US2223203A - Dry plate element and method of forming same - Google Patents

Dry plate element and method of forming same Download PDF

Info

Publication number
US2223203A
US2223203A US293812A US29381239A US2223203A US 2223203 A US2223203 A US 2223203A US 293812 A US293812 A US 293812A US 29381239 A US29381239 A US 29381239A US 2223203 A US2223203 A US 2223203A
Authority
US
United States
Prior art keywords
blocking layer
layer
natural
selenium
dry plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US293812A
Other languages
English (en)
Inventor
Brunke Fritz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Application granted granted Critical
Publication of US2223203A publication Critical patent/US2223203A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/06Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising selenium or tellurium in uncombined form other than as impurities in semiconductor bodies of other materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/06Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising selenium or tellurium in uncombined form other than as impurities in semiconductor bodies of other materials
    • H01L21/10Preliminary treatment of the selenium or tellurium, its application to the foundation plate, or the subsequent treatment of the combination
    • H01L21/108Provision of discrete insulating layers, i.e. non-genetic barrier layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M6/00Primary cells; Manufacture thereof
    • H01M6/42Grouping of primary cells into batteries
    • H01M6/46Grouping of primary cells into batteries of flat cells
    • H01M6/48Grouping of primary cells into batteries of flat cells with bipolar electrodes

Definitions

  • My invention relates to dry plate elements or cells for rectiflers and the like of the selenium type, in which a semi-conductor layer consisting of or comprising selenium, or consisting of or comprising a material, such as tellurium, functioning similarly to selenium as a semi-conductor, is formed on a carrier electrode or plate without any substantial blocking layer between the semiconductor layer and the carrier electrode, the
  • blocking layer means required for the rectification being on the free surface of the semi-conductor layer, that is, between the semi-conductor material and the counterelectrode.
  • a superior blocking layer means is provided 5 by utilizing crystalline sulphur as material for an artificial blocking layer applied on the natural blocking layer.
  • Fig. 1 illustrates graphically, in the operation in general of dry plate rectiers or cells. the relation of reverse current, or current in the blocking direction, to
  • Fig. 2 illustrates graphically the relation of reverse current to voltage in cells of the selenium type or the like as employed heretofore, and the same relation in cells of the selenium type or the like constructed in accordance with 5 the present invention
  • Fig. 3 illustrates a dry plate cell in accordance with the present invention.
  • a varnish or artificial resin layer is applied to the natural blocking layer. It has been found that the natural blocking layer has a crystalline, therefore a. rough, structure. By employing a material which removes this roughness of structure, as is the case for example with varnishes and articial resins, no substantial improvement in cell operation'can be obtained.
  • a blocking layer means which entails none of the above-mentioned disadvantages is obtained in accordance with the present invention by employing crystalline sulphur as material for the artificial blocking layer.
  • the crystalline sulphur becomes attached and crystallizes still further on the latter layer.
  • the roughness of the natural blocking layer is thereby very markedly increased.
  • rectiers or cells of the selenium type or the like are produced wherein not only is the reverse current reduced as compared with such devices employing only the natural blocking layer, but at the same time a displacement of the critical range Vx to higher values by 50 per cent takes place.
  • the load limit is substantially 18 volts in the blocking direction.
  • the conditions illustrated in curve A of Fig. 2 are typical. At 18 volts, which in curve A is the critical voltage point Ver, a very steep rise in the reverse current curve occurs. For example, the reverse current at 20 volts in the case of a cell having a diameter of 45 mm. amounts to approximately 8O milliamperes.
  • the reverse current at 20 volts amounts only to 10 milliamperes, a value of 80 milliamperes being reached only at voltages approximating 30. Therefore, the rectiiiers or cells constructed in accordance Wi-th the present invention may be loaded higher by 50 per cent than the prior usual rectifiers or cells, or to the range designated,v for example, by Vkz. ⁇ The resistance in the positive or ow direction is not thereby increased. On the contrary in cells constructed in accordance with the invention a substantial reduction of the internal resistance has been observed.
  • the thickness of the sulphur layer is preferably of the order of l-5 cm.
  • V a crystalline sulphur layer which is properly formed to enable the cell in which it is employed to operate at relatively high Avalues of vol-tage, loses its blocking properties to a very considerable extent if it is subsequently caused to fuse so that a smooth coating results. It is advantageous, therefore, to vaporize the sulphur on to the natural blocking layer in a few seconds, as thereby an unsuitable heating of the semiconductor surface is prevented and a highdegree of uniformity of the crystalline sulphur layer is attained.
  • the requirements of low heating and rapid application, by vaporizlng, Aof the sulphur layer are best met by performing the vaporizing process at reduced pressure.
  • the dry plate rectifier element or cell of the selenium or like type constructed in accordance with the invention comprises a carrier electrode I, of for example 45 mm. diameter and 1 mm. thickness, composed of any suitable material as nickel-plated iron, upon which is fused or otherwise suitably deposited a layer 2, approximately 0.1 mm. in thickness, of selenium or comprising selenium.
  • the selenium coating is next subjected for five hours, under pressure at a temperature of the order of 120 degrees C., to a forming process.-
  • a two hour heating of the selenium layer in air at approximately 210 degrees C. is required.
  • the crystalline sulphur layer I of approximately -5 cm.
  • the counterelectrode 5 and the carrier electrode i may be provided with suitable current leads 6 and 1.
  • the crystalline sulphur layer 4 may be produced in other ways than as above described.
  • the sulphur layer may be formed on the selenium surface by cataphoresis.
  • known substitute materials therefor such as tellurium or material comprising 'tellurium may be employed.
  • a dry plate element including a carrier electrode composed of material comprising selenium, a natural blocking layer on said semi-conductor layer, an artiilcial blocking layer composed of sulphur on said natural blocking layer, and a counterelectrode on said artificial blocking layer.
  • a dry plate element including a carrier electrode, a semi-conductor layer on said electrode composed of material of the group of materials comprising selenium and tellurium, a natural blocking layer on said semi-conductor layer, an artificial blocking layer composed of sulphur on said natural blocking layer, and a counterelectrode on said articial blocking layer.

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biotechnology (AREA)
  • Thyristors (AREA)
US293812A 1938-09-09 1939-09-07 Dry plate element and method of forming same Expired - Lifetime US2223203A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2223203X 1938-09-09

Publications (1)

Publication Number Publication Date
US2223203A true US2223203A (en) 1940-11-26

Family

ID=7990963

Family Applications (1)

Application Number Title Priority Date Filing Date
US293812A Expired - Lifetime US2223203A (en) 1938-09-09 1939-09-07 Dry plate element and method of forming same

Country Status (4)

Country Link
US (1) US2223203A (fr)
BE (1) BE436338A (fr)
FR (1) FR886506A (fr)
NL (2) NL57635C (fr)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2468527A (en) * 1944-08-08 1949-04-26 Hartford Nat Bank & Trust Co Blocking-layer cell
US2468131A (en) * 1945-05-12 1949-04-26 Standard Telephones Cables Ltd Method of manufacturing rectifier elements
US2501798A (en) * 1944-09-02 1950-03-28 Hartford Nat Bank & Trust Co Blocking-layer cell
US2858239A (en) * 1956-03-13 1958-10-28 Siemens Ag Method for producing selenium rectifiers
DE970900C (de) * 1944-05-24 1958-11-13 Standard Elek K Lorenz Ag Verfahren zur Herstellung unipolarer Leiter mit Selen oder Selenverbindungen als Halbleiter
US2869057A (en) * 1951-12-18 1959-01-13 Itt Electric current rectifier

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE970900C (de) * 1944-05-24 1958-11-13 Standard Elek K Lorenz Ag Verfahren zur Herstellung unipolarer Leiter mit Selen oder Selenverbindungen als Halbleiter
US2468527A (en) * 1944-08-08 1949-04-26 Hartford Nat Bank & Trust Co Blocking-layer cell
US2501798A (en) * 1944-09-02 1950-03-28 Hartford Nat Bank & Trust Co Blocking-layer cell
US2468131A (en) * 1945-05-12 1949-04-26 Standard Telephones Cables Ltd Method of manufacturing rectifier elements
US2869057A (en) * 1951-12-18 1959-01-13 Itt Electric current rectifier
US2858239A (en) * 1956-03-13 1958-10-28 Siemens Ag Method for producing selenium rectifiers

Also Published As

Publication number Publication date
FR886506A (fr) 1943-10-18
BE436338A (fr)
NL57635C (fr)
NL95164C (fr)

Similar Documents

Publication Publication Date Title
US2189576A (en) Dry plate rectifier and method of producing same
US2408910A (en) Electrical condenser
US2973466A (en) Semiconductor contact
US2223203A (en) Dry plate element and method of forming same
US2766509A (en) Titanium dioxide rectifier
US2221596A (en) Method of manufacturing dry rectifiers
US3201667A (en) Titanium dioxide capacitor and method for making same
US2139731A (en) Asymmetric electrode system
US3848260A (en) Electrode structure for a semiconductor device having a shallow junction and method for fabricating same
US2334554A (en) Method of producing blocking layer devices
US3620837A (en) Reliability of aluminum and aluminum alloy lands
US2497649A (en) Process of electroforming selenium rectifiers
US3679947A (en) Metal insulator semi-conductor structures with thermally reversible memory
US3735482A (en) Method of making an mos transistor including a gate insulator layer of aluminum oxide and the article so produced
US2496432A (en) Selenium rectifier
US2163393A (en) Selenium rectifier having light metal carrier electrodes
US3196327A (en) P-i-n semiconductor with improved breakdown voltage
US2479446A (en) Method of manufacturing small current selenium rectifiers
US2745047A (en) Selenium rectifiers and method of manufacture
US3052572A (en) Selenium rectifiers and their method of manufacture
US2215999A (en) Selenium rectifier having an insulating layer
US2201709A (en) Manufacture of alternating electric current rectifiers
JPH01186629A (ja) メサ型半導体素子の製造方法
US2446467A (en) Dry plate rectifier
US2195725A (en) Method of manufacturing selenium rectifiers