US20160168168A1 - Process for preparing benzoxaboroles - Google Patents
Process for preparing benzoxaboroles Download PDFInfo
- Publication number
- US20160168168A1 US20160168168A1 US14/969,467 US201514969467A US2016168168A1 US 20160168168 A1 US20160168168 A1 US 20160168168A1 US 201514969467 A US201514969467 A US 201514969467A US 2016168168 A1 US2016168168 A1 US 2016168168A1
- Authority
- US
- United States
- Prior art keywords
- compound
- formula
- alkyl
- salt
- reagent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- GDMJXXLVTYSBBE-UHFFFAOYSA-N 1,2-benzoxaborole Chemical class C1=CC=C2OB=CC2=C1 GDMJXXLVTYSBBE-UHFFFAOYSA-N 0.000 title description 2
- 238000004519 manufacturing process Methods 0.000 title 1
- 150000001875 compounds Chemical class 0.000 claims abstract description 93
- 150000003839 salts Chemical class 0.000 claims abstract description 64
- 239000003153 chemical reaction reagent Substances 0.000 claims abstract description 29
- 238000000034 method Methods 0.000 claims abstract description 27
- 125000006239 protecting group Chemical group 0.000 claims abstract description 16
- 239000000203 mixture Substances 0.000 claims description 22
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical group [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 18
- 239000003054 catalyst Substances 0.000 claims description 17
- MZRVEZGGRBJDDB-UHFFFAOYSA-N n-Butyllithium Substances [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 claims description 15
- -1 —CH2OCH3 Chemical group 0.000 claims description 11
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 10
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 8
- 239000012069 chiral reagent Substances 0.000 claims description 8
- DLEDOFVPSDKWEF-UHFFFAOYSA-N lithium butane Chemical group [Li+].CCC[CH2-] DLEDOFVPSDKWEF-UHFFFAOYSA-N 0.000 claims description 8
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 claims description 7
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 7
- QCQCHGYLTSGIGX-GHXANHINSA-N 4-[[(3ar,5ar,5br,7ar,9s,11ar,11br,13as)-5a,5b,8,8,11a-pentamethyl-3a-[(5-methylpyridine-3-carbonyl)amino]-2-oxo-1-propan-2-yl-4,5,6,7,7a,9,10,11,11b,12,13,13a-dodecahydro-3h-cyclopenta[a]chrysen-9-yl]oxy]-2,2-dimethyl-4-oxobutanoic acid Chemical compound N([C@@]12CC[C@@]3(C)[C@]4(C)CC[C@H]5C(C)(C)[C@@H](OC(=O)CC(C)(C)C(O)=O)CC[C@]5(C)[C@H]4CC[C@@H]3C1=C(C(C2)=O)C(C)C)C(=O)C1=CN=CC(C)=C1 QCQCHGYLTSGIGX-GHXANHINSA-N 0.000 claims description 6
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 claims description 6
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 6
- YLCRSZMKPIXDDD-UHFFFAOYSA-N boric acid 2,3,5-trimethylhexane-2,3-diol Chemical group OB(O)O.CC(C)CC(C)(O)C(C)(C)O YLCRSZMKPIXDDD-UHFFFAOYSA-N 0.000 claims description 5
- PEWXNMCGBVYPJH-YMDUPTGGSA-N n,n'-bis[(1r,3r,4r)-4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl]ethane-1,2-diamine Chemical compound C([C@](C1(C)C)([H])C2)C[C@@]1(C)[C@@H]2NCCN[C@H]1[C@@](C)(C2(C)C)CC[C@]2([H])C1 PEWXNMCGBVYPJH-YMDUPTGGSA-N 0.000 claims description 5
- 230000009467 reduction Effects 0.000 claims description 5
- WRECIMRULFAWHA-UHFFFAOYSA-N trimethyl borate Chemical compound COB(OC)OC WRECIMRULFAWHA-UHFFFAOYSA-N 0.000 claims description 5
- TZQKYWPCHKBXIL-VHSXEESVSA-N (4s)-2-[2-[(4s)-4-tert-butyl-4,5-dihydro-1,3-oxazol-2-yl]propan-2-yl]-4-methyl-4,5-dihydro-1,3-oxazole Chemical compound C[C@H]1COC(C(C)(C)C=2OC[C@@H](N=2)C(C)(C)C)=N1 TZQKYWPCHKBXIL-VHSXEESVSA-N 0.000 claims description 4
- ZCRAZOVARZXHRS-QWHCGFSZSA-N (4s)-2-[3-[(4s)-4-ethyl-4,5-dihydro-1,3-oxazol-2-yl]pentan-3-yl]-4-propan-2-yl-4,5-dihydro-1,3-oxazole Chemical compound CC[C@H]1COC(C(CC)(CC)C=2OC[C@@H](N=2)C(C)C)=N1 ZCRAZOVARZXHRS-QWHCGFSZSA-N 0.000 claims description 4
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims description 4
- SUSSVOWMIIIKOC-UHFFFAOYSA-N 4,7,7-trimethyl-n-(pyridin-2-ylmethyl)bicyclo[2.2.1]heptan-3-amine;dihydrochloride Chemical group Cl.Cl.CC1(C)C(C2)CCC1(C)C2NCC1=CC=CC=N1 SUSSVOWMIIIKOC-UHFFFAOYSA-N 0.000 claims description 4
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 3
- AGEZXYOZHKGVCM-UHFFFAOYSA-N benzyl bromide Chemical compound BrCC1=CC=CC=C1 AGEZXYOZHKGVCM-UHFFFAOYSA-N 0.000 claims description 3
- 230000031709 bromination Effects 0.000 claims description 3
- 238000005893 bromination reaction Methods 0.000 claims description 3
- 238000005984 hydrogenation reaction Methods 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims description 3
- WGOPGODQLGJZGL-UHFFFAOYSA-N lithium;butane Chemical compound [Li+].CC[CH-]C WGOPGODQLGJZGL-UHFFFAOYSA-N 0.000 claims description 3
- CETVQRFGPOGIQJ-UHFFFAOYSA-N lithium;hexane Chemical compound [Li+].CCCCC[CH2-] CETVQRFGPOGIQJ-UHFFFAOYSA-N 0.000 claims description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 3
- 125000005869 (methoxyethoxy)methanyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])OC([H])([H])* 0.000 claims description 2
- 125000004343 1-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C([H])([H])[H] 0.000 claims description 2
- 125000002927 2-methoxybenzyl group Chemical group [H]C1=C([H])C([H])=C(C(OC([H])([H])[H])=C1[H])C([H])([H])* 0.000 claims description 2
- 125000006497 3-methoxybenzyl group Chemical group [H]C1=C([H])C(=C([H])C(OC([H])([H])[H])=C1[H])C([H])([H])* 0.000 claims description 2
- 125000004217 4-methoxybenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1OC([H])([H])[H])C([H])([H])* 0.000 claims description 2
- 125000003277 amino group Chemical group 0.000 claims description 2
- 230000003197 catalytic effect Effects 0.000 claims description 2
- 125000005982 diphenylmethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 2
- NXJCBFBQEVOTOW-UHFFFAOYSA-L palladium(2+);dihydroxide Chemical compound O[Pd]O NXJCBFBQEVOTOW-UHFFFAOYSA-L 0.000 claims description 2
- 125000001412 tetrahydropyranyl group Chemical group 0.000 claims description 2
- 125000002088 tosyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])S(*)(=O)=O 0.000 claims description 2
- 125000004665 trialkylsilyl group Chemical group 0.000 claims description 2
- 125000001889 triflyl group Chemical group FC(F)(F)S(*)(=O)=O 0.000 claims description 2
- 229910052744 lithium Inorganic materials 0.000 claims 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims 2
- 239000012351 deprotecting agent Substances 0.000 claims 1
- 0 *CCOC1=C2B(O)O[C@H](CN(*)*)C2=CC=C1 Chemical compound *CCOC1=C2B(O)O[C@H](CN(*)*)C2=CC=C1 0.000 description 52
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 35
- 239000000243 solution Substances 0.000 description 32
- 238000002360 preparation method Methods 0.000 description 20
- 238000006243 chemical reaction Methods 0.000 description 16
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 15
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 15
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 13
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 239000012044 organic layer Substances 0.000 description 12
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 10
- 239000002585 base Substances 0.000 description 10
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- LUJMEECXHPYQOF-UHFFFAOYSA-N 3-hydroxyacetophenone Chemical compound CC(=O)C1=CC=CC(O)=C1 LUJMEECXHPYQOF-UHFFFAOYSA-N 0.000 description 8
- IAVREABSGIHHMO-UHFFFAOYSA-N 3-hydroxybenzaldehyde Chemical compound OC1=CC=CC(C=O)=C1 IAVREABSGIHHMO-UHFFFAOYSA-N 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- DADYQGIQOBJGIW-HNCPQSOCSA-N 3-[[(3s)-3-(aminomethyl)-1-hydroxy-3h-2,1-benzoxaborol-7-yl]oxy]propan-1-ol;hydrochloride Chemical compound Cl.C1=CC=C(OCCCO)C2=C1[C@@H](CN)OB2O DADYQGIQOBJGIW-HNCPQSOCSA-N 0.000 description 7
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 7
- OKKJLVBELUTLKV-MZCSYVLQSA-N Deuterated methanol Chemical compound [2H]OC([2H])([2H])[2H] OKKJLVBELUTLKV-MZCSYVLQSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 description 6
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 6
- 239000002002 slurry Substances 0.000 description 6
- 239000000706 filtrate Substances 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- 239000000725 suspension Substances 0.000 description 5
- BZGVJCBWANLWMD-RYWNGCACSA-N (1s)-2-(dibenzylamino)-1-[3-(3-phenylmethoxypropoxy)phenyl]ethanol;hydrochloride Chemical compound Cl.C([C@@H](O)C=1C=C(OCCCOCC=2C=CC=CC=2)C=CC=1)N(CC=1C=CC=CC=1)CC1=CC=CC=C1 BZGVJCBWANLWMD-RYWNGCACSA-N 0.000 description 4
- BCHCDCBIKQGJDA-GOSISDBHSA-N (1s)-2-amino-1-[3-(3-phenylmethoxypropoxy)phenyl]ethanol Chemical compound NC[C@@H](O)C1=CC=CC(OCCCOCC=2C=CC=CC=2)=C1 BCHCDCBIKQGJDA-GOSISDBHSA-N 0.000 description 4
- FPJDYKLJHXRMJX-GOSISDBHSA-N (1s)-2-nitro-1-[3-(3-phenylmethoxypropoxy)phenyl]ethanol Chemical compound [O-][N+](=O)C[C@@H](O)C1=CC=CC(OCCCOCC=2C=CC=CC=2)=C1 FPJDYKLJHXRMJX-GOSISDBHSA-N 0.000 description 4
- GYELJXUKGFAHSI-UHFFFAOYSA-N 3-(3-phenylmethoxypropoxy)benzaldehyde Chemical compound O=CC1=CC=CC(OCCCOCC=2C=CC=CC=2)=C1 GYELJXUKGFAHSI-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 239000008346 aqueous phase Substances 0.000 description 4
- WGQKYBSKWIADBV-UHFFFAOYSA-N benzylamine Chemical compound NCC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-N 0.000 description 4
- 229940125898 compound 5 Drugs 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 238000001556 precipitation Methods 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- 239000007858 starting material Substances 0.000 description 4
- FXQIIDINBDJDKL-SNVBAGLBSA-N 3-[[(3s)-3-(aminomethyl)-1-hydroxy-3h-2,1-benzoxaborol-7-yl]oxy]propan-1-ol Chemical compound C1=CC=C(OCCCO)C2=C1[C@@H](CN)OB2O FXQIIDINBDJDKL-SNVBAGLBSA-N 0.000 description 3
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 239000012267 brine Substances 0.000 description 3
- FJDQFPXHSGXQBY-UHFFFAOYSA-L caesium carbonate Chemical class [Cs+].[Cs+].[O-]C([O-])=O FJDQFPXHSGXQBY-UHFFFAOYSA-L 0.000 description 3
- 150000003840 hydrochlorides Chemical class 0.000 description 3
- YSWFMAYVFKQRJF-WJOKGBTCSA-N n,n-dibenzyl-1-[(3s)-1-hydroxy-7-(3-phenylmethoxypropoxy)-3h-2,1-benzoxaborol-3-yl]methanamine Chemical compound C([C@H]1OB(C2=C(OCCCOCC=3C=CC=CC=3)C=CC=C21)O)N(CC=1C=CC=CC=1)CC1=CC=CC=C1 YSWFMAYVFKQRJF-WJOKGBTCSA-N 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229910000027 potassium carbonate Inorganic materials 0.000 description 3
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- JAANRKHWWCAMPD-JGCGQSQUSA-N (1s)-2-(dibenzylamino)-1-[3-(3-phenylmethoxypropoxy)phenyl]ethanol Chemical compound C([C@@H](O)C=1C=C(OCCCOCC=2C=CC=CC=2)C=CC=1)N(CC=1C=CC=CC=1)CC1=CC=CC=C1 JAANRKHWWCAMPD-JGCGQSQUSA-N 0.000 description 2
- QVEMCOSZMZXRKN-UHFFFAOYSA-N 1,2-benzoxaborol-3-ylmethanamine Chemical compound C1=CC=C2C(CN)=BOC2=C1 QVEMCOSZMZXRKN-UHFFFAOYSA-N 0.000 description 2
- FEYOMCNLHKOTHW-UHFFFAOYSA-N 1-[3-(3-phenylmethoxypropoxy)phenyl]ethanone Chemical compound CC(=O)C1=CC=CC(OCCCOCC=2C=CC=CC=2)=C1 FEYOMCNLHKOTHW-UHFFFAOYSA-N 0.000 description 2
- PXNSJOSKPBSPOR-UHFFFAOYSA-N 2-(dibenzylamino)-1-[3-(3-phenylmethoxypropoxy)phenyl]ethanone Chemical compound C=1C=CC(OCCCOCC=2C=CC=CC=2)=CC=1C(=O)CN(CC=1C=CC=CC=1)CC1=CC=CC=C1 PXNSJOSKPBSPOR-UHFFFAOYSA-N 0.000 description 2
- WXYSNOQSBVUDRQ-UHFFFAOYSA-N 2-bromo-1-[3-(3-phenylmethoxypropoxy)phenyl]ethanone Chemical compound BrCC(=O)C1=CC=CC(OCCCOCC=2C=CC=CC=2)=C1 WXYSNOQSBVUDRQ-UHFFFAOYSA-N 0.000 description 2
- PSUXTZLDBVEZTD-UHFFFAOYSA-N 3-bromopropoxymethylbenzene Chemical compound BrCCCOCC1=CC=CC=C1 PSUXTZLDBVEZTD-UHFFFAOYSA-N 0.000 description 2
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 2
- RHSCVHYJEDFYED-QAPXMQNGSA-N CC(C)OB1OC(C)(C)C(C)(C)O1.Cl.OB1O[C@H](CN(CC2=CC=CC=C2)CC2=CC=CC=C2)C2=CC=CC(OCCCOCC3=CC=CC=C3)=C12.O[C@H](CN(CC1=CC=CC=C1)CC1=CC=CC=C1)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1 Chemical compound CC(C)OB1OC(C)(C)C(C)(C)O1.Cl.OB1O[C@H](CN(CC2=CC=CC=C2)CC2=CC=CC=C2)C2=CC=CC(OCCCOCC3=CC=CC=C3)=C12.O[C@H](CN(CC1=CC=CC=C1)CC1=CC=CC=C1)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1 RHSCVHYJEDFYED-QAPXMQNGSA-N 0.000 description 2
- ZWTFDVUAJRHBLK-ZMFXSWHNSA-N CCO.O=N(=O)C[C@@H](O)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1.[H]N([H])C[C@@H](O)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1 Chemical compound CCO.O=N(=O)C[C@@H](O)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1.[H]N([H])C[C@@H](O)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1 ZWTFDVUAJRHBLK-ZMFXSWHNSA-N 0.000 description 2
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 description 2
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 2
- PCLIMKBDDGJMGD-UHFFFAOYSA-N N-bromosuccinimide Chemical compound BrN1C(=O)CCC1=O PCLIMKBDDGJMGD-UHFFFAOYSA-N 0.000 description 2
- OJVJFWJOYXSJTF-CJJACYEBSA-N NC[C@@H](O)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1.O[C@H](CN(CC1=CC=CC=C1)CC1=CC=CC=C1)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1 Chemical compound NC[C@@H](O)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1.O[C@H](CN(CC1=CC=CC=C1)CC1=CC=CC=C1)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1 OJVJFWJOYXSJTF-CJJACYEBSA-N 0.000 description 2
- VHFSQFNOLKPHPN-UHFFFAOYSA-P OB1OC(CN(CC2=CC=CC=C2)CC2=CC=CC=C2)C2=CC=CC(OCCCOCC3=CC=CC=C3)=C12.OB1OC(C[NH2+]CC2=CC=CC=C2)C2=CC=CC(OCCCOCC3=CC=CC=C3)=C12.[Cl-].[Cl-].[NH3+]CC1OB(O)C2=C(OCCCO)C=CC=C21 Chemical compound OB1OC(CN(CC2=CC=CC=C2)CC2=CC=CC=C2)C2=CC=CC(OCCCOCC3=CC=CC=C3)=C12.OB1OC(C[NH2+]CC2=CC=CC=C2)C2=CC=CC(OCCCOCC3=CC=CC=C3)=C12.[Cl-].[Cl-].[NH3+]CC1OB(O)C2=C(OCCCO)C=CC=C21 VHFSQFNOLKPHPN-UHFFFAOYSA-P 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 2
- 229910000024 caesium carbonate Inorganic materials 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 238000004296 chiral HPLC Methods 0.000 description 2
- 238000004587 chromatography analysis Methods 0.000 description 2
- 229940125773 compound 10 Drugs 0.000 description 2
- 229940125782 compound 2 Drugs 0.000 description 2
- 229940126214 compound 3 Drugs 0.000 description 2
- 239000012043 crude product Substances 0.000 description 2
- 238000010511 deprotection reaction Methods 0.000 description 2
- 229910052805 deuterium Inorganic materials 0.000 description 2
- 238000000132 electrospray ionisation Methods 0.000 description 2
- 239000012458 free base Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 238000010348 incorporation Methods 0.000 description 2
- ZLVXBBHTMQJRSX-VMGNSXQWSA-N jdtic Chemical compound C1([C@]2(C)CCN(C[C@@H]2C)C[C@H](C(C)C)NC(=O)[C@@H]2NCC3=CC(O)=CC=C3C2)=CC=CC(O)=C1 ZLVXBBHTMQJRSX-VMGNSXQWSA-N 0.000 description 2
- 238000004895 liquid chromatography mass spectrometry Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000012074 organic phase Substances 0.000 description 2
- 150000003141 primary amines Chemical class 0.000 description 2
- 239000000741 silica gel Substances 0.000 description 2
- 229910002027 silica gel Inorganic materials 0.000 description 2
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 2
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 2
- 235000019345 sodium thiosulphate Nutrition 0.000 description 2
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 2
- SFLXUZPXEWWQNH-UHFFFAOYSA-K tetrabutylazanium;tribromide Chemical compound [Br-].[Br-].[Br-].CCCC[N+](CCCC)(CCCC)CCCC.CCCC[N+](CCCC)(CCCC)CCCC.CCCC[N+](CCCC)(CCCC)CCCC SFLXUZPXEWWQNH-UHFFFAOYSA-K 0.000 description 2
- ULSIYEODSMZIPX-MRVPVSSYSA-N (1s)-2-amino-1-phenylethanol Chemical compound NC[C@@H](O)C1=CC=CC=C1 ULSIYEODSMZIPX-MRVPVSSYSA-N 0.000 description 1
- XUEWIQNQPBSCOR-MRVPVSSYSA-N (1s)-2-nitro-1-phenylethanol Chemical compound [O-][N+](=O)C[C@@H](O)C1=CC=CC=C1 XUEWIQNQPBSCOR-MRVPVSSYSA-N 0.000 description 1
- HFVMEOPYDLEHBR-UHFFFAOYSA-N (2-fluorophenyl)-phenylmethanol Chemical compound C=1C=CC=C(F)C=1C(O)C1=CC=CC=C1 HFVMEOPYDLEHBR-UHFFFAOYSA-N 0.000 description 1
- 125000000229 (C1-C4)alkoxy group Chemical group 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- BHKKSKOHRFHHIN-MRVPVSSYSA-N 1-[[2-[(1R)-1-aminoethyl]-4-chlorophenyl]methyl]-2-sulfanylidene-5H-pyrrolo[3,2-d]pyrimidin-4-one Chemical compound N[C@H](C)C1=C(CN2C(NC(C3=C2C=CN3)=O)=S)C=CC(=C1)Cl BHKKSKOHRFHHIN-MRVPVSSYSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- RXWOHFUULDINMC-UHFFFAOYSA-N 2-(3-nitrothiophen-2-yl)acetic acid Chemical compound OC(=O)CC=1SC=CC=1[N+]([O-])=O RXWOHFUULDINMC-UHFFFAOYSA-N 0.000 description 1
- DPZHKLJPVMYFCU-UHFFFAOYSA-N 2-(5-bromopyridin-2-yl)acetonitrile Chemical compound BrC1=CC=C(CC#N)N=C1 DPZHKLJPVMYFCU-UHFFFAOYSA-N 0.000 description 1
- JUSXLWAFYVKNLT-UHFFFAOYSA-N 2-bromobenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1Br JUSXLWAFYVKNLT-UHFFFAOYSA-N 0.000 description 1
- SXAYSBNMMPGRGY-UHFFFAOYSA-N 2-methoxy-1,3,2-benzodioxaborole Chemical compound C1=CC=C2OB(OC)OC2=C1 SXAYSBNMMPGRGY-UHFFFAOYSA-N 0.000 description 1
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- XYQPOKBAQDQMQP-UHFFFAOYSA-N 3-chloropropoxymethylbenzene Chemical compound ClCCCOCC1=CC=CC=C1 XYQPOKBAQDQMQP-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- QISOBCMNUJQOJU-UHFFFAOYSA-N 4-bromo-1h-pyrazole-5-carboxylic acid Chemical compound OC(=O)C=1NN=CC=1Br QISOBCMNUJQOJU-UHFFFAOYSA-N 0.000 description 1
- PXRKCOCTEMYUEG-UHFFFAOYSA-N 5-aminoisoindole-1,3-dione Chemical compound NC1=CC=C2C(=O)NC(=O)C2=C1 PXRKCOCTEMYUEG-UHFFFAOYSA-N 0.000 description 1
- KNFXSUGKCKIKBZ-DYCDLGHISA-N BrCCCOCC1=CC=CC=C1.CC(=O)C1=CC=CC(O)=C1.CC(=O)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1.FC([Cs])[Cs].[2H]OOC=O Chemical compound BrCCCOCC1=CC=CC=C1.CC(=O)C1=CC=CC(O)=C1.CC(=O)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1.FC([Cs])[Cs].[2H]OOC=O KNFXSUGKCKIKBZ-DYCDLGHISA-N 0.000 description 1
- IPKJJWZXERFKKZ-PBJKEDEQSA-N BrCCCOCC1=CC=CC=C1.O=CC1=CC=CC(O)=C1.O=CC1=CC=CC(OCCCOCC2=CC=CC=C2)=C1.[2H]CF Chemical compound BrCCCOCC1=CC=CC=C1.O=CC1=CC=CC(O)=C1.O=CC1=CC=CC(OCCCOCC2=CC=CC=C2)=C1.[2H]CF IPKJJWZXERFKKZ-PBJKEDEQSA-N 0.000 description 1
- COVZYZSDYWQREU-UHFFFAOYSA-N Busulfan Chemical compound CS(=O)(=O)OCCCCOS(C)(=O)=O COVZYZSDYWQREU-UHFFFAOYSA-N 0.000 description 1
- DLBCLPFVXMJUOJ-UHFFFAOYSA-N CC(=O)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1.O=C(CBr)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1 Chemical compound CC(=O)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1.O=C(CBr)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1 DLBCLPFVXMJUOJ-UHFFFAOYSA-N 0.000 description 1
- FULQSTQSYJQBFA-JPKZNVRTSA-N CC1(C)C2CCC1(C)C(NCC1=CC=CC=N1)C2.O=CC1=CC=CC(OCCCOCC2=CC=CC=C2)=C1.O=[N+]([O-])C[C@@H](O)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1 Chemical compound CC1(C)C2CCC1(C)C(NCC1=CC=CC=N1)C2.O=CC1=CC=CC(OCCCOCC2=CC=CC=C2)=C1.O=[N+]([O-])C[C@@H](O)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1 FULQSTQSYJQBFA-JPKZNVRTSA-N 0.000 description 1
- MYVRCPRWGMUCHF-SKRVEHMLSA-N CC1(C)C2CCC1(C)C(NCCNC1CC3CCC1(C)C3(C)C)C2.O=CC1=CC=CC(OCCCOCC2=CC=CC=C2)=C1.O=[N+]([O-])C[C@@H](O)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1 Chemical compound CC1(C)C2CCC1(C)C(NCCNC1CC3CCC1(C)C3(C)C)C2.O=CC1=CC=CC(OCCCOCC2=CC=CC=C2)=C1.O=[N+]([O-])C[C@@H](O)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1 MYVRCPRWGMUCHF-SKRVEHMLSA-N 0.000 description 1
- JIORVYBPCJGNKM-KQIGELGVSA-N COB(OC)OC.OB1O[C@H](CN(CC2=CC=CC=C2)CC2=CC=CC=C2)C2=CC=CC(OCCCOCC3=CC=CC=C3)=C12.O[C@H](CN(CC1=CC=CC=C1)CC1=CC=CC=C1)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1.[Li]CCCC Chemical compound COB(OC)OC.OB1O[C@H](CN(CC2=CC=CC=C2)CC2=CC=CC=C2)C2=CC=CC(OCCCOCC3=CC=CC=C3)=C12.O[C@H](CN(CC1=CC=CC=C1)CC1=CC=CC=C1)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1.[Li]CCCC JIORVYBPCJGNKM-KQIGELGVSA-N 0.000 description 1
- XPRWOKJIQPQRKD-PBJKEDEQSA-N ClCCCOCC1=CC=CC=C1.O=CC1=CC=CC(O)=C1.O=CC1=CC=CC(OCCCOCC2=CC=CC=C2)=C1.[2H]CF Chemical compound ClCCCOCC1=CC=CC=C1.O=CC1=CC=CC(O)=C1.O=CC1=CC=CC(OCCCOCC2=CC=CC=C2)=C1.[2H]CF XPRWOKJIQPQRKD-PBJKEDEQSA-N 0.000 description 1
- 229910021592 Copper(II) chloride Inorganic materials 0.000 description 1
- BWLUMTFWVZZZND-UHFFFAOYSA-N Dibenzylamine Chemical compound C=1C=CC=CC=1CNCC1=CC=CC=C1 BWLUMTFWVZZZND-UHFFFAOYSA-N 0.000 description 1
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 1
- UEZVMMHDMIWARA-UHFFFAOYSA-N Metaphosphoric acid Chemical compound OP(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-N 0.000 description 1
- JLCKHXYEZZCQJS-SECBINFHSA-N NC[C@H](c1cccc(OCN)c1)O Chemical compound NC[C@H](c1cccc(OCN)c1)O JLCKHXYEZZCQJS-SECBINFHSA-N 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- 239000007832 Na2SO4 Substances 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- QFLKBEBIBWIHEI-UHFFFAOYSA-N O=C(CBr)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1.O=C(CN(CC1=CC=CC=C1)CC1=CC=CC=C1)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1 Chemical compound O=C(CBr)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1.O=C(CN(CC1=CC=CC=C1)CC1=CC=CC=C1)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1 QFLKBEBIBWIHEI-UHFFFAOYSA-N 0.000 description 1
- FNUWPQIPFIBRQX-FRNKJVBZSA-N O=C(CN(CC1=CC=CC=C1)CC1=CC=CC=C1)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1.O[C@H](CN(CC1=CC=CC=C1)CC1=CC=CC=C1)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1.[HH] Chemical compound O=C(CN(CC1=CC=CC=C1)CC1=CC=CC=C1)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1.O[C@H](CN(CC1=CC=CC=C1)CC1=CC=CC=C1)C1=CC=CC(OCCCOCC2=CC=CC=C2)=C1.[HH] FNUWPQIPFIBRQX-FRNKJVBZSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical class OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric Acid Chemical compound [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- FXQIIDINBDJDKL-SNVBAGLBSA-O [Cl-].[NH3+]C[C@H]1OB(O)C2=C(OCCCO)C=CC=C21 Chemical compound [Cl-].[NH3+]C[C@H]1OB(O)C2=C(OCCCO)C=CC=C21 FXQIIDINBDJDKL-SNVBAGLBSA-O 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- VZTDIZULWFCMLS-UHFFFAOYSA-N ammonium formate Chemical compound [NH4+].[O-]C=O VZTDIZULWFCMLS-UHFFFAOYSA-N 0.000 description 1
- 239000003242 anti bacterial agent Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910000085 borane Inorganic materials 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- MOIPGXQKZSZOQX-UHFFFAOYSA-N carbonyl bromide Chemical compound BrC(Br)=O MOIPGXQKZSZOQX-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 229940125904 compound 1 Drugs 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- SUCQPHMWFOCTTR-UHFFFAOYSA-L dichlororuthenium;triphenylphosphane Chemical compound Cl[Ru]Cl.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 SUCQPHMWFOCTTR-UHFFFAOYSA-L 0.000 description 1
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 244000000058 gram-negative pathogen Species 0.000 description 1
- IZZWJPQHPPRVLP-UHFFFAOYSA-N hexane;2-methoxy-2-methylpropane Chemical compound CCCCCC.COC(C)(C)C IZZWJPQHPPRVLP-UHFFFAOYSA-N 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- BITYAPCSNKJESK-UHFFFAOYSA-N potassiosodium Chemical compound [Na].[K] BITYAPCSNKJESK-UHFFFAOYSA-N 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- XXSLZJZUSYNITM-UHFFFAOYSA-N tetrabutylammonium tribromide Chemical compound Br[Br-]Br.CCCC[N+](CCCC)(CCCC)CCCC XXSLZJZUSYNITM-UHFFFAOYSA-N 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical class CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- 238000009901 transfer hydrogenation reaction Methods 0.000 description 1
- NHDIQVFFNDKAQU-UHFFFAOYSA-N tripropan-2-yl borate Chemical compound CC(C)OB(OC(C)C)OC(C)C NHDIQVFFNDKAQU-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B31/00—Reduction in general
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
- C07F5/02—Boron compounds
- C07F5/025—Boronic and borinic acid compounds
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61P—SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
- A61P31/00—Antiinfectives, i.e. antibiotics, antiseptics, chemotherapeutics
- A61P31/04—Antibacterial agents
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61P—SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
- A61P31/00—Antiinfectives, i.e. antibiotics, antiseptics, chemotherapeutics
- A61P31/10—Antimycotics
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
- C07F5/02—Boron compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
- C07F5/02—Boron compounds
- C07F5/04—Esters of boric acids
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Definitions
- the present invention relates to benzoxaboroles and methods for their preparation.
- the hydrochloride salt of (3S)-3-(aminomethyl)-7-[(3-hydroxypropyl)oxy]-2,1-benzoxaborol-1(3H)-ol, disclosed in U.S. patent application Ser. No. 12/142,692, now U.S. Pat. No. 7,816,344, is characterized by the following formula:
- the present invention is a process comprising deprotecting a compound of formula 6:
- R is H or OR 1 ;
- R 1 and each R 1′ are each protecting groups;
- R 1′′ is H or OH; and
- n is 0, 1, 2, 3, 4 or 5.
- the present invention is a process comprising the steps of
- R is H or OR 1 ; R 1 is a protecting group; and n is 0, 1, 2, 3, 4 or 5; b) reducing the compound of formula 3 to form a compound of formula 4:
- each R 2 is independently C 1 -alkyl, C 2 -alkyl, C 3 -alkyl, C 4 -alkyl, C 5 -alkyl, C 6 -alkyl, or together with the oxygen atoms to which they are attached form a 5- or 6-membered ring; and R 3 is C 1 -alkyl, C 2 -alkyl, C 3 -alkyl, C 4 -alkyl, C 5 -alkyl, C 6 -alkyl; and e) deprotecting the compound of formula 6 or a pharmaceutically acceptable salt thereof to form a compound of formula A or a pharmaceutically acceptable salt thereof:
- R 1′′ is H or OH.
- the present invention is a process comprising the steps of:
- R is H or OR 1 ; R 1 is a protecting group; and n is 0, 1, 2, 3, 4 or 5; b) contacting the compound of formula 9 with HN(R 1′ ) 2 to form a compound of formula 10:
- each R 2 is independently C 1 -C 6 -alkyl, or together with the oxygen atoms to which they are attached form [as above] a 5- or 6-membered ring; and R 3 is C 1 -C 6 -alkyl; and e) deprotecting the compound of formula 6 or a pharmaceutically acceptable salt thereof to form a compound of formula A or a pharmaceutically acceptable salt thereof:
- R 1′′ is H or OH.
- the present invention is a compound characterized by the following formula 6a:
- R 1′′ is H or OH; and R 1′ is a protecting group.
- the present invention is a process comprising deprotecting a compound of formula 6:
- R is H or OR 1 ; R 1 and each R 1′ are protecting groups; leis H or OH; and n is 0, 1, 2, 3, 4, or 5.
- R 1 protecting groups include —CH(R a )-phenyl-(R b ) x , trialkylsilyl, tetrahydropyranyl, —CH 2 OCH 3 , or —CH 2 OCH 2 CH 2 OCH 3 groups, where R a is H, C 1 -alkyl, C 2 -alkyl, C 3 -alkyl, C 4 -alkyl or phenyl; each R b is independently C 1 -alkyloxy, C 2 -alkyloxy, C 3 -alkyloxy, C 4 -alkyloxy; or C 1 -alkyl, C 2 -alkyl, C 3 -alkyl, C 4 -alkyl; and x is 0, 1, or 2.
- R 1 is benzyl.
- C 1 -C 1 -alkyl refers to C 1 -alkyl, C 2 -alkyl, C 3 -alkyl, C 4 -alkyl, e.g. methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, and t-butyl.
- C 1 -C 4 -alkoxy refers to C 1 -alkyloxy, C 2 -alkyloxy, C 3 -alkyloxy, C 4 -alkyloxy e.g. methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, sec-butoxy, and t-butoxy.
- C 1 -C 6 -alkyl refers to C 1 -alkyl, C 3 -alkyl, C 4 -alkyl, C 5 -alkyl, C 6 -alkyl.
- R 1′ protecting groups include —CH(R b )-phenyl-(R c ) y ; examples of such groups include benzyl, 1-phenylethyl, 2-methoxybenzyl, 3-methoxybenzyl, 4-methoxybenzyl, 2,4-dimethoxybenzyl, and diphenylmethyl groups; in another aspect, each R 1′ is benzyl.
- Suitable deprotection methods include metal catalyzed hydrogenation, catalytic transfer hydrogenation, or acid cleavage.
- R′ is benzyl
- preferred deprotection reagents include H 2 over Pd/C, H 2 over Pt/C, H 2 over palladium hydroxide, or ammonium formate and Pd/C.
- n 0, 1, 2 or 3; preferably, n is 2.
- a pharmaceutically acceptable salt refers to an acid addition salt.
- suitable acid addition salts are inorganic acid salts and organic salts;
- suitable inorganic salts include hydrochloric, hydrobromic, phosphoric, metaphosphoric, nitric, and sulfuric acid salts;
- suitable organic acid salts include tartaric, acetic, trifluoroacetic, citric, malic, lactic, fumaric, benzoic, formic, propionic, glycolic, gluconic, maleic, succinic, methanesulfonic, ethanesulfonic, stearic, benzenesulfonic, bromobenzenesulfonic, and p-toluenesulfonic acid salts.
- the pharmaceutically acceptable salt of A is preferably an HCl salt.
- the compound of formula 6 is reduced in the presence of HCl to form the hydrochloride salt of the compound of formula A.
- the compound of formula 6 is prepared by contacting a compound of formula 5:
- a borylating reagent in the presence of an alkyllithium such as n-BuLi, n-hexyllithium, or sec-BuLi.
- Each R 2 is independently C 1 -alkyl, C 2 -alkyl, C 3 -alkyl, C 4 -alkyl, C 5 -alkyl, C 6 -alkyl and each R 3 is C 1 -alkyl, C 2 -alkyl, C 3 -alkyl, C 4 -alkyl, C 5 -alkyl, C 6 -alkyl.
- each R 2 is the same alkyl group; alternatively, the R 2 groups, together with the oxygen atoms to which they are attached form a 5- or 6-membered ring, which may be optionally fused to an aryl ring.
- borylating reagents examples include isopropylpinacolborate, 2-(methoxy)-1,3,2-benzodioxaborole, and tri-C 1 -borates, tri-C 2 -borates and tri-C 3 -borates such as triisopropyl borate and trimethyl borate.
- the borylating reagent is isopropylpinacolborate or trimethyl borate.
- Suitable bases include carbonates such as sodium potassium, and cesium carbonates, or hydroxides such as tetrabutylammonium hydroxide.
- the compound of formula 4 or a salt thereof can be prepared by contacting a compound of formula 2:
- Suitable chiral reagents include 1,7,7-trimethyl-N-(pyridin-2-ylmethyl)bicyclo[2.2.1]heptan-2-amine di-hydrochloride; (4S)-4-ethyl-2- ⁇ 1-ethyl-1-[(4S)-4-(1-methylethyl)-4,5-dihydro-1,3-oxazol-2-yl]propyl ⁇ -4,5-dihydro-1,3-oxazole; (S)-4-(tert-butyl)-2-(2-((S)-4-methyl-4,5-dihydrooxazol-2-yl)propan-2-yl)-4,5-dihydrooxazole; or N1,N2-bis[(1R,2R,4R)-1,7,7-trimethylbicyclo[2.2.1]hept-2-yl]-1,2-ethanediamine in the presence of a suitable catalyst such as Co(OAc) 2 , Cu(OAc)
- Suitable nitro-reducing agents include Pd/C, Pt/C or a mixture thereof, in the presence of hydrogen.
- the compound of formula 2 is conveniently prepared by reaction of R 1 (CH 2 ) 3 —X with 3-hydroxybenzaldehyde in the presence of a suitable base, examples of which include hydroxide and carbonate bases.
- the compound of formula 5 or a salt thereof can be prepared by enantioselective reduction of a compound of formula 10:
- Examples of an enantioselective reduction reagents include H 2 and ruthenium-, rhodium- or iridium-based catalyst such as (S)-2-[(S P )-2-(diphenylphosphino)ferrocenyl]-4-isopropyl-2-oxazoline triphenylphosphine ruthenium(II) dichloride complex (also known as Naud catalyst); (R)-BINAP-Ru-(R,R)-(+)-DPEN Cl (also known as Noyori catalyst), or oxazaborolidine-catalyzed borane reduction.
- ruthenium-, rhodium- or iridium-based catalyst such as (S)-2-[(S P )-2-(diphenylphosphino)ferrocenyl]-4-isopropyl-2-oxazoline triphenylphosphine ruthenium(II) dichloride complex (also known as
- the compound of formula 10 or a salt thereof can be prepared by contacting HN(R 1′ ) 2 with a compound of formula 9:
- the compound of formula 9 can be prepared by bromination of a compound of formula 8:
- Suitable brominating reagents include Br 2 in dichloromethane, NBS, and tetra-n-butylammonium tribromide.
- Compound 8 is prepared by contacting 3-hydroxyacetophenone with X(CH 2 ) 3 —R 1 and a suitable base, examples of which include hydroxide and carbonate bases.
- R 1 R 1′ , and X are not limited to the groups specifically disclosed, nor are the processes limited to the disclosed catalysts, bases, reducing agents, and enantioselective reagents.
- 3-hydroxybenzaldehyde (compound 1) is contacted with XCH 2 (CH 2 ) n CH 2 R in the presence of a suitable base under conditions sufficient to form compound 2.
- Compound 2 is converted to the corresponding (1S)-2-nitro-1-phenylethanol (compound 3) using nitromethane and a suitable chiral reagent such as 1,7,7-trimethyl-N-(pyridin-2-ylmethyl)bicyclo[2.2.1]heptan-2-amine di-hydrochloride; (4S)-4-ethyl-2- ⁇ 1-ethyl-1-[(4S)-4-(1-methylethyl)-4,5-dihydro-1,3-oxazol-2-yl]propyl ⁇ -4,5-dihydro-1,3-oxazole; (S)-4-(tert-butyl)-2-(2-((S)-4-methyl-4,5-dihydrooxazol-2-yl)propan-2-yl)-4,5-dihydrooxazole; or N1,N2-bis[(1R,2R,4R)-1,7,7-trimethylbicyclo[2.2.1]hept-2
- Compound 5 or a salt thereof is borylated with a suitable borylating reagent in the presence of a strong base such as n-BuLi, n-hexyllithium, or sec-BuLi to form Compound 6.
- a strong base such as n-BuLi, n-hexyllithium, or sec-BuLi
- This intermediate is deprotected to form the aminomethyl benzoxaborole, preferably (3S)-3-(aminomethyl)-7-[(3-hydroxypropyl)oxy]-2,1-benzoxaborol-1(3H)-ol.
- This product is advantageously isolated as a hydrochloride salt, and can be further purified by way of recrystallization.
- 3-hydroxyacetophenone (compound 7) is contacted with XCH 2 (CH 2 ) n CH 2 —R in the presence of a suitable base under conditions sufficient to form compound 8.
- Bromination with a suitable brominating reagent results in the formation of the bromoketone (compound 9), which in turn is contacted with HN(R 1′ ) 2 under conditions sufficient to form the protected amine (compound 10).
- Compound 10 or a salt thereof is enantioselectively reduced to the corresponding (1S)-2-amino-1-phenylethanol (Compound 5) under enantioselective reductions conditions.
- reaction temperature was maintained at ⁇ 30° C. for 24-48 h.
- trifluoroacetic acid (952 mg) was charged to the reaction, and the contents were transferred to a separate reactor containing a room temperature solution of 1 N HCl (75 mL) and t-butyl methyl ether (TBME, 150 mL).
- TBME t-butyl methyl ether
- the layers were allowed to separate and the aqueous phase removed.
- the organic phase was then washed with water (75 mL) and the aqueous phase removed.
- the solution of product in TBME was then filtered through a pad of silica gel (15 g) which was rinsed with TBME.
- the product was stored cold as a solution in TBME, to be swapped to ethanol prior to the subsequent hydrogenation step.
- Powdered potassium carbonate (12.8 g) was charged to a 250-mL reactor, followed by the ethanolic solution of (1S)-2-amino-1-[3-( ⁇ 3-[(phenylmethyl)oxy]propyl ⁇ oxy)phenyl]ethanol (12.7 g in 100 mL). Additional ethanol was charged into the slurry (40 mL). Benzyl bromide (15.9 g) was charged to the reactor, and the slurry was stirred at 20-25° C. for 18 h-24 h, after which time, the solids were filtered and washed with ethanol (50 mL). The filtrate was diluted with water (50 mL) then heated to 50° C.
- Copper (II) acetate monohydrate (3.70 g, 0.05 eq) and bis-camphorethylenediamine (N1,N2-bis[(1R,2R,4R)-1,7,7-trimethylbicyclo[2.2.1]hept-2-yl]-1,2-ethanediamine) (7.38 g, 0.06 eq) were charged to a reactor, followed by ethanol (200 mL, 2 vol). The contents were heated to 50-60° C.
- Powdered potassium carbonate (12.8 g) was charged to a 250-mL reactor, followed by the ethanolic solution of (1S)-2-amino-1-[3-( ⁇ 3-[(phenylmethyl)oxy]propyl ⁇ oxy)phenyl]ethanol (12.7 g in 100 mL). Additional ethanol was charged into the slurry (40 mL). Benzyl bromide (15.9 g) was charged to the reactor, and the slurry was stirred at 20-25° C. for 18 h-24 h, after which time, the solids were filtered and washed with ethanol (50 mL). The filtrate was diluted with water (50 mL) then heated to 50° C.
- the reaction was then diluted with 10 mL of TBME, then 5 mL of saturated NaHCO 3 solution was added. After vigorously stirring for about 30 min, the organic layer was washed with 5 mL of 0.1 M NaH 2 PO 4 , then 5 mL of saturated NaHCO 3 . The organic layer was then dried over Na 2 SO 4 and concentrated.
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Abstract
The present invention is a process comprising contacting a compound of formula 6:
or a pharmaceutically acceptable salt thereof;
with a deprotecting reagent to form a compound of formula A:
with a deprotecting reagent to form a compound of formula A:
or a pharmaceutically acceptable salt thereof;
where R is H or OR1; R1 and each R1′ are protecting groups; R1″ is H or OH, and n is 0, 1, 2, 3, 4, or 5.
where R is H or OR1; R1 and each R1′ are protecting groups; R1″ is H or OH, and n is 0, 1, 2, 3, 4, or 5.
Description
- This application is a continuation application of U.S. application Ser. No. 13/639,594, filed Oct. 5, 2012, presently allowed, which is a United States National Phase Application of International Patent Application Serial No. PCT/US2011/31384 filed Apr. 6, 2011, which claims priority to U.S. Provisional Application No. 61/321,642 filed Apr. 7, 2010; the contents of each of the foregoing applications are hereby incorporated by reference.
- The present invention relates to benzoxaboroles and methods for their preparation. The hydrochloride salt of (3S)-3-(aminomethyl)-7-[(3-hydroxypropyl)oxy]-2,1-benzoxaborol-1(3H)-ol, disclosed in U.S. patent application Ser. No. 12/142,692, now U.S. Pat. No. 7,816,344, is characterized by the following formula:
- along with other pharmaceutically acceptable salts. These salts, as well as their corresponding conjugate free base, have shown promise as an antibacterial agent, especially against Gram negative pathogens. It would therefore be advantageous to discover alternative ways of preparing this agent and its salts.
- In one aspect, the present invention is a process comprising deprotecting a compound of formula 6:
- or a pharmaceutically acceptable salt thereof;
under deprotecting conditions to form a compound of formula A: - or a pharmaceutically acceptable salt thereof;
where R is H or OR1; R1 and each R1′ are each protecting groups; R1″ is H or OH; and n is 0, 1, 2, 3, 4 or 5. - In a second aspect, the present invention is a process comprising the steps of
- a) contacting a compound of formula 2:
- with nitromethane in the presence of a chiral reagent to make a compound of formula 3:
- where R is H or OR1; R1 is a protecting group; and n is 0, 1, 2, 3, 4 or 5;
b) reducing the compound of formula 3 to form a compound of formula 4: - c) contacting the compound of formula 4 or a salt thereof with R1′X with a base to form a compound of
formula 5: - or a salt thereof, wherein R1′ is a protecting group and X is a leaving group;
d) contacting the compound of formula 5 or a salt thereof with a borylating reagent characterized by the following formula: - in the presence of n-BuLi to form a compound of formula 6:
- or a pharmaceutically acceptable salt thereof,
where each R2 is independently C1-alkyl, C2-alkyl, C3-alkyl, C4-alkyl, C5-alkyl, C6-alkyl, or together with the oxygen atoms to which they are attached form a 5- or 6-membered ring; and R3 is C1-alkyl, C2-alkyl, C3-alkyl, C4-alkyl, C5-alkyl, C6-alkyl; and
e) deprotecting the compound of formula 6 or a pharmaceutically acceptable salt thereof to form a compound of formula A or a pharmaceutically acceptable salt thereof: - where R1″ is H or OH.
- In another aspect the present invention is a process comprising the steps of:
- a) brominating a compound of formula 8:
- to form a compound of formula 9:
- where R is H or OR1; R1 is a protecting group; and n is 0, 1, 2, 3, 4 or 5;
b) contacting the compound of formula 9 with HN(R1′)2 to form a compound of formula 10: - or a salt thereof,
where each R1′ is a protecting group;
c) enantioselectively reducing the compound of formula 10 to form a compound of formula 5: - d) contacting the compound of formula 5 or a salt thereof with a borylating reagent characterized by the following formula:
- in the presence of n-BuLi, to form a compound of formula 6:
- or a pharmaceutically acceptable salt thereof,
where each R2 is independently C1-C6-alkyl, or together with the oxygen atoms to which they are attached form [as above] a 5- or 6-membered ring; and R3 is C1-C6-alkyl; and
e) deprotecting the compound of formula 6 or a pharmaceutically acceptable salt thereof to form a compound of formula A or a pharmaceutically acceptable salt thereof: - where R1″ is H or OH.
- In another aspect, the present invention is a compound characterized by the following formula 6a:
- or a pharmaceutically acceptable salt thereof,
where R1″ is H or OH; and R1′ is a protecting group. - In a first aspect, the present invention is a process comprising deprotecting a compound of formula 6:
- or a pharmaceutically acceptable salt thereof;
under deprotecting conditions to form a compound of formula A: - or a pharmaceutically acceptable salt thereof;
where R is H or OR1; R1 and each R1′ are protecting groups; leis H or OH; and n is 0, 1, 2, 3, 4, or 5. - Examples of suitable R1 protecting groups include —CH(Ra)-phenyl-(Rb)x, trialkylsilyl, tetrahydropyranyl, —CH2OCH3, or —CH2OCH2CH2OCH3 groups, where Ra is H, C1-alkyl, C2-alkyl, C3-alkyl, C4-alkyl or phenyl; each Rb is independently C1-alkyloxy, C2-alkyloxy, C3-alkyloxy, C4-alkyloxy; or C1-alkyl, C2-alkyl, C3-alkyl, C4-alkyl; and x is 0, 1, or 2. In another aspect, R1 is benzyl.
- C1-C1-alkyl refers to C1-alkyl, C2-alkyl, C3-alkyl, C4-alkyl, e.g. methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, and t-butyl. Similarly, C1-C4-alkoxy refers to C1-alkyloxy, C2-alkyloxy, C3-alkyloxy, C4-alkyloxy e.g. methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, sec-butoxy, and t-butoxy. C1-C6-alkyl refers to C1-alkyl, C3-alkyl, C4-alkyl, C5-alkyl, C6-alkyl.
- Examples of suitable R1′ protecting groups include —CH(Rb)-phenyl-(Rc)y; examples of such groups include benzyl, 1-phenylethyl, 2-methoxybenzyl, 3-methoxybenzyl, 4-methoxybenzyl, 2,4-dimethoxybenzyl, and diphenylmethyl groups; in another aspect, each R1′ is benzyl.
- Suitable deprotection methods include metal catalyzed hydrogenation, catalytic transfer hydrogenation, or acid cleavage. Where R′ is benzyl, preferred deprotection reagents include H2 over Pd/C, H2 over Pt/C, H2 over palladium hydroxide, or ammonium formate and Pd/C.
- In another aspect, n is 0, 1, 2 or 3; preferably, n is 2.
- As used herein, “a pharmaceutically acceptable salt” refers to an acid addition salt. Examples of suitable acid addition salts are inorganic acid salts and organic salts; Examples of suitable inorganic salts include hydrochloric, hydrobromic, phosphoric, metaphosphoric, nitric, and sulfuric acid salts; examples of suitable organic acid salts include tartaric, acetic, trifluoroacetic, citric, malic, lactic, fumaric, benzoic, formic, propionic, glycolic, gluconic, maleic, succinic, methanesulfonic, ethanesulfonic, stearic, benzenesulfonic, bromobenzenesulfonic, and p-toluenesulfonic acid salts. The pharmaceutically acceptable salt of A is preferably an HCl salt.
- In another aspect, the compound of formula 6 is reduced in the presence of HCl to form the hydrochloride salt of the compound of formula A.
- In another aspect of the present invention, the compound of formula 6 is prepared by contacting a compound of formula 5:
- or a salt thereof with a borylating reagent in the presence of an alkyllithium such as n-BuLi, n-hexyllithium, or sec-BuLi.
- The borylating reagent is characterized by the following formula:
- Each R2 is independently C1-alkyl, C2-alkyl, C3-alkyl, C4-alkyl, C5-alkyl, C6-alkyl and each R3 is C1-alkyl, C2-alkyl, C3-alkyl, C4-alkyl, C5-alkyl, C6-alkyl. Preferably, each R2 is the same alkyl group; alternatively, the R2 groups, together with the oxygen atoms to which they are attached form a 5- or 6-membered ring, which may be optionally fused to an aryl ring. Examples of suitable borylating reagents include isopropylpinacolborate, 2-(methoxy)-1,3,2-benzodioxaborole, and tri-C1-borates, tri-C2-borates and tri-C3-borates such as triisopropyl borate and trimethyl borate. In another aspect, the borylating reagent is isopropylpinacolborate or trimethyl borate.
- The compound of formula 5 or a salt thereof can be prepared by contacting under basic conditions R1′X with a compound of formula 4:
- or a salt thereof,
wherein X is a suitable leaving group such as a Br, Cl, I, tosyl, or triflyl group. Suitable bases include carbonates such as sodium potassium, and cesium carbonates, or hydroxides such as tetrabutylammonium hydroxide. - The compound of formula 4 or a salt thereof can be prepared by contacting a compound of formula 2:
- with nitromethane in the presence of a chiral reagent, to form a compound of formula 3:
- then reducing the nitro group to an amine group.
- Examples of suitable chiral reagents include 1,7,7-trimethyl-N-(pyridin-2-ylmethyl)bicyclo[2.2.1]heptan-2-amine di-hydrochloride; (4S)-4-ethyl-2-{1-ethyl-1-[(4S)-4-(1-methylethyl)-4,5-dihydro-1,3-oxazol-2-yl]propyl}-4,5-dihydro-1,3-oxazole; (S)-4-(tert-butyl)-2-(2-((S)-4-methyl-4,5-dihydrooxazol-2-yl)propan-2-yl)-4,5-dihydrooxazole; or N1,N2-bis[(1R,2R,4R)-1,7,7-trimethylbicyclo[2.2.1]hept-2-yl]-1,2-ethanediamine in the presence of a suitable catalyst such as Co(OAc)2, Cu(OAc)2, CuCl2, Zn(OTf)2, or Zn(Et)2.
- Examples of suitable nitro-reducing agents would include Pd/C, Pt/C or a mixture thereof, in the presence of hydrogen.
- The compound of formula 2 is conveniently prepared by reaction of R1(CH2)3—X with 3-hydroxybenzaldehyde in the presence of a suitable base, examples of which include hydroxide and carbonate bases.
- Alternatively, the compound of formula 5 or a salt thereof can be prepared by enantioselective reduction of a compound of formula 10:
- or a salt thereof.
- Examples of an enantioselective reduction reagents include H2 and ruthenium-, rhodium- or iridium-based catalyst such as (S)-2-[(SP)-2-(diphenylphosphino)ferrocenyl]-4-isopropyl-2-oxazoline triphenylphosphine ruthenium(II) dichloride complex (also known as Naud catalyst); (R)-BINAP-Ru-(R,R)-(+)-DPEN Cl (also known as Noyori catalyst), or oxazaborolidine-catalyzed borane reduction.
- The compound of formula 10 or a salt thereof can be prepared by contacting HN(R1′)2 with a compound of formula 9:
- The compound of formula 9 can be prepared by bromination of a compound of formula 8:
- Suitable brominating reagents include Br2 in dichloromethane, NBS, and tetra-n-butylammonium tribromide.
- Compound 8 is prepared by contacting 3-hydroxyacetophenone with X(CH2)3—R1 and a suitable base, examples of which include hydroxide and carbonate bases.
- The following schemes generally illustrate the processes of the present invention. R1 R1′, and X are not limited to the groups specifically disclosed, nor are the processes limited to the disclosed catalysts, bases, reducing agents, and enantioselective reagents.
- In accordance with Scheme 1, 3-hydroxybenzaldehyde (compound 1) is contacted with XCH2(CH2)nCH2R in the presence of a suitable base under conditions sufficient to form compound 2.
- Compound 2 is converted to the corresponding (1S)-2-nitro-1-phenylethanol (compound 3) using nitromethane and a suitable chiral reagent such as 1,7,7-trimethyl-N-(pyridin-2-ylmethyl)bicyclo[2.2.1]heptan-2-amine di-hydrochloride; (4S)-4-ethyl-2-{1-ethyl-1-[(4S)-4-(1-methylethyl)-4,5-dihydro-1,3-oxazol-2-yl]propyl}-4,5-dihydro-1,3-oxazole; (S)-4-(tert-butyl)-2-(2-((S)-4-methyl-4,5-dihydrooxazol-2-yl)propan-2-yl)-4,5-dihydrooxazole; or N1,N2-bis[(1R,2R,4R)-1,7,7-trimethylbicyclo[2.2.1]hept-2-yl]-1,2-ethanediamine in the presence of a suitable catalyst such as Cu(OAc)2. Compound 3 is then converted to the corresponding primary amine (compound 4) then protected with R1′X to form compound 5; this intermediate may be isolated as the free base or as a salt, preferably the hydrochloride salt.
- Compound 5 or a salt thereof is borylated with a suitable borylating reagent in the presence of a strong base such as n-BuLi, n-hexyllithium, or sec-BuLi to form Compound 6. This intermediate is deprotected to form the aminomethyl benzoxaborole, preferably (3S)-3-(aminomethyl)-7-[(3-hydroxypropyl)oxy]-2,1-benzoxaborol-1(3H)-ol. This product is advantageously isolated as a hydrochloride salt, and can be further purified by way of recrystallization.
- In accordance with Scheme 2, 3-hydroxyacetophenone (compound 7) is contacted with XCH2(CH2)nCH2—R in the presence of a suitable base under conditions sufficient to form compound 8. Bromination with a suitable brominating reagent results in the formation of the bromoketone (compound 9), which in turn is contacted with HN(R1′)2 under conditions sufficient to form the protected amine (compound 10).
- Compound 10 or a salt thereof is enantioselectively reduced to the corresponding (1S)-2-amino-1-phenylethanol (Compound 5) under enantioselective reductions conditions.
- Compound 5 or a salt thereof is then borylated and deprotected as described in Scheme 1 to form the aminomethyl benzoxaborole, preferably (3S)-3-(aminomethyl)-7-[(3-hydroxypropyl)oxy]-2,1-benzoxaborol-1(3H)-ol, preferably as the hydrochloride salt.
- The following examples are illustrative of the process of the present invention and are not intended to limit the scope of the invention.
-
- To a 3-L reaction vessel was charged and stirred cesium carbonate (209.6 g), 3-hydroxybenzaldehyde (67.6 g), dimethylformamide (DMF, 250 mL) and 3-bromopropyl phenylmethyl ether (113.4 g) at ambient temperature for ˜18 h. Water (567 mL) was added followed by tert-butyl methyl ether (907 mL). The bottom aqueous layer was separated and the organic layer washed with 1N sodium hydroxide (2×567 mL) and water (1×567 mL). The organic solution was concentrated to a minimum after which ethanol (200 proof, 907 mL) was added and the solution concentrated to a minimum and filtered though a 1-μm filter.
-
- Copper (II) acetate and camphoraminomethylpyridine bis-HCl salt (504 mg) were charged to a reactor, followed by ethanol (60 mL) and diisopropylethylamine (1.16 mL). The contents were stirred for 1 h at room temperature, at which time a solution of 3-({3-[(phenylmethyl)oxy]propyl}oxy)benzaldehyde in ethanol (15 g in 15 mL) was charged. The reaction mixture was cooled to −30° C. to −40° C., whereupon nitromethane (33.9 g) was added slowly to the reaction, maintaining a temperature below −30° C., followed by diisopropylethylamine (359 mg). The reaction temperature was maintained at −30° C. for 24-48 h. When the reaction was complete, trifluoroacetic acid (952 mg) was charged to the reaction, and the contents were transferred to a separate reactor containing a room temperature solution of 1 N HCl (75 mL) and t-butyl methyl ether (TBME, 150 mL). After the addition was complete, the layers were allowed to separate and the aqueous phase removed. The organic phase was then washed with water (75 mL) and the aqueous phase removed. The solution of product in TBME was then filtered through a pad of silica gel (15 g) which was rinsed with TBME. The product was stored cold as a solution in TBME, to be swapped to ethanol prior to the subsequent hydrogenation step.
-
- The (1S)-2-nitro-1-[3-({3-[(phenylmethyl)oxy]propyl}oxy)phenyl]ethanol in ethanol solution (8 g in 160 mL) was hydrogenated using a Pd (4%)/Pt(1%)/C catalyst (1.6 g). Upon consumption of the starting material and the hydroxylamine intermediate, the reaction product in ethanol was filtered.
-
- Powdered potassium carbonate (12.8 g) was charged to a 250-mL reactor, followed by the ethanolic solution of (1S)-2-amino-1-[3-({3-[(phenylmethyl)oxy]propyl}oxy)phenyl]ethanol (12.7 g in 100 mL). Additional ethanol was charged into the slurry (40 mL). Benzyl bromide (15.9 g) was charged to the reactor, and the slurry was stirred at 20-25° C. for 18 h-24 h, after which time, the solids were filtered and washed with ethanol (50 mL). The filtrate was diluted with water (50 mL) then heated to 50° C. Concentrated HCl (3.52 mL) was charged to the reactor resulting the precipitation of the HCl salt of the product. At the onset of precipitation, the slurry was held at 50° C. for 30 min, then cooled to 0° C. and held at 0° C. for an additional 30 min. The product was filtered and washed with a 0° C. solution of 20% aqueous ethanol (˜60 mL).
-
- (1S)-2-[Bis(phenylmethyl)amino]-1-[3-({3-[(phenylmethyl)oxy]propyl}oxy)phenyl]ethanol hydrochloride (20 g) and toluene (160 mL) were charged into the 250-mL reactor. The contents were mixed thoroughly for about 5 min after which the mixture was degassed by placing the reactor under vacuum and backfilling with nitrogen; and repeating two times. The suspension was heated to 50-55° C., at which time nBuLi (16.3 mL, 2.6 M) was added over about 1 h with vigorous mixing. The mixture was then stirred for about 1 h at 50-55° C., at which time the starting material was observed to be consumed. The mixture was then cooled to −20 to −40° C. whereupon 1.0 equiv of nBuLi (14.8 mL) was added at such a rate to maintain the temperature to below −20° C. Upon completion of addition, the temperature was adjusted to −30 to −40° C. and nBuLi (43 mL) was added as quickly as possible (<10 minutes) while still keeping the temperature below −20° C. during addition. The temperature was adjusted to −20 to −25° C. and stirred for 1 hr. The mixture was cooled to −75 to −80° C. and an aliquot was quenched directly into CD3OD. Once complete deuterium incorporation was observed, evidenced by LCMS, THF (18 mL) was added directly followed by rapid addition of the borate (36 mL). The mixture was warmed to 15-25° C. over 30 min to 1 h, 5% aq. NaHCO3 (200 mL) was then added and the mixture was stirred vigorously for ˜15 min. The resulting suspension was filtered and the cake rinsed with at least 30 mL of TBME. The filtrate was allowed to separate and the organic layer was then washed three or four times with water (100 mL), allowing the last wash at least 1 h to settle. The organic layer was concentrated to about 40 mL.
-
- To a solution of (3S)-3-(aminomethyl)-7-[(3-hydroxypropyl)oxy]-2,1-benzoxaborol-1(3H)-ol hydrochloride in toluene (˜46 mL) was added methanol (200 mL), 1 N HCl in water (42.5 mL), and 5% Pd/C catalyst (2 g, 11 wt %). The resulting mixture was treated with hydrogen gas at 100 psig and 50° C. Upon consumption of the mono N-benzyl amine intermediate, the reaction solution was filtered through a filtering aid, followed by a 1 μm filtration. The filtered solution of crude product was then distilled, 2-propanol added (200 mL), then distilled again to minimum stirrable volume. This concentrated solution was allowed to crystallize at room temperature, then filtered and washed with 2-propanol. NMR: (d4-methanol, 400.13 MHz) δ (ppm) 7.48 (t, J=7.81 Hz, 1H), 7.01 (d, J=7.58 Hz, 1H), 6.93 (d, J=8.21 Hz, 1H), 5.37 (dd, J=2.76, 8.77 Hz, 1H), 4.18 (t, J=6.11 Hz, 2H), 3.78 (t, J=5.47 Hz, 2H), 3.59 (dd, J=2.87, 13.29 Hz, 1H), 2.92 (dd, J=8.86, 13.29 Hz, 1H), 2.00 (m, J=6.13 Hz, 2H). The accurate mass of the protonated molecule of [M+H]+ was measured at m/z 238.1247 using positive ion electrospray ionization. The calculated mass of this ion is at m/z 238.1251. Chiral purity was found to be 99.9% using chiral HPLC.
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- To a 3-L reaction vessel was charged and stirred potassium carbonate (152 g), 3-hydroxybenzaldehyde (67.6 g), dimethylformamide (DMF, 250 mL) and 3-chloropropyl phenylmethyl ether (96.4 g) at 90° C. for 18 h. Water (567 mL) was added followed by tert-butyl methyl ether (907 mL). The bottom aqueous layer was separated and the organic layer washed with 1N sodium hydroxide (2×567 mL) and water (1×567 mL). The organic solution was concentrated to a minimum after which ethanol (200 proof, 907 mL) was added and the solution concentrated to a minimum and filtered though a 1-μm filter.
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- Copper (II) acetate monohydrate (3.70 g, 0.05 eq) and bis-camphorethylenediamine (N1,N2-bis[(1R,2R,4R)-1,7,7-trimethylbicyclo[2.2.1]hept-2-yl]-1,2-ethanediamine) (7.38 g, 0.06 eq) were charged to a reactor, followed by ethanol (200 mL, 2 vol). The contents were heated to 50-60° C. for 1 h or until all solids dissolved, then cooled to room temperature and stirred, at which time a solution of 3-({3-[(phenylmethyl)oxy]propyl}oxy)benzaldehyde in ethanol (100 g, 1 eq in 50 mL, 0.5 vol) was charged. The reaction mixture was cooled to −10° C. to −20° C., whereupon nitromethane (112.7 g, 5 eq) was added slowly to the reaction, maintaining a temperature below −10° C., followed by diisopropylethylamine (1.94 mL, 1.44 g, 0.03 eq). The reaction temperature was maintained at −10° C. for 22-30 h. When the reaction was complete, a room temperature solution of 1 N HCl (250 mL, 2.5 vol) and t-butyl methyl ether (TBME, 500 mL, 5 vol) were charged to the reaction vessel. Following the addition, the contents were stirred for 5 minutes and brought to 20° C. (room temperature), and then the layers were allowed to separate and the aqueous phase removed. The organic phase was then washed 2× with water (250 mL, 2.5 vol) and each time the aqueous phase removed. TBME was then distilled off and replaced with absolute ethanol.
-
- The (1S)-2-nitro-1-[3-({3-[(phenylmethyl)oxy]propyl}oxy)phenyl]ethanol in ethanol solution (8 g in 160 mL) was hydrogenated using a Pd (4%)/Pt(1%)/C catalyst (1.6 g). Upon consumption of the starting material and the hydroxylamine intermediate, the reaction product in ethanol was filtered.
-
- Powdered potassium carbonate (12.8 g) was charged to a 250-mL reactor, followed by the ethanolic solution of (1S)-2-amino-1-[3-({3-[(phenylmethyl)oxy]propyl}oxy)phenyl]ethanol (12.7 g in 100 mL). Additional ethanol was charged into the slurry (40 mL). Benzyl bromide (15.9 g) was charged to the reactor, and the slurry was stirred at 20-25° C. for 18 h-24 h, after which time, the solids were filtered and washed with ethanol (50 mL). The filtrate was diluted with water (50 mL) then heated to 50° C. Concentrated HCl (3.52 mL) was charged to the reactor resulting the precipitation of the HCl salt of the product. At the onset of precipitation, the slurry was held at 50° C. for 30 min, then cooled to 0° C. and held at 0° C. for an additional 30 min. The product was filtered and washed with a 0° C. solution of 20% aqueous ethanol (60 mL).
-
- (1S)-2-[Bis(phenylmethyl)amino]-1-[3-({3-[(phenylmethyl)oxy]propyl}oxy)phenyl]ethanol hydrochloride (20 g) and toluene (160 mL) were charged into the 250-mL reactor. The contents were mixed thoroughly for about 5 min after which the mixture was degassed by placing the reactor under vacuum and backfilling with nitrogen; and repeating two times. The suspension was heated to 50-55° C., at which time nBuLi (16.3 mL, 2.6 M) was added over about 1 h with vigorous mixing. The mixture was then stirred for about 1 h at 50-55° C., at which time the starting material was observed to be consumed. The mixture was then cooled to −20 to −40° C. whereupon 1.0 equiv of nBuLi (14.8 mL) was added at such a rate to maintain the temperature to below −20° C. Upon completion of addition, the temperature was adjusted to −30 to −40° C. and nBuLi (43 mL) was added as quickly as possible (<10 minutes) while still keeping the temperature below −20° C. during addition. The temperature was adjusted to −20 to −25° C. and stirred for 1 hr. The mixture was cooled to −75 to −80° C. and an aliquot was quenched directly into CD3OD. Once complete deuterium incorporation was observed, evidenced by LCMS, THF (18 mL) was added directly followed by rapid addition of the borate (36 mL). The mixture was warmed to 15-25° C. over 30 min to 1 h, 5% aq. NaHCO3 (200 mL) was then added and the mixture was stirred vigorously for ˜15 min. The resulting suspension was filtered and the cake rinsed with at least 30 mL of TBME. The filtrate was allowed to separate and the organic layer was then washed three or four times with water (100 mL), allowing the last wash at least 1 h to settle. The organic layer was concentrated to about 40 mL.
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- To a solution of (3S)-3-(aminomethyl)-7-[(3-hydroxypropyl)oxy]-2,1-benzoxaborol-1(3H)-ol hydrochloride in toluene (˜46 mL) was added methanol (200 mL), 1 N HCl in water (42.5 mL), and 5% Pd/C catalyst (2 g, 11 wt %). The resulting mixture was treated with hydrogen gas at 100 psig and 50° C. Upon consumption of the mono N-benzyl amine intermediate, the reaction solution was filtered through a filtering aid, followed by a 1 μm filtration. The filtered solution of crude product was then distilled, 2-propanol added (200 mL), then distilled again to minimum stirrable volume. This concentrated solution was allowed to crystallize at room temperature, then filtered and washed with 2-propanol. 1H NMR: (d4-methanol, 400.13 MHz) δ (ppm) 7.48 (t, J=7.81 Hz, 1H), 7.01 (d, J=7.58 Hz, 1H), 6.93 (d, J=8.21 Hz, 1H), 5.37 (dd, J=2.76, 8.77 Hz, 1H), 4.18 (t, J=6.11 Hz, 2H), 3.78 (t, J=5.47 Hz, 2H), 3.59 (dd, J=2.87, 13.29 Hz, 1H), 2.92 (dd, J=8.86, 13.29 Hz, 1H), 2.00 (m, J=6.13 Hz, 2H). The accurate mass of the protonated molecule of [M+H]+ was measured at m/z 238.1247 using positive ion electrospray ionization. The calculated mass of this ion is at m/z 238.1251. Chiral purity was found to be 99.9% using chiral HPLC.
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- To a solution of 3-hydroxyacetophenone (5.5 g) in dimethylformamide (18 mL) was added 3-bromopropyl phenylmethyl ether (9.25 g) at ambient temperature followed by cesium carbonate (17 g). The suspension was stirred for 24 h and water was added followed by ethyl acetate. The organic layer was separated and the aqueous layer extracted with ethyl acetate. The organic layers were combined and washed twice with 2 N sodium hydroxide, four times with brine, and concentrated in vacuo to an oil to give the title compound.
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- To a solution of 1-[3-({3-[(phenylmethyl)oxy]propyl}oxy)phenyl]ethanone (10.59 g) in tetrahydrofuran (50 mL) was added methanol (50 mL) and a solution of tetrabutylammonium tribromide (16 g) in tetrahydrofuran (50 mL). The reaction was stirred at ambient temperature for 45 min at which time tetrabutylammonium tribromide (0.89 g) was added, followed by further addition of 0.6 g. 10% aqueous sodium thiosulfate was added to the reaction and the mixture was concentrated in vacuo to a minimum volume. Ethyl acetate was added and the resultant organic solution was washed with aqueous sodium thiosulfate, saturated sodium bicarbonate and brine and concentrated to an oil to afford the title compound.
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- To a mixture of 2-bromo-1-[3-({3-[(phenylmethyl)oxy]propyl}oxy)phenyl]ethanone (13.17 g), dibenzylamine (6.4 g) and dichloromethane (25 mL) was added a solution of sodium carbonate (7.6 g) in water (50 mL). The reaction mixture was stirred at ambient temperature overnight. The organic layer was separated and concentrated to a minimum and tert-butyl methyl ether was added. The organic layer was washed with dilute acetic acid (4 times) and 0.1 N sodium hydroxide once and brine once. The organic solution was concentrated to dryness. The oil was washed with methanol and purified by chromatography to give the title compound.
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- A mixture of 2-[bis(phenylmethyl)amino]-1-[3-({3[(phenylmethyl)oxy]propyl}oxy)phenyl]-ethanone, catalyst SK-N003-2z (Naud catalyst, 47 mg) and 1M sodium hydroxide (2.085 mL) in tetrahydrofuran (10 mL) was set under hydrogen at 150 psi for 4 h. The reaction mixture was then filtered through silica gel. The crude filtrate was purified by chromatography eluting with tert-butyl methyl ether-hexane (0-60%) to yield the desired product as a yellow oil.
-
- To a solution of (1S)-2-[bis(phenylmethyl)amino]-1-[3-({3-[(phenylmethyl)oxy]propyl}oxy)phenyl]ethanol (240 mg, 0.50 mmol) in 5 mL of toluene at −20° C. was added 1.75 mmol of nBuLi in hexane (2.59 M, 0.67 mL) over about 5 minutes. The mixture was then stirred for 2 h and then quenched with freshly distilled trimethylborate (0.28 mL, 259 mg, 2.5 mmol). The cold bath was removed and the mixture warmed to room temperature. The reaction was then diluted with 10 mL of TBME, then 5 mL of saturated NaHCO3 solution was added. After vigorously stirring for about 30 min, the organic layer was washed with 5 mL of 0.1 M NaH2PO4, then 5 mL of saturated NaHCO3. The organic layer was then dried over Na2SO4 and concentrated.
Claims (20)
1. A process comprising contacting a compound of formula 6:
or a pharmaceutically acceptable salt thereof;
with a deprotecting reagent to form a compound of formula A:
2. The process of claim 1 wherein
R is OR1;
R1 is —CH(Ra)-phenyl-(Rb)x, trialkylsilyl, tetrahydropyranyl, —CH2OCH3, or —CH2OCH2CH2OCH3 groups, where Ra is H or methyl; Rb is methoxy or C1-alkyl, C2-alkyl, or C3-alkyl; and x is 0, 1 or 2; and
each R1′ is independently —CH(Rc)-phenyl-(Rd)y, where Rc is H or methyl, each Rd is independently methoxy or C1-alkyl, C2-alkyl, or C3-alkyl; n is 0, 1, 2 or 3, and y is 0, 1 or 2.
3. The process of claim 1 wherein R is OR1; R1 and each R1′ are benzyl groups; the deprotecting reagent is a reducing reagent; n is 1; and the compound of formula 6 is reduced in the presence of HCl to form the hydrochloride salt of the compound of formula A.
4. The process of claim 3 wherein the deprotecting reagent is Pd/C or Pt/C in the presence of H2 or a mixture thereof, H2 over palladium hydroxide, or catalytic transfer hydrogenating reagent conditions.
5. The process of any of claims 1 to 4 wherein the compound of formula 6 is prepared by contacting a compound of formula 5:
6. The process of claim 5 wherein the borylating reagent is isopropylpinacolborate, or a tri-C1-borate, tri-C2-borate or tri-C3-borate; n is 0 to 3; and the alkyl lithium reagent is n-BuLi, n-hexyllithium, or sec-BuLi.
7. The process of either claim 5 or 6 wherein the borylating reagent is isopropylpinacolborate or trimethyl borate; n is 2 and the alkyl lithium reagent is n-BuLi.
9. The process of claim 8 wherein the compound of formula 5 or a salt thereof is prepared using H2 and Naud catalyst or H2 and Noyori catalyst; and n is 2.
10. The process of claim 8 wherein the compound of formula 5 or a salt thereof is prepared by contacting the compound of formula 4 or a salt thereof with benzyl bromide in the presence of a carbonate or a hydroxide.
12. The process of claim 11 wherein the chiral reagent is
1,7,7-trimethyl-N-(pyridin-2-ylmethyl)bicyclo[2.2.1]heptan-2-amine di-hydrochloride; (4S)-4-ethyl-2-{1-ethyl-1-[(4 S)-4-(1-methylethyl)-4,5-dihydro-1,3-oxazol-2-yl]propyl}-4,5-dihydro-1,3-oxazole; (S)-4-(tert-butyl)-2-(2-((S)-4-methyl-4,5-dihydrooxazol-2-yl)propan-2-yl)-4,5-dihydrooxazole; or N1,N2-bis[(1R,2R,4R)-1,7,7-trimethylbicyclo[2.2.1]hept-2-yl]-1,2-ethanediamine and Cu(OAc)2; and n is 2.
15. A process comprising the steps of:
a) contacting a compound of formula 2:
where R is H or OR1; R1 is a protecting group; and n is 0, 1, 2, 3, 4 or 5;
b) reducing the compound of formula 3 to form a compound of formula 4:
or a salt thereof;
c) contacting the compound of formula 4 or a salt thereof with R1′X with a base to form a compound of formula 5:
or a salt thereof,
wherein R1′ is a protecting group and X is a leaving group;
d) contacting the compound of formula 5 or a salt thereof with a borylating reagent characterized by the following formula:
or a pharmaceutically acceptable salt thereof,
where each R2 is independently C1-alkyl, C2-alkyl, C3-alkyl, C4-alkyl, C5-alkyl, C6-alkyl, or together with the oxygen atoms to which they are attached form a 5- or 6-membered ring; and R3 is C1-alkyl, C2-alkyl, C3-alkyl, C4-alkyl, C5-alkyl, C6-alkyl; and
e) contacting the compound of formula 6 or a pharmaceutically acceptable salt thereof with a deprotecting reagent to form a compound of formula A or a pharmaceutically acceptable salt thereof:
16. The process of claim 15 wherein:
R1 and each R1′ are benzyl groups;
n is 2;
the chiral reagent is Cu(OAc)2 and 1,7,7-trimethyl-N-(pyridin-2-ylmethyl)bicyclo[2.2.1]heptan-2-amine di-hydrochloride; (4S)-4-ethyl-2-{1-ethyl-1-[(4S)-4-(1-methylethyl)-4,5-dihydro-1,3-oxazol-2-yl]propyl}-4,5-dihydro-1,3-oxazole; (S)-4-(tert-butyl)-2-(2-((S)-4-methyl-4,5-dihydrooxazol-2-yl)propan-2-yl)-4,5-dihydrooxazole; or N1,N2-bis[(1R,2R,4R)-1,7,7-trimethylbicyclo[2.2.1]hept-2-yl]-1,2-ethanediamine;
X is a leaving group selected from Br, Cl, I, tosyl or triflyl;
the borylating reagent is isopropylpinacolborate or trimethylborate; and
the deprotecting agent is hydrogenation in the presence of a Pd/C catalyst, Pt/C catalyst or a mixture of Pd/C+Pt/C catalysts.
17. A process comprising the steps of:
a) brominating a compound of formula 8:
where R is H or OR1; R1 is a protecting group; and n is 0, 1, 2, 3, 4 or 5;
b) contacting the compound of formula 9 with HN(R1′)2 to form a compound of formula 10:
or a salt thereof,
where each R1′ is a protecting group;
c) enantioselectively reducing the compound of formula 10 or a salt thereof to form a compound of formula 5:
or a salt thereof;
d) contacting the compound of formula 5 or a salt thereof with a borylating reagent characterized by the following formula:
or a pharmaceutically acceptable salt thereof,
where each R2 is independently C1-alkyl, C2-alkyl, C3-alkyl, C4-alkyl, C5-alkyl, C6-alkyl, or together with the oxygen atoms to which they are attached form a 5- or 6-membered ring; and R3 is C1-alkyl, C2-alkyl, C3-alkyl, C4-alkyl, C5-alkyl, C6-alkyl; and
e) contacting the compound of formula 6 or a pharmaceutically acceptable salt thereof with a deprotecting reagent to form a compound of formula A or a pharmaceutically acceptable salt thereof:
19. The compound of claim 18 wherein R1′ is benzyl, 1-phenylethyl, 2-methoxybenzyl, 3-methoxybenzyl, 4-methoxybenzyl, 2,4-dimethoxybenzyl, or diphenylmethyl; R1″ is OH; and n is 0, 1, 2 or 3.
20. The compound of either claim 18 or 19 wherein R1′ is benzyl and n is 2.
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WO2011127143A1 (en) | 2011-10-13 |
IL222103A (en) | 2016-12-29 |
US9243003B2 (en) | 2016-01-26 |
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