US20130161840A1 - Stripper solutions effective for back-end-of-line operations - Google Patents
Stripper solutions effective for back-end-of-line operations Download PDFInfo
- Publication number
- US20130161840A1 US20130161840A1 US13/769,853 US201313769853A US2013161840A1 US 20130161840 A1 US20130161840 A1 US 20130161840A1 US 201313769853 A US201313769853 A US 201313769853A US 2013161840 A1 US2013161840 A1 US 2013161840A1
- Authority
- US
- United States
- Prior art keywords
- substrate
- stripper solution
- hydroxide
- triphenyl phosphonium
- phosphonium hydroxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 54
- 238000000034 method Methods 0.000 claims abstract description 38
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical group [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims abstract description 28
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical group [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims abstract description 18
- 150000001412 amines Chemical class 0.000 claims abstract description 16
- 239000003880 polar aprotic solvent Substances 0.000 claims abstract description 14
- 230000008569 process Effects 0.000 claims abstract description 11
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 75
- 239000000758 substrate Substances 0.000 claims description 70
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 claims description 48
- 239000000203 mixture Substances 0.000 claims description 35
- 238000009472 formulation Methods 0.000 claims description 13
- FEWLNYSYJNLUOO-UHFFFAOYSA-N 1-Piperidinecarboxaldehyde Chemical compound O=CN1CCCCC1 FEWLNYSYJNLUOO-UHFFFAOYSA-N 0.000 claims description 12
- DFQPZDGUFQJANM-UHFFFAOYSA-M tetrabutylphosphanium;hydroxide Chemical compound [OH-].CCCC[P+](CCCC)(CCCC)CCCC DFQPZDGUFQJANM-UHFFFAOYSA-M 0.000 claims description 10
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims description 8
- 125000003118 aryl group Chemical group 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- 239000003039 volatile agent Substances 0.000 claims description 6
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 5
- 238000013019 agitation Methods 0.000 claims description 4
- 235000011187 glycerol Nutrition 0.000 claims description 4
- 239000000010 aprotic solvent Substances 0.000 claims description 3
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 3
- 239000002904 solvent Substances 0.000 claims description 3
- 238000005507 spraying Methods 0.000 claims description 3
- 239000003960 organic solvent Substances 0.000 claims description 2
- PYIGXCSOLWAMGG-UHFFFAOYSA-M methyl(triphenyl)phosphanium;hydroxide Chemical compound [OH-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(C)C1=CC=CC=C1 PYIGXCSOLWAMGG-UHFFFAOYSA-M 0.000 claims 4
- ICBQNKQWOYQWLF-UHFFFAOYSA-N triphenylphosphane;hydrate Chemical compound O.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 ICBQNKQWOYQWLF-UHFFFAOYSA-N 0.000 claims 4
- WZMCFQBYCBFTBH-UHFFFAOYSA-M (2-ethoxy-2-oxoethyl)-triphenylphosphanium;hydroxide Chemical compound [OH-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CC(=O)OCC)C1=CC=CC=C1 WZMCFQBYCBFTBH-UHFFFAOYSA-M 0.000 claims 2
- CDQKRYYETURONW-UHFFFAOYSA-M (3-ethoxy-3-oxopropyl)-triphenylphosphanium;hydroxide Chemical compound [OH-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CCC(=O)OCC)C1=CC=CC=C1 CDQKRYYETURONW-UHFFFAOYSA-M 0.000 claims 2
- QFZKRIMQSKCZQT-UHFFFAOYSA-M butyl(triphenyl)phosphanium;hydroxide Chemical compound [OH-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CCCC)C1=CC=CC=C1 QFZKRIMQSKCZQT-UHFFFAOYSA-M 0.000 claims 2
- PLSLRIPNSJTWLD-UHFFFAOYSA-M dodecyl(triphenyl)phosphanium;hydroxide Chemical compound [OH-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CCCCCCCCCCCC)C1=CC=CC=C1 PLSLRIPNSJTWLD-UHFFFAOYSA-M 0.000 claims 2
- SMSCVBBYKOFGCY-UHFFFAOYSA-M ethyl(triphenyl)phosphanium;hydroxide Chemical compound [OH-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CC)C1=CC=CC=C1 SMSCVBBYKOFGCY-UHFFFAOYSA-M 0.000 claims 2
- KSGSOLSPHHVBRO-UHFFFAOYSA-M hexadecyl(triphenyl)phosphanium;hydroxide Chemical compound [OH-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CCCCCCCCCCCCCCCC)C1=CC=CC=C1 KSGSOLSPHHVBRO-UHFFFAOYSA-M 0.000 claims 2
- 229920000642 polymer Polymers 0.000 claims 2
- XVHQFGPOVXTXPD-UHFFFAOYSA-M tetraphenylphosphanium;hydroxide Chemical compound [OH-].C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 XVHQFGPOVXTXPD-UHFFFAOYSA-M 0.000 claims 2
- ZXUIDEIDTIMBRF-UHFFFAOYSA-M tributyl(hexadecyl)phosphanium;hydroxide Chemical compound [OH-].CCCCCCCCCCCCCCCC[P+](CCCC)(CCCC)CCCC ZXUIDEIDTIMBRF-UHFFFAOYSA-M 0.000 claims 2
- FLNRHACWTVIBQS-UHFFFAOYSA-N triphenyl(prop-2-enyl)phosphanium Chemical compound C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CC=C)C1=CC=CC=C1 FLNRHACWTVIBQS-UHFFFAOYSA-N 0.000 claims 2
- SGKOGTXWLOGBID-UHFFFAOYSA-M triphenyl(propyl)phosphanium;hydroxide Chemical compound [OH-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CCC)C1=CC=CC=C1 SGKOGTXWLOGBID-UHFFFAOYSA-M 0.000 claims 2
- MRQBNUZMZQRIOV-UHFFFAOYSA-M triphenyl(tetradecyl)phosphanium;hydroxide Chemical compound [OH-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CCCCCCCCCCCCCC)C1=CC=CC=C1 MRQBNUZMZQRIOV-UHFFFAOYSA-M 0.000 claims 2
- 229910052751 metal Inorganic materials 0.000 abstract description 13
- 239000002184 metal Substances 0.000 abstract description 13
- 239000004065 semiconductor Substances 0.000 abstract description 13
- 238000005530 etching Methods 0.000 abstract description 10
- 239000003795 chemical substances by application Substances 0.000 abstract description 5
- 238000004380 ashing Methods 0.000 abstract description 2
- 239000000243 solution Substances 0.000 description 62
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical group NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 30
- 238000004140 cleaning Methods 0.000 description 28
- 229920002120 photoresistant polymer Polymers 0.000 description 18
- 235000012431 wafers Nutrition 0.000 description 17
- 239000000463 material Substances 0.000 description 15
- 238000004626 scanning electron microscopy Methods 0.000 description 14
- 239000010410 layer Substances 0.000 description 12
- 238000004519 manufacturing process Methods 0.000 description 10
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 9
- 230000007797 corrosion Effects 0.000 description 8
- 238000005260 corrosion Methods 0.000 description 8
- 239000003112 inhibitor Substances 0.000 description 8
- 0 [1*]C([2*])([3*])[4*].[OH-] Chemical compound [1*]C([2*])([3*])[4*].[OH-] 0.000 description 7
- 230000008859 change Effects 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 239000013522 chelant Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 150000003973 alkyl amines Chemical class 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- -1 pyrogallol; aromatic triazoles Chemical class 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 230000004075 alteration Effects 0.000 description 3
- LHIJANUOQQMGNT-UHFFFAOYSA-N aminoethylethanolamine Chemical compound NCCNCCO LHIJANUOQQMGNT-UHFFFAOYSA-N 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000010432 diamond Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 239000000523 sample Substances 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- ICSNLGPSRYBMBD-UHFFFAOYSA-N 2-aminopyridine Chemical compound NC1=CC=CC=N1 ICSNLGPSRYBMBD-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- ZTHYODDOHIVTJV-UHFFFAOYSA-N Propyl gallate Chemical compound CCCOC(=O)C1=CC(O)=C(O)C(O)=C1 ZTHYODDOHIVTJV-UHFFFAOYSA-N 0.000 description 2
- 150000005215 alkyl ethers Chemical class 0.000 description 2
- CBTVGIZVANVGBH-UHFFFAOYSA-N aminomethyl propanol Chemical compound CC(C)(N)CO CBTVGIZVANVGBH-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- UJMDYLWCYJJYMO-UHFFFAOYSA-N benzene-1,2,3-tricarboxylic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1C(O)=O UJMDYLWCYJJYMO-UHFFFAOYSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 238000000445 field-emission scanning electron microscopy Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 150000004679 hydroxides Chemical group 0.000 description 2
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000011068 loading method Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- FBSFWRHWHYMIOG-UHFFFAOYSA-N methyl 3,4,5-trihydroxybenzoate Chemical compound COC(=O)C1=CC(O)=C(O)C(O)=C1 FBSFWRHWHYMIOG-UHFFFAOYSA-N 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- DJFBJKSMACBYBD-UHFFFAOYSA-N phosphane;hydrate Chemical group O.P DJFBJKSMACBYBD-UHFFFAOYSA-N 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- 125000004209 (C1-C8) alkyl group Chemical group 0.000 description 1
- JJZONEUCDUQVGR-WXUKJITCSA-N (NE)-N-[(2E)-2-hydroxyimino-1,2-diphenylethylidene]hydroxylamine Chemical compound c1ccccc1\C(=N/O)\C(=N\O)\c1ccccc1 JJZONEUCDUQVGR-WXUKJITCSA-N 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- UYBWIEGTWASWSR-UHFFFAOYSA-N 1,3-diaminopropan-2-ol Chemical compound NCC(O)CN UYBWIEGTWASWSR-UHFFFAOYSA-N 0.000 description 1
- 150000005207 1,3-dihydroxybenzenes Chemical class 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- ZUYWFUUNQDJUKG-UHFFFAOYSA-N 1-(butylamino)ethanol Chemical group CCCCNC(C)O ZUYWFUUNQDJUKG-UHFFFAOYSA-N 0.000 description 1
- SUZOCIFIGKCISE-UHFFFAOYSA-N 1-(dimethylamino)propan-1-ol Chemical compound CCC(O)N(C)C SUZOCIFIGKCISE-UHFFFAOYSA-N 0.000 description 1
- JRLAKNMVEGRRGK-UHFFFAOYSA-N 1-(ethylamino)butan-2-ol Chemical compound CCNCC(O)CC JRLAKNMVEGRRGK-UHFFFAOYSA-N 0.000 description 1
- RDTCWQXQLWFJGY-UHFFFAOYSA-N 1-(methylamino)butan-2-ol Chemical compound CCC(O)CNC RDTCWQXQLWFJGY-UHFFFAOYSA-N 0.000 description 1
- LXQMHOKEXZETKB-UHFFFAOYSA-N 1-amino-2-methylpropan-2-ol Chemical compound CC(C)(O)CN LXQMHOKEXZETKB-UHFFFAOYSA-N 0.000 description 1
- KODLUXHSIZOKTG-UHFFFAOYSA-N 1-aminobutan-2-ol Chemical compound CCC(O)CN KODLUXHSIZOKTG-UHFFFAOYSA-N 0.000 description 1
- MPGVRLGIUWFEPA-UHFFFAOYSA-N 1-aminooctan-2-ol Chemical compound CCCCCCC(O)CN MPGVRLGIUWFEPA-UHFFFAOYSA-N 0.000 description 1
- HXKKHQJGJAFBHI-UHFFFAOYSA-N 1-aminopropan-2-ol Chemical compound CC(O)CN HXKKHQJGJAFBHI-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- QHBWSLQUJMHGDB-UHFFFAOYSA-N 2,3-diaminopropan-1-ol Chemical compound NCC(N)CO QHBWSLQUJMHGDB-UHFFFAOYSA-N 0.000 description 1
- GIAFURWZWWWBQT-UHFFFAOYSA-N 2-(2-aminoethoxy)ethanol Chemical compound NCCOCCO GIAFURWZWWWBQT-UHFFFAOYSA-N 0.000 description 1
- LJDSTRZHPWMDPG-UHFFFAOYSA-N 2-(butylamino)ethanol Chemical compound CCCCNCCO LJDSTRZHPWMDPG-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- MIJDSYMOBYNHOT-UHFFFAOYSA-N 2-(ethylamino)ethanol Chemical compound CCNCCO MIJDSYMOBYNHOT-UHFFFAOYSA-N 0.000 description 1
- SGBGCXQCQVUHNE-UHFFFAOYSA-N 2-(ethylamino)propan-1-ol Chemical compound CCNC(C)CO SGBGCXQCQVUHNE-UHFFFAOYSA-N 0.000 description 1
- HSHIHFMFJLIQDN-UHFFFAOYSA-N 2-(methylamino)butan-1-ol Chemical compound CCC(CO)NC HSHIHFMFJLIQDN-UHFFFAOYSA-N 0.000 description 1
- PXWASTUQOKUFKY-UHFFFAOYSA-N 2-(methylamino)propan-1-ol Chemical compound CNC(C)CO PXWASTUQOKUFKY-UHFFFAOYSA-N 0.000 description 1
- BCLSJHWBDUYDTR-UHFFFAOYSA-N 2-(propylamino)ethanol Chemical compound CCCNCCO BCLSJHWBDUYDTR-UHFFFAOYSA-N 0.000 description 1
- VPSSPAXIFBTOHY-UHFFFAOYSA-N 2-amino-4-methylpentan-1-ol Chemical compound CC(C)CC(N)CO VPSSPAXIFBTOHY-UHFFFAOYSA-N 0.000 description 1
- JCBPETKZIGVZRE-UHFFFAOYSA-N 2-aminobutan-1-ol Chemical compound CCC(N)CO JCBPETKZIGVZRE-UHFFFAOYSA-N 0.000 description 1
- DPEOTCPCYHSVTC-UHFFFAOYSA-N 2-aminohexan-1-ol Chemical compound CCCCC(N)CO DPEOTCPCYHSVTC-UHFFFAOYSA-N 0.000 description 1
- BKMMTJMQCTUHRP-UHFFFAOYSA-N 2-aminopropan-1-ol Chemical compound CC(N)CO BKMMTJMQCTUHRP-UHFFFAOYSA-N 0.000 description 1
- KJJPLEZQSCZCKE-UHFFFAOYSA-N 2-aminopropane-1,3-diol Chemical compound OCC(N)CO KJJPLEZQSCZCKE-UHFFFAOYSA-N 0.000 description 1
- ASUDFOJKTJLAIK-UHFFFAOYSA-N 2-methoxyethanamine Chemical compound COCCN ASUDFOJKTJLAIK-UHFFFAOYSA-N 0.000 description 1
- AXCSUIBUZBQBGT-UHFFFAOYSA-N 3-(ethylamino)butan-1-ol Chemical compound CCNC(C)CCO AXCSUIBUZBQBGT-UHFFFAOYSA-N 0.000 description 1
- FBXBSCUQZWUZDD-UHFFFAOYSA-N 3-(ethylamino)propan-1-ol Chemical compound CCNCCCO FBXBSCUQZWUZDD-UHFFFAOYSA-N 0.000 description 1
- HNNZBZKURNBXOO-UHFFFAOYSA-N 3-(methylamino)butan-1-ol Chemical compound CNC(C)CCO HNNZBZKURNBXOO-UHFFFAOYSA-N 0.000 description 1
- KRGXWTOLFOPIKV-UHFFFAOYSA-N 3-(methylamino)propan-1-ol Chemical compound CNCCCO KRGXWTOLFOPIKV-UHFFFAOYSA-N 0.000 description 1
- AGMZSYQMSHMXLT-UHFFFAOYSA-N 3-aminobutan-1-ol Chemical compound CC(N)CCO AGMZSYQMSHMXLT-UHFFFAOYSA-N 0.000 description 1
- LXHUAPWNXDAINJ-UHFFFAOYSA-N 3-aminoheptan-4-ol Chemical compound CCCC(O)C(N)CC LXHUAPWNXDAINJ-UHFFFAOYSA-N 0.000 description 1
- KQIGMPWTAHJUMN-UHFFFAOYSA-N 3-aminopropane-1,2-diol Chemical compound NCC(O)CO KQIGMPWTAHJUMN-UHFFFAOYSA-N 0.000 description 1
- UUCQGNWZASKXNN-UHFFFAOYSA-N 3-ethylcatechol Chemical compound CCC1=CC=CC(O)=C1O UUCQGNWZASKXNN-UHFFFAOYSA-N 0.000 description 1
- JIGUICYYOYEXFS-UHFFFAOYSA-N 3-tert-butylbenzene-1,2-diol Chemical compound CC(C)(C)C1=CC=CC(O)=C1O JIGUICYYOYEXFS-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- PVNNOLUAMRODAC-UHFFFAOYSA-N 4-(ethylamino)butan-1-ol Chemical compound CCNCCCCO PVNNOLUAMRODAC-UHFFFAOYSA-N 0.000 description 1
- DBKSSENEKWOVKL-UHFFFAOYSA-N 4-(methylamino)butan-1-ol Chemical compound CNCCCCO DBKSSENEKWOVKL-UHFFFAOYSA-N 0.000 description 1
- BLFRQYKZFKYQLO-UHFFFAOYSA-N 4-aminobutan-1-ol Chemical compound NCCCCO BLFRQYKZFKYQLO-UHFFFAOYSA-N 0.000 description 1
- CTDFCRIOSLTKFQ-UHFFFAOYSA-N 5-aminooctan-4-ol Chemical compound CCCC(N)C(O)CCC CTDFCRIOSLTKFQ-UHFFFAOYSA-N 0.000 description 1
- VJGRDSFPHUTBBE-UHFFFAOYSA-N 5-aminopentan-2-ol Chemical compound CC(O)CCCN VJGRDSFPHUTBBE-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- ROFVEXUMMXZLPA-UHFFFAOYSA-N Bipyridyl Chemical compound N1=CC=CC=C1C1=CC=CC=N1 ROFVEXUMMXZLPA-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- VMQMZMRVKUZKQL-UHFFFAOYSA-N Cu+ Chemical compound [Cu+] VMQMZMRVKUZKQL-UHFFFAOYSA-N 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical class [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 1
- FSVCELGFZIQNCK-UHFFFAOYSA-N N,N-bis(2-hydroxyethyl)glycine Chemical compound OCCN(CCO)CC(O)=O FSVCELGFZIQNCK-UHFFFAOYSA-N 0.000 description 1
- AKNUHUCEWALCOI-UHFFFAOYSA-N N-ethyldiethanolamine Chemical compound OCCN(CC)CCO AKNUHUCEWALCOI-UHFFFAOYSA-N 0.000 description 1
- OPKOKAMJFNKNAS-UHFFFAOYSA-N N-methylethanolamine Chemical compound CNCCO OPKOKAMJFNKNAS-UHFFFAOYSA-N 0.000 description 1
- XOJVVFBFDXDTEG-UHFFFAOYSA-N Norphytane Natural products CC(C)CCCC(C)CCCC(C)CCCC(C)C XOJVVFBFDXDTEG-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- SPFXQZBXVCUHTR-UHFFFAOYSA-N P(O)(O)=O.OCC Chemical compound P(O)(O)=O.OCC SPFXQZBXVCUHTR-UHFFFAOYSA-N 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- WUGQZFFCHPXWKQ-UHFFFAOYSA-N Propanolamine Chemical compound NCCCO WUGQZFFCHPXWKQ-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- SLINHMUFWFWBMU-UHFFFAOYSA-N Triisopropanolamine Chemical compound CC(O)CN(CC(C)O)CC(C)O SLINHMUFWFWBMU-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical compound C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 125000003178 carboxy group Chemical class [H]OC(*)=O 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- JQDCIBMGKCMHQV-UHFFFAOYSA-M diethyl(dimethyl)azanium;hydroxide Chemical compound [OH-].CC[N+](C)(C)CC JQDCIBMGKCMHQV-UHFFFAOYSA-M 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- LVTYICIALWPMFW-UHFFFAOYSA-N diisopropanolamine Chemical compound CC(O)CNCC(C)O LVTYICIALWPMFW-UHFFFAOYSA-N 0.000 description 1
- 229940043276 diisopropanolamine Drugs 0.000 description 1
- JGUQDUKBUKFFRO-CIIODKQPSA-N dimethylglyoxime Chemical compound O/N=C(/C)\C(\C)=N\O JGUQDUKBUKFFRO-CIIODKQPSA-N 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- HFLGBNBLMBSXEM-UHFFFAOYSA-N ethyl catechol Natural products CCC1=CC=C(O)C(O)=C1 HFLGBNBLMBSXEM-UHFFFAOYSA-N 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 229940074391 gallic acid Drugs 0.000 description 1
- 235000004515 gallic acid Nutrition 0.000 description 1
- LHGVFZTZFXWLCP-UHFFFAOYSA-N guaiacol Chemical compound COC1=CC=CC=C1O LHGVFZTZFXWLCP-UHFFFAOYSA-N 0.000 description 1
- 229960001867 guaiacol Drugs 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229940102253 isopropanolamine Drugs 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 239000012263 liquid product Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 229940044600 maleic anhydride Drugs 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 238000010907 mechanical stirring Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 description 1
- IBKQQKPQRYUGBJ-UHFFFAOYSA-N methyl gallate Natural products CC(=O)C1=CC(O)=C(O)C(O)=C1 IBKQQKPQRYUGBJ-UHFFFAOYSA-N 0.000 description 1
- 231100000324 minimal toxicity Toxicity 0.000 description 1
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 239000000473 propyl gallate Substances 0.000 description 1
- 235000010388 propyl gallate Nutrition 0.000 description 1
- 229940075579 propyl gallate Drugs 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 210000003411 telomere Anatomy 0.000 description 1
- 102000055501 telomere Human genes 0.000 description 1
- 108091035539 telomere Proteins 0.000 description 1
- 230000002277 temperature effect Effects 0.000 description 1
- YNHJECZULSZAQK-UHFFFAOYSA-N tetraphenylporphyrin Chemical compound C1=CC(C(=C2C=CC(N2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3N2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 YNHJECZULSZAQK-UHFFFAOYSA-N 0.000 description 1
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 1
- JAJRRCSBKZOLPA-UHFFFAOYSA-M triethyl(methyl)azanium;hydroxide Chemical compound [OH-].CC[N+](C)(CC)CC JAJRRCSBKZOLPA-UHFFFAOYSA-M 0.000 description 1
- 238000009489 vacuum treatment Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
- C11D7/5004—Organic solvents
- C11D7/5013—Organic solvents containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3218—Alkanolamines or alkanolimines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/36—Organic compounds containing phosphorus
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
- C11D7/5004—Organic solvents
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
- H01L21/02068—Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers
- H01L21/02071—Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers the processing being a delineation, e.g. RIE, of conductive layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/34—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
- H01L21/46—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/428
- H01L21/461—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/428 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/465—Chemical or electrical treatment, e.g. electrolytic etching
-
- C11D2111/22—
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3281—Heterocyclic compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/34—Organic compounds containing sulfur
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Back end of line (BEOL) stripping solutions which can be used in a stripping process that replaces etching resist ashing process are provided. The stripping solutions are useful for fabricating circuits and/or forming electrodes on semiconductor devices for semiconductor integrated circuits with good efficiency and with low and acceptable metal etch rates. Methods for their use are similarly provided. The preferred stripping agents contain a polar aprotic solvent, water, an amine and a quaternary hydroxide that is not tetramethylammonium hydroxide. Further provided are integrated circuit devices and electronic interconnect structures prepared according to these methods.
Description
- This application is a continuation of U.S. patent application Ser. No. 12/490,654 filed Jun. 24, 2009 which claims the benefit of U.S. Provisional Application No. 61/075,195, filed Jun. 24, 2008, which is hereby incorporated by reference.
- The present disclosure relates to a back-end-of-line (BEOL) stripping agent for use in fabricating circuits or forming electrodes on semiconductor devices for semiconductor integrated circuits or liquid crystal displays, semiconductor devices made with the new BEOL stripping agent, and further to a process of producing semiconductor devices using the BEOL stripping agent and for producing the BEOL stripping agent.
- The technology of fabricating semiconductor integrated circuits has advanced with regard to the number of transistors, capacitors and other electronic devices which can be fabricated on a single integrated circuit chip. This increasing level of integration has resulted in large part from a reduction in the minimum feature sizes of the integrated circuits and an increase in the number of layers which make up the integrated circuit. Today's design features, generally referred to as “sub-micron” have dropped below 0.25 microns. The manufacture of integrated circuit components having this reduced size and the need to reduce production steps has placed new demands on all aspects of their production including the removal of resists and related materials with chemical stripper solutions.
- Semiconductor devices for semiconductor integrated circuits or liquid crystal displays are commonly produced by a process including the steps of coating a substrate with one or more layers of polymeric resist materials to provide a resist film; patterning the photosensitive resist film by exposure to light and subsequent development; etching exposed portions of the substrate using the patterned resist film as a mask to form minute circuits; and removing the resist film from the inorganic substrate. Alternatively, after forming minute circuits, the post etch residues can be ashed and the remaining resist residues removed from the substrate with a post etch residue remover. This portion of circuit fabrication is referred to as the back-end-of-line (BEOL) fabrication. What is needed is a BEOL stripper solution which can remove remaining photoresists and post etch residues in a single step.
- A superior BEOL stripper solution should: (a) quickly and cleanly remove resist residues, etch residues and related materials at moderate to low temperatures without requiring a final ashing or post etch removal step, (b) have an acceptable effect on the all exposed components, particularly the underlying low or ultra low-κ dielectric and metals, (c) have a substantial capacity to dissolve and/or suspend resist and/or post etch residue to forestall precipitation and/or re-deposition of solid onto the wafer necessitating the early disposal of the stripper solution, (d) be safe to use in a manufacturing environment, (e) have an acceptable shelf-life and (f) be backward compatible with lower technology nodes. A superior BEOL stripper solution should also quickly remove resist residues in a rework process without substrate damage. Finally, superior stripper solutions should exhibit minimal toxicity. This present disclosure addresses and resolves these needs.
- A general object of the present invention is to provide a composition for removing a photoresist, residue, and related materials from a back-end-of-line (BEOL) operation, a method for utilizing the composition in the manufacture of a semiconductor structure, and a semiconductor structure manufactured utilizing the composition. Preferred embodiments of the composition can be utilized without etching or otherwise damaging metals and/or dielectric material contained in or on the semiconductor structure. As used herein, the term resist refers to a photoresist or resist material, a post etch residue, or a combination thereof.
- One object of the present disclosure is a BEOL stripper composition which includes a polar aprotic solvent, water, an amine and a quaternary hydroxide. Suitable quaternary hydroxides are represented by formula I, provided below:
- where Z is N or P and R1, R2, R3, and R4 are alkyl groups, aryl groups, or a combination thereof having collectively at least 5 carbons. The preferred BEOL stripper solutions contain substantially no tetramethylammonium hydroxide. For preferred BEOL stripper solutions, the amine is a hydroxy-substituted alkylamine and/or an alkyl ether of a hydroxy-substituted alkylamine. A particularly preferred hydroxy-substituted alkylamine is monoethanolamine and a preferred amine ether is the methyl ether of a hydroxy-substituted alkylamine. For the preferred BEOL stripper solutions, the polar aprotic solvent is dimethyl sulfoxide (DMSO). Although the concentrations of DMSO can range from about 20% to about 95%, in the preferred BEOL solutions, the aprotic solvent concentration generally ranges from about 40 to about 90 weight per cent, more preferably from about 55 to about 90 weight per cent. Water content for the preferred solutions generally ranges from about 2 to about 15 weight per cent. However, the optimum amount of water can vary depending on the selection of the other components and their proportions. Although the BEOL stripper solutions described herein have been optimized for BEOL applications, these stripper solutions can be used to remove photoresists, etch residues, and the like in a variety of other standard applications including, but not limited to (i) high dose implant resist removal, (ii) post etch residue in gate formation, (iii) post etch residue in floating gate formation, and (iv) re-work applications.
- Another object of the present disclosure is to provide a method for removing a resist film from a substrate in a BEOL process. The method includes the steps of providing a substrate having a component selected from the group consisting of photoresists, planarizing materials, photoresist residues, and the like thereon, and contacting the substrate with a composition including the BEOL stripper solution to effect removal of the photoresist and related materials. Photoresists, planarizing materials, photoresist residues, and the like are collectively referred to herein as “resists.” Preferred BEOL stripper solutions used in the contacting step include those described above. The step of contacting can involve immersion of a substrate in a stripper solution or by spraying the stripper solution onto the substrate using a spray tool, with or without other cleaning aids such as for example megasonics. Further steps following contacting can involve the additional steps of removing the substrate from contact with the stripper solution and/or rinsing the substrate with an appropriate solvent. During the contacting step, the stripper solution is preferably maintained at a temperature of at least about 40° C. and more preferably at a temperature ranging from about 50° C. to about 75° C.
- An important substrate property is a low-κ permittivity value. This value can change, typically increase, following contact with a stripper solution. This change in the low-κ permittivity value (Δ κ) can be minimized by removing volatiles from the substrate following contact with the stripper solution and a rinsing step. Volatiles can be removed from a treated substrate by heating the substrate, subjecting the substrate to a reduced pressure, or a combination thereof. Removal can occur as a result of a treatment specifically designed to remove volatiles or occur coincidentally during subsequent processing steps that involve heating and/or vacuum treatment. With current technology, it is desirable that the removal of a resist from a substrate result in a change in the low-κ permittivity value of ≦0.1
- Another object of the present disclosure is to provide an electronic interconnect structure prepared in part by removing resists, resist residues, and the like from a substrate having metal components according to the method described above to produce an interconnect structure with a reduced number of etching processes and providing reduced damage to the structure.
FIG. 4 illustrates a typical electronic interconnectstructure having trenches barrier layer 4,Trenches - Another object of the present disclosure is to provide an integrated circuit device obtainable in part by processing wafers containing metal components to remove resist residues according to the method described above with reduced metal etching.
FIG. 5 illustrates a typical integrated circuit device having a plurality of computer chips illustrated by I interconnected through chip routers illustrated by 2. - A still further object of the present disclosure is to provide a method for preparing a BEOL stripper solution by providing a container; providing the components of a stripper solution; and adding the components to the container to provide contents within the container. Providing components can include providing individual components, a composition containing various components, or combinations thereof. Further, adding components of a stripper solution can involve adding individual components, premixed components, and/or a preformed stripper solution containing provided components in substantially any order. Preferred components include a polar aprotic organic solvent, water, an amine, and a quaternary hydroxide, where the quaternary hydroxide has the formula:
- where Z is N or P and R1, R2, R3, and R4 are alkyl groups, aryl groups, or a combination thereof having collectively at least 5 carbons. A container can include substantially any vessel capable of holding a stripper solution and includes a typical container used for shipping or transporting a liquid product, equipment used to contain stripper solutions for use processing substrates to remove photoresists and/or etch residues. As used herein a vessel includes equipment used to hold and/or transport a stripper solution during the processing of substrates and includes, but is not limited to holding and transfer vessels including any pipe system used to transport a stripper solution.
-
FIG. 1A provides an SEM (top view) of a via array after an unsuccessful cleaning procedure that would be considered not clean (NC). -
FIG. 1B provides an SEM (top view) of a single via after an unsuccessful cleaning procedure that would be considered not clean (NC). -
FIG. 2A provides an SEM (top view) of a via array after a successful cleaning procedure that would be considered clean (C). -
FIG. 2B provides an SEM (cross section) of a via array after a successful cleaning procedure that would be considered clean (C). -
FIG. 2C provides an SEM (top view) of a single via after an successful cleaning procedure that would be considered clean (C). -
FIG. 3A provides an SEM (top view) of a via array after a successful cleaning procedure that resulted in extensive etch damage to the low k dielectric. -
FIG. 3B provides an SEM (top view) of a via after a successful cleaning procedure that resulted in extensive etch damage to the low K dielectric. -
FIG. 4 illustrates an electronic interconnect structure. -
FIG. 5 illustrates an electronic device containing a plurality of electronic interconnect structures. -
FIG. 6 illustrates a typical photoresist or resist stack. - For the purposes of promoting an understanding of the present disclosure, references will now be made to the embodiments illustrated and specific language will be used to describe the same. It will nevertheless be understood that no limitation of the scope of what is claimed is thereby intended, such alterations and further modifications and such further applications of the principles thereof as illustrated therein being contemplated as would normally occur to one skilled in the art to which the disclosure relates.
- As used herein, back-end-of line or BEOL, refers to the part of integrated circuit fabrication where transistors, resistors, and the like are interconnected with the wiring. The BEOL portion of fabrication typically begins with patterning for the first metal contact or with deposition of the first layer of metal onto the wafer.
- The compositions according to this present disclosure include a BEOL stripper solution containing a polar aprotic solvent, water, and an amine and a quaternary hydroxide. Preferred stripper solutions comprise dimethyl sulfoxide, water, an amine and a quaternary hydroxide represented by the following formula:
- where Z is N or P and R1, R2, R3, and R4 are alkyl groups, aryl groups, or a combination thereof having collectively at least 5 carbons. The BEOL stripper solutions can also contain an alkanolamine or the alkyl ether of an alkanolamine. Preferred quaternary hydroxides include tetrabutylammonium hydroxide and tetrabutylphosphonium hydroxide. Particularly preferred BEOL stripper solutions are also substantially free of tetramethylammonium hydroxide (“TMAH”). A stripper solution that contains less than about 0.5% TMAH is considered to be substantially free of TMAH.
- The compositions typically contain about 20% to about 95%, and more preferably from about 40% to about 90% of a polar aprotic solvent such as, for example, DMSO and from about 2% to about 10% of the quaternary hydroxide. Preferred quaternary substituents include (C1-C8) alkyl, benzyl, aryl and combinations thereof provided that the number of carbons included in the four substituents is at least 5. The stripping formulations can also contain an optional surfactant, typically at levels in the range of about 0.01% to about 3% or more preferably in the range of from about 0.01 to about 2%. Suitable levels of the required alkanolamine can range from about 2% to about 60% of the composition. The preferred compositions tested so far also include from about 2% to about 10% water. All %'s provided herein are weight per cents.
- Preferred alkanolamines have at least two carbon atoms and have the amino and hydroxyl substituents on different carbon atoms. Suitable alkanolamines include, but are not limited to, ethanolamine, N-methylethanolamine, N-ethylethanolamine, N-propylethanolamine, N-butylethanolamine, diethanolamine, triethanolamine, N-methyldiethanolamine, N-ethyldiethanolamine, isopropanolamine, diisopropanolamine, triisopropanolamine, N-methylisopropanolamine, N-ethylisopropanolamine, N-propylisopropanolamine, 2-aminopropane-1-ol, N-methyl-2-aminopropane-1-ol, N-ethyl-2-aminopropane-1-ol, 1-aminopropane-3-ol, N-methyl-1-aminopropane-3-ol, N-ethyl-1-aminopropane-3-ol, 1-aminobutane-2-ol, N-methyl-1-aminobutane-2-ol, N-ethyl-1-aminobutane-2-ol, 2-aminobutane-1-ol, N-methyl-2-aminobutane-1-ol, N-ethyl-2-aminobutane-1-o1, 3-aminobutane-1-ol, N-methyl-3-aminobutane-1-ol, N-ethyl-3-aminobutane-1-ol, 1-aminobutane-4-ol, N-methyl-1-aminobutane-4-ol, N-ethyl-1-aminobutane-4-ol, 1-amino-2-methylpropane-2-ol, 2-amino-2-methylpropane-1-ol, 1-aminopentane-4-ol, 2-amino-4-methylpentane-l-ol, 2-aminohexane-1-ol, 3-aminoheptane-4-ol, 1-aminooctane-2-ol, 5-aminooctane-4-ol, 1-aminopropane-2,3-diol, 2-aminopropane-1,3-diol, tris(oxymethyl)aminomethane, 1,2-diaminopropane-3-ol, 1,3-diaminopropane-2-ol, and 2-(2-aminoethoxy)ethanol. Ethers of the preferred alkanolamines can similarly be utilized.
- Although not required, formulations of the stripper solutions can additionally contain a corrosion inhibitor to further minimize any metal corrosion during contact with the stripper solution. Suitable corrosion inhibitors include, but are not limited to, Cu(I) and Cu(II) salts, aromatic hydroxyl compounds such as catechol; alkylcatechols such as methylcatechol, ethylcatechol and t-butylcatechol, resorcinols, phenols and pyrogallol; aromatic triazoles such as benzotriazole; alkylbenzotriazoles; carboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, isobutyric acid, oxalic acid, malonic acid, succinic acid, glutaric acid, maleic acid, fumaric acid, benzoic acid, phtahlic acid, 1,2,3-benzenetricarboxylic acid, glycolic acid, lactic acid, malic acid, citric acid, acetic anhydride, phthalic anhydride, maleic anhydride, succinic anhydride, salicylic acid, gallic acid, and gallic acid esters such as methyl gallate and propyl gallate; organic salts of carboxyl containing organic containing compounds described above, ethyl silicate, basic substances such as ethanolamine, trimethylamine, diethylamine and pyridines, such as 2-aminopyridine, and the like, and chelate compounds such as phosphoric acid-based chelate compounds including 1,2-propanediaminetetramethylene phosphonic acid and hydroxyethane phosphonic acid, carboxylic acid-based chelate compounds such as ethylenediaminetetraacetic acid and its sodium and ammonium salts, dihydroxyethylglycine and nitrilotriacetic acid, amine-based chelate compounds such as bipyridine, tetraphenylporphyrin and phenanthroline, and oxime-based chelate compounds such as dimethylglyoxime and diphenylglyoxime. A single corrosion inhibitor may be used or a combination of corrosion inhibitors may be used.
- Examples of suitable corrosion inhibitors useful in the BEOL stripper solutions are described in U.S. patent application Ser. No. 11/928,754, filed on Oct. 30, 2007, and in U.S. patent application Ser. No. 11/928,728, filed on Oct. 30, 2007. Corrosion inhibitors have typically proven useful at levels ranging from about 1 ppm to about 10%.
- Preferred stripper solutions can also be formulated to minimize or prevent damage to the low or ultra low-κ dielectric layers present in a wafer. One approach involves the addition of a dielectric damage inhibitor such as glycerine. Suitable levels of glycerin or other inhibitor are currently believed to be in the order of about 0.25 to 1%. A second approach involves replacement of a low molecular weight alkanolamine with a higher molecular weight alkanolamine. Reduced damage to the dielectric layer has been achieved by replacing, on a gram for gram basis, monoethanolamine with aminoethylethanolamine.
- Preferred optional surfactants have included fluorosurfactants. One example of a preferred fluorosurfactant is DuPont FSO (fluorinated telomere B monoether with polyethylene glycol (50%), ethylene glycol (25%), 1,4-dioxane (<0.1%), water 25%). Preferred temperatures of at least 40° C. are preferred for contacting the substrate whereas for a majority of applications, temperatures of from about 50° C. to about 75° C. are more preferred, For particular applications where the substrate is either sensitive or longer removal times are required, lower contacting temperatures are appropriate. For example, when reworking substrates, it may be appropriate to maintain the stripper solution at a lower temperature for a longer time to remove the photoresist and avoid damaging to the substrate. If longer contact times are required for complete resist removal, placing a blanket of dry nitrogen over the stripper solution can reduce water uptake from the atmosphere and maintain the dry stripper solution's improved performance.
- When immersing a substrate, agitation of the composition additionally facilitates photoresist removal. Agitation can be effected by mechanical stirring, circulating, by bubbling an inert gas through the composition, or any combination thereof. Upon removal of the desired amount of resist film, the substrate is removed from contact with the stripper solution and rinsed with water, an alcohol, or a mixture thereof. DI water is a preferred form of water and isopropanol is a preferred alcohol. For substrates having components subject to oxidation, rinsing can be done under an inert atmosphere. The preferred stripper solutions according to the present disclosure have improved loading capacities for photoresist materials compared to current commercial products and are able to process a larger number of substrates with a given volume of stripper solution. As used herein, loading capacity refers to the ability of a stripper solution to dissolve, suspend, or otherwise avoid precipitation and/or re-deposition of a solid onto a wafer being cleaned.
- In addition to immersion techniques, wafers can also be contacted with a stripper solution utilizing a spray device with the stripper solution maintained at the desired temperature. The spraying can optionally be carried out using additional cleaning aids including ultrasonics and/or under an inert atmosphere or optionally in the presence of an active gas such as, for example, oxygen or ozone. The wafer can be removed periodically and inspected to determine when sufficient cleaning has occurred. The clean wafer can be rinsed with isopropanol and dried. This method can be used to remove multiple layers of resist and as a BEOL cleaning step.
- Additionally, wafers containing resist stacks having one or multiple layers of positive and/or negative resists can also be processed by these methods. Typical resist stacks can include, but are not limited to, one or multiple layers of resist which can include, for example, a planarizing layer, a bottom antireflection coating layer, a hard mask, and/or a photoresist.
FIG. 6 illustrates a typical generic via first resist stack that includes: (a) an ultra low-κ dielectric 10, (b) aplanarizing material 12 within and above thevias 16 and the dielectric 10, (c) ahard mask 13 in contact with theplanarizing material 12, (d) abottom antireflection coating 14 in contact with thehard mask 13, and (e) aphotoresist 18.FIG. 6 is provided to illustrate the relationship between layers in one type of typical stack layer and is not meant to limit the utility of the stripper solutions disclosed. One skilled in the art will recognize that other combinations of layers can be utilized depending on the process being utilized and the materials selected and that the solutions disclosed can similarly remove these other stack layer combinations. -
FIG. 1A provides an SEM (top view) of a via array illustrating a “not clean” (NC) result.FIG. 1B provides an SEM (top view) of a single via illustrating a “not clean” (NC) result.FIG. 2A provides an SEM (top view) of a via array illustrating a “clean” (C) result.FIG. 2B provides an SEM of a via array illustrating a “clean” (C) result.FIG. 2C provides an SEM (top view) of a single via illustrating a “clean” (C) result.FIG. 3A provides an SEM (top view) of a via array illustrating a wafer having extensive etching of the low-κ dielectric.FIG. 3B provides an SEM (top view) of a single via illustrating extensive etching of the low-κ dielectric. - The components for the formulation tested in the following Examples were combined with stirring at room temperature to give 100 g of a homogeneous stripper solution. The solution was heated to 65° C. with slow agitation. Patterned test wafers with via and trench patterns formed in ultra low-κ black diamond II were obtained. The test wafers still had their photoresist stack present, and had not been cleaned or processed further after pattern transfer into the ultra low-κ black diamond II. The patterned test wafers were cleaved into ˜4 cm×3 cm pieces and mounted into a small scale wafer holder.
- Unless otherwise noted in a Table, each stripper solution was heated to 65° C. and a wafer piece immersed. The timer was started as soon as they were fully immersed. Immersion was maintained 1, 3, 5, or 10 minutes, after which the wafer was rinsed with isopropanol and dried. Samples were evaluated as clean (C) if substantially all materials had been removed and not clean (NC) if substantially all materials had not been removed.
FIGS. 1A , 1B, 2A, 2B, 2C, 3A, and 3B illustrate what is meant by C and NC. As can be determined by the FIGS. not clean (NC) did not mean that no cleaning at all had occurred. The methods can similarly be carried out with a spray tool. - For imaging, the sample was cleaved into 2 cm×3 cm pieces and the surface was gently flushed to remove dust and particles. Samples were propped in sputter chamber at an approximately 30° angle with cleaved edge facing upward. The chamber was pumped down to 20 mTorr before Ar gas was bled in to a pressure of 50 mTorr. The power supply was turned on and adjusted to 20 mA. Samples were sputtered for 100 s [Pd target, 4″ diameter, ⅛th inch thick from Ted Pella] to deposit approximately 0.8 nm of Pd metal on the sample surface. Scanning electron microscopy (SEM) images were obtained on either an FEI Sirion FE-SEM with 1-3 nm resolution, or a Hitachi S-4800 UHR FE-SEM with 1-1.4 nm resolution.
- Test samples obtained and prepared as described above were immersed in test samples of stripper solutions for 1, 2, 3, and 4 minute intervals and evaluated for cleaning as described above. The results for several different stripper formulations are provided in Table I below. As shown in Table 1, the inclusion of an alkanolamine or its ether can improve cleaning performance, and the selection of the specific alkanolamine and its concentration can further impact the stripper solution's cleaning performance.
-
TABLE 1 Cleaning Result (min.) at 65° C. Example Formulation 1 2 3 4 1-a 87 g DMSO 5.5 g tetrabutylammonium hydroxide NC C C C 4.5 g H2O 1-b 87 g DMSO 5.5 g tetrabutylammonium hydroxide C C C C 4.5 g H2O 3 g monoethanolamine 1-c 87 g DMSO 5.5 g tetrabutylammonium hydroxide NC C C C 4.5 g H2O 3 g tertiary butylaminoethanol 1-d 87 g DMSO 5.5 g tetrabutylammonium hydroxide NC NC C C 4.5 g H2O 3 g 2-amino-2-methyl-l-propanol 1-e 87 g DMSO 5.5 g tetrabutylammonium hydroxide NC C C C 4.5 g H2O 3 g N,N-dimethylamino-l-propanol 1-f 65 g DMSO 5.5 g tetrabutylammonium hydroxide NC NC NC NC 4.5 g H2O 25 g aminoethylethanolamine 1-g 84 g DMSO 5.5 g tetrabutylammonium hydroxide C C C C 4.5 g H2O 6 g monoethanolamine 1-h 83 g DMSO 3 g diethyldimethylammonium hydroxide C C C C 11 g H2O 3 g monoethanolamine 1-i 81 g DMSO 3 g methyltriethylammonium hydroxide C C C C 13 g H2O 3 g monoethanolamine 1-j 86 g DMSO 5.5 g tetrabutylammonium hydroxide C C C C 4.5 g H2O 4 g 1-amino-2-methoxyethane 1-k 93.5 g DMSO 3 g tetrabutylammonium hydroxide NC C C C 2 g H2O 1.5 g monoethanolamine 1-l 87 g DMSO 4 g tetrapropylammonium hydroxide NC C C C 6 g H2O 3 g monoethanolamine C = clean and NC = not clean - As noted in Table 2, the addition of varying amounts of tetramethylammonium hydroxide to a stripper solution interfered with the cleaning process and in some instances caused etching of the low-κ dielectric.
-
TABLE 2 Cleaning Result (min. ) at 65° C. Example Formulation 1 2 3 4 2-a 87 g DMSO C C C C 5.5 g tetrabutylammonium hydroxide 4.5 g H2O 3 g monoethanolamine 2-b 89 g DMSO NC NC NC NC 3 g tetrabutylammonium hydroxide 1 g tetramethylammonium hydroxide 4 g H2O 3 g monoethanolamine 2-c 90 g DMSO NC NC NC NC* 3.5 g tetrabutylammonium hydroxide 0.5 g tetramethylammonium hydroxide 3 g H2O 3 g tertiary monoethanolamine 2-d 87.5 g DMSO NC NC NC NC* 5 g tetrabutylammonium hydroxide 0.2 g tetramethylammonium hydroxide 4.3 g H2O 3 g monoethanolamine 2-e 70 g DMSO NC NC NC NC 5 g tetrabutylammonium hydroxide 5 g H2O 20 g monoethanolamine C = clean; NC = not clean, *= badly etched low-κ dielectric - The data provided in Table 3 illustrates that: (a) a stripper solution with no water performed poorly, (b) the addition of some water improved the cleaning performance of the solution, and (c) the addition of too much water caused etching of the low-κ dielectric with longer contact times.
-
TABLE 3 Cleaning Result (min.) at 65° C. Example Formulation 1 2 3 4 3-a 42 g DMSO NC NC NC NC 5.5 g tetrabutylammonium hydroxide 49.5 g propylene glycol 3 g monoethanolamine 3-b 87 g DMSO NC C C C 5.5 g tetrabutylammonium hydroxide 2.2 g H2O 3 g monoethanolamine 3-c 87 g DMSO C C C C 5.5 g tetrabutylammonium hydroxide 4.5 g H2O 3 g monoethanolamine 3-d 87 g DMSO C C* C* C* 5.5 g tetrabutylammonium hydroxide 7.5 g H2O 3 g monoethanolamine C = clean; NC = not clean, *= badly etched low-κ dielectric - Information regarding cleaning performance as a function of temperature is provided in. Table 4, below.
-
TABLE 4 Cleaning Result at one minute Example Formulation 55° C. 60° C. 65° C. 70° C. 4 87 g DMSO NC NC C C 5.5 g tetrabutylammonium hydroxide 4.5 g H2O 3 g monoethanolamine C = clean and NC = not clean - A stripper solution containing tetrabutylphosphonium hydroxide cleaned effectively and showed little effect on the low-κ dielectric. Additionally, other quaternary phosphonium hydroxides can be utilized to optimize cleaning performance.
-
TABLE 5 Cleaning Result (min.) at 65° C. Example Formulation 1 2 3 4 5-a 81 g DMSO C C C C 7 g tetrabutylphosphonium hydroxide 9 g H2O 3 g monoethanolamine 5-b 81 g DMSO NC NC C C 7 g tetrabutylphosphonium hydroxide 9 g H2O 3 g amino ethylethanolamine 5-c 80.5 g DMSO C C C C 7 g tetrabutylphosphonium hydroxide 9 g H2O 3 g monoethanolamine 0.5 g glycerine C = clean and NC = not clean - As illustrated in Table 6, the stripper solutions can contain a second polar aprotic solvent and maintain desired cleaning levels.
-
TABLE 6 Cleaning Result (min.) at 65° C. Example Formulation 1 2 3 4 2-a 87 g DMSO C C C C 5.5 g tetrabutylammonium hydroxide 4.5 g H2O 3 g monoethanolamine 6-a 86.5 g DMSO C C C C 0.5 g 1-formylpiperidine 5.5 g tetrabutylammonium hydroxide 1 g tetramethylammonium hydroxide 4.5 g H2O 3 g monoethanolamine 6-b 87 g DMSO NC NC C C 5 g 1-formylpiperidine 5.5 g tetrabutylammonium hydroxide 4.5 g H2O 3 g monoethanolamine 6-c 81 g DMSO C C C C 7 g tetrabutylphosphonium hydroxide 9 g H2O 3 g monoethanolamine 6-d 80.5 g DMSO NC C C C 0.5 g 1-formylpiperidine 7 g tetrabutylphosphonium hydroxide 9 g H2O 3 g monoethanolamine 6-e 81 g DMSO C C C C 5 g 1-formylpiperidine 7 g tetrabutylphosphonium hydroxide 9 g H2O 3 g monoethanolamine C = clean and NC = not clean - Blanket wafers of pristine Black Diamond II (BDII) were sectioned into about 1″×1″ samples. The samples were first put into the oven at 250° C. for 30 minutes to ensure that, prior to immersion in stripper solution, they obtained the low permittivity value (κa) that they had at deposition. Results were recorded. The samples were then immersed in the formulation described in Example 5(c) for 60 seconds at 65° C., removed, rinsed with water and isopropyl alcohol, and dried. Permittivity measurements were made and the results recorded to provide a low permittivity value κb. The dried samples were then placed in an oven maintained at 250° C. for 30 minutes. Permittivity measurements were made and the results recorded (κc). [All permittivity values were measured on a Mercury Probe, model 802B from Materials Development Corporation, Chatsworth, Calif., www.mdc4ov.com and the results were recorded.] A typical set of values obtained from this procedure include κa=2.40; κb=2,87; and κc=2.49. The change in the low permittivity value (Δκ) obtained by removing volatiles is therefore 2.49-2.40 or 0.09. Had the volatiles not been removed, the change in low permittivity value (Δκ) would have been 2.87-2.40 or 0.47. Maintaining a Δκ of ≦0.1 is necessary for successful implementation in a semiconductor manufacturing process using low-κBDII.
- While applicant's invention has been described in detail above with reference to specific embodiments, it will be understood that modifications and alterations in embodiments disclosed may be made by those practiced in the art without departing from the spirit and scope of the invention. All such modifications and alterations are intended to be covered. In addition, all publications cited herein are indicative of the level of skill in the art and are hereby incorporated by reference in their entirety as if each had been individually incorporated by reference and fully set forth.
Claims (23)
1. A stripper solution for removing a resist from a substrate comprising a polar aprotic solvent, water, an amine, and a quaternary hydroxide, wherein the quaternary hydroxide has the formula:
where Z is P and R1, R2, R3, and R4 are alkyl groups, benzyl, aryl groups, or a combination thereof having collectively at least 5 carbons.
2. The stripper solution of claim 1 , wherein the stripper solution additionally contains glycerine and the polar aprotic solvent is selected from the group consisting of dimethyl sulfoxide and 1-formylpiperidine.
3. The stripper solution of claim 1 , wherein the aprotic solvent comprises from about 40% to about 90% of the composition; water comprises from about 2% to about 15% of the composition; the quaternary hydroxide comprises from about 1% to about 10% of the composition; and the amine comprises from about 2% to about 60% of the composition.
4. The stripper solution of claim 3 , wherein the aprotic solvent is dimethyl sulfoxide.
5. The stripper solution of claim 1 , wherein Z is P.
6. The stripper solution of claim 3 , wherein said amine is an alkanolamine having at least two carbon atoms, at least one amino substituent and at least one hydroxyl substituent, the amino and hydroxyl substituents attached to different carbon atoms.
7. The stripper solution of claim 3 , wherein the quaternary hydroxide comprises tetrabutyl phosphonium hydroxide, tetraphenyl phosphonium hydroxide, methyl triphenyl phosphonium hydroxide, ethyl triphenyl phosphonium hydroxide, propyl triphenyl phosphonium hydroxide, butyl triphenyl phosphonium hydroxide, benzyl triphenyl phosphonium hydroxide, allyl triphenyl phosphonium hydroxide, dodecyl triphenyl phosphonium hydroxide, tetradecyl triphenyl phosphonium hydroxide, hexadecyl triphenyl phosphonium hydroxide, hexadecyl tributyl phosphonium hydroxide, carbethoxyethyl triphenyl phosphonium hydroxide, carbmethoxyethyl triphenyl phosphonium hydroxide, carbethoxymethyl triphenyl phosphonium hydroxide, or carbmethoxymethyl triphenyl phosphonium hydroxide.
8. The stripper solution of claim 7 , wherein the quaternary hydroxide comprises tetrabutylphosphonium hydroxide.
9. The stripper solution of claim 1 , wherein the stripper solution contains substantially no tetramethylammonium hydroxide.
10. A method for removing a resist from a substrate comprising: (a) providing a substrate having a resist thereon; (b) contacting the substrate with a stripper solution for a time sufficient to remove the resist; (c) removing the substrate from the stripping solution; and (d) rinsing the stripper solution from the substrate with a solvent, wherein the step of contacting the substrate with a stripper solution involves contacting the substrate with a stripper solution including a polar aprotic solvent, water, an amine, and a quaternary hydroxide having the formula:
where Z is P and R1, R2, R3, and R4 are alkyl groups, benzyl, aryl groups, or a combination thereof having collectively at least 5 carbons.
11. The method of claim 10 , wherein contacting the substrate with a stripper solution includes contacting the substrate with a stripper solution including a polar aprotic solvent comprising from about 40% to about 90% of the composition; water comprising from about 2% to about 10% of the composition; the quaternary hydroxide comprising from about 1% to about 10% of the composition; and the amine comprising from about 2% to about 65% of the composition
12. The method of claim 11 , wherein contacting the substrate with a stripper solution includes contacting the substrate with a stripper solution, wherein the polar aprotic solvent is dimethyl sulfoxide.
13. The method of claim 11 , wherein contacting the substrate with a stripper solution includes contacting the substrate with a stripper solution, wherein the polar aprotic solvent is 1-formylpiperidine.
14. The method of claim 10 , wherein contacting the substrate with a stripper solution includes contacting the substrate with a stripper solution including an amine which comprises an alkanolamine having at least two carbon atoms, at least one amino substituent and at least one hydroxyl substituent, the amino and hydroxyl substituents attached to different carbon atoms.
15. The method of claim 10 , wherein contacting the substrate with a stripper solution includes contacting the substrate with a stripper solution having a quaternary hydroxide selected from the group consisting of tetrabutylammonium hydroxide, tetraphenyl phosphonium hydroxide, methyl triphenyl phosphonium hydroxide, ethyl triphenyl phosphonium hydroxide, propyl triphenyl phosphonium hydroxide, butyl triphenyl phosphonium hydroxide, benzyl triphenyl phosphonium hydroxide, allyl triphenyl phosphonium hydroxide, dodecyl triphenyl phosphonium hydroxide, tetradecyl triphenyl phosphonium hydroxide, hexadecyl triphenyl phosphonium hydroxide, hexadecyl tributyl phosphonium hydroxide, carbethoxyethyl triphenyl phosphonium hydroxide, carbmethoxyethyl triphenyl phosphonium hydroxide, carbethoxymethyl triphenyl phosphonium hydroxide, or carbmethoxymethyl triphenyl phosphonium hydroxide.
16. The method of claim 10 , wherein contacting the substrate with a stripper solution includes immersing the substrate in the stripping solution with agitation at a temperature of at least about 40° C.
17. The method of claim 10 , wherein contacting the substrate with a stripper solution includes spraying the stripper solution onto the substrate, wherein the stripper solution is at a temperature of at least about 40° C.,
18. The method of claim 10 , wherein contacting the substrate with a stripper solution includes contacting the substrate with a stripper solution having substantially no tetramethylammonium hydroxide.
19. The method of claim 10 , wherein providing a substrate having a resist thereon, involves providing a substrate having a resist which is a bilayer resist having two polymer layers.
20. The method of claim 10 , wherein providing a substrate having a resist thereon, involves providing a substrate having a resist which is a bilayer resist having one inorganic layer and one polymer layer.
21. The method of claim 10 , further comprising the step of removing adsorbed volatiles from the substrate to obtain a processed substrate, wherein providing a substrate includes providing a substrate having a low-κ permittivity value identified as κa and obtaining a processed substrate includes obtaining a processed substrate having a low-κ permittivity value identified as κcc,
wherein, Δ κ is defined as the difference between κc and κa, and
wherein Δκ≦0.1
22. An electronic device prepared according to a process comprising: (a) providing a substrate having a resist thereon; (b) contacting the substrate with a stripper solution for a time sufficient to remove a desired amount of resist; (c) removing the substrate from the stripping solution; and (d) rinsing the stripper solution from the substrate with a solvent, wherein contacting the substrate with a stripper solution involves contacting the substrate with a stripper solution including a polar aprotic solvent, water, an amine, and a quaternary hydroxide having the formula:
where Z is N and R1, R2, R3, and R4 are alkyl groups, benzyl, aryl groups, or a combination thereof having collectively at least 5 carbons.
23. A method for preparing a BEOL stripper solution comprising the acts of:
(a) providing a container;
(b) providing components of the stripper solution formulation; and
(c) adding said components of said stripper solution to said container to provide contents,
wherein said providing components involves providing a polar aprotic organic solvent, water, an amine, and a quaternary hydroxide, the quaternary hydroxide having the formula:
where Z is P and R1, R2, R3, and R4 are alkyl groups, benzyl, aryl groups, or a combination thereof having collectively at least 5 carbons.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/769,853 US20130161840A1 (en) | 2008-06-24 | 2013-02-19 | Stripper solutions effective for back-end-of-line operations |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US7519508P | 2008-06-24 | 2008-06-24 | |
US12/490,654 US8440389B2 (en) | 2008-06-24 | 2009-06-24 | Stripper solutions effective for back-end-of-line operations |
US13/769,853 US20130161840A1 (en) | 2008-06-24 | 2013-02-19 | Stripper solutions effective for back-end-of-line operations |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/490,654 Continuation US8440389B2 (en) | 2008-06-24 | 2009-06-24 | Stripper solutions effective for back-end-of-line operations |
Publications (1)
Publication Number | Publication Date |
---|---|
US20130161840A1 true US20130161840A1 (en) | 2013-06-27 |
Family
ID=41550669
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/490,654 Active 2030-05-07 US8440389B2 (en) | 2008-06-24 | 2009-06-24 | Stripper solutions effective for back-end-of-line operations |
US13/769,853 Abandoned US20130161840A1 (en) | 2008-06-24 | 2013-02-19 | Stripper solutions effective for back-end-of-line operations |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/490,654 Active 2030-05-07 US8440389B2 (en) | 2008-06-24 | 2009-06-24 | Stripper solutions effective for back-end-of-line operations |
Country Status (5)
Country | Link |
---|---|
US (2) | US8440389B2 (en) |
JP (2) | JP5759369B2 (en) |
KR (1) | KR101704045B1 (en) |
TW (1) | TWI450052B (en) |
WO (1) | WO2010008877A1 (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100089426A1 (en) * | 2005-10-28 | 2010-04-15 | Phenis Michael T | Dynamic multipurpose composition for the removal of photoresists and method for its use |
US9069259B2 (en) | 2005-10-28 | 2015-06-30 | Dynaloy, Llc | Dynamic multi-purpose compositions for the removal of photoresists and method for its use |
US9158202B2 (en) | 2012-11-21 | 2015-10-13 | Dynaloy, Llc | Process and composition for removing substances from substrates |
US9329486B2 (en) | 2005-10-28 | 2016-05-03 | Dynaloy, Llc | Dynamic multi-purpose composition for the removal of photoresists and method for its use |
US10072237B2 (en) | 2015-08-05 | 2018-09-11 | Versum Materials Us, Llc | Photoresist cleaning composition used in photolithography and a method for treating substrate therewith |
WO2019067923A3 (en) * | 2017-09-29 | 2019-06-06 | Versum Materials Us, Llc | Stripper solutions and methods of using stripper solutions |
EP3502225A1 (en) * | 2017-12-22 | 2019-06-26 | Versum Materials US, LLC | Photoresist stripper |
US11353794B2 (en) | 2017-12-22 | 2022-06-07 | Versum Materials Us, Llc | Photoresist stripper |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101089211B1 (en) * | 2010-12-02 | 2011-12-02 | 엘티씨 (주) | Composition of stripping solution for liquid crystal display process photoresist comprising primary alkanolamine |
US20130053291A1 (en) * | 2011-08-22 | 2013-02-28 | Atsushi Otake | Composition for cleaning substrates post-chemical mechanical polishing |
JP6165665B2 (en) * | 2013-05-30 | 2017-07-19 | 信越化学工業株式会社 | Substrate cleaning method |
CN107078044B (en) * | 2014-11-13 | 2020-06-19 | 三菱瓦斯化学株式会社 | Cleaning liquid for semiconductor element with suppressed damage of cobalt, and method for cleaning semiconductor element using same |
KR20170127527A (en) * | 2015-04-10 | 2017-11-21 | 후지필름 가부시키가이샤 | A resist removing liquid, a resist removing method, and a manufacturing method of a regenerated semiconductor substrate |
TWI692679B (en) * | 2017-12-22 | 2020-05-01 | 美商慧盛材料美國責任有限公司 | Photoresist stripper |
US10658589B2 (en) * | 2018-06-27 | 2020-05-19 | International Business Machines Corporation | Alignment through topography on intermediate component for memory device patterning |
JP7220040B2 (en) | 2018-09-20 | 2023-02-09 | 関東化学株式会社 | cleaning liquid composition |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080242575A1 (en) * | 2004-10-08 | 2008-10-02 | Takayuki Haraguchi | Treating liquid for photoresist removal, and method for treating substrate |
US20130143785A1 (en) * | 2011-12-06 | 2013-06-06 | Kanto Kagaku Kabushiki Kaisha | Cleaning liquid composition for electronic device |
Family Cites Families (112)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL123441C (en) * | 1964-01-17 | |||
US3562038A (en) * | 1968-05-15 | 1971-02-09 | Shipley Co | Metallizing a substrate in a selective pattern utilizing a noble metal colloid catalytic to the metal to be deposited |
US3673099A (en) * | 1970-10-19 | 1972-06-27 | Bell Telephone Labor Inc | Process and composition for stripping cured resins from substrates |
US3888891A (en) * | 1972-07-26 | 1975-06-10 | Minnesota Mining & Mfg | Silicone-compatible dyestuffs |
US4038293A (en) * | 1972-07-26 | 1977-07-26 | Minnesota Mining And Manufacturing Company | Silicone-compatible tris(trimethylsilyloxy)silylalkylamino-substituted quinoncid dyestuffs |
US3981859A (en) | 1972-07-26 | 1976-09-21 | Minnesota Mining And Manufacturing Company | Silicone-compatible azo dyestuffs |
US3920695A (en) * | 1972-07-26 | 1975-11-18 | Minnesota Mining & Mfg | Silicone-compatible indigo dyestuffs |
US3981889A (en) * | 1973-06-04 | 1976-09-21 | Ogawa & Co., Ltd. | Method of manufacturing cis,cis-2,4,6-triisopropyl-1,3,5-trioxane |
US3963744A (en) * | 1974-08-28 | 1976-06-15 | Minnesota Mining And Manufacturing Company | Silicone-compatible phthalocyanine dyestuffs |
JPS58139430A (en) * | 1982-02-15 | 1983-08-18 | Toray Ind Inc | Exfoliation of resist |
US4547271A (en) * | 1984-09-12 | 1985-10-15 | Canada Packers Inc. | Process for the electrochemical reduction of 7-ketolithocholic acid to ursodeoxycholic acid |
DE3529960A1 (en) * | 1985-08-22 | 1987-03-05 | Boehringer Ingelheim Kg | AMINO ACID DERIVATIVES, METHOD FOR THE PRODUCTION AND USE THEREOF |
JPS63215041A (en) | 1987-03-04 | 1988-09-07 | Toshiba Corp | Etching liquid for crystal defect evaluation |
US4830641A (en) * | 1987-04-13 | 1989-05-16 | Pall Corporation | Sorbing apparatus |
US5369189A (en) | 1989-12-29 | 1994-11-29 | Lucky, Ltd. | Process for the preparation of heat resistant and transparent acrylic resin |
US5091103A (en) * | 1990-05-01 | 1992-02-25 | Alicia Dean | Photoresist stripper |
RU1807077C (en) | 1990-10-26 | 1993-04-07 | Войсковая часть 75360 | Cleansing and disinfecting agent for cleaning surface against impurities |
US6187730B1 (en) * | 1990-11-05 | 2001-02-13 | Ekc Technology, Inc. | Hydroxylamine-gallic compound composition and process |
JP3160344B2 (en) * | 1991-01-25 | 2001-04-25 | アシュランド インコーポレーテッド | Organic stripping composition |
US5928430A (en) * | 1991-01-25 | 1999-07-27 | Advanced Scientific Concepts, Inc. | Aqueous stripping and cleaning compositions containing hydroxylamine and use thereof |
US5117063A (en) * | 1991-06-21 | 1992-05-26 | Monsanto Company | Method of preparing 4-aminodiphenylamine |
US5304284A (en) * | 1991-10-18 | 1994-04-19 | International Business Machines Corporation | Methods for etching a less reactive material in the presence of a more reactive material |
US5468423A (en) | 1992-02-07 | 1995-11-21 | The Clorox Company | Reduced residue hard surface cleaner |
US5252737A (en) * | 1992-05-22 | 1993-10-12 | Monsanto Company | Process for preparing N-aliphatic substituted p-phenylenediamines |
US7144848B2 (en) * | 1992-07-09 | 2006-12-05 | Ekc Technology, Inc. | Cleaning compositions containing hydroxylamine derivatives and processes using same for residue removal |
US6825156B2 (en) * | 2002-06-06 | 2004-11-30 | Ekc Technology, Inc. | Semiconductor process residue removal composition and process |
US5233010A (en) * | 1992-10-15 | 1993-08-03 | Monsanto Company | Process for preparing isocyanate and carbamate ester products |
US5308745A (en) * | 1992-11-06 | 1994-05-03 | J. T. Baker Inc. | Alkaline-containing photoresist stripping compositions producing reduced metal corrosion with cross-linked or hardened resist resins |
DE59308407D1 (en) * | 1993-01-19 | 1998-05-20 | Siemens Ag | Method for producing a contact and a metallization level comprising these interconnects |
JP2951215B2 (en) | 1993-09-10 | 1999-09-20 | レイセオン・カンパニー | Method of manufacturing fine pattern electronic interconnect structure by phase mask laser |
US5419779A (en) * | 1993-12-02 | 1995-05-30 | Ashland Inc. | Stripping with aqueous composition containing hydroxylamine and an alkanolamine |
US5597678A (en) * | 1994-04-18 | 1997-01-28 | Ocg Microelectronic Materials, Inc. | Non-corrosive photoresist stripper composition |
US5466389A (en) | 1994-04-20 | 1995-11-14 | J. T. Baker Inc. | PH adjusted nonionic surfactant-containing alkaline cleaner composition for cleaning microelectronics substrates |
GB9425031D0 (en) * | 1994-12-09 | 1995-02-08 | Alpha Metals Ltd | Printed circuit board manufacture |
US5612304A (en) * | 1995-07-07 | 1997-03-18 | Olin Microelectronic Chemicals, Inc. | Redox reagent-containing post-etch residue cleaning composition |
JP2911792B2 (en) * | 1995-09-29 | 1999-06-23 | 東京応化工業株式会社 | Stripper composition for resist |
US5648324A (en) * | 1996-01-23 | 1997-07-15 | Ocg Microelectronic Materials, Inc. | Photoresist stripping composition |
US6900193B1 (en) * | 1996-05-01 | 2005-05-31 | The United States Of America As Represented By The Department Of Health And Human Services | Structural modification of 19-norprogesterone I: 17-α-substituted-11-β-substituted-4-aryl and 21-substituted 19-norpregnadienedione as new antiprogestational agents |
US20040134873A1 (en) * | 1996-07-25 | 2004-07-15 | Li Yao | Abrasive-free chemical mechanical polishing composition and polishing process containing same |
US5798323A (en) * | 1997-05-05 | 1998-08-25 | Olin Microelectronic Chemicals, Inc. | Non-corrosive stripping and cleaning composition |
US6033996A (en) * | 1997-11-13 | 2000-03-07 | International Business Machines Corporation | Process for removing etching residues, etching mask and silicon nitride and/or silicon dioxide |
JPH11316465A (en) * | 1998-03-03 | 1999-11-16 | Tokyo Ohka Kogyo Co Ltd | Treating liquid after ashing and treating method using the same |
US6063522A (en) * | 1998-03-24 | 2000-05-16 | 3M Innovative Properties Company | Electrolytes containing mixed fluorochemical/hydrocarbon imide and methide salts |
US6465403B1 (en) * | 1998-05-18 | 2002-10-15 | David C. Skee | Silicate-containing alkaline compositions for cleaning microelectronic substrates |
US7579308B2 (en) * | 1998-07-06 | 2009-08-25 | Ekc/Dupont Electronics Technologies | Compositions and processes for photoresist stripping and residue removal in wafer level packaging |
US6200891B1 (en) * | 1998-08-13 | 2001-03-13 | International Business Machines Corporation | Removal of dielectric oxides |
JP4224651B2 (en) * | 1999-02-25 | 2009-02-18 | 三菱瓦斯化学株式会社 | Resist stripper and method for manufacturing semiconductor device using the same |
US6566322B1 (en) * | 1999-05-27 | 2003-05-20 | Mcmaster University | Chelating silicone polymers |
WO2001013179A1 (en) * | 1999-08-13 | 2001-02-22 | Board Of Regents, University Of Texas System | Water-processable photoresist compositions |
KR100335011B1 (en) * | 1999-08-19 | 2002-05-02 | 주식회사 동진쎄미켐 | Resist removing composition |
KR100298572B1 (en) * | 1999-08-19 | 2001-09-22 | 박찬구 | The method for preparing 4-nitrodiphenylamine and 4-nitrosodiphenylamine from carbanilide |
JP2001100436A (en) * | 1999-09-28 | 2001-04-13 | Mitsubishi Gas Chem Co Inc | Resist removing solution composition |
JP3339575B2 (en) * | 2000-01-25 | 2002-10-28 | 日本電気株式会社 | Release agent composition and release method |
US6531436B1 (en) * | 2000-02-25 | 2003-03-11 | Shipley Company, L.L.C. | Polymer removal |
US6319835B1 (en) | 2000-02-25 | 2001-11-20 | Shipley Company, L.L.C. | Stripping method |
US6475966B1 (en) | 2000-02-25 | 2002-11-05 | Shipley Company, L.L.C. | Plasma etching residue removal |
JP2001244258A (en) * | 2000-02-29 | 2001-09-07 | Sumitomo Bakelite Co Ltd | Method of forming organic insulating film for semiconductor |
EP1360077A4 (en) * | 2000-07-10 | 2009-06-24 | Ekc Technology Inc | Compositions for cleaning organic and plasma etched residues for semiconductor devices |
US7456140B2 (en) * | 2000-07-10 | 2008-11-25 | Ekc Technology, Inc. | Compositions for cleaning organic and plasma etched residues for semiconductor devices |
US6455479B1 (en) * | 2000-08-03 | 2002-09-24 | Shipley Company, L.L.C. | Stripping composition |
JP3738996B2 (en) * | 2002-10-10 | 2006-01-25 | 東京応化工業株式会社 | Cleaning liquid for photolithography and substrate processing method |
TW554258B (en) * | 2000-11-30 | 2003-09-21 | Tosoh Corp | Resist stripper |
JP2003005383A (en) * | 2000-11-30 | 2003-01-08 | Tosoh Corp | Resist remover |
US7084080B2 (en) * | 2001-03-30 | 2006-08-01 | Advanced Technology Materials, Inc. | Silicon source reagent compositions, and method of making and using same for microelectronic device structure |
US6482656B1 (en) | 2001-06-04 | 2002-11-19 | Advanced Micro Devices, Inc. | Method of electrochemical formation of high Tc superconducting damascene interconnect for integrated circuit |
JP4810764B2 (en) * | 2001-06-29 | 2011-11-09 | 三菱瓦斯化学株式会社 | Resist stripper composition |
KR20040032855A (en) * | 2001-07-13 | 2004-04-17 | 이케이씨 테크놀로지, 인코포레이티드 | Sulfoxide Pyrolid(in)one Alkanolamine Stripping and Cleaning Composition |
US6683219B2 (en) * | 2001-07-30 | 2004-01-27 | Wisconsin Alumni Research Foundation | Synthesis of A-ring synthon of 19-nor-1α,25-dihydroxyvitamin D3 from (D)-glucose |
JP3403187B2 (en) * | 2001-08-03 | 2003-05-06 | 東京応化工業株式会社 | Stripping solution for photoresist |
KR20050042051A (en) * | 2001-11-02 | 2005-05-04 | 미츠비시 가스 가가쿠 가부시키가이샤 | Method for releasing resist |
US7064087B1 (en) * | 2001-11-15 | 2006-06-20 | Novellus Systems, Inc. | Phosphorous-doped silicon dioxide process to customize contact etch profiles |
US7543592B2 (en) * | 2001-12-04 | 2009-06-09 | Ekc Technology, Inc. | Compositions and processes for photoresist stripping and residue removal in wafer level packaging |
JP3738992B2 (en) | 2001-12-27 | 2006-01-25 | 東京応化工業株式会社 | Photoresist stripping solution |
US20030138737A1 (en) * | 2001-12-27 | 2003-07-24 | Kazumasa Wakiya | Photoresist stripping solution and a method of stripping photoresists using the same |
KR101017738B1 (en) * | 2002-03-12 | 2011-02-28 | 미츠비시 가스 가가쿠 가부시키가이샤 | Photoresist stripping composition and cleaning composition |
US6878500B2 (en) * | 2002-04-06 | 2005-04-12 | Marlborough, | Stripping method |
US6911293B2 (en) * | 2002-04-11 | 2005-06-28 | Clariant Finance (Bvi) Limited | Photoresist compositions comprising acetals and ketals as solvents |
AU2003225178A1 (en) * | 2002-04-24 | 2003-11-10 | Ekc Technology, Inc. | Oxalic acid as a cleaning product for aluminium, copper and dielectric surfaces |
JP3516446B2 (en) * | 2002-04-26 | 2004-04-05 | 東京応化工業株式会社 | Photoresist stripping method |
US7833957B2 (en) * | 2002-08-22 | 2010-11-16 | Daikin Industries, Ltd. | Removing solution |
JP2004093678A (en) | 2002-08-29 | 2004-03-25 | Jsr Corp | Peeling liquid composition for photoresist |
JP2004101849A (en) * | 2002-09-09 | 2004-04-02 | Mitsubishi Gas Chem Co Inc | Detergent composition |
CN100437922C (en) | 2002-11-08 | 2008-11-26 | 和光纯药工业株式会社 | Cleaning composition and method of cleaning therewith |
US6872663B1 (en) * | 2002-11-22 | 2005-03-29 | Advanced Micro Devices, Inc. | Method for reworking a multi-layer photoresist following an underlayer development |
US7166362B2 (en) * | 2003-03-25 | 2007-01-23 | Fuji Photo Film Co., Ltd. | Film-forming composition, production process therefor, and porous insulating film |
US6846748B2 (en) * | 2003-05-01 | 2005-01-25 | United Microeletronics Corp. | Method for removing photoresist |
EP1491597B1 (en) | 2003-06-27 | 2010-11-24 | Toyo Ink Mfg. Co. Ltd. | Nonaqueous ink-jet ink |
TWI282377B (en) * | 2003-07-25 | 2007-06-11 | Mec Co Ltd | Etchant, replenishment solution and method for producing copper wiring using the same |
US7615377B2 (en) * | 2003-09-05 | 2009-11-10 | Massachusetts Institute Of Technology | Fluorescein-based metal sensors |
US7834043B2 (en) * | 2003-12-11 | 2010-11-16 | Abbott Laboratories | HIV protease inhibiting compounds |
US20060003910A1 (en) * | 2004-06-15 | 2006-01-05 | Hsu Jiun Y | Composition and method comprising same for removing residue from a substrate |
US8030263B2 (en) * | 2004-07-01 | 2011-10-04 | Air Products And Chemicals, Inc. | Composition for stripping and cleaning and use thereof |
JP4718145B2 (en) * | 2004-08-31 | 2011-07-06 | 富士通株式会社 | Semiconductor device and method for manufacturing gate electrode |
US20060073997A1 (en) * | 2004-09-30 | 2006-04-06 | Lam Research Corporation | Solutions for cleaning silicon semiconductors or silicon oxides |
US20060094613A1 (en) * | 2004-10-29 | 2006-05-04 | Lee Wai M | Compositions and processes for photoresist stripping and residue removal in wafer level packaging |
KR101331747B1 (en) * | 2005-01-27 | 2013-11-20 | 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드 | Compositions for processing of semiconductor substrates |
KR100621310B1 (en) * | 2005-05-16 | 2006-09-06 | 금호석유화학 주식회사 | Method for preparing 4-aminodiphenylamine |
US7700533B2 (en) | 2005-06-23 | 2010-04-20 | Air Products And Chemicals, Inc. | Composition for removal of residue comprising cationic salts and methods using same |
US8263539B2 (en) * | 2005-10-28 | 2012-09-11 | Dynaloy, Llc | Dynamic multi-purpose composition for the removal of photoresists and methods for its use |
US20070243773A1 (en) * | 2005-10-28 | 2007-10-18 | Phenis Michael T | Dynamic multi-purpose composition for the removal of photoresists and method for its use |
US7632796B2 (en) * | 2005-10-28 | 2009-12-15 | Dynaloy, Llc | Dynamic multi-purpose composition for the removal of photoresists and method for its use |
CN101356629B (en) * | 2005-11-09 | 2012-06-06 | 高级技术材料公司 | Composition and method for recycling semiconductor wafers having low-K dielectric materials thereon |
US7674755B2 (en) * | 2005-12-22 | 2010-03-09 | Air Products And Chemicals, Inc. | Formulation for removal of photoresist, etch residue and BARC |
US8288330B2 (en) * | 2006-05-26 | 2012-10-16 | Air Products And Chemicals, Inc. | Composition and method for photoresist removal |
US8093150B2 (en) * | 2006-09-19 | 2012-01-10 | Infineon Technologies Ag | Methods of manufacturing semiconductor devices and structures thereof |
US20080076688A1 (en) * | 2006-09-21 | 2008-03-27 | Barnes Jeffrey A | Copper passivating post-chemical mechanical polishing cleaning composition and method of use |
US20100104824A1 (en) * | 2006-10-23 | 2010-04-29 | Phenis Michael T | Dynamic multi-purpose composition for the removal of photoresists |
US20100112728A1 (en) * | 2007-03-31 | 2010-05-06 | Advanced Technology Materials, Inc. | Methods for stripping material for wafer reclamation |
US7655608B2 (en) * | 2007-08-03 | 2010-02-02 | Dynaloy, Llc | Reduced metal etch rates using stripper solutions containing a copper salt |
US8551682B2 (en) * | 2007-08-15 | 2013-10-08 | Dynaloy, Llc | Metal conservation with stripper solutions containing resorcinol |
US20090119979A1 (en) * | 2007-11-08 | 2009-05-14 | Imperial Petroleum, Inc. | Catalysts for production of biodiesel fuel and glycerol |
KR101260599B1 (en) | 2008-12-26 | 2013-05-06 | 케이엔씨 래보러토리즈 컴패니, 리미티드 | Method for producing concentrated solution for photoresist stripper having low water content |
-
2009
- 2009-06-23 TW TW098120996A patent/TWI450052B/en not_active IP Right Cessation
- 2009-06-24 WO PCT/US2009/048409 patent/WO2010008877A1/en active Application Filing
- 2009-06-24 KR KR1020107029182A patent/KR101704045B1/en active IP Right Grant
- 2009-06-24 US US12/490,654 patent/US8440389B2/en active Active
- 2009-06-24 JP JP2011516568A patent/JP5759369B2/en not_active Expired - Fee Related
-
2013
- 2013-02-19 US US13/769,853 patent/US20130161840A1/en not_active Abandoned
-
2015
- 2015-01-23 JP JP2015011054A patent/JP5876948B2/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080242575A1 (en) * | 2004-10-08 | 2008-10-02 | Takayuki Haraguchi | Treating liquid for photoresist removal, and method for treating substrate |
US20130143785A1 (en) * | 2011-12-06 | 2013-06-06 | Kanto Kagaku Kabushiki Kaisha | Cleaning liquid composition for electronic device |
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100089426A1 (en) * | 2005-10-28 | 2010-04-15 | Phenis Michael T | Dynamic multipurpose composition for the removal of photoresists and method for its use |
US9069259B2 (en) | 2005-10-28 | 2015-06-30 | Dynaloy, Llc | Dynamic multi-purpose compositions for the removal of photoresists and method for its use |
US9243218B2 (en) | 2005-10-28 | 2016-01-26 | Dynaloy, Llc | Dynamic multipurpose composition for the removal of photoresists and method for its use |
US9329486B2 (en) | 2005-10-28 | 2016-05-03 | Dynaloy, Llc | Dynamic multi-purpose composition for the removal of photoresists and method for its use |
US9158202B2 (en) | 2012-11-21 | 2015-10-13 | Dynaloy, Llc | Process and composition for removing substances from substrates |
US10072237B2 (en) | 2015-08-05 | 2018-09-11 | Versum Materials Us, Llc | Photoresist cleaning composition used in photolithography and a method for treating substrate therewith |
WO2019067923A3 (en) * | 2017-09-29 | 2019-06-06 | Versum Materials Us, Llc | Stripper solutions and methods of using stripper solutions |
CN111356759A (en) * | 2017-09-29 | 2020-06-30 | 弗萨姆材料美国有限责任公司 | Stripper solution and method of using stripper solution |
JP2020536138A (en) * | 2017-09-29 | 2020-12-10 | バーサム マテリアルズ ユーエス,リミティド ライアビリティ カンパニー | How to use stripper solution and stripper solution |
US11175587B2 (en) | 2017-09-29 | 2021-11-16 | Versum Materials Us, Llc | Stripper solutions and methods of using stripper solutions |
JP7079322B2 (en) | 2017-09-29 | 2022-06-01 | バーサム マテリアルズ ユーエス,リミティド ライアビリティ カンパニー | How to use stripper solution and stripper solution |
EP3502225A1 (en) * | 2017-12-22 | 2019-06-26 | Versum Materials US, LLC | Photoresist stripper |
US11353794B2 (en) | 2017-12-22 | 2022-06-07 | Versum Materials Us, Llc | Photoresist stripper |
IL263891B (en) * | 2017-12-22 | 2022-10-01 | Versum Mat Us Llc | Photoresist stripper |
IL263891B2 (en) * | 2017-12-22 | 2023-02-01 | Versum Mat Us Llc | Photoresist stripper |
Also Published As
Publication number | Publication date |
---|---|
JP5759369B2 (en) | 2015-08-05 |
KR20110043543A (en) | 2011-04-27 |
JP2015143859A (en) | 2015-08-06 |
JP2011525641A (en) | 2011-09-22 |
TWI450052B (en) | 2014-08-21 |
US8440389B2 (en) | 2013-05-14 |
US20100221503A1 (en) | 2010-09-02 |
JP5876948B2 (en) | 2016-03-02 |
KR101704045B1 (en) | 2017-02-07 |
TW201013336A (en) | 2010-04-01 |
WO2010008877A1 (en) | 2010-01-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US8440389B2 (en) | Stripper solutions effective for back-end-of-line operations | |
EP2758507B1 (en) | Composition for removing substances from substrates | |
JP6546080B2 (en) | Composition for cleaning | |
US5977041A (en) | Aqueous rinsing composition | |
US8361237B2 (en) | Wet clean compositions for CoWP and porous dielectrics | |
KR101238471B1 (en) | Method to remove resist, etch residue, and copper oxide from substrates having copper and low-k dielectric material | |
TWI548738B (en) | Aqueous cleaner for the removal of post-etch residues | |
US20060003910A1 (en) | Composition and method comprising same for removing residue from a substrate | |
JP4814356B2 (en) | Compositions for peeling and cleaning and their use | |
KR101056544B1 (en) | Peeling and Cleaning Compositions for Microelectronic Substrates | |
KR100786610B1 (en) | Aqueous based residue removers comprising fluoride | |
US20030181342A1 (en) | pH buffered compositions useful for cleaning residue from semiconductor substrates | |
KR20160075577A (en) | Cleaning formulations for removing residues on surfaces | |
JP2010534358A (en) | Method for removing contamination using a fluorinated composition | |
US7935665B2 (en) | Non-corrosive cleaning compositions for removing etch residues | |
CN113214920A (en) | Cleaning preparation | |
JP2000063895A (en) | Cleaning agent for residue from photoresist ashing |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |