US4642207A - Process for producing ultrafine particles of ceramics - Google Patents
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- US4642207A US4642207A US06/616,686 US61668684A US4642207A US 4642207 A US4642207 A US 4642207A US 61668684 A US61668684 A US 61668684A US 4642207 A US4642207 A US 4642207A
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- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- C01B32/914—Carbides of single elements
- C01B32/956—Silicon carbide
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- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
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- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/14—Methods for preparing oxides or hydroxides in general
- C01B13/32—Methods for preparing oxides or hydroxides in general by oxidation or hydrolysis of elements or compounds in the liquid or solid state or in non-aqueous solution, e.g. sol-gel process
- C01B13/326—Methods for preparing oxides or hydroxides in general by oxidation or hydrolysis of elements or compounds in the liquid or solid state or in non-aqueous solution, e.g. sol-gel process of elements or compounds in the liquid state
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- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
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- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/072—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with aluminium
- C01B21/0722—Preparation by direct nitridation of aluminium
- C01B21/0724—Preparation by direct nitridation of aluminium using a plasma
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- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/076—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with titanium or zirconium or hafnium
- C01B21/0761—Preparation by direct nitridation of titanium, zirconium or hafnium
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- C01B32/90—Carbides
- C01B32/914—Carbides of single elements
- C01B32/956—Silicon carbide
- C01B32/963—Preparation from compounds containing silicon
- C01B32/97—Preparation from SiO or SiO2
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- C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
- C01F11/00—Compounds of calcium, strontium, or barium
- C01F11/02—Oxides or hydroxides
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- C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
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- C01P2004/04—Particle morphology depicted by an image obtained by TEM, STEM, STM or AFM
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- C01P2004/00—Particle morphology
- C01P2004/20—Particle morphology extending in two dimensions, e.g. plate-like
- C01P2004/22—Particle morphology extending in two dimensions, e.g. plate-like with a polygonal circumferential shape
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- C01P2004/32—Spheres
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- C01P2004/54—Particles characterised by their aspect ratio, i.e. the ratio of sizes in the longest to the shortest dimension
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- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
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- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
Definitions
- This invention relates to a process for producing ultrafine particles of a ceramic, particularly those having a size of less than 1 micrometer.
- the "ceramic”, as used herein, denotes an oxide, nitride or carbide of a metal or a mixture thereof.
- Ceramics generally have excellent heat resistance, corrosion resistance and abrasion resistance, and exhibit unique electrical or optical properties. Because of these properties, they have had extensive use as heat-resistant, corrosion-resistant or abrasion-resistant materials or as optical or electronic materials.
- Ceramic materials generally pose difficulties in sintering. When these materials are converted to ultrafine particles, however, this defect is removed or can be ignored. Hence, the ceramics in the form of ultrafine particles can exhibit their function in a wider range of applications.
- a vapor-phase reaction method which comprises oxidizing, nitriding or carbiding a vapor of a metal chloride or a metal hydride.
- the vapor-phase reaction method has some defects. Among these are:
- a mixture of different kinds of ceramics in ultrafine particles (for example, a mixture of an oxide ceramic and a carbide ceramic in ultrafine particles) cannot be produced.
- a process for producing ultrafine particles of a ceramic which comprises heating a ceramic having substantially the same components as the final ultrafine ceramic particles or a mixture of said ceramic with a metal constituting the metal component of the final ultrafine ceramic particles or carbon by an arc plasma or a high frequency induction plasma generated in hydrogen, nitrogen, oxygen, a gaseous mixture of hydrogen and nitrogen, or a gaseous mixture of nitrogen and oxygen.
- This invention also provides a process for producing ultrafine particles of a ceramic, which comprises heating a metal constituting the metal component of the final ultrafine ceramic particles or a mixture of said metal with carbon by an arc plasma or a high frequency induction plasma generated in nitrogen, hydrogen, oxygen, a gaseous mixture of nitrogen and hydrogen, or a gaseous mixture of nitrogen and oxygen.
- an inert gas selected from argon, helium and neon may be added to the gas or the gaseous mixture.
- the mechanism of formation of the ultrafine particles in the process of this invention is not clear, but may be roughly theorized as follows: At a high temperature (more than about 10000 K.) generated by the arc plasma or the high frequency induction plasma, most of a molecular gas consisting of two atoms, such as hydrogen, nitrogen or oxygen, dissociates and exists in the state of atoms or ions. These atoms or ions are in the activated state with a much higher energy than ordinary molecular gases. Accordingly, when these activated gases are contacted with a ceramic or metal, a very active reaction occurs, and in the course of this reaction, the corresponding ultrafine ceramic particles will be formed.
- Oxide-type ceramics produced conveniently by the process of this invention are oxides of Ca, Mg, Zn, Al, Si, Ti, Zr, Sn, Pb, V, Nb, Cr, Mo, W and Cu.
- the oxides of Ca, Mg, Zr, Cr, Mo and W are particularly preferred.
- Nitride-type ceramics produced conveniently by the process of this invention are nitrides of B, Al, Si, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo and W.
- the nitrides of Al, Ti, Zr and Hf are particularly preferred.
- Carbide-type ceramics produced conveniently by the process of this invention are carbides of B, Si, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo and W.
- the carbides of Si, Ti, Hf and W are particularly preferred.
- a ceramic having substantially the same components as the final ultrafine ceramic particles, a metal which is a component of the final ultrafine ceramic particles, or a mixture of such a ceramic and metal are used as a starting material.
- carbon may further be added to the aforesaid starting material.
- ultrafine particles of an oxide ceramic When ultrafine particles of an oxide ceramic are to be produced by using an oxide ceramic or a mixture of an oxide ceramic and a metal as a starting material, hydrogen, nitrogen, oxygen or a mixture of oxygen and nitrogen may be used as an atmosphere in which such a starting material is heated by an arc plasma or a high frequency induction plasma.
- oxygen or a mixture of nitrogen and oxygen may be used as an atmosphere in which the starting material is heated by an arc plasma or a high frequency induction plasma.
- the above gas or gaseous mixture may be used after it is diluted with an inert gas such as argon, helium, or neon.
- the particle size of the ultrafine particles and the rate of formation of such ultrafine particles can be controlled by changing the degree of dilution.
- steam may be added to the hydrogen atmosphere in order to inhibit reduction of the ultrafine particles of the oxide ceramics obtained.
- ultrafine particles of a nitride ceramic are to be produced by using a nitride ceramic or a mixture of a nitride ceramic and a metal as a starting material
- hydrogen, nitrogen, or a mixture of hydrogen and nitrogen may be used as an atmosphere in which the starting material is heated by an arc plasma or a high frequency induction plasma.
- the use of hydrogen prevents the formation of the corresponding oxide and serves to retain the purity of the nitride ceramic. Furthermore, it increases the producing ability.
- nitrogen or a mixture of nitrogen and hydrogen is used as an atmosphere in which the starting material is heated by an arc plasma or a high frequency induction plasma.
- nitrogen alone is preferred. In either case, the above gas or gaseous mixture may be diluted with an inert gas such as argon, helium or neon.
- the pressure of the atmosphere in which the process of this invention is carried out may be one under which an arc plasma or a high frequency induction plasma can be generated stably and maintained. Usually, it is in the range of 760 torr (1 atmosphere) to about 50 torr.
- An ordinary arc melting furnace, plasma melting furnace and high-frequency induction plasma device may be used in carrying out the process of the invention.
- An especially useful device for the control of the particle size of the ultrafine ceramic particles or improvement of the capturing efficiency will be described with reference to the accompanying drawings in which:
- FIG. 1 is a schematic view of an arc melting device using a dc power supply
- FIG. 2 is a schematic view of an arc melting device which empoloys an ac power supply
- FIGS. 3 to 8 are electron microphotographs of ultrafine particles of ceramics obtained by the process of this invention, which respectively show ultrafine particles of a silicon carbide ceramic, an aluminum oxide ceramic, a zirconium oxide ceramic, a magnesium oxide ceramic, a tungsten oxide ceramic, and a titanium nitride ceramic; and
- FIG. 9 is a schematic view of a high frequency induction plasma device.
- one or a plurality of discharging electrodes 2 are provided at the upper portion of a closed container 1.
- a voltage is applied across the discharging electrodes 2 and a starting material 4 placed on a water-cooled copper hearth 5 by a dc power supply 11 to generate an arc 3.
- a given atmospheric gas is introduced from a gas introducing inlet 8 or 8', and the inside of the closed container 1 is maintained at a predetermined pressure.
- hydrogen, nitrogen or oxygen in the introduced atmospheric gas is activated, or the starting material is heated.
- the activated hydrogen, nitrogen or oxygen reacts with the heated starting material.
- the starting material is a mixture of a ceramic and a metal or carbon or a mixture of a metal and carbon
- the reaction of the ceramic with the metal or carbon occurs simultaneously.
- ultrafine particles of the ceramic are generated.
- the generated ultrafine particles of the ceramic are sucked from a suction port 6 together with the atmospheric gas introduced and carried to a cooler 7 where they are rapidly cooled. They are then transferred to a collector 9 and collected.
- the reference numeral 10 represents a suction pump.
- a ceramic having low electric conductivity such as an oxide ceramic
- it may be effectively heated by a plurality of electrodes. Heating by an ac arc using an ac current is also effective.
- a voltage is applied across a pair of discharging electrodes 2 provided in the upper portion of a vertical cylindrical closed container 1 by an ac power supply 12 to generate an arc 3 and thus heat a starting material 4.
- ac power supply 12 to generate an arc 3 and thus heat a starting material 4.
- FIG. 9 shows another example of a device for use in the practice of this invention.
- the reference numeral 2' represents a high frequency coil; 3', a high frequency induction plasma; and 11', a high-frequency power supply for generating a frequency of about 3-15 MHz.
- a starting material 4 is heated by the plasma 3', and the generated ultrafine ceramic particles are collected by a collector 9 via a cooler 7.
- Silicon carbide as a starting material was heated by a dc arc plasma (current 140 A; voltage 30-40 V) generated in an atmosphere of a mixture of 30% H 2 and 70% argon kept at a pressure of 760 torr in the same apparatus as shown in FIG. 1 to obtain ultrafine particles of silicon carbide.
- the starting silicon carbide was a lumpy product having a purity of more than 99%.
- ultrafine particles are those of silicon carbide.
- the ultrafine particles had a particle diameter of 0.02 to 0.5 micrometer, and were spherical or polygonal as shown in the electron microphotograph of FIG. 3.
- Aluminum oxide as a starting material was heated by an ac arc plasma (current 100 A; voltage 30-50 V) generated in an atmosphere of a mixture of 50% H 2 and 50% argon kept at a pressure of 760 torr in the same device as shown in FIG. 2 to obtain ultrafine particles of aluminum oxide.
- the starting aluminum oxide was a lumpy product having a purity of more than 99.9%.
- ultrafine particles were those of aluminum oxide.
- the ultrafine particles had a particle diameter of 0.01 to 0.1 micrometer, and were spherical as shown in the electron microphotograph of FIG. 4.
- Zirconium oxide as a starting material was heated by an ac arc plasma (current 180 A; voltage 30-50 V) generated in an atmosphere of a mixture of 50% H 2 and 50% argon kept at a pressure of 760 torr to obtain ultrafine particles of zirconium oxide.
- the starting zirconium oxide was a lumpy product having a purity of at least 99.9%.
- ultrafine particles are those of zirconium oxide.
- the ultrafine particles had a particle diameter of 0.02 to 0.2 micrometer, and were mainly spherical as shown in the electron microphotograph of FIG. 5.
- Magnesium oxide as a starting material was heated by an ac arc plasma (current 180 A; voltage 30-50 V) generated in an atmosphere of a mixture of 50% H 2 and 50% argon kept at a pressure of 760 torr to obtain ultrafine particles of magnesium oxide.
- the starting magnesium oxide was a lumpy product having a purity of more than 99.9%.
- the ultrafine particles had a particle diameter of 0.02 to 0.5 micrometer, and were polygonal and spherical as shown by the electron microphotograph of FIG. 6.
- a mixture of silicon oxide and metallic aluminum in a weight ratio of 3:2 was heated by a dc arc plasma (current 200 A; voltage 20-30 V) in an atmosphere of 100% N 2 kept at a pressure of 760 torr to obtain ultrafine particles of a mixture of silicon oxide and aluminum nitride.
- the starting silicon oxide was a powder having a purity of more than 99.9%
- the starting metallic aluminum was a powder (100 mesh) having a purity of more than 99.9%.
- the resulting ultrafine particles were those of a mixture of silicon oxide and aluminum nitride.
- silicon oxide was in the form of spherical particles having a particle diameter of 0.02 to 0.5 micrometer
- aluminum nitride was in the form of needle-like particles having a length of about 0.5 micrometer and a width of about 0.03 micrometer.
- a mixture of silicon oxide and carbon in a weight ratio of 1:2 was heated by a dc arc plasma (current 200 A; voltage 20-30 V) in an atmosphere of a mixture of 50% H 2 and 50% argon kept at a pressure of 760 torr to obtain ultrafine particles of a mixture of silicon oxide and silicon carbide.
- the starting silicon oxide was the same as that used in Example 5, and the starting carbon was a graphite powder. These materials had been mixed and pressed under 10 tons/cm 2 to form pellets before they were heated.
- the ultrafine particles are those of a mixture of silicon oxide and silicon carbide.
- silicon oxide was in the form of spherical particles having a particle diameter of 0.02 to 0.5 micrometer
- silicon carbide was in the form of polygonal or spherical particles having a particle diameter of 0.02 to 0.5 micrometer.
- the ultrafine particles were those of titanium nitride.
- the ultrafine particles had a particle diameter of 0.02 to 0.5 micrometer, and were in the form of cubic crystals having a NaCl type crystal form as shown by the electron microphotograph of FIG. 8.
- Metallic tungsten (purity more than 99%, a sintered body of powder) as a starting material was heated by a dc arc plasma (current 140 A; voltage 30-40 V) in an atmosphere of 100% O 2 at a pressure of 760 torr by using the same device as shown in FIG. 1.
- the ultrafine particles were those of tungsten oxide.
- the ultrafine particles had a particle diameter of 0.02 to 0.3 micrometer and were spherical or polygonal as shown by the electron microphotograph of FIG. 7.
- the process of this invention brings about excellent advantages. For example, it easily gives ultrafine particles of various ceramics, or ultrafine particles of a mixture of dissimilar ceramics without the formation of the corresponding chloride, ammonia, etc. which occur in the prior art. Accordingly, there is no need to take measures against corrosion inhibition of the manufacturing equipment. Furthermore, the process does not cause pollution, and can give the aforesaid products with a high efficiency.
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Abstract
Description
Claims (4)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP58-98786 | 1983-06-04 | ||
JP58098786A JPS59227765A (en) | 1983-06-04 | 1983-06-04 | Manufacture of ceramic super fine particle |
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US06/882,536 Division US4889665A (en) | 1983-06-04 | 1986-07-07 | Process for producing ultrafine particles of ceramics |
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Cited By (47)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4732369A (en) * | 1985-10-30 | 1988-03-22 | Hitachi, Ltd. | Arc apparatus for producing ultrafine particles |
US4764357A (en) * | 1987-03-09 | 1988-08-16 | Akzo America Inc. | Process for producing finely divided powdery metal oxide compositions |
EP0354896A2 (en) * | 1988-08-10 | 1990-02-14 | Veitscher Magnesitwerke-Actien-Gesellschaft | Magnesium oxide micropowder and its use |
US4960752A (en) * | 1989-02-27 | 1990-10-02 | Olin Corporation | Process to produce oriented high temperature superconductors |
US5128081A (en) * | 1989-12-05 | 1992-07-07 | Arch Development Corporation | Method of making nanocrystalline alpha alumina |
WO1993002787A1 (en) * | 1991-07-31 | 1993-02-18 | Tetronics Research & Development Co. Limited | Process for the production of ultra-fine powdered materials |
EP0615952A2 (en) * | 1993-03-16 | 1994-09-21 | Ykk Corporation | Composite ultrafine particles of aluminum nitride and rare earth nitride, method for production and sintered article thereof |
US5356120A (en) * | 1992-05-04 | 1994-10-18 | H. C. Starck, Gmbh And Co. Kg. | Device for producing finely-divided metal and ceramic powder |
DE4337336C1 (en) * | 1993-11-02 | 1994-12-15 | Starck H C Gmbh Co Kg | Finely divided metal, alloy and metal compound powders |
US5384306A (en) * | 1992-05-04 | 1995-01-24 | H. C. Starck Gmbh And Co. | Fine-particle oxide ceramic powders |
WO1995003907A1 (en) | 1993-07-27 | 1995-02-09 | Nanophase Technologies Corporation | Method and apparatus for making nanostructured materials |
US5389585A (en) * | 1992-05-04 | 1995-02-14 | H.C. Starck Gmbh And Co. | Fine non-oxide ceramic powders |
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JPS59227765A (en) | 1984-12-21 |
JPS6330062B2 (en) | 1988-06-16 |
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