US20170069740A9 - Topside structures for an insulated gate bipolar transistor (igbt) device to achieve improved device perforemances - Google Patents

Topside structures for an insulated gate bipolar transistor (igbt) device to achieve improved device perforemances Download PDF

Info

Publication number
US20170069740A9
US20170069740A9 US13/892,259 US201313892259A US2017069740A9 US 20170069740 A9 US20170069740 A9 US 20170069740A9 US 201313892259 A US201313892259 A US 201313892259A US 2017069740 A9 US2017069740 A9 US 2017069740A9
Authority
US
United States
Prior art keywords
igbt
trench
region
gate
shield
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
US13/892,259
Other versions
US10686062B2 (en
US20140332845A1 (en
Inventor
Madhur Bobde
Anup Bhalla
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alpha and Omega Semiconductor Inc
Original Assignee
Alpha and Omega Semiconductor Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US12/925,869 external-priority patent/US8441046B2/en
Application filed by Alpha and Omega Semiconductor Inc filed Critical Alpha and Omega Semiconductor Inc
Priority to US13/892,259 priority Critical patent/US10686062B2/en
Assigned to ALPHA AND OMEGA SEMICONDUCTOR INCORPORATED reassignment ALPHA AND OMEGA SEMICONDUCTOR INCORPORATED ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: BHALLA, ANUP, BOBDE, MADHUR
Publication of US20140332845A1 publication Critical patent/US20140332845A1/en
Publication of US20170069740A9 publication Critical patent/US20170069740A9/en
Assigned to ALPHA AND OMEGA SEMICONDUCTOR INCORPORATED reassignment ALPHA AND OMEGA SEMICONDUCTOR INCORPORATED ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: BOBDE, MADHUR, MR
Application granted granted Critical
Publication of US10686062B2 publication Critical patent/US10686062B2/en
Active legal-status Critical Current
Adjusted expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70—Bipolar devices
    • H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
    • H01L29/7393—Insulated gate bipolar mode transistors, i.e. IGBT; IGT; COMFET
    • H01L29/7395—Vertical transistors, e.g. vertical IGBT
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/1095—Body region, i.e. base region, of DMOS transistors or IGBTs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/402—Field plates
    • H01L29/407—Recessed field plates, e.g. trench field plates, buried field plates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
    • H01L29/42312—Gate electrodes for field effect devices
    • H01L29/42316—Gate electrodes for field effect devices for field-effect transistors
    • H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
    • H01L29/42364—Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the insulating layer, e.g. thickness or uniformity
    • H01L29/42368—Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the insulating layer, e.g. thickness or uniformity the thickness being non-uniform
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
    • H01L29/42312—Gate electrodes for field effect devices
    • H01L29/42316—Gate electrodes for field effect devices for field-effect transistors
    • H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
    • H01L29/42372—Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the conducting layer, e.g. the length, the sectional shape or the lay-out
    • H01L29/4238—Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the conducting layer, e.g. the length, the sectional shape or the lay-out characterised by the surface lay-out
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007—Multistep manufacturing processes
    • H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66234—Bipolar junction transistors [BJT]
    • H01L29/66325—Bipolar junction transistors [BJT] controlled by field-effect, e.g. insulated gate bipolar transistors [IGBT]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007—Multistep manufacturing processes
    • H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66234—Bipolar junction transistors [BJT]
    • H01L29/66325—Bipolar junction transistors [BJT] controlled by field-effect, e.g. insulated gate bipolar transistors [IGBT]
    • H01L29/66333—Vertical insulated gate bipolar transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007—Multistep manufacturing processes
    • H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66234—Bipolar junction transistors [BJT]
    • H01L29/66325—Bipolar junction transistors [BJT] controlled by field-effect, e.g. insulated gate bipolar transistors [IGBT]
    • H01L29/66333—Vertical insulated gate bipolar transistors
    • H01L29/66348—Vertical insulated gate bipolar transistors with a recessed gate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70—Bipolar devices
    • H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
    • H01L29/7393—Insulated gate bipolar mode transistors, i.e. IGBT; IGT; COMFET
    • H01L29/7395—Vertical transistors, e.g. vertical IGBT
    • H01L29/7396—Vertical transistors, e.g. vertical IGBT with a non planar surface, e.g. with a non planar gate or with a trench or recess or pillar in the surface of the emitter, base or collector region for improving current density or short circuiting the emitter and base regions
    • H01L29/7397—Vertical transistors, e.g. vertical IGBT with a non planar surface, e.g. with a non planar gate or with a trench or recess or pillar in the surface of the emitter, base or collector region for improving current density or short circuiting the emitter and base regions and a gate structure lying on a slanted or vertical surface or formed in a groove, e.g. trench gate IGBT
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/0684—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape, relative sizes or dispositions of the semiconductor regions or junctions between the regions
    • H01L29/0692—Surface layout
    • H01L29/0696—Surface layout of cellular field-effect devices, e.g. multicellular DMOS transistors or IGBTs

Definitions

  • the invention relates generally to semiconductor power devices. More particularly, this invention relates to new configurations and methods for manufacturing improved device structures for insulated gate bipolar transistors (IGBT).
  • IGBT insulated gate bipolar transistors
  • IGBT insulated gate bipolar transistor
  • V CE ,sat conduction loss
  • Eoff turn-off switching losses
  • More carrier injection while the device is on improves the conductivity of the device, thus reducing conduction loss, but more carrier injection would also cause higher Eoff, because of the energy dissipated when clearing out the injected carriers during turn-off.
  • FIG. 1D is a graph showing the trade-off between V CE ,sat and Eoff. It can be observed that the curve for a superior IGBT structure will be shifted closer to the origin, corresponding to lower losses.
  • V CE ,sat conduction loss
  • IGBT's short circuit ruggedness which in turn depends upon its saturation current Jsat.
  • a high Jsat will result in a lot of energy dissipated in the device during short circuit, which would quickly damage the IGBT device.
  • a lower Jsat will reduce the amount of energy dissipated, allowing the IGBT device to withstand the short circuit for a longer period of time without permanent damage; however, a lower Jsat also results in higher conductivity loss V CE ,sat.
  • FIG. 1A shows the cross section of a conventional planar gate insulated gate bipolar transistor (IGBT).
  • IGBT is a semiconductor power device that combines a metal oxide-semiconductor (MOS) gate control with a bipolar current flow mechanism.
  • MOS metal oxide-semiconductor
  • the functional features of both a metal-oxide-semiconductor field effect transistor (MOSFET) and a bipolar junction transistor (BJT) are combined in an IGBT.
  • Performance features of IGBT are designed to achieve a higher current density than the MOSFETs and faster and more efficient switching characteristics and better control than the BJTs.
  • the drift region can be lightly doped for improved blocking abilities.
  • FIG. 1A is a cross sectional view of another conventional IGBT device that has a trench gate.
  • the trench gate IGBT has the advantages of eliminating the JFET resistance and also has an enhanced top side carrier injection.
  • An accumulation layer can form under the trench gate to improve carrier injection.
  • the trench IGBT device as shown has a high Crss capacitance due to capacitance between the trench gate (at gate voltage) and the substrate and drift region below (at drain voltage).
  • the high Crss of this IGBT device slows down the device switching speed and also leads to higher switching energy losses.
  • FIG. 1C is a cross sectional view of another conventional IGBT device.
  • such device has a lower breakdown voltage due to the heavily doped layer and has a further worsened Crss due to the heavily doped N-layer.
  • the new IGBT with the improved configuration can reduce the Crss and increase the breakdown voltage and to increase the cell pitch to lower the Jsat such that the above discussed limitations and difficulties can be resolved.
  • Another aspect of the present invention is to provide a new and improved device configuration and manufacturing method for providing an IGBT device with a shielded gate with dummy trench such that the cell pitch can be increased to achieve a lower J-sat.
  • the two dimensional channel includes a lateral (planar gate) and a vertical (trench gate) component thus achieving relatively high channel resistance to lower Jsat.
  • the device can therefore achieve an improved rugged short circuit performance with a small cell pitch.
  • this invention discloses an insulated gate bipolar transistor (IGBT) device formed in a semiconductor substrate.
  • the IGBT device includes a split trench gate comprising an insulation layer padded trench filled with an upper gate segment and a lower shield segment insulated by an inter-segment insulation layer.
  • the IGBT device may further include a dummy trench filled with a dielectric layer disposed at a distance away from the split trench gate.
  • the IGBT device further includes a body region extended between the split trench gate and the dummy trench encompassing a source region surrounding the split trench gate near a top surface of the semiconductor substrate; and a heavily doped region disposed below the body region and above a source-dopant drift region above a bottom body-dopant collector region at a bottom surface of the semiconductor substrate.
  • the body region extended between the split trench gate and the dummy trench further extends vertically to a depth approximately the same as the upper gate segment in the semiconductor substrate.
  • the heavily doped region disposed below the body region further extends vertically to a depth approximately the same as the lower shield segment.
  • the body region is a P-dopant region and the source region is an N-dopant source region.
  • the body region is an N-dopant region and the source region is a P-dopant source region.
  • the lower shield segment is padded by a thick gate insulation layer over a bottom surface of the split trench gate.
  • the IGBT device includes a shield trench, containing a shield electrode and a planar gate.
  • the device does not include a trench gate electrode.
  • the planar gate is located next to the source region and the body region such that it can form a channel in the body region connecting the source region to a drain region.
  • the drain region may be the epitaxial layer, and may include a more heavily doped layer under the body region.
  • the shield trenches may run along the surface of the semiconductor die in a direction perpendicular to the planar gates.
  • transistor action may be suppressed next to the shield trenches by pulling the source regions away from the shield trenches, or recessing the shield electrodes from the source regions.
  • the shield electrode may be doped with the opposite conductivity type as the source region.
  • lightly doped source (LDS) regions may be placed between the gate and more heavily doped source regions to increase the resistance and improve the short circuit ruggedness of the device
  • this invention discloses a method of manufacturing a semiconductor power device in a semiconductor substrate.
  • the method may include a step of forming a dummy trench for an IGBT in a semiconductor substrate for increasing a cell pitch for lowering a J-sat of the IGBT.
  • the method further may includes a step of forming the IGBT with a two-dimensional channel by forming a trench gate of the IGBT to extend laterally above a body region to a source region such that the channel includes a lateral and a vertical component.
  • An IGBT may also be formed by forming shield trenches with shield electrodes near the top of the device and forming planar gates on the top surface of the device.
  • FIGS. 1A to 1C are cross sectional views showing three different configurations of conventional IGBT devices.
  • FIG. 1D is a chart showing tradeoffs in the characteristics of IGBT devices.
  • FIG. 2 is a cross sectional view of a shielded gate IGBT with trench gate and trench shield.
  • FIG. 3A is a cross sectional view of a shielded gate IGBT device having a trench shield and a 2D trench gate with a lateral extension to control a two-dimensional (2D) channel with a lateral and vertical channel components of this of this invention.
  • FIG. 3B is a similar structure with lightly doped source (LDS) added.
  • LDS lightly doped source
  • FIG. 4 is a cross sectional view of a shielded gate IGBT device having a trench shield and a planar gate that is parallel to the trench shield.
  • FIG. 5 is a similar cross sectional view of a shielded gate IGBT device having a trench shield and a planar gate that is parallel to the trench shield.
  • FIG. 5-1 is a similar cross sectional view to FIG. 5 , except that it includes a field stop layer near the bottom of the device.
  • FIG. 6 is a cross sectional perspective view of a shielded gate IGBT device having a trench shield and a planar gate that is perpendicular to the trench shield, in the 3 rd dimension.
  • FIGS. 7A-7C, and 7E are possible top views of FIG. 6 .
  • FIG. 7D is an alternative cross sectional perspective view similar to FIG. 6 .
  • FIGS. 8A-8J are cross sectional views illustrating a process of forming an device of this invention.
  • FIGS. 9A-9D are cross sectional views illustrating a process of forming another device of this invention.
  • FIGS. 10A-10C are top views showing an IGBT closed cell layout of this invention.
  • FIGS. 11A-11D are top views illustrating a method of making an IGBT with a closed cell layout of this invention.
  • FIG. 2 is a cross-sectional view of an IGBT device having a trench shield and trench gate configuration with dummy trench of this invention.
  • the IGBT device 100 is formed in semiconductor substrate 105 that has a first conductivity type, e.g., a P type substrate 105 .
  • An epitaxial layer 110 of a second conductivity type, e.g., an N-epitaxial (epi) layer 110 is supported on top of the P-type substrate 105 .
  • epi N-epitaxial
  • the P type substrate 105 and the epitaxial layer 110 may together be referred to as the semiconductor substrate since they both generally have a monocrystalline structure; additionally, the P type substrate may be more generally referred to as a bottom or lower semiconductor layer and the epitaxial layer 110 may more generally be referred to as an upper semiconductor layer.
  • the IGBT 100 is a vertical IGBT device with a collector electrode 120 disposed on a bottom surface of the substrate and an emitter electrode 131 disposed on a top surface.
  • the IGBT device shown in FIG. 2 has a shield gate trench that comprises an insulation layer 126 padded trench filled with an upper gate segment 135 - 1 and a lower shield segment 135 - 2 insulated from each other by an inter-segment insulation layer 138 .
  • the upper gate segment 135 - 1 is lined with a gate oxide 125 .
  • the IGBT device further includes a dummy trench 135 -DM filled with a dielectric layer, and optionally a polysilicon layer 135 -DM-poly, disposed at a distance away from the shield gate trench 135 .
  • the IGBT device further includes a P-type body/emitter region 140 extended between the shield gate trench 135 and the dummy trench 135 -DM encompassing an N-type source region 130 next to the shield gate trench 135 near a top surface of the semiconductor substrate.
  • the body/emitter region 140 extended between the shield gate trench 135 and the dummy trench 135 -DM further extends vertically to a depth approximately the same as the depth of the bottom of upper gate segment 135 - 1 in the semiconductor substrate.
  • the IGBT device further includes a heavily doped N region 145 as an N-type region disposed below the body/emitter region 140 and above the N-type epitaxial layer 110 .
  • the N-type epi layer 110 functions as a drift region above a bottom P-type collector region 105 at a bottom surface of the semiconductor substrate.
  • the heavily doped N region 145 disposed below the body/emitter region 140 further extend vertically to an approximately depth the same as the lower shield segment 135 - 2 .
  • the heavily doped N region 145 has the same conductivity type as the drift region/epitaxial layer 110 , but heavily doped N region 145 has a higher doping concentration. Together, the heavily doped N region 145 and N drift/epitaxial region 110 may act as the base of the PNP bipolar transistor portion of the IGBT device.
  • the lower shield segment 135 - 2 is padded by a thick trench insulation layer 126 over a bottom surface of the shield gate trench 135 .
  • the IGBT device 100 has an advantage that the shield gate trench and heavily doped N region can achieve improved conduction with lower Eoff and Eon losses.
  • the presence of heavily doped N region increases carrier concentration near the topside region of this device, thereby lowering Vce,sat without increasing carrier injection level and Eoff.
  • the heavily doped N region improves the conductivity modulation of the device by making the carrier profile more uniform during conductivity modulation by putting the heavily doped N region having many majority carriers at the top of the drift/epi region, where the minority carrier concentration usually drops off.
  • the shield electrode of this embodiment can achieve a reduced Crss and lower the Eon and Eoff losses and further can take advantage of a Re-surf action of such IGBT device to prevent any lowering of breakdown voltage due to the presence of heavily doped N region under the P body.
  • the shield electrode also allows the heavily doped N region to be even more highly doped and thus improves the Vce,sat.
  • the dummy trench may be an optional feature, but can be included to increase the cell pitch, which achieves a lower Jsat, and thus improve the short circuit ruggedness of the device.
  • the trench 135 -DM can be made a dummy trench by removing the MOS channel action from it, for example by connecting the dummy trench poly 135 -DM-poly to the source voltage, or by not placing a source region 130 adjacent to the dummy trench 135 -DM.
  • FIG. 3A is a cross-sectional view of another IGBT device, having a shielded gate trench bipolar transistor configuration with a two-dimensional (2D) channel of this invention.
  • the IGBT device 100 ′ is formed in semiconductor substrate 105 that has a first conductivity type, e.g., a P type substrate 105 .
  • An epitaxial layer 110 of a second conductivity type, e.g., an N-epitaxial layer 110 is supported on top of the P-type substrate 105 .
  • the IGBT 100 ′ is a vertical IGBT device with a collector electrode 120 disposed on a bottom surface of the substrate and an emitter electrode 131 disposed on a top surface.
  • the IGBT device has a shield gate trench 135 ′ that comprises a trench padded with insulation layer 126 and filled with an upper gate segment 135 - 1 -V and a lower shield segment 135 - 2 separated by an inter-segment insulation layer 138 .
  • the IGBT device 100 ′ may further include a dummy trench 135 -DM optionally having an electrode, e.g., a polysilicon layer 135 -DM-poly, disposed at a distance away from the shield gate trench 135 .
  • the IGBT device further includes a body/emitter region 140 extended between the shield gate trench 135 and the dummy trench 135 -DM encompassing a source region 130 ′ disposed between the shield gate trench 135 and the dummy trench 135 -DM near a top surface of the semiconductor substrate.
  • the body/emitter region 140 extended between the shield gate trench 135 and the dummy trench 135 -DM further extends vertically to a depth shallower than a depth of the upper gate segment 135 - 1 -V in the semiconductor substrate.
  • the emitter electrode 131 is connected to the source 130 ′ and the body/emitter region 140 (and to the dummy trench electrode 135 -DM-poly).
  • the upper gate segment 135 - 1 -V further extends on its top side to planar gate segment 135 - 1 -P over a top surface of the semiconductor substrate above the body/emitter region 140 and reaching the source region 130 ′.
  • the upper gate segment 135 - 1 -V is insulated from the semiconductor substrate by vertical gate oxide 125 -V.
  • the planar gate oxide 125 -P insulates the planar gate segment 135 - 1 -P from the semiconductor surface.
  • the IGBT device 100 ′ further includes a heavily doped region 145 as an N-type region disposed below the body/emitter region 140 and above the N-type epitaxial layer 110 .
  • the N-type epitaxial layer 110 functions as a source-dopant-type drift region above a bottom body-dopant-type collector region 105 at a bottom surface of the semiconductor substrate.
  • the heavily doped N+ region 145 disposed below the body-dopant region 140 further extends vertically to a depth approximately the same as the lower shield segment 135 - 2 .
  • the heavily doped N+ region 145 and the N-epi layer 110 under the body region 140 may be considered the drain of the MOSFET portion of the insulated gate bipolar transistor (IGBT), and also as the base region of the bipolar junction transistor (BJT) portion of the IGBT.
  • the lower shield segment 135 - 2 is padded by a thick gate insulation layer 126 over a bottom surface of the shield gate trench 135 ′.
  • the lower shield segment 135 - 2 is connected to the source/emitter voltage.
  • the IGBT device 100 ′ shown in FIG. 3A is implemented with a new and improved device configuration and manufacturing method to provide a shielded-gate trench bipolar transistor with two dimensional channel for achieving a longer channel without requiring a deep body region.
  • the two dimensional channel includes a lateral and a vertical component thus achieving relatively high channel resistance by increasing the channel length without requiring excessively deep trenches, which are difficult and expensive to fabricate, or requiring excessively wide cell pitches.
  • the high channel resistance is desirable to reduce the saturation current density, Jsat.
  • the device can therefore achieve an improved rugged short circuit performance, while having a small cell pitch.
  • FIG. 3B shows another embodiment of the present invention with IGBT 100 ′′ similar to the IGBT 100 ′ of FIG. 3A except that the IGBT 100 ′′ additionally includes an N-type lightly doped source (LDS) region 131 located between the highly doped N-type source region 130 , and the beginning of the planar gate portion 135 - 1 -P.
  • the lightly doped source region 131 provides additional series resistance which adds a voltage drop during current flow, leading to emitter de-biasing. This voltage drop is small and negligible at normal operating currents, but during high currents, such as those produced during a short circuit, the voltage drop is high, which significantly reduces the saturation current density, Jsat, and improves the device's ability to withstand a short circuit. This also allows for a smaller cell pitch design while keeping the saturation current density Jsat low.
  • LDS lightly doped source
  • FIG. 4 shows another embodiment of the invention in which the gate of IGBT 101 is a planar gate 136 .
  • the trenches only have a shield electrode 137 surrounded by dielectric (e.g. oxide) 126 to form shield trenches 135 -S; the shield trenches 135 -S do not have a gate electrode component.
  • the device does not require a gate electrode.
  • the shield electrode 137 is connected to the source/emitter voltage.
  • the channel is only horizontal, running at the top of the body region 140 , beneath the planar gate 136 , from the source 130 (and optional lightly doped source 131 ) to the top of the heavily doped N+ region 145 .
  • This embodiment may be easier to manufacture, as it is simple to form a planar gate and because the shield trench 135 -S with its single electrode is much easier to form than a shield gate trench structure with multiple electrodes.
  • the shield trench 135 -S still charge compensates the N+ region 145 to keep the breakdown voltage (BV) high, and also keeps the capacitance Crss low for fast and efficient switching.
  • BV breakdown voltage
  • FIG. 5 shows a slight variation of the IGBT 101 of FIG. 4 , except that the IGBT 101 ′ does not include the lightly doped source 131 , but only has N+ source region 130 . It also further includes a highly doped P+ body contact region 142 , to allow good contact to the P-body region 140 .
  • the emitter electrode is not specifically shown but it contacts the source 130 and the P+ body contact regions 142 , and is also connected to shield trench electrodes 137 .
  • IGBT 101 ′- 1 is similar to IGBT 101 ′ of FIG. 5 , except for the inclusion of an N-type field stop layer 101 at the bottom of the N-epi drift layer 111 .
  • FIG. 6 shows a cross sectional perspective view of an IGBT device 102 similar to the IGBT device 101 ′ of FIG. 5B .
  • the planar gate 136 runs in a different direction than the shield trenches 135 -S. They both parallel to the major plane of the device, e.g. along the top surface of the semiconductor material substrate (highly doped bottom substrate and epi layer together), but in different directions along the surface.
  • the planar gate 136 runs substantially perpendicularly to shield trenches 135 - 6 ; the planar gate 136 runs in the X-axis direction, while the shield trench 135 -S runs in the Z-axis direction.
  • FIG. 7A shows a possible top view of the IGBT 102 of FIG. 6 .
  • This shows the top view along the X-Z plane, with planar gate 136 , source 130 , body 140 , and body contact regions 142 , running in stripes in the X-axis direction.
  • the shield trench 135 -S runs in the Z-axis direction.
  • the shield electrode 137 is covered by trench oxide 126 , but its outline is indicated by dashed lines. Again, the emitter electrode and top passivation layers are not shown for clarity.
  • FIG. 7B shows another top view similar to that of FIG. 6 , except that in this case, the planar gate 136 and its underlying gate oxide 125 are made transparent to show the underlying structures; also, the shield electrode 137 is shaded in this figure, even though it is actually covered by the trench oxide 126 .
  • a portion of the body region 140 lies between the source region 130 and the top of the N+ region 145 , and it is within this portion that the MOS channel is formed.
  • a potential problem can occur in the channel region 177 adjacent to the shield trench 135 -S.
  • an inversion layer may form in the P-body 140 adjacent to the shield trench 135 -S under a small gate bias. This lowers the threshold voltage Vt of the device and can also lead to increased leakage in the device.
  • FIG. 7C is a top view showing one possible way to suppress the transistor action adjacent to the shield trench 135 -S.
  • the IGBT 102 ′ of FIG. 7C is similar to IGBT 102 of FIG. 7B , except that the source region 130 ′ is pulled away from the shield trench 135 -S in the X-axis direction, thus pulling transistor action away from the shield trench 135 -S, and preserving the threshold voltage Vt.
  • FIG. 7D is a perspective view showing another way to suppress the transistor action adjacent to shield trench 135 -S.
  • the IGBT 102 ′′ of FIG. 7D is similar to IGBT 102 of FIG. 6 except that the top of the shield electrode 137 is recessed, so that the top of the shield electrode 137 will not be near the channel region 177 of FIG. 7B . This should prevent the shield electrode from interfering with the threshold voltage in the channel regions adjacent to the shield trench 135 -S.
  • the shield electrode is made of n-type polysilicon.
  • the shield electrode can be made of p-type polysilicon. This should keep the threshold voltage in the channel regions adjacent to the shield trench 135 -S from dropping.
  • FIG. 7E shows another alternative embodiment of the invention very similar to IGBT 102 ′ of FIG. 7C , except that IGBT device 102 ′′′ of FIG. 7E further includes a lightly doped source 131 similar to that shown in FIG. 5A .
  • IGBT device 102 ′′′ of FIG. 7E further includes a lightly doped source 131 similar to that shown in FIG. 5A .
  • other layouts are possible, such as a closed cell layout.
  • FIGS. 8A-8J show a simple method to form the IGBT device of this invention.
  • FIG. 8A shows a starting semiconductor substrate including a (P-type) bottom semiconductor layer 105 with an (N-type) semiconductor top layer of opposite conductive type located thereon.
  • trenches 135 are etched into the top semiconductor layer 110 .
  • the trenches are lined with a dielectric (e.g. oxide) 126 and a bottom shield electrode 135 - 2 is formed at a bottom portion of the trench.
  • an inter-segment dielectric 138 is formed over the bottom shield electrode 135 - 2 .
  • a gate dielectric e.g.
  • a gate electrode (e.g. polysilicon) material 139 is filled into the trenches.
  • the gate electrode material 139 is etched back to form upper gate electrode 135 - 1 , and optional dummy trench electrode 135 -DM-poly.
  • the gate electrode material 139 may be patterned to form vertical gate portion 135 - 1 -V and planar gate portion 135 - 1 -P over the top surface.
  • a heavily doped layer having the same conductivity type as but higher doping concentration than the upper semiconductor layer 110 is formed near the bottom of the trenches.
  • the heavily doped (N-type) layer may also be formed earlier in the process, before depositing the gate electrode material 139 .
  • the source and body regions are formed (e.g. by implantation) along the top of upper semiconductor layer 110 .
  • an emitter electrode 131 is formed on the top surface, contacting the source region 130 , and body region 140 and shield electrode 135 - 2 (connection not shown), and a collector electrode 120 is formed on the back surface contacting the bottom semiconductor layer 105 .
  • FIGS. 9A to 9D show another method of forming an IGBT device of this invention.
  • FIG. 9A which is similar to FIG. 8C , except that instead of bottom shield electrodes 135 - 2 being formed at the bottom portion of the trench, shield electrodes 136 are formed filling most of the shield trenches 135 -S.
  • FIG. 9B a heavily doped layer 145 is formed in the upper layer 110 adjacent to the lower portion of the shield trenches 135 -S. As an option, the heavily doped layer 145 could also be formed earlier in the process.
  • FIG. 9C a gate dielectric 125 -P is formed on the top surface, and a planar gate electrode 136 is formed over the gate dielectric 125 -P.
  • body region 140 source region 130 and lightly doped source region 131 are formed at the top of the semiconductor region.
  • FIG. 10A shows a schematic top view of a possible closed cell layout of an IGBT device of this invention.
  • FIG. 10A shows a single IGBT hexagonal closed cell 200 , which can have a cross sectional structure somewhat similar to that shown in FIG. 5 .
  • Closed cell 200 may have neighboring cells, but those are not shown in this figure for simplicity.
  • At the center of the cell is the P+ body contact region 142 .
  • Surrounding the P+ body contact region 142 is the N+ source region 130 .
  • Surrounding the N+ source region 130 is the P-body region 140 .
  • Surrounding the P-body region 140 is the (surface portion of) heavily doped N region 145 .
  • the shield trench 135 -S Surrounding the heavily doped N region 145 is the shield trench 135 -S.
  • the planar gate 136 Surrounding the heavily doped N region 145 is the shield trench 135 -S.
  • the planar gate 136 On top of the semiconductor substrate is the planar gate 136 , which has been made transparent in FIG. 10A for clarity, and the outline of which is indicated by the heavy dashed lines.
  • the planar gate 136 shown in this layout extends from about the outer edge of the source region 130 to beyond the shield trench 135 -S. Alternatively, it may just extend across the P-body region 140 from the N+ source region 130 to the heavily doped N-type region 145 .
  • An emitter electrode (not shown) can make contact to the N+ source region 130 and the P+ body contact region 142 .
  • FIG. 10B shows a top view of the same closed cell 200 as FIG. 10A , except in this drawing, the planar trench 136 is shown as a solid and covers the underlying layers—the outlines of the structures beneath planar gate 136 are marked by thin dashed lines.
  • the planar gate 136 can extend outwards beyond a single closed cell to neighboring IGBT closed cells, to form a honeycomb shaped network of planar gate 136 .
  • the shield trenches may also be shared or connected to neighboring closed cells to form a honeycomb-like network.
  • the shield electrode in the shield trench 135 -S may be connected to the emitter voltage outside of the closed cell shown in FIGS. 10A-10B , e.g., outside of the active area.
  • an emitter electrode may make a contact to the shield electrode within the closed cell through a break in the planar gate (not shown).
  • an IGBT hexagonal closed cell 200 ′ in FIG. 10C has a planar gate 136 that extends from N+ source region 130 to heavily doped N-type region 145 .
  • the planar gate 136 does not extend beyond the shield trench 135 -S, but instead is connected to neighboring closed cells through planar gate spoke structures 136 -SP.
  • the spoke structures 136 -SP may connect the planar gate 136 of this cell to the planar gates of neighboring cells.
  • FIGS. 11A-11D illustrate a basic process for forming a closed cell IGBT like that shown in FIG. 10A .
  • a semiconductor substrate is provided including a P-type lower layer (not shown), an N-type upper (e.g. epi) layer (not shown) over the P-type lower layer, and a heavily doped N-type region 145 formed at the top of the N-type upper layer.
  • the heavily doped N-type region 145 may be formed all throughout the active area.
  • shield trenches 135 -S are formed in the closed cell in a hexagonal shape.
  • FIG. 11C a planar gate 136 structure is formed over the semiconductor substrate.
  • the outline of the shield trench 135 -S under the planar gate 135 -S is indicated in FIG. 11C by thin dashed lines.
  • the body region 140 , source region 130 , and body contact region 142 are formed; they can be formed self aligned to the inner edge of the planar gate 136 (the planar gate 136 is made transparent in FIG. 11D for clarity, but its outline is indicated by thick dashed lines).
  • the regions formed in FIG. 11D may be formed by implantation and diffusion.
  • the body 140 and body contact regions 142 may be formed without masking in the active area.
  • the source region 130 may be formed using a mask to define the inner boundary of the source region 130 .
  • this invention discloses an insulated gate bipolar transistor (IGBT) device formed in a semiconductor substrate comprising a bottom collector region and top emitter region with a current channel formed in a body/emitter region and a source-dopant drift region.
  • the IGBT device further comprises a shield gate trench comprising an insulation layer padded trench filled with an upper gate segment and a lower shield segment separated by an inter-segment insulation layer and a dummy trench disposed at a distance away from the shield gate trench.
  • the body/emitter region extended between the shield gate trench and the dummy trench, encompassing the source region adjacent to the shield gate trench gate near a top surface of the semiconductor substrate.
  • the IGBT device further includes a heavily doped N+ region extended between the shield gate trench and the dummy trench below the body/emitter region and above the source-dopant drift region above the bottom collector region.
  • the body/emitter region formed between the shield gate trench and the dummy trench may further extend vertically to approximately the same depth as the upper gate segment in the semiconductor substrate.
  • the heavily doped N region disposed below the body/emitter region may further extend vertically to a depth approximately the same as the lower shield segment.
  • the body/emitter region is a P-dopant region and the source region is an N-dopant source region.
  • the body/emitter region is an N-dopant region and the source region is a P-dopant source region.
  • the lower shield segment is padded by a thick gate insulation layer over a bottom surface of the shield gate trench.
  • the body/emitter region extended between the shield gate trench and the dummy trench encompasses the source region disposed between the shield gate trench and the dummy trench near a top surface of the semiconductor substrate.
  • the upper gate segment further extends over a top surface of the semiconductor substrate above the body/emitter region and extends laterally to the source region to form a planar gate portion.

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

This invention discloses an insulated gate bipolar transistor (IGBT) device formed in a semiconductor substrate. The IGBT device has a split-shielded trench gate that includes an upper gate segment and a lower shield segment. The IGBT device may further include a dummy trench filled with a dielectric layer disposed at a distance away from the split-shielded trench gate. The IGBT device further includes a body region extended between the split-shielded trench gate and the dummy trench encompassing a source region surrounding the split-shielded trench gate near a top surface of the semiconductor substrate. The IGBT device further includes a heavily doped N region disposed below the body region and above a source-dopant drift region above a bottom body-dopant collector region at a bottom surface of the semiconductor substrate. In an alternative embodiment, the IGBT may include a planar gate with a trench shield electrode.

Description

  • This patent application is a Divisional application and claim the Priority Date of a co-pending application Ser. No. 12/925,869 filed by the Applicants of this application on Oct. 30, 2010. The Disclosures made in application Ser. No. 12/925,869 are hereby incorporated by reference.
    • BACKGROUND OF THE INVENTION
  • 1. Field of the Invention
  • The invention relates generally to semiconductor power devices. More particularly, this invention relates to new configurations and methods for manufacturing improved device structures for insulated gate bipolar transistors (IGBT).
  • 2. Description of the Prior Art
  • Conventional technologies to configure and manufacture insulated gate bipolar transistor (IGBT) devices are still confronted with difficulties and limitations to further improve the performances due to different tradeoffs. In IGBT devices, there is a tradeoff between the conduction loss VCE,sat (which depends upon the collector to emitter saturation voltage at rated current VCE,sat) and turn-off switching losses, Eoff. More carrier injection while the device is on improves the conductivity of the device, thus reducing conduction loss, but more carrier injection would also cause higher Eoff, because of the energy dissipated when clearing out the injected carriers during turn-off. FIG. 1D is a graph showing the trade-off between VCE,sat and Eoff. It can be observed that the curve for a superior IGBT structure will be shifted closer to the origin, corresponding to lower losses.
  • In addition a trade-off also exists between the IGBT VCE,sat (conduction loss) and the IGBT's short circuit ruggedness, which in turn depends upon its saturation current Jsat. A high Jsat will result in a lot of energy dissipated in the device during short circuit, which would quickly damage the IGBT device. A lower Jsat will reduce the amount of energy dissipated, allowing the IGBT device to withstand the short circuit for a longer period of time without permanent damage; however, a lower Jsat also results in higher conductivity loss VCE,sat.
  • FIG. 1A shows the cross section of a conventional planar gate insulated gate bipolar transistor (IGBT). The IGBT is a semiconductor power device that combines a metal oxide-semiconductor (MOS) gate control with a bipolar current flow mechanism. The functional features of both a metal-oxide-semiconductor field effect transistor (MOSFET) and a bipolar junction transistor (BJT) are combined in an IGBT. Performance features of IGBT are designed to achieve a higher current density than the MOSFETs and faster and more efficient switching characteristics and better control than the BJTs. The drift region can be lightly doped for improved blocking abilities. However the device can still have good conductivity because the lightly doped drift region undergoes high level carrier injection from the bottom P collector region resulting in its conductivity modulation. For these reasons, IGBT devices are often implemented for high power (>10 kW), low to medium frequency (up to 30 kHz) applications. The planar IGBT device shown in FIG. 1A has a simple top side structure and is easy to fabricate. However, the planar gate IGBT as shown in FIG. 1A has high VCE,sat due to poor conductivity modulation near the top side, in addition to JFET resistance due to pinching from neighboring body regions. FIG. 1B is a cross sectional view of another conventional IGBT device that has a trench gate. The trench gate IGBT has the advantages of eliminating the JFET resistance and also has an enhanced top side carrier injection. An accumulation layer can form under the trench gate to improve carrier injection. However, the trench IGBT device as shown has a high Crss capacitance due to capacitance between the trench gate (at gate voltage) and the substrate and drift region below (at drain voltage). The high Crss of this IGBT device slows down the device switching speed and also leads to higher switching energy losses. FIG. 1C is a cross sectional view of another conventional IGBT device. There is a more heavily doped N layer disposed below the channel region, at the top of the lightly doped drift region to further enhance the carrier injection on the topside. However, such device has a lower breakdown voltage due to the heavily doped layer and has a further worsened Crss due to the heavily doped N-layer.
  • For the above reasons, there is a need to provide a new IGBT configuration to reduce the turn-on and turn off energy losses Eon and Eoff losses for improvement of the operation efficiency. Furthermore, it is desirable the new IGBT with the improved configuration can reduce the Crss and increase the breakdown voltage and to increase the cell pitch to lower the Jsat such that the above discussed limitations and difficulties can be resolved.
    • SUMMARY OF THE PRESENT INVENTION
  • It is therefore an aspect of the present invention to provide a new and improved IGBT device configuration and manufacturing method for providing a trench IGBT device with a shielded gate IGBT with more heavily doped layer N layer such that the IGBT with can achieve increased injection with lower E-on and E-off losses.
  • Specifically, it is an aspect of the present invention to provide a new and improved device configuration and manufacturing method for providing a trench IGBT device with a shielded gate with optional dummy trench such that the IGBT with the shield gate can achieve a reduced Crss and lowering the E-on losses and further can taking advantage of a Re-surf action of such IGBT device to increase the breakdown voltage.
  • Another aspect of the present invention is to provide a new and improved device configuration and manufacturing method for providing an IGBT device with a shielded gate with dummy trench such that the cell pitch can be increased to achieve a lower J-sat.
  • It is another aspect of the present invention to provide a new and improved device configuration and manufacturing method for providing shielded-gate trench IGBT with two dimensional channel for achieving a longer channel without a deep body region or a excessively deep trench. The two dimensional channel includes a lateral (planar gate) and a vertical (trench gate) component thus achieving relatively high channel resistance to lower Jsat. The device can therefore achieve an improved rugged short circuit performance with a small cell pitch.
  • Briefly in a preferred embodiment this invention discloses an insulated gate bipolar transistor (IGBT) device formed in a semiconductor substrate. The IGBT device includes a split trench gate comprising an insulation layer padded trench filled with an upper gate segment and a lower shield segment insulated by an inter-segment insulation layer. The IGBT device may further include a dummy trench filled with a dielectric layer disposed at a distance away from the split trench gate. The IGBT device further includes a body region extended between the split trench gate and the dummy trench encompassing a source region surrounding the split trench gate near a top surface of the semiconductor substrate; and a heavily doped region disposed below the body region and above a source-dopant drift region above a bottom body-dopant collector region at a bottom surface of the semiconductor substrate. In a preferred embodiment, the body region extended between the split trench gate and the dummy trench further extends vertically to a depth approximately the same as the upper gate segment in the semiconductor substrate. In another preferred embodiment, the heavily doped region disposed below the body region further extends vertically to a depth approximately the same as the lower shield segment. In another preferred embodiment, the body region is a P-dopant region and the source region is an N-dopant source region. In another preferred embodiment, the body region is an N-dopant region and the source region is a P-dopant source region. In another preferred embodiment, the lower shield segment is padded by a thick gate insulation layer over a bottom surface of the split trench gate.
  • In another preferred embodiment, the IGBT device includes a shield trench, containing a shield electrode and a planar gate. The device does not include a trench gate electrode. The planar gate is located next to the source region and the body region such that it can form a channel in the body region connecting the source region to a drain region. The drain region may be the epitaxial layer, and may include a more heavily doped layer under the body region. In another preferred embodiment, the shield trenches may run along the surface of the semiconductor die in a direction perpendicular to the planar gates. In another preferred embodiment, transistor action may be suppressed next to the shield trenches by pulling the source regions away from the shield trenches, or recessing the shield electrodes from the source regions. Alternatively, the shield electrode may be doped with the opposite conductivity type as the source region.
  • In an alternative embodiment, lightly doped source (LDS) regions may be placed between the gate and more heavily doped source regions to increase the resistance and improve the short circuit ruggedness of the device
  • Furthermore, this invention discloses a method of manufacturing a semiconductor power device in a semiconductor substrate. The method may include a step of forming a dummy trench for an IGBT in a semiconductor substrate for increasing a cell pitch for lowering a J-sat of the IGBT. In another embodiment, the method further may includes a step of forming the IGBT with a two-dimensional channel by forming a trench gate of the IGBT to extend laterally above a body region to a source region such that the channel includes a lateral and a vertical component. An IGBT may also be formed by forming shield trenches with shield electrodes near the top of the device and forming planar gates on the top surface of the device.
  • These and other objects and advantages of the present invention will no doubt become obvious to those of ordinary skill in the art after having read the following detailed description of the preferred embodiment, which is illustrated in the various drawing figures.
    • BRIEF DESCRIPTION OF THE DRAWINGS
  • FIGS. 1A to 1C are cross sectional views showing three different configurations of conventional IGBT devices.
  • FIG. 1D is a chart showing tradeoffs in the characteristics of IGBT devices.
  • FIG. 2 is a cross sectional view of a shielded gate IGBT with trench gate and trench shield.
  • FIG. 3A is a cross sectional view of a shielded gate IGBT device having a trench shield and a 2D trench gate with a lateral extension to control a two-dimensional (2D) channel with a lateral and vertical channel components of this of this invention. FIG. 3B is a similar structure with lightly doped source (LDS) added.
  • FIG. 4 is a cross sectional view of a shielded gate IGBT device having a trench shield and a planar gate that is parallel to the trench shield.
  • FIG. 5 is a similar cross sectional view of a shielded gate IGBT device having a trench shield and a planar gate that is parallel to the trench shield. FIG. 5-1 is a similar cross sectional view to FIG. 5, except that it includes a field stop layer near the bottom of the device.
  • FIG. 6 is a cross sectional perspective view of a shielded gate IGBT device having a trench shield and a planar gate that is perpendicular to the trench shield, in the 3rd dimension.
  • FIGS. 7A-7C, and 7E are possible top views of FIG. 6.
  • FIG. 7D is an alternative cross sectional perspective view similar to FIG. 6.
  • FIGS. 8A-8J are cross sectional views illustrating a process of forming an device of this invention.
  • FIGS. 9A-9D are cross sectional views illustrating a process of forming another device of this invention.
  • FIGS. 10A-10C are top views showing an IGBT closed cell layout of this invention.
  • FIGS. 11A-11D are top views illustrating a method of making an IGBT with a closed cell layout of this invention.
    •  DETAILED DESCRIPTION OF THE METHOD
  • FIG. 2 is a cross-sectional view of an IGBT device having a trench shield and trench gate configuration with dummy trench of this invention. The IGBT device 100 is formed in semiconductor substrate 105 that has a first conductivity type, e.g., a P type substrate 105. An epitaxial layer 110 of a second conductivity type, e.g., an N-epitaxial (epi) layer 110, is supported on top of the P-type substrate 105. Alternatively, the P type substrate 105 and the epitaxial layer 110 may together be referred to as the semiconductor substrate since they both generally have a monocrystalline structure; additionally, the P type substrate may be more generally referred to as a bottom or lower semiconductor layer and the epitaxial layer 110 may more generally be referred to as an upper semiconductor layer. The IGBT 100 is a vertical IGBT device with a collector electrode 120 disposed on a bottom surface of the substrate and an emitter electrode 131 disposed on a top surface. The IGBT device shown in FIG. 2 has a shield gate trench that comprises an insulation layer 126 padded trench filled with an upper gate segment 135-1 and a lower shield segment 135-2 insulated from each other by an inter-segment insulation layer 138. The upper gate segment 135-1 is lined with a gate oxide 125. The IGBT device further includes a dummy trench 135-DM filled with a dielectric layer, and optionally a polysilicon layer 135-DM-poly, disposed at a distance away from the shield gate trench 135. The IGBT device further includes a P-type body/emitter region 140 extended between the shield gate trench 135 and the dummy trench 135-DM encompassing an N-type source region 130 next to the shield gate trench 135 near a top surface of the semiconductor substrate. The body/emitter region 140 extended between the shield gate trench 135 and the dummy trench 135-DM further extends vertically to a depth approximately the same as the depth of the bottom of upper gate segment 135-1 in the semiconductor substrate. The IGBT device further includes a heavily doped N region 145 as an N-type region disposed below the body/emitter region 140 and above the N-type epitaxial layer 110. The N-type epi layer 110 functions as a drift region above a bottom P-type collector region 105 at a bottom surface of the semiconductor substrate. The heavily doped N region 145 disposed below the body/emitter region 140 further extend vertically to an approximately depth the same as the lower shield segment 135-2. The heavily doped N region 145 has the same conductivity type as the drift region/epitaxial layer 110, but heavily doped N region 145 has a higher doping concentration. Together, the heavily doped N region 145 and N drift/epitaxial region 110 may act as the base of the PNP bipolar transistor portion of the IGBT device. The lower shield segment 135-2 is padded by a thick trench insulation layer 126 over a bottom surface of the shield gate trench 135.
  • The IGBT device 100 has an advantage that the shield gate trench and heavily doped N region can achieve improved conduction with lower Eoff and Eon losses. The presence of heavily doped N region increases carrier concentration near the topside region of this device, thereby lowering Vce,sat without increasing carrier injection level and Eoff. The heavily doped N region improves the conductivity modulation of the device by making the carrier profile more uniform during conductivity modulation by putting the heavily doped N region having many majority carriers at the top of the drift/epi region, where the minority carrier concentration usually drops off. Furthermore, the shield electrode of this embodiment can achieve a reduced Crss and lower the Eon and Eoff losses and further can take advantage of a Re-surf action of such IGBT device to prevent any lowering of breakdown voltage due to the presence of heavily doped N region under the P body. The shield electrode also allows the heavily doped N region to be even more highly doped and thus improves the Vce,sat. The dummy trench may be an optional feature, but can be included to increase the cell pitch, which achieves a lower Jsat, and thus improve the short circuit ruggedness of the device. The trench 135-DM can be made a dummy trench by removing the MOS channel action from it, for example by connecting the dummy trench poly 135-DM-poly to the source voltage, or by not placing a source region 130 adjacent to the dummy trench 135-DM.
  • FIG. 3A is a cross-sectional view of another IGBT device, having a shielded gate trench bipolar transistor configuration with a two-dimensional (2D) channel of this invention. The IGBT device 100′ is formed in semiconductor substrate 105 that has a first conductivity type, e.g., a P type substrate 105. An epitaxial layer 110 of a second conductivity type, e.g., an N-epitaxial layer 110, is supported on top of the P-type substrate 105. The IGBT 100′ is a vertical IGBT device with a collector electrode 120 disposed on a bottom surface of the substrate and an emitter electrode 131 disposed on a top surface. The IGBT device has a shield gate trench 135′ that comprises a trench padded with insulation layer 126 and filled with an upper gate segment 135-1-V and a lower shield segment 135-2 separated by an inter-segment insulation layer 138. The IGBT device 100′ may further include a dummy trench 135-DM optionally having an electrode, e.g., a polysilicon layer 135-DM-poly, disposed at a distance away from the shield gate trench 135. The IGBT device further includes a body/emitter region 140 extended between the shield gate trench 135 and the dummy trench 135-DM encompassing a source region 130′ disposed between the shield gate trench 135 and the dummy trench 135-DM near a top surface of the semiconductor substrate. The body/emitter region 140 extended between the shield gate trench 135 and the dummy trench 135-DM further extends vertically to a depth shallower than a depth of the upper gate segment 135-1-V in the semiconductor substrate. The emitter electrode 131 is connected to the source 130′ and the body/emitter region 140 (and to the dummy trench electrode 135-DM-poly). The upper gate segment 135-1-V further extends on its top side to planar gate segment 135-1-P over a top surface of the semiconductor substrate above the body/emitter region 140 and reaching the source region 130′. The upper gate segment 135-1-V is insulated from the semiconductor substrate by vertical gate oxide 125-V. The planar gate oxide 125-P insulates the planar gate segment 135-1-P from the semiconductor surface. The IGBT device 100′ further includes a heavily doped region 145 as an N-type region disposed below the body/emitter region 140 and above the N-type epitaxial layer 110. The N-type epitaxial layer 110 functions as a source-dopant-type drift region above a bottom body-dopant-type collector region 105 at a bottom surface of the semiconductor substrate. The heavily doped N+ region 145 disposed below the body-dopant region 140 further extends vertically to a depth approximately the same as the lower shield segment 135-2. The heavily doped N+ region 145 and the N-epi layer 110 under the body region 140 may be considered the drain of the MOSFET portion of the insulated gate bipolar transistor (IGBT), and also as the base region of the bipolar junction transistor (BJT) portion of the IGBT. The lower shield segment 135-2 is padded by a thick gate insulation layer 126 over a bottom surface of the shield gate trench 135′. The lower shield segment 135-2 is connected to the source/emitter voltage.
  • The IGBT device 100′ shown in FIG. 3A is implemented with a new and improved device configuration and manufacturing method to provide a shielded-gate trench bipolar transistor with two dimensional channel for achieving a longer channel without requiring a deep body region. The two dimensional channel includes a lateral and a vertical component thus achieving relatively high channel resistance by increasing the channel length without requiring excessively deep trenches, which are difficult and expensive to fabricate, or requiring excessively wide cell pitches. The high channel resistance is desirable to reduce the saturation current density, Jsat. The device can therefore achieve an improved rugged short circuit performance, while having a small cell pitch.
  • FIG. 3B shows another embodiment of the present invention with IGBT 100″ similar to the IGBT 100′ of FIG. 3A except that the IGBT 100″ additionally includes an N-type lightly doped source (LDS) region 131 located between the highly doped N-type source region 130, and the beginning of the planar gate portion 135-1-P. The lightly doped source region 131 provides additional series resistance which adds a voltage drop during current flow, leading to emitter de-biasing. This voltage drop is small and negligible at normal operating currents, but during high currents, such as those produced during a short circuit, the voltage drop is high, which significantly reduces the saturation current density, Jsat, and improves the device's ability to withstand a short circuit. This also allows for a smaller cell pitch design while keeping the saturation current density Jsat low.
  • FIG. 4 shows another embodiment of the invention in which the gate of IGBT 101 is a planar gate 136. The trenches only have a shield electrode 137 surrounded by dielectric (e.g. oxide) 126 to form shield trenches 135-S; the shield trenches 135-S do not have a gate electrode component. The device does not require a gate electrode. The shield electrode 137 is connected to the source/emitter voltage. In this embodiment, the channel is only horizontal, running at the top of the body region 140, beneath the planar gate 136, from the source 130 (and optional lightly doped source 131) to the top of the heavily doped N+ region 145. This embodiment may be easier to manufacture, as it is simple to form a planar gate and because the shield trench 135-S with its single electrode is much easier to form than a shield gate trench structure with multiple electrodes. The shield trench 135-S still charge compensates the N+ region 145 to keep the breakdown voltage (BV) high, and also keeps the capacitance Crss low for fast and efficient switching.
  • FIG. 5 shows a slight variation of the IGBT 101 of FIG. 4, except that the IGBT 101′ does not include the lightly doped source 131, but only has N+ source region 130. It also further includes a highly doped P+ body contact region 142, to allow good contact to the P-body region 140. The emitter electrode is not specifically shown but it contacts the source 130 and the P+ body contact regions 142, and is also connected to shield trench electrodes 137.
  • The embodiments of this invention may also be combined with various bottom structures. For example in FIG. 5-1, IGBT 101′-1 is similar to IGBT 101′ of FIG. 5, except for the inclusion of an N-type field stop layer 101 at the bottom of the N-epi drift layer 111.
  • FIG. 6 shows a cross sectional perspective view of an IGBT device 102 similar to the IGBT device 101′ of FIG. 5B. In IGBT 102, the planar gate 136 runs in a different direction than the shield trenches 135-S. They both parallel to the major plane of the device, e.g. along the top surface of the semiconductor material substrate (highly doped bottom substrate and epi layer together), but in different directions along the surface. For example, as shown in FIG. 6, the planar gate 136 runs substantially perpendicularly to shield trenches 135-6; the planar gate 136 runs in the X-axis direction, while the shield trench 135-S runs in the Z-axis direction.
  • FIG. 7A shows a possible top view of the IGBT 102 of FIG. 6. This shows the top view along the X-Z plane, with planar gate 136, source 130, body 140, and body contact regions 142, running in stripes in the X-axis direction. The shield trench 135-S runs in the Z-axis direction. The shield electrode 137 is covered by trench oxide 126, but its outline is indicated by dashed lines. Again, the emitter electrode and top passivation layers are not shown for clarity.
  • FIG. 7B shows another top view similar to that of FIG. 6, except that in this case, the planar gate 136 and its underlying gate oxide 125 are made transparent to show the underlying structures; also, the shield electrode 137 is shaded in this figure, even though it is actually covered by the trench oxide 126. A portion of the body region 140 lies between the source region 130 and the top of the N+ region 145, and it is within this portion that the MOS channel is formed. However a potential problem can occur in the channel region 177 adjacent to the shield trench 135-S. In region 177, an inversion layer may form in the P-body 140 adjacent to the shield trench 135-S under a small gate bias. This lowers the threshold voltage Vt of the device and can also lead to increased leakage in the device.
  • To solve this problem, it is desired to suppress the transistor action adjacent to the shield trench 135-S. FIG. 7C is a top view showing one possible way to suppress the transistor action adjacent to the shield trench 135-S. The IGBT 102′ of FIG. 7C is similar to IGBT 102 of FIG. 7B, except that the source region 130′ is pulled away from the shield trench 135-S in the X-axis direction, thus pulling transistor action away from the shield trench 135-S, and preserving the threshold voltage Vt.
  • FIG. 7D is a perspective view showing another way to suppress the transistor action adjacent to shield trench 135-S. The IGBT 102″ of FIG. 7D is similar to IGBT 102 of FIG. 6 except that the top of the shield electrode 137 is recessed, so that the top of the shield electrode 137 will not be near the channel region 177 of FIG. 7B. This should prevent the shield electrode from interfering with the threshold voltage in the channel regions adjacent to the shield trench 135-S.
  • Yet another way to suppress the transistor action is to switch the conductivity type of the shield electrode 137. In a typical n-channel IGBT device, the shield electrode is made of n-type polysilicon. However, to increase the threshold voltage in the channel regions adjacent to the shield trench, the shield electrode can be made of p-type polysilicon. This should keep the threshold voltage in the channel regions adjacent to the shield trench 135-S from dropping.
  • FIG. 7E shows another alternative embodiment of the invention very similar to IGBT 102′ of FIG. 7C, except that IGBT device 102′″ of FIG. 7E further includes a lightly doped source 131 similar to that shown in FIG. 5A. Of course, other layouts are possible, such as a closed cell layout.
  • By way of example, FIGS. 8A-8J show a simple method to form the IGBT device of this invention. FIG. 8A shows a starting semiconductor substrate including a (P-type) bottom semiconductor layer 105 with an (N-type) semiconductor top layer of opposite conductive type located thereon. In FIG. 8B, trenches 135 are etched into the top semiconductor layer 110. In FIG. 8C, the trenches are lined with a dielectric (e.g. oxide) 126 and a bottom shield electrode 135-2 is formed at a bottom portion of the trench. In FIG. 8D, an inter-segment dielectric 138 is formed over the bottom shield electrode 135-2. In FIG. 8E, a gate dielectric (e.g. oxide) 125 is formed on the upper sidewalls of the trenches, and in FIG. 8F, a gate electrode (e.g. polysilicon) material 139 is filled into the trenches. In FIG. 8G, the gate electrode material 139 is etched back to form upper gate electrode 135-1, and optional dummy trench electrode 135-DM-poly. In an alternative embodiment, as shown in FIG. 8G-1, the gate electrode material 139 may be patterned to form vertical gate portion 135-1-V and planar gate portion 135-1-P over the top surface. In FIG. 8H, a heavily doped layer having the same conductivity type as but higher doping concentration than the upper semiconductor layer 110 is formed near the bottom of the trenches. Of course, the heavily doped (N-type) layer may also be formed earlier in the process, before depositing the gate electrode material 139. In FIG. 8I, the source and body regions are formed (e.g. by implantation) along the top of upper semiconductor layer 110. In FIG. 8J, an emitter electrode 131 is formed on the top surface, contacting the source region 130, and body region 140 and shield electrode 135-2 (connection not shown), and a collector electrode 120 is formed on the back surface contacting the bottom semiconductor layer 105.
  • FIGS. 9A to 9D show another method of forming an IGBT device of this invention. In FIG. 9A, which is similar to FIG. 8C, except that instead of bottom shield electrodes 135-2 being formed at the bottom portion of the trench, shield electrodes 136 are formed filling most of the shield trenches 135-S. In FIG. 9B, a heavily doped layer 145 is formed in the upper layer 110 adjacent to the lower portion of the shield trenches 135-S. As an option, the heavily doped layer 145 could also be formed earlier in the process. In FIG. 9C, a gate dielectric 125-P is formed on the top surface, and a planar gate electrode 136 is formed over the gate dielectric 125-P. In FIG. 9D body region 140, source region 130 and lightly doped source region 131 are formed at the top of the semiconductor region.
  • As mentioned earlier, the IGBT device may also have a closed cell layout. FIG. 10A shows a schematic top view of a possible closed cell layout of an IGBT device of this invention. FIG. 10A shows a single IGBT hexagonal closed cell 200, which can have a cross sectional structure somewhat similar to that shown in FIG. 5. Closed cell 200 may have neighboring cells, but those are not shown in this figure for simplicity. At the center of the cell is the P+ body contact region 142. Surrounding the P+ body contact region 142 is the N+ source region 130. Surrounding the N+ source region 130 is the P-body region 140. Surrounding the P-body region 140 is the (surface portion of) heavily doped N region 145. Surrounding the heavily doped N region 145 is the shield trench 135-S. On top of the semiconductor substrate is the planar gate 136, which has been made transparent in FIG. 10A for clarity, and the outline of which is indicated by the heavy dashed lines. The planar gate 136 shown in this layout extends from about the outer edge of the source region 130 to beyond the shield trench 135-S. Alternatively, it may just extend across the P-body region 140 from the N+ source region 130 to the heavily doped N-type region 145. An emitter electrode (not shown) can make contact to the N+ source region 130 and the P+ body contact region 142.
  • FIG. 10B shows a top view of the same closed cell 200 as FIG. 10A, except in this drawing, the planar trench 136 is shown as a solid and covers the underlying layers—the outlines of the structures beneath planar gate 136 are marked by thin dashed lines.
  • The planar gate 136 can extend outwards beyond a single closed cell to neighboring IGBT closed cells, to form a honeycomb shaped network of planar gate 136. The shield trenches may also be shared or connected to neighboring closed cells to form a honeycomb-like network. In such a case, the shield electrode in the shield trench 135-S may be connected to the emitter voltage outside of the closed cell shown in FIGS. 10A-10B, e.g., outside of the active area. Alternatively, an emitter electrode may make a contact to the shield electrode within the closed cell through a break in the planar gate (not shown).
  • In an alternative embodiment similar to closed cell 200 of FIG. 10A, an IGBT hexagonal closed cell 200′ in FIG. 10C has a planar gate 136 that extends from N+ source region 130 to heavily doped N-type region 145. However in this case, the planar gate 136 does not extend beyond the shield trench 135-S, but instead is connected to neighboring closed cells through planar gate spoke structures 136-SP. The spoke structures 136-SP may connect the planar gate 136 of this cell to the planar gates of neighboring cells.
  • The top views of FIGS. 11A-11D illustrate a basic process for forming a closed cell IGBT like that shown in FIG. 10A. In FIG. 11A, a semiconductor substrate is provided including a P-type lower layer (not shown), an N-type upper (e.g. epi) layer (not shown) over the P-type lower layer, and a heavily doped N-type region 145 formed at the top of the N-type upper layer. By way of example, the heavily doped N-type region 145 may be formed all throughout the active area. In FIG. 11B, shield trenches 135-S are formed in the closed cell in a hexagonal shape. Next, in FIG. 11C, a planar gate 136 structure is formed over the semiconductor substrate. The outline of the shield trench 135-S under the planar gate 135-S is indicated in FIG. 11C by thin dashed lines. Next, in FIG. 11D, the body region 140, source region 130, and body contact region 142 are formed; they can be formed self aligned to the inner edge of the planar gate 136 (the planar gate 136 is made transparent in FIG. 11D for clarity, but its outline is indicated by thick dashed lines). By way of example, the regions formed in FIG. 11D may be formed by implantation and diffusion. The body 140 and body contact regions 142 may be formed without masking in the active area. The source region 130 may be formed using a mask to define the inner boundary of the source region 130.
  • In essence, this invention discloses an insulated gate bipolar transistor (IGBT) device formed in a semiconductor substrate comprising a bottom collector region and top emitter region with a current channel formed in a body/emitter region and a source-dopant drift region. The IGBT device further comprises a shield gate trench comprising an insulation layer padded trench filled with an upper gate segment and a lower shield segment separated by an inter-segment insulation layer and a dummy trench disposed at a distance away from the shield gate trench. In one embodiment, the body/emitter region extended between the shield gate trench and the dummy trench, encompassing the source region adjacent to the shield gate trench gate near a top surface of the semiconductor substrate. In another embodiment, the IGBT device further includes a heavily doped N+ region extended between the shield gate trench and the dummy trench below the body/emitter region and above the source-dopant drift region above the bottom collector region. In one embodiment, the body/emitter region formed between the shield gate trench and the dummy trench may further extend vertically to approximately the same depth as the upper gate segment in the semiconductor substrate. In one embodiment, the heavily doped N region disposed below the body/emitter region may further extend vertically to a depth approximately the same as the lower shield segment. In one embodiment, the body/emitter region is a P-dopant region and the source region is an N-dopant source region. In another embodiment, the body/emitter region is an N-dopant region and the source region is a P-dopant source region. In one embodiment, the lower shield segment is padded by a thick gate insulation layer over a bottom surface of the shield gate trench. In one embodiment, the body/emitter region extended between the shield gate trench and the dummy trench encompasses the source region disposed between the shield gate trench and the dummy trench near a top surface of the semiconductor substrate. the upper gate segment further extends over a top surface of the semiconductor substrate above the body/emitter region and extends laterally to the source region to form a planar gate portion.
  • Although the present invention has been described in terms of the presently preferred embodiment, it is to be understood that such disclosure is not to be interpreted as limiting. For example, though the conductivity types in the examples above often show an n-channel device, the invention can also be applied to p-channel devices by reversing the polarities of the conductivity types. Various alterations and modifications will no doubt become apparent to those skilled in the art after reading the above disclosure. Accordingly, it is intended that the appended claims be interpreted as covering all alterations and modifications as fall within the true spirit and scope of the invention.

Claims (20)

I claim:
1. An insulated gate bipolar transistor (IGBT) device comprising:
a semiconductor substrate including a lower semiconductor layer of a second conductivity type and an upper semiconductor layer of a first conductivity type located over the lower semiconductor layer;
a shield gate trench located at the top of the semiconductor substrate, said shield gate trench having a shield electrode at its bottom, and a gate electrode at its top;
a heavily doped layer having a first conductivity type, said heavily doped layer being more heavily doped than the upper semiconductor layer, said heavily doped layer being located approximately at the same level of the shield electrode, wherein said IGBT device is a vertical device.
2. The insulated gate bipolar transistor (IGBT) device of claim 1 further comprising:
a dummy trench located next to the shield gate trench, said dummy trench not having a metal oxide semiconductor (MOS) channel element to it.
3. A method of forming an insulated gate bipolar transistor (IGBT) device comprising:
providing a semiconductor substrate;
forming a shield trench at a top portion of said semiconductor substrate, said trench including a shield electrode;
forming a planar gate located over a portion of said semiconductor substrate such that said planar gate provides a channel to a base region of said IGBT device; and
forming a heavily doped region in the semiconductor substrate adjacent to the shield electrode and below said planar gate.
4. A method of claim 3 further comprising:
forming a body region of a second conductivity type, and a source region of a first conductivity type at the top of the semiconductor substrate,
wherein said forming a heavily doped layer further comprises forming a heavily doped layer of a first conductivity type below the body region, wherein the semiconductor substrate includes an upper semiconductor layer of a first conductivity type, and a lower portion of a second conductivity type, wherein said heavily doped region has a higher doping concentration than the upper semiconductor layer, and wherein at least a portion of the upper semiconductor layer is located between the heavily doped layer and the lower semiconductor layer.
5. The method of claim 4 further comprising:
suppressing transistor action adjacent to the shield trench to avoid decreases in the threshold voltage.
6. The method of claim 5 wherein:
said suppressing transistor action adjacent to the shield trench further comprises locating a source region away from the shield trench.
7. The method of claim 6 further comprising:
arranging the planar gates and the trench gates to run approximately perpendicular to each other along the top of said semiconductor substrate.
8. An insulated gate bipolar transistor (IGBT) device in a semiconductor material comprising:
a semiconductor substrate comprising a lower semiconductor layer having a second conductivity type, and an upper semiconductor layer having a first conductivity type;
a body region having a second conductivity type located at the top of the semiconductor substrate and a source region having a first conductivity type located at the top of the body region;
a heavily doped layer of the first conductivity type located below the body region and above at least a portion of the upper semiconductor layer, said heavily doped layer having a higher doping concentration than the upper semiconductor layer;
an emitter electrode contacting the source and body regions;
a trench including a shield electrode, said shield electrode being connected to the emitter electrode;
a planar gate formed over at least a portion of the source and body regions; and
a highly doped source region and a lightly doped source (LDS) region, said LDS being located between the highly doped source region and the planar gate.
9. The IGBT device of claim 8 wherein:
the heavily doped layer and the upper semiconductor layer comprise a base region of the IGBT, and wherein the planar gate is located next to the source region and the body region such that it forms a channel region in the body region from the source region to base region of the IGBT.
11. The IGBT device of claim 8 wherein:
the trench further includes a gate electrode such that the device has a vertical gate component and a horizontal gate component, such that a channel formed from a horizontal gate component is connected to a channel formed from the vertical gate component.
12. The IGBT device of claim 8 further comprising:
a second trench acting as a dummy trench, said dummy trench configured so as to not form a channel adjacent to the trench.
13. The IGBT device of claim 8 wherein:
the device does not include a trench gate electrode.
14. The IGBT of claim 13 further comprising:
a channel region formed by the planar gate, wherein the channel region is not located adjacent to the shield electrode.
15. The IGBT of claim 13 wherein:
the source region is located away from the shield trench.
16. The IGBT of claim 14 wherein:
the shield electrode is recessed away from the channel region.
17. The IGBT of claim 13 wherein:
the shield electrode has the opposite conductivity type as the source region.
18. The IGBT of claim 13 wherein:
the shield trench runs perpendicular to and intersects the planar gate along the top surface of the substrate.
19. The IGBT of claim 18 wherein:
the source and body regions run parallel to the planar gate, and the source region is pulled back from the shield trench.
20. The IGBT of claim 8 wherein:
the IGBT is a vertical device.
21. The IGBT device of claim 8 wherein:
the IGBT has a closed cell layout.
US13/892,259 2010-10-31 2013-05-11 Topside structures for an insulated gate bipolar transistor (IGBT) device to achieve improved device performances Active 2031-03-27 US10686062B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US13/892,259 US10686062B2 (en) 2010-10-31 2013-05-11 Topside structures for an insulated gate bipolar transistor (IGBT) device to achieve improved device performances

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/925,869 US8441046B2 (en) 2010-10-31 2010-10-31 Topside structures for an insulated gate bipolar transistor (IGBT) device to achieve improved device performances
US13/892,259 US10686062B2 (en) 2010-10-31 2013-05-11 Topside structures for an insulated gate bipolar transistor (IGBT) device to achieve improved device performances

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US12/925,869 Division US8441046B2 (en) 2010-10-31 2010-10-31 Topside structures for an insulated gate bipolar transistor (IGBT) device to achieve improved device performances

Publications (3)

Publication Number Publication Date
US20140332845A1 US20140332845A1 (en) 2014-11-13
US20170069740A9 true US20170069740A9 (en) 2017-03-09
US10686062B2 US10686062B2 (en) 2020-06-16

Family

ID=51864182

Family Applications (1)

Application Number Title Priority Date Filing Date
US13/892,259 Active 2031-03-27 US10686062B2 (en) 2010-10-31 2013-05-11 Topside structures for an insulated gate bipolar transistor (IGBT) device to achieve improved device performances

Country Status (1)

Country Link
US (1) US10686062B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022123026A1 (en) * 2020-12-11 2022-06-16 Mqsemi Ag Semiconductor device

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150118810A1 (en) * 2013-10-24 2015-04-30 Madhur Bobde Buried field ring field effect transistor (buf-fet) integrated with cells implanted with hole supply path
CN204130542U (en) * 2014-06-09 2015-01-28 英飞凌科技股份有限公司 Power semiconductor
CN204067367U (en) * 2014-06-09 2014-12-31 英飞凌科技股份有限公司 Power semiconductor
US10388781B2 (en) 2016-05-20 2019-08-20 Alpha And Omega Semiconductor Incorporated Device structure having inter-digitated back to back MOSFETs
CN106783607A (en) * 2016-12-07 2017-05-31 株洲中车时代电气股份有限公司 A kind of trench gate IGBT device and preparation method thereof
CN108231878B (en) * 2018-02-05 2020-06-30 电子科技大学 Bidirectional trench gate charge storage type IGBT and manufacturing method thereof
CN108428740B (en) * 2018-02-13 2020-09-04 株洲中车时代电气股份有限公司 IGBT chip with composite gate structure containing virtual gate
CN111293168B (en) * 2018-12-10 2023-08-25 深圳尚阳通科技股份有限公司 IGBT device and manufacturing method thereof
GB2585696B (en) * 2019-07-12 2021-12-15 Mqsemi Ag Semiconductor device and method for producing same
CN110444471A (en) * 2019-08-22 2019-11-12 电子科技大学 A kind of preparation method of 3 dimension separation gate groove charge storage type IGBT
GB2590716B (en) * 2019-12-30 2023-12-20 Mqsemi Ag Fortified trench planar MOS power transistor
JP7447769B2 (en) * 2020-11-13 2024-03-12 三菱電機株式会社 Semiconductor elements, semiconductor devices
GB2602637B (en) * 2021-01-06 2023-11-01 Mqsemi Ag Semiconductor device and method for designing thereof

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6768168B1 (en) * 1995-03-14 2004-07-27 Mitsubishi Denki Kabushiki Kaisha Insulated gate semiconductor device with low on voltage and manufacturing method thereof
US6781194B2 (en) * 2001-04-11 2004-08-24 Silicon Semiconductor Corporation Vertical power devices having retrograded-doped transition regions and insulated trench-based electrodes therein
JP4528460B2 (en) * 2000-06-30 2010-08-18 株式会社東芝 Semiconductor element
GB0326030D0 (en) * 2003-11-06 2003-12-10 Koninkl Philips Electronics Nv Insulated gate field effect transistor
US7405452B2 (en) * 2004-02-02 2008-07-29 Hamza Yilmaz Semiconductor device containing dielectrically isolated PN junction for enhanced breakdown characteristics
US7884390B2 (en) * 2007-10-02 2011-02-08 Fairchild Semiconductor Corporation Structure and method of forming a topside contact to a backside terminal of a semiconductor device
US8008747B2 (en) * 2008-02-28 2011-08-30 Alpha & Omega Semiconductor, Ltd. High power and high temperature semiconductor power devices protected by non-uniform ballasted sources
US8441046B2 (en) * 2010-10-31 2013-05-14 Alpha And Omega Semiconductor Incorporated Topside structures for an insulated gate bipolar transistor (IGBT) device to achieve improved device performances
US9048282B2 (en) * 2013-03-14 2015-06-02 Alpha And Omega Semiconductor Incorporated Dual-gate trench IGBT with buried floating P-type shield

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022123026A1 (en) * 2020-12-11 2022-06-16 Mqsemi Ag Semiconductor device

Also Published As

Publication number Publication date
US10686062B2 (en) 2020-06-16
US20140332845A1 (en) 2014-11-13

Similar Documents

Publication Publication Date Title
US8441046B2 (en) Topside structures for an insulated gate bipolar transistor (IGBT) device to achieve improved device performances
US10804355B2 (en) Dual-gate trench IGBT with buried floating P-type shield
US9048282B2 (en) Dual-gate trench IGBT with buried floating P-type shield
US10686062B2 (en) Topside structures for an insulated gate bipolar transistor (IGBT) device to achieve improved device performances
US10998264B2 (en) Dual-gate trench IGBT with buried floating P-type shield
USRE47198E1 (en) Power semiconductor device
US9093522B1 (en) Vertical power MOSFET with planar channel and vertical field plate
KR101745776B1 (en) Power Semiconductor Device
US8294235B2 (en) Edge termination with improved breakdown voltage
TWI453919B (en) Diode structures with controlled injection efficiency for fast switching
JP5002148B2 (en) Semiconductor device
CN215377412U (en) Power semiconductor device
US9685523B2 (en) Diode structures with controlled injection efficiency for fast switching
EP2342753B1 (en) Insulated gate bipolar transistor
JP2019071313A (en) Semiconductor device
US11588045B2 (en) Fortified trench planar MOS power transistor
US9502547B2 (en) Charge reservoir IGBT top structure
CN112201690A (en) MOSFET transistor
JP2012089824A (en) Semiconductor element and manufacturing method thereof
JP5838176B2 (en) Semiconductor device
JP6173987B2 (en) Semiconductor device
CN210015858U (en) Super junction device structure

Legal Events

Date Code Title Description
AS Assignment

Owner name: ALPHA AND OMEGA SEMICONDUCTOR INCORPORATED, CALIFORNIA

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:BOBDE, MADHUR;BHALLA, ANUP;REEL/FRAME:030420/0217

Effective date: 20101029

Owner name: ALPHA AND OMEGA SEMICONDUCTOR INCORPORATED, CALIFO

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:BOBDE, MADHUR;BHALLA, ANUP;REEL/FRAME:030420/0217

Effective date: 20101029

AS Assignment

Owner name: ALPHA AND OMEGA SEMICONDUCTOR INCORPORATED, CALIFORNIA

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:BOBDE, MADHUR, MR;REEL/FRAME:041786/0471

Effective date: 20101029

Owner name: ALPHA AND OMEGA SEMICONDUCTOR INCORPORATED, CALIFO

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:BOBDE, MADHUR, MR;REEL/FRAME:041786/0471

Effective date: 20101029

STPP Information on status: patent application and granting procedure in general

Free format text: FINAL REJECTION MAILED

STPP Information on status: patent application and granting procedure in general

Free format text: DOCKETED NEW CASE - READY FOR EXAMINATION

STPP Information on status: patent application and granting procedure in general

Free format text: NON FINAL ACTION MAILED

STPP Information on status: patent application and granting procedure in general

Free format text: RESPONSE TO NON-FINAL OFFICE ACTION ENTERED AND FORWARDED TO EXAMINER

STPP Information on status: patent application and granting procedure in general

Free format text: FINAL REJECTION MAILED

STPP Information on status: patent application and granting procedure in general

Free format text: NOTICE OF ALLOWANCE MAILED -- APPLICATION RECEIVED IN OFFICE OF PUBLICATIONS

STPP Information on status: patent application and granting procedure in general

Free format text: PUBLICATIONS -- ISSUE FEE PAYMENT VERIFIED

STCF Information on status: patent grant

Free format text: PATENTED CASE

MAFP Maintenance fee payment

Free format text: PAYMENT OF MAINTENANCE FEE, 4TH YEAR, LARGE ENTITY (ORIGINAL EVENT CODE: M1551); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY

Year of fee payment: 4