US254263A - Paul bitteelin - Google Patents
Paul bitteelin Download PDFInfo
- Publication number
- US254263A US254263A US254263DA US254263A US 254263 A US254263 A US 254263A US 254263D A US254263D A US 254263DA US 254263 A US254263 A US 254263A
- Authority
- US
- United States
- Prior art keywords
- paul
- bitteelin
- bitterlin
- etching
- france
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 238000005530 etching Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 2
- 230000007423 decrease Effects 0.000 description 1
- 229910001651 emery Inorganic materials 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31105—Etching inorganic layers
- H01L21/31111—Etching inorganic layers by chemical means
Definitions
- Hydrofluoric acid is in general use for etching vitreous surfaces; but the object of my invention is to enable glass-engravers to obtain old or new effects by mixing therewith a compound which will be hereinafter described.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Weting (AREA)
- Surface Treatment Of Glass (AREA)
- ing And Chemical Polishing (AREA)
Description
. UNIT D STATES PATENT OFFIQl-EO PAUL BITTERLIN, JR, OF PARIS, FRANCE.
COMPOUND FOR ETCHING VITREOUS SURFACES.
SPECIFICATION forming part of Letters Patent No. 254,263, dated February 28, 1882. Application filcd March 7 1881. (No specimens.) Patented in France January 2i, 1880.
To all whom it may concern:
Be it known that I, PAUL BITTERLIN, Jr., of Paris, France, have invented a 00m pound for Etching Vitreous Surfaces, of which the following is a specification.
Hydrofluoric acid is in general use for etching vitreous surfaces; but the object of my invention is to enable glass-engravers to obtain old or new effects by mixing therewith a compound which will be hereinafter described.
I mix with hydrofluoric acid a portion of any finely-divided material-such as the natural silicates, emery, &c.-which will be attacked l y it. This decreases the energy of its action, and causes it to act with more uniformity and regularity upon the vitreous surface; or, if I desire to vary the etched surface and obtain engravings of the most varying aspects, Imix therewith some'finely-divided lnaterial such PAUL BITTERLIN, JEUNE.
Witnesses LOUIS J. ALTON, PHILIP WALKER.
Publications (1)
Publication Number | Publication Date |
---|---|
US254263A true US254263A (en) | 1882-02-28 |
Family
ID=2323559
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US254263D Expired - Lifetime US254263A (en) | Paul bitteelin |
Country Status (1)
Country | Link |
---|---|
US (1) | US254263A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2445238A (en) * | 1946-10-08 | 1948-07-13 | Rca Corp | Production of skeletonized low reflectance glass surface with fluosilicic acid vapor |
US2455719A (en) * | 1945-06-01 | 1948-12-07 | Woldemar A Weyl | Glass manufacture |
US2490662A (en) * | 1946-09-21 | 1949-12-06 | Rca Corp | Skeletonizing glass |
US2716612A (en) * | 1951-08-28 | 1955-08-30 | Polymer Ind Inc | Composition for silicone-treated articles |
US2782949A (en) * | 1954-01-11 | 1957-02-26 | Polymer Ind Inc | Adhesives and method of applying to silicone-treated surfaces |
US2918125A (en) * | 1955-05-09 | 1959-12-22 | William G Sweetman | Chemical cutting method and apparatus |
-
0
- US US254263D patent/US254263A/en not_active Expired - Lifetime
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2455719A (en) * | 1945-06-01 | 1948-12-07 | Woldemar A Weyl | Glass manufacture |
US2490662A (en) * | 1946-09-21 | 1949-12-06 | Rca Corp | Skeletonizing glass |
US2445238A (en) * | 1946-10-08 | 1948-07-13 | Rca Corp | Production of skeletonized low reflectance glass surface with fluosilicic acid vapor |
US2716612A (en) * | 1951-08-28 | 1955-08-30 | Polymer Ind Inc | Composition for silicone-treated articles |
US2782949A (en) * | 1954-01-11 | 1957-02-26 | Polymer Ind Inc | Adhesives and method of applying to silicone-treated surfaces |
US2918125A (en) * | 1955-05-09 | 1959-12-22 | William G Sweetman | Chemical cutting method and apparatus |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US254263A (en) | Paul bitteelin | |
JP6864077B2 (en) | Etching solution, etching method, and manufacturing method of electronic components | |
Banno et al. | Mode changes associated with oil droplet movement in solutions of gemini cationic surfactants | |
Mucic et al. | Effect of partial vapor pressure on the co-adsorption of surfactants and hexane at the water/hexane vapor interface | |
Rub et al. | Micellization behavior of mixtures of amphiphilic promazine hydrochloride and cationic aniline hydrochloride in aqueous and electrolyte solutions | |
Fox et al. | The Reaction of Polyorganosiloxane Monolayers with Aqueous Substrates. | |
KR102050783B1 (en) | Polishing composition | |
Munejiri et al. | Photo-induced structural change in liquid sulphur | |
US3421956A (en) | Method of etching sic | |
US754925A (en) | Massage device. | |
Gillap et al. | Ideal behavior of sodium alkyl sulfates in various interfaces. Thermodynamics of adsorption at the air-water interface | |
US208441A (en) | Improvement in the process of cleansi-ng millstones | |
Mudawadkar et al. | Conductometric studies of micellization of sodium dodecyl sulfate in presence of non-polar additives at various temperatures | |
US282913A (en) | Eugen litdwig | |
Stovbun et al. | Initiation of the formation of chiral strings: Dimension of formation domain, microstructure, and nucleation mechanism | |
US174355A (en) | Improvement in cleansing compounds | |
US141689A (en) | Improvement in making artificial marble | |
Joos | Phase Transitions in Monolayers. Effect of a Second Component on the Transition Pressures | |
Ali et al. | Thermodynamics of micellization of Triton X-100 in aqueous glycine: tensiometric and ultrasonic studies | |
US765973A (en) | Rubber compound. | |
USD30897S (en) | Design for a snap-hook member | |
US382318A (en) | Etching glass | |
USD17663S (en) | Design for a carpet | |
US37975A (en) | Improved mode of removing stains from glass | |
US471569A (en) | Island |