US3253180A - Hollow cathodes - Google Patents

Hollow cathodes Download PDF

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Publication number
US3253180A
US3253180A US216141A US21614162A US3253180A US 3253180 A US3253180 A US 3253180A US 216141 A US216141 A US 216141A US 21614162 A US21614162 A US 21614162A US 3253180 A US3253180 A US 3253180A
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cavity
electron
aperture
hollow cathode
charge
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US216141A
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English (en)
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Huber Harry
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Thales SA
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CSF Compagnie Generale de Telegraphie sans Fil SA
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns
    • H01J3/025—Electron guns using a discharge in a gas or a vapour as electron source
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/025—Hollow cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J17/00—Gas-filled discharge tubes with solid cathode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2893/00—Discharge tubes and lamps
    • H01J2893/006—Tubes with electron bombarded gas (e.g. with plasma filter)

Definitions

  • the present invention relates to a cathode structure, and more particularly to so-called hollow cathode structures providing an improved current density.
  • the so-called hollow cathodes are conventionally realized in the form of a cavity the inner walls of which are entirely or partly lined with an emissive substance, this cavity comprising an orifice with small dimensions for the outflow of the electrons and being heated by any suitable means.
  • Such cathodes are intended to produce an electronic current of great density, this result being based on the emission of electrons by a relatively large surface at the interior of the heated cavity and upon the extraction of these electrons through a relatively small orifice area.
  • Applicant attributes this shortcoming to the fact that the distribution of the electrons emitted at the interior of the cavity is not homogeneous in volume but that, by reason of the space charge, a minimum of volumetric density of electrons is created in the center of the cavity, and a strong density in proximity to the internal surface thereof.
  • the result thereof is a minimum of negative potential, i.e., a potential well in the center of the cavity.
  • This well repels the majority of electrons toward the walls of the cavity where they will remain accumulated by forming a strong space charge, and also expels only a small fraction of electrons toward the output orifice through which they may escape under the effect of the electric field due to the voltage applied to the anode of the tube.
  • the electron output of a hollow cathode is equal to that of a conventional cathodeapart from the effects of the second order-whose emissive surface is equal to the area of the outlet orifice.
  • the present invention aims at an increase of this output and at a realization of an improved hollow cathode supplying a large current density.
  • means are provided to compensate the electronic space charge at the interior of a hollow cathode, the latter thus becoming a palsma cathode.
  • These means consist-according to the present invention of a reservoir or tank of ionizable material connected to the cavity of the hollow cathode, means being provided for ionizing this material and mixing the ions produced with the electrons at the interior of the cavity.
  • the ionization may be realized preferably by the phenomenon of surface or contact ionization.
  • an object of the present invention to provide a hollow cathode structure which effectively eliminates the shortcomings encountered with the prior art structures.
  • Still another object of the present invention resides in the provision of a hollow cathode structure which eliminates, by simple and inexpensive means, the non-homogeneous electron distribution on the inside of the cathode.
  • a further object of the present invention resides in the provision of a hollow cathode structure which utilizes a plasma to achieve the aforementioned objects.
  • FIGURE 1 is an axial cross-sectional view through a first embodiment of a hollow cathode arrangement according to the present invention
  • FIGURE 2 is an axial cross-sectional view through a second embodiment of a hollow cathode arrangement according to the present invention
  • FIGURE 3 is an axial cross-sectional View through a third embodiment of a hollow cathode arrangement according to the present invention.
  • FIGURE 4 is a perspective view through a fourth embodiment of a hollow cathode arrangement according to the present invention.
  • FIG. 1 there is illustrated in this figure a cavity 1 having, for example, a spherical shape, lined at the inside thereof at 2 with a layer of emissive material and equipped at 3 with an outlet or output orifice, this cavity 1 being heated indirectly by a filament 4 thermally insulated within the envelope 5.
  • a suitable anode voltage is applied between the connection 6 connected to the cavity 1 and an anode (not shown).
  • the cavity 1 is connected by means of a tubulure 7 with a reservoir or tank 8 filled with an ionizable substance, such as cesium.
  • a porous body 9 may be arranged and immersed in the cesium reservoir liquid 10.
  • the reservoir or tank 8 is heated by means of a small heating element 11, thermally insulated within the envelope 12, so that the cesium may evaporate.
  • the emissive material 2 has, in this example, a work function larger than the ionization function of cesium, for example, that it is constituted by tungsten, rhenium, tantalum, niobium, or the like, it is additionally necessary to provide for means in order that the cesium atoms fall or impinge on the emissive surface rather than pass through the orifice 3.
  • a shield or screen 13 may be arranged in the cavity 1, as shown in FIGURE 1, this shield consisting of any suitable metal and being interposed between the tubulure 7 and the orifice 3. It is also possible to simply provide the outlet orifice at right angles to the direction of the cesium injection.
  • the emissive layer 2 which is indirectly heated by the filament 4 emits an electron cloud filling the cavity 1.
  • the cesium vapor obtained by heating of reservoir or tank 8 escape-s through the pores of the body 9 and :penetrates through the tubulure 7 into the cavity 1.
  • the cesium atoms are prevented by the shield 13 from being oriented directly toward the orifice 3, and are, instead, reflected by said shield 13 and directed toward the surface of the layer 2.
  • a plasma is thus obtained within the cavity which is submitted to the action of the electric field created by-the anode voltage applied between the anode (not shown) and the connection 6 (certain force lines of this field penetrating into the cavity 1 through orifice 3).
  • the action of this field is such that the effusion current of the elec trons contained in the plasma is attracted by the anode and leaves through orifice 3 'while the ions are repelled by the same field and remain in the interior of the cavity.
  • the hollow plasma cathode according to the present invention offers the advantage as compared to the known hollow electronic gas cathodes of no longer presenting a potential well at the interior thereof but instead operates with an essentially homogeneous distribution of particles which permits the establishment of an effusion current entraining the electrons from the entirety of the cavity space. As a result thereof, it is possible to obtain a great current density at the output which may be of the order of 100 A./cm. in C.W. (continuou wave) operation.
  • the emissive layer 2 is of a substance the work function of which is lower than the ionization function of the ionizable matter used, for example, of an alkaline-earth oxide, if the ionizable material is cesium.
  • the ionizable material is cesium.
  • surface ionization by the impact of atoms on the surface of the cavity is no. longer possible, and it is necessary, therefore, to provide a special conductor made of a material having a high work function, the surface of which will be utilized for the impact of atoms with a view toward ionization thereof.
  • FIGURES 1 and 2 essentially consists in that a shield or screen 13 no longer is present in FIGURE 2, but that an ionizer is interposed instead in the path of the cesium atoms, for example, in the form of a tungsten filament 14 energized through the insulating passages 15 by a heating current.
  • FIGURES 3 and 4 illustrate modifications of possible geometric forms.
  • the spherical cavity has been replaced by a cylinder 16 lined at the inside thereof with emissive material 2, as hereinabove.
  • the ionizer 14 is spirally wound.
  • the same reference numerals as in the previous figures are used to designate like elements.
  • the heating systems have been omitted in FIGURE 3 in order to simplify the showing. The operation, however, is the same as before.
  • the cavity has the shape of a parallelepiped 17 and the ionizer is a plate 18.
  • the ionizer is a plate 18.
  • the present invention is not limited to the details shown and described hereinabove, but is susceptible of all modifications and variations within the scope of a person skilled in the art.
  • the heating of the cavity may be achieved also by electronic bombardment or by any other known equivalent means. It may possibly be achieved also simply by thermal radiation from the ionizer.
  • the choice of materials both for the emissive substance and for the ionizable material is left to the discretion of the designer according to the respective requirements.
  • the ionization means indicated are not limitative but may be substituted by any equivalent means.
  • the geometric configurations shown may be modified in different ways so as to adapt the same to each particular case. It is understood that all of these changes and modifications fall within the broad concept of the present invention and are to be considered as encompassed thereby.
  • a hollow cathode structure comprising wall mean-s forming at least one cavity, an aperture being provided in the wall means of said cavity and having a size substantially smaller than the transverse dimension of said cavity, an electron extracting anode facing said aperture, an electron-emissive layer covering substantially all of the internal surfaces of said wall means, heating means positioned adjacent the outer surface of said wall means and operatively associated with said electron-emissive layer to emit electrons therefrom operable to escape through said aperture, and
  • charge-compensating means operatively associated with said cavity for compensating for the electron space-charge within said cavity by establishing therewith a plasma
  • reservoir means in the form of an enclosure providing internal space essentially isolated from the space under high vacuum within said tube outside of said hollow cathode, said internal space containing an ionizable material, and duct means operatively connecting said reservoir means with said cavity.
  • a hollow cathode structure comprising wall means forming at least one cavity, an aperture being provided in the wall means of said cavity and having a size substantially smaller than the transverse dimension of said cavity, an electron extracting anode facing said aperture, an electron-emissive layer covering substantially all of the internal surfaces of said wall means, heating means positioned adjacent the outer surface of said wall means and operatively associated with said electron-emissive layer to emit electrons therefrom operable to escape through said aperture, and chargecompensating means operatively associated with said cavity for compensating for the electron space-charge within said cavity by establishing therewithin a plasma including reservoir means in the ⁇ form of an enclosure providing an internal space essentially isolated from the space under high vacuum within said tube outside of said hollow cathode, said internal space containing an ionizable material of the type providing ions by contact with a heated surface, and duct means operatively connecting said reservoir means with said cavity.
  • a hollow cathode structure comprising wall means forming at least one cavity, an aperture being provided in the wall means of said cavity and having a size substantially smaller than the transverse dimension of said cavity, an electron extracting anode facing said aperture, an electron-emissive layer covering substantially all of the internal surfaces of said wall means, first heating means positioned adjacent the outer surface of said wall means and operatively associated with said electron-emissive layer to emit electrons there-from operable to escalpe through said aperture,.and charge-compensating means operatively associated with said cavity for compensating for the electron space-charge within said cavity to thereby form a plasma therein including reservoir means in the form of an enclosure providing an internal space essentially isolated from the space under high vacuum within said tube outside of said hollow cathode, said internal space containing an ionizable material essentially consisting of cesium, and duct means operatively connecting said reservoir means with said cavity.
  • a hollow cathode structure comprising wall means forming at least one cavity, an aperture being provided in the wall means of said cavity and having a size substantially smaller than the transverse dimension of said cavity, an electron extracting anode facing said aperture, an electron-emissive layer of a material selected from the group consisting of tungsten, tantalum, rhenium and columbium and covering substantially all of the internal surfaces of said wall means, first heating means operatively associated with said electron-emissive layer to emit electrons therefrom operable to escape through said aperture, and charge-compensating means operatively associated with said cavity for compensating for the electron space-charge within said cavity to thereby form a plasma therein including reservoir means in the form of an enclosure providing an internal space essentially isolated from the space under high vacuum within said tube outside of said hollow cathode, said internal space containing an ionizable material essentially consisting of cesium, and duct means operatively connecting said reservoir means with said cavity.
  • a hollow cathode structure comprising wal-l means forming at least one cavity, an aperture being provided in the wall means of said cavity and having a size substantially smaller than the transverse dimension of said cavity, an electron extracting anode facing said aperture, an electron-emissive layer of a material selected from the group consisting of tungsten, tantalum, rhenium and columbiu'm and covering substantially all of the internal surfaces of said wall means, first heating means operatively associated with said electron-emissive layer to emit electrons therefrom operable to escape through said aperture, and charge-compensating means operatively associated with said cavity for compensating for the electron space-charge within said cavity to thereby form a plasma therein including reservoir means in the form of an enclosure providing an internal space essentially isolated from the space under high vacuum within said tube outside of said hollow cathode, said internal space containing an ionizable material essentially consisting of cesium, duct means operatively connecting said reservoir means with said cavity, and further means
  • a hollow cathode structure comprising Wall means forming at least one cavity, an aperture being provided in the wall means of said cavity and having a size substantially smaller than the transverse dimension of said cavity, an electron extracting anode facing said aperture, an electron-emissive layer covering substantially all of the internal surfaces of said wall means positioned adjacent the outer surface of said wall means and heating means operatively associated with said electron-emissive layer to emit electrons therefrom operable to escape through said aperture, and charge-compensating means operatively associated with said cavity for compensating for the electron spacecharge within said cavity by establishing therewithin a plasma including reservoir means in the form of an en closure providing an internal space essentially isolated from the space under high vacuum within said tube outside of said hollow cathode, said internal space containing an ionizable material of the type providing ions by contact with a heated surface, duct means operatively connecting said reservoir means with said cavity, and further means effectively vaporizing said ionizable material.
  • a hollow cathode structure having wall means forming at least one cavity provided with an aperture in the walls of the cavity, the aperture being of dimensions substantially smaller than the transverse dimension of said cavity, an electron extracting anode facing said aperture, an electron-emissive layer covering at least in part the internal surface of said wall means, and means for effectively producing emission of electrons from said electron-emissive layer to escape through said aperture, the improvement essentially consisting of charge-compensating means operatively associated with said cathode structure for compensating for the electron space charge existing in the cavity by ef- 'rfectively establishing therewithin a plasma while maintaining a high vacuum outside of said cavity.
  • a hollow cathode structure comprising wallmeans forming at least one cavity, an aperture being provided in the wall means of said cavity and having a size substantially smaller than the transverse dimension of said cavity, an electron extracting anode facing said aperture, an electronemissive layer covering substantially all of the internal surfaces of said wall means, heating means operatively associated with said electron-emissive layer to emit electrons therefrom operable to escape through said aperture, and chargecompensating means operativelyassociated with said cavity for compensating for the electron space-charge Within said cavity by establishing therewithin a plasma including reservoir means in the form of an enclosure providing an internal space essentially isolated from the space under high vacuum within said tube outside of said hollow cathode, said internal space containing an ionizable material adapted to be vaporized, connecting means operatively connecting said reservoir means with said cavity, the work function of said electron emissive layer bein g higher than the work function of said ioniz-able material, and vapor deflector :
  • a hollow cathode structure comprising Wall means forming at least one cavity, an aperture being provided in the wall means of said cavity and having a size substantially smaller than the transverse dimension of said cavity, an electron extracting anode facing said aperture, an electron-emissive layer covering substantially all of the internal surfaces of said wall means, heating means operatively associated with said electron-emissive layer to emit electrons therefrom adapted to escape through said aperture, and chargecompensating means operatively associated with said cavity for compensating for the electron space-charge within said cavity by establishing therewithin a plasma including reservoir means in the form of an enclosure providing an internal space essentially isolated from the space under high vacuum within said tube outside of said hollow cathode, said internal space containing an ionizable material, connecting means operatively connecting said reservoir means with said cavity, the work function of said electron-emissive layer being lower than the work function of said ionizable material, ionizing means within said cavity between said connecting means and said aperture having a material with relatively high
  • a hollow cathode structure comprising wall means forming at least one cavity, an aperture being provided in the wall means of said cavity and having a size substantially smaller than the transverse dimension of said cavity, an electron extracting anode facing said aperture, an electron-emissive layer of an earth-oxide material and covering substantially all of the internal surfaces of said wall means, heating means operatively associated with said electron-emissive layer to emit electrons therefrom adapted to escape through said aperture, and charge-compensating means operatively associated with said cavity for compensating for the electron space-charge within said cavity by establishing therewith a plasma including reservoir means in the form of an enclosure providing an internal space essentially isolated from the space under high vacuum within said tube outside of said hollow cathode, said internal space containing an ionizable material essentially consisting of cesium, connecting means operatively connecting said reservoir means with said cavity, the work function of said electron-emissive layer being lower than the work function of said ionizable material, ionizing means within
  • a hollow cathode structure comprising wall means forming at least one cavity, an aperture being provided in the wall means of said cavity and having a size substantially smaller than the transverse dimension of said cavity, an electron eX- tracting anode facing said aperture, an electron-emissive layer covering substantially all of the internal surfaces of said wall means, heating means operatively associated with said electron-emissive layer to emit electrons therefrom adapted to escape through said aperture, and charge compensating means operatively associated with said cavity for compensating for the electron space-charge within said cavity by establishing therewithin a plasma including reservoir means in the form of an enclosure providing an intern-a1 space essentially isolated from the space under high vacuum within said tube outside of said hollow cathode, said internal space containing an ionizable material, connecting means operatively connecting said reservoir means with said cavity, the work function of said electron-emissive layer being lower than the work function of said ionizable material, ionizing means within said cavity between said connecting means and said a
  • a hollow cathode structure comprising wall means forming at least one cavity, an aperture being provided in the wall means of said cavity and having a size substantially smaller than the transverse dimension of said cavity, an electron eX- tracting anode facing said aperture, an ele'ctron-emissive layer covering substantially all of the internal surfaces of said wall means, heating means operatively associated with said electron-emissive layer to emit electrons therefrom adapted to escape through said aperture, and charge-compensating means operatively associated with said cavity for compensating for the electron space-charge within said cavity by establishing therewithin a plasma including reservoir means in the form of an enclosure providing an internal space essentially isolated from the space under high vacuum within said tube outside of said hollow cathode, said internal space containing an ionizable material, connecting means operatively connecting said reservoir means with said cavity, the work function of said electron-em-issive layer being lower than the work function of said ionizable material, ionizing means within said cavity
  • a hollow cathode structure comprising wall means forming at least one cavity, an aperture being provided in the wall means of said cavity and having a size substantially smaller than the transverse dimension of said cavity, an electron extracting anode facing said aperture, an electron-emissive layer covering substantially all of the internal surfaces of said Wall means, heating means operatively associated with said electron-emissive layer to emit electrons therefrom adapted to escape through said aperture, and chargeco-mpensating means operatively associated with said cavity for compensating for the electron space-charge within said cavity by establishing therewithin a plasma including reservoir means in the form of an enclosure providing an internal space essentially isolated from the space under high Vacuum within said tube outside of said hollow cathode, said internal space containing an ionizable material, connecting means operatively connecting said reservoir means with said cavity, the work function of said electron-emissive layer being lower than the work function of said ionizable material, plate-shaped ionizing means within said cavity between said connecting
  • a hollow cathode structure having wall means forming at least one cavity provided with an aperture in the walls of the cavity, the aperture being of dimensions substantially smaller than the transverse dimension of said cavity, an electron extracting anode facing said aperture, an electron-emissive layer covering substantially all of the internal surface of said wall means, and means for effectively producing emission of said electrons from said electron-emissive layer and adapted to escape through said aperture, the improvement essentially consisting of charge-compensating means operatively associated with said cathode structure for compensating the electron space-charge in the cavity by establishing therewithin a plasma while maintaining a high vacuum outside of said cavity including ionizing means producing ions and provided with an ionizable material, the electron-emissive layer material and the ionizabrle material having different work functions.
  • a hollow cathode structure comprising wall means forming at least one cavity, an aperture being provided in the wall means of said cavity and having a size substantially smaller than the transverse dimension of said cavity, an electron extracting anode facing said aperture, an electron-emissive material extending over at least a part of the internal surfaces of said wall means, means operatively associated with said electron-emissive material and operable to produce emission of electrons therefrom adapted to escape through said aperture, and charge-compensating means operatively associated with said cavity for compensating for the electron space charge within said cavity by effectively establishing therewithin a plasma While maintaining a high vacuum outside of said cavity.
  • a hollow cathode structure comprising wall means forming at least one spherical cavity, an aperture being provided in the wall means of said cavity and having a size substantially smaller thanthe transverse dimension of said cavity, an electron extracting anode facing said aperture, an electron-emissive material extending over substantially all of the internal surfaces of said wall means, means operatively associated with said electron-emissive material and operable to produce emission of electrons therefrom adapted to escape through said aperture, and chargecompensating mean-s operatively associated with said cavity for compensating for the electron space-charge within said cavity by effectively establishing therewithin a plasma while maintaining a high vacuum outside of said cavity.
  • a hollow cathode structure comprising wall means forming a plurality of cavities adjacent one another, an aperture being provided in the wall means of at least some out said cavities and each having a size substantially smaller than the transverse dimension of a respective cavity, an electron extracting anode facing said aperture, an electron-emissive material extending over substantially all of the internal surfaces of said wall means, means operatively associated with said electron-emissive material and operable to produce emission of electrons therefrom adapted to escape through said aperture, and charge-compensating means operatively associated with at least some of said cavities for compensating the electron space-change within the respective cavity by establishing therewithin a plasma 15 while maintaining a high vacuum outside of said cavity.

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US216141A 1961-09-27 1962-08-10 Hollow cathodes Expired - Lifetime US3253180A (en)

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FR874284A FR1308692A (fr) 1961-09-27 1961-09-27 Perfectionnements aux cathodes creuses

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Cited By (11)

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US3346750A (en) * 1965-03-01 1967-10-10 Csf Compagne Generale De Teleg Cavity type particle stream accelerator having a non-isothermal chamber
US3515932A (en) * 1967-04-27 1970-06-02 Hughes Aircraft Co Hollow cathode plasma generator
US3523210A (en) * 1966-05-20 1970-08-04 Xerox Corp Gas discharge neutralizer including a charged particle source
US4475063A (en) * 1981-06-22 1984-10-02 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Hollow cathode apparatus
US20140216343A1 (en) 2008-08-04 2014-08-07 Agc Flat Glass North America, Inc. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
WO2016089424A1 (fr) * 2014-12-05 2016-06-09 Agc Glass Europe, S.A. Source de plasma à cathode creuse
US9721765B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
US9721764B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Method of producing plasma by multiple-phase alternating or pulsed electrical current
US10242846B2 (en) 2015-12-18 2019-03-26 Agc Flat Glass North America, Inc. Hollow cathode ion source
US10573499B2 (en) 2015-12-18 2020-02-25 Agc Flat Glass North America, Inc. Method of extracting and accelerating ions
US10755901B2 (en) 2014-12-05 2020-08-25 Agc Flat Glass North America, Inc. Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces

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US2330848A (en) * 1925-12-21 1943-10-05 Raytheon Mfg Co Gaseous discharge device
US2217436A (en) * 1938-05-26 1940-10-08 Westinghouse Electric & Mfg Co Cathode for electron tubes
US2810848A (en) * 1954-06-01 1957-10-22 Bendix Aviat Corp Method and means of making stator coil end turns
US2883568A (en) * 1957-06-25 1959-04-21 Rca Corp Apparatus for producing thermallycool charged particles
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Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3346750A (en) * 1965-03-01 1967-10-10 Csf Compagne Generale De Teleg Cavity type particle stream accelerator having a non-isothermal chamber
US3523210A (en) * 1966-05-20 1970-08-04 Xerox Corp Gas discharge neutralizer including a charged particle source
US3515932A (en) * 1967-04-27 1970-06-02 Hughes Aircraft Co Hollow cathode plasma generator
US4475063A (en) * 1981-06-22 1984-10-02 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Hollow cathode apparatus
US9478401B2 (en) 2008-08-04 2016-10-25 Agc Flat Glass North America, Inc. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
US20150004330A1 (en) 2008-08-04 2015-01-01 Agc Flat Glass North America, Inc. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
US20150002021A1 (en) 2008-08-04 2015-01-01 Agc Flat Glass North America, Inc. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
US10580625B2 (en) 2008-08-04 2020-03-03 Agc Flat Glass North America, Inc. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
US20140216343A1 (en) 2008-08-04 2014-08-07 Agc Flat Glass North America, Inc. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
US10438778B2 (en) 2008-08-04 2019-10-08 Agc Flat Glass North America, Inc. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
US10580624B2 (en) 2008-08-04 2020-03-03 Agc Flat Glass North America, Inc. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
WO2016089424A1 (fr) * 2014-12-05 2016-06-09 Agc Glass Europe, S.A. Source de plasma à cathode creuse
US11875976B2 (en) 2014-12-05 2024-01-16 Agc Flat Glass North America, Inc. Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces
US10755901B2 (en) 2014-12-05 2020-08-25 Agc Flat Glass North America, Inc. Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces
KR20170131343A (ko) * 2014-12-05 2017-11-29 에이쥐씨 글래스 유럽 중공형 음극 플라즈마 소스
US10586685B2 (en) 2014-12-05 2020-03-10 Agc Glass Europe Hollow cathode plasma source
US9721764B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Method of producing plasma by multiple-phase alternating or pulsed electrical current
US10559452B2 (en) 2015-11-16 2020-02-11 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
US20170309458A1 (en) 2015-11-16 2017-10-26 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
US9721765B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
US10573499B2 (en) 2015-12-18 2020-02-25 Agc Flat Glass North America, Inc. Method of extracting and accelerating ions
US10242846B2 (en) 2015-12-18 2019-03-26 Agc Flat Glass North America, Inc. Hollow cathode ion source

Also Published As

Publication number Publication date
FR1308692A (fr) 1962-11-09
DE1232663B (de) 1967-01-19
NL283468A (fr)
GB1020233A (en) 1966-02-16

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