US20090058498A1 - Half bridge circuit and method of operating a half bridge circuit - Google Patents
Half bridge circuit and method of operating a half bridge circuit Download PDFInfo
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- US20090058498A1 US20090058498A1 US11/847,234 US84723407A US2009058498A1 US 20090058498 A1 US20090058498 A1 US 20090058498A1 US 84723407 A US84723407 A US 84723407A US 2009058498 A1 US2009058498 A1 US 2009058498A1
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/51—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used
- H03K17/56—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices
- H03K17/567—Circuits characterised by the use of more than one type of semiconductor device, e.g. BIMOS, composite devices such as IGBT
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
- H01L29/0607—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration
- H01L29/0638—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for preventing surface leakage due to surface inversion layer, e.g. with channel stopper
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
- H01L29/7393—Insulated gate bipolar mode transistors, i.e. IGBT; IGT; COMFET
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/08—Modifications for protecting switching circuit against overcurrent or overvoltage
- H03K17/081—Modifications for protecting switching circuit against overcurrent or overvoltage without feedback from the output circuit to the control circuit
- H03K17/0814—Modifications for protecting switching circuit against overcurrent or overvoltage without feedback from the output circuit to the control circuit by measures taken in the output circuit
- H03K17/08142—Modifications for protecting switching circuit against overcurrent or overvoltage without feedback from the output circuit to the control circuit by measures taken in the output circuit in field-effect transistor switches
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/51—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used
- H03K17/56—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices
- H03K17/687—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices the devices being field-effect transistors
- H03K17/6871—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices the devices being field-effect transistors the output circuit comprising more than one controlled field-effect transistor
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/51—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used
- H03K17/56—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices
- H03K17/687—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices the devices being field-effect transistors
- H03K2017/6878—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices the devices being field-effect transistors using multi-gate field-effect transistors
Definitions
- the present invention relates to a half bridge circuit and to a method of operating a half bridge circuit.
- half bridge circuit two transistor switches are operated in alternating fashion so that as one switch is on, the other is off and vice versa.
- One switch is conventionally termed the “high side switch” and has one output connected to a high voltage supply line and another to a midpoint of the half bridge circuit.
- the other switch is conventionally termed the “low side switch” and has one output connected to a low voltage supply line and another to the midpoint of the half bridge circuit.
- Separate driver circuits are provided to provide appropriate control signals to the gates of the high and low side switches.
- Half bridge circuits have numerous applications, including for example use in converting a DC voltage to a high frequency AC voltage, and are useful in switched mode power supplies, DC-AC converters, drivers for display device (such as plasma panels), etc. Two half bridge circuits may be combined to form a full bridge circuit, again as known per se.
- Power devices operated in integrated circuits typically operate with a voltage in the range 20V to 1.2 kV and typically higher than 30V or 50V or so. Power devices typically operate with a current in the range 10 mA to 50 A and typically higher than 0.1 A and smaller than 5 A. Such devices may also be referred to as “high voltage/power devices”. These devices are typically capable of delivering from a few mWatts to 1 Watt or even a few tens of Watts of power. Their application may range from domestic appliances, electric cars, motor control, and power supplies to RF and microwave circuits and telecommunication systems.
- top and bottom may be used in this specification by convention and that no particular physical orientation of the device as a whole is implied.
- Lateral devices in integrated circuits have the main terminals (variously called the anode/cathode, drain/source and emitter/collector) and the control terminals (termed the gate or base) placed at the top surface of the device in order to be easily accessible.
- the control terminals (termed the gate or base) placed at the top surface of the device in order to be easily accessible.
- power ICs such devices are often monolithically integrated with CMOS-type or BiCMOS-type low voltage/low power circuits. It is desirable that several high voltage/power devices are integrated within the same chip.
- MOS bipolar power devices such as the lateral insulated gate bipolar transistor (LIGBT) are based on MOS control with bipolar current conduction in the lowly-doped drift layer or region of the device. Such devices are based on the conductivity modulation concept.
- MOS control with bipolar current conduction in the lowly-doped drift layer or region of the device.
- Such devices are based on the conductivity modulation concept.
- the mobile charge accumulated when the device is in the on-state dictates the on-state/switching performance of the device given that the mobile carriers must be removed or “mopped up” in order to switch the device to the off-state.
- MOS-bipolar devices such as the LIGBT
- an n-channel LIGBT has an n-channel MOSFET driving the base of a pnp transistor.
- Such devices do not normally have reverse current conduction because, unlike in a MOSFET (or power MOSFET), there is no associated integral body diode.
- the integral body diode in a MOSFET is an intrinsic component of the MOS transistor and is connected in an anti-parallel configuration and allows for reverse current conduction.
- the MOSFET has an advantage over the IGBT in such applications as it has an intrinsic anti-parallel body diode.
- Anode-shorted IGBTs are based on a combination of a MOSFET with an IGBT. They behave as MOSFETs until a certain current threshold is reached, above which they operate as an IGBT. These devices are generally faster than the conventional IGBTs and feature a body diode.
- a significant drawback of such arrangements is that a sharp snap-back is seen in the output characteristics when the device commutes from the MOSFET mode (unipolar mode) to the IGBT mode (bipolar mode).
- MOSFET mode unipolar mode
- IGBT mode bipolar mode
- a dual gate MOS-bipolar device is a high voltage device that is controlled by two MOS gates. Most dual gate devices have the respective gates referred to separate electrodes (i.e. the source and drain respectively).
- a dual gate device which, by applying appropriate voltages to the two insulated gates and the cathode and anode gates, can selectively conduct current in the forward direction and the reverse direction, operating respectively in IGBT mode and diode mode.
- the cathode gate can be operated concomitantly with the anode gate. For example, for the IGBT to turn on for forward conduction, the cathode gate may be switched with respect to the cathode from 0V to +5V while the anode gate is switched with respect to the anode from 0V to ⁇ 5V.
- the cathode gate may be switched from 5V to 0V (or less commonly ⁇ 5 V) while the anode gate is switched from ⁇ 5V to +5V.
- This device which may be termed a dual gate inversion layer emitter transistor (DGILET), can actually operate in unipolar or bipolar mode during forward conduction depending on the voltages applied to the various electrodes and gates.
- DGILET dual gate inversion layer emitter transistor
- the DGILET When the DGILET is operating in the unipolar mode, resembling a MOSFET, it has fast switching characteristics but low on-state current densities.
- the device in its bipolar mode of conduction, the device can operate with high on-state current densities but slower switching speeds.
- the second gate of the DGILET which is referenced to the anode terminal of the device, enables switching between these two modes of operation, allowing the user to take advantage of these characteristics as required at different parts of operating cycle.
- the DGILET has an inherent body diode. This inherent diode can be used as the freewheeling diode when the DGILET is used as a low side switch in a half-bridge converter or other half bridge device, allowing the dedicated diode that is conventionally provided to be omitted.
- the characteristics of the DGILET both in forward (IGBT mode) and reverse (diode mode) conduction can be controlled by changing the bias voltage on the second gate.
- FIG. 1 An experimental demonstration of the output characteristics of a DGILET is shown in FIG. 1 . It can be seen that with increasing negative voltages on the anode gate, the current density in the IGBT mode is increased. Similarly, with increasing positive voltages on the anode gate, the current density of the body diode is increased. The sensitivity of these current densities to the gate voltage can be adjusted by the design of the device as a whole.
- Double gate devices such as the DGILET discussed above but including in general all double gate devices, typically require that the second gate is biased with respect to the high voltage terminal of the device.
- this has been achieved using a high side gate driver arrangement with level shifting devices or optocouplers or other similar arrangements.
- this additional circuitry and components increase the cost and complexity of the device and makes it more difficult to control the operation of the device.
- FIG. 2 shows use of a DGILET in a standard chopper circuit.
- the high side (anode) gate driver is referenced to the anode of the device and requires a level shifting arrangement.
- a half bridge circuit comprising:
- a first semiconductor switch having at least one control gate
- a second semiconductor switch having at least two control gates
- a first driver having an output connected to a control gate of the first semiconductor switch for selectively applying a first control voltage to the control gate of the first semiconductor switch
- a second driver having an output connected to a first control gate of the second semiconductor switch for selectively applying a second control voltage to said first control gate of the second semiconductor switch
- the output of the first driver being connected to a second control gate of the second semiconductor switch by a circuit arrangement such that when the first driver is operated to apply a high, positive voltage to the control gate of the first semiconductor switch, a positive voltage is applied to said second control gate of the second semiconductor switch, and such that when the first driver is operated to apply a low, zero or small voltage to the control gate of the first semiconductor switch, a negative voltage is applied to said second control gate of the second semiconductor switch.
- the same (first) driver can be used to provide control voltages to the control gate of the first semiconductor switch and to the second control gate of the second semiconductor switch.
- a relatively high voltage i.e. a relatively large, positive voltage, of say 5V
- a positive voltage of up to 5V in this case
- a low voltage i.e. a relatively small positive or small negative or zero voltage
- a negative voltage is applied to the second control gate of the second semiconductor switch.
- the circuit arrangement that connects the output of the first driver to the second control gate of the second semiconductor switch contains passive components only.
- the circuit arrangement that connects the output of the first driver to the second control gate of the second semiconductor switch contains at least one diode and at least one capacitor, one side of the capacitor being connected to the output of the first driver, the other side of the capacitor being connected to the second control gate of the second semiconductor switch, the other side of the capacitor being connected via said at least one diode to a midpoint of the circuit, a high voltage terminal of the second semiconductor switch being connected to the midpoint of the circuit, whereby when the output of the first driver is high, the capacitor charges via said at least one diode so as to present a positive voltage to the second control gate of the second semiconductor switch, and when the output of the first driver is low, the capacitor presents a negative voltage to the second control gate of the second semiconductor switch.
- This arrangement is particularly simple and inexpensive to implement.
- the capacitor “automatically” applies a voltage of the correct polarity and an appropriate magnitude to the second control gate of the second semiconductor switch in synchronism with the voltage being applied to the control gate of the first semiconductor switch.
- the second semiconductor switch is a dual gate inversion layer emitter transistor.
- a dual gate inversion layer emitter transistor is particularly useful in a half bridge circuit because its inherent body diode can be used as the diode that is used to carry freewheeling currents in the circuit and because the forward and reverse conduction modes of the dual gate inversion layer emitter transistor can be controlled to optimise the current-carrying abilities and minimise the switching losses of the dual gate inversion layer emitter transistor.
- a method of operating a half bridge circuit that has a first semiconductor switch having at least one control gate; a second semiconductor switch, the second semiconductor switch having at least two control gates; a first driver having an output connected to a control gate of the first semiconductor switch for selectively applying a first control voltage to the control gate of the first semiconductor switch; and, a second driver having an output connected to a first control gate of the second semiconductor switch for selectively applying a second control voltage to said first control gate of the second semiconductor switch; the output of the first driver being connected to a second control gate of the second semiconductor switch by a circuit arrangement; the method comprising:
- FIG. 1 shows an experimental demonstration of the output characteristics of a DGILET
- FIG. 2 shows schematically the use of a DGILET in a standard chopper circuit
- FIG. 3 show schematically a perspective view of an example of a dual gate device suitable for use in a circuit according to an embodiment of the present invention
- FIG. 4 shows schematically an example of a half bridge in accordance with an embodiment of the present invention.
- FIG. 5 shows a timing diagram of voltages applied to the circuit of FIG. 4 .
- FIG. 3 shows schematically a perspective view of an example of a dual gate device.
- this particular example is a high voltage/power lateral double insulated-gate bipolar transistor (LIGBT) device 1 though the present invention may in general be applied to or implemented with any dual gate device.
- LIGBT high voltage/power lateral double insulated-gate bipolar transistor
- This example uses junction isolation technology, which is known per se.
- the device 1 has an n-drift region 2 having first and second ends.
- a p-well region 3 which is adjacent to an n+ cathode region 4 .
- the n+ cathode region 4 is formed in the p-well 3 .
- a p+ region 5 is also formed in the p-well 3 on the opposite side of the n+ cathode region 4 to the n-drift region 2 .
- a low voltage, “cathode” terminal 6 is in electrical contact with at least a part of the n+ cathode region 4 and, in this example, is also in electrical contact with at least a part of the p+ region 5 .
- an n-buffer region or well 7 which is adjacent to a p+ anode region 8 .
- the p+ anode region 8 is formed in the n-buffer well 7 .
- an n+ region 9 is also formed in the n-buffer well 7 on the opposite side of the p+ anode region 8 to the n-drift region 2 .
- a high voltage, “anode” terminal 10 is in electrical contact with at least a part of the p+ anode region 8 and, in this example, is also in electrical contact with at least a part of the n+ region 9 .
- the active layers and regions described above are formed on a p silicon substrate 11 .
- a first gate electrode 13 termed herein the “cathode gate” 13 , is provided towards the first end of the drift region 2 to extend over at least a part of the oxide layer 12 at that end, the adjacent portion of the first end of the drift region 2 , a part of the adjacent portion of the p-well 3 and a part of the n+ cathode region 4 .
- a second gate electrode 14 termed herein the “anode gate” 14 , is provided towards the second end of the drift region 2 to extend over at least a part of the oxide layer 12 at that end, the adjacent portion of the second end of the drift region 2 , a part of the adjacent portion of the n-buffer 7 and a part of the p+ anode region 8 .
- the basic operation of all of these examples is the same.
- the first, “cathode” gate 13 determines whether the IGBT 1 is on or off.
- the second, “anode” gate 14 determines whether the IGBT 1 or the diode is active for forward and reverse conduction respectively in the on-state. If the second, “anode” gate 14 is not used (e.g. by being short-circuited to the anode terminal 10 ), the anode-shorted like structure is obtained. In this mode the device 1 cannot offer a beneficial trade-off between the IGBT on-state performance and the diode on-state performance.
- an electron accumulation layer is formed at the surface of the n-well (n-buffer) 7 and the n-drift region 2 below the insulated second, “anode” gate 14 .
- the electron accumulation layer facilitates electron injection into the drift region 2 , leading to high conductivity modulation and hence good on-state performance during reverse conduction when the device 1 is effectively operating as an anti-parallel diode.
- Anode potential with respect Cathode gate to Anode gate Cathode with respect cathode with respect potential to cathode potential to anode LIGBT 0 + + ⁇ ON-state Anti 0 0 (or ⁇ ) ⁇ + parallel diode ON- state LIGBT/Anti 0 0 (or ⁇ ) ++ 0 parallel diode off state LIGBT 0 + ⁇ 0 (or ⁇ ) + ⁇ ++ ⁇ ⁇ 0 (or +) ON ⁇ OFF LIGBT 0 0 (or ⁇ ) ⁇ + ++ ⁇ + 0 (or +) ⁇ ⁇ OFF ⁇ ON LIGBT ⁇ 0 + ⁇ 0 (or ⁇ ) + ⁇ ⁇ ⁇ ⁇ + Anti parallel diode transient Anti 0 0 (or ⁇ ) ⁇ + ⁇ ⁇ + + ⁇ ⁇ parallel diode ⁇ LIGBT
- An arrow ⁇ indicates a time transition from one state to another. ++ refers to
- the half bridge circuit 20 has a high side 21 and a low side 22 having respective high side and low side transistor switches 23 , 24 .
- the high side switch 23 may be of any suitable type, and may be for example a field-effect transistor (FET).
- FET field-effect transistor
- the low side switch 24 is a dual gate device.
- the low side switch 24 is a DGILET 24 of the type described above. It will be understood however that other types of dual gate device may be used.
- the drain of the high side switch 23 is connected to a high voltage supply voltage line 25 .
- the source of the high side switch 23 is connected to the mid point 26 of the half bridge circuit 20 .
- a high side driver 27 is connected to the gate of the high side switch 23 to control the operation of the high side switch 23 by selectively applying a voltage to the gate as will be discussed further below.
- the drain of the second transistor switch 24 is connected to the mid point 26 of the half bridge circuit.
- the source of the second transistor switch 24 is connected to the low voltage supply line or earth 28 .
- a low side driver 29 is connected to the first, low voltage or “cathode” gate 30 of the dual gate low side switch 24 .
- the output of the high side driver 27 is also connected to one side of a capacitor C d 31 .
- the other side of the capacitor 31 is connected to the second, high voltage or “anode” gate 32 of the dual gate device 24 .
- the second side of the capacitor 31 is connected via at least one diode 33 to the mid point 26 of the half bridge circuit 20 .
- the mid point 26 of the half bridge circuit 20 is also connected to the high side driver 27 .
- a diode 34 between the drain and source of the high side switch 23 and resistor and inductor elements 35 , 36 provided between the mid point 26 and earth, may also be provided but will not be described further herein.
- the circuit 20 of FIG. 4 operates such that an appropriate drive signal is applied to the anode gate 32 of the dual gate device 24 concomitantly with the high side signal that is provided to the control gate of the high side switch 23 .
- the capacitor 31 and one or more diodes 33 act to ensure that the voltage applied to the anode gate 32 of the dual gate device 24 is of the correct magnitude and polarity.
- the voltage V hi output by the high side driver 27 is (ideally) a square wave that is switched over time between a relatively high positive value (of e.g. 5V) and a zero value, as shown in the upper part of FIG. 5 .
- the driver signal V low output by the low side driver 29 is in general the opposite of the drive signal output by the high side driver 27 , i.e. when the output of the high side driver 27 is high, the output of the low side driver 29 is low and vice versa.
- the high side voltage V hi is high, the low side voltage V low is normally zero though it may be small positive or negative.
- the low side voltage V low is normally zero though it may be small positive or negative.
- the capacitor 31 charges with a current i a through the one or more diodes 33 . If the forward bias voltage drop across each diode 33 is V f and the number of diodes 33 is N d , then the voltage V ga developed on the second side of the capacitor, which is applied to the anode gate 32 of the dual gate device 24 , is at least N d .V f above the voltage at the mid point 26 .
- the effect of this is as follows.
- the high side gate drive signal V hi is high so the high side switch 23 is on.
- the low side gate drive signal is low so the voltage applied to the cathode gate 30 of the dual gate device 24 (measured relative to the voltage applied to the cathode) is low (or zero).
- the voltage V ga which is applied to the anode gate 32 of the dual gate device 24 and which is effectively obtained from the high side driver 27 , is positive relative to the voltage of the mid point 26 . With these relative voltages applied to the anode and the cathode gate 30 and the anode gate 32 of the dual gate device 24 , the dual gate device 24 is operating as an anti-parallel diode and reverse-conducting.
- the effect of this is as follows.
- the high side gate drive signal V hi is low so the high side switch 23 is off.
- the low side gate drive signal is high so the voltage applied to the cathode gate 30 of the dual gate device 24 (measured relative to the voltage applied to the cathode) is high.
- the voltage V ga which is applied to the anode gate 32 of the dual gate device 24 and which is effectively obtained from the high side driver 27 , is negative relative to the voltage of the mid point 26 .
- the same high side driver can be used to drive both the control gate of a high side device and one control gate, such as an anode gate, of a dual gate device being used as a low side device in a half bridge circuit.
- any suitable dual gate device when used as a low side switch in a half bridge circuit such that one control gate of the dual gate device can be controlled by a conventional low side driver and the other control gate of the dual gate device can be controlled effectively by the high side driver which is also used to control the high side switch.
- the half bridge circuit described above may be duplicated to form a full bridge circuit, or may be combined with a conventional half bridge circuit to form a full bridge circuit.
Abstract
Description
- The present invention relates to a half bridge circuit and to a method of operating a half bridge circuit.
- In a typical half bridge circuit, two transistor switches are operated in alternating fashion so that as one switch is on, the other is off and vice versa. One switch is conventionally termed the “high side switch” and has one output connected to a high voltage supply line and another to a midpoint of the half bridge circuit. The other switch is conventionally termed the “low side switch” and has one output connected to a low voltage supply line and another to the midpoint of the half bridge circuit. Separate driver circuits are provided to provide appropriate control signals to the gates of the high and low side switches. Half bridge circuits have numerous applications, including for example use in converting a DC voltage to a high frequency AC voltage, and are useful in switched mode power supplies, DC-AC converters, drivers for display device (such as plasma panels), etc. Two half bridge circuits may be combined to form a full bridge circuit, again as known per se.
- Power devices operated in integrated circuits typically operate with a voltage in the range 20V to 1.2 kV and typically higher than 30V or 50V or so. Power devices typically operate with a current in the
range 10 mA to 50 A and typically higher than 0.1 A and smaller than 5 A. Such devices may also be referred to as “high voltage/power devices”. These devices are typically capable of delivering from a few mWatts to 1 Watt or even a few tens of Watts of power. Their application may range from domestic appliances, electric cars, motor control, and power supplies to RF and microwave circuits and telecommunication systems. - It will be appreciated that the terms “top” and “bottom”, “above” and “below”, and “lateral” and “vertical”, may be used in this specification by convention and that no particular physical orientation of the device as a whole is implied.
- Lateral devices in integrated circuits have the main terminals (variously called the anode/cathode, drain/source and emitter/collector) and the control terminals (termed the gate or base) placed at the top surface of the device in order to be easily accessible. In power ICs, such devices are often monolithically integrated with CMOS-type or BiCMOS-type low voltage/low power circuits. It is desirable that several high voltage/power devices are integrated within the same chip.
- MOS bipolar power devices, such as the lateral insulated gate bipolar transistor (LIGBT), are based on MOS control with bipolar current conduction in the lowly-doped drift layer or region of the device. Such devices are based on the conductivity modulation concept. At high levels of charge injection, when the current in the device increases, a mobile charge of electrons and of holes is built up in the drift layer, leading to a desirably sharp increase in the conductivity of the drift layer. The mobile charge accumulated when the device is in the on-state dictates the on-state/switching performance of the device given that the mobile carriers must be removed or “mopped up” in order to switch the device to the off-state.
- MOS-bipolar devices, such as the LIGBT, can be broadly regarded as a low voltage MOS component driving a wide base (high voltage) bipolar transistor. By way of example, an n-channel LIGBT has an n-channel MOSFET driving the base of a pnp transistor. Such devices do not normally have reverse current conduction because, unlike in a MOSFET (or power MOSFET), there is no associated integral body diode. As is known, the integral body diode in a MOSFET is an intrinsic component of the MOS transistor and is connected in an anti-parallel configuration and allows for reverse current conduction.
- In some applications and some architectures, such as half bridges or full bridges, reverse current conduction is necessary. In this respect, therefore, the MOSFET has an advantage over the IGBT in such applications as it has an intrinsic anti-parallel body diode.
- Anode-shorted IGBTs are based on a combination of a MOSFET with an IGBT. They behave as MOSFETs until a certain current threshold is reached, above which they operate as an IGBT. These devices are generally faster than the conventional IGBTs and feature a body diode. A significant drawback of such arrangements however is that a sharp snap-back is seen in the output characteristics when the device commutes from the MOSFET mode (unipolar mode) to the IGBT mode (bipolar mode). There is therefore a very difficult trade-off in anode-shorted devices between the IGBT and the body diode performance. In general, a high performance diode comes with a significant snap-back and thus is an unacceptable solution. Reducing the snap-back however kills the diode output power to an extent that is almost un-usable.
- A dual gate MOS-bipolar device is a high voltage device that is controlled by two MOS gates. Most dual gate devices have the respective gates referred to separate electrodes (i.e. the source and drain respectively).
- Examples of anode-shorted IGBTs or double gate devices are disclosed in F. Udrea, G. A. J. Amaratunga, J. Humphrey, J. Clark and A. Evans, “The MOS Inversion Layer as a Minority Carrier Injector”, IEEE, Electron Device Letters, volume 17, no. 9, p. 425, September 1996; U. N. K. Udugampola, R. A. McMahon, F. Udrea, K. Sheng, G. A. J. Amaratunga, E. M. S. Narayanan, S. Hardikar, and M. M. De Souza, “Dual Gate Lateral Inversion Layer Emitter Transistor for Power and High Voltage Integrated Circuits”, International Symposium on power semiconductor devices and ICs, Cambridge 2003, p. 216-219; F. Udrea, U. N. K. Udugampola, K. Sheng, R. A. McMahon, G. A. J. Amaratunga, E. M. S. Narayanan, M. M. De Souza, and S. Hardikar, “Experimental Demonstration of an Ultra-fast Double Gate Inversion Layer Emitter Transistor (DG-ILET)”, IEEE Electron Device Letters,
Volume 23,Issue 12, December 2002, p. 725-727; and H. Takahashi et al, “1200 V Reverse Conducting IGBT”, ISPSD, p. 133, 2004. - In our copending U.S. patent application Ser. No. 11/486377 filed 14 Jul. 2006, the entire content of which is hereby incorporated by reference, there is disclosed inter alia a dual gate device which, by applying appropriate voltages to the two insulated gates and the cathode and anode gates, can selectively conduct current in the forward direction and the reverse direction, operating respectively in IGBT mode and diode mode. The cathode gate can be operated concomitantly with the anode gate. For example, for the IGBT to turn on for forward conduction, the cathode gate may be switched with respect to the cathode from 0V to +5V while the anode gate is switched with respect to the anode from 0V to −5V. For the IGBT to be turned off and the diode to be turned on for reverse conduction, the cathode gate may be switched from 5V to 0V (or less commonly −5 V) while the anode gate is switched from −5V to +5V. This device, which may be termed a dual gate inversion layer emitter transistor (DGILET), can actually operate in unipolar or bipolar mode during forward conduction depending on the voltages applied to the various electrodes and gates. When the DGILET is operating in the unipolar mode, resembling a MOSFET, it has fast switching characteristics but low on-state current densities. On the other hand, in its bipolar mode of conduction, the device can operate with high on-state current densities but slower switching speeds. The second gate of the DGILET, which is referenced to the anode terminal of the device, enables switching between these two modes of operation, allowing the user to take advantage of these characteristics as required at different parts of operating cycle. As discussed further in our copending U.S. patent application Ser. No. 11/486377, the DGILET has an inherent body diode. This inherent diode can be used as the freewheeling diode when the DGILET is used as a low side switch in a half-bridge converter or other half bridge device, allowing the dedicated diode that is conventionally provided to be omitted. The characteristics of the DGILET both in forward (IGBT mode) and reverse (diode mode) conduction can be controlled by changing the bias voltage on the second gate.
- An experimental demonstration of the output characteristics of a DGILET is shown in
FIG. 1 . It can be seen that with increasing negative voltages on the anode gate, the current density in the IGBT mode is increased. Similarly, with increasing positive voltages on the anode gate, the current density of the body diode is increased. The sensitivity of these current densities to the gate voltage can be adjusted by the design of the device as a whole. - Double gate devices, such as the DGILET discussed above but including in general all double gate devices, typically require that the second gate is biased with respect to the high voltage terminal of the device. Conventionally, this has been achieved using a high side gate driver arrangement with level shifting devices or optocouplers or other similar arrangements. However, this additional circuitry and components increase the cost and complexity of the device and makes it more difficult to control the operation of the device. An example of this is shown schematically in
FIG. 2 which shows use of a DGILET in a standard chopper circuit. The high side (anode) gate driver is referenced to the anode of the device and requires a level shifting arrangement. - Thus, whist it would be beneficial to be able to use a double gate device as one of the semiconductor switches of a half bridge circuit, this has historically not been practical because of the need to provide special complex and/or costly driving arrangements for the second gate of the device.
- According to a first aspect of the present invention, there is provided a half bridge circuit, the circuit comprising:
- a first semiconductor switch having at least one control gate;
- a second semiconductor switch having at least two control gates;
- a first driver having an output connected to a control gate of the first semiconductor switch for selectively applying a first control voltage to the control gate of the first semiconductor switch; and,
- a second driver having an output connected to a first control gate of the second semiconductor switch for selectively applying a second control voltage to said first control gate of the second semiconductor switch;
- the output of the first driver being connected to a second control gate of the second semiconductor switch by a circuit arrangement such that when the first driver is operated to apply a high, positive voltage to the control gate of the first semiconductor switch, a positive voltage is applied to said second control gate of the second semiconductor switch, and such that when the first driver is operated to apply a low, zero or small voltage to the control gate of the first semiconductor switch, a negative voltage is applied to said second control gate of the second semiconductor switch.
- This allows use of a double gate device as one of the switches of the half bridge circuit, and thus avoids having to provide a separate additional diode as in conventional half bridge circuits, without requiring additional, complex drive circuitry for both gates of the dual gate device. The same (first) driver can be used to provide control voltages to the control gate of the first semiconductor switch and to the second control gate of the second semiconductor switch. In general, when a relatively high voltage (i.e. a relatively large, positive voltage, of
say 5V) is applied to the control gate of the first semiconductor switch, a positive voltage (of up to 5V in this case) is applied to the second control gate of the second semiconductor switch. Also, in general, when a low voltage (i.e. a relatively small positive or small negative or zero voltage) is applied to the control gate of the first semiconductor switch, a negative voltage is applied to the second control gate of the second semiconductor switch. - In a preferred embodiment, the circuit arrangement that connects the output of the first driver to the second control gate of the second semiconductor switch contains passive components only.
- In one preferred embodiment, the circuit arrangement that connects the output of the first driver to the second control gate of the second semiconductor switch contains at least one diode and at least one capacitor, one side of the capacitor being connected to the output of the first driver, the other side of the capacitor being connected to the second control gate of the second semiconductor switch, the other side of the capacitor being connected via said at least one diode to a midpoint of the circuit, a high voltage terminal of the second semiconductor switch being connected to the midpoint of the circuit, whereby when the output of the first driver is high, the capacitor charges via said at least one diode so as to present a positive voltage to the second control gate of the second semiconductor switch, and when the output of the first driver is low, the capacitor presents a negative voltage to the second control gate of the second semiconductor switch. This arrangement is particularly simple and inexpensive to implement. The capacitor “automatically” applies a voltage of the correct polarity and an appropriate magnitude to the second control gate of the second semiconductor switch in synchronism with the voltage being applied to the control gate of the first semiconductor switch.
- In a preferred embodiment, the second semiconductor switch is a dual gate inversion layer emitter transistor. A dual gate inversion layer emitter transistor is particularly useful in a half bridge circuit because its inherent body diode can be used as the diode that is used to carry freewheeling currents in the circuit and because the forward and reverse conduction modes of the dual gate inversion layer emitter transistor can be controlled to optimise the current-carrying abilities and minimise the switching losses of the dual gate inversion layer emitter transistor.
- According to a second aspect of the present invention, there is provided a method of operating a half bridge circuit that has a first semiconductor switch having at least one control gate; a second semiconductor switch, the second semiconductor switch having at least two control gates; a first driver having an output connected to a control gate of the first semiconductor switch for selectively applying a first control voltage to the control gate of the first semiconductor switch; and, a second driver having an output connected to a first control gate of the second semiconductor switch for selectively applying a second control voltage to said first control gate of the second semiconductor switch; the output of the first driver being connected to a second control gate of the second semiconductor switch by a circuit arrangement; the method comprising:
- operating the first driver to apply a high, positive voltage to the control gate of the first semiconductor switch, whereby a positive voltage is applied to said second control gate of the second semiconductor switch, and operating the first driver to apply a low, zero or small voltage to the control gate of the first semiconductor switch, whereby a negative voltage is applied to said second control gate of the second semiconductor switch.
- Embodiments of the present invention will now be described by way of example with reference to the accompanying drawings, in which:
-
FIG. 1 shows an experimental demonstration of the output characteristics of a DGILET; -
FIG. 2 shows schematically the use of a DGILET in a standard chopper circuit; -
FIG. 3 show schematically a perspective view of an example of a dual gate device suitable for use in a circuit according to an embodiment of the present invention; -
FIG. 4 shows schematically an example of a half bridge in accordance with an embodiment of the present invention; and, -
FIG. 5 shows a timing diagram of voltages applied to the circuit ofFIG. 4 . - Referring now to the drawings,
FIG. 3 shows schematically a perspective view of an example of a dual gate device. As discussed more fully in our copending U.S. patent application Ser. No. 11/486377, this particular example is a high voltage/power lateral double insulated-gate bipolar transistor (LIGBT)device 1 though the present invention may in general be applied to or implemented with any dual gate device. This example uses junction isolation technology, which is known per se. Thedevice 1 has an n-drift region 2 having first and second ends. - At the first end of the
drift region 2 there is a p-well region 3 which is adjacent to an n+ cathode region 4. In this example, the n+ cathode region 4 is formed in the p-well 3. In this example, ap+ region 5 is also formed in the p-well 3 on the opposite side of the n+ cathode region 4 to the n-drift region 2. A low voltage, “cathode”terminal 6 is in electrical contact with at least a part of the n+ cathode region 4 and, in this example, is also in electrical contact with at least a part of thep+ region 5. - At the second end of the
drift region 2 is an n-buffer region or well 7 which is adjacent to ap+ anode region 8. In this example, thep+ anode region 8 is formed in the n-buffer well 7. In this example, ann+ region 9 is also formed in the n-buffer well 7 on the opposite side of thep+ anode region 8 to the n-drift region 2. A high voltage, “anode”terminal 10 is in electrical contact with at least a part of thep+ anode region 8 and, in this example, is also in electrical contact with at least a part of then+ region 9. - The active layers and regions described above are formed on
a p silicon substrate 11. - An insulating layer of
silicon oxide 12 is formed over at least a part of the surface of thedrift region 2. Afirst gate electrode 13, termed herein the “cathode gate” 13, is provided towards the first end of thedrift region 2 to extend over at least a part of theoxide layer 12 at that end, the adjacent portion of the first end of thedrift region 2, a part of the adjacent portion of the p-well 3 and a part of the n+ cathode region 4. Asecond gate electrode 14, termed herein the “anode gate” 14, is provided towards the second end of thedrift region 2 to extend over at least a part of theoxide layer 12 at that end, the adjacent portion of the second end of thedrift region 2, a part of the adjacent portion of the n-buffer 7 and a part of thep+ anode region 8. - As discussed more fully in our copending U.S. patent application Ser. No. 11/486377, other arrangements for the dual gate device are possible, including those using thick SOI (silicon-on-insulator) technology for isolation instead of junction isolation, and those using “membrane” technology to improve the electrical field distribution within the
drift region 2 in operation. Membrane technology is discussed more fully in our WO-A-02/25700, U.S. Pat. No. 6,703,684, U.S. Pat. No. 6,900,518, U.S. Pat. No. 6,927,102, U.S. Pat. No. 7,235,439 and US-A-2005-0242368, and other related patents and patent applications, the entire contents of which are hereby incorporated by reference. - The basic operation of all of these examples is the same. The first, “cathode”
gate 13 determines whether theIGBT 1 is on or off. The second, “anode”gate 14 determines whether theIGBT 1 or the diode is active for forward and reverse conduction respectively in the on-state. If the second, “anode”gate 14 is not used (e.g. by being short-circuited to the anode terminal 10), the anode-shorted like structure is obtained. In this mode thedevice 1 cannot offer a beneficial trade-off between the IGBT on-state performance and the diode on-state performance. - When the second, “anode”
gate 14 is biased negatively with respect to theanode terminal 10, a hole inversion layer is formed at the surface of the n-well (n-buffer) 7 and the n-drift region 2 below the insulated second, “anode”gate 14. This leads to (i) reduced snap-back characteristics due to hole injection at lower current densities and (ii) increased emitter area, which leads to slightly higher hole injection and, as a result, lower on-state voltage drop after the snap-back during the on-state. An optimal design of the anode layers can result in a minimal or virtually non-existent snap-back. - If the second, “anode”
gate 14 is biased positively with respect to theanode terminal 10, an electron accumulation layer is formed at the surface of the n-well (n-buffer) 7 and the n-drift region 2 below the insulated second, “anode”gate 14. This leads to an enhanced connection of thedrift region 2 to then+ anode region 9 which is shorted to thep+ anode region 8 and in direct contact with theanode terminal 10. The electron accumulation layer facilitates electron injection into thedrift region 2, leading to high conductivity modulation and hence good on-state performance during reverse conduction when thedevice 1 is effectively operating as an anti-parallel diode. - The table below summarises the preferred biasing of the first (cathode) and second (anode) insulated gates for various modes of operation of the device:
-
Anode potential with respect Cathode gate to Anode gate Cathode with respect cathode with respect potential to cathode potential to anode LIGBT 0 + + − ON-state Anti 0 0 (or −) − + parallel diode ON- state LIGBT/Anti 0 0 (or −) ++ 0 parallel diode off state LIGBT 0 + → 0 (or −) + → ++ − → 0 (or +) ON → OFF LIGBT 0 0 (or −) → + ++ → + 0 (or +) → − OFF → ON LIGBT → 0 + → 0 (or −) + → − − → + Anti parallel diode transient Anti 0 0 (or −) → + − → + + → − parallel diode → LIGBT An arrow → indicates a time transition from one state to another. ++ refers to a (very) high positive potential (e.g. 300 V). + refers to a relatively high positive potential (e.g. +5 V). − refers to a relatively high negative potential (e.g. −5 V). - Referring now to
FIG. 4 , an example of ahalf bridge circuit 20 in accordance with an embodiment of the present invention is schematically shown. As is conventional, thehalf bridge circuit 20 has ahigh side 21 and alow side 22 having respective high side and low side transistor switches 23, 24. In this particular example, thehigh side switch 23 may be of any suitable type, and may be for example a field-effect transistor (FET). In accordance with the preferred embodiment of the present invention, thelow side switch 24 is a dual gate device. In the currently most preferred embodiment, thelow side switch 24 is a DGILET 24 of the type described above. It will be understood however that other types of dual gate device may be used. - The drain of the
high side switch 23 is connected to a high voltagesupply voltage line 25. The source of thehigh side switch 23 is connected to themid point 26 of thehalf bridge circuit 20. Ahigh side driver 27 is connected to the gate of thehigh side switch 23 to control the operation of thehigh side switch 23 by selectively applying a voltage to the gate as will be discussed further below. - The drain of the
second transistor switch 24 is connected to themid point 26 of the half bridge circuit. The source of thesecond transistor switch 24 is connected to the low voltage supply line orearth 28. Alow side driver 29 is connected to the first, low voltage or “cathode”gate 30 of the dual gatelow side switch 24. - The output of the
high side driver 27 is also connected to one side of acapacitor C d 31. The other side of thecapacitor 31 is connected to the second, high voltage or “anode”gate 32 of thedual gate device 24. In addition, the second side of thecapacitor 31 is connected via at least onediode 33 to themid point 26 of thehalf bridge circuit 20. Themid point 26 of thehalf bridge circuit 20 is also connected to thehigh side driver 27. - Other components that are conventionally provided in half bridge circuits, such as a
diode 34 between the drain and source of thehigh side switch 23 and resistor andinductor elements mid point 26 and earth, may also be provided but will not be described further herein. - In brief, the
circuit 20 ofFIG. 4 operates such that an appropriate drive signal is applied to theanode gate 32 of thedual gate device 24 concomitantly with the high side signal that is provided to the control gate of thehigh side switch 23. Thecapacitor 31 and one ormore diodes 33 act to ensure that the voltage applied to theanode gate 32 of thedual gate device 24 is of the correct magnitude and polarity. - Referring briefly to
FIG. 5 , as is known per se, the voltage Vhi output by thehigh side driver 27 is (ideally) a square wave that is switched over time between a relatively high positive value (of e.g. 5V) and a zero value, as shown in the upper part ofFIG. 5 . As shown in the lower part ofFIG. 5 , the driver signal Vlow output by thelow side driver 29 is in general the opposite of the drive signal output by thehigh side driver 27, i.e. when the output of thehigh side driver 27 is high, the output of thelow side driver 29 is low and vice versa. It will be understood that when the high side voltage Vhi is high, the low side voltage Vlow is normally zero though it may be small positive or negative. Similarly, it will be understood that when the low side voltage Vlow is high, the high side voltage Vhi is normally zero though it may be small positive or negative. - When the high side gate drive signal Vhi is high, as is known per se the
high side switch 23 is on. During this period, thecapacitor 31 charges with a current ia through the one ormore diodes 33. If the forward bias voltage drop across eachdiode 33 is Vf and the number ofdiodes 33 is Nd, then the voltage Vga developed on the second side of the capacitor, which is applied to theanode gate 32 of thedual gate device 24, is at least Nd.Vf above the voltage at themid point 26. By way of example, if there are twodiodes 33 each with a forward bias drop of 0.7V, then at least +1.4V relative to the voltage at themid point 26 is developed and can be applied to theanode gate 32 of thedual gate device 24 during the period that the high side gate drive signal Vhi is high. This is shown in the middle trace of the timing diagram ofFIG. 5 which shows Vga varying with Vhi and the maximum value Vp of Vga. - The effect of this is as follows. The high side gate drive signal Vhi is high so the
high side switch 23 is on. The low side gate drive signal is low so the voltage applied to thecathode gate 30 of the dual gate device 24 (measured relative to the voltage applied to the cathode) is low (or zero). The voltage Vga, which is applied to theanode gate 32 of thedual gate device 24 and which is effectively obtained from thehigh side driver 27, is positive relative to the voltage of themid point 26. With these relative voltages applied to the anode and thecathode gate 30 and theanode gate 32 of thedual gate device 24, thedual gate device 24 is operating as an anti-parallel diode and reverse-conducting. - In the next part of the cycle, when the high side gate drive signal Vhi is low, as is known per se the
high side switch 23 is off. At this time, the first side of the capacitor 31 (i.e. the side connected to the high side driver 27) is tied to themid point 26 of thecircuit 20. Now, thecapacitor 31 is already charged (from the previous high portion of the cycle of the high side driver 27) and has a lower voltage on its second side compared to its first side. This means that the voltage Vga that is now applied to theanode gate 32 of thedual gate device 24 is now effectively negative (as it is measured relative to the voltage applied to the anode of thedual gate device 24, which of course is the voltage at the mid point 26). Again, this is shown in the middle trace of the timing diagram ofFIG. 5 which shows Vga varying with Vhi and the minimum value Vn of Vga. In this specific example, Vn=−(5−1.4)V=−3.6V. - The effect of this is as follows. The high side gate drive signal Vhi is low so the
high side switch 23 is off. The low side gate drive signal is high so the voltage applied to thecathode gate 30 of the dual gate device 24 (measured relative to the voltage applied to the cathode) is high. The voltage Vga, which is applied to theanode gate 32 of thedual gate device 24 and which is effectively obtained from thehigh side driver 27, is negative relative to the voltage of themid point 26. With these relative voltages applied to the anode and thecathode gate 30 and theanode gate 32 of thedual gate device 24, thedual gate device 24 is operating in LIGBT mode and is forward-conducting. - Thus, by use of simple passive circuit components, in this example a capacitor and one or more diodes, the same high side driver can be used to drive both the control gate of a high side device and one control gate, such as an anode gate, of a dual gate device being used as a low side device in a half bridge circuit.
- It will be understood that the principles described above may be applied to any suitable dual gate device when used as a low side switch in a half bridge circuit such that one control gate of the dual gate device can be controlled by a conventional low side driver and the other control gate of the dual gate device can be controlled effectively by the high side driver which is also used to control the high side switch.
- The half bridge circuit described above may be duplicated to form a full bridge circuit, or may be combined with a conventional half bridge circuit to form a full bridge circuit.
- Embodiments of the present invention have been described with particular reference to the examples illustrated. However, it will be appreciated that variations and modifications may be made to the examples described within the scope of the present invention.
Claims (16)
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