US20240040687A1 - Circuit board assembly - Google Patents
Circuit board assembly Download PDFInfo
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- US20240040687A1 US20240040687A1 US18/486,814 US202318486814A US2024040687A1 US 20240040687 A1 US20240040687 A1 US 20240040687A1 US 202318486814 A US202318486814 A US 202318486814A US 2024040687 A1 US2024040687 A1 US 2024040687A1
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- 239000012792 core layer Substances 0.000 claims abstract description 77
- 239000002184 metal Substances 0.000 claims description 57
- 229910052751 metal Inorganic materials 0.000 claims description 57
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 24
- 229910021389 graphene Inorganic materials 0.000 claims description 24
- 239000004020 conductor Substances 0.000 claims description 21
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- 239000003989 dielectric material Substances 0.000 claims description 7
- 238000000034 method Methods 0.000 description 32
- 239000000758 substrate Substances 0.000 description 22
- 238000004519 manufacturing process Methods 0.000 description 17
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 11
- 229910052802 copper Inorganic materials 0.000 description 11
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- 230000000694 effects Effects 0.000 description 6
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- 238000009713 electroplating Methods 0.000 description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- 230000017525 heat dissipation Effects 0.000 description 5
- 229910052759 nickel Inorganic materials 0.000 description 5
- 229910052709 silver Inorganic materials 0.000 description 5
- 239000004332 silver Substances 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 4
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- 238000000576 coating method Methods 0.000 description 3
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- 230000002452 interceptive effect Effects 0.000 description 2
- 238000001465 metallisation Methods 0.000 description 2
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Images
Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/18—Printed circuits structurally associated with non-printed electric components
- H05K1/182—Printed circuits structurally associated with non-printed electric components associated with components mounted in the printed circuit board, e.g. insert mounted components [IMC]
- H05K1/185—Components encapsulated in the insulating substrate of the printed circuit or incorporated in internal layers of a multilayer circuit
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0213—Electrical arrangements not otherwise provided for
- H05K1/0216—Reduction of cross-talk, noise or electromagnetic interference
- H05K1/0218—Reduction of cross-talk, noise or electromagnetic interference by printed shielding conductors, ground planes or power plane
- H05K1/0219—Printed shielding conductors for shielding around or between signal conductors, e.g. coplanar or coaxial printed shielding conductors
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0213—Electrical arrangements not otherwise provided for
- H05K1/0216—Reduction of cross-talk, noise or electromagnetic interference
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0201—Thermal arrangements, e.g. for cooling, heating or preventing overheating
- H05K1/0203—Cooling of mounted components
- H05K1/0207—Cooling of mounted components using internal conductor planes parallel to the surface for thermal conduction, e.g. power planes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0213—Electrical arrangements not otherwise provided for
- H05K1/0216—Reduction of cross-talk, noise or electromagnetic interference
- H05K1/0218—Reduction of cross-talk, noise or electromagnetic interference by printed shielding conductors, ground planes or power plane
- H05K1/0224—Patterned shielding planes, ground planes or power planes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0296—Conductive pattern lay-out details not covered by sub groups H05K1/02 - H05K1/0295
- H05K1/0298—Multilayer circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/18—Printed circuits structurally associated with non-printed electric components
- H05K1/182—Printed circuits structurally associated with non-printed electric components associated with components mounted in the printed circuit board, e.g. insert mounted components [IMC]
- H05K1/183—Components mounted in and supported by recessed areas of the printed circuit board
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/107—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by filling grooves in the support with conductive material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4682—Manufacture of core-less build-up multilayer circuits on a temporary carrier or on a metal foil
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4697—Manufacturing multilayer circuits having cavities, e.g. for mounting components
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0201—Thermal arrangements, e.g. for cooling, heating or preventing overheating
- H05K1/0203—Cooling of mounted components
Definitions
- This disclosure relates to a circuit board assembly and a manufacturing method thereof, in particular to a circuit board assembly and a manufacturing method thereof that can effectively shield electromagnetic interference between electronic components.
- a current chip package such as System in a Package (SiP)
- SiP System in a Package
- a current chip package includes a plurality of electronic components. These electronic components generate electromagnetic waves when these electronic components are in operation, and the electromagnetic waves interfere with these electronic components, thereby affecting the operation of these electronic components.
- an electronic device equipped with this chip package such as a smartphone or a tablet, may operate abnormally or even malfunction. Therefore, reducing or avoiding the interference of the electromagnetic waves on the electronic components in the chip package is an issue worthy of discussion.
- a purpose of the present disclosure is to provide a circuit board assembly, which includes a core layer, at least one electronic component, at least one first shielding ring wall, at least one second shielding ring wall, a first circuit layer, a second circuit layer, a first insulating layer and a plurality of shielding columns.
- the core layer has an accommodating space, in which the accommodating space has an inner sidewall.
- the electronic component is disposed in the accommodating space.
- the first shielding ring wall is disposed in the accommodating space and covers the inner sidewall, in which the first shielding ring wall surrounds the electronic component and is not in contact with the electronic component.
- the second shielding ring wall is disposed in the core layer and surrounds the first shielding ring wall.
- the core layer is disposed between the first circuit layer and the second circuit layer.
- the second circuit layer is disposed between the first insulating layer and the core layer.
- the shielding columns are disposed in the first insulating layer.
- the shielding columns are electrically connected to the first shielding ring wall.
- the circuit board assembly further includes a shielding layer, in which the shielding layer is disposed beneath the first insulating layer, and the first insulating layer is disposed between the shielding layer and the core layer, and the shielding columns extend to the core layer and the shielding layer.
- the second shielding ring wall includes two metal layers and a conductive material, and the metal layers are arranged in concentric rings, and one of the metal layers surrounds the other of the metal layers and the conductive material.
- a surface of the electronic component, one end of the conductive material, and a surface of the core layer are coplanar.
- the height of the second shielding ring wall is greater than the thickness of the at least one electronic component.
- the circuit board assembly further includes a second insulating layer, in which the first circuit layer is disposed between the second insulating layer and the core layer.
- a material of the core layer is a photosensitive dielectric material.
- the circuit board assembly further includes a graphene layer, in which the graphene layer is disposed in the accommodating space and surrounds the electronic component, and the graphene layer is continuously distributed around the electronic component.
- the electronic component is electrically isolated from the first shielding ring wall, the second shielding ring wall, and the shielding columns.
- the present disclosure also provides a method of manufacturing a circuit board assembly, which includes providing a substrate.
- a first dielectric layer and a first release film are formed on the substrate, in which first release film is disposed between the first dielectric layer and the substrate.
- the first dielectric layer is patterned to form a first dielectric pattern layer, in which the first dielectric pattern layer has at least one first recess and at least one first groove.
- a first metal layer is formed on the first dielectric pattern layer, in which the first metal layer covers an upper surface of the first dielectric pattern layer, a sidewall of the first recess and a sidewall of the first groove.
- At least one electronic component is disposed in the at least one first recess, in which the electronic component is disposed on the substrate.
- a second dielectric pattern layer is disposed on the first dielectric pattern layer and the electronic component after disposing the electronic component in the at least one first recess to form a core layer including the first dielectric pattern layer and the second dielectric pattern layer.
- At least one circuit layer is formed on the core layer.
- At least one insulating layer is formed on the circuit layer.
- a plurality of shielding columns are formed in the insulating layer.
- forming the second dielectric pattern layer includes: while forming the first dielectric layer and the first release film, forming a second dielectric layer and a second release film on another side of the substrate opposite to the first dielectric layer, in which the second release film is disposed between the second dielectric layer and the substrate.
- the second dielectric layer is patterned to form the second dielectric pattern layer, in which the second dielectric pattern layer has at least one second recess and at least one second groove.
- a second metal layer is formed on the second dielectric pattern layer, in which the second metal layer covers an upper surface of the second dielectric pattern layer, a sidewall of the second recess and a sidewall of the second groove.
- the method of manufacturing the circuit board assembly further includes filling a plurality of conductive materials in the first groove and the second groove during disposing the electronic component in the at least one first recess, in which the conductive materials protrude from a surface of the first dielectric pattern layer and a surface of the second dielectric pattern layer.
- the method of manufacturing the circuit board assembly further includes after respectively forming the first metal layer and the second metal layer on the first dielectric pattern layer and the second electrical pattern layer, and before disposing the electronic element in the at least one first recess, thinning the first metal layer, the second metal layer, the first dielectric pattern layer, and the second dielectric pattern layer to expose an upper surface of the first dielectric pattern layer and an upper surface of the second dielectric pattern layer.
- patterning the first dielectric layer and the second dielectric layer comprises an exposure process and a development process.
- disposing the second dielectric pattern layer on the first dielectric pattern layer and the electronic component, the second dielectric pattern layer and the first dielectric pattern layer are adhered to each other.
- the substrate, the first dielectric pattern layer, the second dielectric pattern layer, the electronic component and the conductive materials are in a working environment with a temperature in a range from 25° C. to 180° C.
- the method of manufacturing the circuit board assembly further includes removing the substrate after forming the conductive columns in the insulating layer. At least one build-up circuit layer is formed on the core layer. At least one build-up insulating layer is formed on the build-up circuit layer.
- portions of the conductive columns are disposed in the insulating layer along the first metal layer and the second metal layer adjacent to the electronic component.
- FIG. 1 A is a schematic cross-sectional view of a circuit board
- FIG. 1 B is a schematic top view of a core layer, an electronic component, a first shielding ring wall, a second shielding ring wall, and a shielding column according to FIG. 1 A .
- FIGS. 2 A to 2 J are schematic cross-sectional views illustrating a method of manufacturing a circuit board assembly at various process stages according to some embodiments of the present disclosure.
- FIG. 3 A is a schematic cross-sectional view of a circuit board assembly according to other embodiments of the present disclosure.
- FIG. 3 B is a schematic top view of a core layer, an electronic component, a first shielding ring wall, a second shielding ring wall, a shielding column, and a graphene layer according to FIG. 3 A .
- FIGS. 4 A to 4 D are schematic cross-sectional views illustrating a method of manufacturing a circuit board assembly at various process stages according to other embodiments of the present disclosure.
- FIG. 5 A is a schematic cross-sectional view of a circuit board assembly according to still other embodiments of the present disclosure.
- FIG. 5 B is a schematic top view of a core layer, an electronic component, a first shielding ring wall, a second shielding ring wall, and a shielding column according to FIG. 5 A .
- FIGS. 6 A to 6 C are schematic cross-sectional views illustrating a method of manufacturing a circuit board assembly at various process stages according to still other embodiments of the present disclosure.
- FIG. 7 is a schematic cross-sectional view of a circuit board assembly according to still other embodiments of the present disclosure.
- first and second features are formed in direct contact
- additional feature may be formed between the first and second features, such that the first and second features are not in direct contact
- present disclosure may repeat reference numerals and/or letters in the various examples. This repetition does not indicate a relationship between the various embodiments and/or configurations discussed.
- spatially relative terms such as “beneath”, “below”, “lower”, “over”, “higher”, etc. may be used herein for ease of description to describe one element or feature's relationship to another element(s) or feature(s) as illustrated in the figures.
- the spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures.
- the device may be otherwise oriented (rotated 90 degrees or at other orientations), and the spatially relative description used herein may likewise be interpreted accordingly.
- the circuit board assembly of the present disclosure can be used in any electronic product or electronic device, and can form a highly integrated circuit board with various components such as radio frequency, digital, optoelectronics, etc. using system in a package, and can avoid electromagnetic wave leakage or interference between the various components.
- FIG. 1 A is a schematic cross-sectional view of a circuit board assembly according to some embodiments of the present disclosure.
- the circuit board assembly 100 includes a core layer 110 , at least one electronic component 112 , at least one first shielding ring wall 113 , at least one second shielding ring wall 114 , a first circuit layer 120 , a second circuit layer 130 , a first insulating layer 140 , and a plurality of shielding columns 141 .
- the core layer 110 has at least one accommodating space 111 , in which the accommodating space 111 has an inner sidewall. Please note that the inner sidewall is not specially marked in order to avoid too much confusion in the figure.
- the electronic component 112 is disposed in the accommodating space 111 .
- the first shielding ring wall 113 is disposed in the accommodating space 111 and covers the inner sidewall, in which the first shielding ring wall 113 surrounds the electronic component 112 , and the first shielding ring wall 113 is not in contact with the electronic component 112 .
- the second shielding ring wall 114 is disposed in the core layer 110 and surrounds the first shielding ring wall 113 .
- a material of the core layer 110 is a photosensitive dielectric material.
- a material of the core layer 110 includes, but is not limited to, a photosensitive dielectric material such as photosensitive polyimide (PSPI), photoimageable coverlay (PIC), or a combination thereof.
- the first shielding ring wall 113 is not in contact with the electronic component 112 means that there is an annular space between the first shielding ring wall 113 and the electronic component 112 to electrically separate the first shielding ring wall 113 and the electronic component 112 .
- the use of the photosensitive dielectric material can support components having different sizes and form a corresponding chamber or an accommodating space. In the case of a given size space, more components may be stacked in a vertical direction, and thus the integration could be higher.
- the core layer 110 may have more than one electronic component 112 , and when there are a plurality of electronic components 112 , each of the electronic components 112 is surrounded by a corresponding first shielding ring wall 113 .
- FIG. 1 A shows one electronic component 112 and one first shielding ring wall 113 , which are only exemplary, and it is not limited thereto.
- the first shielding ring wall 113 preliminarily shields or blocks electromagnetic waves leaking from the electronic component 112 to remove most of the electromagnetic wave interference.
- the electronic component 112 may include, but is not limited to, an active component, a passive component, a high-frequency component, a digital component, an optoelectronic component, or a combination thereof.
- a material of the first shielding ring wall 113 includes, but is not limited to, a conductive metal such as copper, gold, silver, nickel, a conductive alloy, or a combination thereof.
- FIG. 1 B is a schematic top view of a core layer, an electronic component, a first shielding ring wall, a second shielding ring wall, and a shielding column according to FIG. 1 A .
- the second shielding ring wall 114 is disposed in the core layer 110 and surrounds the first shielding ring wall 113 .
- the relationship between the first shielding ring wall 113 and the second shielding ring wall 114 can be clearly seen from FIG. 1 B .
- the second shielding ring wall 114 is not directly in contact with the first shielding ring wall 113 , and the second shielding ring wall 114 and the first shielding ring wall 113 are substantially concentrically disposed.
- the second shielding ring wall 114 includes two metal layers 1141 and a conductive material 1142 .
- the two metal layers 1141 are arranged in concentric rings, and one of the metal layers 1141 surrounds the other of the metal layers 1141 and the conductive material 1142 .
- two ends of the second shielding ring wall 114 extend to upper and lower surfaces of the core layer 110 .
- the second shielding ring wall 114 can shield or block electromagnetic waves leaking due to a gap difference between the components when there is a size difference between the electronic components 112 .
- the gap differences are caused by the portions of vertical embedded components on which copper is not deposited or plated.
- a material of the two metal layers 1141 of the second shielding ring wall 114 includes, but is not limited to, a conductive metal such as copper, gold, silver, nickel, a conductive alloy, or a combination thereof.
- a conductive material 1142 of the second shielding ring wall 114 includes, but is not limited to, copper, gold, silver, nickel, or a metal alloy of a combination thereof.
- the core layer 110 is disposed between the first circuit layer 120 and the second circuit layer 130 .
- the electronic component 112 in the core layer 110 should be electrically connected to outside. Therefore, the first circuit layer 120 and the second circuit layer 130 are disposed on the upper and lower surfaces of the core layer 110 , and thus the electronic component 112 can be electrically connected to the outside.
- the second circuit layer 130 is disposed between the first insulating layer 140 and the core layer 110 .
- the shielding column 141 is provided in the first insulating layer 140 .
- a plurality of conductive columns 142 are also disposed in the first insulating layer 140 , and the conductive columns 142 are electrically connected to the electronic component 112 .
- the shielding column 141 is electrically connected to the first shielding ring wall 113 and extends to upper and lower surfaces of the first insulating layer 140 . Furthermore, the shielding columns 141 surround the conductive columns 142 .
- the shielding columns 141 are arranged along the first shielding ring wall 113 .
- the shielding column 141 can shield the electromagnetic field generated by the current.
- FIG. 1 B shows eight shielding columns 141 , which are only exemplary, and it is not limited thereto. More or less shielding columns 141 should be included in the scope of the present disclosure.
- the shielding column 141 is disposed in a column shape, which is different from the first shielding ring wall 113 and the second shielding ring wall 114 , so that the conductive column 142 can further circulate with an external circuit.
- a material of the shielding columns 141 and a material of the conductive columns 142 include, but are not limited to, a conductive metal such as copper, gold, silver, nickel, a conductive alloy, or a combination thereof.
- the electronic component 112 is electrically isolated from the first shielding ring wall 113 , the second shielding ring wall 114 , and the shielding column 141 . As such, the first shielding ring wall 113 , the second shielding ring wall 114 , and the shielding column 141 will not affect the electrical flow or function between the electronic component 112 and the external circuit.
- the circuit board assembly 100 further includes a shielding layer 150 , in which the shielding layer 150 is disposed beneath the first insulating layer 140 , and the first insulating layer 140 is disposed between the shielding layer 150 and the core layer 110 , and the shielding column 141 extends to the core layer 110 and the shielding layer 150 .
- the shielding layer 150 is disposed on a surface of the first insulating layer 140 opposite to the core layer 110 , and the shielding layer 150 is perpendicular to a center line of the conductive column 142 , which can enhance the shielding performance of the electromagnetic field.
- the shielding layer 150 may not be provided, and a thick copper layer may be used instead, so that heat dissipation efficiency of the circuit board assembly 100 can be increased.
- metal wiring may also be used to replace the shielding layer 150 , so that the electronic component 112 can be further electrically connected with more electronic devices.
- the first insulating layer 140 may also have a multi-layer structure, and the layers are connected by a build-up circuit layer 143 and the conductive column 142 .
- a surface of the electronic component 112 , one end of the second shielding ring wall 114 , and a surface of the core layer 110 are coplanar.
- the second shielding ring wall 114 extends to the upper and lower surfaces of the core layer 110 , so that the electromagnetic waves leaking from the electronic component 112 due to the gap difference can be completely shielded.
- the circuit board assembly 100 further includes a second insulating layer 160 , a wiring layer 170 , and a plurality of conductive columns 161 , and the first circuit layer 120 is disposed between the second insulating layer 160 and the core layer 110 .
- the wiring layer 170 is disposed on the second insulating layer 160 , and the conductive column 161 extends to the core layer 110 and the wiring layer 170 .
- FIG. 3 A is a schematic cross-sectional view of a circuit board assembly according to other embodiments of the present disclosure. As shown in FIG. 3 A , the biggest difference between this embodiment and the circuit board assembly 100 of FIG. 1 A is that a core layer 310 of a circuit board assembly 300 of this embodiment further includes a graphene layer 315 . It should be particularly noted that an overall structure of the circuit board assembly 300 in FIG. 3 A is similar to that of the circuit board assembly 100 in FIG. 1 A .
- the circuit board assembly 300 includes the core layer 310 , at least one electronic component 312 , and at least one first shielding ring wall 313 , at least one second shielding ring wall 314 , a first circuit layer 320 , a second circuit layer 330 , a first insulating layer 340 , and a plurality of shielding columns 341 .
- the core layer 310 has at least one accommodating space 311 , in which the accommodating space 311 has an inner sidewall.
- the electronic component 312 is disposed in the accommodating space 311 .
- the first shielding ring wall 313 is disposed in the accommodating space 311 and covers the inner sidewall, in which the first shielding ring wall 313 surrounds the electronic component 312 , and the first shielding ring wall 313 is not in contact with the electronic component 312 .
- the second shielding ring wall 314 is disposed in the core layer 310 and surrounds the first shielding ring wall 313 .
- the second shielding ring wall 314 includes two metal layers 3141 and a conductive material 3142 .
- the two metal layers 3141 are arranged in concentric rings, and one of the metal layers 3141 surrounds the other of the metal layers 3141 and the conductive material 3142 .
- the core layer 310 is disposed between the first circuit layer 320 and the second circuit layer 330 .
- the second circuit layer 330 is disposed between the first insulating layer 340 and the core layer 310 .
- the shielding column 341 is disposed in the first insulating layer 340 .
- a plurality of conductive columns 342 are also disposed in the first insulating layer 340 , and the conductive columns 342 are electrically connected to the electronic component 312 .
- the shielding columns 341 are arranged along the first shielding ring wall 313 .
- the circuit board assembly 300 further includes a shielding layer 350 , in which the shielding layer 350 is disposed beneath the first insulating layer 340 , and the first insulating layer 340 is disposed between the shielding layer 350 and the core layer 310 , and the shielding column 341 extends to the core layer 310 and shielding layer 350 .
- the circuit board assembly 300 further includes a second insulating layer 360 , a wiring layer 370 and a plurality of conductive columns 361 , and the first circuit layer 320 is disposed between the second insulating layer 360 and the core layer 310 .
- the wiring layer 370 is disposed on the second insulating layer 360 , and the conductive columns 361 extend to the core layer 310 and the wiring layer 370 .
- the graphene layer 315 is disposed in the accommodating space 311 and surrounds the electronic component 312 , and the graphene layer 315 is continuously distributed around the electronic component 312 .
- the graphene layer 315 is disposed between the electronic element 312 and the first shielding ring wall 313 , between the electronic element 312 and the first circuit layer 320 , and between the second circuit layer 330 and the first insulating layer 340 , and the graphene layer 315 is a continuous structure.
- the graphene layer 315 can improve heat dissipation efficiency of the circuit board assembly 300 .
- FIG. 3 B is a schematic top view of the core layer, the electronic component, the first shielding ring wall, the second shielding ring wall, the shielding column, and the graphene layer according to FIG. 3 A . It can be clearly understood from FIG. 3 B that the graphene layer 315 is disposed between the first shielding ring wall 313 and the electronic component 312 and covers the electronic component 312 , so that the heat dissipation efficiency of the electronic component 312 can be improved.
- FIG. 5 A is a schematic cross-sectional view of a circuit board assembly according to still other embodiments of the present disclosure. Specifically, FIG. 5 A shows a circuit board assembly 500 having a plurality of electronic components 512 .
- FIG. 5 A shows three electronic components 512 .
- Different electronic components 512 in the vertical direction are separated by a photosensitive dielectric material. Therefore, there will be a gap difference between the electronic components 512 , and electromagnetic waves will leak out. Accordingly, the second shielding ring wall 514 can shield and block the electromagnetic waves leaking out, and prevent the electronic components 512 from interfering with each other.
- FIG. 5 B is a schematic top view of the core layer, the electronic component, the first shielding ring wall, the second shielding ring wall, and the shielding column according to FIG. 5 A . It can also be found from FIG. 5 B that the first shielding ring wall 513 is not in contact with the electronic component 512 , so that the electrical isolation between the first shielding ring wall 513 and the electronic component 512 is maintained.
- FIG. 7 is a schematic cross-sectional view of a circuit board assembly according to still other embodiments of the present disclosure.
- a circuit board assembly 700 a core layer 710 , an electronic component 712 , a first shielding ring wall 713 , a second shielding ring wall 714 , a metal layer 7141 , a conductive material 7142 , a first circuit layer 720 , a second circuit layer 730 , a first insulating layer 740 , a shielding column 741 , a conductive column 742 , a build-up circuit layer 743 , a shielding layer 750 (or a thick copper layer, a metal wiring), a second insulating layer 760 , a conductive column 761 and a wiring layer 770 shown in FIG. 7 , a structural feature and a material of each of the components are the same as the circuit board assemblies 100 and 300 shown in FIG. 1 A and FIG. 3 A , so these components will not be repeated here
- FIG. 7 shows two electronic components 712 , and an upper surface of one of the electronic components 712 is not in contact with an upper surface of the core layer 710 .
- the height of the second shielding ring wall 714 is greater than the thickness of the electronic component 712 which is not in contact with the upper surface of the core layer 710 . Accordingly, the second shielding ring wall 714 can prevent the electromagnetic waves leaking from the electronic component 712 having the gap difference, and keep the electronic components 712 from interfering with each other.
- FIGS. 2 A to 2 J are schematic cross-sectional views illustrating a method of manufacturing a circuit board assembly at various process stages according to some embodiments of the present disclosure.
- a substrate 210 is provided, and a first dielectric layer 220 and a first release film 230 , and a second dielectric layer 240 and a second release film 250 are formed on both sides (i.e., upper and lower surfaces) of the substrate 210 , respectively.
- the first release film 230 is disposed between the first dielectric layer 220 and the substrate 210
- the second release film 250 is disposed between the second dielectric layer 240 and the substrate 210 .
- first release film 230 and the second release film 250 are provided to facilitate separation of the first dielectric layer 220 and the second dielectric layer 240 in subsequent processes.
- a material of the first dielectric layer 220 and a material of the second dielectric layer 240 include, but are not limited to, a photosensitive dielectric material such as photosensitive polyimide (PSPI), photoimageable coverlay (PIC) or a combination thereof.
- PSPI photosensitive polyimide
- PIC photoimageable coverlay
- the first dielectric layer 220 and the second dielectric layer 240 are patterned to form a first dielectric pattern layer 220 ′ and a second dielectric pattern layer 240 ′.
- the first dielectric pattern layer 220 ′ has a first recess 221 and a first groove 222
- the second dielectric pattern layer 240 ′ has a second recess 241 and a second groove 242 .
- the first dielectric pattern layer 220 ′ and the second dielectric pattern layer 240 ′ are used as structural package components.
- a method of patterning the first dielectric layer 220 and the second dielectric layer 240 includes, but is not limited to, an exposure process and a development process.
- a first metal layer 260 is formed on the first dielectric pattern layer 220 ′, in which the first metal layer 260 covers an upper surface of the first dielectric pattern layer 220 ′, a sidewall of the first recess 221 and a sidewall of the first groove 222 .
- a second metal layer 270 is formed on the second dielectric pattern layer 240 ′, in which the second metal layer 270 covers an upper surface of the second dielectric pattern layer 240 ′, a sidewall of the second recess 241 and a sidewall of the second groove 242 .
- a method of forming the first metal layer 260 and the second metal layer 270 includes, but is not limited to, a deposition process, an electroplating process, a coating process, or a combination thereof.
- a material for forming the first metal layer 260 and a material for forming the second metal layer 270 include, but are not limited to, a conductive metal such as copper, gold, silver, nickel, a conductive alloy, or a combination thereof.
- the first metal layer 260 , the second metal layer 270 , the first dielectric pattern layer 220 ′, and the second dielectric pattern layer 240 ′ are thinned to form a first dielectric pattern layer 220 ′′, a second dielectric pattern layer 240 ′′, a first metal pattern layer 260 ′ and a second metal pattern layer 270 ′ exposing upper surfaces thereof.
- a method of thinning the first metal layer 260 , the second metal layer 270 , the first dielectric pattern layer 220 ′, and the second dielectric pattern layer 240 ′ includes, but is not limited to, an etching process, an exposure process and a development process.
- an electronic component 112 is disposed in the first recess 221 , and the electronic component 112 is located on the substrate 210 . It should be noted that the electronic component 112 is not in contact with the metal pattern layer 260 ′ on the sidewall of the first recess 221 , and thus to prevent the electronic element 112 from being electrically connected to the first metal pattern layer 260 ′.
- a plurality of conductive materials 1142 are filled in the first groove 222 and the second groove 242 . It should be noted that the conductive materials 1142 protrude from a surface of the first dielectric pattern layer 220 ′′ and a surface of the second dielectric pattern layer 240 ′′. Accordingly, in a subsequent stacking process, the first dielectric pattern layer 220 ′′ and the second dielectric pattern layer 240 ′′ can be completely bonded.
- the second dielectric pattern layer 240 ′′ is separated from the substrate 210 by the second release film 250 , and is further stacked on the first dielectric pattern layer 220 ′′ and the electronic element 112 .
- the first metal pattern layer 260 ′ and the second metal pattern layer 270 ′ are bonded, and the conductive materials 1142 are also bonded to each other, and thus forming a first shielding ring wall 113 and a second shielding ring wall 114 .
- the core layer 110 shown in FIG. 1 A is formed.
- a second circuit layer 130 is formed on the core layer 110 .
- the second circuit layer 130 is formed by electroplating or metal deposition and then etching.
- a temperature of a working environment is in a range from 25° C. to 180° C., and thus can prevent the core layer 110 from expanding and deforming due to heating or overheating, which leads to damage.
- a first insulating layer 140 is fabricated, and a shielding layer 150 is formed on a surface thereof (a thick copper layer or a metal wiring can also be formed), and a build-up circuit layer 143 is formed in the first insulating layer 140 .
- a method of forming the shielding layer 150 includes, but is not limited to, a deposition process, an electroplating process, a coating process, or a combination thereof.
- a plurality of shielding columns 141 and a plurality of conductive columns 142 are formed in the first insulating layer 140 , and the shielding columns 141 extend to upper and lower surfaces of the first insulating layer 140 , and the conductive columns 142 are surrounded by the shielding columns 141 .
- a method of forming the shielding columns 141 and the conductive columns 142 includes, but is not limited to, a drilling process and a deposition process.
- the first insulating layer 140 shown in FIG. 2 H is stacked on the core layer 110 . It should be noted that this step is to adhere a surface of the first insulating layer 140 that the shielding layer 150 is not disposed and the core layer 110 to each other. As such, the shielding columns 141 are electrically connected to the first shielding ring wall 113 , and the conductive columns 142 are electrically connected to the electronic component 112 .
- the core layer 110 is separated from the substrate 210 by the first release film 230 , and a first circuit layer 120 is formed on a surface of the core layer 110 that is not adhered to the first insulating layer 140 .
- the first circuit layer 120 is formed by electroplating or metal deposition and then etching.
- a second insulating layer 160 is formed on the first circuit layer 120 , and a plurality of conductive columns 161 are formed in the second insulating layer 160 , and a wiring layer 170 is then formed on the second insulating layer 160 .
- the first circuit layer 120 is disposed between the second insulating layer 160 and the core layer 110
- the second insulating layer 160 is disposed between the wiring layer 170 and the first circuit layer 120 .
- the circuit board assembly 100 as shown in FIG. 1 A is formed, which has the effect of shielding the electromagnetic waves leaking from the electronic component 112 in all directions.
- the electronic component 112 is not disposed during the step of filling the conductive materials 1142 shown in FIG. 2 E , but the second dielectric pattern layer 240 ′′ is firstly stacked on the first dielectric pattern layer 220 ′′, and the conductive materials 1142 are bonded.
- a first shielding ring wall 313 is formed on an inner sidewall of an accommodating space 311
- a second circuit layer 330 is formed on a core layer 310 .
- the method of forming the first shielding ring wall 313 and the second circuit layer 330 includes, but is not limited to, a deposition process, an electroplating process, a coating process, or a combination thereof.
- the graphene layer 315 is formed on a substrate 410 , an inner side of the first shielding ring wall 313 , and the second circuit layer 330 .
- the graphene layer 315 is continuous and integrally formed.
- the graphene layer 315 is embedded in the core layer 310 and on the second circuit layer 330 .
- the electronic component 312 is disposed in the graphene layer 315 .
- the graphene layer 315 covers the electronic component 312 and electrically separates the electronic component 312 and the first shielding ring wall 313 .
- FIG. 4 D after the graphene layer 315 is formed and the electronic component 312 is disposed, subsequent steps are the same as those in FIG. 2 G to FIG. 2 J , and a first insulating layer 340 , a shielding column 341 , a conductive column 342 , a build-up circuit layer 343 , a shielding layer 350 , a first circuit layer 320 , a second insulating layer 360 , a conductive column 361 and a wiring layer 370 are formed.
- the circuit board assembly 300 as shown in FIG. 3 A is formed, which has the effect of shielding the electromagnetic waves leaking from the electronic component 312 in all directions, and has the effect of enhancing the heat dissipation efficiency.
- FIGS. 6 A to 6 C are schematic cross-sectional views illustrating a method of manufacturing a circuit board assembly at various process stages according to still other embodiments of the present disclosure.
- the difference between this embodiment and the previously described embodiment is that a plurality of electronic components 512 are provided in this embodiment.
- a first dielectric pattern layer 630 and a first release film 620 a are formed on one side of a first substrate 610
- a second dielectric pattern layer 640 and a second release film 620 b are formed on another side thereof, in which the first release film 620 a is disposed between the first dielectric pattern layer 630 and the first substrate 610
- the second release film 620 b is disposed between the second dielectric pattern layer 640 and the first substrate 610 .
- a third dielectric pattern layer 650 and a third release film 620 c are formed on one side of a second substrate 610 ′, and a fourth dielectric pattern layer 660 and a fourth release film 620 d are formed on another side thereof, in which the third release film 620 c is disposed between the third dielectric pattern layer 650 and the second substrate 610 ′, and the fourth release film 620 d is disposed between the fourth dielectric pattern layer 660 and the second substrate 610 ′.
- the electronic components 512 are disposed in a plurality of recesses of the third dielectric pattern layer 650 .
- the first dielectric pattern layer 630 and the second dielectric pattern layer 640 are peeled off sequentially by the first release film 620 a and the second release film 620 b , and the first dielectric pattern layer 630 and the second dielectric pattern layer 640 are sequentially stacked on the third dielectric pattern layer 650 and the electronic elements 512 .
- the first dielectric pattern layer 630 , the second dielectric pattern layer 640 , and the third dielectric pattern layer 650 are adhered to each other.
- another electronic element 512 is further disposed on the stacked first dielectric pattern layer 630 and in the second dielectric pattern layer 640 .
- the fourth dielectric pattern layer 660 can be further adjusted to make an upper surface of the core layer 510 be flat.
- the first insulating layer 540 , the shielding column 541 , the conductive column 542 , the build-up circuit layer 543 , the shielding layer 550 , the first circuit layer 520 , the second insulating layer 560 , the conductive column 561 and the wiring layer 570 are formed.
- the circuit board assembly 500 as shown in FIG. 5 A is formed, which has the effect of shielding the electromagnetic waves leaking from the electronic components 512 in all directions.
- the circuit board assembly of the present disclosure is provided with the first shielding ring wall around each of the electronic components, which preliminarily shields the electromagnetic waves.
- the second shielding ring wall is used to shield the electromagnetic waves leaking from the electronic components due to the difference in size.
- the first shielding column and/or the second shielding column are further used to shield the electromagnetic field generated by the conductive columns.
- the shielding layer is disposed to enhance the overall shielding effect.
- the present disclosure can also provide the graphene layer to increase the heat dissipation effect of the circuit board assembly. Accordingly, the present disclosure can effectively avoid the electromagnetic interference between the electronic components.
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Abstract
The disclosure provides a circuit board assembly, which includes a core layer, an electronic component, a first shielding ring wall, a second shielding ring wall, a first circuit layer, a second circuit layer, a first insulating layer and a plurality of shielding columns. The core layer has an accommodating space, in which the accommodating space has an inner sidewall. The electronic component is disposed in the accommodating space. The first shielding ring wall is disposed in the accommodating space and covers the inner sidewall, in which the first shielding ring wall surrounds the electronic component and is not in contact with the electronic component. The second shielding ring wall is disposed in the core layer and surrounds the first shielding ring wall. The core layer is disposed between the first circuit layer and the second circuit layer. The shielding columns are disposed in the first insulating layer.
Description
- The present application is a Divisional Application of the U.S. application Ser. No. 17/565,538, filed Dec. 30, 2021, which claims priority to China Application Serial Number 202111438219.6, filed on Nov. 30, 2021, all of which are herein incorporated by reference in their entireties.
- This disclosure relates to a circuit board assembly and a manufacturing method thereof, in particular to a circuit board assembly and a manufacturing method thereof that can effectively shield electromagnetic interference between electronic components.
- A current chip package, such as System in a Package (SiP), includes a plurality of electronic components. These electronic components generate electromagnetic waves when these electronic components are in operation, and the electromagnetic waves interfere with these electronic components, thereby affecting the operation of these electronic components. In this way, an electronic device equipped with this chip package, such as a smartphone or a tablet, may operate abnormally or even malfunction. Therefore, reducing or avoiding the interference of the electromagnetic waves on the electronic components in the chip package is an issue worthy of discussion.
- A purpose of the present disclosure is to provide a circuit board assembly, which includes a core layer, at least one electronic component, at least one first shielding ring wall, at least one second shielding ring wall, a first circuit layer, a second circuit layer, a first insulating layer and a plurality of shielding columns. The core layer has an accommodating space, in which the accommodating space has an inner sidewall. The electronic component is disposed in the accommodating space. The first shielding ring wall is disposed in the accommodating space and covers the inner sidewall, in which the first shielding ring wall surrounds the electronic component and is not in contact with the electronic component. The second shielding ring wall is disposed in the core layer and surrounds the first shielding ring wall. The core layer is disposed between the first circuit layer and the second circuit layer. The second circuit layer is disposed between the first insulating layer and the core layer. The shielding columns are disposed in the first insulating layer.
- In some embodiments, the shielding columns are electrically connected to the first shielding ring wall.
- In some embodiments, the circuit board assembly further includes a shielding layer, in which the shielding layer is disposed beneath the first insulating layer, and the first insulating layer is disposed between the shielding layer and the core layer, and the shielding columns extend to the core layer and the shielding layer.
- In some embodiments, the second shielding ring wall includes two metal layers and a conductive material, and the metal layers are arranged in concentric rings, and one of the metal layers surrounds the other of the metal layers and the conductive material.
- In some embodiments, a surface of the electronic component, one end of the conductive material, and a surface of the core layer are coplanar.
- In some embodiments, the height of the second shielding ring wall is greater than the thickness of the at least one electronic component.
- In some embodiments, the circuit board assembly further includes a second insulating layer, in which the first circuit layer is disposed between the second insulating layer and the core layer.
- In some embodiments, a material of the core layer is a photosensitive dielectric material.
- In some embodiments, the circuit board assembly further includes a graphene layer, in which the graphene layer is disposed in the accommodating space and surrounds the electronic component, and the graphene layer is continuously distributed around the electronic component.
- In some embodiments, the electronic component is electrically isolated from the first shielding ring wall, the second shielding ring wall, and the shielding columns.
- The present disclosure also provides a method of manufacturing a circuit board assembly, which includes providing a substrate. A first dielectric layer and a first release film are formed on the substrate, in which first release film is disposed between the first dielectric layer and the substrate. The first dielectric layer is patterned to form a first dielectric pattern layer, in which the first dielectric pattern layer has at least one first recess and at least one first groove. A first metal layer is formed on the first dielectric pattern layer, in which the first metal layer covers an upper surface of the first dielectric pattern layer, a sidewall of the first recess and a sidewall of the first groove. At least one electronic component is disposed in the at least one first recess, in which the electronic component is disposed on the substrate. A second dielectric pattern layer is disposed on the first dielectric pattern layer and the electronic component after disposing the electronic component in the at least one first recess to form a core layer including the first dielectric pattern layer and the second dielectric pattern layer. At least one circuit layer is formed on the core layer. At least one insulating layer is formed on the circuit layer. A plurality of shielding columns are formed in the insulating layer.
- In some embodiments, forming the second dielectric pattern layer includes: while forming the first dielectric layer and the first release film, forming a second dielectric layer and a second release film on another side of the substrate opposite to the first dielectric layer, in which the second release film is disposed between the second dielectric layer and the substrate. The second dielectric layer is patterned to form the second dielectric pattern layer, in which the second dielectric pattern layer has at least one second recess and at least one second groove. A second metal layer is formed on the second dielectric pattern layer, in which the second metal layer covers an upper surface of the second dielectric pattern layer, a sidewall of the second recess and a sidewall of the second groove.
- In some embodiments, the method of manufacturing the circuit board assembly further includes filling a plurality of conductive materials in the first groove and the second groove during disposing the electronic component in the at least one first recess, in which the conductive materials protrude from a surface of the first dielectric pattern layer and a surface of the second dielectric pattern layer.
- In some embodiments, the method of manufacturing the circuit board assembly further includes after respectively forming the first metal layer and the second metal layer on the first dielectric pattern layer and the second electrical pattern layer, and before disposing the electronic element in the at least one first recess, thinning the first metal layer, the second metal layer, the first dielectric pattern layer, and the second dielectric pattern layer to expose an upper surface of the first dielectric pattern layer and an upper surface of the second dielectric pattern layer.
- In some embodiments, patterning the first dielectric layer and the second dielectric layer comprises an exposure process and a development process.
- In some embodiments, disposing the second dielectric pattern layer on the first dielectric pattern layer and the electronic component, the second dielectric pattern layer and the first dielectric pattern layer are adhered to each other.
- In some embodiments, in the step of disposing the second dielectric pattern layer on the first dielectric pattern layer and the electronic component, the substrate, the first dielectric pattern layer, the second dielectric pattern layer, the electronic component and the conductive materials are in a working environment with a temperature in a range from 25° C. to 180° C.
- In some embodiments, the method of manufacturing the circuit board assembly further includes removing the substrate after forming the conductive columns in the insulating layer. At least one build-up circuit layer is formed on the core layer. At least one build-up insulating layer is formed on the build-up circuit layer.
- In some embodiments, portions of the conductive columns are disposed in the insulating layer along the first metal layer and the second metal layer adjacent to the electronic component.
- Aspects of the present disclosure are best understood from the following detailed description when read with the accompanying figures. It is noted that, in accordance with the standard practice in the industry, various features are not drawn to scale. In fact, the dimensions of the various features may be arbitrarily increased or reduced for clarity of discussion.
-
FIG. 1A is a schematic cross-sectional view of a circuit board - assembly according to some embodiments of the present disclosure.
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FIG. 1B is a schematic top view of a core layer, an electronic component, a first shielding ring wall, a second shielding ring wall, and a shielding column according toFIG. 1A . -
FIGS. 2A to 2J are schematic cross-sectional views illustrating a method of manufacturing a circuit board assembly at various process stages according to some embodiments of the present disclosure. -
FIG. 3A is a schematic cross-sectional view of a circuit board assembly according to other embodiments of the present disclosure. -
FIG. 3B is a schematic top view of a core layer, an electronic component, a first shielding ring wall, a second shielding ring wall, a shielding column, and a graphene layer according toFIG. 3A . -
FIGS. 4A to 4D are schematic cross-sectional views illustrating a method of manufacturing a circuit board assembly at various process stages according to other embodiments of the present disclosure. -
FIG. 5A is a schematic cross-sectional view of a circuit board assembly according to still other embodiments of the present disclosure. -
FIG. 5B is a schematic top view of a core layer, an electronic component, a first shielding ring wall, a second shielding ring wall, and a shielding column according toFIG. 5A . -
FIGS. 6A to 6C are schematic cross-sectional views illustrating a method of manufacturing a circuit board assembly at various process stages according to still other embodiments of the present disclosure. -
FIG. 7 is a schematic cross-sectional view of a circuit board assembly according to still other embodiments of the present disclosure. - The following disclosure provides many different embodiments or examples, for implementing different features of the provided subject matter. Specific examples of elements, values, operations, materials, configurations and the like are described below to simplify the present disclosure. These are, of course, merely examples and are not intended to be limiting. Other elements, values, operations, materials, configurations and the like are also considered. For example, in the following description, forming a first feature on a second feature may include an embodiment in which the first and second features are formed in direct contact, and may also include an embodiment in which an additional feature may be formed between the first and second features, such that the first and second features are not in direct contact. In addition, the present disclosure may repeat reference numerals and/or letters in the various examples. This repetition does not indicate a relationship between the various embodiments and/or configurations discussed.
- In addition, spatially relative terms, such as “beneath”, “below”, “lower”, “over”, “higher”, etc. may be used herein for ease of description to describe one element or feature's relationship to another element(s) or feature(s) as illustrated in the figures. The spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. The device may be otherwise oriented (rotated 90 degrees or at other orientations), and the spatially relative description used herein may likewise be interpreted accordingly.
- Generally, the circuit board assembly of the present disclosure can be used in any electronic product or electronic device, and can form a highly integrated circuit board with various components such as radio frequency, digital, optoelectronics, etc. using system in a package, and can avoid electromagnetic wave leakage or interference between the various components.
- First, please refer to
FIG. 1A .FIG. 1A is a schematic cross-sectional view of a circuit board assembly according to some embodiments of the present disclosure. In some embodiments of the present disclosure, thecircuit board assembly 100 includes acore layer 110, at least oneelectronic component 112, at least one firstshielding ring wall 113, at least one secondshielding ring wall 114, afirst circuit layer 120, asecond circuit layer 130, a first insulatinglayer 140, and a plurality of shieldingcolumns 141. Thecore layer 110 has at least oneaccommodating space 111, in which theaccommodating space 111 has an inner sidewall. Please note that the inner sidewall is not specially marked in order to avoid too much confusion in the figure. Theelectronic component 112 is disposed in theaccommodating space 111. The firstshielding ring wall 113 is disposed in theaccommodating space 111 and covers the inner sidewall, in which the firstshielding ring wall 113 surrounds theelectronic component 112, and the firstshielding ring wall 113 is not in contact with theelectronic component 112. The secondshielding ring wall 114 is disposed in thecore layer 110 and surrounds the firstshielding ring wall 113. In one embodiment, a material of thecore layer 110 is a photosensitive dielectric material. In some embodiments, a material of thecore layer 110 includes, but is not limited to, a photosensitive dielectric material such as photosensitive polyimide (PSPI), photoimageable coverlay (PIC), or a combination thereof. Specifically, the firstshielding ring wall 113 is not in contact with theelectronic component 112 means that there is an annular space between the firstshielding ring wall 113 and theelectronic component 112 to electrically separate the firstshielding ring wall 113 and theelectronic component 112. In addition, the use of the photosensitive dielectric material can support components having different sizes and form a corresponding chamber or an accommodating space. In the case of a given size space, more components may be stacked in a vertical direction, and thus the integration could be higher. - The
core layer 110 may have more than oneelectronic component 112, and when there are a plurality ofelectronic components 112, each of theelectronic components 112 is surrounded by a corresponding first shieldingring wall 113. It should be noted thatFIG. 1A shows oneelectronic component 112 and one firstshielding ring wall 113, which are only exemplary, and it is not limited thereto. Specifically, the firstshielding ring wall 113 preliminarily shields or blocks electromagnetic waves leaking from theelectronic component 112 to remove most of the electromagnetic wave interference. In one embodiment, theelectronic component 112 may include, but is not limited to, an active component, a passive component, a high-frequency component, a digital component, an optoelectronic component, or a combination thereof. In one embodiment, a material of the firstshielding ring wall 113 includes, but is not limited to, a conductive metal such as copper, gold, silver, nickel, a conductive alloy, or a combination thereof. - Please refer to
FIG. 1B first.FIG. 1B is a schematic top view of a core layer, an electronic component, a first shielding ring wall, a second shielding ring wall, and a shielding column according toFIG. 1A . In some embodiments, the secondshielding ring wall 114 is disposed in thecore layer 110 and surrounds the firstshielding ring wall 113. The relationship between the firstshielding ring wall 113 and the secondshielding ring wall 114 can be clearly seen fromFIG. 1B . Specifically, the secondshielding ring wall 114 is not directly in contact with the firstshielding ring wall 113, and the secondshielding ring wall 114 and the firstshielding ring wall 113 are substantially concentrically disposed. - Please continue to refer to
FIG. 1A . In some embodiments, the secondshielding ring wall 114 includes twometal layers 1141 and aconductive material 1142. The twometal layers 1141 are arranged in concentric rings, and one of themetal layers 1141 surrounds the other of themetal layers 1141 and theconductive material 1142. Specifically, two ends of the secondshielding ring wall 114 extend to upper and lower surfaces of thecore layer 110. The secondshielding ring wall 114 can shield or block electromagnetic waves leaking due to a gap difference between the components when there is a size difference between theelectronic components 112. Specifically, the gap differences are caused by the portions of vertical embedded components on which copper is not deposited or plated. Moreover, for a circuit board, the numbers and types of the embedded components in each position are different, and the gap differences are also different, but each of the gap differences is less than the overall thickness of the circuit board. As such, with the arrangement of the firstshielding ring wall 113, most of the electromagnetic waves leaking from the top, bottom, left, and right of theelectronic component 112 are almost shielded. In addition, themetal layers 1141 in the secondshielding ring wall 114 can increase rigidity of thecircuit board assembly 100. In one embodiment, a material of the twometal layers 1141 of the secondshielding ring wall 114 includes, but is not limited to, a conductive metal such as copper, gold, silver, nickel, a conductive alloy, or a combination thereof. In one embodiment, aconductive material 1142 of the secondshielding ring wall 114 includes, but is not limited to, copper, gold, silver, nickel, or a metal alloy of a combination thereof. - Please continue to refer to
FIG. 1A , thecore layer 110 is disposed between thefirst circuit layer 120 and thesecond circuit layer 130. Specifically, theelectronic component 112 in thecore layer 110 should be electrically connected to outside. Therefore, thefirst circuit layer 120 and thesecond circuit layer 130 are disposed on the upper and lower surfaces of thecore layer 110, and thus theelectronic component 112 can be electrically connected to the outside. In addition, thesecond circuit layer 130 is disposed between the first insulatinglayer 140 and thecore layer 110. Theshielding column 141 is provided in the first insulatinglayer 140. In addition, a plurality ofconductive columns 142 are also disposed in the first insulatinglayer 140, and theconductive columns 142 are electrically connected to theelectronic component 112. In one embodiment, theshielding column 141 is electrically connected to the firstshielding ring wall 113 and extends to upper and lower surfaces of the first insulatinglayer 140. Furthermore, the shieldingcolumns 141 surround theconductive columns 142. - Referring to
FIG. 1B at the same time, the shieldingcolumns 141 are arranged along the firstshielding ring wall 113. As such, when theconductive columns 142 beneath theelectronic component 112 as lead-through portions have current flowing and generate an electromagnetic field, theshielding column 141 can shield the electromagnetic field generated by the current. However, it should be noted thatFIG. 1B shows eight shieldingcolumns 141, which are only exemplary, and it is not limited thereto. More orless shielding columns 141 should be included in the scope of the present disclosure. At the same time, theshielding column 141 is disposed in a column shape, which is different from the firstshielding ring wall 113 and the secondshielding ring wall 114, so that theconductive column 142 can further circulate with an external circuit. In some embodiments, a material of the shieldingcolumns 141 and a material of theconductive columns 142 include, but are not limited to, a conductive metal such as copper, gold, silver, nickel, a conductive alloy, or a combination thereof. - In some embodiments, the
electronic component 112 is electrically isolated from the firstshielding ring wall 113, the secondshielding ring wall 114, and theshielding column 141. As such, the firstshielding ring wall 113, the secondshielding ring wall 114, and theshielding column 141 will not affect the electrical flow or function between theelectronic component 112 and the external circuit. - In some embodiments, the
circuit board assembly 100 further includes ashielding layer 150, in which theshielding layer 150 is disposed beneath the first insulatinglayer 140, and the first insulatinglayer 140 is disposed between theshielding layer 150 and thecore layer 110, and theshielding column 141 extends to thecore layer 110 and theshielding layer 150. Specifically, theshielding layer 150 is disposed on a surface of the first insulatinglayer 140 opposite to thecore layer 110, and theshielding layer 150 is perpendicular to a center line of theconductive column 142, which can enhance the shielding performance of the electromagnetic field. In one embodiment, theshielding layer 150 may not be provided, and a thick copper layer may be used instead, so that heat dissipation efficiency of thecircuit board assembly 100 can be increased. In one embodiment, metal wiring may also be used to replace theshielding layer 150, so that theelectronic component 112 can be further electrically connected with more electronic devices. - In addition, in one embodiment, the first insulating
layer 140 may also have a multi-layer structure, and the layers are connected by a build-up circuit layer 143 and theconductive column 142. - Still referring to
FIG. 1A , a surface of theelectronic component 112, one end of the secondshielding ring wall 114, and a surface of thecore layer 110 are coplanar. Specifically, the secondshielding ring wall 114 extends to the upper and lower surfaces of thecore layer 110, so that the electromagnetic waves leaking from theelectronic component 112 due to the gap difference can be completely shielded. - In one embodiment, the
circuit board assembly 100 further includes a second insulatinglayer 160, awiring layer 170, and a plurality ofconductive columns 161, and thefirst circuit layer 120 is disposed between the second insulatinglayer 160 and thecore layer 110. Thewiring layer 170 is disposed on the second insulatinglayer 160, and theconductive column 161 extends to thecore layer 110 and thewiring layer 170. - It should be noted that a manufacturing method and a process flow of the
circuit board assembly 100 as shown inFIG. 1A will be detailed in subsequent paragraphs. - Please refer to
FIG. 3A .FIG. 3A is a schematic cross-sectional view of a circuit board assembly according to other embodiments of the present disclosure. As shown inFIG. 3A , the biggest difference between this embodiment and thecircuit board assembly 100 ofFIG. 1A is that acore layer 310 of acircuit board assembly 300 of this embodiment further includes agraphene layer 315. It should be particularly noted that an overall structure of thecircuit board assembly 300 inFIG. 3A is similar to that of thecircuit board assembly 100 inFIG. 1A . Thecircuit board assembly 300 includes thecore layer 310, at least oneelectronic component 312, and at least one firstshielding ring wall 313, at least one secondshielding ring wall 314, afirst circuit layer 320, asecond circuit layer 330, a first insulatinglayer 340, and a plurality of shieldingcolumns 341. Thecore layer 310 has at least oneaccommodating space 311, in which theaccommodating space 311 has an inner sidewall. Theelectronic component 312 is disposed in theaccommodating space 311. The firstshielding ring wall 313 is disposed in theaccommodating space 311 and covers the inner sidewall, in which the firstshielding ring wall 313 surrounds theelectronic component 312, and the firstshielding ring wall 313 is not in contact with theelectronic component 312. The secondshielding ring wall 314 is disposed in thecore layer 310 and surrounds the firstshielding ring wall 313. The secondshielding ring wall 314 includes twometal layers 3141 and aconductive material 3142. The twometal layers 3141 are arranged in concentric rings, and one of themetal layers 3141 surrounds the other of themetal layers 3141 and theconductive material 3142. Thecore layer 310 is disposed between thefirst circuit layer 320 and thesecond circuit layer 330. Thesecond circuit layer 330 is disposed between the first insulatinglayer 340 and thecore layer 310. Theshielding column 341 is disposed in the first insulatinglayer 340. In addition, a plurality ofconductive columns 342 are also disposed in the first insulatinglayer 340, and theconductive columns 342 are electrically connected to theelectronic component 312. The shieldingcolumns 341 are arranged along the firstshielding ring wall 313. Thecircuit board assembly 300 further includes ashielding layer 350, in which theshielding layer 350 is disposed beneath the first insulatinglayer 340, and the first insulatinglayer 340 is disposed between theshielding layer 350 and thecore layer 310, and theshielding column 341 extends to thecore layer 310 andshielding layer 350. Thecircuit board assembly 300 further includes a second insulatinglayer 360, awiring layer 370 and a plurality ofconductive columns 361, and thefirst circuit layer 320 is disposed between the second insulatinglayer 360 and thecore layer 310. Thewiring layer 370 is disposed on the second insulatinglayer 360, and theconductive columns 361 extend to thecore layer 310 and thewiring layer 370. - Materials of all the components in the
circuit board assembly 300 described above are the same as those of thecircuit board assembly 100 inFIG. 1A , and will not be repeated here. - In some embodiments, the
graphene layer 315 is disposed in theaccommodating space 311 and surrounds theelectronic component 312, and thegraphene layer 315 is continuously distributed around theelectronic component 312. Specifically, thegraphene layer 315 is disposed between theelectronic element 312 and the firstshielding ring wall 313, between theelectronic element 312 and thefirst circuit layer 320, and between thesecond circuit layer 330 and the first insulatinglayer 340, and thegraphene layer 315 is a continuous structure. When thegraphene layer 315 is disposed in theaccommodating space 311, thegraphene layer 315 can improve heat dissipation efficiency of thecircuit board assembly 300. - Please refer to
FIG. 3B first.FIG. 3B is a schematic top view of the core layer, the electronic component, the first shielding ring wall, the second shielding ring wall, the shielding column, and the graphene layer according toFIG. 3A . It can be clearly understood fromFIG. 3B that thegraphene layer 315 is disposed between the firstshielding ring wall 313 and theelectronic component 312 and covers theelectronic component 312, so that the heat dissipation efficiency of theelectronic component 312 can be improved. - It should be noted that a manufacturing method and a process flow of the
circuit board assembly 300 as shown inFIG. 3A will be detailed in subsequent paragraphs. - Please refer to
FIG. 5A .FIG. 5A is a schematic cross-sectional view of a circuit board assembly according to still other embodiments of the present disclosure. Specifically,FIG. 5A shows acircuit board assembly 500 having a plurality ofelectronic components 512. - The
circuit board assembly 500, acore layer 510, theelectronic components 512, a firstshielding ring wall 513, a secondshielding ring wall 514, ametal layer 5141, aconductive material 5142, afirst circuit layer 520, asecond circuit layer 530, a first insulatinglayer 540, ashielding column 541, aconductive column 542, a build-up circuit layer 543, a shielding layer 550 (or a thick copper layer, a metal wiring), a second insulatinglayer 560, aconductive column 561 and awiring layer 570 shown inFIG. 5A , a structural feature and a material of each of the components are the same as thecircuit board assemblies FIG. 1A andFIG. 3A , so these components will not be repeated here. - Specifically,
FIG. 5A shows threeelectronic components 512. Differentelectronic components 512 in the vertical direction are separated by a photosensitive dielectric material. Therefore, there will be a gap difference between theelectronic components 512, and electromagnetic waves will leak out. Accordingly, the secondshielding ring wall 514 can shield and block the electromagnetic waves leaking out, and prevent theelectronic components 512 from interfering with each other. - Please refer to
FIG. 5B .FIG. 5B is a schematic top view of the core layer, the electronic component, the first shielding ring wall, the second shielding ring wall, and the shielding column according toFIG. 5A . It can also be found fromFIG. 5B that the firstshielding ring wall 513 is not in contact with theelectronic component 512, so that the electrical isolation between the firstshielding ring wall 513 and theelectronic component 512 is maintained. - It should be noted that a manufacturing method and a process flow of the
circuit board assembly 500 as shown inFIG. 5A will be detailed in subsequent paragraphs. - Please refer to
FIG. 7 .FIG. 7 is a schematic cross-sectional view of a circuit board assembly according to still other embodiments of the present disclosure. Acircuit board assembly 700, acore layer 710, anelectronic component 712, a firstshielding ring wall 713, a secondshielding ring wall 714, ametal layer 7141, aconductive material 7142, afirst circuit layer 720, asecond circuit layer 730, a first insulatinglayer 740, ashielding column 741, aconductive column 742, a build-up circuit layer 743, a shielding layer 750 (or a thick copper layer, a metal wiring), a second insulatinglayer 760, aconductive column 761 and awiring layer 770 shown inFIG. 7 , a structural feature and a material of each of the components are the same as thecircuit board assemblies FIG. 1A andFIG. 3A , so these components will not be repeated here. - Specifically,
FIG. 7 shows twoelectronic components 712, and an upper surface of one of theelectronic components 712 is not in contact with an upper surface of thecore layer 710. In one embodiment, the height of the secondshielding ring wall 714 is greater than the thickness of theelectronic component 712 which is not in contact with the upper surface of thecore layer 710. Accordingly, the secondshielding ring wall 714 can prevent the electromagnetic waves leaking from theelectronic component 712 having the gap difference, and keep theelectronic components 712 from interfering with each other. - Hereinafter, the manufacturing method and the process flow of the
circuit board assembly 100 of the embodiment shown inFIG. 1A will be described in detail. - Please refer to
FIGS. 2A to 2J .FIGS. 2A to 2J are schematic cross-sectional views illustrating a method of manufacturing a circuit board assembly at various process stages according to some embodiments of the present disclosure. Firstly, as shown inFIG. 2A , asubstrate 210 is provided, and a firstdielectric layer 220 and afirst release film 230, and asecond dielectric layer 240 and asecond release film 250 are formed on both sides (i.e., upper and lower surfaces) of thesubstrate 210, respectively. Thefirst release film 230 is disposed between thefirst dielectric layer 220 and thesubstrate 210, and thesecond release film 250 is disposed between thesecond dielectric layer 240 and thesubstrate 210. Specifically, thefirst release film 230 and thesecond release film 250 are provided to facilitate separation of thefirst dielectric layer 220 and thesecond dielectric layer 240 in subsequent processes. In one embodiment, a material of thefirst dielectric layer 220 and a material of thesecond dielectric layer 240 include, but are not limited to, a photosensitive dielectric material such as photosensitive polyimide (PSPI), photoimageable coverlay (PIC) or a combination thereof. - Referring to
FIG. 2B , thefirst dielectric layer 220 and thesecond dielectric layer 240 are patterned to form a firstdielectric pattern layer 220′ and a seconddielectric pattern layer 240′. The firstdielectric pattern layer 220′ has afirst recess 221 and afirst groove 222, and the seconddielectric pattern layer 240′ has asecond recess 241 and asecond groove 242. Specifically, the firstdielectric pattern layer 220′ and the seconddielectric pattern layer 240′ are used as structural package components. In one embodiment, a method of patterning thefirst dielectric layer 220 and thesecond dielectric layer 240 includes, but is not limited to, an exposure process and a development process. - As shown in
FIG. 2C , afirst metal layer 260 is formed on the firstdielectric pattern layer 220′, in which thefirst metal layer 260 covers an upper surface of the firstdielectric pattern layer 220′, a sidewall of thefirst recess 221 and a sidewall of thefirst groove 222. In addition, asecond metal layer 270 is formed on the seconddielectric pattern layer 240′, in which thesecond metal layer 270 covers an upper surface of the seconddielectric pattern layer 240′, a sidewall of thesecond recess 241 and a sidewall of thesecond groove 242. In one embodiment, a method of forming thefirst metal layer 260 and thesecond metal layer 270 includes, but is not limited to, a deposition process, an electroplating process, a coating process, or a combination thereof. In one embodiment, a material for forming thefirst metal layer 260 and a material for forming thesecond metal layer 270 include, but are not limited to, a conductive metal such as copper, gold, silver, nickel, a conductive alloy, or a combination thereof. - Referring to
FIG. 2D , thefirst metal layer 260, thesecond metal layer 270, the firstdielectric pattern layer 220′, and the seconddielectric pattern layer 240′ are thinned to form a firstdielectric pattern layer 220″, a seconddielectric pattern layer 240″, a firstmetal pattern layer 260′ and a secondmetal pattern layer 270′ exposing upper surfaces thereof. In one embodiment, a method of thinning thefirst metal layer 260, thesecond metal layer 270, the firstdielectric pattern layer 220′, and the seconddielectric pattern layer 240′ includes, but is not limited to, an etching process, an exposure process and a development process. - As shown in
FIG. 2E , anelectronic component 112 is disposed in thefirst recess 221, and theelectronic component 112 is located on thesubstrate 210. It should be noted that theelectronic component 112 is not in contact with themetal pattern layer 260′ on the sidewall of thefirst recess 221, and thus to prevent theelectronic element 112 from being electrically connected to the firstmetal pattern layer 260′. At the same time, a plurality ofconductive materials 1142 are filled in thefirst groove 222 and thesecond groove 242. It should be noted that theconductive materials 1142 protrude from a surface of the firstdielectric pattern layer 220″ and a surface of the seconddielectric pattern layer 240″. Accordingly, in a subsequent stacking process, the firstdielectric pattern layer 220″ and the seconddielectric pattern layer 240″ can be completely bonded. - Please refer to
FIG. 2F , the seconddielectric pattern layer 240″ is separated from thesubstrate 210 by thesecond release film 250, and is further stacked on the firstdielectric pattern layer 220″ and theelectronic element 112. As such, the firstmetal pattern layer 260′ and the secondmetal pattern layer 270′ are bonded, and theconductive materials 1142 are also bonded to each other, and thus forming a firstshielding ring wall 113 and a secondshielding ring wall 114. Accordingly, thecore layer 110 shown inFIG. 1A is formed. When the seconddielectric pattern layer 240″ is stacked on the firstdielectric pattern layer 220″ and theelectronic element 112, the firstdielectric pattern layer 220″ and the seconddielectric pattern layer 240″ are adhered to each other. Next, asecond circuit layer 130 is formed on thecore layer 110. Specifically, thesecond circuit layer 130 is formed by electroplating or metal deposition and then etching. - In one embodiment, during the process of adhering the first
dielectric pattern layer 220″ and the seconddielectric pattern layer 240″ to each other, a temperature of a working environment is in a range from 25° C. to 180° C., and thus can prevent thecore layer 110 from expanding and deforming due to heating or overheating, which leads to damage. - Please refer to
FIG. 2G , a first insulatinglayer 140 is fabricated, and ashielding layer 150 is formed on a surface thereof (a thick copper layer or a metal wiring can also be formed), and a build-up circuit layer 143 is formed in the first insulatinglayer 140. In one embodiment, a method of forming the shielding layer 150 (or the thick copper layer, the metal wiring) includes, but is not limited to, a deposition process, an electroplating process, a coating process, or a combination thereof. - As shown in
FIG. 2H , a plurality of shieldingcolumns 141 and a plurality ofconductive columns 142 are formed in the first insulatinglayer 140, and the shieldingcolumns 141 extend to upper and lower surfaces of the first insulatinglayer 140, and theconductive columns 142 are surrounded by the shieldingcolumns 141. In one embodiment, a method of forming the shieldingcolumns 141 and theconductive columns 142 includes, but is not limited to, a drilling process and a deposition process. - Referring to
FIG. 2I , the first insulatinglayer 140 shown inFIG. 2H is stacked on thecore layer 110. It should be noted that this step is to adhere a surface of the first insulatinglayer 140 that theshielding layer 150 is not disposed and thecore layer 110 to each other. As such, the shieldingcolumns 141 are electrically connected to the firstshielding ring wall 113, and theconductive columns 142 are electrically connected to theelectronic component 112. - Then referring to
FIG. 2J , thecore layer 110 is separated from thesubstrate 210 by thefirst release film 230, and afirst circuit layer 120 is formed on a surface of thecore layer 110 that is not adhered to the first insulatinglayer 140. Specifically, thefirst circuit layer 120 is formed by electroplating or metal deposition and then etching. Next, a second insulatinglayer 160 is formed on thefirst circuit layer 120, and a plurality ofconductive columns 161 are formed in the second insulatinglayer 160, and awiring layer 170 is then formed on the second insulatinglayer 160. Specifically, thefirst circuit layer 120 is disposed between the second insulatinglayer 160 and thecore layer 110, and the second insulatinglayer 160 is disposed between thewiring layer 170 and thefirst circuit layer 120. - So far, the
circuit board assembly 100 as shown inFIG. 1A is formed, which has the effect of shielding the electromagnetic waves leaking from theelectronic component 112 in all directions. - Next, the manufacturing method and the process flow of the
circuit board assembly 300 of the embodiment shown inFIG. 3A will be described in detail below. - First of all, it should be noted that in order to provide the
graphene layer 315 on thecore layer 310 in thecircuit board assembly 300, theelectronic component 112 is not disposed during the step of filling theconductive materials 1142 shown inFIG. 2E , but the seconddielectric pattern layer 240″ is firstly stacked on the firstdielectric pattern layer 220″, and theconductive materials 1142 are bonded. - Referring to
FIG. 4A , a firstshielding ring wall 313 is formed on an inner sidewall of anaccommodating space 311, and asecond circuit layer 330 is formed on acore layer 310. The method of forming the firstshielding ring wall 313 and thesecond circuit layer 330 includes, but is not limited to, a deposition process, an electroplating process, a coating process, or a combination thereof. - Next, as shown in
FIG. 4B , thegraphene layer 315 is formed on asubstrate 410, an inner side of the firstshielding ring wall 313, and thesecond circuit layer 330. Thegraphene layer 315 is continuous and integrally formed. In one embodiment, thegraphene layer 315 is embedded in thecore layer 310 and on thesecond circuit layer 330. - Referring again to
FIG. 4C , theelectronic component 312 is disposed in thegraphene layer 315. Specifically, thegraphene layer 315 covers theelectronic component 312 and electrically separates theelectronic component 312 and the firstshielding ring wall 313. - Next, as shown in
FIG. 4D , after thegraphene layer 315 is formed and theelectronic component 312 is disposed, subsequent steps are the same as those inFIG. 2G toFIG. 2J , and a first insulatinglayer 340, ashielding column 341, aconductive column 342, a build-up circuit layer 343, ashielding layer 350, afirst circuit layer 320, a second insulatinglayer 360, aconductive column 361 and awiring layer 370 are formed. As such, thecircuit board assembly 300 as shown inFIG. 3A is formed, which has the effect of shielding the electromagnetic waves leaking from theelectronic component 312 in all directions, and has the effect of enhancing the heat dissipation efficiency. - Hereinafter, the manufacturing method and the process flow of the
circuit board assembly 500 of the embodiment shown inFIG. 5A will be described in detail. - Please refer to
FIGS. 6A to 6C .FIGS. 6A to 6C are schematic cross-sectional views illustrating a method of manufacturing a circuit board assembly at various process stages according to still other embodiments of the present disclosure. The difference between this embodiment and the previously described embodiment is that a plurality ofelectronic components 512 are provided in this embodiment. - First, as shown in
FIG. 6A , a firstdielectric pattern layer 630 and afirst release film 620 a are formed on one side of afirst substrate 610, and a seconddielectric pattern layer 640 and asecond release film 620 b are formed on another side thereof, in which thefirst release film 620 a is disposed between the firstdielectric pattern layer 630 and thefirst substrate 610, and thesecond release film 620 b is disposed between the seconddielectric pattern layer 640 and thefirst substrate 610. A thirddielectric pattern layer 650 and athird release film 620 c are formed on one side of asecond substrate 610′, and a fourthdielectric pattern layer 660 and afourth release film 620 d are formed on another side thereof, in which thethird release film 620 c is disposed between the thirddielectric pattern layer 650 and thesecond substrate 610′, and thefourth release film 620 d is disposed between the fourthdielectric pattern layer 660 and thesecond substrate 610′. In addition, theelectronic components 512 are disposed in a plurality of recesses of the thirddielectric pattern layer 650. - Next, as shown in
FIG. 6B , the firstdielectric pattern layer 630 and the seconddielectric pattern layer 640 are peeled off sequentially by thefirst release film 620 a and thesecond release film 620 b, and the firstdielectric pattern layer 630 and the seconddielectric pattern layer 640 are sequentially stacked on the thirddielectric pattern layer 650 and theelectronic elements 512. The firstdielectric pattern layer 630, the seconddielectric pattern layer 640, and the thirddielectric pattern layer 650 are adhered to each other. In addition, anotherelectronic element 512 is further disposed on the stacked firstdielectric pattern layer 630 and in the seconddielectric pattern layer 640. When upper surfaces of theelectronic components 512 cannot be coplanar with an upper surface of the seconddielectric pattern layer 640, the fourthdielectric pattern layer 660 can be further adjusted to make an upper surface of thecore layer 510 be flat. - As shown in
FIG. 6C , subsequent steps are the same as those inFIGS. 2G to 2J . Accordingly, the first insulatinglayer 540, theshielding column 541, theconductive column 542, the build-up circuit layer 543, theshielding layer 550, thefirst circuit layer 520, the second insulatinglayer 560, theconductive column 561 and thewiring layer 570 are formed. As such, thecircuit board assembly 500 as shown inFIG. 5A is formed, which has the effect of shielding the electromagnetic waves leaking from theelectronic components 512 in all directions. - In summary, the circuit board assembly of the present disclosure is provided with the first shielding ring wall around each of the electronic components, which preliminarily shields the electromagnetic waves. Next, the second shielding ring wall is used to shield the electromagnetic waves leaking from the electronic components due to the difference in size. The first shielding column and/or the second shielding column are further used to shield the electromagnetic field generated by the conductive columns. Next, the shielding layer is disposed to enhance the overall shielding effect. In addition, the present disclosure can also provide the graphene layer to increase the heat dissipation effect of the circuit board assembly. Accordingly, the present disclosure can effectively avoid the electromagnetic interference between the electronic components.
- The foregoing outlines features of several embodiments so that those skilled in the art may better understand various aspects of the present disclosure. Those skilled in the art should appreciate that they may readily use the present disclosure as a basis for designing or modifying other processes and structures for carrying out the same purposes and/or achieving the same advantages of the embodiments introduced herein. Those skilled in the art should also realize that such equivalent constructions do not depart from the spirit and scope of the present disclosure, and that they may make various changes, substitutions, and alterations herein without departing from the spirit and scope of the present disclosure. The scope of protection of the present disclosure shall be subject to the scope of appended claims.
Claims (10)
1. A circuit board assembly, comprising:
a core layer having at least one accommodating space, wherein the at least one accommodating space has an inner sidewall;
at least one electronic component disposed in the at least one accommodating space;
at least one first shielding ring wall disposed in the at least one accommodating space and covering the inner sidewall, wherein the at least one first shielding ring wall surrounds the at least one electronic component and is not contact with the at least one electronic component;
at least one second shielding ring wall disposed in the core layer and surrounding the at least one first shielding ring wall;
a first circuit layer;
a second circuit layer, wherein the core layer is disposed between the first circuit layer and the second circuit layer;
a first insulating layer, wherein the second circuit layer is disposed between the first insulating layer and the core layer; and
a plurality of shielding columns disposed in the first insulating layer.
2. The circuit board assembly of claim 1 , wherein the shielding columns are electrically connected to the at least one first shielding ring wall.
3. The circuit board assembly of claim 1 , further comprising a shielding layer, wherein the shielding layer is disposed beneath the first insulating layer, and the first insulating layer is disposed between the shielding layer and the core layer, and the shielding columns extend to the core layer and the shielding layer.
4. The circuit board assembly of claim 1 , wherein the at least one second shielding ring wall comprises two metal layers and a conductive material, and the two metal layers are arranged in concentric rings, and one of the metal layers surrounds the other of the metal layers and the conductive material.
5. The circuit board assembly of claim 4 , wherein a surface of the at least one electronic component, one end of the conductive material, and a surface of the core layer are coplanar.
6. The circuit board assembly of claim 4 , wherein a height of the second shielding ring wall is greater than a thickness of the at least one electronic component.
7. The circuit board assembly of claim 1 , further comprising a second insulating layer, wherein the first circuit layer is disposed between the second insulating layer and the core layer.
8. The circuit board assembly of claim 7 , wherein a material of the core layer is a photosensitive dielectric material.
9. The circuit board assembly of claim 7 , further comprising a graphene layer, wherein the graphene layer is disposed in the at least one accommodating space and surrounds the at least one electronic component, and the graphene layer is continuously distributed around the at least one electronic component.
10. The circuit board assembly of claim 1 , wherein the at least one electronic component is electrically isolated from the at least one first shielding ring wall, the at least one second shielding ring wall, and the shielding columns.
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US17/565,538 US11825595B2 (en) | 2021-11-30 | 2021-12-30 | Manufacturing method of circuit board assembly |
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US7947908B2 (en) * | 2007-10-19 | 2011-05-24 | Advantest Corporation | Electronic device |
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JP5861260B2 (en) | 2011-03-10 | 2016-02-16 | 日本電気株式会社 | Semiconductor device manufacturing method and semiconductor device |
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US9198296B1 (en) * | 2015-01-06 | 2015-11-24 | Kinsus Interconnect Technology Corp. | Double sided board with buried element and method for manufacturing the same |
US9913385B2 (en) * | 2015-07-28 | 2018-03-06 | Bridge Semiconductor Corporation | Methods of making stackable wiring board having electronic component in dielectric recess |
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US20190296102A1 (en) * | 2018-03-20 | 2019-09-26 | Unimicron Technology Corp. | Embedded component structure and manufacturing method thereof |
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