US20190301038A1 - Electroplating bath, method for manufacturing plated product, and plated product - Google Patents
Electroplating bath, method for manufacturing plated product, and plated product Download PDFInfo
- Publication number
- US20190301038A1 US20190301038A1 US16/285,322 US201916285322A US2019301038A1 US 20190301038 A1 US20190301038 A1 US 20190301038A1 US 201916285322 A US201916285322 A US 201916285322A US 2019301038 A1 US2019301038 A1 US 2019301038A1
- Authority
- US
- United States
- Prior art keywords
- plating
- plated
- plated product
- trivalent chromium
- black
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000009713 electroplating Methods 0.000 title claims abstract description 37
- 238000000034 method Methods 0.000 title claims description 33
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 44
- 239000011651 chromium Substances 0.000 claims abstract description 44
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 43
- 239000002113 nanodiamond Substances 0.000 claims abstract description 38
- ZMZDMBWJUHKJPS-UHFFFAOYSA-M Thiocyanate anion Chemical compound [S-]C#N ZMZDMBWJUHKJPS-UHFFFAOYSA-M 0.000 claims abstract description 11
- 239000003623 enhancer Substances 0.000 claims abstract description 8
- 238000007747 plating Methods 0.000 claims description 121
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 claims description 17
- 239000002245 particle Substances 0.000 claims description 11
- 230000001376 precipitating effect Effects 0.000 claims description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 63
- 239000000047 product Substances 0.000 description 39
- 229910052759 nickel Inorganic materials 0.000 description 32
- 239000003795 chemical substances by application Substances 0.000 description 31
- 239000000758 substrate Substances 0.000 description 19
- 229910052802 copper Inorganic materials 0.000 description 16
- 239000010949 copper Substances 0.000 description 16
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 15
- 229920003023 plastic Polymers 0.000 description 14
- 239000004033 plastic Substances 0.000 description 14
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 11
- 239000000654 additive Substances 0.000 description 10
- 239000008119 colloidal silica Substances 0.000 description 9
- 239000000243 solution Substances 0.000 description 8
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical group O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 7
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- -1 polyoxyethylene Polymers 0.000 description 6
- 239000003638 chemical reducing agent Substances 0.000 description 5
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 4
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 4
- 239000008139 complexing agent Substances 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- 239000011164 primary particle Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 229910000365 copper sulfate Inorganic materials 0.000 description 3
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 3
- YPTUAQWMBNZZRN-UHFFFAOYSA-N dimethylaminoboron Chemical compound [B]N(C)C YPTUAQWMBNZZRN-UHFFFAOYSA-N 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 235000002639 sodium chloride Nutrition 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 2
- 229920007019 PC/ABS Polymers 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 238000013019 agitation Methods 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- PHFQLYPOURZARY-UHFFFAOYSA-N chromium trinitrate Chemical compound [Cr+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O PHFQLYPOURZARY-UHFFFAOYSA-N 0.000 description 2
- GRWVQDDAKZFPFI-UHFFFAOYSA-H chromium(III) sulfate Chemical compound [Cr+3].[Cr+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRWVQDDAKZFPFI-UHFFFAOYSA-H 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- DOBRDRYODQBAMW-UHFFFAOYSA-N copper(i) cyanide Chemical compound [Cu+].N#[C-] DOBRDRYODQBAMW-UHFFFAOYSA-N 0.000 description 2
- PEVJCYPAFCUXEZ-UHFFFAOYSA-J dicopper;phosphonato phosphate Chemical compound [Cu+2].[Cu+2].[O-]P([O-])(=O)OP([O-])([O-])=O PEVJCYPAFCUXEZ-UHFFFAOYSA-J 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- 230000002708 enhancing effect Effects 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000003906 humectant Substances 0.000 description 2
- 239000010954 inorganic particle Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000003002 pH adjusting agent Substances 0.000 description 2
- 239000006174 pH buffer Substances 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920001955 polyphenylene ether Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 description 2
- 229910052939 potassium sulfate Inorganic materials 0.000 description 2
- 235000011151 potassium sulphates Nutrition 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- VGTPCRGMBIAPIM-UHFFFAOYSA-M sodium thiocyanate Chemical compound [Na+].[S-]C#N VGTPCRGMBIAPIM-UHFFFAOYSA-M 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- CBCQTCPKFYFJEU-UHFFFAOYSA-N 1,4-dioxo-1,4-dipentoxybutane-2-sulfonic acid Chemical compound CCCCCOC(=O)CC(S(O)(=O)=O)C(=O)OCCCCC CBCQTCPKFYFJEU-UHFFFAOYSA-N 0.000 description 1
- JHWIEAWILPSRMU-UHFFFAOYSA-N 2-methyl-3-pyrimidin-4-ylpropanoic acid Chemical compound OC(=O)C(C)CC1=CC=NC=N1 JHWIEAWILPSRMU-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- DEXFNLNNUZKHNO-UHFFFAOYSA-N 6-[3-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperidin-1-yl]-3-oxopropyl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1CCN(CC1)C(CCC1=CC2=C(NC(O2)=O)C=C1)=O DEXFNLNNUZKHNO-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 239000004475 Arginine Substances 0.000 description 1
- 229910021555 Chromium Chloride Inorganic materials 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 229930182556 Polyacetal Natural products 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 235000010210 aluminium Nutrition 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- ODKSFYDXXFIFQN-UHFFFAOYSA-N arginine Natural products OC(=O)C(N)CCCNC(N)=N ODKSFYDXXFIFQN-UHFFFAOYSA-N 0.000 description 1
- 238000000071 blow moulding Methods 0.000 description 1
- KXZJHVJKXJLBKO-UHFFFAOYSA-N chembl1408157 Chemical compound N=1C2=CC=CC=C2C(C(=O)O)=CC=1C1=CC=C(O)C=C1 KXZJHVJKXJLBKO-UHFFFAOYSA-N 0.000 description 1
- OIDPCXKPHYRNKH-UHFFFAOYSA-J chrome alum Chemical compound [K]OS(=O)(=O)O[Cr]1OS(=O)(=O)O1 OIDPCXKPHYRNKH-UHFFFAOYSA-J 0.000 description 1
- QSWDMMVNRMROPK-UHFFFAOYSA-K chromium(3+) trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Cr+3] QSWDMMVNRMROPK-UHFFFAOYSA-K 0.000 description 1
- WYYQVWLEPYFFLP-UHFFFAOYSA-K chromium(3+);triacetate Chemical compound [Cr+3].CC([O-])=O.CC([O-])=O.CC([O-])=O WYYQVWLEPYFFLP-UHFFFAOYSA-K 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910000361 cobalt sulfate Inorganic materials 0.000 description 1
- 229940044175 cobalt sulfate Drugs 0.000 description 1
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical class [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 description 1
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 1
- 229910000001 cobalt(II) carbonate Inorganic materials 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 239000013065 commercial product Substances 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- WPUMTJGUQUYPIV-JIZZDEOASA-L disodium (S)-malate Chemical compound [Na+].[Na+].[O-]C(=O)[C@@H](O)CC([O-])=O WPUMTJGUQUYPIV-JIZZDEOASA-L 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- HHLFWLYXYJOTON-UHFFFAOYSA-N glyoxylic acid Chemical compound OC(=O)C=O HHLFWLYXYJOTON-UHFFFAOYSA-N 0.000 description 1
- HNDVDQJCIGZPNO-UHFFFAOYSA-N histidine Natural products OC(=O)C(N)CC1=CN=CN1 HNDVDQJCIGZPNO-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 235000000396 iron Nutrition 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- WFIZEGIEIOHZCP-UHFFFAOYSA-M potassium formate Chemical compound [K+].[O-]C=O WFIZEGIEIOHZCP-UHFFFAOYSA-M 0.000 description 1
- LJCNRYVRMXRIQR-OLXYHTOASA-L potassium sodium L-tartrate Chemical compound [Na+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O LJCNRYVRMXRIQR-OLXYHTOASA-L 0.000 description 1
- ZNNZYHKDIALBAK-UHFFFAOYSA-M potassium thiocyanate Chemical compound [K+].[S-]C#N ZNNZYHKDIALBAK-UHFFFAOYSA-M 0.000 description 1
- 229940116357 potassium thiocyanate Drugs 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 235000019265 sodium DL-malate Nutrition 0.000 description 1
- 239000012279 sodium borohydride Substances 0.000 description 1
- 229910000033 sodium borohydride Inorganic materials 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 1
- 239000001394 sodium malate Substances 0.000 description 1
- 235000011006 sodium potassium tartrate Nutrition 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- DGSDBJMBHCQYGN-UHFFFAOYSA-M sodium;2-ethylhexyl sulfate Chemical compound [Na+].CCCCC(CC)COS([O-])(=O)=O DGSDBJMBHCQYGN-UHFFFAOYSA-M 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-M sulfamate Chemical compound NS([O-])(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-M 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- RYCLIXPGLDDLTM-UHFFFAOYSA-J tetrapotassium;phosphonato phosphate Chemical compound [K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])([O-])=O RYCLIXPGLDDLTM-UHFFFAOYSA-J 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1653—Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/38—Chromatising
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/08—Deposition of black chromium, e.g. hexavalent chromium, CrVI
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
- C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/623—Porosity of the layers
Definitions
- the present disclosure relates to an electroplating bath for obtaining a black plated product with a reduced yellowish color, a method for manufacturing a plated product, and a plated product.
- Plating treatment is generally carried out as one of the surface treatment techniques for decorative parts to impart appearance characteristics such as decorativeness of decorative parts including plastics, metals, glasses, and ceramics, and functionalities such as durability.
- a chromium plating layer having a metal-like appearance has a plating film with high hardness and accordingly good appearance characteristics and functionalities, and thus is used as, for example, a finishing uppermost plating layer with copper plating or nickel plating as a base.
- the products in which the trivalent chromium plating disclosed in the above patent publication is used have the problem of having a strong yellowish color (b* value) in the obtained black plating film, whereby the product marketability is impaired.
- An objective of the present disclosure is to provide an electroplating bath that reduces a yellowish color in a black plated product, a method for manufacturing a plated product, and a plated product.
- an electroplating bath is provided that is used to precipitate a black trivalent chromium layer onto an object to be plated.
- the electroplating bath includes a nanodiamond and a thiocyanate ion as color enhancers.
- a method for manufacturing a plated product having a black trivalent chromium plating film includes: forming a black trivalent chromium plating film onto an object to be plated by electroplating using the above-described electroplating bath; and applying a chromate treatment onto the black trivalent chromium plating film.
- a plated product that has a black trivalent chromium plating film in which nanodiamond particles are dispersed.
- a b* value of a surface of the plated product is four or less.
- Exemplary embodiments may have different forms, and are not limited to the examples described. However, the examples described are thorough and complete, and convey the full scope of the disclosure to one of ordinary skill in the art.
- the electroplating bath of the first embodiment is an electroplating bath for precipitating a black trivalent chromium layer onto an object to be plated, and contains trivalent chromium with nanodiamond and a thiocyanate ion as color enhancers.
- the thiocyanate ion is blended to obtain a black appearance in plated products.
- the concentration of the thiocyanate ion in the electroplating bath is not particularly limited, and is preferably 0.5 g/L to 10 g/L, and more preferably 0.5 g/L to 3 g/L.
- concentration of the thiocyanate ion is 0.5 g/L or more, a black plating appearance with a more favorable color shade is obtained.
- a jet-black appearance with a reduced yellowish color and lightness is obtained.
- concentration of the thiocyanate ion is 10 g/L or less, a black plating appearance with a more favorable color shade is efficiently obtained.
- the thiocyanate ion can be blended in the form of sodium thiocyanate, potassium thiocyanate, or the like.
- Nanodiamond is blended to obtain a jet-black specular appearance with a reduced yellowish color in plated products.
- the concentration of the nanodiamond in the electroplating bath is not particularly limited, and is preferably 0.01 to 5 g/L, more preferably 0.02 to 0.16 g/L, and further preferably 0.05 to 0.15 g/L.
- concentration of the nanodiamond is 0.01 g/L or more, a yellowish color and lightness is reduced and a better jet-black specular appearance is obtained.
- the concentration of the nanodiamond is 5 g/L or less, the dispersibility of nanodiamond particles is enhanced and a jet-black specular appearance with a reduced yellowish color and lightness is efficiently obtained.
- the nanodiamond usable has a primary particle size of less than 1 ⁇ m (nanolevel), preferably 100 nm or less, and more preferably 10 nm or less. Additionally, it is preferable to use highly dispersible nanodiamond with reduced primary particle aggregation from the viewpoint of obtaining a good black appearance with a reduced yellowish color and lightness.
- a commercial product may be used, and, for example, uDiamond (primary particle 4 to 6 nm, high dispersion grade) manufactured by Carbodeon can be used.
- a trivalent chromate is used for the trivalent chromium.
- the trivalent chromate is not particularly limited as long as it is a component publicly used for forming a trivalent chromium plating film, but examples include chromium sulfate, chrome alum, chromium nitrate, chromium chloride, and chromium acetate. These components may be used singly, or two or more may be used in combination.
- the concentration of the trivalent chromium in the electroplating bath is not particularly limited, but is preferably 1 to 100 g/L, and more preferably 10 to 50 g/L, from the viewpoint of providing a good black color tone and stability of the electroplating bath.
- additives typically used in the electroplating in which trivalent chromium is used such as a complexing agent, a conductive salt, a pH buffer, a precipitation promoter, a humectant, a catalyst, an organic substance, a leveling agent, a brightener, and a reducing agent, can be suitably used.
- the complexing agent include potassium formate and sodium malate.
- the conductive salt include ammonium chloride, sodium chloride, potassium chloride, potassium sulfate, sodium sulfate, and ammonium sulfate.
- Examples of the pH buffer include boric acid, formic acid, and acetic acid.
- Examples of the humectant include nonionic surfactants such as sodium lauryl sulfate, sodium ethylhexyl sulfate, and polyoxyethylene alkylphenyl ether.
- Examples of the other additives which control plating reactions and colors include silica, sulfur, phosphoric acid, and saccharine. An amount of each component used can be suitably adjusted and added depending on various purposes.
- An object (substrate) to be plated to which the electroplating bath of the first embodiment is applied is not particularly limited, and a known material, as long as it is an electroplatable object, can be suitably selected depending on the purpose.
- the substrate include, other than metals, plastics, glasses, and ceramics with the surface coated with a conductive material.
- the substrate made of a plastic can be suitably selected in consideration of functionalities such as hardness, workability, heat resistance, and platability and the purpose of use.
- plastic examples include acrylonitrile-butadiene-styrene (ABS) copolymers, polycarbonate (PC) plastics, PC/ABS alloys (PC/ABS blend plastics), polypropylene (PP) plastics, polyacryl plastics (polymethacryl plastics), polymethylmethacrylate (PMMA) plastics, modified polyphenylene ether (PPE) plastics, polyamide plastics, and polyacetal plastics.
- the substrate made of a plastic can be molded using a known molding method such as the injection molding method, the extrusion molding method, the blow molding method, or the compression molding method.
- the metal used for the substrate include irons, stainless steels, aluminums, aluminum alloys, titaniums, and titanium alloys. These substrates may be selected and used singly, or more than one kind may be used in combination.
- copper plating or nickel plating may be employed from the viewpoint of providing good appearance characteristics and functionalities.
- the copper plating may be formed by an electroless copper plating treatment or an electrolytic copper plating treatment. These can be suitably selected depending on the characteristics of each plating.
- an electrolytic copper plating treatment it is preferable to apply an electroless plating treatment for imparting the conductivity to the substrate surface. Examples of the electroless plating treatment include, other than the electroless copper plating treatment, an electroless nickel plating treatment.
- a known method can be suitably employed for the electroless copper plating treatment.
- examples include a formaldehyde bath in which formaldehyde is used as a reducing agent.
- the treatment can also be carried out by a bath which uses, as a reducing agent, borohydrides such as potassium tetrahydroborate, dimethyl aminoborane (DMAB), and sodium borohydride, glyoxylate, hypophosphite, phosphinate, cobalt(II) salt, and hydrazine.
- borohydrides such as potassium tetrahydroborate, dimethyl aminoborane (DMAB), and sodium borohydride, glyoxylate, hypophosphite, phosphinate, cobalt(II) salt, and hydrazine.
- the treatment when carried out by the formaldehyde bath, can be carried out by immersing the substrate into a plating bath containing, other than the formaldehyde as the reducing agent, copper sulfate as the copper salt, Rochelle salt and ethylenediaminetetraacetic acid (EDTA) as complexing agents, a pH adjusting agent, a stabilizer, a promoter, a coating modifier, and a surfactant.
- EDTA ethylenediaminetetraacetic acid
- a known method can be suitably employed for the electroless nickel plating treatment.
- the substrate is immersed into a surfactant-containing bath to degrease the substrate surface and subsequently immersed in a chromic acid/sulfuric acid solution to carry out an etching treatment onto the substrate surface.
- a catalyst represented by a Pd/Sn mixed colloid catalyst or the like is deposited on the substrate surface to activate and subsequently the electroless nickel plating treatment is carried out.
- the electroless nickel plating treatment can be carried out by immersing the substrate in a plating bath containing phosphinate, tetrahydroborate salt, DMAB, or hydrazine as a reducing agent, nickel sulfate or nickel chloride as a nickel salt, together with a complexing agent, a promoter, a stabilizer, a pH adjusting agent, and a surfactant.
- a known method can be suitably employed for the electrolytic copper plating treatment.
- the plating bath for example, any of a copper cyanide plating bath containing copper(I) cyanide and sodium cyanide, a copper pyrophosphate plating bath containing copper pyrophosphate and potassium pyrophosphate, or a copper sulfate plating bath containing copper sulfate may be employed.
- known additives such as a leveling agent, a promoter, and an inhibitor can be blended. These additives can be added by suitably adjusting the amounts blended and ratios depending on surface conditions of the substrate such as surface roughness and waviness.
- a nickel plating treatment such as semi-bright nickel (SBN) plating treatment, a bright nickel (BN) plating treatment, a dull nickel (DN) plating treatment, or a microporous nickel plating treatment, may be applied to the above copper plating layer.
- SBN semi-bright nickel
- BN bright nickel
- DN dull nickel
- microporous nickel plating treatment may be applied to the above copper plating layer.
- a known method can be suitably employed for the nickel plating treatment. More specifically, examples include methods that use a Watts bath, an all-chloride bath, a sulfamate bath, and a wood's strike bath. To the plating bath, a known brightener applicable to a nickel plating treatment may be blended from the viewpoint of imparting brightness to a nickel plating layer.
- the method for precipitating a black trivalent chromium plating layer onto the surface of an object to be plated by a trivalent chromium plating treatment using the electroplating bath of the first embodiment can be carried out under the conditions of a pH range from 2.5 to 4.5, a bath temperature range from 30 to 50° C., and a current density range from 1 to 20 A/dm 2 , of a plating bath.
- nanodiamond is blended as a color enhancer. Accordingly, a plated product obtained using such an electroplating bath obtains a jet-black appearance with a reduced yellowish color. It is presumed that the nanodiamond has a low transmittance compared with colloidal silica that has been conventionally used and thus can reduce an input reflected yellowish color thereby reducing a b* value.
- the electroplating bath of the first embodiment has the following advantages.
- nanodiamond is blended as a color enhancer. Accordingly, a plated product obtained using such an electroplating bath obtains a jet-black appearance with a reduced yellowish color. Further, a thiocyanate ion is blended as a color enhancer. Accordingly, the plated product obtains a jet-black appearance with a reduced lightness.
- the plated product of the second embodiment is a plated product having a black trivalent chromium plating film in which nanodiamond particles are dispersed and a b* value of the surface of the plated product is four or less.
- a b* value of the surface of the plated product can be measured using a spectrophotometer (e.g., manufactured by Konica Minolta, Inc.: CM-700D).
- the plated product of the second embodiment preferably has an L* value of the surface of fifty or less.
- the black trivalent chromium plating film obtains a richer jet-black appearance.
- a method for manufacturing the plated product of the second embodiment can be preferably carried out using the electroplating bath of the first embodiment.
- the above plated product is obtained by a step of forming a black trivalent chromium plating film by electroplating onto an object to be plated using the plating bath of the first embodiment.
- those described in the first embodiment section can be employed.
- the concentration of the nanodiamond in the electroplating bath is set in a range from 0.02 to 0.16 g/L.
- An object to be plated may have copper plating or nickel plating applied as a base plating treatment before applying a trivalent chromium plating treatment from the viewpoint of easily obtaining a plated product that meets the requirement of the second embodiment.
- the nickel plating treatment include a semi-bright nickel (SBN) plating treatment, a bright nickel (BN) plating treatment, a dull nickel (DN) plating treatment, and a microporous nickel plating treatment. It is preferable that, for example, copper plating, semi-bright nickel plating, bright nickel plating, and microporous nickel plating be sequentially applied to a substrate composing an object to be plated.
- a chromate treatment is further applied to a black trivalent chromium plating film to form a chromate film.
- a plated product having a black trivalent chromium plating film in which nanodiamond particles are dispersed obtains a jet-black appearance with a more reduced yellowish color (b* value) and lightness (L* value).
- a known method can be suitably employed for a chromate treatment.
- Examples of the chromate treatment include the electrolytic chromate method and the immersion chromate method.
- Examples of the electrolytic chromate include a method in which ECR500 (manufactured by JUC) is used as an electrolyte and electrolysis is carried out at 50 to 60° C. for 1 to 2 minutes at a current density of 0.5 A/dm 2 .
- the immersion chromate method is carried out by the immersion in a chromic acid bath.
- Examples of a solution composition for the chromic acid bath include those having a chromic acid or a sodium dichromate as a main component.
- a chromate treatment is carried out by immersion using a solution consisting of 200 g/L of a chromic anhydride, 20 g/L of sulfuric acid, and 10 g/L of NaF, at 50 to 60° C. for 1 to 3 minutes.
- the plated product of the second embodiment has the following advantages.
- the plated product having a black trivalent chromium plating film in which nanodiamond particles are dispersed has a b* value of the surface thereof of four or less. Accordingly, the jet-black plated product having a trivalent chromium plating film obtains a reduced yellowish color.
- the shape and purpose of use of an object to be plated (plated product) of the above embodiment are not particularly limited and can be suitably employed in the fields of interior or exterior parts for vehicles, electrical and electronic parts, and daily necessities.
- the structure in which a copper plating layer, a semi-bright nickel plating layer, a bright nickel plating layer, and a microporous nickel plating layer are laminated as base plating layers has been described as an example, but is not limited to these metal plating layers.
- Metals or metal alloys such as Cu, Zn, Cr, Mo, Fe, Pb, Sn, and Ni are suitably selected to form a base plating layer. Additionally, the lamination sequence is not particularly limited.
- an electroless nickel or copper plating treatment is applied as a pretreatment when an electroplating treatment is applied to an object to be plated, but a method other than such a plating treatment may be used.
- the temperature and time for each plating treatment can be suitably determined in consideration of kind and productivity of an object to be plated.
- a trivalent chromium plating treatment using an electroplating bath of each Example was carried out and an obtained plated product of each Example was evaluated for appearance characteristics (yellowish color, lightness).
- a base plating treatment was carried out onto an ABS plastic to which conductivity was imparted by a pretreatment.
- the base plating treatment was carried out by immersing the conductive ABS plastic substrate in various metal plating baths according to a routine method so that a copper plating layer, a semi-bright nickel plating layer, a bright nickel plating layer, and a microporous nickel plating layer were sequentially laminated.
- a 2.5 mL/L of a uDiamond plating additive dispersion (primary particle 4 to 6 nm) manufactured by Carbodeon was added as the nanodiamond to a plating bath base solution (agent B was not used, 5 mL/L of agent D, and 40 mL/L of agent K) for trivalent chromium plating shown in Table 1 so that an amount of nanodiamond was 0.05 g/L in the plating bath.
- the base plating-treated object to be plated was subjected to the trivalent chromium plating treatment under the conditions shown in Table 2 and nanodiamond particles were coprecipitated.
- the plating-treated product to which the trivalent chromium plating treatment was applied, was further subjected to a chromate treatment.
- the chromate treatment was carried out using ECR500 (manufactured by JUC) according to a routine method.
- the obtained chromate plating-treated object was evaluated on the surface appearance for the obtainment of bright appearance according to the criteria shown below. Additionally, the values of L* and b* at the surface were respectively measured using a spectrophotometer (manufactured by Konica Minolta, Inc.: CM-700D). Results are shown in Table 3.
- Agent A 150 mL/L Chromium sulfate Agent B Amount used as in Silicon dioxide (colloidal Table 3 silica) Agent D Amount used as in Sodium thiocyanate Table 3 Agent G 30 mL/L Sulfuric acid Agent J 4 mL/L Cobalt sulfate Agent K 40 mL/L or 80 mL/L Arginine (Arg), histidine (His) Agent S 280 g/L Potassium sulfate, boric acid Agent W 1.5 mL/L Dipentyl sulfosuccinate
- Example 2 A procedure was carried out in the same manner as in Example 1 except that agent D, agent B, and nanodiamond (manufactured by Carbodeon: uDiamond plating additive dispersion) respectively in the amounts shown in Table 3 and 40 mL/L of agent K were used. Results are shown in Table 3, respectively.
- Example 2 A procedure was carried out in the same manner as in Example 1 except that agent D, agent B, and nanodiamond (manufactured by Carbodeon: uDiamond plating additive dispersion) respectively in the amounts shown in Table 3 and 80 mL/L of agent K were used. Results are shown in Table 3, respectively.
- Example 3 A procedure was carried out in the same manner as in Example 1 except that a trivalent chromium plating bath with which agent D in the amount shown in Table 3 and 40 mL/L of agent K were blended, and agent B and nanodiamond was not blended was used. Results are shown in Table 3.
- Example 3 A procedure was carried out in the same manner as in Example 1 except that a trivalent chromium plating bath with which agent D and agent B in the amounts shown in Table 3 and 40 mL/L of agent K were blended, and nanodiamond was not blended was used. Results are shown in Table 3.
- Example 2 A procedure was carried out in the same manner as in Example 1 except that a trivalent chromium plating bath with which agent D in the amount shown in Table 3 and 40 mL/L of agent K were blended, and nanodiamond was not blended but further 4 mL/L of agent B, in which colloidal silica is replaced with TiO 2 particles (average particle size 7 nm), was blended. TiO 2 particle was in the same concentration as the colloidal silica in agent B.
- the obtained chromate plating-treated product of Comparative Example 3 failed to obtain a desired bright appearance and thus was not measured for L* and b* values at the surface.
- Comparative Example 1 which did not contain the nanodiamond
- Comparative Example 2 in which colloidal silica was used in place of the nanodiamond, it was confirmed that the yellowish color at the surface was not reduced. Further, Comparative Example 3, in which a titanium oxide was used as the inorganic particle failed to obtain a jet-black bright appearance.
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Abstract
An electroplating bath is configured to precipitate a black trivalent chromium layer onto an object to be plated. The electroplating bath includes a nanodiamond and a thiocyanate ion as color enhancers.
Description
- The present disclosure relates to an electroplating bath for obtaining a black plated product with a reduced yellowish color, a method for manufacturing a plated product, and a plated product.
- Plating treatment is generally carried out as one of the surface treatment techniques for decorative parts to impart appearance characteristics such as decorativeness of decorative parts including plastics, metals, glasses, and ceramics, and functionalities such as durability. In such plating treatment, a chromium plating layer having a metal-like appearance has a plating film with high hardness and accordingly good appearance characteristics and functionalities, and thus is used as, for example, a finishing uppermost plating layer with copper plating or nickel plating as a base.
- In recent years, a demand for rich jet-black appearance has been increasing from the viewpoint of design, and for this reason, a trivalent chromium plating treatment is sometimes applied to products for vehicles. Products to which trivalent chromium plating is applied as disclosed in, for example, Japanese Laid-Open Patent Publication No. 2017-106119 have been conventionally known. The same patent publication discloses the use of a trivalent chromium plating solution having the thiocyanate ion and colloidal silica as color enhancing additives. A jet-black specular appearance enhances its color tone when a color enhancing additive such as colloidal silica is blended into a trivalent chromium plating solution.
- However, the products in which the trivalent chromium plating disclosed in the above patent publication is used have the problem of having a strong yellowish color (b* value) in the obtained black plating film, whereby the product marketability is impaired.
- An objective of the present disclosure is to provide an electroplating bath that reduces a yellowish color in a black plated product, a method for manufacturing a plated product, and a plated product.
- This Summary is provided to introduce a selection of concepts in a simplified form that are further described below in the Detailed Description. This Summary is not intended to identify key features or essential features of the claimed subject matter, nor is it intended to be used as an aid in determining the scope of the claimed subject matter.
- In accordance with a first aspect of the present disclosure, an electroplating bath is provided that is used to precipitate a black trivalent chromium layer onto an object to be plated. The electroplating bath includes a nanodiamond and a thiocyanate ion as color enhancers.
- In accordance with a second aspect of the present disclosure, a method for manufacturing a plated product having a black trivalent chromium plating film is provided. The method includes: forming a black trivalent chromium plating film onto an object to be plated by electroplating using the above-described electroplating bath; and applying a chromate treatment onto the black trivalent chromium plating film.
- In accordance with a third aspect of the present disclosure, a plated product is provided that has a black trivalent chromium plating film in which nanodiamond particles are dispersed. A b* value of a surface of the plated product is four or less.
- This description provides a comprehensive understanding of the methods, apparatuses, and/or systems described. Modifications and equivalents of the methods, apparatuses, and/or systems described are apparent to one of ordinary skill in the art. Sequences of operations are exemplary, and may be changed as apparent to one of ordinary skill in the art, with the exception of operations necessarily occurring in a certain order. Descriptions of functions and constructions that are well known to one of ordinary skill in the art may be omitted.
- Exemplary embodiments may have different forms, and are not limited to the examples described. However, the examples described are thorough and complete, and convey the full scope of the disclosure to one of ordinary skill in the art.
- Hereinafter, an electroplating bath according to a first embodiment of the present disclosure will be described. The electroplating bath of the first embodiment is an electroplating bath for precipitating a black trivalent chromium layer onto an object to be plated, and contains trivalent chromium with nanodiamond and a thiocyanate ion as color enhancers.
- The thiocyanate ion is blended to obtain a black appearance in plated products. The concentration of the thiocyanate ion in the electroplating bath is not particularly limited, and is preferably 0.5 g/L to 10 g/L, and more preferably 0.5 g/L to 3 g/L. When the concentration of the thiocyanate ion is 0.5 g/L or more, a black plating appearance with a more favorable color shade is obtained. In particular, when used with the nanodiamond, a jet-black appearance with a reduced yellowish color and lightness is obtained. When the concentration of the thiocyanate ion is 10 g/L or less, a black plating appearance with a more favorable color shade is efficiently obtained. The thiocyanate ion can be blended in the form of sodium thiocyanate, potassium thiocyanate, or the like.
- Nanodiamond is blended to obtain a jet-black specular appearance with a reduced yellowish color in plated products. The concentration of the nanodiamond in the electroplating bath is not particularly limited, and is preferably 0.01 to 5 g/L, more preferably 0.02 to 0.16 g/L, and further preferably 0.05 to 0.15 g/L. When the concentration of the nanodiamond is 0.01 g/L or more, a yellowish color and lightness is reduced and a better jet-black specular appearance is obtained. When the concentration of the nanodiamond is 5 g/L or less, the dispersibility of nanodiamond particles is enhanced and a jet-black specular appearance with a reduced yellowish color and lightness is efficiently obtained.
- The nanodiamond usable has a primary particle size of less than 1 μm (nanolevel), preferably 100 nm or less, and more preferably 10 nm or less. Additionally, it is preferable to use highly dispersible nanodiamond with reduced primary particle aggregation from the viewpoint of obtaining a good black appearance with a reduced yellowish color and lightness. Alternatively, a commercial product may be used, and, for example, uDiamond (primary particle 4 to 6 nm, high dispersion grade) manufactured by Carbodeon can be used.
- For the trivalent chromium, a trivalent chromate is used. Specific examples of the trivalent chromate is not particularly limited as long as it is a component publicly used for forming a trivalent chromium plating film, but examples include chromium sulfate, chrome alum, chromium nitrate, chromium chloride, and chromium acetate. These components may be used singly, or two or more may be used in combination. The concentration of the trivalent chromium in the electroplating bath is not particularly limited, but is preferably 1 to 100 g/L, and more preferably 10 to 50 g/L, from the viewpoint of providing a good black color tone and stability of the electroplating bath.
- Known additives typically used in the electroplating in which trivalent chromium is used, such as a complexing agent, a conductive salt, a pH buffer, a precipitation promoter, a humectant, a catalyst, an organic substance, a leveling agent, a brightener, and a reducing agent, can be suitably used. Within a range which does not inhibit the advantages of the present disclosure, other additives that control plating reactions and colors may be used. Examples of the complexing agent include potassium formate and sodium malate. Examples of the conductive salt include ammonium chloride, sodium chloride, potassium chloride, potassium sulfate, sodium sulfate, and ammonium sulfate. Examples of the pH buffer include boric acid, formic acid, and acetic acid. Examples of the humectant include nonionic surfactants such as sodium lauryl sulfate, sodium ethylhexyl sulfate, and polyoxyethylene alkylphenyl ether. Examples of the other additives which control plating reactions and colors include silica, sulfur, phosphoric acid, and saccharine. An amount of each component used can be suitably adjusted and added depending on various purposes.
- An object (substrate) to be plated to which the electroplating bath of the first embodiment is applied is not particularly limited, and a known material, as long as it is an electroplatable object, can be suitably selected depending on the purpose. Examples of the substrate include, other than metals, plastics, glasses, and ceramics with the surface coated with a conductive material. The substrate made of a plastic can be suitably selected in consideration of functionalities such as hardness, workability, heat resistance, and platability and the purpose of use. Examples of the plastic include acrylonitrile-butadiene-styrene (ABS) copolymers, polycarbonate (PC) plastics, PC/ABS alloys (PC/ABS blend plastics), polypropylene (PP) plastics, polyacryl plastics (polymethacryl plastics), polymethylmethacrylate (PMMA) plastics, modified polyphenylene ether (PPE) plastics, polyamide plastics, and polyacetal plastics. The substrate made of a plastic can be molded using a known molding method such as the injection molding method, the extrusion molding method, the blow molding method, or the compression molding method. Examples of the metal used for the substrate include irons, stainless steels, aluminums, aluminum alloys, titaniums, and titanium alloys. These substrates may be selected and used singly, or more than one kind may be used in combination.
- When the substrate surface is coated with a conductive material, copper plating or nickel plating may be employed from the viewpoint of providing good appearance characteristics and functionalities. The copper plating may be formed by an electroless copper plating treatment or an electrolytic copper plating treatment. These can be suitably selected depending on the characteristics of each plating. When an electrolytic copper plating treatment is applied, it is preferable to apply an electroless plating treatment for imparting the conductivity to the substrate surface. Examples of the electroless plating treatment include, other than the electroless copper plating treatment, an electroless nickel plating treatment.
- A known method can be suitably employed for the electroless copper plating treatment. Examples include a formaldehyde bath in which formaldehyde is used as a reducing agent. Also, the treatment can also be carried out by a bath which uses, as a reducing agent, borohydrides such as potassium tetrahydroborate, dimethyl aminoborane (DMAB), and sodium borohydride, glyoxylate, hypophosphite, phosphinate, cobalt(II) salt, and hydrazine. For example, the treatment, when carried out by the formaldehyde bath, can be carried out by immersing the substrate into a plating bath containing, other than the formaldehyde as the reducing agent, copper sulfate as the copper salt, Rochelle salt and ethylenediaminetetraacetic acid (EDTA) as complexing agents, a pH adjusting agent, a stabilizer, a promoter, a coating modifier, and a surfactant.
- A known method can be suitably employed for the electroless nickel plating treatment. For example, when an ABS plastic is used as the substrate, the substrate is immersed into a surfactant-containing bath to degrease the substrate surface and subsequently immersed in a chromic acid/sulfuric acid solution to carry out an etching treatment onto the substrate surface. Then, a catalyst represented by a Pd/Sn mixed colloid catalyst or the like is deposited on the substrate surface to activate and subsequently the electroless nickel plating treatment is carried out. The electroless nickel plating treatment can be carried out by immersing the substrate in a plating bath containing phosphinate, tetrahydroborate salt, DMAB, or hydrazine as a reducing agent, nickel sulfate or nickel chloride as a nickel salt, together with a complexing agent, a promoter, a stabilizer, a pH adjusting agent, and a surfactant.
- A known method can be suitably employed for the electrolytic copper plating treatment. For the plating bath, for example, any of a copper cyanide plating bath containing copper(I) cyanide and sodium cyanide, a copper pyrophosphate plating bath containing copper pyrophosphate and potassium pyrophosphate, or a copper sulfate plating bath containing copper sulfate may be employed. In the plating bath, known additives such as a leveling agent, a promoter, and an inhibitor can be blended. These additives can be added by suitably adjusting the amounts blended and ratios depending on surface conditions of the substrate such as surface roughness and waviness.
- Further, for a base layer of the substrate to which the electroplating bath of the first embodiment is applied, a nickel plating treatment such as semi-bright nickel (SBN) plating treatment, a bright nickel (BN) plating treatment, a dull nickel (DN) plating treatment, or a microporous nickel plating treatment, may be applied to the above copper plating layer. These nickel plating layers reduce the corrosion and thus improve the durability of plated products.
- A known method can be suitably employed for the nickel plating treatment. More specifically, examples include methods that use a Watts bath, an all-chloride bath, a sulfamate bath, and a wood's strike bath. To the plating bath, a known brightener applicable to a nickel plating treatment may be blended from the viewpoint of imparting brightness to a nickel plating layer.
- Conventionally known conditions can be employed for the method for precipitating a black trivalent chromium plating layer onto the surface of an object to be plated by a trivalent chromium plating treatment using the electroplating bath of the first embodiment. For example, the method can be carried out under the conditions of a pH range from 2.5 to 4.5, a bath temperature range from 30 to 50° C., and a current density range from 1 to 20 A/dm2, of a plating bath.
- Next, operation of the electroplating bath of the first embodiment configured as above will be described below.
- In the electroplating bath for precipitating a black trivalent chromium layer onto an object to be plated of the first embodiment, nanodiamond is blended as a color enhancer. Accordingly, a plated product obtained using such an electroplating bath obtains a jet-black appearance with a reduced yellowish color. It is presumed that the nanodiamond has a low transmittance compared with colloidal silica that has been conventionally used and thus can reduce an input reflected yellowish color thereby reducing a b* value.
- The electroplating bath of the first embodiment has the following advantages.
- (1) In the electroplating bath for precipitating a black trivalent chromium layer onto an object to be plated of the first embodiment, nanodiamond is blended as a color enhancer. Accordingly, a plated product obtained using such an electroplating bath obtains a jet-black appearance with a reduced yellowish color. Further, a thiocyanate ion is blended as a color enhancer. Accordingly, the plated product obtains a jet-black appearance with a reduced lightness.
- (2) When the concentration of the nanodiamond ranging from 0.02 to 0.16 g/L is employed, a yellowish color and lightness is reduced, enabling the obtainment of a richer jet-black specular appearance. Additionally, the dispersibility of nanodiamond particles is enhanced and thus a jet-black specular appearance with a reduced yellowish color and lightness is efficiently obtained.
- Hereinafter, a plated produce according to a second embodiment of the present disclosure will be described. Differences from the first embodiment will mainly be described. The plated product of the second embodiment is a plated product having a black trivalent chromium plating film in which nanodiamond particles are dispersed and a b* value of the surface of the plated product is four or less. A b* value of the surface of the plated product can be measured using a spectrophotometer (e.g., manufactured by Konica Minolta, Inc.: CM-700D).
- Further, the plated product of the second embodiment preferably has an L* value of the surface of fifty or less. With such a characteristic feature, the black trivalent chromium plating film obtains a richer jet-black appearance.
- A method for manufacturing the plated product of the second embodiment can be preferably carried out using the electroplating bath of the first embodiment.
- Specifically, the above plated product is obtained by a step of forming a black trivalent chromium plating film by electroplating onto an object to be plated using the plating bath of the first embodiment. For plating conditions, those described in the first embodiment section can be employed. When the requirement for an L* value of the plated product surface of fifty or less is met, it is preferable for the concentration of the nanodiamond in the electroplating bath to be set in a range from 0.02 to 0.16 g/L.
- For an object to be plated, those described in the first embodiment can be employed. An object to be plated may have copper plating or nickel plating applied as a base plating treatment before applying a trivalent chromium plating treatment from the viewpoint of easily obtaining a plated product that meets the requirement of the second embodiment. Examples of the nickel plating treatment include a semi-bright nickel (SBN) plating treatment, a bright nickel (BN) plating treatment, a dull nickel (DN) plating treatment, and a microporous nickel plating treatment. It is preferable that, for example, copper plating, semi-bright nickel plating, bright nickel plating, and microporous nickel plating be sequentially applied to a substrate composing an object to be plated.
- Additionally, it is preferable that a chromate treatment is further applied to a black trivalent chromium plating film to form a chromate film. When such a treatment is applied, a plated product having a black trivalent chromium plating film in which nanodiamond particles are dispersed obtains a jet-black appearance with a more reduced yellowish color (b* value) and lightness (L* value).
- A known method can be suitably employed for a chromate treatment.
- Examples of the chromate treatment include the electrolytic chromate method and the immersion chromate method. Examples of the electrolytic chromate include a method in which ECR500 (manufactured by JUC) is used as an electrolyte and electrolysis is carried out at 50 to 60° C. for 1 to 2 minutes at a current density of 0.5 A/dm2. The immersion chromate method is carried out by the immersion in a chromic acid bath. Examples of a solution composition for the chromic acid bath include those having a chromic acid or a sodium dichromate as a main component. For example, a chromate treatment is carried out by immersion using a solution consisting of 200 g/L of a chromic anhydride, 20 g/L of sulfuric acid, and 10 g/L of NaF, at 50 to 60° C. for 1 to 3 minutes.
- The plated product of the second embodiment has the following advantages.
- (3) In the second embodiment, the plated product having a black trivalent chromium plating film in which nanodiamond particles are dispersed has a b* value of the surface thereof of four or less. Accordingly, the jet-black plated product having a trivalent chromium plating film obtains a reduced yellowish color.
- (4) When the plated product of the second embodiment has an L* value of the surface of fifty or less, a black trivalent chromium plating film obtains a richer jet-black appearance.
- The above described embodiment may be modified as follows.
- The shape and purpose of use of an object to be plated (plated product) of the above embodiment are not particularly limited and can be suitably employed in the fields of interior or exterior parts for vehicles, electrical and electronic parts, and daily necessities.
- In the second embodiment, the structure in which a copper plating layer, a semi-bright nickel plating layer, a bright nickel plating layer, and a microporous nickel plating layer are laminated as base plating layers has been described as an example, but is not limited to these metal plating layers. Metals or metal alloys such as Cu, Zn, Cr, Mo, Fe, Pb, Sn, and Ni are suitably selected to form a base plating layer. Additionally, the lamination sequence is not particularly limited.
- In the above embodiment, an electroless nickel or copper plating treatment is applied as a pretreatment when an electroplating treatment is applied to an object to be plated, but a method other than such a plating treatment may be used.
- In the above embodiment, the temperature and time for each plating treatment can be suitably determined in consideration of kind and productivity of an object to be plated.
- It is not an intention to prevent the addition of inorganic particles such as colloidal silica, other than the nanodiamond as a color enhancer, to the above electroplating bath within a range that does not inhibit the advantages of the present disclosure. When colloidal silica is used in combination, a yellowish color (b* value) is more reduced. However, it is preferable not to use colloidal silica in combination from the viewpoint of more reducing lightness (L* value).
- Next, the embodiments will be described further specifically with reference to Examples and Comparative Examples. However, the configuration of the present disclosure is not limited to the configuration of each Example.
- An object to be plated, to which a base plating treatment shown below was applied, was prepared. A trivalent chromium plating treatment using an electroplating bath of each Example was carried out and an obtained plated product of each Example was evaluated for appearance characteristics (yellowish color, lightness).
- Object to be Plated
- A base plating treatment was carried out onto an ABS plastic to which conductivity was imparted by a pretreatment. The base plating treatment was carried out by immersing the conductive ABS plastic substrate in various metal plating baths according to a routine method so that a copper plating layer, a semi-bright nickel plating layer, a bright nickel plating layer, and a microporous nickel plating layer were sequentially laminated.
- A 2.5 mL/L of a uDiamond plating additive dispersion (primary particle 4 to 6 nm) manufactured by Carbodeon was added as the nanodiamond to a plating bath base solution (agent B was not used, 5 mL/L of agent D, and 40 mL/L of agent K) for trivalent chromium plating shown in Table 1 so that an amount of nanodiamond was 0.05 g/L in the plating bath. The base plating-treated object to be plated was subjected to the trivalent chromium plating treatment under the conditions shown in Table 2 and nanodiamond particles were coprecipitated.
- Subsequently, the plating-treated product, to which the trivalent chromium plating treatment was applied, was further subjected to a chromate treatment. The chromate treatment was carried out using ECR500 (manufactured by JUC) according to a routine method. The obtained chromate plating-treated object (plated product) was evaluated on the surface appearance for the obtainment of bright appearance according to the criteria shown below. Additionally, the values of L* and b* at the surface were respectively measured using a spectrophotometer (manufactured by Konica Minolta, Inc.: CM-700D). Results are shown in Table 3.
-
TABLE 1 Amount used Composition Agent A 150 mL/L Chromium sulfate Agent B Amount used as in Silicon dioxide (colloidal Table 3 silica) Agent D Amount used as in Sodium thiocyanate Table 3 Agent G 30 mL/L Sulfuric acid Agent J 4 mL/L Cobalt sulfate Agent K 40 mL/L or 80 mL/L Arginine (Arg), histidine (His) Agent S 280 g/L Potassium sulfate, boric acid Agent W 1.5 mL/L Dipentyl sulfosuccinate -
TABLE 2 Amount of solution 300 mL Solution temperature 40° C. Plating bath pH 3.2 Agitation Air agitation Current density 7 A/dm2 - A procedure was carried out in the same manner as in Example 1 except that agent D, agent B, and nanodiamond (manufactured by Carbodeon: uDiamond plating additive dispersion) respectively in the amounts shown in Table 3 and 40 mL/L of agent K were used. Results are shown in Table 3, respectively.
- A procedure was carried out in the same manner as in Example 1 except that agent D, agent B, and nanodiamond (manufactured by Carbodeon: uDiamond plating additive dispersion) respectively in the amounts shown in Table 3 and 80 mL/L of agent K were used. Results are shown in Table 3, respectively.
- A procedure was carried out in the same manner as in Example 1 except that a trivalent chromium plating bath with which agent D in the amount shown in Table 3 and 40 mL/L of agent K were blended, and agent B and nanodiamond was not blended was used. Results are shown in Table 3.
- A procedure was carried out in the same manner as in Example 1 except that a trivalent chromium plating bath with which agent D and agent B in the amounts shown in Table 3 and 40 mL/L of agent K were blended, and nanodiamond was not blended was used. Results are shown in Table 3.
- A procedure was carried out in the same manner as in Example 1 except that a trivalent chromium plating bath with which agent D in the amount shown in Table 3 and 40 mL/L of agent K were blended, and nanodiamond was not blended but further 4 mL/L of agent B, in which colloidal silica is replaced with TiO2 particles (average particle size 7 nm), was blended. TiO2 particle was in the same concentration as the colloidal silica in agent B. The obtained chromate plating-treated product of Comparative Example 3 failed to obtain a desired bright appearance and thus was not measured for L* and b* values at the surface.
- Bright appearance
-
- ∘ Jet-black bright appearance was obtained.
- x Jet-black bright appearance was not obtained.
-
TABLE 3 Nanodiamond Nanodiamond Agent D Agent B concentration concentration Bright L* b* (mL/L) (mL/L) (mass %) (g/L) appearance Value Value Example 1 5 0 0.005 0.05 ∘ 48.92 4.0 Example 2 5 0 0.01 0.1 ∘ 49.18 3.9 Example 3 5 0 0.1 1.0 ∘ 50.6 3.92 Example 4 5 0 0.2 2.0 ∘ 51.13 3.66 Example 5 5 0 0.4 4.0 ∘ 52.3 3.58 Example 6 5 4 0.4 4.0 ∘ 52.94 3.35 Example 7 5 6 0.4 4.0 ∘ 53.29 3.15 Example 8 5 0 0.005 0.05 ∘ 47.92 3.97 Example 9 5 0 0.01 0.1 ∘ 46.67 3.59 Comparative 5 0 0 0 ∘ 48.46 4.4 Example 1 Comparative 5 4 0 0 ∘ 49.28 4.21 Example 2 Comparative 5 TiO2 0 0 x — — Example 3 - As shown in Table 3, in the configuration of each Example, a good jet-black bright appearance was obtained and a plating film with a reduced yellowish color (b* value) was also obtained. When a nanodiamond content was low (e.g., 0.1 g/L or less), a better jet-black bright appearance with not only a reduced yellowish color but also a low lightness (L* value) was obtained.
- In Comparative Example 1, which did not contain the nanodiamond, and Comparative Example 2, in which colloidal silica was used in place of the nanodiamond, it was confirmed that the yellowish color at the surface was not reduced. Further, Comparative Example 3, in which a titanium oxide was used as the inorganic particle failed to obtain a jet-black bright appearance.
- Various changes in form and details may be made to the examples above without departing from the spirit and scope of the claims and their equivalents. The examples are for the sake of description only, and not for purposes of limitation. Descriptions of features in each example are to be considered as being applicable to similar features or aspects in other examples. Suitable results may be achieved if sequences are performed in a different order, and/or if components in a described system, architecture, device, or circuit are combined differently, and/or replaced or supplemented by other components or their equivalents. The scope of the disclosure is not defined by the detailed description, but by the claims and their equivalents. All variations within the scope of the claims and their equivalents are included in the disclosure.
Claims (5)
1. An electroplating bath for precipitating a black trivalent chromium layer onto an object to be plated,
the electroplating bath comprising a nanodiamond and a thiocyanate ion as color enhancers.
2. The electroplating bath according to claim 1 , wherein a concentration of the nanodiamond is 0.02 to 0.16 g/L.
3. A method for manufacturing a plated product having a black trivalent chromium plating film, comprising:
forming a black trivalent chromium plating film onto an object to be plated by electroplating using the electroplating bath according to claim 1 ; and
applying a chromate treatment onto the black trivalent chromium plating film.
4. A plated product having a black trivalent chromium plating film in which nanodiamond particles are dispersed, wherein a b* value of a surface of the plated product is four or less.
5. The plated product according to claim 4 , wherein an L* value of the surface of the plated product is fifty or less.
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| JP2018-066801 | 2018-03-30 | ||
| JP2018066801A JP6973242B2 (en) | 2018-03-30 | 2018-03-30 | Electroplating bath, manufacturing method of plated products, and plated products |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111349952A (en) * | 2020-03-06 | 2020-06-30 | 广州三孚新材料科技股份有限公司 | Trivalent black chromium electroplating solution for solar heat collector |
| WO2022123019A1 (en) * | 2020-12-11 | 2022-06-16 | Atotech Deutschland GmbH & Co. KG | Method for electrodepositing a dark chromium layer on a substrate and substrate having at least one side fully covered with a dark chromium layer |
| US20220259743A1 (en) * | 2019-05-16 | 2022-08-18 | Pac Tech - Packaging Technologies Gmbh | Plating bath for the electroless plating of a substrate |
| EP4083268A1 (en) * | 2021-04-30 | 2022-11-02 | Atotech Deutschland GmbH & Co. KG | Electroplating composition for depositing a chromium or chromium alloy layer on a substrate |
| EP4101948A1 (en) | 2021-06-10 | 2022-12-14 | Atotech Deutschland GmbH & Co. KG | Method for adjusting the brightness l* of an electroplated chromium layer |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12559432B2 (en) | 2019-09-30 | 2026-02-24 | Panasonic Intellectual Property Management Co., Ltd. | Composite member |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9758884B2 (en) * | 2012-02-16 | 2017-09-12 | Stacey Hingley | Color control of trivalent chromium deposits |
| EP3320126A1 (en) * | 2015-07-06 | 2018-05-16 | Carbodeon Ltd Oy | Metallic coating and a method for producing the same |
| JP6414001B2 (en) * | 2015-10-06 | 2018-10-31 | 豊田合成株式会社 | Black-plated resin parts and manufacturing method thereof |
-
2018
- 2018-03-30 JP JP2018066801A patent/JP6973242B2/en active Active
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- 2019-02-26 US US16/285,322 patent/US20190301038A1/en not_active Abandoned
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20220259743A1 (en) * | 2019-05-16 | 2022-08-18 | Pac Tech - Packaging Technologies Gmbh | Plating bath for the electroless plating of a substrate |
| CN111349952A (en) * | 2020-03-06 | 2020-06-30 | 广州三孚新材料科技股份有限公司 | Trivalent black chromium electroplating solution for solar heat collector |
| WO2022123019A1 (en) * | 2020-12-11 | 2022-06-16 | Atotech Deutschland GmbH & Co. KG | Method for electrodepositing a dark chromium layer on a substrate and substrate having at least one side fully covered with a dark chromium layer |
| CN115803479A (en) * | 2020-12-11 | 2023-03-14 | 德国艾托特克有限两合公司 | Method for the galvanic deposition of a dark chromium layer on a substrate and substrate completely covered on at least one side with a dark chromium layer |
| US20230193496A1 (en) * | 2020-12-11 | 2023-06-22 | Atotech Deutschland GmbH & Co. KG | Method for electrodepositing a dark chromium layer on a substrate and substrate having at least one side fully covered with a dark chromium layer |
| EP4083268A1 (en) * | 2021-04-30 | 2022-11-02 | Atotech Deutschland GmbH & Co. KG | Electroplating composition for depositing a chromium or chromium alloy layer on a substrate |
| WO2022229373A1 (en) * | 2021-04-30 | 2022-11-03 | Atotech Deutschland GmbH & Co. KG | Electroplating composition for depositing a chromium or chromium alloy layer on a substrate |
| EP4101948A1 (en) | 2021-06-10 | 2022-12-14 | Atotech Deutschland GmbH & Co. KG | Method for adjusting the brightness l* of an electroplated chromium layer |
| WO2022258621A1 (en) | 2021-06-10 | 2022-12-15 | Atotech Deutschland GmbH & Co. KG | Method for adjusting the brightness l* of an electroplated chromium layer |
Also Published As
| Publication number | Publication date |
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| JP6973242B2 (en) | 2021-11-24 |
| JP2019178350A (en) | 2019-10-17 |
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