US3462271A - Diazotype material - Google Patents
Diazotype material Download PDFInfo
- Publication number
- US3462271A US3462271A US547738A US3462271DA US3462271A US 3462271 A US3462271 A US 3462271A US 547738 A US547738 A US 547738A US 3462271D A US3462271D A US 3462271DA US 3462271 A US3462271 A US 3462271A
- Authority
- US
- United States
- Prior art keywords
- group
- diazonium
- amino
- compounds
- alkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/16—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms
- C07D295/18—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms by radicals derived from carboxylic acids, or sulfur or nitrogen analogues thereof
- C07D295/182—Radicals derived from carboxylic acids
- C07D295/185—Radicals derived from carboxylic acids from aliphatic carboxylic acids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J29/00—Catalysts comprising molecular sieves
- B01J29/04—Catalysts comprising molecular sieves having base-exchange properties, e.g. crystalline zeolites
- B01J29/06—Crystalline aluminosilicate zeolites; Isomorphous compounds thereof
- B01J29/061—Crystalline aluminosilicate zeolites; Isomorphous compounds thereof containing metallic elements added to the zeolite
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/08—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms
- C07D295/084—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms with the ring nitrogen atoms and the oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
- C07D295/088—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms with the ring nitrogen atoms and the oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/08—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms
- C07D295/096—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms with the ring nitrogen atoms and the oxygen or sulfur atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/12—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms
- C07D295/135—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms with the ring nitrogen atoms and the substituent nitrogen atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10G—CRACKING HYDROCARBON OILS; PRODUCTION OF LIQUID HYDROCARBON MIXTURES, e.g. BY DESTRUCTIVE HYDROGENATION, OLIGOMERISATION, POLYMERISATION; RECOVERY OF HYDROCARBON OILS FROM OIL-SHALE, OIL-SAND, OR GASES; REFINING MIXTURES MAINLY CONSISTING OF HYDROCARBONS; REFORMING OF NAPHTHA; MINERAL WAXES
- C10G27/00—Refining of hydrocarbon oils in the absence of hydrogen, by oxidation
- C10G27/04—Refining of hydrocarbon oils in the absence of hydrogen, by oxidation with oxygen or compounds generating oxygen
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10G—CRACKING HYDROCARBON OILS; PRODUCTION OF LIQUID HYDROCARBON MIXTURES, e.g. BY DESTRUCTIVE HYDROGENATION, OLIGOMERISATION, POLYMERISATION; RECOVERY OF HYDROCARBON OILS FROM OIL-SHALE, OIL-SAND, OR GASES; REFINING MIXTURES MAINLY CONSISTING OF HYDROCARBONS; REFORMING OF NAPHTHA; MINERAL WAXES
- C10G27/00—Refining of hydrocarbon oils in the absence of hydrogen, by oxidation
- C10G27/04—Refining of hydrocarbon oils in the absence of hydrogen, by oxidation with oxygen or compounds generating oxygen
- C10G27/06—Refining of hydrocarbon oils in the absence of hydrogen, by oxidation with oxygen or compounds generating oxygen in the presence of alkaline solutions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/52—Compositions containing diazo compounds as photosensitive substances
- G03C1/54—Diazonium salts or diazo anhydrides
Definitions
- the present invention relates to a diazotype material and more particularly relates to improved photosensitive diazo components useful in diazotype reproduction material.
- diazo compounds In copying papers and other diazotype materials that have been sensitized with diazo compounds, the derivatives of unilaterally diazotized p-phenylenediamine have been used as the photosensitive components. These diazonium compounds have a tertiary amino group of basic character and they have been used successfully for both the dry process and the semiwet process.
- the diazo compounds which are most suitable are those containing lower alkyl groups attached to the basic nitrogen atom, while for the semiwet process the best ones are those in which the basic nitrogen atom is attached to higher hydrocarbon radicals.
- the substituents on the basic nitrogen atom affect not only coupling speed, but they also affect the light sensitivity and keeping qualities of the diazo compounds and the light-sensitive layers prepared therewith.
- the properties of the p-aminobenzene diazo compounds depend also on substituents attached to the phenylene ring.
- a substituent such as a methyl, methoxy or carboxyl group in a position ortho to the diazonium group brings about a considerable improvement in stability and at the same time a color shift toward blue.
- Light sensitivity is, however, lowered by these substituents.
- the presence of an alkoxy group in a position meta to the diazonium group makes the diazo compound considerably more light sensitive in relation to the unsubstituted compound, but the keeping qualities become poorer as a result.
- this type of diazo compound is nevertheless important because of its high light sensitivity and it finds practical use in cases where copies have to be prepared as quickly as possible.
- diazotype material having improved stability and light sensitivity comprising substituted p-aminobenzene diazonium compounds which are meta-substituted with alkoxy, aryloxy, or aralkoxy groups and additionally by hydroxyalkyl substituent in the p-amino group.
- the lightsensitive diazonium compounds of the present invention have the general formula:
- R is an alkylene group which contains at least 2 C-atoms, R is an alkylene group,
- R is an alkyl, aralkyl, or hydroxyalkyl
- Z is an alkoxy, aralkoxy, aryloxy, or the group wherein R is hydrogen, or an alkyl or hydroxyalkyl,
- R is alkyl, hydroxyalkyl, or aralkyl, or
- X is hydrogen or a halogen or a methyl group
- Y is an anion of an acid.
- hydroxyalkyl radicals present in the diazo compounds defined above are preferably monohydroxyalkyl groups but may, however, also contain more than one hydroxyl group.
- alkyl or .alkylene radicals radicals with up to four carbon atoms are preferred.
- R and R are aralkyl groups
- the benzyl group is preferred, which may optionally contain one or several low alkyl radicals or, on the nucleus, other substituents inert in the reaction.
- the diazotype material according to the present invention exhibits particularly good stability with very good light sensitivity.
- the diazo compounds which characterize the material have good compatibility with additives and stabilizers such as, e.g., citric acid, thiourea, zinc chloride, naphthalene-1,3,6-trisulfonic acid.
- additives and stabilizers such as, e.g., citric acid, thiourea, zinc chloride, naphthalene-1,3,6-trisulfonic acid.
- the material according to the invention can be prepared both as two-component material for the so-called dry process and as onecomponent material for the so-called semiwet process.
- the dry process twocomponent material diazo compounds which at the amino group on the nucleus bear a low hydroxyalkyl radical besides a second such radical or a low alkyl radical and, for the semiwet process one-component material, diazo compounds which hear, at the amino group on the nucleus, at higher alkyl or hydroxyalkyl or aralkyl radical as a substituent in addition to the hydroxyalkyl radical which is always necessary.
- the coupling dyes from the diazo compounds which are hydroxyalkylated at the amino nitrogen are, in general, not so sensitive to changes in pH value, are more bluish, and in continuous tones are of the same color as in the full shades.
- the diazo compounds which characterize the reproduction material according to the invention are new and are in general used as diazonium chloride in the form of the double salts with metal halides, for example zinc chloride or cadmium chloride. However, they may also be used in other precipitation forms, e.g., as sulfates, phosphates, borofluorides, for the preparation of the light-sensitive coatings.
- the hydroxyalkyl group is best introduced with the aid of alkylene oxide, e.g., ethylene oxide or propylene oxide. Other methods of preparation may also be effectively employed.
- the present diazo compounds are used to prepare diazotype materials in the usual manner as typically shown in the examples. Dry or semiwet developing processes may be employed according to the material prepared and, depending upon the azo coupler components selected, dye images of various colors may be rapidly formed.
- the sensitized base paper is imagewise exposed under a transparent original and developed with a solution which contains in each 100 cc. of water:
- Phloroglucinol 0.330 Trisodium citrate 9.600 Sodium benzoate 2.420 Adipic acid 1.975 Sodium chloride z 5.700 Sodium salt of a dialkylnaphthalene sulfonic acid 0.200
- Continuous tones are also of the same hue as the full shades.
- Example 2 A photocopying base paper of the kind commonly used in diazotype processes and having a precoat consisting of colloidal silicic acid and polyvinyl acetate is coated on the precoated side with a solution which contains in 100 cc. of water:
- the sensitized base paper is imagewise exposed under a transparent original and developed with ammonia. Bluish red lines on a white background are obtained.
- Diazotype reproduction material comprising a support and a photosensitive composition coated thereon, said composition comprising a photosensitive diazonium compound having the general formula:
- R is an alkylene group having 2 to 4 carbon atoms or a beta-hydroxypropylene group
- R is an alkylene group, having 2 to 4 carbon atoms
- R is an alkyl group having 1 to 3 carbon atoms, benzyl,
- Z is an alkoxy having 2 to 4 carbon atoms, phenoxy,
- R is an alkyl having 1 to 3 carbon atoms, or hydroxyalkyl group, and R is an alkyl having 1 to 3 carbon atoms, or benzyl;
- X is hydrogen or a halogen or a methyl group
- Y is an anion of an acid.
- diazonium compound is the zinc chloride double salt of 2-chloro- 4-(N-beta-hydroxypropyl-N-benzyl)-amino-5-[beta (methoxy)ethoxy]benzene diazonium chloride.
- diazonium compound is the zinc chloride double salt of 2-methyl-4- (N-hydroxyethyl-N-ethyl)amino-S-[delta-(N methyl N- benzylamino)butoxy]benzene diazonium chloride.
- diazonium compound is the zinc chloride double salt of 3-[beta- (butoxy)ethoxy]-4 (N-beta hydroxybutyl N methyl) aminobenzene diazonium chloride.
- diazonium compound is the zinc chloride double salt of 3-[gamma-(diethylamino)propoxy]-4-(N-hydroxyethyl N benzyl)aminobenzene diazonium chloride.
- diazoniurn compound is the zinc chloride double salt of 2-chloro- 4-(N-hydroxyethyl-N-hydroxyethyl amino-S- [beta (phen0xy)ethoxy] benzene diazonium chloride.
- diazonium compound is the zinc chloride double salt of 3-[beta- (benzyloxy)ethoxy]-4-(N-hydroxyethyl N propyl)aminobenzene diazonium chloride.
- diazonium compound is the cadmium chloride double salt of 2-methyl-4-(N-hydroxyethyl-N-ethyl)amino-5-[ gamma (N hydroxyethyl-N-propyl amino)propoxy]benzene diazonium chloride.
- diazonium compound is the zinc chloride double salt of 3-[be tahydroxy-gamma-(N-diethylamino)propoxy] 4 (N hydroxyethyl-N-ethyl)aminobenzene diazonium chloride.
- diazonium compound is the zinc chloride double salt of 3-[betahydroxy-gamma-(N-diethylamino)propoxy] 4 (N hydroxyethyl-N-benzyl)aminobenzcne diazonium chloride.
Description
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEK47829A DE1226879B (en) | 1962-09-26 | 1962-09-26 | Light-sensitive copying material with p-phenylenediamine derivative diazotized on one side as a light-sensitive substance |
DEK0051523 | 1963-12-03 | ||
DEK0051880 | 1964-01-18 | ||
DEK56060A DE1289736B (en) | 1962-09-26 | 1965-05-08 | Photosensitive copying material which contains as photosensitive substance at least one derivative of p-phenylenediamine which is diazotized on one side and has an alkoxy group in the m-position to the diazo group |
DEK56061A DE1289425B (en) | 1962-09-26 | 1965-05-08 | Photosensitive copying material which, as photosensitive substance, contains at least one derivative of p-phenylenediamine which is diazotized on one side and has an alkoxy group in the m-position to the diazo group |
Publications (1)
Publication Number | Publication Date |
---|---|
US3462271A true US3462271A (en) | 1969-08-19 |
Family
ID=27512136
Family Applications (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US311220A Expired - Lifetime US3272630A (en) | 1962-09-26 | 1963-09-24 | Light-sensitive reproduction material containing unilaterally diazotized p-phenylene-diamine derivatives as the light sensitive substance |
US425921A Expired - Lifetime US3432301A (en) | 1962-09-26 | 1965-01-15 | Reproduction material |
US547721A Expired - Lifetime US3459551A (en) | 1962-09-26 | 1966-05-05 | Diazotype material |
US547738A Expired - Lifetime US3462271A (en) | 1962-09-26 | 1966-05-05 | Diazotype material |
Family Applications Before (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US311220A Expired - Lifetime US3272630A (en) | 1962-09-26 | 1963-09-24 | Light-sensitive reproduction material containing unilaterally diazotized p-phenylene-diamine derivatives as the light sensitive substance |
US425921A Expired - Lifetime US3432301A (en) | 1962-09-26 | 1965-01-15 | Reproduction material |
US547721A Expired - Lifetime US3459551A (en) | 1962-09-26 | 1966-05-05 | Diazotype material |
Country Status (9)
Country | Link |
---|---|
US (4) | US3272630A (en) |
BE (3) | BE651969A (en) |
CH (3) | CH439960A (en) |
DE (5) | DE1226879B (en) |
DK (2) | DK116488B (en) |
FI (2) | FI44335B (en) |
GB (4) | GB1001493A (en) |
NL (6) | NL140344B (en) |
SE (5) | SE301420B (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3769021A (en) * | 1966-08-26 | 1973-10-30 | Ricoh Kk | Light-sensitive diazotype copying material |
US4284705A (en) * | 1977-08-09 | 1981-08-18 | Eastman Kodak Company | Photosensitive diazo salt compositions and lithographic plate comprising same |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL297944A (en) * | 1962-09-26 | |||
US3379531A (en) * | 1965-03-30 | 1968-04-23 | Gen Aniline & Film Corp | Two-component heat developing diazotypes |
DE1793342C3 (en) * | 1968-09-03 | 1979-05-23 | Hoechst Ag, 6000 Frankfurt | Fluorine-containing benzene diazonium compounds and their use in diazotype material |
JPS5115858B2 (en) * | 1972-04-17 | 1976-05-20 | ||
CH661501A5 (en) * | 1982-01-26 | 1987-07-31 | Oreal | COMPOUNDS DERIVATIVE FROM AMINO-3 PROPANOL-2 FOR USE IN DYEING HAIR, PREPARATION METHOD THEREOF, DYE COMPOSITION CONTAINING THE SAME, AND HAIR DYEING METHOD THEREOF. |
EP1465488A4 (en) * | 2001-08-30 | 2007-04-18 | Chemocentryx Inc | Arylamines as inhibitors of chemokine binding to us28 |
DE102013220789A1 (en) * | 2013-10-15 | 2015-04-16 | Henkel Ag & Co. Kgaa | Antiperspirant cosmetic products containing aromatic sulfonic acids |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2529464A (en) * | 1946-09-23 | 1950-11-07 | Gen Aniline & Film Corp | Diazotype composition containing n-hydroxyethyl-m-toluidine-p-diazos |
US2552354A (en) * | 1947-04-16 | 1951-05-08 | Gen Aniline & Film Corp | Diazotype layers containing diazos of n-(2-hydroxypropyl)-phenylenediamines |
US3272630A (en) * | 1962-09-26 | 1966-09-13 | Keuffel & Esser Co | Light-sensitive reproduction material containing unilaterally diazotized p-phenylene-diamine derivatives as the light sensitive substance |
US3281246A (en) * | 1964-11-30 | 1966-10-25 | Keuffel & Esser Co | Diazotype reproduction material |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL261709A (en) * | 1960-03-04 | |||
BE629326A (en) * | 1962-03-09 | |||
DE1255486C2 (en) * | 1963-09-14 | 1973-04-19 | Kalle Ag | Two component diazotype material |
-
0
- NL NL297944D patent/NL297944A/xx unknown
- DE DENDAT1249682D patent/DE1249682B/en active Pending
- DE DENDAT1249683D patent/DE1249683B/en active Pending
-
1962
- 1962-09-26 DE DEK47829A patent/DE1226879B/en active Pending
-
1963
- 1963-09-16 NL NL63297944A patent/NL140344B/en unknown
- 1963-09-19 GB GB36951/63A patent/GB1001493A/en not_active Expired
- 1963-09-23 CH CH1167663A patent/CH439960A/en unknown
- 1963-09-23 SE SE10384/63A patent/SE301420B/xx unknown
- 1963-09-24 US US311220A patent/US3272630A/en not_active Expired - Lifetime
-
1964
- 1964-08-18 BE BE651969A patent/BE651969A/xx unknown
- 1964-11-25 NL NL6413684A patent/NL6413684A/xx unknown
- 1964-11-30 BE BE656466A patent/BE656466A/xx unknown
- 1964-11-30 SE SE14456/64A patent/SE327134B/xx unknown
- 1964-12-02 GB GB49039/64A patent/GB1062918A/en not_active Expired
- 1964-12-18 NL NL646414808A patent/NL141657B/en unknown
-
1965
- 1965-01-15 US US425921A patent/US3432301A/en not_active Expired - Lifetime
- 1965-01-15 SE SE00573/65A patent/SE329331B/xx unknown
- 1965-05-08 DE DEK56061A patent/DE1289425B/en active Pending
- 1965-05-08 DE DEK56060A patent/DE1289736B/en active Pending
-
1966
- 1966-04-28 NL NL666605723A patent/NL149294B/en unknown
- 1966-05-05 US US547721A patent/US3459551A/en not_active Expired - Lifetime
- 1966-05-05 DK DK231666AA patent/DK116488B/en unknown
- 1966-05-05 US US547738A patent/US3462271A/en not_active Expired - Lifetime
- 1966-05-05 DK DK231366AA patent/DK114170B/en unknown
- 1966-05-06 GB GB20202/66A patent/GB1122249A/en not_active Expired
- 1966-05-06 FI FI1196/66A patent/FI44335B/fi active
- 1966-05-06 CH CH661366A patent/CH468024A/en unknown
- 1966-05-06 NL NL6606212A patent/NL6606212A/xx unknown
- 1966-05-06 SE SE06294/66A patent/SE340042B/xx unknown
- 1966-05-06 BE BE680701D patent/BE680701A/xx unknown
- 1966-05-06 GB GB20201/66A patent/GB1122104A/en not_active Expired
- 1966-05-06 CH CH661466A patent/CH468025A/en unknown
- 1966-05-06 SE SE06295/66A patent/SE340043B/xx unknown
- 1966-05-06 FI FI1197/66A patent/FI44191B/fi active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2529464A (en) * | 1946-09-23 | 1950-11-07 | Gen Aniline & Film Corp | Diazotype composition containing n-hydroxyethyl-m-toluidine-p-diazos |
US2552354A (en) * | 1947-04-16 | 1951-05-08 | Gen Aniline & Film Corp | Diazotype layers containing diazos of n-(2-hydroxypropyl)-phenylenediamines |
US3272630A (en) * | 1962-09-26 | 1966-09-13 | Keuffel & Esser Co | Light-sensitive reproduction material containing unilaterally diazotized p-phenylene-diamine derivatives as the light sensitive substance |
US3281246A (en) * | 1964-11-30 | 1966-10-25 | Keuffel & Esser Co | Diazotype reproduction material |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3769021A (en) * | 1966-08-26 | 1973-10-30 | Ricoh Kk | Light-sensitive diazotype copying material |
US4284705A (en) * | 1977-08-09 | 1981-08-18 | Eastman Kodak Company | Photosensitive diazo salt compositions and lithographic plate comprising same |
Also Published As
Publication number | Publication date |
---|---|
NL6413684A (en) | 1965-11-25 |
SE327134B (en) | 1970-08-10 |
BE651969A (en) | 1965-02-18 |
NL6606212A (en) | 1966-11-10 |
NL149294B (en) | 1976-04-15 |
BE656466A (en) | 1965-05-31 |
CH439960A (en) | 1967-07-15 |
DE1249683B (en) | 1967-09-07 |
CH468024A (en) | 1969-01-31 |
GB1122249A (en) | 1968-07-31 |
DE1289736B (en) | 1969-02-20 |
SE301420B (en) | 1968-06-04 |
NL140344B (en) | 1973-11-15 |
FI44191B (en) | 1971-06-01 |
SE329331B (en) | 1970-10-05 |
GB1001493A (en) | 1965-08-18 |
FI44335B (en) | 1971-06-30 |
BE680701A (en) | 1966-11-07 |
US3272630A (en) | 1966-09-13 |
SE340042B (en) | 1971-11-01 |
NL6414808A (en) | 1965-07-19 |
DE1289425B (en) | 1969-02-13 |
DE1226879B (en) | 1966-10-13 |
US3459551A (en) | 1969-08-05 |
GB1122104A (en) | 1968-07-31 |
SE340043B (en) | 1971-11-01 |
DK114170B (en) | 1969-06-02 |
NL297944A (en) | |
NL6605723A (en) | 1966-11-10 |
DE1249682B (en) | 1967-09-07 |
US3432301A (en) | 1969-03-11 |
CH468025A (en) | 1969-01-31 |
DK116488B (en) | 1970-01-12 |
GB1062918A (en) | 1967-03-22 |
NL141657B (en) | 1974-03-15 |
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