US20140374809A1 - Pads including curved sides and related electronic devices, structures, and methods - Google Patents
Pads including curved sides and related electronic devices, structures, and methods Download PDFInfo
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- US20140374809A1 US20140374809A1 US14/105,581 US201314105581A US2014374809A1 US 20140374809 A1 US20140374809 A1 US 20140374809A1 US 201314105581 A US201314105581 A US 201314105581A US 2014374809 A1 US2014374809 A1 US 2014374809A1
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- pads
- layer
- sides
- columns
- pattern
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Images
Classifications
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- H01L27/10805—
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/01—Manufacture or treatment
- H10B12/02—Manufacture or treatment for one transistor one-capacitor [1T-1C] memory cells
- H10B12/03—Making the capacitor or connections thereto
- H10B12/033—Making the capacitor or connections thereto the capacitor extending over the transistor
- H10B12/0335—Making a connection between the transistor and the capacitor, e.g. plug
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
- H01L21/0334—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
- H01L21/0337—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31144—Etching the insulating layers by chemical or physical means using masks
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/3213—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
- H01L21/32139—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer using masks
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76895—Local interconnects; Local pads, as exemplified by patent document EP0896365
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76897—Formation of self-aligned vias or contact plugs, i.e. involving a lithographically uncritical step
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/528—Geometry or layout of the interconnection structure
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/01—Manufacture or treatment
- H10B12/02—Manufacture or treatment for one transistor one-capacitor [1T-1C] memory cells
- H10B12/03—Making the capacitor or connections thereto
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/01—Manufacture or treatment
- H10B12/09—Manufacture or treatment with simultaneous manufacture of the peripheral circuit region and memory cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
- H10B12/48—Data lines or contacts therefor
- H10B12/482—Bit lines
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/50—Peripheral circuit region structures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B99/00—Subject matter not provided for in other groups of this subclass
Definitions
- a self-align patterning method for forming patterns may include forming a first layer on a substrate, and forming a plurality of first hard mask patterns on the first layer.
- a sacrificial layer is formed on top surfaces and sidewalls of the first hard mask patterns, thereby forming a gap between respective facing portions of the sacrificial layer on the sidewalls of the first hard mask patterns.
- a second hard mask pattern is formed in the gap, the sacrificial layer is etched using the second hard mask pattern as a mask to expose the first hard mask patterns, the first layer is exposed using the exposed first hard mask patterns and the second hard mask pattern. The exposed first layer is then etched using the first and second hard mask patterns.
- a method of forming an electronic device may include providing a pad layer on a substrate, and forming a plurality of spaced apart first masks on the pad layer.
- Each of the first masks may define a non-linear pattern extending along a respective axis in a first direction.
- a plurality of spaced apart second masks may be formed on the pad layer extending in a second direction different than the first direction, wherein each of the second masks crosses each of the first masks.
- the pad layer may be patterned using the plurality of spaced apart first masks and the plurality of spaced apart second masks to form a plurality of spaced apart pads on the substrate.
- Forming the plurality of spaced apart first masks may precede forming the plurality of spaced apart second masks.
- patterning the pad layer may include patterning the plurality of spaced apart first masks using the plurality of spaced apart second masks, removing the plurality of spaced apart second masks to provide a plurality of pad masks after patterning the plurality of spaced apart first masks, patterning the pad layer using the plurality of pad masks to form the plurality of spaced apart pads, and removing the pad masks after patterning the pad layer.
- Forming the plurality of spaced apart second masks may precede forming the plurality of spaced apart first masks.
- patterning the pad layer may include patterning the plurality of spaced apart second masks using the plurality of spaced apart first masks, removing the plurality of spaced apart first masks to provide a plurality of pad masks after patterning the plurality of spaced apart second masks, patterning the pad layer using the plurality of pad masks to form the plurality of spaced apart pads, and removing the pad masks after patterning the pad layer.
- Each of the second masks may cross the plurality of spaced apart first masks linearly.
- Each of the second masks may have a non-linear pattern crossing the plurality of spaced apart first masks.
- the non-linear pattern may be a periodic pattern extending along the respective axis in the first direction.
- Each of the second masks may cross each of the first masks at a respective maximum deviation of the first mask from the respective axis.
- Forming the plurality of spaced apart first masks may include forming a first plurality of spaced apart patterns, and forming a second plurality of spaced apart patterns that are self-aligned with the first plurality of spaced apart patterns.
- the substrate may include a plurality of memory cell transistors, and each of the plurality of spaced apart pads may be electrically coupled to a source/drain region of a respective one of the memory cell transistors. After forming the plurality of pads, a plurality of memory cell capacitors may be formed, wherein each of the memory cell capacitors is electrically coupled to a respective one of the pads.
- the second direction may be perpendicular with respect to the first direction.
- a method of forming an electronic device may include providing a pad layer on a substrate, and forming a plurality of spaced apart first masks on the pad layer extending in a first direction.
- Forming the plurality of spaced apart first masks may include forming a first plurality of spaced apart patterns, and forming a second plurality of spaced apart patterns that are self-aligned with the first plurality of spaced apart patterns.
- a plurality of spaced apart second masks may be formed on the pad layer extending in a second direction different than the first direction, and each of the second masks may cross each of the first masks.
- the pad layer may be patterned using the plurality of spaced apart first masks and the plurality of spaced apart second masks to form a plurality of spaced apart pads on the substrate.
- Each of the first masks may define a non-linear pattern extending along a respective axis in the first direction
- each of the second masks may define a linear pattern extending along a respective axis in the second direction.
- Each of the first masks may define a linear pattern extending along a respective axis in the first direction
- each of the second masks may define a non-linear pattern extending along a respective axis in the second direction.
- Each of the first masks may define a linear pattern extending along a respective axis in the first direction
- each of the second masks may define a linear pattern extending along a respective axis in the second direction.
- Each of the first masks may define a non-linear pattern extending along a respective axis in the first direction
- each of the second masks may define a non-linear pattern extending along a respective axis in the second direction.
- Forming the plurality of spaced apart first masks may precede forming the plurality of spaced apart second masks.
- patterning the pad layer may include patterning the plurality of spaced apart first masks using the plurality of spaced apart second masks, removing the plurality of spaced apart second masks to provide a plurality of pad masks after patterning the plurality of spaced apart first masks, patterning the pad layer using the plurality of pad masks to form the plurality of spaced apart pads, and removing the pad masks after patterning the pad layer.
- Forming the plurality of spaced apart second masks may precede forming the plurality of spaced apart first masks.
- patterning the pad layer may include patterning the plurality of spaced apart second masks using the plurality of spaced apart first masks, removing the plurality of spaced apart first masks to provide a plurality of pad masks after patterning the plurality of spaced apart second masks, patterning the pad layer using the plurality of pad masks to form the plurality of spaced apart pads, and removing the pad masks after patterning the pad layer.
- the substrate may include a plurality of memory cell transistors, and each of the plurality of spaced apart pads may be electrically coupled to a source/drain region of a respective one of the memory cell transistors. After forming the plurality of pads, a plurality of memory cell capacitors may be formed wherein each of the memory cell capacitors is electrically coupled to a respective one of the pads.
- the second direction may be perpendicular with respect to the first direction.
- Forming the plurality of spaced apart second masks may include forming a third plurality of spaced apart patterns, and forming a fourth plurality of spaced apart patterns that are self-aligned with the third plurality of spaced apart patterns.
- an electronic device may include a substrate, and a plurality of spaced apart pads on the substrate.
- Each of the pads may include first, second, third, and fourth sides.
- the first and third sides may be opposite sides that are substantially straight, and the second and fourth sides may be opposite sides that are curved.
- the plurality of pads may be arranged in linear columns in a direction that is parallel with the first and third sides, and a center line connecting centers of adjacent pads of different columns may define an angle of at least 60 degrees and less than 90 degrees relative to the direction that is parallel with the first and third sides.
- One of the second and fourth sides may be concave, and the other of the second and fourth sides may be convex.
- the plurality of pads may be arranged in linear columns, wherein pads of a first column may be arranged with the convex sides pointing in a first direction parallel to a direction of the columns, wherein pads of a second column may be arranged with the convex sides pointing in a second direction parallel to the direction of the columns, and wherein the first and second directions may be opposite directions.
- the substrate may include a plurality of memory cell transistors, and each of the spaced apart pads may be electrically coupled to a source/drain region of a respective one of the memory cell transistors.
- each of a plurality of memory cell capacitors may be electrically coupled to a respective one of the pads.
- an electronic device may include a substrate, and a plurality of spaced apart pads on the substrate.
- Each of the pads may include first and second opposing sides wherein the first side is concave and the second side is convex.
- Each of the pads may include third and fourth opposing sides extending between the first and second sides, and the third and fourth sides may be opposite sides that are substantially straight.
- the plurality of pads may be arranged in linear columns in a direction that is parallel with the first and third sides, and a center line connecting centers of adjacent pads of different columns may define an angle of at least 60 degrees and less than 90 degrees relative to the direction that is parallel with the first and third sides.
- the plurality of pads may be arranged in linear columns. Pads of a first column may be arranged with the convex sides pointing in a first direction parallel to a direction of the columns, pads of a second column may be arranged with the convex sides pointing in a second direction parallel to the direction of the columns, and the first and second directions may be opposite directions.
- the substrate may include a plurality of memory cell transistors, and each of the spaced apart pads may be electrically coupled to a source/drain region of a respective one of the memory cell transistors.
- each of a plurality of memory cell capacitors may be electrically coupled to a respective one of the pads.
- an electronic device may include a substrate, and a plurality of spaced apart pads on the substrate.
- the plurality of pads may be arranged in linear columns, and a center line connecting centers of adjacent pads of different columns may define an angle of at least 60 degrees and less than 90 degrees relative to a direction of the columns.
- Each of the pads may include first, second, third, and fourth sides, the first and third sides may be opposite sides that are substantially straight, and the second and fourth sides may be opposite sides that are curved. Moreover, one of the second and fourth sides may be concave and the other of the second and fourth sides may be convex. Pads of a first column are arranged with the convex sides pointing in a first direction parallel to the direction of the columns, pads of a second column may be arranged with the convex sides pointing in a second direction parallel to the direction of the columns, and the first and second directions may be opposite directions.
- the substrate may include a plurality of memory cell transistors, and each of the spaced apart pads may be electrically coupled to a source/drain region of a respective one of the memory cell transistors. Moreover, each of a plurality of memory cell capacitors may be electrically coupled to a respective one of the pads.
- a dynamic random access memory device may include a substrate having a plurality of memory cell transistors. Each of a plurality of spaced apart pads on the substrate may be electrically coupled to a source/drain region of a respective one of the memory cell transistors.
- the plurality of pads may be arranged in linear columns, and a center line connecting centers of adjacent pads of different columns may define an angle of at least 60 degrees and less than 90 degrees relative to a direction of the columns.
- Each of a plurality of memory cell capacitors may be electrically coupled to a respective one of the pads.
- Each of the pads may include first, second, third, and fourth sides, the first and third sides may be opposite sides that are substantially straight, and the second and fourth sides may be opposite sides that are curved.
- One of the second and fourth sides may be concave, and the other of the second and fourth sides may be convex.
- Pads of a first column may be arranged with the convex sides pointing in a first direction parallel to the direction of the columns, pads of a second column may be arranged with the convex sides pointing in a second direction parallel to the direction of the columns, and the first and second directions may be opposite directions.
- FIGS. 1-49 represent non-limiting, example embodiments as described herein.
- FIGS. 1 , 4 , 8 , 13 , 16 , 18 , 21 and 24 are plan views illustrating stages of forming pads in accordance with example embodiments
- FIGS. 2-3 , 5 - 7 , 9 - 12 , 14 - 15 , 17 , 19 - 20 and 22 - 23 are related cross-sectional views illustrating stages of forming the pads in accordance with example embodiments;
- FIG. 25 is a plan view illustrating a pad array in accordance with example embodiments.
- FIG. 26 is a plan view illustrating a pad array in accordance with example embodiments.
- FIG. 27 is a plan view illustrating a pad array in accordance with example embodiments.
- FIGS. 28 , 30 , 32 , 34 , 36 , 38 , 40 , 43 and 44 are related plan views illustrating stages of a method of manufacturing a semiconductor device in accordance with example embodiments
- FIGS. 29 , 31 , 33 , 35 , 37 , 39 , 41 , 42 , 45 and 46 are cross-sectional views illustrating stages of a method of manufacturing the semiconductor device in accordance with example embodiments;
- FIG. 47 is a plan view illustrating the locations of second contact plugs, landing pads and lower electrodes in the semiconductor device of FIG. 46 ;
- FIG. 48 is a plan view illustrating locations of second contact plugs, landing pads and lower electrodes in the semiconductor device in accordance with other example embodiments.
- FIG. 49 is a cross-sectional view of the semiconductor device in FIG. 48 .
- Example embodiments will now be described more fully with reference to the accompanying drawings, in which example embodiments are shown. Example embodiments may, however, be embodied in many different forms and should not be construed as limited to the example embodiments set forth herein.
- the thicknesses of layers and regions are exaggerated for clarity.
- Like reference numerals in the drawings denote like elements, and thus their repeated description may be omitted and/or abbreviated.
- first, second, third, etc. may be used herein to describe various elements, components, regions, layers and/or sections, these elements, components, regions, layers and/or sections should not be limited by these terms. Unless indicated otherwise, these terms are only used to distinguish one element, component, region, layer or section from another region, layer or section. Thus, a first element, component, region, layer or section discussed below could be termed a second element, component, region, layer or section without departing from the teachings of the example embodiments.
- spatially relative terms such as “beneath,” “below,” “lower,” “above,” “upper” and the like, may be used herein for ease of description to describe one element or feature's relationship to another element(s) or feature(s) as illustrated in the figures. It will be understood that the spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. For example, if the device in the figures is turned over, elements described as “below” or “beneath” other elements or features would then be oriented “above” the other elements or features. Thus, the exemplary term “below” can encompass both an orientation of above and below. The device may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.
- Example embodiments are described herein with reference to cross-sectional illustrations that are schematic illustrations of idealized example embodiments (and intermediate structures). As such, variations from the shapes of the illustrations as a result, for example, of manufacturing techniques and/or tolerances, are to be expected. Thus, example embodiments should not be construed as limited to the particular shapes of regions illustrated herein but are to include deviations in shapes that result, for example, from manufacturing. For example, an implanted region illustrated as a rectangle will, typically, have rounded or curved features and/or a gradient of implant concentration at its edges rather than a binary change from implanted to non-implanted region.
- a buried region formed by implantation may result in some implantation in the region between the buried region and the surface through which the implantation takes place.
- the regions illustrated in the figures are schematic in nature and their shapes are not intended to limit the scope of the present disclosure.
- FIGS. 1 , 4 , 8 , 13 , 16 , 18 , 21 and 24 are plan views illustrating stages of forming pads in accordance with example embodiments
- FIGS. 2-3 , 5 - 7 , 9 - 12 , 14 - 15 , 17 , 19 - 20 and 22 - 23 are related cross-sectional views illustrating stages of forming the pads in accordance with example embodiments.
- Each of the cross-sectional views includes cross-sections of the corresponding plan view cut along lines A-A′, B-B′, C-C′, D-D′, E-E′ and F-F′, respectively.
- the lines A-A′, B-B′ and C-C′ extend in a second direction substantially parallel to a top surface of an etching object layer
- the lines D-D′, E-E′ and F-F′ extend in a first direction substantially parallel to the top surface of the etching object layer and substantially perpendicular to the second direction.
- the method of forming the pads may be performed together with a method of forming wirings. That is, the pads may be formed in a first region I according to the method of forming the pads, and simultaneously the wirings may be formed in a second region II according to the method of forming the wirings. Thus, a portion of each cross-sectional view labeled II also illustrates a cross-section of the second region II cut along the second direction (not shown in FIG. 1 or in any of the other plan views).
- a first layer 110 , a second layer 120 , a first mask layer 130 , a third layer 140 and a fourth layer 150 may be sequentially formed on an etching object layer 100 (also referred to as a pad layer), and first and third photoresist patterns 160 and 165 may be formed on the fourth layer 150 in the first and second regions I and II, respectively.
- the etching object layer 100 may include various types of layers that may be patterned to be transformed into patterns, e.g., pads, wirings, masks, etc. Thus, the etching object layer 100 may be referred to as a pad layer, a wiring layer, a mask layer, etc., in accordance with the desired patterns.
- the etching object layer 100 may include a conductive material or an insulating material. Examples of the conductive material may include a metal, (e.g., tungsten, titanium, tantalum, etc.), a metal nitride, a metal silicide, a doped polysilicon, etc., and examples of the insulating material may include silicon nitride, silicon oxide, silicide oxynitride, etc.
- the first layer 110 may be an amorphous carbon layer (ACL)
- the second and fourth layers 120 and 150 may include an oxynitride, e.g., plasma enhanced silicon oxynitride (PE-SION)
- the first mask layer 130 may include an oxide, e.g., atomic layer deposition oxide (ALD-OX)
- the third layer 140 may include spin-on-hardmask
- the first photoresist pattern 160 may extend in the first direction, and a plurality of first photoresist patterns 160 may be formed in the second direction.
- Each of the first photoresist patterns 160 may extend in a non-linear pattern (also referred to as a waveform) along an axis in the first direction. That is, each first photoresist pattern 160 may not extend in a straight line in the first direction but may fluctuate right and left as it extends along an axis in the first direction, and thus may have an amplitude along the second direction.
- the third photoresist pattern 165 may entirely cover the second region II.
- An anti-reflective coating (ARC) layer (not shown) may be further formed between the fourth layer 150 and the first photoresist pattern 160 and/or between the fourth layer 150 and the third photoresist pattern 165 .
- the fourth and third layers 150 and 140 may be sequentially etched using the first photoresist pattern 160 as an etching mask to form fourth and third layer patterns 152 and 142 , respectively, and a top surface of the first mask layer 130 may be exposed.
- a plurality of third layer patterns 142 and a plurality of fourth layer patterns 152 may be formed in the second direction.
- one of the third layer patterns 142 and one of the fourth layer patterns 152 thereon may be referred to simply as a first pattern 142 and 152 .
- Each first pattern 142 and 152 may extend in a waveform along the first direction, and a plurality of first patterns 142 and 152 may be formed in the second direction.
- the third photoresist pattern 165 entirely covers the fourth layer 150 , and thus the fourth layer 150 may not be etched in the second region II.
- the first and third photoresist patterns 160 and 165 may be removed.
- the first and third photoresist patterns 160 and 165 may be removed using an ashing process and/or a stripping process.
- a second mask layer 170 may be formed on the plurality of first patterns 142 and 152 and the exposed top surface of the first mask layer 130 in the first region I, and on the fourth layer 150 in the second region II.
- a second pattern 180 may be formed on a portion of the second mask layer 170 between the plurality of first patterns 142 and 152 .
- the second mask layer 170 may be conformally formed on sidewalls and top surfaces of the first patterns 142 and 152 , on the exposed top surface of the first mask layer 130 , and on the fourth layer 150 .
- the second mask layer 170 may be formed to include a material substantially the same as that of the first mask layer 130 , e.g., ALD-OX.
- ALD-OX a material substantially the same as that of the first mask layer 130
- the first and second mask layers 130 and 170 in the first region I may be merged into a layer, and the merged layer will be shown as a single layer in figures after FIG. 5 .
- the second pattern 180 may be formed by forming a filling layer on the second mask layer 170 to sufficiently fill a space between the plurality of first patterns 142 and 152 and planarizing an upper portion of the filling layer.
- the filling layer may be formed to include a material substantially the same as that of the third layer 140 , and thus may include, e.g., SOH (spin-on-hardmask).
- the planarization process may be performed by an etch back process and/or a chemical mechanical polishing (CMP) process.
- the second pattern 180 may have a top surface substantially coplanar with or lower than an uppermost portion of the top surface of the second mask layer 170 .
- the second mask layer 170 may be conformally formed on the sidewalls and the top surfaces of the first patterns 142 and 152 , the exposed top surface of the first mask layer 130 and the fourth layer 150 , and thus the second pattern 180 formed on the portion of the second mask layer 170 between the plurality of first patterns 142 and 152 in the first region I may have a shape substantially the same as or similar to that of each first pattern 142 and 152 .
- the second pattern 180 may be formed to have a width along the second direction substantially the same as that of each first pattern 142 and 152 along the second direction.
- the merged first and second mask layers 130 and 170 in the first region I and the second mask layer 170 in the second region II may be etched using the first patterns 142 and 152 and the second patterns 180 as an etching mask to form first masks 172 in the first region I and to remove the second mask layer 170 from the second region II.
- the fourth layer pattern 152 of the first pattern 142 and 152 may be removed from the first region I, and the fourth layer 150 may be removed from the second region II.
- first regions I a plurality of first structures each of which may include the first mask 172 and the third layer pattern 142 sequentially stacked on the second layer 120
- second structures each of which may include the first mask 172 and the second pattern 180 sequentially stacked on the second layer 120
- Each of the first structures and each of the second structures may extend in a non-linear pattern (also referred to as a waveform) along an axis in the first direction.
- the first mask layer 130 and the third layer 140 that are sequentially stacked on the second layer 120 may remain.
- the third layer patterns 142 and the second patterns 180 may be removed from the first region I to expose the first masks 172 , and the third layer 140 may be removed from the second region II to expose the first mask layer 130 .
- Each of the exposed first masks 172 in the first region I may extend in a non-linear pattern (also referred to as a waveform) along the first direction, and the exposed first mask layer 130 in the second region II may entirely cover the second layer 120 .
- the third layer patterns 142 , the second patterns 180 , and the third layer 140 may be removed using an ashing process and/or a stripping process.
- a first planarization layer 200 may be formed on the second layer 120 to sufficiently cover the first masks 172 , and in the second region II, the first planarization layer 200 may be formed on the first mask layer 130 .
- a fifth layer 210 , a third mask layer 220 , a sixth layer 230 and a seventh layer 240 may be sequentially formed on the first planarization layer 130 both in the first and second regions I and II.
- Second and fourth photoresist patterns 250 and 255 may be formed on the seventh layer 240 in the first and second regions I and II, respectively.
- the first planarization layer 200 may be formed to include a material substantially the same as that of the third layer 140 , and thus may include, e.g., SOH.
- the fifth and seventh layers 210 and 240 may be formed to include a material substantially the same as that of the second and fourth layers 120 and 150 , and thus may include an oxynitride, e.g., PE-SiON.
- the third mask layer 220 may be formed to include a material substantially the same as that of the first and second mask layers 130 and 170 , and thus may include an oxide, e.g., ALD-OX.
- the sixth layer 230 may be formed to include a material substantially the same as that of the third layer 140 and the first planarization layer 200 , and thus may include, e.g., SOH.
- the second photoresist pattern 250 may extend in the second direction, and a plurality of second photoresist patterns 250 may be formed in the first direction.
- Each of the second photoresist patterns 250 may extend in a straight line in the second direction.
- the second photoresist patterns 250 may be spaced apart from each other in the first direction at a distance of about 2 times to about 4 times of a width of each second photoresist pattern 250 in the first direction.
- the fourth photoresist pattern 255 may have various shapes according to the desired shape of the wirings, and e.g., may extend in the first direction.
- An ARC layer (not shown) may be further formed between the seventh layer 240 and the second photoresist pattern 250 and/or between the seventh layer 240 and the fourth photoresist pattern 255 .
- the seventh and sixth layers 240 and 230 may be sequentially etched using the second photoresist pattern 250 as an etching mask to form seventh and sixth layer patterns 242 and 232 , respectively, and a top surface of the third mask layer 220 may be exposed.
- a plurality of sixth layer patterns 232 and a plurality of seventh layer patterns 242 may be formed in the first direction.
- one of the sixth layer patterns 232 and one of the seventh layer patterns 242 thereon may be referred to simply as a third pattern 232 and 242 .
- Each third pattern 232 and 242 like the second photoresist pattern 250 , may extend in a straight line in the second direction, and a plurality of third patterns 232 and 242 may be formed in the first direction.
- the seventh and sixth layers 240 and 230 may be sequentially etched using the fourth photoresist pattern 255 as an etching mask to form ninth and eighth layer patterns 243 and 233 , respectively, and a top surface of the third mask layer 220 may be exposed.
- the eighth and ninth layer patterns 233 and 243 may be referred to simply as a fifth pattern 233 and 243 .
- the second and fourth photoresist patterns 250 and 255 may be removed.
- FIG. 11 a process substantially the same as or similar to that illustrated with reference to FIGS. 4 and 5 may be performed.
- a fourth mask layer 260 may be formed on the plurality of third patterns 232 and 242 and the exposed top surface of the third mask layer 220 , and a fourth pattern 270 may be formed on a portion of the fourth mask layer 260 between the plurality of third patterns 232 and 242 .
- the fourth mask layer 260 may be formed on the plurality of fifth patterns 233 and 243 and the exposed top surface of the third mask layer 220 , and the fourth pattern 270 may be formed on a portion of the fourth mask layer 260 between the plurality of fifth patterns 233 and 243 .
- the fourth mask layer 260 may be conformally formed on sidewalls and top surfaces of the third patterns 232 and 242 , sidewalk and top surfaces of the fifth patterns 233 and 243 , and the exposed top surface of the third mask layer 220 .
- the fourth mask layer 260 may be formed to include a material substantially the same as that of the third mask layer 220 , e.g., ALD-OX.
- the third and fourth mask layers 220 and 260 may be merged into a layer, and the merged layer will be shown as a single layer in figures after FIG. 12 .
- the fourth pattern 270 may be formed to include a material substantially the same as that of the sixth and eighth layer patterns 232 and 233 , and thus may include, e.g., SOH.
- the fourth pattern 270 may have a top surface substantially coplanar with or lower than an uppermost portion of the top surface of the fourth mask layer 260 .
- the fourth pattern 270 may have a shape substantially the same as or similar to that of each third pattern 232 and 242 in the first region I, and may have a shape substantially the same as or similar to that of each fifth pattern 233 and 243 in the second region II.
- the fourth pattern 270 may be formed to have a width along the first direction substantially the same as that of each third pattern 232 and 242 along the first direction in the first region I.
- a portion of the fourth pattern 270 formed in the second region II may be removed.
- an ashing process and/or a stripping process may be performed to remove the portion of the fourth pattern 270 in the second region II.
- the merged third and fourth mask layers 220 and 260 may be etched using the third patterns 232 and 242 and the fourth patterns 270 as an etching mask to form second masks 262 .
- the seventh layer pattern 242 of the third pattern 232 and 242 may be removed from the first region I.
- the merged third and fourth mask layers 220 and 260 may be etched using the fifth patterns 233 and 243 as an etching mask to form fourth masks 263 .
- the ninth layer pattern 243 of the fifth pattern 233 and 243 may be removed from the second region II.
- a plurality of third structures (each of which may include the second mask 262 and the sixth layer pattern 232 sequentially stacked on the fifth layer 210 ), and a plurality of fourth structures (each of which may include the second mask 262 and the fourth pattern 270 sequentially stacked on the fifth layer 210 ) may be formed.
- Each of the third structures and each of the fourth structures like the third pattern 232 and 242 and the fourth pattern 270 , may extend in a straight line in the second direction.
- a plurality of fifth structures (each of which may include the fourth mask 263 and the eighth layer pattern 233 sequentially stacked on the fifth layer 210 ) may be formed.
- Each of the fifth structures may have a shape substantially the same as that of each fifth pattern 233 and 243 .
- the sixth layer patterns 232 and the fourth patterns 270 may be removed from the first region I to expose the second masks 262
- the eighth layer patterns 233 may be removed from the second region II to expose the fourth masks 263 .
- Each of the exposed second masks 262 may extend in a straight line in the second direction.
- the fifth layer 210 and the first planarization layer 200 may be etched using the second masks 262 in the first region I and the fourth masks 263 in the second region II as an etching mask to form a fifth layer pattern 212 and a first planarization layer pattern 202 in the first region I and a tenth layer pattern 213 and a second planarization layer pattern 203 in the second region II.
- portions of the first masks 172 and the second layer 120 may be exposed in the first region I, and a portion of the first mask layer 130 may be exposed in the second region II.
- the second masks 262 and the exposed portion of the first masks 172 may be removed to form a plurality of third masks 174 . That is, as the exposed portion of the first masks 172 is removed, each first mask 172 extending in the first direction may be divided into the plurality of third masks 174 . Accordingly, the third masks 174 may be formed both in the first and second directions. In the etching process, the fifth layer pattern 212 may also be removed.
- the fourth masks 263 and the exposed portion of the first mask layer 130 may be removed to form a plurality of fifth masks 133 .
- the tenth layer pattern 213 may be also removed.
- a second planarization layer 280 may be formed on the second layer 120 to sufficiently cover the first and second planarization layer patterns 202 and 203 and the third and fifth masks 174 and 133 , and an upper portion of the second planarization layer 280 may be planarized.
- the second planarization layer 280 may be formed to include a material substantially the same as that of the first and second planarization layer patterns 202 and 203 , e.g., SOH.
- the first and second planarization layer patterns 202 and 203 may be merged into the second planarization layer 280 , and only the merged second planarization layer 280 is shown in FIG. 20 .
- An eleventh layer 290 may be formed on the second planarization layer 280 , and a fifth photoresist pattern 295 may be formed thereon in the second region II.
- the eleventh layer 290 may be formed to include an oxynitride, e.g., PE-SiON.
- the fifth photoresist pattern 295 may overlap a portion of the sixth mask 133 when viewed from a top side, i.e., the fifth photoresist pattern 295 may vertically overlap the portion of the sixth mask 133 .
- the eleventh layer 290 and the second planarization layer 280 may be patterned using the fifth photoresist pattern 295 as an etching mask so that the third masks 174 and a portion of the second layer 120 may be exposed in the first region I and an eleventh layer pattern 293 and a third planarization layer pattern 283 may be formed in the second region II. Additionally, the sixth masks 133 and a portion of the second layer 120 may be exposed, however, the portion of the sixth mask 133 overlapped with the fifth photoresist pattern 295 may not be exposed but covered by the third planarization layer pattern 283 .
- the second layer 120 and the first layer 110 may be patterned using the third masks 174 , the sixth masks 133 , and the third planarization layer pattern 283 as an etching mask so that a second layer pattern 122 and a first layer pattern 112 may be formed and a portion of the etching object layer 100 may be exposed in the first region I, and a thirteenth layer pattern 123 and a twelfth layer pattern 113 may be formed and a portion of the etching object layer 100 may be exposed in the second region II.
- the third masks 174 and the second layer pattern 122 in the first region I, and the sixth masks 133 , the third planarization layer pattern 283 , and the thirteenth layer pattern 123 in the second region II may be removed.
- the exposed portion of the etching object layer 100 in the first region I may be etched using the first layer pattern 112 as an etching mask to form a plurality of pads 102
- the exposed portion of the etching object layer 100 in the second region II may be etched using the twelfth layer pattern 113 as an etching mask to form a plurality of wirings (not shown).
- the pads 102 may be formed by a double patterning technology (DPT) process using the first photoresist pattern 160 extending in a non-linear pattern (also referred to as a waveform) along an axis in the first direction, and by a DPT process using the second photoresist pattern 250 extending in a straight line in the second direction. That is, when the pads 102 and the wirings are not simultaneously formed but only the pads 102 are formed in the first region I, the pads 102 may be formed by performing a DPT process only twice.
- DPT double patterning technology
- portions of the etching object layer 100 that are commonly covered by the first mask structure including the first photoresist patterns 160 and the second pattern 180 , and the second mask structure including the second photoresist patterns 250 and the fourth pattern 270 may remain to be transformed into the pads 102 .
- An array of the pads 102 i.e., a pad array
- FIG. 25 An array of the pads 102 (i.e., a pad array) will be discussed in greater detail below with reference to FIG. 25 .
- the pads 102 and the wirings may be formed by performing an etching process three times, which may include performing a DPT process twice.
- the wirings are formed in the second region II, not only a portion of the etching object layer 100 commonly covered by the fifth photoresist pattern 295 and the sixth mask 133 but also a portion thereof covered only by one of the fifth photoresist pattern 295 and the sixth mask 133 may remain, so that a portion of the etching object layer 100 covered by any one of the fifth photoresist pattern 295 and the sixth mask 133 may be transformed into the wirings.
- the wirings may thus be formed by other methods that are different from the above method. For example, after forming a preliminary mask using a photoresist pattern having a size large enough to cover several adjacent patterns of a desired wiring, the preliminary mask may be divided into a plurality of masks using a photoresist pattern covering only a portion of the preliminary mask as an etching mask, and finally the etching object layer 100 may be patterned using the mask as an etching mask to form the desired wiring.
- the method of forming the pads 102 and the wirings may be used to manufacture a semiconductor device including a cell region and a peripheral circuit region. That is, the method of forming the pads 102 in the first region I may be used (e.g., to form capacitor landing pads in the cell region), and the method of forming the wirings in the second region II may be used, (e.g., to form bit lines in the peripheral circuit region).
- FIG. 25 is a plan view illustrating a pad array in accordance with example embodiments.
- the pad array may include a first pad column 11 and a second pad column 13 .
- a plurality of first pad columns 11 may be formed in the first direction, and also a plurality of second pad columns 13 may be formed in the first direction.
- the first and second pad columns 11 and 13 may be arranged alternately and repeatedly in the first direction. That is, the pad array may have a structure in which a first pad column 11 , a second pad column 13 , a first pad column 11 , and a second pad column 13 are arranged in this order.
- each second pad column 13 may be interposed between the adjacent first pad columns 11 .
- adjacent first and second pad columns 11 and 13 may be disposed at a given distance from each other in the first direction.
- Each first pad column 11 may have a plurality of first pads 12 disposed in the second direction substantially perpendicular to the first direction, and each second pad column 13 may have a plurality of second pads 14 disposed in the second direction.
- the first pads 12 may be disposed at a given distance from each other in the second direction
- the second pads 14 may be disposed at a given distant from each other in the second direction.
- Each first pad 12 may have four sides, and first and second sides a1 and a2 of the four sides that are opposite to each other may be substantially straight lines, each of which may be parallel to the second direction.
- the other two opposite sides of the four sides i.e., third and fourth sides b1 and b2
- the third side b1 of each first pad 12 may include two straight lines, which may form a first angle ⁇ therebetween
- the fourth side b2 of each first pad 12 may include two straight lines that are parallel to the respective two lines of the third side b1.
- the first angle ⁇ may be an obtuse angle.
- First and second pads 12 and 14 adjacent to each other in the first direction may form point symmetry with respect to a point located therebetween.
- each second pad 14 may also have four sides, and first and second sides c1 and c2 of the four sides that are opposite to each other may be substantially straight lines each of which may be parallel to the second direction.
- the other two opposite sides of the four sides i.e., third and fourth sides d1 and d2
- third and fourth sides d1 and d2 may be curved (with side d2 being concave and with side d1 being convex) in the second direction.
- each second pad 14 may include two straight lines, which may form a second angle ⁇ therebetween, and the fourth side d2 of each second pad 14 may include two straight lines that are parallel to the respective two lines of the third side d1.
- the second angle ⁇ may be an obtuse angle, which may be substantially the same as the first angle ⁇ .
- the first and second pads 12 and 14 may be arranged in a pattern or waveform along an axis in the first direction. That is, the first and second pads 12 and 14 may be disposed in a zigzag fashion along the first direction.
- An imaginary central line (CL) connecting centers of the first and second pads 12 and 14 adjacent to each other in the first direction may form an acute angle with the first direction or may be parallel with the first direction.
- the counterclockwise direction may be considered as a positive angular direction. If a portion of the central line CL connecting a center of the first pad 12 to a center of the second pad 14 in this order forms a third angle A with the first direction, the third angle A may be a positive value. Additionally, if a portion of the central line CL connecting a center of the second pad 14 to a center of the first pad 12 in this order may form a fourth angle B with the first direction, the fourth angle B may be a negative value.
- the third angle A or the fourth angle B may be in a range of about 0 to about 90 degrees.
- the third and fourth angles A and B may be in a range of about 0 to about 30 degrees.
- the centers of the first and second pads 12 and 14 may form a honeycomb structure, that is, the centers of the first and second pads 12 and 14 may be disposed at vertices and centers of hexagons.
- the first and second pads 12 and 14 may be arranged not only in a honeycomb structure but also in other structures.
- FIG. 26 is a plan view illustrating a pad array in accordance with example embodiments.
- the pad array may include a plurality of third pads 20 arranged both in the first and second directions substantially perpendicular to each other.
- each third pad 20 may have first and second sides e1 and e2 substantially parallel to the second direction, and third and fourth sides f1 and f2 substantially parallel to the first direction. That is, unlike the first and second pads 12 and 14 , the third and fourth sides f1 and f2 of each third pad 20 may be neither concave nor convex but flat/straight in the second direction, and thus each third pad 20 may have a rectangular shape.
- the pad array may be formed using a sixth photoresist pattern (not shown) extending in a straight line along the first direction that is different from the first photoresist pattern 160 extending in a pattern/waveform along the first direction in FIG. 1 .
- the first mask structure includes the first photoresist patterns 160 extending in a non-linear pattern (also referred to as a waveform) along an axis in the first direction and the second pattern 180 between the first photoresist patterns 160 formed by a DPT process
- the second mask structure includes the second photoresist patterns 250 extending in a straight line in the second direction and the fourth pattern 270 between the second photoresist patterns 250 formed by a DPT process.
- the first and second mask structures may serve as an etching mask for forming the etching object layer 100 so that only portions of the etching object layer 100 covered by both of the first and second mask structures may remain to serve as pads 12 and 14 and the pad array may be defined.
- the arrangement of the pads 12 and 14 may be changed by controlling a degree of fluctuation of the first photoresist pattern 160 toward the second direction, i.e., the amplitude, while it extends in the first direction, and this may correspond to the first and second angles ⁇ and ⁇ of the first and second pads 12 and 14 , respectively, or the third and fourth angles A and B between the central line CL and the first direction.
- the first and second angles ⁇ and ⁇ may increase, and the third and fourth angles A and B may decrease.
- the third pads 20 may not be arranged in a zigzag fashion but linearly in the first direction, and each third pad 20 may have a rectangular shape.
- the first and second angles ⁇ and ⁇ or the third and fourth angles A and B may be substantially zero.
- FIG. 27 is a plan view illustrating a pad array in accordance with example embodiments.
- the pad array may include a fourth pad column 15 and a fifth pad column 17 .
- a plurality of fourth pad columns 15 may be formed in the first direction, and also a plurality of fifth pad columns 17 may be formed in the first direction.
- the fourth and fifth pad columns 15 and 17 may be arranged alternately and repeatedly in the first direction, and may be disposed at a given distance from each other in the first direction.
- Each fourth pad column 15 may have a plurality of fourth pads 16 disposed in the second direction substantially perpendicular to the first direction, and each fifth pad column 17 may have a plurality of fifth pads 18 disposed in the second direction.
- the fourth pads 16 may be disposed at a given distance from each other in the second direction
- the fifth pads 18 may be disposed at a given distant from each other in the second direction.
- Each fourth pad 16 may have four sides, and first and second sides g1 and g2 of the four sides that are opposite to each other may be substantially straight lines each of which may be parallel to the second direction.
- the other two opposite sides of the four sides, i.e., third and fourth sides h1 and h2 may be parallel curves that are respectively concave and convex in the second direction.
- each fifth pad 18 may also have four sides, and first and second sides i1 and i2 of the four sides that are opposite to each other may be substantially straight lines each of which may be parallel to the second direction. Additionally, the other two opposite sides of the four sides, i.e., third and fourth sides j1 and j2 may be parallel curves that are respectively convex and concave in the second direction.
- the fourth and fifth pads 16 and 18 may be arranged in a waveform along the first direction. That is, the fourth and fifth pads 16 and 18 may be disposed in a zigzag fashion along the first direction.
- each of the third and fourth sides h1, h2, j1 and j2 of the fourth and fifth pads 16 and 18 in FIG. 27 may not be two straight lines but may be curved (also referred to as bent).
- the pad array may be formed using a seventh photoresist pattern (not shown) extending in a curve along the first direction that is different from the first photoresist pattern 160 in FIG. 1 .
- FIGS. 28 , 30 , 32 , 34 , 36 , 38 , 40 ; 43 and 44 are plan views illustrating stages of a method of manufacturing a semiconductor device in accordance with example embodiments
- FIGS. 29 , 31 , 33 , 35 , 37 , 39 , 41 , 42 , 45 and 46 are cross-sectional views illustrating stages of a method of manufacturing the semiconductor device in accordance with example embodiments.
- Each of the cross-sectional views includes cross-sections of the corresponding plan view cut along lines G-G′, H-H′, K-K′ and L-L′, respectively.
- the lines G-G′ and H-H′ extend in a second direction substantially parallel to a top surface of a substrate, and the lines K-K′ and L-L′ extend in a first direction substantially parallel to the top surface of the substrate and substantially perpendicular to the second direction.
- the method of forming the pads in the first region illustrated with reference to FIGS. 1 to 27 may be applied to forming capacitor landing pads in a cell region of a dynamic random access memory (DRAM) device.
- the method of forming the wirings in the second region performed together with the method of forming the pads in the first region may be applied to forming various patterns in a peripheral circuit region of the DRAM device (e.g., bit lines), however, other such patterns are not illustrated herein.
- bit lines e.g., bit lines
- a first hard mask 310 may be formed on a substrate 300 , and an upper portion of the substrate 300 may be etched using the first hard mask 310 as an etching mask to form a first trench 305 .
- the substrate 300 may be a silicon substrate, a germanium substrate, a silicon-germanium substrate, a silicon-on-insulator (SOI) substrate, a germanium-on-insulator (GOI) substrate, etc.
- the first hard mask 310 may be formed to include a nitride, e.g., silicon nitride.
- An isolation layer may be formed on the substrate 300 to sufficiently fill the first trench 305 , and an upper portion of the isolation layer may be planarized until a top surface of the substrate 300 is exposed to form an isolation layer pattern 320 in the first trench 305 .
- the isolation layer may be formed to include an oxide, e.g., silicon oxide.
- a region of the substrate 300 on which the isolation layer pattern 320 is formed may be defined as a field region, and a region of the substrate 300 on which no isolation layer pattern is formed may be defined as an active region.
- a plurality of active regions may be formed, and each active region may extend in a third direction that is substantially parallel to the top surface of the substrate 300 , but that is neither parallel nor perpendicular to the first and second directions.
- Impurities may be implanted into upper portions of the substrate 300 to form impurity regions (not shown).
- the impurity regions may form a transistor together with a first gate structure 360 (refer to FIG. 31 ) subsequently formed, and may serve as source/drain regions of the transistor.
- the first hard mask 310 , the substrate 300 and the isolation layer pattern 320 may be partially removed to form second trenches each of which may extend in the second direction.
- the second trenches may be formed to have different depths at the substrate 300 and the isolation layer pattern 320 according to the etching selectivity therebetween.
- two second trenches may be formed in each active region of the substrate 300 .
- a first gate insulation layer 330 may be formed on upper surfaces of the substrate 300 exposed by the second trenches, and a first gate electrode 340 and a capping layer pattern 350 may be sequentially formed in each second trench.
- the first gate electrode 340 may fill a lower portion of each second trench and the capping layer pattern 350 may fill an upper portion of each second trench.
- the first gate insulation layer 330 may be formed using a thermal oxidation process or a chemical vapor deposition (CVD) process, and thus may be formed to include an oxide, e.g., silicon oxide.
- CVD chemical vapor deposition
- the first gate electrode 340 may be formed by forming a first gate electrode layer on the first gate insulation layer 330 , the first hard mask 310 and the isolation layer pattern 320 to sufficiently fill the second trenches, and removing an upper portion of the first gate electrode layer through an etch back process and/or a CMP (chemical mechanical polishing) process.
- the first gate electrode layer may be formed to include a metal, e.g., tungsten, titanium, tantalum, etc., or a metal nitride, e.g., tungsten nitride, titanium nitride, tantalum nitride, etc.
- the capping layer pattern 350 may be formed by forming a capping layer on the first gate electrode 340 , the first gate insulation layer 330 , the first hard mask 310 and the isolation layer pattern 320 to sufficiently fill remaining portions of the second trenches, and planarizing an upper portion of the capping layer until top surfaces of the first hard mask 310 and the isolation layer pattern 320 may be exposed.
- the capping layer may be formed to include a nitride, e.g., silicon nitride.
- the first gate structure 360 including the first gate insulation layer 330 , the first gate electrode 340 and the capping layer pattern 350 may be formed in each second trench.
- the first gate structure 360 may extend in the second direction.
- a first insulating interlayer 370 may be formed on the first hard mask 310 , the isolation layer pattern 320 and the capping layer pattern 350 , and the first insulating interlayer 370 and the first hard mask 310 may be partially removed to form first contact holes 375 exposing the active regions of the substrate 300 , respectively.
- each first contact hole 375 may expose a central top surface of each active region.
- the capping layer pattern 350 and the isolation layer pattern 320 may also be partially removed.
- a first spacer 380 may be formed on a sidewall of each first contact hole 375 .
- the first spacers 380 may be formed by forming a first spacer layer on the sidewalls of the first contact holes 375 , the exposed top surface of the active regions, and the first insulating interlayer 370 , and anisotropically etching the first spacer layer.
- the first spacer layer may be formed to include a nitride, e.g., silicon nitride.
- a first contact plug 412 filling a remaining portion of each first contact hole 375 may be formed on the exposed top surface of the active region and the first spacer 380 .
- the first contact plug 412 may include a first metal layer pattern 402 and a barrier layer pattern 392 surrounding the first metal layer pattern 402 .
- the first contact plugs 412 may be formed by forming a barrier layer on the exposed top surface of the active regions, the first spacers 380 and the first insulating interlayer 370 , by forming a first metal layer to sufficiently fill remaining portions of the first contact holes 375 , and by planarizing upper portions of the barrier layer and the first metal layer until a top surface of the first insulating interlayer 370 is exposed.
- the barrier layer may be formed to include a metal nitride (e.g., tungsten nitride, titanium nitride, tantalum nitride, etc.), and the first metal layer may be formed to include a metal (e.g., tungsten, aluminum, copper, etc.).
- the first contact plugs 412 may be formed to include doped polysilicon.
- a first bit line 422 and a second hard mask 432 may be sequentially formed on the first insulating interlayer 370 to contact the first plugs 412 .
- the first bit line 422 and the second hard mask 432 may be formed by sequentially forming a second metal layer and a second hard mask layer on the first insulating interlayer 370 , the first contact plugs 412 , and the first spacers 380 , and by patterning the second hard mask layer and the second metal layer using a photolithography process.
- each of the first bit line 422 and the second hard mask 432 may extend in the first direction, and a plurality of first bit lines 422 and a plurality of second hard masks 432 may be formed in the second direction.
- the second metal layer may be formed to include a metal, e.g., tungsten, aluminum, copper, etc.
- the second hard mask layer may be formed to include a nitride, e.g., silicon nitride.
- a second spacer 442 may be formed on sidewalls of each first bit line 422 and each second hard mask 432 .
- the second spacers 442 may be formed by forming a second spacer layer on the first bit lines 422 , the second hard masks 432 , the first contact plugs 412 and the first insulating interlayer 370 , and by anisotropically etching the second spacer layer.
- the second spacer layer may be formed to include a nitride, e.g., silicon nitride.
- the second spacer 442 may extend in the first direction, and a plurality of second spacers 442 may be formed in the second direction.
- the bit line 422 , the second hard mask 432 and the second spacer 442 may define a first bit line structure.
- a second insulating interlayer 450 may be formed on the first insulating interlayer 370 to cover the first bit line structures, and the second insulating interlayer 450 , the first insulating interlayer 370 and the first hard mask 310 may be partially etched to form second contact holes 455 exposing top surfaces of the active regions, respectively.
- the isolation layer pattern 320 may be partially etched.
- a plurality of second contact holes 455 may be formed in the first direction between the first bit line structures.
- the second contact holes 455 may be formed to be self-aligned with the first bit line structures, and two second contact holes 455 may be formed on each active region.
- a second contact plug 462 filling a lower portion of each second contact hole 455 may be formed.
- the second contact plugs 462 may be formed by forming a first conductive layer on the exposed top surfaces of the active regions, the first bit line structures, and the second insulating interlayer 450 to sufficiently fill the second contact holes 455 , and by removing an upper portion of the first conductive layer.
- the first conductive layer may be formed to include, e.g., doped polysilicon.
- Metal silicide patterns may be further formed on top surfaces of the second contact plugs 462 , thereby reducing a resistance between the second contact plugs 462 and landing pads 472 (refer to FIGS. 44 and 45 ) subsequently formed.
- a second conductive layer 470 may be formed on the second contact plugs 462 , the first bit line structures and the second insulating interlayer 450 to sufficiently fill remaining portions of the second contact holes 455 .
- the second conductive layer 470 may be formed to include a metal, e.g., tungsten, aluminum, copper, etc.
- a third conductive layer (not shown) is formed on the second contact plugs 462 , the first bit line structures, and the second insulating interlayer 450 to sufficiently fill remaining portions of the second contact holes 455 .
- an upper portion of the third conductive layer may be planarized until top surfaces of the first bit line structures and the second insulating interlayer 450 may be exposed to form contact plugs (not shown), and a fourth conductive layer (not shown) serving as a pad layer may be formed on the contact plugs, the first bit line structures and the second insulating interlayer 450 .
- the second conductive layer 470 serving as both of the contact plug and the pad layer
- a DPT process using the first photoresist pattern 160 extending in a waveform along the first direction and a DPT process using the second photoresist pattern 250 extending in a straight line in the second direction may be sequentially performed to pattern an upper portion of the second conductive layer 470 .
- the landing pads 472 (each of which may include an upper portion having the shape of the pads 102 in FIG. 24 ) may be formed. A lower portion of each landing pad 472 may contact a top surface of each second contact plug 462 .
- capacitors 530 contacting the landing pads 472 may be formed to complete the semiconductor device.
- a third insulating interlayer 480 may be formed on the first bit line structures and the second insulating interlayer 450 to cover the landing pads 472 , an upper portion of the third insulating interlayer 480 may be planarized until a top surface of the landing pads 472 may be exposed.
- An etch stop layer 490 and a mold layer may be sequentially formed on the third insulating interlayer 480 and the landing pads 472 , and may be partially etched to form third contact holes (not shown) exposing top surfaces of the landing pads 472 , respectively. In the etching process, a top surface of the third insulating interlayer 480 may also be partially exposed.
- the third contact holes may form a honeycomb structure. That is, the third contact holes may be formed at positions corresponding to vertices and centers of hexagons when viewed from a top side.
- a sacrificial layer (not shown) may be formed on the lower electrode layer to sufficiently fill remaining portions of the third contact holes, and upper portions of the sacrificial layer and the lower electrode layer may be planarized until a top surface of the mold layer is exposed to divide the lower electrode layer into a plurality of pieces. The sacrificial layer and the mold layer may be removed.
- a plurality of cylindrical lower electrodes 500 may be formed on the sidewalls of the third contact holes, the exposed top surfaces of the landing pads 472 , and the exposed top surface of the third insulating interlayer 480 , and the lower electrodes 500 may form a honeycomb structure in accordance with the honeycomb structure of the third contact holes.
- a plurality of pillar-shaped lower electrodes may be formed instead of the plurality of cylindrical lower electrodes 500 , and in this case, the lower electrode layer may entirely fill the third contact holes and the sacrificial layer may not be formed.
- the cylindrical lower electrodes 500 are formed will be illustrated.
- a dielectric layer 510 may be formed on the lower electrodes 500 and the etch stop layer 490 , and an upper electrode 520 may be formed on the dielectric layer 510 to form the capacitors 530 , each of which may include the lower electrode 500 , the dielectric layer 510 , and the upper electrode 520 .
- the lower and upper electrodes 500 and 520 may be formed to include doped polysilicon, a metal, a metal nitride, etc., and the dielectric layer 510 may be formed to include a metal oxide, silicon oxide, etc.
- the second contact plugs 462 may be arranged at a given distance from each other in the first direction between the second spacers 442 of the first bit line structures, and the landing pads 472 may be formed to contact top surfaces of the second contact plugs 462 , respectively.
- the landing pads 472 may be disposed in the first direction in a waveform that may fluctuate toward the second direction. That is, the landing pads 472 may be disposed in a zigzag fashion in the first direction.
- a second center C2 of each landing pad 472 may not be coincident with a first center C1 of the corresponding second contact plug 462 , and may be spaced apart from the first center C1 by a first distance D1.
- the lower electrodes 500 may be arranged in a honeycomb structure in consideration of making best use of space and avoiding mutual interference therebetween. That is, the lower electrodes 500 may be arranged at positions corresponding to vertices and centers of hexagons when viewed from a top side. Thus, the positions of the lower electrodes 500 may be different from those of the second contact plugs 462 when viewed from a top side.
- the landing pads 472 may be formed therebetween.
- the second center C2 of each landing pad 472 may be located between the first center C1 of each second contact plug 462 and a third center C3 of each lower electrode 500 , when viewed from a top side.
- the landing pads 472 are formed in a honeycomb structure like the lower electrodes 500 , and thus the second center C2 of each landing pad 472 may be coincident with the third center C3 of the corresponding lower electrode 500 , resistance between the landing pads 472 and the second contact plugs 462 may be high due to the small contact area therebetween.
- the second center C2 of each landing pad 472 may be located between the first center C1 of each second contact plug 462 and the third center C3 of each lower electrode 500 , and thus resistance between the landing pads 472 and the second contact plugs 462 may be reduced.
- the resistance between the landing pads 472 and the lower electrodes 500 may be relatively high due to the small contact area therebetween.
- second center C2 of each landing pad 472 may be located between the first center C1 of each second contact plug 462 and the third center C3 of each lower electrode 500 , and thus resistance between the landing pads 472 and the lower electrodes 500 may be reduced.
- the resistance between the landing pads 472 and the second contact plugs 462 and the resistance between the landing pads 472 and the lower electrodes 500 may be controlled by changing the relative locations of the second contact plugs 462 , the landing pads 472 , and the lower electrodes 500 .
- FIG. 48 is a plan view illustrating the locations of the second contact plugs 462 , the landing pads 472 , and the lower electrodes 500 in the semiconductor device in accordance with other example embodiments.
- FIG. 49 is a cross-sectional view of the semiconductor device in FIG. 48 .
- a third distance D3 between the second center C2 of each landing pad 472 and the first center C1 of the corresponding second contact plug 462 is smaller than the first distance D1 in the semiconductor device of FIG. 47
- a fourth distance D4 between the second center C2 of each landing pad 472 and the third center C3 of the corresponding lower electrode 500 is larger than the second distance D2 in the semiconductor device of FIG. 47 .
- resistance between the landing pads 472 and the second contact plugs 462 and resistance between the landing pads 472 and the lower electrodes 500 in the semiconductor device of FIGS. 48 and 49 may be different from those of the semiconductor device of FIG. 47 .
- a desired layout of the landing pads may be implemented by performing a DPT process only twice.
- Present inventive concepts may be applied to various types of semiconductor devices including pattern structures, e.g., pads, masks, wirings, etc.
- present inventive concepts may be applied to forming capacitor landing pads in a cell region or bit lines in a peripheral circuit region in a DRAM device including planar transistors, or forming active patterns in a DRAM device including vertical channel transistors.
- the mask layer may be patterned by the method of forming pads illustrated with reference to FIGS. 1 to 26 to form a plurality of masks.
- An upper portion of the substrate may be etched using the plurality of masks as an etching mask to form active patterns.
- a pad may be a conductive landing pad providing electrical coupling between a memory cell capacitor and a source/drain region of a memory cell access transistor. More particularly, the conductive landing pad may provide electrical coupling to an electrode of the memory cell capacitor. According to some other embodiments, the pad may be a conductive landing pad providing electrical coupling between a bit line and a source/drain region(s) of a memory cell access transistor(s). According to still other embodiments, the pad may be a portion of a capacitor electrode or any other electrode. According to yet other embodiments, the pad may be any other conductive pattern.
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Abstract
An electronic device may include a substrate, and a plurality of spaced apart pads on the substrate. Each of the pads may includes first, second, third, and fourth sides, the first and third sides may be opposite sides that are substantially straight, and the second and fourth sides may be opposite sides that are curved. Related methods, devices, and structures are also discussed.
Description
- This application claims priority under 35 USC §119 to Korean Patent Application No. 10-2013-0070688, filed on Jun. 20, 2013 in the Korean Intellectual Property Office (KIPO), the disclosure of which is hereby incorporated herein by reference in its entirety.
- A self-align patterning method for forming patterns may include forming a first layer on a substrate, and forming a plurality of first hard mask patterns on the first layer. A sacrificial layer is formed on top surfaces and sidewalls of the first hard mask patterns, thereby forming a gap between respective facing portions of the sacrificial layer on the sidewalls of the first hard mask patterns. A second hard mask pattern is formed in the gap, the sacrificial layer is etched using the second hard mask pattern as a mask to expose the first hard mask patterns, the first layer is exposed using the exposed first hard mask patterns and the second hard mask pattern. The exposed first layer is then etched using the first and second hard mask patterns.
- Such self-aligned patterning methods are discussed, for example, in U.S. Pat. No. 7,615,496 to Lee et al., entitled “Method of Forming Pad Patterns Using Self-Aligned Double Patterning Method, Pad Pattern Layout Formed Using the Same, And Method Of Forming Contact Holes Using Self-Aligned Double Patterning Method,” the disclosure of which is hereby incorporated herein in its entirety by reference.
- According to some embodiments, a method of forming an electronic device may include providing a pad layer on a substrate, and forming a plurality of spaced apart first masks on the pad layer. Each of the first masks may define a non-linear pattern extending along a respective axis in a first direction. A plurality of spaced apart second masks may be formed on the pad layer extending in a second direction different than the first direction, wherein each of the second masks crosses each of the first masks. The pad layer may be patterned using the plurality of spaced apart first masks and the plurality of spaced apart second masks to form a plurality of spaced apart pads on the substrate.
- Forming the plurality of spaced apart first masks may precede forming the plurality of spaced apart second masks. Moreover, patterning the pad layer may include patterning the plurality of spaced apart first masks using the plurality of spaced apart second masks, removing the plurality of spaced apart second masks to provide a plurality of pad masks after patterning the plurality of spaced apart first masks, patterning the pad layer using the plurality of pad masks to form the plurality of spaced apart pads, and removing the pad masks after patterning the pad layer.
- Forming the plurality of spaced apart second masks may precede forming the plurality of spaced apart first masks. Moreover, patterning the pad layer may include patterning the plurality of spaced apart second masks using the plurality of spaced apart first masks, removing the plurality of spaced apart first masks to provide a plurality of pad masks after patterning the plurality of spaced apart second masks, patterning the pad layer using the plurality of pad masks to form the plurality of spaced apart pads, and removing the pad masks after patterning the pad layer.
- Each of the second masks may cross the plurality of spaced apart first masks linearly.
- Each of the second masks may have a non-linear pattern crossing the plurality of spaced apart first masks.
- The non-linear pattern may be a periodic pattern extending along the respective axis in the first direction. Each of the second masks may cross each of the first masks at a respective maximum deviation of the first mask from the respective axis.
- Forming the plurality of spaced apart first masks may include forming a first plurality of spaced apart patterns, and forming a second plurality of spaced apart patterns that are self-aligned with the first plurality of spaced apart patterns.
- The substrate may include a plurality of memory cell transistors, and each of the plurality of spaced apart pads may be electrically coupled to a source/drain region of a respective one of the memory cell transistors. After forming the plurality of pads, a plurality of memory cell capacitors may be formed, wherein each of the memory cell capacitors is electrically coupled to a respective one of the pads.
- The second direction may be perpendicular with respect to the first direction.
- According to some other embodiments, a method of forming an electronic device may include providing a pad layer on a substrate, and forming a plurality of spaced apart first masks on the pad layer extending in a first direction. Forming the plurality of spaced apart first masks may include forming a first plurality of spaced apart patterns, and forming a second plurality of spaced apart patterns that are self-aligned with the first plurality of spaced apart patterns. A plurality of spaced apart second masks may be formed on the pad layer extending in a second direction different than the first direction, and each of the second masks may cross each of the first masks. The pad layer may be patterned using the plurality of spaced apart first masks and the plurality of spaced apart second masks to form a plurality of spaced apart pads on the substrate.
- Each of the first masks may define a non-linear pattern extending along a respective axis in the first direction, and each of the second masks may define a linear pattern extending along a respective axis in the second direction.
- Each of the first masks may define a linear pattern extending along a respective axis in the first direction, and each of the second masks may define a non-linear pattern extending along a respective axis in the second direction.
- Each of the first masks may define a linear pattern extending along a respective axis in the first direction, and each of the second masks may define a linear pattern extending along a respective axis in the second direction.
- Each of the first masks may define a non-linear pattern extending along a respective axis in the first direction, and each of the second masks may define a non-linear pattern extending along a respective axis in the second direction.
- Forming the plurality of spaced apart first masks may precede forming the plurality of spaced apart second masks. In addition, patterning the pad layer may include patterning the plurality of spaced apart first masks using the plurality of spaced apart second masks, removing the plurality of spaced apart second masks to provide a plurality of pad masks after patterning the plurality of spaced apart first masks, patterning the pad layer using the plurality of pad masks to form the plurality of spaced apart pads, and removing the pad masks after patterning the pad layer.
- Forming the plurality of spaced apart second masks may precede forming the plurality of spaced apart first masks. In addition, patterning the pad layer may include patterning the plurality of spaced apart second masks using the plurality of spaced apart first masks, removing the plurality of spaced apart first masks to provide a plurality of pad masks after patterning the plurality of spaced apart second masks, patterning the pad layer using the plurality of pad masks to form the plurality of spaced apart pads, and removing the pad masks after patterning the pad layer.
- The substrate may include a plurality of memory cell transistors, and each of the plurality of spaced apart pads may be electrically coupled to a source/drain region of a respective one of the memory cell transistors. After forming the plurality of pads, a plurality of memory cell capacitors may be formed wherein each of the memory cell capacitors is electrically coupled to a respective one of the pads.
- The second direction may be perpendicular with respect to the first direction.
- Forming the plurality of spaced apart second masks may include forming a third plurality of spaced apart patterns, and forming a fourth plurality of spaced apart patterns that are self-aligned with the third plurality of spaced apart patterns.
- According to some other embodiments, an electronic device may include a substrate, and a plurality of spaced apart pads on the substrate. Each of the pads may include first, second, third, and fourth sides. The first and third sides may be opposite sides that are substantially straight, and the second and fourth sides may be opposite sides that are curved.
- The plurality of pads may be arranged in linear columns in a direction that is parallel with the first and third sides, and a center line connecting centers of adjacent pads of different columns may define an angle of at least 60 degrees and less than 90 degrees relative to the direction that is parallel with the first and third sides.
- One of the second and fourth sides may be concave, and the other of the second and fourth sides may be convex.
- Moreover, the plurality of pads may be arranged in linear columns, wherein pads of a first column may be arranged with the convex sides pointing in a first direction parallel to a direction of the columns, wherein pads of a second column may be arranged with the convex sides pointing in a second direction parallel to the direction of the columns, and wherein the first and second directions may be opposite directions.
- The substrate may include a plurality of memory cell transistors, and each of the spaced apart pads may be electrically coupled to a source/drain region of a respective one of the memory cell transistors. In addition, each of a plurality of memory cell capacitors may be electrically coupled to a respective one of the pads.
- According to still other embodiments, an electronic device may include a substrate, and a plurality of spaced apart pads on the substrate. Each of the pads may include first and second opposing sides wherein the first side is concave and the second side is convex.
- Each of the pads may include third and fourth opposing sides extending between the first and second sides, and the third and fourth sides may be opposite sides that are substantially straight.
- The plurality of pads may be arranged in linear columns in a direction that is parallel with the first and third sides, and a center line connecting centers of adjacent pads of different columns may define an angle of at least 60 degrees and less than 90 degrees relative to the direction that is parallel with the first and third sides.
- The plurality of pads may be arranged in linear columns. Pads of a first column may be arranged with the convex sides pointing in a first direction parallel to a direction of the columns, pads of a second column may be arranged with the convex sides pointing in a second direction parallel to the direction of the columns, and the first and second directions may be opposite directions.
- The substrate may include a plurality of memory cell transistors, and each of the spaced apart pads may be electrically coupled to a source/drain region of a respective one of the memory cell transistors. In addition, each of a plurality of memory cell capacitors may be electrically coupled to a respective one of the pads.
- According to yet other embodiments, an electronic device may include a substrate, and a plurality of spaced apart pads on the substrate. The plurality of pads may be arranged in linear columns, and a center line connecting centers of adjacent pads of different columns may define an angle of at least 60 degrees and less than 90 degrees relative to a direction of the columns.
- Each of the pads may include first, second, third, and fourth sides, the first and third sides may be opposite sides that are substantially straight, and the second and fourth sides may be opposite sides that are curved. Moreover, one of the second and fourth sides may be concave and the other of the second and fourth sides may be convex. Pads of a first column are arranged with the convex sides pointing in a first direction parallel to the direction of the columns, pads of a second column may be arranged with the convex sides pointing in a second direction parallel to the direction of the columns, and the first and second directions may be opposite directions.
- The substrate may include a plurality of memory cell transistors, and each of the spaced apart pads may be electrically coupled to a source/drain region of a respective one of the memory cell transistors. Moreover, each of a plurality of memory cell capacitors may be electrically coupled to a respective one of the pads.
- According to still more embodiments, a dynamic random access memory device may include a substrate having a plurality of memory cell transistors. Each of a plurality of spaced apart pads on the substrate may be electrically coupled to a source/drain region of a respective one of the memory cell transistors. The plurality of pads may be arranged in linear columns, and a center line connecting centers of adjacent pads of different columns may define an angle of at least 60 degrees and less than 90 degrees relative to a direction of the columns. Each of a plurality of memory cell capacitors may be electrically coupled to a respective one of the pads.
- Each of the pads may include first, second, third, and fourth sides, the first and third sides may be opposite sides that are substantially straight, and the second and fourth sides may be opposite sides that are curved. One of the second and fourth sides may be concave, and the other of the second and fourth sides may be convex. Pads of a first column may be arranged with the convex sides pointing in a first direction parallel to the direction of the columns, pads of a second column may be arranged with the convex sides pointing in a second direction parallel to the direction of the columns, and the first and second directions may be opposite directions.
- Example embodiments will be more clearly understood from the following detailed description taken in conjunction with the accompanying drawings.
FIGS. 1-49 represent non-limiting, example embodiments as described herein. -
FIGS. 1 , 4, 8, 13, 16, 18, 21 and 24 are plan views illustrating stages of forming pads in accordance with example embodiments, andFIGS. 2-3 , 5-7, 9-12, 14-15, 17, 19-20 and 22-23 are related cross-sectional views illustrating stages of forming the pads in accordance with example embodiments; -
FIG. 25 is a plan view illustrating a pad array in accordance with example embodiments; -
FIG. 26 is a plan view illustrating a pad array in accordance with example embodiments; -
FIG. 27 is a plan view illustrating a pad array in accordance with example embodiments; -
FIGS. 28 , 30, 32, 34, 36, 38, 40, 43 and 44 are related plan views illustrating stages of a method of manufacturing a semiconductor device in accordance with example embodiments, andFIGS. 29 , 31, 33, 35, 37, 39, 41, 42, 45 and 46 are cross-sectional views illustrating stages of a method of manufacturing the semiconductor device in accordance with example embodiments; -
FIG. 47 is a plan view illustrating the locations of second contact plugs, landing pads and lower electrodes in the semiconductor device ofFIG. 46 ; -
FIG. 48 is a plan view illustrating locations of second contact plugs, landing pads and lower electrodes in the semiconductor device in accordance with other example embodiments; and -
FIG. 49 is a cross-sectional view of the semiconductor device inFIG. 48 . - Example embodiments will now be described more fully with reference to the accompanying drawings, in which example embodiments are shown. Example embodiments may, however, be embodied in many different forms and should not be construed as limited to the example embodiments set forth herein. In the drawings, the thicknesses of layers and regions are exaggerated for clarity. Like reference numerals in the drawings denote like elements, and thus their repeated description may be omitted and/or abbreviated.
- It will be understood that when an element or layer is referred to as being “on,” “connected to” or “coupled to” another element or layer, it can be directly on, connected or coupled to the other element or layer or intervening elements or layers may be present. In contrast, when an element is referred to as being “directly on,” “directly connected to” or “directly coupled to” another element or layer, there are no intervening elements or layers present. Like numerals refer to like elements throughout. As used herein, the term “and/or” includes any and all combinations of one or more of the associated listed items. Other words used to describe the relationship between elements or layers should be interpreted in a like fashion (e.g., “between” versus “directly between,” “adjacent” versus “directly adjacent,” “on” versus “directly on”).
- It will be understood that, although the terms first, second, third, etc. may be used herein to describe various elements, components, regions, layers and/or sections, these elements, components, regions, layers and/or sections should not be limited by these terms. Unless indicated otherwise, these terms are only used to distinguish one element, component, region, layer or section from another region, layer or section. Thus, a first element, component, region, layer or section discussed below could be termed a second element, component, region, layer or section without departing from the teachings of the example embodiments.
- Spatially relative terms, such as “beneath,” “below,” “lower,” “above,” “upper” and the like, may be used herein for ease of description to describe one element or feature's relationship to another element(s) or feature(s) as illustrated in the figures. It will be understood that the spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. For example, if the device in the figures is turned over, elements described as “below” or “beneath” other elements or features would then be oriented “above” the other elements or features. Thus, the exemplary term “below” can encompass both an orientation of above and below. The device may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.
- The terminology used herein is for the purpose of describing particular example embodiments only and is not intended to be limiting of the example embodiments. As used herein, the singular forms “a,” “an” and “the” are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms “comprises” and/or “comprising,” when used in this specification, specify the presence of stated features, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or groups thereof.
- Example embodiments are described herein with reference to cross-sectional illustrations that are schematic illustrations of idealized example embodiments (and intermediate structures). As such, variations from the shapes of the illustrations as a result, for example, of manufacturing techniques and/or tolerances, are to be expected. Thus, example embodiments should not be construed as limited to the particular shapes of regions illustrated herein but are to include deviations in shapes that result, for example, from manufacturing. For example, an implanted region illustrated as a rectangle will, typically, have rounded or curved features and/or a gradient of implant concentration at its edges rather than a binary change from implanted to non-implanted region. Likewise, a buried region formed by implantation may result in some implantation in the region between the buried region and the surface through which the implantation takes place. Thus, the regions illustrated in the figures are schematic in nature and their shapes are not intended to limit the scope of the present disclosure.
- Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this disclosure belongs. It will be further understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning that is consistent with their meaning in the context of the relevant art and will not be interpreted in an idealized or overly formal sense unless expressly so defined herein.
-
FIGS. 1 , 4, 8, 13, 16, 18, 21 and 24 are plan views illustrating stages of forming pads in accordance with example embodiments, andFIGS. 2-3 , 5-7, 9-12, 14-15, 17, 19-20 and 22-23 are related cross-sectional views illustrating stages of forming the pads in accordance with example embodiments. - Each of the cross-sectional views includes cross-sections of the corresponding plan view cut along lines A-A′, B-B′, C-C′, D-D′, E-E′ and F-F′, respectively. The lines A-A′, B-B′ and C-C′ extend in a second direction substantially parallel to a top surface of an etching object layer, and the lines D-D′, E-E′ and F-F′ extend in a first direction substantially parallel to the top surface of the etching object layer and substantially perpendicular to the second direction.
- The method of forming the pads may be performed together with a method of forming wirings. That is, the pads may be formed in a first region I according to the method of forming the pads, and simultaneously the wirings may be formed in a second region II according to the method of forming the wirings. Thus, a portion of each cross-sectional view labeled II also illustrates a cross-section of the second region II cut along the second direction (not shown in
FIG. 1 or in any of the other plan views). - Referring to
FIGS. 1 and 2 , afirst layer 110, asecond layer 120, afirst mask layer 130, athird layer 140 and afourth layer 150 may be sequentially formed on an etching object layer 100 (also referred to as a pad layer), and first andthird photoresist patterns fourth layer 150 in the first and second regions I and II, respectively. - The
etching object layer 100 may include various types of layers that may be patterned to be transformed into patterns, e.g., pads, wirings, masks, etc. Thus, theetching object layer 100 may be referred to as a pad layer, a wiring layer, a mask layer, etc., in accordance with the desired patterns. Theetching object layer 100 may include a conductive material or an insulating material. Examples of the conductive material may include a metal, (e.g., tungsten, titanium, tantalum, etc.), a metal nitride, a metal silicide, a doped polysilicon, etc., and examples of the insulating material may include silicon nitride, silicon oxide, silicide oxynitride, etc. - For example, the
first layer 110 may be an amorphous carbon layer (ACL), the second andfourth layers first mask layer 130 may include an oxide, e.g., atomic layer deposition oxide (ALD-OX), and thethird layer 140 may include spin-on-hardmask - In example embodiments, the
first photoresist pattern 160 may extend in the first direction, and a plurality offirst photoresist patterns 160 may be formed in the second direction. Each of thefirst photoresist patterns 160 may extend in a non-linear pattern (also referred to as a waveform) along an axis in the first direction. That is, eachfirst photoresist pattern 160 may not extend in a straight line in the first direction but may fluctuate right and left as it extends along an axis in the first direction, and thus may have an amplitude along the second direction. Thethird photoresist pattern 165 may entirely cover the second region II. - An anti-reflective coating (ARC) layer (not shown) may be further formed between the
fourth layer 150 and thefirst photoresist pattern 160 and/or between thefourth layer 150 and thethird photoresist pattern 165. - Referring to
FIG. 3 , in the first region I, the fourth andthird layers first photoresist pattern 160 as an etching mask to form fourth andthird layer patterns first mask layer 130 may be exposed. In example embodiments, a plurality ofthird layer patterns 142 and a plurality offourth layer patterns 152 may be formed in the second direction. Hereinafter, one of thethird layer patterns 142 and one of thefourth layer patterns 152 thereon may be referred to simply as afirst pattern first pattern first photoresist pattern 160, may extend in a waveform along the first direction, and a plurality offirst patterns third photoresist pattern 165 entirely covers thefourth layer 150, and thus thefourth layer 150 may not be etched in the second region II. - The first and
third photoresist patterns third photoresist patterns - Referring to
FIGS. 4 and 5 , asecond mask layer 170 may be formed on the plurality offirst patterns first mask layer 130 in the first region I, and on thefourth layer 150 in the second region II. Asecond pattern 180 may be formed on a portion of thesecond mask layer 170 between the plurality offirst patterns - In example embodiments, the
second mask layer 170 may be conformally formed on sidewalls and top surfaces of thefirst patterns first mask layer 130, and on thefourth layer 150. In example embodiments, thesecond mask layer 170 may be formed to include a material substantially the same as that of thefirst mask layer 130, e.g., ALD-OX. Thus, the first and second mask layers 130 and 170 in the first region I may be merged into a layer, and the merged layer will be shown as a single layer in figures afterFIG. 5 . - In example embodiments, the
second pattern 180 may be formed by forming a filling layer on thesecond mask layer 170 to sufficiently fill a space between the plurality offirst patterns third layer 140, and thus may include, e.g., SOH (spin-on-hardmask). The planarization process may be performed by an etch back process and/or a chemical mechanical polishing (CMP) process. Thesecond pattern 180 may have a top surface substantially coplanar with or lower than an uppermost portion of the top surface of thesecond mask layer 170. - The
second mask layer 170 may be conformally formed on the sidewalls and the top surfaces of thefirst patterns first mask layer 130 and thefourth layer 150, and thus thesecond pattern 180 formed on the portion of thesecond mask layer 170 between the plurality offirst patterns first pattern second pattern 180 may be formed to have a width along the second direction substantially the same as that of eachfirst pattern - Referring to
FIG. 6 , the merged first and second mask layers 130 and 170 in the first region I and thesecond mask layer 170 in the second region II may be etched using thefirst patterns second patterns 180 as an etching mask to formfirst masks 172 in the first region I and to remove thesecond mask layer 170 from the second region II. In the etching process, thefourth layer pattern 152 of thefirst pattern fourth layer 150 may be removed from the second region II. - Thus, in the first region I, a plurality of first structures each of which may include the
first mask 172 and thethird layer pattern 142 sequentially stacked on thesecond layer 120, and a plurality of second structures each of which may include thefirst mask 172 and thesecond pattern 180 sequentially stacked on thesecond layer 120 may be formed. Each of the first structures and each of the second structures, like thefirst pattern second pattern 180, may extend in a non-linear pattern (also referred to as a waveform) along an axis in the first direction. In the second region II, thefirst mask layer 130 and thethird layer 140 that are sequentially stacked on thesecond layer 120 may remain. - Referring to
FIG. 7 , thethird layer patterns 142 and thesecond patterns 180 may be removed from the first region I to expose thefirst masks 172, and thethird layer 140 may be removed from the second region II to expose thefirst mask layer 130. Each of the exposedfirst masks 172 in the first region I may extend in a non-linear pattern (also referred to as a waveform) along the first direction, and the exposedfirst mask layer 130 in the second region II may entirely cover thesecond layer 120. In example embodiments, thethird layer patterns 142, thesecond patterns 180, and thethird layer 140 may be removed using an ashing process and/or a stripping process. - Referring to
FIGS. 8 and 9 , in the first region I, afirst planarization layer 200 may be formed on thesecond layer 120 to sufficiently cover thefirst masks 172, and in the second region II, thefirst planarization layer 200 may be formed on thefirst mask layer 130. Afifth layer 210, athird mask layer 220, asixth layer 230 and aseventh layer 240 may be sequentially formed on thefirst planarization layer 130 both in the first and second regions I and II. Second andfourth photoresist patterns seventh layer 240 in the first and second regions I and II, respectively. - The
first planarization layer 200 may be formed to include a material substantially the same as that of thethird layer 140, and thus may include, e.g., SOH. The fifth andseventh layers fourth layers third mask layer 220 may be formed to include a material substantially the same as that of the first and second mask layers 130 and 170, and thus may include an oxide, e.g., ALD-OX. Thesixth layer 230 may be formed to include a material substantially the same as that of thethird layer 140 and thefirst planarization layer 200, and thus may include, e.g., SOH. - In example embodiments, the
second photoresist pattern 250 may extend in the second direction, and a plurality ofsecond photoresist patterns 250 may be formed in the first direction. Each of thesecond photoresist patterns 250 may extend in a straight line in the second direction. In example embodiments, thesecond photoresist patterns 250 may be spaced apart from each other in the first direction at a distance of about 2 times to about 4 times of a width of eachsecond photoresist pattern 250 in the first direction. Thefourth photoresist pattern 255 may have various shapes according to the desired shape of the wirings, and e.g., may extend in the first direction. - An ARC layer (not shown) may be further formed between the
seventh layer 240 and thesecond photoresist pattern 250 and/or between theseventh layer 240 and thefourth photoresist pattern 255. - Referring to
FIG. 10 , a process substantially the same as or similar to that discussed with reference toFIG. 3 may be performed. - Thus, in the first region I, the seventh and
sixth layers second photoresist pattern 250 as an etching mask to form seventh andsixth layer patterns third mask layer 220 may be exposed. In example embodiments, a plurality ofsixth layer patterns 232 and a plurality ofseventh layer patterns 242 may be formed in the first direction. Hereinafter, one of thesixth layer patterns 232 and one of theseventh layer patterns 242 thereon may be referred to simply as athird pattern third pattern second photoresist pattern 250, may extend in a straight line in the second direction, and a plurality ofthird patterns - In the second region II, the seventh and
sixth layers fourth photoresist pattern 255 as an etching mask to form ninth andeighth layer patterns third mask layer 220 may be exposed. Hereinafter, the eighth andninth layer patterns fifth pattern - The second and
fourth photoresist patterns - Referring to
FIG. 11 , a process substantially the same as or similar to that illustrated with reference toFIGS. 4 and 5 may be performed. - Thus, in the first region I, a
fourth mask layer 260 may be formed on the plurality ofthird patterns third mask layer 220, and afourth pattern 270 may be formed on a portion of thefourth mask layer 260 between the plurality ofthird patterns fourth mask layer 260 may be formed on the plurality offifth patterns third mask layer 220, and thefourth pattern 270 may be formed on a portion of thefourth mask layer 260 between the plurality offifth patterns - In example embodiments, the
fourth mask layer 260 may be conformally formed on sidewalls and top surfaces of thethird patterns fifth patterns third mask layer 220. In example embodiments, thefourth mask layer 260 may be formed to include a material substantially the same as that of thethird mask layer 220, e.g., ALD-OX. Thus, the third and fourth mask layers 220 and 260 may be merged into a layer, and the merged layer will be shown as a single layer in figures afterFIG. 12 . - The
fourth pattern 270 may be formed to include a material substantially the same as that of the sixth andeighth layer patterns fourth pattern 270 may have a top surface substantially coplanar with or lower than an uppermost portion of the top surface of thefourth mask layer 260. Thefourth pattern 270 may have a shape substantially the same as or similar to that of eachthird pattern fifth pattern fourth pattern 270 may be formed to have a width along the first direction substantially the same as that of eachthird pattern - Referring to
FIG. 12 , a portion of thefourth pattern 270 formed in the second region II may be removed. In example embodiments, after forming a mask (not shown) covering the first region I, an ashing process and/or a stripping process may be performed to remove the portion of thefourth pattern 270 in the second region II. - Referring to
FIGS. 13 and 14 , a process substantially the same as or similar to that illustrated with reference toFIG. 6 may be performed. - Thus, in the first region I, the merged third and fourth mask layers 220 and 260 may be etched using the
third patterns fourth patterns 270 as an etching mask to form second masks 262. In the etching process, theseventh layer pattern 242 of thethird pattern fifth patterns ninth layer pattern 243 of thefifth pattern - Thus, in the first region I, a plurality of third structures (each of which may include the
second mask 262 and thesixth layer pattern 232 sequentially stacked on the fifth layer 210), and a plurality of fourth structures (each of which may include thesecond mask 262 and thefourth pattern 270 sequentially stacked on the fifth layer 210) may be formed. Each of the third structures and each of the fourth structures, like thethird pattern fourth pattern 270, may extend in a straight line in the second direction. In the second region II, a plurality of fifth structures (each of which may include thefourth mask 263 and theeighth layer pattern 233 sequentially stacked on the fifth layer 210) may be formed. Each of the fifth structures may have a shape substantially the same as that of eachfifth pattern - Referring to
FIG. 15 , a process substantially the same as or similar to that illustrated with reference toFIG. 7 may be performed. - Thus, the
sixth layer patterns 232 and thefourth patterns 270 may be removed from the first region I to expose thesecond masks 262, and theeighth layer patterns 233 may be removed from the second region II to expose the fourth masks 263. Each of the exposedsecond masks 262 may extend in a straight line in the second direction. - Referring to
FIGS. 16 and 17 , thefifth layer 210 and thefirst planarization layer 200 may be etched using thesecond masks 262 in the first region I and thefourth masks 263 in the second region II as an etching mask to form afifth layer pattern 212 and a firstplanarization layer pattern 202 in the first region I and atenth layer pattern 213 and a secondplanarization layer pattern 203 in the second region II. Thus, portions of thefirst masks 172 and thesecond layer 120 may be exposed in the first region I, and a portion of thefirst mask layer 130 may be exposed in the second region II. - Referring to
FIGS. 18 and 19 , in the first region I, thesecond masks 262 and the exposed portion of thefirst masks 172 may be removed to form a plurality ofthird masks 174. That is, as the exposed portion of thefirst masks 172 is removed, eachfirst mask 172 extending in the first direction may be divided into the plurality ofthird masks 174. Accordingly, thethird masks 174 may be formed both in the first and second directions. In the etching process, thefifth layer pattern 212 may also be removed. - In the second region II, the
fourth masks 263 and the exposed portion of thefirst mask layer 130 may be removed to form a plurality offifth masks 133. In the etching process, thetenth layer pattern 213 may be also removed. - Referring to
FIG. 20 , asecond planarization layer 280 may be formed on thesecond layer 120 to sufficiently cover the first and secondplanarization layer patterns fifth masks second planarization layer 280 may be planarized. In example embodiments, thesecond planarization layer 280 may be formed to include a material substantially the same as that of the first and secondplanarization layer patterns planarization layer patterns second planarization layer 280, and only the mergedsecond planarization layer 280 is shown inFIG. 20 . - An
eleventh layer 290 may be formed on thesecond planarization layer 280, and afifth photoresist pattern 295 may be formed thereon in the second region II. - The
eleventh layer 290 may be formed to include an oxynitride, e.g., PE-SiON. In example embodiments, thefifth photoresist pattern 295 may overlap a portion of thesixth mask 133 when viewed from a top side, i.e., thefifth photoresist pattern 295 may vertically overlap the portion of thesixth mask 133. - Referring to
FIGS. 21 and 22 , theeleventh layer 290 and thesecond planarization layer 280 may be patterned using thefifth photoresist pattern 295 as an etching mask so that thethird masks 174 and a portion of thesecond layer 120 may be exposed in the first region I and aneleventh layer pattern 293 and a thirdplanarization layer pattern 283 may be formed in the second region II. Additionally, thesixth masks 133 and a portion of thesecond layer 120 may be exposed, however, the portion of thesixth mask 133 overlapped with thefifth photoresist pattern 295 may not be exposed but covered by the thirdplanarization layer pattern 283. - Referring to
FIG. 23 , after removing thefifth photoresist pattern 295 and theeleventh layer pattern 293, thesecond layer 120 and thefirst layer 110 may be patterned using thethird masks 174, thesixth masks 133, and the thirdplanarization layer pattern 283 as an etching mask so that asecond layer pattern 122 and afirst layer pattern 112 may be formed and a portion of theetching object layer 100 may be exposed in the first region I, and athirteenth layer pattern 123 and atwelfth layer pattern 113 may be formed and a portion of theetching object layer 100 may be exposed in the second region II. - Referring to
FIGS. 23 and 24 , thethird masks 174 and thesecond layer pattern 122 in the first region I, and thesixth masks 133, the thirdplanarization layer pattern 283, and thethirteenth layer pattern 123 in the second region II may be removed. The exposed portion of theetching object layer 100 in the first region I may be etched using thefirst layer pattern 112 as an etching mask to form a plurality ofpads 102, and the exposed portion of theetching object layer 100 in the second region II may be etched using thetwelfth layer pattern 113 as an etching mask to form a plurality of wirings (not shown). - As illustrated above, the
pads 102 may be formed by a double patterning technology (DPT) process using thefirst photoresist pattern 160 extending in a non-linear pattern (also referred to as a waveform) along an axis in the first direction, and by a DPT process using thesecond photoresist pattern 250 extending in a straight line in the second direction. That is, when thepads 102 and the wirings are not simultaneously formed but only thepads 102 are formed in the first region I, thepads 102 may be formed by performing a DPT process only twice. In a method of forming thepads 102, portions of theetching object layer 100 that are commonly covered by the first mask structure including thefirst photoresist patterns 160 and thesecond pattern 180, and the second mask structure including thesecond photoresist patterns 250 and thefourth pattern 270 may remain to be transformed into thepads 102. An array of the pads 102 (i.e., a pad array) will be discussed in greater detail below with reference toFIG. 25 . - When the
pads 102 and the wirings are simultaneously formed in the first and second regions I and II, respectively, thepads 102 and the wirings may be formed by performing an etching process three times, which may include performing a DPT process twice. When the wirings are formed in the second region II, not only a portion of theetching object layer 100 commonly covered by thefifth photoresist pattern 295 and thesixth mask 133 but also a portion thereof covered only by one of thefifth photoresist pattern 295 and thesixth mask 133 may remain, so that a portion of theetching object layer 100 covered by any one of thefifth photoresist pattern 295 and thesixth mask 133 may be transformed into the wirings. - According to the shape of the
fifth photoresist pattern 295, the wirings may thus be formed by other methods that are different from the above method. For example, after forming a preliminary mask using a photoresist pattern having a size large enough to cover several adjacent patterns of a desired wiring, the preliminary mask may be divided into a plurality of masks using a photoresist pattern covering only a portion of the preliminary mask as an etching mask, and finally theetching object layer 100 may be patterned using the mask as an etching mask to form the desired wiring. - The method of forming the
pads 102 and the wirings may be used to manufacture a semiconductor device including a cell region and a peripheral circuit region. That is, the method of forming thepads 102 in the first region I may be used (e.g., to form capacitor landing pads in the cell region), and the method of forming the wirings in the second region II may be used, (e.g., to form bit lines in the peripheral circuit region). -
FIG. 25 is a plan view illustrating a pad array in accordance with example embodiments. - Referring to
FIG. 25 , the pad array may include afirst pad column 11 and asecond pad column 13. In example embodiments, a plurality offirst pad columns 11 may be formed in the first direction, and also a plurality ofsecond pad columns 13 may be formed in the first direction. The first andsecond pad columns first pad column 11, asecond pad column 13, afirst pad column 11, and asecond pad column 13 are arranged in this order. Thus, eachsecond pad column 13 may be interposed between the adjacentfirst pad columns 11. In example embodiments, adjacent first andsecond pad columns - Each
first pad column 11 may have a plurality offirst pads 12 disposed in the second direction substantially perpendicular to the first direction, and eachsecond pad column 13 may have a plurality ofsecond pads 14 disposed in the second direction. In example embodiments, in eachfirst pad column 11, thefirst pads 12 may be disposed at a given distance from each other in the second direction, and in eachsecond pad column 13, thesecond pads 14 may be disposed at a given distant from each other in the second direction. - Each
first pad 12 may have four sides, and first and second sides a1 and a2 of the four sides that are opposite to each other may be substantially straight lines, each of which may be parallel to the second direction. The other two opposite sides of the four sides (i.e., third and fourth sides b1 and b2) may be curved (with side b1 being concave and with side b2 being convex) in the second direction. Particularly, the third side b1 of eachfirst pad 12 may include two straight lines, which may form a first angle α therebetween, and the fourth side b2 of eachfirst pad 12 may include two straight lines that are parallel to the respective two lines of the third side b1. In example embodiments, the first angle α may be an obtuse angle. - First and
second pads second pad 14 may also have four sides, and first and second sides c1 and c2 of the four sides that are opposite to each other may be substantially straight lines each of which may be parallel to the second direction. Additionally, the other two opposite sides of the four sides (i.e., third and fourth sides d1 and d2) may be curved (with side d2 being concave and with side d1 being convex) in the second direction. Particularly, the third side d1 of eachsecond pad 14 may include two straight lines, which may form a second angle β therebetween, and the fourth side d2 of eachsecond pad 14 may include two straight lines that are parallel to the respective two lines of the third side d1. In example embodiments, the second angle β may be an obtuse angle, which may be substantially the same as the first angle α. - According to the shapes of the first and
second pads second pads second pads - An imaginary central line (CL) connecting centers of the first and
second pads - The counterclockwise direction may be considered as a positive angular direction. If a portion of the central line CL connecting a center of the
first pad 12 to a center of thesecond pad 14 in this order forms a third angle A with the first direction, the third angle A may be a positive value. Additionally, if a portion of the central line CL connecting a center of thesecond pad 14 to a center of thefirst pad 12 in this order may form a fourth angle B with the first direction, the fourth angle B may be a negative value. - Alternatively, if the angular direction is not considered, i.e., if only the absolute value of the angle is considered, the third angle A or the fourth angle B may be in a range of about 0 to about 90 degrees. In example embodiments, the third and fourth angles A and B may be in a range of about 0 to about 30 degrees. When the third and fourth angles A and B are 30 degrees, the centers of the first and
second pads second pads second pads -
FIG. 26 is a plan view illustrating a pad array in accordance with example embodiments. - Referring to
FIG. 26 , the pad array may include a plurality ofthird pads 20 arranged both in the first and second directions substantially perpendicular to each other. Unlike the first andsecond pads FIG. 25 , eachthird pad 20 may have first and second sides e1 and e2 substantially parallel to the second direction, and third and fourth sides f1 and f2 substantially parallel to the first direction. That is, unlike the first andsecond pads third pad 20 may be neither concave nor convex but flat/straight in the second direction, and thus eachthird pad 20 may have a rectangular shape. - The pad array may be formed using a sixth photoresist pattern (not shown) extending in a straight line along the first direction that is different from the
first photoresist pattern 160 extending in a pattern/waveform along the first direction inFIG. 1 . - According to present inventive concepts, the first mask structure includes the
first photoresist patterns 160 extending in a non-linear pattern (also referred to as a waveform) along an axis in the first direction and thesecond pattern 180 between thefirst photoresist patterns 160 formed by a DPT process, and the second mask structure includes thesecond photoresist patterns 250 extending in a straight line in the second direction and thefourth pattern 270 between thesecond photoresist patterns 250 formed by a DPT process. Together, the first and second mask structures may serve as an etching mask for forming theetching object layer 100 so that only portions of theetching object layer 100 covered by both of the first and second mask structures may remain to serve aspads pads first photoresist pattern 160 toward the second direction, i.e., the amplitude, while it extends in the first direction, and this may correspond to the first and second angles α and β of the first andsecond pads - That is, as the amplitude of the
first photoresist pattern 160 toward the second direction decreases, the first and second angles α and β may increase, and the third and fourth angles A and B may decrease. Thus, when thefirst photoresist pattern 160 does not fluctuate substantially toward the second direction, i.e., when the sixth photoresist pattern is used, thethird pads 20 may not be arranged in a zigzag fashion but linearly in the first direction, and eachthird pad 20 may have a rectangular shape. In this case, the first and second angles α and β or the third and fourth angles A and B may be substantially zero. -
FIG. 27 is a plan view illustrating a pad array in accordance with example embodiments. - Referring to
FIG. 27 , the pad array may include afourth pad column 15 and afifth pad column 17. In example embodiments, a plurality offourth pad columns 15 may be formed in the first direction, and also a plurality offifth pad columns 17 may be formed in the first direction. The fourth andfifth pad columns - Each
fourth pad column 15 may have a plurality offourth pads 16 disposed in the second direction substantially perpendicular to the first direction, and eachfifth pad column 17 may have a plurality offifth pads 18 disposed in the second direction. In example embodiments, in eachfourth pad column 15, thefourth pads 16 may be disposed at a given distance from each other in the second direction, and in eachfifth pad column 17, thefifth pads 18 may be disposed at a given distant from each other in the second direction. - Each
fourth pad 16 may have four sides, and first and second sides g1 and g2 of the four sides that are opposite to each other may be substantially straight lines each of which may be parallel to the second direction. The other two opposite sides of the four sides, i.e., third and fourth sides h1 and h2 may be parallel curves that are respectively concave and convex in the second direction. - Fourth and
fifth pads fifth pad 18 may also have four sides, and first and second sides i1 and i2 of the four sides that are opposite to each other may be substantially straight lines each of which may be parallel to the second direction. Additionally, the other two opposite sides of the four sides, i.e., third and fourth sides j1 and j2 may be parallel curves that are respectively convex and concave in the second direction. - According to the shapes of the fourth and
fifth pads fifth pads fifth pads second pads FIG. 25 , each of the third and fourth sides h1, h2, j1 and j2 of the fourth andfifth pads FIG. 27 may not be two straight lines but may be curved (also referred to as bent). - The pad array may be formed using a seventh photoresist pattern (not shown) extending in a curve along the first direction that is different from the
first photoresist pattern 160 inFIG. 1 . -
FIGS. 28 , 30, 32, 34, 36, 38, 40; 43 and 44 are plan views illustrating stages of a method of manufacturing a semiconductor device in accordance with example embodiments, andFIGS. 29 , 31, 33, 35, 37, 39, 41, 42, 45 and 46 are cross-sectional views illustrating stages of a method of manufacturing the semiconductor device in accordance with example embodiments. Each of the cross-sectional views includes cross-sections of the corresponding plan view cut along lines G-G′, H-H′, K-K′ and L-L′, respectively. The lines G-G′ and H-H′ extend in a second direction substantially parallel to a top surface of a substrate, and the lines K-K′ and L-L′ extend in a first direction substantially parallel to the top surface of the substrate and substantially perpendicular to the second direction. - In this method, the method of forming the pads in the first region illustrated with reference to
FIGS. 1 to 27 may be applied to forming capacitor landing pads in a cell region of a dynamic random access memory (DRAM) device. The method of forming the wirings in the second region performed together with the method of forming the pads in the first region may be applied to forming various patterns in a peripheral circuit region of the DRAM device (e.g., bit lines), however, other such patterns are not illustrated herein. Hereinafter, only the method of manufacturing the cell region of the DRAM device will be illustrated. - Referring to
FIGS. 28 and 29 , a firsthard mask 310 may be formed on asubstrate 300, and an upper portion of thesubstrate 300 may be etched using the firsthard mask 310 as an etching mask to form afirst trench 305. For example, thesubstrate 300 may be a silicon substrate, a germanium substrate, a silicon-germanium substrate, a silicon-on-insulator (SOI) substrate, a germanium-on-insulator (GOI) substrate, etc. The firsthard mask 310 may be formed to include a nitride, e.g., silicon nitride. - An isolation layer may be formed on the
substrate 300 to sufficiently fill thefirst trench 305, and an upper portion of the isolation layer may be planarized until a top surface of thesubstrate 300 is exposed to form anisolation layer pattern 320 in thefirst trench 305. The isolation layer may be formed to include an oxide, e.g., silicon oxide. - A region of the
substrate 300 on which theisolation layer pattern 320 is formed may be defined as a field region, and a region of thesubstrate 300 on which no isolation layer pattern is formed may be defined as an active region. In example embodiments, a plurality of active regions may be formed, and each active region may extend in a third direction that is substantially parallel to the top surface of thesubstrate 300, but that is neither parallel nor perpendicular to the first and second directions. - Impurities may be implanted into upper portions of the
substrate 300 to form impurity regions (not shown). The impurity regions may form a transistor together with a first gate structure 360 (refer toFIG. 31 ) subsequently formed, and may serve as source/drain regions of the transistor. - Referring to
FIGS. 30 and 31 , the firsthard mask 310, thesubstrate 300 and theisolation layer pattern 320 may be partially removed to form second trenches each of which may extend in the second direction. The second trenches may be formed to have different depths at thesubstrate 300 and theisolation layer pattern 320 according to the etching selectivity therebetween. In example embodiments, two second trenches may be formed in each active region of thesubstrate 300. - A first
gate insulation layer 330 may be formed on upper surfaces of thesubstrate 300 exposed by the second trenches, and afirst gate electrode 340 and acapping layer pattern 350 may be sequentially formed in each second trench. Thefirst gate electrode 340 may fill a lower portion of each second trench and thecapping layer pattern 350 may fill an upper portion of each second trench. - In example embodiments, the first
gate insulation layer 330 may be formed using a thermal oxidation process or a chemical vapor deposition (CVD) process, and thus may be formed to include an oxide, e.g., silicon oxide. - The
first gate electrode 340 may be formed by forming a first gate electrode layer on the firstgate insulation layer 330, the firsthard mask 310 and theisolation layer pattern 320 to sufficiently fill the second trenches, and removing an upper portion of the first gate electrode layer through an etch back process and/or a CMP (chemical mechanical polishing) process. The first gate electrode layer may be formed to include a metal, e.g., tungsten, titanium, tantalum, etc., or a metal nitride, e.g., tungsten nitride, titanium nitride, tantalum nitride, etc. - The
capping layer pattern 350 may be formed by forming a capping layer on thefirst gate electrode 340, the firstgate insulation layer 330, the firsthard mask 310 and theisolation layer pattern 320 to sufficiently fill remaining portions of the second trenches, and planarizing an upper portion of the capping layer until top surfaces of the firsthard mask 310 and theisolation layer pattern 320 may be exposed. The capping layer may be formed to include a nitride, e.g., silicon nitride. - By the above process, the
first gate structure 360 including the firstgate insulation layer 330, thefirst gate electrode 340 and thecapping layer pattern 350 may be formed in each second trench. In example embodiments, thefirst gate structure 360 may extend in the second direction. - Referring to
FIGS. 32 and 33 , a first insulatinginterlayer 370 may be formed on the firsthard mask 310, theisolation layer pattern 320 and thecapping layer pattern 350, and the first insulatinginterlayer 370 and the firsthard mask 310 may be partially removed to form first contact holes 375 exposing the active regions of thesubstrate 300, respectively. In example embodiments, eachfirst contact hole 375 may expose a central top surface of each active region. When the first contact holes 375 are formed, thecapping layer pattern 350 and theisolation layer pattern 320 may also be partially removed. - A
first spacer 380 may be formed on a sidewall of eachfirst contact hole 375. Thefirst spacers 380 may be formed by forming a first spacer layer on the sidewalls of the first contact holes 375, the exposed top surface of the active regions, and the first insulatinginterlayer 370, and anisotropically etching the first spacer layer. The first spacer layer may be formed to include a nitride, e.g., silicon nitride. - Referring to
FIGS. 34 and 35 , afirst contact plug 412 filling a remaining portion of eachfirst contact hole 375 may be formed on the exposed top surface of the active region and thefirst spacer 380. Thefirst contact plug 412 may include a firstmetal layer pattern 402 and abarrier layer pattern 392 surrounding the firstmetal layer pattern 402. - The first contact plugs 412 may be formed by forming a barrier layer on the exposed top surface of the active regions, the
first spacers 380 and the first insulatinginterlayer 370, by forming a first metal layer to sufficiently fill remaining portions of the first contact holes 375, and by planarizing upper portions of the barrier layer and the first metal layer until a top surface of the first insulatinginterlayer 370 is exposed. The barrier layer may be formed to include a metal nitride (e.g., tungsten nitride, titanium nitride, tantalum nitride, etc.), and the first metal layer may be formed to include a metal (e.g., tungsten, aluminum, copper, etc.). Alternatively, the first contact plugs 412 may be formed to include doped polysilicon. - Referring to
FIGS. 36 and 37 , afirst bit line 422 and a secondhard mask 432 may be sequentially formed on the first insulatinginterlayer 370 to contact the first plugs 412. - The
first bit line 422 and the secondhard mask 432 may be formed by sequentially forming a second metal layer and a second hard mask layer on the first insulatinginterlayer 370, the first contact plugs 412, and thefirst spacers 380, and by patterning the second hard mask layer and the second metal layer using a photolithography process. In example embodiments, each of thefirst bit line 422 and the secondhard mask 432 may extend in the first direction, and a plurality offirst bit lines 422 and a plurality of secondhard masks 432 may be formed in the second direction. The second metal layer may be formed to include a metal, e.g., tungsten, aluminum, copper, etc., and the second hard mask layer may be formed to include a nitride, e.g., silicon nitride. - Referring to
FIGS. 38 and 39 , asecond spacer 442 may be formed on sidewalls of eachfirst bit line 422 and each secondhard mask 432. - The
second spacers 442 may be formed by forming a second spacer layer on thefirst bit lines 422, the secondhard masks 432, the first contact plugs 412 and the first insulatinginterlayer 370, and by anisotropically etching the second spacer layer. The second spacer layer may be formed to include a nitride, e.g., silicon nitride. In example embodiments, thesecond spacer 442 may extend in the first direction, and a plurality ofsecond spacers 442 may be formed in the second direction. - The
bit line 422, the secondhard mask 432 and thesecond spacer 442 may define a first bit line structure. - Referring to
FIGS. 40 and 41 , a second insulatinginterlayer 450 may be formed on the first insulatinginterlayer 370 to cover the first bit line structures, and the second insulatinginterlayer 450, the first insulatinginterlayer 370 and the firsthard mask 310 may be partially etched to form second contact holes 455 exposing top surfaces of the active regions, respectively. When the second contact holes 455 are formed, theisolation layer pattern 320 may be partially etched. In example embodiments, a plurality of second contact holes 455 may be formed in the first direction between the first bit line structures. In example embodiments, the second contact holes 455 may be formed to be self-aligned with the first bit line structures, and two second contact holes 455 may be formed on each active region. - A
second contact plug 462 filling a lower portion of eachsecond contact hole 455 may be formed. The second contact plugs 462 may be formed by forming a first conductive layer on the exposed top surfaces of the active regions, the first bit line structures, and the second insulatinginterlayer 450 to sufficiently fill the second contact holes 455, and by removing an upper portion of the first conductive layer. The first conductive layer may be formed to include, e.g., doped polysilicon. - Metal silicide patterns (not shown) may be further formed on top surfaces of the second contact plugs 462, thereby reducing a resistance between the second contact plugs 462 and landing pads 472 (refer to
FIGS. 44 and 45 ) subsequently formed. - Referring to
FIG. 42 , a secondconductive layer 470 may be formed on the second contact plugs 462, the first bit line structures and the second insulatinginterlayer 450 to sufficiently fill remaining portions of the second contact holes 455. The secondconductive layer 470 may be formed to include a metal, e.g., tungsten, aluminum, copper, etc. - Alternatively, after a third conductive layer (not shown) is formed on the second contact plugs 462, the first bit line structures, and the second insulating
interlayer 450 to sufficiently fill remaining portions of the second contact holes 455, an upper portion of the third conductive layer may be planarized until top surfaces of the first bit line structures and the second insulatinginterlayer 450 may be exposed to form contact plugs (not shown), and a fourth conductive layer (not shown) serving as a pad layer may be formed on the contact plugs, the first bit line structures and the second insulatinginterlayer 450. Hereinafter, only the case in which the second conductive layer 470 (serving as both of the contact plug and the pad layer) is formed will be illustrated. - Referring to
FIG. 43 , processes substantially the same as or similar to those illustrated with reference toFIGS. 1 to 23 may be performed. That is, a DPT process using thefirst photoresist pattern 160 extending in a waveform along the first direction and a DPT process using thesecond photoresist pattern 250 extending in a straight line in the second direction may be sequentially performed to pattern an upper portion of the secondconductive layer 470. - Thus, referring to
FIGS. 44 and 45 , the landing pads 472 (each of which may include an upper portion having the shape of thepads 102 inFIG. 24 ) may be formed. A lower portion of eachlanding pad 472 may contact a top surface of eachsecond contact plug 462. - Referring to
FIG. 46 ,capacitors 530 contacting thelanding pads 472, respectively, may be formed to complete the semiconductor device. - That is, a third
insulating interlayer 480 may be formed on the first bit line structures and the second insulatinginterlayer 450 to cover thelanding pads 472, an upper portion of the third insulatinginterlayer 480 may be planarized until a top surface of thelanding pads 472 may be exposed. Anetch stop layer 490 and a mold layer (not shown) may be sequentially formed on the third insulatinginterlayer 480 and thelanding pads 472, and may be partially etched to form third contact holes (not shown) exposing top surfaces of thelanding pads 472, respectively. In the etching process, a top surface of the third insulatinginterlayer 480 may also be partially exposed. In example embodiments, the third contact holes may form a honeycomb structure. That is, the third contact holes may be formed at positions corresponding to vertices and centers of hexagons when viewed from a top side. - After a lower electrode layer is formed on sidewalls of the third contact holes, the exposed top surfaces of the
landing pads 472, the exposed top surface of the third insulatinginterlayer 480, and the mold layer, a sacrificial layer (not shown) may be formed on the lower electrode layer to sufficiently fill remaining portions of the third contact holes, and upper portions of the sacrificial layer and the lower electrode layer may be planarized until a top surface of the mold layer is exposed to divide the lower electrode layer into a plurality of pieces. The sacrificial layer and the mold layer may be removed. Thus, a plurality of cylindricallower electrodes 500 may be formed on the sidewalls of the third contact holes, the exposed top surfaces of thelanding pads 472, and the exposed top surface of the third insulatinginterlayer 480, and thelower electrodes 500 may form a honeycomb structure in accordance with the honeycomb structure of the third contact holes. Alternatively, a plurality of pillar-shaped lower electrodes may be formed instead of the plurality of cylindricallower electrodes 500, and in this case, the lower electrode layer may entirely fill the third contact holes and the sacrificial layer may not be formed. Hereinafter, only the case in which the cylindricallower electrodes 500 are formed will be illustrated. - A
dielectric layer 510 may be formed on thelower electrodes 500 and theetch stop layer 490, and anupper electrode 520 may be formed on thedielectric layer 510 to form thecapacitors 530, each of which may include thelower electrode 500, thedielectric layer 510, and theupper electrode 520. The lower andupper electrodes dielectric layer 510 may be formed to include a metal oxide, silicon oxide, etc. -
FIG. 47 is a plan view illustrating locations of the second contact plugs 462, thelanding pads 472, and thelower electrodes 500 in the semiconductor device ofFIG. 46 . InFIG. 47 , only shapes of the upper portions of thelanding pads 472 are shown. - Referring to
FIG. 47 , the second contact plugs 462 may be arranged at a given distance from each other in the first direction between thesecond spacers 442 of the first bit line structures, and thelanding pads 472 may be formed to contact top surfaces of the second contact plugs 462, respectively. Thelanding pads 472 may be disposed in the first direction in a waveform that may fluctuate toward the second direction. That is, thelanding pads 472 may be disposed in a zigzag fashion in the first direction. Thus, when viewed from a top side, a second center C2 of eachlanding pad 472 may not be coincident with a first center C1 of the correspondingsecond contact plug 462, and may be spaced apart from the first center C1 by a first distance D1. - The
lower electrodes 500 may be arranged in a honeycomb structure in consideration of making best use of space and avoiding mutual interference therebetween. That is, thelower electrodes 500 may be arranged at positions corresponding to vertices and centers of hexagons when viewed from a top side. Thus, the positions of thelower electrodes 500 may be different from those of the second contact plugs 462 when viewed from a top side. In order to electrically connect the second contact plugs 462 with thelower electrodes 500, thelanding pads 472 may be formed therebetween. In example embodiments, the second center C2 of eachlanding pad 472 may be located between the first center C1 of eachsecond contact plug 462 and a third center C3 of eachlower electrode 500, when viewed from a top side. - If the
landing pads 472 are formed in a honeycomb structure like thelower electrodes 500, and thus the second center C2 of eachlanding pad 472 may be coincident with the third center C3 of the correspondinglower electrode 500, resistance between thelanding pads 472 and the second contact plugs 462 may be high due to the small contact area therebetween. However, in accordance with example embodiments, the second center C2 of eachlanding pad 472 may be located between the first center C1 of eachsecond contact plug 462 and the third center C3 of eachlower electrode 500, and thus resistance between thelanding pads 472 and the second contact plugs 462 may be reduced. - If the
landing pads 472 are formed such that the second center C2 of eachlanding pad 472 may be coincident with the first center C1 of the correspondingsecond contact plug 462, the resistance between thelanding pads 472 and thelower electrodes 500 may be relatively high due to the small contact area therebetween. However, in accordance with example embodiments, second center C2 of eachlanding pad 472 may be located between the first center C1 of eachsecond contact plug 462 and the third center C3 of eachlower electrode 500, and thus resistance between thelanding pads 472 and thelower electrodes 500 may be reduced. - That is, according to the first distance D1 between the second center C2 of each
landing pad 472 and the first center C1 of eachsecond contact plug 462, and a second distance D2 between the second center C2 of eachlanding pad 472 and the third center C3 of eachlower electrode 500, resistance between thelanding pads 472 and the second contact plugs 462 and resistance between thelanding pads 472 and thelower electrodes 500 may be changed. In example embodiments, the locations of thelanding pads 472 may be controlled by changing the fluctuation amplitude of thefirst photoresist pattern 160 toward the second direction, so that the first and second distances D1 and D2 may be easily controlled. Thus, in accordance with example embodiments, the resistance between thelanding pads 472 and the second contact plugs 462 and the resistance between thelanding pads 472 and thelower electrodes 500 may be controlled by changing the relative locations of the second contact plugs 462, thelanding pads 472, and thelower electrodes 500. -
FIG. 48 is a plan view illustrating the locations of the second contact plugs 462, thelanding pads 472, and thelower electrodes 500 in the semiconductor device in accordance with other example embodiments.FIG. 49 is a cross-sectional view of the semiconductor device inFIG. 48 . - Referring to
FIGS. 48 and 49 , a third distance D3 between the second center C2 of eachlanding pad 472 and the first center C1 of the correspondingsecond contact plug 462 is smaller than the first distance D1 in the semiconductor device ofFIG. 47 , and a fourth distance D4 between the second center C2 of eachlanding pad 472 and the third center C3 of the correspondinglower electrode 500 is larger than the second distance D2 in the semiconductor device ofFIG. 47 . Thus, resistance between thelanding pads 472 and the second contact plugs 462 and resistance between thelanding pads 472 and thelower electrodes 500 in the semiconductor device ofFIGS. 48 and 49 may be different from those of the semiconductor device ofFIG. 47 . - As illustrated above, in accordance with example embodiments, a desired layout of the landing pads may be implemented by performing a DPT process only twice.
- Present inventive concepts may be applied to various types of semiconductor devices including pattern structures, e.g., pads, masks, wirings, etc. For example, present inventive concepts may be applied to forming capacitor landing pads in a cell region or bit lines in a peripheral circuit region in a DRAM device including planar transistors, or forming active patterns in a DRAM device including vertical channel transistors. In the latter case, after forming a mask layer on a substrate, the mask layer may be patterned by the method of forming pads illustrated with reference to
FIGS. 1 to 26 to form a plurality of masks. An upper portion of the substrate may be etched using the plurality of masks as an etching mask to form active patterns. - As discussed herein, a pad may be a conductive landing pad providing electrical coupling between a memory cell capacitor and a source/drain region of a memory cell access transistor. More particularly, the conductive landing pad may provide electrical coupling to an electrode of the memory cell capacitor. According to some other embodiments, the pad may be a conductive landing pad providing electrical coupling between a bit line and a source/drain region(s) of a memory cell access transistor(s). According to still other embodiments, the pad may be a portion of a capacitor electrode or any other electrode. According to yet other embodiments, the pad may be any other conductive pattern.
- While example embodiments have been particularly shown and described, it will be understood by one of ordinary skill in the art that variations in form and detail may be made therein without departing from the spirit and scope of the claims.
Claims (23)
1.-22. (canceled)
23. An electronic device comprising:
a substrate; and
a plurality of spaced apart pads on the substrate, wherein each of the pads includes first, second, third, and fourth sides, wherein the first and third sides are opposite sides that are substantially straight, and wherein the second and fourth sides are opposite sides that are curved.
24. The electronic device of claim 23 wherein the plurality of pads are arranged in linear columns in a direction that is parallel with the first and third sides, and wherein a center line connecting centers of adjacent pads of different columns defines an angle of at least 60 degrees and less than 90 degrees relative to the direction that is parallel with the first and third sides.
25. The electronic device of claim 23 wherein one of the second and fourth sides is concave and the other of the second and fourth sides is convex.
26. The electronic device of claim 25 wherein the plurality of pads are arranged in linear columns, wherein pads of a first column are arranged with the convex sides pointing in a first direction parallel to a direction of the columns, wherein pads of a second column are arranged with the convex sides pointing in a second direction parallel to the direction of the columns, and wherein the first and second directions are opposite directions.
27. The electronic device of claim 23 wherein the substrate includes a plurality of memory cell transistors, and wherein each of the spaced apart pads is electrically coupled to a source/drain region of a respective one of the memory cell transistors.
28. The electronic device of claim 27 further comprising:
a plurality of memory cell capacitors wherein each of the memory cell capacitors is electrically coupled to a respective one of the pads.
29. An electronic device comprising:
a substrate; and
a plurality of spaced apart pads on the substrate, wherein each of the pads includes first and second opposing sides wherein the first side is concave and the second side is convex.
30. The electronic device of claim 29 wherein each of the pads includes third and fourth opposing sides extending between the first and second sides, and wherein the third and fourth sides are opposite sides that are substantially straight.
31. The electronic device of claim 29 wherein the plurality of pads are arranged in linear columns in a direction that is parallel with the first and third sides, and wherein a center line connecting centers of adjacent pads of different columns defines an angle of at least 60 degrees and less than 90 degrees relative to the direction that is parallel with the first and third sides.
32. The electronic device of claim 29 wherein the plurality of pads are arranged in linear columns, wherein pads of a first column are arranged with the convex sides pointing in a first direction parallel to a direction of the columns, wherein pads of a second column are arranged with the convex sides pointing in a second direction parallel to the direction of the columns, and wherein the first and second directions are opposite directions.
33. The electronic device of claim 29 wherein the substrate includes a plurality of memory cell transistors, and wherein each of the spaced apart pads is electrically coupled to a source/drain region of a respective one of the memory cell transistors.
34. The electronic device of claim 33 further comprising:
a plurality of memory cell capacitors wherein each of the memory cell capacitors is electrically coupled to a respective one of the pads.
35. An electronic device comprising:
a substrate; and
a plurality of spaced apart pads on the substrate, wherein the plurality of pads are arranged in linear columns, and wherein a center line connecting centers of adjacent pads of different columns defines an angle of at least 60 degrees and less than 90 degrees relative to a direction of the columns.
36. The electronic device of claim 35 wherein each of the pads includes first, second, third, and fourth sides, wherein the first and third sides are opposite sides that are substantially straight, and wherein the second and fourth sides are opposite sides that are curved.
37. The electronic device of claim 36 wherein one of the second and fourth sides is concave and the other of the second and fourth sides is convex.
38. The electronic device of claim 37 wherein pads of a first column are arranged with the convex sides pointing in a first direction parallel to the direction of the columns, wherein pads of a second column are arranged with the convex sides pointing in a second direction parallel to the direction of the columns, and wherein the first and second directions are opposite directions.
39. The electronic device of claim 35 wherein the substrate includes a plurality of memory cell transistors, and wherein each of the spaced apart pads is electrically coupled to a source/drain region of a respective one of the memory cell transistors.
40. The electronic device of claim 39 further comprising:
a plurality of memory cell capacitors wherein each of the memory cell capacitors is electrically coupled to a respective one of the pads.
41. A dynamic random access memory device comprising:
a substrate including a plurality of memory cell transistors;
a plurality of spaced apart pads on the substrate wherein each of the spaced apart pads is electrically coupled to a source/drain region of a respective one of the memory cell transistors, wherein the plurality of pads are arranged in linear columns, and wherein a center line connecting centers of adjacent pads of different columns defines an angle of at least 60 degrees and less than 90 degrees relative to a direction of the columns; and
a plurality of memory cell capacitors wherein each of the memory cell capacitors is electrically coupled to a respective one of the pads.
42. The dynamic random access memory device of claim 41 wherein each of the pads includes first, second, third, and fourth sides, wherein the first and third sides are opposite sides that are substantially straight, and wherein the second and fourth sides are opposite sides that are curved.
43. The dynamic random access memory device of claim 42 wherein one of the second and fourth sides is concave and the other of the second and fourth sides is convex.
44. The dynamic random access memory device of claim 43 wherein pads of a first column are arranged with the convex sides pointing in a first direction parallel to the direction of the columns, wherein pads of a second column are arranged with the convex sides pointing in a second direction parallel to the direction of the columns, and wherein the first and second directions are opposite directions.
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US14/847,324 US9461051B2 (en) | 2013-06-20 | 2015-09-08 | Methods of forming electronic devices having pads using first and second masks |
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KR1020130070688A KR102064265B1 (en) | 2013-06-20 | 2013-06-20 | Methods of forming pads, methods of manufacturing semiconductor devices using the same, conductive pad arrays, and semiconductor devices including the same |
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US14/847,324 Continuation US9461051B2 (en) | 2013-06-20 | 2015-09-08 | Methods of forming electronic devices having pads using first and second masks |
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US14/847,324 Active US9461051B2 (en) | 2013-06-20 | 2015-09-08 | Methods of forming electronic devices having pads using first and second masks |
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KR20200085512A (en) * | 2019-01-07 | 2020-07-15 | 삼성전자주식회사 | Method of forming a pattern and method of manufacturing a semiconductor device using the same |
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Also Published As
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KR20140147434A (en) | 2014-12-30 |
US9461051B2 (en) | 2016-10-04 |
US20160027787A1 (en) | 2016-01-28 |
KR102064265B1 (en) | 2020-01-09 |
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