US20140147353A1 - Compositions and methods for the separation of metals - Google Patents
Compositions and methods for the separation of metals Download PDFInfo
- Publication number
- US20140147353A1 US20140147353A1 US13/820,358 US201113820358A US2014147353A1 US 20140147353 A1 US20140147353 A1 US 20140147353A1 US 201113820358 A US201113820358 A US 201113820358A US 2014147353 A1 US2014147353 A1 US 2014147353A1
- Authority
- US
- United States
- Prior art keywords
- metal
- solution
- substrate
- solvent
- gold
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 141
- 239000002184 metal Substances 0.000 title claims abstract description 141
- 238000000034 method Methods 0.000 title claims abstract description 101
- 239000000203 mixture Substances 0.000 title abstract description 42
- 150000002739 metals Chemical class 0.000 title abstract description 40
- 238000000926 separation method Methods 0.000 title description 4
- 238000006243 chemical reaction Methods 0.000 claims abstract description 73
- 239000000758 substrate Substances 0.000 claims abstract description 56
- 150000003839 salts Chemical class 0.000 claims abstract description 27
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 110
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical group ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 claims description 100
- 239000002904 solvent Substances 0.000 claims description 79
- 239000010931 gold Substances 0.000 claims description 77
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 73
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical group CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims description 63
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 57
- 229910000510 noble metal Inorganic materials 0.000 claims description 49
- 229910052697 platinum Inorganic materials 0.000 claims description 46
- 229910006124 SOCl2 Inorganic materials 0.000 claims description 44
- 229910052737 gold Inorganic materials 0.000 claims description 44
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 42
- 239000010949 copper Substances 0.000 claims description 41
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 41
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 35
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical group CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 28
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 claims description 27
- 229910052802 copper Inorganic materials 0.000 claims description 27
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 26
- 229910052763 palladium Inorganic materials 0.000 claims description 22
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 21
- 229910052709 silver Inorganic materials 0.000 claims description 21
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 claims description 20
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 19
- 239000004332 silver Substances 0.000 claims description 19
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 16
- 229910052759 nickel Inorganic materials 0.000 claims description 11
- 239000003960 organic solvent Substances 0.000 claims description 11
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 claims description 10
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 claims description 10
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 claims description 10
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 claims description 9
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 claims description 9
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 claims description 9
- ZLTPDFXIESTBQG-UHFFFAOYSA-N isothiazole Chemical compound C=1C=NSC=1 ZLTPDFXIESTBQG-UHFFFAOYSA-N 0.000 claims description 9
- CTAPFRYPJLPFDF-UHFFFAOYSA-N isoxazole Chemical compound C=1C=NOC=1 CTAPFRYPJLPFDF-UHFFFAOYSA-N 0.000 claims description 9
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 claims description 9
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 claims description 9
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 8
- 229910052738 indium Inorganic materials 0.000 claims description 8
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 8
- 229910052742 iron Inorganic materials 0.000 claims description 8
- 239000011135 tin Substances 0.000 claims description 8
- 229910052718 tin Inorganic materials 0.000 claims description 8
- 125000003342 alkenyl group Chemical group 0.000 claims description 7
- 125000000304 alkynyl group Chemical group 0.000 claims description 7
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 7
- 150000004820 halides Chemical class 0.000 claims description 7
- 238000003756 stirring Methods 0.000 claims description 6
- 239000012071 phase Substances 0.000 claims description 5
- 239000012808 vapor phase Substances 0.000 claims description 4
- 238000002156 mixing Methods 0.000 claims description 3
- 125000005843 halogen group Chemical group 0.000 claims 1
- 239000003153 chemical reaction reagent Substances 0.000 abstract description 38
- 125000000475 sulfinyl group Chemical group [*:2]S([*:1])=O 0.000 abstract description 35
- 239000000243 solution Substances 0.000 description 108
- 239000002105 nanoparticle Substances 0.000 description 39
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 21
- 238000004090 dissolution Methods 0.000 description 16
- 238000005530 etching Methods 0.000 description 12
- -1 but not limited to Substances 0.000 description 11
- 239000003054 catalyst Substances 0.000 description 11
- 239000000463 material Substances 0.000 description 11
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 description 10
- 230000003647 oxidation Effects 0.000 description 10
- 238000007254 oxidation reaction Methods 0.000 description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 9
- 239000011258 core-shell material Substances 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 238000012546 transfer Methods 0.000 description 8
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 7
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 6
- 229910052804 chromium Inorganic materials 0.000 description 6
- 239000011651 chromium Substances 0.000 description 6
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 6
- 238000002386 leaching Methods 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- QGLWBTPVKHMVHM-KTKRTIGZSA-N (z)-octadec-9-en-1-amine Chemical compound CCCCCCCC\C=C/CCCCCCCCN QGLWBTPVKHMVHM-KTKRTIGZSA-N 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 150000001450 anions Chemical class 0.000 description 5
- 230000003993 interaction Effects 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 238000004064 recycling Methods 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- 238000000527 sonication Methods 0.000 description 5
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- PVMNPAUTCMBOMO-UHFFFAOYSA-N 4-chloropyridine Chemical compound ClC1=CC=NC=C1 PVMNPAUTCMBOMO-UHFFFAOYSA-N 0.000 description 4
- KDCGOANMDULRCW-UHFFFAOYSA-N 7H-purine Chemical compound N1=CNC2=NC=NC2=C1 KDCGOANMDULRCW-UHFFFAOYSA-N 0.000 description 4
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical group [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 4
- 229910021592 Copper(II) chloride Inorganic materials 0.000 description 4
- QOSSAOTZNIDXMA-UHFFFAOYSA-N Dicylcohexylcarbodiimide Chemical compound C1CCCCC1N=C=NC1CCCCC1 QOSSAOTZNIDXMA-UHFFFAOYSA-N 0.000 description 4
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 4
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 4
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 238000005065 mining Methods 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 238000001556 precipitation Methods 0.000 description 4
- 230000009257 reactivity Effects 0.000 description 4
- 238000006722 reduction reaction Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- YGAILVDTGIMZAB-UHFFFAOYSA-N 3-pyrazol-3-ylidenepyrazole Chemical compound N1=NC=CC1=C1N=NC=C1 YGAILVDTGIMZAB-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 238000001157 Fourier transform infrared spectrum Methods 0.000 description 3
- 238000001069 Raman spectroscopy Methods 0.000 description 3
- 238000001237 Raman spectrum Methods 0.000 description 3
- 150000004703 alkoxides Chemical class 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 125000000129 anionic group Chemical group 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 3
- 230000003197 catalytic effect Effects 0.000 description 3
- 150000001768 cations Chemical class 0.000 description 3
- 238000005119 centrifugation Methods 0.000 description 3
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 3
- 238000004821 distillation Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000000446 fuel Substances 0.000 description 3
- 238000001819 mass spectrum Methods 0.000 description 3
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 3
- 238000006384 oligomerization reaction Methods 0.000 description 3
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 3
- PQYPWQNZJONUFT-UHFFFAOYSA-M pyridin-1-ium-1-sulfinyl chloride;chloride Chemical compound [Cl-].ClS(=O)[N+]1=CC=CC=C1 PQYPWQNZJONUFT-UHFFFAOYSA-M 0.000 description 3
- 238000011084 recovery Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 238000002198 surface plasmon resonance spectroscopy Methods 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- HFRXJVQOXRXOPP-UHFFFAOYSA-N thionyl bromide Chemical compound BrS(Br)=O HFRXJVQOXRXOPP-UHFFFAOYSA-N 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 230000004580 weight loss Effects 0.000 description 3
- NZFLWVDXYUGFAV-UHFFFAOYSA-N 1-methyl-2-acetylpyrrole Chemical compound CC(=O)C1=CC=CN1C NZFLWVDXYUGFAV-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- GSNUFIFRDBKVIE-UHFFFAOYSA-N DMF Natural products CC1=CC=C(C)O1 GSNUFIFRDBKVIE-UHFFFAOYSA-N 0.000 description 2
- 229910004044 HAuCl4.3H2O Inorganic materials 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical class Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- 229910006121 SOBr2 Inorganic materials 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 238000001460 carbon-13 nuclear magnetic resonance spectrum Methods 0.000 description 2
- 238000006555 catalytic reaction Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 150000001879 copper Chemical class 0.000 description 2
- 229910052593 corundum Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000010494 dissociation reaction Methods 0.000 description 2
- 230000005593 dissociations Effects 0.000 description 2
- XJWSAJYUBXQQDR-UHFFFAOYSA-M dodecyltrimethylammonium bromide Chemical compound [Br-].CCCCCCCCCCCC[N+](C)(C)C XJWSAJYUBXQQDR-UHFFFAOYSA-M 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- FDWREHZXQUYJFJ-UHFFFAOYSA-M gold monochloride Chemical compound [Cl-].[Au+] FDWREHZXQUYJFJ-UHFFFAOYSA-M 0.000 description 2
- JUWSSMXCCAMYGX-UHFFFAOYSA-N gold platinum Chemical compound [Pt].[Au] JUWSSMXCCAMYGX-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 description 2
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002082 metal nanoparticle Substances 0.000 description 2
- 238000001465 metallisation Methods 0.000 description 2
- FDRVTDDJHPPAGK-UHFFFAOYSA-N n,n-dimethylformamide;thionyl dichloride Chemical compound ClS(Cl)=O.CN(C)C=O FDRVTDDJHPPAGK-UHFFFAOYSA-N 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 229920000767 polyaniline Polymers 0.000 description 2
- CPNGPNLZQNNVQM-UHFFFAOYSA-N pteridine Chemical compound N1=CN=CC2=NC=CN=C21 CPNGPNLZQNNVQM-UHFFFAOYSA-N 0.000 description 2
- JEXVQSWXXUJEMA-UHFFFAOYSA-N pyrazol-3-one Chemical compound O=C1C=CN=N1 JEXVQSWXXUJEMA-UHFFFAOYSA-N 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000010944 silver (metal) Substances 0.000 description 2
- 238000004088 simulation Methods 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- WXAZIUYTQHYBFW-UHFFFAOYSA-N tris(4-methylphenyl)phosphane Chemical compound C1=CC(C)=CC=C1P(C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 WXAZIUYTQHYBFW-UHFFFAOYSA-N 0.000 description 2
- 238000002371 ultraviolet--visible spectrum Methods 0.000 description 2
- 229910001868 water Inorganic materials 0.000 description 2
- 229910001845 yogo sapphire Inorganic materials 0.000 description 2
- HRANPRDGABOKNQ-ORGXEYTDSA-N (1r,3r,3as,3br,7ar,8as,8bs,8cs,10as)-1-acetyl-5-chloro-3-hydroxy-8b,10a-dimethyl-7-oxo-1,2,3,3a,3b,7,7a,8,8a,8b,8c,9,10,10a-tetradecahydrocyclopenta[a]cyclopropa[g]phenanthren-1-yl acetate Chemical compound C1=C(Cl)C2=CC(=O)[C@@H]3C[C@@H]3[C@]2(C)[C@@H]2[C@@H]1[C@@H]1[C@H](O)C[C@@](C(C)=O)(OC(=O)C)[C@@]1(C)CC2 HRANPRDGABOKNQ-ORGXEYTDSA-N 0.000 description 1
- 125000006727 (C1-C6) alkenyl group Chemical group 0.000 description 1
- 125000006728 (C1-C6) alkynyl group Chemical group 0.000 description 1
- KLFRPGNCEJNEKU-FDGPNNRMSA-L (z)-4-oxopent-2-en-2-olate;platinum(2+) Chemical compound [Pt+2].C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O KLFRPGNCEJNEKU-FDGPNNRMSA-L 0.000 description 1
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 1
- NVAOLENBKNECGF-UHFFFAOYSA-N 2-phenylpropanenitrile Chemical compound N#CC(C)C1=CC=CC=C1 NVAOLENBKNECGF-UHFFFAOYSA-N 0.000 description 1
- XVMSFILGAMDHEY-UHFFFAOYSA-N 6-(4-aminophenyl)sulfonylpyridin-3-amine Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=N1 XVMSFILGAMDHEY-UHFFFAOYSA-N 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 1
- 229910003803 Gold(III) chloride Inorganic materials 0.000 description 1
- 229910003594 H2PtCl6.6H2O Inorganic materials 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical compound C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 description 1
- CKFWDDBBHPLQCY-UHFFFAOYSA-N [3-[(4-fluorophenyl)carbamoyl]phenyl]boronic acid Chemical compound OB(O)C1=CC=CC(C(=O)NC=2C=CC(F)=CC=2)=C1 CKFWDDBBHPLQCY-UHFFFAOYSA-N 0.000 description 1
- CMHKGULXIWIGBU-UHFFFAOYSA-N [Fe].[Pt] Chemical compound [Fe].[Pt] CMHKGULXIWIGBU-UHFFFAOYSA-N 0.000 description 1
- KGCZCJMWEGKYMC-UHFFFAOYSA-N [Ni].[Cu].[Pt] Chemical compound [Ni].[Cu].[Pt] KGCZCJMWEGKYMC-UHFFFAOYSA-N 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000003637 basic solution Substances 0.000 description 1
- 229940045348 brown mixture Drugs 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001728 carbonyl compounds Chemical class 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 150000003841 chloride salts Chemical class 0.000 description 1
- 150000001805 chlorine compounds Chemical group 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- BUOVWYNELHQYBG-UHFFFAOYSA-N copper gold platinum Chemical compound [Cu][Au][Pt] BUOVWYNELHQYBG-UHFFFAOYSA-N 0.000 description 1
- WBLJAACUUGHPMU-UHFFFAOYSA-N copper platinum Chemical compound [Cu].[Pt] WBLJAACUUGHPMU-UHFFFAOYSA-N 0.000 description 1
- 238000002484 cyclic voltammetry Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- VBXGEZFROCINDO-UHFFFAOYSA-N gold nickel platinum Chemical compound [Ni][Pt][Au] VBXGEZFROCINDO-UHFFFAOYSA-N 0.000 description 1
- RJHLTVSLYWWTEF-UHFFFAOYSA-K gold trichloride Chemical compound Cl[Au](Cl)Cl RJHLTVSLYWWTEF-UHFFFAOYSA-K 0.000 description 1
- 239000010438 granite Substances 0.000 description 1
- 231100001261 hazardous Toxicity 0.000 description 1
- 235000011167 hydrochloric acid Nutrition 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 238000001095 inductively coupled plasma mass spectrometry Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 238000005272 metallurgy Methods 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- PCLURTMBFDTLSK-UHFFFAOYSA-N nickel platinum Chemical compound [Ni].[Pt] PCLURTMBFDTLSK-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 150000002940 palladium Chemical class 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- 238000005120 petroleum cracking Methods 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- FHMDYDAXYDRBGZ-UHFFFAOYSA-N platinum tin Chemical compound [Sn].[Pt] FHMDYDAXYDRBGZ-UHFFFAOYSA-N 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000005588 protonation Effects 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- NZHCQRVEGNBTRP-UHFFFAOYSA-N pyrazol-3-one;1h-pyrrole Chemical compound C=1C=CNC=1.O=C1C=CN=N1 NZHCQRVEGNBTRP-UHFFFAOYSA-N 0.000 description 1
- YOXCYXPIIFUVDQ-UHFFFAOYSA-N pyridine;thionyl dichloride Chemical compound ClS(Cl)=O.C1=CC=NC=C1 YOXCYXPIIFUVDQ-UHFFFAOYSA-N 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000012429 reaction media Substances 0.000 description 1
- 230000008707 rearrangement Effects 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 239000011435 rock Substances 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- SDKPSXWGRWWLKR-UHFFFAOYSA-M sodium;9,10-dioxoanthracene-1-sulfonate Chemical compound [Na+].O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2S(=O)(=O)[O-] SDKPSXWGRWWLKR-UHFFFAOYSA-M 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- 238000001845 vibrational spectrum Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B7/00—Working up raw materials other than ores, e.g. scrap, to produce non-ferrous metals and compounds thereof; Methods of a general interest or applied to the winning of more than two metals
- C22B7/006—Wet processes
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B3/00—Extraction of metal compounds from ores or concentrates by wet processes
- C22B3/20—Treatment or purification of solutions, e.g. obtained by leaching
- C22B3/26—Treatment or purification of solutions, e.g. obtained by leaching by liquid-liquid extraction using organic compounds
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B11/00—Obtaining noble metals
- C22B11/04—Obtaining noble metals by wet processes
- C22B11/042—Recovery of noble metals from waste materials
- C22B11/046—Recovery of noble metals from waste materials from manufactured products, e.g. from printed circuit boards, from photographic films, paper or baths
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/12—Gaseous compositions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/44—Compositions for etching metallic material from a metallic material substrate of different composition
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Definitions
- the various embodiments of the present invention relate generally to the reaction of thionyl reagents with metals, the use of that reaction to selectively separate metals from mixtures and more particularly to compositions and methods for achieving the separation.
- Aqua regia (“royal water”) has been used for centuries as a powerful etchant to dissolve noble metals.
- Aqua regia is a simple 1:3 mixture of concentrated nitric and hydrochloric acids can dissolve noble metals such as gold, palladium, and platinum while these metals are not soluble in either of the acids independently.
- conventional platinum recovery is complicated by its reliance on aqua regia and possible subsequent precipitation of the dissolved platinum from the solution.
- Aqua regia dissolves all the metals at the same time and cannot separate them out, resulting in low-purity platinum which cannot go back to the product stream directly; it has to be refined, but refining is costly. Moreover, aqua regia is relatively dangerous to work with, is not readily recyclable, and is considered by many to be environmentally hazardous.
- bimetallic nanoparticles of noble metal elements will also require selective separation of metals during recycling.
- Au—Pt core-shell nanoparticles sometimes called platinum-decorated gold nanoparticles, platinum-layered gold nanoparticles, or gold-platinum dendritic hetero-aggregate nanoparticles to account for the morphology of the non-uniform and porous platinum shell
- platinum-decorated gold nanoparticles platinum-layered gold nanoparticles
- gold-platinum dendritic hetero-aggregate nanoparticles to account for the morphology of the non-uniform and porous platinum shell
- the various embodiments of the present invention provide methods and compositions for reactions of metals with thionyl reagents, methods of selectively separating metals from substrates, methods of selectively separating metals from other metals, methods of removing metals from materials, compositions for conducting the methods, and compositions resulting from the methods.
- An exemplary embodiment of the present invention is a method for preparing a metal salt.
- the method comprises reacting a metal with a solution comprising SOX 1 X 2 , wherein X 1 is Cl or Br and X 2 is a halide, OR 1 or NR 2 R 3 and R 1 , R 2 , and R 3 are each independently a C 1 -C 6 alkyl, alkenyl, alkynyl, or carbonyl.
- X 2 can be Cl, Br, or OR.
- SOX 1 X 2 can be SOCl 2 .
- the metal can be any metal that is not a passivated metal.
- the metal can be copper, nickel, iron, tin, indium, silver, gold or palladium.
- the metal can be silver, gold or palladium.
- the solution can contain a donor solvent.
- the donor solvent can be N,N′-dimethylformamide, pyridine, imidazole, thiazole, oxazole, pyridazine, pyrimidine, pyrazine, triazine, pyrrolidine, pyrrolidone, isoxazole, isothiazole, or pyrazole.
- the donor solvent can be N,N′-dimethylformamide, pyridine or imidazole.
- Another exemplary embodiment of the present invention is a method for separating at least one metal from a substrate, the method comprising introducing the substrate by solution phase contact or vapor phase contact to a solution comprising SOX 1 X 2 , reacting the at least one metal with at least a portion of the SOX 1 X 2 in the solution to form a reaction solution, wherein the reaction solution contains a metal salt of the at least one metal, and separating the reaction solution containing the metal salt from the substrate.
- the metal can be copper, nickel, iron, tin, indium, silver, gold or palladium, or a combination thereof.
- reacting the metal can include stirring, heating the solution, sonicating the solution, or causing the solution to flow across the substrate.
- the solution can contain a dissolving solvent.
- the dissolving solvent can be an organic solvent.
- the dissolving solvent can be acetonitrile.
- the method can also include the steps of recovering at least a portion of the substrate that was separated from the reaction solution, and repeating the previous steps with the recovered substrate.
- the substrate can include platinum.
- Another exemplary embodiment of the present invention can be a reaction solution containing a metal salt, a thionyl reagent and a donor solvent.
- the thionyl reagent can be SOCl 2 or SOBr 2 .
- the metal salt can be a copper salt, a silver salt, a gold salt, a palladium salt or a combination thereof.
- the donor solvent can be pyridine, DMF, or imidazole.
- a method for selectively separating at least one metal from a substrate that has platinum and the at least one metal comprises introducing the substrate to an organic solution comprising SOX 1 X 2 and a donor solvent, reacting the at least one other metal with the organic solution to form a reaction solution, wherein the reaction solution contains a metal salt of the at least one other metal, and separating the reaction solution containing the metal salt from the substrate containing the platinum.
- the X 1 can be Cl or Br and X 2 can be a halide, OR 1 or NR 2 R 3 , where R 1 , R 2 , and R 3 are each independently a C 1 -C 6 alkyl, alkenyl, alkynyl, or carbonyl.
- the donor solvent can be N,N′-dimethylformamide, pyridine, imidazole, thiazole, oxazole, pyridazine, pyrimidine, pyrazine, triazine, pyrrolidine, pyrrolidone, isoxazole, isothiazole, or pyrazole.
- the donor solvent can be N,N′-dimethylformamide, pyridine or imidazole.
- the at least one metal can be copper, nickel, iron, tin, indium, silver, gold or palladium or a combination thereof. In another embodiment, the at least one metal can be gold, silver, or palladium.
- Another exemplary embodiment of the present invention is a method for separating a noble metal from a substrate comprising introducing the substrate to an organic solution having SOX 1 X 2 and a donor solvent, reacting the noble metal with at least a portion of the SOX 1 X 2 in the organic solution to form a reaction solution, where the reaction solution contains a noble metal salt of the noble metal, and separating the reaction solution containing the noble metal salt from the substrate.
- X 1 can be Cl or Br and X 2 can be a halide
- OR 1 or NR 2 R 3 and R 1 , R 2 , and R 3 are each independently a C 1 -C 6 alkyl, alkenyl, alkynyl, or carbonyl.
- X 1 and X 2 are each independently Cl or Br.
- the noble metal can be gold, silver or palladium.
- the donor solvent can be N,N′-dimethylformamide, pyridine, imidazole, thiazole, oxazole, pyridazine, pyrimidine, pyrazine, triazine, pyrrolidine, pyrrolidone, isoxazole, isothiazole, or pyrazole.
- the donor solvent is N,N′-dimethylformamide, pyridine or imidazole.
- the method can further include steps prior to the step of introducing the substrate to the organic solution having SOX 1 X 2 and a donor solvent.
- the substrate can be first treated with a non-donor solvent solution comprising SOX 1 X 2 without a donor solvent; then the substrate can be separated from the non-donor solution and subjected to the remaining steps of the method.
- a method for separating a non-noble metal from a substrate comprises introducing the substrate to an organic solution comprising SOX 1 X 2 , reacting the non-noble metal in the substrate with the organic solution to form a reaction solution, wherein the reaction solution comprises a salt of the non-noble metal from the non-noble metal on the substrate, and separating the reaction solution containing the copper salt from the substrate.
- X 1 can be Cl or Br and X 2 can be a halide
- OR 1 or NR 2 R 3 and R 1 , R 2 , and R 3 are each independently a C 1 -C 6 alkyl, alkenyl, alkynyl, or carbonyl.
- X 1 and X 2 can be each independently Cl or Br.
- the organic solution contains acetonitrile.
- the non-noble metal can be copper.
- the method can be used to prepare a copper pattern on a surface.
- the method comprises depositing a layer of copper on a surface, placing a pattern mask over the copper layer, and treating the surface of the device with an organic solution containing SOX 1 X 2 to remove the copper exposed outside the mask.
- FIG. 1 illustrates rates of reaction for different metals in accordance with exemplary embodiments of the present invention.
- FIG. 2 illustrates a reaction flow chart in accordance with exemplary embodiments of the present invention.
- FIG. 3 illustrates a vapor phase etching system in accordance with exemplary embodiments of the present invention.
- Ranges may be expressed herein as from “about” or “approximately” one particular value and/or to “about” or “approximately” another particular value. When such a range is expressed, other exemplary embodiments include from the one particular value and/or to the other particular value.
- Various embodiments of the present invention are directed to the reaction of thionyl reagents with metals. Treating various metals with a thionyl reagent, such as, but not limited to, thionyl chloride, along with a solvent, such as, but not limited to, pyridine, causes the metal to react and oxidize, creating a metallic solution.
- a thionyl reagent such as, but not limited to, thionyl chloride
- a solvent such as, but not limited to, pyridine
- Various embodiments of the present invention further comprise a series of reactions that can cause a reaction for metals on a surface and can allow for converting metals to salts, and even can allow for selective conversion in the presence of other metals.
- Various embodiments of the present invention are reactions of a metal with SOX 1 X 2 , which can be referred to as a thionyl reagent.
- X 1 and X 2 can be the same or different, and can be halides, alkoxides, or amides.
- the alkoxide, which is chemically related to an alcohol can be described as —OR 1 .
- the amide, which is chemically related to an amine can be described as —NR 2 R 3 .
- R 1 , R 2 , and R 3 can be each independently a C 1 -C 6 alkyl, a C 1 -C 6 , a C 1 -C 6 alkenyl, a C 1 -C 6 alkynyl, or a C 1 -C 6 carbonyl compound.
- X 1 is chloride or bromide.
- X 1 and X 2 can each be independently chloride or bromide.
- SOX 1 X 2 can be SOCl 2 , commonly referred to as thionyl chloride, or can be SOBr 2 , commonly referred to as thionyl bromide.
- a metal reacts with the thionyl reagent.
- the metal can be a metal in a zero oxidation state in which the reaction of the zero oxidation state metal can be an oxidation to a positive oxidation state by the oxidation with the thionyl reagent.
- the metal can be any metal known by one of ordinary skill in the art to react with a thionyl reagent.
- the metal can be nickel, copper, iron, tin, or indium, referred to herein as non-noble metals.
- the metal can be gold, silver or palladium, referred to herein as noble metals.
- Metals that do not react in the current method can include platinum, tungsten, chromium, titanium, tantalum, and silicon.
- metals that have a passivated surface may not react in the current system.
- titanium is well-known for the strength and hardness of their surface oxides, but does not react in the current system.
- Platinum is also known to have a hard passivation layer, and is similarly resistant to the reactions of the present invention.
- the passivated metal need not be actively passivated, such as when titanium is anodized, but can include naturally passivated metals. Therefore, in another embodiment of the present invention, the metal can be any metal that is not a passivated metal.
- the reaction of a metal with a thionyl reagent can produce a metal cation and can also produce a counterion, which will be anionic.
- the metal cation and anionic counterion can form a metal salt.
- the overall charge of the metal salt, comprising the metal cation and anionic counterion can be in any overall charge state, including +3, +2, +1, neutral, ⁇ 1, ⁇ 2, ⁇ 3, and so forth.
- the metal salt can be in any physical state known to one of ordinary skill in the art.
- the metal salt can be in solution, suspension, precipitated, and so forth.
- the anion of the metal salt can be any anion recognized by one of ordinary skill in the art.
- the anion can be a chloride, bromide, alkoxide, or amide salt.
- the anion can be bromide or chloride.
- the anion can also be chloride.
- a solution that can contain the thionyl reagent which reacts with a metal can also contain a solvent.
- the solvent is an organic solvent.
- the solution can also be described as an organic solution.
- the organic solvent can be a donor solvent or a dissolving solvent, or both a donor solvent and a dissolving solvent.
- the donor solvent can be any organic solvent that activates the thionyl reagent, reduces the work function of the metal being reacted, or does both.
- the donor solvent can be N,N′-dimethylformamide, pyridine, imidazole, thiazole, oxazole, pyridazine, pyrimidine, pyrazine, triazine, pyrrolidine, pyrrolidone, isoxazole, isothiazole, pyrazole, indole, quinoline, purine, pteridine, phthalocyanine, N,N′-dicyclohexylcarbodiimide, N,N′-dimethylbenzylamine, dodecyltrimethylammonium bromide, tri-p-tolyl-phosphine, pyrrole, pyrazolone, or bipyrazole.
- the donor solvent can be N,N′-dimethylformamide, pyridine, imidazole, thiazole, oxazole, pyridazine, pyrimidine, pyrazine, triazine, pyrrolidine, pyrrolidone, isoxazole, isothiazole, or pyrazole.
- the donor solvent can be N,N′-dimethylformamide, pyridine, or imidazole.
- the donor solvent appears to play two roles in the reaction encompassed by the method of the present invention.
- the donor solvent can coordinate to the surface of the metal, potentially via non-bonding electron pairs or ⁇ -bond type coordination. This would effectively reduce the work function of the metal making the surface more susceptible to oxidation.
- the donor solvent may form a charge-transfer complex with the thionyl reagent to activate it. This might potentially stabilize the complex for the dissociation of the chloride loss and for accepting the electrons from the oxidized metal. This proposed mechanism then allows for tuning the reactivity of the solution to different metals, as embodied by the method in several ways discussed herein.
- the reaction rate for the method of the present invention can be controlled by adjusting the ratio of thionyl reagent and donor solvent.
- the reaction rate varies for the ratio of thionyl reagent:donor solvent based on two competing factors.
- the dissolution/reaction rates for a gold metal in a 6:4 thionyl reagent: donor solvent solution can be faster than in a 4:6 solution.
- a 7:3 thionyl reagent: donor solvent can be faster than both a 9:1 solution and a 5:5 solution.
- the ratio of thionyl reagent:donor solvent can be in the range of about 10,000:1 to about 1:10,000. In an embodiment, the ratio can be in the range of about 100:1 to about 1:100, including in the range of about 10:1 to about 1:10. In an embodiment, the ratio can be in the range of about 7:1 to about 1:7, including in the range of about 5:1 to 1:5. In an embodiment, the ratio can be about 3:1.
- the rate can also be controlled by adjusting the donor solvent used in the reaction.
- the donor solvent used in the reaction For example, pyridine, DMF and imidazole give the swiftest reactions for the method with a metal, for example, gold.
- Other donor solvents can be relatively slower.
- the “fast” donor solvents can be N,N′-dimethylformamide, pyridine, imidazole;
- the “medium” donor solvents can be thiazole, oxazole, pyridazine, pyrimidine, pyrazine, triazine, pyrrolidine, pyrrolidone, isoxazole, isothiazole, or pyrazole;
- the “slow” donor solvents can be indole, quinoline, purine, pteridine, phthalocyanine, N,N′-dicyclohexylcarbodiimide, N,N′-dimethylbenzylamine, dodecyltrimethylammonium bro
- the slowest solvents can be acetonitrile, maleimide, azobisisobutyronitrile, aniline, polyaniline, phenanthroline, methylbenzyl cyanide, 2-acetyl-1-methylpyrrole, or benzyltriethylammonium tetrafluoroborate.
- the reaction rate for the method of the present invention can also be controlled by dilution of the solution containing the thionyl reagent. Diluting the solution with, for example, an organic solvent, can lead to a slower reaction. However, the diluted reaction can also be more efficient because it cuts down on side reactions, e.g. oligomerization of donor solvent, that consume the thionyl reagent.
- the reaction rate of the thionyl reagent with the metals in the method of the present invention can also vary based on the metal being converted to a metal salt. Across several donor solvents, the following relative order of reactivity can be established: silver can be faster than gold and both silver and gold can be faster than palladium. Platinum does not react in the current method. Copper, nickel, iron, tin and indium can be all faster than silver or gold. Silicon, silicon dioxide, titanium, tungsten, tantalum, and chromium do not react in the current method. Teflon is also inert.
- some non-noble metals can react according to the methods of the invention with thionyl reagents and a very weak donor solvent or dissolving solvent.
- a dissolving solvent can be any organic solvent that solubilizes and stabilizes the metal and/or metal salt to aid the reaction.
- the dissolving solvent can be acetonitrile.
- some donor solvents do not support the reaction of the thionyl reagents with noble metals, e.g. acetonitrile, but can nonetheless activate the oxidation and dissolution of non-noble metals and thereby act as dissolving solvents.
- the dissolving solvent does not have to be as strong an actor as the donor solvent.
- the method can be a reaction of a non-noble metal with a thionyl reagent and a dissolving solvent.
- the non-noble metal can be copper, nickel, iron, tin or indium. In another embodiment, the metal can be copper.
- the reaction of the metal with the solution containing a thionyl reagent can include any technique for controlling the reaction that is known to one of ordinary skill in the art.
- the reaction can include stirring the solution containing the thionyl reagent and the metal, heating the solution, or refluxing the solution.
- the reaction can be conducted at room temperature, above room temperature, or below room temperature.
- the reaction can include causing the solution to flow across a surface containing the substrate.
- the reaction can be conducted in a solution phase, where the substrate and/or metal is immersed or rinsed with the solution containing the thionyl reagent.
- the reaction can be conducted in the vapor phase, where the substrate is immersed in a vapor containing the solution containing the thionyl chloride.
- the reaction can be conducted with sonication.
- a method can include a step of introducing a substrate to a solution.
- the solution can also be called a first solution, a reagent solution, a thionyl solution, or a reactant solution.
- the method can also include a step of introducing a substrate to an organic solution including a thionyl reagent, in which the solution can have an organic solvent present in it.
- the method can also include reacting a metal with the solution to form a reaction solution, wherein the reacted products are present in the reaction solution.
- Some common metal combinations might include, but are not limited to, platinum-nickel, platinum-copper, platinum-palladium, platinum-gold, platinum-iron, platinum-tin, platinum-nickel-gold, platinum-gold-palladium, titania-supported metal compounds, chromium mixed metals, tungsten mixed metals, silicon-metal systems prevalent in semiconductor devices, SiO 2 -supported metals systems, metals intermixed with a rock such as granite from mining operation, and so forth.
- the method can include numerous different strategies for dissolving and separating several different metals.
- the method can include a solution of thionyl reagent that is fast reacting with any metal, for example, a 3:1 SOCl 2 :pyridine solution. Such a reaction could remove all non-passivated metals from a substrate.
- This technique might be useful for recovering a single metal from a substrate, or for removing a metal from a substrate that contains a passivated metal, e.g. platinum.
- the method can include a solution of thionyl reagent that is fast reacting with only non-noble metals, for example a SOCl 2 solution in acetonitrile.
- a solution of thionyl reagent that is fast reacting with only non-noble metals, for example a SOCl 2 solution in acetonitrile.
- Such a solution could remove all non-noble metals, and might be useful for recovering single non-noble metals, or for removing non-noble metals from a substrate containing noble metals.
- the method can be used to separate two noble metals, where a first noble metal does not react as swiftly as a second noble metal, e.g. for example, separating silver from palladium.
- the method can include a first reaction having SOCl 2 and acetonitrile to remove a non-noble metal, then a second reaction using SOCl 2 and pyridine to remove a noble metal, for example separating copper and gold sequentially from a substrate, or separating copper and gold sequentially from platinum.
- Metal salts that can be a product of one or more methods according to various embodiments of the present invention and can be contained in the reaction solution can be recovered by any technique known to one of ordinary skill in the art.
- the solution containing the metal salt can be evaporated to recover the solids.
- the solids can then be calcinated to recover the metal.
- the substrate used in the method can also be further treated by any technique known to one of ordinary skill in the art.
- platinum on Al 2 O 3 can be recovered by dissolving the alumina in a basic solution to recover the metal.
- platinum could be treated using standard techniques such as aqua regia to recover the purified platinum that would not have other metals present by virtue of the separation achieved with the method embodied in the present invention.
- the solutions embodied by the present invention have several advantages over the traditional aqua regia.
- the solutions embodied by the present invention can be composed of numerous different compositions, and the concentration of those solutions can be varied. This tunability provides for the selective dissolution of metals.
- aqua regia is always 1:3 nitric acid to hydrochloride acid, is a concentrated reaction, and is indiscriminate.
- Aqua regia is corrosive and explosive, whereas the present solutions are merely corrosive, providing an added safety benefit.
- Aqua regia is consumed and not recyclable, whereas portions of the solutions embodied by the present invention can be recovered and recycled.
- the metalized substrates were immersed in 20 mL of 3:1 v/v SOCl 2 -py at room temperature with mild shaking for a preset duration, taken out, rinsed thoroughly, dried, and weighed. No weight loss was detected of a platinum film after it was immersed in the SOCl 2 -py mixture at room temperature or even at 70° C. (refluxing) for 1 week.
- FIG. 1 shows the kinetic results of the dissolution of noble metals in the mixture of SOCl 2 and pyridine (py) with a volumetric ratio of 3:1.
- SOCl 2 dissolved Au at a rate of 0.3 mol m ⁇ 2 h ⁇ 1 at room temperature, which is faster than Au dissolution in conventional cyanide leaching agents ( ⁇ 0.004 mol m ⁇ 2 h ⁇ 1 ) and iodide solutions ( ⁇ 0.16 mol m ⁇ 2 h ⁇ 1 ).
- Silver (Ag) and Pd also dissolved at high dissolution rates (0.8 mol m ⁇ 2 h ⁇ 1 and 0.5 mol m ⁇ 2 h ⁇ 1 , respectively); in comparison, Pt was completely inert.
- Au(I) ⁇ Au(III) oxidation by SOCl 2 has been demonstrated at certain conditions. However, Au cannot be oxidized by SOCl 2 alone. No weight loss was detected for a gold film after immersion in SOCl 2 at 70° C. for 1 week. Pyridine undoubtedly played an important role in the dissolution process.
- Nuclear magnetic resonance (NMR) spectra of the SOCl 2 -py mixture showed a deshielding (low-field chemical shifts) of 14 N (ca, 5 ppm), 13 C (ca, 1.35 and 2.42 ppm for C-3 and C-4, respectively), and 1 H (ca, 0.35, 0.49 and 0.50 ppm for H-2, H-3 and H-4, respectively), and shielding (high-field chemical shift) of C-2 (ca, -1.77 ppm) relative to pure pyridine.
- These chemical shifts can be attributed to the charge-transfer interaction between SOCl 2 and pyridine. Charge-transfer complexes between SOCl 2 and amine have been prepared and studied before.
- the NMR spectra of the 0.03 mol L ⁇ 1 Au—SOCl 2 -py solution showed complete chemical shifts of 14 N (ca, ⁇ 10.4 ppm), 13 C (ca, ⁇ 0.46, 0.14, and 0.50 ppm for C-2, C-3, and C-4, respectively) and 1 H (ca, ⁇ 0.06, ⁇ 0.04, and ⁇ 0.04 ppm for H-2, H-3 and, H-4, respectively) relative to the 3:1 SOCl 2 -py mixture before Au dissolution.
- Solid state 13 C NMR spectrum showed chemical shifts of C-4, C-2, and C-3 at 147.7, 142.2, and 129.2 ppm, respectively. This was in very good agreement with the calculated 13 C NMR result of oligomers of 4-chloropyridine. Protonation at the pyridinium site were confirmed by the appearance of the vibration peak of NH + at ⁇ 3222 cm ⁇ 1 in the FTIR spectra and the Au—SOCl 2 -py solution.
- the pyridinium structure was also reflected in the cyclic voltammogram of the gold/SOCl 2 /pyridine solution in acetonitrile, where the reduction peak potential at ⁇ 1.28 V at the cathodic scan fell in the regime of the reduction potentials of pyridiniums. Dimers and trimers of 4-chloropyridine and their derivatives were present in the mass spectra and the precipitate from the long-standing Au—SOCl 2 -py solution.
- the 4-chloropyridine might have formed as the intermediate and Au(III) catalyzed the oligomerization of 4-chloropyridine.
- the oligomeric nature was evident by the very viscous solution. The increased viscosity resulted in low mobility of molecules.
- Gold nanoparticles were synthesized by reducing 12 mg HAuCl 4 .3H 2 O in 10 mL oleylamine at 105° C. for 2 h under an Ar blanket, collected by precipitation with ethanol and centrifugation, and washed with mixtures of acetone and hexane.
- Au—Pt core-shell nanoparticles were synthesized by a sequential reduction reaction in oleylamine.
- Au core was formed by reducing 24 mg HAuCl 4 .3H 2 O in 10 mL oleylamine at 120° C. for 3 h under an Ar blanket.
- 25 mg platinum acetylacetonate was dissolved in 10 ml oleylamine at 70° C., and then added into the dark purple Au colloidal solution at 120° C. under vigorous stiffing. The solution was fast heated up to 235° C., and kept for 3 h. The whole synthesis process was under Ar protection.
- the core-shell nanoparticles were collected by precipitation with ethanol and centrifugation, and washed with mixtures of acetone and hexane.
- the oleylamine capping agent is so strongly coordinated to the surface of the Platinum nanoparticles that it results in the easy extraction of the capped platinum nanoparticles by hexane.
- Au was recovered simply by calcination.
- the platinum nanoparticles/hexane dispersion was washed several times by mixing with deionized water to remove the ionic residuals. The platinum nanoparticles were recovered after distillation of the hexane.
- XRD patterns of the synthesized Au and platinum nanoparticles were taken.
- the average sizes of the Au and platinum nanoparticles are approximately 4.8 and 4.3 nm, respectively, based on calculation according to Scherrer's equation (using ⁇ 111 ⁇ peaks only, so are the calculations from here after).
- the leaching process of the nanoparticle mixtures was monitored by XRD characterizations of the collected precipitate powders: with leaching of the gold nanoparticles from the mixture, the relative intensity of the Pt ⁇ 111 ⁇ peak with regard to the Au ⁇ 111 ⁇ peak increased. Platinum nanoparticles were recovered after a thorough leaching of the gold nanoparticles. No distinct broadening of the Pt ⁇ 111 ⁇ peak after the leaching process was observed, which indicated that the recovered platinum nanoparticles remain intact during the leaching. The purity of the recovered Pt was 99.49 ⁇ 0.22%, determined by ICP-MS. The yield of the recovered Pt was 80-86% (3.9-4.3 out of the 5 mg).
- UV-vis spectrum and XRD pattern of the synthesized Au—Pt core-shell nanoparticles were consistent with those reported in literature about Au—Pt core-shell nanoparticles.
- the average diameter of the Au core (by fitting the XRD pattern and calculation based on Scherrer's equation) is 5.8 nm.
- a very broad Pt ⁇ 111 ⁇ peak was evident, corresponding to 3.2 nm in size.
- the poor signal-to-noise ratio, the weak ⁇ 200 ⁇ and ⁇ 220 ⁇ peaks, and the broad ⁇ 111 ⁇ peak (corresponding to an average size of 3.2 nm) of the recovered platinum nanoparticles were all characteristic of the poor crystallinity and small size of the platinum nanoparticles initially in the form of shells in the Au—Pt core-shell nanoparticles.
- UV-vis spectra showed a weak surface plasmon resonance (SPR) peaked at around 510 nm for the core-shell nanoparticles; in contrast, SPR disappeared after the gold nanoparticles were leached thoroughly.
- the purity of the recovered platinum is 95.02 ⁇ 0.08%.
- the purity was relatively low, in comparison with the recovered platinum from the mixture of platinum and gold nanoparticles.
- a possible reason is that a small amount of gold atoms are mixed indistinguishably into the lattice of the Pt shell during the sequential synthesis process of the Au—Pt core-shell nanoparticles.
- the recovered platinum and gold were around 2.1 and 6.7 mg, respectively.
- the thionyl reagent and donor solvent can be formulated using organic solvent/reagents other than pyridine.
- organic solvents/reagents such as N,N-dimethylformamide (DMF), imidazole, pyrimidine, and pyrazine can be used as donor solvents.
- DMF N,N-dimethylformamide
- a SOCl 2 -DMF mixture dissolved Au at a rate of 0.3 mol m ⁇ 2 h ⁇ 1 ; by contrast, neither Pd nor Pt apparently dissolved.
- One key feature that all the organic candidates have in common is that they can have charge-transfer interactions with SOCl 2 .
- quantitative analysis is currently unavailable to answer the question of why different donor solvents show different reactivity toward different noble metals, it can be reasonably assumed that the dissolution selectivity derives from the tunable interaction between SOCl 2 and the donor solvent.
- the polished Cu plate was cleaned in a 1:1 mixture of ethanol and acetone with sonication, and dried with nitrogen flow.
- the plate was then fixed in a clamp made of Teflon, and immersed in 200 mL etchant under stirring.
- the along-thickness direction was parallel to the direction of rotation of the liquid.
- the plate was rinsed with distilled water immediately and thoroughly.
- the plate was dried with nitrogen flow and then weighed.
- the etching rate, in mg min ⁇ 1 cm ⁇ 2 is calculated from the slope of the line of best fit for the plot of normalized weight loss vs. accumulated immersion time.
- the etching rate of Cu in 1 mol L ⁇ 1 SOCl 2 /CH 3 CN solution at mild conditions is 36 mg min ⁇ 1 cm ⁇ 2 .
- the rate was much faster than those in the current major etchants such as acidic solutions of FeCl 3 (11-27 mg min ⁇ 1 cm ⁇ 2 ) and CuCl 2 (11-22 mg min ⁇ 1 cm ⁇ 2 ), and ammoniacal alkaline solutions (13-27 mg min ⁇ 1 cm ⁇ 2 ) of higher concentrations and stirring rates at elevated temperatures.
- the etching rate increased with the concentration of SOCl 2 . There are two regimes: the low-concentration one ( ⁇ 0.3 mol L ⁇ 1 ) with relatively strong concentration dependence, and the high-concentration one with relatively weak concentration dependence.
- the high etching rate provides a method for rapid dissolution or etching of copper.
- the reaction is the insensitivity to surface oxide on the copper. When the copper surface is initially oxidized Cu, there was no distinct change in the etching rate.
- it is compatible with current Cu/low-K technology because SiO 2 is not soluble in the etchant. In comparison, SiO 2 can be etched by alkaline etchants.
- the etchant can be recovered/regenerated simply by distillation; in comparison.
- the dissolution selectivity can open up a new avenue toward recycling of noble metals, in particular, platinum.
- the method can find wide applications several industries, including, for example, in microelectronics and mining industries.
- a silicon substrate was metalized with a Pd—Au—Pt layer (250-nm thick each by an e-beam evaporation or DC sputtering, with chromium as the adhesion layer) and the Au and Pd were dissolved, sequentially and respectively in the SOCl 2 -DMF and the SOCl 2 -py mixtures. The process is demonstrated in FIG. 2 .
- a copper-gold-platinum metal system on a silica support is treated first with SOCl 2 in acetonitrile to separate the copper as a copper chloride, then second with SOCl 2 in pyridine to separate the gold as a gold chloride.
- the remaining metal was platinum metal on a silica support that can be recovered or reprocessed.
- a copper-nickel-platinum particle is treated with a thionyl chloride solution containing actenoitrile to separate the copper and nickel as chloride salts, and the remaining solid contains the platinum metal.
- a crude mixture of mining ore containing a mixture of copper and gold is treated with a thionyl chloride solution containing acetonitrile to separate the copper ore as copper chloride, then treated with a thionyl-DMF solution to separate the gold ore as gold chloride.
- a mixture of used palladium catalysts and platinum catalysts supported on an activated carbon that can be recovered from an industrial process for recycling is first fired to burn off the carbon support, then the remaining material is treated with a thionyl chloride-pyridine solution to separate the palladium as palladium chloride and recover the platinum as a single metal.
- Vapor etching of Au metallization on a circuit board by vaporized SOCl 2 and donor solvent was conducted, as shown in FIG. 3 .
- a nitrogen purge produced a vapor solution that etched the mounted circuit board. Photos of the circuit board are shown, prior to etching, at 5 minutes and at 15 minutes.
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Abstract
Methods and compositions are described for preparing metal salts and selectively separating metals from substrates and other metals. The methods can include a thionyl reagent that reacts with a metal in a solution to produce a metal salt. The reaction can be controlled by varying reagents and conditions such that the method can be used to selectively separate one or more metals from another metal or from a substrate. The method can also be used for removing metals from a surface. Compositions produced by the method are also described.
Description
- This application claims the benefit of U.S. Provisional Patent Application No. 61/379,857 filed 3 Sep. 2010, the entire contents and substance of which are hereby incorporated by reference in its entirety as if fully set forth below.
- The various embodiments of the present invention relate generally to the reaction of thionyl reagents with metals, the use of that reaction to selectively separate metals from mixtures and more particularly to compositions and methods for achieving the separation.
- Dissolution of noble metals is important for metallurgy, catalysis, organometallic chemistry, syntheses and applications of noble metal nanoparticles, and recycling of noble metals. Aqua regia (“royal water”) has been used for centuries as a powerful etchant to dissolve noble metals. Aqua regia is a simple 1:3 mixture of concentrated nitric and hydrochloric acids can dissolve noble metals such as gold, palladium, and platinum while these metals are not soluble in either of the acids independently. However, conventional platinum recovery is complicated by its reliance on aqua regia and possible subsequent precipitation of the dissolved platinum from the solution. Aqua regia dissolves all the metals at the same time and cannot separate them out, resulting in low-purity platinum which cannot go back to the product stream directly; it has to be refined, but refining is costly. Moreover, aqua regia is relatively dangerous to work with, is not readily recyclable, and is considered by many to be environmentally hazardous.
- This issue is compounded by the current global energy crisis demands for green energy technologies, which will undoubtedly require increased noble metal resources. However, noble metals are scarce, and the current metal prices, particularly for copper, silver and gold reported in the daily news, reveal a need for new methods of recovering these metals. The ability to recover high-purity noble metals via recycling processes may be paramount to the sustainable development. Among the noble metals, platinum is widely used as a catalyst in many green technologies, in particular, proton-exchange membrane fuel cell.
- Another class of materials, bimetallic nanoparticles of noble metal elements, will also require selective separation of metals during recycling. Among the various combinations of bimetallic nanoparticles, Au—Pt core-shell nanoparticles (sometimes called platinum-decorated gold nanoparticles, platinum-layered gold nanoparticles, or gold-platinum dendritic hetero-aggregate nanoparticles to account for the morphology of the non-uniform and porous platinum shell) are an important category that has demonstrated improved catalytic activities and multifunctionality. Platinum is becoming increasingly important because of growth in environmentally-friendly applications such as fuel cells and pollution-control catalysts. Researchers, especially materials chemists, have been trying to push platinum utilization to its theoretical maximum; this accounts significantly for the broad interest in platinum-metal (M=Au, Pd, Ni, etc.) bimetallic nanoparticles. Efficient recovery of platinum elements from catalyst nanoparticles is desirable from the viewpoint of sustainable growth.
- The various embodiments of the present invention provide methods and compositions for reactions of metals with thionyl reagents, methods of selectively separating metals from substrates, methods of selectively separating metals from other metals, methods of removing metals from materials, compositions for conducting the methods, and compositions resulting from the methods.
- An exemplary embodiment of the present invention is a method for preparing a metal salt. The method comprises reacting a metal with a solution comprising SOX1X2, wherein X1 is Cl or Br and X2 is a halide, OR1 or NR2R3 and R1, R2, and R3 are each independently a C1-C6 alkyl, alkenyl, alkynyl, or carbonyl. In an embodiment, X2 can be Cl, Br, or OR. In another embodiment, SOX1X2 can be SOCl2.
- In some exemplary embodiments of the present invention, the metal can be any metal that is not a passivated metal. In an exemplary embodiment, the metal can be copper, nickel, iron, tin, indium, silver, gold or palladium. In other exemplary embodiments, the metal can be silver, gold or palladium.
- In some exemplary embodiments of the present invention, the solution can contain a donor solvent. In an exemplary embodiment, the donor solvent can be N,N′-dimethylformamide, pyridine, imidazole, thiazole, oxazole, pyridazine, pyrimidine, pyrazine, triazine, pyrrolidine, pyrrolidone, isoxazole, isothiazole, or pyrazole. In another exemplary embodiment, the donor solvent can be N,N′-dimethylformamide, pyridine or imidazole.
- Another exemplary embodiment of the present invention is a method for separating at least one metal from a substrate, the method comprising introducing the substrate by solution phase contact or vapor phase contact to a solution comprising SOX1X2, reacting the at least one metal with at least a portion of the SOX1X2 in the solution to form a reaction solution, wherein the reaction solution contains a metal salt of the at least one metal, and separating the reaction solution containing the metal salt from the substrate. The metal can be copper, nickel, iron, tin, indium, silver, gold or palladium, or a combination thereof.
- In some exemplary embodiments, reacting the metal can include stirring, heating the solution, sonicating the solution, or causing the solution to flow across the substrate. In some embodiments, the solution can contain a dissolving solvent. The dissolving solvent can be an organic solvent. In one embodiment, the dissolving solvent can be acetonitrile.
- The method can also include the steps of recovering at least a portion of the substrate that was separated from the reaction solution, and repeating the previous steps with the recovered substrate. In some embodiments, the substrate can include platinum.
- Another exemplary embodiment of the present invention can be a reaction solution containing a metal salt, a thionyl reagent and a donor solvent. In an embodiment, the thionyl reagent can be SOCl2 or SOBr2. The metal salt can be a copper salt, a silver salt, a gold salt, a palladium salt or a combination thereof. In an embodiment, the donor solvent can be pyridine, DMF, or imidazole.
- According to another exemplary embodiment, a method for selectively separating at least one metal from a substrate that has platinum and the at least one metal comprises introducing the substrate to an organic solution comprising SOX1X2 and a donor solvent, reacting the at least one other metal with the organic solution to form a reaction solution, wherein the reaction solution contains a metal salt of the at least one other metal, and separating the reaction solution containing the metal salt from the substrate containing the platinum. The X1 can be Cl or Br and X2 can be a halide, OR1 or NR2R3, where R1, R2, and R3 are each independently a C1-C6 alkyl, alkenyl, alkynyl, or carbonyl. The donor solvent can be N,N′-dimethylformamide, pyridine, imidazole, thiazole, oxazole, pyridazine, pyrimidine, pyrazine, triazine, pyrrolidine, pyrrolidone, isoxazole, isothiazole, or pyrazole. In another embodiment, the donor solvent can be N,N′-dimethylformamide, pyridine or imidazole. The at least one metal can be copper, nickel, iron, tin, indium, silver, gold or palladium or a combination thereof. In another embodiment, the at least one metal can be gold, silver, or palladium.
- Another exemplary embodiment of the present invention is a method for separating a noble metal from a substrate comprising introducing the substrate to an organic solution having SOX1X2 and a donor solvent, reacting the noble metal with at least a portion of the SOX1X2 in the organic solution to form a reaction solution, where the reaction solution contains a noble metal salt of the noble metal, and separating the reaction solution containing the noble metal salt from the substrate. In an embodiment, X1 can be Cl or Br and X2 can be a halide, OR1 or NR2R3, and R1, R2, and R3 are each independently a C1-C6 alkyl, alkenyl, alkynyl, or carbonyl. In another embodiment, X1 and X2 are each independently Cl or Br. In an embodiment, the noble metal can be gold, silver or palladium. In an embodiment, the donor solvent can be N,N′-dimethylformamide, pyridine, imidazole, thiazole, oxazole, pyridazine, pyrimidine, pyrazine, triazine, pyrrolidine, pyrrolidone, isoxazole, isothiazole, or pyrazole. In another embodiment, the donor solvent is N,N′-dimethylformamide, pyridine or imidazole.
- The method can further include steps prior to the step of introducing the substrate to the organic solution having SOX1X2 and a donor solvent. In an embodiment, the substrate can be first treated with a non-donor solvent solution comprising SOX1X2 without a donor solvent;, then the substrate can be separated from the non-donor solution and subjected to the remaining steps of the method.
- According to an exemplary embodiment of the present invention, a method for separating a non-noble metal from a substrate comprises introducing the substrate to an organic solution comprising SOX1X2, reacting the non-noble metal in the substrate with the organic solution to form a reaction solution, wherein the reaction solution comprises a salt of the non-noble metal from the non-noble metal on the substrate, and separating the reaction solution containing the copper salt from the substrate. X1 can be Cl or Br and X2 can be a halide, OR1 or NR2R3, and R1, R2, and R3 are each independently a C1-C6 alkyl, alkenyl, alkynyl, or carbonyl. In an embodiment, X1 and X2 can be each independently Cl or Br. In an embodiment, the organic solution contains acetonitrile. In an embodiment, the non-noble metal can be copper.
- The method can be used to prepare a copper pattern on a surface. In an exemplary embodiment, the method comprises depositing a layer of copper on a surface, placing a pattern mask over the copper layer, and treating the surface of the device with an organic solution containing SOX1X2 to remove the copper exposed outside the mask.
- Other aspects and features of embodiments of the present invention will become apparent to those of ordinary skill in the art, upon reviewing the following detailed description in conjunction with the accompanying figures.
-
FIG. 1 illustrates rates of reaction for different metals in accordance with exemplary embodiments of the present invention. -
FIG. 2 illustrates a reaction flow chart in accordance with exemplary embodiments of the present invention. -
FIG. 3 illustrates a vapor phase etching system in accordance with exemplary embodiments of the present invention. - To facilitate an understanding of the principles and features of the various embodiments of the invention, various illustrative embodiments are explained below. Although exemplary embodiments of the invention are explained in detail, it is to be understood that other embodiments are contemplated. Accordingly, it is not intended that the invention is limited in its scope to the details of construction and arrangement of components set forth in the following description or illustrated in the drawings. The invention is capable of other embodiments and of being practiced or carried out in various ways. Also, in describing the exemplary embodiments, specific terminology will be resorted to for the sake of clarity.
- It must also be noted that, as used in the specification and the appended claims, the singular forms “a,” “an” and “the” include plural references unless the context clearly dictates otherwise. For example, reference to a component is intended also to include composition of a plurality of components. References to a composition containing “a” constituent is intended to include other constituents in addition to the one named.
- Also, in describing the exemplary embodiments, terminology will be resorted to for the sake of clarity. It is intended that each term contemplates its broadest meaning as understood by those skilled in the art and includes all technical equivalents which operate in a similar manner to accomplish a similar purpose.
- Ranges may be expressed herein as from “about” or “approximately” one particular value and/or to “about” or “approximately” another particular value. When such a range is expressed, other exemplary embodiments include from the one particular value and/or to the other particular value.
- By “comprising” or “containing” or “including” is meant that at least the named compound, element, particle, or method step is present in the composition or article or method, but does not exclude the presence of other compounds, materials, particles, method steps, even if the other such compounds, material, particles, method steps have the same function as what is named.
- It is also to be understood that the mention of one or more method steps does not preclude the presence of additional method steps or intervening method steps between those steps expressly identified. Similarly, it is also to be understood that the mention of one or more components in a composition does not preclude the presence of additional components other than those expressly identified.
- Various embodiments of the present invention are directed to the reaction of thionyl reagents with metals. Treating various metals with a thionyl reagent, such as, but not limited to, thionyl chloride, along with a solvent, such as, but not limited to, pyridine, causes the metal to react and oxidize, creating a metallic solution. Various embodiments of the present invention further comprise a series of reactions that can cause a reaction for metals on a surface and can allow for converting metals to salts, and even can allow for selective conversion in the presence of other metals.
- Various embodiments of the present invention are reactions of a metal with SOX1X2, which can be referred to as a thionyl reagent. X1 and X2 can be the same or different, and can be halides, alkoxides, or amides. In an embodiment, the alkoxide, which is chemically related to an alcohol, can be described as —OR1. In an embodiment, the amide, which is chemically related to an amine, can be described as —NR2R3. R1, R2, and R3 can be each independently a C1-C6 alkyl, a C1-C6, a C1-C6 alkenyl, a C1-C6 alkynyl, or a C1-C6 carbonyl compound. In an embodiment, X1 is chloride or bromide. In another embodiment, X1 and X2 can each be independently chloride or bromide. SOX1X2 can be SOCl2, commonly referred to as thionyl chloride, or can be SOBr2, commonly referred to as thionyl bromide.
- In an exemplary embodiment of the present invention, a metal reacts with the thionyl reagent. The metal can be a metal in a zero oxidation state in which the reaction of the zero oxidation state metal can be an oxidation to a positive oxidation state by the oxidation with the thionyl reagent. In an embodiment, the metal can be any metal known by one of ordinary skill in the art to react with a thionyl reagent. The metal can be nickel, copper, iron, tin, or indium, referred to herein as non-noble metals. The metal can be gold, silver or palladium, referred to herein as noble metals. Metals that do not react in the current method can include platinum, tungsten, chromium, titanium, tantalum, and silicon.
- Without being bound by theory, part of the reactivity for the metals seems to depend on the passivation of the surface of the metal. Metals that have a passivated surface may not react in the current system. For example, titanium is well-known for the strength and hardness of their surface oxides, but does not react in the current system. Platinum is also known to have a hard passivation layer, and is similarly resistant to the reactions of the present invention. The passivated metal need not be actively passivated, such as when titanium is anodized, but can include naturally passivated metals. Therefore, in another embodiment of the present invention, the metal can be any metal that is not a passivated metal.
- In various embodiments of the present invention, the reaction of a metal with a thionyl reagent can produce a metal cation and can also produce a counterion, which will be anionic. The metal cation and anionic counterion can form a metal salt. The overall charge of the metal salt, comprising the metal cation and anionic counterion, can be in any overall charge state, including +3, +2, +1, neutral, −1, −2, −3, and so forth. The metal salt can be in any physical state known to one of ordinary skill in the art. The metal salt can be in solution, suspension, precipitated, and so forth. The anion of the metal salt can be any anion recognized by one of ordinary skill in the art. In an embodiment, the anion can be a chloride, bromide, alkoxide, or amide salt. In another embodiment, the anion can be bromide or chloride. The anion can also be chloride.
- In the present invention, a solution that can contain the thionyl reagent which reacts with a metal can also contain a solvent. In an embodiment, the solvent is an organic solvent. When the solvent is an organic solvent, the solution can also be described as an organic solution. The organic solvent can be a donor solvent or a dissolving solvent, or both a donor solvent and a dissolving solvent.
- In an embodiment, the donor solvent can be any organic solvent that activates the thionyl reagent, reduces the work function of the metal being reacted, or does both. In an embodiment, the donor solvent can be N,N′-dimethylformamide, pyridine, imidazole, thiazole, oxazole, pyridazine, pyrimidine, pyrazine, triazine, pyrrolidine, pyrrolidone, isoxazole, isothiazole, pyrazole, indole, quinoline, purine, pteridine, phthalocyanine, N,N′-dicyclohexylcarbodiimide, N,N′-dimethylbenzylamine, dodecyltrimethylammonium bromide, tri-p-tolyl-phosphine, pyrrole, pyrazolone, or bipyrazole. In another embodiment, the donor solvent can be N,N′-dimethylformamide, pyridine, imidazole, thiazole, oxazole, pyridazine, pyrimidine, pyrazine, triazine, pyrrolidine, pyrrolidone, isoxazole, isothiazole, or pyrazole. In yet another embodiment the donor solvent can be N,N′-dimethylformamide, pyridine, or imidazole.
- Without being bound by theory, the donor solvent appears to play two roles in the reaction encompassed by the method of the present invention. First, the donor solvent can coordinate to the surface of the metal, potentially via non-bonding electron pairs or π-bond type coordination. This would effectively reduce the work function of the metal making the surface more susceptible to oxidation. Second, the donor solvent may form a charge-transfer complex with the thionyl reagent to activate it. This might potentially stabilize the complex for the dissociation of the chloride loss and for accepting the electrons from the oxidized metal. This proposed mechanism then allows for tuning the reactivity of the solution to different metals, as embodied by the method in several ways discussed herein.
- The reaction rate for the method of the present invention can be controlled by adjusting the ratio of thionyl reagent and donor solvent. In general, the reaction rate varies for the ratio of thionyl reagent:donor solvent based on two competing factors. First, as discussed above, the activation of the complex and the work function of the metal are both affected by increasing donor solvent. Second, the ability of the metal chloride to dissolve away from the substrate is affected by solvent polarity which is dominated by the high-polarity thionyl reagent. By way of a nonlimiting example, the dissolution/reaction rates for a gold metal in a 6:4 thionyl reagent: donor solvent solution can be faster than in a 4:6 solution. Similarly, a 7:3 thionyl reagent: donor solvent can be faster than both a 9:1 solution and a 5:5 solution.
- In an embodiment, the ratio of thionyl reagent:donor solvent can be in the range of about 10,000:1 to about 1:10,000. In an embodiment, the ratio can be in the range of about 100:1 to about 1:100, including in the range of about 10:1 to about 1:10. In an embodiment, the ratio can be in the range of about 7:1 to about 1:7, including in the range of about 5:1 to 1:5. In an embodiment, the ratio can be about 3:1.
- The rate can also be controlled by adjusting the donor solvent used in the reaction. For example, pyridine, DMF and imidazole give the swiftest reactions for the method with a metal, for example, gold. Other donor solvents can be relatively slower. In a qualitative sense, the “fast” donor solvents can be N,N′-dimethylformamide, pyridine, imidazole; the “medium” donor solvents can be thiazole, oxazole, pyridazine, pyrimidine, pyrazine, triazine, pyrrolidine, pyrrolidone, isoxazole, isothiazole, or pyrazole; and the “slow” donor solvents can be indole, quinoline, purine, pteridine, phthalocyanine, N,N′-dicyclohexylcarbodiimide, N,N′-dimethylbenzylamine, dodecyltrimethylammonium bromide, tri-p-tolyl-phosphine, pyrrole, pyrazolone, or bipyrazole. The slowest solvents, many to the point of not demonstrating any substantial oxidation with some metals, can be acetonitrile, maleimide, azobisisobutyronitrile, aniline, polyaniline, phenanthroline, methylbenzyl cyanide, 2-acetyl-1-methylpyrrole, or benzyltriethylammonium tetrafluoroborate.
- The reaction rate for the method of the present invention can also be controlled by dilution of the solution containing the thionyl reagent. Diluting the solution with, for example, an organic solvent, can lead to a slower reaction. However, the diluted reaction can also be more efficient because it cuts down on side reactions, e.g. oligomerization of donor solvent, that consume the thionyl reagent.
- The reaction rate of the thionyl reagent with the metals in the method of the present invention can also vary based on the metal being converted to a metal salt. Across several donor solvents, the following relative order of reactivity can be established: silver can be faster than gold and both silver and gold can be faster than palladium. Platinum does not react in the current method. Copper, nickel, iron, tin and indium can be all faster than silver or gold. Silicon, silicon dioxide, titanium, tungsten, tantalum, and chromium do not react in the current method. Teflon is also inert.
- In an exemplary reaction according to various embodiments of the present invention, some non-noble metals can react according to the methods of the invention with thionyl reagents and a very weak donor solvent or dissolving solvent. In an embodiment of the present invention, a dissolving solvent can be any organic solvent that solubilizes and stabilizes the metal and/or metal salt to aid the reaction. In one exemplary embodiment, the dissolving solvent can be acetonitrile. Without being bound by theory, some donor solvents do not support the reaction of the thionyl reagents with noble metals, e.g. acetonitrile, but can nonetheless activate the oxidation and dissolution of non-noble metals and thereby act as dissolving solvents. Without being bound by theory, this could be due to the smaller work function present in non-noble metals, e.g. the smaller work function for copper versus gold. Therefore, in some embodiments, the dissolving solvent does not have to be as strong an actor as the donor solvent.
- In an embodiment of the present invention, the method can be a reaction of a non-noble metal with a thionyl reagent and a dissolving solvent. In an embodiment, the non-noble metal can be copper, nickel, iron, tin or indium. In another embodiment, the metal can be copper.
- In an embodiment of the methods of the present invention, the reaction of the metal with the solution containing a thionyl reagent can include any technique for controlling the reaction that is known to one of ordinary skill in the art. The reaction can include stirring the solution containing the thionyl reagent and the metal, heating the solution, or refluxing the solution. The reaction can be conducted at room temperature, above room temperature, or below room temperature. The reaction can include causing the solution to flow across a surface containing the substrate. The reaction can be conducted in a solution phase, where the substrate and/or metal is immersed or rinsed with the solution containing the thionyl reagent. The reaction can be conducted in the vapor phase, where the substrate is immersed in a vapor containing the solution containing the thionyl chloride. The reaction can be conducted with sonication.
- In an embodiment of the present invention, a method can include a step of introducing a substrate to a solution. The solution can also be called a first solution, a reagent solution, a thionyl solution, or a reactant solution. The method can also include a step of introducing a substrate to an organic solution including a thionyl reagent, in which the solution can have an organic solvent present in it. The method can also include reacting a metal with the solution to form a reaction solution, wherein the reacted products are present in the reaction solution.
- In an embodiment of the present invention, the substrate used in the method can be any material that contains a metal susceptible to removal by the present invention. The substrate can be any material, catalyst, surface, object, structure, residue, and so forth that has a metal. Non-limiting examples of substrates can include, but are not limited to, automobile combustion catalysts and catalytic converters, petroleum cracking catalysts, industrial catalysts on supports, industrial catalysts in particulate forms, residual catalyst sludges from catalytic reactions, semiconductor and chip manufacturing materials and parts, batteries and anodic or cathodic metals in batteries, metal nanoparticles, fuels cells, crude mining ores and so forth. Some common metal combinations might include, but are not limited to, platinum-nickel, platinum-copper, platinum-palladium, platinum-gold, platinum-iron, platinum-tin, platinum-nickel-gold, platinum-gold-palladium, titania-supported metal compounds, chromium mixed metals, tungsten mixed metals, silicon-metal systems prevalent in semiconductor devices, SiO2-supported metals systems, metals intermixed with a rock such as granite from mining operation, and so forth.
- In view of the above information, methods according to various embodiments of the present invention can include numerous different strategies for dissolving and separating several different metals. In an embodiment, the method can include a solution of thionyl reagent that is fast reacting with any metal, for example, a 3:1 SOCl2:pyridine solution. Such a reaction could remove all non-passivated metals from a substrate. This technique might be useful for recovering a single metal from a substrate, or for removing a metal from a substrate that contains a passivated metal, e.g. platinum. In an embodiment, the method can include a solution of thionyl reagent that is fast reacting with only non-noble metals, for example a SOCl2 solution in acetonitrile. Such a solution could remove all non-noble metals, and might be useful for recovering single non-noble metals, or for removing non-noble metals from a substrate containing noble metals. In an embodiment, the method can be used to separate two noble metals, where a first noble metal does not react as swiftly as a second noble metal, e.g. for example, separating silver from palladium. In an embodiment, the method can include a first reaction having SOCl2 and acetonitrile to remove a non-noble metal, then a second reaction using SOCl2 and pyridine to remove a noble metal, for example separating copper and gold sequentially from a substrate, or separating copper and gold sequentially from platinum.
- Metal salts that can be a product of one or more methods according to various embodiments of the present invention and can be contained in the reaction solution can be recovered by any technique known to one of ordinary skill in the art. In one non-limiting example, the solution containing the metal salt can be evaporated to recover the solids. The solids can then be calcinated to recover the metal. The substrate used in the method can also be further treated by any technique known to one of ordinary skill in the art. In one non-limiting example, platinum on Al2O3 can be recovered by dissolving the alumina in a basic solution to recover the metal. In another non-limiting example, platinum could be treated using standard techniques such as aqua regia to recover the purified platinum that would not have other metals present by virtue of the separation achieved with the method embodied in the present invention.
- The solutions embodied by the present invention have several advantages over the traditional aqua regia. The solutions embodied by the present invention can be composed of numerous different compositions, and the concentration of those solutions can be varied. This tunability provides for the selective dissolution of metals. In contrast, aqua regia is always 1:3 nitric acid to hydrochloride acid, is a concentrated reaction, and is indiscriminate. Aqua regia is corrosive and explosive, whereas the present solutions are merely corrosive, providing an added safety benefit. Aqua regia is consumed and not recyclable, whereas portions of the solutions embodied by the present invention can be recovered and recycled.
- The various embodiments of the present invention are further illustrated by the following non-limiting examples.
- Layers of 250-nm-thick Au, Pd, Ag, and Pt, was deposited, onto a 9-cm2 silicon substrate each, with 20-nm-thick chromium as the adhesion layer (chromium was not soluble in any reaction medium) to avoid the error that might be introduced due to peel-off of the noble metal metallization layer. The metalized substrates were immersed in 20 mL of 3:1 v/v SOCl2-py at room temperature with mild shaking for a preset duration, taken out, rinsed thoroughly, dried, and weighed. No weight loss was detected of a platinum film after it was immersed in the SOCl2-py mixture at room temperature or even at 70° C. (refluxing) for 1 week.
-
FIG. 1 shows the kinetic results of the dissolution of noble metals in the mixture of SOCl2 and pyridine (py) with a volumetric ratio of 3:1. SOCl2 dissolved Au at a rate of 0.3 mol m−2 h−1 at room temperature, which is faster than Au dissolution in conventional cyanide leaching agents (<0.004 mol m−2 h−1) and iodide solutions (<0.16 mol m−2 h−1). Silver (Ag) and Pd also dissolved at high dissolution rates (0.8 mol m−2 h−1 and 0.5 mol m−2 h−1, respectively); in comparison, Pt was completely inert. - Different solutions in the method were analyzed by different techniques. X-ray photoelectron spectroscopy of the reaction of gold in SOCl2-py showed the Au 4f7/2 binding energy at 86.6 eV characteristic of the oxidation state of Au(III). To demonstrate that Au was oxidized to Au(III) instantaneously, SOCl2-pyridine vapor was used to etch an Au/Si surface. Au(III) was confirmed on the vapor-etched Au/Si surface by XPS and Raman spectroscopy in the form of AuCl4 −. Vibration modes of Au(III)-Cl, however, were not observed in the Raman spectrum probably because they were covered by the strong fluorescence background. Actually, after the 0.03 mol L−1 Au/3:1 SOCl2-py solution was stored at room temperature in a dark room for 150 days, a large amount of yellow precipitate was observed and the solution turned into a dark suspension. [AuCl4]− was confirmed in the Raman spectrum of the precipitate. Therefore, [AuCl4]− appeared to form as a result of Au dissolution in SOCl2-py mixtures. No chemical shifts resulting from coordination of pyridine with Au(III) were observed in the NMR spectra and no simple Au(III) compounds were observed in the mass spectra or the X-ray diffraction pattern. These results suggested the absence of AuCl3 or its complex with pyridine in the Au—SOCl2-pyridine solution.
- Au(I)→Au(III) oxidation by SOCl2 has been demonstrated at certain conditions. However, Au cannot be oxidized by SOCl2 alone. No weight loss was detected for a gold film after immersion in SOCl2 at 70° C. for 1 week. Pyridine undoubtedly played an important role in the dissolution process. Nuclear magnetic resonance (NMR) spectra of the SOCl2-py mixture showed a deshielding (low-field chemical shifts) of 14N (ca, 5 ppm), 13C (ca, 1.35 and 2.42 ppm for C-3 and C-4, respectively), and 1H (ca, 0.35, 0.49 and 0.50 ppm for H-2, H-3 and H-4, respectively), and shielding (high-field chemical shift) of C-2 (ca, -1.77 ppm) relative to pure pyridine. These chemical shifts can be attributed to the charge-transfer interaction between SOCl2 and pyridine. Charge-transfer complexes between SOCl2 and amine have been prepared and studied before. In this case, similarly, the sulfur in SOCl2 is an electron acceptor, and the nitrogen in pyridine is an electron donor. The charge transfer in general weakens the bonds within the acceptor molecule, which accounts for the observed redshifts of both the asymmetric and the symmetric Cl—S—Cl stretching in the Raman spectra of SOCl2-py mixtures. In comparison with pure pyridine and SOCl2, shifts and intensity changes of py-related vibration peaks were also observed in the FTIR of the SOCl2-py mixture. Such shifts are mainly attributed to the formation of the charge-transfer complex, SOCl2-py, in good agreement with simulation results of the vibration spectra (IR). SOCl2-py was observed directly in the mass spectrum of the SOCl2-py mixture. Therefore, the charge-transfer interaction may activate SOCl2 to oxidize Au.
- In the Raman and the FTIR spectra of the SOCl2-py mixture, almost all the vibration modes of pure pyridine and pure SOCl2 remained. This indicated that the parent molecules, although perturbed by the charge-transfer interaction, had maintained their basic structural integrity, and that the dominating product was a molecular adduct rather than a rearrangement, elimination or dissociated product. Neither 1-(chlorosulfinyl)-pyridinium chloride nor 1-(chlorosulfinyl)-4-chloro-4-hydropyridine were identified in the NMR spectra. Simulation results showed that 1-(chlorosulfinyl)-pyridinium chloride, the dissociated form of the adduct, was not energy favorable. Proof of its existence could not be picked up easily in the FTIR spectra. However, experimental data of electrical conductivity of the mixtures suggested the presence of mobile ions due to the dissociation. Therefore, 1-(chlorosulfinyl)-pyridinium chloride, though being a weak electrolyte in SOCl2, existed as the dissociated form of the SOCl2-py adduct in the solutions. No known reduction products of SOCl2 such as sulfur have been confirmed.
- With the dissolution of Au into the SOCl2-py mixture, SOCl2 was consumed non-stoichiometrically. This was evident from the reduced Raman intensities of the vibration peaks at Δv=200.0, 288.5, 348.2, 427.5, and 493.0 cm−1. The py-related peaks were at Δv=657.3, 1000.9, 1035.4, and 3064.6 cm−1 shift to 643.5, 1013.5, 1027.3, and 3101.4 cm−1, respectively. The peak shifting were complete at Au(III) concentration of as low as 0.03 mol L−1. Correspondingly, the NMR spectra of the 0.03 mol L−1 Au—SOCl2-py solution showed complete chemical shifts of 14N (ca, −10.4 ppm), 13C (ca, −0.46, 0.14, and 0.50 ppm for C-2, C-3, and C-4, respectively) and 1H (ca, −0.06, −0.04, and −0.04 ppm for H-2, H-3 and, H-4, respectively) relative to the 3:1 SOCl2-py mixture before Au dissolution. These results suggested a non-stoichiometric chemical reaction in the solution. Solid state 13C NMR spectrum showed chemical shifts of C-4, C-2, and C-3 at 147.7, 142.2, and 129.2 ppm, respectively. This was in very good agreement with the calculated 13C NMR result of oligomers of 4-chloropyridine. Protonation at the pyridinium site were confirmed by the appearance of the vibration peak of NH+ at ˜3222 cm−1 in the FTIR spectra and the Au—SOCl2-py solution. The pyridinium structure was also reflected in the cyclic voltammogram of the gold/SOCl2/pyridine solution in acetonitrile, where the reduction peak potential at −1.28 V at the cathodic scan fell in the regime of the reduction potentials of pyridiniums. Dimers and trimers of 4-chloropyridine and their derivatives were present in the mass spectra and the precipitate from the long-standing Au—SOCl2-py solution. The 4-chloropyridine might have formed as the intermediate and Au(III) catalyzed the oligomerization of 4-chloropyridine. The oligomeric nature was evident by the very viscous solution. The increased viscosity resulted in low mobility of molecules. This low mobility of molecules could be the reason for the peak broadening observed in the 13C NMR spectrum of the Au—SOCl2-py solution (Table S1). Different metals such as Au, Ag, and Cu can exhibit different catalytic effects. The oligomerization reaction accounts for the non-stoichiometric feature.
- Gold nanoparticles were synthesized by reducing 12 mg HAuCl4.3H2O in 10 mL oleylamine at 105° C. for 2 h under an Ar blanket, collected by precipitation with ethanol and centrifugation, and washed with mixtures of acetone and hexane. Platinum nanoparticles were synthesized by reducing 30 mg H2PtCl6.6H2O in 20 mL ethylene glycol (containing 35 mg polyvinylpyrrolidone, Mw=29000) at 165° C. for 2 h under an Ar blanket, collected by precipitation with acetone and centrifugation, and washed with mixtures of acetone and ethanol [17].
- 20 mg dried gold nanoparticles and 5 mg dried platinum nanoparticles were mixed, and then added into 10 mL SOCl2 to form a dark brown mixture. A certain amount of pyridine was added at room temperature, changing the colour of the mixture to light brown. The solution was diluted into 200 mL acetonitrile. The dissolved Au went into the solution; the non-dissolved nanoparticles were precipitated out of the solution, washed, and collected. The yield was calculated by dividing the weight of the collected recovered platinum nanoparticles by the starting weight of the platinum nanoparticles in the mixture, i.e., 5 mg.
- Au—Pt core-shell nanoparticles were synthesized by a sequential reduction reaction in oleylamine. Au core was formed by reducing 24 mg HAuCl4.3H2O in 10 mL oleylamine at 120° C. for 3 h under an Ar blanket. 25 mg platinum acetylacetonate was dissolved in 10 ml oleylamine at 70° C., and then added into the dark purple Au colloidal solution at 120° C. under vigorous stiffing. The solution was fast heated up to 235° C., and kept for 3 h. The whole synthesis process was under Ar protection. The core-shell nanoparticles were collected by precipitation with ethanol and centrifugation, and washed with mixtures of acetone and hexane.
- 10 mg of the dark brown Au—Pt core-shell Nanoparticles were added into a solution of SOCl2 and pyridine (3:1 in volume) at room temperature, and then diluted into 400 mL acetonitrile. The acetonitrile solution was then mixed with 50 mL hexane under vigorous stiffing. After the mixing, the mixture went through a fast phase separation at room temperature. The dissolved Au went into the bottom acetonitrile phase (yellow). Platinum nanoparticles were extracted out of the acetonitrile solution, and re-dispersed in the upper hexane phase (brown). It is surprising that the oleylamine capping agent is so strongly coordinated to the surface of the Platinum nanoparticles that it results in the easy extraction of the capped platinum nanoparticles by hexane. After the acetonitrile was recycled by distillation and condensation (>95% of the acetonitrile was recovered). Au was recovered simply by calcination. The platinum nanoparticles/hexane dispersion was washed several times by mixing with deionized water to remove the ionic residuals. The platinum nanoparticles were recovered after distillation of the hexane.
- XRD patterns of the synthesized Au and platinum nanoparticles were taken. The average sizes of the Au and platinum nanoparticles are approximately 4.8 and 4.3 nm, respectively, based on calculation according to Scherrer's equation (using {111} peaks only, so are the calculations from here after).
- The leaching process of the nanoparticle mixtures was monitored by XRD characterizations of the collected precipitate powders: with leaching of the gold nanoparticles from the mixture, the relative intensity of the Pt {111} peak with regard to the Au {111} peak increased. Platinum nanoparticles were recovered after a thorough leaching of the gold nanoparticles. No distinct broadening of the Pt {111} peak after the leaching process was observed, which indicated that the recovered platinum nanoparticles remain intact during the leaching. The purity of the recovered Pt was 99.49±0.22%, determined by ICP-MS. The yield of the recovered Pt was 80-86% (3.9-4.3 out of the 5 mg).
- UV-vis spectrum and XRD pattern of the synthesized Au—Pt core-shell nanoparticles were consistent with those reported in literature about Au—Pt core-shell nanoparticles. The average diameter of the Au core (by fitting the XRD pattern and calculation based on Scherrer's equation) is 5.8 nm. A very broad Pt {111} peak was evident, corresponding to 3.2 nm in size. The poor signal-to-noise ratio, the weak {200} and {220} peaks, and the broad {111} peak (corresponding to an average size of 3.2 nm) of the recovered platinum nanoparticles were all characteristic of the poor crystallinity and small size of the platinum nanoparticles initially in the form of shells in the Au—Pt core-shell nanoparticles. UV-vis spectra showed a weak surface plasmon resonance (SPR) peaked at around 510 nm for the core-shell nanoparticles; in contrast, SPR disappeared after the gold nanoparticles were leached thoroughly.
- The purity of the recovered platinum is 95.02±0.08%. The purity was relatively low, in comparison with the recovered platinum from the mixture of platinum and gold nanoparticles. A possible reason is that a small amount of gold atoms are mixed indistinguishably into the lattice of the Pt shell during the sequential synthesis process of the Au—Pt core-shell nanoparticles. The recovered platinum and gold were around 2.1 and 6.7 mg, respectively.
- The thionyl reagent and donor solvent can be formulated using organic solvent/reagents other than pyridine. Many organic solvents/reagents such as N,N-dimethylformamide (DMF), imidazole, pyrimidine, and pyrazine can be used as donor solvents. For example, a SOCl2-DMF mixture dissolved Au at a rate of 0.3 mol m−2 h−1; by contrast, neither Pd nor Pt apparently dissolved. One key feature that all the organic candidates have in common is that they can have charge-transfer interactions with SOCl2. Although quantitative analysis is currently unavailable to answer the question of why different donor solvents show different reactivity toward different noble metals, it can be reasonably assumed that the dissolution selectivity derives from the tunable interaction between SOCl2 and the donor solvent.
- Qualitative relative rates of reaction were determined for a range of donor solvents. Gold particles were suspended in acetonitrile and treated with a solution of SOCl2 and donor solvent in a 3:1 v/v ratio of SOCl2:donor solvent. Based on the approximate rate of dissolution, donor solvents were categorized as fast, medium, slow and unreactive. The results are set forth in Table I.
-
TABLE I FAST MEDIUM SLOW UNREACTIVE pyridine thiazole indole acetonitrile N,N′- oxazole quinoline maleimide dimethylformamide pyridazine purine azobisisobutyronitrile (DMF) pyrimidine pteridine aniline imidazole pyrazine phthalocyanine polyaniline triazine N,N′- phenanthroline pyrrolidine dicyclohexylcarbodiimide methylbenzyl cyanide pyrrolidone N,N′-dimethylbenzylamine 2-acetyl-1-methylpyrrole isoxazole dodecyltrimethylammonium benzyltriethylammonium isothiazole bromide tetrafluoroborate pyrazole tri-p-tolyl-phosphine pyrrole pyrazolone bipyrazole - A pure Cu plate (1×1×0.1 cm3, was rough polished with SiC paper (grit 1200 and 2000 sequentially), and fine polished with a Al2O3 (50 nm) slurry. The polished Cu plate was cleaned in a 1:1 mixture of ethanol and acetone with sonication, and dried with nitrogen flow. The plate was then fixed in a clamp made of Teflon, and immersed in 200 mL etchant under stirring. The along-thickness direction was parallel to the direction of rotation of the liquid. After a preset duration, the plate was rinsed with distilled water immediately and thoroughly. The plate was dried with nitrogen flow and then weighed. The etching rate, in mg min−1 cm−2, is calculated from the slope of the line of best fit for the plot of normalized weight loss vs. accumulated immersion time.
-
TABLE 2 Stirring Etching rate Concentration Temperature rate (mg min−1 Etchant (mol L−1) (° C.) (rpm) cm−2) FeCl3 3.76 50 N/A 3.5 CuCl2 2.33 50 N/A 1.7 FeCl3 2 50 1500 27 FeCl3 2 30 1500 17 O2/NH3•H2O 0.9 atm/0.74 26 660 0.03 Alkaline N/A 30-60 N/A 13-27 CuCl2 >2 50-54 N/A 11-22 FeCl3 >2 43-49 N/A 11-22 SOCl2/CH3CN 1 20 500 36 SOCl2/CH3CN 2 20 500 53 SOCl2/CH3CN 1 20 Sonication 320 FeCl3 b 2 50 500 19 FeCl3 b 2 20 Sonication 33 - The etching rate of Cu in 1 mol L−1 SOCl2/CH3CN solution at mild conditions is 36 mg min−1 cm−2. The rate was much faster than those in the current major etchants such as acidic solutions of FeCl3 (11-27 mg min−1 cm−2) and CuCl2 (11-22 mg min−1 cm−2), and ammoniacal alkaline solutions (13-27 mg min−1 cm−2) of higher concentrations and stirring rates at elevated temperatures. The etching rate increased with the concentration of SOCl2. There are two regimes: the low-concentration one (<0.3 mol L−1) with relatively strong concentration dependence, and the high-concentration one with relatively weak concentration dependence. This was consistent with the observed phenomenon that a porous black matter accumulated on the surface of Cu at high SOCl2 concentrations. The black matter was Cu2S formed by chemical reaction between Cu and SOCl2. Cu2S reacted with SOCl2 to become CuCl2 that is soluble in CH3CN, but with a lower rate than the reaction between Cu and SOCl2. Therefore, at high SOCl2 concentrations, the Cu2S formed very fast, and accumulated on the Cu surface as a diffusion barrier layer. The effect of diffusion was distinct for etchants of high SOCl2 concentrations, as can be seen in
FIG. 3 . Sonication (210 W) removed the Cu2S from the Cu surface very efficiently, and therefore, improved the etching rate dramatically (320 mg min−1 cm−2). - There are at least four advantages for the SOCl2/CH3CN etchant. First, the high etching rate provides a method for rapid dissolution or etching of copper. Second, the reaction is the insensitivity to surface oxide on the copper. When the copper surface is initially oxidized Cu, there was no distinct change in the etching rate. Third, it is compatible with current Cu/low-K technology because SiO2 is not soluble in the etchant. In comparison, SiO2 can be etched by alkaline etchants. Finally, the etchant can be recovered/regenerated simply by distillation; in comparison.
- Based on kinetic studies, several efficient processes of selective dissolution of metals are demonstrated. The dissolution selectivity can open up a new avenue toward recycling of noble metals, in particular, platinum. Besides the application in noble metal recovery, the method can find wide applications several industries, including, for example, in microelectronics and mining industries.
- A silicon substrate was metalized with a Pd—Au—Pt layer (250-nm thick each by an e-beam evaporation or DC sputtering, with chromium as the adhesion layer) and the Au and Pd were dissolved, sequentially and respectively in the SOCl2-DMF and the SOCl2-py mixtures. The process is demonstrated in
FIG. 2 . - A copper-gold-platinum metal system on a silica support is treated first with SOCl2 in acetonitrile to separate the copper as a copper chloride, then second with SOCl2 in pyridine to separate the gold as a gold chloride. The remaining metal was platinum metal on a silica support that can be recovered or reprocessed.
- A copper-nickel-platinum particle is treated with a thionyl chloride solution containing actenoitrile to separate the copper and nickel as chloride salts, and the remaining solid contains the platinum metal.
- A crude mixture of mining ore containing a mixture of copper and gold is treated with a thionyl chloride solution containing acetonitrile to separate the copper ore as copper chloride, then treated with a thionyl-DMF solution to separate the gold ore as gold chloride.
- A mixture of used palladium catalysts and platinum catalysts supported on an activated carbon that can be recovered from an industrial process for recycling is first fired to burn off the carbon support, then the remaining material is treated with a thionyl chloride-pyridine solution to separate the palladium as palladium chloride and recover the platinum as a single metal.
- Vapor etching of Au metallization on a circuit board by vaporized SOCl2 and donor solvent was conducted, as shown in
FIG. 3 . A circuit board having a metalized surface of gold, nickel and copper, part of which was protected with an etching mask, was mounted above a solution of thionyl chloride and pyridine was added to the solution via a syringe feed. A nitrogen purge produced a vapor solution that etched the mounted circuit board. Photos of the circuit board are shown, prior to etching, at 5 minutes and at 15 minutes. - The embodiments of the present invention are not limited to the particular formulations, process steps, and materials disclosed herein as such formulations, process steps, and materials may vary somewhat. Moreover, the terminology employed herein is used for the purpose of describing exemplary embodiments only and the terminology is not intended to be limiting since the scope of the various embodiments of the present invention will be limited only by the appended claims and equivalents thereof.
- Therefore, while embodiments of this disclosure have been described in detail with particular reference to exemplary embodiments, those skilled in the art will understand that variations and modifications can be effected within the scope of the disclosure as defined in the appended claims. Accordingly, the scope of the various embodiments of the present invention should not be limited to the above-discussed embodiments, and should only be defined by the following claims and all equivalents.
Claims (26)
1-8. (canceled)
9. A method for separating at least one metal from a substrate, the method comprising:
a) introducing the substrate by solution phase contact or vapor phase contact to a solution comprising SOX1X2;
b) reacting the at least one metal with at least a portion of the SOX1X2 in the solution to form a reaction solution, wherein the reaction solution comprises a metal salt of the at least one metal, and
c) separating the reaction solution containing the metal salt from the substrate
wherein X1 is Cl or Br and X2 is a halide, OR1 or NR2R3 and R1, R2, and R3 are each independently a C1-C6 alkyl, alkenyl, alkynyl, or carbonyl.
10. The method of claim 9 , wherein X2 is Cl, Br, or OR1.
11. The method of claim 9 , wherein SOX1X2 is SOCl2.
12. The method of claim 9 wherein the solution further comprises a donor solvent.
13. The method of claim 12 , wherein the donor solvent is N,N′-dimethylformamide, pyridine, imidazole, thiazole, oxazole, pyridazine, pyrimidine, pyrazine, triazine, pyrrolidine, pyrrolidone, isoxazole, isothiazole, or pyrazole.
14. The method of claim 12 , wherein the donor solvent is N,N′-dimethylformamide, pyridine or imidazole.
15. The method of claim 9 , wherein the solution further comprises a dissolving solvent.
16. The method of claim 15 , wherein the dissolving solvent is an organic solvent.
17. The method of claim 15 , wherein the dissolving solvent is acetonitrile.
18. The method of claim 9 , further comprising
d) recovering at least a portion of the substrate that was separated from the reaction solution, and
e) repeating steps a through c with the recovered substrate.
19. The method of claim 9 , wherein the at least one metal is copper, nickel, iron, tin, indium, silver, gold or palladium.
20-21. (canceled)
22. The method of claim 9 , wherein the at least one metal is gold, silver or palladium.
23. The method of claim 9 , wherein the at least one metal is gold, silver or palladium, and the solution further comprises a donor solvent.
24. The method of claim 9 , wherein the reacting the metal with the SOX1X2 solution comprises stirring, mixing, controlling the temperature or sonicating the solution.
25-31. (canceled)
32. A method for selectively separating at least one metal from a substrate, wherein the substrate comprises platinum and at least one other metal, the method comprising the steps of:
a) introducing the substrate to an organic solution comprising SOX1X2 and a donor solvent,
b) reacting the at least one other metal with the organic solution to form a reaction solution, wherein the reaction solution comprises a metal salt of the at least one other metal, and
c) separating the reaction solution containing the metal salt from the substrate containing the platinum,
wherein X1 is Cl or Br and X2 can be a halide, OR1 or NR2R3, R1, R2, and R3 are each independently a C1-C6 alkyl, alkenyl, alkynyl, or carbonyl, and
wherein the donor solvent is N,N′-dimethylformamide, pyridine, imidazole, thiazole, oxazole, pyridazine, pyrimidine, pyrazine, triazine, pyrrolidine, pyrrolidone, isoxazole, isothiazole, or pyrazole.
33. The method of claim 32 , wherein the at least one metal is copper, nickel, iron, tin, indium, silver, gold or palladium or a combination thereof.
34. The method of claim 32 , wherein the donor solvent is N,N′-dimethylformamide, pyridine or imidazole.
35. The method of claim 32 , wherein the at least one metal is gold, silver or palladium.
36. A method for separating a noble metal from a substrate, the method comprising:
a) introducing the substrate to an organic solution comprising SOX1X2 and a donor solvent,
b) reacting the noble metal with at least a portion of the SOX1X2 in the organic solution to form a reaction solution, wherein the reaction solution comprises a noble metal salt, and
c) separating the reaction solution containing the noble metal from the substrate,
wherein X1 is Cl or Br and X2 can be a halide, OR1 or NR2R3, and R1, R2, and R3 are each independently a C1-C6 alkyl, alkenyl, alkynyl, or carbonyl,
wherein the noble metal is gold, silver, or palladium or a combination thereof; and
wherein the donor solvent is N,N′-dimethylformamide, pyridine, imidazole, thiazole, oxazole, pyridazine, pyrimidine, pyrazine, triazine, pyrrolidine, pyrrolidone, isoxazole, isothiazole, or pyrazole.
37. The method of claim 36 , wherein X1 and X2 are each independently Cl or Br.
38. The method of claim 36 , wherein the donor solvent is N,N′-dimethylformamide, pyridine or imidazole.
39. The method of claim 36 , wherein, before step a), the substrate is first treated with a solution comprising SOX1X2 without a donor solvent, then the substrate is separated from the non-donor solution and subjected to the remaining steps of the method.
40-47. (canceled)
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US20140165786A1 (en) * | 2011-09-01 | 2014-06-19 | Petr Dedek | Method for the removal and recovery of metals and precious metals from substrates |
US20150079786A1 (en) * | 2013-09-17 | 2015-03-19 | Lam Research Corporation | Method and solution for cleaning metal residue |
WO2016066413A1 (en) * | 2014-10-29 | 2016-05-06 | Aixtron Se | Method for separating a carbon structure from a seed structure |
CN106222699A (en) * | 2016-08-27 | 2016-12-14 | 盛隆资源再生(无锡)有限公司 | A kind of direct electrolysis method waste acid recovery is containing the method for stannum in palladium sensitizing solution with palladium |
WO2018152404A1 (en) * | 2017-02-16 | 2018-08-23 | Tyton Biosciences, Llc | Method of separating metal from metallic starting materials using a hydrothermal reactor system |
CN114107663A (en) * | 2021-10-12 | 2022-03-01 | 安徽元琛环保科技股份有限公司 | Method for extracting noble metal from waste noble metal catalyst |
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US20140165786A1 (en) * | 2011-09-01 | 2014-06-19 | Petr Dedek | Method for the removal and recovery of metals and precious metals from substrates |
US10781503B2 (en) * | 2011-09-01 | 2020-09-22 | Petr Dedek | Method for the removal and recovery of metals and precious metals from substrates |
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CN106222699A (en) * | 2016-08-27 | 2016-12-14 | 盛隆资源再生(无锡)有限公司 | A kind of direct electrolysis method waste acid recovery is containing the method for stannum in palladium sensitizing solution with palladium |
WO2018152404A1 (en) * | 2017-02-16 | 2018-08-23 | Tyton Biosciences, Llc | Method of separating metal from metallic starting materials using a hydrothermal reactor system |
CN114107663A (en) * | 2021-10-12 | 2022-03-01 | 安徽元琛环保科技股份有限公司 | Method for extracting noble metal from waste noble metal catalyst |
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WO2012031194A2 (en) | 2012-03-08 |
WO2012031194A3 (en) | 2012-05-18 |
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