US6461784B1 - Photosensitive printing plate having mat particles formed on the photosensitive layer and method of producing the same - Google Patents
Photosensitive printing plate having mat particles formed on the photosensitive layer and method of producing the same Download PDFInfo
- Publication number
- US6461784B1 US6461784B1 US09/708,888 US70888800A US6461784B1 US 6461784 B1 US6461784 B1 US 6461784B1 US 70888800 A US70888800 A US 70888800A US 6461784 B1 US6461784 B1 US 6461784B1
- Authority
- US
- United States
- Prior art keywords
- photosensitive
- printing plate
- meth
- plate according
- photosensitive printing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 239000011248 coating agent Substances 0.000 claims abstract description 24
- 238000000576 coating method Methods 0.000 claims abstract description 24
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- 239000003999 initiator Substances 0.000 claims description 10
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- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- JPIYZTWMUGTEHX-UHFFFAOYSA-N auramine O free base Chemical compound C1=CC(N(C)C)=CC=C1C(=N)C1=CC=C(N(C)C)C=C1 JPIYZTWMUGTEHX-UHFFFAOYSA-N 0.000 description 1
- IVRMZWNICZWHMI-UHFFFAOYSA-N azide group Chemical group [N-]=[N+]=[N-] IVRMZWNICZWHMI-UHFFFAOYSA-N 0.000 description 1
- HRBFQSUTUDRTSV-UHFFFAOYSA-N benzene-1,2,3-triol;propan-2-one Chemical compound CC(C)=O.OC1=CC=CC(O)=C1O HRBFQSUTUDRTSV-UHFFFAOYSA-N 0.000 description 1
- SBRNNFKJRZCFRF-UHFFFAOYSA-N benzene-1,4-diol;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.OC1=CC=C(O)C=C1 SBRNNFKJRZCFRF-UHFFFAOYSA-N 0.000 description 1
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical class C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- ZFMQKOWCDKKBIF-UHFFFAOYSA-N bis(3,5-difluorophenyl)phosphane Chemical compound FC1=CC(F)=CC(PC=2C=C(F)C=C(F)C=2)=C1 ZFMQKOWCDKKBIF-UHFFFAOYSA-N 0.000 description 1
- ZLSMCQSGRWNEGX-UHFFFAOYSA-N bis(4-aminophenyl)methanone Chemical compound C1=CC(N)=CC=C1C(=O)C1=CC=C(N)C=C1 ZLSMCQSGRWNEGX-UHFFFAOYSA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- VFGRALUHHHDIQI-UHFFFAOYSA-N butyl 2-hydroxyacetate Chemical compound CCCCOC(=O)CO VFGRALUHHHDIQI-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
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- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
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- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
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- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- JESXATFQYMPTNL-UHFFFAOYSA-N mono-hydroxyphenyl-ethylene Natural products OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 1
- NQAWGTOHYUGFGZ-UHFFFAOYSA-N n-(benzenesulfonyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NS(=O)(=O)C1=CC=CC=C1 NQAWGTOHYUGFGZ-UHFFFAOYSA-N 0.000 description 1
- SEEYREPSKCQBBF-UHFFFAOYSA-N n-methylmaleimide Chemical compound CN1C(=O)C=CC1=O SEEYREPSKCQBBF-UHFFFAOYSA-N 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
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- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- HVAMZGADVCBITI-UHFFFAOYSA-M pent-4-enoate Chemical compound [O-]C(=O)CCC=C HVAMZGADVCBITI-UHFFFAOYSA-M 0.000 description 1
- 125000001791 phenazinyl group Chemical class C1(=CC=CC2=NC3=CC=CC=C3N=C12)* 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
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- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
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- 229920000915 polyvinyl chloride Polymers 0.000 description 1
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- 239000000047 product Substances 0.000 description 1
- HPCIWDZYMSZAEZ-UHFFFAOYSA-N prop-2-enyl octadecanoate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCC=C HPCIWDZYMSZAEZ-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 229920003987 resole Polymers 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 235000013874 shellac Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- PNGLEYLFMHGIQO-UHFFFAOYSA-M sodium;3-(n-ethyl-3-methoxyanilino)-2-hydroxypropane-1-sulfonate;dihydrate Chemical compound O.O.[Na+].[O-]S(=O)(=O)CC(O)CN(CC)C1=CC=CC(OC)=C1 PNGLEYLFMHGIQO-UHFFFAOYSA-M 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- NVBFHJWHLNUMCV-UHFFFAOYSA-N sulfamide Chemical group NS(N)(=O)=O NVBFHJWHLNUMCV-UHFFFAOYSA-N 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- 125000003718 tetrahydrofuranyl group Chemical group 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- HQUQLFOMPYWACS-UHFFFAOYSA-N tris(2-chloroethyl) phosphate Chemical compound ClCCOP(=O)(OCCCl)OCCCl HQUQLFOMPYWACS-UHFFFAOYSA-N 0.000 description 1
- FKVXIGHJGBQFIH-UHFFFAOYSA-K trisodium 5-amino-3-[[4-[4-[(7-amino-1-hydroxy-3-sulfonatonaphthalen-2-yl)diazenyl]phenyl]phenyl]diazenyl]-4-hydroxynaphthalene-2,7-disulfonate Chemical compound C1=CC(=CC=C1C2=CC=C(C=C2)N=NC3=C(C=C4C=CC(=CC4=C3[O-])N)S(=O)(=O)O)N=NC5=C(C6=C(C=C(C=C6C=C5S(=O)(=O)O)S(=O)(=O)[O-])N)[O-].[Na+].[Na+].[Na+] FKVXIGHJGBQFIH-UHFFFAOYSA-K 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
Definitions
- the present invention relates to a photosensitive printing plate and a method of producing the same and, more particularly, to a photosensitive printing plate which is superior in vacuum contact properties and is free from tack on the surface when used, and is also superior in storage stability, and a method of producing the same.
- Japanese Patent Application, First Publication No. 51-111102 has suggested a photosensitive printing plate produced by coating the surface of a photosensitive layer with a matting agent to form a fine pattern (mat particles) in which a coated portion and a non-coated portion are simultaneously present
- Japanese Patent Application, First Publication No. 55-12974 has suggested a photosensitive printing plate produced by thermally fusing solid powders to the surface of a photosensitive layer to form mat particles.
- materials of the mat particles in these photosensitive printing plates had drawbacks in that the mat particles are fractured by various pressures applied during the production, storage and use thereof because of poor mechanical strength, thereby lengthening the vacuum close contact time.
- Japanese Patent Application, First Publication No. 57-34558 has suggested a photosensitive printing plate produced by spraying an aqueous solution, which is prepared by dissolving or dispersing a carboxyl group-containing water-soluble resin, over the surface of a photosensitive layer to form mat particles on the surface of the photosensitive layer.
- the mat particles of this photosensitive printing plate are superior in terms of adhesion to the photosensitive layer and have minimal peeling from the surface of the photosensitive layer by friction or pressure.
- a water-soluble resin is used as mat particles in view of the safety during the production thereof.
- Japanese Patent Application, First Publication No. 57-58152 has suggested, as a photosensitive printing plate having improved tack on the surface, a photosensitive printing plate produced by using a water-soluble resin containing an ammonium salt of acrylic acid unit as the resin for mat particles.
- a photosensitive material in the photosensitive layer is decomposed after a lapse of time, thereby making it impossible to partially develop the photosensitive layer, resulting in poor storage stability.
- Japanese Patent Application, First Publication No. 58-182636 has suggested a photosensitive printing plate produced by using a water-soluble resin having a sulfonic group as the resin for mat particles.
- a water-soluble resin having a sulfonic group as the resin for mat particles.
- tack and storage stability under the conditions of high temperature and high humidity are improved but are still poor. That is, there were drawbacks in that a large content of the sulfonic group causes tack, while a large content of an alkali salt, an ammonium salt and a water-soluble amine salt causes poor storage stability.
- An object of the present invention is to provide a photosensitive printing plate which has excellent vacuum contact properties and resistance to friction and pressure and is free from tack on the surface when used, and which causes no problem in developing properties during the storage for a long period of time.
- the inventors have intensively studied to attain the above object and found that the above object can be attained by using, as mat particles, a copolymer containing (meth)acrylamides as a unit. Thus, the present invention has been achieved.
- the photosensitive printing plate of the present invention comprises a substrate, a photosensitive layer formed on the substrate, and mat particles formed on the photosensitive layer, wherein the mat particles contain a copolymer which contains at least one (meth)acrylamides as a unit.
- the method of producing the photosensitive printing plate of the present invention is a method of producing a photosensitive printing plate comprising a substrate, a photosensitive layer formed on the substrate, and mat particles formed on the photosensitive layer, the method comprising dissolving a copolymer containing at least one (meth)acrylamide as a unit in a solvent to prepare a solution, and coating the photosensitive layer with the solution to form mat particles.
- the photosensitive printing plate of the present invention has excellent vacuum contact properties and resistance to friction and pressure and is free from tack on the surface when used, causes no problem in developing properties during storage for a long period of time, and is superior in terms of solubility in an exhausted developer.
- mat particles on the photosensitive layer are not adhered to the back surface of a substrate of the photosensitive printing plate, which is in contact with the mat particles, when a pressure is applied on the surface of the photosensitive layer for a long period of time in the state where the photosensitive printing plates are stacked without interleaving paper between them. Therefore the photosensitive printing plate of the present invention is preferably used in an automatic plate making machine.
- the method of producing the photosensitive printing plate of the present invention there can be produced a photosensitive printing plate which has excellent vacuum contact properties and resistance to friction and pressure and is free from tack on the surface when used, and also causes no problem in developing properties during the storage for a long period of time and is superior in solubility in an exhausted developer.
- FIG. 1 is a schematic cross sectional view showing one embodiment of the photosensitive printing plate according to the present invention.
- the photosensitive printing plate of the present invention is a photosensitive printing plate used in conjunction with a type of exposing to light in the state where an original film is layered on the photosensitive printing plate.
- photosensitive printing plates include photosensitive metal relief printing plates, photosensitive resin relief printing plates, various photosensitive planographic printing plates, various photosensitive intaglio printing plates, photosensitive flexographic printing plates, photosensitive screen printing plates, various silver halide emulsion type printing plates and the like.
- the construction of the present invention will be described by way of the photosensitive planographic printing plate.
- FIG. 1 is a schematic cross sectional view showing one embodiment of the photosensitive planographic printing plate according to the present invention.
- This photosensitive planographic printing plate 1 is schematically depicted as comprising a substrate 2 , a photosensitive layer 3 formed on the substrate 2 , and a plurality of mat particles 4 formed on the photosensitive layer 3 .
- the mat particles 4 contain a copolymer which contains at least one (meth)acrylamide as a constituent unit.
- (meth)acrylamides refers generically to methacrylamide and compounds derived therefrom as well as acrylamide and compounds derived therefrom, whereas, the term “(meth)acrylamide” refers generically to methacrylamide and acrylamide.
- the (meth)acrylamides include (meth)acrylamide, N-methyl (meth)acrylamide, N-ethyl (meth)acrylamide, N-propyl (meth)acrylamide, N-butyl (meth)acrylamide, N-hexyl (meth)acrylamide, N-octyl (meth)acrylamide, N-cyclohexyl (meth)acrylamide, N-methylol (meth)acrylamide, N-hydroxyethyl (meth)acrylamide, N-benzyl (meth)acrylamide, N-phenyl (meth)acrylamide, N-nitrophenyl (meth)acrylamide, N-tolyl (meth)acrylamide, N-hydroxyphenyl (meth)acrylamide, N,N-dimethyl (meth)acrylamide, N,N-diethyl (meth)acrylamide, N,N-dicyclohexyl (meth)acrylamide and the like. These (meth)acrylamides may be any
- (meth)acrylamides for example, acrylamide, methacrylamide, N,N-dimethylacrylamide and N,N-dimethylmethacrylamide are preferable, and methacrylamide, N,N-dimethylacrylamide are more preferable.
- These (meth)acrylamides can be available at cheap price, and mat particles containing a copolymer which contains these (meth)acrylamides as a unit have comparatively low cost and good contact properties to the photosensitive layer, and also have high strength and less tack. Accordingly, a photosensitive planographic printing plate with such mat particles formed on the surface is particularly superior in vacuum contact properties and has less tack on the surface.
- the (meth)acrylamides provide the copolymer with enough strength to maintain good vacuum contact properties, and the (meth)acrylamides also provide the copolymer with solubility in a coating solvent and solubility in a developer.
- the copolymer containing the (meth)acrylamides as the constituent unit has good contact properties to the photosensitive layer 3 and less tack under the conditions of high temperature and high humidity. Furthermore, it does not decompose photosensitive material in the photosensitive layer 3 over time.
- a sufficient amount of the monomer of the (meth)acrylamides to achieve these effects is within a range of 20 to 90% by mole, and preferably within a range of 35 to 85% by mole, based on the total constituent components of the copolymer.
- the amount of the (meth)acrylamides in the copolymer components is less than 20% by mole, sufficient solubility in the coating solvent and developer is not obtained.
- the amount of the (meth)acrylamides exceeds 90% by mole, the copolymer exhibits tack sometimes during the storage under the conditions of high temperature and high humidity.
- the copolymer for mat particles 4 does not have a sulfonic group.
- the copolymer has a sulfonic group, the copolymer is likely to exhibit tack during storage under conditions of high temperature and high humidity.
- the copolymer contains an alkali metal salt, an ammonium salt or a water-soluble amine salt of sulfonic acid, there is concern that the photosensitive layer 3 can not be developed partially during storage for a long time.
- the copolymer for mat particles 4 can be produced by a known conventional method.
- the copolymer can be produced by adding a conventional radical polymerization initiator to (meth)acrylamides and, if necessary, an addition-polymerizable unsaturated compound capable of copolymerizing with the (meth)acrylamides in an organic solvent, followed by thermal polymerization.
- Examples of the addition-polymerizable unsaturated compound capable of copolymerizing with the (meth)acrylamides include (meth)acrylates such as methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, butyl (meth)acrylate, amyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, octyl (meth)acrylate, 2-chloroethyl (meth)acrylate, cyclohexyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, diethylene glycol mono(meth)acrylate, 2-hydroxy-3-phenoxypropyl (meth)acrylate, glycidyl (meth)acrylate, diethylaminoethyl (meth)acrylate, furfuryl (meth)acrylate,
- the substrate 2 examples include a metal plate made of aluminum, zinc, copper, stainless steel, and iron; plastic film made of polyethylene terephthalate, polycarbonate, polyvinyl acetal, and polyethylene; paper coated with a molten synthetic resin or a synthetic resin solution; and composite made by forming a metal layer on a plastic film using a technique such as vacuum deposition or lamination, and materials used as the substrate of the printing plate.
- the substrate having a surface made of metal, especially aluminum is preferably surface-treated by graining, anodizing, hydrophilization or the like.
- the photosensitive layer 3 is a layer made of a photosensitive composition
- the photosensitive planographic printing plate 1 includes positive and negative working photosensitive planographic printing plates, which differ in formulation of the photosensitive composition used in the photosensitive layer 3 .
- the photosensitive composition for positive working photosensitive planographic printing plates may be any photosensitive composition as far as the solubility or swell characteristics in developer vary before and after exposure, and examples thereof include various known photosensitive materials such as positive working photosensitive compositions containing an alkali-soluble resin and an o-quinonediazide compound, three-component chemical amplification type positive working photosensitive compositions and the like.
- positive working photosensitive compositions containing an alkali-soluble resin and an o-quinonediazide compound can be used in the present invention, and are particularly preferred.
- the positive working photosensitive composition will be described below by way of this composition.
- the o-quinonediazide compound is a compound having at least one o-quinonediazide group and is preferably a compound in which the solubility in aqueous alkali solution is enhanced by active light.
- Such compounds having various structures, are known and described, for example, in “Light-Sensitive Systems” (John Wiley & Sons, Inc., published on 1965), pp. 336-352 (J. Kosar ed.).
- sulfonates of various hydroxyl compounds and o-benzoquinonediazide or o-naphthoquinonediazide are preferable.
- Examples of the o-quinonediazide compound include ester of 1,2-naphthoquinone-2-diazide-5-sulfonyl chloride and phenol-formaldehyde resin or cresol-formaldehyde resin; ester of 1,2-naphthoquinone-2-diazide-5-sulfonyl chloride and pyrogallol-acetone resin described in U.S. Pat. No. 3,635,709; ester of 1,2-naphthoquinone-2-diazide-5-sulfonyl chloride and resorcine-benzaldehyde resin described in Japanese Patent Application, Second Publication No.
- Examples of known o-quinonediazide compound further include those described in Japanese Patent Application, First Publication No. 63-80254, Japanese Patent Application, First Publication No. 58-5737, Japanese Patent Application, First Publication No. 57-111530, Japanese Patent Application, First Publication No. 57-111531, Japanese Patent Application, First Publication No. 57-114138, Japanese Patent Application, First Publication No. 57-142635, Japanese Patent Application, First Publication No. 51-36129, Japanese Patent Application, Second Publication No. 62-3411, Japanese Patent Application, Second Publication No. 62-51459, and Japanese Patent Application, Second Publication No. 51-483.
- the amount of the o-quinonediazide compound is usually within a range of 5 to 60% by weight, and preferably within a range of 10 to 40% by weight, based on the total solid content of the photosensitive composition.
- a resin which is insoluble in water and soluble in an aqueous alkali solution (hereinafter referred to as an “alkali-soluble resin”) can be used as a binder resin, thereby making it possible to improve properties such as developing properties, durability, solvent resistance, and chemical resistance.
- alkali-soluble resin examples include novolak resins or resol resins, such as phenyl-formaldehyde resins, cresol-formaldehyde resins, and phenol-cresol-formaldehyde resins; acrylic resins containing one or more monomers having an acidic group, such as polyhydroxystyrene, polyhalogenated hydroxystyrene, N-(4-hydroxyphenyl)methacrylamide, hydroquinone monomethacrylate, N-(sulfamoylphenyl)methacrylamide, N-phenylsulfonylmethacrylamide, N-phenylsulfonylmaleimide, acrylic acid, and methacrylic acid; vinyl polymer resins such as active methylene group-containing resins described in Japanese Patent Application, First Publication No.
- polyurethane resins such as polyurethane resins having a N-sulfonylamide group, a N-sulfonylureido group and a N-aminosulfonylamide group described in Japanese Patent Application, First Publication No. 63-261350, and active imide group-containing polyurethane resins described in Japanese Patent Application, First Publication No. 2-77748; polyamide resins such as polyhydroxypolyamide described in Japanese Patent Application, First Publication No. 1-6947; and polyester resins such as polyester resins having a phenolic hydroxyl group described in Japanese Patent Application, First Publication No. 6-236029.
- alkali-soluble resins may be used alone or in combination, and are usually used in the amount of 90% by weight or less based on the total weight of the composition.
- cyclic acid anhydrides for enhancing sensitivity, printing-out agents for forming a visible image immediately after exposure, dyes as an image colorant, and other fillers can be added in the positive working photosensitive composition.
- cyclic acid anhydrides examples include succinic anhydride, glutaric anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, maleic anhydride, chloromaleic anhydride, pyromellitic anhydride and the like. These cyclic acid anhydrides can be contained in the amount within a range of 1 to 15% by weight based on the total composition.
- Examples of print-out agents for forming a visible image immediately after exposure include combination of a photosensitive compound capable of producing an acid by exposure and an organic dye capable of forming a salt with the acid thereby changing color tone.
- Examples of the photosensitive compound capable of producing an acid by exposure include o-naphthoquinonediazide-4-halogenide sulfonate described in Japanese Patent Application, First Publication No. 50-36209; trihalomethyl-2-pyrone or trihalomethyl-s-triazine described in Japanese Patent Application, First Publication No. 53-36223; various o-naphthoquinonediazide compounds described in Japanese Patent Application, First Publication No. 55-62444; 2-trihalomethyl-5-aryl-1,3,4-oxadiazole compound described in Japanese Patent Application, First Publication No. 55-77742; and diazonium salt. These compounds can be used alone or in combination and the amount is preferably within a range of 0.3 to 15% by weight based on the total weight of the composition.
- Examples of the organic dye capable of forming a salt include triphenylmethane dye, cyanine dye, diazo dye, styryl dye and the like. Specific examples thereof include Crystal Violet, Ethyl Violet, Methyl Violet, Methylene Blue, Victoria Blue BH, Victoria Pure Blue BOH, Malachite Green, Oil Blue #603, Oil Green BG, Brilliant Green, Fuchsine, Eosin, Rhodamine B, Oil Pink #312, Oil Red 5B, Oil Black BS, Oil Yellow #101, Phenolphthalein, Cresol Red, Auramine, Leucocrystal Violet, Leucomalachite Green and the like.
- the amount is preferably within a range of 0.3 to 15% by weight based on the total weight of the composition.
- various additives for example, various resins having a hydrophobic group for improving ink acceptability of image, such as octylphenolformaldehyde resin, t-butylphenolformaldehyde resin, t-butylphenol-benzaldehyde resin, rosin-modified novolak resin, and o-naphthoquinonediazide sulfonate of the modified novolak resin; and plasticizers for improving flexibility of coated film, such as dibutyl phthalate, dioctyl phthalate, butyl glycolate, tricresyl phosphate, and dioctyl adipate for various purposes.
- the amount is preferably within a range of 0.01 to 30% by weight based on the total weight of the composition.
- Examples of the photosensitive material used as the photosensitive composition for producing a negative working photosensitive printing plate include systems which can be preferably used, such as: (1) photosensitive diazonium compounds; (2) combinations of addition-polymerizable unsaturated group-containing compounds and photopolymerization initiators; and (3) combinations of photosensitive diazonium compounds, addition-polymerizable unsaturated group-containing compounds and photopolymerization initiators.
- Examples of the photosensitive diazonium compounds (1) above include diazo resins such as salts of condensates of diazodiarylamine and active carbonyl compounds, preferably compounds which are photosensitive and also insoluble in water and soluble in an organic solvent.
- Examples of particularly preferable diazo resins include organic acid or inorganic acid salts of condensates of 4-diazodiphenylamine, 4-diazo-3-methyldiphenylamine, 4-diazo-4′-methyldiphenylamine, 4-diazo-3′-methyldiphenylamine, 4-diazo-4′-methoxyldiphenylamine, 4-diazo-3-methyl-4′-ethoxydiphenylamine or 4-diazo-3-methoxyldiphenylamine, and formaldehyde, paraformaldehyde, acetaldehyde, benzaldehyde or 4,4′-bis-methoxymethyl diphenyl ether.
- organic acids of the diazo resins include methanesulfonic acid, benzenesulfonic acid, toluenesulfonic acid, xylenesulfonic acid, mesitylenesulfonic acid, dodecylbenzenesulfonic acid, naphthalenesulfonic acid, propylnaphthalenesulfonic acid, 1-naphthol-5-sulfonic acid, 2-nitrobenzenesulfonic acid, 3-chlorobenzenesulfonic acid, 2-hydroxy-4-methoxybenzophenone-5-sulfonic acid and the like.
- inorganic acids include hexafluorophosphoric acid, tetrafluoroboric acid, thiocyanic acid and the like.
- diazo resins having a polyester group at a principal chain as described in Japanese Patent Application, First Publication No. 54-30121; diazo resins obtained by reacting a polymer having a carboxylic anhydride group with a diazo compound having a hydroxyl group as described in Japanese Patent Application, First Publication No. 61-273538; and diazo resins obtained by reacting a polyisocyanate compound with a diazo compound having a hydroxyl group.
- the amount of the diazo resin is preferably within a range of 0 to 40% by weight based on the solid content of the composition and, if necessary, two or more diazo compounds may be used in combination.
- an organic polymeric binder is usually used in combination.
- the organic polymeric binders include acrylic resins, polyamide resins, polyester resins, epoxy resins, polyacetal resins, polystyrene resins, novolak resins and the like.
- thermal polymerization inhibitors such as thermal polymerization inhibitors, dyes, pigments, plasticizers, and stability improvers can also be added.
- preferable dyes include basic oil-soluble dyes such as Crystal Violet, Malachite Green, Victoria Blue, Methylene Blue, Ethyl Violet, Rhodamine B and the like.
- Commercially available products include, for example, “Victoria Blue BOH” (manufactured by Hodogaya Chemical Industries Co., Ltd.), “Oil Blue #603” (manufactured by Orient Chemical Industries Co., Ltd.) and the like.
- the pigment include Phthalocyanine Blue, Phthalocyanine Green, Dioxadine Violet, Quinacridone Red and the like.
- plasticizers examples include diethyl phthalate, dibutyl phthalate, dioctyl phthalate, tributyl phosphate, trioctyl phosphate, tricresyl phosphate, tri(2-chloroethyl) phosphate, tributyl citrate and the like.
- phosphoric acid phosphorous acid, oxalic acid, tartaric acid, malic acid, citric acid, dipicolinic acid, polyacrylic acid, benzenesulfonic acid and toluenesulfonic acid can also be used in combination as the known stability improver.
- the amount of various additives which may be used varies depending on the purpose, but is preferably within a range of 0 to 30% by weight based on the solid content of the photosensitive composition.
- the photosensitive composition (2) above containing an addition-polymerizable unsaturated group-containing compound and a photopolymerization initiator includes, for example, compositions comprising an addition-polymerizable unsaturated group-containing compound having two or more terminal ethylene groups and a photopolymerization initiator, which are described in U.S. Pat. Nos. 2,760,863 and 3,060,023 and Japanese Patent Application, First Publication No. 62-121448.
- addition-polymerizable unsaturated group-containing compound refers to a monomer or oligomer which has a boiling point of 100° C. or higher at normal pressure and has at least one, preferably two or more addition-polymerizable ethylenic unsaturated groups, in a molecule.
- Examples of the monomer or oligomer include monofunctional (meth)acrylates such as polyethylene glycol mono(meth)acrylate (methacerylate and acrylate are generically referred to herein as (meth)acrylate), polypropylene glycol mono(meth)acrylate, and phenoxyethyl (meth)acrylate; and polyfunctional (meth)acrylates such as polyethylene glycol di(meth)acrylate, polypropylene glycol di(meth)acrylate, trimethylolropane tri(meth)acrylate, neopentyl glycol di(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol hexa(meth)acrylate, hexanediol di(meth)acrylate, tri(acryloyloxyethyl) isocyanurate, (meth)acrylate
- the amount of these compounds having an addition-polymerizable ethylenically unsaturated group is preferably within a range of 5 to 70% by weight based on the solid content of the composition.
- photopolymerization initiator examples include alpha-carbonyl compounds described in U.S. Pat. No. 2,367,661, acyloin ethers described in U.S. Pat. No. 2,448,828, alpha-hydrocarbon-substituted aromatic acyloin compounds described in U.S. Pat. No. 2,722,512, polynuclear quinone compounds described in U.S. Pat. No. 3,046,127, combinations of triaryl biimidazole and p-aminophenylketone described in U.S. Pat. No. 3,549,367, trihalomethyl-s-triazine compounds described in U.S. Pat. No.
- the amount of the photopolymerization initiator is preferably within a range of 0.5 to 20% by weight based on the solid content of the composition.
- the negative working photosensitive material described above is characterized in that: (1) when using a photosensitive diazonium compound, good adhesion is achieved between the photosensitive layer and substrate; (2) when using a combination of the addition-polymerizable unsaturated group-containing compound and photopolymerization initiator, a tough coated film can be obtained by exposure; and (3) when using a combination of the photosensitive diazonium compound, addition-polymerizable unsaturated group-containing compound and photopolymerization initiator, a coated film having features of both can be obtained.
- binder resins for example, copolymers such as (meth)acrylic acid-(meth)acrylate copolymers, copolymers containing hydroxyalkyl (meth)acrylate and (meth) acrylonitrile having acid value of 10 to 100 described in U.S. Pat. No. 4,123,276, copolymer having aromatic hydroxyl groups as described in Japanese Patent Application, Second Publication No. 57-43890, and polymers having 2-hydroxy-3-phenoxypropyl (meth)acrylate units as described in Japanese Patent Application, Second Publication No.
- a photo-crosslinkable resin having affinity with an aqueous alkali developer is preferable as the photo-crosslinkable resin.
- copolymers having a cinnamic group and a carboxyl group as described in Japanese Patent Application, Second Publication No. 54-15711; polyester resins having a phenylenediacrylic acid residue and a carboxyl group as described in Japanese Patent Application, First Publication No. 60-165646; polyester resins having a phenylenediacrylic acid residue and a phenolic hydroxyl group as described in Japanese Patent Application, First Publication No.
- polyester resins having a phenylenediacrylic residue and a sodium iminodisulfonyl group as described in Japanese Patent Application, Second Publication No. 57-42858; and polymers having an azide group and a carboxyl group at a side chain as described in Japanese Patent Application, First Publication No. 59-208552.
- the above negative working photosensitive composition is dissolved in a proper solvent after dyes, pigments, stabilizers, fillers and crosslinking agents are added, if necessary.
- the method of producing the photosensitive printing plate of the present invention will be described referring to the photosensitive planographic printing plate 1 in FIG. 1 .
- the surface of the substrate 2 is coated with a solution prepared by dissolving or dispersing the above photosensitive composition in an organic solvent, and then the solution is dried to form the photosensitive layer 3 on the substrate 2 .
- a copolymer containing (meth)acrylamides as a constituent unit is dissolved in a coating solvent to provide a solution, and the photosensitive layer 3 is coated with the solution to form mat particles 4 .
- organic solvent in which the photosensitive composition is dissolved or dispersed for example, any conventionally known organic solvents can be used.
- organic solvent examples include alcohols such as methyl alcohol, ethyl alcohol, n- or iso-propyl alcohol, n- or iso-butyl alcohol, and diacetone alcohol; ketones such as acetone, methyl ethyl ketone, methyl propyl ketone, methyl butyl ketone, methyl amyl ketone, methyl hexyl ketone, diethyl ketone, diisobutyl ketone, cyclohexanone, methylcyclohexane, and acetylacetone; hydrocarbons such as hexane, cyclohexane, heptane, octane, nonane, decane, benzene, toluene, xylene, and methoxybenzene; acetates such as ethyl acetate, n- or iso-propyl acetate, n- or iso-butyl alcohol,
- the method of coating with the photosensitive composition for example, there can be used methods such as roll coating, dip coating, air knife coating, gravure coating, gravure offset coating, hopper coating, blade coating, wire doctor coating, spray coating and the like.
- the coating weight of the photosensitive composition is preferably within a range of 10 to 100 ml/m 2 .
- the coated substrate 2 is usually dried by using heated air.
- the heating is performed at a temperature within a range of 30 to 200° C., and particularly within a range of 40 to 140° C. Not only the method of maintaining the drying temperature at a fixed temperature during the drying, but also the method of increasing the drying temperature can be carried out in stages.
- Preferable results can be obtained on occasion by dehumidification of dry air.
- the heated air is fed to the coated surface at a rate within a range of 0.1 to 30 m/second, and particularly within a range of 0.5 to 20 m/second.
- the coating weight of the photosensitive composition is usually within the range of about 0.5 to 5 g/m 2 on a dry weight basis.
- the coating solvent in which the copolymer containing (meth)acrylamides as a unit is dissolved or dispersed for example, water and various organic solvents are used alone or in combination.
- the organic solvent include alcohols such as methyl alcohol, ethyl alcohol, n- or iso-propyl alcohol, n- or iso-butyl alcohol, and diacetone alcohol; ketones such as acetone, methyl ethyl ketone, methyl propyl ketone, methyl butyl ketone, methyl amyl ketone, methyl hexyl ketone, diethyl ketone, diisobutyl ketone, cyclohexanone, methylcyclohexanone, and acetylacetone; hydrocarbons such as hexane, cyclohexane, heptane, octane, nonane, decane, benzene, toluene, xylene
- additives can be added to the above solution.
- these additives include light absorbents having optical absorption within an active light range of the photosensitive layer 3 of the photosensitive planographic printing plate 1 , dyes, pigments, ultraviolet absorbers, fluorine surfactants, silicone surfactants, diazo compounds, ethylenic unsaturated compounds, and fillers such as silicon dioxide, titanium oxide, zirconium oxide, glass particles, alumina and polymer particles.
- the method of coating the photosensitive layer 3 with a solution prepared by dissolving or dispersing a copolymer containing (meth)acrylamides as a unit for example, there can be used known methods such as air spray methods, airless spray methods, electrostatic air spray methods, electrostatic coating methods by electrostatic atomizing and the like.
- the number of mat particles formed by these methods is within a range of 1 to 1000/mm 2 , and preferably within a range of 5 to 500/mm 2 .
- the height is preferably within a range of about 0.5 to 20 ⁇ m and the diameter is within a range of about 1 to 200 ⁇ m.
- An aluminum plate having a thickness of 0.30 mm was degreased by using an aqueous sodium hydroxide solution and then electrochemically grained in a 2% hydrochloric acid bath to obtain a grained plate of 0.6 ⁇ m in center line average roughness (Ra).
- the resulting grained plate was anodized in a 20% sulfuric acid bath at a current density of 2 A/dm 2 to form 2.7 g/m 2 of an oxide layer and, furthermore, the plate was passed through an aqueous 2.5% sodium silicate solution at 70° C. for 30 seconds, washed with water and then dried to obtain a substrate.
- the substrate was coated with a coating solution of the formulation shown in Table 1 at low speed using a roll coater, and then dried at 100° C. for three minutes to form a photosensitive layer.
- the dry coating weight was 2.0 g/m 2 .
- the 2-hydroxyetyl methacrylate copolymer in Table 1 was prepared in the following manner.
- the coating weight of the copolymer was about 0.1 g/m 2 and the number of the mat particles was within a range of 50 to 200/mm 2 and, furthermore, the height thereof was within a range of 5 to 20 ⁇ m and the diameter was within a range of 20 to 100 ⁇ m.
- the vacuum contact time was evaluated by using an exposure device manufactured by Dainippon Screen MFG.
- the respective photosensitive printing plates were allowed to stand under the conditions of a temperature of 60° C. and a humidity of 75% for 24 hours and developed at 30° C. for 20 seconds by an automatic processor PD-912 manufactured by Dainippon Screen MFG. Co., Ltd., Incorporation, using a developer prepared by diluting a developer ND-1 manufactured by Kodak Polychrome Graphics Japan Ltd. with water in a volume ratio of 1:3 (ND-1: water), and then the developing properties of the trace of the mat particles were confirmed.
- a developer in the state of being exhausted was prepared by treating a negative working photosensitive planographic printing plate NN-2 manufactured by Kodak Polychrome Graphics Japan Ltd. with a developer in a volume ratio of 1:3 (ND-1: water) Using this exhausted developer, the respective photosensitive printing plates were developed, and then the developing properties of the trace of the mat particles were confirmed.
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Abstract
Description
| TABLE 1 | |
| Coating solution of photosensitive composition | Unit: g |
| 2-hydroxyethyl methacrylate copolymer (described in Example 1 | 1.75 |
| of Japanese Patent Application, First Publication No. 50-118802) | |
| 2-methoxy-4-hydroxy-5-benzoylbenzenesulfonate salt of | 0.20 |
| condensate of p-diazodiphenylamine and formaldehyde | |
| Oil Blue #603 (manufactured by Orient Chemical Industries Co., | 0.05 |
| Ltd.) | |
| Methyl glycol | 28.0 |
| Methylcellosolve acetate | 20.0 |
| TABLE 2 | |||
| (Meth) acrylamides | Other components (% by mole) | ||
| component (% by mole) | Methyl | Ethyl | Acrylic | Acrylic acid |
| Methacrylamide | N,N-dimethylacrylamide | methacrylate | methacrylate | acid | sodium salt | ||
| Examples | ||||||
| 1 | 23 | 60 | 17 | |||
| 2 | 40 | 30 | 30 | |||
| 3 | 20 | 50 | 30 | |||
| 4 | 11 | 76 | 13 | |||
| 5 | 20 | 30 | 50 | |||
| 6 | 35 | 15 | 50 | |||
| 7 | 45 | 15 | 40 | |||
| Comp. | ||||||
| Examples | ||||||
| 1 | 50 | 30 | 20 | |||
| 2 | 50 | 30 | 20 | |||
| 3 | 80 | 8 | 12 | |||
| TABLE 3 | ||
| Evaluation results | ||
| HT developing | Developing properties | |||
| properties | Tack | for exhausted developer | ||
| Examples | 1 | A | A | A |
| 2 | A | A | A | |
| 3 | A | A | A | |
| 4 | A | A-B | A-B | |
| 5 | A-B | A | A-B | |
| 6 | A-B | A | A | |
| 7 | A-B | A | A | |
| Comp. | 1 | B | A | E |
| Examples | 2 | E | A | A-B |
| 3 | E | A | A-B | |
Claims (19)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11-317405 | 1999-08-11 | ||
| JP31740599A JP4361651B2 (en) | 1999-11-08 | 1999-11-08 | Photosensitive printing plate and method for producing the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US6461784B1 true US6461784B1 (en) | 2002-10-08 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US09/708,888 Expired - Fee Related US6461784B1 (en) | 1999-08-11 | 2000-11-08 | Photosensitive printing plate having mat particles formed on the photosensitive layer and method of producing the same |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6461784B1 (en) |
| EP (1) | EP1098224B1 (en) |
| JP (1) | JP4361651B2 (en) |
| DE (1) | DE60033907T2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6767693B1 (en) | 2002-07-30 | 2004-07-27 | Advanced Micro Devices, Inc. | Materials and methods for sub-lithographic patterning of contact, via, and trench structures in integrated circuit devices |
| US6884735B1 (en) * | 2002-08-21 | 2005-04-26 | Advanced Micro Devices, Inc. | Materials and methods for sublithographic patterning of gate structures in integrated circuit devices |
| US20180299774A1 (en) * | 2017-04-17 | 2018-10-18 | Shin-Etsu Chemical Co., Ltd. | Positive resist film laminate and pattern forming process |
Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51111102A (en) | 1975-03-24 | 1976-10-01 | Fuji Photo Film Co Ltd | Photosensitive printing plates |
| JPS5512974A (en) | 1978-07-15 | 1980-01-29 | Konishiroku Photo Ind Co Ltd | Photosensitive printing plate |
| US4216289A (en) * | 1975-02-19 | 1980-08-05 | Fuji Photo Film Co., Ltd. | Process for the production of printing plates |
| JPS5734558A (en) | 1980-08-11 | 1982-02-24 | Fuji Photo Film Co Ltd | Photosensitive printing plate |
| JPS5758152A (en) | 1980-09-25 | 1982-04-07 | Fuji Photo Film Co Ltd | Photosensitive printing plate |
| JPS58182636A (en) | 1982-04-20 | 1983-10-25 | Fuji Photo Film Co Ltd | Photosensitive printing plate |
| EP0154981A2 (en) | 1984-03-12 | 1985-09-18 | Fuji Photo Film Co., Ltd. | Process for producing light-sensitive lithographic plate requiring no dampening solution |
| US4557997A (en) | 1981-06-23 | 1985-12-10 | Fuji Photo Film Co., Ltd. | Photo-polymerizable process of image formation using unsaturated materials and silver halide |
| US5576137A (en) | 1993-10-18 | 1996-11-19 | Agfa-Gevaert Ag | Matted, radiation-sensitive recording material and printing plate |
| US5595862A (en) * | 1995-02-01 | 1997-01-21 | Eastman Kodak Company | Photographic elements containing matte particles of bimodal size distribution |
| US5747220A (en) * | 1995-04-11 | 1998-05-05 | Mitsubishi Chemical Corporation | Light sensitive planographic printing plate having particular deposited particles and process for producing the same |
| US5916741A (en) | 1997-08-26 | 1999-06-29 | Eastman Kodak Company | Photographic elements containing elastomeric matting agent |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04145437A (en) * | 1990-10-08 | 1992-05-19 | Konica Corp | Production of waterless planograph |
-
1999
- 1999-11-08 JP JP31740599A patent/JP4361651B2/en not_active Expired - Fee Related
-
2000
- 2000-11-06 DE DE60033907T patent/DE60033907T2/en not_active Expired - Fee Related
- 2000-11-06 EP EP00309861A patent/EP1098224B1/en not_active Expired - Lifetime
- 2000-11-08 US US09/708,888 patent/US6461784B1/en not_active Expired - Fee Related
Patent Citations (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4216289A (en) * | 1975-02-19 | 1980-08-05 | Fuji Photo Film Co., Ltd. | Process for the production of printing plates |
| US4288526A (en) * | 1975-02-19 | 1981-09-08 | Fuji Photo Film Co., Ltd. | Light-sensitive printing plates with discontinuous over-coating |
| JPS51111102A (en) | 1975-03-24 | 1976-10-01 | Fuji Photo Film Co Ltd | Photosensitive printing plates |
| JPS5512974A (en) | 1978-07-15 | 1980-01-29 | Konishiroku Photo Ind Co Ltd | Photosensitive printing plate |
| US5028512A (en) | 1978-07-15 | 1991-07-02 | Konica Corporation And Mitsubishi Kasei Corporation | Method of manufacturing photosensitive printing plates comprising applying a powdered surface |
| US4626484A (en) | 1980-08-11 | 1986-12-02 | Fuji Photo Film Co., Ltd. | Light-sensitive printing plate precursor |
| JPS5734558A (en) | 1980-08-11 | 1982-02-24 | Fuji Photo Film Co Ltd | Photosensitive printing plate |
| JPS5758152A (en) | 1980-09-25 | 1982-04-07 | Fuji Photo Film Co Ltd | Photosensitive printing plate |
| US4557997A (en) | 1981-06-23 | 1985-12-10 | Fuji Photo Film Co., Ltd. | Photo-polymerizable process of image formation using unsaturated materials and silver halide |
| JPS58182636A (en) | 1982-04-20 | 1983-10-25 | Fuji Photo Film Co Ltd | Photosensitive printing plate |
| EP0154981A2 (en) | 1984-03-12 | 1985-09-18 | Fuji Photo Film Co., Ltd. | Process for producing light-sensitive lithographic plate requiring no dampening solution |
| US5576137A (en) | 1993-10-18 | 1996-11-19 | Agfa-Gevaert Ag | Matted, radiation-sensitive recording material and printing plate |
| US5595862A (en) * | 1995-02-01 | 1997-01-21 | Eastman Kodak Company | Photographic elements containing matte particles of bimodal size distribution |
| US5747220A (en) * | 1995-04-11 | 1998-05-05 | Mitsubishi Chemical Corporation | Light sensitive planographic printing plate having particular deposited particles and process for producing the same |
| US5916741A (en) | 1997-08-26 | 1999-06-29 | Eastman Kodak Company | Photographic elements containing elastomeric matting agent |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6767693B1 (en) | 2002-07-30 | 2004-07-27 | Advanced Micro Devices, Inc. | Materials and methods for sub-lithographic patterning of contact, via, and trench structures in integrated circuit devices |
| US6884735B1 (en) * | 2002-08-21 | 2005-04-26 | Advanced Micro Devices, Inc. | Materials and methods for sublithographic patterning of gate structures in integrated circuit devices |
| US20180299774A1 (en) * | 2017-04-17 | 2018-10-18 | Shin-Etsu Chemical Co., Ltd. | Positive resist film laminate and pattern forming process |
| CN108732868A (en) * | 2017-04-17 | 2018-11-02 | 信越化学工业株式会社 | Positive-workingresist film laminate and pattern forming method |
| US10719015B2 (en) * | 2017-04-17 | 2020-07-21 | Shin-Etsu Chemical Co., Ltd. | Positive resist film laminate and pattern forming process |
| CN108732868B (en) * | 2017-04-17 | 2022-12-13 | 信越化学工业株式会社 | Positive resist film laminate and pattern forming method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2001133985A (en) | 2001-05-18 |
| DE60033907T2 (en) | 2007-11-22 |
| EP1098224B1 (en) | 2007-03-14 |
| DE60033907D1 (en) | 2007-04-26 |
| EP1098224A1 (en) | 2001-05-09 |
| JP4361651B2 (en) | 2009-11-11 |
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