US2114468A - Processes for copying on positive diazotype layers - Google Patents
Processes for copying on positive diazotype layers Download PDFInfo
- Publication number
- US2114468A US2114468A US46825A US4682535A US2114468A US 2114468 A US2114468 A US 2114468A US 46825 A US46825 A US 46825A US 4682535 A US4682535 A US 4682535A US 2114468 A US2114468 A US 2114468A
- Authority
- US
- United States
- Prior art keywords
- rays
- ranges
- diazo
- original
- absorption
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/52—Compositions containing diazo compounds as photosensitive substances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/52—Compositions containing diazo compounds as photosensitive substances
- G03C1/54—Diazonium salts or diazo anhydrides
Definitions
- Positive diazotype layers have so far mainly been used for the copying of line-drawings by means of transmitted rays and only seldom for the preparation of half-tone copies (for example from screened half-tone originals) and reflex copies.
- Paradiazo-orthochlor-dimetliylaniline 2850-3200 2850 a shorter Paradiazo dimethylanilinemetasul- 2850-3200 2850 a. shorter Phonic 4150-4800 3200-4150 A.
- Paradiazo diphenylaniline 2900-3200 2900 a shorter The foregoing wave lengths are expressed in the angstrom unit, 5 4 01 1 mm.
- ranges to be used and ranges to be avoided there also are the ranges (which with most diazo compounds include wave lengths above approidmately 5000 A. units, with a few above approximately 5700 A. units) in which the diazo compounds do not show practical sensitiveness.
- the rays in this range can be applied in combination with the others without decreasing the eflect of the invention.
- sources which emit these rays it consequently is not necessary to filter them out, provided that the heating of the irradiated copying system caused by these rays is not objectionable (for the same reasons one also would eventually filter out the infra-red rays).
- selecting or searching for a suitable source of rays it, however, can be useful to choose the source so that these last named rays are emitted to a slight extent-only because substantial emission of these rays would only involve useless loss of energy.
- Diazo compound Source oi radiation Filter Paradiazo diphenylemlne Arc-lamp for copying purposes Arc-lamp for copying purposes- Bright sunlight Strong incandescent lamp Cadmium vapour lamp oi Uviol sion). High pressure mercury vapour High pressure mercury' vapour Schott GO 3 (x) or "Corning (xx) Noviol A No. 038.
- Zinc vapour lamp oi Uvlol glass 10 mm. oi an aqueous solution of 0,01% K1CrO4'in 0,05 N.KOH. Zinc vapour lamp of Uviol glass... Without; or with 10 mm. oi an aqueous solution of 0,01% K2Cl'04 in 0.05 N.KOH.
- aliases emitted by the source When a source of radiation is powerful in the preferred range as is for example the case with the known high pressure mercury vapour lamps, more specifically with the super high pressure lamp of B01 (see. Pieter Zeeman, Verschen, edited by Martinus Nijstage-lighting and the like (see Osram, Lichtheft,
- filter layers can be combined with'the picture forming layer into one and the same sheet; For the purposes of the invention it is not necessary to carry out the entire irradiation exclusively with the preferred rays.
- a reflex copy is made by means of a transparent sheet coated on one side with a solution of 15% para-diam ethyloenzylanilinechloride, which is located with its sensitive surface in contact with the original.
- the source oi radiation is a high pressure mercury vapour lamp of 1000 watts of low ultra-violet transmission with a vapour pressure oi 300 mm.
- a quinine sulphate filter is inserted between the source of radiation and the copying system. The irradiation is continued until a test after development with a solution of 1% phlorogluclnol (azo dyestufi coupling component) and 2% sodium carbonate yields a positive picture on a. dark background, the optical density of which is reduced to approximately ,4; of its original value.
- diazotype print which is positive with respect to said original, the steps of exposing in contact with said original a layer containing a light sensitive diazo compound having an amino group in the nucleus and an absorption spectrum containing ranges of low absorption and ranges of high absorption to a source of radiation emitting substantially only active rays which 'iall within said ranges oflow absorption, and destuti coupling component to react with said diazo compound so as to convert the diazo compound into an azo dyestufi color'and thereby produce the darker parts oi'the print.
- diazotype print which is positive with respect to said original, the steps of exposing in contact with said original a layer containing a light sensitive diazc compound having an amino group in the nucleus and an absorption spectrum containing ranges of low absorption and ranges of high absorption to a radiation containing active rays which fall within said ranges of low absorption with the exclusion substantially of' rays falling within saidrange's of high absorption for the major portion of the total actinic eiiect, exposing still in the some contact with said original said layer to a radiation containing active rays which fall within said ranges of high absorptionior a lesser portion of the total aetinic -effect than that produced by the low absorption radiation, and developing the exposedlayer by causing an azo dyestui! coupling component to react with said diazo compound so as to convert the disco compoundintoan azo dyestufi color and thereby produce the darker parts of the print.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Heat Sensitive Colour Forming Recording (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL74632 | 1935-08-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
US2114468A true US2114468A (en) | 1938-04-19 |
Family
ID=19750255
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US46825A Expired - Lifetime US2114468A (en) | 1935-08-23 | 1935-10-25 | Processes for copying on positive diazotype layers |
Country Status (3)
Country | Link |
---|---|
US (1) | US2114468A (en(2012)) |
FR (1) | FR810413A (en(2012)) |
NL (1) | NL48339C (en(2012)) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2660526A (en) * | 1949-01-03 | 1953-11-24 | Gen Aniline & Film Corp | Diazotype reflex photoprinting |
US3077401A (en) * | 1957-10-07 | 1963-02-12 | Grinten Chem L V D | Process for the dosage of the exposure during the copying of positive lineoriginals on diazotype material |
US3536490A (en) * | 1964-04-28 | 1970-10-27 | Pitney Bowes Inc | Novel diazotype copying process |
FR2353083A1 (fr) * | 1976-05-28 | 1977-12-23 | Hoechst Ag | Procede et dispositif pour la production de diazocopies a l'aide d'un materiel de diazotypie a deux composants |
US4094681A (en) * | 1975-10-23 | 1978-06-13 | Trans World Technology Laboratories, Inc. | Image amplification of negative-working diazo materials |
US4804614A (en) * | 1984-10-01 | 1989-02-14 | The Aerospace Corporation | Photoresist process of fabricating microelectronic circuits using water processable diazonium compound containing contrast enhancement layer |
US5188924A (en) * | 1984-05-14 | 1993-02-23 | Kabushiki Kaisha Toshiba | Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4282300A (en) * | 1978-12-04 | 1981-08-04 | Eliott Industries | Method for diazo copying of blue line originals |
-
0
- NL NL48339D patent/NL48339C/xx active
-
1935
- 1935-10-25 US US46825A patent/US2114468A/en not_active Expired - Lifetime
-
1936
- 1936-08-18 FR FR810413D patent/FR810413A/fr not_active Expired
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2660526A (en) * | 1949-01-03 | 1953-11-24 | Gen Aniline & Film Corp | Diazotype reflex photoprinting |
US3077401A (en) * | 1957-10-07 | 1963-02-12 | Grinten Chem L V D | Process for the dosage of the exposure during the copying of positive lineoriginals on diazotype material |
US3536490A (en) * | 1964-04-28 | 1970-10-27 | Pitney Bowes Inc | Novel diazotype copying process |
US4094681A (en) * | 1975-10-23 | 1978-06-13 | Trans World Technology Laboratories, Inc. | Image amplification of negative-working diazo materials |
FR2353083A1 (fr) * | 1976-05-28 | 1977-12-23 | Hoechst Ag | Procede et dispositif pour la production de diazocopies a l'aide d'un materiel de diazotypie a deux composants |
US5188924A (en) * | 1984-05-14 | 1993-02-23 | Kabushiki Kaisha Toshiba | Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt |
US4804614A (en) * | 1984-10-01 | 1989-02-14 | The Aerospace Corporation | Photoresist process of fabricating microelectronic circuits using water processable diazonium compound containing contrast enhancement layer |
Also Published As
Publication number | Publication date |
---|---|
NL48339C (en(2012)) | |
FR810413A (fr) | 1937-03-22 |
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