US3851202A - Method and apparatus for increasing the useful life of a quartz envelope in a high power light source - Google Patents

Method and apparatus for increasing the useful life of a quartz envelope in a high power light source Download PDF

Info

Publication number
US3851202A
US3851202A US00309808A US30980872A US3851202A US 3851202 A US3851202 A US 3851202A US 00309808 A US00309808 A US 00309808A US 30980872 A US30980872 A US 30980872A US 3851202 A US3851202 A US 3851202A
Authority
US
United States
Prior art keywords
quartz
envelope
arc
titanium
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US00309808A
Inventor
H Troue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Union Carbide Corp
Original Assignee
Union Carbide Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Union Carbide Corp filed Critical Union Carbide Corp
Priority to US00309808A priority Critical patent/US3851202A/en
Priority to DE2358573A priority patent/DE2358573A1/en
Priority to JP48131827A priority patent/JPS4984084A/ja
Application granted granted Critical
Publication of US3851202A publication Critical patent/US3851202A/en
Assigned to MORGAN GUARANTY TRUST COMPANY OF NEW YORK, AND MORGAN BANK ( DELAWARE ) AS COLLATERAL ( AGENTS ) SEE RECORD FOR THE REMAINING ASSIGNEES. reassignment MORGAN GUARANTY TRUST COMPANY OF NEW YORK, AND MORGAN BANK ( DELAWARE ) AS COLLATERAL ( AGENTS ) SEE RECORD FOR THE REMAINING ASSIGNEES. MORTGAGE (SEE DOCUMENT FOR DETAILS). Assignors: STP CORPORATION, A CORP. OF DE.,, UNION CARBIDE AGRICULTURAL PRODUCTS CO., INC., A CORP. OF PA.,, UNION CARBIDE CORPORATION, A CORP.,, UNION CARBIDE EUROPE S.A., A SWISS CORP.
Assigned to UNION CARBIDE CORPORATION, reassignment UNION CARBIDE CORPORATION, RELEASED BY SECURED PARTY (SEE DOCUMENT FOR DETAILS). Assignors: MORGAN BANK (DELAWARE) AS COLLATERAL AGENT
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00Gas-discharge or vapour-discharge lamps
    • H01J61/02Details
    • H01J61/38Devices for influencing the colour or wavelength of the light
    • H01J61/40Devices for influencing the colour or wavelength of the light by light filters; by coloured coatings in or on the envelope

Definitions

  • This invention relates generally to high power arc light sources and more particularly to an apparatus and method for increasing the useful-life of the light transmittingenvelope in a high power arc light source and in particular to a light source whose arc generates a high intensity predominately continuous spectral distribution of light including ultraviolet short wave radiation below 1600 Angstroms.
  • high power arc light radiators particularly for generating radiant energy in the short wave length ultraviolet region
  • arc radiation type wherein a pair of electrodes are spaced at opposite ends within an arc chamber defined by a transparent tubular envelope which is almost invariably formed from quartz.
  • These devices usually operate with a continuous flow of swirling inert gas injected into the pressurized chamber in the space between the electrodes.
  • inert gas any inert gas may be employed, argon is preferred because of availability and economics of operation.
  • double envelopes had some serious disadvantages, namely; they increased the complexity and cost of the sources and they decreased the radiant output since there were two mediums through which the light had to be transmitted.
  • the present invention is concerned solely with increasing the reliability and permissible accumulated operating times of arc light sources by increasing the longevity of the quartz envelope, i.e., rendering the envelope less susceptible to deterioration and more tolerable to the harsh environment and intense radiation to which it is subjected.
  • FIG. 1 schemetically illustrates, in longitudinal vertical section, a typical high power are radiation source to which the invention is uniquely adapted;
  • FIG. 1A illustrates a section of one embodiment of the quartz envelop of FIG. 1 where the quartz is composed of laminated sections;
  • FIG. 2 is a graph of a typical spectral radiance distribution of the light emitted from the radiation source of FIG. 1.
  • the illustrated apparatus shown in FIG. 1 generally comprises a pair of spaced electrodes 12 and 14 respectively, which are axially aligned within a pressurized gas tight arc chamber 16 formed from a transparent quartz envelope 20.
  • Each electrode is of nozzle type construction having a centrally disposed bore. It is to be understood however that the invention is neither limited to the specific arc source assembly shown in FIG. 1 nor to hollow type electrodes.
  • Argon gas is injected into the arc chamber 16 from gas inlet port. 22 in a swirling pattern so as to create a strong swirling gas flow within the chamber. The gas exits from the bores of each electrode. An arc 18 is established between the electrodes and is maintained by power supply 24.
  • the are 18 terminates at each electrode within the nozzle bore at a location relatively close to the adjacent ends of the electrodes.
  • the swirling gas constricts the arc column 18 increasing the arc intensity and resulting in are current densities of the order of 2000 amp/cm or greater.
  • the quartz envelope 20 forming the pressurized arc chamber 16 must not only efficiently transmit the radiant energy emitted from the arc column 18 with as little loss as possible, but must be strong enough to withstand the pressure within chamber 16 and the heat radiated by the very intense arc.
  • the are column 18 emits a continuum radiation spectrum having a typical distribution as shown in FIG. 2.
  • the total radiant energy striking the envelope is at least about 2000 watts per square inch of quartz surface area. Quartz will transmit radiation in accordance with the following equation:
  • the magnitude of a is inversely related to wavelength in the short ultraviolet region. It is well known that quartz efficiently transmits radiation above about 1800 A where (1 is relatively small; whereas below l800 A, in the short wavelength ultraviolet region, the coefficient of absorption becomes very large. Since the arc column 18 emits very little radiation below 1800 A, the intense radiation of the arc column incident upon the quartz envelop 20 should play an insignificant factor in the rapid deterioration of the quartz. Although some radiation at less than 1800 A will will be emitted from argon atoms which are swept outwardly from the vicinity of the arc column 18 to a relatively cooler region, such radiation cannot be a signifcant factor primarily because of its comparitively low intensity. Moreover much of such radiant flux will strike or cross the arc column 18 where it would be readily reabsorbed. For the above reasons primary attention has, in the past, been given to the physical and thermal loading on the quartz envelope.
  • an additive such as titanium or any oxide thereof, which has a very large absorption coefficient, below 1600 A, is present within the quartz, a heavy absorption band below 1600 A and including 1049 A results which significantly decreases the quartz susceptibility to penetration by short wavelength ultraviolet radiation below 1600 A.
  • titanium and/or its oxides is preferred any additive having this characteristic absorption band may be employed.
  • oxides of titanium specifically include TiO and TiO but is not limited thereto. Quartz is sold commercially based on its degree of purity. Some poorer grades of commercially available quartz have been chemically analyzed and are known to contain a great many impurities including trace quantities of titanium and/or its oxides.
  • the level of concentration of titanium and/or its oxides has to be at least about 3 parts per million to secure a significant increase in quartz envelope longevity when the quartz envelope is subjected to intense radiation from an arc radiation source where a proportional part of such radiation is below 1600A.
  • the use of a fused quartz material containing at least about 5 parts per million titanium and/or its oxides extended the useful life of the quartz envelope tenfold when compared to the useful life achieved under otherwise identical operating conditions using an envelope of essentially pure quartz material having only a trace amount of titanium and/or its oxides.
  • the distribution and location of the additive within the quartz envelope wall volume is also significant. It is preferred that the additive be unifomtly concentrated primarily at the inner surface of the quartz envelope wall as opposed to being distributed throughout the quartz envelope wall volume. This will further limit the penetration of the destructive short wave ultraviolet 1049 A radiation and permit ready visible detection of the extent of envelope deterioration.
  • a preferred technique to impart a greater concentration of titanium and/or its oxides at the inner surface of the quartz envelope wall would be to fabricate a laminated quartz envelope with the inner layer thereof containing the largest concentration of the additive.
  • a method for increasing the useful life of a quartz medium for use as a light transmitting member in a plasma arc light source having a swirling gas flow of substantially argon passed thereabout and wherein said quartz medium is in the form of a tubular shell surrounding said arc and defining the arc chamber comprising adding an additive to said quartz in an amount of at least 3 parts per million and selected from the group consisting of titanium and an oxide of titanium.
  • a method for increasing the useful life of a quartz medium for use as the light transmitting envelope in an arc radiation plasma type light source wherein a proportional part of the radiated light incident upon said member is short wave ultraviolet radiation of below 1600 Angstroms comprising the steps of fabricating a laminated quartz envelope having at least one lamina including at least about 3 parts per million of an additive selected from the group consisting of titanium and an oxide of titanium.
  • an apparatus for generating high intensity light radiation having a continuum spectral distribution extending from the ultraviolet region to at least the visible region, including in combination; a pair of spaced electrodes between which an arc is established, a single tuing of titanium and an oxide of titanium whereby said envelope is rendered less susceptible to deterioration from short wavelength ultraviolet energy.

Landscapes

  • Glass Compositions (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

In a high power light radiator having a light transmitting quartz shell with a total radiation loading incident upon such shell in the order of at least about 2000 watts per sq. inch of surface area with a proportional part of such radiation having wavelengths below 1600 A wherein the quartz susceptibility to deterioration is decreased by the addition of an additive such as titanium or an oxide thereof to said quartz.

Description

United States Patent 1191 Troue METHOD AND APPARATUS FOR INCREASING THE USEFUL LIFE OF A QUARTZ ENVELOPE IN A HIGH POWER Nov. 26, 1974 3,581,139 5/1971 Haftetal. ..313/221 3,597,650 8/1971 Anderson m1. ..313/231 LIGHT SOURCE Primary Examiner-Ronald L. Wibert [75] Inventor: Harden Henry Troue, Indianapolis, Assistant ExammeF'Rwhard Rosenbergef 1nd Attorney, Agent, or Firm-Eugene Lieberstem [73] Assignee: Union Carbide Corporation, New
57 ABSTRACT [22] Filed: Nov. 27, 1972 In a h1gh power light radiator having a light transmlt- PP 309,808 ting quartz shell with a total radiation loading incident upon such shell in the order of at least about 2000 52 us. c1 313/221, 313/112, 313/231 watts p qinch of surface area with a Proportional [51 1m. 01. HOlj 5/04 P of such radiation having wavelengths below 1600 [58] n w of Search 313/221, 231, 184 7 A wherein the quartz susceptibility to deterioration is decreased by the addition of an additive such as tita- 5 References Cited nium or an oxide thereof to said quartz.
UNITED STATES PATENTS 4 Claims, 3 Drawing Figures 3,53l,677 9/l970 Loughndge 3l3/22l POWER SUPPLY PATENTL 591251974 3. 851 302 mm 1 0f 2 24 POWER SUPPLY FIG.- IA
PAIENTE; Bv 261914 3.851.202 mm 2 a; 2
WAVELENGTH (A) (yool 13- wn/sum) ALISNlLNI 3 UY'IOSSV 'IVWHON FIGZ METHOD AND APPARATUS FOR INCREASING THE USEFUL LIFE OF A QUARTZ ENVELOPE IN A HIGH POWER LIGHT SOURCE This invention relates generally to high power arc light sources and more particularly to an apparatus and method for increasing the useful-life of the light transmittingenvelope in a high power arc light source and in particular to a light source whose arc generates a high intensity predominately continuous spectral distribution of light including ultraviolet short wave radiation below 1600 Angstroms.
The use of high power arc light radiators, particularly for generating radiant energy in the short wave length ultraviolet region, is becoming especially important in the field of irradiating photo chemicals. Present day devices for generating high intensity light are of the arc radiation type wherein a pair of electrodes are spaced at opposite ends within an arc chamber defined by a transparent tubular envelope which is almost invariably formed from quartz. These devices usually operate with a continuous flow of swirling inert gas injected into the pressurized chamber in the space between the electrodes. Although any inert gas may be employed, argon is preferred because of availability and economics of operation.
In industrial applications for which such are light sources are intended it is essential that such sources be capable of operating reliably for relatively long accumulated times, 100 hours at the very minimum. Heretofore, the transparent window or envelope experienced failure, often in the form of an explosion, after very short accumulated operating times, from only a few to at most tens of hours. The failures would occur suddenly, frequently without any apparent indication of envelope deterioration. To overcome this serious deficiency double concentric envelopes were used. The inner envelope was used to define the arc chamber while the outer envelope, radially spaced from the inner envelope, took the greater portion of the pressure loading and in some instances was used to maintain a compressive force upon the inner envelope. A cooling gas was introduced in the space between the envelopes to cool and reduce the thermal gradient over the inner envelope. Although the use of two envelopes did increase the useful life of the arc light source, the increase in operating time before failure was not ade quate. Moreover, double envelopes had some serious disadvantages, namely; they increased the complexity and cost of the sources and they decreased the radiant output since there were two mediums through which the light had to be transmitted.
The present invention is concerned solely with increasing the reliability and permissible accumulated operating times of arc light sources by increasing the longevity of the quartz envelope, i.e., rendering the envelope less susceptible to deterioration and more tolerable to the harsh environment and intense radiation to which it is subjected.
To prolong quartz life primary attention had heretofore been given to the theory that defects in quartz purity as well as optical defects act as a starting point for deterioration. Based upon this reasoning all initial attempts to improve longevity involved selection of the Very best of quartz materials in terms of their purity and UV range of transmission such as (by trade name) Amerisil, Superasil, Dynasil UV-l000, Thermal American Spectrosil, and Quartz Silice Pursil 453. Such materials at failure exhibited few visible signs of deterioration but had accumulated lifetimes of only a few tens of hours of operation before failure. Moreover, failure often occurred in the form of an explosion.
It was subsequently discovered, contrary to what would have been anticipated from the aforementioned concept of quartz failure, that the presence of titanium or any oxide thereof in the quartz, as an additive to the extent of at least about 3 parts per million, increases the life expectancy of the quartz by at least an order of magnitude from tens to hundreds of hours. It is theorized from such discovery that any additive which has an absorption band below 1600 A. and including 1049 A will beneficially affect quartz longevity. One immediate and obvious advantage of the above noted discovery is that the use of a second or outer envelope is not necessary. It has further been observed that, with the inclusion of titanium or any oxide thereof in the quartz, or presumably any additive that meets the above noted requirements, any deterioration which occurs does so slowly and is visibly detectable,providing ample warning and time to replace the envelope thereby substantially reducing the possibility of an explosive failure.
These and other advantages of the present invention will become apparent from the following detailed description taken in conjunction with the accompanying drawings in which:
FIG. 1 schemetically illustrates, in longitudinal vertical section, a typical high power are radiation source to which the invention is uniquely adapted;
FIG. 1A illustrates a section of one embodiment of the quartz envelop of FIG. 1 where the quartz is composed of laminated sections;
FIG. 2 is a graph of a typical spectral radiance distribution of the light emitted from the radiation source of FIG. 1.
The illustrated apparatus shown in FIG. 1 generally comprises a pair of spaced electrodes 12 and 14 respectively, which are axially aligned within a pressurized gas tight arc chamber 16 formed from a transparent quartz envelope 20. Each electrode is of nozzle type construction having a centrally disposed bore. It is to be understood however that the invention is neither limited to the specific arc source assembly shown in FIG. 1 nor to hollow type electrodes. Argon gas is injected into the arc chamber 16 from gas inlet port. 22 in a swirling pattern so as to create a strong swirling gas flow within the chamber. The gas exits from the bores of each electrode. An arc 18 is established between the electrodes and is maintained by power supply 24. The are 18 terminates at each electrode within the nozzle bore at a location relatively close to the adjacent ends of the electrodes. The swirling gas constricts the arc column 18 increasing the arc intensity and resulting in are current densities of the order of 2000 amp/cm or greater.
The quartz envelope 20 forming the pressurized arc chamber 16 must not only efficiently transmit the radiant energy emitted from the arc column 18 with as little loss as possible, but must be strong enough to withstand the pressure within chamber 16 and the heat radiated by the very intense arc. The are column 18 emits a continuum radiation spectrum having a typical distribution as shown in FIG. 2. The total radiant energy striking the envelope is at least about 2000 watts per square inch of quartz surface area. Quartz will transmit radiation in accordance with the following equation:
I T e-04M. wherei V I transmitted radiation,
1,, incident radiation,
04 wavelength dependent absorption coefficient,
t quartz thickness,
A wavelength.
The magnitude of a is inversely related to wavelength in the short ultraviolet region. It is well known that quartz efficiently transmits radiation above about 1800 A where (1 is relatively small; whereas below l800 A, in the short wavelength ultraviolet region, the coefficient of absorption becomes very large. Since the arc column 18 emits very little radiation below 1800 A, the intense radiation of the arc column incident upon the quartz envelop 20 should play an insignificant factor in the rapid deterioration of the quartz. Although some radiation at less than 1800 A will will be emitted from argon atoms which are swept outwardly from the vicinity of the arc column 18 to a relatively cooler region, such radiation cannot be a signifcant factor primarily because of its comparitively low intensity. Moreover much of such radiant flux will strike or cross the arc column 18 where it would be readily reabsorbed. For the above reasons primary attention has, in the past, been given to the physical and thermal loading on the quartz envelope.
After a considerable reevaluation it was concluded that in fact resonance radiation from argon at about 1049 A was initiating stress concentrations deep within the quartz envelope walls. What earlier had been analyzed as thermal strain concentrations within the walls were determined to be the result of structural damage from the absorption of argon resonance radiation at about 1049 A. Resonance radiation results when an electron which has been brought to an excited state returns from its lowest excited state to its unexcited energy level or ground state emitting a quantum of radiant energy. The predominant resonance line for argon is 1049 A. This wavelength is readily absorbed throughout the wall structure of the quartz envelope thereby stressing and structurely weakening it.
Although it would be expected that radiation corresponding to this resonance line would be reabsorbed within the arc column and should generally never leave the arc, it was felt that the escape of such radiation must in fact be taking place. Moreover, such rapid stress concentration and quartz structural deterioration as observed required a relatively intense level of such radiation.
It was ultimately discovered that the source of such intense 1049 Angstrom resonance radiation-is the arc termination regions and/or tail flame within the bore of each nozzle electrode where sufficient cooling exists to retum the electrons to the ground state and release resonance radiation. Hence, it was concluded that the stress concentration and structural deterioration of the quartz envelope walls could be prevented or at least significantly reduced if the penetration of the quartz wall by such radiation could be significantly decreased.
It was demonstrated pursuant to the present invention that if an additive, such as titanium or any oxide thereof, which has a very large absorption coefficient, below 1600 A, is present within the quartz, a heavy absorption band below 1600 A and including 1049 A results which significantly decreases the quartz susceptibility to penetration by short wavelength ultraviolet radiation below 1600 A. Although titanium and/or its oxides is preferred any additive having this characteristic absorption band may be employed. For purposes of the present disclosure oxides of titanium specifically include TiO and TiO but is not limited thereto. Quartz is sold commercially based on its degree of purity. Some poorer grades of commercially available quartz have been chemically analyzed and are known to contain a great many impurities including trace quantities of titanium and/or its oxides. It was found that the level of concentration of titanium and/or its oxides has to be at least about 3 parts per million to secure a significant increase in quartz envelope longevity when the quartz envelope is subjected to intense radiation from an arc radiation source where a proportional part of such radiation is below 1600A. The use of a fused quartz material containing at least about 5 parts per million titanium and/or its oxides extended the useful life of the quartz envelope tenfold when compared to the useful life achieved under otherwise identical operating conditions using an envelope of essentially pure quartz material having only a trace amount of titanium and/or its oxides.
Further analysis indicates that the distribution and location of the additive within the quartz envelope wall volume is also significant. It is preferred that the additive be unifomtly concentrated primarily at the inner surface of the quartz envelope wall as opposed to being distributed throughout the quartz envelope wall volume. This will further limit the penetration of the destructive short wave ultraviolet 1049 A radiation and permit ready visible detection of the extent of envelope deterioration. A preferred technique to impart a greater concentration of titanium and/or its oxides at the inner surface of the quartz envelope wall would be to fabricate a laminated quartz envelope with the inner layer thereof containing the largest concentration of the additive.
What is claimed is:
1. A method for increasing the useful life of a quartz medium for use as a light transmitting member in a plasma arc light source having a swirling gas flow of substantially argon passed thereabout and wherein said quartz medium is in the form of a tubular shell surrounding said arc and defining the arc chamber comprising adding an additive to said quartz in an amount of at least 3 parts per million and selected from the group consisting of titanium and an oxide of titanium.
2. A method for increasing the useful life of a quartz medium for use as the light transmitting envelope in an arc radiation plasma type light source wherein a proportional part of the radiated light incident upon said member is short wave ultraviolet radiation of below 1600 Angstroms comprising the steps of fabricating a laminated quartz envelope having at least one lamina including at least about 3 parts per million of an additive selected from the group consisting of titanium and an oxide of titanium.
3. In an apparatus for generating high intensity light radiation having a continuum spectral distribution extending from the ultraviolet region to at least the visible region, including in combination; a pair of spaced electrodes between which an arc is established, a single tuing of titanium and an oxide of titanium whereby said envelope is rendered less susceptible to deterioration from short wavelength ultraviolet energy.
4. In an apparatus as defined in claim 3 wherein a greater proportion of said additive is contained within said envelope at the inner surface thereof facing said are.

Claims (4)

1. A method for increasing the useful life of a quartz medium for use as a light transmitting member in a plasma arc light source having a swirling gas flow of substantially argon passed thereabout and wherein said quartz medium is in the form of a tubular shell surrounding said arc and defining the arc chamber comprising adding an additive to said quartz in an amount of at least 3 parts per million and selected from the group consisting of titanium and an oxide of titanium.
2. A method for increasing the useful life of a quartz medium for use as the light transmitting envelope in an arc radiation plasma type light source wherein a proportional part of the radiated light incident upon said member is short wave ultraviolet radiation of below 1600 Angstroms comprising the steps of fabricating a laminated quartz envelope having at least one lamina including at least about 3 parts per million of an additive selected from the group consisting of titanium and an oxide of titanium.
3. In an apparatus for generating high intensity light radiation having a continuum spectral distribution extending from the ultraviolet region to at least the visible region, including in combination; a pair of spaced electrodes between which an arc is established, a single tubular quartz envelope surrounding said electrodes and defining therewithin an arc chamber, said envelope representing the sole light transmitting enclosure, means for passing argon gas in a swirling pattern within said arc chamber and power supply means for maintaining said arc, the improvement of which comprises; said single quartz envelope including at least 3 parts per million of an additive selected from the group consisting of titanium and an oxide of titanium whereby said envelope is rendered less susceptible to deterioration from short wavelength ultraviolet energy.
4. In an apparatus as defined in claim 3 wherein a greater proportion of said additive is contained within said envelope at the inner surface thereof facing said arc.
US00309808A 1972-11-27 1972-11-27 Method and apparatus for increasing the useful life of a quartz envelope in a high power light source Expired - Lifetime US3851202A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US00309808A US3851202A (en) 1972-11-27 1972-11-27 Method and apparatus for increasing the useful life of a quartz envelope in a high power light source
DE2358573A DE2358573A1 (en) 1972-11-27 1973-11-24 METHOD AND DEVICE FOR INCREASING THE SERVICE LIFE OF A QUARTZ COVERING FOR A LIGHT SOURCE OF HIGH POWER
JP48131827A JPS4984084A (en) 1972-11-27 1973-11-26

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00309808A US3851202A (en) 1972-11-27 1972-11-27 Method and apparatus for increasing the useful life of a quartz envelope in a high power light source

Publications (1)

Publication Number Publication Date
US3851202A true US3851202A (en) 1974-11-26

Family

ID=23199739

Family Applications (1)

Application Number Title Priority Date Filing Date
US00309808A Expired - Lifetime US3851202A (en) 1972-11-27 1972-11-27 Method and apparatus for increasing the useful life of a quartz envelope in a high power light source

Country Status (3)

Country Link
US (1) US3851202A (en)
JP (1) JPS4984084A (en)
DE (1) DE2358573A1 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4942831A (en) * 1987-01-23 1990-07-24 Seculock B. V. Device for the protected storage of objects
US5614151A (en) * 1995-06-07 1997-03-25 R Squared Holding, Inc. Electrodeless sterilizer using ultraviolet and/or ozone
US20040119412A1 (en) * 2002-12-18 2004-06-24 Ushiodenki Kabushiki Kaisha Discharge lamp of the short arc type

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4177720B2 (en) * 2003-06-25 2008-11-05 ハリソン東芝ライティング株式会社 Flash discharge lamp, flash discharge lamp lighting device and light irradiation device
JP4749797B2 (en) * 2005-08-10 2011-08-17 株式会社オーク製作所 Excimer lamp

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3531677A (en) * 1966-12-14 1970-09-29 Sylvania Electric Prod Quartz glass envelope with radiation-absorbing glaze
US3581139A (en) * 1969-03-20 1971-05-25 Westinghouse Electric Corp Fluorescent lamp having titanium dioxide-containing glass envelope and reduced phosphor weight
US3597650A (en) * 1969-09-23 1971-08-03 Union Carbide Corp Arc radiation sources

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3531677A (en) * 1966-12-14 1970-09-29 Sylvania Electric Prod Quartz glass envelope with radiation-absorbing glaze
US3581139A (en) * 1969-03-20 1971-05-25 Westinghouse Electric Corp Fluorescent lamp having titanium dioxide-containing glass envelope and reduced phosphor weight
US3597650A (en) * 1969-09-23 1971-08-03 Union Carbide Corp Arc radiation sources

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4942831A (en) * 1987-01-23 1990-07-24 Seculock B. V. Device for the protected storage of objects
US5614151A (en) * 1995-06-07 1997-03-25 R Squared Holding, Inc. Electrodeless sterilizer using ultraviolet and/or ozone
US20040119412A1 (en) * 2002-12-18 2004-06-24 Ushiodenki Kabushiki Kaisha Discharge lamp of the short arc type
CN100334682C (en) * 2002-12-18 2007-08-29 优志旺电机株式会社 Short-arc discharging lamp
US7560865B2 (en) * 2002-12-18 2009-07-14 Ushiodenki Kabushiki Kaisha Discharge lamp of the short arc type
DE10356762B4 (en) * 2002-12-18 2012-09-27 Ushiodenki Kabushiki Kaisha Discharge lamp of the short arc type

Also Published As

Publication number Publication date
JPS4984084A (en) 1974-08-13
DE2358573A1 (en) 1974-05-30

Similar Documents

Publication Publication Date Title
US3500242A (en) Static co2 gas laser
US3900803A (en) Lasers optically pumped by laser-produced plasma
Malka et al. Second harmonic generation and its interaction with relativistic plasma waves driven by forward Raman instability in underdense plasmas
JPS63252491A (en) Metal ion laser device
US3851202A (en) Method and apparatus for increasing the useful life of a quartz envelope in a high power light source
US5418424A (en) Vacuum ultraviolet light source utilizing rare gas scintillation amplification sustained by photon positive feedback
Vasilyev et al. 1.5-mJ Cr: ZnSe chirped pulse amplifier seeded by a Kerr-lens mode-locked Cr: ZnS oscillator
Fork et al. Increased resistance to photodegradation of rhodamine 6G in cooled solid matrices
US2924733A (en) Wall-stabilized electric high-pressure gaseous discharge lamp
US3993965A (en) Laser having improved windows
US3402367A (en) Three-electrode cold-cathode gas laser tube
US3745483A (en) Inert gas laser with continuous gas flow
Cann Light Sources in the 0.15–20-μ Spectral Range
Aminoff et al. Characterization and laser properties of lanthanum magnesium hexa-aluminate activated by neodymium and chromium
US4680770A (en) Dual beam gas ion laser
US4945545A (en) Cold electrode metal vapor laser
Hodges CW laser oscillation in singly ionized magnesium
GB1013725A (en) An optical maser
Damany et al. Multiphoton excitation and decay processes in xenon: Off-breakdown and breakdown emission at densities up to 1.4× 10 21 atoms cm− 3
US3691478A (en) Laser energy monitor and control
Johnson Excitation of an atmospheric-pressure CO 2-N 2-He laser by capacitor discharges
Dushman The search for high efficiency light sources
US3483481A (en) Radiation source for producing continuous coherent radiations
US3492597A (en) Ceramic tube for gas ion laser
US3564453A (en) Laser and method

Legal Events

Date Code Title Description
AS Assignment

Owner name: MORGAN GUARANTY TRUST COMPANY OF NEW YORK, AND MOR

Free format text: MORTGAGE;ASSIGNORS:UNION CARBIDE CORPORATION, A CORP.,;STP CORPORATION, A CORP. OF DE.,;UNION CARBIDE AGRICULTURAL PRODUCTS CO., INC., A CORP. OF PA.,;AND OTHERS;REEL/FRAME:004547/0001

Effective date: 19860106

AS Assignment

Owner name: UNION CARBIDE CORPORATION,

Free format text: RELEASED BY SECURED PARTY;ASSIGNOR:MORGAN BANK (DELAWARE) AS COLLATERAL AGENT;REEL/FRAME:004665/0131

Effective date: 19860925