US20100059867A1 - Integrated circuit chip with seal ring structure - Google Patents
Integrated circuit chip with seal ring structure Download PDFInfo
- Publication number
- US20100059867A1 US20100059867A1 US12/207,490 US20749008A US2010059867A1 US 20100059867 A1 US20100059867 A1 US 20100059867A1 US 20749008 A US20749008 A US 20749008A US 2010059867 A1 US2010059867 A1 US 2010059867A1
- Authority
- US
- United States
- Prior art keywords
- seal ring
- integrated circuit
- analog
- circuit chip
- ring structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000002452 interceptive effect Effects 0.000 claims abstract description 4
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 238000010168 coupling process Methods 0.000 description 4
- 238000005859 coupling reaction Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000002411 adverse Effects 0.000 description 3
- 230000008878 coupling Effects 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000012212 insulator Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 230000001902 propagating effect Effects 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/5222—Capacitive arrangements or effects of, or between wiring layers
- H01L23/5225—Shielding layers formed together with wiring layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/552—Protection against radiation, e.g. light or electromagnetic waves
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/564—Details not otherwise provided for, e.g. protection against moisture
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
- H01L23/64—Impedance arrangements
- H01L23/66—High-frequency adaptations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Definitions
- the present invention related to integrated circuits and, more particularly, to a seal ring structure of an integrated circuit chip having both a digital circuit and an analog and/or RF circuit on one chip.
- an integrated circuit chip includes a seal ring used to protect it from moisture degradation or ionic contamination.
- the seal ring is made of a stack of metal and contact/via layers and is manufactured step by step as sequential depositions of insulators and metals in conjunction together with the fabrication of the integrated circuit elements.
- an integrated circuit chip which includes an analog and/or RF circuit block and a seal ring structure surrounding the analog and/or RF circuit block.
- the seal ring structure comprises a continuous outer seal ring and a discontinuous inner seal ring divided into at least a first portion and a second portion. The second portion is situated in front of the analog and/or RF circuit block for shielding a noise from interfering the analog and/or RF circuit block.
- FIG. 1 is a schematic, planar view of an integrated circuit chip with a seal ring structure in accordance with one preferred embodiment of this invention.
- FIG. 2 is a schematic, planar view of an integrated circuit chip with a seal ring structure in accordance with another preferred embodiment of this invention.
- the present invention pertains to an integrated circuit chip with a seal ring structure.
- the seal ring structure includes an outer seal ring and an inner seal ring.
- the outer seal ring is a continuous ring, while the inner seal ring is divided into at least two separated portions including a conductive rampart that is situated in front of a sensitive analog and/or RF circuit block of the integrated circuit chip.
- the conductive rampart of the inner seal ring shields the analog and/or RF circuit from noise, which may propagate through the outer seal ring, thereby reducing the noise-coupling effects.
- the continuous outer seal ring keeps the moisture and corrosive substances from entering the IC.
- FIG. 1 is a schematic, planar view of an integrated circuit chip 10 with a seal ring structure 12 in accordance with one preferred embodiment of this invention.
- the integrated circuit chip 10 comprises at least one analog and/or RF circuit block 14 , a digital circuit 16 and a seal ring structure 12 surrounding and protecting the analog and/or RF circuit block 14 and digital circuit 16 .
- the integrated circuit chip 10 may further comprise a plurality of input/output (I/O) pads 20 .
- I/O input/output
- noise may originate from a digital power V DD signal line or a signal out pad 20 a of the digital circuit 16 , for example, propagates through the seal ring and adversely affects the performance of the sensitive analog and/or RF circuit 14 .
- a possible noise propagation path 30 is indicated in FIG. 1 .
- the present invention aims to tackle this problem.
- the seal ring structure 12 which is disposed along the periphery of the chip, includes a continuous outer seal ring 122 and a discontinuous inner seal ring 124 .
- the inner seal ring 124 is divided into two portions including a first portion 124 a and a second portion 124 b. Though the inner seal ring 124 is divided into two portions in this embodiment, it could be divided into more portions.
- the first portion 124 a and a second portion 124 b may have substantially the same structure, which may be made of a stack of metal and contact/via layers and may be manufactured step by step as sequential depositions of insulators and metals in conjunction together with the fabrication of the integrated circuit elements.
- the second portion 124 b serves as an isolated conductive rampart that is situated in front of the analog and/or RF circuit block 14 for shielding the noise propagating through the continuous outer seal ring 122 .
- the length of the second portion 124 b is equal to or greater than the length of the shielded analog and/or RF circuit block 14 .
- FIG. 2 is a schematic, planar view of an integrated circuit chip 10 a with a seal ring structure 12 in accordance with another preferred embodiment of this invention, wherein like numeral numbers designate like regions, layers or elements.
- the integrated circuit chip 10 a comprises at least one analog and/or RF circuit block 14 , a digital circuit 16 and a seal ring structure 12 surrounding and protecting the analog and/or RF circuit block 14 and digital circuit 16 .
- the integrated circuit chip 10 a may further comprises a plurality of input/output (I/O) pads 20 .
- Noise which may originate from a digital power V DD signal line or a signal out pad 20 a of the digital circuit 16 , propagates through the seal ring and adversely affects the performance of the sensitive analog and/or RF circuit block 14 .
- the seal ring structure 12 includes a continuous outer seal ring 122 and a discontinuous inner seal ring 124 .
- the inner seal ring 124 is divided into two portions including a first portion 124 a and a second portion 124 b. Though the inner seal ring 124 is divided into two portions in this embodiment, it could be divided into more portions.
- the first portion 124 a and a second portion 124 b may have substantially the same ring structure, which may be made of a stack of metal and contact/via layers and may be manufactured step by step as sequential depositions of insulators and metals in conjunction together with the fabrication of the integrated circuit elements.
- the second portion 124 b serves as an isolated conductive rampart for shielding the noise propagating through the continuous outer seal ring 122 .
- the length of the second portion 124 b is equal to or greater than the length of the shielded analog and/or RF circuit block 14 .
- the second portion 124 b may be coupled to an independent ground or an independent supply voltage. According to this invention, the second portion 124 b may be coupled to the independent ground through an independent pad and an interconnection trace.
- independent used herein means that the ground, pad or supply voltage is not commonly used by the analog circuit, RF circuit or digital circuit.
- the second portion 124 b may be electrically coupled to an independent pad 20 b through an interconnection trace 124 c.
- the interconnection trace 124 c may be comprised of a topmost metal layer of the integrated circuit chip 10 a and an aluminum layer (not shown). By doing this, the second portion 124 b could be coupled to an independent ground (not shown) or an independent supply voltage, such as V SS , and the noise coupling can be significantly reduced.
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Health & Medical Sciences (AREA)
- Electromagnetism (AREA)
- Toxicology (AREA)
- Semiconductor Integrated Circuits (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
Description
- 1. Field of the Invention
- The present invention related to integrated circuits and, more particularly, to a seal ring structure of an integrated circuit chip having both a digital circuit and an analog and/or RF circuit on one chip.
- 2. Description of the Prior Art
- Advances in fabrication technology have enabled entire functional blocks, which previously had been implemented as plural chips on a circuit board, to be integrated onto a single IC. One particularly significant development is mixed-signal circuits, which combine analog circuitry and digital logic circuitry onto a single IC.
- However, a major technical hurdle to implementing mixed-signal circuits has been the coupling of noise between different portions of the IC, for example, from the digital to the analog portions of the IC.
- Ordinarily, an integrated circuit chip includes a seal ring used to protect it from moisture degradation or ionic contamination. Typically, the seal ring is made of a stack of metal and contact/via layers and is manufactured step by step as sequential depositions of insulators and metals in conjunction together with the fabrication of the integrated circuit elements.
- It has been found that the noise, such as those come from a digital power signal line such as VDD or signal pad of a digital circuit, propagates through the seal ring and adversely affects the performance of the sensitive analog and/or RF circuit.
- It is one object of the present invention to provide an improved seal ring structure of an integrated circuit chip, which is capable of reducing a noise such as those coupling from a digital circuit.
- To achieve the goals of the invention, an integrated circuit chip is provided, which includes an analog and/or RF circuit block and a seal ring structure surrounding the analog and/or RF circuit block. The seal ring structure comprises a continuous outer seal ring and a discontinuous inner seal ring divided into at least a first portion and a second portion. The second portion is situated in front of the analog and/or RF circuit block for shielding a noise from interfering the analog and/or RF circuit block.
- These and other objectives of the present invention will no doubt become obvious to those of ordinary skill in the art after reading the following detailed description of the preferred embodiment that is illustrated in the various figures and drawings.
- The accompanying drawings are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification. The drawings illustrate embodiments of the invention and, together with the description, serve to explain the principles of the invention. In the drawings:
-
FIG. 1 is a schematic, planar view of an integrated circuit chip with a seal ring structure in accordance with one preferred embodiment of this invention; and -
FIG. 2 is a schematic, planar view of an integrated circuit chip with a seal ring structure in accordance with another preferred embodiment of this invention. - The present invention pertains to an integrated circuit chip with a seal ring structure. The seal ring structure includes an outer seal ring and an inner seal ring. The outer seal ring is a continuous ring, while the inner seal ring is divided into at least two separated portions including a conductive rampart that is situated in front of a sensitive analog and/or RF circuit block of the integrated circuit chip.
- The conductive rampart of the inner seal ring shields the analog and/or RF circuit from noise, which may propagate through the outer seal ring, thereby reducing the noise-coupling effects. The continuous outer seal ring keeps the moisture and corrosive substances from entering the IC.
- Please refer to
FIG. 1 .FIG. 1 is a schematic, planar view of an integratedcircuit chip 10 with aseal ring structure 12 in accordance with one preferred embodiment of this invention. As shown inFIG. 1 , theintegrated circuit chip 10 comprises at least one analog and/orRF circuit block 14, adigital circuit 16 and aseal ring structure 12 surrounding and protecting the analog and/orRF circuit block 14 anddigital circuit 16. - The
integrated circuit chip 10 may further comprise a plurality of input/output (I/O)pads 20. As previously described, noise may originate from a digital power VDD signal line or a signal outpad 20a of thedigital circuit 16, for example, propagates through the seal ring and adversely affects the performance of the sensitive analog and/orRF circuit 14. A possiblenoise propagation path 30 is indicated inFIG. 1 . The present invention aims to tackle this problem. - According to the present invention, the
seal ring structure 12, which is disposed along the periphery of the chip, includes a continuousouter seal ring 122 and a discontinuousinner seal ring 124. Theinner seal ring 124 is divided into two portions including afirst portion 124 a and asecond portion 124 b. Though theinner seal ring 124 is divided into two portions in this embodiment, it could be divided into more portions. - The
first portion 124 a and asecond portion 124 b may have substantially the same structure, which may be made of a stack of metal and contact/via layers and may be manufactured step by step as sequential depositions of insulators and metals in conjunction together with the fabrication of the integrated circuit elements. - The
second portion 124 b serves as an isolated conductive rampart that is situated in front of the analog and/orRF circuit block 14 for shielding the noise propagating through the continuousouter seal ring 122. Preferably, the length of thesecond portion 124 b is equal to or greater than the length of the shielded analog and/orRF circuit block 14. -
FIG. 2 is a schematic, planar view of anintegrated circuit chip 10 a with aseal ring structure 12 in accordance with another preferred embodiment of this invention, wherein like numeral numbers designate like regions, layers or elements. As shown inFIG. 2 , likewise, theintegrated circuit chip 10 a comprises at least one analog and/orRF circuit block 14, adigital circuit 16 and aseal ring structure 12 surrounding and protecting the analog and/orRF circuit block 14 anddigital circuit 16. - The
integrated circuit chip 10 a may further comprises a plurality of input/output (I/O)pads 20. Noise, which may originate from a digital power VDD signal line or a signal outpad 20 a of thedigital circuit 16, propagates through the seal ring and adversely affects the performance of the sensitive analog and/orRF circuit block 14. - The
seal ring structure 12 includes a continuousouter seal ring 122 and a discontinuousinner seal ring 124. Theinner seal ring 124 is divided into two portions including afirst portion 124 a and asecond portion 124 b. Though theinner seal ring 124 is divided into two portions in this embodiment, it could be divided into more portions. - The
first portion 124 a and asecond portion 124 b may have substantially the same ring structure, which may be made of a stack of metal and contact/via layers and may be manufactured step by step as sequential depositions of insulators and metals in conjunction together with the fabrication of the integrated circuit elements. - The
second portion 124 b serves as an isolated conductive rampart for shielding the noise propagating through the continuousouter seal ring 122. Preferably, the length of thesecond portion 124 b is equal to or greater than the length of the shielded analog and/orRF circuit block 14. - According to this invention, the
second portion 124 b may be coupled to an independent ground or an independent supply voltage. According to this invention, thesecond portion 124 b may be coupled to the independent ground through an independent pad and an interconnection trace. The term “independent” used herein means that the ground, pad or supply voltage is not commonly used by the analog circuit, RF circuit or digital circuit. - The
second portion 124 b may be electrically coupled to anindependent pad 20 b through aninterconnection trace 124 c. Theinterconnection trace 124 c may be comprised of a topmost metal layer of theintegrated circuit chip 10 a and an aluminum layer (not shown). By doing this, thesecond portion 124 b could be coupled to an independent ground (not shown) or an independent supply voltage, such as VSS, and the noise coupling can be significantly reduced. - Those skilled in the art will readily observe that numerous modifications and alterations of the device and method may be made while retaining the teachings of the invention.
Claims (14)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/207,490 US7667302B1 (en) | 2008-09-09 | 2008-09-09 | Integrated circuit chip with seal ring structure |
TW098100335A TWI441306B (en) | 2008-09-09 | 2009-01-07 | Integrated circuit chip and seal ring structure of an integrated circuit chip |
CN2009100002129A CN101673733B (en) | 2008-09-09 | 2009-01-13 | Integrated circuit chip and seal ring structure of same |
US12/650,549 US8242586B2 (en) | 2008-09-09 | 2009-12-31 | Integrated circuit chip with seal ring structure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/207,490 US7667302B1 (en) | 2008-09-09 | 2008-09-09 | Integrated circuit chip with seal ring structure |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/650,549 Continuation-In-Part US8242586B2 (en) | 2008-09-09 | 2009-12-31 | Integrated circuit chip with seal ring structure |
Publications (2)
Publication Number | Publication Date |
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US7667302B1 US7667302B1 (en) | 2010-02-23 |
US20100059867A1 true US20100059867A1 (en) | 2010-03-11 |
Family
ID=41692176
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/207,490 Active US7667302B1 (en) | 2008-09-09 | 2008-09-09 | Integrated circuit chip with seal ring structure |
Country Status (3)
Country | Link |
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US (1) | US7667302B1 (en) |
CN (1) | CN101673733B (en) |
TW (1) | TWI441306B (en) |
Cited By (6)
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JP2015092607A (en) * | 2011-09-27 | 2015-05-14 | インフィネオン テクノロジーズ アーゲーInfineon Technologies Ag | Semiconductor structure having guard ring |
DE102015111848A1 (en) * | 2015-06-10 | 2016-12-15 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device and manufacturing method |
CN107851635A (en) * | 2015-07-24 | 2018-03-27 | 高通股份有限公司 | Conductive seal ring for distribution |
US10546822B2 (en) | 2017-08-30 | 2020-01-28 | Globalfoundries Inc. | Seal ring structure of integrated circuit and method of forming same |
WO2020030931A1 (en) | 2018-08-09 | 2020-02-13 | Datalase Ltd. | Functionalising diacetylene compounds |
US11740418B2 (en) | 2021-03-23 | 2023-08-29 | Globalfoundries U.S. Inc. | Barrier structure with passage for waveguide in photonic integrated circuit |
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US7948060B2 (en) * | 2008-07-01 | 2011-05-24 | Xmos Limited | Integrated circuit structure |
JP5535490B2 (en) * | 2009-01-30 | 2014-07-02 | 住友電工デバイス・イノベーション株式会社 | Semiconductor device |
US9295157B2 (en) * | 2012-07-13 | 2016-03-22 | Skyworks Solutions, Inc. | Racetrack design in radio frequency shielding applications |
CN102832178A (en) * | 2012-09-18 | 2012-12-19 | 上海工程技术大学 | Sealing ring structure used for integrated circuit chip |
JP6478395B2 (en) * | 2015-03-06 | 2019-03-06 | 住友電工デバイス・イノベーション株式会社 | Semiconductor device |
US10128047B2 (en) | 2015-07-19 | 2018-11-13 | Vq Research, Inc. | Methods and systems for increasing surface area of multilayer ceramic capacitors |
US10236123B2 (en) | 2015-07-19 | 2019-03-19 | Vq Research, Inc. | Methods and systems to minimize delamination of multilayer ceramic capacitors |
US10431508B2 (en) | 2015-07-19 | 2019-10-01 | Vq Research, Inc. | Methods and systems to improve printed electrical components and for integration in circuits |
US10332684B2 (en) | 2015-07-19 | 2019-06-25 | Vq Research, Inc. | Methods and systems for material cladding of multilayer ceramic capacitors |
US10242803B2 (en) | 2015-07-19 | 2019-03-26 | Vq Research, Inc. | Methods and systems for geometric optimization of multilayer ceramic capacitors |
US9793227B1 (en) * | 2016-04-21 | 2017-10-17 | Peregrine Semiconductor San Diego | Switchable die seal connection |
US11309412B1 (en) * | 2017-05-17 | 2022-04-19 | Northrop Grumman Systems Corporation | Shifting the pinch-off voltage of an InP high electron mobility transistor with a metal ring |
CN108281421A (en) * | 2018-02-12 | 2018-07-13 | 上海矽杰微电子有限公司 | A kind of domain structure of radio frequency chip |
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- 2009-01-13 CN CN2009100002129A patent/CN101673733B/en active Active
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JP2015092607A (en) * | 2011-09-27 | 2015-05-14 | インフィネオン テクノロジーズ アーゲーInfineon Technologies Ag | Semiconductor structure having guard ring |
DE102015111848A1 (en) * | 2015-06-10 | 2016-12-15 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device and manufacturing method |
DE102015111848B4 (en) * | 2015-06-10 | 2020-12-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device and manufacturing method |
CN107851635A (en) * | 2015-07-24 | 2018-03-27 | 高通股份有限公司 | Conductive seal ring for distribution |
US10546822B2 (en) | 2017-08-30 | 2020-01-28 | Globalfoundries Inc. | Seal ring structure of integrated circuit and method of forming same |
WO2020030931A1 (en) | 2018-08-09 | 2020-02-13 | Datalase Ltd. | Functionalising diacetylene compounds |
US11740418B2 (en) | 2021-03-23 | 2023-08-29 | Globalfoundries U.S. Inc. | Barrier structure with passage for waveguide in photonic integrated circuit |
Also Published As
Publication number | Publication date |
---|---|
US7667302B1 (en) | 2010-02-23 |
TW201011887A (en) | 2010-03-16 |
CN101673733A (en) | 2010-03-17 |
TWI441306B (en) | 2014-06-11 |
CN101673733B (en) | 2012-07-04 |
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