US20160078889A1 - Sensor structure having layer with high magnetic moment - Google Patents
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- US20160078889A1 US20160078889A1 US14/486,827 US201414486827A US2016078889A1 US 20160078889 A1 US20160078889 A1 US 20160078889A1 US 201414486827 A US201414486827 A US 201414486827A US 2016078889 A1 US2016078889 A1 US 2016078889A1
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- 230000005291 magnetic effect Effects 0.000 title claims abstract description 98
- 239000002131 composite material Substances 0.000 claims abstract description 21
- 125000006850 spacer group Chemical group 0.000 claims abstract description 21
- 239000000463 material Substances 0.000 claims description 33
- 239000000203 mixture Substances 0.000 claims description 4
- 229910002546 FeCo Inorganic materials 0.000 claims description 2
- -1 FeCoN Inorganic materials 0.000 claims description 2
- 229910005347 FeSi Inorganic materials 0.000 claims description 2
- 239000010410 layer Substances 0.000 abstract 6
- 239000002356 single layer Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 description 11
- 229910045601 alloy Inorganic materials 0.000 description 8
- 239000000956 alloy Substances 0.000 description 8
- 230000005290 antiferromagnetic effect Effects 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 239000000696 magnetic material Substances 0.000 description 5
- 230000009467 reduction Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000013500 data storage Methods 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 229910000702 sendust Inorganic materials 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
- G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
- G11B5/3912—Arrangements in which the active read-out elements are transducing in association with active magnetic shields, e.g. magnetically coupled shields
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
- G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
- G11B5/3929—Disposition of magnetic thin films not used for directly coupling magnetic flux from the track to the MR film or for shielding
- G11B5/3932—Magnetic biasing films
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
- G11B5/398—Specially shaped layers
Definitions
- a magnetic read/write head includes a reader portion having a magnetoresistive (MR) sensor for retrieving magnetically encoded information stored on a magnetic disc.
- MR magnetoresistive
- Magnetic flux from the surface of the disc causes rotation of the magnetization vector of a sensing layer of the MR sensor, which in turn causes a change in electrical resistivity of the MR sensor.
- the change in resistivity of the MR sensor can be detected by passing a current through the MR sensor and measuring a voltage across the MR sensor.
- External circuitry then converts the voltage information into an appropriate format and manipulates that information to recover the information encoded on the disc.
- the composite shield includes a high magnetic moment (HMM) layer having a magnetic moment greater than 1.0 T, a low magnetic moment (LMM) layer, and a spacer therebetween, wherein the HMM layer is closer to the stack than the LMM layer.
- HMM high magnetic moment
- LMM low magnetic moment
- a reader sensor having a top shield, a bottom shield, and a sensor stack between the top shield and to the bottom shield.
- At least one of the top shield and the bottom shield includes a reference layer having a high magnetic moment greater than 1.0 T, a pinned layer having a magnetic moment no greater than 1.0 T, and a spacer therebetween.
- the reference layer is closer to the stack than the pinned layer.
- Yet another particular implementation is a reader sensor having a top shield, a bottom shield, and a sensor stack between the top shield and the bottom shield.
- One of the top shield or the bottom shield comprises a reference layer, a pinned layer, a spacer between the reference layer and the pinned layer, and a high magnetic moment (HMM) layer magnetically coupled to the reference layer.
- the HMM layer is closer to the one of the top shield or the bottom shield than the reference layer.
- FIG. 1 is a perspective view of an example recording device using a reader having a sensor structure disclosed herein.
- FIG. 2 is a schematic an air-bearing surface (ABS) view of an example reader sensor structure.
- ABS air-bearing surface
- FIG. 3 is a schematic an air-bearing surface (ABS) view of an example reader sensor structure.
- ABS air-bearing surface
- FIG. 4 is a schematic an air-bearing surface (ABS) view of an example reader sensor structure.
- ABS air-bearing surface
- FIG. 5 is a schematic an air-bearing surface (ABS) view of an example reader sensor structure.
- ABS air-bearing surface
- FIG. 6 is a graphical representation of the effect of the magnetic moment of a material and its thickness on PW50.
- FIG. 7 is a graphical representation of the effect of the magnetic moment of a material, its thickness, and its inclusion with other materials on PW50.
- FIG. 8 is a flowchart illustrating an example method of forming an example reader sensor structure.
- FIG. 9 is a flowchart illustrating an example method of forming an example reader sensor structure.
- Giant Magnetoresistive (GMR) sensors that have increased sensitivity consist of two soft magnetic layers separated by a thin conductive, non-magnetic spacer layer such as copper.
- Tunnel Magnetoresistive (TMR) sensors provide an extension to GMR in which the electrons travel with their spins oriented perpendicularly to the layers across a thin insulating tunnel barrier.
- An antiferromagnetic (AFM) material (often called a “pinning layer”) is placed adjacent to the first soft magnetic layer to prevent it from rotating. With its rotation inhibited, the first soft layer is termed the “pinned layer” (PL).
- AFM materials exhibiting this pinning property are termed “pinning materials”.
- the second soft magnetic layer rotates freely in response to an external field and is called the “free layer” (FL).
- the MR sensor is preferably stabilized against the formation of edge domains because domain wall motion results in electrical noise that makes data recovery difficult.
- a common way to achieve stabilization is with a permanent magnet abutted junction design.
- permanent magnets with high coercive field i.e., hard magnets
- the field from the permanent magnets stabilizes the sensor and prevents edge domain formation, as well as provides proper bias.
- a synthetic antiferromagnetic (SAF) material is used in the PL.
- the use of the AFM/PL allows for consistent and predictable orientation of the SAF structure.
- the use of the AFM/PL also provides stable structure to enable high amplitude linear response for a reader using the MR sensor.
- the assembly of the various layers the GMR/TMR sensors, as discussed above, is also referred to as a sensor stack.
- Such sensor stack may be surrounded by a bottom shield and a top shield to shield the sensor from any magnetic influences that are generated from other components of the transducer head; these shields can be referred to as bulk shields.
- the distance between the top shield and the bottom shield is referred to as the shield-to-shield spacing (SSS).
- SSS shield-to-shield spacing
- PW50 which is the pulse width of a magnetic element at 50% of the pulse amplitude, is indicative of the spatial resolution of the sensor.
- the pulse width PW50 of magnetic sensors which determine the signal-to-noise (SNR) ratio in a recording system, depend on the SSS of the head. Specifically, a reduction in the SSS leads to reduction in the value of the PW50 and therefore, an increase in the value of the SNR for the recording system. However, using SSS reduction to achieve lower PW50 has its limits.
- a top shield has two main functions: shielding for PW50 and MT metrics improvement, and support of the side shields.
- supporting the side shields precludes PW50 reduction by using thin layers decoupled from the bulk shields.
- An example sensor assembly disclosed herein provides PW50 improvement while having shield material coercivity and magnetic non-uniformity significantly less than in a high-moment shield.
- an example sensor assembly disclosed herein provides alternative methods for reducing the PW50 of a sensor without reducing the SSS of the sensor and without increasing significantly the coercivity and magnetic non-uniformity of the shields.
- the sensor assembly includes a reader sensor or “stack” surrounded by a bottom shield and a top shield in down-track direction, where one of the shields has a layer, magnetically coupled to the rest of the shield, having a high magnetic moment (higher than 1.0 T) close to the sensor stack.
- the stability of the sensor is maintained, due to a small increase in coercivity and magnetic non-uniformity, if any, while the PW50 of the sensor stack is greatly decreased.
- the result is improved SNR of the recording system using such sensor assembly.
- AMR anisotropic magnetoresistive
- TMR sensors TMR sensors
- GMR sensors GMR sensors
- LSV lateral spin valve
- SHE spin-hall effect
- STO spin torque oscillation
- FIG. 1 illustrates a perspective view of an example recording device 100 using a reader disclosed herein.
- Recording device 100 includes a disc 102 , which rotates about a spindle center or a disc axis of rotation 104 during operation.
- the disc 102 includes an inner diameter 106 and an outer diameter 108 between which are a number of concentric data tracks 110 , illustrated by circular dashed lines.
- the data tracks 110 are substantially circular and are made up of regularly spaced patterned bits 112 , indicated as dots or ovals on the disc 102 . It should be understood, however, that the described technology may be employed with other types of storage media, including continuous magnetic media, discrete track (DT) media, etc.
- DT discrete track
- a transducer head 124 is mounted on an actuator assembly 120 at an end distal to an actuator axis of rotation 122 and the transducer head 124 flies in close proximity above the surface of the disc 102 during disc operation.
- the actuator assembly 120 rotates during a seek operation about the actuator axis of rotation 122 positioned adjacent to the disc 102 .
- the seek operation positions the transducer head 124 over a target data track of the data tracks 110 .
- An exploded view 140 illustrates an expanded view of the transducer head 124 , with a reader sensor 150 illustrated by a schematic block diagram that illustrates an air-bearing surface (ABS) view of the reader sensor 150 .
- the reader sensor 150 is illustrated to include a top shield 152 and a bottom shield 154 , with a sensor stack 156 between the shields 152 , 154 along the down-track direction of the reader 150 .
- the top shield 152 and the bottom shield 154 protect the sensor stack 156 from flux from adjacent data tracks 110 on the disc 102 .
- sensor stack 156 includes multiple layers, including a free layer that has a switchable magnetic orientation.
- top shield 152 and the bottom shield 154 bounding the sensor stack 156 in the cross-track directions, are side shields 158 .
- at least one of the top shield 152 and the bottom shield 154 is a composite shield, that includes a high magnetic moment (HMM) material that has a magnetic moment greater than 1.0 T.
- HMM high magnetic moment
- the magnetic moment is at least 1.2 T, or at least 1.4 T, or at least 1.8 T, or even at least 2.4 T.
- FIG. 2 illustrates an ABS view of an example implementation of a sensor structure, particularly, of a reader 200 .
- the reader 200 includes a top shield 202 and a base or bottom shield 204 around a sensor stack 206 that has multiple layers, one of which is a free layer with a switchable magnetic orientation.
- the particulars of the sensor stack 206 are not detailed herein, and other layers that may be in the sensor stack 206 include an AFM layer, a pinned layer, a spacer layer, a reference layer, etc.
- the side shields 208 encompass all layers of the sensor stack 206 , however in other implementations, the side shields 208 may not encompass one or more of the layers that form the sensor stack 206 .
- the side shields 208 may be hard magnetic or permanent magnets (PM), and may have high magnetic moment (i.e., greater than 1.0 T) or low magnetic moment (i.e., 1.0 T or less).
- the side shields 208 provide a magnetic biasing field on the free layer in the sensor stack 206 .
- the side shields 208 can be directly magnetically coupled with the top shield 202 .
- the top shield 202 is a composite shield, composed of at least three layers; in this implementation, the top shield 202 has a pinned layer 210 , a reference layer 212 , a spacer 211 therebetween, and a high magnetic moment (HMM) layer 215 having a high magnetic moment.
- the pinned layer 210 is a magnetic layer that has a pinned (or not readily switchable) magnetic orientation, a low magnetic moment (i.e., 1.0 T or less) and low coercivity (usually on the order of a few Oersteads (Oe)), and low magnetic non-uniformity; the pinned layer 210 can be referred to as a low magnetic moment (LMM) layer.
- the reference layer 212 is a magnetic layer that also has a low magnetic moment of 1.0 T or less and a low coercivity and low magnetic non-uniformity. Together, in some implementations layers 210 / 211 / 212 are referred to as a synthetic antiferromagnetic layer, or SAF layer.
- the HMM layer 215 is magnetically coupled to the reference layer 212 and is separated from the pinned layer 210 by the spacer layer 211 and by the reference layer 212 .
- the HMM layer 215 is closer to the sensor stack 206 than the reference layer 212 , and in the illustrated implementation, the HMM layer 215 is directly in contact with and adjacent to the sensor stack 206 .
- the HMM layer 215 is not magnetically coupled to the stack 206 . This can be due to a non-magnetic cap layer present between the stack 206 and the HMM layer 215 . In some implementations, such a cap layer extends across the sensor stack 206 and the side shields 208 , so that the side shields 208 contact the cap layer.
- the HMM layer 215 is formed from a magnetic material having a magnetic moment greater than 1.0 T.
- the magnetic moment of the HMM layer 215 is at least 1.2 T, or at least 1.4 T, or at least 1.8 T, or even at least 2.4 T.
- General examples of high magnetic moment alloys include FeCo, FeCoN, FeSi, and FeC.
- high magnetic moment alloys include Fe 44-46 Co 39-42 Ni 14.5-15 (2.1 T), Fe 54-56 Ni 27-29 Co 16-18 (1.8 T), Fe 86-90 Cr 10-14 (1.8 T), Fe 52-62 Co 26-36 Cr 10-14 (1.9 T), Ni 40-60 Fe 50-60 including Ni 45 Fe 55 (1.6 T), and “sendust” (Al 5.4 Fe 65 Si 9.6 (1.1 T)), where the subscripts indicate the range of atomic percentages for each element in the alloy. “Permalloy” (Ni 81 Fe 19 ) is not a high magnetic moment material, as it has a magnetic moment of 1.0 T.
- the HMM layer 215 may have a coercivity (e.g., a few tens of Oersteads) similar to or slightly higher than the coercivity of the pinned layer 210 .
- the HMM layer 215 is sufficiently thin so that the SSS is increased slightly, if at all, over a comparable structure having no HMM layer. Because it is thin, its contribution to the total coercivity of the top shield 202 is relatively low.
- the HHM layer 215 has a thickness of at least 1 nm and in other implementations at least 2 nm.
- the HHM layer 215 is, in some implementations, no greater than 50 nm thick and in other implementations no greater than 30 nm.
- Example thicknesses of a discrete HMM layer, such as HMM layer 215 include 1 nm, 2 nm, 4 nm, 6 nm, 10 nm, 20 nm, and 30 nm.
- the HMM layer 215 improves the PW50 of the reader 200 because the coercivity of the entire top shield 202 is the weighted average of the coercivity of the HMM layer 215 versus the rest of the top shield 202 (e.g., the pinned layer 210 , the spacer layer 211 and the reference layer 212 ).
- the coercivity and magnetic non-uniformity of the shield 202 is increased minimally by the addition of the HMM layer 215 , whereas the PW50 improves (i.e., decreases) significantly.
- the improved PW50 increases the capability of the sensor 200 to read data with higher linear density, thus allowing a recording device using the sensor 200 to provide higher linear data density and thus more cost effective data storage capabilities.
- reader sensor 200 The particulars of the specific construction of the reader sensor 200 are not of particular relevance to composite shield and the HMM layer in the reader sensor 200 , and a detailed discussion of the other elements of sensor 200 is not provided herein.
- FIG. 3 illustrates another schematic block diagram of an ABS view of an example implementation of a reader 300 .
- the reader 300 includes a top shield 302 and a base or bottom shield 304 around a sensor stack 306 . Also between the top shield 302 and the bottom shield 304 , in the crosstrack or lateral direction to the sensor stack 306 , are side shields 308 .
- the top shield 302 is a composite shield, composed of at least three layers; however in this implementation, the top shield 302 has a pinned layer 310 , a spacer layer 311 , and a reference layer 315 having a high magnetic moment.
- the composite HMM/reference layer 315 has a magnetic moment greater than 1.0 T, and is formed from a mixture or combination (e.g., an alloy) of a magnetic material having a magnetic moment greater than 1.0 T and a second magnetic material having a magnetic moment of 1.0 T or less.
- the ratio of the materials should be such that the resulting material has a magnetic moment greater than 1.0 T, in some implementations, at least 1.2 T, or at least 1.4 T, or at least 1.8 T, or even at least 2.4 T
- the HMM/reference layer 315 is a mixture or combination (e.g., an alloy) of multiple magnetic materials, at least one of which has a magnetic moment greater than 1.0 T.
- the pinned layer 310 is a low magnetic moment (LMM) layer, having a magnetic moment no greater than 1.0 T.
- the HMM/reference layer 315 typically has a thickness similar to or equal to the thickness the reference layer would be if no HMM material were present. In some implementations, the HMM/reference layer 315 has a thickness of at least 5 nm, 10 nm, 20 nm and in other implementations at least 30 nm.
- the HMM/reference layer 315 is separated from the pinned layer 310 by the spacer layer 311 .
- the HMM/reference layer 315 is closer to the sensor stack 306 than the pinned layer 310 , and in the illustrated implementation, the HMM/reference layer 315 is The HMM/reference layer 315 is not magnetically coupled to stack.
- FIG. 4 illustrates another schematic block diagram of an ABS view of an example implementation of a reader 400 .
- reader 400 includes a top shield 402 and a base or bottom shield 404 around a sensor stack 406 . Also between the top shield 402 and the bottom shield 404 , in the crosstrack or lateral direction to the sensor stack 406 , are side shields 408 .
- the bottom shield 404 is a composite shield, composed of at least three layers; in this implementation, the bottom shield 404 has a pinned layer 410 , a reference layer 412 , a spacer layer 411 therebetween, and a HMM layer 415 having a high magnetic moment.
- the HMM layer 415 has a magnetic moment greater than 1.0 T, whereas the pinned layer 410 has a low magnetic moment (LMM) no greater than 1.0 T.
- the HMM layer 415 is magnetically coupled to the reference layer 412 and is separated from the pinned layer 410 by the spacer layer 411 and by the reference layer 412 .
- the HMM layer 415 is closer to the sensor stack 406 than the pinned layer 410 and the reference layer 412 , and in the illustrated implementation, the HMM layer 415 is directly in contact with and adjacent to the sensor stack 406 .
- FIG. 5 illustrates another schematic block diagram of an ABS view of an example implementation of a reader 500 .
- the reader 500 includes a top shield 502 and a base or bottom shield 504 around a sensor stack 506 . Also between the top shield 502 and the bottom shield 504 , in the crosstrack or lateral direction to the sensor stack 506 , are side shields 508 .
- the bottom shield 504 is a composite shield, composed of at least three layers; however in this implementation, the bottom shield 504 has a pinned layer 510 , a spacer layer 511 , and a reference layer 515 having a high magnetic moment.
- the HMM/reference layer 515 has a magnetic moment greater than 1.0 T, and is formed from a mixture or combination (e.g., an alloy) of multiple materials, at least one of which has a magnetic moment greater than 1.0 T.
- the pinned layer 510 is a low magnetic moment (LMM) layer, having a magnetic moment no greater than 1.0 T.
- the HMM/reference layer 515 is separated from the pinned layer 510 by the spacer layer 511 .
- the HMM/reference layer 515 is closer to the sensor stack 506 than the pinned layer 510 , and in the illustrated implementation, the HMM/reference layer 515 is in direct contact with and adjacent to the sensor stack 506 .
- FIG. 6 shows the theoretical improvement (i.e., reduction) of PW50 due to the HMM material proximate to the sensor stack and directly magnetically coupled to the rest of the composite shield.
- the baseline sensor had a 30 nm reference layer with no HMM layer.
- the modeled sensor stacks were: 26 nm reference layer+4 nm HMM, 24 nm reference layer+6 nm HMM, 20 nm reference layer+10 nm HMM, 12 nm reference layer+18 nm HMM, and 4 nm reference layer+26 nm HMM.
- Two HMM materials were used for the models, a 1.8 T HMM and a 2.4 T HMM.
- a 1.0 T material was used.
- the PW50 improves as the magnetic moment increased (i.e., 1.0 T versus 1.8 T versus 2.4 T).
- a 10 nm HMM (1.8 T) improves the PW50 by 0.6 nm
- a 10 nm HM (2.4 T) improves the PW50 by 0.9 nm.
- the PW50 also improves as the thickness of the HMM layer increases.
- a 10 nm HMM (2.4 T) improves the PW50 by 0.9 nm and an 18 nm HMM (2.4 T) improves the PW50 by 1.2 nm. Decreased PW50 improves linear density capabilities of the reader.
- Having the HMM alloyed with a lower magnetic moment material also improves the PW50, although not as much as a discrete layer of HMM. As can be seen in FIG. 7 , the PW50 decreases with both a discrete HMM layer or an HMM alloy layer, although the discrete HMM layer reduces PW50 more effectively.
- a composite shield either top shield or bottom shield, having a layer with a high magnetic moment greater than 1.0 T, improves PW50 while providing acceptable increase in coercivity and magnetic non-uniformity, all which enhances linear density capabilities of the reader.
- All of the read sensors described above, readers 200 , 300 , 400 , 500 and variations thereof, can be fabricated by conventional methods, including plating, deposition, etching, milling, and other conventional processing techniques.
- a flowchart illustrates an example method for forming a read sensor having a composite top shield with a discrete HMM layer, such as the sensor 200 of FIG. 2 .
- the method involves operation 802 of forming a bottom shield layer on a substrate. This operation does not require forming the bottom shield directly on the substrate, as intervening materials/layers may be present between the bottom shield and substrate.
- a sensor stack is formed on the bottom shield in operation 804 . This operation does not require forming the sensor stack directly on the substrate, as intervening materials/layers may be present between the bottom shield and sensor stack.
- side shields are formed on the bottom shield around the sensor stack.
- a composite top shield is formed on the sensor stack in operations 808 through 812 .
- a layer of HMM material i.e., having a magnetic moment of greater than 1.0 T
- the HMM layer is formed directly on and in contact with the sensor stack.
- a reference layer is formed, in this particular method, on and in contact with the HMM layer.
- a spacer layer and then a pinned layer are formed in operation 812 on the reference layer.
- FIG. 9 An alternate example method for forming a read sensor is illustrated in FIG. 9 , the read sensor having a composite top shield with an alloy HMM layer, such as the sensor 300 of FIG. 3 .
- the method involves operation 902 of forming a bottom shield layer on a substrate. This operation does not require forming the bottom shield directly on the substrate, as intervening materials/layers may be present between the bottom shield and substrate.
- a sensor stack is formed on the bottom shield in operation 904 . This operation does not require forming the sensor stack directly on the substrate, as intervening materials/layers may be present between the bottom shield and sensor stack.
- side shields are formed on the bottom shield around the sensor stack.
- a composite top shield is formed on the sensor stack in operations 908 through 910 .
- a HMM layer (i.e., having a magnetic moment of greater than 1.0 T) is formed; the HMM layer is composed of multiple magnetic materials, at least one of which has a magnetic moment greater than 1.0 T.
- the HMM layer is formed directly on and in contact with the sensor stack.
- a spacer layer and then a pinned layer are formed on the reference layer.
- spatially related terms including but not limited to, “bottom,” “lower”, “top”, “upper”, “beneath”, “below”, “above”, “on top”, “on,” etc., if used herein, are utilized for ease of description to describe spatial relationships of an element(s) to another.
- Such spatially related terms encompass different orientations of the device in addition to the particular orientations depicted in the figures and described herein. For example, if a structure depicted in the figures is turned over or flipped over, portions previously described as below or beneath other elements would then be above or over those other elements.
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Abstract
Description
- In a magnetic data storage and retrieval system, a magnetic read/write head includes a reader portion having a magnetoresistive (MR) sensor for retrieving magnetically encoded information stored on a magnetic disc. Magnetic flux from the surface of the disc causes rotation of the magnetization vector of a sensing layer of the MR sensor, which in turn causes a change in electrical resistivity of the MR sensor. The change in resistivity of the MR sensor can be detected by passing a current through the MR sensor and measuring a voltage across the MR sensor. External circuitry then converts the voltage information into an appropriate format and manipulates that information to recover the information encoded on the disc.
- One particular implementation described herein is a reader sensor having a sensor stack and a composite shield. The composite shield includes a high magnetic moment (HMM) layer having a magnetic moment greater than 1.0 T, a low magnetic moment (LMM) layer, and a spacer therebetween, wherein the HMM layer is closer to the stack than the LMM layer.
- Another particular implementation is a reader sensor having a top shield, a bottom shield, and a sensor stack between the top shield and to the bottom shield. At least one of the top shield and the bottom shield includes a reference layer having a high magnetic moment greater than 1.0 T, a pinned layer having a magnetic moment no greater than 1.0 T, and a spacer therebetween. The reference layer is closer to the stack than the pinned layer.
- Yet another particular implementation is a reader sensor having a top shield, a bottom shield, and a sensor stack between the top shield and the bottom shield. One of the top shield or the bottom shield comprises a reference layer, a pinned layer, a spacer between the reference layer and the pinned layer, and a high magnetic moment (HMM) layer magnetically coupled to the reference layer. The HMM layer is closer to the one of the top shield or the bottom shield than the reference layer.
- This Summary is provided to introduce a selection of concepts in a simplified form that are further described below in the Detailed Description. This Summary is not intended to identify key features or essential features of the claimed subject matter, nor is it intended to be used to limit the scope of the claimed subject matter. These and various other features and advantages will be apparent from a reading of the following detailed description.
- The described technology is best understood from the following Detailed Description describing various implementations read in connection with the accompanying drawings.
-
FIG. 1 is a perspective view of an example recording device using a reader having a sensor structure disclosed herein. -
FIG. 2 is a schematic an air-bearing surface (ABS) view of an example reader sensor structure. -
FIG. 3 is a schematic an air-bearing surface (ABS) view of an example reader sensor structure. -
FIG. 4 is a schematic an air-bearing surface (ABS) view of an example reader sensor structure. -
FIG. 5 is a schematic an air-bearing surface (ABS) view of an example reader sensor structure. -
FIG. 6 is a graphical representation of the effect of the magnetic moment of a material and its thickness on PW50. -
FIG. 7 is a graphical representation of the effect of the magnetic moment of a material, its thickness, and its inclusion with other materials on PW50. -
FIG. 8 is a flowchart illustrating an example method of forming an example reader sensor structure. -
FIG. 9 is a flowchart illustrating an example method of forming an example reader sensor structure. - There is an increasing demand for high data densities and sensitive sensors to read data from a magnetic media. Giant Magnetoresistive (GMR) sensors that have increased sensitivity consist of two soft magnetic layers separated by a thin conductive, non-magnetic spacer layer such as copper. Tunnel Magnetoresistive (TMR) sensors provide an extension to GMR in which the electrons travel with their spins oriented perpendicularly to the layers across a thin insulating tunnel barrier. An antiferromagnetic (AFM) material (often called a “pinning layer”) is placed adjacent to the first soft magnetic layer to prevent it from rotating. With its rotation inhibited, the first soft layer is termed the “pinned layer” (PL). AFM materials exhibiting this pinning property are termed “pinning materials”. The second soft magnetic layer rotates freely in response to an external field and is called the “free layer” (FL).
- To operate the MR sensor properly, the sensor is preferably stabilized against the formation of edge domains because domain wall motion results in electrical noise that makes data recovery difficult. A common way to achieve stabilization is with a permanent magnet abutted junction design. In this scheme, permanent magnets with high coercive field (i.e., hard magnets) are placed at each end of the sensor. The field from the permanent magnets stabilizes the sensor and prevents edge domain formation, as well as provides proper bias. In order to increase the stiffness of the PL, a synthetic antiferromagnetic (SAF) material is used in the PL. The use of the AFM/PL allows for consistent and predictable orientation of the SAF structure. Furthermore, the use of the AFM/PL also provides stable structure to enable high amplitude linear response for a reader using the MR sensor.
- The assembly of the various layers the GMR/TMR sensors, as discussed above, is also referred to as a sensor stack. Such sensor stack may be surrounded by a bottom shield and a top shield to shield the sensor from any magnetic influences that are generated from other components of the transducer head; these shields can be referred to as bulk shields. In such an implementation, the distance between the top shield and the bottom shield is referred to as the shield-to-shield spacing (SSS). PW50, which is the pulse width of a magnetic element at 50% of the pulse amplitude, is indicative of the spatial resolution of the sensor. The pulse width PW50 of magnetic sensors, which determine the signal-to-noise (SNR) ratio in a recording system, depend on the SSS of the head. Specifically, a reduction in the SSS leads to reduction in the value of the PW50 and therefore, an increase in the value of the SNR for the recording system. However, using SSS reduction to achieve lower PW50 has its limits.
- The PW50 performance of a shield can be improved by increasing its magnetic moment. However, higher-moment materials tend to have higher coercivity and magnetic non-uniformity, which creates shield instability and a decrease in the SNR. A top shield has two main functions: shielding for PW50 and MT metrics improvement, and support of the side shields. However, supporting the side shields precludes PW50 reduction by using thin layers decoupled from the bulk shields.
- An example sensor assembly disclosed herein provides PW50 improvement while having shield material coercivity and magnetic non-uniformity significantly less than in a high-moment shield. Specifically an example sensor assembly disclosed herein provides alternative methods for reducing the PW50 of a sensor without reducing the SSS of the sensor and without increasing significantly the coercivity and magnetic non-uniformity of the shields. Specifically, the sensor assembly includes a reader sensor or “stack” surrounded by a bottom shield and a top shield in down-track direction, where one of the shields has a layer, magnetically coupled to the rest of the shield, having a high magnetic moment (higher than 1.0 T) close to the sensor stack. By providing a high magnetic moment material close to the sensor stack, the stability of the sensor is maintained, due to a small increase in coercivity and magnetic non-uniformity, if any, while the PW50 of the sensor stack is greatly decreased. The result is improved SNR of the recording system using such sensor assembly.
- It is noted that the technology disclosed herein may be used in conjunction with a variety of different types of magnetic sensors (e.g., anisotropic magnetoresistive (AMR) sensors, TMR sensors, GMR sensors, etc.). Accordingly, the implementations discussed may also be applicable to new sensor designs that are based on new physical phenomena such as lateral spin valve (LSV), spin-hall effect (SHE), spin torque oscillation (STO), etc.
- In the following description, reference is made to the accompanying drawing that forms a part hereof and in which are shown by way of illustration at least one specific implementation. The following description provides additional specific implementations. It is to be understood that other implementations are contemplated and may be made without departing from the scope or spirit of the present disclosure. The following detailed description, therefore, is not to be taken in a limiting sense. While the present disclosure is not so limited, an appreciation of various aspects of the disclosure will be gained through a discussion of the examples provided below. In some instances, a reference numeral may have an associated sub-label consisting of a lower-case letter to denote one of multiple similar components. When reference is made to a reference numeral without specification of a sub-label, the reference is intended to refer to all such multiple similar components.
-
FIG. 1 illustrates a perspective view of anexample recording device 100 using a reader disclosed herein.Recording device 100 includes adisc 102, which rotates about a spindle center or a disc axis ofrotation 104 during operation. Thedisc 102 includes aninner diameter 106 and anouter diameter 108 between which are a number of concentric data tracks 110, illustrated by circular dashed lines. The data tracks 110 are substantially circular and are made up of regularly spaced patternedbits 112, indicated as dots or ovals on thedisc 102. It should be understood, however, that the described technology may be employed with other types of storage media, including continuous magnetic media, discrete track (DT) media, etc. - Information may be written to and read from the
bits 112 on thedisc 102 in different data tracks 110. Atransducer head 124 is mounted on anactuator assembly 120 at an end distal to an actuator axis ofrotation 122 and thetransducer head 124 flies in close proximity above the surface of thedisc 102 during disc operation. Theactuator assembly 120 rotates during a seek operation about the actuator axis ofrotation 122 positioned adjacent to thedisc 102. The seek operation positions thetransducer head 124 over a target data track of the data tracks 110. - An exploded
view 140 illustrates an expanded view of thetransducer head 124, with areader sensor 150 illustrated by a schematic block diagram that illustrates an air-bearing surface (ABS) view of thereader sensor 150. In the illustrated implementation, thereader sensor 150 is illustrated to include atop shield 152 and abottom shield 154, with asensor stack 156 between theshields reader 150. Thetop shield 152 and thebottom shield 154 protect thesensor stack 156 from flux from adjacent data tracks 110 on thedisc 102. The details of which are not shown,sensor stack 156 includes multiple layers, including a free layer that has a switchable magnetic orientation. Also between thetop shield 152 and thebottom shield 154, bounding thesensor stack 156 in the cross-track directions, are side shields 158. In accordance with this disclosure, at least one of thetop shield 152 and thebottom shield 154 is a composite shield, that includes a high magnetic moment (HMM) material that has a magnetic moment greater than 1.0 T. In some implementations, the magnetic moment is at least 1.2 T, or at least 1.4 T, or at least 1.8 T, or even at least 2.4 T. -
FIG. 2 illustrates an ABS view of an example implementation of a sensor structure, particularly, of areader 200. Thereader 200 includes atop shield 202 and a base orbottom shield 204 around asensor stack 206 that has multiple layers, one of which is a free layer with a switchable magnetic orientation. The particulars of thesensor stack 206 are not detailed herein, and other layers that may be in thesensor stack 206 include an AFM layer, a pinned layer, a spacer layer, a reference layer, etc. - Also between the
top shield 202 and thebottom shield 204, in the crosstrack or lateral direction to thesensor stack 206, are side shields 208. In the illustrated implementations, the side shields 208 encompass all layers of thesensor stack 206, however in other implementations, the side shields 208 may not encompass one or more of the layers that form thesensor stack 206. The side shields 208 may be hard magnetic or permanent magnets (PM), and may have high magnetic moment (i.e., greater than 1.0 T) or low magnetic moment (i.e., 1.0 T or less). The side shields 208 provide a magnetic biasing field on the free layer in thesensor stack 206. The side shields 208 can be directly magnetically coupled with thetop shield 202. - The
top shield 202 is a composite shield, composed of at least three layers; in this implementation, thetop shield 202 has a pinnedlayer 210, areference layer 212, aspacer 211 therebetween, and a high magnetic moment (HMM)layer 215 having a high magnetic moment. The pinnedlayer 210 is a magnetic layer that has a pinned (or not readily switchable) magnetic orientation, a low magnetic moment (i.e., 1.0 T or less) and low coercivity (usually on the order of a few Oersteads (Oe)), and low magnetic non-uniformity; the pinnedlayer 210 can be referred to as a low magnetic moment (LMM) layer. In some implementations, thereference layer 212 is a magnetic layer that also has a low magnetic moment of 1.0 T or less and a low coercivity and low magnetic non-uniformity. Together, in someimplementations layers 210/211/212 are referred to as a synthetic antiferromagnetic layer, or SAF layer. - The HMM
layer 215 is magnetically coupled to thereference layer 212 and is separated from the pinnedlayer 210 by thespacer layer 211 and by thereference layer 212. The HMMlayer 215 is closer to thesensor stack 206 than thereference layer 212, and in the illustrated implementation, the HMMlayer 215 is directly in contact with and adjacent to thesensor stack 206. In some implementations, the HMMlayer 215 is not magnetically coupled to thestack 206. This can be due to a non-magnetic cap layer present between thestack 206 and the HMMlayer 215. In some implementations, such a cap layer extends across thesensor stack 206 and the side shields 208, so that the side shields 208 contact the cap layer. - As indicated above, the HMM
layer 215 is formed from a magnetic material having a magnetic moment greater than 1.0 T. In some implementations, the magnetic moment of the HMMlayer 215 is at least 1.2 T, or at least 1.4 T, or at least 1.8 T, or even at least 2.4 T. General examples of high magnetic moment alloys include FeCo, FeCoN, FeSi, and FeC. Particular examples of high magnetic moment alloys include Fe44-46Co39-42Ni14.5-15 (2.1 T), Fe54-56Ni27-29Co16-18 (1.8 T), Fe86-90Cr10-14 (1.8 T), Fe52-62Co26-36Cr10-14 (1.9 T), Ni40-60Fe50-60 including Ni45Fe55 (1.6 T), and “sendust” (Al5.4Fe65Si9.6 (1.1 T)), where the subscripts indicate the range of atomic percentages for each element in the alloy. “Permalloy” (Ni81Fe19) is not a high magnetic moment material, as it has a magnetic moment of 1.0 T. - The HMM
layer 215 may have a coercivity (e.g., a few tens of Oersteads) similar to or slightly higher than the coercivity of the pinnedlayer 210. The HMMlayer 215 is sufficiently thin so that the SSS is increased slightly, if at all, over a comparable structure having no HMM layer. Because it is thin, its contribution to the total coercivity of thetop shield 202 is relatively low. In some implementations, theHHM layer 215 has a thickness of at least 1 nm and in other implementations at least 2 nm. TheHHM layer 215 is, in some implementations, no greater than 50 nm thick and in other implementations no greater than 30 nm. Example thicknesses of a discrete HMM layer, such as HMMlayer 215, include 1 nm, 2 nm, 4 nm, 6 nm, 10 nm, 20 nm, and 30 nm. - The HMM
layer 215 improves the PW50 of thereader 200 because the coercivity of the entiretop shield 202 is the weighted average of the coercivity of the HMM layer 215 versus the rest of the top shield 202 (e.g., the pinnedlayer 210, thespacer layer 211 and the reference layer 212). The coercivity and magnetic non-uniformity of theshield 202 is increased minimally by the addition of the HMMlayer 215, whereas the PW50 improves (i.e., decreases) significantly. The improved PW50 increases the capability of thesensor 200 to read data with higher linear density, thus allowing a recording device using thesensor 200 to provide higher linear data density and thus more cost effective data storage capabilities. - The particulars of the specific construction of the
reader sensor 200 are not of particular relevance to composite shield and the HMM layer in thereader sensor 200, and a detailed discussion of the other elements ofsensor 200 is not provided herein. -
FIG. 3 illustrates another schematic block diagram of an ABS view of an example implementation of areader 300. Various elements or features ofreader 300 are the same as or similar to the corresponding element or feature ofreader 200, unless indicated otherwise. Thereader 300 includes atop shield 302 and a base orbottom shield 304 around asensor stack 306. Also between thetop shield 302 and thebottom shield 304, in the crosstrack or lateral direction to thesensor stack 306, are side shields 308. - Similar to the previous figure, the
top shield 302 is a composite shield, composed of at least three layers; however in this implementation, thetop shield 302 has a pinnedlayer 310, aspacer layer 311, and areference layer 315 having a high magnetic moment. The composite HMM/reference layer 315 has a magnetic moment greater than 1.0 T, and is formed from a mixture or combination (e.g., an alloy) of a magnetic material having a magnetic moment greater than 1.0 T and a second magnetic material having a magnetic moment of 1.0 T or less. The ratio of the materials should be such that the resulting material has a magnetic moment greater than 1.0 T, in some implementations, at least 1.2 T, or at least 1.4 T, or at least 1.8 T, or even at least 2.4 T - In other implementations, the HMM/
reference layer 315 is a mixture or combination (e.g., an alloy) of multiple magnetic materials, at least one of which has a magnetic moment greater than 1.0 T. The pinnedlayer 310 is a low magnetic moment (LMM) layer, having a magnetic moment no greater than 1.0 T. - The HMM/
reference layer 315 typically has a thickness similar to or equal to the thickness the reference layer would be if no HMM material were present. In some implementations, the HMM/reference layer 315 has a thickness of at least 5 nm, 10 nm, 20 nm and in other implementations at least 30 nm. - The HMM/
reference layer 315 is separated from the pinnedlayer 310 by thespacer layer 311. The HMM/reference layer 315 is closer to thesensor stack 306 than the pinnedlayer 310, and in the illustrated implementation, the HMM/reference layer 315 is The HMM/reference layer 315 is not magnetically coupled to stack. -
FIG. 4 illustrates another schematic block diagram of an ABS view of an example implementation of areader 400. Various elements or features ofreader 400 are the same as or similar to the corresponding element or feature ofreaders reader 400 includes atop shield 402 and a base orbottom shield 404 around asensor stack 406. Also between thetop shield 402 and thebottom shield 404, in the crosstrack or lateral direction to thesensor stack 406, are side shields 408. - In this implementation, the
bottom shield 404 is a composite shield, composed of at least three layers; in this implementation, thebottom shield 404 has a pinnedlayer 410, areference layer 412, aspacer layer 411 therebetween, and a HMMlayer 415 having a high magnetic moment. The HMMlayer 415 has a magnetic moment greater than 1.0 T, whereas the pinnedlayer 410 has a low magnetic moment (LMM) no greater than 1.0 T. - The HMM
layer 415 is magnetically coupled to thereference layer 412 and is separated from the pinnedlayer 410 by thespacer layer 411 and by thereference layer 412. The HMMlayer 415 is closer to thesensor stack 406 than the pinnedlayer 410 and thereference layer 412, and in the illustrated implementation, the HMMlayer 415 is directly in contact with and adjacent to thesensor stack 406. -
FIG. 5 illustrates another schematic block diagram of an ABS view of an example implementation of areader 500. Various elements or features ofreader 500 are the same as or similar to the corresponding element or feature ofreaders reader 500 includes atop shield 502 and a base orbottom shield 504 around asensor stack 506. Also between thetop shield 502 and thebottom shield 504, in the crosstrack or lateral direction to thesensor stack 506, are side shields 508. - Similar to the previous figure, the
bottom shield 504 is a composite shield, composed of at least three layers; however in this implementation, thebottom shield 504 has a pinnedlayer 510, aspacer layer 511, and areference layer 515 having a high magnetic moment. The HMM/reference layer 515 has a magnetic moment greater than 1.0 T, and is formed from a mixture or combination (e.g., an alloy) of multiple materials, at least one of which has a magnetic moment greater than 1.0 T. The pinnedlayer 510 is a low magnetic moment (LMM) layer, having a magnetic moment no greater than 1.0 T. - The HMM/
reference layer 515 is separated from the pinnedlayer 510 by thespacer layer 511. The HMM/reference layer 515 is closer to thesensor stack 506 than the pinnedlayer 510, and in the illustrated implementation, the HMM/reference layer 515 is in direct contact with and adjacent to thesensor stack 506. - Various implementations of reader sensors were modeled, with a sensor stack having a 30 nm thick pinned layer and a reference layer and HMM layer that both varied in thickness.
FIG. 6 shows the theoretical improvement (i.e., reduction) of PW50 due to the HMM material proximate to the sensor stack and directly magnetically coupled to the rest of the composite shield. The baseline sensor had a 30 nm reference layer with no HMM layer. The modeled sensor stacks were: 26 nm reference layer+4 nm HMM, 24 nm reference layer+6 nm HMM, 20 nm reference layer+10 nm HMM, 12 nm reference layer+18 nm HMM, and 4 nm reference layer+26 nm HMM. Two HMM materials were used for the models, a 1.8 T HMM and a 2.4 T HMM. As another baseline, a 1.0 T material was used. - As can be seen in
FIG. 6 , presence of the HMM layer reduces the PW50. The PW50 improves as the magnetic moment increased (i.e., 1.0 T versus 1.8 T versus 2.4 T). For example, a 10 nm HMM (1.8 T) improves the PW50 by 0.6 nm, and a 10 nm HM (2.4 T) improves the PW50 by 0.9 nm. The PW50 also improves as the thickness of the HMM layer increases. For example, a 10 nm HMM (2.4 T) improves the PW50 by 0.9 nm and an 18 nm HMM (2.4 T) improves the PW50 by 1.2 nm. Decreased PW50 improves linear density capabilities of the reader. - Having the HMM alloyed with a lower magnetic moment material, as in the implementations shown and described in respect to
FIGS. 3 and 5 , also improves the PW50, although not as much as a discrete layer of HMM. As can be seen inFIG. 7 , the PW50 decreases with both a discrete HMM layer or an HMM alloy layer, although the discrete HMM layer reduces PW50 more effectively. - A composite shield, either top shield or bottom shield, having a layer with a high magnetic moment greater than 1.0 T, improves PW50 while providing acceptable increase in coercivity and magnetic non-uniformity, all which enhances linear density capabilities of the reader.
- All of the read sensors described above,
readers - In reference now to
FIG. 8 , a flowchart illustrates an example method for forming a read sensor having a composite top shield with a discrete HMM layer, such as thesensor 200 ofFIG. 2 . The method involvesoperation 802 of forming a bottom shield layer on a substrate. This operation does not require forming the bottom shield directly on the substrate, as intervening materials/layers may be present between the bottom shield and substrate. A sensor stack is formed on the bottom shield inoperation 804. This operation does not require forming the sensor stack directly on the substrate, as intervening materials/layers may be present between the bottom shield and sensor stack. Inoperation 806, side shields are formed on the bottom shield around the sensor stack. A composite top shield is formed on the sensor stack inoperations 808 through 812. Inoperation 808, a layer of HMM material (i.e., having a magnetic moment of greater than 1.0 T) is formed. In this particular method, the HMM layer is formed directly on and in contact with the sensor stack. Inoperation 810, a reference layer is formed, in this particular method, on and in contact with the HMM layer. A spacer layer and then a pinned layer are formed inoperation 812 on the reference layer. - An alternate example method for forming a read sensor is illustrated in
FIG. 9 , the read sensor having a composite top shield with an alloy HMM layer, such as thesensor 300 ofFIG. 3 . The method involvesoperation 902 of forming a bottom shield layer on a substrate. This operation does not require forming the bottom shield directly on the substrate, as intervening materials/layers may be present between the bottom shield and substrate. A sensor stack is formed on the bottom shield inoperation 904. This operation does not require forming the sensor stack directly on the substrate, as intervening materials/layers may be present between the bottom shield and sensor stack. Inoperation 906, side shields are formed on the bottom shield around the sensor stack. A composite top shield is formed on the sensor stack inoperations 908 through 910. Inoperation 908, a HMM layer (i.e., having a magnetic moment of greater than 1.0 T) is formed; the HMM layer is composed of multiple magnetic materials, at least one of which has a magnetic moment greater than 1.0 T. In this particular method, the HMM layer is formed directly on and in contact with the sensor stack. Inoperation 910, a spacer layer and then a pinned layer are formed on the reference layer. - The above specification and examples provide a complete description of the structure and use of exemplary implementations of the invention. The above description provides specific implementations. It is to be understood that other implementations are contemplated and may be made without departing from the scope or spirit of the present disclosure. The above detailed description, therefore, is not to be taken in a limiting sense. While the present disclosure is not so limited, an appreciation of various aspects of the disclosure will be gained through a discussion of the examples provided.
- Unless otherwise indicated, all numbers expressing feature sizes, amounts, and physical properties are to be understood as being modified by the term “about.” Accordingly, unless indicated to the contrary, the numerical parameters set forth are approximations that can vary depending upon the desired properties sought to be obtained by those skilled in the art utilizing the teachings disclosed herein.
- As used herein, the singular forms “a”, “an”, and “the” encompass implementations having plural referents, unless the content clearly dictates otherwise. As used in this specification and the appended claims, the term “or” is generally employed in its sense including “and/or” unless the content clearly dictates otherwise.
- Spatially related terms, including but not limited to, “bottom,” “lower”, “top”, “upper”, “beneath”, “below”, “above”, “on top”, “on,” etc., if used herein, are utilized for ease of description to describe spatial relationships of an element(s) to another. Such spatially related terms encompass different orientations of the device in addition to the particular orientations depicted in the figures and described herein. For example, if a structure depicted in the figures is turned over or flipped over, portions previously described as below or beneath other elements would then be above or over those other elements.
- Since many implementations of the invention can be made without departing from the spirit and scope of the invention, the invention resides in the claims hereinafter appended. Furthermore, structural features of the different implementations may be combined in yet another implementation without departing from the recited claims.
Claims (23)
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US14/486,827 US9269381B1 (en) | 2014-09-15 | 2014-09-15 | Sensor structure having layer with high magnetic moment |
US15/018,365 US9343091B1 (en) | 2014-09-15 | 2016-02-08 | Sensor structure having layer with high magnetic moment |
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Publications (2)
Publication Number | Publication Date |
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US9269381B1 US9269381B1 (en) | 2016-02-23 |
US20160078889A1 true US20160078889A1 (en) | 2016-03-17 |
Family
ID=55314717
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US14/486,827 Active US9269381B1 (en) | 2014-09-15 | 2014-09-15 | Sensor structure having layer with high magnetic moment |
US15/018,365 Expired - Fee Related US9343091B1 (en) | 2014-09-15 | 2016-02-08 | Sensor structure having layer with high magnetic moment |
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US9269381B1 (en) * | 2014-09-15 | 2016-02-23 | Seagate Technology Llc | Sensor structure having layer with high magnetic moment |
US9454979B1 (en) * | 2014-11-14 | 2016-09-27 | Seagate Technology Llc | Sensor structure with multilayer top shield |
US9886974B2 (en) * | 2015-10-30 | 2018-02-06 | Seagate Technology Llc | Read head free layer having front and rear portions biased at different levels |
US9947347B1 (en) * | 2016-12-20 | 2018-04-17 | Western Digital Technologies, Inc. | Magnetic sensor using inverse spin hall effect |
JP6661215B2 (en) * | 2017-10-31 | 2020-03-11 | Tdk株式会社 | Position detection device and camera module |
US11676627B2 (en) * | 2021-08-06 | 2023-06-13 | Western Digital Technologies, Inc. | Magnetic recording head with stable magnetization of shields |
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US5606478A (en) | 1994-12-08 | 1997-02-25 | International Business Machines Corporation | Ni45 Fe55 metal-in-gap thin film magnetic head |
JPH10188222A (en) * | 1996-12-20 | 1998-07-21 | Read Rite S M I Kk | Combined thin-film magnetic head |
US6275360B1 (en) * | 1997-09-29 | 2001-08-14 | Hitachi, Ltd. | Read-write head |
US6163442A (en) | 1999-03-15 | 2000-12-19 | International Business Machines Corporation | High moment bilayer first pole piece layer of a write head with high magnetic stability for promoting read signal symmetry of a read head |
US6393692B1 (en) * | 1999-04-01 | 2002-05-28 | Headway Technologies, Inc. | Method of manufacture of a composite shared pole design for magnetoresistive merged heads |
US6342311B1 (en) | 1999-10-08 | 2002-01-29 | Seagate Technology, Inc. | High magnetic moment seed layer materials for writer pole tips |
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US7293344B2 (en) * | 2004-07-08 | 2007-11-13 | Headway Technologies, Inc. | Process of making CD uniformity in high track density recording head |
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US8462467B2 (en) * | 2010-10-08 | 2013-06-11 | Tdk Corporation | Thin film magnetic head including soft layer magnetically connected with shield |
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US8630069B1 (en) * | 2012-10-04 | 2014-01-14 | HGST Netherlands B.V. | Magnetic shield having improved resistance to the hard bias magnetic field |
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US20140254047A1 (en) | 2013-03-08 | 2014-09-11 | Seagate Technology Llc | Reader with decoupled magnetic seed layer |
US20140268417A1 (en) * | 2013-03-16 | 2014-09-18 | Seagate Technology Llc | Bottom shield stabilized magnetic seed layer |
US8988832B2 (en) * | 2013-07-30 | 2015-03-24 | Seagate Technology Llc | Magnetoresistive sensor shield |
US9087525B2 (en) | 2013-10-30 | 2015-07-21 | Seagate Technology Llc | Layered synthetic anti-ferromagnetic upper shield |
US9053720B1 (en) * | 2014-01-10 | 2015-06-09 | Headway Technologies, Inc. | High moment wrap shields for magnetic read head to improve micro-magnetic read width |
US9269381B1 (en) * | 2014-09-15 | 2016-02-23 | Seagate Technology Llc | Sensor structure having layer with high magnetic moment |
-
2014
- 2014-09-15 US US14/486,827 patent/US9269381B1/en active Active
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2016
- 2016-02-08 US US15/018,365 patent/US9343091B1/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
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US9343091B1 (en) | 2016-05-17 |
US9269381B1 (en) | 2016-02-23 |
US20160155458A1 (en) | 2016-06-02 |
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