US20230221349A1 - Plunger and method of manufacturing plunger - Google Patents
Plunger and method of manufacturing plunger Download PDFInfo
- Publication number
- US20230221349A1 US20230221349A1 US18/009,994 US202118009994A US2023221349A1 US 20230221349 A1 US20230221349 A1 US 20230221349A1 US 202118009994 A US202118009994 A US 202118009994A US 2023221349 A1 US2023221349 A1 US 2023221349A1
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- Prior art keywords
- plunger
- opening
- width
- conductive material
- resist film
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- 238000004519 manufacturing process Methods 0.000 title claims description 27
- 239000004020 conductor Substances 0.000 claims abstract description 39
- 238000000034 method Methods 0.000 claims description 10
- 229920001971 elastomer Polymers 0.000 description 27
- 239000000806 elastomer Substances 0.000 description 27
- 229910052751 metal Inorganic materials 0.000 description 17
- 239000002184 metal Substances 0.000 description 17
- 238000007747 plating Methods 0.000 description 17
- 238000007689 inspection Methods 0.000 description 14
- 238000005498 polishing Methods 0.000 description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 239000000523 sample Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 229920000106 Liquid crystal polymer Polymers 0.000 description 2
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R3/00—Apparatus or processes specially adapted for the manufacture or maintenance of measuring instruments, e.g. of probe tips
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/06711—Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
- G01R1/06716—Elastic
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/06711—Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
- G01R1/06733—Geometry aspects
- G01R1/06738—Geometry aspects related to tip portion
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/073—Multiple probes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/06711—Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
- G01R1/06755—Material aspects
- G01R1/06761—Material aspects related to layers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/073—Multiple probes
- G01R1/07307—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
- G01R1/0735—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card arranged on a flexible frame or film
Definitions
- the present invention relates to a plunger and a method of manufacturing a plunger.
- the inspection device includes a plunger.
- the plunger includes a tip contactor and a columnar part connected to the tip contactor.
- the tip contactor is formed by polishing.
- Patent Document 1 Japanese Unexamined Patent Publication No. 2014-25737
- An example of an object of the present invention is to miniaturize the plunger.
- Other object of the present invention will be apparent from the description of the present specification.
- One aspect of the present invention is a plunger including a tip contactor formed by embedding a first conductive material in a recess part provided in a base, a columnar part formed by embedding a second conductive material in a first opening provided in a first resist film formed over the base, the first opening being located above the recess part, and a receiving part formed by embedding a third conductive material in a second opening provided in a second resist film formed over the first resist film, the second opening being located above the first opening.
- Another aspect of the present invention is a method of manufacturing a plunger, the method including embedding a first conductive material in a recess part provided in a base, embedding a second conductive material in a first opening provided in a first resist film formed over the base, the first opening being located above the recess part, and embedding a third conductive material in a second opening provided in a second resist film formed over the first resist film, the second opening being located above the first opening.
- the plunger can be miniaturized.
- FIG. 1 is a perspective cross-sectional view showing the details of an inspection device according to Embodiment 1.
- FIG. 2 is a cross-sectional view for describing a method of manufacturing a first plunger according to Embodiment 1.
- FIG. 3 is a cross-sectional view for describing the method of manufacturing the first plunger according to Embodiment 1.
- FIG. 4 is a cross-sectional view for describing the method of manufacturing the first plunger according to Embodiment 1.
- FIG. 5 is a cross-sectional view for describing the method of manufacturing the first plunger according to Embodiment 1.
- FIG. 6 is a cross-sectional view for describing the method of manufacturing the first plunger according to Embodiment 1.
- FIG. 7 is a cross-sectional view for describing the method of manufacturing the first plunger according to Embodiment 1.
- FIG. 8 is a cross-sectional view for describing a method of manufacturing a first plunger according to Embodiment 2.
- FIG. 9 is a cross-sectional view for describing a method of manufacturing a first plunger according to Embodiment 3.
- ordinal numbers such as “first”, “second”, and “third”, are merely used to distinguish similarly named configurations unless otherwise noted, and do not imply any particular feature of the configuration, such as order or importance.
- FIG. 1 is a perspective cross-sectional view showing the details of an inspection device 10 according to Embodiment 1.
- a direction indicated by an arrow indicating the vertical direction Z is the upward direction of the vertical direction Z.
- a direction opposite to the direction indicated by the arrow indicating the vertical direction Z is the downward direction of the vertical direction Z.
- the inspection device 10 includes a first elastomer 100 , a plurality of first plungers 110 , a plurality of second plungers 120 , a first pin plate 130 , and a second pin plate 140 .
- Each first plunger 110 includes a first tip contactor 112 , a first columnar part 114 , and a first receiving part 116 .
- Each second plunger 120 includes a second tip contactor 122 , a second columnar part 124 , and a second receiving part 126 .
- At least a portion of the first elastomer 100 such as a periphery of a hole 102 described later in the first elastomer 100 , a conductive film 104 described later, each first plunger 110 , and each second plunger 120 function as a probe.
- Each first plunger 110 and each second plunger 120 are biased in the vertical direction Z by at least a portion of the first elastomer 100 such as the periphery of the hole 102 .
- the first elastomer 100 has a sheet shape.
- the first elastomer 100 is made of a polymeric material having elasticity, for example a polymeric material such as silicone, polyimide, or styrene-butadiene rubber (SBR).
- a polymeric material such as silicone, polyimide, or styrene-butadiene rubber (SBR).
- the first elastomer 100 defines a plurality of holes 102 that penetrate the first elastomer 100 along the vertical direction Z.
- the conductive film 104 is formed on an inner wall of each hole 102 .
- the conductive film 104 includes metal such as at least one selected from the group consisting of nickel, copper, and gold.
- the conductive film 104 is, for example, a multilayer film of these metals.
- Each hole 102 is hollow. In this case, as compared with a case in which the conductive film 104 is formed on the inner wall of the hole 102 and the hole 102 is solid (the hole 102 is filled), a material and a process for making the hole 102 solid are unnecessary, and a manufacturing cost of the inspection device 10 can be reduced.
- the first plunger 110 is located below the first elastomer 100 .
- the first plunger 110 overlaps with the first elastomer 100 in the vertical direction Z.
- the first plunger 110 overlaps with the hole 102 in the vertical direction Z. Accordingly, the first plunger 110 can be biased in a direction away from the second plunger 120 , that is, downward by the first elastomer 100 .
- the first plunger 110 is electrically connected to the conductive film 104 . Accordingly, the first plunger 110 can be electrically connected to the second plunger 120 through the conductive film 104 .
- the first plunger 110 does not overlap with the hole 102 in the vertical direction Z, an electrical path such as a conductive material embedded in the first elastomer 100 needs to be provided separately from the conductive film 104 in order to electrically connect the first plunger 110 to the conductive film 104 .
- the first plunger 110 overlaps with the hole 102 in the vertical direction Z, however, the first plunger 110 can be directly connected to the conductive film 104 without through the electrical path such as the conductive material embedded in the first elastomer 100 . Accordingly, as compared with a case in which the electrical path is provided, a material and a process for manufacturing the electrical path itself are unnecessary, and the manufacturing cost of the inspection device 10 can be reduced.
- first plunger 110 may be offset from the hole 102 in a direction orthogonal to the vertical direction Z. Even in this case, the first plunger 110 can be connected to the conductive film 104 through the electrical path such as the conductive material embedded in the first elastomer 100 .
- the first tip contactor 112 includes metal such as at least one selected from the group consisting of rhodium, ruthenium, iridium, tungsten, and tantalum.
- a width of the first tip contactor 112 is narrowed from a base end to a tip of the first tip contactor 112 .
- the first tip contactor 112 is a conic solid such as a cone or a pyramid, and has a tapered shape from the base end to the tip of the first tip contactor 112 .
- a tip of the first tip contactor 112 has a flat surface of, for example, equal to or more than 1 ⁇ m and equal to or less than 20 ⁇ m.
- the shape of the tip of the first tip contactor 112 is not limited to this example.
- the first columnar part 114 includes metal such as at least one selected from the group consisting of copper and nickel.
- the first columnar part 114 is connected to the base end of the first tip contactor 112 .
- the first tip contactor 112 and the first columnar part 114 may be integrated or separate.
- a height of the first columnar part 114 is, for example, equal to or more than 5 ⁇ m and equal to or less than 300 ⁇ m.
- the first columnar part 114 is a column such as a cylinder or a prism.
- a diameter of the first columnar part 114 is, for example, equal to or more than 20 ⁇ m and equal to or less than 500 ⁇ m.
- the shape of the first columnar part 114 is not limited to this example.
- the first receiving part 116 includes metal such as at least one selected from the group consisting of copper and nickel.
- the first receiving part 116 is connected to an end portion of the first columnar part 114 opposite to the first tip contactor 112 .
- the first columnar part 114 and the first receiving part 116 may be integrated or separated.
- the first receiving part 116 has a width wider than a width of the first columnar part 114 .
- a thickness of the first receiving part 116 is, for example, equal to or more than 5 ⁇ m and equal to or less than 200 ⁇ m.
- An upper surface of the first receiving part 116 is flat. However, at least one convex part may be formed on the upper surface of the first receiving part 116 .
- the first pin plate 130 is made of, for example, polyimide, liquid crystal polymer, or glass substrate.
- the first pin plate 130 defines a plurality of first through-holes 132 .
- Each of the plurality of first plungers 110 is inserted into each of the plurality of first through-holes 132 .
- the plurality of first plungers 110 can be arranged at a minute pitch (narrow pitch) of, for example, equal to or more than 10 ⁇ m and equal to or less than 500 ⁇ m.
- At least a portion of the first tip contactor 112 is exposed from a lower end of the first through-hole 132 of the first pin plate 130 .
- At least a portion of the first columnar part 114 penetrates the first through-hole 132 .
- the first receiving part 116 is located between an upper surface of the first pin plate 130 and a lower surface of the first elastomer 100 .
- the width of the first receiving part 116 in the left-right direction in the drawing is wider than a width of the first through-hole 132 in the left-right direction in the drawing. Accordingly, the first receiving part 116 is caught by a peripheral portion of an opening end of the first through-hole 132 on the upper surface of the first pin plate 130 .
- the first receiving part 116 can be suppressed from exiting downward the first pin plate 130 through the first through-hole 132 .
- the first receiving part 116 is not provided, even if a length of the first plunger 110 (a length of the first columnar part 114 ) is shortened, the first plunger 110 is unlikely to exit below the first pin plate 130 .
- the length of the first plunger 110 can be shortened, and the first plunger 110 can be applied to an inspection in a high frequency band of equal to or more than 1 GHz and equal to or less than 100 GHz.
- the second plunger 120 is located above the first elastomer 100 .
- the second plunger 120 overlaps with the first elastomer 100 in the vertical direction Z.
- the second plunger 120 overlaps with the hole 102 in the vertical direction Z. Accordingly, the second plunger 120 can be biased in a direction away from the first plunger 110 , that is, upward by the first elastomer 100 .
- the second plunger 120 is electrically connected to the conductive film 104 . Accordingly, the second plunger 120 can be electrically connected to the first plunger 110 through the conductive film 104 .
- the second plunger 120 does not overlap with the hole 102 in the vertical direction Z, an electrical path such as a conductive material embedded in the first elastomer 100 needs to be provided separately from the conductive film 104 in order to electrically connect the second plunger 120 to the conductive film 104 .
- the second plunger 120 overlaps with the hole 102 in the vertical direction Z, however, the second plunger 120 can be directly connected to the conductive film 104 without through the electrical path such as the conductive material embedded in the first elastomer 100 . Accordingly, as compared with a case in which the electrical path is provided, the material and the process for manufacturing the electrical path itself are unnecessary, and the manufacturing cost of the inspection device 10 can be reduced.
- the second plunger 120 may be offset from the hole 102 in a direction orthogonal to the vertical direction Z. Even in this case, the second plunger 120 can be connected to the conductive film 104 through the electrical path such as the conductive material embedded in the first elastomer 100 .
- the second pin plate 140 defines a plurality of second through-holes 142 .
- Each of the plurality of second plungers 120 is inserted into each of the plurality of second through-holes 142 in the same manner as the plurality of first plungers 110 and the first pin plate 130 .
- the first elastomer 100 plays a role of compression and extension of the spring
- the conductive film 104 plays a role of conduction of the spring. If the plunger is biased by the spring, a free length of the spring needs to be short to compare the free lengths of the probe. In this case, however, it is difficult to achieve a sufficient stroke. On the other hand, in the present embodiment, there is no need to use the spring. Accordingly, as compared with a case in which the plunger is biased by the spring, a natural length of the probe can be shortened while achieving the stroke having a sufficient length.
- first plunger 110 and the second plunger 120 overlap with the first elastomer 100 in the vertical direction Z.
- first elastomer 100 and the second plunger 120 may overlap with the first elastomer 100 in a direction different from the vertical direction Z.
- FIGS. 2 to 7 are cross-sectional views for describing a method of manufacturing the first plunger 110 according to Embodiment 1.
- FIGS. 2 to 7 show a normal direction Z1 of a surface of a metal base 600 A on which a recess part 602 A is formed.
- the method of manufacturing the first plunger 110 will be described with reference to FIGS. 2 to 7 . It should be noted that the second plunger 120 can also be manufactured in the same manner as described below.
- the recess part 602 A is formed in the metal base 600 A.
- a width of the recess part 602 A is narrowed from an opening end toward a bottom end of the recess part 602 A.
- the recess part 602 A has a tapered shape.
- the metal base 600 A is, for example, a copper plate.
- the recess part 602 A is formed in the metal base 600 A by, for example, punching or pressing.
- a first resist film 610 is formed on the metal base 600 A.
- a first opening 612 is provided in the first resist film 610 .
- the first opening 612 overlaps with the recess part 602 A in the normal direction Z1.
- a width of the first opening 612 is wider than a width of the opening end of the recess part 602 A. That is, the width of the first columnar part 114 may be different from a width of the base end of the first tip contactor 112 due to tolerance between the width of the first opening 612 and the width of the opening end of the recess part 602 A.
- the width of the first columnar part 114 may be equal to the width of the base end of the first tip contactor 112 . That is, the width of the first opening 612 may be equal to the width of the opening end of the recess part 602 A.
- a first conductive material as the first tip contactor 112 is deposited by plating and the first conductive material is embedded in the recess part 602 A.
- the first tip contactor 112 is formed in the recess part 602 A. Accordingly, the first tip contactor 112 has a plating layer.
- a thickness of the first resist film 610 is further increased.
- a second conductive material as the first columnar part 114 is deposited by plating and the second conductive material is embedded in the first opening 612 .
- the first columnar part 114 is formed in the first opening 612 . Accordingly, the first columnar part 114 has a plating layer.
- a first seed layer 116 a is formed on the first columnar part 114 and the first resist film 610 .
- a second resist film 620 is formed on the first resist film 610 .
- a second opening 622 is provided in the second resist film 620 .
- the second opening 622 overlaps with the first opening 612 in the normal direction Z1.
- a width of the second opening 622 is wider (larger) than the width of the first opening 612 .
- a third conductive material as a first plating layer 116 b is deposited by plating and the third conductive material is embedded in the second opening 622 .
- the first receiving part 116 is formed in the second opening 622 .
- the first receiving part 116 simultaneously forms a plurality of layers including the first seed layer 116 a and the first plating layer 116 b .
- the first resist film 610 and the second resist film 620 are removed by, for example, chemical solution treatment.
- the first plunger 110 is removed from the metal base 600 A.
- the tip of the first tip contactor 112 is treated by, for example, machining to form the flat surface. It should be noted that the flat surface of the tip of the first tip contactor 112 may be formed by adjusting a shape of the bottom end of the recess part 602 A of the metal base 600 A.
- the first tip contactor 112 can be formed by using the recess part 602 A of the metal base 600 A as a die.
- the first columnar part 114 can be formed by using the first opening 612 of the first resist film 610 as a die.
- the first receiving part 116 can be formed by using the second opening 622 of the second resist film 620 as a die.
- the first plunger 110 can be miniaturized as compared with a case in which the first tip contactor 112 is formed by polishing.
- the first plunger 110 can be manufactured at a low cost as compared with a case in which the first tip contactor 112 is formed by polishing.
- a degree of freedom in a structure of the first plunger 110 can be increased as compared with a case in which the first tip contactor 112 is formed by polishing.
- FIG. 8 is a cross-sectional view for describing a method of manufacturing the first plunger 110 according to Embodiment 2.
- the method according to Embodiment 2 is the same as the method according to Embodiment 1, except for the following points.
- the first plunger 110 is manufactured as follows.
- a recess part 602 B is formed in a semiconductor base 600 B.
- the semiconductor base 600 B is, for example, a silicon substrate.
- the recess part 602 B is formed by, for example, anisotropic etching.
- the flatness of the surface of the semiconductor base 600 B according to Embodiment 2 is higher than the flatness of the surface of the metal base 600 A according to Embodiment 1. Accordingly, in Embodiment 2, the first tip contactor 112 can be formed by using the recess part 602 B provided on the surface having such high flatness as a die. Thus, as compared with Embodiment 1, Embodiment 2 may be suitable for mass production of the first plunger 110 .
- FIG. 9 is a cross-sectional view for describing a method of manufacturing the first plunger 110 according to Embodiment 3.
- the method according to Embodiment 3 is the same as the method according to Embodiment 1, except for the following points.
- the first plunger 110 is manufactured as follows.
- a recess part 602 C is formed in a resin base 600 C.
- the resin base 600 C is, for example, polyimide or liquid crystal polymer.
- the recess part 602 C is formed by, for example, machining.
- a seed layer 604 C is formed on an inner wall of the recess part 602 C.
- the seed layer 604 C is provided for depositing the first conductive material as the first tip contactor 112 by plating.
- the resin base 600 C according to Embodiment 3 is softer than the metal base 600 A according to Embodiment 1. Accordingly, the recess part may be more easily formed in the resin base 600 C according to Embodiment 3, than in the metal base 600 A according to Embodiment 1.
- Aspect 1-1 is a plunger including a tip contactor formed by embedding a first conductive material in a recess part provided in a base, a columnar part formed by embedding a second conductive material in a first opening provided in a first resist film formed over the base, the first opening being located above the recess part, and a receiving part formed by embedding a third conductive material in a second opening provided in a second resist film formed over the first resist film, the second opening being located above the first opening.
- the tip contactor can be formed by using the recess part of the base as a die.
- the columnar part can be formed by using the first opening of the first resist film as a die.
- the receiving part can be formed by using the second opening of the second resist film as a die. Accordingly, the plunger can be miniaturized as compared with a case in which the tip contactor is formed by polishing.
- Aspect 1-2 is the plunger according to Aspect 1-1, in which a width of the columnar part is different from a width of a base end of the tip contactor.
- the width of the columnar part is different from the width of the base end of the tip contactor due to tolerance between the width of the opening end of the recess part of the base for forming the tip contactor and the width of the opening of the resist for forming the columnar part.
- the width of the columnar part being different from the width of the base end of the tip contactor can prevent the plunger from dropping out from the inspection device.
- Aspect 1-3 is the plunger according to Aspect 1-1 or 1-2, in which the receiving part has a plurality of layers.
- the receiving part is formed by forming the plating layer on the seed layer.
- the receiving part has the plurality of layers including the seed layer and the plating layer.
- Aspect 2-1 is a method of manufacturing a plunger, the method including embedding a first conductive material in a recess part provided in a base, embedding a second conductive material in a first opening provided in a first resist film formed over the base, the first opening being located above the recess part, and embedding a third conductive material in a second opening provided in a second resist film formed over the first resist film, the second opening being located above the first opening.
- the tip contactor can be formed of the first conductive material by using the recess part of the base as a die.
- the columnar part can be formed of the second conductive material by using the first opening of the first resist film as a die.
- the receiving part can be formed of the third conductive material by using the second opening of the second resist film as a die. Accordingly, the plunger can be miniaturized as compared with a case in which the tip contactor is formed by polishing.
- Aspect 2-2 is the method of manufacturing a plunger according to Aspect 2-1, in which a width of the first opening is different from a width of an opening end of the recess part.
- the width of the columnar part can be different from the width of the base end of the tip contactor.
- the width of the columnar part being different from the width of the base end of the tip contactor can prevent the plunger from dropping out from the inspection device.
- Aspect 2-3 is the method of manufacturing a plunger according to Aspect 2-1 or 2-2, in which the third conductive material is formed over a seed layer.
- the receiving part can be formed by forming the plating layer on the seed layer.
- Aspect 3-1 is a plunger including a tip contactor including a first plating layer of which a width is narrowed from a base end toward a tip, a columnar part including a second plating layer connected to the base end of the tip contactor, and a receiving part connected to an end portion of the columnar part opposite to the tip contactor, the receiving part including a third plating layer having a width wider than a width of the columnar part.
- the tip contactor can be formed by using the recess part of the base as a die.
- the columnar part can be formed by using the first opening of the first resist film as a die.
- the receiving part can be formed by using the second opening of the second resist film as a die. Accordingly, the plunger can be miniaturized as compared with a case in which the tip contactor is formed by polishing.
- Aspect 3-2 is the plunger according to Aspect 3-1, in which a width of the columnar part is different from a width of a base end of the tip contactor.
- the width of the columnar part is different from the width of the base end of the tip contactor due to tolerance between the width of the opening end of the recess part of the base for forming the tip contactor and the width of the opening of the resist for forming the columnar part.
- the width of the columnar part being different from the width of the base end of the tip contactor can prevent the plunger from dropping out from the inspection device.
- Aspect 3-3 is the plunger according to Aspect 3-1 or 3-2, in which the receiving part has a plurality of layers.
- the receiving part is formed by forming the third plating layer on the seed layer.
- the receiving part has the plurality of layers including the seed layer and the third plating layer.
- REFERENCE SIGNS LIST 10 inspection device 100 first elastomer 102 hole 104 conductive film 110 first plunger 112 first tip contactor 114 first columnar part 116 first receiving part 116 a first seed layer 116 b first plating layer 120 second plunger 122 second tip contactor 124 second columnar part 126 second receiving part 130 first pin plate 132 first through-hole 140 second pin plate 142 second through-hole 600
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Abstract
A plunger comprising: a tip contactor formed by embedding a first conductive material in a recess part provided in a base; a columnar part formed by embedding a second conductive material in a first opening provided in a first resist film formed over the base, the first opening being located above the recess part; and a receiving part formed by embedding a third conductive material in a second opening provided in a second resist film formed over the first resist film, the second opening being located above the first opening.
Description
- The present invention relates to a plunger and a method of manufacturing a plunger.
- Various inspection devices have been developed for inspecting characteristics of electronic devices such as integrated circuits (ICs). As disclosed in Patent Document 1, the inspection device includes a plunger. In Patent Document 1, the plunger includes a tip contactor and a columnar part connected to the tip contactor. The tip contactor is formed by polishing.
- Patent Document 1: Japanese Unexamined Patent Publication No. 2014-25737
- With the miniaturization of the electronic device, arrangement of minute plungers at high density is required for the inspection device in some case. For example, when the tip contactor is formed by polishing as disclosed in Patent Document 1, it may be difficult to miniaturize the plunger.
- An example of an object of the present invention is to miniaturize the plunger. Other object of the present invention will be apparent from the description of the present specification.
- One aspect of the present invention is a plunger including a tip contactor formed by embedding a first conductive material in a recess part provided in a base, a columnar part formed by embedding a second conductive material in a first opening provided in a first resist film formed over the base, the first opening being located above the recess part, and a receiving part formed by embedding a third conductive material in a second opening provided in a second resist film formed over the first resist film, the second opening being located above the first opening.
- Another aspect of the present invention is a method of manufacturing a plunger, the method including embedding a first conductive material in a recess part provided in a base, embedding a second conductive material in a first opening provided in a first resist film formed over the base, the first opening being located above the recess part, and embedding a third conductive material in a second opening provided in a second resist film formed over the first resist film, the second opening being located above the first opening.
- According to the above aspects of the present invention, the plunger can be miniaturized.
-
FIG. 1 is a perspective cross-sectional view showing the details of an inspection device according to Embodiment 1. -
FIG. 2 is a cross-sectional view for describing a method of manufacturing a first plunger according to Embodiment 1. -
FIG. 3 is a cross-sectional view for describing the method of manufacturing the first plunger according to Embodiment 1. -
FIG. 4 is a cross-sectional view for describing the method of manufacturing the first plunger according to Embodiment 1. -
FIG. 5 is a cross-sectional view for describing the method of manufacturing the first plunger according to Embodiment 1. -
FIG. 6 is a cross-sectional view for describing the method of manufacturing the first plunger according to Embodiment 1. -
FIG. 7 is a cross-sectional view for describing the method of manufacturing the first plunger according to Embodiment 1. -
FIG. 8 is a cross-sectional view for describing a method of manufacturing a first plunger according to Embodiment 2. -
FIG. 9 is a cross-sectional view for describing a method of manufacturing a first plunger according to Embodiment 3. - In the following, embodiments of the present invention will be described with reference to the drawings. It should be noted that, in all drawings, similar components are designated by the same reference numerals, and the description thereof will not be repeated.
- In the present specification, ordinal numbers, such as “first”, “second”, and “third”, are merely used to distinguish similarly named configurations unless otherwise noted, and do not imply any particular feature of the configuration, such as order or importance.
-
FIG. 1 is a perspective cross-sectional view showing the details of aninspection device 10 according to Embodiment 1. - In
FIG. 1 , a direction indicated by an arrow indicating the vertical direction Z is the upward direction of the vertical direction Z. A direction opposite to the direction indicated by the arrow indicating the vertical direction Z is the downward direction of the vertical direction Z. - The
inspection device 10 includes afirst elastomer 100, a plurality offirst plungers 110, a plurality ofsecond plungers 120, afirst pin plate 130, and asecond pin plate 140. Eachfirst plunger 110 includes afirst tip contactor 112, a firstcolumnar part 114, and a first receivingpart 116. Eachsecond plunger 120 includes asecond tip contactor 122, a secondcolumnar part 124, and a second receivingpart 126. At least a portion of thefirst elastomer 100 such as a periphery of ahole 102 described later in thefirst elastomer 100, aconductive film 104 described later, eachfirst plunger 110, and eachsecond plunger 120 function as a probe. Eachfirst plunger 110 and eachsecond plunger 120 are biased in the vertical direction Z by at least a portion of thefirst elastomer 100 such as the periphery of thehole 102. - The
first elastomer 100 has a sheet shape. In one example, thefirst elastomer 100 is made of a polymeric material having elasticity, for example a polymeric material such as silicone, polyimide, or styrene-butadiene rubber (SBR). - The
first elastomer 100 defines a plurality ofholes 102 that penetrate thefirst elastomer 100 along the vertical direction Z. - The
conductive film 104 is formed on an inner wall of eachhole 102. In one example, theconductive film 104 includes metal such as at least one selected from the group consisting of nickel, copper, and gold. Theconductive film 104 is, for example, a multilayer film of these metals. - Each
hole 102 is hollow. In this case, as compared with a case in which theconductive film 104 is formed on the inner wall of thehole 102 and thehole 102 is solid (thehole 102 is filled), a material and a process for making thehole 102 solid are unnecessary, and a manufacturing cost of theinspection device 10 can be reduced. - The
first plunger 110 is located below thefirst elastomer 100. The first plunger 110 overlaps with thefirst elastomer 100 in the vertical direction Z. Specifically, thefirst plunger 110 overlaps with thehole 102 in the vertical direction Z. Accordingly, thefirst plunger 110 can be biased in a direction away from thesecond plunger 120, that is, downward by thefirst elastomer 100. Thefirst plunger 110 is electrically connected to theconductive film 104. Accordingly, thefirst plunger 110 can be electrically connected to thesecond plunger 120 through theconductive film 104. If thefirst plunger 110 does not overlap with thehole 102 in the vertical direction Z, an electrical path such as a conductive material embedded in thefirst elastomer 100 needs to be provided separately from theconductive film 104 in order to electrically connect thefirst plunger 110 to theconductive film 104. When thefirst plunger 110 overlaps with thehole 102 in the vertical direction Z, however, thefirst plunger 110 can be directly connected to theconductive film 104 without through the electrical path such as the conductive material embedded in thefirst elastomer 100. Accordingly, as compared with a case in which the electrical path is provided, a material and a process for manufacturing the electrical path itself are unnecessary, and the manufacturing cost of theinspection device 10 can be reduced. It should be noted that thefirst plunger 110 may be offset from thehole 102 in a direction orthogonal to the vertical direction Z. Even in this case, thefirst plunger 110 can be connected to theconductive film 104 through the electrical path such as the conductive material embedded in thefirst elastomer 100. - The
first tip contactor 112 includes metal such as at least one selected from the group consisting of rhodium, ruthenium, iridium, tungsten, and tantalum. - A width of the
first tip contactor 112 is narrowed from a base end to a tip of thefirst tip contactor 112. Thefirst tip contactor 112 is a conic solid such as a cone or a pyramid, and has a tapered shape from the base end to the tip of thefirst tip contactor 112. A tip of thefirst tip contactor 112 has a flat surface of, for example, equal to or more than 1 µm and equal to or less than 20 µm. However, the shape of the tip of thefirst tip contactor 112 is not limited to this example. - The first
columnar part 114 includes metal such as at least one selected from the group consisting of copper and nickel. - The first
columnar part 114 is connected to the base end of thefirst tip contactor 112. Thefirst tip contactor 112 and the firstcolumnar part 114 may be integrated or separate. A height of the firstcolumnar part 114 is, for example, equal to or more than 5 µm and equal to or less than 300 µm. The firstcolumnar part 114 is a column such as a cylinder or a prism. When the firstcolumnar part 114 is a cylinder, a diameter of the firstcolumnar part 114 is, for example, equal to or more than 20 µm and equal to or less than 500 µm. However, the shape of the firstcolumnar part 114 is not limited to this example. - The
first receiving part 116 includes metal such as at least one selected from the group consisting of copper and nickel. - The
first receiving part 116 is connected to an end portion of the firstcolumnar part 114 opposite to thefirst tip contactor 112. The firstcolumnar part 114 and the first receivingpart 116 may be integrated or separated. Thefirst receiving part 116 has a width wider than a width of the firstcolumnar part 114. A thickness of the first receivingpart 116 is, for example, equal to or more than 5 µm and equal to or less than 200 µm. An upper surface of the first receivingpart 116 is flat. However, at least one convex part may be formed on the upper surface of the first receivingpart 116. - The
first pin plate 130 is made of, for example, polyimide, liquid crystal polymer, or glass substrate. - The
first pin plate 130 defines a plurality of first through-holes 132. Each of the plurality offirst plungers 110 is inserted into each of the plurality of first through-holes 132. The plurality offirst plungers 110 can be arranged at a minute pitch (narrow pitch) of, for example, equal to or more than 10 µm and equal to or less than 500 µm. - At least a portion of the
first tip contactor 112 is exposed from a lower end of the first through-hole 132 of thefirst pin plate 130. At least a portion of the firstcolumnar part 114 penetrates the first through-hole 132. Thefirst receiving part 116 is located between an upper surface of thefirst pin plate 130 and a lower surface of thefirst elastomer 100. The width of the first receivingpart 116 in the left-right direction in the drawing is wider than a width of the first through-hole 132 in the left-right direction in the drawing. Accordingly, the first receivingpart 116 is caught by a peripheral portion of an opening end of the first through-hole 132 on the upper surface of thefirst pin plate 130. In this case, even if thefirst plunger 110 is biased downward by thefirst elastomer 100, the first receivingpart 116 can be suppressed from exiting downward thefirst pin plate 130 through the first through-hole 132. Thus, as compared with a case in which the first receivingpart 116 is not provided, even if a length of the first plunger 110 (a length of the first columnar part 114) is shortened, thefirst plunger 110 is unlikely to exit below thefirst pin plate 130. The length of thefirst plunger 110 can be shortened, and thefirst plunger 110 can be applied to an inspection in a high frequency band of equal to or more than 1 GHz and equal to or less than 100 GHz. - The
second plunger 120 is located above thefirst elastomer 100. Thesecond plunger 120 overlaps with thefirst elastomer 100 in the vertical direction Z. Specifically, thesecond plunger 120 overlaps with thehole 102 in the vertical direction Z. Accordingly, thesecond plunger 120 can be biased in a direction away from thefirst plunger 110, that is, upward by thefirst elastomer 100. Thesecond plunger 120 is electrically connected to theconductive film 104. Accordingly, thesecond plunger 120 can be electrically connected to thefirst plunger 110 through theconductive film 104. If thesecond plunger 120 does not overlap with thehole 102 in the vertical direction Z, an electrical path such as a conductive material embedded in thefirst elastomer 100 needs to be provided separately from theconductive film 104 in order to electrically connect thesecond plunger 120 to theconductive film 104. When thesecond plunger 120 overlaps with thehole 102 in the vertical direction Z, however, thesecond plunger 120 can be directly connected to theconductive film 104 without through the electrical path such as the conductive material embedded in thefirst elastomer 100. Accordingly, as compared with a case in which the electrical path is provided, the material and the process for manufacturing the electrical path itself are unnecessary, and the manufacturing cost of theinspection device 10 can be reduced. It should be noted that thesecond plunger 120 may be offset from thehole 102 in a direction orthogonal to the vertical direction Z. Even in this case, thesecond plunger 120 can be connected to theconductive film 104 through the electrical path such as the conductive material embedded in thefirst elastomer 100. - The
second pin plate 140 defines a plurality of second through-holes 142. Each of the plurality ofsecond plungers 120 is inserted into each of the plurality of second through-holes 142 in the same manner as the plurality offirst plungers 110 and thefirst pin plate 130. - According to the present embodiment, as compared with a case in which the plunger is biased by a spring, the
first elastomer 100 plays a role of compression and extension of the spring, and theconductive film 104 plays a role of conduction of the spring. If the plunger is biased by the spring, a free length of the spring needs to be short to compare the free lengths of the probe. In this case, however, it is difficult to achieve a sufficient stroke. On the other hand, in the present embodiment, there is no need to use the spring. Accordingly, as compared with a case in which the plunger is biased by the spring, a natural length of the probe can be shortened while achieving the stroke having a sufficient length. - It should be noted that, in the present embodiment, the case has been described in which the
first plunger 110 and thesecond plunger 120 overlap with thefirst elastomer 100 in the vertical direction Z. However, thefirst elastomer 100 and thesecond plunger 120 may overlap with thefirst elastomer 100 in a direction different from the vertical direction Z. -
FIGS. 2 to 7 are cross-sectional views for describing a method of manufacturing thefirst plunger 110 according to Embodiment 1.FIGS. 2 to 7 show a normal direction Z1 of a surface of ametal base 600A on which arecess part 602A is formed. - The method of manufacturing the
first plunger 110 will be described with reference toFIGS. 2 to 7 . It should be noted that thesecond plunger 120 can also be manufactured in the same manner as described below. - First, as shown in
FIG. 2 , therecess part 602A is formed in themetal base 600A. A width of therecess part 602A is narrowed from an opening end toward a bottom end of therecess part 602A. Therecess part 602A has a tapered shape. Themetal base 600A is, for example, a copper plate. Therecess part 602A is formed in themetal base 600A by, for example, punching or pressing. - Next, as shown in
FIG. 3 , a first resistfilm 610 is formed on themetal base 600A. Afirst opening 612 is provided in the first resistfilm 610. Thefirst opening 612 overlaps with therecess part 602A in the normal direction Z1. A width of thefirst opening 612 is wider than a width of the opening end of therecess part 602A. That is, the width of the firstcolumnar part 114 may be different from a width of the base end of thefirst tip contactor 112 due to tolerance between the width of thefirst opening 612 and the width of the opening end of therecess part 602A. However, the width of the firstcolumnar part 114 may be equal to the width of the base end of thefirst tip contactor 112. That is, the width of thefirst opening 612 may be equal to the width of the opening end of therecess part 602A. - Next, as shown in
FIG. 4 , a first conductive material as thefirst tip contactor 112 is deposited by plating and the first conductive material is embedded in therecess part 602A. As a result, thefirst tip contactor 112 is formed in therecess part 602A. Accordingly, thefirst tip contactor 112 has a plating layer. Next, a thickness of the first resistfilm 610 is further increased. Next, a second conductive material as the firstcolumnar part 114 is deposited by plating and the second conductive material is embedded in thefirst opening 612. As a result, the firstcolumnar part 114 is formed in thefirst opening 612. Accordingly, the firstcolumnar part 114 has a plating layer. - Next, as shown in
FIG. 5 , afirst seed layer 116 a is formed on the firstcolumnar part 114 and the first resistfilm 610. - Next, as shown in
FIG. 6 , a second resistfilm 620 is formed on the first resistfilm 610. Asecond opening 622 is provided in the second resistfilm 620. Thesecond opening 622 overlaps with thefirst opening 612 in the normal direction Z1. A width of thesecond opening 622 is wider (larger) than the width of thefirst opening 612. - Next, as shown in
FIG. 7 , a third conductive material as afirst plating layer 116 b is deposited by plating and the third conductive material is embedded in thesecond opening 622. As a result, the first receivingpart 116 is formed in thesecond opening 622. In this case, the first receivingpart 116 simultaneously forms a plurality of layers including thefirst seed layer 116 a and thefirst plating layer 116 b. - Next, the first resist
film 610 and the second resistfilm 620 are removed by, for example, chemical solution treatment. Next, thefirst plunger 110 is removed from themetal base 600A. Next, as necessary, the tip of thefirst tip contactor 112 is treated by, for example, machining to form the flat surface. It should be noted that the flat surface of the tip of thefirst tip contactor 112 may be formed by adjusting a shape of the bottom end of therecess part 602A of themetal base 600A. - According to the present embodiment, the
first tip contactor 112 can be formed by using therecess part 602A of themetal base 600A as a die. The firstcolumnar part 114 can be formed by using thefirst opening 612 of the first resistfilm 610 as a die. Thefirst receiving part 116 can be formed by using thesecond opening 622 of the second resistfilm 620 as a die. Accordingly, thefirst plunger 110 can be miniaturized as compared with a case in which thefirst tip contactor 112 is formed by polishing. According to the present embodiment, thefirst plunger 110 can be manufactured at a low cost as compared with a case in which thefirst tip contactor 112 is formed by polishing. Further, according to the present embodiment, a degree of freedom in a structure of thefirst plunger 110 can be increased as compared with a case in which thefirst tip contactor 112 is formed by polishing. -
FIG. 8 is a cross-sectional view for describing a method of manufacturing thefirst plunger 110 according to Embodiment 2. The method according to Embodiment 2 is the same as the method according to Embodiment 1, except for the following points. - In the present embodiment, the
first plunger 110 is manufactured as follows. - First, as shown in
FIG. 8 , arecess part 602B is formed in asemiconductor base 600B. Thesemiconductor base 600B is, for example, a silicon substrate. Therecess part 602B is formed by, for example, anisotropic etching. - The subsequent steps are the same as the steps described with reference to
FIGS. 3 to 7 of Embodiment 1. - In general, the flatness of the surface of the
semiconductor base 600B according to Embodiment 2 is higher than the flatness of the surface of themetal base 600A according to Embodiment 1. Accordingly, in Embodiment 2, thefirst tip contactor 112 can be formed by using therecess part 602B provided on the surface having such high flatness as a die. Thus, as compared with Embodiment 1, Embodiment 2 may be suitable for mass production of thefirst plunger 110. -
FIG. 9 is a cross-sectional view for describing a method of manufacturing thefirst plunger 110 according to Embodiment 3. The method according to Embodiment 3 is the same as the method according to Embodiment 1, except for the following points. - In the present embodiment, the
first plunger 110 is manufactured as follows. - First, as shown in
FIG. 9 , arecess part 602C is formed in aresin base 600C. Theresin base 600C is, for example, polyimide or liquid crystal polymer. Therecess part 602C is formed by, for example, machining. Next, aseed layer 604C is formed on an inner wall of therecess part 602C. Theseed layer 604C is provided for depositing the first conductive material as thefirst tip contactor 112 by plating. - The subsequent steps are the same as the steps described with reference to
FIGS. 3 to 7 of the embodiment. - In general, the
resin base 600C according to Embodiment 3 is softer than themetal base 600A according to Embodiment 1. Accordingly, the recess part may be more easily formed in theresin base 600C according to Embodiment 3, than in themetal base 600A according to Embodiment 1. - In the above, the embodiments of the present invention have been described with reference to the drawings, but these are examples of the present invention, and various configurations other than the above can be adopted.
- According to the present specification, the following aspects are provided.
- Aspect 1-1 is a plunger including a tip contactor formed by embedding a first conductive material in a recess part provided in a base, a columnar part formed by embedding a second conductive material in a first opening provided in a first resist film formed over the base, the first opening being located above the recess part, and a receiving part formed by embedding a third conductive material in a second opening provided in a second resist film formed over the first resist film, the second opening being located above the first opening.
- According to Aspect 1-1, the tip contactor can be formed by using the recess part of the base as a die. The columnar part can be formed by using the first opening of the first resist film as a die. The receiving part can be formed by using the second opening of the second resist film as a die. Accordingly, the plunger can be miniaturized as compared with a case in which the tip contactor is formed by polishing.
- Aspect 1-2 is the plunger according to Aspect 1-1, in which a width of the columnar part is different from a width of a base end of the tip contactor.
- According to Aspect 1-2, the width of the columnar part is different from the width of the base end of the tip contactor due to tolerance between the width of the opening end of the recess part of the base for forming the tip contactor and the width of the opening of the resist for forming the columnar part. The width of the columnar part being different from the width of the base end of the tip contactor can prevent the plunger from dropping out from the inspection device.
- Aspect 1-3 is the plunger according to Aspect 1-1 or 1-2, in which the receiving part has a plurality of layers.
- According to Aspect 3, the receiving part is formed by forming the plating layer on the seed layer. As a result, the receiving part has the plurality of layers including the seed layer and the plating layer.
- Aspect 2-1 is a method of manufacturing a plunger, the method including embedding a first conductive material in a recess part provided in a base, embedding a second conductive material in a first opening provided in a first resist film formed over the base, the first opening being located above the recess part, and embedding a third conductive material in a second opening provided in a second resist film formed over the first resist film, the second opening being located above the first opening.
- According to Aspect 2-1, the tip contactor can be formed of the first conductive material by using the recess part of the base as a die. The columnar part can be formed of the second conductive material by using the first opening of the first resist film as a die. The receiving part can be formed of the third conductive material by using the second opening of the second resist film as a die. Accordingly, the plunger can be miniaturized as compared with a case in which the tip contactor is formed by polishing.
- Aspect 2-2 is the method of manufacturing a plunger according to Aspect 2-1, in which a width of the first opening is different from a width of an opening end of the recess part.
- According to Aspect 2-2, the width of the columnar part can be different from the width of the base end of the tip contactor. The width of the columnar part being different from the width of the base end of the tip contactor can prevent the plunger from dropping out from the inspection device.
- Aspect 2-3 is the method of manufacturing a plunger according to Aspect 2-1 or 2-2, in which the third conductive material is formed over a seed layer.
- According to Aspect 2-3, the receiving part can be formed by forming the plating layer on the seed layer.
- Aspect 3-1 is a plunger including a tip contactor including a first plating layer of which a width is narrowed from a base end toward a tip, a columnar part including a second plating layer connected to the base end of the tip contactor, and a receiving part connected to an end portion of the columnar part opposite to the tip contactor, the receiving part including a third plating layer having a width wider than a width of the columnar part.
- According to Aspect 3-1, the tip contactor can be formed by using the recess part of the base as a die. The columnar part can be formed by using the first opening of the first resist film as a die. The receiving part can be formed by using the second opening of the second resist film as a die. Accordingly, the plunger can be miniaturized as compared with a case in which the tip contactor is formed by polishing.
- Aspect 3-2 is the plunger according to Aspect 3-1, in which a width of the columnar part is different from a width of a base end of the tip contactor.
- According to Aspect 3-2, the width of the columnar part is different from the width of the base end of the tip contactor due to tolerance between the width of the opening end of the recess part of the base for forming the tip contactor and the width of the opening of the resist for forming the columnar part. The width of the columnar part being different from the width of the base end of the tip contactor can prevent the plunger from dropping out from the inspection device.
- Aspect 3-3 is the plunger according to Aspect 3-1 or 3-2, in which the receiving part has a plurality of layers.
- According to Aspect 3-3, the receiving part is formed by forming the third plating layer on the seed layer. As a result, the receiving part has the plurality of layers including the seed layer and the third plating layer.
- This application claims priority based on Japanese Patent Application No. 2020-106766 filed on Jun. 22, 2020, the entire disclosure of which is incorporated herein by reference.
-
REFERENCE SIGNS LIST 10 inspection device 100 first elastomer 102 hole 104 conductive film 110 first plunger 112 first tip contactor 114 first columnar part 116 first receiving part 116 a first seed layer 116 b first plating layer 120 second plunger 122 second tip contactor 124 second columnar part 126 second receiving part 130 first pin plate 132 first through- hole 140 second pin plate 142 second through- hole 600 A metal base 600 B semiconductor base 600 C resin base 602 A recess part 602 B recess part 602 C recess part 604 C seed layer 610 first resist film 612 first opening 620 second resist film 622 second opening Z vertical direction Z1 normal direction
Claims (6)
1. A plunger comprising:
a tip contactor formed by embedding a first conductive material in a recess part provided in a base;
a columnar part formed by embedding a second conductive material in a first opening provided in a first resist film formed over the base, the first opening being located above the recess part; and
a receiving part formed by embedding a third conductive material in a second opening provided in a second resist film formed over the first resist film, the second opening being located above the first opening.
2. The plunger according to claim 1 ,
wherein a width of the columnar part is different from a width of a base end of the tip contactor.
3. The plunger according to claim 1 ,
wherein the receiving part has a plurality of layers.
4. A method of manufacturing a plunger, the method comprising:
embedding a first conductive material in a recess part provided in a base;
embedding a second conductive material in a first opening provided in a first resist film formed over the base, the first opening being located above the recess part; and
embedding a third conductive material in a second opening provided in a second resist film formed over the first resist film, the second opening being located above the first opening.
5. The method of manufacturing a plunger according to claim 4 ,
wherein a width of the first opening is different from a width of an opening end of the recess part.
6. The method of manufacturing a plunger according to claim 4 ,
wherein the third conductive material is formed over a seed layer.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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JP2020-106766 | 2020-06-22 | ||
JP2020106766 | 2020-06-22 | ||
PCT/JP2021/022246 WO2021261287A1 (en) | 2020-06-22 | 2021-06-11 | Plunger and production method for plunger |
Publications (1)
Publication Number | Publication Date |
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US20230221349A1 true US20230221349A1 (en) | 2023-07-13 |
Family
ID=79187490
Family Applications (1)
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US18/009,994 Pending US20230221349A1 (en) | 2020-06-22 | 2021-06-11 | Plunger and method of manufacturing plunger |
Country Status (5)
Country | Link |
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US (1) | US20230221349A1 (en) |
JP (1) | JPWO2021261287A1 (en) |
CN (2) | CN113899924A (en) |
TW (1) | TW202217326A (en) |
WO (1) | WO2021261287A1 (en) |
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2021
- 2021-06-11 JP JP2022531763A patent/JPWO2021261287A1/ja active Pending
- 2021-06-11 US US18/009,994 patent/US20230221349A1/en active Pending
- 2021-06-11 WO PCT/JP2021/022246 patent/WO2021261287A1/en active Application Filing
- 2021-06-11 CN CN202110651713.4A patent/CN113899924A/en active Pending
- 2021-06-11 CN CN202121306108.5U patent/CN215768709U/en active Active
- 2021-06-11 TW TW110121485A patent/TW202217326A/en unknown
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Also Published As
Publication number | Publication date |
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TW202217326A (en) | 2022-05-01 |
CN215768709U (en) | 2022-02-08 |
JPWO2021261287A1 (en) | 2021-12-30 |
CN113899924A (en) | 2022-01-07 |
WO2021261287A1 (en) | 2021-12-30 |
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