US20170243999A1 - Solar cell - Google Patents
Solar cell Download PDFInfo
- Publication number
- US20170243999A1 US20170243999A1 US15/434,718 US201715434718A US2017243999A1 US 20170243999 A1 US20170243999 A1 US 20170243999A1 US 201715434718 A US201715434718 A US 201715434718A US 2017243999 A1 US2017243999 A1 US 2017243999A1
- Authority
- US
- United States
- Prior art keywords
- light absorbing
- absorbing layer
- layer
- solar cell
- window
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000000203 mixture Substances 0.000 claims abstract description 42
- 239000000758 substrate Substances 0.000 claims abstract description 20
- 229910052733 gallium Inorganic materials 0.000 claims abstract description 16
- 229910052738 indium Inorganic materials 0.000 claims abstract description 13
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims abstract description 8
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims abstract description 8
- YNLHHZNOLUDEKQ-UHFFFAOYSA-N copper;selanylidenegallium Chemical compound [Cu].[Se]=[Ga] YNLHHZNOLUDEKQ-UHFFFAOYSA-N 0.000 claims description 13
- KTSFMFGEAAANTF-UHFFFAOYSA-N [Cu].[Se].[Se].[In] Chemical compound [Cu].[Se].[Se].[In] KTSFMFGEAAANTF-UHFFFAOYSA-N 0.000 claims description 11
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 2
- 239000011701 zinc Substances 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 238000000034 method Methods 0.000 description 19
- 239000011669 selenium Substances 0.000 description 14
- 229910052711 selenium Inorganic materials 0.000 description 12
- 239000004065 semiconductor Substances 0.000 description 10
- 239000010949 copper Substances 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 6
- 238000001704 evaporation Methods 0.000 description 6
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000011787 zinc oxide Substances 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000005361 soda-lime glass Substances 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000000149 argon plasma sintering Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- DVRDHUBQLOKMHZ-UHFFFAOYSA-N chalcopyrite Chemical compound [S-2].[S-2].[Fe+2].[Cu+2] DVRDHUBQLOKMHZ-UHFFFAOYSA-N 0.000 description 2
- 229910052951 chalcopyrite Inorganic materials 0.000 description 2
- 238000000224 chemical solution deposition Methods 0.000 description 2
- 238000010549 co-Evaporation Methods 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910017612 Cu(In,Ga)Se2 Inorganic materials 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000307 polymer substrate Polymers 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/032—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
- H01L31/0322—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312 comprising only AIBIIICVI chalcopyrite compounds, e.g. Cu In Se2, Cu Ga Se2, Cu In Ga Se2
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/072—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type
- H01L31/0725—Multiple junction or tandem solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/072—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type
- H01L31/0749—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type including a AIBIIICVI compound, e.g. CdS/CulnSe2 [CIS] heterojunction solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/541—CuInSe2 material PV cells
Definitions
- the present disclosure herein relates to solar cells, and more particularly, to tandem-type solar cells.
- a solar cell is a semiconductor device which directly converts solar light into electricity.
- Solar cell techniques aim at developing a large-area, low-cost, and high-efficiency solar cell.
- a light absorbing layer of a thin-film solar cell converts light energy into electrical energy by absorbing solar light to form electron-hole pairs.
- its energy payback time is shorter than that of a silicon solar cell, and an ultra-thin thin-film solar cell and a large-area thin-film solar cell may be fabricated.
- innovative manufacturing cost reduction is possible due to the development of manufacturing techniques.
- Tandem-type solar cells having different optical band gaps have been developed to increase the efficiency of the solar cell.
- the tandem-type solar cell has a form in which a top cell is stacked on a bottom cell, wherein the top cell relatively close to an incident surface of light may have a wide band gap and the bottom cell relatively far from the incident surface of light may have a narrow band gap.
- the top cell is disposed on the bottom cell, the bottom cell already formed may be damaged by performing a high-temperature process.
- the present disclosure provides a tandem-type solar cell having high heat resistance.
- An embodiment of the inventive concept provides a solar cell including a back electrode on a substrate; a first light absorbing layer including gallium (Ga) and indium (In) on the back electrode; a first buffer layer on the first light absorbing layer; a first window layer on the first buffer layer; a second light absorbing layer including Ga on the first window layer; a second buffer layer on the second light absorbing layer; and a second window layer on the second buffer layer, wherein a composition ratio of (Ga)/(Ga+In) of the first light absorbing layer is lower than that of the second light absorbing layer.
- composition ratio of (Ga)/(Ga+In) of the first light absorbing layer may be in a range of about 0.23 or more to about 0.25 or less.
- the first buffer layer may include zinc.
- the first light absorbing layer may include a copper indium gallium selenide (CIGS) absorbing layer
- the second light absorbing layer may include a copper gallium selenide (CGS) absorbing layer.
- CGS copper indium gallium selenide
- CGS copper gallium selenide
- the second window layer may include a first sub-window layer configured to have high resistance and a second sub-window layer configured to have high transparency.
- a solar cell includes a bottom cell having a first light absorbing layer; and a top cell which is stacked on the bottom cell and has a second light absorbing layer, wherein the first light absorbing layer includes gallium (Ga) and indium (In), and a composition ratio of (Ga)/(Ga+In) of the first light absorbing layer is in a range of about 0.23 or more to about 0.25 or less.
- the first light absorbing layer may include a copper indium gallium selenide (CIGS) absorbing layer
- the second light absorbing layer may include a copper gallium selenide (CGS) absorbing layer.
- CGS copper indium gallium selenide
- CGS copper gallium selenide
- FIG. 1 illustrates a solar cell according to an embodiment of the inventive concept
- FIG. 2 is a flowchart illustrating a process of fabricating the tandem-type solar cell of FIG. 1 ;
- FIG. 3A illustrates an open-circuit voltage according to a composition ratio of (Ga)/(Ga+In) of a first light absorbing layer
- FIG. 3B illustrates an short-circuit current according to the composition ratio of (Ga)/(Ga+In) of the first light absorbing layer
- FIG. 3C illustrates a fill factor (FF) according to the composition ratio of (Ga)/(Ga+In) of the first light absorbing layer
- FIG. 3D illustrates efficiency according to the composition ratio of (Ga)/(Ga+In) of the first light absorbing layer
- FIG. 1 illustrates a solar cell 10 according to an embodiment of the inventive concept.
- the solar cell 10 may be a tandem-type solar cell.
- the solar cell 10 may include a bottom cell 100 and a top cell 200 stacked on the bottom cell 100 .
- the bottom cell 100 may be a copper indium gallium selenide (CIGS)-based solar cell
- the top cell 200 may be a copper gallium selenide (CGS)-based solar cell.
- CGS copper indium gallium selenide
- the solar cell 10 may include a substrate 110 , a back electrode 120 on the substrate 110 , a first light absorbing layer 130 on the back electrode 120 , a first buffer layer 140 on the first light absorbing layer 130 , a first window layer 150 on the first buffer layer 140 , a second light absorbing layer 210 on the first window layer 150 , a second buffer layer 220 on the second light absorbing layer 210 , a second window layer 230 on the second buffer layer 220 , and a grid 240 on the second window layer 230 .
- the substrate 110 , the back electrode 120 , the first light absorbing layer 130 , the first buffer layer 140 , and the first window layer 150 may constitute the bottom cell 100
- the first window layer 150 , the second light absorbing layer 210 , the second buffer layer 220 , the second window layer 230 , and the grid 240 may constitute the top cell 200
- the bottom cell 100 and the top cell 200 configured to share the first window layer 150 may constitute the tandem-type solar cell 10 .
- the substrate 110 may be a sodalime glass substrate, a ceramic substrate, a semiconductor substrate such as a silicon substrate, a metal substrate, a stainless steel substrate, a polyimide substrate, or a polymer substrate.
- the substrate 110 may be a sodalime glass substrate.
- the back electrode 120 may be formed of a material having a small thermal expansion coefficient difference from the substrate 110 in order to prevent delamination from the substrate 110 .
- the back electrode 120 may be formed of molybdenum (Mo). Mo may have high electrical conductivity, may have ohmic contact formation characteristics with other thin films, and may have high-temperature stability in a selenium (Se) atmosphere.
- the first light absorbing layer 130 may be formed of a I-III-VI group compound semiconductor.
- the first light absorbing layer 130 may include gallium (Ga) and indium (In).
- the first light absorbing layer 130 may be a CIGS-based absorbing layer.
- the first light absorbing layer 130 may include a chalcopyrite-based compound semiconductor such as CuInGaSe or CuInGaSe 2 .
- a composition ratio of (Ga)/(Ga+In) of the first light absorbing layer 130 may be in a range of about 0.23 or more to about 0.25 or less.
- the first buffer layer 140 may alleviate a difference in energy band gaps between the first light absorbing layer 130 and the first window layer 150 .
- the first buffer layer 140 may have a larger energy band gap than the first light absorbing layer 130 and may have a smaller energy band gap than the first window layer 150 .
- the first buffer layer 140 may include zinc (Zn).
- the first window layer 150 may have excellent electro-optical characteristics.
- the first window layer 150 may include one of indium tin oxide (ITO), transparent conductive oxide (TCO), or aluminum-doped zinc oxide (AZO) (i-ZnO).
- the first window layer 150 may function as a back electrode of the top cell 200 .
- the second light absorbing layer 210 may be formed of a I-III-IV group compound semiconductor.
- the second light absorbing layer 210 may include gallium (Ga).
- the second light absorbing layer 210 may be a CGS-based absorbing layer.
- the composition ratio of (Ga)/(Ga+In) of the first light absorbing layer 130 may be lower than that of the second light absorbing layer 210 .
- the (Ga)/(Ga+In) of the second light absorbing layer 210 may be about 1.
- the second buffer layer 220 may alleviate a difference in energy band gaps between the second light absorbing layer 210 and the second window layer 230 .
- the second buffer layer 220 may have a larger energy band gap than the second light absorbing layer 210 and may have a smaller energy band gap than the second window layer 230 .
- the second window layer 230 may have a multilayer structure.
- the second window layer 230 may include a first sub-window layer 232 and a second sub-window layer 234 which are sequentially stacked.
- the first sub-window layer 232 may have high resistance and the second sub-window layer 234 may have high transparency.
- the first sub-window layer 232 may include TCO and the second sub-window layer 234 may include ITO or AZO (i-ZnO).
- the grid 240 may be electrically connected to the second window layer 230 .
- the grid 240 may include at least one metal layer, such as gold, silver, aluminum, and indium.
- Each of the first and second window layers 150 and 230 as a n-type semiconductor, may form a p-n junction with each of the first and second light absorbing layers 130 and 210 , as a p-type semiconductor.
- a light scattering sheet may be disposed on the second window layer 230 .
- the light scattering sheet may include an adhesive material, and, for example, may include at least one of ethylene vinyl acetate (EVA) and poly vinyl butyral (PVB).
- EVA ethylene vinyl acetate
- PVB poly vinyl butyral
- FIG. 2 is a flowchart illustrating a process of fabricating the tandem-type solar cell 10 of FIG. 1 .
- the back electrode 120 is disposed on the substrate 110 (S 110 ).
- the substrate 110 may be formed of sodalime glass.
- the back electrode 100 may be formed of molybdenum (Mo). Mo may have high electrical conductivity, may have good ohmic contact formation characteristics with other thin films, and may have high-temperature stability in a selenium (Se) atmosphere.
- the back electrode 120 may be formed by using a sputtering method, for example, a direct current (DC) sputtering method.
- DC direct current
- the first light absorbing layer 130 is disposed on the back electrode 120 (S 120 ).
- the first light absorbing layer 130 may include gallium (Ga) and indium (In).
- the first light absorbing layer 130 may be formed of a group compound semiconductor.
- the group compound semiconductor may be a chalcopyrite-based compound semiconductor such as Cu(In,Ga)Se 2 , Cu(In,Ga)(S,Se) 2 , and (Au,Ag,Cu)(In,Ga,Al)(S,Se) 2 .
- the first light absorbing layer 130 may be formed by using a co-evaporation method in which metal elements of copper (Cu), In, Ga, and Se are used as precursors.
- the first light absorbing layer 130 may be formed by a deposition process including a first step of evaporating In, Ga, and Se at the same time, a second step of evaporating Cu and Se at the same time, and a third step of evaporating In, Ga, and Se at the same time.
- the first step may be performed in a temperature range of about 350° C. to about 450° C.
- the second step may be performed in a temperature range of about 480° C. to about 550° C.
- the third step may be performed in a temperature range of about 480° C. to about 550° C.
- the composition ratio of (Ga)/(Ga+In) of the first light absorbing layer 130 may be controlled by adjusting an amount of Ga evaporated in the third step to be smaller than an amount of Ga evaporated in the first step.
- the amount of Ga evaporated in the first step may be about 0.20 angstrom/sec
- the amount of Ga evaporated in the third step may be about 0.07 angstrom/sec.
- the composition ratio of (Ga)/(Ga+In) of the formed first light absorbing layer 130 may be in a range of about 0.23 or more to about 0.25 or less.
- the first buffer layer 140 is further disposed on the first light absorbing layer 130 (S 130 ).
- the first buffer layer 140 may alleviate a difference in energy band gaps between the first light absorbing layer 130 and the first window layer 150 .
- the first buffer layer 140 may be formed by a sputtering method. In a case in which the first buffer layer 140 is formed by a dry process, the process may be performed in-line. Thus, the entire process may be simpler than a process in which the first buffer layer 140 is formed by a chemical bath deposition (CBD) method that requires vacuum.
- CBD chemical bath deposition
- the first window layer 150 is disposed on the first buffer layer 140 (S 140 ).
- the first window layer 150 may be formed of a material having high light transmittance and excellent electrical conductivity.
- the bottom cell 100 may be completed by forming the first window layer 150 .
- the second light absorbing layer 210 is disposed on the first window layer 150 (S 150 ).
- the second light absorbing layer 210 may include Ga.
- the second light absorbing layer 210 may be a CGS-based absorbing layer.
- the composition ratio of (Ga)/(Ga+In) of the first light absorbing layer 130 may be lower than that of the second light absorbing layer 210 .
- the second light absorbing layer 210 may be formed by using a co-evaporation method in which metal elements of Cu, Ga, and Se are used as precursors.
- the second light absorbing layer 210 may be formed by a deposition process including a first step of evaporating In, Ga, and Se at the same time, a second step of evaporating Cu and Se at the same time, and a third step of evaporating In, Ga, and Se at the same time.
- the first step may be performed in a temperature range of about 350° C. to about 450° C.
- the second step may be performed in a temperature range of about 480° C. to about 550° C.
- the third step may be performed in a temperature range of about 480° C. to about 550° C.
- the bottom cell 100 already formed may be damaged by the high-temperature process.
- an element of the first buffer layer 140 may be diffused into the first light absorbing layer 130 to reduce efficiency of the bottom cell 100 . Since the first buffer layer 140 includes zinc (Zn), a diffusion distance may be reduced in comparison to a case in which the first buffer layer 140 includes cadmium (Cd). Changes in the characteristics of the bottom cell 100 due to the high-temperature process will be described later with reference to FIGS. 3A to 4E .
- the second buffer layer 220 is disposed on the second light absorbing layer 210 (S 160 ).
- the second buffer layer 220 may alleviate a difference in energy band gaps between the second light absorbing layer 210 and the second window layer 230 .
- the second buffer layer 220 may be formed by a sputtering method. When the second buffer layer 220 is formed by a dry process, the process may be performed in-line.
- the second window layer 230 is disposed on the second buffer layer 220 (S 170 ).
- the second window layer 230 may be formed of a material having high light transmittance and excellent electrical conductivity.
- the first sub-window layer 232 and the second sub-window layer 234 may be sequentially provided.
- the first sub-window layer 232 may have high resistance and the second sub-window layer 234 may have high transparency.
- the first sub-window layer 232 may include TCO and the second sub-window layer 234 may include ITO or AZO (i-ZnO).
- the grid 240 may be disposed on the second window layer 230 (S 180 ).
- the grid 240 may collect current on the surface of the solar cell 10 .
- the grid 240 may be formed of a metal such as aluminum (Al) or Nickel (Ni)/Al.
- the grid 240 may be formed by using a sputtering method.
- the top cell 200 and the tandem-type solar cell 10 may be completed by forming the grid 240 .
- FIGS. 3A to 3D are graphs comparing characteristics of the first light absorbing layer 130 according to before and after stacking the top cell 200 on the bottom cell 100 .
- FIGS. 3A to 3D are graphs comparing the characteristics of the first light absorbing layer 130 of the bottom cell 100 according to the presence of the high-temperature process.
- FIG. 3A illustrates an open-circuit voltage (Voc) according to the composition ratio of (Ga)/(Ga+In) of the first light absorbing layer 130
- FIG. 3B illustrates an short-circuit current (Jsc) according to the composition ratio of (Ga)/(Ga+In) of the first light absorbing layer 130
- FIG. 3C illustrates a fill factor (FF) according to the composition ratio of (Ga)/(Ga+In) of the first light absorbing layer 130
- FIG. 3D illustrates efficiency according to the composition ratio of (Ga)/(Ga+In) of the first light absorbing layer 130
- the open-circuit voltage denotes a potential difference formed at both ends of the solar cell in a state in which the circuit is open
- the short-circuit current denotes a reverse current density that flows when subjected to light in a state in which external resistance is absent
- FF denotes a value obtained by dividing a product of current density and voltage at a maximum power point by a product of the open-circuit voltage and the short-circuit current.
- the efficiency of the solar cell is derived by reflecting the open-circuit voltage, the short-circuit current, and the FF.
- ⁇ circle around ( 1 ) ⁇ of FIGS. 3A to 3D represents the characteristics of the first light absorbing layer before stacking the top cell 200
- ⁇ circle around ( 2 ) ⁇ of FIGS. 3A to 3D represents the characteristics of the first light absorbing layer after stacking the top cell 200 .
- 3A to 3D are the composition ratios of (Ga)/(Ga+In), wherein r 1 , r 2 , r 3 , r 4 , r 5 , r 6 , r 7 , and r 8 are 0.05, 0.13, 0.16, 0.23, 0.25, 0.29, 0.33, and 0.36, respectively.
- ⁇ circle around ( 3 ) ⁇ of FIGS. 4A to 4E represents the characteristics of the first light absorbing layer before stacking the top cell 200
- ⁇ circle around ( 4 ) ⁇ of FIGS. 4A to 4E represents the characteristics of the first light absorbing layer after stacking the top cell 200 .
- the expression “external quantum efficiency” may denote a ratio of electrons generated by photons.
- the external quantum efficiencies are all reduced due to the high-temperature process.
- a decrease amount of the efficiency is large and/or a loss in a long wavelength region is large.
- the long wavelength may be a wavelength of about 700 nm or more. Since the bottom cell 100 of the tandem-type solar cell 10 absorbs more of the long wavelength radiation in comparison to the top cell 200 , the presence of the loss in the long wavelength region may denote the efficiency of the bottom cell of the tandem-type solar cell 10 .
- the efficiency and the absorption in the long wavelength region of the tandem-type solar cell 10 are better than a case in which the composition ratio is different from the above values.
- the tandem-type solar cell 10 having high heat resistance may be provided.
- the tandem-type solar cell 10 having high heat resistance may be provided by controlling the composition ratio of (Ga)/(Ga+In) of the first light absorbing layer 130 of the bottom cell 100 to be in a range of about 0.23 or more to about 0.25 or less.
- the first light absorbing layer 130 having a composition ratio of (Ga)/(Ga+In) of about 0.23 or more to about 0.25 or less may function as a diffusion barrier layer to prevent diffusion of a predetermined concentration of Ga at an interface between the first light absorbing layer 130 and the first buffer layer 140 .
- a tandem-type solar cell having high heat resistance may be provided.
Abstract
A solar cell according to embodiments of the inventive concept includes a back electrode on a substrate, a first light absorbing layer including gallium (Ga) and indium (In) on the back electrode, a first buffer layer on the first light absorbing layer, a first window layer on the first buffer layer, a second light absorbing layer including
Ga on the first window layer, a second buffer layer on the second light absorbing layer, and a second window layer on the second buffer layer, wherein a composition ratio of (Ga)/(Ga+In) of the first light absorbing layer is lower than that of the second light absorbing layer.
Description
- This U.S. non-provisional patent application claims priority under 35 U.S.C. §119 of Korean Patent Application No. 10-2016-0021640, filed on Feb. 24, 2016, the entire contents of which are hereby incorporated by reference.
- The present disclosure herein relates to solar cells, and more particularly, to tandem-type solar cells.
- A solar cell is a semiconductor device which directly converts solar light into electricity. Solar cell techniques aim at developing a large-area, low-cost, and high-efficiency solar cell.
- A light absorbing layer of a thin-film solar cell converts light energy into electrical energy by absorbing solar light to form electron-hole pairs. With respect to the thin-film solar cell, its energy payback time is shorter than that of a silicon solar cell, and an ultra-thin thin-film solar cell and a large-area thin-film solar cell may be fabricated. Thus, it is expected for the thin-film solar cell that innovative manufacturing cost reduction is possible due to the development of manufacturing techniques.
- Tandem-type solar cells having different optical band gaps have been developed to increase the efficiency of the solar cell. The tandem-type solar cell has a form in which a top cell is stacked on a bottom cell, wherein the top cell relatively close to an incident surface of light may have a wide band gap and the bottom cell relatively far from the incident surface of light may have a narrow band gap. When the top cell is disposed on the bottom cell, the bottom cell already formed may be damaged by performing a high-temperature process. Thus, there is a need to form a bottom cell having high heat resistance.
- The present disclosure provides a tandem-type solar cell having high heat resistance.
- The object of the present invention is not limited to the aforesaid, but other objects not described herein will be clearly understood by those skilled in the art from descriptions below.
- An embodiment of the inventive concept provides a solar cell including a back electrode on a substrate; a first light absorbing layer including gallium (Ga) and indium (In) on the back electrode; a first buffer layer on the first light absorbing layer; a first window layer on the first buffer layer; a second light absorbing layer including Ga on the first window layer; a second buffer layer on the second light absorbing layer; and a second window layer on the second buffer layer, wherein a composition ratio of (Ga)/(Ga+In) of the first light absorbing layer is lower than that of the second light absorbing layer.
- In an embodiment, the composition ratio of (Ga)/(Ga+In) of the first light absorbing layer may be in a range of about 0.23 or more to about 0.25 or less.
- In an embodiment, the first buffer layer may include zinc.
- In an embodiment, the first light absorbing layer may include a copper indium gallium selenide (CIGS) absorbing layer, and the second light absorbing layer may include a copper gallium selenide (CGS) absorbing layer.
- In an embodiment, the second window layer may include a first sub-window layer configured to have high resistance and a second sub-window layer configured to have high transparency.
- In an embodiment of the inventive concept, a solar cell includes a bottom cell having a first light absorbing layer; and a top cell which is stacked on the bottom cell and has a second light absorbing layer, wherein the first light absorbing layer includes gallium (Ga) and indium (In), and a composition ratio of (Ga)/(Ga+In) of the first light absorbing layer is in a range of about 0.23 or more to about 0.25 or less.
- In an embodiment, the first light absorbing layer may include a copper indium gallium selenide (CIGS) absorbing layer, and the second light absorbing layer may include a copper gallium selenide (CGS) absorbing layer.
- Particularities of other embodiments are included in the detailed description and drawings.
- The accompanying drawings are included to provide a further understanding of the inventive concept, and are incorporated in and constitute a part of this specification. The drawings illustrate exemplary embodiments of the inventive concept and, together with the description, serve to explain principles of the inventive concept. In the drawings:
-
FIG. 1 illustrates a solar cell according to an embodiment of the inventive concept; -
FIG. 2 is a flowchart illustrating a process of fabricating the tandem-type solar cell ofFIG. 1 ; -
FIG. 3A illustrates an open-circuit voltage according to a composition ratio of (Ga)/(Ga+In) of a first light absorbing layer,FIG. 3B illustrates an short-circuit current according to the composition ratio of (Ga)/(Ga+In) of the first light absorbing layer,FIG. 3C illustrates a fill factor (FF) according to the composition ratio of (Ga)/(Ga+In) of the first light absorbing layer, andFIG. 3D illustrates efficiency according to the composition ratio of (Ga)/(Ga+In) of the first light absorbing layer; and -
FIG. 4A illustrates changes in external quantum efficiency according to a wavelength when the composition ratio of (Ga)/(Ga+In) is r4 (=0.23),FIG. 4B illustrates changes in external quantum efficiency according to the wavelength when the composition ratio of (Ga)/(Ga+In) is r5 (=0.25),FIG. 4C illustrates changes in external quantum efficiency according to the wavelength when the composition ratio of (Ga)/(Ga+In) is r6 (=0.29),FIG. 4D illustrates changes in external quantum efficiency according to the wavelength when the composition ratio of (Ga)/(Ga+In) is r7 (=0.33), andFIG. 4E illustrates changes in external quantum efficiency according to the wavelength when the composition ratio of (Ga)/(Ga+In) is r8 (=0.36). - Advantages and features of the present disclosure, and implementation methods thereof will be clarified through following embodiments described with reference to the accompanying drawings. The present disclosure may, however, be embodied in different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the inventive concept to those skilled in the art. Further, the present invention is only defined by scopes of claims. Like numbers refer to like elements throughout.
- In the following description, the technical terms are used only for explaining a specific exemplary embodiment while not limiting the inventive concept. The terms of a singular form may include plural forms unless referred to the contrary. It will be understood that the terms “comprises” and/or “comprising”, when used in this specification, specify the presence of stated elements, steps, operations, and/or components, but do not preclude the presence or addition of one or more other elements, steps, operations, and/or components.
- Additionally, the embodiments in the detailed description will be described with sectional and/or plan views as ideal exemplary views of the inventive concept. In the figures, the thicknesses of layers and regions are exaggerated for clarity of illustration. Accordingly, shapes of the exemplary views may be modified according to manufacturing techniques and/or allowable errors. Therefore, the embodiments of the inventive concept are not limited to the specific shape illustrated in the exemplary views, but may include other shapes that may be created according to manufacturing processes. Areas exemplified in the drawings have general properties, and are used to illustrate a specific shape of a device region. Thus, this should not be construed as limited to the scope of the inventive concept.
-
FIG. 1 illustrates asolar cell 10 according to an embodiment of the inventive concept. Thesolar cell 10 may be a tandem-type solar cell. In other words, thesolar cell 10 may include abottom cell 100 and atop cell 200 stacked on thebottom cell 100. For example, thebottom cell 100 may be a copper indium gallium selenide (CIGS)-based solar cell, and thetop cell 200 may be a copper gallium selenide (CGS)-based solar cell. - Referring to
FIG. 1 , thesolar cell 10 according to the embodiment of the inventive concept may include asubstrate 110, aback electrode 120 on thesubstrate 110, a firstlight absorbing layer 130 on theback electrode 120, afirst buffer layer 140 on the firstlight absorbing layer 130, afirst window layer 150 on thefirst buffer layer 140, a secondlight absorbing layer 210 on thefirst window layer 150, asecond buffer layer 220 on the secondlight absorbing layer 210, asecond window layer 230 on thesecond buffer layer 220, and agrid 240 on thesecond window layer 230. Thesubstrate 110, theback electrode 120, the firstlight absorbing layer 130, thefirst buffer layer 140, and thefirst window layer 150 may constitute thebottom cell 100, and thefirst window layer 150, the secondlight absorbing layer 210, thesecond buffer layer 220, thesecond window layer 230, and thegrid 240 may constitute thetop cell 200. In other words, thebottom cell 100 and thetop cell 200 configured to share thefirst window layer 150 may constitute the tandem-typesolar cell 10. - The
substrate 110 may be a sodalime glass substrate, a ceramic substrate, a semiconductor substrate such as a silicon substrate, a metal substrate, a stainless steel substrate, a polyimide substrate, or a polymer substrate. For example, thesubstrate 110 may be a sodalime glass substrate. Theback electrode 120 may be formed of a material having a small thermal expansion coefficient difference from thesubstrate 110 in order to prevent delamination from thesubstrate 110. For example, theback electrode 120 may be formed of molybdenum (Mo). Mo may have high electrical conductivity, may have ohmic contact formation characteristics with other thin films, and may have high-temperature stability in a selenium (Se) atmosphere. The firstlight absorbing layer 130 may be formed of a I-III-VI group compound semiconductor. The firstlight absorbing layer 130 may include gallium (Ga) and indium (In). For example, the firstlight absorbing layer 130 may be a CIGS-based absorbing layer. For example, the firstlight absorbing layer 130 may include a chalcopyrite-based compound semiconductor such as CuInGaSe or CuInGaSe2. A composition ratio of (Ga)/(Ga+In) of the firstlight absorbing layer 130 may be in a range of about 0.23 or more to about 0.25 or less. Thefirst buffer layer 140 may alleviate a difference in energy band gaps between the firstlight absorbing layer 130 and thefirst window layer 150. Thefirst buffer layer 140 may have a larger energy band gap than the firstlight absorbing layer 130 and may have a smaller energy band gap than thefirst window layer 150. Thefirst buffer layer 140, for example, may include zinc (Zn). Thefirst window layer 150 may have excellent electro-optical characteristics. For example, thefirst window layer 150 may include one of indium tin oxide (ITO), transparent conductive oxide (TCO), or aluminum-doped zinc oxide (AZO) (i-ZnO). - The
first window layer 150 may function as a back electrode of thetop cell 200. The secondlight absorbing layer 210 may be formed of a I-III-IV group compound semiconductor. The secondlight absorbing layer 210 may include gallium (Ga). For example, the secondlight absorbing layer 210 may be a CGS-based absorbing layer. The composition ratio of (Ga)/(Ga+In) of the firstlight absorbing layer 130 may be lower than that of the secondlight absorbing layer 210. For example, in a case in which the secondlight absorbing layer 210 is a CGS-based absorbing layer, the (Ga)/(Ga+In) of the secondlight absorbing layer 210 may be about 1. Thesecond buffer layer 220 may alleviate a difference in energy band gaps between the secondlight absorbing layer 210 and thesecond window layer 230. Thesecond buffer layer 220 may have a larger energy band gap than the secondlight absorbing layer 210 and may have a smaller energy band gap than thesecond window layer 230. Thesecond window layer 230 may have a multilayer structure. For example, thesecond window layer 230 may include a firstsub-window layer 232 and a secondsub-window layer 234 which are sequentially stacked. For example, the firstsub-window layer 232 may have high resistance and the secondsub-window layer 234 may have high transparency. For example, the firstsub-window layer 232 may include TCO and the secondsub-window layer 234 may include ITO or AZO (i-ZnO). Thegrid 240 may be electrically connected to thesecond window layer 230. Thegrid 240, for example, may include at least one metal layer, such as gold, silver, aluminum, and indium. Each of the first and second window layers 150 and 230, as a n-type semiconductor, may form a p-n junction with each of the first and secondlight absorbing layers - Although not shown in
FIG. 1 , a light scattering sheet (not shown) may be disposed on thesecond window layer 230. The light scattering sheet (not shown) may include an adhesive material, and, for example, may include at least one of ethylene vinyl acetate (EVA) and poly vinyl butyral (PVB). -
FIG. 2 is a flowchart illustrating a process of fabricating the tandem-typesolar cell 10 ofFIG. 1 . Referring toFIGS. 1 and 2 , theback electrode 120 is disposed on the substrate 110 (S110). For example, thesubstrate 110 may be formed of sodalime glass. Theback electrode 100 may be formed of molybdenum (Mo). Mo may have high electrical conductivity, may have good ohmic contact formation characteristics with other thin films, and may have high-temperature stability in a selenium (Se) atmosphere. Theback electrode 120 may be formed by using a sputtering method, for example, a direct current (DC) sputtering method. - The first
light absorbing layer 130 is disposed on the back electrode 120 (S120). The firstlight absorbing layer 130 may include gallium (Ga) and indium (In). The firstlight absorbing layer 130 may be formed of a group compound semiconductor. For example, the group compound semiconductor may be a chalcopyrite-based compound semiconductor such as Cu(In,Ga)Se2, Cu(In,Ga)(S,Se)2, and (Au,Ag,Cu)(In,Ga,Al)(S,Se)2. The firstlight absorbing layer 130 may be formed by using a co-evaporation method in which metal elements of copper (Cu), In, Ga, and Se are used as precursors. - Specifically, the first
light absorbing layer 130 may be formed by a deposition process including a first step of evaporating In, Ga, and Se at the same time, a second step of evaporating Cu and Se at the same time, and a third step of evaporating In, Ga, and Se at the same time. For example, the first step may be performed in a temperature range of about 350° C. to about 450° C., the second step may be performed in a temperature range of about 480° C. to about 550° C., and the third step may be performed in a temperature range of about 480° C. to about 550° C. In this case, the composition ratio of (Ga)/(Ga+In) of the firstlight absorbing layer 130 may be controlled by adjusting an amount of Ga evaporated in the third step to be smaller than an amount of Ga evaporated in the first step. For example, the amount of Ga evaporated in the first step may be about 0.20 angstrom/sec, and the amount of Ga evaporated in the third step may be about 0.07 angstrom/sec. The composition ratio of (Ga)/(Ga+In) of the formed firstlight absorbing layer 130 may be in a range of about 0.23 or more to about 0.25 or less. - The
first buffer layer 140 is further disposed on the first light absorbing layer 130 (S130). Thefirst buffer layer 140 may alleviate a difference in energy band gaps between the firstlight absorbing layer 130 and thefirst window layer 150. Thefirst buffer layer 140 may be formed by a sputtering method. In a case in which thefirst buffer layer 140 is formed by a dry process, the process may be performed in-line. Thus, the entire process may be simpler than a process in which thefirst buffer layer 140 is formed by a chemical bath deposition (CBD) method that requires vacuum. - The
first window layer 150 is disposed on the first buffer layer 140 (S140). Thefirst window layer 150 may be formed of a material having high light transmittance and excellent electrical conductivity. Thebottom cell 100 may be completed by forming thefirst window layer 150. - Subsequently, the second
light absorbing layer 210 is disposed on the first window layer 150 (S150). The secondlight absorbing layer 210 may include Ga. For example, the secondlight absorbing layer 210 may be a CGS-based absorbing layer. The composition ratio of (Ga)/(Ga+In) of the firstlight absorbing layer 130 may be lower than that of the secondlight absorbing layer 210. The secondlight absorbing layer 210 may be formed by using a co-evaporation method in which metal elements of Cu, Ga, and Se are used as precursors. - Specifically, the second
light absorbing layer 210 may be formed by a deposition process including a first step of evaporating In, Ga, and Se at the same time, a second step of evaporating Cu and Se at the same time, and a third step of evaporating In, Ga, and Se at the same time. For example, the first step may be performed in a temperature range of about 350° C. to about 450° C., the second step may be performed in a temperature range of about 480° C. to about 550° C., and the third step may be performed in a temperature range of about 480° C. to about 550° C. In this case, thebottom cell 100 already formed may be damaged by the high-temperature process. For example, an element of thefirst buffer layer 140 may be diffused into the firstlight absorbing layer 130 to reduce efficiency of thebottom cell 100. Since thefirst buffer layer 140 includes zinc (Zn), a diffusion distance may be reduced in comparison to a case in which thefirst buffer layer 140 includes cadmium (Cd). Changes in the characteristics of thebottom cell 100 due to the high-temperature process will be described later with reference toFIGS. 3A to 4E . - The
second buffer layer 220 is disposed on the second light absorbing layer 210 (S160). Thesecond buffer layer 220 may alleviate a difference in energy band gaps between the secondlight absorbing layer 210 and thesecond window layer 230. Thesecond buffer layer 220 may be formed by a sputtering method. When thesecond buffer layer 220 is formed by a dry process, the process may be performed in-line. - The
second window layer 230 is disposed on the second buffer layer 220 (S170). Thesecond window layer 230 may be formed of a material having high light transmittance and excellent electrical conductivity. For example, the firstsub-window layer 232 and the secondsub-window layer 234 may be sequentially provided. The firstsub-window layer 232 may have high resistance and the secondsub-window layer 234 may have high transparency. For example, the firstsub-window layer 232 may include TCO and the secondsub-window layer 234 may include ITO or AZO (i-ZnO). Thereafter, thegrid 240 may be disposed on the second window layer 230 (S180). Thegrid 240 may collect current on the surface of thesolar cell 10. Thegrid 240 may be formed of a metal such as aluminum (Al) or Nickel (Ni)/Al. Thegrid 240 may be formed by using a sputtering method. Thetop cell 200 and the tandem-typesolar cell 10 may be completed by forming thegrid 240. -
FIGS. 3A to 3D are graphs comparing characteristics of the firstlight absorbing layer 130 according to before and after stacking thetop cell 200 on thebottom cell 100. In other words,FIGS. 3A to 3D are graphs comparing the characteristics of the firstlight absorbing layer 130 of thebottom cell 100 according to the presence of the high-temperature process.FIG. 3A illustrates an open-circuit voltage (Voc) according to the composition ratio of (Ga)/(Ga+In) of the firstlight absorbing layer 130,FIG. 3B illustrates an short-circuit current (Jsc) according to the composition ratio of (Ga)/(Ga+In) of the firstlight absorbing layer 130,FIG. 3C illustrates a fill factor (FF) according to the composition ratio of (Ga)/(Ga+In) of the firstlight absorbing layer 130, andFIG. 3D illustrates efficiency according to the composition ratio of (Ga)/(Ga+In) of the firstlight absorbing layer 130. The open-circuit voltage denotes a potential difference formed at both ends of the solar cell in a state in which the circuit is open, the short-circuit current denotes a reverse current density that flows when subjected to light in a state in which external resistance is absent, and FF denotes a value obtained by dividing a product of current density and voltage at a maximum power point by a product of the open-circuit voltage and the short-circuit current. The efficiency of the solar cell is derived by reflecting the open-circuit voltage, the short-circuit current, and the FF. {circle around (1 )} ofFIGS. 3A to 3D represents the characteristics of the first light absorbing layer before stacking thetop cell 200, and {circle around (2)} ofFIGS. 3A to 3D represents the characteristics of the first light absorbing layer after stacking thetop cell 200. r1, r2, r3, r4, r5, r6, r7, and r8 ofFIGS. 3A to 3D are the composition ratios of (Ga)/(Ga+In), wherein r1, r2, r3, r4, r5, r6, r7, and r8 are 0.05, 0.13, 0.16, 0.23, 0.25, 0.29, 0.33, and 0.36, respectively. - Referring to {circle around (1 )} of
FIGS. 3A to 3D , as the composition ratio of (Ga)/(Ga+In) is increased, the open-circuit voltage is generally increased, the short-circuit current is relatively decreased, and the FF generally shows a constant value except when the composition ratio is r1 (=0.05) and r8 (=0.36). Also, in a case in which the composition ratio of (Ga)/(Ga+In) is equal to or greater than r4 (=0.23), it may be understood that the efficiency is generally high. In particular, when the composition ratio of (Ga)/(Ga+In) is r4 (=0.23), the solar cell has the highest efficiency. Referring to {circle around (2)} ofFIGS. 3A to 3D , it may be confirmed that the short-circuit current is relatively less affected by the heat treatment, but the open-circuit voltage and the FF are relatively greatly affected by the heat treatment. Accordingly, it may be understood that p-n junction characteristics of thebottom cell 100 are degraded by the high-temperature process. - Subsequently, changes in external quantum efficiency according to a wavelength was measured for the case in which the efficiency is relatively high, that is, the case in which the composition ratio of (Ga)/(Ga+In) is equal to or greater than r4 (=0.23).
-
FIG. 4A illustrates changes in external quantum efficiency according to the wavelength when the composition ratio of (Ga)/(Ga+In) is r4 (=0.23),FIG. 4B illustrates changes in external quantum efficiency according to the wavelength when the composition ratio of (Ga)/(Ga+In) is r5 (=0.25),FIG. 4C illustrates changes in external quantum efficiency according to the wavelength when the composition ratio of (Ga)/(Ga+In) is r6 (=0.29),FIG. 4D illustrates changes in external quantum efficiency according to the wavelength when the composition ratio of (Ga)/(Ga+In) is r7 (=0.33), andFIG. 4E illustrates changes in external quantum efficiency according to the wavelength when the composition ratio of (Ga)/(Ga+In) is r8 (=0.36). {circle around (3)} ofFIGS. 4A to 4E represents the characteristics of the first light absorbing layer before stacking thetop cell 200, and {circle around (4)} ofFIGS. 4A to 4E represents the characteristics of the first light absorbing layer after stacking thetop cell 200. The expression “external quantum efficiency” may denote a ratio of electrons generated by photons. - Referring to
FIGS. 4A to 4E , when the composition ratio of (Ga)/(Ga+In) is r4(=0.23), r5(=0.25), r6(=0.29), r7(=0.33), and r8(=0.36), it may be understood that the external quantum efficiencies are all reduced due to the high-temperature process. Particularly, when the composition ratio of (Ga)/(Ga+In) is r6(=0.29), r7(=0.33), and r8(=0.36), a decrease amount of the efficiency is large and/or a loss in a long wavelength region is large. For example, the long wavelength may be a wavelength of about 700 nm or more. Since thebottom cell 100 of the tandem-typesolar cell 10 absorbs more of the long wavelength radiation in comparison to thetop cell 200, the presence of the loss in the long wavelength region may denote the efficiency of the bottom cell of the tandem-typesolar cell 10. - Thus, referring to
FIGS. 3A to 4E , in a case in which the composition ratio of (Ga)/(Ga+In) of the firstlight absorbing layer 130 is in a range of about 0.23 to about 0.25, the efficiency and the absorption in the long wavelength region of the tandem-typesolar cell 10 are better than a case in which the composition ratio is different from the above values. - According to the inventive concept, the tandem-type
solar cell 10 having high heat resistance may be provided. In particular, the tandem-typesolar cell 10 having high heat resistance may be provided by controlling the composition ratio of (Ga)/(Ga+In) of the firstlight absorbing layer 130 of thebottom cell 100 to be in a range of about 0.23 or more to about 0.25 or less. For example, the firstlight absorbing layer 130 having a composition ratio of (Ga)/(Ga+In) of about 0.23 or more to about 0.25 or less may function as a diffusion barrier layer to prevent diffusion of a predetermined concentration of Ga at an interface between the firstlight absorbing layer 130 and thefirst buffer layer 140. - According to embodiments of the inventive concept, a tandem-type solar cell having high heat resistance may be provided.
- Although preferred embodiments of the inventive concept have been shown and described with reference to the accompanying drawings, it will be understood by those of ordinary skill in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the following claims. Accordingly, it is to be understood that the inventive concept has been described by way of illustration and not limitation.
Claims (7)
1. A solar cell comprising:
a back electrode on a substrate;
a first light absorbing layer including gallium (Ga) and indium (In) on the back electrode;
a first buffer layer on the first light absorbing layer;
a first window layer on the first buffer layer;
a second light absorbing layer including Ga on the first window layer;
a second buffer layer on the second light absorbing layer; and
a second window layer on the second buffer layer,
wherein a composition ratio of (Ga)/(Ga+In) of the first light absorbing layer is lower than that of the second light absorbing layer.
2. The solar cell of claim 1 , wherein the composition ratio of (Ga)/(Ga+In) of the first light absorbing layer is in a range of about 0.23 or more to about 0.25 or less.
3. The solar cell of claim 1 , wherein the first buffer layer comprises zinc.
4. The solar cell of claim 1 , wherein the first light absorbing layer comprises a copper indium gallium selenide (CIGS) absorbing layer, and the second light absorbing layer comprises a copper gallium selenide (CGS) absorbing layer.
5. The solar cell of claim 1 , wherein the second window layer comprises:
a first sub-window layer configured to have high resistance; and
a second sub-window layer configured to have high transparency.
6. A solar cell comprising:
a bottom cell having a first light absorbing layer; and
a top cell which is stacked on the bottom cell and has a second light absorbing layer,
wherein the first light absorbing layer comprises gallium (Ga) and indium (In), and a composition ratio of (Ga)/(Ga+In) of the first light absorbing layer is in a range of about 0.23 or more to about 0.25 or less.
7. The solar cell of claim 6 , wherein the first light absorbing layer comprises a copper indium gallium selenide (CIGS) absorbing layer, and the second light absorbing layer comprises a copper gallium selenide (CGS) absorbing layer.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020160021640A KR102350885B1 (en) | 2016-02-24 | 2016-02-24 | Solar cell |
KR10-2016-0021640 | 2016-02-24 |
Publications (1)
Publication Number | Publication Date |
---|---|
US20170243999A1 true US20170243999A1 (en) | 2017-08-24 |
Family
ID=59630151
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US15/434,718 Abandoned US20170243999A1 (en) | 2016-02-24 | 2017-02-16 | Solar cell |
Country Status (2)
Country | Link |
---|---|
US (1) | US20170243999A1 (en) |
KR (1) | KR102350885B1 (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111725340A (en) * | 2020-06-11 | 2020-09-29 | 中山德华芯片技术有限公司 | Ultrathin flexible gallium arsenide solar cell chip and preparation method thereof |
US10927294B2 (en) | 2019-06-20 | 2021-02-23 | Nanosys, Inc. | Bright silver based quaternary nanostructures |
CN112531048A (en) * | 2020-11-06 | 2021-03-19 | 凯盛光伏材料有限公司 | Copper indium gallium selenide laminated thin-film solar cell and preparation method thereof |
US11360250B1 (en) | 2021-04-01 | 2022-06-14 | Nanosys, Inc. | Stable AIGS films |
US11407940B2 (en) | 2020-12-22 | 2022-08-09 | Nanosys, Inc. | Films comprising bright silver based quaternary nanostructures |
US11926776B2 (en) | 2020-12-22 | 2024-03-12 | Shoei Chemical Inc. | Films comprising bright silver based quaternary nanostructures |
US11970646B2 (en) | 2020-06-18 | 2024-04-30 | Shoei Chemical Inc. | Bright silver based quaternary nanostructures |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100170556A1 (en) * | 2009-01-06 | 2010-07-08 | Sunlight Photonics Inc. | Multi-junction pv module |
US20110005578A1 (en) * | 2009-07-10 | 2011-01-13 | Samsung Electronics Co., Ltd. | Tandem solar cell and method of manufacturing same |
US20110065228A1 (en) * | 2009-09-15 | 2011-03-17 | Xiao-Chang Charles Li | Manufacture of thin solar cells based on ink printing technology |
US20140043669A1 (en) * | 2012-08-08 | 2014-02-13 | Kinestral Technologies, Inc. | Electrochromic multi-layer devices with composite current modulating structure |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7488890B2 (en) | 2003-04-21 | 2009-02-10 | Sharp Kabushiki Kaisha | Compound solar battery and manufacturing method thereof |
KR101103770B1 (en) * | 2009-10-12 | 2012-01-06 | 이화여자대학교 산학협력단 | Compound Semiconductor Solar Cells and Methods of Fabricating the Same |
KR20140095070A (en) * | 2011-10-28 | 2014-07-31 | 다우 글로벌 테크놀로지스 엘엘씨 | Method of manufacture of chalcogenide-based photovoltaic cells |
-
2016
- 2016-02-24 KR KR1020160021640A patent/KR102350885B1/en active IP Right Grant
-
2017
- 2017-02-16 US US15/434,718 patent/US20170243999A1/en not_active Abandoned
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100170556A1 (en) * | 2009-01-06 | 2010-07-08 | Sunlight Photonics Inc. | Multi-junction pv module |
US20110005578A1 (en) * | 2009-07-10 | 2011-01-13 | Samsung Electronics Co., Ltd. | Tandem solar cell and method of manufacturing same |
US20110065228A1 (en) * | 2009-09-15 | 2011-03-17 | Xiao-Chang Charles Li | Manufacture of thin solar cells based on ink printing technology |
US20140043669A1 (en) * | 2012-08-08 | 2014-02-13 | Kinestral Technologies, Inc. | Electrochromic multi-layer devices with composite current modulating structure |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10927294B2 (en) | 2019-06-20 | 2021-02-23 | Nanosys, Inc. | Bright silver based quaternary nanostructures |
CN111725340A (en) * | 2020-06-11 | 2020-09-29 | 中山德华芯片技术有限公司 | Ultrathin flexible gallium arsenide solar cell chip and preparation method thereof |
US11970646B2 (en) | 2020-06-18 | 2024-04-30 | Shoei Chemical Inc. | Bright silver based quaternary nanostructures |
CN112531048A (en) * | 2020-11-06 | 2021-03-19 | 凯盛光伏材料有限公司 | Copper indium gallium selenide laminated thin-film solar cell and preparation method thereof |
US11407940B2 (en) | 2020-12-22 | 2022-08-09 | Nanosys, Inc. | Films comprising bright silver based quaternary nanostructures |
US11926776B2 (en) | 2020-12-22 | 2024-03-12 | Shoei Chemical Inc. | Films comprising bright silver based quaternary nanostructures |
US11360250B1 (en) | 2021-04-01 | 2022-06-14 | Nanosys, Inc. | Stable AIGS films |
Also Published As
Publication number | Publication date |
---|---|
KR102350885B1 (en) | 2022-01-17 |
KR20170100078A (en) | 2017-09-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7632701B2 (en) | Thin film solar cells by selenization sulfurization using diethyl selenium as a selenium precursor | |
JP6689456B2 (en) | Photovoltaic device with transparent tunnel junction | |
US20170243999A1 (en) | Solar cell | |
EP1492169A2 (en) | Solar cell | |
US20120186643A1 (en) | Compound semiconductor solar cells and methods of fabricating the same | |
US9935211B2 (en) | Back contact structure for photovoltaic devices such as copper-indium-diselenide solar cells | |
JP5873881B2 (en) | Photovoltaic power generation apparatus and manufacturing method thereof. | |
KR20170036596A (en) | A solar cell comprising CZTS Thin film with a oxide buffer layer and a method of manufacturing the same | |
KR101848853B1 (en) | Semi-transparent CIGS solar cells and method of manufacture the same and BIPV module comprising the same | |
KR101428146B1 (en) | Solar cell module and method of fabricating the same | |
KR101415251B1 (en) | Multiple-Layered Buffer, and Its Fabrication Method, and Solor Cell with Multiple-Layered Buffer. | |
Brémaud | Investigation and development of CIGS solar cells on flexible substrates and with alternative electrical back contacts | |
JP2017059828A (en) | Photoelectric conversion device and solar cell | |
KR101300791B1 (en) | Method for enhancing conductivity of molybdenum layer | |
KR101474487B1 (en) | Thin film solar cell and Method of fabricating the same | |
KR101455832B1 (en) | Thin film solar cell and Method of fabricating the same | |
EP2876694A1 (en) | Solar cell | |
KR101283240B1 (en) | Solar cell and method of fabricating the same | |
KR101134730B1 (en) | Solar cell apparatus and method of fabricating the same | |
KR20090065894A (en) | Tandem structure cigs solar cell and method for manufacturing the same | |
KR101846337B1 (en) | Solar cell apparatus and method of fabricating the same | |
Song et al. | Spray pyrolysis of semi-transparent backwall superstrate CuIn (S, Se) 2 solar cells | |
KR20170036606A (en) | A CZTS based solar cell comprising a double light aborbing layer | |
KR101372026B1 (en) | Solar cell apparatus and method of fabricating the same | |
KR101349417B1 (en) | Solar cell apparatus and method of fabricating the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTIT Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:WI, JAE-HYUNG;CHUNG, YONG-DUCK;LEE, WOO JUNG;AND OTHERS;REEL/FRAME:041279/0543 Effective date: 20160712 |
|
STPP | Information on status: patent application and granting procedure in general |
Free format text: FINAL REJECTION MAILED |
|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |