US3887808A - Thermoimaging process utilizing a photochromic material containing a spiropyran, a polyhalogenated hydrocarbon, a thiol compound and a polyvinylcarbazole - Google Patents
Thermoimaging process utilizing a photochromic material containing a spiropyran, a polyhalogenated hydrocarbon, a thiol compound and a polyvinylcarbazole Download PDFInfo
- Publication number
- US3887808A US3887808A US372938A US37293873A US3887808A US 3887808 A US3887808 A US 3887808A US 372938 A US372938 A US 372938A US 37293873 A US37293873 A US 37293873A US 3887808 A US3887808 A US 3887808A
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- US
- United States
- Prior art keywords
- compound
- spiropyran
- exposure
- process according
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- 238000000034 method Methods 0.000 title claims abstract description 37
- 239000000463 material Substances 0.000 title claims abstract description 28
- -1 thiol compound Chemical class 0.000 title claims description 28
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 title claims description 17
- 150000002430 hydrocarbons Chemical class 0.000 title description 7
- 229930195733 hydrocarbon Natural products 0.000 title description 5
- 239000004215 Carbon black (E152) Substances 0.000 title description 4
- 150000001875 compounds Chemical class 0.000 claims abstract description 74
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical group C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 claims abstract description 15
- 238000010438 heat treatment Methods 0.000 claims abstract description 8
- 229920000642 polymer Polymers 0.000 claims abstract description 8
- 150000003839 salts Chemical class 0.000 claims abstract description 7
- 239000011872 intimate mixture Substances 0.000 claims abstract description 5
- HJUGFYREWKUQJT-UHFFFAOYSA-N tetrabromomethane Chemical compound BrC(Br)(Br)Br HJUGFYREWKUQJT-UHFFFAOYSA-N 0.000 claims description 26
- 230000005855 radiation Effects 0.000 claims description 19
- 125000003118 aryl group Chemical group 0.000 claims description 15
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 claims description 10
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 claims description 8
- 125000004442 acylamino group Chemical group 0.000 claims description 6
- 125000003368 amide group Chemical group 0.000 claims description 5
- 239000011230 binding agent Substances 0.000 claims description 5
- 238000007598 dipping method Methods 0.000 claims description 4
- 239000007788 liquid Substances 0.000 claims description 4
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical group ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 claims description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 3
- 229910017464 nitrogen compound Inorganic materials 0.000 claims description 2
- 150000002830 nitrogen compounds Chemical class 0.000 claims description 2
- CZTCZDFGLUDUQP-UHFFFAOYSA-N 1',3',3'-trimethylspiro[chromene-2,2'-indole] Chemical compound O1C2=CC=CC=C2C=CC21C(C)(C)C1=CC=CC=C1N2C CZTCZDFGLUDUQP-UHFFFAOYSA-N 0.000 claims 1
- 239000000203 mixture Substances 0.000 abstract description 31
- 150000003573 thiols Chemical group 0.000 abstract description 5
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 27
- 229920001577 copolymer Polymers 0.000 description 26
- OKJPEAGHQZHRQV-UHFFFAOYSA-N iodoform Chemical compound IC(I)I OKJPEAGHQZHRQV-UHFFFAOYSA-N 0.000 description 20
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 17
- 125000000217 alkyl group Chemical group 0.000 description 16
- 239000000243 solution Substances 0.000 description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- FZERHIULMFGESH-UHFFFAOYSA-N N-phenylacetamide Chemical compound CC(=O)NC1=CC=CC=C1 FZERHIULMFGESH-UHFFFAOYSA-N 0.000 description 10
- 238000002360 preparation method Methods 0.000 description 10
- 125000004122 cyclic group Chemical group 0.000 description 9
- 238000002844 melting Methods 0.000 description 9
- 230000008018 melting Effects 0.000 description 9
- HVYVMSPIJIWUNA-UHFFFAOYSA-N triphenylstibine Chemical compound C1=CC=CC=C1[Sb](C=1C=CC=CC=1)C1=CC=CC=C1 HVYVMSPIJIWUNA-UHFFFAOYSA-N 0.000 description 9
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 8
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 7
- 239000000460 chlorine Substances 0.000 description 7
- 239000001257 hydrogen Substances 0.000 description 7
- 229910052739 hydrogen Inorganic materials 0.000 description 7
- 150000003254 radicals Chemical class 0.000 description 7
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 6
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 6
- 241001061127 Thione Species 0.000 description 6
- 229910052794 bromium Inorganic materials 0.000 description 6
- 229910052801 chlorine Inorganic materials 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 5
- 229960001413 acetanilide Drugs 0.000 description 5
- 125000004429 atom Chemical group 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 229910052736 halogen Inorganic materials 0.000 description 5
- 150000002367 halogens Chemical group 0.000 description 5
- 239000004615 ingredient Substances 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 229920000139 polyethylene terephthalate Polymers 0.000 description 5
- 239000005020 polyethylene terephthalate Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 235000002639 sodium chloride Nutrition 0.000 description 5
- 230000006641 stabilisation Effects 0.000 description 5
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- 229910052740 iodine Inorganic materials 0.000 description 4
- 239000004417 polycarbonate Substances 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 230000001235 sensitizing effect Effects 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 238000011105 stabilization Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- 239000005864 Sulphur Substances 0.000 description 3
- 230000003213 activating effect Effects 0.000 description 3
- 125000005605 benzo group Chemical group 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 230000005670 electromagnetic radiation Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 229920000578 graft copolymer Polymers 0.000 description 3
- 125000000623 heterocyclic group Chemical group 0.000 description 3
- 239000011630 iodine Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 150000002894 organic compounds Chemical class 0.000 description 3
- 125000000962 organic group Chemical group 0.000 description 3
- 125000001477 organic nitrogen group Chemical group 0.000 description 3
- 239000013034 phenoxy resin Substances 0.000 description 3
- 229920006287 phenoxy resin Polymers 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 125000000547 substituted alkyl group Chemical group 0.000 description 3
- 125000003396 thiol group Chemical group [H]S* 0.000 description 3
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 2
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 2
- GJYCVCVHRSWLNY-UHFFFAOYSA-N 2-butylphenol Chemical compound CCCCC1=CC=CC=C1O GJYCVCVHRSWLNY-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical group [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- 125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 description 2
- 125000002252 acyl group Chemical group 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 125000003435 aroyl group Chemical group 0.000 description 2
- 125000004104 aryloxy group Chemical group 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- DIKBFYAXUHHXCS-UHFFFAOYSA-N bromoform Chemical compound BrC(Br)Br DIKBFYAXUHHXCS-UHFFFAOYSA-N 0.000 description 2
- 125000002837 carbocyclic group Chemical group 0.000 description 2
- 125000005521 carbonamide group Chemical group 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 125000004185 ester group Chemical group 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000007687 exposure technique Methods 0.000 description 2
- 229920001600 hydrophobic polymer Polymers 0.000 description 2
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 238000006068 polycondensation reaction Methods 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
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- 239000004645 polyester resin Substances 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 125000004309 pyranyl group Chemical group O1C(C=CC=C1)* 0.000 description 2
- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical class C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 2
- XSCHRSMBECNVNS-UHFFFAOYSA-N quinoxaline Chemical compound N1=CC=NC2=CC=CC=C21 XSCHRSMBECNVNS-UHFFFAOYSA-N 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 230000003678 scratch resistant effect Effects 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
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- VIJSPAIQWVPKQZ-BLECARSGSA-N (2s)-2-[[(2s)-2-[[(2s)-2-[[(2s)-2-[[(2s)-2-[[(2s)-2-acetamido-5-(diaminomethylideneamino)pentanoyl]amino]-4-methylpentanoyl]amino]-4,4-dimethylpentanoyl]amino]-4-methylpentanoyl]amino]propanoyl]amino]-5-(diaminomethylideneamino)pentanoic acid Chemical compound NC(=N)NCCC[C@@H](C(O)=O)NC(=O)[C@H](C)NC(=O)[C@H](CC(C)C)NC(=O)[C@H](CC(C)(C)C)NC(=O)[C@H](CC(C)C)NC(=O)[C@H](CCCNC(N)=N)NC(C)=O VIJSPAIQWVPKQZ-BLECARSGSA-N 0.000 description 1
- POJPQMDDRCILHJ-UHFFFAOYSA-N 1,1,1,2,2,2-hexabromoethane Chemical compound BrC(Br)(Br)C(Br)(Br)Br POJPQMDDRCILHJ-UHFFFAOYSA-N 0.000 description 1
- OGVPXEPSTZMAFF-UHFFFAOYSA-N 1,1,1,2,2-pentabromoethane Chemical compound BrC(Br)C(Br)(Br)Br OGVPXEPSTZMAFF-UHFFFAOYSA-N 0.000 description 1
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical compound C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 1
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- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
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- 125000002373 5 membered heterocyclic group Chemical group 0.000 description 1
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- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000003785 benzimidazolyl group Chemical group N1=C(NC2=C1C=CC=C2)* 0.000 description 1
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- 239000002244 precipitate Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- LVTJOONKWUXEFR-FZRMHRINSA-N protoneodioscin Natural products O(C[C@@H](CC[C@]1(O)[C@H](C)[C@@H]2[C@]3(C)[C@H]([C@H]4[C@@H]([C@]5(C)C(=CC4)C[C@@H](O[C@@H]4[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@@H](O)[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@H](CO)O4)CC5)CC3)C[C@@H]2O1)C)[C@H]1[C@H](O)[C@H](O)[C@H](O)[C@@H](CO)O1 LVTJOONKWUXEFR-FZRMHRINSA-N 0.000 description 1
- SMUQFGGVLNAIOZ-UHFFFAOYSA-N quinaldine Chemical group C1=CC=CC2=NC(C)=CC=C21 SMUQFGGVLNAIOZ-UHFFFAOYSA-N 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 229960002668 sodium chloride Drugs 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000012265 solid product Substances 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000003107 substituted aryl group Chemical group 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- YFDSDPIBEUFTMI-UHFFFAOYSA-N tribromoethanol Chemical compound OCC(Br)(Br)Br YFDSDPIBEUFTMI-UHFFFAOYSA-N 0.000 description 1
- 229950004616 tribromoethanol Drugs 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D493/00—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system
- C07D493/02—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system in which the condensed system contains two hetero rings
- C07D493/10—Spiro-condensed systems
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/30—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using chemical colour formers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/163—Radiation-chromic compound
Definitions
- PATENTS be a polymer containing N-vinylcarbazole units. aum .1 3.642.479 2 1972 Van Allen et al. 96/90 PC 15 Claims, 2 Drawing Figures THERMOIMAGING PROCESS UTILIZING A PHOTOCIIROMIC MATERIAL CONTAINING A SPIROPYRAN, A POLYIIALOGENATEI) HYDROCARBON, A THIOL COMPOUND AND A POLYVINYLCARBAZOLE
- This invention relates to thermographic recording.
- the Belgian Pat. No. 771,848 relates to a photographic process, wherein a recording material, containing an intimate mixture comprising 1. at least one spiropyran compound,
- At least one ultraviolet-sensitive compound capable of producing on exposure to ultra-violet radiation with the spiropyran compound a dye salt, and in working relationship with said mixture one or more compounds belonging to one of the following classes:
- Z represents sulphur or a single bond.
- A represents a single bond or a divalent hydrocarbon group.
- each of R, and R represents hydrogen or a lower alkyl radical
- each of Q. and O represents hydrogen or to gether represent the necessary atoms to cclose an adjacent carbocyclic nucleus including a substituted adjacent carhocyclic nucleus
- n 1 or 2
- inorganic compounds producing photoelectrons under the influence of activating electromagnetic radiation and having a basic or amphoteric character
- the United Kingdom Patent Application No. 40,349/71 being a modification of the United Kingdom Patent Application No. 4] ,749/70, which corresponds with the above-mentioned Belgian Pat. No. 771,848 relates to the use of an amide, acylamino or ureido compound in a photographic process operating with said spiropyran and ultraviolet-sensitive compound.
- the amido, acylamino, or ureido compound used in admixture with said spiropyran compound and ultraviolet-sensitive compound corresponds to the following general formula:
- R represents an organic group, e.g. of the type present in a carboxylic acid chloride, e.g. an alkyl group, an aryl group, or heterocyclic group including these groups in substituted form, or a NHR or group, in which each of R and R represents an alkyl group or an aryl group, e.g. a phenyl group including these groups in substituted form, and
- R represents hydrogen or an organic group as is di rectly linked to the NH; group of an organic amino compound, e.g. an alkyl group, an aryl group, or a heterocyclic group including these groups in substituted form.
- the recording material is exposed with infrared radiation and a minor amount of visible light while being in heat-conductive contact with an original containing infrared-absorbing image markings.
- the exposure is preferably reflectographical i.e. the in frared radiation is allowed to pass first through the recording material before it strikes the original.
- the infraredabsorbing image markings of the original are heated and the heat gener ated in these markings is transmitted by conduction to the recording layer.
- the infrared-absorbing image markings are. e.g.. printed characters the ink of which contains carbon black or a metallic compound.
- FIG. 1 and HO. 2 Two possible ways of effecting reflectographic exposure are illustrated in the accompanying FIG. 1 and HO. 2.
- a photosensitive material 1 comprising a photo-sensitive layer 2 applied to a support 3, which is capable of transmitting infrared radiation and visible light is placed between the infrared radiation source 4 and the original 5 bearing infra-red-absorbing indicia 6, during the exposure.
- the photosensitive layer 7 of the photosensitive material 12 is facing the infrared radiation source 8.
- the support 9 of the photosensitive layer 7 is in contact with the infrared-absorbing indicia 10 of the original 11.
- the support 9 of the photosensitive layer 7 is thin and heatconducting.
- the infrared exposure source emits infra-red radiation and a minor amount. e.g. up to percent of visible light.
- Spiropyran compounds suited for photothermographic image formation according to the present invention are spiropyrans containing at least one pyran ring having in the orthoand meta-position to the oxygen atom a condensed benzo. naphtho, or other higher aromatic polycyclic condensed ring system including these condensed rings or ring systems in substituted form, e.g. an anthraceno or a phenanthreno ring system as is present e.g. in a spirodibenzopyran, a spirodinaphthopyran, a spirobenzonaphthopyran. a 1.- 3.3-trimethylindolinobenzospiropyran. a 1.3.3- trimethyLindolinonaphthospiropyran or such spiropyrans containing condensed aromatic nuclei of the anthracene or phenanthrene type.
- the condensed benzo In said spiropyrans the pyran rings, the condensed benzo. the condensed higher aromatic rings as well as the l.3.3 trimeth vlindolino ring may be substituted.
- Suitable substituents therefor are, erg. hydrocarbon groups such as alkyl groups, e.g. lower alkyl groups such as methyl. substituted alkyl groups. e.g. substituted with halogen. or phenylsubstituted alkyl groups.
- alkylene ester groups e.g. -CH COOC H alkylene carboxyl groups e.g. CH COOH, carbonamide groups or substituted carbonamide groups e.g.
- halogen nitro, hydroxy. alkoxy. aryloxy or a substituent linking the carbon atoms in 3.3'-position in the spiropyran system together. e.g. a (CH-fl -chain wherein n is 2 or 3.
- Preferred spiropyran compounds are spirodinaphthopyrans and spirobenzonaphthopyrzins including such compounds wherein the naphthoand/or benzo ring(s) is (are) substituted.
- the pyrylium salt formed is separated by suction, washed with ethanol and thereupon brought into sus pension in 300 ml of ethanol.
- a l0 percent by weight aqueous solution of ammonium hydroxide is added with stirring until the mixture is definitely alcaline. During this operation the mixture becomes colourless.
- the obtained crystalline product is separated by suc tion, washed with water, and dried.
- the compound capable of producing a dye salt with a spiropyran on exposure to activating electromagnetic radiation, for use according to the present invention is preferably an organic polyhalogen compound, from which a halogen-containing radical can be separated photolytically.
- Compounds posssessing that property are within the scope of the following general formulazwherein:
- each of A, B, X. and Y is a halogen atom of the group of chlorine. bromine or iodine, or
- one of said symbols A, B. X, or Y represents an alkyl group, including a substituted alkyl group, e.g. a halogen-substituted alkyl group. a hydroxyalkyl group or an aralkyl group e.g. benzyl. an aryl group, a substituted aryl group. or a heterocyclic group e.g. a quinoxaline or quinaldine group or an aroyl group and the other symbols are chlorine. bromine or iodine, or wherein at least two of said symbols A, B, X or Y represent an aromatic acyl group e.g. benzoyl and the other symbols chlorine, bromine. or iodine.
- a substituted alkyl group e.g. a halogen-substituted alkyl group.
- a hydroxyalkyl group or an aralkyl group e.g. benzyl. an aryl group
- Suitable representatives falling within the scope of that general formula are organic halides such as carbon tetrabromide. bromoform. iodoform, hexachloroethane, hexabromoethane, pentabromoethane. l,l.2.2- tetrabromoethane, a.ma-tribromoacetophenone. and tribromoethanol.
- the recording materials used according to the pres ent invention containing a spirodiarylopyran compound and said thiol or thione compound in combina tion with poly-N-vinylcarbazole have a remarkably high sensitivity to white light and particularly to red light when spectrally sensitized with acetanilide or acetanilide derivatives.
- the amount of spectral sensitizing agent may vary within a wide range depending on the intensity of the effect desired.
- Preferred amounts of sensitizing agent are in the weight ratio range of 1:1 to 0.05:1 with respect to the spiropyran compound(s).
- Preferred thiol and thione compounds correspond to the following tautomeric structures:
- Z represents the necessary atoms to close a 5- or 6- membered heterocyclic nitrogen-containing ring or X represents oxygen, sulphur, selenium or the group in which R is hydrogen or an organic group, e. g. an alkyl group including a substituted alkyl group. preferably a C -C alkyl group'or an aryl group.
- ring system including such ring or ring system in .1 substituted form e.g. a benzothiazole, benzoselen- 0-5 azole, benzoxazole or benzimidazole ring.
- Z Particularly useful thiol and thione compounds are listed in the following table 3.
- N vinylcarbazole polymer or copolymer is preferably used as binding agent so that it is present in a large molar excess with respect to the spiropyran compound.
- the spiropyran compoundts) is (are) preferably used in admixture with a 5- to -fold amount by weight of photosensitive organic halogen compound such as Carbon tetrabromide.
- anti-foggants may be added to the photosensitive composition.
- Suitable antifoggants include triaryl compounds of group V ele merits, e.g. triphenylstibine and sterically hindered phenols, e.g. 2,6-di-terLbutyl-p-cresol and other reducing agents or compounds accepting atmospheric oxygen.
- Triphenylstibine and analogous compounds for the purpose of the present invention are described in the United Kingdom Pat. No. l,O7l,l04.
- Preferred amounts of anti-foggant agent such as triphenylstibine are within the weight ratio range of 1:100 to 10:100 with respect to photosensitive carbontetra bromide and/or iodoform.
- a dry photographic coating containing the above mentioned ingredients may be formed by dissolving the binding agenttsl in a suitable inert solvent that acts as dispersing or dissolving medium for the other ingredients and that is removed from the coating composition by evaporation so that a solid photographic recording layer is left on a properly chosen support.
- the supports may be of any kind encountered in silver halide photographic materials, e.g. paper and film supports.
- hydrophobic polymers are used preferably as binding agent. They shield the ingredients from a direct contact with the atmosphere and more especially from oxygen as much as possible.
- Particularly suitable binders for use in the present invention are hydrophobic polymers and copolymers containing, e.g. styrene, vinyl acetate, acrylonitrile, acrylate, methacrylate, Nw'inylcarbazole or butadiene units, hydrophobic cellulose derivatives, phenoxy resins or polycondensates of the polyester type, eg. polycarbonates.
- these polymers may be used in admixture for improvement of the mechanical strength or adhering power of the recording layer to its subbed or non-subbed support.
- subbing layers for photochromic layers containing a spiropyran compound are described in the Belgian Pat. No. 782,026.
- Said subbing layers applied to a polyester film support are made of a partially saponified copolymer of vinyl chloride and vinyl acetate and/or of a polymer or copolymer of acrylic or methacrylic acid esters of aliphatic or cycloaliphatic alcohols containing from 1 to 8 carbon atoms.
- polyester resin supports It has been established experimentally that the adherence of recording layers containing poly-N- vinylcarbazole or copolymers containing N- vinylcarbazole units to polyester resin supports can be markedly improved by using in admixture with the N- vinylcarbazole polymer or copolymer a polyester, a phenoxy resin or a phenol-formaldehyde resin.
- a preferably applied polyester resin is polyethylene isophthal ate.
- a preferred phenoxy resin is EPONOL 55-8-40 of Shell, the Netherlands.
- Suited phenolformaldehyde resins are: the polycondensatinn product of a mixture of p-cresol and phenol with formaldehyde (50:50), the polycondensation product of a mixture of ptert.butylphenol and phenol with formaldehyde, the polycondensation product of p-cresol and formaldehyde (used in excess) 2 xylenol-formaldehyde resin like RESlN R of Brit ish Resin Products. Great-Britain.
- the resins improving the adherence are preferably used in a percentage by weight calculated on the re cording layer of at least 3 percent.
- the infrared exposure of the recording materials used according to the present invention may proceed in any known thermographic copying apparatus of the reflectographic type.
- a suitable operating temperature is in the range of 90 to 150C.
- the recording materials are suited to produce coloured copies of image-wise infrared-absorbing originals, the colour of the dye-image being determined by the type of spiropyran compound used.
- the prints obtained may be stabilized by washing out the residual free radical generator with a suitable solvent or solvent mixture, e.g. a hydrocarbon liguid such as petroleum ether optionally mixed with acetone, or by simply evaporating the free radical generator by raising the temperature if the compound involved is sufficiently volatile.
- a suitable solvent or solvent mixture e.g. a hydrocarbon liguid such as petroleum ether optionally mixed with acetone
- carbon tetrabromide having a high photosensitivity or a mixture of carbon tetrabromide and iodoform is preferred as free radical generator.
- the stabilization proceeds with increased speed when the recording layer is first overall heated at about 80C in the absence of visible light for at least 5 sec. and then treated with a chlorinated solvent, e.g. perchloroethylene at room temperature (C) for at least l5 sec in order to extract the photosensitive polyhalogen compound.
- a chlorinated solvent e.g. perchloroethylene at room temperature (C) for at least l5 sec in order to extract the photosensitive polyhalogen compound.
- Stabilization may proceed very fast by dipping the exposed recording material in a heated organic liquid having a relatively high boiling point, preferably above 200C and not affecting the recording layer.
- the organic liquid is preferably heated in the range of 145 to 165C and the dipping time is e.g. 5 to 20 sec.
- Suitable liquids are mineral oil of aliphatic or naph' thenic nature e.g. motor oil and lSOPAR G (trade name).
- a post-treatment with a solvent, e.g. a chlorinated hydrocarbon solvent may be necessary to remove the residual oil film.
- a photosensitive composition consisting of:
- the photosensitive film obtained was exposed reflectographically in a 3M Thermofax copying machine (Model 47) in contact with an opaque original being a black printed text on white paper. A dense blue positive image of the original was obtained.
- the copy as such was not stable to light and had to be stabilized by heating at 170C.
- EXAMPLE 2 A same photosensitive composition as in example 1 was used, with the difference, however, that 0.06 g of compound having the following formula:
- thermographic exposure step as in example l was executed.
- a photosensitive composition consisting of:
- a photosensitive composition consisting of:
- a photosensitive composition consisting of:
- Reflectographic exposure proceeded according to the arrangement of FIG. 1 in a 3M Thermofax photo copier. model secretary, set at the lowest transport speed and yielded a very dense positive reproduction of the original.
- a photosensitive composition consisting of:
- Example 2 The material obtained was exposed and processed as described in Example 1. A deep blue image in a very good adhering scratch-resistant recording layer was obtained.
- a photosensitive composition consisting of:
- the stabilization of the image proceeded according to one embodiment by heating the recording layer whilst pressing it for 10 sec. in contact with a metal rol ler heated at C. Subsequently, the recording material was dipped for 15 sec at room temperature (20C) into perchloroethylene. The image thus obtained was stable to daylight and had an optical density of 1.80.
- the stabilization could equally well be effected according to a second embodiment by dipping the exposed material for 5 sec. in lSOPAR G (trade name of Shell Company. the Netherlands. for a mixture of hydrocarbons boiling in the range of 166-170C) heated at C.
- lSOPAR G trade name of Shell Company. the Netherlands. for a mixture of hydrocarbons boiling in the range of 166-170C
- the recording layer containing the stabilized image was scratch-resistant and strongly adhered to its support.
- N-vinyl polymers and copolymers containing N- vinylcarbazole units which can be used according to the invention can be prepared by application of one of the various known polymerization procedures, e.g., by pearlor emulsion polymerization or by polymerization in solution.
- the initiation of the polymerization can occur by free radicals, by ion formation, or by radiation e.g., with actinic light.
- the polymerization degree is not critical and may vary between wide limits.
- the content of groups corresponding to the general formula given hereinbefore is not critical and. as shown hereinafter in the table of copolymers containing N-vinylcarbazole units. it may vary between wide limits, e.g.
- copolymers having a content of vinylcarbazole units between 40 and 90 percent.
- N-vinylcarbazole copolymers The preparation of suitable N-vinylcarbazole copolymers is described in the United Kingdom Pat. No. 964.875. which specification also contains a preparation receipt for poly(N-allyl carbazole) (R 2 CH and R H) and for poly(N-propenyl carbazole) (R. H. R H. A CH;).
- Halogen-substituted poly-N-vinyl carbazoles are de scribed in the published Japanese Patent Applications 21.875/67, 25.230/67. 7.592/68. 19.751/67 and 7.59l/68.
- a process for forming a dye image comprising applying a heat pattern having a temperature of at least 90C of the image in the presence of minor amounts of about up to 20% of visible light to a recording material including a recording layer containing an intimate mixture comprising:
- At least one ultraviolet radiation-sensitive polyhalogen compound capable of producing on exposure with ultra-violet radiation with the spiropyran compound a dye salt and having the general formula:
- each of A. B. X and Y is a chlorine. bromine or iodine atom. or one of said groups A. B. X or Y is an alkyl group. an aryl group or an aroyl group and the other groups are each chlorine. bromine. or iodine. or two of said groups A. B. X or Y each is an aromatic acyl group and the other groups chlorine. bromine. or iodine. and in working relation with said mixture at least one of the following compounds.
- X represents oxygen. sulphur. selenium or the group in which R is hydrogen. or an alkyl. allyl. or phenyl group.
- Z represent the necessary atoms to close a or 6- membered heterocyclic nitrogen-containing ring system, and b, a polymer containing N-vinylcarbazolc units.
- pattern-wise heating olthe recording material proceeds by exposure thereof to infrared radiation and a minor amount of visible light while said layer is in heatconductive contact with an original containing infra red-absorbing image markings.
- amido, acylamino or ureido compound corresponds to the following general formula:
- R represents an organic residue of the type present in a carboxylic acid chloride, a l lHR or 12.
- said process of claim 1 wherein said spiropyran compound corresponds to one of the general formulae:
- R, R R',, R R R and R each represent hydrogen, alkyl, alkyl substituted with halogen, alkyl sub stituted with an ester group, alkyl substituted with a carboxyl group, alkyl substituted with a N- phenylcarbamyl group, a hydroxy group, an alkoxy group, an aryloxy group, a phenyl group, piperidyl, acetyl, halogen, nitro, or R, and R together represent a -(CH- chain wherein n 2 or 3 to link carbon atoms in the 3 and 3' positions together.
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB2991572A GB1432771A (en) | 1972-06-26 | 1972-06-26 | Recording method |
Publications (1)
Publication Number | Publication Date |
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US3887808A true US3887808A (en) | 1975-06-03 |
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ID=10299271
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US372938A Expired - Lifetime US3887808A (en) | 1972-06-26 | 1973-06-25 | Thermoimaging process utilizing a photochromic material containing a spiropyran, a polyhalogenated hydrocarbon, a thiol compound and a polyvinylcarbazole |
Country Status (5)
Country | Link |
---|---|
US (1) | US3887808A (enrdf_load_stackoverflow) |
BE (1) | BE801353A (enrdf_load_stackoverflow) |
DE (1) | DE2332040A1 (enrdf_load_stackoverflow) |
FR (1) | FR2191484A5 (enrdf_load_stackoverflow) |
GB (1) | GB1432771A (enrdf_load_stackoverflow) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4151748A (en) * | 1977-12-15 | 1979-05-01 | Ncr Corporation | Two color thermally sensitive record material system |
US4184874A (en) * | 1974-02-05 | 1980-01-22 | Fuji Photo Film Co., Ltd. | Photosensitive composition containing chelate compound |
US4960679A (en) * | 1985-01-31 | 1990-10-02 | Canon Kabushiki Kaisha | Image forming device |
US5234798A (en) * | 1991-10-04 | 1993-08-10 | Dittler Brothers, Incorporated | Thermal reactive structures |
US5879866A (en) * | 1994-12-19 | 1999-03-09 | International Business Machines Corporation | Image recording process with improved image tolerances using embedded AR coatings |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4108665A (en) * | 1976-10-07 | 1978-08-22 | Minnesota Mining And Manufacturing Company | Stabilizers for photothermographic constructions |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3359105A (en) * | 1965-03-10 | 1967-12-19 | Horizons Inc | Speed-increasing agents for an nu-vinyl amine and organic halogen dye former system |
US3451338A (en) * | 1964-05-11 | 1969-06-24 | Ncr Co | Thermographic recording system |
US3642479A (en) * | 1970-03-02 | 1972-02-15 | Eastman Kodak Co | Photographic element and process |
US3785820A (en) * | 1972-02-18 | 1974-01-15 | Canon Camera Co | Photorecording process and photorecording member |
US3810762A (en) * | 1970-09-01 | 1974-05-14 | Agfa Gevaert Nv | Photochromic composition containing polyhalogenated hydrocarbon,spiropyran compound and poly-n-vinylcarbazole and the use thereof |
US3820995A (en) * | 1971-08-27 | 1974-06-28 | Agfa Gevaert Nv | Photochromic material containing a spiropyran compound a polyhalogenated hydrocarbon photoactivator and an acetanilide sensitizer and the use thereof in photoimaging |
-
1972
- 1972-06-26 GB GB2991572A patent/GB1432771A/en not_active Expired
-
1973
- 1973-06-15 FR FR7322025A patent/FR2191484A5/fr not_active Expired
- 1973-06-22 BE BE1005185A patent/BE801353A/xx unknown
- 1973-06-23 DE DE2332040A patent/DE2332040A1/de active Pending
- 1973-06-25 US US372938A patent/US3887808A/en not_active Expired - Lifetime
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3451338A (en) * | 1964-05-11 | 1969-06-24 | Ncr Co | Thermographic recording system |
US3359105A (en) * | 1965-03-10 | 1967-12-19 | Horizons Inc | Speed-increasing agents for an nu-vinyl amine and organic halogen dye former system |
US3642479A (en) * | 1970-03-02 | 1972-02-15 | Eastman Kodak Co | Photographic element and process |
US3810762A (en) * | 1970-09-01 | 1974-05-14 | Agfa Gevaert Nv | Photochromic composition containing polyhalogenated hydrocarbon,spiropyran compound and poly-n-vinylcarbazole and the use thereof |
US3820995A (en) * | 1971-08-27 | 1974-06-28 | Agfa Gevaert Nv | Photochromic material containing a spiropyran compound a polyhalogenated hydrocarbon photoactivator and an acetanilide sensitizer and the use thereof in photoimaging |
US3785820A (en) * | 1972-02-18 | 1974-01-15 | Canon Camera Co | Photorecording process and photorecording member |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4184874A (en) * | 1974-02-05 | 1980-01-22 | Fuji Photo Film Co., Ltd. | Photosensitive composition containing chelate compound |
US4151748A (en) * | 1977-12-15 | 1979-05-01 | Ncr Corporation | Two color thermally sensitive record material system |
US4960679A (en) * | 1985-01-31 | 1990-10-02 | Canon Kabushiki Kaisha | Image forming device |
US5234798A (en) * | 1991-10-04 | 1993-08-10 | Dittler Brothers, Incorporated | Thermal reactive structures |
US5879866A (en) * | 1994-12-19 | 1999-03-09 | International Business Machines Corporation | Image recording process with improved image tolerances using embedded AR coatings |
US6309809B1 (en) * | 1994-12-19 | 2001-10-30 | International Business Machines Corporation | Multi-layer integrated imaging/image recording process with improved image tolerances |
Also Published As
Publication number | Publication date |
---|---|
DE2332040A1 (de) | 1974-01-10 |
FR2191484A5 (enrdf_load_stackoverflow) | 1974-02-01 |
BE801353A (nl) | 1973-12-26 |
GB1432771A (en) | 1976-04-22 |
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