US8385020B2 - Modified shield design to eliminate the far-field WATE problem - Google Patents
Modified shield design to eliminate the far-field WATE problem Download PDFInfo
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- US8385020B2 US8385020B2 US12/927,797 US92779710A US8385020B2 US 8385020 B2 US8385020 B2 US 8385020B2 US 92779710 A US92779710 A US 92779710A US 8385020 B2 US8385020 B2 US 8385020B2
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- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/1278—Structure or manufacture of heads, e.g. inductive specially adapted for magnetisations perpendicular to the surface of the record carrier
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/3116—Shaping of layers, poles or gaps for improving the form of the electrical signal transduced, e.g. for shielding, contour effect, equalizing, side flux fringing, cross talk reduction between heads or between heads and information tracks
Definitions
- the invention relates to the general field of magnetic data recording with particular reference to dealing with the wide area track erasure problem.
- WATE wide area track erasure
- FIG. 2 shows some characteristics of WATE: the degraded bit error rate (BER) as a function of offset position to the main pole of 10 heads (each line is one head) was measured.
- the y-axis is the amount of BER degradation after the recording head has written on the central track for a certain amount of cycles.
- the x-axis is the offset from the center of the write pole.
- the write pole's (track) magnetic width is around 0.1 ⁇ m. It is obvious that some heads show strong erasure features at 1.2-1.5 ⁇ m away from the main pole. This far-track erasure phenomenon is detrimental to the disk drive reliability since the data not intended to be erased at those positions (1.2-1.5 ⁇ m away from the central track) can be accidentally erased. Testing for far-track WATE prior to drive-build is economically prohibitive so pre-screening is not an option. Solutions must therefore be found that eliminate these WATE peaks. Some of the root causes of WATE have been discovered [1-3], but many remain unknown at present.
- Hsiao et al. teach a tapered trailing shield to prevent wide angle track erasure while in U.S. 2007/0230045, Hsiao et al. disclose recessed shield portions to prevent WATE. Guan et al. (Headway) show shields having recessed edges to avoid concentration of flux at the edges in U.S. Pat. No. 7,599,152. Okada et al. describe recessed shields to prevent leaking of the magnetic field in U.S. 2003/0026039. In U.S. 2009/0262464, Gill et al. disclose a wrap-around shield made of low-permeability material to reduce WATE while in U.S. 2007/0268623 Feng teaches a multi-layer pole structure to reduce WATE.
- Another object of at least one embodiment of the present invention has been to describe a magnetic write head that embodies said method.
- Still another object of at least one embodiment of the present invention has been to describe a process for the manufacture of said write head.
- FIG. 1 Schematic drawing of air-bearing-surface (ABS) view of a wrap-around writer design (original FIG. 1 ).
- ABS air-bearing-surface
- FIG. 2 Measured cross-track delta BER after central track erasure, the WATE is apparent in the 0.5-0.9 ⁇ m region for this case.
- Each graph point symbol represents a single head.
- FIG. 3 a ABS view of general Proximity Shield Design (PSD)#1.
- FIG. 3 b Cross-section view of PSD#1 outside of the PSD region (off main port center).
- FIG. 4 a ABS view of PSD#.
- FIG. 4 b Cross-section view of PSD#2 outside of the PSD region (off main port center).
- FIG. 5 a ABS view of PSD#3 with non recessed region forming a straight bar across the top yoke.
- FIG. 5 b Cross-section view of PSD#3 at the center line of the main pole.
- FIG. 5 c Cross-section view of PSD#3 off the PSD region.
- FIG. 6 a ABS view of PSD#4 with non recessed region conforming to the side and write gaps of the main pole.
- FIG. 6 b Cross-section view of PSD#4 at the center line of the main pole.
- FIG. 7 Schematic view of the main pole looking down on the main pole top surface of the PSD with the recessed region forming a straight line bar for the full LS/SS/WS or top yoke width (along the horizontal direction).
- FIG. 8 Schematic view illustrating tapered shield design that increases volume of non-magnetic material between it and the ABS.
- the invention discloses a novel design (the proximity shield design or PSD) and processes to implement it.
- PSD the proximity shield design
- the purpose of the PSD is to completely eliminate far-field wide area track erasure or WATE.
- WATE far-field wide area track erasure
- the key feature of the invention that leads to the elimination of far-field WATE is a slight recession, or displacement, of the magnetic shields away from the ABS (and recording medium) except in the immediate vicinity of the main pole.
- the proximity magnetic shield will still continue to prevent fringe fields generated during write operations from reaching the recording medium while the increased distance of the recessed magnetic shields from the magnetic media will reduce any disturb fields originating in the recessed region to a low enough level to avoid accidental erasure.
- the width of the proximity shield is in the range of 0.05-0.5 ⁇ m per side. For a track width of 0.05-0.1 ⁇ m, the proximity shield thus covers only 1 to 10 tracks per side, so all WATE peaks beyond the outer edge of the proximity shield will be eliminated. Additionally, the disk drive already has a build-in function which re-writes ⁇ 10 adjacent tracks after some number of write cycles and/or on detection of signal degradation on adjacent tracks.
- LS refers to ‘leading (magnetic) shield’
- SS to ‘side shield’
- WS to ‘write shield’.
- the write gap and side gap are of non-magnetic material.
- the top yoke is the magnetic layer that wraps around the write coil to complete the write flux loop.
- the full recessed region extends all the way to the outer edges of the LS, SS, and WS.
- the amount of recess depends on the detailed design requirements and process limitations to achieve the selected PSD. The typical minimum value is 5 nm. The greater the recessed amount, the less the chance of WATE caused by undesired magnetic activity in the LS, SS, and WS.
- the first embodiment of the invention (PSD#1 shown in FIGS. 3 a and 3 b ) has a straight proximity shield with non-recessed top.
- FIG. 3 b is a cross-section made in a plane normal to the ABS and showing recessed depth 34 as well as proximity shield 31 , seed layer 35 , write gap 32 , main pole 10 side shield 11 a , and leading shield 13 a.
- PSD#2 shown in FIGS. 4 a and 4 b has its top yoke recessed as well as LS, SS, and WS.
- PSD#3 shown in ABS view in FIG. 5 a , has a non-recessed central section 5 b and recessed outer sections 5 c in a similar manner to LS, SS, and WS.
- PSD#4 shown in ABS view in FIG. 6 a , has the proximity shields in the LS and SS regions conforming to the shape of the side and write gaps.
- An important feature of this design is that the magnetization of the proximity shield in the LS and SS regions is aligned to the edges of the side gap, as indicated by the arrows.
- This layout of the magnetization has the advantage of being an effective shield to reduce side fringing while continuing to prevent flux from the proximity shield from passing through the ABS, thereby reducing the likelihood of accidental erasure.
- FIG. 6 b A cross-sectional view of PSD#4 is shown in FIG. 6 b (cut made through the center of the main pole).
- FIG. 7 is a schematic view taken looking down on the main pole top surface of the PSD with the recessed region forming a straight bar for the full LS/SS/WS or top yoke width (along the horizontal direction).
- Non-magnetic material 71 is deposited to replace the LS/SS/WS material that was removed near the ABS by ion milling, as illustrated in the top view of the main pole surface seen in FIG. 7 .
- This non-magnetic material can be a dielectric or a semiconductor such as (but not limited to) Al 2 O 3 , SiO 2 , MgO, Si, or Ge et.
- a suitable deposition process such as chemical vapor deposition (CVD) or it could be a non-magnetic metal or alloy such as (but not limited to) Ta, V, Zr, Cr, Rh, or any of the non-magnetic alloys of Ni and/or Fe and/or Co with (but not limited to) V, Cr, Ta, or Rh deposited by (but not limited to) CVD, sputtering or electrodeposition.
- CVD chemical vapor deposition
- a non-magnetic metal or alloy such as (but not limited to) Ta, V, Zr, Cr, Rh, or any of the non-magnetic alloys of Ni and/or Fe and/or Co with (but not limited to) V, Cr, Ta, or Rh deposited by (but not limited to) CVD, sputtering or electrodeposition.
- non-magnetic material will be part of the ABS, its adhesion to the recessed magnetic shields may not be strong enough. This poses a reliability concern of cracking or of a small piece breaking loose and then falling into the disk drive environment and causing mechanical contact between the head and the recording media.
- This problem has been solved by using the tapered PSD design illustrated in FIG. 8 .
- This design increases the volume of non-magnetic material located some distance away from the main pole area, thereby increasing both the overall adhesion and the mechanical strength of the non-magnetic layer, whereby the non-magnetic layer is better able to resist deleterious effects of thermal cycling including forming unintended mechanical contacts inside the disk drive.
- Another method to realize the PSD design includes ABS trimming. At row bar level, after the head has been lapped, additional photo patterning and ion milling are applied as follows:
- Photoresist is applied and patterned to protect the reader and the non recessed area while leaving the recessed area unprotected.
- Etching is then performed at the slider level. After final lapping, the wafer is sliced into multiple rows, there being a number of heads per row. Each slider row is then aligned and internally bonded with its ABS facing up. After a photoresist mask has been applied to protect the proximity shield and reader, ion-milling or wet-etching process is used to remove at least 5 nm in the unprotected region so as to form the recessed region in the LS/SS/WS/Top yoke. After stripping the photoresist and cleaning, processing of the slider continues in the normal way.
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Abstract
Description
- 1) Daniel Z. Bai, et. al. “High Density Perpendicular Recording with Wrap-Around Shielded Writer”, TMRC 2009, Paper B4
- 2) M. Mallary et. al, “One terabit per square inch perpendicular recording conceptual design”, IEEE Trans. Magn., vol. 38, pp. 1719-1724, July 2002.
- 3) S. Li, et. al. “Side track erasure processes in perpendicular recording”, IEEE Trans. Magn., vol. 42, pp. 3874-3879, December 2006.
- 1) filling the portion between the recessed magnetic shields and the ABS with non-magnetic material;
- 2) providing a suitably shaped mask to protect the main pole and proximity shield of the writer as well as the entire reader structure and then ion milling a cavity to a depth of at least 5 nm to form the desired recession of the leading, side, and write shields (LS/SS/WS) as well as the top yoke.
Claims (19)
Priority Applications (1)
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US12/927,797 US8385020B2 (en) | 2010-11-24 | 2010-11-24 | Modified shield design to eliminate the far-field WATE problem |
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Application Number | Priority Date | Filing Date | Title |
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US12/927,797 US8385020B2 (en) | 2010-11-24 | 2010-11-24 | Modified shield design to eliminate the far-field WATE problem |
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US20120127611A1 US20120127611A1 (en) | 2012-05-24 |
US8385020B2 true US8385020B2 (en) | 2013-02-26 |
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US12/927,797 Active 2031-09-07 US8385020B2 (en) | 2010-11-24 | 2010-11-24 | Modified shield design to eliminate the far-field WATE problem |
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9230566B1 (en) * | 2014-10-29 | 2016-01-05 | HGST Netherlands B.V. | Perpendicular magnetic write head having a controlled magnetization state shield |
US9245562B1 (en) | 2015-03-30 | 2016-01-26 | Western Digital (Fremont), Llc | Magnetic recording writer with a composite main pole |
US9286919B1 (en) * | 2014-12-17 | 2016-03-15 | Western Digital (Fremont), Llc | Magnetic writer having a dual side gap |
US9595273B1 (en) | 2015-09-30 | 2017-03-14 | Western Digital (Fremont), Llc | Shingle magnetic writer having nonconformal shields |
US11295767B2 (en) | 2018-12-04 | 2022-04-05 | Headway Technologies, Inc. | Perpendicular magnetic recording (PMR) writer with recessed leading shield |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8576514B2 (en) * | 2011-12-16 | 2013-11-05 | Headway Technologies, Inc. | Thin-film magnetic head, method of manufacturing the same, head gimbal assembly, and hard disk drive |
Citations (9)
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US6785097B2 (en) | 2001-08-03 | 2004-08-31 | Hitachi, Ltd. | Thin film magnetic recording head, method of fabricating the thin film magnetic recording head and magnetic disk drive |
US20070230045A1 (en) | 2006-03-28 | 2007-10-04 | Hitachi Global Storage Technologies | Two step corner recess for secondary stray field reduction in a perpendicular magnetic recording head |
US20080112081A1 (en) * | 2006-11-10 | 2008-05-15 | Sae Magnetics (H.K.) Ltd. | Perpendicular magnetic write head, method of manufacturing the same, and magnetic recording apparatus |
US7538976B2 (en) | 2006-04-25 | 2009-05-26 | Hitachi Global Storage Technologies B.V. | Trailing shield design for reducing wide area track erasure (water) in a perpendicular recording system |
US7599152B2 (en) | 2005-04-28 | 2009-10-06 | Headway Technologies, Inc. | Magnetic read-write head shield that prevents flux concentration at edges close to the ABS |
US20090262464A1 (en) | 2008-04-21 | 2009-10-22 | Hardayal Singh Gill | Perpendicular magnetic write head having a wrap around shield constructed of a low permeability material for reduced adjacent track erasure |
US7768741B2 (en) | 2006-05-22 | 2010-08-03 | Hitachi Global Storage Technologies Netherlands B.V. | Magnetic write head design for reducing wide area track erasure |
US20110157746A1 (en) * | 2009-12-30 | 2011-06-30 | Tdk Corporation | Perpendicular magnetic recording head and magnetic recording device |
US20110216443A1 (en) * | 2010-03-08 | 2011-09-08 | Tdk Corporation | Perpendicular magnetic write head and magnetic recording device |
-
2010
- 2010-11-24 US US12/927,797 patent/US8385020B2/en active Active
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
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US6785097B2 (en) | 2001-08-03 | 2004-08-31 | Hitachi, Ltd. | Thin film magnetic recording head, method of fabricating the thin film magnetic recording head and magnetic disk drive |
US7599152B2 (en) | 2005-04-28 | 2009-10-06 | Headway Technologies, Inc. | Magnetic read-write head shield that prevents flux concentration at edges close to the ABS |
US20070230045A1 (en) | 2006-03-28 | 2007-10-04 | Hitachi Global Storage Technologies | Two step corner recess for secondary stray field reduction in a perpendicular magnetic recording head |
US7538976B2 (en) | 2006-04-25 | 2009-05-26 | Hitachi Global Storage Technologies B.V. | Trailing shield design for reducing wide area track erasure (water) in a perpendicular recording system |
US7768741B2 (en) | 2006-05-22 | 2010-08-03 | Hitachi Global Storage Technologies Netherlands B.V. | Magnetic write head design for reducing wide area track erasure |
US20080112081A1 (en) * | 2006-11-10 | 2008-05-15 | Sae Magnetics (H.K.) Ltd. | Perpendicular magnetic write head, method of manufacturing the same, and magnetic recording apparatus |
US20090262464A1 (en) | 2008-04-21 | 2009-10-22 | Hardayal Singh Gill | Perpendicular magnetic write head having a wrap around shield constructed of a low permeability material for reduced adjacent track erasure |
US20110157746A1 (en) * | 2009-12-30 | 2011-06-30 | Tdk Corporation | Perpendicular magnetic recording head and magnetic recording device |
US20110216443A1 (en) * | 2010-03-08 | 2011-09-08 | Tdk Corporation | Perpendicular magnetic write head and magnetic recording device |
US8164853B2 (en) * | 2010-03-08 | 2012-04-24 | Tdk Corporation | Perpendicular magnetic write head with side shield saturation magnetic flux density increasing away from magnetic pole |
Non-Patent Citations (3)
Title |
---|
"High Density Perpendicular Recording with Wrap-Around Shielded Writer," by Daniel Z. Bai et al, TMRC 2009, Paper B4, pp. 1-9, Manuscript received Aug. 24, 2009. |
"One Terabit per Square Inch Perpendicular Recording Conceptual Design," by M. Mallary et al., IEEE Transactions on Magnetics, vol. 38, No. 4, Jul. 2002, pp. 1719-1724. |
"Side-Track Erasure Processes in Perpendicular Recording," by Shaoping Li et al., IEEE Transactions on Magnetics, vol. 42, No. 12, Dec. 2006, pp. 3874-3879. |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9230566B1 (en) * | 2014-10-29 | 2016-01-05 | HGST Netherlands B.V. | Perpendicular magnetic write head having a controlled magnetization state shield |
US9286919B1 (en) * | 2014-12-17 | 2016-03-15 | Western Digital (Fremont), Llc | Magnetic writer having a dual side gap |
US9245562B1 (en) | 2015-03-30 | 2016-01-26 | Western Digital (Fremont), Llc | Magnetic recording writer with a composite main pole |
US9595273B1 (en) | 2015-09-30 | 2017-03-14 | Western Digital (Fremont), Llc | Shingle magnetic writer having nonconformal shields |
US11295767B2 (en) | 2018-12-04 | 2022-04-05 | Headway Technologies, Inc. | Perpendicular magnetic recording (PMR) writer with recessed leading shield |
US20220223176A1 (en) * | 2018-12-04 | 2022-07-14 | Headway Technologies, Inc. | Perpendicular Magnetic Recording (PMR) Writer with Recessed Leading Shield |
US11699460B2 (en) * | 2018-12-04 | 2023-07-11 | Headway Technologies, Inc. | Perpendicular magnetic recording (PMR) writer with recessed leading shield |
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