US2313018A - Electrostatic electron lens - Google Patents

Electrostatic electron lens Download PDF

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Publication number
US2313018A
US2313018A US368271A US36827140A US2313018A US 2313018 A US2313018 A US 2313018A US 368271 A US368271 A US 368271A US 36827140 A US36827140 A US 36827140A US 2313018 A US2313018 A US 2313018A
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United States
Prior art keywords
bushing
electron
electrostatic
layer
conducting
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Expired - Lifetime
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US368271A
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English (en)
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Krause Friedrich
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Individual
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Individual
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/12—Lenses electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/58—Arrangements for focusing or reflecting ray or beam
    • H01J29/62—Electrostatic lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/12—Lenses electrostatic
    • H01J2237/1205—Microlenses

Definitions

  • the present invention relates toelectron microscopes and more specifically pertains to electrostatic means for controlling the movement of electrons in such apparatus.
  • Electrostatic electron lens operate in such a manner that potential difierences are applied to two or more insulated plates. often referred to as diaphragms whereby lens-like effects are produced on electron rays passing axially through openings in: the diaphragms. Such lenses are used in electron apparatus such as electrostatic electron microscopes.
  • An object of the present invention resides in providing animproved type of electrostatic lens. for electron microscopes wherein the lens arrangement is characterized by a continuous variation of the potential fields.
  • Fig. 1 is a sectional view of a tube of an electron microscope showing one lens arrangement embodying the invention.
  • Fig. 2 is a similar sectional view of a modified arrangement.
  • Fig. 3 is a sectional view of an electron microscope tube showing a further modification of the electrostatic lens arrangement.
  • Fig. l a tube of an electron microscope.
  • the electron rays move axially in the tube as indicated by the arrow Ill.
  • a cylindrical bushing b formed of suitable insulating material is provided within the tube and suitably secured therein.
  • Another bushing c of insulating material is mounted within the bushing b.
  • the bushing 2 may be provided with external threads for engaging internal threads of the bushing 22.
  • the two bushings b and 0 may be formed of any suitable insulating material such as phenol formaldehyde condensation products or other synthetic resins.
  • the bushing c is provided with a central axially extending opening through which the electron rays of the microscope are adapted to pass.
  • the inner periphery of the bushing c is coated with a conducting varnish d having a relatively high resistance characteristic.
  • the varnish layer covers the ends of the bushing c as illustrated in Fig. 1.
  • Current is supplied to the conducting varnish layer d by means of wires I which are connected to metal rings e.
  • the metal rings e a and thickness of the conducting varnish. A volt- 10' age of a. few thousand volts may therefore be impressed across the end rings e" and it is thus possible to form and continuously control the electric field within the central opening of the bushing c.
  • a modified electrostatic. lens arrangement is illustrated in Fig. 2 wherein aninsulatingbushing a is arranged within the bushing b.
  • the bushing 0' may likewise be threaded in the bushing 1).
  • the inner surface of the insulating bushing 0' is preferably arched or provided with a I concave shape as shown in Fig. 2;
  • the bushing c is also formed of a suitable insulating material and coated on the inner surface with a conducting varnish having a relatively high ohmic characteristic. Current is conducted to the varnish layer d by means of end .rings e and conductors f in a manner similar to the arrangement disclosed in Fig. l.
  • the conducting varnish layer d may vary in thickness so that the central portion of the bushing c' is provided with a thicker conducting layer than the thickness of the layer adjacent the ends of the bushing c.
  • the arcuate shape of the inner surface of the conducting layer at provides the advantage that the ends of the electrostatic field adjacent the rings e are further removed from the central axis of the microscope.
  • Another advantage of providing a thicker coating of the conducting varnish in the center of the bushing c pertains to the fact that the voltage drop varies along the length of the bushing 0' since the resistance of the conducting coating varies with the thickness thereof.
  • the central portion of the conducting layer d may be grounded as indicated at g.
  • a number of electrostatic lens arrangements such as shown in Figs. 1 and 2 may be arranged in an electron microscope tube a and an example of such a series of electron lens is shown in Fig. 3.
  • the insulating bushings c are similar to those illustrated in Fig. 1 and successively arranged along the electron microscope tube a.
  • insulating bushing mounted within said tube and having an opening through which rays of the electron tube are adapted to pass, a layer of conducting material arranged on said bushing within said opening, means for applying a voltage across said layer, and said conducting layer having suffi- V cient resistance to provide a voltage drop along the inner surface of the bushing so as to provide an electrostatic field for controlling the movement of the electron rays.
  • An electrostatic electron lens for electron tubes comprising, a bushing of insulating material mounted within the electron tube, said bushing being of appreciable length and having an opening tubes comprising, a bushing of insulating material 3 mounted within the electron tube, said bushing being of appreciable length and having an opening therein through which electron rays are adapted to pass, a layer of conducting material arranged along the surface of said opening, means for impressing a voltage across said conducting layer and the resistance and thickness of said conducting layer being such as to provide a voltage drop establishing an electrostatic field for controlling the electron rays, and said conducting layer having varying thicknesses along the inner surface of the bushing.
  • An electrostatic electron lens for electron tubes comprising, a bushing of insulating material mounted within the electron tube, said bushing havin an appreciable length and an axial opening of concave shape through which electron rays are adapted to pass, a layer of conducting varnish arranged along the surface of said opening, means for impressing a voltage across said conducting layer and the resistance and thickness of said conducting varnish layer being such as to provide a voltage drop establishing an electrostatic field for controlling the electron rays.
  • An electrostatic electron lens for electron microscopes comprising, an electron tube, an insulating bushing mounted within said electron tube and having an opening of concave shape through which electron rays are adapted to pass, a layer of electrically conductive material arranged on said bushing within said opening, means for impressing a voltage across said conductive layer, and the thickness of said electrically conductive layer varying along the inner surface of the bushing so as to provide a voltage drop along the conductive layer within the opening for controlling the movement of the electrons therethrough.

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
US368271A 1940-05-08 1940-12-02 Electrostatic electron lens Expired - Lifetime US2313018A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2313018X 1940-05-08

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US (1) US2313018A (de)
BE (1) BE440927A (de)

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2421234A (en) * 1944-08-31 1947-05-27 Gen Electric Electron lens assembly
US2424788A (en) * 1942-12-01 1947-07-29 Gen Electric Electron microscope
US2455992A (en) * 1947-01-25 1948-12-14 Du Mont Allen B Lab Inc Cathode-ray tube amusement device
US2507331A (en) * 1946-03-12 1950-05-09 Csf Independent electrostatic lens
US2740913A (en) * 1951-11-01 1956-04-03 Itt Electron gun
US2845571A (en) * 1953-04-17 1958-07-29 Kazan Benjamin Electrostatically focused traveling wave tube
US2862129A (en) * 1954-03-11 1958-11-25 Philips Corp Device for compensating the astigmatism of electron lenses
US2925496A (en) * 1954-10-20 1960-02-16 Swift & Co Apparatus for obtaining substantially uniform irradiation from a nonuni form source
US3143681A (en) * 1959-12-07 1964-08-04 Gen Electric Spiral electrostatic electron lens
US3188465A (en) * 1959-12-29 1965-06-08 Kabushikikaisha Nihondenshi Ka Two stage electron beam magnification device comprising plural adjustable magnetic lens system
US4096386A (en) * 1977-04-04 1978-06-20 Taylor-Kincaid Company Light reflecting electrostatic electron lens
US4126781A (en) * 1977-05-10 1978-11-21 Extranuclear Laboratories, Inc. Method and apparatus for producing electrostatic fields by surface currents on resistive materials with applications to charged particle optics and energy analysis
FR2460035A1 (fr) * 1979-06-25 1981-01-16 Rca Corp Canon electronique pour tubes a rayons cathodiques et son procede de fabrication
US4370594A (en) * 1978-11-29 1983-01-25 Rca Corporation Resistive lens structure for electron gun
US4663532A (en) * 1984-12-14 1987-05-05 Commissariat A L'energie Atomique Apparatus for irradiating material by an electron beam
EP0843335A1 (de) * 1996-11-19 1998-05-20 ACT Advanced Circuit Testing Gesellschaft für Testsystementwicklung mbH Elektrostatische Vorrichtung zur Einwirkung auf einen Korpuskularstrahl
EP2478546A2 (de) * 2009-09-18 2012-07-25 FEI Company Beschleunigungssäule für verteilte ionenquellen
WO2014068434A3 (en) * 2012-10-31 2014-09-12 Koninklijke Philips N.V. Optical element with manipulated coating resistance

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2424788A (en) * 1942-12-01 1947-07-29 Gen Electric Electron microscope
US2421234A (en) * 1944-08-31 1947-05-27 Gen Electric Electron lens assembly
US2507331A (en) * 1946-03-12 1950-05-09 Csf Independent electrostatic lens
US2455992A (en) * 1947-01-25 1948-12-14 Du Mont Allen B Lab Inc Cathode-ray tube amusement device
US2740913A (en) * 1951-11-01 1956-04-03 Itt Electron gun
US2845571A (en) * 1953-04-17 1958-07-29 Kazan Benjamin Electrostatically focused traveling wave tube
US2862129A (en) * 1954-03-11 1958-11-25 Philips Corp Device for compensating the astigmatism of electron lenses
US2925496A (en) * 1954-10-20 1960-02-16 Swift & Co Apparatus for obtaining substantially uniform irradiation from a nonuni form source
US3143681A (en) * 1959-12-07 1964-08-04 Gen Electric Spiral electrostatic electron lens
US3188465A (en) * 1959-12-29 1965-06-08 Kabushikikaisha Nihondenshi Ka Two stage electron beam magnification device comprising plural adjustable magnetic lens system
US4096386A (en) * 1977-04-04 1978-06-20 Taylor-Kincaid Company Light reflecting electrostatic electron lens
US4126781A (en) * 1977-05-10 1978-11-21 Extranuclear Laboratories, Inc. Method and apparatus for producing electrostatic fields by surface currents on resistive materials with applications to charged particle optics and energy analysis
US4370594A (en) * 1978-11-29 1983-01-25 Rca Corporation Resistive lens structure for electron gun
FR2460035A1 (fr) * 1979-06-25 1981-01-16 Rca Corp Canon electronique pour tubes a rayons cathodiques et son procede de fabrication
US4281270A (en) * 1979-06-25 1981-07-28 Rca Corporation Precoated resistive lens structure for electron gun and method of fabrication
US4663532A (en) * 1984-12-14 1987-05-05 Commissariat A L'energie Atomique Apparatus for irradiating material by an electron beam
EP0843335A1 (de) * 1996-11-19 1998-05-20 ACT Advanced Circuit Testing Gesellschaft für Testsystementwicklung mbH Elektrostatische Vorrichtung zur Einwirkung auf einen Korpuskularstrahl
EP2478546A2 (de) * 2009-09-18 2012-07-25 FEI Company Beschleunigungssäule für verteilte ionenquellen
EP2478546A4 (de) * 2009-09-18 2014-07-30 Fei Co Beschleunigungssäule für verteilte ionenquellen
WO2014068434A3 (en) * 2012-10-31 2014-09-12 Koninklijke Philips N.V. Optical element with manipulated coating resistance

Also Published As

Publication number Publication date
BE440927A (de)

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