US20100273798A1 - Processes for the preparation of rivaroxaban and intermediates thereof - Google Patents

Processes for the preparation of rivaroxaban and intermediates thereof Download PDF

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US20100273798A1
US20100273798A1 US12/431,272 US43127209A US2010273798A1 US 20100273798 A1 US20100273798 A1 US 20100273798A1 US 43127209 A US43127209 A US 43127209A US 2010273798 A1 US2010273798 A1 US 2010273798A1
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compound
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alkyl
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US7816355B1 (en
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Prabhudas Bodhuri
Gamini Weeratunga
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Apotex Pharmachem Inc
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Priority to US12/767,436 priority patent/US8101609B2/en
Priority to CN2010800251705A priority patent/CN102844309A/en
Priority to NZ595942A priority patent/NZ595942A/en
Priority to PCT/CA2010/000656 priority patent/WO2010124385A1/en
Priority to CA2759828A priority patent/CA2759828C/en
Priority to BRPI1007768A priority patent/BRPI1007768A2/en
Priority to MX2011011328A priority patent/MX2011011328A/en
Priority to JP2012507552A priority patent/JP2012525337A/en
Priority to EP10769190.9A priority patent/EP2424847B1/en
Priority to KR1020117028296A priority patent/KR20120104077A/en
Priority to AU2010242496A priority patent/AU2010242496B2/en
Priority to US12/906,907 priority patent/US8309547B2/en
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D413/00Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms
    • C07D413/02Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing two hetero rings
    • C07D413/12Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K31/00Medicinal preparations containing organic active ingredients
    • A61K31/33Heterocyclic compounds
    • A61K31/395Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
    • A61K31/535Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with at least one nitrogen and one oxygen as the ring hetero atoms, e.g. 1,2-oxazines
    • A61K31/53751,4-Oxazines, e.g. morpholine
    • A61K31/53771,4-Oxazines, e.g. morpholine not condensed and containing further heterocyclic rings, e.g. timolol
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61PSPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
    • A61P11/00Drugs for disorders of the respiratory system
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61PSPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
    • A61P7/00Drugs for disorders of the blood or the extracellular fluid
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61PSPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
    • A61P7/00Drugs for disorders of the blood or the extracellular fluid
    • A61P7/02Antithrombotic agents; Anticoagulants; Platelet aggregation inhibitors
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61PSPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
    • A61P9/00Drugs for disorders of the cardiovascular system
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D265/00Heterocyclic compounds containing six-membered rings having one nitrogen atom and one oxygen atom as the only ring hetero atoms
    • C07D265/281,4-Oxazines; Hydrogenated 1,4-oxazines
    • C07D265/301,4-Oxazines; Hydrogenated 1,4-oxazines not condensed with other rings
    • C07D265/321,4-Oxazines; Hydrogenated 1,4-oxazines not condensed with other rings with oxygen atoms directly attached to ring carbon atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D413/00Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms
    • C07D413/02Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing two hetero rings
    • C07D413/10Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing aromatic rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D413/00Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms
    • C07D413/14Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing three or more hetero rings

Definitions

  • the present invention relates to the field of chemical synthesis of organic compounds and in particular to methods for the synthesis of Rivaroxaban and intermediates thereof.
  • Rivaroxaban (1) (5-chloro-N- ⁇ [(5S)-2-oxo-3-[4-(3-oxomorpholin-4-yl)phenyl]oxazolidin-5-yl]methyl ⁇ thiophene-2-carboxamide) is a low molecular weight, orally administrable anticoagulant drug.
  • the pharmaceutical directly inhibits the active form of serine protease Factor Xa (FXa).
  • Rivaroxaban can be used for the prevention and treatment of various thromboembolic diseases, in particular of deep vein thrombosis (DVT), pulmonary embolism (PE), myocardial infract, angina pectoris, reocclusions and restenoses after angioplasty or aortocoronary bypass, cerebral stroke, transitory ischemic attacks, and peripheral arterial occlusive diseases.
  • DVT deep vein thrombosis
  • PE pulmonary embolism
  • myocardial infract myocardial infract
  • angina pectoris reocclusions and restenoses after angioplasty or aortocoronary bypass
  • cerebral stroke CAD
  • transitory ischemic attacks and peripheral arterial occlusive diseases.
  • Rivaroxaban is disclosed in WO 01/47919 and has the following structure:
  • US2007/0149522 relates to a method for producing 5-chloro-N-( ⁇ 5S)-2-oxo-3-[4-(3-oxo-4-morpholinyl)-phenyl]-1,3-oxazolidin-5-yl ⁇ -methyl)-2-thiophene carboxamide starting from 5-chlorothiophene-2-carbonyl chloride and (2S)-3-amino-propane-1,2-diol and 4-(4-aminophenyl)-3-morpholinone.
  • US2007/0066611 relates to a process for preparing 4-(4-aminophenyl)-3-morpholinone by reacting 4-(4-nitrophenyl)-3-morpholinone with hydrogen in the presence of a hydrogenation catalyst, characterized in that the reaction is effected in an aliphatic alcohol.
  • U.S. Pat. No. 7,351,823 relates to a process for preparing 5-chloro-N-( ⁇ (5S)-2-oxo-3-[4-(3-oxo-4-morpholinyl)phenyl]-1,3-oxazolidin-5-yl ⁇ methyl)-2-thiophenecarboxamide starting from 2-[(2S)-2-oxiranylmethyl]-1H-isoindole-1,3-(2H)-dione, 4-(4-aminophenyl)-3-morpholinone and 5-chlorothiophene-2-carbonyl chloride.
  • WO 2009/023233 relates to novel compounds that are substituted oxazolidinones derivatives and pharmaceutically acceptable salts thereof. More specifically, this invention relates to novel oxazolidinone compounds that are derivatives of Rivaroxaban.
  • the invention also provides pyrogen-free compositions comprising one or more compounds of the invention and a carrier, along with the use of the disclosed compounds and compositions in methods of treating diseases and condition that are beneficially treated by administering a selective inhibitor of factor Xa, such as Rivaroxaban.
  • This invention is based, in part, on preparing Rivaroxaban by reacting a compound of Formula 8a, 8b or 8c with 5-chlorothiophene-2-carboxamide of Formula 9 in Scheme 1.
  • the present invention is directed to methods of preparation of Rivaroxaban, various intermediates useful in the preparation of Rivaroxaban and methods of preparation of such intermediates.
  • Rivaroxaban and the intermediates thereof may be prepared by an exemplary process as set out in Scheme 1. Exemplary reagents and conditions for these reactions are disclosed herein.
  • the (R)-enantiomer of Rivaroxaban is prepared by the processes of the present invention by replacing the compound of Formula 4 of Scheme 1 with the (S)-enantiomer (ie. (S)-(+)-epichlorohydrin) and preparing compounds having the stereochemistry as shown in Scheme 1a.
  • R 4 is selected from the group consisting of:
  • G is OR 1 , NR 2 R 3 or CX 3 ;
  • R 1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R 2 and R 3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R 2 and R 3 when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl;
  • R 2 and R 3 when together form a single ring group with the N to which they are bonded, are a heteroaryl ring;
  • X is halogen
  • L 2 is a halogen or sulfonyloxy group.
  • G is OR 1 , NR 2 R 3 , or CX 3 ;
  • R 1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R 2 and R 3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R 2 and R 3 when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl;
  • R 2 and R 3 when together form a single ring group with the N to which they are bonded, are a heteroaryl ring;
  • X is halogen, the process comprising:
  • L 1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C 1 -C 4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
  • L 2 is a halogen or sulfonyloxy group, thereby forming the compound of Formula 8a.
  • G is OR 1 , NR 2 R 3 , or CX 3 ;
  • R is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R 2 and R 3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R 2 and R 3 when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl;
  • R 2 and R 3 when together form a single ring group with the N to which they are bonded are a heteroaryl ring;
  • X is halogen, the process comprising:
  • L 2 is a halogen or sulfonyloxy group, thereby forming a compound of Formula 6:
  • L 1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C 1 -C 4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
  • G is as defined above for Formula 8a, thereby forming the compound of Formula 8a.
  • G is OR 1 , NR 2 R 3 , or CX 3 ;
  • R 1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R 2 and R 3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R 2 and R 3 when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl;
  • R 2 and R 3 when together form a single ring group with the N to which they are bonded, are a heteroaryl ring;
  • L 2 is a halogen or sulfonyloxy group, the process comprising:
  • L 2 is a halogen or sulfonyloxy group
  • L 2 is as defined for Formula 4.
  • L 1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C 1 -C 4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
  • G is as defined above for Formula 8c, thereby forming the compound of Formula 8c.
  • G is OR 1 , NR 2 R 3 , or CX 3 ;
  • R 1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R 2 and R 3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R 2 and R 3 when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl;
  • R 2 and R 3 when together form a single ring group with the N to which they are bonded, are a heteroaryl ring;
  • X is halogen, the process comprising conversion of a compound of Formula 8c to the compound of Formula 8a.
  • R 1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl.
  • R 1 is alkyl or substituted alkyl.
  • G is OR 1 , NR 2 R 3 , or CX 3 ;
  • R 1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R 2 and R 3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R 2 and R 3 when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
  • R 2 and R 3 when together form a single ring group with the N to which they are bonded, are a heteroaryl ring;
  • X is halogen
  • R 1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted arylalkyl.
  • R 1 is alkyl or substituted alkyl.
  • G is OR 1 , NR 2 R 3 , or CX 3 ;
  • R 1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted arylalkyl;
  • R 2 and R 3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R 2 and R 3 when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
  • R 2 and R 3 when together form a single ring group with the N to which they are bonded, are a heteroaryl ring;
  • L 2 is a halogen or sulfonyloxy group.
  • R 1 is alkyl or substituted alkyl and L 2 is a halogen or sulfonyloxy group.
  • L 2 is a halogen or sulfonyloxy group.
  • G is OR 1 , NR 2 R 3 , or CX 3 ;
  • R 1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R 2 and R 3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R 2 and R 3 when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl;
  • R 2 and R 3 when together form a single ring group with the N to which they are bonded, are a heteroaryl ring;
  • X is halogen, the process comprising:
  • L 1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C 1 -C 4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
  • G is as defined above for Formula 8aa, thereby forming a compound of Formula 5:
  • L 2 is a halogen or sulfonyloxy group, thereby forming the compound of Formula 8aa.
  • G is OR 1 , NR 2 R 3 , or CX 3 ;
  • R 1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R 2 and R 3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R 2 and R 3 when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl;
  • R 2 and R 3 when together form a single ring group with the N to which they are bonded are a heteroaryl ring;
  • X is halogen, the process comprising:
  • L 2 is a halogen or sulfonyloxy group, thereby forming a compound of Formula 6a:
  • L 1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C 1 -C 4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
  • G is as defined above for Formula 8aa, thereby forming the compound of Formula 8aa.
  • G is OR 1 , NR 2 R 3 , or CX 3 ;
  • R 1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R 2 and R 3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R 2 and R 3 when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl;
  • R 2 and R 3 when together form a single ring group with the N to which they are bonded, are a heteroaryl ring;
  • L 2 is a halogen or sulfonyloxy group, the process comprising:
  • L 2 is as defined for Formula 4a;
  • L 1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C 1 -C 4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
  • G is as defined above for Formula 8ca, thereby forming the compound of Formula 8ca.
  • G is OR 1 , NR 2 R 3 , or CX 3 ;
  • R 1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R 2 and R 3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R 2 and R 3 when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl;
  • R 2 and R 3 when together form a single ring group with the N to which they are bonded, are a heteroaryl ring;
  • X is halogen, the process comprising conversion of a compound of Formula 8ca to the compound of Formula 8aa.
  • G is OR 1 NR 2 R 3 , or CX 3 ;
  • R 1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R 2 and R 3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R 2 and R 3 when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
  • R 2 and R 3 when together form a single ring group with the N to which they are bonded, are a heteroaryl ring;
  • X is halogen
  • R 1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted arylalkyl.
  • R 1 is alkyl or substituted alkyl.
  • G is OR 1 , NR 2 R 3 , or CX 3 ;
  • R 1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R 2 and R 3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R 2 and R 3 when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
  • R 2 and R 3 when together form a single ring group with the N to which they are bonded, are a heteroaryl ring;
  • L 2 is a halogen or sulfonyloxy group.
  • R 1 is alkyl or substituted alkyl and L 2 is a halogen or sulfonyloxy group.
  • L 2 is a halogen or sulfonyloxy group.
  • substituted refers to the replacement of a hydrogen atom on a compound with a substituent group.
  • a substituent may be a non-hydrogen atom or multiple atoms of which at least one is a non-hydrogen atom and one or more may or may not be hydrogen atoms.
  • substituted compounds may comprise one or more substituents selected from the group consisting of: R′′, OR′′, NR′′R′′′, SR′′, halogen, SiR′′R′′′R′′′′, OC(O)R′′, C(O)R′′, CO 2 R′′, CONR′′R′′′, NR′′′C(O) 2 R′′, S(O)R′′, S(O) 2 R′′, CN, and NO 2 .
  • each R′′, R′′′, and R′′′′ may be selected, independently, from the group consisting of: hydrogen, halogen, oxygen, substituted or unsubstituted heteroalkyl, substituted or unsubstituted aryl, substituted or unsubstituted alkyl, alkoxy or thioalkoxy groups, and arylalkyl groups.
  • alkyl by itself or as part of another substituent, means, unless otherwise stated, a saturated straight or branched chain, or cyclic hydrocarbon radical, or combination thereof having the number of carbon atoms designated (e.g. C 1 -C 10 or 1- to 10-membered means one to ten carbons).
  • the number of carbon atoms designated e.g. C 1 -C 10 or 1- to 10-membered means one to ten carbons.
  • saturated hydrocarbon radicals include, but are not limited to, groups such as methyl, ethyl, n-propyl, isopropyl, n-butyl, t-butyl, isobutyl, sec-butyl, cyclohexyl, (cyclohexyl)methyl, cyclopropylmethyl, homologs and isomers of, for example, n-pentyl, n-hexyl, n-heptyl, n-octyl, and the like.
  • aryl by itself or as part of another substituent, means, unless otherwise stated, a polyunsaturated, aromatic, hydrocarbon substituent which can be a single ring or multiple rings (often from 1 to 3 rings) which are fused together or linked covalently.
  • Aryl includes, but is not limited to, “heteroaryl” groups. “Heteroaryl” refers to an aryl group that contain from one to four heteroatoms selected from N, O, and S, wherein the nitrogen and sulfur atoms are optionally oxidized, and the nitrogen atom(s) are optionally quaternized. A heteroaryl group can be attached to the remainder of the molecule through a heteroatom.
  • Non-limiting examples of aryl and heteroaryl groups include: phenyl, 1-naphthyl, 2-naphthyl, 4-biphenyl, 1-pyrrolyl, 2-pyrrolyl, 3-pyrrolyl, 3-pyrazolyl, 2-imidazolyl, 4-imidazolyl, pyrazinyl, 2-oxazolyl, 4-oxazolyl, 2-phenyl-4-oxazolyl, 5-oxazolyl, 3-isoxazolyl, 4-isoxazolyl, 5-isoxazolyl, 2-thiazolyl, 4-thiazolyl, 5-thiazolyl, 2-furyl, 3-furyl, 2-thienyl, 3-thienyl, 2-pyridinyl, 3-pyridinyl, 4-pyridinyl, 2-pyrimidyl, 4-pyrimidyl, 5-benzothiazolyl, purinyl, 2-benzimidazolyl, 5-indolyl, 1-isoquino
  • aryl when used in combination with other terms (e.g., aryloxy, arylthioxy, arylalkyl) includes both aryl and heteroaryl rings as defined above.
  • arylalkyl is meant to include those radicals in which an aryl group is attached to an alkyl group (e.g., benzyl, phenethyl, pyridylmethyl, etc.) including those alkyl groups in which a carbon atom containing group (e.g., a methylene group) has been replaced by, for example, an oxygen atom (e.g., phenoxymethyl, 2-pyridyloxymethyl, 3-(1-naphthyloxy)propyl, etc).
  • alkyl group e.g., benzyl, phenethyl, pyridylmethyl, etc.
  • an oxygen atom e.g., phenoxymethyl, 2-pyridyloxymethyl, 3-(1-nap
  • the present invention is directed to methods of preparation of Rivaroxaban, various intermediates useful in the preparation of Rivaroxaban and methods of preparation of such intermediates.
  • R 4 is one of the following:
  • G is OR 1 , NR 2 R 3 , or CX 3 ;
  • R 1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R 2 and R 3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R 2 and R 3 when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
  • R 2 and R 3 when together form a single ring group with the N to which they are bonded, are a heteroaryl ring;
  • X is halogen
  • L 2 is a halogen or sulfonyloxy group.
  • the first base may be a strong base suitable for deprotonation of an amide.
  • the first base may be an organometallic compound.
  • the organometallic compound may be selected from the group consisting of organomagnesium, organozinc, organosodium, organolithium compounds and mixtures thereof.
  • the first base may be selected from the group consisting of alkylmagnesium halide, arylmagnesium halide, alkylzinc halide, alkyllithium, aryllithium, lithium hexaalkyldisilazide, sodium hexaalkyldisilazide, potassium hexaalkyldisilazide, potassium t-butoxide, sodium hydride, lithium hydride, L-selectride, superhydride, lithium amide, sodium amide, lithium dialkylamide, and mixtures thereof.
  • the first base may be lithium hexamethyldisilazide, n-butyllithium, or potassium t-butoxide.
  • the first base may be combined with an inorganic salt additive such as LiX or CuX wherein X is halogen.
  • the reaction of the compound of Formula 8 with the compound of Formula 9 may be conducted in a first solvent.
  • the first solvent may be a suitable aprotic organic solvent.
  • the first solvent may be selected from the group consisting of alkyl ethers (e.g. tetrahydrofuran, dioxane, diethyl ether, methyl t-butyl ether, diisopropyl ether, butyl ether), alkyl esters (e.g. ethyl acetate, isopropyl acetate), ketones (e.g. acetone, methyl ethyl ketone, methyl isobutyl ketone), aromatic, and aliphatic hydrocarbons (e.g.
  • toluene xylenes, hexanes, and heptanes
  • nitriles e.g. acetonitrile, propionitrile, butyronitrile, and benzonitrile
  • N,N-dialkylamides e.g. N,N-dimethylformamide, N,N-dimethylacetamide, and N-methyl-2-pyrrolidinone
  • sulfoxides and sulfones e.g. dimethyl sulfoxide and sulfolane
  • halogenated hydrocarbons e.g. dichloromethane and dichloroethane
  • G is OR 1 , NR 2 R 3 , or CX 3 ;
  • R 1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R 2 and R 3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R 2 and R 3 when independent groups, are independently selected from H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
  • R 2 and R 3 when together form a single ring group with the N to which they are bonded, are a heteroaryl ring;
  • X is halogen, the process comprising:
  • L 1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C 1 -C 4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
  • L 2 is a halogen or sulfonyloxy group, thereby forming the compound of Formula 8a.
  • the compound of Formula 3 is a compound in which L 1 is halogen and G is OR 1 . In some embodiments the compound of Formula 3 is a compound in which L 1 is chloro and R 1 is alkyl. In some embodiments the compound of Formula 3 is a compound in which L 1 is chloro and R 1 is methyl. In some embodiments the compound of Formula 3 is a compound in which L 1 and G are imidazole.
  • the compound of Formula 4 is a compound in which L 2 is a sulfonyloxy group. In some embodiments the compound of Formula 4 is a compound in which L 2 is a toluenesulfonyloxy, methanesulfonyloxy or trifluoromethanesulfonyloxy group. In some embodiments the compound of Formula 4 is a compound in which L 2 is a halogen. In some embodiments the compound of Formula 4 is a compound in which L 2 is chloro.
  • the second base may be inorganic or organic.
  • the second base may be selected from the group consisting of metal hydroxides, carbonates, phosphates, tertiary amines, and aryl amines.
  • the second base may be selected from the group consisting of sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, sodium bicarbonate, potassium carbonate, lithium carbonate, potassium phosphate, sodium phosphate, triethylamine, diisopropylethylamine, N,N-dimethylaniline, N,N-diethylaniline, pyridine, and mixtures thereof.
  • the reaction of the compound of Formula 2 with the compound of Formula 3 may be conducted in a second solvent.
  • the second solvent may be selected from the group consisting of alkyl ethers (e.g. tetrahydrofuran, dioxane, diethyl ether, methyl t-butyl ether, diisopropyl ether, butyl ether), alkyl esters (e.g. ethyl acetate, isopropyl acetate), ketones (e.g. acetone, methyl ethyl ketone, methyl isobutyl ketone), aromatic and aliphatic hydrocarbons (e.g.
  • toluene xylenes, hexanes, and heptanes
  • nitriles e.g. acetonitile, propionitrile, butyronitrile, and benzonitrile
  • N,N-dialkylamides e.g. N,N-dimethylformamide, N,N-dimethylacetamide, and N-methyl-2-pyrrolidinone
  • sulfoxides and sulfones e.g. dimethyl sulfoxide and sulfolane
  • halogenated hydrocarbons e.g. dichloromethane and dichloroethane
  • alcohols e.g. methanol, ethanol, isopropanol, butanol
  • water and mixtures thereof e.g. methanol, ethanol, isopropanol, butanol
  • the third base may be a suitable non-nucleophillic base.
  • the third base may be selected from the group consisting of lithium hexamethyldisilazide, lithium dialkyl amide, sodium hydride, potassium t-butoxide and n-butyllithium.
  • the reaction of the compound of Formula 5 with the compound of Formula 4 may be conducted in a third solvent.
  • the third solvent may be a suitable aprotic organic solvent.
  • the third solvent may be selected from the group consisting of alkyl ethers (e.g. tetrahydrofuran, dioxane, diethyl ether, methyl t-butyl ether, diisopropyl ether, butyl ether), alkyl esters (e.g. ethyl acetate, isopropyl acetate), ketones (e.g. acetone, methyl ethyl ketone, methyl isobutyl ketone), aromatic and aliphatic hydrocarbons (e.g.
  • toluene xylenes, hexanes, and heptanes
  • nitriles e.g. acetonitrile, propionitrile, butyronitrile, and benzonitrile
  • N,N-dialkylamides e.g. N,N-dimethylformamide, N,N-dimethylacetamide, and N-methyl-2-pyrrolidinone
  • sulfoxides and sulfones e.g. dimethyl sulfoxide and sulfolane
  • halogenated hydrocarbons e.g. dichloromethane and dichloroethane
  • G is OR 1 , NR 2 R 3 , or CX 3 ;
  • R 1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R 2 and R 3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R 2 and R 3 when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
  • R 2 and R 3 when together form a single ring group with the N to which they are bonded, are a heteroaryl ring;
  • X is halogen, the process comprising:
  • L 2 is a halogen or sulfonyloxy group, thereby forming a compound of Formula 6:
  • L 1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C 1 -C 4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
  • G is as defined above for Formula 8a, thereby forming the compound of Formula 8a.
  • the compound of Formula 4 is a compound in which L 2 is a sulfonyloxy group. In some embodiments the compound of Formula 4 is a compound in which L 2 is a toluenesulfonyloxy, methanesulfonyloxy or trifluoromethanesulfonyloxy group. In some embodiments the compound of Formula 4 is a compound in which L 2 is a halogen. In some embodiments the compound of Formula 4 is a compound in which L 2 is chloro.
  • the compound of Formula 3 is a compound in which L 1 is halogen and G is OR 1 . In some embodiments the compound of Formula 3 is a compound in which L 1 is chloro and R 1 is alkyl. In some embodiments the compound of Formula 3 is a compound in which L 1 is chloro and R 1 is methyl. In some embodiments the compound of Formula 3 is a compound in which L 1 and G are imidazole.
  • the fourth base may be inorganic or organic.
  • the fourth base may be selected from the group consisting of metal hydroxides, carbonates, phosphates, tertiary amines, and aryl amines.
  • the fourth base may be selected from the group consisting of sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, sodium bicarbonate, potassium carbonate, lithium carbonate, potassium phosphate, sodium phosphate, triethylamine, diisopropylethylamine, N,N-dimethylaniline, N,N-diethylaniline, pyridine, and mixtures thereof.
  • Reaction of the compound of Formula 2 with the compound of Formula 4 may be conducted in a fourth solvent.
  • the fourth solvent may be selected from the group consisting of alkyl ethers (e.g. tetrahydrofuran, diethyl ether, methyl t-butyl ether, diisopropyl ether, butyl ether), alkyl esters (e.g. ethyl acetate, isopropyl acetate), ketones (e.g. acetone, methyl ethyl ketone, methyl isobutyl ketone), aromatic and aliphatic hydrocarbons (e.g.
  • toluene xylenes, hexanes, and heptanes
  • nitriles e.g. acetonitile, propionitrile, butyronitrile, and benzonitrile
  • N,N-dialkylamides e.g. N,N-dimethylformamide, N,N-dimethylacetamide, and N-methyl-2-pyrrolidinone
  • sulfoxides and sulfones e.g. dimethyl sulfoxide and sulfolane
  • halogenated hydrocarbons e.g. dichloromethane and dichloroethane
  • alcohols e.g. methanol, ethanol, isopropanol, butanol
  • water and mixtures thereof e.g. methanol, ethanol, isopropanol, butanol
  • the fifth base may be inorganic or organic.
  • the fifth base may be selected from the group consisting of metal hydroxides, carbonates, phosphates, tertiary amines, and aryl amines.
  • the fifth base may be selected from the group consisting of sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, sodium bicarbonate, potassium carbonate, lithium carbonate, potassium phosphate, sodium phosphate, triethylamine, diisopropylethylamine, N,N-dimethylaniline, N,N-diethylaniline, pyridine, and mixtures thereof.
  • the compound of Formula 2 may be treated with the compound of Formula 4 without base to yield an intermediate of Formula 7, which may or may not be isolated, before treatment with a fourth base to yield the compound of Formula 6.
  • the fifth solvent may be selected from the group consisting of alkyl ethers (e.g. tetrahydrofuran, dioxane, diethyl ether, methyl t-butyl ether, diisopropyl ether, butyl ether), alkyl esters (e.g. ethyl acetate, isopropyl acetate), ketones (e.g. acetone, methyl ethyl ketone, methyl isobutyl ketone), aromatic and aliphatic hydrocarbons (e.g.
  • alkyl ethers e.g. tetrahydrofuran, dioxane, diethyl ether, methyl t-butyl ether, diisopropyl ether, butyl ether
  • alkyl esters e.g. ethyl acetate, isopropyl acetate
  • ketones e.g. acetone, methyl ethy
  • toluene xylenes, hexanes, and heptanes
  • nitriles e.g. acetonitrile, propionitrile, butyronitrile, and benzonitrile
  • N,N-dialkylamides e.g. N,N-dimethylformamide, N,N-dimethylacetamide, and N-methyl-2-pyrrolidinone
  • sulfoxides and sulfones e.g. dimethyl sulfoxide and sulfolane
  • halogenated hydrocarbons e.g. dichloromethane and dichloroethane
  • alcohols e.g. methanol, ethanol, isopropanol, butanol
  • water and mixtures thereof e.g. methanol, ethanol, isopropanol, butanol
  • G is OR 1 , NR 2 R 3 , or CX 3 ;
  • R 1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R 2 and R 3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R 2 and R 3 when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
  • R 2 and R 3 when together form a single ring group with the N to which they are bonded, are a heteroaryl ring;
  • L 2 is a halogen or sulfonyloxy group, the process comprising:
  • L 2 is a halogen or sulfonyloxy group; thereby forming a compound of Formula 7:
  • L 2 is as defined for Formula 4, and
  • L 1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C 1 -C 4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
  • G is as defined above for Formula 8c, thereby forming the compound of Formula 8c.
  • the compound of Formula 4 is a compound in which L 2 is a sulfonyloxy group. In some embodiments the compound of Formula 4 is a compound in which L 2 is a toluenesulfonyloxy, methanesulfonyloxy or trifluoromethanesulfonyloxy group. In some embodiments the compound of Formula 4 is a compound in which L 2 is a halogen. In some embodiments the compound of Formula 4 is a compound in which L 2 is chloro.
  • the compound of Formula 3 is a compound in which R 1 is alkyl. In some embodiments the compound of Formula 3 is a compound in which R 1 is methyl. In some embodiments the compound of Formula 3 is a compound in which X is chloro and R 1 is methyl.
  • the sixth base may be inorganic or organic.
  • the sixth base may be selected from the group consisting of metal hydroxides, carbonates, phosphates, tertiary amines and aryl amines.
  • the sixth base may be selected from the group consisting of sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, sodium bicarbonate, potassium carbonate, lithium carbonate, potassium phosphate, sodium phosphate, triethylamine, diisopropylethylamine, N,N-dimethylaniline, N,N-diethylaniline, pyridine, and mixtures thereof.
  • Reaction of the compound of Formula 2 with the compound of Formula 4 may be conducted in a sixth solvent that is the same as the fourth solvent above.
  • Reaction of the compound of Formula 7 with the compound of Formula 3 may be conducted in a seventh solvent that is the same as the fifth solvent above.
  • G is OR 1 , NR 2 R 3 , or CX 3 ;
  • R 1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R 2 and R 3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R 2 and R 3 when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
  • R 2 and R 3 when together form a single ring group with the N to which they are bonded, are a heteroaryl ring;
  • X is halogen, the process comprising conversion of a compound of Formula 8c to the compound of Formula 8a.
  • Conversion of the compound of Formula 8c to the compound of Formula 8a may be conducted by treatment of the compound of Formula 8c with a suitable alkali halide optionally in the presence of a seventh base.
  • the suitable alkali halide may be sodium iodide.
  • the seventh base may be the same as the sixth base above.
  • L 2 is as defined above for Formula 4, may be prepared from the compound of Formula 7 or the compound of Formula 8c.
  • the compound of Formula 7 when the compound of Formula 7 is treated with the compound of Formula 3 in the presence of a suitable base, the cyclized compound of Formula 8b may be obtained.
  • the compound of Formula 8c may be converted to the compound of Formula 8b under suitable conditions.
  • the compound of Formula 8b when the compound of Formula 8c is treated with a suitable base, the compound of Formula 8b may be obtained.
  • Other methods for converting the compound of Formula 7 or Formula 8c to the compound of Formula 8b are known to those skilled in the art.
  • G is OR 1 , NR 2 R 3 , or CX 3 ;
  • R 1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R 2 and R 3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R 2 and R 3 when independent groups, are independently selected from H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
  • R 2 and R 3 when together form a single ring group with the N to which they are bonded, are a heteroaryl ring;
  • X is halogen, the process comprising:
  • L 1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C 1 -C 4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
  • G is as defined above for Formula 8aa, thereby forming a compound of Formula 5:
  • L 2 is a halogen or sulfonyloxy group, thereby forming the compound of Formula 8aa.
  • the compound of Formula 3 is a compound in which L 1 is halogen and G is OR 1 . In some embodiments the compound of Formula 3 is a compound in which L 1 is chloro and R 1 is alkyl. In some embodiments the compound of Formula 3 is a compound in which L 1 is chloro and R 1 is methyl. In some embodiments the compound of Formula 3 is a compound in which L 1 and G are imidazole.
  • the compound of Formula 4a is a compound in which L 2 is a sulfonyloxy group. In some embodiments the compound of Formula 4a is a compound in which L 2 is a toluenesulfonyloxy, methanesulfonyloxy or trifluoromethanesulfonyloxy group. In some embodiments the compound of Formula 4a is a compound in which L 2 is a halogen. In some embodiments the compound of Formula 4a is a compound in which L 2 is chloro.
  • the second base may be inorganic or organic.
  • the second base may be selected from the group consisting of metal hydroxides, carbonates, phosphates, tertiary amines, and aryl amines.
  • the second base may be selected from the group consisting of sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, sodium bicarbonate, potassium carbonate, lithium carbonate, potassium phosphate, sodium phosphate, triethylamine, diisopropylethylamine, N,N-dimethylaniline, N,N-diethylaniline, pyridine, and mixtures thereof.
  • the reaction of the compound of Formula 2 with the compound of Formula 3 may be conducted in a second solvent.
  • the second solvent may be selected from the group consisting of alkyl ethers (e.g. tetrahydrofuran, dioxane, diethyl ether, methyl t-butyl ether, diisopropyl ether, butyl ether), alkyl esters (e.g. ethyl acetate, isopropyl acetate), ketones (e.g. acetone, methyl ethyl ketone, methyl isobutyl ketone), aromatic and aliphatic hydrocarbons (e.g.
  • toluene xylenes, hexanes, and heptanes
  • nitriles e.g. acetonitile, propionitrile, butyronitrile, and benzonitrile
  • N,N-dialkylamides e.g. N,N-dimethylformamide, N,N-dimethylacetamide, and N-methyl-2-pyrrolidinone
  • sulfoxides and sulfones e.g. dimethyl sulfoxide and sulfolane
  • halogenated hydrocarbons e.g. dichloromethane and dichloroethane
  • alcohols e.g. methanol, ethanol, isopropanol, butanol
  • water and mixtures thereof e.g. methanol, ethanol, isopropanol, butanol
  • the third base may be a suitable non-nucleophillic base.
  • the third base may be selected from the group consisting of lithium hexamethyldisilazide, lithium dialkyl amide, sodium hydride, potassium t-butoxide and n-butyllithium.
  • the reaction of the compound of Formula 5 with the compound of Formula 4a may be conducted in a third solvent.
  • the third solvent may be a suitable aprotic organic solvent.
  • the third solvent may be selected from the group consisting of alkyl ethers (e.g. tetrahydrofuran, dioxane, diethyl ether, methyl t-butyl ether, diisopropyl ether, butyl ether), alkyl esters (e.g. ethyl acetate, isopropyl acetate), ketones (e.g. acetone, methyl ethyl ketone, methyl isobutyl ketone), aromatic and aliphatic hydrocarbons (e.g.
  • toluene xylenes, hexanes, and heptanes
  • nitriles e.g. acetonitrile, propionitrile, butyronitrile, and benzonitrile
  • N,N-dialkylamides e.g. N,N-dimethylformamide, N,N-dimethylacetamide, and N-methyl-2-pyrrolidinone
  • sulfoxides and sulfones e.g. dimethyl sulfoxide and sulfolane
  • halogenated hydrocarbons e.g. dichloromethane and dichloroethane
  • G is OR 1 , NR 2 R 3 , or CX 3 ;
  • R 1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R 2 and R 3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R 2 and R 3 when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
  • R 2 and R 3 when together form a single ring group with the N to which they are bonded, are a heteroaryl ring;
  • X is halogen, the process comprising:
  • L 2 is a halogen or sulfonyloxy group, thereby forming a compound of Formula 6a:
  • L 1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C 1 -C 4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
  • G is as defined above for Formula 8a, thereby forming the compound of Formula 8aa.
  • the compound of Formula 4a is a compound in which L 2 is a sulfonyloxy group. In some embodiments the compound of Formula 4a is a compound in which L 2 is a toluenesulfonyloxy, methanesulfonyloxy or trifluoromethanesulfonyloxy group. In some embodiments the compound of Formula 4a is a compound in which L 2 is a halogen. In some embodiments the compound of Formula 4a is a compound in which L 2 is chloro.
  • the compound of Formula 3 is a compound in which L 1 is halogen and G is OR 1 . In some embodiments the compound of Formula 3 is a compound in which L 1 is chloro and R 1 is alkyl. In some embodiments the compound of Formula 3 is a compound in which L 1 is chloro and R is methyl. In some embodiments the compound of Formula 3 is a compound in which L 1 and G are imidazole.
  • the fourth base may be inorganic or organic.
  • the fourth base may be selected from the group consisting of metal hydroxides, carbonates, phosphates, tertiary amines, and aryl amines.
  • the fourth base may be selected from the group consisting of sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, sodium bicarbonate, potassium carbonate, lithium carbonate, potassium phosphate, sodium phosphate, triethylamine, diisopropylethylamine, N,N-dimethylaniline, N,N-diethylaniline, pyridine, and mixtures thereof.
  • Reaction of the compound of Formula 2 with the compound of Formula 4a may be conducted in a fourth solvent.
  • the fourth solvent may be selected from the group consisting of alkyl ethers (e.g. tetrahydrofuran, diethyl ether, methyl t-butyl ether, diisopropyl ether, butyl ether), alkyl esters (e.g. ethyl acetate, isopropyl acetate), ketones (e.g. acetone, methyl ethyl ketone, methyl isobutyl ketone), aromatic and aliphatic hydrocarbons (e.g.
  • toluene xylenes, hexanes, and heptanes
  • nitriles e.g. acetonitrile, propionitrile, butyronitrile, and benzonitrile
  • N,N-dialkylamides e.g. N,N-dimethylformamide, N,N-dimethylacetamide, and N-methyl-2-pyrrolidinone
  • sulfoxides and sulfones e.g. dimethyl sulfoxide and sulfolane
  • halogenated hydrocarbons e.g. dichloromethane and dichloroethane
  • alcohols e.g. methanol, ethanol, isopropanol, butanol
  • water and mixtures thereof e.g. methanol, ethanol, isopropanol, butanol
  • the fifth base may be inorganic or organic.
  • the fifth base may be selected from the group consisting of metal hydroxides, carbonates, phosphates, tertiary amines, and aryl amines.
  • the fifth base may be selected from the group consisting of sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, sodium bicarbonate, potassium carbonate, lithium carbonate, potassium phosphate, sodium phosphate, triethylamine, diisopropylethylamine, N,N-dimethylaniline, N,N-diethylaniline, pyridine, and mixtures thereof.
  • the compound of Formula 2 may be treated with the compound of Formula 4a without base to yield an intermediate of Formula 7a, which may or may not be isolated, before treatment with a fourth base to yield the compound of Formula 6a.
  • the fifth solvent may be selected from the group consisting of alkyl ethers (e.g. tetrahydrofuran, dioxane, diethyl ether, methyl t-butyl ether, diisopropyl ether, butyl ether), alkyl esters (e.g. ethyl acetate, isopropyl acetate), ketones (e.g. acetone, methyl ethyl ketone, methyl isobutyl ketone), aromatic and aliphatic hydrocarbons (e.g.
  • alkyl ethers e.g. tetrahydrofuran, dioxane, diethyl ether, methyl t-butyl ether, diisopropyl ether, butyl ether
  • alkyl esters e.g. ethyl acetate, isopropyl acetate
  • ketones e.g. acetone, methyl ethy
  • nitrites e.g. acetonitrile, propionitrile, butyronitrile, and benzonitrile
  • N,N-dialkylamides e.g. N,N-dimethylform
  • G is OR 1 , NR 2 R 3 , or CX 3 ;
  • R 1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R 2 and R 3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R 2 and R 3 when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
  • R 2 and R 3 when together form a single ring group with the N to which they are bonded, are a heteroaryl ring;
  • L 2 is a halogen or sulfonyloxy group, the process comprising:
  • L 2 is a halogen or sulfonyloxy group; thereby forming a compound of Formula 7a:
  • L 2 is as defined for Formula 4, and
  • L 1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C 1 -C 4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
  • G is as defined above for Formula 8ca, thereby forming the compound of Formula 8ca.
  • the compound of Formula 4a is a compound in which L 2 is a sulfonyloxy group. In some embodiments the compound of Formula 4a is a compound in which L 2 is a toluenesulfonyloxy, methanesulfonyloxy or trifluoromethanesulfonyloxy group. In some embodiments the compound of Formula 4a is a compound in which L 2 is a halogen. In some embodiments the compound of Formula 4a is a compound in which L 2 is chloro.
  • the compound of Formula 3 is a compound in which R 1 is alkyl. In some embodiments the compound of Formula 3 is a compound in which R 1 is methyl. In some embodiments the compound of Formula 3 is a compound in which X is chloro and R 1 is methyl.
  • the sixth base may be inorganic or organic.
  • the sixth base may be selected from the group consisting of metal hydroxides, carbonates, phosphates, tertiary amines and aryl amines.
  • the sixth base may be selected from the group consisting of sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, sodium bicarbonate, potassium carbonate, lithium carbonate, potassium phosphate, sodium phosphate, triethylamine, diisopropylethylamine, N,N-dimethylaniline, N,N-diethylaniline, pyridine, and mixtures thereof.
  • Reaction of the compound of Formula 2 with the compound of Formula 4a may be conducted in a sixth solvent that is the same as the fourth solvent above.
  • Reaction of the compound of Formula 7a with the compound of Formula 3 may be conducted in a seventh solvent that is the same as the fifth solvent above.
  • G is OR 1 , NR 2 R 3 , or CX 3 ;
  • R 1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R 2 and R 3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R 2 and R 3 when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
  • R 2 and R 3 when together form a single ring group with the N to which they are bonded, are a heteroaryl ring;
  • X is halogen, the process comprising conversion of a compound of Formula 8ca to the compound of Formula 8aa.
  • Conversion of the compound of Formula 8ca to the compound of Formula 8aa may be conducted by treatment of the compound of Formula 8ca with a suitable alkali halide optionally in the presence of a seventh base.
  • the suitable alkali halide may be sodium iodide.
  • the seventh base may be the same as the sixth base above.
  • L 2 is as defined above for Formula 4a, may be prepared from the compound of Formula 7a or the compound of Formula 8ca.
  • the compound of Formula 7a when the compound of Formula 7a is treated with the compound of Formula 3 in the presence of a suitable base, the cyclized compound of Formula 8ba may be obtained.
  • the compound of Formula 8ca may be converted to the compound of Formula 8ba under suitable conditions.
  • the compound of Formula 8ba when the compound of Formula 8ca is treated with a suitable base, the compound of Formula 8ba may be obtained.
  • Other methods for converting the compound of Formula 7a or Formula 8ca to the compound of Formula 8ba are known to those skilled in the art.
  • Rivaroxaban n-BuLi (2.36 mL, 3.77 mmol, 1.6 M in hexane) was added drop-wise (over ca. 2-3 min) to a stirred and cooled ( ⁇ 10° C.) suspension of 5-chlorothiophene-2-carboxamide (9, 831 mg, 5.141 mmol) in THF (8 mL). The cooling bath was removed after 30 min and the reaction mixture was stirred for another 30 min.
  • Methyl N-(2R,3-epoxy-1-propyl)-N-[4-(3-oxo-4-morpholinyl)phenyl]carbamate (8a2, 1.05 g, 3.427 mmol) was added as a solid in one portion. The reaction mixture was then refluxed for 5 h and the solvent evaporated in vacuo. A mixture of cold water (30 mL; ⁇ 5° C.) and saturated aqueous NH 4 Cl (10 mL) was added to the damp residue. The mixture was stirred for 10 min, filtered and washed the solids with cold ( ⁇ 5° C.) water (2 ⁇ 10 mL). The solid was pulped in MeOH (40 mL) at 60° C.
  • Rivaroxaban 97% as a crystalline solid.
  • Rivaroxaban LiCl (17 mg, 0.391 mmol) was added to a solution of t-BuOK (42 mg, 0.359 mmol) in THF (1 mL). After stirring for 30 min, 5-chlorothiophene-2-carboxamide (9, 79 mg, 0.489 mmol) was added. The suspension was stirred for another 30 min and methyl N-(2R,3-epoxy-1-propyl)-N-[4-(3-oxo-4-morpholinyl)phenyl]carbamate (8a2, 100 mg, 0.326 mmol) was added. The reaction mixture was refluxed for 4 h and the solvent was evaporated using a rotary evaporator.
  • Rivaroxaban LiHMDS (0.36 mL, 0.36 mmol,1M in THF) was added dropwise to a suspension of 5-chlorothiophene-2-carboxamide (9, 95 mg, 0.587 mmol) in THF (1 mL). The resulting homogeneous solution was stirred at room temperature for 15 min and methyl N-(2R,3-epoxy-1-propyl)-N-[4-(3-oxo-4-morpholinyl)phenyl]carbamate (8a2, 100 mg, 0.326 mmol) was added as a solid. The reaction mixture was refluxed for 3 h during which time solids separated out.

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Abstract

This invention provides a process for the preparation of S-Rivaroxaban and/or R-Rivaroxaban comprising reacting, in the presence of a first base, a compound of Formula 9:
Figure US20100273798A1-20101028-C00001
with a compound of Formula 8:
Figure US20100273798A1-20101028-C00002

Description

    TECHNICAL FIELD
  • The present invention relates to the field of chemical synthesis of organic compounds and in particular to methods for the synthesis of Rivaroxaban and intermediates thereof.
  • BACKGROUND
  • Rivaroxaban (1) (5-chloro-N-{[(5S)-2-oxo-3-[4-(3-oxomorpholin-4-yl)phenyl]oxazolidin-5-yl]methyl}thiophene-2-carboxamide) is a low molecular weight, orally administrable anticoagulant drug. The pharmaceutical directly inhibits the active form of serine protease Factor Xa (FXa). Rivaroxaban can be used for the prevention and treatment of various thromboembolic diseases, in particular of deep vein thrombosis (DVT), pulmonary embolism (PE), myocardial infract, angina pectoris, reocclusions and restenoses after angioplasty or aortocoronary bypass, cerebral stroke, transitory ischemic attacks, and peripheral arterial occlusive diseases.
  • Rivaroxaban is disclosed in WO 01/47919 and has the following structure:
  • Figure US20100273798A1-20101028-C00003
  • US2007/0149522 relates to a method for producing 5-chloro-N-({5S)-2-oxo-3-[4-(3-oxo-4-morpholinyl)-phenyl]-1,3-oxazolidin-5-yl}-methyl)-2-thiophene carboxamide starting from 5-chlorothiophene-2-carbonyl chloride and (2S)-3-amino-propane-1,2-diol and 4-(4-aminophenyl)-3-morpholinone.
  • US2007/0066611 relates to a process for preparing 4-(4-aminophenyl)-3-morpholinone by reacting 4-(4-nitrophenyl)-3-morpholinone with hydrogen in the presence of a hydrogenation catalyst, characterized in that the reaction is effected in an aliphatic alcohol.
  • U.S. Pat. No. 7,351,823 relates to a process for preparing 5-chloro-N-({(5S)-2-oxo-3-[4-(3-oxo-4-morpholinyl)phenyl]-1,3-oxazolidin-5-yl}methyl)-2-thiophenecarboxamide starting from 2-[(2S)-2-oxiranylmethyl]-1H-isoindole-1,3-(2H)-dione, 4-(4-aminophenyl)-3-morpholinone and 5-chlorothiophene-2-carbonyl chloride.
  • WO 2009/023233 relates to novel compounds that are substituted oxazolidinones derivatives and pharmaceutically acceptable salts thereof. More specifically, this invention relates to novel oxazolidinone compounds that are derivatives of Rivaroxaban. The invention also provides pyrogen-free compositions comprising one or more compounds of the invention and a carrier, along with the use of the disclosed compounds and compositions in methods of treating diseases and condition that are beneficially treated by administering a selective inhibitor of factor Xa, such as Rivaroxaban.
  • SUMMARY
  • This invention is based, in part, on preparing Rivaroxaban by reacting a compound of Formula 8a, 8b or 8c with 5-chlorothiophene-2-carboxamide of Formula 9 in Scheme 1.
  • The present invention is directed to methods of preparation of Rivaroxaban, various intermediates useful in the preparation of Rivaroxaban and methods of preparation of such intermediates.
  • In illustrative embodiments of the present invention, Rivaroxaban and the intermediates thereof may be prepared by an exemplary process as set out in Scheme 1. Exemplary reagents and conditions for these reactions are disclosed herein.
  • Figure US20100273798A1-20101028-C00004
  • In illustrative embodiments of the present invention, the (R)-enantiomer of Rivaroxaban is prepared by the processes of the present invention by replacing the compound of Formula 4 of Scheme 1 with the (S)-enantiomer (ie. (S)-(+)-epichlorohydrin) and preparing compounds having the stereochemistry as shown in Scheme 1a.
  • Figure US20100273798A1-20101028-C00005
  • In illustrative embodiments of the present invention, there is provided a process for the preparation of S-Rivaroxaban and/or R-Rivaroxaban comprising reacting, in the presence of a first base, a compound of Formula 9:
  • Figure US20100273798A1-20101028-C00006
  • with a compound of Formula 8:
  • Figure US20100273798A1-20101028-C00007
  • wherein R4 is selected from the group consisting of:
  • Figure US20100273798A1-20101028-C00008
  • wherein
  • G is OR1, NR2R3 or CX3;
  • R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl;
  • R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring;
  • X is halogen; and
  • L2 is a halogen or sulfonyloxy group.
  • In illustrative embodiments of the present invention, there is provided a process described herein wherein a compound of Formula 8 is a compound of Formula 8a and/or 8aa:
  • Figure US20100273798A1-20101028-C00009
  • In illustrative embodiments of the present invention, there is provided a process described herein wherein a compound of Formula 8 is a compound of Formula 8b and/or 8ba:
  • Figure US20100273798A1-20101028-C00010
  • In illustrative embodiments of the present invention, there is provided a process described herein wherein a compound of Formula 8 is a compound of Formula 8c and/or 8ca:
  • Figure US20100273798A1-20101028-C00011
  • In illustrative embodiments of the present invention, there is provided a process for the preparation of a compound of Formula 8a:
  • Figure US20100273798A1-20101028-C00012
  • wherein
  • G is OR1, NR2R3, or CX3;
  • R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl;
  • R2 and R3 when together form a single ring group with the N to which they are bonded, are a heteroaryl ring; and
  • X is halogen, the process comprising:
  • i. reacting, optionally in the presence of a second base, a compound of Formula 2:
  • Figure US20100273798A1-20101028-C00013
  • with a compound of Formula 3:
  • Figure US20100273798A1-20101028-C00014
  • wherein
  • L1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C1-C4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
  • G is as defined above for Formula 8a, thereby forming a compound of Formula 5:
  • Figure US20100273798A1-20101028-C00015
  • wherein G is as defined above for Formula 8a; and
  • ii. reacting the compound of Formula 5, in the presence of a third base, with a compound of Formula 4:
  • Figure US20100273798A1-20101028-C00016
  • wherein L2 is a halogen or sulfonyloxy group, thereby forming the compound of Formula 8a.
  • In illustrative embodiments of the present invention, there is provided a process for the preparation of a compound of Formula 8a:
  • Figure US20100273798A1-20101028-C00017
  • wherein
  • G is OR1, NR2R3, or CX3;
  • R is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl;
  • R2 and R3 when together form a single ring group with the N to which they are bonded are a heteroaryl ring; and
  • X is halogen, the process comprising:
  • i. reacting, in the presence of a fourth base, a compound of Formula 2:
  • Figure US20100273798A1-20101028-C00018
  • with a compound of Formula 4:
  • Figure US20100273798A1-20101028-C00019
  • wherein L2 is a halogen or sulfonyloxy group, thereby forming a compound of Formula 6:
  • Figure US20100273798A1-20101028-C00020
  • and;
  • ii. reacting, optionally in the presence of a fifth base, the compound of Formula 6 with a compound of Formula 3:
  • Figure US20100273798A1-20101028-C00021
  • wherein
  • L1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C1-C4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
  • G is as defined above for Formula 8a, thereby forming the compound of Formula 8a.
  • In illustrative embodiments of the present invention, there is provided a process for the preparation of a compound of Formula 8c:
  • Figure US20100273798A1-20101028-C00022
  • wherein
  • G is OR1, NR2R3, or CX3;
  • R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl;
  • R2 and R3 when together form a single ring group with the N to which they are bonded, are a heteroaryl ring; and
  • L2 is a halogen or sulfonyloxy group, the process comprising:
  • i. reacting a compound of Formula 2:
  • Figure US20100273798A1-20101028-C00023
  • with a compound of Formula 4:
  • Figure US20100273798A1-20101028-C00024
  • wherein L2 is a halogen or sulfonyloxy group; thereby forming a compound of Formula 7:
  • Figure US20100273798A1-20101028-C00025
  • wherein
  • L2 is as defined for Formula 4; and
  • ii. reacting, in the presence of a sixth base, the compound of Formula 7 with a compound of Formula 3:
  • Figure US20100273798A1-20101028-C00026
  • wherein
  • L1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C1-C4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
  • G is as defined above for Formula 8c, thereby forming the compound of Formula 8c.
  • In illustrative embodiments of the present invention, there is provided a process for the preparation of a compound of Formula 8a:
  • Figure US20100273798A1-20101028-C00027
  • wherein
  • G is OR1, NR2R3, or CX3;
  • R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl;
  • R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring;
  • X is halogen, the process comprising conversion of a compound of Formula 8c to the compound of Formula 8a.
  • In illustrative embodiments of the present invention, there is provided a compound of Formula 5a:
  • Figure US20100273798A1-20101028-C00028
  • wherein
  • R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl.
  • In illustrative embodiments of the present invention, there is provided a compound of Formula 5a:
  • Figure US20100273798A1-20101028-C00029
  • wherein
  • R1 is alkyl or substituted alkyl.
  • In illustrative embodiments of the present invention, there is provided a compound of Formula 5b:
  • Figure US20100273798A1-20101028-C00030
  • In illustrative embodiments of the present invention, there is provided a compound of Formula 6:
  • Figure US20100273798A1-20101028-C00031
  • In illustrative embodiments of the present invention, there is provided a compound of Formula 8a:
  • Figure US20100273798A1-20101028-C00032
  • wherein
  • G is OR1, NR2R3, or CX3;
  • R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
  • R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring; and
  • X is halogen.
  • In illustrative embodiments of the present invention, there is provided a compound of Formula 8a1:
  • Figure US20100273798A1-20101028-C00033
  • wherein
  • R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted arylalkyl.
  • In illustrative embodiments of the present invention, there is provided a compound of Formula 8a1:
  • Figure US20100273798A1-20101028-C00034
  • wherein
  • R1 is alkyl or substituted alkyl.
  • In illustrative embodiments of the present invention, there is provided a compound of Formula 8a2:
  • Figure US20100273798A1-20101028-C00035
  • In illustrative embodiments of the present invention, there is provided a compound of Formula 8c:
  • Figure US20100273798A1-20101028-C00036
  • wherein
  • G is OR1, NR2R3, or CX3;
  • R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted arylalkyl;
  • R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
  • R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring; and
  • L2 is a halogen or sulfonyloxy group.
  • In illustrative embodiments of the present invention, there is provided a compound of Formula 8c1:
  • Figure US20100273798A1-20101028-C00037
  • wherein
  • R1 is alkyl or substituted alkyl and L2 is a halogen or sulfonyloxy group.
  • In illustrative embodiments of the present invention, there is provided a compound of Formula 8c2:
  • Figure US20100273798A1-20101028-C00038
  • wherein
  • L2 is a halogen or sulfonyloxy group.
  • In illustrative embodiments of the present invention, there is provided a compound of Formula 8c3:
  • Figure US20100273798A1-20101028-C00039
  • In illustrative embodiments of the present invention, there is provided a process for the preparation of a compound of Formula 8aa:
  • Figure US20100273798A1-20101028-C00040
  • wherein
  • G is OR1, NR2R3, or CX3;
  • R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl;
  • R2 and R3 when together form a single ring group with the N to which they are bonded, are a heteroaryl ring; and
  • X is halogen, the process comprising:
  • i. reacting, optionally in the presence of a second base, a compound of Formula 2:
  • Figure US20100273798A1-20101028-C00041
  • with a compound of Formula 3:
  • Figure US20100273798A1-20101028-C00042
  • wherein
  • L1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C1-C4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
  • G is as defined above for Formula 8aa, thereby forming a compound of Formula 5:
  • Figure US20100273798A1-20101028-C00043
  • wherein G is as defined above for Formula 8aa; and
  • ii. reacting the compound of Formula 5, in the presence of a third base, with a compound of Formula 4a:
  • Figure US20100273798A1-20101028-C00044
  • wherein L2 is a halogen or sulfonyloxy group, thereby forming the compound of Formula 8aa.
  • In illustrative embodiments of the present invention, there is provided a process for the preparation of a compound of Formula 8aa:
  • Figure US20100273798A1-20101028-C00045
  • wherein
  • G is OR1, NR2R3, or CX3;
  • R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl;
  • R2 and R3 when together form a single ring group with the N to which they are bonded are a heteroaryl ring; and
  • X is halogen, the process comprising:
  • i. reacting, in the presence of a fourth base, a compound of Formula 2:
  • Figure US20100273798A1-20101028-C00046
  • with a compound of Formula 4a:
  • Figure US20100273798A1-20101028-C00047
  • wherein L2 is a halogen or sulfonyloxy group, thereby forming a compound of Formula 6a:
  • Figure US20100273798A1-20101028-C00048
  • and;
  • ii. reacting, optionally in the presence of a fifth base, the compound of Formula 6a with a compound of Formula 3:
  • Figure US20100273798A1-20101028-C00049
  • wherein
  • L1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C1-C4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
  • G is as defined above for Formula 8aa, thereby forming the compound of Formula 8aa.
  • In illustrative embodiments of the present invention, there is provided a process for the preparation of a compound of Formula 8ca:
  • Figure US20100273798A1-20101028-C00050
  • wherein
  • G is OR1, NR2R3, or CX3;
  • R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl;
  • R2 and R3 when together form a single ring group with the N to which they are bonded, are a heteroaryl ring; and
  • L2 is a halogen or sulfonyloxy group, the process comprising:
  • i. reacting a compound of Formula 2:
  • Figure US20100273798A1-20101028-C00051
  • with a compound of Formula 4a:
  • Figure US20100273798A1-20101028-C00052
  • wherein L2 is a halogen or sulfonyloxy group; thereby forming a compound of Formula 7a:
  • Figure US20100273798A1-20101028-C00053
  • wherein
  • L2 is as defined for Formula 4a; and
  • ii. reacting, in the presence of a sixth base, the compound of Formula 7a with a compound of Formula 3:
  • Figure US20100273798A1-20101028-C00054
  • wherein
  • L1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C1-C4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
  • G is as defined above for Formula 8ca, thereby forming the compound of Formula 8ca.
  • In illustrative embodiments of the present invention, there is provided a process for the preparation of a compound of Formula 8aa:
  • Figure US20100273798A1-20101028-C00055
  • wherein
  • G is OR1, NR2R3, or CX3;
  • R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl;
  • R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring; X is halogen, the process comprising conversion of a compound of Formula 8ca to the compound of Formula 8aa.
  • In illustrative embodiments of the present invention, there is provided a compound of Formula 6a:
  • Figure US20100273798A1-20101028-C00056
  • In illustrative embodiments of the present invention, there is provided a compound of Formula 8aa:
  • Figure US20100273798A1-20101028-C00057
  • wherein
  • G is OR1 NR2R3, or CX3;
  • R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
  • R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring; and
  • X is halogen;
  • In illustrative embodiments of the present invention, there is provided a compound of Formula 8aa1:
  • Figure US20100273798A1-20101028-C00058
  • wherein
  • R1is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted arylalkyl.
  • In illustrative embodiments of the present invention, there is provided a compound of Formula 8aa1:
  • Figure US20100273798A1-20101028-C00059
  • wherein
  • R1 is alkyl or substituted alkyl.
  • In illustrative embodiments of the present invention, there is provided a compound of Formula 8aa2:
  • Figure US20100273798A1-20101028-C00060
  • In illustrative embodiments of the present invention, there is provided a compound of Formula 8ca:
  • Figure US20100273798A1-20101028-C00061
  • wherein
  • G is OR1, NR2R3, or CX3;
  • R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
  • R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring; and
  • L2 is a halogen or sulfonyloxy group.
  • In illustrative embodiments of the present invention, there is provided a compound of Formula 8ca1:
  • Figure US20100273798A1-20101028-C00062
  • wherein
  • R1 is alkyl or substituted alkyl and L2 is a halogen or sulfonyloxy group.
  • In illustrative embodiments of the present invention, there is provided a compound of Formula 8ca2:
  • Figure US20100273798A1-20101028-C00063
  • wherein
  • L2 is a halogen or sulfonyloxy group.
  • In illustrative embodiments of the present invention, there is provided a compound of Formula 8ca3:
  • Figure US20100273798A1-20101028-C00064
  • Other aspects and features of the present invention will become apparent to those ordinarily skilled in the art upon review of the following description of specific embodiments of the invention in conjunction with the accompanying figures.
  • DETAILED DESCRIPTION
  • As used herein, the term “substituted” refers to the replacement of a hydrogen atom on a compound with a substituent group. A substituent may be a non-hydrogen atom or multiple atoms of which at least one is a non-hydrogen atom and one or more may or may not be hydrogen atoms. For example, without limitation, substituted compounds may comprise one or more substituents selected from the group consisting of: R″, OR″, NR″R′″, SR″, halogen, SiR″R′″R″″, OC(O)R″, C(O)R″, CO2R″, CONR″R′″, NR′″C(O)2R″, S(O)R″, S(O)2R″, CN, and NO2.
  • As used herein, each R″, R′″, and R″″ may be selected, independently, from the group consisting of: hydrogen, halogen, oxygen, substituted or unsubstituted heteroalkyl, substituted or unsubstituted aryl, substituted or unsubstituted alkyl, alkoxy or thioalkoxy groups, and arylalkyl groups.
  • As used herein, the term “alkyl” by itself or as part of another substituent, means, unless otherwise stated, a saturated straight or branched chain, or cyclic hydrocarbon radical, or combination thereof having the number of carbon atoms designated (e.g. C1-C10 or 1- to 10-membered means one to ten carbons). When there is no indication of the number of carbon atoms in the alkyl, it is meant, unless otherwise indicated by context, that there are from 1 to 10 carbons. Examples of saturated hydrocarbon radicals include, but are not limited to, groups such as methyl, ethyl, n-propyl, isopropyl, n-butyl, t-butyl, isobutyl, sec-butyl, cyclohexyl, (cyclohexyl)methyl, cyclopropylmethyl, homologs and isomers of, for example, n-pentyl, n-hexyl, n-heptyl, n-octyl, and the like.
  • As used herein, the term “aryl” by itself or as part of another substituent, means, unless otherwise stated, a polyunsaturated, aromatic, hydrocarbon substituent which can be a single ring or multiple rings (often from 1 to 3 rings) which are fused together or linked covalently. “Aryl” includes, but is not limited to, “heteroaryl” groups. “Heteroaryl” refers to an aryl group that contain from one to four heteroatoms selected from N, O, and S, wherein the nitrogen and sulfur atoms are optionally oxidized, and the nitrogen atom(s) are optionally quaternized. A heteroaryl group can be attached to the remainder of the molecule through a heteroatom. Non-limiting examples of aryl and heteroaryl groups include: phenyl, 1-naphthyl, 2-naphthyl, 4-biphenyl, 1-pyrrolyl, 2-pyrrolyl, 3-pyrrolyl, 3-pyrazolyl, 2-imidazolyl, 4-imidazolyl, pyrazinyl, 2-oxazolyl, 4-oxazolyl, 2-phenyl-4-oxazolyl, 5-oxazolyl, 3-isoxazolyl, 4-isoxazolyl, 5-isoxazolyl, 2-thiazolyl, 4-thiazolyl, 5-thiazolyl, 2-furyl, 3-furyl, 2-thienyl, 3-thienyl, 2-pyridinyl, 3-pyridinyl, 4-pyridinyl, 2-pyrimidyl, 4-pyrimidyl, 5-benzothiazolyl, purinyl, 2-benzimidazolyl, 5-indolyl, 1-isoquinolyl, 5-isoquinolyl, 2-quinoxalinyl, 5-quinoxalinyl, 3-quinolyl, and 6-quinolyl. The term “aryl” when used in combination with other terms (e.g., aryloxy, arylthioxy, arylalkyl) includes both aryl and heteroaryl rings as defined above. Thus, the term “arylalkyl” is meant to include those radicals in which an aryl group is attached to an alkyl group (e.g., benzyl, phenethyl, pyridylmethyl, etc.) including those alkyl groups in which a carbon atom containing group (e.g., a methylene group) has been replaced by, for example, an oxygen atom (e.g., phenoxymethyl, 2-pyridyloxymethyl, 3-(1-naphthyloxy)propyl, etc).
  • The present invention is directed to methods of preparation of Rivaroxaban, various intermediates useful in the preparation of Rivaroxaban and methods of preparation of such intermediates.
  • A person of skill in the art recognizes that by appropriate choice of reagents, the processes of the present invention may be equally applied to the preparation of the (R)-enantiomer of Rivaroxaban. By replacing (R)-(−)-epichlorohydrin (compound of Formula 4) of the present invention with (S)-(+)-epichlorohydrin, the (R)-enantiomer of Rivaroxaban is obtained. The processes of the present invention encompass preparation of both enantiomers of Rivaroxaban.
  • According to illustrative embodiments of the present invention, there is provided a process for the preparation of (S)-Rivaroxaban and/or (R)-Rivaroxaban comprising reacting, in the presence of a first base, a compound of Formula 9:
  • Figure US20100273798A1-20101028-C00065
  • with a compound of Formula 8:
  • Figure US20100273798A1-20101028-C00066
  • wherein
  • R4 is one of the following:
  • Figure US20100273798A1-20101028-C00067
  • wherein
  • G is OR1, NR2R3, or CX3;
  • R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
  • R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring;
  • X is halogen; and
  • L2 is a halogen or sulfonyloxy group.
  • The first base may be a strong base suitable for deprotonation of an amide. The first base may be an organometallic compound. The organometallic compound may be selected from the group consisting of organomagnesium, organozinc, organosodium, organolithium compounds and mixtures thereof. The first base may be selected from the group consisting of alkylmagnesium halide, arylmagnesium halide, alkylzinc halide, alkyllithium, aryllithium, lithium hexaalkyldisilazide, sodium hexaalkyldisilazide, potassium hexaalkyldisilazide, potassium t-butoxide, sodium hydride, lithium hydride, L-selectride, superhydride, lithium amide, sodium amide, lithium dialkylamide, and mixtures thereof. The first base may be lithium hexamethyldisilazide, n-butyllithium, or potassium t-butoxide. The first base may be combined with an inorganic salt additive such as LiX or CuX wherein X is halogen.
  • The reaction of the compound of Formula 8 with the compound of Formula 9 may be conducted in a first solvent. The first solvent may be a suitable aprotic organic solvent. The first solvent may be selected from the group consisting of alkyl ethers (e.g. tetrahydrofuran, dioxane, diethyl ether, methyl t-butyl ether, diisopropyl ether, butyl ether), alkyl esters (e.g. ethyl acetate, isopropyl acetate), ketones (e.g. acetone, methyl ethyl ketone, methyl isobutyl ketone), aromatic, and aliphatic hydrocarbons (e.g. toluene, xylenes, hexanes, and heptanes), nitriles (e.g. acetonitrile, propionitrile, butyronitrile, and benzonitrile), N,N-dialkylamides (e.g. N,N-dimethylformamide, N,N-dimethylacetamide, and N-methyl-2-pyrrolidinone), sulfoxides and sulfones (e.g. dimethyl sulfoxide and sulfolane), halogenated hydrocarbons (e.g. dichloromethane and dichloroethane), and mixtures thereof.
  • According to illustrative embodiments of the present invention, there is provided a process for preparation of a compound of Formula 8a:
  • Figure US20100273798A1-20101028-C00068
  • wherein
  • G is OR1, NR2R3, or CX3;
  • R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R2 and R3, when independent groups, are independently selected from H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
  • R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring; and
  • X is halogen, the process comprising:
  • i. reacting, optionally in the presence of a second base, a compound of Formula 2:
  • Figure US20100273798A1-20101028-C00069
  • with a compound of Formula 3:
  • Figure US20100273798A1-20101028-C00070
  • wherein
  • L1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C1-C4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
  • G is as defined above for Formula 8a, thereby forming a compound of Formula 5:
  • Figure US20100273798A1-20101028-C00071
  • wherein
  • G is as defined above for Formula 8a; and
  • ii. reacting the compound of Formula 5, in the presence of a third base, with a compound of Formula 4:
  • Figure US20100273798A1-20101028-C00072
  • wherein
  • L2 is a halogen or sulfonyloxy group, thereby forming the compound of Formula 8a.
  • In some embodiments, the compound of Formula 3 is a compound in which L1 is halogen and G is OR1. In some embodiments the compound of Formula 3 is a compound in which L1 is chloro and R1 is alkyl. In some embodiments the compound of Formula 3 is a compound in which L1 is chloro and R1 is methyl. In some embodiments the compound of Formula 3 is a compound in which L1 and G are imidazole.
  • In some embodiments the compound of Formula 4 is a compound in which L2 is a sulfonyloxy group. In some embodiments the compound of Formula 4 is a compound in which L2 is a toluenesulfonyloxy, methanesulfonyloxy or trifluoromethanesulfonyloxy group. In some embodiments the compound of Formula 4 is a compound in which L2 is a halogen. In some embodiments the compound of Formula 4 is a compound in which L2 is chloro.
  • The second base may be inorganic or organic. The second base may be selected from the group consisting of metal hydroxides, carbonates, phosphates, tertiary amines, and aryl amines. The second base may be selected from the group consisting of sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, sodium bicarbonate, potassium carbonate, lithium carbonate, potassium phosphate, sodium phosphate, triethylamine, diisopropylethylamine, N,N-dimethylaniline, N,N-diethylaniline, pyridine, and mixtures thereof.
  • The reaction of the compound of Formula 2 with the compound of Formula 3 may be conducted in a second solvent. The second solvent may be selected from the group consisting of alkyl ethers (e.g. tetrahydrofuran, dioxane, diethyl ether, methyl t-butyl ether, diisopropyl ether, butyl ether), alkyl esters (e.g. ethyl acetate, isopropyl acetate), ketones (e.g. acetone, methyl ethyl ketone, methyl isobutyl ketone), aromatic and aliphatic hydrocarbons (e.g. toluene, xylenes, hexanes, and heptanes), nitriles (e.g. acetonitile, propionitrile, butyronitrile, and benzonitrile), N,N-dialkylamides (e.g. N,N-dimethylformamide, N,N-dimethylacetamide, and N-methyl-2-pyrrolidinone), sulfoxides and sulfones (e.g. dimethyl sulfoxide and sulfolane), halogenated hydrocarbons (e.g. dichloromethane and dichloroethane), alcohols (e.g. methanol, ethanol, isopropanol, butanol), water and mixtures thereof.
  • The third base may be a suitable non-nucleophillic base. The third base may be selected from the group consisting of lithium hexamethyldisilazide, lithium dialkyl amide, sodium hydride, potassium t-butoxide and n-butyllithium.
  • The reaction of the compound of Formula 5 with the compound of Formula 4 may be conducted in a third solvent. The third solvent may be a suitable aprotic organic solvent. The third solvent may be selected from the group consisting of alkyl ethers (e.g. tetrahydrofuran, dioxane, diethyl ether, methyl t-butyl ether, diisopropyl ether, butyl ether), alkyl esters (e.g. ethyl acetate, isopropyl acetate), ketones (e.g. acetone, methyl ethyl ketone, methyl isobutyl ketone), aromatic and aliphatic hydrocarbons (e.g. toluene, xylenes, hexanes, and heptanes), nitriles (e.g. acetonitrile, propionitrile, butyronitrile, and benzonitrile), N,N-dialkylamides (e.g. N,N-dimethylformamide, N,N-dimethylacetamide, and N-methyl-2-pyrrolidinone), sulfoxides and sulfones (e.g. dimethyl sulfoxide and sulfolane), halogenated hydrocarbons (e.g. dichloromethane and dichloroethane), and mixtures thereof.
  • According to illustrative embodiments of the present invention, there is provided a process for the preparation of a compound of Formula 8a:
  • Figure US20100273798A1-20101028-C00073
  • wherein
  • G is OR1, NR2R3, or CX3;
  • R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
  • R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring; and
  • X is halogen, the process comprising:
  • i. reacting, in the presence of a fourth base, a compound of Formula 2:
  • Figure US20100273798A1-20101028-C00074
  • with a compound of Formula 4:
  • Figure US20100273798A1-20101028-C00075
  • wherein
  • L2 is a halogen or sulfonyloxy group, thereby forming a compound of Formula 6:
  • Figure US20100273798A1-20101028-C00076
  • and;
  • ii. reacting, optionally in the presence of a fifth base, the compound of Formula 6 with a compound of Formula 3:
  • Figure US20100273798A1-20101028-C00077
  • wherein
  • L1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C1-C4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
  • G is as defined above for Formula 8a, thereby forming the compound of Formula 8a.
  • In some embodiments the compound of Formula 4 is a compound in which L2 is a sulfonyloxy group. In some embodiments the compound of Formula 4 is a compound in which L2 is a toluenesulfonyloxy, methanesulfonyloxy or trifluoromethanesulfonyloxy group. In some embodiments the compound of Formula 4 is a compound in which L2 is a halogen. In some embodiments the compound of Formula 4 is a compound in which L2 is chloro.
  • In some embodiments the compound of Formula 3 is a compound in which L1 is halogen and G is OR1. In some embodiments the compound of Formula 3 is a compound in which L1 is chloro and R1 is alkyl. In some embodiments the compound of Formula 3 is a compound in which L1 is chloro and R1 is methyl. In some embodiments the compound of Formula 3 is a compound in which L1 and G are imidazole.
  • The fourth base may be inorganic or organic. The fourth base may be selected from the group consisting of metal hydroxides, carbonates, phosphates, tertiary amines, and aryl amines. The fourth base may be selected from the group consisting of sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, sodium bicarbonate, potassium carbonate, lithium carbonate, potassium phosphate, sodium phosphate, triethylamine, diisopropylethylamine, N,N-dimethylaniline, N,N-diethylaniline, pyridine, and mixtures thereof.
  • Reaction of the compound of Formula 2 with the compound of Formula 4 may be conducted in a fourth solvent. The fourth solvent may be selected from the group consisting of alkyl ethers (e.g. tetrahydrofuran, diethyl ether, methyl t-butyl ether, diisopropyl ether, butyl ether), alkyl esters (e.g. ethyl acetate, isopropyl acetate), ketones (e.g. acetone, methyl ethyl ketone, methyl isobutyl ketone), aromatic and aliphatic hydrocarbons (e.g. toluene, xylenes, hexanes, and heptanes), nitriles (e.g. acetonitile, propionitrile, butyronitrile, and benzonitrile), N,N-dialkylamides (e.g. N,N-dimethylformamide, N,N-dimethylacetamide, and N-methyl-2-pyrrolidinone), sulfoxides and sulfones (e.g. dimethyl sulfoxide and sulfolane), halogenated hydrocarbons (e.g. dichloromethane and dichloroethane), alcohols (e.g. methanol, ethanol, isopropanol, butanol), water and mixtures thereof.
  • The fifth base may be inorganic or organic. The fifth base may be selected from the group consisting of metal hydroxides, carbonates, phosphates, tertiary amines, and aryl amines. The fifth base may be selected from the group consisting of sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, sodium bicarbonate, potassium carbonate, lithium carbonate, potassium phosphate, sodium phosphate, triethylamine, diisopropylethylamine, N,N-dimethylaniline, N,N-diethylaniline, pyridine, and mixtures thereof.
  • In some embodiments, the compound of Formula 2 may be treated with the compound of Formula 4 without base to yield an intermediate of Formula 7, which may or may not be isolated, before treatment with a fourth base to yield the compound of Formula 6.
  • Reaction of the compound of Formula 6 with the compound of Formula 3 may be conducted in a fifth solvent. The fifth solvent may be selected from the group consisting of alkyl ethers (e.g. tetrahydrofuran, dioxane, diethyl ether, methyl t-butyl ether, diisopropyl ether, butyl ether), alkyl esters (e.g. ethyl acetate, isopropyl acetate), ketones (e.g. acetone, methyl ethyl ketone, methyl isobutyl ketone), aromatic and aliphatic hydrocarbons (e.g. toluene, xylenes, hexanes, and heptanes), nitriles (e.g. acetonitrile, propionitrile, butyronitrile, and benzonitrile), N,N-dialkylamides (e.g. N,N-dimethylformamide, N,N-dimethylacetamide, and N-methyl-2-pyrrolidinone), sulfoxides and sulfones (e.g. dimethyl sulfoxide and sulfolane), halogenated hydrocarbons (e.g. dichloromethane and dichloroethane), alcohols (e.g. methanol, ethanol, isopropanol, butanol), water and mixtures thereof.
  • According to illustrative embodiments of the present invention, there is provided a process for preparation of a compound of Formula 8c:
  • Figure US20100273798A1-20101028-C00078
  • wherein
  • G is OR1, NR2R3, or CX3;
  • R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
  • R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring; and
  • L2 is a halogen or sulfonyloxy group, the process comprising:
  • i. reacting a compound of Formula 2:
  • Figure US20100273798A1-20101028-C00079
  • with a compound of Formula 4:
  • Figure US20100273798A1-20101028-C00080
  • wherein
  • L2 is a halogen or sulfonyloxy group; thereby forming a compound of Formula 7:
  • Figure US20100273798A1-20101028-C00081
  • wherein
  • L2 is as defined for Formula 4, and;
  • ii. reacting, in the presence of a sixth base, the compound of Formula 7 with a compound of Formula 3:
  • Figure US20100273798A1-20101028-C00082
  • wherein
  • L1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C1-C4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
  • G is as defined above for Formula 8c, thereby forming the compound of Formula 8c.
  • In some embodiments the compound of Formula 4 is a compound in which L2 is a sulfonyloxy group. In some embodiments the compound of Formula 4 is a compound in which L2 is a toluenesulfonyloxy, methanesulfonyloxy or trifluoromethanesulfonyloxy group. In some embodiments the compound of Formula 4 is a compound in which L2 is a halogen. In some embodiments the compound of Formula 4 is a compound in which L2 is chloro.
  • In some embodiments the compound of Formula 3 is a compound in which R1 is alkyl. In some embodiments the compound of Formula 3 is a compound in which R1 is methyl. In some embodiments the compound of Formula 3 is a compound in which X is chloro and R1 is methyl.
  • The sixth base may be inorganic or organic. The sixth base may be selected from the group consisting of metal hydroxides, carbonates, phosphates, tertiary amines and aryl amines. The sixth base may be selected from the group consisting of sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, sodium bicarbonate, potassium carbonate, lithium carbonate, potassium phosphate, sodium phosphate, triethylamine, diisopropylethylamine, N,N-dimethylaniline, N,N-diethylaniline, pyridine, and mixtures thereof.
  • Reaction of the compound of Formula 2 with the compound of Formula 4 may be conducted in a sixth solvent that is the same as the fourth solvent above.
  • Reaction of the compound of Formula 7 with the compound of Formula 3 may be conducted in a seventh solvent that is the same as the fifth solvent above.
  • According to illustrative embodiments of the present invention, there is provided a process for the preparation of a compound of Formula 8a:
  • Figure US20100273798A1-20101028-C00083
  • wherein
  • G is OR1, NR2R3, or CX3;
  • R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
  • R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring; and
  • X is halogen, the process comprising conversion of a compound of Formula 8c to the compound of Formula 8a.
  • Conversion of the compound of Formula 8c to the compound of Formula 8a may be conducted by treatment of the compound of Formula 8c with a suitable alkali halide optionally in the presence of a seventh base. The suitable alkali halide may be sodium iodide. The seventh base may be the same as the sixth base above.
  • A compound of Formula 8b:
  • Figure US20100273798A1-20101028-C00084
  • wherein
  • L2 is as defined above for Formula 4, may be prepared from the compound of Formula 7 or the compound of Formula 8c. For example, when the compound of Formula 7 is treated with the compound of Formula 3 in the presence of a suitable base, the cyclized compound of Formula 8b may be obtained. Similarly, the compound of Formula 8c may be converted to the compound of Formula 8b under suitable conditions. For example, when the compound of Formula 8c is treated with a suitable base, the compound of Formula 8b may be obtained. Other methods for converting the compound of Formula 7 or Formula 8c to the compound of Formula 8b are known to those skilled in the art.
  • According to illustrative embodiments of the present invention, there is provided a process for preparation of a compound of Formula 8aa:
  • Figure US20100273798A1-20101028-C00085
  • wherein
  • G is OR1, NR2R3, or CX3;
  • R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R2 and R3 when independent groups, are independently selected from H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
  • R2 and R3 when together form a single ring group with the N to which they are bonded, are a heteroaryl ring; and
  • X is halogen, the process comprising:
  • i. reacting, optionally in the presence of a second base, a compound of Formula 2:
  • Figure US20100273798A1-20101028-C00086
  • with a compound of Formula 3:
  • Figure US20100273798A1-20101028-C00087
  • wherein
  • L1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C1-C4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
  • G is as defined above for Formula 8aa, thereby forming a compound of Formula 5:
  • Figure US20100273798A1-20101028-C00088
  • wherein
  • G is as defined above for Formula 8aa; and
  • ii. reacting the compound of Formula 5, in the presence of a third base, with a compound of Formula 4a:
  • Figure US20100273798A1-20101028-C00089
  • wherein
  • L2 is a halogen or sulfonyloxy group, thereby forming the compound of Formula 8aa.
  • In some embodiments, the compound of Formula 3 is a compound in which L1 is halogen and G is OR1. In some embodiments the compound of Formula 3 is a compound in which L1 is chloro and R1 is alkyl. In some embodiments the compound of Formula 3 is a compound in which L1 is chloro and R1 is methyl. In some embodiments the compound of Formula 3 is a compound in which L1 and G are imidazole.
  • In some embodiments the compound of Formula 4a is a compound in which L2 is a sulfonyloxy group. In some embodiments the compound of Formula 4a is a compound in which L2 is a toluenesulfonyloxy, methanesulfonyloxy or trifluoromethanesulfonyloxy group. In some embodiments the compound of Formula 4a is a compound in which L2 is a halogen. In some embodiments the compound of Formula 4a is a compound in which L2 is chloro.
  • The second base may be inorganic or organic. The second base may be selected from the group consisting of metal hydroxides, carbonates, phosphates, tertiary amines, and aryl amines. The second base may be selected from the group consisting of sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, sodium bicarbonate, potassium carbonate, lithium carbonate, potassium phosphate, sodium phosphate, triethylamine, diisopropylethylamine, N,N-dimethylaniline, N,N-diethylaniline, pyridine, and mixtures thereof.
  • The reaction of the compound of Formula 2 with the compound of Formula 3 may be conducted in a second solvent. The second solvent may be selected from the group consisting of alkyl ethers (e.g. tetrahydrofuran, dioxane, diethyl ether, methyl t-butyl ether, diisopropyl ether, butyl ether), alkyl esters (e.g. ethyl acetate, isopropyl acetate), ketones (e.g. acetone, methyl ethyl ketone, methyl isobutyl ketone), aromatic and aliphatic hydrocarbons (e.g. toluene, xylenes, hexanes, and heptanes), nitriles (e.g. acetonitile, propionitrile, butyronitrile, and benzonitrile), N,N-dialkylamides (e.g. N,N-dimethylformamide, N,N-dimethylacetamide, and N-methyl-2-pyrrolidinone), sulfoxides and sulfones (e.g. dimethyl sulfoxide and sulfolane), halogenated hydrocarbons (e.g. dichloromethane and dichloroethane), alcohols (e.g. methanol, ethanol, isopropanol, butanol), water and mixtures thereof.
  • The third base may be a suitable non-nucleophillic base. The third base may be selected from the group consisting of lithium hexamethyldisilazide, lithium dialkyl amide, sodium hydride, potassium t-butoxide and n-butyllithium.
  • The reaction of the compound of Formula 5 with the compound of Formula 4a may be conducted in a third solvent. The third solvent may be a suitable aprotic organic solvent. The third solvent may be selected from the group consisting of alkyl ethers (e.g. tetrahydrofuran, dioxane, diethyl ether, methyl t-butyl ether, diisopropyl ether, butyl ether), alkyl esters (e.g. ethyl acetate, isopropyl acetate), ketones (e.g. acetone, methyl ethyl ketone, methyl isobutyl ketone), aromatic and aliphatic hydrocarbons (e.g. toluene, xylenes, hexanes, and heptanes), nitriles (e.g. acetonitrile, propionitrile, butyronitrile, and benzonitrile), N,N-dialkylamides (e.g. N,N-dimethylformamide, N,N-dimethylacetamide, and N-methyl-2-pyrrolidinone), sulfoxides and sulfones (e.g. dimethyl sulfoxide and sulfolane), halogenated hydrocarbons (e.g. dichloromethane and dichloroethane), and mixtures thereof.
  • According to illustrative embodiments of the present invention, there is provided a process for the preparation of a compound of Formula 8aa:
  • Figure US20100273798A1-20101028-C00090
  • wherein
  • G is OR1, NR2R3, or CX3;
  • R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
  • R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring; and
  • X is halogen, the process comprising:
  • i. reacting, in the presence of a fourth base, a compound of Formula 2:
  • Figure US20100273798A1-20101028-C00091
  • with a compound of Formula 4a:
  • Figure US20100273798A1-20101028-C00092
  • wherein
  • L2 is a halogen or sulfonyloxy group, thereby forming a compound of Formula 6a:
  • Figure US20100273798A1-20101028-C00093
  • and;
  • ii. reacting, optionally in the presence of a fifth base, the compound of Formula 6a with a compound of Formula 3:
  • Figure US20100273798A1-20101028-C00094
  • wherein
  • L1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C1-C4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
  • G is as defined above for Formula 8a, thereby forming the compound of Formula 8aa.
  • In some embodiments the compound of Formula 4a is a compound in which L2 is a sulfonyloxy group. In some embodiments the compound of Formula 4a is a compound in which L2 is a toluenesulfonyloxy, methanesulfonyloxy or trifluoromethanesulfonyloxy group. In some embodiments the compound of Formula 4a is a compound in which L2 is a halogen. In some embodiments the compound of Formula 4a is a compound in which L2 is chloro.
  • In some embodiments the compound of Formula 3 is a compound in which L1 is halogen and G is OR1. In some embodiments the compound of Formula 3 is a compound in which L1 is chloro and R1 is alkyl. In some embodiments the compound of Formula 3 is a compound in which L1 is chloro and R is methyl. In some embodiments the compound of Formula 3 is a compound in which L1 and G are imidazole.
  • The fourth base may be inorganic or organic. The fourth base may be selected from the group consisting of metal hydroxides, carbonates, phosphates, tertiary amines, and aryl amines. The fourth base may be selected from the group consisting of sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, sodium bicarbonate, potassium carbonate, lithium carbonate, potassium phosphate, sodium phosphate, triethylamine, diisopropylethylamine, N,N-dimethylaniline, N,N-diethylaniline, pyridine, and mixtures thereof.
  • Reaction of the compound of Formula 2 with the compound of Formula 4a may be conducted in a fourth solvent. The fourth solvent may be selected from the group consisting of alkyl ethers (e.g. tetrahydrofuran, diethyl ether, methyl t-butyl ether, diisopropyl ether, butyl ether), alkyl esters (e.g. ethyl acetate, isopropyl acetate), ketones (e.g. acetone, methyl ethyl ketone, methyl isobutyl ketone), aromatic and aliphatic hydrocarbons (e.g. toluene, xylenes, hexanes, and heptanes), nitriles (e.g. acetonitrile, propionitrile, butyronitrile, and benzonitrile), N,N-dialkylamides (e.g. N,N-dimethylformamide, N,N-dimethylacetamide, and N-methyl-2-pyrrolidinone), sulfoxides and sulfones (e.g. dimethyl sulfoxide and sulfolane), halogenated hydrocarbons (e.g. dichloromethane and dichloroethane), alcohols (e.g. methanol, ethanol, isopropanol, butanol), water and mixtures thereof.
  • The fifth base may be inorganic or organic. The fifth base may be selected from the group consisting of metal hydroxides, carbonates, phosphates, tertiary amines, and aryl amines. The fifth base may be selected from the group consisting of sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, sodium bicarbonate, potassium carbonate, lithium carbonate, potassium phosphate, sodium phosphate, triethylamine, diisopropylethylamine, N,N-dimethylaniline, N,N-diethylaniline, pyridine, and mixtures thereof.
  • In some embodiments, the compound of Formula 2 may be treated with the compound of Formula 4a without base to yield an intermediate of Formula 7a, which may or may not be isolated, before treatment with a fourth base to yield the compound of Formula 6a.
  • Reaction of the compound of Formula 6a with the compound of Formula 3 may be conducted in a fifth solvent. The fifth solvent may be selected from the group consisting of alkyl ethers (e.g. tetrahydrofuran, dioxane, diethyl ether, methyl t-butyl ether, diisopropyl ether, butyl ether), alkyl esters (e.g. ethyl acetate, isopropyl acetate), ketones (e.g. acetone, methyl ethyl ketone, methyl isobutyl ketone), aromatic and aliphatic hydrocarbons (e.g. toluene, xylenes, hexanes, and heptanes), nitrites (e.g. acetonitrile, propionitrile, butyronitrile, and benzonitrile), N,N-dialkylamides (e.g. N,N-dimethylformamide, N,N-dimethylacetamide, and N-methyl-2-pyrrolidinone), sulfoxides and sulfones (e.g. dimethyl sulfoxide and sulfolane), halogenated hydrocarbons (e.g. dichloromethane and dichloroethane), alcohols (e.g. methanol, ethanol, isopropanol, butanol), and mixtures thereof.
  • According to illustrative embodiments of the present invention, there is provided a process for preparation of a compound of Formula 8ca:
  • Figure US20100273798A1-20101028-C00095
  • wherein
  • G is OR1, NR2R3, or CX3;
  • R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
  • R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring; and
  • L2 is a halogen or sulfonyloxy group, the process comprising:
  • i. reacting a compound of Formula 2:
  • Figure US20100273798A1-20101028-C00096
  • with a compound of Formula 4a:
  • Figure US20100273798A1-20101028-C00097
  • wherein
  • L2 is a halogen or sulfonyloxy group; thereby forming a compound of Formula 7a:
  • Figure US20100273798A1-20101028-C00098
  • wherein
  • L2 is as defined for Formula 4, and;
  • ii. reacting, in the presence of a sixth base, the compound of Formula 7a with a compound of Formula 3:
  • Figure US20100273798A1-20101028-C00099
  • wherein
  • L1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C1-C4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
  • G is as defined above for Formula 8ca, thereby forming the compound of Formula 8ca.
  • In some embodiments the compound of Formula 4a is a compound in which L2 is a sulfonyloxy group. In some embodiments the compound of Formula 4a is a compound in which L2 is a toluenesulfonyloxy, methanesulfonyloxy or trifluoromethanesulfonyloxy group. In some embodiments the compound of Formula 4a is a compound in which L2 is a halogen. In some embodiments the compound of Formula 4a is a compound in which L2 is chloro.
  • In some embodiments the compound of Formula 3 is a compound in which R1 is alkyl. In some embodiments the compound of Formula 3 is a compound in which R1 is methyl. In some embodiments the compound of Formula 3 is a compound in which X is chloro and R1 is methyl.
  • The sixth base may be inorganic or organic. The sixth base may be selected from the group consisting of metal hydroxides, carbonates, phosphates, tertiary amines and aryl amines. The sixth base may be selected from the group consisting of sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, sodium bicarbonate, potassium carbonate, lithium carbonate, potassium phosphate, sodium phosphate, triethylamine, diisopropylethylamine, N,N-dimethylaniline, N,N-diethylaniline, pyridine, and mixtures thereof.
  • Reaction of the compound of Formula 2 with the compound of Formula 4a may be conducted in a sixth solvent that is the same as the fourth solvent above.
  • Reaction of the compound of Formula 7a with the compound of Formula 3 may be conducted in a seventh solvent that is the same as the fifth solvent above.
  • According to illustrative embodiments of the present invention, there is provided a process for the preparation of a compound of Formula 8aa:
  • Figure US20100273798A1-20101028-C00100
  • wherein
  • G is OR1, NR2R3, or CX3;
  • R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
  • R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
  • R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
  • R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring; and
  • X is halogen, the process comprising conversion of a compound of Formula 8ca to the compound of Formula 8aa.
  • Conversion of the compound of Formula 8ca to the compound of Formula 8aa may be conducted by treatment of the compound of Formula 8ca with a suitable alkali halide optionally in the presence of a seventh base. The suitable alkali halide may be sodium iodide. The seventh base may be the same as the sixth base above.
  • A compound of Formula 8ba:
  • Figure US20100273798A1-20101028-C00101
  • wherein
  • L2 is as defined above for Formula 4a, may be prepared from the compound of Formula 7a or the compound of Formula 8ca. For example, when the compound of Formula 7a is treated with the compound of Formula 3 in the presence of a suitable base, the cyclized compound of Formula 8ba may be obtained. Similarly, the compound of Formula 8ca may be converted to the compound of Formula 8ba under suitable conditions. For example, when the compound of Formula 8ca is treated with a suitable base, the compound of Formula 8ba may be obtained. Other methods for converting the compound of Formula 7a or Formula 8ca to the compound of Formula 8ba are known to those skilled in the art.
  • EXAMPLES
  • The following examples are illustrative of some of the embodiments of the invention described herein. These examples should not be considered to limit the spirit or scope of the invention in any way.
  • Example 1
  • Preparation of methyl N-[4-(3-oxo-4-morpholinyl)phenyl]carbamate (5b): N,N-Diisopropylethylamine (27.2 mL, 156.08 mmol) was added over 3 min to a stirred suspension of 4-(4-aminophenyl)-3-morpholinone (2, 25 g, 130.07 mmol) in CH2Cl2 (750 mL). The reaction mixture was stirred at room temperature for 15 min and methyl chloroformate (11.6 mL, 149.58 mmol) was added drop-wise over 10 min. The resulting thick suspension was stirred for another 1 h and filtered through a Buchner funnel. The solid was washed with CH2Cl2 (2×75 mL) and dried under vacuum to obtain methyl N-[4-(3-oxo-4-morpholinyl)phenyl]carbamate (5b, 30.92 g, 95%) as a crystalline solid.
  • 1HNMR (300 MHz, DMSO-d6) δ 3.66-3.69 (m, 2H), 3.67 (s, 3H), 3.93-3.97 (m, 2H), 4.17 (s, 2H), 7.28 (d, J=8.8 Hz, 2H), 7.46 (d, J=8.8 Hz, 2H), 9.72 (brs, 1H).
  • Example 2
  • Preparation of methyl N-(2R,3-epoxy-1-propyl)-N-[4-(3-oxo-4-morpholinyl)phenyl]carbamate (8a2): NaH (1.772 g, 48 mmol, 65% in mineral oil) was washed with heptane (30 mL) under a nitrogen atmosphere and DMF (30 mL) was added. A suspension of methyl N-[4-(3-oxo-4-morpholinyl)phenyl]carbamate (5b, 10 g, 40 mmol) in DMF (60 mL) was added in one portion. (R)-(−)-epichlorohydrin (4.7 mL, 60 mmol) was added and the reaction mixture was heated at 60° C. for 3 h. The reaction mixture was cooled to room temperature and diluted with a mixture of water (700 mL) and sat. aq. NH4Cl. The aqueous layer was extracted with EtOAc (100 mL) followed by CH2Cl2 (3×100 mL). The combined organic layers were dried (Na2SO4) and evaporated. The residue was purified by flash chromatography over silica gel (6×20 cm) using 70% EtOAc-heptane to obtain methyl N-(2R,3-epoxy-1-propyl)-N-[4-(3-oxo-4-morpholinyl)phenyl]carbamate (8a2, 5.075 g, 42%) as a crystalline solid.
  • 1HNMR (400 MHz, CDCl3) δ 2.55 (dd, J=5.5, 2.5 Hz, 1H), 2.82 (t, J=4.5 Hz, 1H), 3.24-3.28 (m, 1H), 3.54, (dd, J14.8, 6.1 Hz, 1H), 3.72 (s, 3H), 3.77 (m, 2H), 3.98 (dd, J=14.8, 3.8 Hz, 1H), 4.03 (m, 2H), 4.33 (s, 2H), 7.34 (s, 4H).
  • Example 3
  • Preparation of 4-[4-(N-(2R,3-epoxy-1-propyl)amino)phenyl]morpholin-3-one (6): R-(−)epichlorohydrin (1.3 mL, 16.5 mmol) was added to a suspension of 4-(4-aminophenyl)-3-morpholinone (2, 2.883 g, 15 mmol) in IPA (75 mL). The reaction mixture was refluxed for 20 h and a solution of NaHCO3 (1.513 g, 18 mmol) in water (30 mL) was added and reflux continued for another 1.5 h. Solvent was evaporated using a rotary evaporator and the residue was diluted with water (100 mL) and extracted with EtOAc (3×50 mL). Combined organic extracts were dried (Na2SO4), evaporated and the residue was purified by flash chromatography over silica gel (4×12 cm) using 80% EtOAc-heptane to obtain 4-[4-(N-(2R,3-epoxy-1-propyl)amino)phenyl]morpholin-3-one (6,1.675 g, 46%) as a crystalline white solid.
  • 1HNMR (300 MHz, CDCl3) δ 2.69 (dd, J=5.0, 2.2 Hz, 1H), 2.82 (t, J4.3 Hz, 1H), 3.20-3.27 (m, 2H), 3.51-3.58 (m, 1H), 3.67-3.71 (m, 2H), 3.96-4.02 (m, 3H), 4.32 (s, 2H), 6.66 (d, J=8.7 Hz, 2H), 7.11 (d, J=8.7 Hz, 2H).
  • Example 4
  • Preparation of methyl N-(2R,3-epoxy-1-propyl)-N-[4-(3-oxo-4-morpholinyl)phenyl]carbamate (8a2): Methyl chloroformate (0.17 mL, 2.214 mmol) and N,N-Diisopropylethylamine (0.39 mL, 2.214 mmol) were added in that order to a stirred and cooled (0° C.) solution of 4-[4-(N-(2R,3-epoxy-1-propyl)amino)phenyl]morpholin-3-one (6, 500 mg, 2.013 mmol) in MeCN (10 mL). The cooling bath was removed after 5 min and stirring continued for another 30 min. The reaction mixture was diluted with water (70 mL) and extracted with EtOAc (3×30 mL). The combined organic extracts were dried (Na2SO4), evaporated and the residue was purified by flash chromatography over silica gel (2×16 cm) using 90% EtOAc-heptane to obtain methyl N-(2R,3-epoxy-1-propyl)-N-[4-(3-oxo-4-morpholinyl)phenyl]carbamate (8a2, 536 mg, 87%) as a crystalline white solid.
  • 1HNMR (400 MHz, CDCl3) δ 2.55 (dd, J=5.5, 2.5 Hz, 1H), 2.82 (t, J=4.5 Hz, 1H), 3.24-3.28 (m, 1H), 3.54, (dd, J=14.8, 6.1 Hz, 1H), 3.72 (s, 3H), 3.77 (m, 2H), 3.98 (dd, J=14.8, 3.8 Hz, 1H), 4.03 (m, 2H), 4.33 (s, 2H), 7.34 (s, 4H).
  • Example 5
  • Preparation of 4-[4-(N-(3-chloro-2R-hydroxy-1-propyl)amino)phenyl]morpholin-3-one (7, L2 is chloro): R(−)-epichlorohydrin (2.12 mL, 27.053 mmol) was added to a refluxing solution of 4-(4-aminophenyl)-3-morpholinone (2, 4.0 g, 20.81 mmol) in IPA (125 mL). The mixture was refluxed for 24 h and the solvent was evaporated in vacuo. The residue was purified by flash chromatography over silica gel (4×22 cm) using 90% EtOAc-hexane to obtain 4-[4-(N-(3-chloro-2R-hydroxy-1-propyl)amino)phenyl]morpholin-3-one (7, L2 is chloro, 4.89 g, 83%) as a crystalline white solid. Alternatively the crude residue can be purified by crystallization in EtOAc-hexane (2:1).
  • 1HNMR (300 MHz, CDCl3) d 2.80 (d, J=5.1 Hz, 1H), 3.15-3.22 (m, 1H), 3.33-3.38 (m, 1H), 3.57-3.71 (m, 4H), 3.96-4.05 (m, 3H), 4.13 (br s, 1H), 4,17 (s, 2H), 6.60-6.65 (m, 2H), 7.07-7.11 (m, 2H).
  • Example 6
  • Preparation of methyl N-(3-chloro-2R-hydroxy-1-propyl)-N-[4-(3-oxo-4-morpholinyl)phenyl]carbamate (8c3): Methyl chloroformate (0.05 mL, 0.631 mmol) and N,N-diisopropylethylamine (0.09 mL, 0.5 mmol) were added in that order to a stirred solution of 4-[4-(N-(3-chloro-2R-hydroxy-1-propyl)amino)phenyl]morpholin-3-one (7, L2 is chloro, 150 mg, 0.526 mmol) in MeCN (5 mL). The mixture was stirred at room temperature for 1 h and solvent was evaporated in vacuo at 30-35° C. The residue was taken up in CH2Cl2 (25 mL) and washed with water (10 mL). The organic layer was dried (Na2SO4), evaporated and dried under vacuum to obtain methyl N-(3-chloro-2R-hydroxy-1-propyl)-N-[4-(3-oxo-4-morpholinyl)phenyl]carbamate (8c3, 181 mg, ca. 100%).
  • 1HNMR (300 MHz, CDCl3) d 3.45 (br s, 1H), 3.52 (dd, J=11.2, 5.5 Hz, 1H), 3.60 (dd, J=11.2, 5.0 Hz, 1H), 3.67-3.80 (m, 3H), 3.70 (s, 3H), 3.88-3.96 (m, 1H), 4.02-4.06 (m, 3H), 4.34 (s, 2H), 7.28-7.37 (m, 4H).
  • Example 7
  • Preparation of Rivaroxaban: n-BuLi (2.36 mL, 3.77 mmol, 1.6 M in hexane) was added drop-wise (over ca. 2-3 min) to a stirred and cooled (−10° C.) suspension of 5-chlorothiophene-2-carboxamide (9, 831 mg, 5.141 mmol) in THF (8 mL).The cooling bath was removed after 30 min and the reaction mixture was stirred for another 30 min. Methyl N-(2R,3-epoxy-1-propyl)-N-[4-(3-oxo-4-morpholinyl)phenyl]carbamate (8a2, 1.05 g, 3.427 mmol) was added as a solid in one portion. The reaction mixture was then refluxed for 5 h and the solvent evaporated in vacuo. A mixture of cold water (30 mL; ˜5° C.) and saturated aqueous NH4Cl (10 mL) was added to the damp residue. The mixture was stirred for 10 min, filtered and washed the solids with cold (˜5° C.) water (2×10 mL). The solid was pulped in MeOH (40 mL) at 60° C. for 1 h, concentrated to ˜10 mL and cooled to room temperature. The solids were filtered, washed with cold (0° C.) MeOH (2×4 mL) and dried under vacuum to obtain Rivaroxaban (925 mg, 62%) as a crystalline solid.
  • Example 8
  • Preparation of Rivaroxaban: LiCl (17 mg, 0.391 mmol) was added to a solution of t-BuOK (42 mg, 0.359 mmol) in THF (1 mL). After stirring for 30 min, 5-chlorothiophene-2-carboxamide (9, 79 mg, 0.489 mmol) was added. The suspension was stirred for another 30 min and methyl N-(2R,3-epoxy-1-propyl)-N-[4-(3-oxo-4-morpholinyl)phenyl]carbamate (8a2, 100 mg, 0.326 mmol) was added. The reaction mixture was refluxed for 4 h and the solvent was evaporated using a rotary evaporator. A mixture of cold water (8 mL; ˜5° C.) and saturated aqueous NH4Cl (2 mL) was added to the damp residue. The mixture was stirred for 10 min, filtered and washed the solids with cold (˜5° C.) water (2×2 mL). The solid was dissolved in MeOH (8 mL) and concentrated using a rotary evaporator to ˜1 mL. The precipitated solids were filtered, washed with cold (0° C.) MeOH (0.5 mL) and dried under vacuum to obtain Rivaroxaban (44 mg, 31%) as a crystalline solid.
  • Example 9
  • Preparation of Rivaroxaban: LiHMDS (0.36 mL, 0.36 mmol,1M in THF) was added dropwise to a suspension of 5-chlorothiophene-2-carboxamide (9, 95 mg, 0.587 mmol) in THF (1 mL). The resulting homogeneous solution was stirred at room temperature for 15 min and methyl N-(2R,3-epoxy-1-propyl)-N-[4-(3-oxo-4-morpholinyl)phenyl]carbamate (8a2, 100 mg, 0.326 mmol) was added as a solid. The reaction mixture was refluxed for 3 h during which time solids separated out. The solvent was evaporated in vacuo and a mixture of cold (5° C.) water (8 mL) plus sat. aq. NH4Cl (2 mL) was added to the damp solids. The solids were filtered and washed with cold (5° C.) water (5 ml). The solids were dissolved in 1:1 mixture of MeOH—CH2Cl2 (10 mL) and concentrated on a rotary evaporator to ˜1 mL. The precipitated solids were filtered, washed with cold (5° C.) MeOH (2×0.5 mL) and dried under vacuum to obtain Rivaroxaban (90 mg, 64%) as a crystalline solid.
  • 1HNMR (300 MHz, CDCl3) δ 3.59-3.62 (m, 2H), 3.69-3.73 (m, 2H), 3.85 (dd, J=8.9, 6.3 Hz, 1H), 3.95-3.99 (m, 2H), 4.16-4.22 (m, 1H), 4.19 (s, 2H), 4.82-4.86 (m,. 1H), 7.19 (d, J=4.2 Hz, 1H), 7.40 (d, J=8.7 Hz, 2H), 7.56 (d, J=8.7 Hz, 2H), 7.69 (d, J=4.2 Hz,1H), 8.97 (t, J=5.5 Hz, 1H).
  • Although various embodiments of the invention are disclosed herein, many adaptations and modifications may be made within the scope of the invention in accordance with the common general knowledge of those skilled in this art. Such modifications include the substitution of known equivalents for any aspect of the invention in order to achieve the same result in substantially the same way. Numeric ranges are inclusive of the numbers defining the range. The word “comprising” is used herein as an open-ended term, substantially equivalent to the phrase “including, but not limited to”, and the word “comprises” has a corresponding meaning. As used herein, the singular forms “a”, “an” and “the” include plural referents unless the context clearly dictates otherwise. Thus, for example, reference to “a thing” includes more than one such thing. Citation of references herein is not an admission that such references are prior art to the present invention. Any priority document(s) are incorporated herein by reference as if each individual priority document were specifically and individually indicated to be incorporated by reference herein and as though fully set forth herein. The invention includes all embodiments and variations substantially as hereinbefore described and with reference to the examples and drawings.

Claims (79)

1. A process for the preparation of at least one of S-Rivaroxaban and R-Rivaroxaban comprising reacting, in the presence of a first base, a compound of Formula 9:
Figure US20100273798A1-20101028-C00102
with a compound of Formula 8:
Figure US20100273798A1-20101028-C00103
wherein
R4 is selected from the group consisting of:
Figure US20100273798A1-20101028-C00104
wherein
G is OR1, NR2R3, or CX3;
R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring;
X is halogen; and
L2 is a halogen or sulfonyloxy group.
2. The process of claim 1 wherein the compound of Formula 8 is a compound of Formula 8a:
Figure US20100273798A1-20101028-C00105
wherein
G is OR1, NR2R3 or CX3;
R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring; and
X is halogen.
3. The process of claim 1 wherein the compound of Formula 8 is a compound of Formula 8a2:
Figure US20100273798A1-20101028-C00106
4. The process of claim 1 wherein the compound of Formula 8 is a compound of Formula 8b:
Figure US20100273798A1-20101028-C00107
wherein
L2 is a halogen or sulfonyloxy group.
5. The process of claim 1 wherein the compound of Formula 8 is a compound of Formula 8c:
Figure US20100273798A1-20101028-C00108
wherein
G is OR1, NR2R3, or CX3;
R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring;
X is halogen; and
L2 is a halogen or sulfonyloxy group.
6. The process of claim 1 wherein the compound of Formula 8 is a compound of Formula 8c3:
Figure US20100273798A1-20101028-C00109
7. The process of claim 2 wherein the compound of Formula 8a is prepared by a process comprising:
i. reacting a compound of Formula 2:
Figure US20100273798A1-20101028-C00110
with a compound of Formula 3:
Figure US20100273798A1-20101028-C00111
wherein
L1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C1-C4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
G is OR1, NR2R3, or CX3;
thereby forming a compound of Formula 5:
Figure US20100273798A1-20101028-C00112
wherein
G is OR1, NR2R3, or CX3; and
ii. reacting the compound of Formula 5, in the presence of a third base, with a compound of Formula 4:
Figure US20100273798A1-20101028-C00113
wherein
L2 is a halogen or sulfonyloxy group, thereby forming the compound of Formula 8a.
8. The process of claim 7 wherein the reacting the compound of Formula 2 with the compound of Formula 3 occurs in the presence of a second base.
9. The process of claim 7 wherein the compound of Formula 3 is a haloformate.
10. The process of claim 9 wherein the haloformate is methyl chloroformate.
11. The process of claim 7 wherein the compound of Formula 3 is carbonyldiimidazole.
12. The process of claim 7 wherein the compound of Formula 4 is (R)-(−)-epichlorohydrin.
13. The process of claim 2 wherein the compound of Formula 8a is prepared by a process comprising:
i. reacting, in the presence of a fourth base, a compound of Formula 2:
Figure US20100273798A1-20101028-C00114
with a compound of Formula 4:
Figure US20100273798A1-20101028-C00115
wherein
L2 is a halogen or sulfonyloxy group, thereby forming a compound of Formula 6:
Figure US20100273798A1-20101028-C00116
and;
ii. reacting the compound of Formula 6 with a compound of Formula 3:
Figure US20100273798A1-20101028-C00117
wherein
L1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C1-C4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
G is OR1, NR2R3, or CX3;
thereby forming the compound of Formula 8a.
14. The process of claim 13 wherein reacting the compound of Formula 6 with the compound of Formula 3 occurs in the presence of a fifth base.
15. The process of claim 13 wherein the compound of Formula 3 is a haloformate.
16. The process of claim 15 wherein the haloformate is methyl chloroformate.
17. The process of claim 13 wherein the compound of Formula 3 is carbonyidiimidazole.
18. The process of claim 13 wherein the compound of Formula 4 is (R)-(−)-epichlorohydrin.
19. The process of claim 5 wherein the compound of Formula 8c is prepared by a process comprising:
i. reacting a compound of Formula 2:
Figure US20100273798A1-20101028-C00118
with a compound of Formula 4:
Figure US20100273798A1-20101028-C00119
thereby forming a compound of Formula 7:
Figure US20100273798A1-20101028-C00120
wherein L2 is a halogen or sulfonyloxy group; and
ii. reacting, in the presence of a sixth base, the compound of Formula 7 with a compound of Formula 3:
Figure US20100273798A1-20101028-C00121
wherein
L1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C1-C4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
G is OR1, NR2R3, or CX3;
thereby forming the compound of Formula 8c.
20. The process of claim 19 wherein the compound of Formula 4 is (R)-(−)-epichlorohydrin.
21. The process of claim 19 wherein the compound of Formula 3 is methyl chloroformate.
22. A process for preparation of a compound of Formula 8a:
Figure US20100273798A1-20101028-C00122
wherein
G is OR1, NR2R3, or CX3;
R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring; and
X is halogen,
the process comprising:
i. reacting a compound of Formula 2:
Figure US20100273798A1-20101028-C00123
with a compound of Formula 3:
Figure US20100273798A1-20101028-C00124
wherein
L1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C1-C4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
G is OR1, NR2R3, or CX3; thereby forming a compound of Formula 5:
Figure US20100273798A1-20101028-C00125
wherein
G is OR1, NR2R3, or CX3; and
ii. reacting the compound of Formula 5, in the presence of a third base, with a compound of Formula 4:
Figure US20100273798A1-20101028-C00126
wherein
L2 is a halogen or sulfonyloxy group,
thereby forming the compound of Formula 8a.
23. The process of claim 22 wherein reacting the compound of Formula 2 with the compound of Formula 3 occurs in the presence of a second base.
24. The process of claim 22 wherein the compound of Formula 3 is a haloformate.
25. The process of claim 24 wherein the haloformate is methyl chloroformate.
26. The process of claim 22 wherein the compound of Formula 3 is carbonyldiimidazole.
27. The process of claim 22 wherein the compound of Formula 4 is (R)-(−)-epichlorohydrin.
28. A process for the preparation of a compound of Formula 8a:
Figure US20100273798A1-20101028-C00127
wherein
G is OR1, NR2R3, or CX3;
R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring; and
X is halogen,
the process comprising:
i. reacting, in the presence of a fourth base, a compound of Formula 2:
Figure US20100273798A1-20101028-C00128
with a compound of Formula 4:
Figure US20100273798A1-20101028-C00129
wherein
L2 is a halogen or sulfonyloxy group,
thereby forming a compound of Formula 6:
Figure US20100273798A1-20101028-C00130
and;
ii. reacting the compound of Formula 6 with a compound of Formula 3:
Figure US20100273798A1-20101028-C00131
wherein
L1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C1-C4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
G is OR1, NR2R3, or CX3;
thereby forming the compound of Formula 8a.
29. The compound of claim 28 wherein reacting the compound of Formula 6 with the compound of Formula 3 occurs in the presence of a fifth base.
30. The process of claim 28 wherein the compound of Formula 3 is a haloformate.
31. The process of claim 30 wherein the haloformate is methyl chloroformate.
32. The process of claim 28 wherein the compound of Formula 3 is carbonyidiimidazole.
33. The process of claim 28 wherein the compound of Formula 4 is (R)-(−)-epichlorohydrin.
34. A process for preparation of a compound of Formula 8c:
Figure US20100273798A1-20101028-C00132
wherein
G is OR1, NR2R3, or CX3;
R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring; and
L2 is a halogen or sulfonyloxy group,
the process comprising:
i. reacting a compound of Formula 2:
Figure US20100273798A1-20101028-C00133
with a compound of Formula 4:
Figure US20100273798A1-20101028-C00134
thereby forming a compound of Formula 7:
Figure US20100273798A1-20101028-C00135
wherein
L2 is a halogen or sulfonyloxy group,
and;
ii. reacting, in the presence of a sixth base, the compound of Formula 7 with a compound of Formula 3:
Figure US20100273798A1-20101028-C00136
wherein
L1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C1-C4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
G is OR1, NR2R3, or CX3;
thereby forming the compound of Formula 8c.
35. The process of claim 34 wherein the compound of Formula 4 is (R)-(−)-epichlorohydrin.
36. The process of claim 34 wherein the compound of Formula 3 is methyl chloroformate.
37. A process for the preparation of a compound of Formula 8a:
Figure US20100273798A1-20101028-C00137
wherein
G is OR1, NR2R3, or CX3;
R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
R2 and R3, when independent groups, are independently selected from H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring; and
X is halogen,
the process comprising converting a compound of Formula 8c:
Figure US20100273798A1-20101028-C00138
to the compound of Formula 8a.
38. The process of claim 37 wherein converting the compound of Formula 8c comprises treating of the compound of Formula 8c with sodium iodide.
39. The process of claim 38 wherein the treating of the compound of Formula 8c occurs in the presence of a seventh base.
40-51. (canceled)
52. The process of claim 1 wherein the compound of Formula 8 is a compound of Formula 8aa:
Figure US20100273798A1-20101028-C00139
wherein
G is OR1, NR2R3, or CX3;
R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring; and
X is halogen.
53. The process of claim 1 wherein the compound of Formula 8 is a compound of Formula 8aa2:
Figure US20100273798A1-20101028-C00140
54. The process of claim 1 wherein the compound of Formula 8 is a compound of Formula 8ba:
Figure US20100273798A1-20101028-C00141
wherein
L2 is a halogen or sulfonyloxy group.
55. The process of claim 1 wherein the compound of Formula 8 is a compound of Formula 8ca:
Figure US20100273798A1-20101028-C00142
wherein
G is OR1, NR2R3, or CX3;
R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring;
X is halogen; and
L2 is a halogen or sulfonyloxy group.
56. The process of claim 1 wherein the compound of Formula 8 is a compound of Formula 8ca3:
Figure US20100273798A1-20101028-C00143
57. The process of claim 52 wherein the compound of Formula 8aa is prepared by a process comprising:
i. reacting a compound of Formula 2:
Figure US20100273798A1-20101028-C00144
with a compound of Formula 3:
Figure US20100273798A1-20101028-C00145
wherein
L1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C1-C4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
G is OR1, NR2R3, or CX3;
thereby forming a compound of Formula 5:
Figure US20100273798A1-20101028-C00146
wherein
G is OR1, NR2R3, or CX3; and
ii. reacting the compound of Formula 5, in the presence of a third base, with a compound of Formula 4a:
Figure US20100273798A1-20101028-C00147
wherein
L2 is a halogen or sulfonyloxy group, thereby forming the compound of Formula 8aa.
58. The process of claim 57 wherein reacting the compound of Formula 2 with the compound of Formula 3 occurs in the presence of a second base.
59. The process of claim 57 wherein the compound of Formula 3 is a haloformate.
60. The process of claim 59 wherein the haloformate is methyl chloroformate.
61. The process of claim 57 wherein the compound of Formula 3 is carbonyldiimidazole.
62. The process of claim 57 wherein the compound of Formula 4a is (S)-(+)-epichlorohydrin.
63. The process of claim 52 wherein the compound of Formula 8aa is prepared by a process comprising:
i. reacting, in the presence of a fourth base, a compound of Formula 2:
Figure US20100273798A1-20101028-C00148
with a compound of Formula 4a:
Figure US20100273798A1-20101028-C00149
wherein
L2 is a halogen or sulfonyloxy group, thereby forming a compound of Formula 6a:
Figure US20100273798A1-20101028-C00150
and;
ii. reacting the compound of Formula 6a with a compound of Formula 3:
Figure US20100273798A1-20101028-C00151
wherein
L1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C1-C4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
G is OR1, NR2R3, or CX3;
thereby forming the compound of Formula 8aa.
64. The process of claim 63 wherein reacting the compound of Formula 6a with the compound of Formula 3 occurs in the presence of a fifth base.
65. The process of claim 63 wherein the compound of Formula 3 is a haloformate.
66. The process of claim 65 wherein the haloformate is methyl chloroformate.
67. The process of claim 63 wherein the compound of Formula 3 is carbonyidiimidazole.
68. The process of claim 63 wherein the compound of Formula 4a is (S)-(+)-epichlorohydrin.
69. The process of claim 55 wherein the compound of Formula 8ca is prepared by a process comprising:
i. reacting a compound of Formula 2:
Figure US20100273798A1-20101028-C00152
with a compound of Formula 4a:
Figure US20100273798A1-20101028-C00153
thereby forming a compound of Formula 7a:
Figure US20100273798A1-20101028-C00154
wherein L2 is a halogen or sulfonyloxy group;
and;
ii. reacting, in the presence of a sixth base, the compound of Formula 7a with a compound of Formula 3:
Figure US20100273798A1-20101028-C00155
wherein
L1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C1-C4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
G is OR1, NR2R3, or CX3;
thereby forming the compound of Formula 8ca.
70. The process of claim 69 wherein the compound of Formula 4a is (S)-(+)-epichlorohydrin.
71. The process of claim 69 wherein the compound of Formula 3 is methyl chloroformate.
72. A process for preparation of a compound of Formula 8aa:
Figure US20100273798A1-20101028-C00156
wherein
G is OR1, NR2R3, or CX3;
R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring; and
X is halogen,
the process comprising:
i. reacting a compound of Formula 2:
Figure US20100273798A1-20101028-C00157
with a compound of Formula 3:
Figure US20100273798A1-20101028-C00158
wherein
L1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C1-C4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
G is OR1, NR2R3, or CX3;
thereby forming a compound of Formula 5:
Figure US20100273798A1-20101028-C00159
wherein
G is OR1, NR2R3, or CX3; and
ii. reacting the compound of Formula 5, in the presence of a third base, with a compound of Formula 4a:
Figure US20100273798A1-20101028-C00160
wherein L2 is a halogen or sulfonyloxy group,
thereby forming the compound of Formula 8aa.
73. The process of claim 72 wherein reacting the compound of Formula 2 with the compound of Formula 3 occurs in the presence of a second base.
74. The process of claim 72 wherein the compound of Formula 3 is a haloformate.
75. The process of claim 74 wherein the haloformate is methyl chloroformate.
76. The process of claim 72 wherein the compound of Formula 3 is carbonyidiimidazole.
77. The process of claim 72 wherein the compound of Formula 4a is (S)-(+)-epichlorohydrin.
78. A process for the preparation of a compound of Formula 8aa:
Figure US20100273798A1-20101028-C00161
wherein
G is OR1, NR2R3, or CX3;
R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring; and
X is halogen,
the process comprising:
i. reacting, in the presence of a fourth base, a compound of Formula 2:
Figure US20100273798A1-20101028-C00162
with a compound of Formula 4a:
Figure US20100273798A1-20101028-C00163
wherein
L2 is a halogen or sulfonyloxy group,
thereby forming a compound of Formula 6a:
Figure US20100273798A1-20101028-C00164
and;
ii. reacting the compound of Formula 6a with a compound of Formula 3:
Figure US20100273798A1-20101028-C00165
wherein
L1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C1-C4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
G is OR1, NR2R3, or CX3,
thereby forming the compound of Formula 8aa.
79. The compound of claim 78 wherein the reacting the compound of Formula 6a with the compound of Formula 3 occurs in the presence of a fifth base.
80. The process of claim 78 wherein the compound of Formula 3 is a haloformate.
81. The process of claim 80 wherein the haloformate is methyl chloroformate.
82. The process of claim 78 wherein the compound of Formula 3 is carbonyldiimidazole.
83. The process of claim 78 wherein the compound of Formula 4a is (S)-(+)-epichlorohydrin.
84. A process for preparation of a compound of Formula 8ca:
Figure US20100273798A1-20101028-C00166
wherein
G is OR1, NR2R3, or CX3;
R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
R2 and R3, when independent groups, are independently selected from the group consisting of: H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring; and
L2 is a halogen or sulfonyloxy group,
the process comprising:
i. reacting a compound of Formula 2:
Figure US20100273798A1-20101028-C00167
with a compound of Formula 4a:
Figure US20100273798A1-20101028-C00168
thereby forming a compound of Formula 7a:
Figure US20100273798A1-20101028-C00169
wherein
L2 is a halogen or sulfonyloxy group,
and;
ii. reacting, in the presence of a sixth base, the compound of Formula 7a with a compound of Formula 3:
Figure US20100273798A1-20101028-C00170
wherein
L1 is a leaving group selected from the group consisting of halogen, imidazole, ester, C1-C4 alkoxy, trihalomethoxy, N-hydroxysuccinimide, p-nitrophenol, N-hydroxyphthalimide, and N-hydroxybenzotriazole; and
G is OR1, NR2R3, or CX3;
thereby forming the compound of Formula 8ca.
85. The process of claim 84 wherein the compound of Formula 4a is (S)-(+)-epichlorohydrin.
86. The process of claim 84 wherein the compound of Formula 3 is methyl chloroformate.
87. A process for the preparation of a compound of Formula 8aa:
Figure US20100273798A1-20101028-C00171
wherein
G is OR1, NR2R3, or CX3;
R1 is alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl, or substituted aryl alkyl;
R2 and R3 are either (a) two independent groups or (b) together form a single ring group with the N to which they are bonded;
R2 and R3, when independent groups, are independently selected from H, alkyl, substituted alkyl, aryl, substituted aryl, arylalkyl and substituted arylalkyl,
R2 and R3, when together form a single ring group with the N to which they are bonded, are a heteroaryl ring; and
X is halogen,
the process comprising converting a compound of Formula 8ca:
Figure US20100273798A1-20101028-C00172
to the compound of Formula 8aa.
88. The process of claim 87 wherein the converting the compound of Formula 8ca comprises treating the compound of Formula 8ca with sodium iodide.
89. The process of claim 88 wherein the treating the compound of Formula 8ca occurs in the presence of a seventh base.
90-100. (canceled)
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013105100A1 (en) * 2012-01-09 2013-07-18 Symed Labs Limited Processes for the preparation of 5-chloro-n-({(5s)-2-oxo-3-[4-(3-oxo-4-morpholinyl)phenyl]-1,3-oxazolidin-5-yl}methyl)-2-thiophene-carboxamide and intermediates thereof
CN104844588A (en) * 2015-03-24 2015-08-19 辽宁好护士药业(集团)有限责任公司 Synthetic method for rivaroxaban related substance diamine
US9556163B2 (en) 2011-05-06 2017-01-31 Egis Gyogyszergyar Nyilvanosan Mukodo Reszvenytarsasag Process for the preparation of a rivaroxaban and intermediates formed in said process

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2810478A1 (en) * 2010-09-07 2012-03-15 Symed Labs Limited Processes for the preparation of 4-{4-[5(s)-(aminomethyl)-2-oxo-1,3-oxazolidin-3-yl]phenyl}morpholin-3-one
AU2010362639B2 (en) * 2010-10-18 2016-10-27 Apotex Pharmachem Inc. Processes for the preparation of Rivaroxaban and intermediates thereof
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CN104693139B (en) * 2011-01-07 2017-04-19 浙江九洲药业股份有限公司 Novel technology for synthesizing Rivaroxaban intermediate
EP2697209B1 (en) * 2011-04-11 2015-09-23 Sandoz AG Method for the preparation of substituted oxazolidinones
ES2395304B1 (en) 2011-05-20 2014-01-16 Interquim, S.A. PROCEDURE FOR OBTAINING A THIOPHEN-2-CARBOXAMIDE.
CN102827154B (en) 2011-06-14 2015-04-22 上海科胜药物研发有限公司 New method for synthesizing rivaroxaban intermediate 4-{4-[(5S)-5-(aminomethyl)-2-oxo-1,3-oxazolidine-3-yl]phenyl}morpholine-3-ketone
CZ2012111A3 (en) * 2012-02-16 2013-08-28 Zentiva, K.S. Process for preparing rivaroxaban based on the use of (S)-epichlorohydrin
CN103288814B (en) 2012-02-24 2016-07-06 国药集团国瑞药业有限公司 A kind of preparation method of Rivaroxaban intermediate
EP2834235A1 (en) 2012-04-06 2015-02-11 Indiana University Research and Technology Corporation Processes for preparing rivaroxaban
AU2012378913B2 (en) 2012-05-02 2017-04-13 Symed Labs Limited Improved process for preparing rivaroxaban using novel intermediates
CN102702186B (en) * 2012-06-20 2014-11-19 安润医药科技(苏州)有限公司 Synthesis method of rivaroxaban
CN102786516B (en) * 2012-08-21 2014-10-01 湖南师范大学 Method for synthesizing rivaroxaban
WO2014102822A2 (en) 2012-12-26 2014-07-03 Wanbury Ltd. Aldehyde derivative of substitute oxazolidinones
WO2014102820A2 (en) 2012-12-26 2014-07-03 Wanbury Ltd. Rivaroxaban intermediate and preparation thereof
WO2014155259A2 (en) 2013-03-25 2014-10-02 Glenmark Pharmaceuticals Limited; Glenmark Generics Limited Process for the preparation of rivaroxaban
CN104098556B (en) * 2013-04-09 2019-01-08 浙江九洲药物科技有限公司 A kind of synthesis technology of razaxaban
CN104370854B (en) * 2013-08-12 2016-07-06 四川大学 3-halogen-2-hydroxypropyl-1-anilid compounds Preparation Method And The Use
WO2015026761A1 (en) 2013-08-19 2015-02-26 Amneal Pharmaceuticals Llc A process for the preparation of rivaroxaban
CN104447726B (en) * 2013-09-18 2017-10-10 深圳翰宇药业股份有限公司 A kind of preparation method of razaxaban
WO2015104605A1 (en) 2014-01-08 2015-07-16 Wockhardt Limited A process for preparing rivaroxaban or a pharmaceutically acceptable salt thereof
WO2015111076A2 (en) 2014-01-23 2015-07-30 Symed Labs Limited Improved processes for the preparation of highly pure rivaroxaban crystal modification i
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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7157456B2 (en) * 1999-12-24 2007-01-02 Bayer Healthcare Ag Substituted oxazolidinones and their use in the field of blood coagulation
US20070026065A1 (en) * 2004-12-24 2007-02-01 Bayer Healthcare Ag Solid, modified-release pharmaceutical dosage forms which can be administered orally
US20070066611A1 (en) * 2003-09-15 2007-03-22 Bayer Healthcare Ag Method for the production of 4-(4-aminophenyl)-3-morpholinone
US20070149522A1 (en) * 2003-01-07 2007-06-28 Bayer Healthcare Ag Method for producing 5-chloro-n-({(5s)-2-oxo-3-[4-(3-oxo-4-morpholinyl)phenyl]-1,3-oxazolidin-5-yl}methyl)-2-thiophenecarboxamide
US20080026057A1 (en) * 2003-11-27 2008-01-31 Bayer Healthcare Ag Process for the Preparation of a Solid, Orally Administrable Pharmaceutical Composition
US7351823B2 (en) * 2004-01-15 2008-04-01 Bayer Healthcare Ag Preparation process
US20090004265A1 (en) * 2005-01-31 2009-01-01 Bayer Healthcare Ag Prevention and Treatment of Thromboembolic Disorders

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2823159C (en) 2005-10-04 2014-10-21 Bayer Intellectual Property Gmbh Polymorphic form of 5-chloro-n-({(5s)-2-oxo-3-[4-(3-oxo-4-morpholinyl)-phenyl]-1,3-oxazolidin-5-yl}-methyl)-2-thiophenecarboxamide
DE102005047564A1 (en) * 2005-10-04 2007-05-31 Bayer Healthcare Ag New forms of specific substituted thiophene carboxamide (rivaroxaban), useful for prevention and treatment of thromboembolic disease, have higher solubility than known modifications
DE102005047561A1 (en) 2005-10-04 2007-04-05 Bayer Healthcare Ag Drug delivery system, useful to treat and/or prevent e.g. thromboembolic disease, comprises 5-chloro-N-(((5S)-2-oxo-3-(4-(3-oxo-4-morpholinyl)-phenyl)-1,3-oxazolidine-5-yl)-methyl)-2-thiophene carboxamide with fast release active substance
DE102005048824A1 (en) 2005-10-10 2007-04-12 Bayer Healthcare Ag Treatment and prophylaxis of microangiopathies
DE102006007146A1 (en) 2006-02-16 2007-08-23 Bayer Healthcare Ag Aminoacyl prodrugs
DE102006039589A1 (en) 2006-08-24 2008-03-06 Bayer Healthcare Ag Aminoacyl prodrugs II
DE102007018662A1 (en) 2007-04-20 2008-10-23 Bayer Healthcare Ag Oxazolidinone for the treatment and prophylaxis of pulmonary hypertension
DE102007032345A1 (en) * 2007-07-11 2009-01-15 Bayer Healthcare Ag Aminoacyl prodrugs
ES2425183T3 (en) 2007-08-14 2013-10-11 Concert Pharmaceuticals Inc. Substituted oxazolidinone derivatives
US20100168111A1 (en) 2008-12-31 2010-07-01 Apotex Pharmachem Inc. Polymorphic form of 5 chloro n {[(5s) 2 oxo 3 [4 (3 oxomorpholin 4 yl)phenyl]oxa-zolidin 5 yl]-methyl}thiophene 2 carboxamide

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7157456B2 (en) * 1999-12-24 2007-01-02 Bayer Healthcare Ag Substituted oxazolidinones and their use in the field of blood coagulation
US20070149522A1 (en) * 2003-01-07 2007-06-28 Bayer Healthcare Ag Method for producing 5-chloro-n-({(5s)-2-oxo-3-[4-(3-oxo-4-morpholinyl)phenyl]-1,3-oxazolidin-5-yl}methyl)-2-thiophenecarboxamide
US20070066611A1 (en) * 2003-09-15 2007-03-22 Bayer Healthcare Ag Method for the production of 4-(4-aminophenyl)-3-morpholinone
US20080026057A1 (en) * 2003-11-27 2008-01-31 Bayer Healthcare Ag Process for the Preparation of a Solid, Orally Administrable Pharmaceutical Composition
US7351823B2 (en) * 2004-01-15 2008-04-01 Bayer Healthcare Ag Preparation process
US20070026065A1 (en) * 2004-12-24 2007-02-01 Bayer Healthcare Ag Solid, modified-release pharmaceutical dosage forms which can be administered orally
US20090004265A1 (en) * 2005-01-31 2009-01-01 Bayer Healthcare Ag Prevention and Treatment of Thromboembolic Disorders

Cited By (4)

* Cited by examiner, † Cited by third party
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US9556163B2 (en) 2011-05-06 2017-01-31 Egis Gyogyszergyar Nyilvanosan Mukodo Reszvenytarsasag Process for the preparation of a rivaroxaban and intermediates formed in said process
WO2013105100A1 (en) * 2012-01-09 2013-07-18 Symed Labs Limited Processes for the preparation of 5-chloro-n-({(5s)-2-oxo-3-[4-(3-oxo-4-morpholinyl)phenyl]-1,3-oxazolidin-5-yl}methyl)-2-thiophene-carboxamide and intermediates thereof
CN104844588A (en) * 2015-03-24 2015-08-19 辽宁好护士药业(集团)有限责任公司 Synthetic method for rivaroxaban related substance diamine
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