US20230103270A2 - Flux and Solder Material - Google Patents
Flux and Solder Material Download PDFInfo
- Publication number
- US20230103270A2 US20230103270A2 US17/052,318 US201917052318A US2023103270A2 US 20230103270 A2 US20230103270 A2 US 20230103270A2 US 201917052318 A US201917052318 A US 201917052318A US 2023103270 A2 US2023103270 A2 US 2023103270A2
- Authority
- US
- United States
- Prior art keywords
- ring
- flux
- iodine
- mass
- skeleton
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000004907 flux Effects 0.000 title claims description 62
- 229910000679 solder Inorganic materials 0.000 title claims description 57
- 239000000463 material Substances 0.000 title claims description 30
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims abstract description 42
- 229910052740 iodine Inorganic materials 0.000 claims abstract description 40
- 239000011630 iodine Substances 0.000 claims abstract description 36
- 150000001923 cyclic compounds Chemical class 0.000 claims abstract description 28
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 13
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 13
- 125000004429 atom Chemical group 0.000 claims abstract description 10
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 9
- 125000004430 oxygen atom Chemical group O* 0.000 claims abstract description 8
- 125000004433 nitrogen atom Chemical group N* 0.000 claims abstract description 6
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 4
- 229910045601 alloy Inorganic materials 0.000 claims description 21
- 239000000956 alloy Substances 0.000 claims description 21
- 239000012190 activator Substances 0.000 claims description 17
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 12
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 9
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 9
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 9
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 claims description 8
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical compound O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 claims description 5
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 claims description 4
- 229940091173 hydantoin Drugs 0.000 claims description 4
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 4
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 claims description 4
- 235000013675 iodine Nutrition 0.000 description 35
- 229910052718 tin Inorganic materials 0.000 description 12
- 239000002904 solvent Substances 0.000 description 11
- 239000011347 resin Substances 0.000 description 10
- 229920005989 resin Polymers 0.000 description 10
- 239000000758 substrate Substances 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 9
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 8
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 8
- 150000007524 organic acids Chemical class 0.000 description 8
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 8
- 239000010949 copper Substances 0.000 description 7
- 238000002844 melting Methods 0.000 description 7
- 230000008018 melting Effects 0.000 description 7
- 125000001424 substituent group Chemical group 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 125000005843 halogen group Chemical group 0.000 description 6
- 229910052797 bismuth Inorganic materials 0.000 description 5
- -1 carboxyl compound Chemical class 0.000 description 5
- 230000009974 thixotropic effect Effects 0.000 description 5
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 4
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 4
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 4
- 229910052794 bromium Inorganic materials 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 229910052736 halogen Inorganic materials 0.000 description 4
- 125000005842 heteroatom Chemical group 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 229910052787 antimony Inorganic materials 0.000 description 3
- 150000002366 halogen compounds Chemical class 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 125000000623 heterocyclic group Chemical group 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 239000011800 void material Substances 0.000 description 3
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Chemical group C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 2
- AFABGHUZZDYHJO-UHFFFAOYSA-N 2-Methylpentane Chemical compound CCCC(C)C AFABGHUZZDYHJO-UHFFFAOYSA-N 0.000 description 2
- OADIZUFHUPTFAG-UHFFFAOYSA-N 2-[2-(2-ethylhexoxy)ethoxy]ethanol Chemical compound CCCCC(CC)COCCOCCO OADIZUFHUPTFAG-UHFFFAOYSA-N 0.000 description 2
- WXUAQHNMJWJLTG-UHFFFAOYSA-N 2-methylbutanedioic acid Chemical compound OC(=O)C(C)CC(O)=O WXUAQHNMJWJLTG-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical group C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical group N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000001361 adipic acid Substances 0.000 description 2
- 235000011037 adipic acid Nutrition 0.000 description 2
- 150000007824 aliphatic compounds Chemical class 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 230000003078 antioxidant effect Effects 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- HGCIXCUEYOPUTN-UHFFFAOYSA-N cyclohexene Chemical compound C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 2
- LPIQUOYDBNQMRZ-UHFFFAOYSA-N cyclopentene Chemical compound C1CC=CC1 LPIQUOYDBNQMRZ-UHFFFAOYSA-N 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000013008 thixotropic agent Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- RDZHCKRAHUPIFK-UHFFFAOYSA-N 1,3-diiodo-5,5-dimethylimidazolidine-2,4-dione Chemical compound CC1(C)N(I)C(=O)N(I)C1=O RDZHCKRAHUPIFK-UHFFFAOYSA-N 0.000 description 1
- JZJWCDQGIPQBAO-UHFFFAOYSA-N 1-(4-iodophenyl)ethanone Chemical compound CC(=O)C1=CC=C(I)C=C1 JZJWCDQGIPQBAO-UHFFFAOYSA-N 0.000 description 1
- NHPPIJMARIVBGU-UHFFFAOYSA-N 1-iodonaphthalene Chemical compound C1=CC=C2C(I)=CC=CC2=C1 NHPPIJMARIVBGU-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- QFGCFKJIPBRJGM-UHFFFAOYSA-N 12-[(2-methylpropan-2-yl)oxy]-12-oxododecanoic acid Chemical compound CC(C)(C)OC(=O)CCCCCCCCCCC(O)=O QFGCFKJIPBRJGM-UHFFFAOYSA-N 0.000 description 1
- HIDCNJIBRZBEPN-UHFFFAOYSA-N 2,4,5-triiodo-1h-imidazole Chemical compound IC1=NC(I)=C(I)N1 HIDCNJIBRZBEPN-UHFFFAOYSA-N 0.000 description 1
- VAPDZNUFNKUROY-UHFFFAOYSA-N 2,4,6-triiodophenol Chemical compound OC1=C(I)C=C(I)C=C1I VAPDZNUFNKUROY-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- GZMAAYIALGURDQ-UHFFFAOYSA-N 2-(2-hexoxyethoxy)ethanol Chemical compound CCCCCCOCCOCCO GZMAAYIALGURDQ-UHFFFAOYSA-N 0.000 description 1
- CXHXFDQEFKFYQJ-UHFFFAOYSA-N 2-bromo-4-chloro-1-iodobenzene Chemical compound ClC1=CC=C(I)C(Br)=C1 CXHXFDQEFKFYQJ-UHFFFAOYSA-N 0.000 description 1
- WJPSANINUBHCFE-UHFFFAOYSA-N 2-bromo-5-iodo-3-methylpyridine Chemical compound CC1=CC(I)=CN=C1Br WJPSANINUBHCFE-UHFFFAOYSA-N 0.000 description 1
- CRWNQZTZTZWPOF-UHFFFAOYSA-N 2-methyl-4-phenylpyridine Chemical compound C1=NC(C)=CC(C=2C=CC=CC=2)=C1 CRWNQZTZTZWPOF-UHFFFAOYSA-N 0.000 description 1
- NIEBHDXUIJSHSL-UHFFFAOYSA-N 4-iodobenzaldehyde Chemical compound IC1=CC=C(C=O)C=C1 NIEBHDXUIJSHSL-UHFFFAOYSA-N 0.000 description 1
- VSMDINRNYYEDRN-UHFFFAOYSA-N 4-iodophenol Chemical compound OC1=CC=C(I)C=C1 VSMDINRNYYEDRN-UHFFFAOYSA-N 0.000 description 1
- QPGPCPKDVSPJAY-UHFFFAOYSA-N 5-iodofuran-2-carbaldehyde Chemical compound IC1=CC=C(C=O)O1 QPGPCPKDVSPJAY-UHFFFAOYSA-N 0.000 description 1
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical group CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- RJUFJBKOKNCXHH-UHFFFAOYSA-N Methyl propionate Chemical compound CCC(=O)OC RJUFJBKOKNCXHH-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
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- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001335 aliphatic alkanes Chemical group 0.000 description 1
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- 125000002355 alkine group Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
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- 125000003118 aryl group Chemical group 0.000 description 1
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- 125000001246 bromo group Chemical group Br* 0.000 description 1
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- 125000001309 chloro group Chemical group Cl* 0.000 description 1
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- 125000004122 cyclic group Chemical group 0.000 description 1
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- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
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- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
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- NNXVARLKWUFGGG-UHFFFAOYSA-N methyl 2-amino-5-iodobenzoate Chemical compound COC(=O)C1=CC(I)=CC=C1N NNXVARLKWUFGGG-UHFFFAOYSA-N 0.000 description 1
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- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
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- 235000005985 organic acids Nutrition 0.000 description 1
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- 239000002245 particle Substances 0.000 description 1
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- WOQDVIVTFCTQCE-UHFFFAOYSA-N pentacontanediamide Chemical compound NC(=O)CCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCC(N)=O WOQDVIVTFCTQCE-UHFFFAOYSA-N 0.000 description 1
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- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 125000001174 sulfone group Chemical group 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- YFWQFKUQVJNPKP-UHFFFAOYSA-N tert-butyl 4-iodopiperidine-1-carboxylate Chemical compound CC(C)(C)OC(=O)N1CCC(I)CC1 YFWQFKUQVJNPKP-UHFFFAOYSA-N 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
- B23K35/3612—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest with organic compounds as principal constituents
- B23K35/3616—Halogen compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/24—Selection of soldering or welding materials proper
- B23K35/26—Selection of soldering or welding materials proper with the principal constituent melting at less than 400 degrees C
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/10—Metallic powder containing lubricating or binding agents; Metallic powder containing organic material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/24—Selection of soldering or welding materials proper
- B23K35/26—Selection of soldering or welding materials proper with the principal constituent melting at less than 400 degrees C
- B23K35/262—Sn as the principal constituent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
- B23K35/3612—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest with organic compounds as principal constituents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
- B23K35/362—Selection of compositions of fluxes
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/0425—Copper-based alloys
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C13/00—Alloys based on tin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
Definitions
- the present invention relates to a flux and a solder material containing the flux.
- Solder used for joining electronic parts is composed of a solder material containing a solder alloy and flux.
- the flux is formulated to improve solderability and contains multiple components such as resin, activator, solvent, antioxidant, and thixotropic agent components.
- halogen-based compounds have been conventionally used.
- Patent Document 1 describes a flux containing, as an activator, a halogen compound in which a halogen atom such as bromine and chlorine atoms is introduced into an organic compound by a covalent bond.
- Patent Document 2 describes a flux containing an iodine-based carboxyl compound as an activator.
- Patent Document 3 describes a flux containing a halogen compound activator in which a halogen atom such as iodine and bromine atoms bonded to a linear chain at a specific position of an aliphatic compound.
- each of the above-mentioned components also contains a compound that generates gas during heating, and voids may be generated by the gas. Although such voids cause a decrease in heat dissipation of an electrical connection, the generation of voids cannot be sufficiently suppressed by the conventional flux as described above.
- Patent Document 1 Japanese Patent Application Publication No. 2002-120089
- Patent Document 2 Japanese Patent Application Publication No. 2014-188578
- Patent Document 3 Japanese Patent Application Publication No. 2016-140915
- the present invention has been made in view of the above-mentioned problem of the prior arts, and an object of the present invention is to provide a flux and a solder material capable of sufficiently suppressing the generation of voids.
- a flux of the present invention contains an iodine-containing cyclic compound including no carboxy group and including one ring skeleton or a plurality of ring skeletons forming a fused ring in one molecule, in which the ring of the ring skeleton includes only a carbon atom, or a carbon atom, and a nitrogen atom and/or an oxygen atom, and an iodine atom is bonded to at least one of the atoms constituting the ring of the ring skeleton.
- the ring skeleton may be a 5-membered ring or a 6-membered ring.
- the ring of the ring skeleton may include a carbon atom, and a nitrogen atom or an oxygen atom.
- the ring skeleton may be one selected from the group consisting of cyclohexane, benzene, pyridine, imidazole, hydantoin, furan, naphthalene, and quinoline skeletons.
- the iodine-containing cyclic compound may be contained in an amount of 0.1% by mass or more and 5.0% by mass or less.
- the flux may contain an activator in an amount of 0.5% by mass or more and 20% by mass or less.
- the present invention relating to a solder material includes the flux and a solder alloy.
- a flux and a solder material capable of sufficiently suppressing the generation of voids can be provided
- FIG. 1 illustrates structures of iodine-containing cyclic compounds used in Examples.
- FIG. 2 illustrates structures of iodine-containing cyclic compounds used in Examples.
- FIG. 3 illustrates structures of bromine-based compounds used in Comparative Examples.
- FIG. 4 shows photographs of test substrates of Examples.
- FIG. 5 shows photographs of test substrates of Comparative Examples.
- FIG. 6 shows Table 1.
- FIG. 7 shows Table 2.
- a flux and a solder material containing the flux according to the present invention will be described below.
- the flux of the present embodiment contains an iodine-containing cyclic compound including no carboxy group and including one ring skeleton or a plurality of ring skeletons forming a fused ring in one molecule, in which the ring of the ring skeleton includes only a carbon atom, or a carbon atom, and a nitrogen atom and/or an oxygen atom, and an iodine atom is bonded to at least one of the atoms constituting the ring of the ring skeleton.
- the ring skeleton refers to a portion of cyclic arrangement of atoms included in a molecule.
- the ring skeleton may be a structure in which a ring is composed of only carbon atoms (a homocyclic ring), or a structure in which a ring is composed of a carbon atom and an atom other than a carbon atom (a heterocyclic ring).
- heteroatom constituting the ring examples include nitrogen and oxygen atoms.
- each atom is also simply referred to as carbon, nitrogen, or oxygen, etc.
- the ring may include one or more nitrogens or oxygens as heteroatoms constituting the ring.
- nitrogen and oxygen may be included as a different heteroatom.
- the ring skeleton examples include a ring skeleton having no double bond such as cycloalkane and cyclopentane skeletons, a ring skeleton having a double bond such as cyclohexene, cyclopentene, and benzene skeletons, and a ring skeleton having one or more of the above-mentioned heteroatoms as atoms constituting the ring of the ring skeleton, such as pyridine, imidazole, hydantoin, furan, and pyrrole skeletons.
- the ring skeleton which is the above-mentioned skeleton in the present embodiment, refers to a skeleton in which an iodine is bonded to at least one of the atoms constituting a ring of a basic ring skeleton such as cyclohexane and benzene skeletons.
- the ring skeleton also includes a skeleton in which halogen atoms other than an iodine, and/or other substituents are bonded to the basic ring skeleton.
- the iodine-containing cyclic compound of the present embodiment may have a plurality of ring skeletons forming a fused ring.
- Examples of the plurality of ring skeletons forming a fused ring include, but are not particularly limited to, a fused ring of a 6-membered ring and a 5-membered ring, and a fused ring of a 6-membered ring and a 6-membered ring.
- each ring skeleton constituting the fused ring may be a heterocyclic ring or a homocyclic ring as mentioned above.
- the fused ring may have various substituents.
- fused ring examples include ring skeletons consisting of fused rings such as pentalene, indene, naphthalene, quinoline, indole, and benzimidazole skeletons.
- the ring skeleton preferably includes one selected from the group consisting of cyclohexane, benzene, pyridine, imidazole, hydantoin, furan, naphthalene, and quinoline skeletons.
- the ring skeleton has an iodine that is bonded to at least one of the atoms constituting the ring.
- the ring skeleton may have one or more iodines that are bonded to the elements constituting the ring skeleton.
- a halogen atom other than an iodine such as a bromine and chlorine, may be bonded together with one or more iodines.
- the ring skeleton may or may not have a substituent other than an iodine.
- substituent other than an iodine examples include halogen atoms other than an iodine such as a bromine and chlorine, a hydrogen atom, an oxygen atom, hydroxy groups, acyl groups such as formyl and acetyl groups, amino groups, amide groups, esters, an acetamide group, alkoxy groups such as methoxy and ethoxy groups, aryl groups, sulfone groups, a benzyl group, alkyl groups such as alkane, alkene, and alkyne groups, and these substituents having a substituent.
- Examples of the iodine-containing compound of the present embodiment include iodine-containing cyclic compounds represented by the following Formula 1 or general formulas, Formulas 2 to 12.
- X1 and X2 are the same or different halogen atoms
- R 1 , R 2 , and R 3 are each a hydrogen atom, a hydroxy group (—OH), —C( ⁇ O)—H, or a group represented by —C( ⁇ O)—R 4 (R 4 is an alkyl group), —C( ⁇ O)—NH—R 5 , or —NR—C( ⁇ O)—R 7 (R 5-7 are alkyl groups having a hydroxy group as a substituent), and R 1 , R 2 , and R 3 may be the same or different groups.
- iodine-containing cyclic compound examples include the following.
- Examples of the iodine-containing cyclic compound having a cyclohexane skeleton as the ring skeleton include iodocyclohexane and 1-tert-butoxycarbonyl-4-iodopiperidine.
- Examples of the iodine-containing cyclic compound having a benzene skeleton as the ring skeleton include 4-iodophenol, 2,4,6-triiodophenol, ethyl 3-iodobenzoate, 4-iodobenzaldehyde, 4′-iodoacetophenone, methyl 5-iodoanthranilate, iohexol, 2-bromo-4-chloro-1-iodobenzene.
- Examples of the iodine-containing cyclic compound having a pyridine skeleton as the ring skeleton include 2-bromo-5-iodo-3-methylpyridine.
- Examples of the iodine-containing cyclic compound having an imidazole skeleton as the ring skeleton include 2,4,5-triiodo-1h-imidazole.
- Examples of the iodine-containing cyclic compound having a hydantoin skeleton as the ring skeleton include 1,3-diiodo-5,5-dimethylhydantoin.
- Examples of the iodine-containing cyclic compound having a furan skeleton as the ring skeleton include 5-iodo-2-furaldehyde.
- Examples of the iodine-containing cyclic compound having a naphthalene skeleton as the ring skeleton include 1-iodonaphthalene.
- Examples of the iodine-containing cyclic compound having a quinoline skeleton as the ring skeleton include 5,7-diiodo-8-hydroxyquinoline.
- the content of the iodine-containing cyclic compound in the flux is not particularly limited, but include, for example, 0.1% by mass or more and 5.0% by mass or less, preferably 0.5% by mass or more and 2.6% by mass or less.
- the flux can effectively suppress the generation of voids.
- the content of the iodine-containing cyclic compound in the present embodiment can be measured by a known method using gas chromatography-mass spectrometry (GC/MS) and combustion-ion chromatography.
- GC/MS gas chromatography-mass spectrometry
- the flux of the present embodiment may include known flux components such as various activator components, activator components other than isocyanuric acid derivatives, and resin, solvent, antioxidant, and thixotropic components.
- the flux of the present embodiment may further contain an organic acid as an activator component other than the iodine-containing cyclic compound.
- the organic acid is not particularly limited as long as it is a known component used as an activator component of flux.
- Examples of such organic acid include glutaric acid, succinic acid, methylsuccinic acid, azelaic acid, adipic acid, sebacic acid, stearic acid, benzoic acid, dodecanedioic acid, maleic acid, and cyanulic acid.
- the organic acid can be used alone or in combination of two or more.
- the content of the activator such as the organic acid in the flux is not particularly limited, but include, for example, 0.5% by mass or more and 20% by mass or less, preferably 3.0% by mass or more and 10% by mass or less in terms of the solid content (the ratio in the components other than the solvent component).
- activator components such as amine halogen salts and halogen compounds can be used.
- the concentration of the entire halogen in the flux including the halogen in the iodine-containing cyclic compound is preferably 1.0% by mass or less, preferably 0.5% by mass or less.
- an activator component contains a large amount of components that generate gas during heating, such as organic acids, it is conceivable to reduce the content of an activator component to suppress voids, but if an activator component is reduced, the solderability is disadvantageously lowered.
- the flux of the present embodiment contains an iodine-containing cyclic compound, the generation of voids can be suppressed without reducing an activator component. Therefore, generation of voids can be suppressed while maintaining the solderability.
- the flux of the present embodiment may contain a resin component as a rosin component.
- the resin component is not particularly limited as long as it is a known resin component used as a resin component of flux, such as a synthetic resin and a natural resin.
- the resin component include polymerized rosin, hydrogenated rosin, natural rosin, disproportionated rosin, and acid-modified rosin.
- the resin can be used alone or in combination of two or more.
- the content of the resin component in the flux is not particularly limited, but includes, for example, 50% by mass or more and 90% by mass or less, preferably 70% by mass or more and 80% by mass or less in terms of the solid content.
- the solvent component is not particularly limited as long as it is a known component used as a solvent component of flux.
- the solvent component include, glycol ethers such as diethylene glycol monohexyl ether (hexyl diglycol), diethylene glycol dibutyl ether (dibutyl diglycol), diethylene glycol mono 2-ethylhexyl ether (2 ethyl hexyl diglycol), and diethylene glycol monobutyl ether (butyl diglycol); aliphatic compounds such as n-hexane, isohexane, and n-heptane; esters such as isopropyl acetate, methyl propionate and ethyl propionate; ketones such as methyl ethyl ketone, methyl-n-propyl ketone and diethyl ketone; and alcohols such as ethanol, n-propanol, isopropanol, isobutanol and
- voids can be suppressed by employing a highly volatile component as a solvent component, in this case, the time during which the tackiness of a solder material can be maintained is disadvantageously shortened.
- the flux of the present embodiment contains the iodine-containing cyclic compound, the generation of voids can be suppressed without selecting the type of solvent.
- the solvent can be used alone or in combination of two or more.
- the content of the solvent component in the flux is not particularly limited, but includes, for example, 20% by mass or more and 70% by mass or less, preferably 30% by mass or more and 60% by mass or less.
- the thixotropic component is not particularly limited as long as it is a known component used as a thixotropic component of flux.
- Examples of the thixotropic component include hydrogenated castor oil, fatty acid amides, oxyfatty acids, and waxes.
- the content of the thixotropic component in the flux is not particularly limited, but includes, for example, 3.0% by mass or more and 20% by mass or less, preferably 5.0% by mass or more and 10% by mass or less.
- the flux of the present embodiment may further contain other additives.
- the flux of the present embodiment can be used as a flux for a solder paste but can be also used as a liquid flux such as a post flux and a flux for a solder material such as resin flux cored solder.
- the solder material of the present embodiment contains above-mentioned fluxes and a solder alloy.
- the solder alloy may be a lead-free alloy.
- the solder alloy is not particularly limited and may be either a lead-free solder alloy or a leaded solder alloy, but a lead-free solder alloy is preferable from the viewpoint of environmental impact.
- a lead-free solder alloy include alloys containing tin, silver, copper, zinc, bismuth, and antimony, and more specifically, alloys such as Sn/Ag, Sn/Ag/Cu, Sn/Cu, Sn/Ag/Bi, Sn/Bi, Sn/Ag/Cu/Bi, Sn/Sb, Sn/Zn/Bi, Sn/Zn, Sn/Zn/Al, Sn/Ag/Bi/In, Sn/Ag/Cu/Bi/In/Sb, and In/Ag.
- Sn/Ag/Cu is preferable.
- the content of the solder alloy in the solder material is not particularly limited, but includes, for example, 80% by mass or more and 95% by mass or less, preferably 85% by mass or more and 90% by mass or less.
- solder material of the present embodiment is a solder paste obtained by mixing the solder alloy and the flux of the present embodiment
- the solder alloy is contained in an amount of 80% by mass or more and 95% by mass or less
- the flux is contained in an amount of 5% by mass or more and 20% by mass or less.
- conditions can be appropriately set according to an object to be soldered.
- the conditions are not particularly limited, but include, for example, the temperature rise rate during preheating: 1.0 to 3.0° C./sec, preheat temperature: 150 to 190° C./60 to 100 sec, heating rate during solder melting: 1.0 to 2.0° C./sec, melting temperature: 219° C. or higher for 30 seconds or longer, and reflow peak temperature: 230 to 250° C.
- the flux of the present embodiment When the flux of the present embodiment is formulated to a solder material, it can suppress the generation of voids without suppressing the use of the active component. Therefore, the generation of voids can be suppressed without lowering the wettability.
- solder material of the present embodiment employs the above-mentioned flux, the solderability is good while the generation of voids can be suppressed.
- the solder material of the present embodiment may contain a solder alloy without limitation as long as it is a common solder alloy, but a lead-free solder alloy is particularly suitable.
- a lead-free solder material containing a lead-free solder alloy has a problem that gas generated by a component such as a volatile component of flux tends to remain during solder melting, and thereby voids are likely to occur.
- the flux of the present embodiment can suppress voids even when used in such a lead-free solder material.
- the solder material of the present embodiment is suitable for mounting electronic parts on a substrate, particularly for mounting electronic parts such as quad flat no-leads (QFNs) and power transistors, which have a relatively large solder joint area and a small space for gas to escape during heating. Although voids are likely to be generated due to the generation of gas in mounting of these parts, the generation of voids can be suppressed more effectively by using the solder material of the present embodiment.
- QFNs quad flat no-leads
- power transistors which have a relatively large solder joint area and a small space for gas to escape during heating.
- Acid-modified ultra-light-colored rosin KE-604, made by Arakawa Chemical Industries, Ltd.
- Hexyl diglycol (HeDG): made by Nippon Nyukazai Co., Ltd.
- Adipic acid made by Sumitomo Chemical Co., Ltd.
- Solder alloy powder (Sn-3.0% Ag-0.5% Cu, 20 to 38 ⁇ m particle size) and each flux are mixed at a ratio of 88 ⁇ 1% by mass and 12 ⁇ 1% by mass to prepare a pasty solder material (solder paste).
- test substrate was prepared as follows.
- a substrate having a size of 100 mm ⁇ 100 mm and a thickness of 1.6 mm was prepared for evaluation and subjected to heat treatment twice under the following temperature conditions.
- Heating rate 1.0 to 3.0° C./sec
- Preheat temperature 150 to 190° C./60 to 100 seconds
- Heating rate 1.0 to 2.0° C./sec
- Peak temperature 240° C.
- a solder material was applied to the heat-treated substrate so as to have a thickness of 120 ⁇ m and a size of 6.0 mm ⁇ 6.0 mm square.
- the application thickness was 120 ⁇ m.
- a part IC TXRX ETHERET 72QFP manufacturer: Microchip Technology
- Heating rate 1.0 to 3.0° C./sec
- Preheat temperature 150 to 190° C./60 to 100 seconds
- Heating rate 1.0 to 2.0° C./sec
- Peak temperature 240° C.
- An imaging device was TUX-3100 made by Mars Token Co. Ltd., and the imaging conditions were tube voltage: 75.0V, tube current: 65.0 ⁇ A, filament current: 3.130 A, and magnification: 10.9 ⁇ .
- FIGS. 4 and 5 photographs of the test substrates of Examples and Comparative Examples are shown in FIGS. 4 and 5 .
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Abstract
Description
- The present invention relates to a flux and a solder material containing the flux.
- Solder used for joining electronic parts, for example, is composed of a solder material containing a solder alloy and flux. The flux is formulated to improve solderability and contains multiple components such as resin, activator, solvent, antioxidant, and thixotropic agent components. Among the solderability, in order to improve solder wettability and solder meltability, halogen-based compounds have been conventionally used.
- For example,
Patent Document 1 describes a flux containing, as an activator, a halogen compound in which a halogen atom such as bromine and chlorine atoms is introduced into an organic compound by a covalent bond. -
Patent Document 2 describes a flux containing an iodine-based carboxyl compound as an activator. -
Patent Document 3 describes a flux containing a halogen compound activator in which a halogen atom such as iodine and bromine atoms bonded to a linear chain at a specific position of an aliphatic compound. - On the other hand, each of the above-mentioned components also contains a compound that generates gas during heating, and voids may be generated by the gas. Although such voids cause a decrease in heat dissipation of an electrical connection, the generation of voids cannot be sufficiently suppressed by the conventional flux as described above.
- Patent Document 1: Japanese Patent Application Publication No. 2002-120089
- Patent Document 2: Japanese Patent Application Publication No. 2014-188578
- Patent Document 3: Japanese Patent Application Publication No. 2016-140915
- The present invention has been made in view of the above-mentioned problem of the prior arts, and an object of the present invention is to provide a flux and a solder material capable of sufficiently suppressing the generation of voids.
- A flux of the present invention contains an iodine-containing cyclic compound including no carboxy group and including one ring skeleton or a plurality of ring skeletons forming a fused ring in one molecule, in which the ring of the ring skeleton includes only a carbon atom, or a carbon atom, and a nitrogen atom and/or an oxygen atom, and an iodine atom is bonded to at least one of the atoms constituting the ring of the ring skeleton.
- The ring skeleton may be a 5-membered ring or a 6-membered ring.
- The ring of the ring skeleton may include a carbon atom, and a nitrogen atom or an oxygen atom.
- The ring skeleton may be one selected from the group consisting of cyclohexane, benzene, pyridine, imidazole, hydantoin, furan, naphthalene, and quinoline skeletons.
- The iodine-containing cyclic compound may be contained in an amount of 0.1% by mass or more and 5.0% by mass or less.
- The flux may contain an activator in an amount of 0.5% by mass or more and 20% by mass or less.
- The present invention relating to a solder material includes the flux and a solder alloy.
- According to the present invention, a flux and a solder material capable of sufficiently suppressing the generation of voids can be provided
-
FIG. 1 illustrates structures of iodine-containing cyclic compounds used in Examples. -
FIG. 2 illustrates structures of iodine-containing cyclic compounds used in Examples. -
FIG. 3 illustrates structures of bromine-based compounds used in Comparative Examples. -
FIG. 4 shows photographs of test substrates of Examples. -
FIG. 5 shows photographs of test substrates of Comparative Examples. -
FIG. 6 shows Table 1. -
FIG. 7 shows Table 2. - A flux and a solder material containing the flux according to the present invention will be described below.
- The flux of the present embodiment contains an iodine-containing cyclic compound including no carboxy group and including one ring skeleton or a plurality of ring skeletons forming a fused ring in one molecule, in which the ring of the ring skeleton includes only a carbon atom, or a carbon atom, and a nitrogen atom and/or an oxygen atom, and an iodine atom is bonded to at least one of the atoms constituting the ring of the ring skeleton.
- In the present embodiment, the ring skeleton refers to a portion of cyclic arrangement of atoms included in a molecule.
- The ring skeleton may be a structure in which a ring is composed of only carbon atoms (a homocyclic ring), or a structure in which a ring is composed of a carbon atom and an atom other than a carbon atom (a heterocyclic ring).
- When the ring skeleton is a heterocyclic ring, examples of the heteroatom constituting the ring include nitrogen and oxygen atoms. Hereinafter, each atom is also simply referred to as carbon, nitrogen, or oxygen, etc.
- The ring may include one or more nitrogens or oxygens as heteroatoms constituting the ring. In addition, nitrogen and oxygen may be included as a different heteroatom.
- Examples of the ring skeleton include a ring skeleton having no double bond such as cycloalkane and cyclopentane skeletons, a ring skeleton having a double bond such as cyclohexene, cyclopentene, and benzene skeletons, and a ring skeleton having one or more of the above-mentioned heteroatoms as atoms constituting the ring of the ring skeleton, such as pyridine, imidazole, hydantoin, furan, and pyrrole skeletons.
- The ring skeleton, which is the above-mentioned skeleton in the present embodiment, refers to a skeleton in which an iodine is bonded to at least one of the atoms constituting a ring of a basic ring skeleton such as cyclohexane and benzene skeletons. The ring skeleton also includes a skeleton in which halogen atoms other than an iodine, and/or other substituents are bonded to the basic ring skeleton.
- The iodine-containing cyclic compound of the present embodiment may have a plurality of ring skeletons forming a fused ring.
- Examples of the plurality of ring skeletons forming a fused ring include, but are not particularly limited to, a fused ring of a 6-membered ring and a 5-membered ring, and a fused ring of a 6-membered ring and a 6-membered ring. In addition, each ring skeleton constituting the fused ring may be a heterocyclic ring or a homocyclic ring as mentioned above. Further, the fused ring may have various substituents.
- Examples of the fused ring include ring skeletons consisting of fused rings such as pentalene, indene, naphthalene, quinoline, indole, and benzimidazole skeletons.
- The ring skeleton preferably includes one selected from the group consisting of cyclohexane, benzene, pyridine, imidazole, hydantoin, furan, naphthalene, and quinoline skeletons.
- The ring skeleton has an iodine that is bonded to at least one of the atoms constituting the ring.
- The ring skeleton may have one or more iodines that are bonded to the elements constituting the ring skeleton. In addition, a halogen atom other than an iodine, such as a bromine and chlorine, may be bonded together with one or more iodines.
- Further, the ring skeleton may or may not have a substituent other than an iodine.
- Examples of the substituent other than an iodine include halogen atoms other than an iodine such as a bromine and chlorine, a hydrogen atom, an oxygen atom, hydroxy groups, acyl groups such as formyl and acetyl groups, amino groups, amide groups, esters, an acetamide group, alkoxy groups such as methoxy and ethoxy groups, aryl groups, sulfone groups, a benzyl group, alkyl groups such as alkane, alkene, and alkyne groups, and these substituents having a substituent.
- Examples of the iodine-containing compound of the present embodiment include iodine-containing cyclic compounds represented by the following
Formula 1 or general formulas,Formulas 2 to 12. In the general formulas, X1 and X2 are the same or different halogen atoms, R1, R2, and R3 are each a hydrogen atom, a hydroxy group (—OH), —C(═O)—H, or a group represented by —C(═O)—R4 (R4 is an alkyl group), —C(═O)—NH—R5, or —NR—C(═O)—R7 (R5-7 are alkyl groups having a hydroxy group as a substituent), and R1, R2, and R3 may be the same or different groups. - Specific examples of the iodine-containing cyclic compound include the following.
- Examples of the iodine-containing cyclic compound having a cyclohexane skeleton as the ring skeleton include iodocyclohexane and 1-tert-butoxycarbonyl-4-iodopiperidine.
- Examples of the iodine-containing cyclic compound having a benzene skeleton as the ring skeleton include 4-iodophenol, 2,4,6-triiodophenol, ethyl 3-iodobenzoate, 4-iodobenzaldehyde, 4′-iodoacetophenone, methyl 5-iodoanthranilate, iohexol, 2-bromo-4-chloro-1-iodobenzene.
- Examples of the iodine-containing cyclic compound having a pyridine skeleton as the ring skeleton include 2-bromo-5-iodo-3-methylpyridine.
- Examples of the iodine-containing cyclic compound having an imidazole skeleton as the ring skeleton include 2,4,5-triiodo-1h-imidazole.
- Examples of the iodine-containing cyclic compound having a hydantoin skeleton as the ring skeleton include 1,3-diiodo-5,5-dimethylhydantoin.
- Examples of the iodine-containing cyclic compound having a furan skeleton as the ring skeleton include 5-iodo-2-furaldehyde.
- Examples of the iodine-containing cyclic compound having a naphthalene skeleton as the ring skeleton include 1-iodonaphthalene.
- Examples of the iodine-containing cyclic compound having a quinoline skeleton as the ring skeleton include 5,7-diiodo-8-hydroxyquinoline.
- The content of the iodine-containing cyclic compound in the flux is not particularly limited, but include, for example, 0.1% by mass or more and 5.0% by mass or less, preferably 0.5% by mass or more and 2.6% by mass or less.
- When the content of the iodine-containing cyclic compound in the flux is within the above range, the flux can effectively suppress the generation of voids.
- The content of the iodine-containing cyclic compound in the present embodiment can be measured by a known method using gas chromatography-mass spectrometry (GC/MS) and combustion-ion chromatography.
- In addition to the iodine-containing cyclic compound, the flux of the present embodiment may include known flux components such as various activator components, activator components other than isocyanuric acid derivatives, and resin, solvent, antioxidant, and thixotropic components.
- These components can be formulated to the flux as needed, and any of the components may or may not be contained.
- The flux of the present embodiment may further contain an organic acid as an activator component other than the iodine-containing cyclic compound.
- The organic acid is not particularly limited as long as it is a known component used as an activator component of flux. Examples of such organic acid include glutaric acid, succinic acid, methylsuccinic acid, azelaic acid, adipic acid, sebacic acid, stearic acid, benzoic acid, dodecanedioic acid, maleic acid, and cyanulic acid.
- The organic acid can be used alone or in combination of two or more.
- The content of the activator such as the organic acid in the flux is not particularly limited, but include, for example, 0.5% by mass or more and 20% by mass or less, preferably 3.0% by mass or more and 10% by mass or less in terms of the solid content (the ratio in the components other than the solvent component).
- Other than the organic acid, activator components such as amine halogen salts and halogen compounds can be used.
- In this case, the concentration of the entire halogen in the flux including the halogen in the iodine-containing cyclic compound is preferably 1.0% by mass or less, preferably 0.5% by mass or less.
- Since an activator component contains a large amount of components that generate gas during heating, such as organic acids, it is conceivable to reduce the content of an activator component to suppress voids, but if an activator component is reduced, the solderability is disadvantageously lowered.
- Since the flux of the present embodiment contains an iodine-containing cyclic compound, the generation of voids can be suppressed without reducing an activator component. Therefore, generation of voids can be suppressed while maintaining the solderability.
- The flux of the present embodiment may contain a resin component as a rosin component.
- The resin component is not particularly limited as long as it is a known resin component used as a resin component of flux, such as a synthetic resin and a natural resin. Examples of the resin component include polymerized rosin, hydrogenated rosin, natural rosin, disproportionated rosin, and acid-modified rosin.
- The resin can be used alone or in combination of two or more.
- In this case, the content of the resin component in the flux is not particularly limited, but includes, for example, 50% by mass or more and 90% by mass or less, preferably 70% by mass or more and 80% by mass or less in terms of the solid content.
- The solvent component is not particularly limited as long as it is a known component used as a solvent component of flux. Examples of the solvent component include, glycol ethers such as diethylene glycol monohexyl ether (hexyl diglycol), diethylene glycol dibutyl ether (dibutyl diglycol), diethylene glycol mono 2-ethylhexyl ether (2 ethyl hexyl diglycol), and diethylene glycol monobutyl ether (butyl diglycol); aliphatic compounds such as n-hexane, isohexane, and n-heptane; esters such as isopropyl acetate, methyl propionate and ethyl propionate; ketones such as methyl ethyl ketone, methyl-n-propyl ketone and diethyl ketone; and alcohols such as ethanol, n-propanol, isopropanol, isobutanol and octanediol.
- Although voids can be suppressed by employing a highly volatile component as a solvent component, in this case, the time during which the tackiness of a solder material can be maintained is disadvantageously shortened.
- Since the flux of the present embodiment contains the iodine-containing cyclic compound, the generation of voids can be suppressed without selecting the type of solvent.
- The solvent can be used alone or in combination of two or more.
- The content of the solvent component in the flux is not particularly limited, but includes, for example, 20% by mass or more and 70% by mass or less, preferably 30% by mass or more and 60% by mass or less.
- The thixotropic component is not particularly limited as long as it is a known component used as a thixotropic component of flux. Examples of the thixotropic component include hydrogenated castor oil, fatty acid amides, oxyfatty acids, and waxes.
- The content of the thixotropic component in the flux is not particularly limited, but includes, for example, 3.0% by mass or more and 20% by mass or less, preferably 5.0% by mass or more and 10% by mass or less.
- The flux of the present embodiment may further contain other additives.
- The flux of the present embodiment can be used as a flux for a solder paste but can be also used as a liquid flux such as a post flux and a flux for a solder material such as resin flux cored solder.
- The solder material of the present embodiment contains above-mentioned fluxes and a solder alloy.
- The solder alloy may be a lead-free alloy.
- The solder alloy is not particularly limited and may be either a lead-free solder alloy or a leaded solder alloy, but a lead-free solder alloy is preferable from the viewpoint of environmental impact.
- Specific examples of a lead-free solder alloy include alloys containing tin, silver, copper, zinc, bismuth, and antimony, and more specifically, alloys such as Sn/Ag, Sn/Ag/Cu, Sn/Cu, Sn/Ag/Bi, Sn/Bi, Sn/Ag/Cu/Bi, Sn/Sb, Sn/Zn/Bi, Sn/Zn, Sn/Zn/Al, Sn/Ag/Bi/In, Sn/Ag/Cu/Bi/In/Sb, and In/Ag. In particular, Sn/Ag/Cu is preferable.
- The content of the solder alloy in the solder material is not particularly limited, but includes, for example, 80% by mass or more and 95% by mass or less, preferably 85% by mass or more and 90% by mass or less.
- When the solder material of the present embodiment is a solder paste obtained by mixing the solder alloy and the flux of the present embodiment, it is preferable that, for example, the solder alloy is contained in an amount of 80% by mass or more and 95% by mass or less, and the flux is contained in an amount of 5% by mass or more and 20% by mass or less.
- For using the solder material of the present embodiment, conditions can be appropriately set according to an object to be soldered. The conditions are not particularly limited, but include, for example, the temperature rise rate during preheating: 1.0 to 3.0° C./sec, preheat temperature: 150 to 190° C./60 to 100 sec, heating rate during solder melting: 1.0 to 2.0° C./sec, melting temperature: 219° C. or higher for 30 seconds or longer, and reflow peak temperature: 230 to 250° C.
- When the flux of the present embodiment is formulated to a solder material, it can suppress the generation of voids without suppressing the use of the active component. Therefore, the generation of voids can be suppressed without lowering the wettability.
- Since the solder material of the present embodiment employs the above-mentioned flux, the solderability is good while the generation of voids can be suppressed.
- The solder material of the present embodiment may contain a solder alloy without limitation as long as it is a common solder alloy, but a lead-free solder alloy is particularly suitable.
- A lead-free solder material containing a lead-free solder alloy has a problem that gas generated by a component such as a volatile component of flux tends to remain during solder melting, and thereby voids are likely to occur. The flux of the present embodiment can suppress voids even when used in such a lead-free solder material.
- The solder material of the present embodiment is suitable for mounting electronic parts on a substrate, particularly for mounting electronic parts such as quad flat no-leads (QFNs) and power transistors, which have a relatively large solder joint area and a small space for gas to escape during heating. Although voids are likely to be generated due to the generation of gas in mounting of these parts, the generation of voids can be suppressed more effectively by using the solder material of the present embodiment.
- The flux and the solder material according to the present embodiment are as described above, but it should be considered that the embodiment disclosed herein is exemplary in all respects and is not restrictive. The scope of the present invention is shown not by the above description but by the scope of claims, and it is intended that all modifications within the meaning and scope equivalent to the scope of claims are included.
- Next, Examples of the present invention will be described together with Comparative Examples. It should be noted that the present invention is not construed as being limited to the following Examples.
- The materials shown below and the iodine-containing cyclic compounds shown in Tables 1 and 2 (see
FIGS. 1 to 3 for structural formulas) were used in the formulations shown in Tables 1 and 2 to prepare fluxes to be used in Examples and Comparative Examples. - The materials for each of Examples and Comparative Examples were respectively placed into an appropriate container and mixed at room temperature until all the materials were uniformly dissolved to obtain a flux.
- Acid-modified ultra-light-colored rosin: KE-604, made by Arakawa Chemical Industries, Ltd.
- Hexyl diglycol (HeDG): made by Nippon Nyukazai Co., Ltd.
- Hexamethylenebis behenamide: Slipax ZHH, made by Mitsubishi Chemical Corporation
- Adipic acid: made by Sumitomo Chemical Co., Ltd.
- Solder alloy powder (Sn-3.0% Ag-0.5% Cu, 20 to 38 μm particle size) and each flux are mixed at a ratio of 88±1% by mass and 12±1% by mass to prepare a pasty solder material (solder paste).
- Using the solder material of each of the above-mentioned Examples and Comparative Examples, a test substrate was prepared as follows.
- A substrate having a size of 100 mm×100 mm and a thickness of 1.6 mm was prepared for evaluation and subjected to heat treatment twice under the following temperature conditions.
- Heating rate: 1.0 to 3.0° C./sec
- Preheat temperature: 150 to 190° C./60 to 100 seconds
- Heating rate: 1.0 to 2.0° C./sec
- Melting temperature: 219° C. or higher for 45 seconds
- Peak temperature: 240° C.
- Air atmosphere
- A solder material was applied to the heat-treated substrate so as to have a thickness of 120 μm and a size of 6.0 mm×6.0 mm square. The application thickness was 120 μm. Then, a part (IC TXRX ETHERET 72QFP manufacturer: Microchip Technology) was mounted on the position to which the solder material was applied, and heated under the following conditions.
- Heating rate: 1.0 to 3.0° C./sec
- Preheat temperature: 150 to 190° C./60 to 100 seconds
- Heating rate: 1.0 to 2.0° C./sec
- Melting temperature: 219° C. or higher for 45 seconds
- Peak temperature: 240° C.
- Air atmosphere
- In each test substrate prepared using the Examples and Comparative Examples, an X-ray transmission photograph was taken at the part mounting position. The photograph was binarized, the area of the joint and the void portion was measured, and the ratio of the area of the void portion to the joint was determined.
- An imaging device was TUX-3100 made by Mars Token Co. Ltd., and the imaging conditions were tube voltage: 75.0V, tube current: 65.0 μA, filament current: 3.130 A, and magnification: 10.9×.
- The results are shown in Tables 1 and 2, depicted in
FIGS. 6 and 7 , respectively. - In addition, photographs of the test substrates of Examples and Comparative Examples are shown in
FIGS. 4 and 5 . - As shown in Tables 1 and 2 and
FIGS. 4 and 5 , the generation of voids was extremely low in the test substrates of Examples as compared with Comparative Examples.
Claims (7)
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JP2543718B2 (en) * | 1987-09-04 | 1996-10-16 | 四国化成工業株式会社 | Flux for rosin-based solder containing new activator |
JP4043620B2 (en) * | 1998-10-29 | 2008-02-06 | 内橋エステック株式会社 | Solder flux |
DE19857149A1 (en) | 1998-12-11 | 2000-06-15 | Bayer Ag | X-ray contrasting plastic masses |
JP4505125B2 (en) | 2000-10-17 | 2010-07-21 | クックソンエレクトロニクス株式会社 | Soldering flux |
CN101808971A (en) * | 2007-08-31 | 2010-08-18 | 三菱瓦斯化学株式会社 | Process for production of phenol derivatives substituted with iodine at ortho position |
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