US3401318A - Switching element having accurately set threshold potential - Google Patents

Switching element having accurately set threshold potential Download PDF

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US3401318A
US3401318A US514956A US51495665A US3401318A US 3401318 A US3401318 A US 3401318A US 514956 A US514956 A US 514956A US 51495665 A US51495665 A US 51495665A US 3401318 A US3401318 A US 3401318A
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electrodes
switching element
semiconductor
projection
resistance
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US514956A
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Jensen Arne
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Danfoss AS
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Danfoss AS
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C7/00Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/04Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material having negative temperature coefficient
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03KPULSE TECHNIQUE
    • H03K17/00Electronic switching or gating, i.e. not by contact-making and –breaking
    • H03K17/51Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used
    • H03K17/56Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices
    • H03K17/70Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices the devices having only two electrodes and exhibiting negative resistance
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices without a potential-jump barrier or surface barrier, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/20Multistable switching devices, e.g. memristors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices without a potential-jump barrier or surface barrier, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801Constructional details of multistable switching devices
    • H10N70/841Electrodes
    • H10N70/8418Electrodes adapted for focusing electric field or current, e.g. tip-shaped
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices without a potential-jump barrier or surface barrier, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801Constructional details of multistable switching devices
    • H10N70/881Switching materials
    • H10N70/882Compounds of sulfur, selenium or tellurium, e.g. chalcogenides
    • H10N70/8828Tellurides, e.g. GeSbTe

Definitions

  • the threshold potential is accurately determined by a projection, preferably conical, formed by a punched mark on one of the electrodes and extending toward the other electrode.
  • the projection determines the position of a current path between the electrodes and makes it possible to make similar switching elements with similar threshold potentials.
  • the present invention relates to a semiconductor switching element, and more particularly to a semiconductor switching element utilizing semiconductor material having a negative temperature coeflicient of resistance.
  • Switching elements containing a body of switching material consisting of a semiconductor material having a neagtive temperature coefiicient of resistance operates in this manner: when a potential is applied across the semiconductor material, a very small current will flow therethrough; if the potential exceeds a certain threshold value, the resistance between the electrodes drops sharply to a very low value. It is believed that the current through the switching material causes heating thereof which is less than the heat dissipation of the material between the electrodes itself, that is the current through the material itself does not cause heating, which results in a decrease of resistance.
  • Elements of this kind are known; they consist essential ly of tellurium, with additives from elements of groups IV and V of the Periodic Table of Elements. They can be made by vapor deposition, by sintering, or by permitting a melt of the semiconductor material to solidify on an electrode plate. In their high resistance state, the resistance between coplanar parallel electrodes may be several megohms; in their low resistance state the resistance may drop to the order of 1 ohm.
  • a suitable composition is, for example, 67.5% tellurium, 25% arsenic, and 7.5% germanium.
  • the semiconductor switching element is so arranged, that semiconductor material is arranged to be sandwiched between a pair of electrodes.
  • One of the electrodes is provided with a projection, which is preferably conical and may be formed by a punch mark, which projection extends in the direction of the other electrode.
  • a body of semiconductor material 1 is arranged between a pair of electrodes 2 and 3, both of which are preferably plane and circular; lead wires 4 and 5 are soldered to electrodes 2 and 3.
  • One of the electrodes is formed with a projection, which is preferably conical and may be made by a punch mark, 7, which projects within a matching depression 6 of the semi-conductor material 1.
  • the resistance of the semiconductor material 1 will remain high.
  • the potential applied is increased and exceeds a certain threshold, increased heating below the point 7 is to be expected, and a low-resistance current path 8 is formed.
  • the current through this path 8 will very quickly rise to a high value, and the current density will be great, which is typical for this kind of semiconductor switching element.
  • the projection 7 determines the location of the current path 8 within the switching element.
  • the construction according to the present invention permits manufacture by the cheapest method, that is by vapor deposition or sintering of the semiconductor material on either one of the electrodes 2, 3. Any irregularities of the material which may occur due to the method of manufacture, and which are not compensated by pressure of the other electrodes, are overcome by the extent of the projection 7.
  • the construction of the switching element with the projection is also suitable when the elec- V v 3 trodes are applied against a semiconductor body having preformed depressions, which depressions however should not be as deep as the extent of the projection 7, and the matching depression 6 of the semiconductor element itself.
  • Adjustment of the threshold potential can be made not only by suitable arrangement of the extent of projection of projection 7, but also by suitable choice of the electrode material.
  • the electrode material consists of good heat conductive material so that the heat generated by current through the semiconductor material, when the applied potential is below the threshold value, can be readily dissipated.
  • a semiconductor switching element comprising, a pair of connecting, parallel electrodes, and semiconductor materialhaving a negative temperature coefficient of resistance located between said electrodes and in contact therewith, wherein one of said electrodes is formed with a conical projection extending in the direction of said other electrode to form a path within said semiconductor 4i material of lesser length, and said projection is larger than irregularities in the surface of the electrodes adjacent the semiconductor material.

Description

Sept. 0, 1968 A. JENSEN 3,401,318
SWITCHING EIJEMENT HAVING ACCURATELY SET THRESHOLD POTENTIAL Filed Dec. 20, 1965 l T V W p ,5
United States Patent 3,401,318 SWITCHING ELEMENT HAVING ACCURATELY SET THRESHOLD POTENTIAL Arne Jensen, Havnbjerg, Als, Denmark, assignor to Danfoss A/ S, Nordborg, Denmark, :1 company of Denmark Filed Dec. 20, 1965, Ser. No. 514,956 Claims priority, application Germany, Dec. 22, 1964, D 6,118 2 Claims. (Cl. 317-235) ABSTRACT OF THE DISCLOSURE A switching element having parallel electrodes between which is disposed a body of semiconductor. material having a negative temperature coefficient of resistance. When a potential is applied across the semiconductor body a very small current will flow therethrough. If the potential exceeds a certain threshold value the resistance between the electrodes drops sharply to a very low value. The threshold potential is accurately determined by a projection, preferably conical, formed by a punched mark on one of the electrodes and extending toward the other electrode. The projection determines the position of a current path between the electrodes and makes it possible to make similar switching elements with similar threshold potentials.
The present invention relates to a semiconductor switching element, and more particularly to a semiconductor switching element utilizing semiconductor material having a negative temperature coeflicient of resistance.
Switching elements containing a body of switching material consisting of a semiconductor material having a neagtive temperature coefiicient of resistance operates in this manner: when a potential is applied across the semiconductor material, a very small current will flow therethrough; if the potential exceeds a certain threshold value, the resistance between the electrodes drops sharply to a very low value. It is believed that the current through the switching material causes heating thereof which is less than the heat dissipation of the material between the electrodes itself, that is the current through the material itself does not cause heating, which results in a decrease of resistance. When the threshold value of voltage, however, is exceeded, so that the current therethrough increases to such an extent that the heat losses can no longer be dissipated, then very quickly a negative temperature coefiicient of resistance will cause a lowering of resistance at a certain region between the electrodes; this in turn causes a larger current, an even greater heating, and a rapid drop of resistance.
Elements of this kind are known; they consist essential ly of tellurium, with additives from elements of groups IV and V of the Periodic Table of Elements. They can be made by vapor deposition, by sintering, or by permitting a melt of the semiconductor material to solidify on an electrode plate. In their high resistance state, the resistance between coplanar parallel electrodes may be several megohms; in their low resistance state the resistance may drop to the order of 1 ohm. A suitable composition is, for example, 67.5% tellurium, 25% arsenic, and 7.5% germanium.
When such coplanar, parallel electrodes are used, the particular region where the semiconductor material breaks down is indeterminate; that is, the breakdown occurs at random, somewhere between the parallel electrodes. The threshold voltage at which the material itself would break down depends to a large extent on the thickness of the material between the electrodes. Since it is very difficult to manufacture such switching elements which have perfectly fiat, parallel electrodes, separated 3,401,318 Patented Sept. 10, 1968 "ice a semiconductor switching element of the type described which is cheaper and easier to manufacture, and in which the threshold potential can be more accurately determined.
Briefly, in accordance with the present invention, the semiconductor switching element is so arranged, that semiconductor material is arranged to be sandwiched between a pair of electrodes. One of the electrodes is provided with a projection, which is preferably conical and may be formed by a punch mark, which projection extends in the direction of the other electrode.
The structure, organization and operation of the invention will now be described more specifically in the following detailed description with reference to the accompanying drawings, in which the sole figure illustrates, schematically, a cross sectional view through a semiconductor switching element of the present invention, which may, in plan view, for example, be circular.
A body of semiconductor material 1 is arranged between a pair of electrodes 2 and 3, both of which are preferably plane and circular; lead wires 4 and 5 are soldered to electrodes 2 and 3. One of the electrodes is formed with a projection, which is preferably conical and may be made by a punch mark, 7, which projects within a matching depression 6 of the semi-conductor material 1. Upon application of a small potential to the connections 4 and 5, a small current will flow through the semiconductor body 1 which is essentially evenly distributed across the cross section thereof. The thickness of the material, through which the current has to pass, is indicated in the drawing by H. Below projection 7, however, where the thickness is only h, the resistance will be slightly less. So long as the dissipation of heat of the material is sufficient to prevent any localized heating, the resistance of the semiconductor material 1 will remain high. When the potential applied is increased and exceeds a certain threshold, increased heating below the point 7 is to be expected, and a low-resistance current path 8 is formed. The current through this path 8 will very quickly rise to a high value, and the current density will be great, which is typical for this kind of semiconductor switching element. Thus, the projection 7 determines the location of the current path 8 within the switching element. The difference between dimensions H and h, for a given material, determines the threshold potential. Thus, even if the surfaces of electrodes 2 and 3 should show irregularities, causing spurious current paths or non-reproducibility of threshold potential, provision of a projection which is greater than such irregularities would determine the threshold potential and definitely locate current path 8. When the material of the electrode is harder than that of the semiconductor body, a subsequent adjustment of the depth of the projection 7 can be made, for example by slight additional punching, screw pressure against a housing, or the like. Locating this projection 7 within the center of the switching element, that is at the center of the circle in a preferred construction, provides for best utilization of material, and for most accurate reproducibility of elements.
The construction according to the present invention permits manufacture by the cheapest method, that is by vapor deposition or sintering of the semiconductor material on either one of the electrodes 2, 3. Any irregularities of the material which may occur due to the method of manufacture, and which are not compensated by pressure of the other electrodes, are overcome by the extent of the projection 7. The construction of the switching element with the projection is also suitable when the elec- V v 3 trodes are applied against a semiconductor body having preformed depressions, which depressions however should not be as deep as the extent of the projection 7, and the matching depression 6 of the semiconductor element itself.
Adjustment of the threshold potential can be made not only by suitable arrangement of the extent of projection of projection 7, but also by suitable choice of the electrode material. Preferably, the electrode material consists of good heat conductive material so that the heat generated by current through the semiconductor material, when the applied potential is below the threshold value, can be readily dissipated.
I claim:
1. A semiconductor switching element comprising, a pair of connecting, parallel electrodes, and semiconductor materialhaving a negative temperature coefficient of resistance located between said electrodes and in contact therewith, wherein one of said electrodes is formed with a conical projection extending in the direction of said other electrode to form a path within said semiconductor 4i material of lesser length, and said projection is larger than irregularities in the surface of the electrodes adjacent the semiconductor material.
2. An element as claimed in claim 1 wherein said electrodes are of good heat conductive material.
References Cited 4 UNITED STATES PATENTS 3,017,520 1/1962 Maupin 3l7-235 3,056,100 9/1962 Warner 317-235 3,309,585 3/1967 Forrest 317--235 3,331,432 7/1967 Cotton 317-235 FOREIGN PATENTS 107,795 7/1939 Great Britian. 953,339 3/1964 Great Britian.
JOHN W. HUCKERT, Primary Examiner.
20 A. 1. JAMES, Assistant Examiner.
US514956A 1964-12-22 1965-12-20 Switching element having accurately set threshold potential Expired - Lifetime US3401318A (en)

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DED0046118 1964-12-22

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US (1) US3401318A (en)
BE (1) BE674037A (en)
DE (1) DE1465450B1 (en)
DK (1) DK111529B (en)
FR (1) FR1460438A (en)
GB (1) GB1065930A (en)
NL (1) NL6516741A (en)
SE (1) SE305024B (en)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3831030A (en) * 1971-07-19 1974-08-20 Texas Instruments Inc Laser-operated system for spectroscopic analysis
US3906537A (en) * 1973-11-02 1975-09-16 Xerox Corp Solid state element comprising semi-conductive glass composition exhibiting negative incremental resistance and threshold switching
US4331861A (en) * 1979-09-28 1982-05-25 Siemens Aktiengesellschaft Positive temperature coefficient (PTC) resistor heating device
US4364021A (en) * 1977-10-07 1982-12-14 General Electric Company Low voltage varistor configuration
US4445026A (en) * 1979-05-21 1984-04-24 Raychem Corporation Electrical devices comprising PTC conductive polymer elements
US5863407A (en) * 1993-05-14 1999-01-26 Kiyokawa Mekki Kougyo Co., Ltd. Metal film resistor having fuse function and method for producing the same
EP1355365A2 (en) * 2002-04-04 2003-10-22 Hewlett-Packard Company Electrode for phase change memory device
US20040087074A1 (en) * 2002-11-01 2004-05-06 Young-Nam Hwang Phase changeable memory cells and methods of fabricating the same
US20060097238A1 (en) * 2002-07-26 2006-05-11 Laurent Breuil Non-volatile memory element and production method thereof and storage memory arrangement
US20060291268A1 (en) * 2003-11-28 2006-12-28 Happ Thomas D Intergrated semiconductor memory and method for producing an integrated semiconductor memory
US20100034010A1 (en) * 2008-08-06 2010-02-11 Seagate Technology Llc Memory devices with concentrated electrical fields
CN114967234A (en) * 2022-05-26 2022-08-30 京东方科技集团股份有限公司 Display backboard, adjusting method thereof and display device

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB107795A (en) * 1916-07-08 1917-07-09 Toyojiro Terashima Improvements in Stereoscopes.
US3017520A (en) * 1960-07-01 1962-01-16 Honeywell Regulator Co Integral transistor-thermistor and circuit using same for compensating for changing transistor temperature
US3056100A (en) * 1959-12-04 1962-09-25 Bell Telephone Labor Inc Temperature compensated field effect resistor
GB953339A (en) * 1959-05-26 1964-03-25 Ceskoslovenska Akademie Ved Semi-conductor component with a p-n junction and cooled by a peltier cell
US3309585A (en) * 1963-11-29 1967-03-14 Westinghouse Electric Corp Junction transistor structure with interdigitated configuration having features to minimize localized heating
US3331432A (en) * 1964-10-06 1967-07-18 Eugene S Cotton Asymmetrical heat conductor

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE973206C (en) * 1949-05-31 1959-12-24 Siemens Ag Adjustable resistance
BE624465A (en) * 1961-11-06

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB107795A (en) * 1916-07-08 1917-07-09 Toyojiro Terashima Improvements in Stereoscopes.
GB953339A (en) * 1959-05-26 1964-03-25 Ceskoslovenska Akademie Ved Semi-conductor component with a p-n junction and cooled by a peltier cell
US3056100A (en) * 1959-12-04 1962-09-25 Bell Telephone Labor Inc Temperature compensated field effect resistor
US3017520A (en) * 1960-07-01 1962-01-16 Honeywell Regulator Co Integral transistor-thermistor and circuit using same for compensating for changing transistor temperature
US3309585A (en) * 1963-11-29 1967-03-14 Westinghouse Electric Corp Junction transistor structure with interdigitated configuration having features to minimize localized heating
US3331432A (en) * 1964-10-06 1967-07-18 Eugene S Cotton Asymmetrical heat conductor

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3831030A (en) * 1971-07-19 1974-08-20 Texas Instruments Inc Laser-operated system for spectroscopic analysis
US3906537A (en) * 1973-11-02 1975-09-16 Xerox Corp Solid state element comprising semi-conductive glass composition exhibiting negative incremental resistance and threshold switching
US4364021A (en) * 1977-10-07 1982-12-14 General Electric Company Low voltage varistor configuration
US4445026A (en) * 1979-05-21 1984-04-24 Raychem Corporation Electrical devices comprising PTC conductive polymer elements
US4331861A (en) * 1979-09-28 1982-05-25 Siemens Aktiengesellschaft Positive temperature coefficient (PTC) resistor heating device
US5863407A (en) * 1993-05-14 1999-01-26 Kiyokawa Mekki Kougyo Co., Ltd. Metal film resistor having fuse function and method for producing the same
US5961808A (en) * 1993-05-14 1999-10-05 Kiyokawa Mekki Kougyo Co., Ltd. Metal film resistor having fuse function and method for producing the same
EP1355365A3 (en) * 2002-04-04 2005-04-20 Hewlett-Packard Company Electrode for phase change memory device
EP1355365A2 (en) * 2002-04-04 2003-10-22 Hewlett-Packard Company Electrode for phase change memory device
US20060097238A1 (en) * 2002-07-26 2006-05-11 Laurent Breuil Non-volatile memory element and production method thereof and storage memory arrangement
US7361924B2 (en) * 2002-07-26 2008-04-22 Infineon Technologies Ag Non-volatile memory element and production method thereof and storage memory arrangement
US20080206931A1 (en) * 2002-07-26 2008-08-28 Laurent Breuil Nonvolatile memory element and production method thereof and storage memory arrangement
US7923342B2 (en) 2002-07-26 2011-04-12 Infineon Technologies Ag Nonvolatile memory element and production method thereof and storage memory arrangement
US20040087074A1 (en) * 2002-11-01 2004-05-06 Young-Nam Hwang Phase changeable memory cells and methods of fabricating the same
US7105396B2 (en) 2002-11-01 2006-09-12 Samsung Electronics Co., Ltd. Phase changeable memory cells and methods of fabricating the same
DE10351017B4 (en) * 2002-11-01 2007-09-06 Samsung Electronics Co., Ltd., Suwon Phase change memory cells and methods of making the same
US20060291268A1 (en) * 2003-11-28 2006-12-28 Happ Thomas D Intergrated semiconductor memory and method for producing an integrated semiconductor memory
US7787279B2 (en) 2003-11-28 2010-08-31 Qimonda Ag Integrated circuit having a resistive memory
US20100034010A1 (en) * 2008-08-06 2010-02-11 Seagate Technology Llc Memory devices with concentrated electrical fields
CN114967234A (en) * 2022-05-26 2022-08-30 京东方科技集团股份有限公司 Display backboard, adjusting method thereof and display device
CN114967234B (en) * 2022-05-26 2023-11-03 京东方科技集团股份有限公司 Display backboard, adjusting method thereof and display device

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BE674037A (en) 1966-04-15
SE305024B (en) 1968-10-14
FR1460438A (en) 1966-11-25
GB1065930A (en) 1967-04-19
DK111529B (en) 1968-09-09
DE1465450B1 (en) 1970-07-23
NL6516741A (en) 1966-06-23

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