US20220181245A1 - Printed circuit board - Google Patents
Printed circuit board Download PDFInfo
- Publication number
- US20220181245A1 US20220181245A1 US17/191,485 US202117191485A US2022181245A1 US 20220181245 A1 US20220181245 A1 US 20220181245A1 US 202117191485 A US202117191485 A US 202117191485A US 2022181245 A1 US2022181245 A1 US 2022181245A1
- Authority
- US
- United States
- Prior art keywords
- metal layer
- layer
- circuit board
- printed circuit
- pad
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000010410 layer Substances 0.000 claims abstract description 375
- 239000011241 protective layer Substances 0.000 claims abstract description 42
- 229910052751 metal Inorganic materials 0.000 claims description 304
- 239000002184 metal Substances 0.000 claims description 304
- 239000011888 foil Substances 0.000 description 51
- 238000010586 diagram Methods 0.000 description 33
- 238000004519 manufacturing process Methods 0.000 description 20
- 238000000034 method Methods 0.000 description 20
- 239000000758 substrate Substances 0.000 description 19
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 18
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 15
- 239000010949 copper Substances 0.000 description 14
- 239000010931 gold Substances 0.000 description 12
- 239000010936 titanium Substances 0.000 description 12
- 238000009713 electroplating Methods 0.000 description 10
- 229910052802 copper Inorganic materials 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 239000011889 copper foil Substances 0.000 description 7
- 238000007747 plating Methods 0.000 description 7
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 6
- 229910045601 alloy Inorganic materials 0.000 description 6
- 239000000956 alloy Substances 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 239000004020 conductor Substances 0.000 description 6
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 6
- 229910052737 gold Inorganic materials 0.000 description 6
- 229910052759 nickel Inorganic materials 0.000 description 6
- 229910052709 silver Inorganic materials 0.000 description 6
- 239000004332 silver Substances 0.000 description 6
- 229910052719 titanium Inorganic materials 0.000 description 6
- 239000011810 insulating material Substances 0.000 description 4
- 238000005530 etching Methods 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 229910000859 α-Fe Inorganic materials 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003985 ceramic capacitor Substances 0.000 description 1
- 239000011162 core material Substances 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000010295 mobile communication Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/11—Printed elements for providing electric connections to or between printed circuits
- H05K1/111—Pads for surface mounting, e.g. lay-out
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49838—Geometry or layout
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49811—Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/11—Printed elements for providing electric connections to or between printed circuits
- H05K1/115—Via connections; Lands around holes or via connections
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/18—Printed circuits structurally associated with non-printed electric components
- H05K1/182—Printed circuits structurally associated with non-printed electric components associated with components mounted in the printed circuit board, e.g. insert mounted components [IMC]
- H05K1/185—Components encapsulated in the insulating substrate of the printed circuit or incorporated in internal layers of a multilayer circuit
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/241—Reinforcing the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4682—Manufacture of core-less build-up multilayer circuits on a temporary carrier or on a metal foil
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
- H01L21/4857—Multilayer substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68345—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used as a support during the manufacture of self supporting substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49822—Multilayer substrates
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0364—Conductor shape
- H05K2201/0367—Metallic bump or raised conductor not used as solder bump
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09209—Shape and layout details of conductors
- H05K2201/09372—Pads and lands
- H05K2201/09472—Recessed pad for surface mounting; Recessed electrode of component
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09209—Shape and layout details of conductors
- H05K2201/09654—Shape and layout details of conductors covering at least two types of conductors provided for in H05K2201/09218 - H05K2201/095
- H05K2201/098—Special shape of the cross-section of conductors, e.g. very thick plated conductors
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09818—Shape or layout details not covered by a single group of H05K2201/09009 - H05K2201/09809
- H05K2201/099—Coating over pads, e.g. solder resist partly over pads
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0703—Plating
- H05K2203/0723—Electroplating, e.g. finish plating
Definitions
- the present disclosure relates to a printed circuit board.
- An electronic device such as a mobile product has been designed to have a reduced thickness and size, and has been required to have improved quality.
- a ball grid array (BGA) package product has been implemented to have a fine pitch using a conductive post.
- a metal such as copper may have a relatively higher Young's modulus and a higher aspect ratio than those of solder, which may lead to an increase in the force applied to a pad connected to a conductive post, and it may be necessary to reduce the magnitude of the force applied to the pad.
- An aspect of the present disclosure is to provide a printed circuit board including a pad having an increased contact area with an insulating material.
- Another aspect of the present disclosure is to provide a printed circuit board including a plurality of inflection points.
- Another aspect of the present disclosure is to provide a printed circuit board which may reduce force applied to a pad.
- a printed circuit board includes a first insulating layer; a pad disposed on the insulating layer and having a protrusion; and a protective layer disposed on the insulating layer and having an opening exposing at least a portion of the pad.
- the protrusion protrudes from one surface of the pad and is buried in at least one of the insulating layer and the protective layer.
- a printed circuit board includes an insulating layer; a pad buried in the insulating layer to be exposed to one surface of the insulating layer and including a first metal layer and a second metal layer disposed on the first metal layer; a protective layer disposed on the insulating layer and having an opening exposing at least a portion of the pad; and a conductive post disposed in the opening of the protective layer, protruding from the protective layer, and connected to the pad.
- a printed circuit board includes an insulating body; a pad disposed in the insulating body and including a first metal layer and a second metal layer; and a conductive post extending from the first metal layer to protrude from the insulating body.
- the second metal layer is spaced apart from the conductive post.
- FIG. 1 is a block diagram illustrating an example of an electronic device system
- FIG. 2 is a perspective diagram illustrating an example of an electronic device
- FIG. 3 is a cross-sectional diagram illustrating a printed circuit board according to an example embodiment
- FIG. 4 is a cross-sectional diagram illustrating a printed circuit board according to another example embodiment
- FIG. 5 is a cross-sectional diagram illustrating a printed circuit board according to another example embodiment
- FIG. 6 is a cross-sectional diagram illustrating a printed circuit board according to another example embodiment
- FIGS. 7A and 7B are cross-sectional diagrams illustrating a portion of an example embodiment of a process of manufacturing the printed circuit board illustrated in FIG. 3 ;
- FIGS. 8A and 8B are cross-sectional diagrams illustrating a portion of an example embodiment of a process of manufacturing the printed circuit board illustrated in FIG. 4 ;
- FIGS. 9A and 9B are cross-sectional diagrams illustrating a portion of an example embodiment of a process of manufacturing the printed circuit board illustrated in FIG. 5 ;
- FIGS. 10A and 10B are cross-sectional diagrams illustrating a portion of an example embodiment of a process of manufacturing the printed circuit board illustrated in FIG. 6 .
- FIG. 1 is a block diagram illustrating an example of an electronic device system.
- an electronic device 1000 may accommodate a mainboard 1010 therein.
- the mainboard 1010 may include chip related components 1020 , network related components 1030 , other components 1040 , and the like, physically or electrically connected thereto. These components may be connected to others to be described below to form various signal lines 1090 .
- the chip related components 1020 may include a memory chip such as a volatile memory (for example, a dynamic random access memory (DRAM)), a non-volatile memory (for example, a read only memory (ROM)), a flash memory, or the like; an application processor chip such as a central processor (for example, a central processing unit (CPU)), a graphics processor (for example, a graphics processing unit (GPU)), a digital signal processor, a cryptographic processor, a microprocessor, a microcontroller, or the like; and a logic chip such as an analog-to-digital (ADC) converter, an application-specific integrated circuit (ASIC), or the like.
- the chip related components 1020 are not limited thereto, and may also include other types of chip related components.
- the chip related components 1020 may be combined with each other.
- the chip related components 1020 may have a package form including the above-described chip or an electronic component.
- the network related components 1030 may include protocols such as wireless fidelity (Wi-Fi) (Institute of Electrical And Electronics Engineers (IEEE) 802.11 family, or the like), worldwide interoperability for microwave access (WiMAX) (IEEE 802.16 family, or the like), IEEE 802.20, long term evolution (LTE), evolution data only (Ev-DO), high speed packet access+(HSPA+), high speed downlink packet access+(HSDPA+), high speed uplink packet access+(HSUPA+), enhanced data GSM environment (EDGE), global system for mobile communications (GSM), global positioning system (GPS), general packet radio service (GPRS), code division multiple access (CDMA), time division multiple access (TDMA), digital enhanced cordless telecommunications (DECT), Bluetooth, 3G, 4G, and 5G protocols, and any other wireless and wired protocols, designated after the abovementioned protocols.
- Wi-Fi Institutee of Electrical And Electronics Engineers (IEEE) 802.11 family, or the like
- WiMAX worldwide interoper
- Other components 1040 may include a high frequency inductor, a ferrite inductor, a power inductor, ferrite beads, a low temperature co-fired ceramic (LTCC), an electromagnetic interference (EMI) filter, a multilayer ceramic capacitor (MLCC), or the like.
- LTCC low temperature co-fired ceramic
- EMI electromagnetic interference
- MLCC multilayer ceramic capacitor
- other components 1040 are not limited thereto, and may also include chip-component type passive components used for various other purposes, or the like.
- other components 1040 may be combined with the chip related components 1020 or the network related components 1030 described above.
- the electronic device 1000 may include other components that may or may not be physically or electrically connected to the mainboard 1010 .
- these other components may include, for example, a camera module 1050 , an antenna 1060 , a display device 1070 , and a battery 1080 .
- these other components may include an audio codec, a video codec, a power amplifier, a compass, an accelerometer, a gyroscope, a speaker, amass storage unit (for example, a hard disk drive), a compact disk (CD) drive), a digital versatile disk (DVD) drive, or the like.
- amass storage unit for example, a hard disk drive), a compact disk (CD) drive
- DVD digital versatile disk
- other components used for various purposes depending on a type of electronic device 1000 , or the like may be included.
- the electronic device 1000 may be a smartphone, a personal digital assistant (PDA), a digital video camera, a digital still camera, a network system, a computer, a monitor, a tablet PC, a laptop PC, a netbook PC, a television, a video game machine, a smartwatch, an automotive component, or the like.
- PDA personal digital assistant
- the electronic device 1000 is not limited thereto, and may be any other electronic device processing data.
- FIG. 2 is a perspective diagram illustrating an example of an electronic device.
- the electronic device may be implemented by a smartphone 1100 .
- a mainboard 1110 may be accommodated in a smartphone 1100 , and various electronic components 1120 may be physically or electrically connected to the mainboard 1110 .
- Other electronic components which may or may not be physically or electrically connected to the mainboard 1110 , such as the camera module 1130 and/or the speaker 1140 , may be accommodated therein.
- Some of the components 1120 may be the chip related components, such as a component package 1121 , for example, but an example embodiment thereof is not limited thereto.
- electronic components may be disposed on a multilayer printed circuit board in the form of surface mounting, but an example embodiment thereof is not limited thereto.
- the electronic device is not necessarily limited to the smartphone 1100 , and may be other electronic devices as described above.
- FIG. 3 is a cross-sectional diagram illustrating a printed circuit board according to an example embodiment.
- a printed circuit board in the example embodiment may include an insulating layer 110 , a wiring layer 120 , a pad 130 , a protective layer 140 , and a conductive post 150 .
- the number of the insulating layers 110 is not limited to any particular example, and may be configured as a single insulating layer 110 or a plurality of insulating layers 110 .
- an insulating material such as a thermosetting resin such as an epoxy resin, a thermoplastic resin such as a polyimide resin, or resin in which the thermosetting resin or the thermoplastic resin is impregnated in a core material such as a glass fiber (glass cloth or glass fabic) with an inorganic filler, such as prepreg, an ajinomoto build-up film (ABF), FR-4, bismaleimide triazine (BT), or the like, may be used.
- a thermosetting resin such as an epoxy resin
- a thermoplastic resin such as a polyimide resin
- resin in which the thermosetting resin or the thermoplastic resin is impregnated in a core material such as a glass fiber (glass cloth or glass fabic) with an inorganic filler, such as prepreg, an ajinomoto build-up film (ABF), FR-4, bismaleimide triazine (BT), or the like.
- ABS ajinomoto build-up film
- FR-4 FR-4
- the wiring layer 120 may be formed on the insulating layer 110 .
- the wiring layer 120 may be disposed on the insulating layer 120 or may be buried in the insulating layer 110 .
- the wiring layer 120 may also be configured as a plurality of wiring layers 120 , and in this case, the plurality of wiring layers 120 may be formed on the plurality of insulating layers 110 , respectively.
- a conductive material such as copper (Cu), aluminum (Al), silver (Ag), tin (Sn), gold (Au), nickel (Ni), lead (Pb), titanium (Ti), or alloys thereof may be used.
- a method of forming the wiring layer 120 is not limited to any particular method, and a first plating layer working as a seed layer may be formed by electroless plating, and a second plating layer may be formed on the first plating layer by electrolytic plating, thereby forming the wiring layer 120 .
- the wiring layer 120 may include a plurality of metal layers.
- the printed circuit board in the example embodiment may further include a via penetrating the insulating layer 110 and connecting the wiring layers 120 and the pad 130 disposed on different levels to each other.
- the pad 130 may be formed on the insulating layer 110 , and may have a protrusion P.
- the protrusion P may protrude from one surface of the pad 130 , and a region protruding from the one surface of the pad 130 may form the protrusion P.
- the protrusion P may be configured as a plurality of protrusions P spaced apart from each other.
- the number of the plurality of protrusions P is not limited to any particular example, and the protrusion P may have a greater number of protrusions P than the example illustrated in the diagram.
- the protrusion P of the printed circuit board in an example embodiment may be buried in the protective layer 140 .
- the pad 130 may include a first metal layer 131 and a second metal layer 132 disposed on the first metal layer 131 .
- the first metal layer 131 and the second metal layer 132 may have a boundary therebetween and may be distinct from each other.
- the first metal layer 131 may be disposed on the insulating layer 110 , and the second metal layer 132 may be disposed on a surface opposite to the surface of the first metal layer 131 opposing the insulating layer 110 . Referring to the diagram, the first metal layer 131 may be disposed on an upper portion of the insulating layer 110 , and the second metal layer 132 may be disposed on the upper surface of the first metal layer 131 .
- the second metal layer 132 may form the protrusion P, and accordingly, the second metal layer 132 forming the protrusion P may be buried in the protective layer 140 .
- a width of the first metal layer 131 may be different from a width of the second metal layer 132 .
- the width of the second metal layer 132 forming the protrusion P may be narrower than the width of the first metal layer 131 .
- One surface of the pad 130 on which the protrusion P is formed may be coplanar with a boundary between the first metal layer 131 and the second metal layer 132 .
- One surface of the pad 130 may be the same as one surface of the first metal layer 131 , and the second metal layer 132 forming the protrusion P may protrude from one surface of the first metal layer 131 , thereby having the above-described structure.
- a conductive material such as copper (Cu), aluminum (Al), silver (Ag), tin (Sn), gold (Au), nickel (Ni), lead (Pb), titanium (Ti), or alloys thereof may be used.
- first metal layer 131 and the second metal layer 132 is not limited to a single metal layer.
- first metal layer 131 may have a multilayer structure including a seed layer and a plating layer.
- the second metal layer 132 may also have a multilayer structure.
- the protective layer 140 may be disposed on the insulating layer 110 and may have an opening exposing at least a portion of the pad 130 .
- the protective layer 140 may be disposed on at least one of both sides of the insulating layer 110 , and may be disposed on the insulating layer 110 disposed on an uppermost side and/or a lowermost side of the plurality of insulating layers 110 .
- a portion of the pad 130 exposed by the protective layer 140 may be configured as a portion of the first metal layer 131 .
- the opening of the protective layer 140 may be formed in a region other than the region in which the second metal layer 132 is disposed and may expose the first metal layer 131 .
- the protective layer 140 may further have an opening exposing a portion of the wiring layer 120 .
- the protective layer 140 may further have an opening exposing a portion of each of the wiring layers 120 disposed on an uppermost side and/or a lowermost side of the wiring layer 120 .
- the protective layer 140 may be configured as a solder resist (SR) layer. However, an example embodiment thereof is not limited thereto, and a generally used insulating material such as Ajinomoto Build-up Film (ABF) may be used as a material for forming the protective layer 140 .
- SR solder resist
- ABSF Ajinomoto Build-up Film
- the conductive post 150 may be disposed on the insulating layer 110 and may be connected to the pad 110 .
- the conductive post 150 may fill the opening of the protective layer 140 and may be formed to protrude from the protective layer 140 .
- the conductive post 150 may have a columnar shape, but an example embodiment thereof is not limited thereto.
- a conductive material such as copper (Cu), aluminum (Al), silver (Ag), tin (Sn), gold (Au), nickel (Ni), lead (Pb), titanium (Ti), or alloys thereof, may be used.
- a contact area with the protective layer 140 may increase. Also, as the pad 130 of the printed circuit board in an example embodiment includes the protrusion P, the pad 130 may have a plurality of inflection points. Accordingly, the force applied to the pad 130 may be reduced due to the conductive post 150 .
- FIG. 4 is a cross-sectional diagram illustrating a printed circuit board according to another example embodiment.
- a structure of the pad 130 may be different from that of the pad 130 of the printed circuit board in FIG. 3 .
- the pad 130 of the printed circuit board according to another example embodiment will be described hereinafter.
- the pad 130 may be formed on the insulating layer 110 , and may have a protrusion P.
- the protrusion P may protrude from one surface of the pad 130 , and a region protruding from the one surface of the pad 130 may form the protrusion P.
- the protrusions P may be configured as a plurality of protrusions P spaced apart from each other.
- the number of the plurality of protrusions P is not limited to any particular example, and the protrusions P may have a greater number of protrusions P than the example illustrated in the diagram.
- the protrusion P may be buried in the insulating layer 110 .
- the pad 130 may include a first metal layer 131 and a second metal layer 132 disposed on the first metal layer 131 .
- the first metal layer 131 and the second metal layer 132 may have a boundary therebetween and may be distinct from each other.
- the first metal layer 131 may be disposed on the insulating layer 110 , and the second metal layer 132 may be disposed on a surface of the first metal layer 131 opposing the insulating layer 110 .
- the first metal layer 131 may be disposed on an upper side of the insulating layer 110 and the second metal layer 132 may be disposed on a lower surface of the first metal layer 131 .
- the second metal layer 132 may be buried in the insulating layer 110 , and in this case, one surface of the second metal layer 132 may be coplanar with one surface of the insulating layer 110 .
- the second metal layer 132 may form the protrusion P, and thus, the second metal layer 132 may be buried in the insulating layer 110 .
- a width of the first metal layer 131 may be different from a width of the second metal layer 132 .
- the width of the second metal layer 132 forming the protrusion P may be narrower than the width of the first metal layer 131 .
- One surface of the pad 130 on which the protrusion P is formed may be coplanar with a boundary between the first metal layer 131 and the second metal layer 132 .
- One surface of the pad 130 may be the same as one surface of the first metal layer 131 , and the second metal layer 132 forming the protrusion P may protrude from one surface of the first metal layer 131 , thereby having the above-described structure.
- a conductive material such as copper (Cu), aluminum (Al), silver (Ag), tin (Sn), gold (Au), nickel (Ni), lead (Pb), titanium (Ti), or alloys thereof may be used.
- first metal layer 131 and the second metal layer 132 is not limited to a single metal layer.
- first metal layer 131 may have a multilayer structure including a seed layer and a plating layer.
- the second metal layer 132 may also have a multilayer structure.
- a contact area with the insulating layer 110 may increase. Also, as the pad 130 of the printed circuit board in an example embodiment includes the protrusion P, the pad 130 may have a plurality of inflection points. Accordingly, the force applied to the pad 130 may be reduced due to the conductive post 150 .
- FIG. 5 is a cross-sectional diagram illustrating a printed circuit board according to another example embodiment.
- a structure of the pad 130 may be different from that of the pad 130 of the printed circuit board in FIG. 3 .
- the pad 130 of the printed circuit board according to another example embodiment will be described.
- the pad 130 may be buried in the insulating layer 110 to be exposed to one surface of the insulating layer 110 , and may include a first metal layer 131 and a second metal layer 132 disposed on the first metal layer 131 .
- the first metal layer 131 and the second metal layer 132 may have a boundary therebetween and may be distinct from each other.
- the pad 130 may be buried in the insulating layer 110 such that one surface of the first metal layer 131 may be exposed to one surface of the insulating layer 110 .
- the second metal layer 132 may be disposed on the lower surface of the first metal layer 131 , and may be buried in the insulating layer 110 such that the upper surface of the first metal layer 131 may be exposed to the upper surface of the insulating layer 110 .
- One surface of the pad 130 may be coplanar with one surface of the insulating layer 110 .
- One surface of the pad 130 may be the same as one surface of the first metal layer 131 , and thus, one surface of the first metal layer 131 may be coplanar with one surface of the insulating layer 110 .
- a width of the first metal layer 131 may be different from a width of the second metal layer 132 .
- the width of the first metal layer 131 may be narrower than the width of the second metal layer 132 .
- the width of the second metal layer 132 may be narrower than the width of the first metal layer 131 .
- the pad 130 may include a region having a stepped portion. Specifically, the pad 130 may include a region in which the first metal layer 131 is not formed on the second metal layer 132 , such that a stepped portion may be formed between the region in which both the first metal layer 131 and the second metal layer 132 are formed and the region in which only the second metal layer 132 is formed.
- a conductive material such as copper (Cu), aluminum (Al), silver (Ag), tin (Sn), gold (Au), nickel (Ni), lead (Pb), titanium (Ti), or alloys thereof may be used.
- first metal layer 131 and the second metal layer 132 is not limited to a single metal layer.
- first metal layer 131 may have a multilayer structure including a seed layer and a plating layer.
- the second metal layer 132 may also have a multilayer structure.
- the pad may include a region having a stepped portion, such that a contact area with the insulating layer 110 may increase. Also, as the pad 130 of the printed circuit board in the example embodiment includes the region having a stepped portion, the pad 130 may have a plurality of inflection points. Accordingly, the force applied to the pad 130 may be reduced due to the conductive post 150 .
- FIG. 6 is a cross-sectional diagram illustrating a printed circuit board according to another example embodiment.
- a structure of the pad 130 may be different from that of the pad 130 of the printed circuit board in FIGS. 3 and 5 .
- the pad 130 of the printed circuit board according to another example embodiment will be described.
- the pad 130 may be buried in the insulating layer 110 to be exposed to one surface of the insulating layer 110 , and may include a first metal layer 131 and a second metal layer 132 disposed on the first metal layer 131 .
- the first metal layer 131 and the second metal layer 132 may have a boundary therebetween and may be distinct from each other.
- the pad 130 may be buried in the insulating layer 110 such that one surface of the first metal layer 131 may be exposed to one surface of the insulating layer 110 .
- the second metal layer 132 may be disposed on a lower surface of the first metal layer 131 , and may be buried in the insulating layer 110 such that the upper surface of the first metal layer 131 may be exposed to the upper surface of the insulating layer 110 .
- One surface of the pad 130 may be coplanar with one surface of the insulating layer 110 .
- One surface of the pad 130 may be the same as one surface of the first metal layer 131 , and thus, one surface of the first metal layer 131 may be coplanar with one surface of the insulating layer 110 .
- a width of the first metal layer 131 may be the same as or different from a width of the second metal layer 132 .
- the pad 130 may include a region having a stepped portion.
- the pad 130 may include a through-portion H formed in the first metal layer 131 and exposing the second metal layer 132 , such that a stepped portion may be formed between the region in which both the first metal layer 131 and the second metal layer 132 are formed as the through-portion H is not formed and the region in which only the second metal layer 132 is formed as the through-portion H is formed.
- the region of the pad 130 having a stepped portion may be configured as a concave region (or a groove portion) due to the through-portion H.
- the through-portion H may be filled with the protective layer 140 . Also, the through-portions H may be configured as a plurality of through-portions H spaced apart from each other.
- a conductive material such as copper (Cu), aluminum (Al), silver (Ag), tin (Sn), gold (Au), nickel (Ni), lead (Pb), titanium (Ti), or alloys thereof may be used.
- first metal layer 131 and the second metal layer 132 is not limited to a single metal layer.
- first metal layer 131 may have a multilayer structure including a seed layer and a plating layer.
- the second metal layer 132 may also have a multilayer structure.
- a groove portion may be formed in a pad, and the pad may include a region having a stepped portion, such that a contact area with the insulating layer 110 may increase. Also, as the pad 130 of the printed circuit board in the example embodiment include the region having a stepped portion, the pad 130 may have a plurality of inflection points. Accordingly, the force applied to the pad 130 may be reduced due to the conductive post 150 .
- FIGS. 7A and 7B are cross-sectional diagrams illustrating a portion of an example embodiment of a process of manufacturing the printed circuit board illustrated in FIG. 3 .
- a base substrate in which a metal foil M 1 is formed on at least one surface of an insulating substrate 10 may be prepared.
- the base substrate may be configured as a copper clad laminate (CCL) in which copper foil is laminated on at least one surface of the insulating substrate 10 , but an example embodiment thereof is not limited thereto.
- CCL copper clad laminate
- a first resist layer R 1 may be formed on the metal foil M 1 .
- the first resist layer R 1 may have an opening in a region corresponding to the first metal layer 13 a.
- a first metal layer 13 a may be formed on the metal foil M 1 .
- the metal foil M 1 may work as a seed layer, and accordingly, the first metal layer 13 a may be formed through electrolytic plating.
- the first resist layer R 1 may be removed, and a second resist layer R 2 may be formed on the metal foil M 1 and the first metal layer 131 a .
- the second resist layer R 2 may have an opening in a region corresponding to the second metal layer 13 b.
- a second metal layer 13 b may be formed on the first metal layer 13 a .
- the first metal layer 13 a may work as a seed layer along with the metal foil M 1
- the second metal layer 13 b may be formed through electrolytic plating.
- the second resist layer R 2 may be removed, and the metal foil M 1 disposed in a region other than the region corresponding to the pad 13 may also be removed by etching.
- the metal foil M 1 , the first metal layer 13 a , and the second metal layer 13 b may form the pad 13
- the second metal layer 13 b may form the protrusion P.
- the metal foil M 1 and the first metal layer 13 a may correspond to the first metal layer 131 of the printed circuit board in FIG. 3
- the second metal layer 13 b may correspond to the second metal layer 132 of the printed circuit board in FIG. 3 .
- the pad 13 may be connected to the metal post 15 .
- the protective layer 14 may correspond to the protective layer 140 of the printed circuit board in FIG. 3
- the metal post 15 may correspond to the metal post 150 of the printed circuit board in FIG. 3 .
- FIGS. 8A and 8B are cross-sectional diagrams illustrating a portion of an example embodiment of a process of manufacturing the printed circuit board illustrated in FIG. 4 .
- a base substrate in which a first metal foil M 1 and a second metal foil M 2 are formed on at least one surface of the insulating substrate 10 may be prepared.
- the base substrate may be configured as a carrier film in which a first copper foil and a second copper foil are laminated on at least one surface of the insulating substrate 10 , but an example embodiment thereof is not limited thereto.
- a release film may be also disposed between the first metal foil M 1 and the second metal foil M 2 .
- a first resist layer R 1 may be formed on the second metal foil M 2 .
- the first resist layer R 1 may have an opening in a region corresponding to the first metal layer 13 a.
- a first metal layer 13 a may be formed on the second metal foil M 2 .
- the second metal foil M 2 may work as a seed layer, and thus, the first metal layer 13 a may be formed through electrolytic plating.
- the first resist layer R 1 may be removed, and the insulating layer 11 may be laminated on the base substrate on which the first metal layer 13 a is formed to bury the first metal layer 13 a.
- the first metal foil M 1 and the second metal foil M 2 may be separated from each other.
- a carrier film may be disposed on a surface of the insulating layer 110 opposite to the surface on which the second metal foil M 2 is disposed for ease of processing.
- a second resist layer R 2 may be formed on the second metal foil M 2 .
- the second resist layer R 2 may have an opening in a region corresponding to the second metal layer 13 b.
- a second metal layer 13 b may be formed on the second metal foil M 2 .
- the second metal foil M 2 may work as a seed layer, and the second metal layer 13 b may be formed through electrolytic plating.
- the second resist layer R 2 may be removed, and the second metal foil M 2 disposed in a region other than the region corresponding to the pad 13 may also be removed by etching.
- the second metal foil M 2 , the first metal layer 13 a , and the second metal layer 13 b may form the pad 13
- the first metal layer 13 a may form the protrusion P.
- the second metal layer 13 b may correspond to the first metal layer 131 of the printed circuit board in FIG. 4
- the second metal foil M 2 and the first metal layer 13 a may correspond to the second metal layer 132 of the printed circuit board in FIG. 4 .
- the pad 13 may be connected to the metal post 15 .
- the protective layer 14 may correspond to the protective layer 140 of the printed circuit board in FIG. 4
- the metal post 15 may correspond to the metal post 150 of the printed circuit board in FIG. 4 .
- FIGS. 9A and 9B are cross-sectional diagrams illustrating a portion of an example embodiment of a process of manufacturing the printed circuit board illustrated in FIG. 5 .
- abase substrate in which a first metal foil M 1 and a second metal foil M 2 are formed on at least one surface of an insulating substrate 10 may be prepared.
- the base substrate may be configured as a carrier film in which a first copper foil and a second copper foil are laminated on at least one surface of the insulating substrate 10 , but an example embodiment thereof is not limited thereto.
- a release film may be disposed between the first metal foil M 1 and the second metal foil M 2 .
- a first resist layer R 1 may be formed on the second metal foil M 2 .
- the first resist layer R 1 may have an opening in a region corresponding to the first metal layer 13 a.
- a first metal layer 13 a may be formed on the second metal foil M 2 .
- the second metal foil M 2 may work as a seed layer, and thus, the first metal layer 13 a may be formed through electrolytic plating.
- a second resist layer R 2 may be formed on the first resist layer R 1 .
- the second resist layer R 2 may have an opening in a region corresponding to the second metal layer 13 b.
- a second metal layer 13 b may be formed on the first metal layer 13 a .
- the first metal layer 13 a may work as a seed layer along with the second metal foil M 2 , and thus, the second metal layer 13 b may be formed through electrolytic plating.
- the first resist layer R 1 and the second resist layer R 2 may be removed, the insulating layer 11 may be laminated on the base substrate on which the first metal layer 13 a and the second metal layer 13 b are formed to bury the first metal layer 13 a and the second metal layer 13 b.
- the first metal foil M 1 and the second metal foil M 2 may be separated from each other.
- a carrier film may be disposed on a surface of the insulating layer 110 opposite to the surface on which the second metal foil M 2 is disposed for ease of the process.
- a protective layer 14 and a metal post 15 may be formed on the second metal foil M 2 .
- the second metal foil M 2 may work as a seed layer, and thus, the metal post 15 may be formed through electrolytic plating.
- the second metal foil M 2 formed in a region other than the region in which the metal post 15 is formed may be removed by etching.
- the second metal foil M 2 and the metal post 15 may form the metal post 150 of the printed circuit board in FIG. 5 .
- the first metal layer 13 a and the second metal layer 13 b may form the pad 13 .
- the first metal layer 13 a may correspond to the first metal layer 131 of the printed circuit board in FIG. 5
- the second metal layer 13 b may correspond to the second metal layer 132 of the printed circuit board in FIG. 5
- the protective layer 14 may correspond to the protective layer 140 of the printed circuit board in FIG. 5
- the metal post 15 may correspond to the metal post 150 of the printed circuit board in FIG. 5 .
- FIGS. 10A and 10B are cross-sectional diagrams illustrating a portion of an example embodiment of a process of manufacturing the printed circuit board illustrated in FIG. 6 .
- a base substrate in which a first metal foil M 1 and a second metal foil M 2 are formed on at least one surface of an insulating substrate 10 may be prepared.
- the base substrate may be configured as a carrier film in which a first copper foil and a second copper foil are laminated on at least one surface of the insulating substrate 10 , but an example embodiment thereof is not limited thereto.
- a release film may be disposed between the first metal foil M 1 and the second metal foil M 2 .
- a first resist layer R 1 may be formed on the second metal foil M 2 .
- the first resist layer R 1 may have an opening in a region corresponding to the first metal layer 13 a.
- a first metal layer 13 a may be formed on the second metal foil M 2 .
- the second metal foil M 2 may work as a seed layer, and thus, the first metal layer 13 a may be formed through electrolytic plating.
- a second resist layer R 2 may be formed on the first resist layer R 1 .
- the second resist layer R 2 may have an opening in a region corresponding to the second metal layer 13 b.
- a second metal layer 13 b may be formed on the first metal layer 13 a .
- the first metal layer 13 a may work as a seed layer along with the second metal foil M 2 , and thus, the second metal layer 13 b may be formed through electrolytic plating.
- the first resist layer R 1 and the second resist layer R 2 may be removed. In this case, a region of the first resist layer R 1 covered by the second metal layer 13 b may not be removed and may remain. Thereafter, the insulating layer 11 may be laminated on the base substrate on which the first metal layer 13 a and the second metal layer 13 b are formed to bury the first metal layer 13 a and the second metal layer 13 b.
- the first metal foil M 1 and the second metal foil M 2 may be separated from each other, and a through-portion H may be formed by removing the remaining first resist layer R 1 .
- a carrier film may be disposed on a surface of the insulating layer 110 opposite to the surface on which the second metal foil M 2 is disposed for ease of the process.
- the pad 13 may be connected to the metal post 15 .
- a seed layer may be additionally formed between the first metal layer 13 a and the metal post 15 .
- the first metal layer 13 a and the second metal layer 13 b may form the pad 13 .
- the first metal layer 13 a may correspond to the first metal layer 131 of the printed circuit board in FIG. 6
- the second metal layer 13 b may correspond to the second metal layer 132 of the printed circuit board in FIG. 6
- the protective layer 14 may correspond to the protective layer 140 of the printed circuit board in FIG. 6
- the metal post 15 may correspond to the metal post 150 of the printed circuit board in FIG. 6 .
- a printed circuit board including a pad having an increased contact area with an insulating material may be provided.
- a printed circuit board including a plurality of inflection points may be provided.
- a printed circuit board which may reduce force applied to a pad may be provided.
- the expression that an element is “disposed” on another element is not intended to set a direction. Accordingly, the expression that an element is “disposed” on another element may indicate that the element is disposed on an upper side of another element or on a lower side.
- connection may not only refer to “directly connected” but also include “indirectly connected” by means of an adhesive layer, or the like.
- electrically connected may include both of the case in which elements are “physically connected” and the case in which elements are “not physically connected.”
- first may be referred to as a second element, and similarly, a second element may be referred to as a first element without departing from the scope of right of the example embodiments.
- example embodiment may not refer to one same example embodiment, and may be provided to describe and emphasize different unique features of each example embodiment.
- the above suggested example embodiments may be implemented do not exclude the possibilities of combination with features of other example embodiments. For example, even though the features described in one example embodiment are not described in the other example embodiment, the description may be understood as relevant to the other example embodiment unless otherwise indicated.
Abstract
Description
- This application claims benefit of priority to Korean Patent Application No. 10-2020-0170429 filed on Dec. 8, 2020 in the Korean Intellectual Property Office, the disclosure of which is incorporated herein by reference in its entirety.
- The present disclosure relates to a printed circuit board.
- An electronic device such as a mobile product has been designed to have a reduced thickness and size, and has been required to have improved quality. To respond to this trend, a ball grid array (BGA) package product has been implemented to have a fine pitch using a conductive post. A metal such as copper may have a relatively higher Young's modulus and a higher aspect ratio than those of solder, which may lead to an increase in the force applied to a pad connected to a conductive post, and it may be necessary to reduce the magnitude of the force applied to the pad.
- An aspect of the present disclosure is to provide a printed circuit board including a pad having an increased contact area with an insulating material.
- Another aspect of the present disclosure is to provide a printed circuit board including a plurality of inflection points.
- Another aspect of the present disclosure is to provide a printed circuit board which may reduce force applied to a pad.
- According to an example embodiment of the present disclosure, a printed circuit board includes a first insulating layer; a pad disposed on the insulating layer and having a protrusion; and a protective layer disposed on the insulating layer and having an opening exposing at least a portion of the pad. The protrusion protrudes from one surface of the pad and is buried in at least one of the insulating layer and the protective layer.
- According to another example embodiment of the present disclosure, a printed circuit board includes an insulating layer; a pad buried in the insulating layer to be exposed to one surface of the insulating layer and including a first metal layer and a second metal layer disposed on the first metal layer; a protective layer disposed on the insulating layer and having an opening exposing at least a portion of the pad; and a conductive post disposed in the opening of the protective layer, protruding from the protective layer, and connected to the pad.
- According to another example embodiment of the present disclosure, a printed circuit board includes an insulating body; a pad disposed in the insulating body and including a first metal layer and a second metal layer; and a conductive post extending from the first metal layer to protrude from the insulating body. The second metal layer is spaced apart from the conductive post.
- The above and other aspects, features, and advantages of the present disclosure will be more clearly understood from the following detailed description, taken in conjunction with the accompanying drawings, in which:
-
FIG. 1 is a block diagram illustrating an example of an electronic device system; -
FIG. 2 is a perspective diagram illustrating an example of an electronic device; -
FIG. 3 is a cross-sectional diagram illustrating a printed circuit board according to an example embodiment; -
FIG. 4 is a cross-sectional diagram illustrating a printed circuit board according to another example embodiment; -
FIG. 5 is a cross-sectional diagram illustrating a printed circuit board according to another example embodiment; -
FIG. 6 is a cross-sectional diagram illustrating a printed circuit board according to another example embodiment; -
FIGS. 7A and 7B are cross-sectional diagrams illustrating a portion of an example embodiment of a process of manufacturing the printed circuit board illustrated inFIG. 3 ; -
FIGS. 8A and 8B are cross-sectional diagrams illustrating a portion of an example embodiment of a process of manufacturing the printed circuit board illustrated inFIG. 4 ; -
FIGS. 9A and 9B are cross-sectional diagrams illustrating a portion of an example embodiment of a process of manufacturing the printed circuit board illustrated inFIG. 5 ; and -
FIGS. 10A and 10B are cross-sectional diagrams illustrating a portion of an example embodiment of a process of manufacturing the printed circuit board illustrated inFIG. 6 . - Hereinafter, embodiments of the present disclosure will be described as follows with reference to the attached drawings.
- Electronic Device
-
FIG. 1 is a block diagram illustrating an example of an electronic device system. - Referring to
FIG. 1 , anelectronic device 1000 may accommodate amainboard 1010 therein. Themainboard 1010 may include chiprelated components 1020, networkrelated components 1030,other components 1040, and the like, physically or electrically connected thereto. These components may be connected to others to be described below to formvarious signal lines 1090. - The chip
related components 1020 may include a memory chip such as a volatile memory (for example, a dynamic random access memory (DRAM)), a non-volatile memory (for example, a read only memory (ROM)), a flash memory, or the like; an application processor chip such as a central processor (for example, a central processing unit (CPU)), a graphics processor (for example, a graphics processing unit (GPU)), a digital signal processor, a cryptographic processor, a microprocessor, a microcontroller, or the like; and a logic chip such as an analog-to-digital (ADC) converter, an application-specific integrated circuit (ASIC), or the like. However, the chiprelated components 1020 are not limited thereto, and may also include other types of chip related components. Also, the chiprelated components 1020 may be combined with each other. The chiprelated components 1020 may have a package form including the above-described chip or an electronic component. - The network
related components 1030 may include protocols such as wireless fidelity (Wi-Fi) (Institute of Electrical And Electronics Engineers (IEEE) 802.11 family, or the like), worldwide interoperability for microwave access (WiMAX) (IEEE 802.16 family, or the like), IEEE 802.20, long term evolution (LTE), evolution data only (Ev-DO), high speed packet access+(HSPA+), high speed downlink packet access+(HSDPA+), high speed uplink packet access+(HSUPA+), enhanced data GSM environment (EDGE), global system for mobile communications (GSM), global positioning system (GPS), general packet radio service (GPRS), code division multiple access (CDMA), time division multiple access (TDMA), digital enhanced cordless telecommunications (DECT), Bluetooth, 3G, 4G, and 5G protocols, and any other wireless and wired protocols, designated after the abovementioned protocols. However, the networkrelated components 1030 are not limited thereto, and may also include a variety of other wireless or wired standards or protocols. Also, the networkrelated components 1030 may be combined with each other, together with the chiprelated components 1020 described above. -
Other components 1040 may include a high frequency inductor, a ferrite inductor, a power inductor, ferrite beads, a low temperature co-fired ceramic (LTCC), an electromagnetic interference (EMI) filter, a multilayer ceramic capacitor (MLCC), or the like. However,other components 1040 are not limited thereto, and may also include chip-component type passive components used for various other purposes, or the like. Also,other components 1040 may be combined with the chiprelated components 1020 or the networkrelated components 1030 described above. - Depending on a type of the
electronic device 1000, theelectronic device 1000 may include other components that may or may not be physically or electrically connected to themainboard 1010. These other components may include, for example, acamera module 1050, anantenna 1060, adisplay device 1070, and abattery 1080. However, an example embodiment thereof is not limited thereto, and these other components may include an audio codec, a video codec, a power amplifier, a compass, an accelerometer, a gyroscope, a speaker, amass storage unit (for example, a hard disk drive), a compact disk (CD) drive), a digital versatile disk (DVD) drive, or the like. In addition to the above examples, other components used for various purposes depending on a type ofelectronic device 1000, or the like, may be included. - The
electronic device 1000 may be a smartphone, a personal digital assistant (PDA), a digital video camera, a digital still camera, a network system, a computer, a monitor, a tablet PC, a laptop PC, a netbook PC, a television, a video game machine, a smartwatch, an automotive component, or the like. However, theelectronic device 1000 is not limited thereto, and may be any other electronic device processing data. -
FIG. 2 is a perspective diagram illustrating an example of an electronic device. - Referring to
FIG. 2 , the electronic device may be implemented by asmartphone 1100. Amainboard 1110 may be accommodated in asmartphone 1100, and variouselectronic components 1120 may be physically or electrically connected to themainboard 1110. Other electronic components which may or may not be physically or electrically connected to themainboard 1110, such as thecamera module 1130 and/or thespeaker 1140, may be accommodated therein. Some of thecomponents 1120 may be the chip related components, such as a component package 1121, for example, but an example embodiment thereof is not limited thereto. In the component package 1121, electronic components may be disposed on a multilayer printed circuit board in the form of surface mounting, but an example embodiment thereof is not limited thereto. The electronic device is not necessarily limited to thesmartphone 1100, and may be other electronic devices as described above. - Printed Circuit Board
-
FIG. 3 is a cross-sectional diagram illustrating a printed circuit board according to an example embodiment. - Referring to the diagram, a printed circuit board in the example embodiment may include an insulating
layer 110, awiring layer 120, apad 130, aprotective layer 140, and aconductive post 150. - The number of the insulating
layers 110 is not limited to any particular example, and may be configured as a single insulatinglayer 110 or a plurality of insulatinglayers 110. - As a material for forming the first insulating
layer 110, at least one of an insulating material such as a thermosetting resin such as an epoxy resin, a thermoplastic resin such as a polyimide resin, or resin in which the thermosetting resin or the thermoplastic resin is impregnated in a core material such as a glass fiber (glass cloth or glass fabic) with an inorganic filler, such as prepreg, an ajinomoto build-up film (ABF), FR-4, bismaleimide triazine (BT), or the like, may be used. - The
wiring layer 120 may be formed on the insulatinglayer 110. Thewiring layer 120 may be disposed on the insulatinglayer 120 or may be buried in the insulatinglayer 110. Thewiring layer 120 may also be configured as a plurality ofwiring layers 120, and in this case, the plurality ofwiring layers 120 may be formed on the plurality of insulatinglayers 110, respectively. - As a material for forming the
wiring layer 120, a conductive material such as copper (Cu), aluminum (Al), silver (Ag), tin (Sn), gold (Au), nickel (Ni), lead (Pb), titanium (Ti), or alloys thereof may be used. A method of forming thewiring layer 120 is not limited to any particular method, and a first plating layer working as a seed layer may be formed by electroless plating, and a second plating layer may be formed on the first plating layer by electrolytic plating, thereby forming thewiring layer 120. In this case, thewiring layer 120 may include a plurality of metal layers. - Although not specifically illustrated in the diagram, the printed circuit board in the example embodiment may further include a via penetrating the insulating
layer 110 and connecting the wiring layers 120 and thepad 130 disposed on different levels to each other. - The
pad 130 may be formed on the insulatinglayer 110, and may have a protrusion P. The protrusion P may protrude from one surface of thepad 130, and a region protruding from the one surface of thepad 130 may form the protrusion P. - The protrusion P may be configured as a plurality of protrusions P spaced apart from each other. The number of the plurality of protrusions P is not limited to any particular example, and the protrusion P may have a greater number of protrusions P than the example illustrated in the diagram.
- The protrusion P of the printed circuit board in an example embodiment may be buried in the
protective layer 140. - The
pad 130 may include afirst metal layer 131 and asecond metal layer 132 disposed on thefirst metal layer 131. Thefirst metal layer 131 and thesecond metal layer 132 may have a boundary therebetween and may be distinct from each other. - The
first metal layer 131 may be disposed on the insulatinglayer 110, and thesecond metal layer 132 may be disposed on a surface opposite to the surface of thefirst metal layer 131 opposing the insulatinglayer 110. Referring to the diagram, thefirst metal layer 131 may be disposed on an upper portion of the insulatinglayer 110, and thesecond metal layer 132 may be disposed on the upper surface of thefirst metal layer 131. - In this case, the
second metal layer 132 may form the protrusion P, and accordingly, thesecond metal layer 132 forming the protrusion P may be buried in theprotective layer 140. - A width of the
first metal layer 131 may be different from a width of thesecond metal layer 132. Specifically, the width of thesecond metal layer 132 forming the protrusion P may be narrower than the width of thefirst metal layer 131. - One surface of the
pad 130 on which the protrusion P is formed may be coplanar with a boundary between thefirst metal layer 131 and thesecond metal layer 132. One surface of thepad 130 may be the same as one surface of thefirst metal layer 131, and thesecond metal layer 132 forming the protrusion P may protrude from one surface of thefirst metal layer 131, thereby having the above-described structure. - As a material for forming each of the
first metal layer 131 and thesecond metal layer 132, a conductive material such as copper (Cu), aluminum (Al), silver (Ag), tin (Sn), gold (Au), nickel (Ni), lead (Pb), titanium (Ti), or alloys thereof may be used. - Each of the
first metal layer 131 and thesecond metal layer 132 is not limited to a single metal layer. For example, depending on a manufacturing process, thefirst metal layer 131 may have a multilayer structure including a seed layer and a plating layer. Thesecond metal layer 132 may also have a multilayer structure. - The
protective layer 140 may be disposed on the insulatinglayer 110 and may have an opening exposing at least a portion of thepad 130. Theprotective layer 140 may be disposed on at least one of both sides of the insulatinglayer 110, and may be disposed on the insulatinglayer 110 disposed on an uppermost side and/or a lowermost side of the plurality of insulatinglayers 110. - Since the
second metal layer 132 of the printed circuit board in an example embodiment is buried in theprotective layer 140, a portion of thepad 130 exposed by theprotective layer 140 may be configured as a portion of thefirst metal layer 131. Specifically, the opening of theprotective layer 140 may be formed in a region other than the region in which thesecond metal layer 132 is disposed and may expose thefirst metal layer 131. - Also, the
protective layer 140 may further have an opening exposing a portion of thewiring layer 120. For example, theprotective layer 140 may further have an opening exposing a portion of each of the wiring layers 120 disposed on an uppermost side and/or a lowermost side of thewiring layer 120. - The
protective layer 140 may be configured as a solder resist (SR) layer. However, an example embodiment thereof is not limited thereto, and a generally used insulating material such as Ajinomoto Build-up Film (ABF) may be used as a material for forming theprotective layer 140. - The
conductive post 150 may be disposed on the insulatinglayer 110 and may be connected to thepad 110. - The
conductive post 150 may fill the opening of theprotective layer 140 and may be formed to protrude from theprotective layer 140. Theconductive post 150 may have a columnar shape, but an example embodiment thereof is not limited thereto. - As a material for forming the
conductive post 150, a conductive material such as copper (Cu), aluminum (Al), silver (Ag), tin (Sn), gold (Au), nickel (Ni), lead (Pb), titanium (Ti), or alloys thereof, may be used. - As the
pad 130 of the printed circuit board in an example embodiment includes the protrusion P, a contact area with theprotective layer 140 may increase. Also, as thepad 130 of the printed circuit board in an example embodiment includes the protrusion P, thepad 130 may have a plurality of inflection points. Accordingly, the force applied to thepad 130 may be reduced due to theconductive post 150. -
FIG. 4 is a cross-sectional diagram illustrating a printed circuit board according to another example embodiment. - As for the printed circuit board according to another example embodiment, a structure of the
pad 130 may be different from that of thepad 130 of the printed circuit board in FIG. 3. Thus, thepad 130 of the printed circuit board according to another example embodiment will be described hereinafter. - The
pad 130 may be formed on the insulatinglayer 110, and may have a protrusion P. The protrusion P may protrude from one surface of thepad 130, and a region protruding from the one surface of thepad 130 may form the protrusion P. - The protrusions P may be configured as a plurality of protrusions P spaced apart from each other. The number of the plurality of protrusions P is not limited to any particular example, and the protrusions P may have a greater number of protrusions P than the example illustrated in the diagram.
- In the printed circuit board in another example embodiment, the protrusion P may be buried in the insulating
layer 110. - The
pad 130 may include afirst metal layer 131 and asecond metal layer 132 disposed on thefirst metal layer 131. Thefirst metal layer 131 and thesecond metal layer 132 may have a boundary therebetween and may be distinct from each other. - The
first metal layer 131 may be disposed on the insulatinglayer 110, and thesecond metal layer 132 may be disposed on a surface of thefirst metal layer 131 opposing the insulatinglayer 110. Referring to the diagram, thefirst metal layer 131 may be disposed on an upper side of the insulatinglayer 110 and thesecond metal layer 132 may be disposed on a lower surface of thefirst metal layer 131. Thesecond metal layer 132 may be buried in the insulatinglayer 110, and in this case, one surface of thesecond metal layer 132 may be coplanar with one surface of the insulatinglayer 110. - In this case, the
second metal layer 132 may form the protrusion P, and thus, thesecond metal layer 132 may be buried in the insulatinglayer 110. - A width of the
first metal layer 131 may be different from a width of thesecond metal layer 132. Specifically, the width of thesecond metal layer 132 forming the protrusion P may be narrower than the width of thefirst metal layer 131. - One surface of the
pad 130 on which the protrusion P is formed may be coplanar with a boundary between thefirst metal layer 131 and thesecond metal layer 132. One surface of thepad 130 may be the same as one surface of thefirst metal layer 131, and thesecond metal layer 132 forming the protrusion P may protrude from one surface of thefirst metal layer 131, thereby having the above-described structure. - As a material for forming each of the
first metal layer 131 and thesecond metal layer 132, a conductive material such as copper (Cu), aluminum (Al), silver (Ag), tin (Sn), gold (Au), nickel (Ni), lead (Pb), titanium (Ti), or alloys thereof may be used. - Each of the
first metal layer 131 and thesecond metal layer 132 is not limited to a single metal layer. For example, depending on a manufacturing process, thefirst metal layer 131 may have a multilayer structure including a seed layer and a plating layer. Thesecond metal layer 132 may also have a multilayer structure. - As the
pad 130 of the printed circuit board in an example embodiment includes the protrusion P, a contact area with the insulatinglayer 110 may increase. Also, as thepad 130 of the printed circuit board in an example embodiment includes the protrusion P, thepad 130 may have a plurality of inflection points. Accordingly, the force applied to thepad 130 may be reduced due to theconductive post 150. - The descriptions of the other elements may be substantially the same as in the aforementioned example embodiment with reference to
FIG. 3 , and thus, detailed descriptions thereof will not be provided. -
FIG. 5 is a cross-sectional diagram illustrating a printed circuit board according to another example embodiment. - As for the printed circuit board according to another example embodiment, a structure of the
pad 130 may be different from that of thepad 130 of the printed circuit board inFIG. 3 . Thus, thepad 130 of the printed circuit board according to another example embodiment will be described. - The
pad 130 may be buried in the insulatinglayer 110 to be exposed to one surface of the insulatinglayer 110, and may include afirst metal layer 131 and asecond metal layer 132 disposed on thefirst metal layer 131. Thefirst metal layer 131 and thesecond metal layer 132 may have a boundary therebetween and may be distinct from each other. - The
pad 130 may be buried in the insulatinglayer 110 such that one surface of thefirst metal layer 131 may be exposed to one surface of the insulatinglayer 110. Referring to the diagram, thesecond metal layer 132 may be disposed on the lower surface of thefirst metal layer 131, and may be buried in the insulatinglayer 110 such that the upper surface of thefirst metal layer 131 may be exposed to the upper surface of the insulatinglayer 110. - One surface of the
pad 130 may be coplanar with one surface of the insulatinglayer 110. One surface of thepad 130 may be the same as one surface of thefirst metal layer 131, and thus, one surface of thefirst metal layer 131 may be coplanar with one surface of the insulatinglayer 110. - A width of the
first metal layer 131 may be different from a width of thesecond metal layer 132. For example, as illustrated in the diagram, the width of thefirst metal layer 131 may be narrower than the width of thesecond metal layer 132. Alternatively, the width of thesecond metal layer 132 may be narrower than the width of thefirst metal layer 131. - The
pad 130 may include a region having a stepped portion. Specifically, thepad 130 may include a region in which thefirst metal layer 131 is not formed on thesecond metal layer 132, such that a stepped portion may be formed between the region in which both thefirst metal layer 131 and thesecond metal layer 132 are formed and the region in which only thesecond metal layer 132 is formed. - As a material for forming each of the
first metal layer 131 and thesecond metal layer 132, a conductive material such as copper (Cu), aluminum (Al), silver (Ag), tin (Sn), gold (Au), nickel (Ni), lead (Pb), titanium (Ti), or alloys thereof may be used. - Each of the
first metal layer 131 and thesecond metal layer 132 is not limited to a single metal layer. For example, depending on a manufacturing process, thefirst metal layer 131 may have a multilayer structure including a seed layer and a plating layer. Thesecond metal layer 132 may also have a multilayer structure. - In the printed circuit board according to another example embodiment, the pad may include a region having a stepped portion, such that a contact area with the insulating
layer 110 may increase. Also, as thepad 130 of the printed circuit board in the example embodiment includes the region having a stepped portion, thepad 130 may have a plurality of inflection points. Accordingly, the force applied to thepad 130 may be reduced due to theconductive post 150. - The descriptions of the other elements may be substantially the same as in the aforementioned example embodiment with reference to
FIG. 3 , and thus, detailed descriptions thereof will not be provided. -
FIG. 6 is a cross-sectional diagram illustrating a printed circuit board according to another example embodiment. - As for the printed circuit board according to another example embodiment, a structure of the
pad 130 may be different from that of thepad 130 of the printed circuit board inFIGS. 3 and 5 . Thus, thepad 130 of the printed circuit board according to another example embodiment will be described. - The
pad 130 may be buried in the insulatinglayer 110 to be exposed to one surface of the insulatinglayer 110, and may include afirst metal layer 131 and asecond metal layer 132 disposed on thefirst metal layer 131. Thefirst metal layer 131 and thesecond metal layer 132 may have a boundary therebetween and may be distinct from each other. - The
pad 130 may be buried in the insulatinglayer 110 such that one surface of thefirst metal layer 131 may be exposed to one surface of the insulatinglayer 110. Referring to the diagram, thesecond metal layer 132 may be disposed on a lower surface of thefirst metal layer 131, and may be buried in the insulatinglayer 110 such that the upper surface of thefirst metal layer 131 may be exposed to the upper surface of the insulatinglayer 110. - One surface of the
pad 130 may be coplanar with one surface of the insulatinglayer 110. One surface of thepad 130 may be the same as one surface of thefirst metal layer 131, and thus, one surface of thefirst metal layer 131 may be coplanar with one surface of the insulatinglayer 110. - A width of the
first metal layer 131 may be the same as or different from a width of thesecond metal layer 132. - The
pad 130 may include a region having a stepped portion. Specifically, thepad 130 may include a through-portion H formed in thefirst metal layer 131 and exposing thesecond metal layer 132, such that a stepped portion may be formed between the region in which both thefirst metal layer 131 and thesecond metal layer 132 are formed as the through-portion H is not formed and the region in which only thesecond metal layer 132 is formed as the through-portion H is formed. The region of thepad 130 having a stepped portion may be configured as a concave region (or a groove portion) due to the through-portion H. - The through-portion H may be filled with the
protective layer 140. Also, the through-portions H may be configured as a plurality of through-portions H spaced apart from each other. - As a material for forming each of the
first metal layer 131 and thesecond metal layer 132, a conductive material such as copper (Cu), aluminum (Al), silver (Ag), tin (Sn), gold (Au), nickel (Ni), lead (Pb), titanium (Ti), or alloys thereof may be used. - Each of the
first metal layer 131 and thesecond metal layer 132 is not limited to a single metal layer. For example, depending on a manufacturing process, thefirst metal layer 131 may have a multilayer structure including a seed layer and a plating layer. Thesecond metal layer 132 may also have a multilayer structure. - In the printed circuit board according to another example embodiment, a groove portion may be formed in a pad, and the pad may include a region having a stepped portion, such that a contact area with the insulating
layer 110 may increase. Also, as thepad 130 of the printed circuit board in the example embodiment include the region having a stepped portion, thepad 130 may have a plurality of inflection points. Accordingly, the force applied to thepad 130 may be reduced due to theconductive post 150. - The descriptions of the other elements may be substantially the same as in the aforementioned example embodiment with reference to
FIG. 3 , and thus, detailed descriptions thereof will not be provided. -
FIGS. 7A and 7B are cross-sectional diagrams illustrating a portion of an example embodiment of a process of manufacturing the printed circuit board illustrated inFIG. 3 . - Referring to the diagram, a base substrate in which a metal foil M1 is formed on at least one surface of an insulating
substrate 10 may be prepared. The base substrate may be configured as a copper clad laminate (CCL) in which copper foil is laminated on at least one surface of the insulatingsubstrate 10, but an example embodiment thereof is not limited thereto. - Thereafter, a first resist layer R1 may be formed on the metal foil M1. The first resist layer R1 may have an opening in a region corresponding to the
first metal layer 13 a. - A
first metal layer 13 a may be formed on the metal foil M1. In this case, the metal foil M1 may work as a seed layer, and accordingly, thefirst metal layer 13 a may be formed through electrolytic plating. - The first resist layer R1 may be removed, and a second resist layer R2 may be formed on the metal foil M1 and the first metal layer 131 a. The second resist layer R2 may have an opening in a region corresponding to the
second metal layer 13 b. - A
second metal layer 13 b may be formed on thefirst metal layer 13 a. In this case, thefirst metal layer 13 a may work as a seed layer along with the metal foil M1, and thesecond metal layer 13 b may be formed through electrolytic plating. - The second resist layer R2 may be removed, and the metal foil M1 disposed in a region other than the region corresponding to the
pad 13 may also be removed by etching. The metal foil M1, thefirst metal layer 13 a, and thesecond metal layer 13 b may form thepad 13, and thesecond metal layer 13 b may form the protrusion P. In this case, the metal foil M1 and thefirst metal layer 13 a may correspond to thefirst metal layer 131 of the printed circuit board inFIG. 3 , and thesecond metal layer 13 b may correspond to thesecond metal layer 132 of the printed circuit board inFIG. 3 . - By forming the
protective layer 14 and themetal post 15, thepad 13 may be connected to themetal post 15. Theprotective layer 14 may correspond to theprotective layer 140 of the printed circuit board inFIG. 3 , and themetal post 15 may correspond to themetal post 150 of the printed circuit board inFIG. 3 . - The above description is provided to describe an example of the process of manufacturing the printed circuit board according to
FIG. 3 , and the process of manufacturing the printed circuit board inFIG. 3 is not limited thereto. -
FIGS. 8A and 8B are cross-sectional diagrams illustrating a portion of an example embodiment of a process of manufacturing the printed circuit board illustrated inFIG. 4 . - Referring to the diagram, a base substrate in which a first metal foil M1 and a second metal foil M2 are formed on at least one surface of the insulating
substrate 10 may be prepared. The base substrate may be configured as a carrier film in which a first copper foil and a second copper foil are laminated on at least one surface of the insulatingsubstrate 10, but an example embodiment thereof is not limited thereto. A release film may be also disposed between the first metal foil M1 and the second metal foil M2. - A first resist layer R1 may be formed on the second metal foil M2. The first resist layer R1 may have an opening in a region corresponding to the
first metal layer 13 a. - A
first metal layer 13 a may be formed on the second metal foil M2. In this case, the second metal foil M2 may work as a seed layer, and thus, thefirst metal layer 13 a may be formed through electrolytic plating. - The first resist layer R1 may be removed, and the insulating
layer 11 may be laminated on the base substrate on which thefirst metal layer 13 a is formed to bury thefirst metal layer 13 a. - The first metal foil M1 and the second metal foil M2 may be separated from each other. In this case, a carrier film may be disposed on a surface of the insulating
layer 110 opposite to the surface on which the second metal foil M2 is disposed for ease of processing. - A second resist layer R2 may be formed on the second metal foil M2. The second resist layer R2 may have an opening in a region corresponding to the
second metal layer 13 b. - A
second metal layer 13 b may be formed on the second metal foil M2. In this case, the second metal foil M2 may work as a seed layer, and thesecond metal layer 13 b may be formed through electrolytic plating. - The second resist layer R2 may be removed, and the second metal foil M2 disposed in a region other than the region corresponding to the
pad 13 may also be removed by etching. The second metal foil M2, thefirst metal layer 13 a, and thesecond metal layer 13 b may form thepad 13, and thefirst metal layer 13 a may form the protrusion P. In this case, thesecond metal layer 13 b may correspond to thefirst metal layer 131 of the printed circuit board inFIG. 4 , and the second metal foil M2 and thefirst metal layer 13 a may correspond to thesecond metal layer 132 of the printed circuit board inFIG. 4 . - By forming the
protective layer 14 and themetal post 15, thepad 13 may be connected to themetal post 15. Theprotective layer 14 may correspond to theprotective layer 140 of the printed circuit board inFIG. 4 , and themetal post 15 may correspond to themetal post 150 of the printed circuit board inFIG. 4 . - The above description is provided to describe an example of the process of manufacturing the printed circuit board according to
FIG. 4 , and the process of manufacturing the printed circuit board inFIG. 4 is not limited thereto. -
FIGS. 9A and 9B are cross-sectional diagrams illustrating a portion of an example embodiment of a process of manufacturing the printed circuit board illustrated inFIG. 5 . - Referring to the diagram, abase substrate in which a first metal foil M1 and a second metal foil M2 are formed on at least one surface of an insulating
substrate 10 may be prepared. The base substrate may be configured as a carrier film in which a first copper foil and a second copper foil are laminated on at least one surface of the insulatingsubstrate 10, but an example embodiment thereof is not limited thereto. A release film may be disposed between the first metal foil M1 and the second metal foil M2. - A first resist layer R1 may be formed on the second metal foil M2. The first resist layer R1 may have an opening in a region corresponding to the
first metal layer 13 a. - A
first metal layer 13 a may be formed on the second metal foil M2. In this case, the second metal foil M2 may work as a seed layer, and thus, thefirst metal layer 13 a may be formed through electrolytic plating. - A second resist layer R2 may be formed on the first resist layer R1. The second resist layer R2 may have an opening in a region corresponding to the
second metal layer 13 b. - A
second metal layer 13 b may be formed on thefirst metal layer 13 a. In this case, thefirst metal layer 13 a may work as a seed layer along with the second metal foil M2, and thus, thesecond metal layer 13 b may be formed through electrolytic plating. - The first resist layer R1 and the second resist layer R2 may be removed, the insulating
layer 11 may be laminated on the base substrate on which thefirst metal layer 13 a and thesecond metal layer 13 b are formed to bury thefirst metal layer 13 a and thesecond metal layer 13 b. - The first metal foil M1 and the second metal foil M2 may be separated from each other. In this case, a carrier film may be disposed on a surface of the insulating
layer 110 opposite to the surface on which the second metal foil M2 is disposed for ease of the process. - A
protective layer 14 and ametal post 15 may be formed on the second metal foil M2. In this case, the second metal foil M2 may work as a seed layer, and thus, themetal post 15 may be formed through electrolytic plating. The second metal foil M2 formed in a region other than the region in which themetal post 15 is formed may be removed by etching. The second metal foil M2 and themetal post 15 may form themetal post 150 of the printed circuit board inFIG. 5 . - The
first metal layer 13 a and thesecond metal layer 13 b may form thepad 13. In this case, thefirst metal layer 13 a may correspond to thefirst metal layer 131 of the printed circuit board inFIG. 5 , thesecond metal layer 13 b may correspond to thesecond metal layer 132 of the printed circuit board inFIG. 5 , theprotective layer 14 may correspond to theprotective layer 140 of the printed circuit board inFIG. 5 , and themetal post 15 may correspond to themetal post 150 of the printed circuit board inFIG. 5 . - The above description is provided to describe an example of the process of manufacturing the printed circuit board according to
FIG. 5 , and the process of manufacturing the printed circuit board inFIG. 5 is not limited thereto. -
FIGS. 10A and 10B are cross-sectional diagrams illustrating a portion of an example embodiment of a process of manufacturing the printed circuit board illustrated inFIG. 6 . - Referring to the diagram, a base substrate in which a first metal foil M1 and a second metal foil M2 are formed on at least one surface of an insulating
substrate 10 may be prepared. The base substrate may be configured as a carrier film in which a first copper foil and a second copper foil are laminated on at least one surface of the insulatingsubstrate 10, but an example embodiment thereof is not limited thereto. A release film may be disposed between the first metal foil M1 and the second metal foil M2. - A first resist layer R1 may be formed on the second metal foil M2. The first resist layer R1 may have an opening in a region corresponding to the
first metal layer 13 a. - A
first metal layer 13 a may be formed on the second metal foil M2. In this case, the second metal foil M2 may work as a seed layer, and thus, thefirst metal layer 13 a may be formed through electrolytic plating. - A second resist layer R2 may be formed on the first resist layer R1. The second resist layer R2 may have an opening in a region corresponding to the
second metal layer 13 b. - A
second metal layer 13 b may be formed on thefirst metal layer 13 a. In this case, thefirst metal layer 13 a may work as a seed layer along with the second metal foil M2, and thus, thesecond metal layer 13 b may be formed through electrolytic plating. - The first resist layer R1 and the second resist layer R2 may be removed. In this case, a region of the first resist layer R1 covered by the
second metal layer 13 b may not be removed and may remain. Thereafter, the insulatinglayer 11 may be laminated on the base substrate on which thefirst metal layer 13 a and thesecond metal layer 13 b are formed to bury thefirst metal layer 13 a and thesecond metal layer 13 b. - The first metal foil M1 and the second metal foil M2 may be separated from each other, and a through-portion H may be formed by removing the remaining first resist layer R1. In this case, a carrier film may be disposed on a surface of the insulating
layer 110 opposite to the surface on which the second metal foil M2 is disposed for ease of the process. - By forming the
protective layer 14 and themetal post 15, thepad 13 may be connected to themetal post 15. In this case, to form themetal post 15, a seed layer may be additionally formed between thefirst metal layer 13 a and themetal post 15. - The
first metal layer 13 a and thesecond metal layer 13 b may form thepad 13. In this case, thefirst metal layer 13 a may correspond to thefirst metal layer 131 of the printed circuit board inFIG. 6 , thesecond metal layer 13 b may correspond to thesecond metal layer 132 of the printed circuit board inFIG. 6 , theprotective layer 14 may correspond to theprotective layer 140 of the printed circuit board inFIG. 6 , and themetal post 15 may correspond to themetal post 150 of the printed circuit board inFIG. 6 . - The above description is provided to describe an example of the process of manufacturing the printed circuit board according to
FIG. 6 , and the process of manufacturing the printed circuit board inFIG. 6 is not limited thereto. - According to the aforementioned example embodiments, a printed circuit board including a pad having an increased contact area with an insulating material may be provided.
- Also, a printed circuit board including a plurality of inflection points may be provided.
- Further, a printed circuit board which may reduce force applied to a pad may be provided.
- In the example embodiment, the expression that an element is “disposed” on another element is not intended to set a direction. Accordingly, the expression that an element is “disposed” on another element may indicate that the element is disposed on an upper side of another element or on a lower side.
- In the example embodiments, the term “connected” may not only refer to “directly connected” but also include “indirectly connected” by means of an adhesive layer, or the like. Also, the term “electrically connected” may include both of the case in which elements are “physically connected” and the case in which elements are “not physically connected.”
- The terms “first,” “second,” and the like may be used to distinguish one element from the other, and may not limit a sequence and/or an importance, or others, in relation to the elements. In some cases, a first element may be referred to as a second element, and similarly, a second element may be referred to as a first element without departing from the scope of right of the example embodiments.
- In the example embodiments, the term “example embodiment” may not refer to one same example embodiment, and may be provided to describe and emphasize different unique features of each example embodiment. The above suggested example embodiments may be implemented do not exclude the possibilities of combination with features of other example embodiments. For example, even though the features described in one example embodiment are not described in the other example embodiment, the description may be understood as relevant to the other example embodiment unless otherwise indicated.
- An expression used in the singular encompasses the expression of the plural, unless it has a clearly different meaning in the context.
- While the example embodiments have been illustrated and described above, it will be apparent to those skilled in the art that modifications and variations could be made without departing from the scope of the present invention as defined by the appended claims.
Claims (20)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US18/211,093 US20230335479A1 (en) | 2020-12-08 | 2023-06-16 | Printed circuit board |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020200170429A KR20220081020A (en) | 2020-12-08 | 2020-12-08 | Printed circuit board |
KR10-2020-0170429 | 2020-12-08 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US18/211,093 Continuation US20230335479A1 (en) | 2020-12-08 | 2023-06-16 | Printed circuit board |
Publications (1)
Publication Number | Publication Date |
---|---|
US20220181245A1 true US20220181245A1 (en) | 2022-06-09 |
Family
ID=81848212
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US17/191,485 Abandoned US20220181245A1 (en) | 2020-12-08 | 2021-03-03 | Printed circuit board |
US18/211,093 Pending US20230335479A1 (en) | 2020-12-08 | 2023-06-16 | Printed circuit board |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US18/211,093 Pending US20230335479A1 (en) | 2020-12-08 | 2023-06-16 | Printed circuit board |
Country Status (3)
Country | Link |
---|---|
US (2) | US20220181245A1 (en) |
KR (1) | KR20220081020A (en) |
CN (1) | CN114615800A (en) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5283948A (en) * | 1991-05-31 | 1994-02-08 | Cray Research, Inc. | Method of manufacturing interconnect bumps |
US20060120056A1 (en) * | 2004-12-06 | 2006-06-08 | Alps Electric Co., Ltd. | Circuit component module, electronic circuit device, and method for manufacturing the circuit component module |
US20070108572A1 (en) * | 2005-11-16 | 2007-05-17 | Industrial Technology Research Institute | Structure for reducing stress for vias and fabricating method thereof |
US20110100695A1 (en) * | 2009-11-03 | 2011-05-05 | Nan Ya Pcb Corp. | Printed circuit board structure |
US20170280560A1 (en) * | 2016-03-22 | 2017-09-28 | Samsung Electronics Co., Ltd. | Printed circuit board and semiconductor package including the same |
-
2020
- 2020-12-08 KR KR1020200170429A patent/KR20220081020A/en active Search and Examination
-
2021
- 2021-03-03 US US17/191,485 patent/US20220181245A1/en not_active Abandoned
- 2021-05-31 CN CN202110598577.7A patent/CN114615800A/en active Pending
-
2023
- 2023-06-16 US US18/211,093 patent/US20230335479A1/en active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5283948A (en) * | 1991-05-31 | 1994-02-08 | Cray Research, Inc. | Method of manufacturing interconnect bumps |
US20060120056A1 (en) * | 2004-12-06 | 2006-06-08 | Alps Electric Co., Ltd. | Circuit component module, electronic circuit device, and method for manufacturing the circuit component module |
US20070108572A1 (en) * | 2005-11-16 | 2007-05-17 | Industrial Technology Research Institute | Structure for reducing stress for vias and fabricating method thereof |
US20110100695A1 (en) * | 2009-11-03 | 2011-05-05 | Nan Ya Pcb Corp. | Printed circuit board structure |
US20170280560A1 (en) * | 2016-03-22 | 2017-09-28 | Samsung Electronics Co., Ltd. | Printed circuit board and semiconductor package including the same |
Also Published As
Publication number | Publication date |
---|---|
CN114615800A (en) | 2022-06-10 |
KR20220081020A (en) | 2022-06-15 |
US20230335479A1 (en) | 2023-10-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US11088089B2 (en) | Package substrate | |
US11658124B2 (en) | Connection structure embedded substrate | |
CN112992883A (en) | Substrate embedded with electronic component | |
US20220022310A1 (en) | Substrate with electronic component embedded therein | |
US20230245989A1 (en) | Printed circuit board and electronic component package including the same | |
CN113905516A (en) | Embedded substrate of electronic component | |
US11587878B2 (en) | Substrate having electronic component embedded therein | |
US20230105030A1 (en) | Circuit board | |
US11516914B2 (en) | Printed circuit board | |
US11039537B1 (en) | Electronic component embedded substrate | |
US20220181245A1 (en) | Printed circuit board | |
US11715680B2 (en) | Printed circuit board | |
US11856701B2 (en) | Printed circuit board | |
US20230413437A1 (en) | Printed circuit board | |
US20240032208A1 (en) | Printed circuit board and method of manufacturing the same | |
US11627659B2 (en) | Printed circuit board and electronic package comprising the same | |
US11903129B2 (en) | Printed circuit board | |
US20230189451A1 (en) | Printed circuit board and method for manufacturing the same | |
US11963301B2 (en) | Printed circuit board | |
US20240040698A1 (en) | Printed circuit board | |
US20230141412A1 (en) | Printed circuit board | |
US20230189452A1 (en) | Printed circuit board | |
US11521922B2 (en) | Printed circuit board | |
US20230057689A1 (en) | Printed circuit board | |
US11075156B2 (en) | Substrate having electronic component embedded therein |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: SAMSUNG ELECTRO-MECHANICS CO., LTD., KOREA, REPUBLIC OF Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:KO, CHAN HOON;KIM, SANG HOON;OH, YOONG;AND OTHERS;SIGNING DATES FROM 20210209 TO 20210211;REEL/FRAME:055489/0910 |
|
STPP | Information on status: patent application and granting procedure in general |
Free format text: DOCKETED NEW CASE - READY FOR EXAMINATION |
|
STPP | Information on status: patent application and granting procedure in general |
Free format text: NON FINAL ACTION MAILED |
|
STPP | Information on status: patent application and granting procedure in general |
Free format text: NON FINAL ACTION MAILED |
|
STPP | Information on status: patent application and granting procedure in general |
Free format text: FINAL REJECTION MAILED |
|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |