US3317664A - Projection system - Google Patents
Projection system Download PDFInfo
- Publication number
- US3317664A US3317664A US392107A US39210764A US3317664A US 3317664 A US3317664 A US 3317664A US 392107 A US392107 A US 392107A US 39210764 A US39210764 A US 39210764A US 3317664 A US3317664 A US 3317664A
- Authority
- US
- United States
- Prior art keywords
- medium
- naphthalene
- deformable
- deformations
- container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 claims description 54
- KCXMKQUNVWSEMD-UHFFFAOYSA-N benzyl chloride Chemical compound ClCC1=CC=CC=C1 KCXMKQUNVWSEMD-UHFFFAOYSA-N 0.000 claims description 16
- 229940073608 benzyl chloride Drugs 0.000 claims description 16
- 239000007795 chemical reaction product Substances 0.000 claims description 16
- 238000005727 Friedel-Crafts reaction Methods 0.000 claims description 14
- 230000003287 optical effect Effects 0.000 claims description 14
- 239000000463 material Substances 0.000 description 32
- 238000010894 electron beam technology Methods 0.000 description 16
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 12
- 239000000203 mixture Substances 0.000 description 12
- 150000002790 naphthalenes Chemical class 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 7
- 230000007423 decrease Effects 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000012530 fluid Substances 0.000 description 6
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 5
- 230000003247 decreasing effect Effects 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- -1 methyl-substituted naphthalene Chemical class 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 4
- 238000009835 boiling Methods 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 229940093956 potassium carbonate Drugs 0.000 description 3
- 229910000027 potassium carbonate Inorganic materials 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- KTHUKEZOIFYPEH-UHFFFAOYSA-N 1-benzylnaphthalene Chemical compound C=1C=CC2=CC=CC=C2C=1CC1=CC=CC=C1 KTHUKEZOIFYPEH-UHFFFAOYSA-N 0.000 description 2
- QPUYECUOLPXSFR-UHFFFAOYSA-N 1-methylnaphthalene Chemical compound C1=CC=C2C(C)=CC=CC2=C1 QPUYECUOLPXSFR-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- PUWZJGYABYPHCK-UHFFFAOYSA-N 1,2-dibenzylnaphthalene Chemical compound C=1C=C2C=CC=CC2=C(CC=2C=CC=CC=2)C=1CC1=CC=CC=C1 PUWZJGYABYPHCK-UHFFFAOYSA-N 0.000 description 1
- QWUWMCYKGHVNAV-UHFFFAOYSA-N 1,2-dihydrostilbene Chemical group C=1C=CC=CC=1CCC1=CC=CC=C1 QWUWMCYKGHVNAV-UHFFFAOYSA-N 0.000 description 1
- 229910000497 Amalgam Inorganic materials 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 101100008046 Caenorhabditis elegans cut-2 gene Proteins 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 235000013871 bee wax Nutrition 0.000 description 1
- 239000012166 beeswax Substances 0.000 description 1
- 125000001797 benzyl group Chemical class [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 239000007863 gel particle Substances 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- XCOBTUNSZUJCDH-UHFFFAOYSA-B lithium magnesium sodium silicate Chemical compound [Li+].[Li+].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[Na+].[Na+].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3 XCOBTUNSZUJCDH-UHFFFAOYSA-B 0.000 description 1
- MJGFBOZCAJSGQW-UHFFFAOYSA-N mercury sodium Chemical compound [Na].[Hg] MJGFBOZCAJSGQW-UHFFFAOYSA-N 0.000 description 1
- YVUZUKYBUMROPQ-UHFFFAOYSA-N mercury zinc Chemical compound [Zn].[Hg] YVUZUKYBUMROPQ-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000191 radiation effect Effects 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910001023 sodium amalgam Inorganic materials 0.000 description 1
- 239000012258 stirred mixture Substances 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N5/00—Details of television systems
- H04N5/74—Projection arrangements for image reproduction, e.g. using eidophor
- H04N5/7416—Projection arrangements for image reproduction, e.g. using eidophor involving the use of a spatial light modulator, e.g. a light valve, controlled by a video signal
- H04N5/7425—Projection arrangements for image reproduction, e.g. using eidophor involving the use of a spatial light modulator, e.g. a light valve, controlled by a video signal the modulator being a dielectric deformable layer controlled by an electron beam, e.g. eidophor projector
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S585/00—Chemistry of hydrocarbon compounds
- Y10S585/929—Special chemical considerations
- Y10S585/944—Radiation-resistant composition
Definitions
- PROJECTION SYSTEM Filed Aug. 26, 1964 SCREEN ELECTRON GUN INVENTOR EDWARD F. PERLOWSKLJR.
- This invention relates to projection systems of the electronic type. More particularly, it relates to such projection systems having a container with a conducting interior and a deformable medium in the container that decreases in resistivity with decreases in thickness in the presence of an electrical charge on the surface of the medium, the medium being the polymeric reaction product of benzyl chloride and naphthalene.
- this projection system which is illustrated in FIG. 1 of the drawing, comprises an evacuated glass envelope containing an electron gun .11 for producing an electron beam 13 deflecting the beam in a rectangular raster over the surface of a light transmitting deformable medium 15 which is within a portion 17 of the transparent container. An enlarged view of this portion of the assembly is shown in FIG. 2.
- the beam 13 is preferably velocity-modulated by a television signal applied to the deflection means (not shown) inthe electron gun 11.
- Deformable medium 15 has a central portion 19 of decreased thickness which is coincident with the raster area of beam 13 produced by electrons from beam 13 which are attracted to a conducting coating 21 on the inner surface of the container portion 17. These same electrons also produce deformations in the surface of the deformable medium 15 and the amplitudes of these deformations are a function of the number of electrons deposited by the beam .13 at the various points on the surface of medium 15. Thus, the amplitudes of these deformations are a function of the modulated electron beam 13.
- the deformations on the surface of medium 15 are utilized to ditfract light from a source 23 in an optical system including a lens 24 which projects an image of light source 23 on the surface of medium 15 through a bar and slit system 25.
- Another lens 29 images the slits of system on the bars of another bar and slit system 31 if there are no deformations on the surface of deformable medium 15.
- any deformations on such surface diifract the transient light so that it passes through the slits in the system 31 with an intensity that corresponds to the amplitudes of the deformations and hence the amplitudes of the applied modulating signal such as a television signal.
- the light passing through system 29 is imaged by a projection lens 33 on screen 35 by means of mirror 37.
- the average charge density produces a force on the medium 15 that overcomes the surface tension from the excess medium outside the raster area and decreases the portion 19 of medium 15 to zero thickness. Under such conditions, no deformations can be formed and the system becomes inoperative until the medium is replaced.
- the above patent teaches that if the medium has the property of decreasing in resistivity with decreasing thickness, portion 19 does not decrease to zero thickness under the pressure of the charges but maintains a thickness which is a function of the magnitude of charge density on the surface of the medium 15. With decrease in resistivity, the time constant is decreased for the passage of leakage current from the surface of deformable medium 15 to the conducting coating beneath it.
- the deformable compositions described in the aforesaid Patent, US. 2,943,147, as suitable for the medium are required to be transparent, be capable of withstanding electron bombardment without significant decomposition, have a viscosity at the operating temperature (between about 25 C. and 150 C.) of approximately 100 to 50,000 centistokes, and the deformable composition must not decompose the conducting coating.
- the medium must also have a volume resistivity that varies within the range of approximately 10 to 10 ohms-cm, with the average resistivity at the stable thickness being approximately 10 ohms-cm.
- deformable media or fluids described in the above patent are, for instance, beeswax, methyl silicone fluids, methyl silicone fluids containing up to 5% of phenyl silicones, methylphenyl silicones containing an average of two methyl and phenyl groups per silicon atom in which the mole ratio of methyl groups to silicon atoms is greater than zero and less than 2, etc.
- these deformable fluids are not as stable as one would desire because under the influence of an electron beam, the deformable medium or deformable fluid tends to increase in viscosity and with continued use of the projection system described above, the viscosity increases to a point where gel particles begin to form and ultimately the deformable medium gels. This means that the apparatus can no longer be used with that particular deformable medium.
- Benzyl chloride is the preferred chloroalkylated material used herein. It will, of course, be appreciated that other halo-substituted benzyl materials of the above description can be used such as the iodoand bromo-substituted materials. However, the chloro-substituted materials are preferred from the point of View of cost and ready availability as well as from the point of view of easier processing. In addition to naphthalene, various hydrocarbon-substituted naphthalenes can also be used.
- methyl naphthalene is very useful as are the aromatic-substituted materials and aralkyl-substituted naphthalene such as the benzyl-substituted material. Mixtures of the above materials are also useful.
- Aluminum chloride is preferred as the catalyst material but other materials well known to those skilled in the art, including zinc chloride, ferric chloride, mercury zinc amalgam, mercury sodium amalgam, and boron trifiuoride, as well as various silicate materials, can be used. Generally speaking, any Lewis acid material or equivalent can be used.
- chloro-methylated aromatic material such as benzyl chloride
- benzyl chloride preferably from about 0.8 to 3 moles of chloro-methylated aromatic material, such as benzyl chloride, are used for each mole of aromatic hydrocarbon and most preferably at least about one mole of halogenated material for each mole of aromatic hydrocarbon.
- from about 0.1 to about 10 moles of chloromethylated material is used for each mole of naphthalene.
- EXAMPLE 1 There were added to a mixture of 256 grams (2 moles) naphthalene, 800 cc. cyclohexane and 2 grams aluminum chloride at 27 C. with mixing, 308 grams (2.44 moles) benzyl chloride over a onehour period, the reaction temperature being maintained at from about 27 C. to 33 C. Stirring was continued for an additional two and onehalf hours to insure completion of reaction, and during this time an additional two grams of aluminum chloride was added to increase the rate of reaction. At the end of the reaction period the mixture was neutralized with dilute (6N) hydrochloric acid, washed with hot potassium hydroxide solution, dried over anhydrous potassium carbonate and treated with activated charcoal and Celkate to improve the color and remove impurities.
- 6N dilute
- Celkate is a synthetic magnesium silicate material made by the Johns- Manville Corporation. Solvent and light ends were removed from the product to provide a 63 mole percent yield of material having a boiling point of from about 180 C. to 325 C. at 25 microns Hg. This material was further distilled to provide a out having a boiling point of 220 to 257 C. at 2 microns Hg. This latter material proved to be very suitable for use in connection with the present system.
- the viscosity of the product at 50 C. was 1000 centistokes and the vapor pressure was 8 10" torr at 50 C.
- the refractive index at 25 C. was 1.6577.
- the selected fraction was subjected to electron irradiation with a 1500 kv.
- the low gas value and small change in viscosity along with the other suitable characteristics of the medium, such as good transparency and a resistivity of about 6 l0 ohm-cm, at 50 C. showed conclusively the suitability of such compositions as a deformable medium in a projection system of the present type.
- the medium was used in the system as described very clear images were obtained and the fluid was used over long periods of time with no evidence of degradation, gelation or other failure.
- the polybenzyl naphthalene of Fraction 3 above when treated in the usual manner, provides a material useful as a writing medium for light valves of the type described.
- deformable media which, because of their desirable transparency, viscosity, resistance to decomposition under electron bombardment, good resistivity, low vapor pressure and compatibility with other elements of the projection system are well suited for the use described. It will be realized that obvious modifications may be made without departing from the scope and spirit of the invention.
- a projection system comprising a container having a conductnig interior, a deformable medium in said container comprising the Friedel-Crafts reaction product of from about 0.1 to moles of halogenated, alkylated aromatic and one mole of a material selected from the group consisting of naphthalene, methyl-substituted naphthalene, aralkyl-substituted naphthalene, aromaticsubstituted naphthalene and mixtures thereof, electron beam means for producing an electrical charge on the surface of said deformable medium as a function of an applied electrical signal and cooperating With said conducting interior to subject the medium to a deforming force to produce deformations in the surf-ace of said medium and a light and optical system for projecting light as a function of the deformations in the surface of said medium.
- a projection system comprising a container having a conducting interior, a deformable medium in said container comprising the Friedel-Crafts reaction product of from about 0.8 to 3 moles of halogenated, alkylated aromatic and one mole of a material selected from the group consisting of naphthalene, methyl-substituted naphthalene, aralkyl-substituted naphthalene, aromatic-substituted naphthalene and mixtures thereof, electron beam means for producing an electrical charge on the surface of said deformable medium as a function of an applied electrical signal and cooperating with said conducting interior to subject the medium to a deforming force to produce deformations in the surface of said medium and a light and optical system for projecting light as a function of the deformations in the surface of said medium.
- a projection system comprising a container having a conducting interior, a deformable medium in said container comprising the Friedel-Crafts reaction product of at least one mole of halogenated, alkylated aromatic and one mole of a material selected from the group consisting of naphthalene, methyl-substituted naphthalene, ar-alkyl-substituted naphthalene, aromatic-substituted naphthalene and mixtures thereof, electron beam means for producing an electrical charge on the surface of said deformable medium as a function of an applied electrical signal and cooperating with said conducting interior to subject the medium to a deforming force to produce deformations in the surface of said medium and a light and optical system for projecting light as a function of the deformations in the surface of said medium.
- a projecting system comprising a container having a conducting interior, a deformable medium in said container comprising the Friedel-Crafts reaction product of from about 0.1 to 10 moles of benzyl chloride and one mole of a material selected from the group consisting of naphthalene, methyl-substituted naphthalene, aralkyl-substituted naphthalene, aromatic-substituted naphthalene and mixtures thereof, electron beam means for producing an electrical charge on the surface of said deformable medium as a function of an applied electrical signal and cooperating With said conducting interior to subject the medium to a deforming force to produce deformations in the surface of said medium and a light and optical system for projecting light as a function of the deformations in the surface of said medium.
- a projection system comprising a container having a conducting interior, a deformable medium in said container comprising the Friedel-Crafts reaction product of from about 0.1 to 10 moles of benzyl chloride and one more of methyl-substituted naphthalene, electron beam means for producing an electrical charge on the surface of said deformable medium as a function of an applied electrical signal and cooperating with said conducting interior to subject the medium to a deforming force to produce deformations in the surface of said medium and a light and optical system for projecting light as a function of the deformations in the surface of said medium.
- a projection system comprising a container having a conducting interior, a deformable medium in said container comprising the Friedel-Crafts reaction product of from about 0.1 to 10 moles of benzyl chloride and one mole of aralkyl-substituted naphthalene, electron beam means for producing an electrical charge on the surface of said deformable medium as a function of an applied electrical signal and cooperating with said conducting interior to subject the medium to a deforming force to produce deformations in the surface of said medium and a light and optical system for projecting lightas a function of the deformations in the surface of said medium.
- a projection system comprising a container having a conducting interior, a deformable medium in said container comprising the Friedel-Crafts reaction product of from about 0.1 to 10 moles of benzyl chloride and one mole of aromatic-substituted naphthalene, electron beam means for producing an electrical charge on the surface of said deformable medium as a function of an applied electrical signal and cooperating with said conducting interior to subject the medium to a deforming force to produce deformations in the surface of said medium and a light and optical system for projecting light as a function of the deformations in the surface of said medium.
- a projection system comprising a container having a conducting interior, a deformable medium in said container comprising the Friedel-Crafts reaction product of from about 0.1 to 10 moles of benzyl chloride and naphthalene, electron beam means for producing an electrical charge on the surface of said deformable medium as a function of an applied electrical signal and cooperating with said conducting interior to subject the medium to a deforming force to produce deformations in the surface of said medium and a light and optical system for projecting light as a function of the deformations in the surface of said medium.
- a projection system comprising a container having a conducting interior, a deformable medium in said container comprising the Friedel-Crafts reaction product of from about 0.8 to 3 moles of benzyl chloride and one mole of naphthalene, electron beam means for producing an electrical charge on the surface of said deformable medium as a function of an applied electrical signal and cooperating with said conducting interior to subject the medium to a deforming force to produce deformations in the surface of said medium and a light and optical system for projecting light as a function of the deformations in the surface of said medium.
- a projection system comprising a container having a conducting interior, a deformable medium in said container comprising the Friedel-Crafts reaction product of at least one mole of benzyl chloride and one mole of naphthalene, electron beam means for producing an electrical charge on the surface of said deformable medium as a function of an applied electrical signal and cooperat' ing with said conducting interior to subject the medium to a deforming force to produce deformations in the surf-ace of said medium and a light and optical system for projecting light as a function of the deformations in the surface of said medium.
- a projection system comprising a container having a conducting interior, a deformable medium in said container comprising the FriedelCrafts reaction product of lbenzyl chloride and naphthalene, electron beam means for producing an electrical charge on the surface of said deformable medium as a function of an applied electrical signal and cooperating with said conducting interior to subject the medium to a deforming force to produce deformations in the surface of said medium and a light and optical system for projecting light as a function of the deformations in the surface of said medium.
- a projection system comprising a container having a conducting interior, a deformable medium in said container comprising the Friedel-Crafts reaction product of benzyl chloride and benzyl naphthalene, electron beam means for producing an electrical charge on the surface of said deformable medium as a function of an applied electrical signal and cooperating with said conducting interior to subject the medium to a deforming force to produce deformations in the surface of said medium and a light and optical system for projecting light as a function of the deformations in the surface of said medium.
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- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DENDAT1437667 DE1437667A1 (enrdf_load_stackoverflow) | 1964-08-26 | ||
US392107A US3317664A (en) | 1964-08-26 | 1964-08-26 | Projection system |
GB29639/65A GB1074714A (en) | 1964-08-26 | 1965-07-13 | Improvements in projection system |
FR29242A FR1451605A (fr) | 1964-08-26 | 1965-08-24 | Perfectionnements aux systèmes de projection |
DE19651437678 DE1437678A1 (de) | 1964-08-26 | 1965-08-26 | Projektionssystem |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US392107A US3317664A (en) | 1964-08-26 | 1964-08-26 | Projection system |
Publications (1)
Publication Number | Publication Date |
---|---|
US3317664A true US3317664A (en) | 1967-05-02 |
Family
ID=23549274
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US392107A Expired - Lifetime US3317664A (en) | 1964-08-26 | 1964-08-26 | Projection system |
Country Status (3)
Country | Link |
---|---|
US (1) | US3317664A (enrdf_load_stackoverflow) |
DE (2) | DE1437678A1 (enrdf_load_stackoverflow) |
GB (1) | GB1074714A (enrdf_load_stackoverflow) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3498694A (en) * | 1966-09-23 | 1970-03-03 | Stromberg Carlson Corp | Optical interference filter means bombarded by crt beam for selectively passing monochromatic light |
US3715494A (en) * | 1971-01-28 | 1973-02-06 | Gen Electric | Projection system |
DE2324652A1 (de) * | 1972-05-18 | 1974-01-31 | Gen Electric | Lichtmodulationsmedium fuer bildprojektionsapparate |
US4954896A (en) * | 1989-02-08 | 1990-09-04 | Heinrich-Hertz-Institut Fur Nachrichtentechnik Berlin Gmbh | Electronic projector system such as a high definition television (HDTV) projection television system or the like having a fluid therein with increased resistance to damage from projection system radiation |
-
0
- DE DENDAT1437667 patent/DE1437667A1/de active Pending
-
1964
- 1964-08-26 US US392107A patent/US3317664A/en not_active Expired - Lifetime
-
1965
- 1965-07-13 GB GB29639/65A patent/GB1074714A/en not_active Expired
- 1965-08-26 DE DE19651437678 patent/DE1437678A1/de active Pending
Non-Patent Citations (1)
Title |
---|
None * |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3498694A (en) * | 1966-09-23 | 1970-03-03 | Stromberg Carlson Corp | Optical interference filter means bombarded by crt beam for selectively passing monochromatic light |
US3715494A (en) * | 1971-01-28 | 1973-02-06 | Gen Electric | Projection system |
DE2324652A1 (de) * | 1972-05-18 | 1974-01-31 | Gen Electric | Lichtmodulationsmedium fuer bildprojektionsapparate |
US4954896A (en) * | 1989-02-08 | 1990-09-04 | Heinrich-Hertz-Institut Fur Nachrichtentechnik Berlin Gmbh | Electronic projector system such as a high definition television (HDTV) projection television system or the like having a fluid therein with increased resistance to damage from projection system radiation |
Also Published As
Publication number | Publication date |
---|---|
DE1437678A1 (de) | 1968-10-31 |
GB1074714A (en) | 1967-07-05 |
DE1437667A1 (enrdf_load_stackoverflow) |
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