US254263A - Paul bitteelin - Google Patents

Paul bitteelin Download PDF

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Publication number
US254263A
US254263A US254263DA US254263A US 254263 A US254263 A US 254263A US 254263D A US254263D A US 254263DA US 254263 A US254263 A US 254263A
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paul
bitteelin
bitterlin
etching
france
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31105—Etching inorganic layers
    • H01L21/31111—Etching inorganic layers by chemical means

Definitions

  • Hydrofluoric acid is in general use for etching vitreous surfaces; but the object of my invention is to enable glass-engravers to obtain old or new effects by mixing therewith a compound which will be hereinafter described.

Description

. UNIT D STATES PATENT OFFIQl-EO PAUL BITTERLIN, JR, OF PARIS, FRANCE.
COMPOUND FOR ETCHING VITREOUS SURFACES.
SPECIFICATION forming part of Letters Patent No. 254,263, dated February 28, 1882. Application filcd March 7 1881. (No specimens.) Patented in France January 2i, 1880.
To all whom it may concern:
Be it known that I, PAUL BITTERLIN, Jr., of Paris, France, have invented a 00m pound for Etching Vitreous Surfaces, of which the following is a specification.
Hydrofluoric acid is in general use for etching vitreous surfaces; but the object of my invention is to enable glass-engravers to obtain old or new effects by mixing therewith a compound which will be hereinafter described.
I mix with hydrofluoric acid a portion of any finely-divided material-such as the natural silicates, emery, &c.-which will be attacked l y it. This decreases the energy of its action, and causes it to act with more uniformity and regularity upon the vitreous surface; or, if I desire to vary the etched surface and obtain engravings of the most varying aspects, Imix therewith some'finely-divided lnaterial such PAUL BITTERLIN, JEUNE.
Witnesses LOUIS J. ALTON, PHILIP WALKER.
US254263D Paul bitteelin Expired - Lifetime US254263A (en)

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US254263A true US254263A (en) 1882-02-28

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2445238A (en) * 1946-10-08 1948-07-13 Rca Corp Production of skeletonized low reflectance glass surface with fluosilicic acid vapor
US2455719A (en) * 1945-06-01 1948-12-07 Woldemar A Weyl Glass manufacture
US2490662A (en) * 1946-09-21 1949-12-06 Rca Corp Skeletonizing glass
US2716612A (en) * 1951-08-28 1955-08-30 Polymer Ind Inc Composition for silicone-treated articles
US2782949A (en) * 1954-01-11 1957-02-26 Polymer Ind Inc Adhesives and method of applying to silicone-treated surfaces
US2918125A (en) * 1955-05-09 1959-12-22 William G Sweetman Chemical cutting method and apparatus

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2455719A (en) * 1945-06-01 1948-12-07 Woldemar A Weyl Glass manufacture
US2490662A (en) * 1946-09-21 1949-12-06 Rca Corp Skeletonizing glass
US2445238A (en) * 1946-10-08 1948-07-13 Rca Corp Production of skeletonized low reflectance glass surface with fluosilicic acid vapor
US2716612A (en) * 1951-08-28 1955-08-30 Polymer Ind Inc Composition for silicone-treated articles
US2782949A (en) * 1954-01-11 1957-02-26 Polymer Ind Inc Adhesives and method of applying to silicone-treated surfaces
US2918125A (en) * 1955-05-09 1959-12-22 William G Sweetman Chemical cutting method and apparatus

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