US3706637A - Chromium plating bath containing chromic compound - Google Patents
Chromium plating bath containing chromic compound Download PDFInfo
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- US3706637A US3706637A US116891A US3706637DA US3706637A US 3706637 A US3706637 A US 3706637A US 116891 A US116891 A US 116891A US 3706637D A US3706637D A US 3706637DA US 3706637 A US3706637 A US 3706637A
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- United States
- Prior art keywords
- chromium
- bath
- plating
- complex
- acid
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- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title abstract description 99
- 239000011651 chromium Substances 0.000 title abstract description 84
- 229910052804 chromium Inorganic materials 0.000 title abstract description 83
- 238000007747 plating Methods 0.000 title abstract description 80
- 150000001875 compounds Chemical class 0.000 title abstract description 11
- 239000000470 constituent Substances 0.000 abstract description 23
- 229910052736 halogen Inorganic materials 0.000 abstract description 18
- 150000002367 halogens Chemical class 0.000 abstract description 18
- 150000001732 carboxylic acid derivatives Chemical class 0.000 abstract 1
- 239000000203 mixture Substances 0.000 description 32
- 239000002609 medium Substances 0.000 description 31
- 239000000243 solution Substances 0.000 description 28
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 24
- 239000002253 acid Substances 0.000 description 21
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 19
- 150000001735 carboxylic acids Chemical class 0.000 description 17
- HEMHJVSKTPXQMS-UHFFFAOYSA-M sodium hydroxide Inorganic materials [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 17
- 238000006243 chemical reaction Methods 0.000 description 16
- 150000003839 salts Chemical class 0.000 description 15
- 238000012360 testing method Methods 0.000 description 14
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 13
- 239000004327 boric acid Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 12
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 10
- 150000004820 halides Chemical class 0.000 description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 9
- 239000000460 chlorine Substances 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- 238000000151 deposition Methods 0.000 description 8
- 230000008021 deposition Effects 0.000 description 8
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 7
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 7
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 7
- 229910052801 chlorine Inorganic materials 0.000 description 7
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 7
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 238000009713 electroplating Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 5
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 5
- 150000007513 acids Chemical class 0.000 description 5
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 5
- 239000011737 fluorine Substances 0.000 description 5
- 229910052731 fluorine Inorganic materials 0.000 description 5
- 125000005843 halogen group Chemical group 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 239000001103 potassium chloride Substances 0.000 description 5
- 235000011164 potassium chloride Nutrition 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 239000004310 lactic acid Substances 0.000 description 4
- 235000014655 lactic acid Nutrition 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 239000012429 reaction media Substances 0.000 description 4
- 229910052708 sodium Inorganic materials 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- 229910001369 Brass Inorganic materials 0.000 description 3
- AEMRFAOFKBGASW-UHFFFAOYSA-M Glycolate Chemical compound OCC([O-])=O AEMRFAOFKBGASW-UHFFFAOYSA-M 0.000 description 3
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 3
- 239000012736 aqueous medium Substances 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000010951 brass Substances 0.000 description 3
- 239000012141 concentrate Substances 0.000 description 3
- 238000010494 dissociation reaction Methods 0.000 description 3
- 230000005593 dissociations Effects 0.000 description 3
- -1 e.g. Inorganic materials 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052700 potassium Inorganic materials 0.000 description 3
- 239000011591 potassium Substances 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-M Lactate Chemical compound CC(O)C([O-])=O JVTAAEKCZFNVCJ-UHFFFAOYSA-M 0.000 description 2
- 238000013019 agitation Methods 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 230000003190 augmentative effect Effects 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 229910021538 borax Inorganic materials 0.000 description 2
- 229910052810 boron oxide Inorganic materials 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 2
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 239000003517 fume Substances 0.000 description 2
- 239000011630 iodine Substances 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002763 monocarboxylic acids Chemical class 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 239000004328 sodium tetraborate Substances 0.000 description 2
- 235000010339 sodium tetraborate Nutrition 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- XBBVURRQGJPTHH-UHFFFAOYSA-N 2-hydroxyacetic acid;2-hydroxypropanoic acid Chemical compound OCC(O)=O.CC(O)C(O)=O XBBVURRQGJPTHH-UHFFFAOYSA-N 0.000 description 1
- 235000011960 Brassica ruvo Nutrition 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910001854 alkali hydroxide Inorganic materials 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 1
- 150000008041 alkali metal carbonates Chemical class 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 150000001805 chlorine compounds Chemical group 0.000 description 1
- 229910021563 chromium fluoride Inorganic materials 0.000 description 1
- 229940117975 chromium trioxide Drugs 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N chromium trioxide Inorganic materials O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- BFGKITSFLPAWGI-UHFFFAOYSA-N chromium(3+) Chemical compound [Cr+3] BFGKITSFLPAWGI-UHFFFAOYSA-N 0.000 description 1
- QYHKPQCMTYXLIA-UHFFFAOYSA-K chromium(3+);2-hydroxyacetate Chemical compound [Cr+3].OCC([O-])=O.OCC([O-])=O.OCC([O-])=O QYHKPQCMTYXLIA-UHFFFAOYSA-K 0.000 description 1
- GAMDZJFZMJECOS-UHFFFAOYSA-N chromium(6+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Cr+6] GAMDZJFZMJECOS-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- 238000004512 die casting Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000013101 initial test Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000012811 non-conductive material Substances 0.000 description 1
- 230000001473 noxious effect Effects 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 238000010979 pH adjustment Methods 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000005494 tarnishing Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- FTBATIJJKIIOTP-UHFFFAOYSA-K trifluorochromium Chemical compound F[Cr](F)F FTBATIJJKIIOTP-UHFFFAOYSA-K 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
Definitions
- the bath contains a solution of a complex, watersoluble trivalent chromic compound containing carboxylic acid constituents and halogen constituents.
- the bath provides for excellent plating speed in the low current density region thus offering enhanced chromium thickness in recessed and difiicult to plate areas.
- a decorative chromium plating bath has now been developed which in addition to providing a highly desirable bright range and a decorative plate with a desirable bright finish, shows excellent plating speed in the low current density region.
- the invention is directed to an aqueous electrolytic plating medium comprising a complex, water-soluble chromic compound containing carboxylic acid constituents and halogen constituent selected from the group consisting of chlorine, fluorine, bromine, iodine or mixtures thereof, with the medium having a molar concentration of chromium within the range from about 0.5 to about 3.
- the invention is further directed to a method of chromium plating an article with bright chromium plate using the medium of the present invention and further to the chromium plated article thereby obtained.
- the present invention is still further directed to an additive concentrate for preparing or sustaining a chromium plating bath, such concentrate comprising the above-described water-soluble complex.
- the chromic compound for the present invention contains halogen constituents that can be chloride, fluoride, bromide, iodide or mixtures thereof.
- halogen constituents that can be chloride, fluoride, bromide, iodide or mixtures thereof.
- bromine and iodine are often not used, for economy and to avoid evolution of visible noxious fumes at the anode. Therefore chlorine, fluorine and their mixtures are preferred for the complex.
- the carboxylic acid constituent of the complex is most typically supplied by a carboxylic acid having less than about 10 carbon atoms and being a saturated acid free from carbon-to-carbon unsaturation.
- the acid is a dicarboxylic acid, or a monocarboxylic acid, or such dicarboxylic and monocarboxylic acids containing at least one hydroxyl group, or mixtures of these acids.
- ⁇ acids which can or have been used most usually have less than about six carbon atoms and include glycolic acid, lactic acid, oxalic acid, and their mixtures.
- carboxylic acid constituent is supplied at least in major amount by glycolic acid.
- a compound of any of the carboxylic acids, such as a salt or an ester thereof, which will act in any of the reactions such as those discussed in more detail hereinbelow whereby the complex is formed, in the same manner as the free acid, can be used.
- the complex virtually always contains a molar ratio of chromium atoms to carboxyl constituent within the range of 1:0.7 to 1:3, and further contains a molar ratio of chromium atoms to halogen atoms within the range of 1:0.1 to 1:3.5.
- Especially preferred ratios based upon desirable performance and economy, can depend upon the acid as well as the halogen constituents of the complex.
- the molar ratio of chromium atoms to halogen is preferably within the range of about 1:0.4 to 1:1.
- the molar ratio of chromium atoms to halogen atoms is preferably within the range of about 1:2.6 to 123.2.
- the complex can be prepared by any of several methods, and representative methods are discussed herein, but should not be construed as being exhaustive.
- One method is the straightforward combination of chromium metal with carboxylic acid plus, for example, hydrochloric acid.
- the reaction can be highly exothermic, and therefore caution needs be taken in carrying out same.
- external heating is applied; and, where the reaction proceeds in a liquid medium such as an aqueous medium such external heating can involve refluxing of the reaction mixture to augment completion of the reaction.
- the complex may also be prepared from the carboxylic and hydrochloric acid in admixture with chromic acid, typically charged to the reaction medium as a solution of chromic acid in water.
- the chromic acid can be supplied by any of the suitable substances for forming chromic acid in water, e.g., chromium trioxide.
- the reaction resulting from this method is also exothermic and caution in the use of such method is thus advisable.
- the complex may further be prepared by reaction of chromic halide, with such halide corresponding to the halide that is to be present in the complex.
- strong base e.g., an alkali metal hydroxide.
- CrF -9H O may be used in this method and will readily yield a chromium/carboxylic acid/fluoride complex involving exothermic reaction conditions.
- the complex is present in the plating medium in an amount to provide from about 25 to about 150 grams of chromium per liter, that is, the molar concentration of chromium in the plating medium is within the range from about 0.5 to about 3.
- the more highly concentrated media having augmented viscosity are not well suited for deposition of chromium onto a metal substrate which is immersed therein.
- Such media having a molar concentration of chromium above about 1.5 may be employed in portable plating devices used in spot plating, e.g., for brush plating, but for bath operation wherein the article is immersed in a bath, such baths most always contain an amount of complex providing from about 25 to about 75 grams of chromium per liter.
- the bath will be supplied with suflicient complex to avoid frequent bath replenishment during working.
- the complex is virtually always used in a liquid medium supplied simply by water, although other liquids may be present, e.g., excess carboxylic acid other than such acid present in the complex, but these other liquids will constitute a minor amount of the liquid medium of on the order of about five volume percent or less.
- the medium Before deposition of chromium, the medium is adjusted to a pH within the range from about 1.8 to 4.9. Such adjustment of pH can be readily carried out with a base, particularly alkali metal carbonates or hydroxides, with sodium or potassium hydroxide or their mixtures being preferred. Before addition to the medium, such material for pH adjustment can be initially dissolved in water and the water solution then added to the medium.
- the bath can also contain a salt of a strong acid preferably, for economy, an alkali metal salt.
- a salt of a strong acid preferably, for economy, an alkali metal salt.
- Such salts enhance the conductivity achieved in the electroplating operation.
- the plating bath usually contains between about 50-200 grams per liter of such salts.
- the bath can also contain boric acid, or an equivalent to boric acid in aqueous solution, such as borax, boron oxide, or sodium oxylfluoborate. Such compounds operate in the bath to augment the rate of deposition of the chromium and are typically used in an amount between about 10-70 grams per liter of bath.
- Such a salt of a strong acid, alone or along with boric acid or boric acid equivalent, can also be blended into a solution for use in establishing or sustaining a plating bath.
- the amount of complex in the freshly prepared solution supplies above about 50 grams of chromium per liter of the solution. More often, such fresh solutions contain sufficient complex to provide greater than 75 grams, e.g., 100-150 grams, of chromium per liter.
- These solutions can be stored and then subsequently used for preparing a new bath, or for sustaining a working bath, as such baths typically contain an amount 4 of complex providing from about 25 to about 75 grams of chromium per liter.
- These freshly prepared concentrated solutions may be blended before storage with sufficient salt of a strong acid to prepare a solution having a molar ratio of moles of chromium, supplied by the complex, to moles of salt of a strong acid, of between about 1:15 to 1:25.
- the freshly prepared solution either alone, or blended with salt of a strong acid may be blended before storage with sufficient boric acid or boric acid equivalent to supply the blend with a molar ratio of moles of chromium provided by the complex to moles of boric acid equivalent of between about 1:1.1 to about 1:0.3.
- solutions may then be stored, or directly used, e.g., in a working bath, to supply complex for replenishment of chromium and to supply the salt of a strong acid and/or boric acid to replenish the losses of these materials that can occurr, for example through drag-out.
- Stored solutions may thereafter find particular use, as in enhancing conductivity and augmenting rate of deposition of chromium, in chromium plating baths and especially in baths containing trivalent chromium in complex form that are employed for the deposition of bright, decorative chromium plate.
- the temperature of the medium during plating may range from about 20 C. up to advantageously not substantially above about 50 C. for enhanced plating performance.
- the most desirable pH range and temperature range can depend upon the make-up of the complex present in the plating medium, with, for example, complex containing a substantial amount of fluorine as the halogen being in a bath that is preferably maintained at a slightly more elevated temperature than for a bath where chlorine supplies the major amount of the halogen.
- the object to be plated is made the cathode, for example immersed in the plating bath, or the cathode in a brush plating operation where the plating medium is contained in the brush, and an inert anode is used such as a carbon, graphite, platinum or platinized titanium anode.
- an inert anode such as a carbon, graphite, platinum or platinized titanium anode.
- a desirable, bright decorative chromium plate of commercially acceptable thickness can typically be plated from about 1000 a.s.f. down to about 3 a.s.f. during a three minute plating cycle. Such bright plating range is unique in the history of decorative chromium plating.
- halogen e.g., gaseous chlorine
- trivalent chromium fume may be given oif at the anode.
- halide replenishment as well as replenishment of all chromium, including that plated from the bath or lost by drag-out, is adequately taken care of by addition of further complex.
- addition of complex can adequately replenish any acid which may be used up in the plating operation during Working of the bath. 4
- the substrate which may be employed for receiving the decorative-protective finish provided by the chromium plate of the present invention includes metals such as steel, brass, copper, copper alloys, bronze, zinc diecastings, as for example to prevent rusting or tarnishing, or nickel surfaces. Additionally such plating can be performed on plastic surfaces which are activated or prepared for an electroplating operation.
- the plating can be typicallycarried out in any vessel useful for chromium electroplating such as tanks lined with corrosion resistant material including glass, ceramic material, polyvinyl chloride, and the like.
- electrodeposition with the plating composition can be performed in the bath by any conventional plating technique including rotating receptacle coating apparatus immersed in the plating bath.
- the method is applicable to the plating of substrates by the use of portable plating devices wherein the apparatus supplies the electrolyte and a positive source of electrical current, e.g., brush or stylus means for applying the plating composition to a substrate.
- a positive source of electrical current e.g., brush or stylus means for applying the plating composition to a substrate.
- diaphragm compartment cells may be employed for plating, they are not preferred for economy.
- the following examples show ways in which the invention has been practiced but should not be construed as limiting the invention.
- plating tests in the examples are conducted in a modified Hull cell.
- the standard Hull cell is a trapezoidal box of nonconductive material at the opposite ends of which are positioned anode and cathode plates, as has been more particularly described in US. Pat. No. 2,149,344.
- For either the standard or the modified Hull cell it is possible to easily determine the effective plating range of a plating composition under varying conditions.
- /z-inch holes are introduced in the parallel sides of the cell adjacent the anode and cathode whereby, upon immersion of the cell in another containing plating solution, into which vessel the cell will fit very closely, improved electrolyte circulation and consequent improved temperature control is afforded, as more particularly described in an article appearing in Plating, Volume 46, Number 3 (1959), page 257.
- EXAMPLE 1 Into a container there is placed 0.8 mole of chromium metal, 1.8 moles of glycolic acid of 70% strength, that is, 70% of glycolic acid and a balance of water, and 0.5 mole of 37.3% strength hydrochloric acid which is 37.3% by weight HCl in water. The container is covered and good ventilation is provided. After the ingredients are placed together in the container, dissolution of the chrostarts slowly but gradually increases thus supplying heat to the reaction. As the reaction continues the temperature of the reaction medium reaches 71 C. without external heating and the chromium metal can be seen by visual inspection to be substantially dissolved. As the temperature starts to subside from 71 C., external heating is applied and the temperature of the reaction medium is permitted to reach 88 C.
- Total reaction time i.e., to complete chromium metal dissolution, is about 4 hours. T hereupon the solution is heated at reflux, reaching a temperature of 107 C., for about 2 hours, and is thereafter permitted to cool.
- the resulting complex having a molar ratio of chromium to glycolic acid of 1:225 and of chromium to chloride of 1:0.625, is added to water to provide a concentration of chromium metal of 40 grams per liter (g./l.).
- a concentration of chromium metal 40 grams per liter (g./l.).
- 150 g./l. of KCl and 63 g./l. of H BO The pH of the bath is adjusted to 2.94 by the addition of 40% strength sodium hydroxide, that is, 40 weight percent NaOH in a balance of water, and the final volume of the bath is adjusted to 1 000 milliliters (mls.) by subsequent addition of water.
- the bath is electrolyzed for 10 to 20 amp hrs/gal. and is then ready for plating in the above-described modified Hull cell.
- Hull cell graphite anodes are used and the cathode for each test is a 3 55 x 2 /8" brass panel, each panel being nickel coated prior to use in the cell.
- Each test is carried out using 10 amperes current for a 3 minute cycle.
- the results shown in the table below give the rates of deposition at seven specific current density levels.
- the chromium thickness reported at each density level is in micro-inches per 3 minute cycle.
- the cur- 6 rent density range shown in the table is in amperes per square foot (a.s.f.).
- the bright range extended from 800 a.s.f. to 6 a.s.f. at the high and low current density areas respectively.
- the plate Over the plating range the plate exhibits a reflective reflectance value of 50 percent, with the color of the chromium deposit being of a slightly darker cast than that observed with commercially available decorative chromium deposits from hexavalent chromium plating baths, the deposit thus exhibiting a deep and rich appearance.
- the results from the fresh bath i.e., the results first given in the table, have been plotted as the upper graph line in the drawing.
- Example 2 In the manner of Example 1 there is placed sufiicient chromium metal, together with sufiicient- 88.4% strength lactic acid, that is, 88.4% lactic acid and the balance water, together with an amount, of 37.3% strength hydrochloric acid, to provide a mole ratio of chromium to lactic acid of 1:1.625 and a mole ratio of chromium to chloride of 1:0.625.
- the contents of the container are reacted in the manner of Example 1, i.e., are permitted to react without external heating, followed by external heating and subsequently by refluxing.
- Plating tests conducted inthe manner of Example 1, after electrolyzing the bath as described in Example 1, are carried out using the Hull cell with graphite anodes and the nickel plated panel cathodes, and using 10 amperes of current for a 3 minute cycle.
- the results given in the table below are for eight different specific current density levels, and are in chromium thickness reported in micro-inches per 3 minute cycle at current density ranges in a.s.f.
- the bright range for some panels from this test extends completely across the panels, representing a range of ap proximately 1000 to 1 a.s.f. which is unique in the history of decorative chromium plating.
- the showing of a definite chromium thickness at the 5 ast. current density level is regarded as an indication that the system will still deposit chromium at the 1-2 a.s.f. level.
- EXAMPLE 3 A bath is prepared by adding this complex to water to provide a concentration of 40 grams of chromium per liter of the bath, and further admixing therewith about 150 g./l. of potassium chloride and about 60 g./l. of H BO In the manner of Example 1, the pH of the bath is adjusted to 3.0 by the addition of sodium hydroxide, and water is added to bring the final volume of the bath to 1000 mls.
- Example 1 Plating tests are carried out in the manner of Example 1 and the results are reported in the table below in the manner of Example 1. Variation in the bath temperature as shown in the table below is deliberate to show affect on plating results.
- the reaction is exothermic and, as agitation in the mixture is continued, external heating is applied until the mixture is brought to boiling and is refluxed for several hours. Following this the volume of the mixture is adjusted to 750 mls. by the addition of water and to this there is added 56.6 grams of H BO and 150 grams of potassium chloride, with agitation. As the mixture is further permitted to cool to 90 F., the volume is adjusted to 1 liter and the pH is adjusted to 3.4 in the manner of Example 1.
- the resulting bath contains sufiicient complex to provide 40 grams of chromium per liter of the bath and the complex has a molar ratio of chromium to glycolic acid of 112.25 and of chromium to fluoride of 1:3. Thereafter the bath is electrolyzed for 0.5 hour at a current of 12 amperes. Plating tests are carried out in the manner of Example 1 and the results are reported in the table below in the manner of Example 1.
- TAB LE 4 The plating test gives a full bright range coverage to the extreme low current density end of the panel and lacked 2% coverage at the extreme high current density area. The bright range is then deemed to be from about 950 a.s.f. down to 1-2 a.s.f.
- the finish on the panel is comparable to the finish described in the panels plated in Example 1, i.e., the panel has a reflective reflectance value of 50%, has a desirably rich and deep appearance, and the color of the chromium deposit is of a slightly darker cast than that observed with commercially available decorative chromium deposits from hexavalent chromium plating baths.
- a comparative chromium glycolate complex is prepared in accordance with the precepts of US. Pat. 3,006,823. For this, there is added to a reaction vessel containing 3000 mls. water, 4398 grams glycolic acid. This mixture is heated to 70 C. and is then gradually combined with a solution of chromic acid containing 2700 grams chromium, expressed as Cr0 and 1680 mls. water. During the slow addition of the chromic acid solution, the temperature in the reaction medium is maintained at 70 C. After addition of the chromic acid solution, the reaction mixture is heated to C. and held at that temperature for one hour. Subsequently, the mixture is permitted to cool and is diluted with water to 11,232 mls.
- Example 1 Using the Hull cell as above described, a plating test is run on this comparative bath in the manner of Example 1, i.e., a nickel plated brass panel cathode is employed and the bath is operated using 10 amperes current for a 3 minute cycle. The results of such test, as rates of deposition at seven different specific current density levels, are shown in the table below for a freshly prepared bath.
- An aqueous electrolytic plating medium for the plating of bright chromium plate comprising a complex, water-soluble trivalent chromic compound containing halogen constituents selected from the group consisting of chloride, fluoride, mixtures thereof and mixtures thereof with other halide, and said complex containing carboxylic acid constituents supplied by acids selected from the group consisting of glycolate, lactate, oxalate, and mixtures thereof, said medium having a molar concentration of chromium within the range from about 0.5 to about 3 and said complex having a molar ratio of chromium atoms to carboxyl constituent within the range of 1:0.7 to 1:3, and a molar ratio of chromium atoms to halogen atoms within the range of 1:01 to 1:3.5.
- halogen is selected from the group consisting of fluoride and mixtures thereof with other halides.
- said substance supplying boric acid equivalent in aqueous solution is selected from the group consisting of borax, boron oxide, sodium oxyfluoborate, and mixtures thereof and said medium contains between about -70 grams per liter of said substance.
- the method of plating an article with bright chromium plate comprising passing an electrical current between an anode and an article forming a cathode which are in contact with an aqueous chromium plating medium comprising a complex, water-soluble trivalent chromic compound containing halogen constituents selected from the group consisting of chlorine, fluorine, mixtures thereof, and mixtures thereof with other halide, and said complex containing carboxylic acid constituents supplied by acids selected from the group consisting of glycolate lactate, oxalate, and mixtures thereof, said medium having a molar concentration of chromium within the range from about 0.5 to about 3, and said complex having a molar ratio of chromium atoms to carboxyl constituent within the range of 1:07 to 1:3, and a molar ratio of chromium atoms to halogen atoms within the range of 1:0.1 to 1:35.
- a chromium plating solution for dilution with aqueous medium in preparation of a plating bath for the plating of bright chromium plate upon articles immersed therein said solution containing, in aqueous medium, the trivalent-chromium-containing reaction complex from halogen, carboxylic acid, and chromium-providing substance, said plating solution comprising a concentrate in water medium of said complex supplying above about grams of chromium per liter of the medium, said complex containing halogen constituents selected from the group consisting of chlorine, fluorine, mixtures thereof, and mixtures thereof with other halide, and said complex containing carboxylic acid constituents supplied by acids selected from the group consisting of glycolate, lactate, oxalate, and mixtures thereof, said complex having a molar ratio of chromium atoms to carboxyl constituent within the range of 1:07 to 1:3, and a molar ratio of chromium atoms to halogen atoms within the range of
- halogen constituent is selected from the group consisting of fluoride and mixtures thereof with other halides.
- the plating solution of claim 10 characterized by containing a molar ratio of moles of chromium supplied by said complex to moles of boric acid equivalent of between about 1:1.1 to about 1:03.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11689171A | 1971-02-19 | 1971-02-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3706637A true US3706637A (en) | 1972-12-19 |
Family
ID=22369843
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US116891A Expired - Lifetime US3706637A (en) | 1971-02-19 | 1971-02-19 | Chromium plating bath containing chromic compound |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3706637A (OSRAM) |
| JP (1) | JPS5624038B1 (OSRAM) |
| CA (1) | CA1019277A (OSRAM) |
| FR (1) | FR2125316B1 (OSRAM) |
| GB (1) | GB1376022A (OSRAM) |
| IT (1) | IT948643B (OSRAM) |
| NL (1) | NL7202042A (OSRAM) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2204702A1 (en) * | 1972-10-27 | 1974-05-24 | Du Pont | Chromium plating bath - for rotary receptacle plating |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3076833A (en) * | 1959-07-20 | 1963-02-05 | Diamond Alkali Co | Chromic chloride complexes |
-
1971
- 1971-02-19 US US116891A patent/US3706637A/en not_active Expired - Lifetime
-
1972
- 1972-02-04 FR FR7203768A patent/FR2125316B1/fr not_active Expired
- 1972-02-08 CA CA134,149A patent/CA1019277A/en not_active Expired
- 1972-02-16 NL NL7202042A patent/NL7202042A/xx not_active Application Discontinuation
- 1972-02-18 GB GB759872A patent/GB1376022A/en not_active Expired
- 1972-02-18 IT IT48414/72A patent/IT948643B/it active
- 1972-02-18 JP JP1658872A patent/JPS5624038B1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE2207704B2 (de) | 1976-02-19 |
| CA1019277A (en) | 1977-10-18 |
| JPS5624038B1 (OSRAM) | 1981-06-03 |
| GB1376022A (en) | 1974-12-04 |
| FR2125316A1 (OSRAM) | 1972-09-29 |
| FR2125316B1 (OSRAM) | 1976-10-29 |
| NL7202042A (OSRAM) | 1972-08-22 |
| DE2207704A1 (de) | 1972-08-31 |
| IT948643B (it) | 1973-06-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AS | Assignment |
Owner name: MCGEAN-ROHCO, INC. 1250 TERMINAL TOWER, CLEVELAND, Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:E.I. DU PONT DE NEMOURS AND COMPANY;REEL/FRAME:004015/0065 Effective date: 19820520 |