US5262246A - Material for use in spacecraft parts - Google Patents

Material for use in spacecraft parts Download PDF

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Publication number
US5262246A
US5262246A US07/633,236 US63323690A US5262246A US 5262246 A US5262246 A US 5262246A US 63323690 A US63323690 A US 63323690A US 5262246 A US5262246 A US 5262246A
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United States
Prior art keywords
parts
protective layer
thickness
spacecraft
solvent
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Expired - Fee Related
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US07/633,236
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English (en)
Inventor
Takao Nishikawa
Katsumi Sonoda
Yoshiko Aiba
Hiroshi Adachi
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Mitsubishi Electric Corp
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Mitsubishi Electric Corp
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Priority claimed from JP1337931A external-priority patent/JPH0490341A/ja
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Assigned to MITSUBISHI DENKI KABUSHIKI KAISHA, A CORP. OF JAPAN reassignment MITSUBISHI DENKI KABUSHIKI KAISHA, A CORP. OF JAPAN ASSIGNMENT OF ASSIGNORS INTEREST. Assignors: ADACHI, HIROSHI, AIBA, YOSHIKO, NISHIKAWA, TAKAO, SONODA, KATSUMI
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D143/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium, or a metal; Coating compositions based on derivatives of such polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers
    • Y10T428/31931—Polyene monomer-containing

Definitions

  • This invention relates to material for use in spacecraft parts which averts degradation of the surfaces caused by oxygen interaction.
  • An object of the present invention is to solve the problems mentioned above by providing material having resistance to atomic oxygen for use in spacecraft parts such as wires and panels having resistance to atomic oxygen, which averts degradation of the surfaces of the spacecraft parts even if it is exposed to the oxygen atom in space for a long time (for several decades).
  • the material pertaining to this invention is made of a compound that contains the group IV b elements, and a shield layer (resin layer) which covers at least a portion of the above mentioned) material is applied, as a structuring material of the spacecraft of which resistance of atomic oxygen was absolutely necessary.
  • a shield layer resin layer which covers at least a portion of the above mentioned
  • the materials for the spacecraft pertaining to the present invention avert degradation of the surfaces of the spacecraft by using the resin layer containing the group IV b elements provided on the materials constructing a conventional spacecraft.
  • This resin layer characteristically extremely smooth, oxidizes its surface and produce the shield layer to fend off the oxygen atoms, when exposed to the atomic oxygen.
  • This shield layer prevents a further degradation caused by the oxygen interaction and therefore deters a severe loss of the surface layer.
  • FIG. 1 shows a cutaway view of an embodiment of the present invention.
  • FIG. 2 shows the result of thickness measurement of a silicon polymer layer before and after the exposure thereof to oxygen atoms.
  • FIG. 3 shows a cutaway view of a solar battery for which this invention is used. It also shows an on-board solar battery paddle and the structure of the solar battery.
  • FIG. 4 shows cutaway views of other parts for which this invention is used.
  • a ladder silicon polymer layer can be specified, which is expressed as shown in Denki Kagaku, Vol. 51, No. 7 (1983), pp. 554 to 559, by the following general formula I: ##STR1## where R1, R2 are appropriately constructed hydrocarbon radicals where n is a positive integer (n being 100 or more)
  • a substitutional resin layer that contains substituted para-methoxy of polystyrene one of the group IV b elements expressed as shown in RECUEIL 79 1076 (1960) by the following general formula II: ##STR2## where M is one of the group IV b elements, such as Si, Ge, Sn, Pb where n is a positive integer (n being 60 or more).
  • substitutional resin layer either a resin containing a single element or a copolymer resin containing at least two kinds of elements can be used.
  • FIG. 1A shows material used in the plane surface.
  • FIG. 1B shows material used in the curved surface.
  • numeral (1) indicates material used in the structural part of spacecraft.
  • FRP Fiber Reinforced Plastic
  • CFRP Carbon Fiber Reinforced Plastic
  • Numeral (2) indicates a resin layer (a shield layer) which contains the group IV b elements that tolerates oxygen atoms.
  • the surface of the structural part (1) of the spacecraft made of the traditional materials is covered with the above mentioned layer containing the polymer having a thickness of 0.1 ⁇ 100 ⁇ m.
  • the material for use in the spacecraft parts pertaining to this invention is made of the resin layer containing the IV b element having the resistance to atomic oxygen for preventing the degradation even when it is exposed to the oxygen atom.
  • This resin layer is provided on the conventional material, so that the surface of the structure is prevented from the deterioration caused by the oxygen atom. Consequently, the structure made of the material of the present invention can be used for a long time (from several months to several decades or more) in the environment exposed to the oxygen atom, which was impossible in the past.
  • FIG. 2 An embodiment of the present invention will be explained further in detail hereinafter referring to FIG. 2.
  • the application of the present invention is not limited to this embodiment.
  • a silicon polymer is expressed by the following formula for average molecular weight 100,000, where ph is a phenyl radical. ##STR3## The silicon polymer is dissolved in an anisole solvent to produce a solution of 26% concentration. Then, a panel (4) made of CFRP is coated with this solvent and baked in nitrogen atmosphere, with the temperature of 150° C., for 30 minutes to produce a silicon polymer layer (3) with the thickness of approximately 11 ⁇ m.
  • a sample material thus coated with the silicon polymer layer (3) which has a smooth surface obtained in the manner illustrated above, is then exposed to the oxygen atoms by using an oxygen atomic exposure device.
  • a flux of the oxygen atoms irradiated with RF output of 100 w, a vacuum degree of 0.4 torr, and the amount of the oxygen gas flow of 75SCCM is performed under the same conditions of 10 14 ⁇ 10 15 atoms/cm as in the Space Shuttle flight test.
  • FIG. 2A and FIG. 2B show the result of the thickness measurement of the silicon polymer layer before and after the exposure.
  • the measurement of the thickness of the layer is performed by measuring the difference between the level of the silicon polymer layer (30) and that of an opening (5) formed by removing a portion of the silicon polymer layer (3) until the surface of the panel (4) becomes bare.
  • the result of the measurement as shown in FIG. 2A and FIG. 2B, demonstrates little change in the thickness of the silicon polymer layer (3) before and after the exposure, and after further exposure, little change in the thickness is shown either.
  • the panel (4) made of CFRP is then coated with this solvent, using a spinner.
  • the coated panel (4) is then baked for 30 minutes in the nitrogen atmosphere, with the temperature of 120° C., to produce a polymer layer (3) containing Ge, with the thickness of approximately 10 ⁇ m.
  • the sample created in the manner described above is then exposed to the oxygen atoms for approximately one hour under the same condition as in the experiment 1. Approximately 1% loss in the thickness of the polymer layer is demonstrated by the thickness measurement before and after the exposure. Further exposure, does not show a further loss in thickness of the layer.
  • the panel (4) made of CFRP is then coated with this solvent, using the spinner.
  • the panel (4) thus coated is then baked for 30 minutes in the nitrogen atmosphere, with the temperature of 100° C., to produce a polymer layer (3) which contains Sn, with the thickness of approximately 10.5 ⁇ m.
  • the sample created in the manner illustrated above was then exposed to the oxygen atoms for approximately one hour under the same condition as in the experiment 1. Approximately 1% loss in the thickness measurement before and is demonstrated by the thickness measurement before and after the exposure. A prolonged exposure does not show a further loss in the thickness of the layer.
  • FIG. 3A shows a cutaway view of a solar battery and FIG. 3B shows structural drawings of an on-board solar battery paddle of a solar battery.
  • numeral (31) indicates solar battery cells;
  • numeral (32) indicates a cover glass that covers exterior of the solar battery cells (31);
  • numeral (33) indicates an adhesive agent which joins the solar battery cells (31) to the cover glass (32);
  • numeral (34) indicates an interconnector which joins each solar battery cell.
  • a plurality of the solar battery cells (31) are adhered to the solar battery panel (35) by an adhesive agent (36) in a connected state, so as to construct a solar battery paddle (39).
  • the make-up of the solar battery panel (35) is as follows: a construction material (37a) made of a traditional panel material intolerant of oxygen interaction, i.e., CFRP and the like, is coated with an insulating film (37b) to produce a laminate. This laminate is then coated with an insulating layer (38) made of a silicon resin layer which tolerates the oxygen interaction.
  • the solar battery panel is constructed by coating the surface of a laminate made of both a traditional material (37a) used for the panel and the insulating film (37b) with the silicon polymer layer (38) shown in the general formula (1) illustrated above deposited thereover.
  • the thickness of the silicon polymer is 0.1 to 100 ⁇ m.
  • This solar battery panel (35) by having material that constitutes the panel coated with the silicon resin layer (38) which tolerates the oxygen interaction, is prevented from the degradation of the surface after a direct exposure to the oxygen atoms in the orbit atmosphere, the solar battery panel, actualizing the prolonged use (several months to several decades or more) thereof in the environment exposed to the oxygen atoms.
  • the silicon polymer which has the average molecular weight of 100,000 as described in the embodiment 1 and expressed by the general formula (III): ##STR4## where Ph is a phenyl radical and n is a positive integer, is dissolved in an anisole solvent to produce a solution of 26% concentration. Then, with this solvent, the laminate placed on the solar battery panel (35) made of the material (37a) used in the structural part made of the CFRP and the insulating film (37b) are coated. This laminate coated with the solvent described above is then baked in the nitrogen atmosphere with the temperature of 150° C. for 30 minutes and then is dried to produce an insulating layer (38) of the silicon polymer, with thickness of approximately 11 ⁇ m.
  • the oxygen atoms flux used for the exposure was performed so as to simulate the condition used in the actual Space Shuttle flight test, that is 10 14 to 10 15 atoms/cm. sec.
  • the solar battery panel constructed with conventional material coated with the insulating layer made of the silicon resinous compound averts the degradation of the surfaces caused by the oxygen atom and therefore is suitable for a direct exposure to and the prolonged use in the atomic oxygen environment of the orbit.
  • FIG. 4A and FIG. 4B show cutaway views of the other application of the invention.
  • numeral (41) indicates solar battery cells placed on the exposed part of the spacecraft.
  • Numeral (42) indicates exposed wires used in the interconnecting part that joins the solar battery cells (41).
  • Numeral (43) indicates a resin layer which contains silicon (Si) or gerumanium (Ge), tin (Sn), and other group IV b elements that characteristically fend off the oxygen atoms.
  • the surfaces of the exposed wires (42) are coated with this resin layer which has the thickness of 0.1 to 100 ⁇ m.
  • a resin layer a shield layer; a insulating layer and a polymer layer, etc.
  • a layer can be a layer-like or a film-like, or even a spotlike.
  • the thickness of the layer can be uneven or wave-like.
  • coating of the material can be so performed as to cover only a part of the surface, instead of the whole surface.
  • the present invention materializes the materials that evert the degradation caused by the oxygen interaction.
  • the application of this invention to the traditional construction materials used in the spacecraft parts enables these materials for the prolonged use (from several months to several decades) in the oxygen environment of the orbit.

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Laminated Bodies (AREA)
US07/633,236 1989-12-26 1990-12-21 Material for use in spacecraft parts Expired - Fee Related US5262246A (en)

Applications Claiming Priority (2)

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JP1337931A JPH0490341A (ja) 1989-09-22 1989-12-26 宇宙用材料
JP1-337931 1989-12-26

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2550725A (en) * 1945-09-15 1951-05-01 Bell & Gossett Co Conduit construction
US5888846A (en) * 1997-05-29 1999-03-30 Kabushiki Kaisha Kobe Seiko Sho Method for microfabricating diamond
US6632542B1 (en) * 2000-05-11 2003-10-14 Sandia Corporation Solar selective absorption coatings
US20130144025A1 (en) * 2010-08-18 2013-06-06 Korea Institute Of Science And Technology Method for preparing a polysilsesquioxane of a controlled structure and polysilsesquioxane prepared by the same

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3294717A (en) * 1963-12-23 1966-12-27 Gen Electric Process and composition for producing organopolysiloxanes
US4292419A (en) * 1979-05-15 1981-09-29 Mitsubishi Rayon Co., Ltd. Process for producing radiation-shielding plastic materials
US4397994A (en) * 1980-09-20 1983-08-09 Japan Synthetic Rubber Co., Ltd. High vinyl polybutadiene or styrene-butadiene copolymer
EP0241158A2 (en) * 1986-03-22 1987-10-14 Nippon Telegraph And Telephone Corporation Thermal control coating composition
US4746693A (en) * 1986-12-12 1988-05-24 Rca Corporation Polyalkylsilsesquioxane coating composition
US4980206A (en) * 1986-09-15 1990-12-25 The Boeing Company Method for improving atomic oxygen resistance
EP0417778A1 (en) * 1989-09-15 1991-03-20 E.I. Du Pont De Nemours And Company Polyimide compositions containing polyorganosiloxane for improving atomic oxygen resistance
US5021585A (en) * 1989-06-14 1991-06-04 Hughes Aircraft Company Aromatic polyimide silanol compounds, precursors and polymers thereof
US5039771A (en) * 1988-10-17 1991-08-13 Shin-Etsu Chemical Co., Ltd. Method for the preparation of a ladder-type organopolysiloxane

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3294717A (en) * 1963-12-23 1966-12-27 Gen Electric Process and composition for producing organopolysiloxanes
US4292419A (en) * 1979-05-15 1981-09-29 Mitsubishi Rayon Co., Ltd. Process for producing radiation-shielding plastic materials
US4397994A (en) * 1980-09-20 1983-08-09 Japan Synthetic Rubber Co., Ltd. High vinyl polybutadiene or styrene-butadiene copolymer
EP0241158A2 (en) * 1986-03-22 1987-10-14 Nippon Telegraph And Telephone Corporation Thermal control coating composition
US4980206A (en) * 1986-09-15 1990-12-25 The Boeing Company Method for improving atomic oxygen resistance
US4746693A (en) * 1986-12-12 1988-05-24 Rca Corporation Polyalkylsilsesquioxane coating composition
US5039771A (en) * 1988-10-17 1991-08-13 Shin-Etsu Chemical Co., Ltd. Method for the preparation of a ladder-type organopolysiloxane
US5021585A (en) * 1989-06-14 1991-06-04 Hughes Aircraft Company Aromatic polyimide silanol compounds, precursors and polymers thereof
EP0417778A1 (en) * 1989-09-15 1991-03-20 E.I. Du Pont De Nemours And Company Polyimide compositions containing polyorganosiloxane for improving atomic oxygen resistance
US5073607A (en) * 1989-09-15 1991-12-17 E. I. Du Pont De Nemours And Company Polyimide compositions containing polyorganosiloxane for improving atomic oxygen resistance

Non-Patent Citations (6)

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Title
Chemical Abstracts, vol. 104, No. 16, De Rody, A. "The degradation of metal surfaces by atomic oxygen", p. 271, (1986).
Chemical Abstracts, vol. 104, No. 16, De Rody, A. The degradation of metal surfaces by atomic oxygen , p. 271, (1986). *
Leger et al, "A Consideration of Atomic Oxygen Interactions . . . ", J. Spacecraft and Rockets, vol. 23, No. 5 (1986), pp. 505-511.
Leger et al, A Consideration of Atomic Oxygen Interactions . . . , J. Spacecraft and Rockets, vol. 23, No. 5 (1986), pp. 505 511. *
Visentine et al, "STS Atomic Oxygen Effects Experiment", AIAA 23rd Aerospace Sciences Meeting, paper 85-0415 (1985).
Visentine et al, STS Atomic Oxygen Effects Experiment , AIAA 23rd Aerospace Sciences Meeting, paper 85 0415 (1985). *

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2550725A (en) * 1945-09-15 1951-05-01 Bell & Gossett Co Conduit construction
US5888846A (en) * 1997-05-29 1999-03-30 Kabushiki Kaisha Kobe Seiko Sho Method for microfabricating diamond
US6632542B1 (en) * 2000-05-11 2003-10-14 Sandia Corporation Solar selective absorption coatings
US20130144025A1 (en) * 2010-08-18 2013-06-06 Korea Institute Of Science And Technology Method for preparing a polysilsesquioxane of a controlled structure and polysilsesquioxane prepared by the same
US8927673B2 (en) * 2010-08-18 2015-01-06 Korea Institute Of Science And Technology Method for preparing a polysilsesquioxane of a controlled structure and polysilsesquioxane prepared by the same

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FR2659343A1 (fr) 1991-09-13
FR2659343B1 (pt) 1994-08-19

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