US3863086A - Coated pattern mask for use in forming a color CRT screen structure and method for coating the mask - Google Patents

Coated pattern mask for use in forming a color CRT screen structure and method for coating the mask Download PDF

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Publication number
US3863086A
US3863086A US310706A US31070672A US3863086A US 3863086 A US3863086 A US 3863086A US 310706 A US310706 A US 310706A US 31070672 A US31070672 A US 31070672A US 3863086 A US3863086 A US 3863086A
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Prior art keywords
coating
mask
apertured
cathode ray
ray tube
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US310706A
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English (en)
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Kenneth Speigel
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GTE Sylvania Inc
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GTE Sylvania Inc
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Priority to US310706A priority Critical patent/US3863086A/en
Priority to CA182,606A priority patent/CA1011389A/en
Priority to DE2358974A priority patent/DE2358974B2/de
Priority to BE2053249A priority patent/BE807945A/xx
Priority to FR7342556A priority patent/FR2209206B3/fr
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Publication of US3863086A publication Critical patent/US3863086A/en
Assigned to NORTH AMERICAN PHILIPS CONSUMER ELECTRONICS CORP. reassignment NORTH AMERICAN PHILIPS CONSUMER ELECTRONICS CORP. ASSIGNS ITS ENTIRE RIGHT TITLE AND INTEREST, UNDER SAID PATENTS AND APPLICATIONS, SUBJECT TO CONDITIONS AND LICENSES EXISTING AS OF JANUARY 21, 1981. (SEE DOCUMENT FOR DETAILS). Assignors: GTE PRODUCTS CORPORATION A DE CORP.
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
    • H01J9/22—Applying luminescent coatings
    • H01J9/227—Applying luminescent coatings with luminescent material discontinuously arranged, e.g. in dots or lines

Definitions

  • a first coating material disposed as a substantially semiporous coating to reduce the sizes of the initially defined apertures is of a discrete material substantially absorbant and non-reflective of ultraviolet radiant energy in substantially the 340 to 380 nanometer range.
  • a second coating of a substantially ultraviolet transparent permeative binder solution is applied thereover in a manner to impregnate the first coating material and form a compacture therewith to provide improved adherence and abrasion resistance therefor.
  • An improved method is taught for applying the temporal duo-coatings to the apertured mask member.
  • This invention relates to color cathode ray tubes and more particularly to improved mask modifications means utilized in the forming of a patterned color screen structure.
  • Color cathode ray tubes such as those employed i television applications, usually have patterned screen structures comprised of repetitive groups of related phosphor materials. These groupings are-conventionally disposed as bars, stripes, or dots depending upon the particular type of color tube considered.
  • the related screen pattern is usually composed of a vast multitude of substantially round or discretely elongated dots formed of selected cathodoluminescent phosphors, which, upon predetermined electron excitation, produce additive primary hues to provide the desired color imagery.
  • the individual dots comprising the screen pattern are often separated by relatively small interstitial spacings to provide improved color purity by reducing the possibility of electron excitation of adjacent dots.
  • Each of the apertures therein being of a substantially round or elongated shaping, is cognitively related to a specific grouping of similar-shaped phosphor dots, comprising the spatially related screen pattern, in a manner to enable the selected electron beams traversing the apertures to impinge the proper dots therebeneath.
  • each phosphor dot is defined by a substantially dark opaque encompassment which collectively comprises a foraminous pattern in the form of a windowed webbing having an array of substantially opaque connected interstices.
  • Such web-like structures have been fabricated, either before or after screening, by several known processes wherein photo-deposition techniques play a prominent part.
  • An example of a typical web-forming procedure is disclosed in Ser. No. 41,535 by R. L. Bergamo et al., filed May 28, 1970, assigned to the assignee of this invention and now abandoned.
  • a pattern of clear polymerized PVA dots is light disposed on the panel, on those areas subsequently to be windows in the opaque webbing, by photo-exposure through the related apertured shadow mask.
  • the resultant island-like polymerized dots are reduced in size by an erosion technique involving a chemical degrading agent.
  • an opaque graphite coating is applied to completely overcoat the pattern of the reduced-in-size clear dots and the adjacent bare interstitial glass areas.
  • an oxidizing agent is applied to completely degrade the pattern of dots thereby lossening the superjacent opaque coating thereon, whereupon the materials so loosened are removed by a subsequent water development step.
  • an opaque interstitial web having multudinous windows defined as bare glass areas that are of a size smaller than the related mask apertures.
  • the phosphor pattern elements are then disposed on these window areas upon photo-exposure through the same size mask apertures by one of the various processes known to the art. While the aforedescribed dot-erosion procedure is an acceptable production technique, it necessitates the inclusion of additional process steps.
  • the mask apertures are subjected to a chemical etching process to enlarge their sizes thereby effecting the desired dimensional differential between the final-sized apertures and the formed windows in the interstitial webbing.
  • the aperture etching requires additional closely controlled processing steps.
  • metallurgical inconsistencies of the mask material have been evidenced such as a ragged aperture periphery, a weakening of the mask material per se and destruction of the desirable dark oxide coating on the surface of the mask.
  • etching of the mask apertures is an inherently costly procedure as it precludes any subsequent reuse of masks which ordinarily could be salvagable from the final stages of the tube manufacturing operation.
  • the prior art is replete with a variety of techniques for modifying the size of the shadow mask apertures for utilization in the forming or operation of specific types of color screen structures.
  • the changing of aperture sizes is executed by the deposition within the aperture openings of peripheral fill-in substances applied, as for example, by painting, dipping, electrophoresis, electroplating and vaporization.
  • the results of the respective depositions and their subsequent removals have been evidenced by varying degrees of success involving additional concomitant procedures and expense.
  • the controlled quality aspects has been annoyingly unsatisfactory.
  • apatterned cathode ray tube shadow mask formed of a temporarily modified multi-apertured metallic pattern member having integral strengthening means conjunctive with the periphery thereof.
  • the sizes of the apertures in the mask are temporarily modified in an improved manner for utilization in selected steps of the procedure for fabricating the windowed opaque webbing and the overlying phosphor elements of the multiplex color screen structure.
  • the improvement in the temporarily modified apertured member is in the form of a basic or first coating of a substantially semiporous structure applied in a manner, such as by electrophoretic deposition, to effect predeterminate temporal reduction in the sizes of the initially defined apertures.
  • the first coating being of a discrete material substantially absorbant and non-reflective of ultraviolet radiant energy in substantially the 340 to 380 nanometer range, has the chemical characteristic of being soluble in a solvent that is non-destructive to the metallic mask material.
  • a second coating material differing from that of the first coating, is uniformly applied over the first coating material.
  • the second material is a permeative binder solution substantially ultraviolet transparent in the form of, for example, a polyhydric secondary alcohol which is applied in a manner to impregnate and provide improved adherence and abrasion resistance for the semiporous first coating material.
  • An improved plural-step method is taught for sequentially applying the related duo-coatings to the apertured pattern member.
  • FIG. 1 is a prior art view of a color cathode ray tube in an operable environment and partially in section showing the relationship of the multi-apertured shadow mask to the patterned screen structure disposed on the viewing panel of the tube;
  • FIG. 2a is an enlarged sectional view of the apertured pattern member of the mask showing the invention
  • FIG. 3 is a sectional view illustrating a procedure for electrophoretically coating the mask
  • FIG. 4 is a graphic presentation showing the relationship between mask-coating thickness and anodecathode spacing during the coating procedure.
  • FIGS. 5a and 5b are enlarged sectional manifestations illustrating individual apertures in an exemplary mask coating gradient.
  • FIG. 1 a prior art view illustrating a shadow mask type of color cathode ray tube ll in an operable environment denoted diagrammatically as 12.
  • the encompassing envelope 13 of the tube includes a funnel portion 15 to which a viewing panel 17 is suitably attached as by a continuous bead of bonding frit 19.
  • a metallic shadow mask structure 21 which comprises a curved or domed multiapertured pattern member 23 formed of, for example, an iron alloy material having a strengthening means or perimetral frame 25 integral with the periphery thereof.
  • This peripheral frame has a plurality of positioning means 27, attached at spaced-apart locations thereon, which mate with supporting protuberances such as metal studs 29 projecting inwardly from the sidewall portion 31 of the viewing panel 17.
  • a patterned screen structure 33 Disposed on the interior surface of the viewing panel is a patterned screen structure 33, the elements of which are formed in accordance with the apertures 35 in the adjacent mask pattern member 23, the substantially domed contour of the mask being related to the surface contour of the interior of the panel.
  • the multiplex patterned screen structure is comprised of repetitive groupings of two or more elemental cathodoluminescent areas of different phosphors overlaid on the discretely formed window areas of the opaque interstitial webbing portion of the structure 33.
  • the opaque interstitial webbing 37 has an exemplary window area 39 which is dimensioned as a; such is intended to be normally representative of the multitudinous windows therein.
  • the window openings per se are substantially round, elongated, or of other discrete shapings in keeping with the screen pattern desired.
  • Overlaid on each of the window areas is a related phosphor area, of which phosphor pattern element 43 is representative of one of the pattern components.
  • the phosphor area is dimensioned as b being at least as large as or preferably larger than the associated window area 39. To facilitate clarity in the drawing, the usually present aluminum coating or backing on the screen structure is omitted. Spaced rearward from the screen structure 33 is the shadow mask multi-opening pattern member 23, wherein a representative aperture denoted as 35, is dimensioned as c and is larger than the related window area 39.
  • the aforementioned windows and related phosphor areas are usually formed in accordance with the shapings of the apertures by known photo-exposure techniques.
  • An exemplary electron beam 45, emanating within the tube from a source not shown, is directed toward the mask-screen assembly 47.
  • the present invention provides an improvement in the temporary modification of the apertured pattern member of the shadow mask; the temporary modification being utilized in selected steps of the procedure for fabricating the windowed opaque webbing and the associated phosphor elements of a window-limited color screen structure.
  • This apertured member for example, is formed of a basic material 53 such as S.A.E. 1010 cold rolled steel having a conventional thickness d within the range of 0.005 to 0.007 inch, and is normally domed in a manner related to the interior contour of the viewing panel as priorly shown in FIG. 1.
  • the mask structure is priorly subjected to a known controlled atmospheric heat treatment to form a dark coating comprising a mixture of iron oxides, not shown, on both the inner and outer surfaces thereof.
  • An exemplary initially formed aperture 55 in the pattern member material 53 is dimensioned as e and may be in the order of 0.0145 inch.
  • the invention being a temporary coated modification 56 of the mask member is consummated by applying a first coating 57 to the apertured member 51 to effect a predeterminate reduction in the order of 0.0015 to 0.0025 inch in the sizes of the initially defined apertures in the pattern member.
  • This first coating is in the form of at least one uniformly disposed substantially semiporous application of a discrete particulate material that is applied, for example, by electrophoretic deposition.
  • the coating material is substantially absorbant and non-reflective of ultraviolet radiant energy in substantially the 340 to 380 nanometer range.
  • the uv absorbent material prevents deleterious reflection of the actinic exposure radiation thereby promoting better control of the exposure technique with marked improvements in size control and definition of the respective resultant patterns.
  • the first coating material has the chemical characteristic of being soluble in an easily removed substance nondestructive to the mask material.
  • This electrophoretically applied first coating is an opaque minutely particulate material selected. for example, from the group consisting essentially of zinc oxide, titanium dioxide. and a mixture of zinc oxide and titanium dioxide.
  • a first coating thickness of such materials being defined asfeffectively decreases the size of the aperture 55 from, for example, 0.0145 inch to the reduced dimension ofg which may be of a modified value such as 0.012 to 0.013 inch.
  • An application of a second coating material 61 is uniformly applied as a permeative coating over the first coating 57.
  • the second coating material differs from the first coating material and is disposed in at least one uniform application of a substantially ultraviolet transparent synthetic binder solution in the form of, for example, a polyhydric secondary alcohol, such as polyvinyl alcohol,- which wets and impregnates the substantially semiporous first coating material thereby imparting improved adherence and abrasion resistance thereto.
  • a substantially ultraviolet transparent synthetic binder solution in the form of, for example, a polyhydric secondary alcohol, such as polyvinyl alcohol,- which wets and impregnates the substantially semiporous first coating material thereby imparting improved adherence and abrasion resistance thereto.
  • a polyhydric secondary alcohol such as polyvinyl alcohol
  • the second coating 61 permeates the minutely particulate material of the semiporous first coating 57 whereupon only a thin film or residuum is evidenced on the surface of the first layer.
  • the final dimension of the aperture 55 is denoted as k which substantially equals the first coating modified aperture dimension g.
  • FIG. 2b an enlarged sectional view of a portion of the mask-screen assembly 49 is shown wherein the duo-coated temporarily modified mask 51 is positioned utilization in fabricating the windowed interstitial webbing of the color screen structure.
  • a substantially clear photosensitive resist material 63 such as dichromated polyvinyl alcohol
  • the affected area of sensitized coating is light-polymerized as a pattern dot having the dimension m, this being directly related to the dimension n of the light beam which is sized by the modified aperture 55.
  • This polymerized pattern dot 67 subsequently becomes a window in the opaque interstitial webbing of the color screen structure such as taught in the previously mentioned web-forming procedure disclosed in US. patent application Ser. No. 41,535 by R. L. Bergamo et al., now abandoned.
  • the temporary duo-coatings 57 and 61 are expe ditiously and completely removed from the shadow mask by treatment with a weak solvent, such as acetic acid, followed by a water rinse.
  • a weak solvent such as acetic acid
  • Such coating removal treatment is in no way deleterious to the mask material.
  • Th precisely formed apertures are maintained as initially fabricated, and the dark iron oxide coating formed on the surface of the mask material is desirably retained to enhance uniform heat radiation in the finished tube.
  • FIG. 3 wherein an improved electrophoretic coating apparatus 71 is illustrated.
  • a shadow mask structure 73 having a domed apertured portion 75 peripherally attached to a frame-like strengthening means 77, is invertedly positioned in a manner that only the apertured portion is immersed in an electrophoretic bath of a first coating suspension 79.
  • a plurality of supportive means 81 attached in a spaced-apart manner about the mask frame 77, are mated with stud-like projections 83extending from mask holding means 85.
  • This partially shown mask holding means is constructed to move the mask in a vertical predetermined manner to effect immersion and removal of the domed apertured portion 75 into and out of the electrophoretic suspension 79 by actuation means not shown.
  • the coating suspension is held by a non-conductive liquid-holding container 87 having sufficient depth to accommodate a formed foraminous electrode 89 which is edge supported by a perimetric frame 91 positioned relative to the bottom 93 of the coating bath container.
  • the foraminous electrode 89 being formed of a mesh or multitudinous apertured material is shaped to a contour relative to that of the domed aperture portion 75 of the mask to which it is spacedly related when the mask is immersed in the coating suspension 79.
  • the functioning area of the electrode 89 at least equals the area of the apertured portion 75.
  • the multitudinous openings 95 in the electrode are, for example, in the order of from to mils in diameter, being much larger than the solid particles comprising the coating suspension 79.
  • Electrical connections 97 and 99 from a dc. electrical supply 101 are connected through switching means 103 to the electrode 89 and mask 73 to effect coating deposition on the mask apertured portion 75.
  • the foraminous electrode is the anode and the mask the cathode to effect cataphoretic deposition of the suspension solids on the mask 73.
  • a supply of the first coating suspension 79 is contained in reservoir 105 wherein agitation means 107 maintains the suspension.
  • Valving means 109 regulates the flow of the coating suspension from the reservoir through the piping 111 to the apparatus coating container 87.
  • Within the container are a plurality of spaced-apart agitation means 113, such as ultrasonic or fluid vibrators, which are operated to continue the suspension and expedite flow of the suspended particles through the foraminous electrode.
  • Several spaced apart out-flow means 115 maintain the level of suspension within the container. The several outflow means discharge into a collector reservoir 117.
  • the first coating electrophoretic bath is a suspension of an opaque minutely particulate uv absorptive material selected from the group consisting essentially of zinc oxide, titanium dioxide, and a mixture of zinc oxide and titanium dioxide.
  • These suspended solids are preferably of sub-micron size particles having a mean particle size within the range of approximately 0.10 to 0.20 micron. The upper limit of particle size should not exceed substantially 5.0 microns.
  • Zinc oxide is preferred because of its property of being readily soluble in a weak acid. While on the other hand, it appears that minute particles of titanium dioxide are readily maintained in long-life suspension, the resultant coating is not appreciably dissolvable in a desired weak type of solvent, such as acetic acid. Therefore, when employing the long-life suspension characteristics of titanium dioxide, sufficient zinc oxide should be present to assure subsequent removal of the temporal coated modification 56 from the mask material 53. Two procedures for utilizing titanium dioxide are:
  • the liquid vehicle of the suspension is comprised of a C C; monohydric alcohol. such as methanol and/or ethanol, combined with a C -C monohydric alcohol, such as a propyl, butyl or amyl alcohol. or mixtures of the same, and water.
  • a C C monohydric alcohol
  • a C -C monohydric alcohol such as a propyl, butyl or amyl alcohol. or mixtures of the same, and water.
  • a small amount of aluminum nitrate is included to promote electrical conductivity.
  • a generic formulation per liter for cataphoretic deposition comprises, for example:
  • a preferential cataphoretic formulation per liter comprises, for example:
  • the coating procedure is accomplished by invertedly positioning the domed apertured pattern member 75 of the shadow mask in the first coating bath 79 to a predetermined depth in spaced relationship to the aforedescribed foraminous electrode structure 89 as for example in the order of 0.5 to 1.0 inch spacing. Movement is initiated within the electrophoretic bath by activation of the plural agitation means 113. The dc. power supply 101 is then activated to apply an electrical potential of, for example, to 200 volts to establish a coating application current of a sufficiency, such as 2 amperes. between the mask 73 (cathode) and the electrode 89 (anode); the voltage being dependent upon the interelectrode anode-to-cathode spacing therebetween.
  • a sufficiency such as 2 amperes.
  • electrical potential activation period of from one to two minutes effects a semiporous cataphoretic deposition of from 1 to 15 mils of particulate material, such as zinc oxide, on the pattern portion of the mask which temporarily modifies or reduces the size of the apertures therein.
  • the mask Upon inactivation of the dc. supply, the mask is-removed vertically from the coating suspension by a relatively rapid withdrawal, whereupon the mask is turned dome-up to allow the residual liquid coating to flatten or evenly spread thereover.
  • the mask is then dried in any appropriate orientation. It has been found expeditious to make a second or repeat application of the first coating material to achieve the desired coating build-up to further reduce the aperture dimensioning. Sequential applications of a relatively thin coating deposition, such as approximately 1 mil of thickness, produces a composite first coating that is less prone to crack, and one wherein slight irregularities become smoothed and minimized.
  • FIG. 4 a graphic presentation illustrates the relationship between mask-coating thickness and anode-to-cathode spacing during the electrophoretic coating procedure.
  • the current density varies in accordance with the inter-electrode spacing, the closer the electrodes, the thicker the coating.
  • the mask apertured portion 75 having a basic metallic thickness of d may for purposes of illustration have a zero gradient basic aperture array, i.e., wherein all of the apertures formed thereacross in the metallic mask material are of substantially the same dimensioning e.
  • the cathode-to-anode spacing at x is greater than at'w; therefore, the thickness of the coating deposition r at location x is less than coating thickness r at w.
  • the coated mask thickness evidences a gradually increasing thickness from s to s', whereof the gradient of aperture dimensions exhibits a gradual reduction from k to k.
  • a second coating 61 of a binder material is next applied to the coated mask to permeate the semiporous first coating.
  • Application is accomplished by a suitable wetting procedure such as by dipping or immersing only the domed apertured portion 23 of the mask structure into a vat, not shown, containing the second coating binder material.
  • a suitable wetting procedure such as by dipping or immersing only the domed apertured portion 23 of the mask structure into a vat, not shown, containing the second coating binder material.
  • one immersion application is sufficient to provide enough binder to adequately permeate the first coating.
  • An exemplary second coating uv transparent binder solution comprises:
  • said apertured pattern member of said mask by said supportive means in a first coating electrophoretic bath to a predetermined depth in spaced relationship to a shaped foraminous electrode structure immersed in said bath, said bath including suspended particulate solids of a material substantially absorbent of ultraviolet radiation in substantially the 340 to 380 nanometer range, the openings in said foraminous electrode being larger than said solid particles;
  • a method for temporarily modifying the apertured pattern member of a cathode ray tube mask according to claim 1 wherein said second coating permeative binder solution comprises:
  • a cathode ray tube patterned metallic aperture mask formed of a multi-apertured pattern member having strengthening means conjunctive with the periphery thereof and having a plurality of positioning means attached relative to said strengthening means to facilitate orientation of said mask within the viewing panel of a color cathode ray tube, said apertured pattern member being temporarily modified in an improved manner for utilization in selected steps of the procedure for fabrieating a patterned screen structure disposed on the interior surface of said panel having an interior contour related to that of said apertured mask member, the improvement in said temporary modification comprising:

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US310706A 1972-11-30 1972-11-30 Coated pattern mask for use in forming a color CRT screen structure and method for coating the mask Expired - Lifetime US3863086A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
US310706A US3863086A (en) 1972-11-30 1972-11-30 Coated pattern mask for use in forming a color CRT screen structure and method for coating the mask
CA182,606A CA1011389A (en) 1972-11-30 1973-10-03 Method for coating a pattern mask for a color crt screen
DE2358974A DE2358974B2 (de) 1972-11-30 1973-11-27 Verfahren zum photographischen Drukken der Schirmstruktur eines Bildschirms einer Farbbildröhre
BE2053249A BE807945A (fr) 1972-11-30 1973-11-29 Masque reticule revetu utilisable pour la formation d'une structure d'ecran d'un tube a rayons cathodiques du type couleur, et son procede de revetement
FR7342556A FR2209206B3 (show.php) 1972-11-30 1973-11-29

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Application Number Priority Date Filing Date Title
US310706A US3863086A (en) 1972-11-30 1972-11-30 Coated pattern mask for use in forming a color CRT screen structure and method for coating the mask

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US3863086A true US3863086A (en) 1975-01-28

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US (1) US3863086A (show.php)
BE (1) BE807945A (show.php)
CA (1) CA1011389A (show.php)
DE (1) DE2358974B2 (show.php)
FR (1) FR2209206B3 (show.php)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5148082A (en) * 1989-07-11 1992-09-15 Kabushiki Kaisha Toshiba Color picture tube with light absorbing layer on screen

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3360450A (en) * 1962-11-19 1967-12-26 American Optical Corp Method of making cathode ray tube face plates utilizing electrophoretic deposition
US3525679A (en) * 1964-05-05 1970-08-25 Westinghouse Electric Corp Method of electrodepositing luminescent material on insulating substrate
US3554889A (en) * 1968-11-22 1971-01-12 Ibm Color cathode ray tube screens
US3600213A (en) * 1969-09-12 1971-08-17 Buckbee Mears Co Aperture masks
US3616732A (en) * 1969-11-06 1971-11-02 Buckbee Mears Co Aperture mask optical system
US3653900A (en) * 1969-08-15 1972-04-04 Zenith Radio Corp Selective etching process for changing shadow-mask aperture size
US3661581A (en) * 1969-12-30 1972-05-09 Rca Corp Method for photodepositing smaller size image screen areas for cathode ray tube from larger size mask apertures
US3688360A (en) * 1969-12-24 1972-09-05 Hitachi Ltd Method of manufacturing color picture tubes
US3764514A (en) * 1972-11-30 1973-10-09 Gte Sylvania Inc Apparatus for coating a pattern mask for use in forming a color crt screen structure
US3794873A (en) * 1972-11-06 1974-02-26 Zenith Radio Corp Interchangeable shadow mask

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3360450A (en) * 1962-11-19 1967-12-26 American Optical Corp Method of making cathode ray tube face plates utilizing electrophoretic deposition
US3525679A (en) * 1964-05-05 1970-08-25 Westinghouse Electric Corp Method of electrodepositing luminescent material on insulating substrate
US3554889A (en) * 1968-11-22 1971-01-12 Ibm Color cathode ray tube screens
US3653900A (en) * 1969-08-15 1972-04-04 Zenith Radio Corp Selective etching process for changing shadow-mask aperture size
US3600213A (en) * 1969-09-12 1971-08-17 Buckbee Mears Co Aperture masks
US3616732A (en) * 1969-11-06 1971-11-02 Buckbee Mears Co Aperture mask optical system
US3688360A (en) * 1969-12-24 1972-09-05 Hitachi Ltd Method of manufacturing color picture tubes
US3661581A (en) * 1969-12-30 1972-05-09 Rca Corp Method for photodepositing smaller size image screen areas for cathode ray tube from larger size mask apertures
US3794873A (en) * 1972-11-06 1974-02-26 Zenith Radio Corp Interchangeable shadow mask
US3764514A (en) * 1972-11-30 1973-10-09 Gte Sylvania Inc Apparatus for coating a pattern mask for use in forming a color crt screen structure

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5148082A (en) * 1989-07-11 1992-09-15 Kabushiki Kaisha Toshiba Color picture tube with light absorbing layer on screen

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DE2358974B2 (de) 1978-08-03
FR2209206B3 (show.php) 1976-10-15
FR2209206A1 (show.php) 1974-06-28
CA1011389A (en) 1977-05-31
BE807945A (fr) 1974-05-29
DE2358974A1 (de) 1974-06-12

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Effective date: 19810708