US3749652A - Crack-free hard chrome - Google Patents

Crack-free hard chrome Download PDF

Info

Publication number
US3749652A
US3749652A US00225218A US3749652DA US3749652A US 3749652 A US3749652 A US 3749652A US 00225218 A US00225218 A US 00225218A US 3749652D A US3749652D A US 3749652DA US 3749652 A US3749652 A US 3749652A
Authority
US
United States
Prior art keywords
crack
deposit
hardness
chrome
hard chrome
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US00225218A
Other languages
English (en)
Inventor
S Eisner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saint Gobain Abrasives Inc
Original Assignee
Norton Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Norton Co filed Critical Norton Co
Application granted granted Critical
Publication of US3749652A publication Critical patent/US3749652A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/22Electroplating combined with mechanical treatment during the deposition
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00Stock material or miscellaneous articles
    • Y10S428/922Static electricity metal bleed-off metallic stock
    • Y10S428/9335Product by special process
    • Y10S428/934Electrical process
    • Y10S428/935Electroplating
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771Transition metal-base component
    • Y10T428/12806Refractory [Group IVB, VB, or VIB] metal-base component
    • Y10T428/12826Group VIB metal-base component
    • Y10T428/12833Alternative to or next to each other
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771Transition metal-base component
    • Y10T428/12806Refractory [Group IVB, VB, or VIB] metal-base component
    • Y10T428/12826Group VIB metal-base component
    • Y10T428/12847Cr-base component
    • Y10T428/12854Next to Co-, Fe-, or Ni-base component

Definitions

  • Chromium metal has been used as a protective, wearresistant hard metal coating for functional as contrasted to decorative applications. Such coatings are deposited by electroplating from an aqueous solution.
  • Chromium metal hard enough to provide a wearresistant surface, has heretofore inherently had a crack pattern in the deposit.
  • a mud crack pattern the appearance of the deposit under magnification resembles sun-baked earth with a large number of cracks defining small islands of metal. While these cracks are usually obvious in the deposit immediately after formation, they will always be present in conventional deposits having a thickness of 3 microns or more and are fully developed after the deposit has aged for a relatively short time, e.g. not more than 56 days. These cracks are apparently due to tensile stresses which develop during the deposition.
  • Crack-free soft chrome i.e. metal having a hardness of 600 VPH or less (Vickers Pyramid Hardness at a 100 gram load)
  • metal having a hardness of 600 VPH or less can be produced usually by depositing with low current densities and high temperature baths using the conventional sulfuric acid: chromic acid ratio of 1:100.
  • the chrome deposit is either soft and crack-free or hard (700 VPH or more) and cracked.
  • he hard, cracked chrome of the prior art is a good wear resistant surface but it is incapable of providing protection to a substrate where, for example, a highly oxidizing environment exists. This bars its use in many high temperature applications where steel or other substrates, e.g. molybdenum, are rapidly corroded by oxygen unless completely shielded by a protective coating.
  • the present invention is the provision of a chromium metal deposit which is not only crack-free but which has a hardness in excess of 700 VPH Further, this deposit maintains its crack-free nature upon aging for at least in excess of the 56-day period within which conventional hard chrome invariably forms cracks and, in fact, for many times this period (deposits aged for over 2 /2 years have retained their crack-free structure).
  • the hard chrome deposits of the present invention will have a hardness of at least 700 VPH and generally will have a hardness in excess of 900 VPH
  • the deposit, after polishing and etching, will show an essentially featureless surface, i.e. no visible crack lines. This crackfree structure will exist not only in thin deposits, e.g. 1 mil, but also in deposits of greater thickness, e.g. up to at least 6 mil in thickness.
  • Tests have indicated that the structure will not develop cracks upon aging under normal atmospheric conditions for periods at least as long as two years and further that when deposits aged for this period of time are subjected to quite severe stress, for example, prying the deposit from the substrate to which it was applied, they remain resistant to crack development.
  • FIGS. 1 and 2 shows the visual difference between a conventional hard chrome surface (FIG. 1) and the surface of a deposit of the character of the present invention (FIG. 2).
  • FIG. 1 it will be seen that a multitude of intersecting crack lines criss-cross the surface.
  • the measured crack density in this particular specimen was 1150 cracks lines/inch.
  • FIG. 2 shows a complete absence of crack lines under the same magnification as that of FIG. 1 even though etching was carried out for more than 50% longer than for the sample of FIG. 1.
  • Both samples were produced from conventional electrolyte baths of sulfuric acid-chromic acid which are known to produce only cracked deposits according to the prior art.
  • Both samples were etched in the same way and under the same conditions except that etching was carried out in the case of FIG. 2 for 9 seconds longer than the 16 second etch of FIG. 1.
  • the etching solution was a 33 oz./gal. chromic acid solution with a copper cathode at 6.75 volts and 1.20 amps used in both instances.
  • the hardness of the specimens was measured by the standard Vickers Pyramidal Hardness test under a gram load (Metals Handbook, 8th ed.; vol. 2, p. 471).
  • the hardness of the conventional cracked chrome of FIG. 1 was 1050 VPH while the hardness of the chrome sample according to the present invention (FIG. 2) was 964 VPH
  • the sample of FIG. 1 was 0.0018 inch thick while the sample of FIG.
  • FIG. 2 was 0.0052 inch thick. According to the prior art, thicker deposits are expected to develop crack patterns more rapidly than thin deposits.
  • the deposit of FIG. 2 was approximately 2 /2 years old at the time the photomicrograph was taken and had been chipped mechanically from the steel substrate on which it was deposited about one week prior to the taking of the photomicrograph.
  • the deposit of FIG. 1 was less than two years old and was separated from its substrate in the same way and at the same time as that of the FIG. 2 deposit.
  • Deposits of the character of the hard chrome of the present invention will be useful wherever high temperatures are involved along with oxidation and subsequent spalling or disintegration of metals.
  • Hard, crack-free chrome will provide a protective coating preventing such oxidation and its attendant problems.
  • Molybdenum and alloys thereof used in the aerospace industry are typical problems of this type.
  • inexpensive metal substrates e.g. low carbon steel
  • Chemical attack also is protected against by this type of coating permitting such applications as extending the life of electrical contact rolls used in high speed strip platinglines.
  • deposits of this invention give wear, galling and erosion resistance to metal parts plated therewith.
  • a crack-free electrodeposit of chromium metal having a hardness in excess of 700 VPH produced by activation of the deposit throughout its period of formation by relative motion and contact between such deposit and a plurality of small activating particles.

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
US00225218A 1972-02-10 1972-02-10 Crack-free hard chrome Expired - Lifetime US3749652A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US22521872A 1972-02-10 1972-02-10

Publications (1)

Publication Number Publication Date
US3749652A true US3749652A (en) 1973-07-31

Family

ID=22844013

Family Applications (1)

Application Number Title Priority Date Filing Date
US00225218A Expired - Lifetime US3749652A (en) 1972-02-10 1972-02-10 Crack-free hard chrome

Country Status (5)

Country Link
US (1) US3749652A (US07494231-20090224-C00006.png)
JP (1) JPS4892234A (US07494231-20090224-C00006.png)
DE (1) DE2306252A1 (US07494231-20090224-C00006.png)
FR (1) FR2171112B1 (US07494231-20090224-C00006.png)
IL (1) IL41428A0 (US07494231-20090224-C00006.png)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2244832A1 (en) * 1973-09-25 1975-04-18 Richardson Chemical Co Electroplating and machining process - using tool as anode
US5456818A (en) * 1993-11-03 1995-10-10 Ingersoll-Rand Company Method for preventing fretting and galling in a polygon coupling
US7449098B1 (en) 1999-10-05 2008-11-11 Novellus Systems, Inc. Method for planar electroplating
US7531079B1 (en) 1998-10-26 2009-05-12 Novellus Systems, Inc. Method and apparatus for uniform electropolishing of damascene IC structures by selective agitation
US20090280649A1 (en) * 2003-10-20 2009-11-12 Novellus Systems, Inc. Topography reduction and control by selective accelerator removal
US7799200B1 (en) 2002-07-29 2010-09-21 Novellus Systems, Inc. Selective electrochemical accelerator removal
US8168540B1 (en) 2009-12-29 2012-05-01 Novellus Systems, Inc. Methods and apparatus for depositing copper on tungsten
US8530359B2 (en) 2003-10-20 2013-09-10 Novellus Systems, Inc. Modulated metal removal using localized wet etching

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2787588A (en) * 1954-08-12 1957-04-02 Metal & Thermit Corp Chromium plating

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2244832A1 (en) * 1973-09-25 1975-04-18 Richardson Chemical Co Electroplating and machining process - using tool as anode
US5456818A (en) * 1993-11-03 1995-10-10 Ingersoll-Rand Company Method for preventing fretting and galling in a polygon coupling
US5482437A (en) * 1993-11-03 1996-01-09 Ingersoll-Rand Company Method for preventing fretting and galling in a polygon coupling
US7531079B1 (en) 1998-10-26 2009-05-12 Novellus Systems, Inc. Method and apparatus for uniform electropolishing of damascene IC structures by selective agitation
US7449098B1 (en) 1999-10-05 2008-11-11 Novellus Systems, Inc. Method for planar electroplating
US8268154B1 (en) 2002-07-29 2012-09-18 Novellus Systems, Inc. Selective electrochemical accelerator removal
US8795482B1 (en) 2002-07-29 2014-08-05 Novellus Systems, Inc. Selective electrochemical accelerator removal
US7799200B1 (en) 2002-07-29 2010-09-21 Novellus Systems, Inc. Selective electrochemical accelerator removal
US20090277867A1 (en) * 2003-10-20 2009-11-12 Novellus Systems, Inc. Topography reduction and control by selective accelerator removal
US8158532B2 (en) 2003-10-20 2012-04-17 Novellus Systems, Inc. Topography reduction and control by selective accelerator removal
US8470191B2 (en) 2003-10-20 2013-06-25 Novellus Systems, Inc. Topography reduction and control by selective accelerator removal
US8530359B2 (en) 2003-10-20 2013-09-10 Novellus Systems, Inc. Modulated metal removal using localized wet etching
US20090280649A1 (en) * 2003-10-20 2009-11-12 Novellus Systems, Inc. Topography reduction and control by selective accelerator removal
US8168540B1 (en) 2009-12-29 2012-05-01 Novellus Systems, Inc. Methods and apparatus for depositing copper on tungsten
US8377824B1 (en) 2009-12-29 2013-02-19 Novellus Systems, Inc. Methods and apparatus for depositing copper on tungsten

Also Published As

Publication number Publication date
DE2306252A1 (de) 1973-08-30
FR2171112A1 (US07494231-20090224-C00006.png) 1973-09-21
FR2171112B1 (US07494231-20090224-C00006.png) 1975-04-04
IL41428A0 (en) 1973-03-30
JPS4892234A (US07494231-20090224-C00006.png) 1973-11-30

Similar Documents

Publication Publication Date Title
Hadian et al. Residual stresses in electrodeposits of nickel and nickel–iron alloys
Brenner et al. Electrodeposition of alloys of phosphorus with nickel or cobalt
Schintlmeister et al. Structure and strength effects in CVD titanium carbide and titanium nitride coatings
Dennis et al. Nickel and chromium plating
US2859158A (en) Method of making a nickel-chromium diffusion alloy
US2643221A (en) Electrodeposition of phosphorusnickel and phosphorus-cobalt alloys
US4892628A (en) Electrodeposition of amorphous ternary nickel-chromium-phosphorus alloy
US3749652A (en) Crack-free hard chrome
GB2157709A (en) Process for preparing zn-ni-alloy-plated steel sheets
DE3809139C2 (US07494231-20090224-C00006.png)
Kedward et al. The development of electrodeposited composites for use as wear control coatings on aero engines
EP0186266A1 (en) Erosion-resistant coating system
US2389131A (en) Electrodeposition of antimony
US4412892A (en) Pretreatment of superalloys and stainless steels for electroplating
US4892627A (en) Method of nickel-tungsten-silicon carbide composite plating
Carr et al. The effects of zinc alloy electroplating on the hydrogen embrittlement of high strength steels
Dini et al. Plating on some difficult-to-plate metals and alloys
US5514479A (en) Functional coatings comprising light emitting particles
US3763002A (en) Method of forming protective coatings by electrolysis
JP3320965B2 (ja) 硬質膜の剥離方法および該方法によって得られる再被覆部材
US2546150A (en) Method for securing adhesion of electroplated coatings to a metal base
Dinan et al. The effect of arsenic upon the hardness of electrodeposited gold
US5868917A (en) Process for the electrodeposition of a chromium coating containing solid inclusions and plating solution employed in this process
US1791785A (en) Tantalum spinneret
US3502548A (en) Method of electroplating gold on chromium