US3867152A - Photographic silver halide material - Google Patents
Photographic silver halide material Download PDFInfo
- Publication number
- US3867152A US3867152A US364327A US36432773A US3867152A US 3867152 A US3867152 A US 3867152A US 364327 A US364327 A US 364327A US 36432773 A US36432773 A US 36432773A US 3867152 A US3867152 A US 3867152A
- Authority
- US
- United States
- Prior art keywords
- emulsion
- silver halide
- layer
- photographic
- compounds
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- -1 silver halide Chemical class 0.000 title claims abstract description 40
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 34
- 239000004332 silver Substances 0.000 title claims abstract description 34
- 239000000463 material Substances 0.000 title claims abstract description 29
- 229920000642 polymer Polymers 0.000 claims abstract description 32
- 238000012545 processing Methods 0.000 claims abstract description 24
- 239000000839 emulsion Substances 0.000 claims description 61
- 108010010803 Gelatin Proteins 0.000 claims description 21
- 239000000084 colloidal system Substances 0.000 claims description 21
- 239000008273 gelatin Substances 0.000 claims description 21
- 229920000159 gelatin Polymers 0.000 claims description 21
- 235000019322 gelatine Nutrition 0.000 claims description 21
- 235000011852 gelatine desserts Nutrition 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 18
- 230000002180 anti-stress Effects 0.000 claims description 7
- 230000001681 protective effect Effects 0.000 claims description 7
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 claims description 7
- SXRSQZLOMIGNAQ-UHFFFAOYSA-N Glutaraldehyde Chemical compound O=CCCCC=O SXRSQZLOMIGNAQ-UHFFFAOYSA-N 0.000 claims description 4
- 239000011230 binding agent Substances 0.000 claims description 2
- 150000004820 halides Chemical class 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 abstract description 12
- 239000010802 sludge Substances 0.000 abstract description 8
- 125000003118 aryl group Chemical group 0.000 abstract description 4
- 230000015572 biosynthetic process Effects 0.000 abstract description 4
- 125000000217 alkyl group Chemical group 0.000 abstract description 3
- 229910052739 hydrogen Inorganic materials 0.000 abstract description 3
- 239000001257 hydrogen Substances 0.000 abstract description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 abstract description 3
- 125000006833 (C1-C5) alkylene group Chemical group 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 27
- 229920000126 latex Polymers 0.000 description 13
- 239000000203 mixture Substances 0.000 description 13
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 12
- 239000004816 latex Substances 0.000 description 12
- 238000002360 preparation method Methods 0.000 description 12
- 239000000178 monomer Substances 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 9
- 159000000000 sodium salts Chemical class 0.000 description 9
- 238000010992 reflux Methods 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- KXDHJXZQYSOELW-UHFFFAOYSA-M Carbamate Chemical compound NC([O-])=O KXDHJXZQYSOELW-UHFFFAOYSA-M 0.000 description 6
- 239000000975 dye Substances 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 4
- 125000002947 alkylene group Chemical group 0.000 description 4
- DGTNSSLYPYDJGL-UHFFFAOYSA-N phenyl isocyanate Chemical compound O=C=NC1=CC=CC=C1 DGTNSSLYPYDJGL-UHFFFAOYSA-N 0.000 description 4
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 150000002736 metal compounds Chemical class 0.000 description 3
- 229910000510 noble metal Inorganic materials 0.000 description 3
- 229910052700 potassium Inorganic materials 0.000 description 3
- 239000011591 potassium Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- GGZHVNZHFYCSEV-UHFFFAOYSA-N 1-Phenyl-5-mercaptotetrazole Chemical compound SC1=NN=NN1C1=CC=CC=C1 GGZHVNZHFYCSEV-UHFFFAOYSA-N 0.000 description 2
- AZCYBBHXCQYWTO-UHFFFAOYSA-N 2-[(2-chloro-6-fluorophenyl)methoxy]benzaldehyde Chemical compound FC1=CC=CC(Cl)=C1COC1=CC=CC=C1C=O AZCYBBHXCQYWTO-UHFFFAOYSA-N 0.000 description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- IFVYHJRLWCUVBB-UHFFFAOYSA-N allyl thiocyanate Chemical compound C=CCSC#N IFVYHJRLWCUVBB-UHFFFAOYSA-N 0.000 description 2
- JEHKKBHWRAXMCH-UHFFFAOYSA-N benzenesulfinic acid Chemical compound O[S@@](=O)C1=CC=CC=C1 JEHKKBHWRAXMCH-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 150000002731 mercury compounds Chemical class 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000004848 polyfunctional curative Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 229910001961 silver nitrate Inorganic materials 0.000 description 2
- HEMHJVSKTPXQMS-UHFFFAOYSA-M sodium hydroxide Inorganic materials [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 2
- 229920001567 vinyl ester resin Polymers 0.000 description 2
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 1
- NCNYEGJDGNOYJX-NSCUHMNNSA-N (e)-2,3-dibromo-4-oxobut-2-enoic acid Chemical compound OC(=O)C(\Br)=C(/Br)C=O NCNYEGJDGNOYJX-NSCUHMNNSA-N 0.000 description 1
- LUMLZKVIXLWTCI-NSCUHMNNSA-N (e)-2,3-dichloro-4-oxobut-2-enoic acid Chemical compound OC(=O)C(\Cl)=C(/Cl)C=O LUMLZKVIXLWTCI-NSCUHMNNSA-N 0.000 description 1
- WDCYWAQPCXBPJA-UHFFFAOYSA-N 1,3-dinitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC([N+]([O-])=O)=C1 WDCYWAQPCXBPJA-UHFFFAOYSA-N 0.000 description 1
- GWEHVDNNLFDJLR-UHFFFAOYSA-N 1,3-diphenylurea Chemical compound C=1C=CC=CC=1NC(=O)NC1=CC=CC=C1 GWEHVDNNLFDJLR-UHFFFAOYSA-N 0.000 description 1
- IPKAAAXIUJZLCZ-UHFFFAOYSA-N 1-benzylidene-2-nitro-2h-pyridin-1-ium Chemical compound [O-][N+](=O)C1C=CC=C[N+]1=CC1=CC=CC=C1 IPKAAAXIUJZLCZ-UHFFFAOYSA-N 0.000 description 1
- MDVXZTGQQZSLIJ-UHFFFAOYSA-N 1-benzylidene-2-nitro-2h-quinolin-1-ium Chemical class [O-][N+](=O)C1C=CC2=CC=CC=C2[N+]1=CC1=CC=CC=C1 MDVXZTGQQZSLIJ-UHFFFAOYSA-N 0.000 description 1
- LLCOQBODWBFTDD-UHFFFAOYSA-N 1h-triazol-1-ium-4-thiolate Chemical class SC1=CNN=N1 LLCOQBODWBFTDD-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- OFQCQIGMURIECL-UHFFFAOYSA-N 2-[2-(diethylamino)ethyl]-2',6'-dimethylspiro[isoquinoline-4,4'-oxane]-1,3-dione;phosphoric acid Chemical compound OP(O)(O)=O.O=C1N(CCN(CC)CC)C(=O)C2=CC=CC=C2C21CC(C)OC(C)C2 OFQCQIGMURIECL-UHFFFAOYSA-N 0.000 description 1
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 1
- NICLKHGIKDZZGV-UHFFFAOYSA-N 2-cyanopentanoic acid Chemical compound CCCC(C#N)C(O)=O NICLKHGIKDZZGV-UHFFFAOYSA-N 0.000 description 1
- CBHTTYDJRXOHHL-UHFFFAOYSA-N 2h-triazolo[4,5-c]pyridazine Chemical class N1=NC=CC2=C1N=NN2 CBHTTYDJRXOHHL-UHFFFAOYSA-N 0.000 description 1
- OWIRCRREDNEXTA-UHFFFAOYSA-N 3-nitro-1h-indazole Chemical compound C1=CC=C2C([N+](=O)[O-])=NNC2=C1 OWIRCRREDNEXTA-UHFFFAOYSA-N 0.000 description 1
- VFXXTYGQYWRHJP-UHFFFAOYSA-N 4,4'-azobis(4-cyanopentanoic acid) Chemical compound OC(=O)CCC(C)(C#N)N=NC(C)(CCC(O)=O)C#N VFXXTYGQYWRHJP-UHFFFAOYSA-N 0.000 description 1
- RYYXDZDBXNUPOG-UHFFFAOYSA-N 4,5,6,7-tetrahydro-1,3-benzothiazole-2,6-diamine;dihydrochloride Chemical compound Cl.Cl.C1C(N)CCC2=C1SC(N)=N2 RYYXDZDBXNUPOG-UHFFFAOYSA-N 0.000 description 1
- UTMDJGPRCLQPBT-UHFFFAOYSA-N 4-nitro-1h-1,2,3-benzotriazole Chemical compound [O-][N+](=O)C1=CC=CC2=NNN=C12 UTMDJGPRCLQPBT-UHFFFAOYSA-N 0.000 description 1
- OAOABCKPVCUNKO-UHFFFAOYSA-N 8-methyl Nonanoic acid Chemical compound CC(C)CCCCCCC(O)=O OAOABCKPVCUNKO-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical group NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical group CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 101100058943 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) CAK1 gene Proteins 0.000 description 1
- 206010070834 Sensitisation Diseases 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- 229910021612 Silver iodide Inorganic materials 0.000 description 1
- 239000004133 Sodium thiosulphate Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical class [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- 229920002494 Zein Polymers 0.000 description 1
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000000783 alginic acid Substances 0.000 description 1
- 235000010443 alginic acid Nutrition 0.000 description 1
- 229920000615 alginic acid Polymers 0.000 description 1
- 229960001126 alginic acid Drugs 0.000 description 1
- 150000004781 alginic acids Chemical class 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- HTKFORQRBXIQHD-UHFFFAOYSA-N allylthiourea Chemical compound NC(=S)NCC=C HTKFORQRBXIQHD-UHFFFAOYSA-N 0.000 description 1
- 229960001748 allylthiourea Drugs 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- NVSONFIVLCXXDH-UHFFFAOYSA-N benzylsulfinic acid Chemical compound O[S@@](=O)CC1=CC=CC=C1 NVSONFIVLCXXDH-UHFFFAOYSA-N 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 229940105329 carboxymethylcellulose Drugs 0.000 description 1
- 239000005018 casein Substances 0.000 description 1
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 1
- 235000021240 caseins Nutrition 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000002939 deleterious effect Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 150000002344 gold compounds Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002391 heterocyclic compounds Chemical class 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- FQGYCXFLEQVDJQ-UHFFFAOYSA-N mercury dicyanide Chemical compound N#C[Hg]C#N FQGYCXFLEQVDJQ-UHFFFAOYSA-N 0.000 description 1
- XCGQJCSSCTYHDV-UHFFFAOYSA-N mercury(1+);sulfane Chemical compound S.[Hg+] XCGQJCSSCTYHDV-UHFFFAOYSA-N 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical group CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- PKDBSOOYVOEUQR-UHFFFAOYSA-N mucobromic acid Natural products OC1OC(=O)C(Br)=C1Br PKDBSOOYVOEUQR-UHFFFAOYSA-N 0.000 description 1
- ZAKLKBFCSHJIRI-UHFFFAOYSA-N mucochloric acid Natural products OC1OC(=O)C(Cl)=C1Cl ZAKLKBFCSHJIRI-UHFFFAOYSA-N 0.000 description 1
- YNTOKMNHRPSGFU-UHFFFAOYSA-N n-Propyl carbamate Chemical compound CCCOC(N)=O YNTOKMNHRPSGFU-UHFFFAOYSA-N 0.000 description 1
- HNHVTXYLRVGMHD-UHFFFAOYSA-N n-butyl isocyanate Chemical compound CCCCN=C=O HNHVTXYLRVGMHD-UHFFFAOYSA-N 0.000 description 1
- 150000005181 nitrobenzenes Chemical class 0.000 description 1
- 150000004010 onium ions Chemical class 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229940068984 polyvinyl alcohol Drugs 0.000 description 1
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 1
- SRVYMWGYUFLRGH-UHFFFAOYSA-M potassium;butyl-oxido-oxo-sulfanylidene-$l^{6}-sulfane Chemical compound [K+].CCCCS([O-])(=O)=S SRVYMWGYUFLRGH-UHFFFAOYSA-M 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 239000012925 reference material Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 230000005070 ripening Effects 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 150000003378 silver Chemical class 0.000 description 1
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 1
- 229940045105 silver iodide Drugs 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- AXZWODMDQAVCJE-UHFFFAOYSA-L tin(II) chloride (anhydrous) Chemical compound [Cl-].[Cl-].[Sn+2] AXZWODMDQAVCJE-UHFFFAOYSA-L 0.000 description 1
- 238000004879 turbidimetry Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000005019 zein Substances 0.000 description 1
- 229940093612 zein Drugs 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/04—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with macromolecular additives; with layer-forming substances
- G03C1/053—Polymers obtained by reactions involving only carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
Definitions
- the present invention relates to photographic radiation sensitive silver halide elements and more particularly to radiation-sensitive silver halide elements with reduced tendency to formation of sludge and pressure marks on rapid processing, after exposure, at elevated temperature.
- COO-A-OCONH-R wherein ducing photographic images by exposure and process ing of a photographic silver halide materialcomprising at least one silver halide emulsion layer wherein the said emulsion layer or a hydrophilic colloid layer in water-permeable relationship therewith comprises a polymeric compound as defined above.
- the polymeric compounds for use according to the present invention are homopolymers or copolymers.
- the polymeric materials may comprise in addition to the recurring units of the above formula recurring units of other copolymerized monomers for example recurring units of acrylic acid and methacrylic acid, acrylamide and methacrylamide as well as the N-alkylated derivatives thereof, alkyl acrylates and alkylmethacrylates e.g., methyland butylacrylate, acrylonitrile, ethylene, vinyl esters e.g., vinyl acetate and the vinyl ester of versatic acid, vinyl ethers especially those the aliphatic ether group of which comprises at most 4 C- atoms vinyl chloride, vinylidene chloride, styrene, butadiene, etc.
- the effectiveness of the polymeric compounds for use according to the present invention is due to the recurring units of the above general formula, and therefore the polymeric compounds preferably comprise at least 15 mole percent, preferably at least 50 mole percent of these recurring units.
- the copolymerized monomers should be such that they have no deleterious effect on the photographic properties of the silver halide emulsion layers. 5
- ooAocomm .nz a wherein X, A, and R have the same significance as above, which are used in the preparation of the polymeric compounds having recurring units of the above general formula I, can be prepared by reaction of the appropriateisocyanate with a hydroxyalkyl(meth)acrylate as is illustrated by the following preparations.
- Preparation I N-phenyl-methacryloyloxy ethylcarbamate of the formula:
- the latex formed was stirred for 4 hours at 60C and then 30 min. at 90C. After cooling and filtering, 4250 ml of a latex with pH 6 was obtained. Solids content 23.4 g/l00 ml.
- the latex has a surface tension of 39.25 dyne/cm and the average particle size determined by'turbidimetry was nm.
- the mixture was heated to 70C whereupon 40 ml of a 2.5 percent aqueous solution of the sodium salt of 4,4-azo-bis(4-cyanovaleric acid) were added dropwise with stirring in 20 min. The temperature rose to 80C and the mixture was stirred at this temperature for 1 hour. After cooling and filtering, 430 ml of latex with a solids content of 21.7 g/l00 ml wereobtained.
- the polymeric compounds for use according to the present invention may be incorporated into the silver halide emulsion or another layer of the photographic material which is in water-permeable relationship with the said emulsion layer. They are preferably used in a gelatin protective antistress layer coated on top of the emulsion layer.
- the polymeric compounds of use according to the present invention may be used in any type of lightsensitive material
- Various silver salts may be used as light-sensitive salt e.g., silver bromide, silver iodide, silver chloride, or mixed silver halides, e.g., silver chloro bromide or silver bromoiodide.
- the invention is of particular importance for mechanical processing at elevated temperature i.e., above 30C of silver bromoiodide emulsions.
- the silver halide emulsions for being processed after exposure at elevated temperature in an automatic processing machine generally are silver halide emulsions I having a very low content of hydrophilic colloid e.g.,
- the ratio of hydrophilic colloid, more-particularly gelatin, to silver halide expressed as silver nitrate is preferably comprised between 0.2 and 0.6.
- the emulsion may be a negative emulsion or a directpositive emulsion which comprises fogged silver halide.
- fogging maybe effected by known means e.g., by lightand preferably, by chemical sensitization to fog e.g., by means of reducing agents such as hydroxylamine, hydrazine, formaldehyde, tin- (II)chloride, thiourea dioxide, etc., and/or by means of noble metal compounds such as gold compounds.
- fogging may also occur by increasing the pH of the emulsion by means of alkaline substances such as sodium or potassium hydroxide.
- the silver halides are dispersed in the common hydrophilic colloids such as gelatin, casein, zein, polyvinyl alcohol, carboxymethylcellulose, alginic acid, etc., gelatin being however favoured.
- the amount of polymeric compound employed in the light-sensitive halide emulsion layer or in the colloid layer in water-permeable relationship therewith depends on theparticular compound, the particular type of emulsion and the desired effect and can vary within very wide limits. The optimum amount of each individual polymeric compound to be added is best determined for each particular type of emulsion by trial. Generally, the most suitable concentration in the particular colloid layer involved is comprised between 5 and 50 percent by weight relative to the weight of the hydrophilic colloid.
- the polymeric'compounds can be added in the form of loose powder but they are preferably added from an aqueous solution or dispersion (i.e., a latex) e.g., prepared as described above by emulsion polymerisation. In the form of a latex the polymeric compounds are easily incorporated in the hydrophilic thehydrophilic colloid, more particularly gelatin.
- the silver halide emulsions of the radiation-sensitive elements comprising the polymeric compounds in accordance with the present invention may be chemically as well as spectrally sensitized. They may be chemically sensitized by any of the accepted procedures.
- the emulsions may be digested with naturally active gelatin or sulphur compounds may be added such as allyl thiocyanate, allyl thiourea, sodium thiosulphate, etc.
- the emulsions may also be sensitized by means of reductors for instance tin compounds as described in our United Kingdom Pat. Specification No.
- noble metal compounds e.g., of gold, platinum, palladium, iridium, ruthenium and rhodium as described by R. Koslowsky, Z.wiss.Phot.- 46, 67-72 (1951).
- Representative noble metal compounds are ammonium chloro palladate, potassium chloroplatinate, potassium chloroaurate and potassium aurithiocyanate.
- the emulsions may further comprise compounds that sensitize the emulsion by development acceleration for example alkylene oxide polymers.
- alkylene oxide polymers may be of various type e.g., polyethylene glycol having a molecular weight of 1500 or more, alky1-.
- the emulsions may be spectrally sensitized e.g. by means of the common methine dyes such as neutrocyanines, basic or acid carboxyanines, rhodacyanines, hemicyanines, styryl dyes, oxonol dyes and the like.
- common methine dyes such as neutrocyanines, basic or acid carboxyanines, rhodacyanines, hemicyanines, styryl dyes, oxonol dyes and the like.
- Such like spectrally sensitizing dyes have been described by F. M. Hamer in The cyanine dyes and related compounds (1964).
- Direct-positive emulsions may comprise desensitlzing dyes e.g., as described in United Kingdom Pat. Specification No. 1,155,404.
- the emulsions may comprise the common emulsion stabilizers e.g., homopolar or salt-like compounds of mercury with aromatic and heterocyclic rings (e.g., mercaptotriazoles) simple mercury compounds, mercury sulphonium double salts and other mercury compounds of the kind described in Belgian Pat. Specification Nos. 524,121, 677,337, 707,386 and 709,195.
- Other suitable emulsion stabilizers are the azaindenes, particularly the tetraor pentaazaindenes and especially those substituted by hydroxyor amino groups. Suchlike compounds have been described by Birr in Z.wiss.Phot. 47, 2-58 (1952).
- the emulsions may further comprise as stabilizers heterocyclic nitrogencontaining mercapto compounds such as benzothlazoline-2-thione and 1-phenyl-5-mercapto-tetrazole, sulphinic acids such as benzene sulphinic acid and toluene sulphinic acid, thiosulphonic acids such as benzene thiosulphonic, acid, 'toluene' thiosulphonic acid, pchlorobenzene thiosulphonic acid sodium salt,”propyl thiosulphonic acid-potassium salt, butyl thiosulphonic acid potassium salt, etc.
- heterocyclic nitrogencontaining mercapto compounds such as benzothlazoline-2-thione and 1-phenyl-5-mercapto-tetrazole
- sulphinic acids such as benzene sulphinic acid and toluene sulphinic acid
- thiosulphonic acids such as
- the photographic silver halide materials may further comprise surface active compounds, e.g., the fluorinated surfactants of United Kingdom Pat. No. 1,293,189, plasticizers, matting agents, e.g., polymethyl methacrylate and silica particles, colour couplers, hardening agents e.g., formaldehyde, dialdehydes, halogen substituted aldehyde acids such as mucochloric and mucobromic acid, etc.
- surface active compounds e.g., the fluorinated surfactants of United Kingdom Pat. No. 1,293,189
- plasticizers e.g., polymethyl methacrylate and silica particles
- colour couplers e.g., halogen substituted aldehyde acids such as mucochloric and mucobromic acid, etc.
- the hardening agent is generally an aldehyde hardener particularly aliphatic dialdehydes e.g. maleic aldehyde and glutaraldehyde whichmay be used as such or in the form of their bisulphite addition products.
- the three emulsion portions were coated under identical circumstances on both sides of a polyethylene terephthalate support and then overcoated with a gelatin antistress layer comprising formaldehyde as. hardening agent.
- a gelatin antistress layer comprising formaldehyde as. hardening agent.
- the latices of preparations A and B were added in an amount of 25 percent by weight. of dry polymer relative to the amount of dry gelatin.
- the materials were exposed through a continuous wedge with constant 0.15 and then automatically processed in a seconds processing machine. Development occurred for 2-3 seconds at 35C in Agfa- Gevaerts hardening developer for automatic processing G 138 which comprises hydroquinone and l-phenyl-3-pyrazolidinone as developing agents and glutaraldehyde as hardener.
- the values given for the speed are relative values with respect to reference material A, the speed of which has been given a value of 100.
- the table also includes values for the abrasion resis-- tance (A.R.). These values are the pressures (in gram) necessaryfto be applied to a steel ball having a diameter of A inch to make it penetrate completely through the wet hydrophilic colloid layers (on both sides of the support) on which the ball is placed, when the ball is drawn over the material.
- A.R. abrasion resis-- tance
- the value given for the sludge is the amount of sludge formed per sq.m of developed double-coated film material.
- X is hydrogen or methyl
- g l A is a straight-chain or branched-chain C C,-, alkylene group
- R is an alkyl or aryl group.
- Photographic silver halide material according to claim 1 wherein the polymer is present in a protective l0 gelatin antistress layer.
- Photographic material according to claim I wherein the said polymeric compound is present in the said layer in an amount ot5 to percent by weight relative to the weight of the hydrophilic colloid.
- Photographic material according to claim 1 wherein the emulsion is a silver bromoiodide emulsion.
- X is hydrogen or methyl
- A is a straight-chain or branched-chain C C alkylene group
- R is an alkyl or aryl group.
- Method according to claim 12, wherein the developer comprises glutaraldehyde.
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Abstract
Polymeric compounds having recurring units of the formula:
WHEREIN: X is hydrogen or methyl, A is C1-C5 alkylene and R is alkyl or aryl, ARE DESCRIBED FOR USE IN PHOTOGRAPHIC SILVER HALIDE MATERIAL. The compounds reduce the formation of sludge and pressure marks upon processing, especially processing at elevated temperature, of the exposed elements.
Description
limited States Patent [111 3,867,152 Priem etal. Feb. 18, 1975 [54] PHOTOGRAPHIC SILVER HALIDE 3,607,290 9/1971 Butler; 96/1 l4 MATERIAL 3,775,129 11/1973 Dodwcll 96/1l4 Inventors: Jan Jozef Priem, Mortsel; Walter Frans De Winter, Berchem; .lan Bernard Lambrechts, Antwerpen, all of Belgium Agfa-Gevaert N.V., Mortsel, Belgium Filed: May 29, 1973 Appl. No.: 364,327
Assignee:
Foreign Application-Priority Data June 22, 1972 Great Britain 29386/72 Field of Search 96/114, 67, 87 R, 50, 63,
References Cited UNITED STATES PATENTS 4/l967 Minsk ct al. 96/114 1/1970 Smith 96/114 Primary Examiner-Ronald H. Smith Attorney, Agent, or Firm-A. W. Breiner [57] ABSTRACT Polymeric compounds having recurring units of the formula:
COOAOCONHR 13 Claims, No Drawings ll PHOTOGRAPI-IIC SILVER HALIDIE MATERIAL The present invention relates to photographic radiation sensitive silver halide elements and more particularly to radiation-sensitive silver halide elements with reduced tendency to formation of sludge and pressure marks on rapid processing, after exposure, at elevated temperature.
It is known to use techniques for automatic processing of exposed photographic materials. In order toreduce the time that the materials pass through the automatic processing machines, where they are conducted from one processing station to another by means of roller pairs, processing is carried out at elevated temperatures, say above 30C. Under these severe processing conditions the physical and photographic properties of the materials are impaired the more because in these materials for rapid processing the gelatin content ofthe silver halide emulsions is reduced considerably as compared with the gelatin content used in emulsions for normal processing. For instance, owing to the very low gelatin content, the machine-processed materials show repeated pressure marks from the roller pairs by which they are guided in the processing machine. Moreover, some sort of gelatin sludge is deposited on the first transport rollers and/or formed at the surface of the fixing bath.
' It is possible to reduce these pressure marks and sludge formation by appropriate hardening of the material, more particularly of the protective gelatin top layer, but with these short processing times this unfortunately results in an.unacceptable lowering of the gradation, andalso of the emulsion speed.
It has now been found possible to reduce or eliminate the pressure marks and sludge formation without affecting the gradation and emulsion speed to a noteworthy extent by incorporating in the radiation sensitive layer in water-permeable relationship with the said emulsion layer, preferably in the gelatin protective antistress layer, a novel polymeric compound containing recurring units of the following formula l:
COO-A-OCONH-R wherein ducing photographic images by exposure and process ing of a photographic silver halide materialcomprising at least one silver halide emulsion layer wherein the said emulsion layer or a hydrophilic colloid layer in water-permeable relationship therewith comprises a polymeric compound as defined above.
silver halide emulsion layer or a hydrophilic colloid The polymeric compounds for use according to the present invention are homopolymers or copolymers. The polymeric materials may comprise in addition to the recurring units of the above formula recurring units of other copolymerized monomers for example recurring units of acrylic acid and methacrylic acid, acrylamide and methacrylamide as well as the N-alkylated derivatives thereof, alkyl acrylates and alkylmethacrylates e.g., methyland butylacrylate, acrylonitrile, ethylene, vinyl esters e.g., vinyl acetate and the vinyl ester of versatic acid, vinyl ethers especially those the aliphatic ether group of which comprises at most 4 C- atoms vinyl chloride, vinylidene chloride, styrene, butadiene, etc.
The effectiveness of the polymeric compounds for use according to the present invention is due to the recurring units of the above general formula, and therefore the polymeric compounds preferably comprise at least 15 mole percent, preferably at least 50 mole percent of these recurring units. The copolymerized monomers should be such that they have no deleterious effect on the photographic properties of the silver halide emulsion layers. 5
Though the molecular weight of the polymeric compounds used is of minor importance and the best range can be easily determined by means of some simple tests the compounds generally have a molecular weight comprised between 10 and 10 The monomeric compounds of the following formula ll:
ooAocomm .nz a wherein X, A, and R have the same significance as above, which are used in the preparation of the polymeric compounds having recurring units of the above general formula I, can be prepared by reaction of the appropriateisocyanate with a hydroxyalkyl(meth)acrylate as is illustrated by the following preparations. Preparation I N-phenyl-methacryloyloxy ethylcarbamate of the formula:
CH =Q (CIV1 )COOCH CH QCONH- Q was prepared as follows:
In a 5 litre reaction vessel fitted with thermometer, stirrer, reflux. condenser and dropping funnel were placed in 2.250 liter of dry diisopropyl ether, 9 moles of phenyl isocyanate and some copper curlings as polymerisation inhibitor. The mixture was heated to Yield: 89.5'perccnt. Melting point 58C.
Preparation II N-n-butyl-methacryloyloxy ethylcarbamate of the formula:
CH =C(CH )COOCI-I CH OCONHC,H was prepared as follows:
In a 1 litre reaction vessel fitted with stirrer, thermometer, reflux condenser, and dropping funnel were placed 250 ml of diisopropyl ether, 1 mole of butyl isocyanate and some crystals of m-dinitrobenzene as polymerisation inhibitor. The mixture was heated to 80C and 1 mole of hydroxyethylmehtacrylate was dropwise added. After the addition, the mixture was refluxed for 4 hours. The solvent was then removed by evaporation and the residue subjected to fractional destillation. The monomer fraction distills at l20C/O.1 mm. Yield 72 percent.
The monomer is a clear, colourless liquid which solidifies at -3C. NMR-analysis showed that the monomer comprised 5 percent of unreacted hydroxyethyl methacrylate. Preparation III N-phenyl-acryloyloxy ethylcarbamate of the formula:
CH =CH COOCH CH OCONH was prepared as follows:
In a 500 ml reaction vessel fitted with stirrer, reflux condenser, thermometer and dropping funnel were placed 250 ml of diisopropyl ether, 1 mole of phenyl isocyanate -and" some crystals of ndinitrobenzene as polymerization inhibitor. The mixture was heated to 82C whereupon 1.1 mole of hydroxyethyl acrylate was added dropwise in min.
After the addition, the mixture was refluxed for 1 hour, and then poured into an excess of hexane. The mono-- .mer that crystallized was filtered off and dried. Yield 83 percent.
100 g of monomer was dissolved in 200 ml of diisopropyl ether, filtered while hot and poured into an excess of hexane. The crystallized monomer had a melting point of 50-53C.
NMR-analysis reveals the presence of a little unreacted hydroxyethyl acrylate and diphenyl urea (formed by traces of water with the phenylisocyanate). Preparation IV N-phenyl-methacryloyloxypropylcarbamate of the formula:
. comm-Q liquid was obtained. After having left standing overnight in a refrigerator the product crystallized. Melting point 6264C.
Calculated Found Analysis N 5.32 5.36-5.35
Preparation V N-phenyl-acryloyloxy propyl carbamate of the formula:
CH2= CH-COOCH2CH-CH5 0CONH- Q was prepared as follows:
In a reaction vessel fitted with stirrer, thermometer, reflux condenser and dropping funnel were placed: 1 mole of phenyl isocyanate and some crystals of mdinitrobenzene. The mixture was heated to 60C whereupon 1 mole of freshly distilled B-hydroxypropyl acrylate was added so that the temperature did not rise above 70C. The mixture was then stirred 65C whereupon 1000 g of N-phenyl methacryloyl 0xyethyl carbamate were added. At 65C 200 ml of a 5 percent aqueous solution of the sodiumsalt'of 4,4-azobis (4-cyanovaleric acid) were added dropwise with stirring'in 20 min. The latex formed was stirred for 4 hours at 60C and then 30 min. at 90C. After cooling and filtering, 4250 ml of a latex with pH 6 was obtained. Solids content 23.4 g/l00 ml. The latex has a surface tension of 39.25 dyne/cm and the average particle size determined by'turbidimetry was nm.
The intrinsic viscosity of the isolated polymer measured in methylene chloride at 25C was 0.90 dl/g. Preparation B Co(butyl acrylate/N-phenylmethacryloyloxyethyl carbamate) (50:50)
In a reaction vessel fitted with stirrer, thermometer, reflux condenser, and dropping funnel 400 ml of demineralized water and 5 g of the sodium salt of oleyl methyl tauride were placed. The solution was heated to 60C whereupon 50 g of butyl acrylate and 50 g of N-phenyl-methacryloyloxyethyl carbamate added. The emulsion was heated to 80C and 20 ml of a 5 percent aqueous solution of 4,4 -azo-b is(4-)cyanovaleric acid) were added in 15 min. The mixture was further heated for 1 hour at C whereupon the latex formed was cooled and filtered. 500 ml of latex with a solids content of 19.6 g/ ml were obtained.
P 7 Surface tension: 42.5 dyne/cm Average particle size: 52 nm Intrinsic viscosity (25C/tetrahydrofuran): 0.90 dl/g Poly( N-butyl-methacryloyloxyethyl heating at this temperature for 1 hour the latex formed was cooled to room-temperature andflltered. 490 ml of latex with a solids content of 20.92 g/lOO ml were obtained:
pH: 685 Surface tension: 34.3 dyne/cm Average particle size: 54 nm lnstrinsic viscosity (25C/methylene chloride): 0.52 dI/g Preparation D poly(N-phenyI-acryloyloxyethyl carbamate) In a reaction vessel fitted with stirrer, thermometer, reflux condenser and dropping funnel, 350 ml of demineralized water, 10 g of the sodium salt of oleyl methyl tauride and I g of monomer were placed. The mixture was heated to 70C whereupon 40 ml of a 2.5 percent aqueous solution of the sodium salt of 4,4-azo-bis(4-cyanovaleric acid) were added dropwise with stirring in 20 min. The temperature rose to 80C and the mixture was stirred at this temperature for 1 hour. After cooling and filtering, 430 ml of latex with a solids content of 21.7 g/l00 ml wereobtained.
Surface tension 34.5 dyne/cm Average particle size 80 nm Preparation E poly(N-phenyl-methacryloyloxypropyl carbamate) In a reaction vessel fitted with stirrer, thermometer, reflux condenser and dropping funnel, 500 ml of demineralized water, l5 g of the sodium salt of oleyl methyl tauride and 150 g of monomer were placed. The mixture was heated to 80C whereupon 70 ml ofa 2.5 percent aqueous solution ofthe sodium salt of4,4"-azo bis (4-cyanovaleric acid) were added dropwise in 15 min. The mixture was then stirred for 1 hour at 90C whereupon the emulsion was cooled and filtered. 520 ml of latex with a solids content of 22.2 g/100 ml. pH 5.1
Surface tension 34 dyne/cm Average particle size 55 nm Intrinsic viscosity (25C/methylene chloride) 0.238 dl/g Preparation F poly(-N-phenyl-acryloyloxypropyl carbamate) In a reaction vessel fitted with stirrer, thermometer, reflux condenser and dropping funnel 300 ml of demineralized water, 9 g of the sodium salt of oleyl methyl tauride and 90 g of monomer were placed. The mixture was heated to 80C whereupon 36 ml of a 2.5 percent solution of the sodium salt of 4,4'-azo-bis(4- cyanovaleric acid) were added dropwise in 15 min. The temperature rose from 80 to 95C. Stirring was then continued for 30 min. at 80C. After cooling and filtering 340 ml of latex having a solids content of 223 g/] 00 ml were obtained Surface tension dyne/cm Average particle size 67 nm Intrinsic viscosity (25C/methylene chloride): 0.356 dl/g.
The polymeric compounds for use according to the present invention may be incorporated into the silver halide emulsion or another layer of the photographic material which is in water-permeable relationship with the said emulsion layer. They are preferably used in a gelatin protective antistress layer coated on top of the emulsion layer.
The polymeric compounds of use according to the present invention may be used in any type of lightsensitive material Various silver salts may be used as light-sensitive salt e.g., silver bromide, silver iodide, silver chloride, or mixed silver halides, e.g., silver chloro bromide or silver bromoiodide. The invention is of particular importance for mechanical processing at elevated temperature i.e., above 30C of silver bromoiodide emulsions.
The silver halide emulsions for being processed after exposure at elevated temperature in an automatic processing machine generally are silver halide emulsions I having a very low content of hydrophilic colloid e.g.,
gelatin. The ratio of hydrophilic colloid, more-particularly gelatin, to silver halide expressed as silver nitrate is preferably comprised between 0.2 and 0.6.
The emulsion may be a negative emulsion or a directpositive emulsion which comprises fogged silver halide. In direct-positive emulsions fogging maybe effected by known means e.g., by lightand preferably, by chemical sensitization to fog e.g., by means of reducing agents such as hydroxylamine, hydrazine, formaldehyde, tin- (II)chloride, thiourea dioxide, etc., and/or by means of noble metal compounds such as gold compounds. In addition thereto fogging may also occur by increasing the pH of the emulsion by means of alkaline substances such as sodium or potassium hydroxide.
' The silver halides are dispersed in the common hydrophilic colloids such as gelatin, casein, zein, polyvinyl alcohol, carboxymethylcellulose, alginic acid, etc., gelatin being however favoured.
The amount of polymeric compound employed in the light-sensitive halide emulsion layer or in the colloid layer in water-permeable relationship therewith depends on theparticular compound, the particular type of emulsion and the desired effect and can vary within very wide limits. The optimum amount of each individual polymeric compound to be added is best determined for each particular type of emulsion by trial. Generally, the most suitable concentration in the particular colloid layer involved is comprised between 5 and 50 percent by weight relative to the weight of the hydrophilic colloid. The polymeric'compounds can be added in the form of loose powder but they are preferably added from an aqueous solution or dispersion (i.e., a latex) e.g., prepared as described above by emulsion polymerisation. In the form of a latex the polymeric compounds are easily incorporated in the hydrophilic thehydrophilic colloid, more particularly gelatin.
The silver halide emulsions of the radiation-sensitive elements comprising the polymeric compounds in accordance with the present invention may be chemically as well as spectrally sensitized. They may be chemically sensitized by any of the accepted procedures. The emulsions may be digested with naturally active gelatin or sulphur compounds may be added such as allyl thiocyanate, allyl thiourea, sodium thiosulphate, etc. The emulsions may also be sensitized by means of reductors for instance tin compounds as described in our United Kingdom Pat. Specification No. 789,823 and by means of small amounts of noble metal compounds e.g., of gold, platinum, palladium, iridium, ruthenium and rhodium as described by R. Koslowsky, Z.wiss.Phot.- 46, 67-72 (1951). Representative noble metal compounds are ammonium chloro palladate, potassium chloroplatinate, potassium chloroaurate and potassium aurithiocyanate. These chemical sensitizers can be added separately or together during no matter what step of emulsion preparation e.g., before, during or after the chemical ripening. I
The emulsions may further comprise compounds that sensitize the emulsion by development acceleration for example alkylene oxide polymers. These alkylene oxide polymers may be of various type e.g., polyethylene glycol having a molecular weight of 1500 or more, alky1-.
ene oxide condensation products or polymers as described among others in US. Pat. Nos. 1,970,578, 2,240,472, 2,423,549, 2,441,389, 2,531,832 and 2,533,990, in UnitedKingdom Pat. Specification Nos. 920,637, 940,051,945,340 and 991,608 and in Belgian Pat. Specification No. 648,710. Other compounds that sensitize the emulsion by development acceleration and that are suitable for use in combination with the polymeric compounds of use according to the invention are the quaternary ammonium and phosphonium compounds and ternary sulphonium compounds as well as onium derivatives of amino-N-oxides as described in United Kingdom Pat. Specification No. 1,121,696.
The emulsions may be spectrally sensitized e.g. by means of the common methine dyes such as neutrocyanines, basic or acid carboxyanines, rhodacyanines, hemicyanines, styryl dyes, oxonol dyes and the like. Such like spectrally sensitizing dyes have been described by F. M. Hamer in The cyanine dyes and related compounds (1964). Direct-positive emulsions may comprise desensitlzing dyes e.g., as described in United Kingdom Pat. Specification No. 1,155,404.
The emulsions may comprise the common emulsion stabilizers e.g., homopolar or salt-like compounds of mercury with aromatic and heterocyclic rings (e.g., mercaptotriazoles) simple mercury compounds, mercury sulphonium double salts and other mercury compounds of the kind described in Belgian Pat. Specification Nos. 524,121, 677,337, 707,386 and 709,195. Other suitable emulsion stabilizers are the azaindenes, particularly the tetraor pentaazaindenes and especially those substituted by hydroxyor amino groups. Suchlike compounds have been described by Birr in Z.wiss.Phot. 47, 2-58 (1952). The emulsions may further comprise as stabilizers heterocyclic nitrogencontaining mercapto compounds such as benzothlazoline-2-thione and 1-phenyl-5-mercapto-tetrazole, sulphinic acids such as benzene sulphinic acid and toluene sulphinic acid, thiosulphonic acids such as benzene thiosulphonic, acid, 'toluene' thiosulphonic acid, pchlorobenzene thiosulphonic acid sodium salt,"propyl thiosulphonic acid-potassium salt, butyl thiosulphonic acid potassium salt, etc. They may further'comprise'or be developed in the presence of compounds that are particularly effective as antifoggants for materials that are processed at elevated temperatures e.g.,heterocyclic compounds with nitro-substituents e.g., nitroindazole and nitrobenztriazole as described in French Pat. Specification No. 2,008,245, nitrobenzylidene pyridinium and nitrobenzylidene quinolinium compounds as well as the onium compounds described in published German Pat. Application No. 2040876; further the nitrobenzene compounds described in co-pending Application 43,517/71 and the nitrile compounds described in copending Application 43,5.18/71.
The photographic silver halide materials may further comprise surface active compounds, e.g., the fluorinated surfactants of United Kingdom Pat. No. 1,293,189, plasticizers, matting agents, e.g., polymethyl methacrylate and silica particles, colour couplers, hardening agents e.g., formaldehyde, dialdehydes, halogen substituted aldehyde acids such as mucochloric and mucobromic acid, etc.
As is known, in the automatic processing at elevated temperatures of radiation-sensitive silver halide elements it is preferred to use a hardening developer. in these developers the hardening agent is generally an aldehyde hardener particularly aliphatic dialdehydes e.g. maleic aldehyde and glutaraldehyde whichmay be used as such or in the form of their bisulphite addition products.
The following example illustrates the present invention.
EXAMPLE A silver bromoiodide X-ray emulsion (2 mole percent iodide) comprising per kg an amount of silver halide equivalent to 190 g of silver nitrate, 74 g of gelatin, 545 mg of 5-methyl-7-hydroxy-s-triazole[ l ,5 a]pyrimidine, 6.5 mg of 1-phenyl5-mercaptotetrazole and 0.45 mg of mercury cyanide was divided into three aliquot portions A, B and C.
The three emulsion portions were coated under identical circumstances on both sides of a polyethylene terephthalate support and then overcoated with a gelatin antistress layer comprising formaldehyde as. hardening agent. To the coating solutions of the gelatin protective layers for emulsions B and C, the latices of preparations A and B respectively were added in an amount of 25 percent by weight. of dry polymer relative to the amount of dry gelatin.
The materials were exposed through a continuous wedge with constant 0.15 and then automatically processed in a seconds processing machine. Development occurred for 2-3 seconds at 35C in Agfa- Gevaerts hardening developer for automatic processing G 138 which comprises hydroquinone and l-phenyl-3-pyrazolidinone as developing agents and glutaraldehyde as hardener.
The sensitometric results obtained are listed in the table below.
The values given for the speed are relative values with respect to reference material A, the speed of which has been given a value of 100.
The table also includes values for the abrasion resis-- tance (A.R.). These values are the pressures (in gram) necessaryfto be applied to a steel ball having a diameter of A inch to make it penetrate completely through the wet hydrophilic colloid layers (on both sides of the support) on which the ball is placed, when the ball is drawn over the material.
The value given for the sludge is the amount of sludge formed per sq.m of developed double-coated film material.
Material Fog Grad Relative A.R. g sludge I ation Speed side 1 side 2 sq. M
A 0.05 2,99 100 450 450 0.22 l 0.05 296 lol 70 XUU 0.12 C 0.05 2.85 llll) 800 900 i). l 9
mula:
n I \JH2%:
COOAOCONHR wherein:
X is hydrogen or methyl, g l A is a straight-chain or branched-chain C C,-, alkylene group, and
R is an alkyl or aryl group.
2. Photographic silver halide material according to claim 1 wherein the ratio of hydrophilic colloid binder to silver halide in the said emulsion layer is comprised between 0.2 and 0.6.
3. Photographic silver halide material according to claim 1, wherein the polymer is present in a protective l0 gelatin antistress layer.
4. Photographic material according to claim I, wherein the said polymeric compound is present in the said layer in an amount ot5 to percent by weight relative to the weight of the hydrophilic colloid.
5. Photographic material according to claim 1 wherein the emulsion is a silver bromoiodide emulsion.
6. Method of producing photographic images by processing of an exposed photographic silver halide material comprising at least one silver halide emulsion layer wherein the said emulsion layer or a hydrophilic colloid layer in water'permeable relationship therewith comprises a polymeric compound having recurring units of the formula:
wherein: Y
X is hydrogen or methyl,
A is a straight-chain or branched-chain C C alkylene group, and
R is an alkyl or aryl group.
7. Method according to claim 6, wherein processing occurs at a temperature above 30C.
8. Method according toclaim. 6, wherein the said polymeric compound is present in the said layer in an amount of 5 to 50 percent by weight relative to the weight of dry hydrophilic colloid.
9. Method according to claim 6, wherein in the said emulsion layer the ratio of hydrophilic colloid to silver halide is comprised between 0.2 and 0.6.
10. Method according to claim 6, wherein the emul sion is a silver bromoiodide emulsion.
11. Method according to claim 6, wherein the polymer is present in a protective gelatin antistress layer.
12. Method according to claim 6, wherein processing occurs by means of a hardening developer.
13. Method according to claim 12, wherein the developer comprises glutaraldehyde.
l= l= l l= l
Claims (13)
1. PHOTOGRAPHIC SLVER HALIDE MATERIAL TO BE FURTHER PROCESSED COMPRISING A SUPPORT AND AT LEAST NE SILVER HALIDE EMULSION LAYER WHEREIN THE SAID EMULSION LAYER OR A HYDROPHILLIC COLLOID LAYER IN WATER-PERMEABLE RELATIONSHIP WITH THE SAID EMULSION LAYER COMPRISES A POLYMERIC COMPOUND COMPRISING RECURRING UNITS OF THE FORMULA:
2. Photographic silver halide material according to claim 1 wherein the ratio of hydrophilic colloid binder to silver halide in the said emulsion layer is comprised between 0.2 and 0.6.
3. Photographic silver halidE material according to claim 1, wherein the polymer is present in a protective gelatin antistress layer.
4. Photographic material according to claim 1, wherein the said polymeric compound is present in the said layer in an amount of 5 to 50 percent by weight relative to the weight of the hydrophilic colloid.
5. Photographic material according to claim 1 wherein the emulsion is a silver bromoiodide emulsion.
6. Method of producing photographic images by processing of an exposed photographic silver halide material comprising at least one silver halide emulsion layer wherein the said emulsion layer or a hydrophilic colloid layer in water-permeable relationship therewith comprises a polymeric compound having recurring units of the formula:
7. Method according to claim 6, wherein processing occurs at a temperature above 30*C.
8. Method according to claim 6, wherein the said polymeric compound is present in the said layer in an amount of 5 to 50 percent by weight relative to the weight of dry hydrophilic colloid.
9. Method according to claim 6, wherein in the said emulsion layer the ratio of hydrophilic colloid to silver halide is comprised between 0.2 and 0.6.
10. Method according to claim 6, wherein the emulsion is a silver bromoiodide emulsion.
11. Method according to claim 6, wherein the polymer is present in a protective gelatin antistress layer.
12. Method according to claim 6, wherein processing occurs by means of a hardening developer.
13. Method according to claim 12, wherein the developer comprises glutaraldehyde.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB2938672A GB1429649A (en) | 1972-06-22 | 1972-06-22 | Unsaturated carboxylic esters of hydroxyalkyl carbamates addition polymers derived thereform and photographic silver halide materials containing said polymers |
Publications (1)
Publication Number | Publication Date |
---|---|
US3867152A true US3867152A (en) | 1975-02-18 |
Family
ID=10290744
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US364327A Expired - Lifetime US3867152A (en) | 1972-06-22 | 1973-05-29 | Photographic silver halide material |
Country Status (4)
Country | Link |
---|---|
US (1) | US3867152A (en) |
BE (1) | BE800655A (en) |
DE (1) | DE2329142A1 (en) |
GB (1) | GB1429649A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5254441A (en) * | 1991-10-01 | 1993-10-19 | Eastman Kodak Company | Development inhibitor reflector layers |
US5298376A (en) * | 1991-10-01 | 1994-03-29 | Eastman Kodak Company | Photographic silver halide material with improved color saturation |
US6150071A (en) * | 1998-10-15 | 2000-11-21 | 3M Innovative Properties Company | Fabrication process for flex circuit applications |
JP2010043079A (en) * | 2008-08-08 | 2010-02-25 | Bayer Materialscience Ag | Urethane acrylate based on phenyl isocyanate, production method thereof, and usage thereof |
CN109562596A (en) * | 2016-08-10 | 2019-04-02 | 阿科玛法国公司 | The compound of functional group containing cyclic structure primitive, urethane/urea base connection unit and free redical polymerization |
CN115960017A (en) * | 2021-10-08 | 2023-04-14 | 上海华峰龙湾技术有限公司 | Modified acrylate monomer and photocurable resin thereof |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2623128A1 (en) * | 1976-05-22 | 1977-12-08 | Bayer Ag | NETWORKABLE POLYMERS |
JP5792746B2 (en) | 2010-02-02 | 2015-10-14 | バイエル・インテレクチュアル・プロパティ・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツングBayer Intellectual Property GmbH | Photosensitive polymer composition containing ester-based writing monomer |
EP2531892B1 (en) | 2010-02-02 | 2016-01-27 | Covestro Deutschland AG | Use of a photopolymer formulation with triazine-based writing monomers |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3316097A (en) * | 1964-12-21 | 1967-04-25 | Eastman Kodak Co | Photographic element |
US3488708A (en) * | 1965-12-20 | 1970-01-06 | Eastman Kodak Co | Photographic materials containing novel polymers |
US3607290A (en) * | 1968-01-08 | 1971-09-21 | Minnesota Mining & Mfg | Polymer-containing silver halide photographic emulsions, preparation thereof and photographic elements produced therefrom |
US3775129A (en) * | 1971-04-16 | 1973-11-27 | Ilford Ltd | Photographic gelatino silver halide emulsion |
-
1972
- 1972-06-22 GB GB2938672A patent/GB1429649A/en not_active Expired
-
1973
- 1973-05-29 US US364327A patent/US3867152A/en not_active Expired - Lifetime
- 1973-06-07 DE DE2329142A patent/DE2329142A1/en active Pending
- 1973-06-08 BE BE1005132A patent/BE800655A/en unknown
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3316097A (en) * | 1964-12-21 | 1967-04-25 | Eastman Kodak Co | Photographic element |
US3488708A (en) * | 1965-12-20 | 1970-01-06 | Eastman Kodak Co | Photographic materials containing novel polymers |
US3607290A (en) * | 1968-01-08 | 1971-09-21 | Minnesota Mining & Mfg | Polymer-containing silver halide photographic emulsions, preparation thereof and photographic elements produced therefrom |
US3775129A (en) * | 1971-04-16 | 1973-11-27 | Ilford Ltd | Photographic gelatino silver halide emulsion |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5254441A (en) * | 1991-10-01 | 1993-10-19 | Eastman Kodak Company | Development inhibitor reflector layers |
US5298376A (en) * | 1991-10-01 | 1994-03-29 | Eastman Kodak Company | Photographic silver halide material with improved color saturation |
US6150071A (en) * | 1998-10-15 | 2000-11-21 | 3M Innovative Properties Company | Fabrication process for flex circuit applications |
JP2010043079A (en) * | 2008-08-08 | 2010-02-25 | Bayer Materialscience Ag | Urethane acrylate based on phenyl isocyanate, production method thereof, and usage thereof |
CN109562596A (en) * | 2016-08-10 | 2019-04-02 | 阿科玛法国公司 | The compound of functional group containing cyclic structure primitive, urethane/urea base connection unit and free redical polymerization |
CN109562596B (en) * | 2016-08-10 | 2022-02-01 | 阿科玛法国公司 | Compounds containing cyclic structural units, urethane/ureido linking units and free-radically polymerizable functional groups |
US11680039B2 (en) | 2016-08-10 | 2023-06-20 | Arkema France | Compounds containing cyclic structural elements, urethane/ureido linkages and a free radical-polymerizable functional group |
CN115960017A (en) * | 2021-10-08 | 2023-04-14 | 上海华峰龙湾技术有限公司 | Modified acrylate monomer and photocurable resin thereof |
Also Published As
Publication number | Publication date |
---|---|
DE2329142A1 (en) | 1974-01-10 |
BE800655A (en) | 1973-12-10 |
GB1429649A (en) | 1976-03-24 |
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