US20090250763A1 - Integrated circuit including a first channel and a second channel - Google Patents
Integrated circuit including a first channel and a second channel Download PDFInfo
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- US20090250763A1 US20090250763A1 US12/486,165 US48616509A US2009250763A1 US 20090250763 A1 US20090250763 A1 US 20090250763A1 US 48616509 A US48616509 A US 48616509A US 2009250763 A1 US2009250763 A1 US 2009250763A1
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- 238000002955 isolation Methods 0.000 claims description 10
- 239000004065 semiconductor Substances 0.000 claims description 10
- 230000000694 effects Effects 0.000 claims description 9
- 229910044991 metal oxide Inorganic materials 0.000 claims description 8
- 150000004706 metal oxides Chemical class 0.000 claims description 8
- 230000005669 field effect Effects 0.000 claims description 3
- 238000000034 method Methods 0.000 description 21
- 238000010586 diagram Methods 0.000 description 12
- 238000005516 engineering process Methods 0.000 description 11
- 230000008901 benefit Effects 0.000 description 8
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 5
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical group [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 description 5
- 230000001939 inductive effect Effects 0.000 description 5
- 125000006850 spacer group Chemical group 0.000 description 5
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 4
- 230000001965 increasing effect Effects 0.000 description 3
- 238000001459 lithography Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
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- 230000007423 decrease Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/8238—Complementary field-effect transistors, e.g. CMOS
- H01L21/823807—Complementary field-effect transistors, e.g. CMOS with a particular manufacturing method of the channel structures, e.g. channel implants, halo or pocket implants, or channel materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
- H01L27/092—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7842—Field effect transistors with field effect produced by an insulated gate means for exerting mechanical stress on the crystal lattice of the channel region, e.g. using a flexible substrate
- H01L29/7843—Field effect transistors with field effect produced by an insulated gate means for exerting mechanical stress on the crystal lattice of the channel region, e.g. using a flexible substrate the means being an applied insulating layer
Definitions
- an electronic system typically includes a number of integrated circuit chips that process data and communicate with one another to perform system applications.
- the integrated circuit chips include devices, such as n-channel metal oxide semiconductor (NMOS) transistors and p-channel metal oxide semiconductor (PMOS) transistors.
- NMOS n-channel metal oxide semiconductor
- PMOS metal oxide semiconductor
- the integrated circuit chips include NMOS and PMOS transistors in a complementary metal oxide semiconductor (CMOS) configuration.
- CMOS complementary metal oxide semiconductor
- Stress engineering uses stress engineering to enhance device performance. Stresses are introduced into the channel of a device to enhance hole or electron mobility and thereby conductivity through the channel. The stresses affect bandgap and carrier mobility in the silicon and applying the appropriate stress to a channel can significantly improve device performance in terms of the Ion/Ioff ratio. Stress engineering techniques have been used in deep sub-micron process technologies, such as 90 nm processes and 65 nm processes.
- PMOS and NMOS devices respond differently to different types of stress.
- PMOS device performance is enhanced by applying compressive stress to a channel and NMOS device performance is enhanced by applying tensile stress to the channel. Also, stresses can be induced locally, which allows PMOS and NMOS devices to be enhanced independently.
- PMOS and NMOS devices are scaled by increasing the width of the channels.
- stress engineering introduces a width dependence on device performance, such that the maximum on current per width decreases due to stress effects as width is increased.
- FIG. 1 is a diagram illustrating one embodiment of an integrated circuit according to the present invention.
- FIG. 2 is a diagram illustrating one embodiment of a metal oxide semiconductor field effect transistor (MOSFET).
- MOSFET metal oxide semiconductor field effect transistor
- FIG. 3 is a cross-section diagram illustrating one embodiment of a MOSFET.
- FIG. 4 is a diagram illustrating one embodiment of a MOSFET that is scaled to be a larger transistor than the MOSFET of FIG. 2 .
- FIG. 5 is a diagram illustrating one embodiment of a MOSFET that includes a first active area and a second active area.
- FIG. 6 is a diagram illustrating another embodiment of a MOSFET that includes a first active area and a second active area.
- FIG. 1 is a diagram illustrating one embodiment of an integrated circuit 20 according to the present invention.
- Integrated circuit 20 is manufactured via a deep sub-micron process technology.
- integrated circuit 20 is manufactured via a 45 nanometer (nm) process technology.
- integrated circuit 20 is manufactured via less than or equal to a 45 nm process technology, i.e., at most a 45 nm process.
- Integrated circuit 20 includes device 22 , which can be any suitable device.
- device 22 is a CMOS device.
- device 22 is an NMOS transistor.
- device 22 is a PMOS transistor.
- Device 22 includes multiple active areas, where each active area includes a channel that provides a corresponding current and has a corresponding width.
- the corresponding currents are summed to provide a combined current that is greater than a single current provided via a single channel having a single width that is substantially equal to the sum of the corresponding widths.
- the combined or total current is directly proportional to the sum of the corresponding widths.
- the active areas are separated via one or more shallow trench isolation regions.
- each of the active areas is stress engineered to enhance mobility in the channel.
- Smaller channel widths benefit more from stress engineering than larger channel widths.
- the performance of a single channel having a larger channel width is degraded due to stress effects.
- the difference in performance between smaller channels and larger channels due to stress effects is more apparent and becomes an issue in process technologies of less than or equal to the 45 nm technology node.
- device 22 is an NMOS device and the multiple active areas are stress engineered to provide enhanced mobility in the channels via tensile stress along the channels. In one embodiment, device 22 is a PMOS device and the multiple channels are stress engineered to provide enhanced mobility in the channels via compressive stress along the channels.
- each of the active areas is substantially similar to each of the other active areas and the corresponding channel widths are substantially equal to one another. Also, the corresponding currents are substantially equal to one another, such that the combined current is an integer multiple of one of the corresponding currents. In one embodiment, each active area and channel is the size of a 1 ⁇ device.
- device 22 includes a first active area and a second active area.
- the first active area includes a first channel that has a first width and the second active area includes a second channel that has a second width.
- the first channel provides a first current and the second channel provides a second current.
- the first and second currents are summed to provide a combined current that is greater than a single current provided via a single channel having a single width substantially equal to the sum of the first width and the second width.
- a first active area is stress engineered to enhance carrier mobility in a first channel and a second active area is stress engineered to enhance carrier mobility in a second channel.
- the smaller channel widths of the first channel and the second channel benefit more from stress engineering than the larger channel width of a single channel, such that the performance of the single channel is degraded due to stress effects and the combined current is greater than a single current from the single channel. Also, the combined current is directly proportional to the sum of the first width and the second width.
- the first active area is substantially similar to the second active area and the first width is substantially equal to the second width.
- the first current is substantially equal to the second current, such that the combined current is twice the first current. If the first active area and the second active area are each the size of a 1 ⁇ device, a device that includes only the first active area and the second active area is a 2 ⁇ device. Also, a device that includes n active areas that are each the size of a 1 ⁇ device, is scaled to be an n ⁇ device.
- FIG. 2 is a diagram illustrating one embodiment of a metal oxide semiconductor field effect transistor (MOSFET) 30 having a channel width of W 1 .
- MOSFET 30 is manufactured via a 45 nm process. In one embodiment, MOSFET 30 is manufactured via at most a 45 nm process. In one embodiment, MOSFET 30 is an NMOS transistor. In one embodiment MOSFET 30 is a PMOS transistor.
- MOSFET 30 includes an active area 32 and a gate 34 .
- Active area 32 is a 3-dimensional volume that includes a portion of gate 34 , drain/source region 36 on one side of gate 34 , source/drain region 38 on the other side of gate 34 , and a channel under gate 34 and between drain/source region 36 and source/drain region 38 .
- Active area 32 and the channel have a width of W 1 .
- MOSFET 30 including width W 1 is sized to be a 1 ⁇ device of the manufacturing process.
- Drain/source region 36 includes drain/source contact 40 and source/drain region 38 includes source/drain contact 42 .
- Gate 34 extends to include gate contact 44 .
- gate 34 includes a poly-silicon gate structure.
- active area 32 is stress engineered to enhance mobility in the channel.
- Channels having smaller channel widths benefit more from stress engineering than channels having larger channel widths.
- the performance of a channel having a larger channel width is degraded due to stress effects.
- the differences in channel performance due to stress effects in channels having smaller channel widths versus channels having larger channel widths is more apparent and becomes an issue in process technologies of less than or equal to the 45 nm technology node.
- MOSFET 30 is an NMOS device and active area 32 is stress engineered to provide enhanced mobility in the channel via tensile stress along the channel. In one embodiment, MOSFET 30 is a PMOS device and active area 32 is stress engineered to provide enhanced mobility in the channel via compressive stress along the channel. In one embodiment, drain/source region 36 and source/drain region 38 are silicon-germanium regions. In one embodiment, active area 32 includes a strain-inducing capping layer.
- an active gate voltage is applied to gate 34 via contact 44 and MOSFET 30 conducts current between drain/source region 36 and source/drain region 38 .
- the current can be provided to other circuits via drain/source contact 40 and source/drain contact 42 .
- the magnitude of the current corresponds to channel width W 1 , where larger channel widths correspond to larger currents and smaller channel widths correspond to smaller currents. If active area 32 is stress engineered, the magnitude of the current is larger for a given channel width W 1 .
- FIG. 3 is a cross-section diagram illustrating one embodiment of a MOSFET 50 .
- MOSFET 50 includes active area 52 , indicated between the dashed lines, where active area 52 is a 3-dimensional volume that extends in the x, y, and z dimensions.
- MOSFET 50 is similar to MOSFET 30 of FIG. 2 .
- MOSFET 50 is an NMOS transistor.
- MOSFET 50 is a PMOS transistor.
- MOSFET 50 is manufactured via a deep sub-micron process technology. In one embodiment, MOSFET 50 is manufactured via a 45 nm process. In one embodiment, MOSFET 50 is manufactured via at most a 45 nm process.
- Active area 52 includes gate 54 , drain/source region 56 , source/drain region 58 , and a channel 60 in substrate 62 .
- Channel 60 is under gate 54 and between drain/source region 56 and source/drain region 58 .
- Channel 60 has channel length L 1 that extends in the x direction along channel 60 and between drain/source region 56 and source/drain region 58 .
- channel 60 has a channel width in the z direction, which is similar to channel width W 1 of MOSFET 30 .
- channel 60 extends vertically in the y direction from gate 54 .
- MOSFET 50 including channel length L 1 and the channel width, is sized to be a 1 ⁇ device of the manufacturing process.
- Active area 52 includes spacer 64 a, spacer 64 b, and strain-inducing capping layer 68 .
- Active area 52 is bounded by shallow trench isolation regions 66 a and 66 b that isolate active area 52 from other devices.
- Spacer 64 a is on one side of gate 54 and spacer 64 b is on the other side of gate 54 .
- Shallow trench isolation region 66 a is on one side of active area 52 and shallow trench isolation region 66 b is on the other side of active area 52 .
- Capping layer 68 is applied over shallow trench isolation regions 66 a and 66 b, gate 54 , spacers 64 a and 64 b , drain/source region 56 , and source/drain region 58 .
- Standard lithography patterning techniques can be used to selectively deposit capping layer 68 .
- Active area 52 is stress engineered to enhance mobility in channel 60 .
- MOSFET 50 is an NMOS transistor and active area 52 is stress engineered to provide enhanced mobility in channel 60 via tensile stress along channel length L 1 of channel 60 .
- MOSFET 50 is a PMOS transistor and active area 52 is stress engineered to provide enhanced mobility in channel 60 via compressive stress along channel length L 1 of channel 60 .
- drain/source region 56 and source/drain region 58 are silicon-germanium regions that provide compressive stress along channel length L 1 of channel 60 .
- capping layer 68 is applied to provide compressive stress along channel length L 1 of channel 60 .
- capping layer 68 is applied to provide tensile stress along channel length L 1 of channel 60 .
- standard patterning and lithography techniques are used to selectively deposit a tensile capping layer over NMOS devices and a compressive capping layer over PMOS devices.
- an active gate voltage is applied to gate 54 and MOSFET 50 conducts current along channel length L 1 , through channel 60 in the x direction between drain/source region 56 and source/drain region 58 .
- the magnitude of the conducted current corresponds to the channel width of channel 60 in the z direction, where larger channel widths correspond to larger currents and smaller channel widths correspond to smaller currents.
- the stress engineered active area 52 provides a larger current for a given channel width.
- FIG. 4 is a diagram illustrating one embodiment of a MOSFET 70 that is scaled to be a larger transistor than MOSFET 30 .
- MOSFET 70 is similar to MOSFET 30 of FIG. 2 , except the channel width W 2 of MOSFET 70 is larger than the channel width W 1 of MOSFET 30 .
- the channel width W 2 is twice as large as the channel width W 1 .
- MOSFET 70 includes active area 72 and gate 74 .
- Active area 72 is a 3-dimensional volume that includes a portion of gate 74 , drain/source region 76 on one side of gate 74 , source/drain region 78 on the other side of gate 74 , and a channel under gate 74 and between drain/source region 76 and source/drain region 78 .
- Active area 72 and the channel have width W 2 .
- Drain/source region 76 includes drain/source contacts 80 a and 80 b and source/drain region 78 includes source/drain contacts 82 a and 82 b.
- Gate 74 extends to include gate contact 84 .
- gate 74 includes a poly-silicon gate structure.
- Active area 72 is stress engineered to enhance mobility in the channel.
- MOSFET 70 is an NMOS device and active area 72 is stress engineered to provide enhanced mobility in the channel via tensile stress along the channel.
- MOSFET 70 is a PMOS device and active area 72 is stress engineered to provide enhanced mobility in the channel via compressive stress along the channel.
- drain/source region 76 and source/drain region 78 are silicon-germanium regions.
- active area 72 includes a strain-inducing capping layer.
- an active gate voltage is applied to gate 74 via contact 84 and MOSFET 70 conducts current between drain/source region 76 and source/drain region 78 .
- the current can be provided to other circuits via drain/source contacts 80 a and 80 b and source/drain contacts 82 a and 82 b.
- the magnitude of the current corresponds to the channel width W 2 , where larger channel widths correspond to larger currents and smaller channel widths correspond to smaller currents.
- Channels having smaller channel widths benefit more from stress engineering than channels having larger channel widths.
- the performance of a channel having a larger channel width is degraded due to stress effects.
- the difference in channel performance between channels having smaller channel widths and channels having larger channel widths is more apparent and becomes an issue in process technologies of less than or equal to the 45 nm technology node.
- MOSFET 30 benefits more from the stress engineering than MOSFET 70 , since channel width W 1 is smaller than channel width W 2 . This results in MOSFET 30 providing more current per unit of channel width than MOSFET 70 .
- the increase in current provided via MOSFET 70 is not directly proportional to the increase in channel width from channel width W 1 to channel width W 2 . For example, if MOSFET 70 is scaled to have a channel width W 2 that is twice as large as channel width W 1 , MOSFET 70 does not provide a current that is twice as large as the current provided via MOSFET 30 . Instead, MOSFET 70 provides a current that is less than twice the current provided via MOSFET 30 .
- FIG. 5 is a diagram illustrating one embodiment of a MOSFET 100 that is scaled to be a larger transistor than MOSFET 30 of FIG. 2 .
- MOSFET 100 includes a first active area 102 , a second active area 104 , and a gate 106 .
- Each of the active areas 102 and 104 is similar to active area 32 (shown in FIG. 2 ) and similar to active area 52 (shown in FIG. 3 ).
- First active area 102 includes a first channel having a channel width of W 3 and second active area 104 includes a second channel having a channel width of W 4 .
- the combined current provided via the first and second channels in MOSFET 100 is directly proportional to the sum of channel width W 3 and channel width W 4 .
- at least one of the channel widths W 3 and W 4 is substantially equal to channel width W 1 of MOSFET 30 .
- each of the channel widths of W 3 and W 4 is substantially equal to channel width W 1 of MOSFET 30 and MOSFET 100 provides substantially twice as much current as MOSFET 30 .
- MOSFET 30 is a 1 ⁇ device and each of the channel widths of W 3 and W 4 is substantially equal to channel width W 1 of MOSFET 30 , such that MOSFET 100 is a 2 ⁇ device.
- First active area 102 is a 3-dimensional volume that includes a portion of gate 106 , drain/source region 108 on one side of gate 106 , source/drain region 110 on the other side of gate 106 , and the first channel under gate 106 and between drain/source region 108 and source/drain region 110 .
- First active area 102 and the first channel have a width of W 3 .
- channel width W 3 is substantially equal to channel width W 1 .
- channel width W 3 can be any suitable width including widths that are larger or smaller than channel width W 1 of MOSFET 30 .
- Second active area 104 is a 3-dimensional volume that includes a portion of gate 106 , drain/source region 112 on one side of gate 106 , source/drain region 114 on the other side of gate 106 , and the second channel under gate 106 and between drain/source region 112 and source/drain region 114 .
- Second active area 104 and the second channel have a width of W 4 .
- channel width W 4 is substantially equal to channel width W 1 .
- channel width W 4 can be any suitable width including widths that are larger or smaller than channel width W 1 of MOSFET 30 .
- Drain/source region 108 includes drain/source contact 116 and source/drain region 110 includes source/drain contact 118 .
- Drain/source region 112 includes drain/source contact 120 and source/drain region 114 includes source/drain contact 122 .
- Gate 106 extends to include gate contact 124 .
- Shallow trench isolation region 126 extends between and surrounds first active area 102 and second active area 104 . Shallow trench isolation region 126 isolates first active area 102 from second active area 104 .
- gate 106 includes a poly-silicon gate structure.
- First active area 102 is stress engineered to enhance mobility in the first channel and second active area 104 is stress engineered to enhance mobility in the second channel.
- MOSFET 100 is an NMOS transistor and first active area 102 is stress engineered to provide enhanced mobility in the first channel via tensile stress along the first channel and second active area 104 is stress engineered to provide enhanced mobility in the second channel via tensile stress along the second channel.
- MOSFET 100 is a PMOS transistor and first active area 102 is stress engineered to provide enhanced mobility in the first channel via compressive stress along the first channel and second active area 104 is stress engineered to provide enhanced mobility in the second channel via compressive stress along the second channel.
- drain/source regions 108 and 112 and source/drain regions 110 and 114 are silicon-germanium regions.
- first active area 102 and second active area 104 include strain-inducing capping layers.
- an active gate voltage is applied to gate 106 via contact 124 .
- First active area 102 conducts current between drain/source region 108 and source/drain region 110 and provides a first current
- second active area 104 conducts current between drain/source region 112 and source/drain region 114 and provides a second current.
- the first current and the second current are combined to provide a total or combined current.
- the combined current is provided to other circuits via drain/source contacts 116 and 120 and source/drain contacts 118 and 122 .
- the magnitude of the combined current corresponds to the sum of the channel widths W 3 and W 4 .
- MOSFET 100 if active area 102 is substantially equal in size to active area 32 and active area 104 is substantially equal in size to active area 32 such that channel width W 1 is substantially equal to channel width W 3 and channel width W 1 is substantially equal to channel width W 4 , MOSFET 100 provides substantially twice the current provided via MOSFET 30 . This doubling of current via MOSFET 100 is directly proportional to the doubling of channel width from channel width W 1 to the sum of channel widths W 3 and W 4 . Since channel width W 1 is substantially equal to channel width W 3 and channel width W 1 is substantially equal to channel width W 4 , each channel benefits equally from the stress engineering and one channels performance is not degraded more than any other channels performance. The current provided via MOSFET 100 is directly proportional to the sum of the channel widths W 3 and W 4 .
- FIG. 6 is a diagram illustrating another embodiment of a MOSFET 200 that is scaled to be a larger transistor than MOSFET 30 of FIG. 2 .
- MOSFET 200 includes a first active area 202 , a second active area 204 , and a gate 206 .
- Each of the active areas 202 and 204 is similar to active area 32 (shown in FIG. 2 ) and similar to active area 52 (shown in FIG. 3 ).
- First active area 202 includes a first channel having a channel width of W 5 and second active area 204 includes a second channel having a channel width of W 6 .
- Gate 206 is forked to cross first active area 202 and second active area 204 .
- the first channel is substantially equal to the second channel in the other dimensions of channel length and channel depth.
- the combined current provided via the first and second channels in MOSFET 200 is directly proportional to the sum of channel width W 5 and channel width W 6 .
- at least one of the channel widths W 5 and W 6 is substantially equal to channel width W 1 of MOSFET 30 .
- each of the channel widths W 5 and W 6 is substantially equal to channel width W 1 of MOSFET 30 and MOSFET 200 provides substantially twice as much current as MOSFET 30 .
- MOSFET 30 is a 1 ⁇ device and each of the channel widths of W 5 and W 6 is substantially equal to channel width W 1 of MOSFET 30 , such that MOSFET 200 is a 2 ⁇ device.
- First active area 202 is a 3-dimensional volume that includes a portion of gate 206 , drain/source region 208 on one side of gate 206 , source/drain region 210 on the other side of gate 206 , and the first channel under gate 206 and between drain/source region 208 and source/drain region 210 .
- First active area 202 and the first channel have a width of W 5 .
- channel width W 5 is substantially equal to channel width W 1 .
- channel width W 5 can be any suitable width including widths that are larger or smaller than channel width W 1 of MOSFET 30 .
- Second active area 204 is a 3-dimensional volume that includes a portion of gate 206 , drain/source region 212 on one side of gate 206 , source/drain region 214 on the other side of gate 206 , and the second channel under gate 206 and between drain/source region 212 and source/drain region 214 .
- Second active area 204 and the second channel have a width of W 6 .
- channel width W 6 is substantially equal to channel width W 1 .
- channel width W 6 can be any suitable width including widths that are larger or smaller than channel width W 1 of MOSFET 30 .
- Drain/source region 208 includes drain/source contact 216 and source/drain region 210 includes source/drain contact 218 .
- Drain/source region 212 includes drain/source contact 220 and source/drain region 214 includes source/drain contact 222 .
- Gate 206 extends to include gate contact 224 .
- Shallow trench isolation region 226 extends between and surrounds first active area 202 and second active area 204 . Shallow trench isolation region 226 isolates first active area 202 from second active area 204 .
- gate 206 includes a poly-silicon gate structure.
- First active area 202 is stress engineered to enhance mobility in the first channel and second active area 204 is stress engineered to enhance mobility in the second channel.
- MOSFET 200 is an NMOS transistor and first active area 202 is stress engineered to provide enhanced mobility in the first channel via tensile stress along the first channel and second active area 204 is stress engineered to provide enhanced mobility in the second channel via tensile stress along the second channel.
- MOSFET 200 is a PMOS transistor and first active area 202 is stress engineered to provide enhanced mobility in the first channel via compressive stress along the first channel and second active area 204 is stress engineered to provide enhanced mobility in the second channel via compressive stress along the second channel.
- drain/source regions 208 and 212 and source/drain regions 210 and 214 are silicon-germanium regions.
- first active area 202 and second active area 204 include strain-inducing capping layers.
- an active gate voltage is applied to gate 206 via contact 224 .
- First active area 202 conducts current between drain/source region 208 and source/drain region 210 and provides a first current
- second active area 204 conducts current between drain/source region 212 and source/drain region 214 and provides a second current.
- the first current and the second current are combined to provide a total or combined current.
- the combined current is provided to other circuits via drain/source contacts 216 and 220 and source/drain contacts 218 and 222 .
- the magnitude of the combined current corresponds to the sum of the channel widths W 5 and W 6 .
- MOSFET 200 In MOSFET 200 , if active area 202 is substantially equal in size to active area 32 and active area 204 is substantially equal in size to active area 32 such that channel width W 1 is substantially equal to channel width W 5 and channel width W 1 is substantially equal to channel width W 6 , MOSFET 200 provides substantially twice the current provided via MOSFET 30 . This doubling of current via MOSFET 200 is directly proportional to the doubling of channel width from channel width W 1 to the sum of channel widths W 5 and W 6 . Since channel width W 1 is substantially equal to channel width W 5 and channel width W 1 is substantially equal to channel width W 6 , each channel benefits equally from the stress engineering and one channels performance is not degraded more than any other channels performance. The current provided via MOSFET 200 is directly proportional to the sum of the channel widths W 5 and W 6 .
- the MOSFET can be scaled to provide an integer multiple of current by providing multiple active areas that are substantially equal in size to one active area, such as active area 32 .
- active area 32 For example, if MOSFET 30 is a 1 ⁇ device, a MOSFET that includes two active areas that are each substantially equal in size to active area 32 is a 2 ⁇ device and a MOSFET that includes three active areas that are each substantially equal in size to active area 32 is a 3 ⁇ device, and so on.
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- Insulated Gate Type Field-Effect Transistor (AREA)
Abstract
An integrated circuit is disclosed. In one embodiment, the integrated circuit includes a first area and a second area. The first area is stress engineered to provide enhanced mobility in a first channel that has a first width. The second area is stress engineered to provide enhanced mobility in a second channel that has a second width. The first channel and the second channel provide a combined current that is greater than a single current provided via a single channel having a single width that is substantially equal to the sum of the first width and the second width.
Description
- This application is a Divisional application of co-pending application Ser. No. 11/843,883, which was filed on Aug. 23, 2007. The Priority of application Ser. No. 11/843,883 is hereby claimed.
- Typically, an electronic system includes a number of integrated circuit chips that process data and communicate with one another to perform system applications. The integrated circuit chips include devices, such as n-channel metal oxide semiconductor (NMOS) transistors and p-channel metal oxide semiconductor (PMOS) transistors. Often, the integrated circuit chips include NMOS and PMOS transistors in a complementary metal oxide semiconductor (CMOS) configuration. Semiconductor manufacturers continue increasing device densities and speeds to meet the demands of system applications.
- Semiconductor manufacturers use stress engineering to enhance device performance. Stresses are introduced into the channel of a device to enhance hole or electron mobility and thereby conductivity through the channel. The stresses affect bandgap and carrier mobility in the silicon and applying the appropriate stress to a channel can significantly improve device performance in terms of the Ion/Ioff ratio. Stress engineering techniques have been used in deep sub-micron process technologies, such as 90 nm processes and 65 nm processes.
- PMOS and NMOS devices respond differently to different types of stress. PMOS device performance is enhanced by applying compressive stress to a channel and NMOS device performance is enhanced by applying tensile stress to the channel. Also, stresses can be induced locally, which allows PMOS and NMOS devices to be enhanced independently.
- Typically, PMOS and NMOS devices are scaled by increasing the width of the channels. However, stress engineering introduces a width dependence on device performance, such that the maximum on current per width decreases due to stress effects as width is increased.
- For these and other reasons there is a need for the present invention.
- The accompanying drawings are included to provide a further understanding of the present invention and are incorporated in and constitute a part of this specification. The drawings illustrate the embodiments of the present invention and together with the description serve to explain the principles of the invention. Other embodiments of the present invention and many of the intended advantages of the present invention will be readily appreciated as they become better understood by reference to the following detailed description. The elements of the drawings are not necessarily to scale relative to each other. Like reference numerals designate corresponding similar parts.
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FIG. 1 is a diagram illustrating one embodiment of an integrated circuit according to the present invention. -
FIG. 2 is a diagram illustrating one embodiment of a metal oxide semiconductor field effect transistor (MOSFET). -
FIG. 3 is a cross-section diagram illustrating one embodiment of a MOSFET. -
FIG. 4 is a diagram illustrating one embodiment of a MOSFET that is scaled to be a larger transistor than the MOSFET ofFIG. 2 . -
FIG. 5 is a diagram illustrating one embodiment of a MOSFET that includes a first active area and a second active area. -
FIG. 6 is a diagram illustrating another embodiment of a MOSFET that includes a first active area and a second active area. - In the following Detailed Description, reference is made to the accompanying drawings, which form a part hereof, and in which is shown by way of illustration specific embodiments in which the invention may be practiced. In this regard, directional terminology, such as “top,” “bottom,” “front,” “back,” “leading,” “trailing,” etc., is used with reference to the orientation of the Figure(s) being described. Because components of embodiments of the present invention can be positioned in a number of different orientations, the directional terminology is used for purposes of illustration and is in no way limiting. It is to be understood that other embodiments may be utilized and structural or logical changes may be made without departing from the scope of the present invention. The following detailed description, therefore, is not to be taken in a limiting sense, and the scope of the present invention is defined by the appended claims.
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FIG. 1 is a diagram illustrating one embodiment of an integratedcircuit 20 according to the present invention.Integrated circuit 20 is manufactured via a deep sub-micron process technology. In one embodiment, integratedcircuit 20 is manufactured via a 45 nanometer (nm) process technology. In one embodiment,integrated circuit 20 is manufactured via less than or equal to a 45 nm process technology, i.e., at most a 45 nm process. -
Integrated circuit 20 includesdevice 22, which can be any suitable device. In one embodiment,device 22 is a CMOS device. In one embodiment,device 22 is an NMOS transistor. In one embodiment,device 22 is a PMOS transistor. -
Device 22 includes multiple active areas, where each active area includes a channel that provides a corresponding current and has a corresponding width. The corresponding currents are summed to provide a combined current that is greater than a single current provided via a single channel having a single width that is substantially equal to the sum of the corresponding widths. The combined or total current is directly proportional to the sum of the corresponding widths. In one embodiment, the active areas are separated via one or more shallow trench isolation regions. - In one embodiment, each of the active areas is stress engineered to enhance mobility in the channel. Smaller channel widths benefit more from stress engineering than larger channel widths. The performance of a single channel having a larger channel width is degraded due to stress effects. The difference in performance between smaller channels and larger channels due to stress effects is more apparent and becomes an issue in process technologies of less than or equal to the 45 nm technology node.
- In one embodiment,
device 22 is an NMOS device and the multiple active areas are stress engineered to provide enhanced mobility in the channels via tensile stress along the channels. In one embodiment,device 22 is a PMOS device and the multiple channels are stress engineered to provide enhanced mobility in the channels via compressive stress along the channels. - In one embodiment, each of the active areas is substantially similar to each of the other active areas and the corresponding channel widths are substantially equal to one another. Also, the corresponding currents are substantially equal to one another, such that the combined current is an integer multiple of one of the corresponding currents. In one embodiment, each active area and channel is the size of a 1× device.
- In one embodiment,
device 22 includes a first active area and a second active area. The first active area includes a first channel that has a first width and the second active area includes a second channel that has a second width. The first channel provides a first current and the second channel provides a second current. The first and second currents are summed to provide a combined current that is greater than a single current provided via a single channel having a single width substantially equal to the sum of the first width and the second width. - In one embodiment, a first active area is stress engineered to enhance carrier mobility in a first channel and a second active area is stress engineered to enhance carrier mobility in a second channel. The smaller channel widths of the first channel and the second channel benefit more from stress engineering than the larger channel width of a single channel, such that the performance of the single channel is degraded due to stress effects and the combined current is greater than a single current from the single channel. Also, the combined current is directly proportional to the sum of the first width and the second width.
- In one embodiment, the first active area is substantially similar to the second active area and the first width is substantially equal to the second width. Also, the first current is substantially equal to the second current, such that the combined current is twice the first current. If the first active area and the second active area are each the size of a 1× device, a device that includes only the first active area and the second active area is a 2× device. Also, a device that includes n active areas that are each the size of a 1× device, is scaled to be an n× device.
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FIG. 2 is a diagram illustrating one embodiment of a metal oxide semiconductor field effect transistor (MOSFET) 30 having a channel width of W1. In one embodiment,MOSFET 30 is manufactured via a 45 nm process. In one embodiment,MOSFET 30 is manufactured via at most a 45 nm process. In one embodiment,MOSFET 30 is an NMOS transistor. In oneembodiment MOSFET 30 is a PMOS transistor. -
MOSFET 30 includes anactive area 32 and agate 34.Active area 32 is a 3-dimensional volume that includes a portion ofgate 34, drain/source region 36 on one side ofgate 34, source/drain region 38 on the other side ofgate 34, and a channel undergate 34 and between drain/source region 36 and source/drain region 38.Active area 32 and the channel have a width of W1. In one embodiment,MOSFET 30 including width W1 is sized to be a 1× device of the manufacturing process. - Drain/
source region 36 includes drain/source contact 40 and source/drain region 38 includes source/drain contact 42.Gate 34 extends to includegate contact 44. In one embodiment,gate 34 includes a poly-silicon gate structure. - In one embodiment,
active area 32 is stress engineered to enhance mobility in the channel. Channels having smaller channel widths benefit more from stress engineering than channels having larger channel widths. The performance of a channel having a larger channel width is degraded due to stress effects. The differences in channel performance due to stress effects in channels having smaller channel widths versus channels having larger channel widths is more apparent and becomes an issue in process technologies of less than or equal to the 45 nm technology node. - In one embodiment,
MOSFET 30 is an NMOS device andactive area 32 is stress engineered to provide enhanced mobility in the channel via tensile stress along the channel. In one embodiment,MOSFET 30 is a PMOS device andactive area 32 is stress engineered to provide enhanced mobility in the channel via compressive stress along the channel. In one embodiment, drain/source region 36 and source/drain region 38 are silicon-germanium regions. In one embodiment,active area 32 includes a strain-inducing capping layer. - In operation, an active gate voltage is applied to
gate 34 viacontact 44 andMOSFET 30 conducts current between drain/source region 36 and source/drain region 38. The current can be provided to other circuits via drain/source contact 40 and source/drain contact 42. The magnitude of the current corresponds to channel width W1, where larger channel widths correspond to larger currents and smaller channel widths correspond to smaller currents. Ifactive area 32 is stress engineered, the magnitude of the current is larger for a given channel width W1. -
FIG. 3 is a cross-section diagram illustrating one embodiment of aMOSFET 50.MOSFET 50 includesactive area 52, indicated between the dashed lines, whereactive area 52 is a 3-dimensional volume that extends in the x, y, and z dimensions.MOSFET 50 is similar toMOSFET 30 ofFIG. 2 . In one embodiment,MOSFET 50 is an NMOS transistor. In oneembodiment MOSFET 50 is a PMOS transistor. -
MOSFET 50 is manufactured via a deep sub-micron process technology. In one embodiment,MOSFET 50 is manufactured via a 45 nm process. In one embodiment,MOSFET 50 is manufactured via at most a 45 nm process. -
Active area 52 includesgate 54, drain/source region 56, source/drain region 58, and achannel 60 insubstrate 62.Channel 60 is undergate 54 and between drain/source region 56 and source/drain region 58.Channel 60 has channel length L1 that extends in the x direction alongchannel 60 and between drain/source region 56 and source/drain region 58. Also,channel 60 has a channel width in the z direction, which is similar to channel width W1 ofMOSFET 30. In addition,channel 60 extends vertically in the y direction fromgate 54. In one embodiment,MOSFET 50, including channel length L1 and the channel width, is sized to be a 1× device of the manufacturing process. -
Active area 52 includes spacer 64 a,spacer 64 b, and strain-inducingcapping layer 68.Active area 52 is bounded by shallowtrench isolation regions active area 52 from other devices.Spacer 64 a is on one side ofgate 54 andspacer 64 b is on the other side ofgate 54. Shallowtrench isolation region 66 a is on one side ofactive area 52 and shallowtrench isolation region 66 b is on the other side ofactive area 52. Cappinglayer 68 is applied over shallowtrench isolation regions gate 54,spacers source region 56, and source/drain region 58. Standard lithography patterning techniques can be used to selectively deposit cappinglayer 68. -
Active area 52 is stress engineered to enhance mobility inchannel 60. In one embodiment,MOSFET 50 is an NMOS transistor andactive area 52 is stress engineered to provide enhanced mobility inchannel 60 via tensile stress along channel length L1 ofchannel 60. In one embodiment,MOSFET 50 is a PMOS transistor andactive area 52 is stress engineered to provide enhanced mobility inchannel 60 via compressive stress along channel length L1 ofchannel 60. - In one embodiment, drain/
source region 56 and source/drain region 58 are silicon-germanium regions that provide compressive stress along channel length L1 ofchannel 60. In one embodiment, cappinglayer 68 is applied to provide compressive stress along channel length L1 ofchannel 60. In one embodiment, cappinglayer 68 is applied to provide tensile stress along channel length L1 ofchannel 60. In one embodiment, standard patterning and lithography techniques are used to selectively deposit a tensile capping layer over NMOS devices and a compressive capping layer over PMOS devices. - In operation, an active gate voltage is applied to
gate 54 andMOSFET 50 conducts current along channel length L1, throughchannel 60 in the x direction between drain/source region 56 and source/drain region 58. The magnitude of the conducted current corresponds to the channel width ofchannel 60 in the z direction, where larger channel widths correspond to larger currents and smaller channel widths correspond to smaller currents. The stress engineeredactive area 52 provides a larger current for a given channel width. -
FIG. 4 is a diagram illustrating one embodiment of aMOSFET 70 that is scaled to be a larger transistor thanMOSFET 30.MOSFET 70 is similar toMOSFET 30 ofFIG. 2 , except the channel width W2 ofMOSFET 70 is larger than the channel width W1 ofMOSFET 30. In one embodiment, the channel width W2 is twice as large as the channel width W1. -
MOSFET 70 includes active area 72 andgate 74. Active area 72 is a 3-dimensional volume that includes a portion ofgate 74, drain/source region 76 on one side ofgate 74, source/drain region 78 on the other side ofgate 74, and a channel undergate 74 and between drain/source region 76 and source/drain region 78. Active area 72 and the channel have width W2. - Drain/
source region 76 includes drain/source contacts drain region 78 includes source/drain contacts Gate 74 extends to includegate contact 84. In one embodiment,gate 74 includes a poly-silicon gate structure. - Active area 72 is stress engineered to enhance mobility in the channel. In one embodiment,
MOSFET 70 is an NMOS device and active area 72 is stress engineered to provide enhanced mobility in the channel via tensile stress along the channel. In one embodiment,MOSFET 70 is a PMOS device and active area 72 is stress engineered to provide enhanced mobility in the channel via compressive stress along the channel. In one embodiment, drain/source region 76 and source/drain region 78 are silicon-germanium regions. In one embodiment, active area 72 includes a strain-inducing capping layer. - In operation, an active gate voltage is applied to
gate 74 viacontact 84 andMOSFET 70 conducts current between drain/source region 76 and source/drain region 78. The current can be provided to other circuits via drain/source contacts drain contacts - Channels having smaller channel widths benefit more from stress engineering than channels having larger channel widths. The performance of a channel having a larger channel width is degraded due to stress effects. The difference in channel performance between channels having smaller channel widths and channels having larger channel widths is more apparent and becomes an issue in process technologies of less than or equal to the 45 nm technology node.
- If
MOSFET 30 andMOSFET 70 are stress engineered and manufactured in at most a 45 nm process,MOSFET 30 benefits more from the stress engineering thanMOSFET 70, since channel width W1 is smaller than channel width W2. This results inMOSFET 30 providing more current per unit of channel width thanMOSFET 70. The increase in current provided viaMOSFET 70 is not directly proportional to the increase in channel width from channel width W1 to channel width W2. For example, ifMOSFET 70 is scaled to have a channel width W2 that is twice as large as channel width W1,MOSFET 70 does not provide a current that is twice as large as the current provided viaMOSFET 30. Instead,MOSFET 70 provides a current that is less than twice the current provided viaMOSFET 30. -
FIG. 5 is a diagram illustrating one embodiment of aMOSFET 100 that is scaled to be a larger transistor thanMOSFET 30 ofFIG. 2 .MOSFET 100 includes a firstactive area 102, a secondactive area 104, and agate 106. Each of theactive areas FIG. 2 ) and similar to active area 52 (shown inFIG. 3 ). - First
active area 102 includes a first channel having a channel width of W3 and secondactive area 104 includes a second channel having a channel width of W4. The combined current provided via the first and second channels inMOSFET 100 is directly proportional to the sum of channel width W3 and channel width W4. In one embodiment, at least one of the channel widths W3 and W4 is substantially equal to channel width W1 ofMOSFET 30. In one embodiment, each of the channel widths of W3 and W4 is substantially equal to channel width W1 ofMOSFET 30 andMOSFET 100 provides substantially twice as much current asMOSFET 30. In one embodiment,MOSFET 30 is a 1× device and each of the channel widths of W3 and W4 is substantially equal to channel width W1 ofMOSFET 30, such thatMOSFET 100 is a 2× device. - First
active area 102 is a 3-dimensional volume that includes a portion ofgate 106, drain/source region 108 on one side ofgate 106, source/drain region 110 on the other side ofgate 106, and the first channel undergate 106 and between drain/source region 108 and source/drain region 110. Firstactive area 102 and the first channel have a width of W3. In one embodiment, channel width W3 is substantially equal to channel width W1. In other embodiments, channel width W3 can be any suitable width including widths that are larger or smaller than channel width W1 ofMOSFET 30. - Second
active area 104 is a 3-dimensional volume that includes a portion ofgate 106, drain/source region 112 on one side ofgate 106, source/drain region 114 on the other side ofgate 106, and the second channel undergate 106 and between drain/source region 112 and source/drain region 114. Secondactive area 104 and the second channel have a width of W4. In one embodiment, channel width W4 is substantially equal to channel width W1. In other embodiments, channel width W4 can be any suitable width including widths that are larger or smaller than channel width W1 ofMOSFET 30. - Drain/
source region 108 includes drain/source contact 116 and source/drain region 110 includes source/drain contact 118. Drain/source region 112 includes drain/source contact 120 and source/drain region 114 includes source/drain contact 122.Gate 106 extends to includegate contact 124. Shallow trench isolation region 126 extends between and surrounds firstactive area 102 and secondactive area 104. Shallow trench isolation region 126 isolates firstactive area 102 from secondactive area 104. In one embodiment,gate 106 includes a poly-silicon gate structure. - First
active area 102 is stress engineered to enhance mobility in the first channel and secondactive area 104 is stress engineered to enhance mobility in the second channel. In one embodiment,MOSFET 100 is an NMOS transistor and firstactive area 102 is stress engineered to provide enhanced mobility in the first channel via tensile stress along the first channel and secondactive area 104 is stress engineered to provide enhanced mobility in the second channel via tensile stress along the second channel. In one embodiment,MOSFET 100 is a PMOS transistor and firstactive area 102 is stress engineered to provide enhanced mobility in the first channel via compressive stress along the first channel and secondactive area 104 is stress engineered to provide enhanced mobility in the second channel via compressive stress along the second channel. In one embodiment, drain/source regions drain regions active area 102 and secondactive area 104 include strain-inducing capping layers. - In operation, an active gate voltage is applied to
gate 106 viacontact 124. Firstactive area 102 conducts current between drain/source region 108 and source/drain region 110 and provides a first current, and secondactive area 104 conducts current between drain/source region 112 and source/drain region 114 and provides a second current. The first current and the second current are combined to provide a total or combined current. The combined current is provided to other circuits via drain/source contacts drain contacts 118 and 122. The magnitude of the combined current corresponds to the sum of the channel widths W3 and W4. - In
MOSFET 100, ifactive area 102 is substantially equal in size toactive area 32 andactive area 104 is substantially equal in size toactive area 32 such that channel width W1 is substantially equal to channel width W3 and channel width W1 is substantially equal to channel width W4,MOSFET 100 provides substantially twice the current provided viaMOSFET 30. This doubling of current viaMOSFET 100 is directly proportional to the doubling of channel width from channel width W1 to the sum of channel widths W3 and W4. Since channel width W1 is substantially equal to channel width W3 and channel width W1 is substantially equal to channel width W4, each channel benefits equally from the stress engineering and one channels performance is not degraded more than any other channels performance. The current provided viaMOSFET 100 is directly proportional to the sum of the channel widths W3 and W4. -
FIG. 6 is a diagram illustrating another embodiment of aMOSFET 200 that is scaled to be a larger transistor thanMOSFET 30 ofFIG. 2 .MOSFET 200 includes a firstactive area 202, a secondactive area 204, and agate 206. Each of theactive areas FIG. 2 ) and similar to active area 52 (shown inFIG. 3 ). - First
active area 202 includes a first channel having a channel width of W5 and secondactive area 204 includes a second channel having a channel width of W6.Gate 206 is forked to cross firstactive area 202 and secondactive area 204. The first channel is substantially equal to the second channel in the other dimensions of channel length and channel depth. - The combined current provided via the first and second channels in
MOSFET 200 is directly proportional to the sum of channel width W5 and channel width W6. In one embodiment, at least one of the channel widths W5 and W6 is substantially equal to channel width W1 ofMOSFET 30. In one embodiment, each of the channel widths W5 and W6 is substantially equal to channel width W1 ofMOSFET 30 andMOSFET 200 provides substantially twice as much current asMOSFET 30. In one embodiment,MOSFET 30 is a 1× device and each of the channel widths of W5 and W6 is substantially equal to channel width W1 ofMOSFET 30, such thatMOSFET 200 is a 2× device. - First
active area 202 is a 3-dimensional volume that includes a portion ofgate 206, drain/source region 208 on one side ofgate 206, source/drain region 210 on the other side ofgate 206, and the first channel undergate 206 and between drain/source region 208 and source/drain region 210. Firstactive area 202 and the first channel have a width of W5. In one embodiment, channel width W5 is substantially equal to channel width W1. In other embodiments, channel width W5 can be any suitable width including widths that are larger or smaller than channel width W1 ofMOSFET 30. - Second
active area 204 is a 3-dimensional volume that includes a portion ofgate 206, drain/source region 212 on one side ofgate 206, source/drain region 214 on the other side ofgate 206, and the second channel undergate 206 and between drain/source region 212 and source/drain region 214. Secondactive area 204 and the second channel have a width of W6. In one embodiment, channel width W6 is substantially equal to channel width W1. In other embodiments, channel width W6 can be any suitable width including widths that are larger or smaller than channel width W1 ofMOSFET 30. - Drain/
source region 208 includes drain/source contact 216 and source/drain region 210 includes source/drain contact 218. Drain/source region 212 includes drain/source contact 220 and source/drain region 214 includes source/drain contact 222.Gate 206 extends to includegate contact 224. Shallowtrench isolation region 226 extends between and surrounds firstactive area 202 and secondactive area 204. Shallowtrench isolation region 226 isolates firstactive area 202 from secondactive area 204. In one embodiment,gate 206 includes a poly-silicon gate structure. - First
active area 202 is stress engineered to enhance mobility in the first channel and secondactive area 204 is stress engineered to enhance mobility in the second channel. In one embodiment,MOSFET 200 is an NMOS transistor and firstactive area 202 is stress engineered to provide enhanced mobility in the first channel via tensile stress along the first channel and secondactive area 204 is stress engineered to provide enhanced mobility in the second channel via tensile stress along the second channel. In one embodiment,MOSFET 200 is a PMOS transistor and firstactive area 202 is stress engineered to provide enhanced mobility in the first channel via compressive stress along the first channel and secondactive area 204 is stress engineered to provide enhanced mobility in the second channel via compressive stress along the second channel. In one embodiment, drain/source regions drain regions active area 202 and secondactive area 204 include strain-inducing capping layers. - In operation, an active gate voltage is applied to
gate 206 viacontact 224. Firstactive area 202 conducts current between drain/source region 208 and source/drain region 210 and provides a first current, and secondactive area 204 conducts current between drain/source region 212 and source/drain region 214 and provides a second current. The first current and the second current are combined to provide a total or combined current. The combined current is provided to other circuits via drain/source contacts drain contacts - In
MOSFET 200, ifactive area 202 is substantially equal in size toactive area 32 andactive area 204 is substantially equal in size toactive area 32 such that channel width W1 is substantially equal to channel width W5 and channel width W1 is substantially equal to channel width W6,MOSFET 200 provides substantially twice the current provided viaMOSFET 30. This doubling of current viaMOSFET 200 is directly proportional to the doubling of channel width from channel width W1 to the sum of channel widths W5 and W6. Since channel width W1 is substantially equal to channel width W5 and channel width W1 is substantially equal to channel width W6, each channel benefits equally from the stress engineering and one channels performance is not degraded more than any other channels performance. The current provided viaMOSFET 200 is directly proportional to the sum of the channel widths W5 and W6. - Thus, in a MOSFET manufactured in at most a 45 nm process and stress engineered, the MOSFET can be scaled to provide an integer multiple of current by providing multiple active areas that are substantially equal in size to one active area, such as
active area 32. For example, ifMOSFET 30 is a 1× device, a MOSFET that includes two active areas that are each substantially equal in size toactive area 32 is a 2× device and a MOSFET that includes three active areas that are each substantially equal in size toactive area 32 is a 3× device, and so on. - Although specific embodiments have been illustrated and described herein, it will be appreciated by those of ordinary skill in the art that a variety of alternate and/or equivalent implementations may be substituted for the specific embodiments shown and described without departing from the scope of the present invention. This application is intended to cover any adaptations or variations of the specific embodiments discussed herein. Therefore, it is intended that this invention be limited only by the claims and the equivalents thereof.
Claims (9)
1. An integrated circuit, comprising:
a first stress engineered area configured to provide enhanced mobility in a first channel that has a first width; and
a second stress engineered area configured to provide enhanced mobility in a second channel that has a second width, wherein the first channel and the second channel provide a combined current that is greater than a single current provided via a single channel having a single width substantially equal to the sum of the first width and the second width.
2. The integrated circuit of claim 1 , wherein the combined current is greater than the single current due to stress effects that degrade performance in the single channel.
3. The integrated circuit of claim 1 , wherein the combined current is greater than the single current due to stress effects that enhance mobility more in the first channel and the second channel.
4. The integrated circuit of claim 1 , wherein the first stress engineered area is substantially similar to the second stress engineered area.
5. The integrated circuit of claim 1 , wherein the first channel provides a first current and the second channel provides a second current and the combined current is substantially twice the first current.
6. The integrated circuit of claim 1 , wherein the first stress engineered area is separated from the second stress engineered area via a shallow trench isolation region.
7. The integrated circuit of claim 1 , wherein the first stress engineered area and the second stress engineered area are in a metal oxide semiconductor field effect transistor.
8. The integrated circuit of claim 1 , wherein the first stress engineered area is configured to provide enhanced mobility in the first channel via tensile forces along the first channel in an n-channel metal oxide semiconductor device.
9. The integrated circuit of claim 1 , wherein the first stress engineered area is configured to provide enhanced mobility in the first channel via compressive forces along the first channel in a p-channel metal oxide semiconductor device.
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US9607838B1 (en) * | 2015-09-18 | 2017-03-28 | Taiwan Semiconductor Manufacturing Co., Ltd. | Enhanced channel strain to reduce contact resistance in NMOS FET devices |
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2007
- 2007-08-23 US US11/843,883 patent/US8877576B2/en active Active
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2008
- 2008-08-20 DE DE200810038454 patent/DE102008038454A1/en not_active Ceased
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2009
- 2009-06-17 US US12/486,165 patent/US20090250763A1/en not_active Abandoned
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Also Published As
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US8877576B2 (en) | 2014-11-04 |
US20090050973A1 (en) | 2009-02-26 |
CN101373771B (en) | 2011-09-07 |
DE102008038454A1 (en) | 2009-02-26 |
CN101373771A (en) | 2009-02-25 |
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