US2243237A - Process of producing metal emboss - Google Patents
Process of producing metal emboss Download PDFInfo
- Publication number
- US2243237A US2243237A US2243237DA US2243237A US 2243237 A US2243237 A US 2243237A US 2243237D A US2243237D A US 2243237DA US 2243237 A US2243237 A US 2243237A
- Authority
- US
- United States
- Prior art keywords
- metal
- layer
- support
- metals
- gold
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052751 metal Inorganic materials 0.000 title description 46
- 239000002184 metal Substances 0.000 title description 46
- 238000000034 method Methods 0.000 title description 12
- 239000010410 layer Substances 0.000 description 30
- 239000010953 base metal Substances 0.000 description 20
- 239000011888 foil Substances 0.000 description 20
- 239000010970 precious metal Substances 0.000 description 15
- 230000008016 vaporization Effects 0.000 description 13
- 238000009834 vaporization Methods 0.000 description 13
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 12
- 150000002739 metals Chemical class 0.000 description 12
- 238000004049 embossing Methods 0.000 description 11
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 11
- 229910045601 alloy Inorganic materials 0.000 description 9
- 239000000956 alloy Substances 0.000 description 9
- 229910052737 gold Inorganic materials 0.000 description 9
- 239000010931 gold Substances 0.000 description 9
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 8
- 239000004411 aluminium Substances 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 238000000151 deposition Methods 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 8
- 239000002131 composite material Substances 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- 229910052759 nickel Inorganic materials 0.000 description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 5
- 239000011651 chromium Substances 0.000 description 5
- 229910052804 chromium Inorganic materials 0.000 description 5
- 239000010941 cobalt Substances 0.000 description 5
- 229910017052 cobalt Inorganic materials 0.000 description 5
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 229910052763 palladium Inorganic materials 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 229910001020 Au alloy Inorganic materials 0.000 description 2
- 229910001252 Pd alloy Inorganic materials 0.000 description 2
- 229910001260 Pt alloy Inorganic materials 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 239000003353 gold alloy Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000002207 thermal evaporation Methods 0.000 description 2
- 229920000298 Cellophane Polymers 0.000 description 1
- 210000003165 abomasum Anatomy 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 238000010009 beating Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000010985 leather Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004513 sizing Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/06—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects
- B05D5/067—Metallic effect
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
Definitions
- This invention relates to metal embossing foils and their manufacture and has for its object an improved foil and process for making it.
- Embossing foils consist of a layer of metal on a support such as paper or the substance sold under the registered trade-mark Cellophane," with an intermediate layer of a substance such as wax, permitting the layer of metal to be detached from the support when the foil is heated, and an adhesive layer such as a layer of size on the face surface of the metal layer, adapted to cause the metal layer to stick to the article to be embossed.
- the metal employed is gold and its alloys, but foils of aluminium and silver have been made.
- Embossing foils have usually'been made by applying gold leaf to a waxed support and sizing the gold leaf. Embossing foils have been made with a layer of gold which is thinner than is possible to obtain by beating, by cathode deposition of the gold on a waxed support.
- an embossing foil is made by enclosing the support and a supply of metal in a vacuum chamber and heating the metal to a temperature above its vaporization point at the pressure in the chamber, so as to deposit a film of metal on the support.
- foils can be produced commercially of metals which cannot be beaten as gold is beaten, such as nickel, cobalt, chromium, aluminium bronzes, and of metals which cannot commercially be deposited by cathode discharge, such as aluminium, copper and the above mentioned metals and alloys. And, by the same apparatus and process, embossing foils can be made with a layer of precious metal, such as gold, platinum, palladium or their alloys on a layer of a comparatively cheap base metal.
- the layer of metal In an embossing foil, the layer of metal must have a certain minimum thickness, and by producing a composite layer the necessary thickness of metal may be obtained with a lesser thickness of precious metal than is permissible in a layer of precious metal only, and thereby the cost of the foil is materially reduced.
- the base metals used for the composite layer are, for the metalin contact with the precious metal, metals which do not become alloyed with it by diffusion and, for the metal which is'in contact with the leather or other material to which the foil is applied, metals which are not attackedby the said material.
- Baseimetals suitable for the composite layer cannot, at any rate commercially, be deposited by cathode deposition, because the rate of deposi- (Cl. ill-70.1)
- tion is too slow, but by thermal deposition in vacuo, they can be deposited asrapidly as, for instance, gold.
- metals suitable for a single layer foil because they do not readily tarnish, are, gold, platinum, palladium and their alloys and cobalt, chromium, aluminium and aluminium bronzes.
- metals suitable for the base metal portion of a composite layer are nickel, cobalt, chromium and copper.
- the support is coated with a layer of wax or the like, and is then placed in a vacuum chamber having, preferably, means for continuous evacuation.
- the metal to be deposited is then heated to a temperature above its vaporization point at the pressure in the chamber, and thereby the deposition of a layer on the support is effected. If the foil is to have a layer of a single metal only, the deposition is continued until a layer of suflicient thickness to form an embossing foil has been deposited. If the foil is to have a composite layer of a precious and a base metal, the deposition of the) precious metal is continued, for the sake of economy, for a shorter time, and the layer produced may be thinner than would give a satisfactoryembossing on a rough surface, or than would retain the colour of the precious metal. The operation is then repeated in the same or a similar apparatus by depositing a base metal on the layer of precious metal. The layer of metal is then coated with size or other suitable adhesive.
- the precious or base metal deposited may be an alloy and a composite layer may consist of a layer of precious metal and two different base metals.
- a layer of copper or nickel may be deposited on the precious metal, and a layer of aluminium deposited on the copper or nickel. Thereby the precious metal is protected from any diffusion into it oi the aluminium.
- the metal to be deposited is an alloy
- it is heated to a temperature above the vaporization point, at the pressure employed, of the constituent of the alloy having the highest vaporization point, and the phrase vaporization point of themetal is to be understood herein as meaning the vaporization point of the constituent having the highest vaporization point, when the metal is an alloy.
- a metal may be deposited from a mixture with the metal of a metal having a substantially higher vaporization point, and the mixture is then heated to a temperature above the vaporization point of'the metal to be deposited, but below that o! the metal with which it is mixed.
- the support is in the form of a roll which is unrolled from one bobbin onto another bobbin in the vacuum chamber during the proces of deposition, and thereby the size of the vacuum chamber necessary for producing a large sheet of 1011 may be greatly reduced.
- the support on which the metal is deposited comprises the layer oi material, such as wax, permitting-the metal layer to be detached.
- a foil can be produced having a composite layer 0! metal, of which the thickness of the precious metal is less than. 40 milli-microns, and the foil may have such a total thickness as to be suitable for embossing on rough materials.
- a non-metallic support with a material adapted to release the support when heated, enclosing the coated support together with a supply of one of the group of metals consisting of gold, platinum, palladium, gold alloy, platinum alloy, palladium alloy, in a vacuum chamber, heating the metal to a temperature above its vaporization point at the pressure in the chamber so as to deposit a film of the metal on the coated support, then enclosing the support with metal film together with a supply or a base metal adapted to iorm a consistent film in a vacuum chamber, heating the base metal to a temperature above its vaporization point at the pressure in the chamber so as to deposit a film of base metal on the precious metal and coating the base metal, after removal from the chamber, with an adhesive material.
- the group of precious metals consisting of gold, platinum, palladium, gold alloy, platinum alloy, palladium alloy
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Laminated Bodies (AREA)
Description
Patented May 27, 1941 PROCESS OF PRODUCING IHETAL EMBOSS- IN G FOILS Cecil Whiley, St. Mawes, England No Drawing. Application September 26, 1938, Serial No. 231,751. In Great Britain October 4 Claims.
This invention relates to metal embossing foils and their manufacture and has for its object an improved foil and process for making it.
Embossing foils consist of a layer of metal on a support such as paper or the substance sold under the registered trade-mark Cellophane," with an intermediate layer of a substance such as wax, permitting the layer of metal to be detached from the support when the foil is heated, and an adhesive layer such as a layer of size on the face surface of the metal layer, adapted to cause the metal layer to stick to the article to be embossed. The metal employed is gold and its alloys, but foils of aluminium and silver have been made.
Embossing foils have usually'been made by applying gold leaf to a waxed support and sizing the gold leaf. Embossing foils have been made with a layer of gold which is thinner than is possible to obtain by beating, by cathode deposition of the gold on a waxed support.
According to the invention, an embossing foil is made by enclosing the support and a supply of metal in a vacuum chamber and heating the metal to a temperature above its vaporization point at the pressure in the chamber, so as to deposit a film of metal on the support.
By this process, foils can be produced commercially of metals which cannot be beaten as gold is beaten, such as nickel, cobalt, chromium, aluminium bronzes, and of metals which cannot commercially be deposited by cathode discharge, such as aluminium, copper and the above mentioned metals and alloys. And, by the same apparatus and process, embossing foils can be made with a layer of precious metal, such as gold, platinum, palladium or their alloys on a layer of a comparatively cheap base metal.
In an embossing foil, the layer of metal must have a certain minimum thickness, and by producing a composite layer the necessary thickness of metal may be obtained with a lesser thickness of precious metal than is permissible in a layer of precious metal only, and thereby the cost of the foil is materially reduced.
The base metals used for the composite layer are, for the metalin contact with the precious metal, metals which do not become alloyed with it by diffusion and, for the metal which is'in contact with the leather or other material to which the foil is applied, metals which are not attackedby the said material.
Baseimetals suitable for the composite layer cannot, at any rate commercially, be deposited by cathode deposition, because the rate of deposi- (Cl. ill-70.1)
tion is too slow, but by thermal deposition in vacuo, they can be deposited asrapidly as, for instance, gold.
Examples of metals suitable for a single layer foil, because they do not readily tarnish, are, gold, platinum, palladium and their alloys and cobalt, chromium, aluminium and aluminium bronzes. Examples of metals suitable for the base metal portion of a composite layer are nickel, cobalt, chromium and copper.
In carrying out the invention, the support is coated with a layer of wax or the like, and is then placed in a vacuum chamber having, preferably, means for continuous evacuation. The
metal to be deposited is then heated to a temperature above its vaporization point at the pressure in the chamber, and thereby the deposition of a layer on the support is effected. If the foil is to have a layer of a single metal only, the deposition is continued until a layer of suflicient thickness to form an embossing foil has been deposited. If the foil is to have a composite layer of a precious and a base metal, the deposition of the) precious metal is continued, for the sake of economy, for a shorter time, and the layer produced may be thinner than would give a satisfactoryembossing on a rough surface, or than would retain the colour of the precious metal. The operation is then repeated in the same or a similar apparatus by depositing a base metal on the layer of precious metal. The layer of metal is then coated with size or other suitable adhesive.
The precious or base metal deposited may be an alloy and a composite layer may consist of a layer of precious metal and two different base metals. Thus a layer of copper or nickel may be deposited on the precious metal, and a layer of aluminium deposited on the copper or nickel. Thereby the precious metal is protected from any diffusion into it oi the aluminium.
When the metal to be deposited is an alloy, it is heated to a temperature above the vaporization point, at the pressure employed, of the constituent of the alloy having the highest vaporization point, and the phrase vaporization point of themetal is to be understood herein as meaning the vaporization point of the constituent having the highest vaporization point, when the metal is an alloy.
A metal. however, may be deposited from a mixture with the metal of a metal having a substantially higher vaporization point, and the mixture is then heated to a temperature above the vaporization point of'the metal to be deposited, but below that o! the metal with which it is mixed.
Preferably the support is in the form of a roll which is unrolled from one bobbin onto another bobbin in the vacuum chamber during the proces of deposition, and thereby the size of the vacuum chamber necessary for producing a large sheet of 1011 may be greatly reduced.
The thermal deposition of metals in vacuo, for the production of mirrors on glass, has been carried out-commercially, and the process need not therefore be described in greater detail,
It is to be understood that the support on which the metal is deposited comprises the layer oi material, such as wax, permitting-the metal layer to be detached.
By the above described process a foil can be produced having a composite layer 0! metal, of which the thickness of the precious metal is less than. 40 milli-microns, and the foil may have such a total thickness as to be suitable for embossing on rough materials.
Having described my invention, I declare that what I claim and desire to secure by Letters Patent is:
1. Process of producing a metal embossing toil,
' by coating a non-metallic support with a material adapted to release the support when heated, enclosing the coated support together with a supply of one of the group of metals consisting of gold, platinum, palladium, gold alloy, platinum alloy, palladium alloy, in a vacuum chamber, heating the metal to a temperature above its vaporization point at the pressure in the chamber so as to deposit a film of the metal on the coated support, then enclosing the support with metal film together with a supply or a base metal adapted to iorm a consistent film in a vacuum chamber, heating the base metal to a temperature above its vaporization point at the pressure in the chamber so as to deposit a film of base metal on the precious metal and coating the base metal, after removal from the chamber, with an adhesive material. I
2. Process of producing a metal embossing toil, by coating a non-metallic support with a material adapted to release the support when heated,
enclosing the coated support together with a supply of one of the group of precious metals, consisting of gold, platinum, palladium, gold alloy, platinum alloy, palladium alloy, in a vacuum chamber, heating the metal to a temperature above its vaporization point at the pressure in the chamber so as to deposit a film of metal on the coated support, then enclosing the support with metal film together with a supply of a base metal adapted to form a consistent film in a vacuum chamber, heating the base metal to a temperature above its vaporization point at the pressure in the chamber so as to deposit a film oi base metal on the precious metal, and, by the same process. depositing a film of a different base metal adapted to form a consistent film on the first base metal and coating the base metal, after removal from the chamber, with an adhesive material.
3. Process as claimed in claim 1 in which the base metal is one of the group 0! metals consisting of nickel, cobalt, chromium, copper,
4. Process as claimed in claim 2 in which the first base metal is one 0! the group of metals consisting oi! nickel, chromium, cobalt, copper, and the second base metal is one 0! the group of metals consisting oi aluminium and its alloys.
CECIL WHILEY.
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US2243237A true US2243237A (en) | 1941-05-27 |
Family
ID=3431937
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US2243237D Expired - Lifetime US2243237A (en) | Process of producing metal emboss |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | US2243237A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2443756A (en) * | 1942-12-26 | 1948-06-22 | Brush Dev Co | Magnetic material |
| US2644208A (en) * | 1950-05-24 | 1953-07-07 | Gen Electronique Soc | Method for the manufacture of a screen for a television apparatus or the like |
| US2916398A (en) * | 1954-10-07 | 1959-12-08 | Union Carbide Corp | Adhesive tape with a gas plated metal film for a conductor |
| US6317947B1 (en) | 1997-11-14 | 2001-11-20 | Meadowbrook Inventions, Inc. | Method of producing metallic flakes |
-
0
- US US2243237D patent/US2243237A/en not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2443756A (en) * | 1942-12-26 | 1948-06-22 | Brush Dev Co | Magnetic material |
| US2644208A (en) * | 1950-05-24 | 1953-07-07 | Gen Electronique Soc | Method for the manufacture of a screen for a television apparatus or the like |
| US2916398A (en) * | 1954-10-07 | 1959-12-08 | Union Carbide Corp | Adhesive tape with a gas plated metal film for a conductor |
| US6317947B1 (en) | 1997-11-14 | 2001-11-20 | Meadowbrook Inventions, Inc. | Method of producing metallic flakes |
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