US3563862A - High precision anodizing of thin films - Google Patents

High precision anodizing of thin films Download PDF

Info

Publication number
US3563862A
US3563862A US773185A US3563862DA US3563862A US 3563862 A US3563862 A US 3563862A US 773185 A US773185 A US 773185A US 3563862D A US3563862D A US 3563862DA US 3563862 A US3563862 A US 3563862A
Authority
US
United States
Prior art keywords
electrolyte
resistance
measurement
pad
anodization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US773185A
Inventor
Jean Joly
Georges Dubois
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lignes Telegraphiques et Telephoniques LTT SA
Original Assignee
Lignes Telegraphiques et Telephoniques LTT SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lignes Telegraphiques et Telephoniques LTT SA filed Critical Lignes Telegraphiques et Telephoniques LTT SA
Application granted granted Critical
Publication of US3563862A publication Critical patent/US3563862A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/04Anodisation of aluminium or alloys based thereon
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/005Apparatus specially adapted for electrolytic conversion coating

Definitions

  • Anodization is carried through a movable arm carrying a pad filled with electrolyte the movement of which is synchronized with the A-C oxidising current.
  • the film surface is dried when the pad is removed.
  • the present invention relates to improvements in processes for the anodization of thin-film devices and more particularly to the control of this operation. It is well known to produce devices from thin metal films deposited upon insulating substrates. These devices alford such advantages from the view-point of overall dimensions and reliability that their industrial development has been very rapid in recent years. Such devices consist mainly in metal deposits produced by evaporation in vacuo, by cathode sputtering or by any other method known per se. These films, which are very thin, are relatively sensitive to weathering agents, and a protective oxide layer is employed to passivate the surface. This protection is often afforded through anodization.
  • a simple method of controlling the degree of oxidation consists in measuring the resistance of the layer in the course of the operation. When the operation is automatic, the measurement permits to limit its duration.
  • the component consists of a patterned thin metal deposit on a non-conductive support.
  • a coarse adjustment of the value of the resistance is effected by means of the parameters defining the deposit: geometrical shape, thickness, etc.
  • the precise adjustment of the value of the resistance is effected by anodizing the resistive layer.
  • the present invention is aimed at increasing the precision of the anodization control by increasing the precision of the dynamic resistance measurement during oxidation. It is mainly characterised in that it makes it possible to eliminate the measurement error due to the presence of electrolyte on the surface of the film the resistance of which is being controlled.
  • the present invention has for its object to eliminate the influence of the electrolyte during the measurement, and it is essentially characterised in that the layer to be anodized is only in contact with the electrolyte during the time when it acts as an anode, the said layer being electrolyte-free during the measuring time.
  • the resistor to be adjusted which consists of a metal deposit of given pattern on an insulating substrate 1.
  • the terminal contacts of the metal deposit are connected, generally by soldering, to two leads .2, 2'. These two leads are connected through a switch (not shown) to the resistance measuring circuit (not shown), for example a measuring bridge of a type known per se.
  • the switch makes it possible, to interconnect the lead 2 to a first output terminal of an alternatingcurrent supply source.
  • the switch is so designed as to connect the resistor to the said terminal during the halfcycles in which the latter is positive in relation to the second terminal of the same supply.
  • a pad 3 filled with electrolyte is mounted on the core 4 of an electromagnet 5 which is supplied with alternating current synchronized with the supply source serving for the oxidation.
  • Pad 3 is connected to the second supply terminal.
  • the winding of the electromagnet is so chosen that the pad is in contact with the layer to be anodized during the half-cycles in which the oxidation occurs. It is removed from the resistor as shown in the figure during the half-cycle in which no oxidation is performed and during which the measurement of the resistance takes place. It is to be understood that the alternating displacement of the core may be controlled at any frequency provided that the oxidation current and the movement of the core are synchronous.
  • the pad 3 consists of felt, plastic foam, eider chamois skin or any other porous material which does not leave any fluff and which is filled with 0.1% aqueous orthophosphoric acid solution, the refilling with electrolyte being effected by injection of liquid controlled by an electromagnetic valve every 3 minutes.
  • the alternating-current supply source is a source whose frequency is between 15 and c./s. The frequency is chosen as a function of the range of resistance values to be obtained.
  • the result of the measurement may be used for automating the operation.
  • the resistance value to be reached is stored in a memory, and the measured value may be compared with the desired value, there being derived from this comparison an error signal which serves to control the anodic oxidising circuit either on an on-off basis or progressively, for example by control of the anodic oxidation voltage.
  • the same result would be obtained by displacing, the thin-film circuit, such as the resistor ,1 described in the foregoing instead of the electrolyte filled pad.
  • the thin-film circuit such as the resistor ,1 described in the foregoing instead of the electrolyte filled pad.
  • withdrawal of the pad may be insufficient.
  • the drying may be etfected, for example, by means of a jet ;of dry hot air blown onto the surface during the withdrawal of the buffer.
  • the thin film device When the thin film device is displaced, its own movement may be utilised to remove any electrolyte remaining on the surface through mechanical force.
  • a process for controlling the resistance of a thin metallic film during anodization thereof comprising the following steps:

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Measurement Of Resistance Or Impedance (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)

Abstract

TO OBTAIN HIGH PRECESION CONTROL OF THE ANODIZATION OF THIN METAL FILMS BY MEASUREMENT OF THE RESISTANCE OF THE SAID LAYER IN THE COURSE OF THE OPERATION, THE MEASUREMENT IS PERFORMED ON AN ELECTROLYTE FREE SURFACE. ANODIZATION IS CARRIED THROUGH A MOVEABLE ARM CARRYING A PAD FILLED WITH ELECTROLYTE THE MOVEMENT OF WHICH IS SYNCHRONIZED WITH THE A-C OXIDIZING CURRENT. THE FILM SURFACE IS DRIED WHEN THE PAD IS REMOVED.

Description

Fgb. 16 11971" JYQLY ETAL.
.HIGH PRECISION ANODIZING 0F THIN FILMS Filed Nov. 4, 1968 United States Patent Int. Cl. B23p 1702,- C23b 5/48 US. Cl. 204-15 4 Claims ABSTRACT OF THE DISCLOSURE To obtain high precision control of the anodization of thin metal films by measurement of the resistance of the said layer in the course of the operation, the measurement is performed on an electrolyte free surface.
Anodization is carried through a movable arm carrying a pad filled with electrolyte the movement of which is synchronized with the A-C oxidising current. The film surface is dried when the pad is removed.
BACKGROUND OF THE INVENTION The present invention relates to improvements in processes for the anodization of thin-film devices and more particularly to the control of this operation. It is well known to produce devices from thin metal films deposited upon insulating substrates. These devices alford such advantages from the view-point of overall dimensions and reliability that their industrial development has been very rapid in recent years. Such devices consist mainly in metal deposits produced by evaporation in vacuo, by cathode sputtering or by any other method known per se. These films, which are very thin, are relatively sensitive to weathering agents, and a protective oxide layer is employed to passivate the surface. This protection is often afforded through anodization. A simple method of controlling the degree of oxidation consists in measuring the resistance of the layer in the course of the operation. When the operation is automatic, the measurement permits to limit its duration. In the case of the manufacture of thin-film resistors, the component consists of a patterned thin metal deposit on a non-conductive support. A coarse adjustment of the value of the resistance is effected by means of the parameters defining the deposit: geometrical shape, thickness, etc. The precise adjustment of the value of the resistance is effected by anodizing the resistive layer.
The present invention is aimed at increasing the precision of the anodization control by increasing the precision of the dynamic resistance measurement during oxidation. It is mainly characterised in that it makes it possible to eliminate the measurement error due to the presence of electrolyte on the surface of the film the resistance of which is being controlled.
PRIOR ART In processes hitherto described, such as in US. Pats. 3,341,444, filed on Sept. 1, 1964 and 3,341,445 filed on Sept. 1, 1964, the resistance measurement is effected by connecting to a measuring bridge the two terminals of the resistor which is immersed in the electrolyte bath serving for the oxidation. In the process described in the aforesaid patent and its addition, an alternating voltage is applied to the oxidising bath and the measurement takes place during the half-cycles of the current which do not produce the oxidation. During measurement, the resistance of the metal film is connected in parallel with the resistance consisting of the electrolyte layer which con- 3,563,862 Patented Feb. 16, 1971 sists of that fraction of the bath situated between the two terminals of the resistor. The measured resistance value is therefore the resultant of these two parallel-connected resistances.
The present invention has for its object to eliminate the influence of the electrolyte during the measurement, and it is essentially characterised in that the layer to be anodized is only in contact with the electrolyte during the time when it acts as an anode, the said layer being electrolyte-free during the measuring time.
DETAILED DESCRIPTION The invention will be readily understood with reference to the following description and to the figure accompanying it, which are given by way of illustration of the invention and have no limiting character, and which concern the manufacture of thin-film resistors, it being understood that this application does not limit the scope of application of the invention.
There is shown at 1 the resistor to be adjusted, which consists of a metal deposit of given pattern on an insulating substrate 1. The terminal contacts of the metal deposit are connected, generally by soldering, to two leads .2, 2'. These two leads are connected through a switch (not shown) to the resistance measuring circuit (not shown), for example a measuring bridge of a type known per se. The switch makes it possible, to interconnect the lead 2 to a first output terminal of an alternatingcurrent supply source. The switch is so designed as to connect the resistor to the said terminal during the halfcycles in which the latter is positive in relation to the second terminal of the same supply. A pad 3 filled with electrolyte is mounted on the core 4 of an electromagnet 5 which is supplied with alternating current synchronized with the supply source serving for the oxidation. Pad 3 is connected to the second supply terminal. The winding of the electromagnet is so chosen that the pad is in contact with the layer to be anodized during the half-cycles in which the oxidation occurs. It is removed from the resistor as shown in the figure during the half-cycle in which no oxidation is performed and during which the measurement of the resistance takes place. It is to be understood that the alternating displacement of the core may be controlled at any frequency provided that the oxidation current and the movement of the core are synchronous.
The mechanical arrangement of the various parts of the circuit is schematically illustrated, it being understood that these elements may be incorporated into a complex assembly operating simultaneously on a large number of resistors 1, it being possible for the measurement to be made multi-successively on the various resistors under treated through an appropriate switching device.
In a particular embodiment of the invention, the pad 3 consists of felt, plastic foam, eider chamois skin or any other porous material which does not leave any fluff and which is filled with 0.1% aqueous orthophosphoric acid solution, the refilling with electrolyte being effected by injection of liquid controlled by an electromagnetic valve every 3 minutes. The alternating-current supply source is a source whose frequency is between 15 and c./s. The frequency is chosen as a function of the range of resistance values to be obtained.
The result of the measurement may be used for automating the operation. The resistance value to be reached is stored in a memory, and the measured value may be compared with the desired value, there being derived from this comparison an error signal which serves to control the anodic oxidising circuit either on an on-off basis or progressively, for example by control of the anodic oxidation voltage.
By applying the invention, on an automatic machine, resistance values to within 0.1% were obtained.
It is to be understood that the same result would be obtained by displacing, the thin-film circuit, such as the resistor ,1 described in the foregoing instead of the electrolyte filled pad. Depending on the resistance range, it may be necessary to eliminate completely the electrolyte film remaining on the surface of the layer in the course of the oxidation. When the electrolyte is not very liquid, withdrawal of the pad may be insufficient. The drying may be etfected, for example, by means of a jet ;of dry hot air blown onto the surface during the withdrawal of the buffer. When the thin film device is displaced, its own movement may be utilised to remove any electrolyte remaining on the surface through mechanical force.
We claim:
1. A process for controlling the resistance of a thin metallic film during anodization thereof comprising the following steps:
oxidizing the thin metallic film by means of an arm the end of which carries a pad filled with electrolyte,
mechanically interrupting the oxidation circuit by distancing said pad and said thin film surface,
drying the film surface when the pad is no longer contacting the surface,
measuring intermittently the resistance value through fixed contacts on the film when said pad and thin film are distanced.
References Cited UNITED STATES PATENTS 3,148,129 9/1964 Basseches et al. 204-228 3,341,444 9/1967 Chapelle 204228 3,341,445 9/1967 Gerhard 204228 FOREIGN PATENTS 1,060,712 3/1967 Great Britain 204-15 OTHER REFERENCES Western Electric Technical Digest No. 4 October 1966 pp. 1 and 2.
JOHN H. MACK, Primary Examiner -T. TUFARIELLO, Assistant Examiner US. Cl. X.R. 204224
US773185A 1967-11-10 1968-11-04 High precision anodizing of thin films Expired - Lifetime US3563862A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR127648 1967-11-10

Publications (1)

Publication Number Publication Date
US3563862A true US3563862A (en) 1971-02-16

Family

ID=8641505

Family Applications (1)

Application Number Title Priority Date Filing Date
US773185A Expired - Lifetime US3563862A (en) 1967-11-10 1968-11-04 High precision anodizing of thin films

Country Status (6)

Country Link
US (1) US3563862A (en)
BE (1) BE723227A (en)
DE (1) DE1808103B2 (en)
FR (1) FR1554760A (en)
GB (1) GB1243830A (en)
NL (1) NL6815523A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4085026A (en) * 1975-06-13 1978-04-18 Imperial Metal Industries (Kynoch) Limited Anode assembly for electrodeposition cell
US5184550A (en) * 1990-03-01 1993-02-09 Heidelberger Druckmaschinen Ag Device for controlling wetting behavior of metal surfaces by application of electrolyte under controlled voltage

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2702207C2 (en) * 1977-01-20 1984-01-12 Robert Bosch Gmbh, 7000 Stuttgart Method and device for adjusting electronic circuits
DE2908361C2 (en) * 1979-03-03 1985-05-15 Dynamit Nobel Ag, 5210 Troisdorf Method for increasing the resistance of electrical ignition elements

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4085026A (en) * 1975-06-13 1978-04-18 Imperial Metal Industries (Kynoch) Limited Anode assembly for electrodeposition cell
US5184550A (en) * 1990-03-01 1993-02-09 Heidelberger Druckmaschinen Ag Device for controlling wetting behavior of metal surfaces by application of electrolyte under controlled voltage

Also Published As

Publication number Publication date
DE1808103A1 (en) 1969-09-25
GB1243830A (en) 1971-08-25
FR1554760A (en) 1969-01-24
BE723227A (en) 1969-04-01
NL6815523A (en) 1969-05-13
DE1808103B2 (en) 1971-05-19

Similar Documents

Publication Publication Date Title
Grimm et al. AC impedance study of anodically formed salt films on iron in chloride solution
US4203194A (en) Batch method for making solid-electrolyte capacitors
US3148129A (en) Metal film resistors
US3240685A (en) Method and device for selective anodization
Heine et al. The Distribution of A‐C Resistance in Oxide Films on Aluminum
Burger et al. Dielectric breakdown in electrolytic capacitors
EP0035536A4 (en) Method of manufactoring adjustable thick film capacitors.
US3563862A (en) High precision anodizing of thin films
US3539309A (en) Circuit component machining
US3159556A (en) Stabilized tantalum film resistors
Datta et al. Anodic film studies on nickel under high rate transpassive dissolution conditions
US3282821A (en) Apparatus for making precision resistors
US3079536A (en) Film-forming metal capacitors
US3723257A (en) Methods and apparatus for trimming thin-film devices to value by means of a computer-controlled anodization process
US2953507A (en) Method for electrolytic thickness reduction of metal wires
US3573176A (en) Selective anodization apparatus and process
US4302316A (en) Non-contacting technique for electroplating X-ray lithography
US4604144A (en) Process for cleaning a circuit board
US3412220A (en) Voltage sensitive switch and method of making
US3649488A (en) Electrochemical etching technique for charting and curing defects in thin film capacitors
US3738917A (en) Method for simultaneous production of a plurality of equal semiconductor components with a pn junction from a single semiconductor wafer
US3481843A (en) Technique for anodization of thin film resistors
US3388047A (en) Controlled electrolytic treatment of materials
Bernard The equivalent series resistance of anodically formed oxide films on aluminum
US4134808A (en) Method of trimming electronic components having an integrated circuit to design specification