US20080182424A1 - Method for selectively controlling lengths of nanowires - Google Patents
Method for selectively controlling lengths of nanowires Download PDFInfo
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- US20080182424A1 US20080182424A1 US11/297,900 US29790005A US2008182424A1 US 20080182424 A1 US20080182424 A1 US 20080182424A1 US 29790005 A US29790005 A US 29790005A US 2008182424 A1 US2008182424 A1 US 2008182424A1
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- 239000002070 nanowire Substances 0.000 title claims abstract description 173
- 238000000034 method Methods 0.000 title claims abstract description 56
- 239000002105 nanoparticle Substances 0.000 claims abstract description 79
- 239000000758 substrate Substances 0.000 claims abstract description 65
- 239000000463 material Substances 0.000 claims description 59
- 239000010410 layer Substances 0.000 claims description 39
- 239000003054 catalyst Substances 0.000 claims description 37
- 239000000203 mixture Substances 0.000 claims description 27
- 230000000994 depressogenic effect Effects 0.000 claims description 8
- 239000007789 gas Substances 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 7
- 230000000873 masking effect Effects 0.000 claims description 6
- 239000002243 precursor Substances 0.000 claims description 5
- 230000008859 change Effects 0.000 claims description 3
- 239000012530 fluid Substances 0.000 claims description 3
- 239000011241 protective layer Substances 0.000 claims description 3
- 238000001338 self-assembly Methods 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims 3
- 238000000576 coating method Methods 0.000 claims 3
- 238000000151 deposition Methods 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 description 7
- 230000003287 optical effect Effects 0.000 description 6
- 230000008569 process Effects 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000003491 array Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 3
- 238000001459 lithography Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 238000001069 Raman spectroscopy Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000012491 analyte Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007123 defense Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/60—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape characterised by shape
- C30B29/62—Whiskers or needles
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/006—Controlling or regulating
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/04—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt
- C30B11/08—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt every component of the crystal composition being added during the crystallisation
- C30B11/12—Vaporous components, e.g. vapour-liquid-solid-growth
Definitions
- the present disclosure relates generally to nanowire arrays, and more particularly to forming a substantially non-uniform array of nanowires.
- Nanowires are generally formed in uniform arrays because nanowires to date have been known to grow at the same rate when the nanoparticles catalyzing the nanowires are of uniform size. Extensive effort has been expended to form nanoparticles with a narrow size distribution so that the properties of the nanowires in an array are uniform. In some instances, however, an array of nanowires with lengths that vary in a controlled manner from one nanowire to another are desired. In order to achieve non-uniform arrays, the lengths of selected large (at least micron scale) regions of nanowires are reduced to a desirable size by, for example, etching or oxidation followed by etching. These additional steps may add to the complexity and expense of the formation process.
- a method for selectively controlling lengths of nanowires in a substantially non-uniform array of nanowires includes establishing at least two different catalyzing nanoparticles on a substrate. A nanowire from each of the at least two different catalyzing nanoparticles is substantially simultaneously grown. At least one of the nanowires has a length different from that of at least another of the nanowires.
- FIG. 1 is a flow diagram depicting an embodiment of the method
- FIG. 2 is a perspective schematic view of an embodiment of a substantially non-uniform array of nanowires
- FIG. 3A is a perspective schematic view of an embodiment of a substrate having a plurality of catalyzing nanoparticles established thereon;
- FIG. 3C is a perspective schematic view of an embodiment of a substrate having a plurality of depressions defined therein and a plurality of catalyzing nanoparticles established within the depressions;
- FIG. 4 is a perspective schematic view of an alternate embodiment of a substantially non-uniform array of nanowires
- FIG. 5 is a perspective schematic view of still another embodiment of a substantially non-uniform array of nanowires.
- FIGS. 6A through 6D are perspective schematic views depicting the formation of a channel leading to an embodiment of the nanowire array.
- Embodiment(s) of the method disclosed herein advantageously allow for the substantially controlled formation of non-uniform nanowires.
- the nanowire growth rate is at least partially dependent upon the size and/or composition of the catalyzing nanoparticle.
- the growth rate and length of each of the nanowires may be individually controlled.
- the x, y coordinates at which the different nanoparticles are established are determined.
- two different sized catalyzing nanoparticles may be placed at different predetermined x and y coordinates with nanoscale precision (e.g. less than about 100 nm) on a substrate so that each of the nanowires (having selectively controllable, different lengths in the z-axis) is grown in a desirable, predetermined location.
- the method allows one to control at which x, y coordinates a nanowire of a desirable length (z-coordinate) will be formed.
- nanoparticles Still another factor that may be varied to allow control over nanowire formation is the technique used to establish the nanoparticles. Different methods (discussed hereinbelow) may result in different nanoparticle sizes, which will alter the size and growth rate of the nanowires.
- the nanowires formed by the method(s) disclosed herein may advantageously exhibit desired/predetermined optical properties, electrical properties, and the like (non-limitative examples of which include size-controlled electrical conductivity, light-guiding properties, increased sensitivity, etc.).
- the substantially non-uniform arrays 10 may be used in optical applications (a non-limitative example of which includes nanophotonics), electronic applications, sensor applications, and the like.
- Some non-limitative examples of sensor applications include gas sensors, chemical sensors, bio-sensors, and/or the like.
- an embodiment of the method of forming a non-uniform array of nanowires includes establishing at least two different catalyzing nanoparticles on a substrate, as depicted at reference numeral 11 .
- the catalyzing nanoparticles enable substantially simultaneous growth of a nanowire from each of at least two different catalyzing nanoparticles, as depicted at reference numeral 13 .
- At least one of the nanowires has a length and/or a diameter different from that of at least one other of the nanowires. It is to be understood that the method will be disclosed herein in more detail in reference to FIGS. 2 through 6C .
- a substantially non-uniform array 10 of nanowires 12 is depicted.
- a substrate 14 is a silicon wafer.
- suitable substrate materials include silicon dioxide, silicon-on-insulator (SOI), alumina, quartz, fused silica, germanium, compound semiconductors (e.g., InP, GaAs, etc.), glass materials (e.g., those capable of withstanding temperatures greater than about 300° C.), electronic circuitry (e.g., integrated circuits) or the like, or combinations thereof.
- the substrate 14 may also have one or more layers established thereon.
- Embodiments of the substrate 14 are depicted in FIGS. 3A through 3C .
- the substrates 14 have a plurality of catalyzing nanoparticles 16 established thereon or therein.
- the catalyzing nanoparticles 16 are established on, and are substantially raised from the surface of the substrate 14 .
- the catalyzing nanoparticles 16 are established on, or in the substrate 14 surface such that they are substantially level with the surface.
- the catalyzing nanoparticles 16 are established in depressions 18 formed in the substrate 14 surface.
- the catalyzing nanoparticles 16 may be established on (see FIG. 3A ), or substantially level with (see FIG. 3B ), the substrate surface via a variety of techniques.
- the catalyzing nanoparticles 16 are established by imprinting the nanoparticles 16 via an imprint device (e.g., a mold or a stamp) having regions of catalyzing material that correspond with the catalyzing nanoparticles 16 .
- the catalyst material is placed on selected, nano-scale regions of the imprint device, and is transferred to the substrate 14 from the device.
- the size and/or shape of the nanoparticle 16 may be selectively controlled using nanoimprinting.
- the imprint device has regions of a binding material (e.g., an adhesive material) that is capable of binding a subsequently established catalyst material.
- the binding material is transferred from the imprint device to the substrate 14 .
- the binding material adheres the catalyst material to the substrate 14 , thereby forming the catalyzing nanoparticles 16 .
- a sacrificial layer e.g. a masking layer, a resist layer, and/or the like
- a nanoimprinted pattern is formed in the sacrificial layer.
- the nanoimprinted pattern includes a plurality of depressions, which generally expose various portions of the substrate 14 .
- a catalyst material is deposited such that it contacts the exposed substrate portions. The sacrificial layer is selectively removed, and the catalyst material remains on the substrate 14 .
- the substrate 14 is covered with a thin layer of catalyst material and a subsequent layer of masking material.
- Imprint lithography patterns the masking layer so that it remains and protects the regions that will become the catalyst regions.
- the catalyst is etched from the remaining regions, and the masking material is removed, leaving the catalyst nanoparticles 16 on the substrate 14 . It is to be understood that imprint lithography may be accomplished on the nano- or a larger (e.g. micron) scale.
- the catalyzing nanoparticles 16 may be established by establishing a catalyst material on the substrate 14 , a layer of non-catalyst material on the catalyst material, and then a sacrificial layer on the non-catalyst material.
- the sacrificial layer may be patterned via imprint lithography so that regions of the sacrificial layer are removed where nanoparticles 16 are desirable.
- the non-catalytic layer is etched in these regions, thus exposing the catalyst.
- the catalyst material in these regions acts as the catalyzing nanoparticles 16 for nanowire 12 growth.
- the substrate 14 has a plurality of depressed regions 18 defined therein.
- the regions 18 may have different widths, depths, shapes, and/or combinations thereof.
- a catalyst material may be established on the substrate 14 and in the depressed regions 18 .
- the excess catalyst material may then be removed via chemical mechanical planarization (CMP) such that the material remains in the depressions 18 .
- CMP chemical mechanical planarization
- the size and shape of the catalyst material within the depressed region 18 is substantially determined by that region's width, depth, and/or shape.
- the width, depth, and/or shape of each of the depressed regions 18 may be controlled so that desirable catalyzing nanoparticles 16 and nanowires 12 are formed.
- Still other methods of establishing the catalyzing nanoparticles 16 include agglomeration of a thin catalyst material during heat treatment, strain-induced self-assembly, or deposition of pre-formed catalyst nanoparticles 16 .
- the catalyzing nanoparticles 16 may be formed on the substrate 14 in any desirable pattern.
- a predetermined pattern may be determined, at least in part, by the final application in which the array 10 is to be used, the desired size of each of the nanowires 12 , the size of the substrate 14 , the size of the nanoparticles 16 , the imprinting process parameters, and/or the like, and/or combinations thereof.
- any suitable catalyzing nanoparticles 16 may be selected.
- suitable catalyzing nanoparticles 16 include gold, titanium, platinum, palladium, nickel, and/or combinations thereof.
- the nanoparticles 16 may have any desirable size, shape, composition, or combination thereof.
- the nanowires 12 are substantially simultaneously grown from the catalyzing nanoparticles 16 . It is to be understood that supplying heat and precursor gases of the material(s) forming the nanowires 12 may be used to initiate growth of the nanowires 12 at an area between the substrate 14 and the nanoparticles 16 . Alternately, growth may be initiated by supplying atoms of the materials that form the nanowires 12 (e.g. by laser ablation).
- the size and/or shape of the catalyzing nanoparticles advantageously determines, at least in part, the size (e.g. the length in the z-direction and/or diameter) of the resulting nanowire.
- the growth rate of the nanowires 12 may be selectively controlled by selecting or forming desirable catalyzing nanoparticles.
- first set A of the nanowires 12 has a first height (or length) H 1 and a first diameter D 1
- a second set B of the nanowires 12 has a second height (or length) H 2 and a second diameter D 2 .
- growth of the nanowires 12 of first set A initiated by nanoparticles 16 of one size and/or composition takes place at a first rate; while growth of the nanowires 12 of second set B initiated by nanoparticles 16 of another size and/or composition takes place at a second rate.
- the nanoparticle(s) 16 selected for the first set A results in a faster nanowire growth rate than the nanoparticle(s) 16 selected for the second set B.
- FIG. 2 also depicts the nanowires 12 having a plurality of different compositions throughout the nanowire 12 .
- the nanoparticles 16 and/or nanowires 12 may be exposed to different precursor gases to change the composition of some or all of the nanowires 12 .
- each of the nanowires 12 has a segment 15 of composition C 1 , a segment 15 of composition C 2 , a segment 15 of composition C 3 , and a segment 15 of composition C 4 (and so on up to C n , where n is any integer).
- the composition of the nanowires 12 may be transitioned as many times as desirable throughout and/or after the growth process.
- a variety of compositions may be chosen for the growing or grown nanowires 12 with nanoscale precision in the z-direction.
- composition transition may occur at different heights on each nanowire 12 , as at least two of the nanowires 12 have different growth rates. This is illustrated in FIG. 2 where the first composition C 1 of the nanowires 12 in the first set A has a greater height than the first composition C 1 of the nanowires 12 in the second set B. Furthermore, the nanowires 12 may be doped during and/or after growth.
- each nanowire 12 may have a different composition than each of the other nanowires 12 .
- the nanowires 12 may all have the same or similar compositions. It is to be understood that generally the precursor gas determines the nanowire 12 composition. In an embodiment, however, the catalyst may be incorporated into the nanowire 12 , thus potentially altering the composition. In another embodiment, different catalyst materials may catalyze the decomposition of each gas in a mixture of precursor gases at a different rate, therefore, the composition of the nanowire 12 may be dependent upon the catalyst materials used.
- FIG. 5 another embodiment of the substantially non-uniform array 10 of nanowires 12 is shown.
- at least two of the plurality of nanoparticles 16 established (prior to nanowire 12 growth) on the substrate 14 are substantially the same.
- eighteen individual nanoparticles 16 are formed on the substrate 14 , and nine different nanoparticle sizes are used.
- each of the eighteen nanowires 12 has substantially the same diameter and length as one of the other seventeen nanowires 12 in the array 10 . It is to be understood that while some of the nanowires 12 are substantially identical to others in the array 10 , the array 10 remains substantially non-uniform.
- FIG. 5 also illustrates how the formation of the nanowires 12 may be controlled to form a desirable structure with positions controlled in the x, y, and z directions.
- the controlled selection and placement of the nanoparticles 16 results in an array 10 that may be specifically designed (with desirable placement, composition, length, diameter, etc.) for a desired end use.
- a selected group of segments 15 e.g. each of the C 1 's together, each of the C 2 's together, etc.
- this 3-D shape may be useful in another structure.
- the top regions 28 (one of the groups of segments 15 ) of the nanowires 12 may form a predetermined 3-D shape, as mentioned above.
- the nanowires 12 may be a means to an end for controlling formation of desirable structures, e.g. structures having desirable shapes, electrical properties, optical properties, and/or chemical properties.
- the nanowires 12 may be grown so that the top regions 28 , located at predetermined x and y coordinates on the substrate 14 , are in the desirable z coordinate.
- the nanowire array 10 may be used in a sensor, where the top regions 28 are electrically, chemically, and/or optically active.
- the shape of the nanowire array 10 may be specifically designed to coordinate with, for example, a sample delivery device.
- FIGS. 6A through 6D some embodiments of forming one or more channel(s) 26 adapted to have fluid flow therethrough are depicted.
- FIG. 6A depicts a non-uniform array 10 of nanowires 12 on a substrate 14 , similar to those previously described. As shown, a portion 20 of the substrate 14 between the nanowires 12 is exposed. It is to be understood that the channel(s) 26 may also be formed with a uniform array of nanowires.
- FIG. 6B depicts three layers 22 , 24 , 30 established on the exposed portions 20 of the substrate 14 , such that the layers 22 , 24 , 30 substantially surround at least some of the nanowires 12 .
- FIG. 6C depicts the selective removal of one of the layers 22 , 24 , 30 (e.g. layer 24 is shown removed) such that a channel 26 is formed (it is to be understood that channel 26 optionally may be bounded by a single layer, e.g. see FIG. 6D ). Selective removal may be accomplished by a chemical etchant, selected to remove the desired layer 22 , 24 , 30 .
- the channel 26 has the array 10 of nanowires 12 extending therethrough. It is to be understood that the channel 26 may be adapted to have fluid (non-limitative examples of which include gases and liquids) flow adjacent the nanowires extending therethrough.
- any number of layers 22 , 24 , 30 and channels 26 may be formed, as desired. Generally, if “n” layers are formed (where “n” is any number), then up to n/2 layers may be removed to form one or more channels 26 . It is to be further understood that such layers 22 , 24 , 30 /channels 26 may be formed around a uniform array of nanowires, or around a substantially non-uniform array 10 of nanowires.
- the growth of the nanowires 12 may be selectively controlled so that each has a predetermined composition extending through the channel 26 and/or so that each individual nanowire 12 exhibits an individual predetermined functionality.
- the nanowires 12 exhibit optical, chemical and/or electrical activity.
- each of the five nanowires 12 may be selectively controlled so that the portion of an individual nanowire 12 extending through the channel 26 is capable of sensing one or more analyte(s) that is/are different from those capable of being sensed by each of the other four individual nanowires 12 .
- a single array 10 may be exposed to a solution containing a variety of analytes, and multiple analytes within the solution may be detectable.
- two layers 22 , 24 may be established, as mentioned above.
- Nanowires 12 of varying lengths extend therethrough.
- the nanowires 12 with layer 24 acting as a protective layer, are cut to substantially the same length, such as via, for example, chemical mechanical polishing (CMP), or any other suitable process (though layer 24 may be optional if, for example, nanowires 12 substantially do not need protection during CMP).
- Layer 24 if desired, may then be removed by any suitable process, such as for example, etching It is to be understood that layer 24 may be formed from any suitable sacrificial material, as desired.
- nanowires 12 remaining in channel 26 may be capable of detecting the same and/or different analytes of interest.
- each of the nanowires 12 may be selectively (i.e. each individual nanowire 12 in this embodiment may be different from another individual nanowire 12 ; or some 12 may be substantially the same as others 12 ; or all 12 may be substantially the same) electrically, chemically, and/or optically active.
- different materials may be established on different nanowires 12 in the array 10 .
- one or more of the nanowires 12 may be protected or masked such that the unprotected/unmasked nanowires 12 remain exposed.
- the exposed nanowires 12 may then have a material established thereon.
- a nanowire 12 may have an additional material established thereon such that a portion of the nanowire 12 has a larger diameter than another portion of the same nanowire 12 .
- a portion of the nanowire 12 is selectively masked such that another portion of the same nanowire 12 is exposed.
- a material is established on the exposed portion, such that that portion has a larger diameter than the rest of the nanowire 12 .
- the different diameters are formed by selectively adding materials to selected segments of a nanowire 12 .
- the added material may be formed, for example, by electro- or electroless plating. It is to be understood that the added material may selectively form on a particular segment of the nanowire 12 .
- the substantially non-uniform array 10 may be used in any suitable device, including optical devices, electronic devices, and the like.
- a non-limitative example of such a device includes a superlattice with varying symmetry formed by the method(s) disclosed herein.
- Nanowires 12 with segments of varying length formed by the method(s) described herein may also be used to form optical sensors using enhanced Raman spectroscopy. The binding of the molecules to be analyzed by the enhanced Raman technique depends on the length of the segments (e.g., the length of the inactive segment separating active segments). Different nanowires 12 (or groups of nanowires 12 ) with different length segments may, therefore, be sensitive to different molecules, allowing the species, as well as the concentration, to be determined.
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Abstract
Description
- This invention was made in the course of research partially supported by the Defense Advanced Research Projects Agency, Agreement No. MDA972-01-3-0005. The U.S. government has certain rights in the invention.
- The present disclosure relates generally to nanowire arrays, and more particularly to forming a substantially non-uniform array of nanowires.
- Nanowires are generally formed in uniform arrays because nanowires to date have been known to grow at the same rate when the nanoparticles catalyzing the nanowires are of uniform size. Extensive effort has been expended to form nanoparticles with a narrow size distribution so that the properties of the nanowires in an array are uniform. In some instances, however, an array of nanowires with lengths that vary in a controlled manner from one nanowire to another are desired. In order to achieve non-uniform arrays, the lengths of selected large (at least micron scale) regions of nanowires are reduced to a desirable size by, for example, etching or oxidation followed by etching. These additional steps may add to the complexity and expense of the formation process.
- As such, it would be desirable to provide a method for forming a non-uniform array of nanowires during nanowire growth, where the method allows for selective control of individual nanowire growth rate, length, and diameter.
- A method for selectively controlling lengths of nanowires in a substantially non-uniform array of nanowires is disclosed. The method includes establishing at least two different catalyzing nanoparticles on a substrate. A nanowire from each of the at least two different catalyzing nanoparticles is substantially simultaneously grown. At least one of the nanowires has a length different from that of at least another of the nanowires.
- Features and advantages of the present disclosure will become apparent by reference to the following detailed description and drawings, in which like reference numerals correspond to similar, though not necessarily identical components. For the sake of brevity, reference numerals or features having a previously described function may not necessarily be described in connection with other drawings in which they appear.
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FIG. 1 is a flow diagram depicting an embodiment of the method; -
FIG. 2 is a perspective schematic view of an embodiment of a substantially non-uniform array of nanowires; -
FIG. 3A is a perspective schematic view of an embodiment of a substrate having a plurality of catalyzing nanoparticles established thereon; -
FIG. 3B is a perspective schematic view of an embodiment of a substrate having a plurality of catalyzing nanoparticles established substantially level with a surface of a substrate; -
FIG. 3C is a perspective schematic view of an embodiment of a substrate having a plurality of depressions defined therein and a plurality of catalyzing nanoparticles established within the depressions; -
FIG. 4 is a perspective schematic view of an alternate embodiment of a substantially non-uniform array of nanowires; -
FIG. 5 is a perspective schematic view of still another embodiment of a substantially non-uniform array of nanowires; and -
FIGS. 6A through 6D are perspective schematic views depicting the formation of a channel leading to an embodiment of the nanowire array. - Embodiment(s) of the method disclosed herein advantageously allow for the substantially controlled formation of non-uniform nanowires. Without being bound to any theory, it is believed that the nanowire growth rate is at least partially dependent upon the size and/or composition of the catalyzing nanoparticle. As such, by varying the catalyzing nanoparticles used, the growth rate and length of each of the nanowires may be individually controlled.
- It is to be understood that various other factors may advantageously be altered so that formation of the nanowires is selectively controllable. One other factor that may be varied is the determination of the x, y coordinates at which the different nanoparticles are established. For example, two different sized catalyzing nanoparticles may be placed at different predetermined x and y coordinates with nanoscale precision (e.g. less than about 100 nm) on a substrate so that each of the nanowires (having selectively controllable, different lengths in the z-axis) is grown in a desirable, predetermined location. As such, the method allows one to control at which x, y coordinates a nanowire of a desirable length (z-coordinate) will be formed.
- Still another factor that may be varied to allow control over nanowire formation is the technique used to establish the nanoparticles. Different methods (discussed hereinbelow) may result in different nanoparticle sizes, which will alter the size and growth rate of the nanowires.
- Further, the nanowires formed by the method(s) disclosed herein may advantageously exhibit desired/predetermined optical properties, electrical properties, and the like (non-limitative examples of which include size-controlled electrical conductivity, light-guiding properties, increased sensitivity, etc.). As such, the substantially
non-uniform arrays 10 may be used in optical applications (a non-limitative example of which includes nanophotonics), electronic applications, sensor applications, and the like. Some non-limitative examples of sensor applications include gas sensors, chemical sensors, bio-sensors, and/or the like. - Referring now to
FIG. 1 , an embodiment of the method of forming a non-uniform array of nanowires is disclosed. Generally, an embodiment of the method includes establishing at least two different catalyzing nanoparticles on a substrate, as depicted atreference numeral 11. The catalyzing nanoparticles enable substantially simultaneous growth of a nanowire from each of at least two different catalyzing nanoparticles, as depicted atreference numeral 13. At least one of the nanowires has a length and/or a diameter different from that of at least one other of the nanowires. It is to be understood that the method will be disclosed herein in more detail in reference toFIGS. 2 through 6C . - Referring now to
FIG. 2 , an embodiment of a substantiallynon-uniform array 10 ofnanowires 12 is depicted. As shown, a plurality ofnanowires 12 is formed on asubstrate 14. Anysuitable substrate 14 may be used, and in an embodiment, thesubstrate 14 is a silicon wafer. Other non-limitative examples of suitable substrate materials include silicon dioxide, silicon-on-insulator (SOI), alumina, quartz, fused silica, germanium, compound semiconductors (e.g., InP, GaAs, etc.), glass materials (e.g., those capable of withstanding temperatures greater than about 300° C.), electronic circuitry (e.g., integrated circuits) or the like, or combinations thereof. It is to be understood that thesubstrate 14 may also have one or more layers established thereon. - Embodiments of the substrate 14 (without grown nanowires 12) are depicted in
FIGS. 3A through 3C . In the embodiments shown in.FIGS. 3A through 3C , thesubstrates 14 have a plurality of catalyzingnanoparticles 16 established thereon or therein. InFIG. 3A , thecatalyzing nanoparticles 16 are established on, and are substantially raised from the surface of thesubstrate 14. InFIG. 3B , thecatalyzing nanoparticles 16 are established on, or in thesubstrate 14 surface such that they are substantially level with the surface. InFIG. 3C , the catalyzingnanoparticles 16 are established indepressions 18 formed in thesubstrate 14 surface. - It is to be understood that the catalyzing
nanoparticles 16 may be established on (seeFIG. 3A ), or substantially level with (seeFIG. 3B ), the substrate surface via a variety of techniques. In an embodiment, the catalyzingnanoparticles 16 are established by imprinting thenanoparticles 16 via an imprint device (e.g., a mold or a stamp) having regions of catalyzing material that correspond with the catalyzingnanoparticles 16. In this embodiment, the catalyst material is placed on selected, nano-scale regions of the imprint device, and is transferred to thesubstrate 14 from the device. As such, the size and/or shape of thenanoparticle 16 may be selectively controlled using nanoimprinting. - In another embodiment, the imprint device has regions of a binding material (e.g., an adhesive material) that is capable of binding a subsequently established catalyst material. In this embodiment, the binding material is transferred from the imprint device to the
substrate 14. The binding material adheres the catalyst material to thesubstrate 14, thereby forming the catalyzingnanoparticles 16. - In still another embodiment, a sacrificial layer (e.g. a masking layer, a resist layer, and/or the like) is established on the
substrate 14, and a nanoimprinted pattern is formed in the sacrificial layer. The nanoimprinted pattern includes a plurality of depressions, which generally expose various portions of thesubstrate 14. A catalyst material is deposited such that it contacts the exposed substrate portions. The sacrificial layer is selectively removed, and the catalyst material remains on thesubstrate 14. - In another embodiment, the
substrate 14 is covered with a thin layer of catalyst material and a subsequent layer of masking material. Imprint lithography patterns the masking layer so that it remains and protects the regions that will become the catalyst regions. The catalyst is etched from the remaining regions, and the masking material is removed, leaving thecatalyst nanoparticles 16 on thesubstrate 14. It is to be understood that imprint lithography may be accomplished on the nano- or a larger (e.g. micron) scale. - The catalyzing
nanoparticles 16 may be established by establishing a catalyst material on thesubstrate 14, a layer of non-catalyst material on the catalyst material, and then a sacrificial layer on the non-catalyst material. The sacrificial layer may be patterned via imprint lithography so that regions of the sacrificial layer are removed wherenanoparticles 16 are desirable. The non-catalytic layer is etched in these regions, thus exposing the catalyst. The catalyst material in these regions acts as the catalyzingnanoparticles 16 fornanowire 12 growth. - In another embodiment, the
substrate 14 has a plurality ofdepressed regions 18 defined therein. Theregions 18 may have different widths, depths, shapes, and/or combinations thereof. A catalyst material may be established on thesubstrate 14 and in thedepressed regions 18. The excess catalyst material may then be removed via chemical mechanical planarization (CMP) such that the material remains in thedepressions 18. In an embodiment, the size and shape of the catalyst material within thedepressed region 18 is substantially determined by that region's width, depth, and/or shape. As such, the width, depth, and/or shape of each of thedepressed regions 18 may be controlled so thatdesirable catalyzing nanoparticles 16 andnanowires 12 are formed. - Still other methods of establishing the catalyzing
nanoparticles 16 include agglomeration of a thin catalyst material during heat treatment, strain-induced self-assembly, or deposition ofpre-formed catalyst nanoparticles 16. - The catalyzing
nanoparticles 16 may be formed on thesubstrate 14 in any desirable pattern. A predetermined pattern may be determined, at least in part, by the final application in which thearray 10 is to be used, the desired size of each of thenanowires 12, the size of thesubstrate 14, the size of thenanoparticles 16, the imprinting process parameters, and/or the like, and/or combinations thereof. - It is to be understood that any
suitable catalyzing nanoparticles 16 may be selected. Non-limitative examples ofsuitable catalyzing nanoparticles 16 include gold, titanium, platinum, palladium, nickel, and/or combinations thereof. Thenanoparticles 16 may have any desirable size, shape, composition, or combination thereof. - The
nanowires 12 are substantially simultaneously grown from the catalyzingnanoparticles 16. It is to be understood that supplying heat and precursor gases of the material(s) forming thenanowires 12 may be used to initiate growth of thenanowires 12 at an area between thesubstrate 14 and thenanoparticles 16. Alternately, growth may be initiated by supplying atoms of the materials that form the nanowires 12 (e.g. by laser ablation). - As previously indicated, it is believed that the size and/or shape of the catalyzing nanoparticles, advantageously determines, at least in part, the size (e.g. the length in the z-direction and/or diameter) of the resulting nanowire. As such, the growth rate of the
nanowires 12 may be selectively controlled by selecting or forming desirable catalyzing nanoparticles. - Referring back to
FIG. 2 , first set A of thenanowires 12 has a first height (or length) H1 and a first diameter D1, and a second set B of thenanowires 12 has a second height (or length) H2 and a second diameter D2. In this embodiment, growth of thenanowires 12 of first set A initiated bynanoparticles 16 of one size and/or composition takes place at a first rate; while growth of thenanowires 12 of second set B initiated bynanoparticles 16 of another size and/or composition takes place at a second rate. In this embodiment, the nanoparticle(s) 16 selected for the first set A results in a faster nanowire growth rate than the nanoparticle(s) 16 selected for the second set B. -
FIG. 2 also depicts thenanowires 12 having a plurality of different compositions throughout thenanowire 12. At different times during thenanowire 12 growth, thenanoparticles 16 and/ornanowires 12 may be exposed to different precursor gases to change the composition of some or all of thenanowires 12. In this embodiment, each of thenanowires 12 has asegment 15 of composition C1, asegment 15 of composition C2, asegment 15 of composition C3, and asegment 15 of composition C4 (and so on up to Cn, where n is any integer). It is to be understood that the composition of thenanowires 12 may be transitioned as many times as desirable throughout and/or after the growth process. Thus, a variety of compositions may be chosen for the growing orgrown nanowires 12 with nanoscale precision in the z-direction. - It is to be understood that the composition transition may occur at different heights on each
nanowire 12, as at least two of thenanowires 12 have different growth rates. This is illustrated inFIG. 2 where the first composition C1 of thenanowires 12 in the first set A has a greater height than the first composition C1 of thenanowires 12 in the second set B. Furthermore, thenanowires 12 may be doped during and/or after growth. - In another embodiment, each
nanowire 12 may have a different composition than each of theother nanowires 12. In still a further embodiment, thenanowires 12 may all have the same or similar compositions. It is to be understood that generally the precursor gas determines thenanowire 12 composition. In an embodiment, however, the catalyst may be incorporated into thenanowire 12, thus potentially altering the composition. In another embodiment, different catalyst materials may catalyze the decomposition of each gas in a mixture of precursor gases at a different rate, therefore, the composition of thenanowire 12 may be dependent upon the catalyst materials used. - Referring now to
FIG. 4 , an alternate embodiment of the substantiallynon-uniform array 10 ofnanowires 12 is shown. Each of thenanowires 12 in this embodiment has a different length/height Hx (in the figure, x=1 through 9) and a different diameter Dx than each of theother nanowires 12. It is to be understood that a plurality ofnanoparticles 16 is established on thesubstrate 14 to form such anarray 10. It is to be further understood that each of thenanoparticles 16 is different from the other of thenanoparticles 16, such that each formednanowire 12 is unique. - Referring now to
FIG. 5 , another embodiment of the substantiallynon-uniform array 10 ofnanowires 12 is shown. In this embodiment, at least two of the plurality ofnanoparticles 16 established (prior tonanowire 12 growth) on thesubstrate 14 are substantially the same. In this particular embodiment of thearray 10, eighteenindividual nanoparticles 16 are formed on thesubstrate 14, and nine different nanoparticle sizes are used. As such, each of the eighteennanowires 12 has substantially the same diameter and length as one of the other seventeennanowires 12 in thearray 10. It is to be understood that while some of thenanowires 12 are substantially identical to others in thearray 10, thearray 10 remains substantially non-uniform. -
FIG. 5 also illustrates how the formation of thenanowires 12 may be controlled to form a desirable structure with positions controlled in the x, y, and z directions. The controlled selection and placement of thenanoparticles 16 results in anarray 10 that may be specifically designed (with desirable placement, composition, length, diameter, etc.) for a desired end use. Together, a selected group of segments 15 (e.g. each of the C1's together, each of the C2's together, etc.) of thenanowires 12 may form a predetermined 3-D shape (e.g., two substantially parallel rows of C1, C2, etc.segments 15 having varying heights at opposed ends of the substrate 14). In an embodiment, this 3-D shape may be useful in another structure. In one non-limitative embodiment, the top regions 28 (one of the groups of segments 15) of thenanowires 12 may form a predetermined 3-D shape, as mentioned above. As such, thenanowires 12 may be a means to an end for controlling formation of desirable structures, e.g. structures having desirable shapes, electrical properties, optical properties, and/or chemical properties. - As a further non-limitative example, the
nanowires 12 may be grown so that thetop regions 28, located at predetermined x and y coordinates on thesubstrate 14, are in the desirable z coordinate. Thenanowire array 10 may be used in a sensor, where thetop regions 28 are electrically, chemically, and/or optically active. The shape of thenanowire array 10 may be specifically designed to coordinate with, for example, a sample delivery device. - Referring now to
FIGS. 6A through 6D , some embodiments of forming one or more channel(s) 26 adapted to have fluid flow therethrough are depicted.FIG. 6A depicts anon-uniform array 10 ofnanowires 12 on asubstrate 14, similar to those previously described. As shown, aportion 20 of thesubstrate 14 between thenanowires 12 is exposed. It is to be understood that the channel(s) 26 may also be formed with a uniform array of nanowires. -
FIG. 6B depicts threelayers portions 20 of thesubstrate 14, such that thelayers nanowires 12. -
FIG. 6C depicts the selective removal of one of thelayers e.g. layer 24 is shown removed) such that achannel 26 is formed (it is to be understood thatchannel 26 optionally may be bounded by a single layer, e.g. seeFIG. 6D ). Selective removal may be accomplished by a chemical etchant, selected to remove the desiredlayer channel 26 has thearray 10 ofnanowires 12 extending therethrough. It is to be understood that thechannel 26 may be adapted to have fluid (non-limitative examples of which include gases and liquids) flow adjacent the nanowires extending therethrough. - Although three
layers channel 26 are shown, it is to be understood that any number oflayers channels 26 may be formed, as desired. Generally, if “n” layers are formed (where “n” is any number), then up to n/2 layers may be removed to form one ormore channels 26. It is to be further understood thatsuch layers channels 26 may be formed around a uniform array of nanowires, or around a substantiallynon-uniform array 10 of nanowires. - It is to be understood that the growth of the
nanowires 12 may be selectively controlled so that each has a predetermined composition extending through thechannel 26 and/or so that eachindividual nanowire 12 exhibits an individual predetermined functionality. In an embodiment, thenanowires 12 exhibit optical, chemical and/or electrical activity. - In one non-limitative embodiment of an application of the nanowire array shown in
FIG. 6C , for example, each of the fivenanowires 12 may be selectively controlled so that the portion of anindividual nanowire 12 extending through thechannel 26 is capable of sensing one or more analyte(s) that is/are different from those capable of being sensed by each of the other fourindividual nanowires 12. As such, in one non-limitative example of the use ofarray 10, asingle array 10 may be exposed to a solution containing a variety of analytes, and multiple analytes within the solution may be detectable. - Referring now to
FIG. 6D , a further non-limitative embodiment is depicted. In this embodiment, twolayers Nanowires 12 of varying lengths extend therethrough. Then, thenanowires 12, withlayer 24 acting as a protective layer, are cut to substantially the same length, such as via, for example, chemical mechanical polishing (CMP), or any other suitable process (thoughlayer 24 may be optional if, for example,nanowires 12 substantially do not need protection during CMP).Layer 24, if desired, may then be removed by any suitable process, such as for example, etching It is to be understood thatlayer 24 may be formed from any suitable sacrificial material, as desired. In this embodiment,nanowires 12 remaining inchannel 26 may be capable of detecting the same and/or different analytes of interest. In another embodiment, each of thenanowires 12 may be selectively (i.e. eachindividual nanowire 12 in this embodiment may be different from anotherindividual nanowire 12; or some 12 may be substantially the same asothers 12; or all 12 may be substantially the same) electrically, chemically, and/or optically active. - In all the embodiments disclosed herein, different materials may be established on
different nanowires 12 in thearray 10. In one embodiment, subsequent tonanowire 12 growth, one or more of thenanowires 12 may be protected or masked such that the unprotected/unmaskednanowires 12 remain exposed. The exposednanowires 12 may then have a material established thereon. - Alternately, a
nanowire 12 may have an additional material established thereon such that a portion of thenanowire 12 has a larger diameter than another portion of thesame nanowire 12. In forming thisnanowire 12 in thearray 10, a portion of thenanowire 12 is selectively masked such that another portion of thesame nanowire 12 is exposed. A material is established on the exposed portion, such that that portion has a larger diameter than the rest of thenanowire 12. - In another embodiment, the different diameters are formed by selectively adding materials to selected segments of a
nanowire 12. The added material may be formed, for example, by electro- or electroless plating. It is to be understood that the added material may selectively form on a particular segment of thenanowire 12. - It is to be understood that the substantially
non-uniform array 10 may be used in any suitable device, including optical devices, electronic devices, and the like. A non-limitative example of such a device includes a superlattice with varying symmetry formed by the method(s) disclosed herein.Nanowires 12 with segments of varying length formed by the method(s) described herein may also be used to form optical sensors using enhanced Raman spectroscopy. The binding of the molecules to be analyzed by the enhanced Raman technique depends on the length of the segments (e.g., the length of the inactive segment separating active segments). Different nanowires 12 (or groups of nanowires 12) with different length segments may, therefore, be sensitive to different molecules, allowing the species, as well as the concentration, to be determined. - While several embodiments have been described in detail, it will be apparent to those skilled in the art that the disclosed embodiments may be modified. Therefore, the foregoing description is to be considered exemplary rather than limiting.
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100056851A1 (en) * | 2008-09-02 | 2010-03-04 | Georgia Tech Research Corporation | Piezoelectric Nanowire Vibration Sensors |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7570355B2 (en) * | 2006-01-27 | 2009-08-04 | Hewlett-Packard Development Company, L.P. | Nanowire heterostructures and methods of forming the same |
KR101530379B1 (en) * | 2006-03-29 | 2015-06-22 | 삼성전자주식회사 | Method for Producing Silicon Nanowire Using Porous Glass Template and Device Comprising Silicon Nanowire Formed by the Same |
KR100779090B1 (en) * | 2006-07-18 | 2007-11-27 | 한국전자통신연구원 | Gas sensor using zinc oxide and method of forming the same |
US7719678B2 (en) * | 2007-04-25 | 2010-05-18 | Hewlett-Packard Development Company, L.P. | Nanowire configured to couple electromagnetic radiation to selected guided wave, devices using same, and methods of fabricating same |
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US7965388B2 (en) * | 2009-04-01 | 2011-06-21 | Hewlett-Packard Development Company, L.P. | Structure for surface enhanced raman spectroscopy |
US8269257B2 (en) * | 2009-07-29 | 2012-09-18 | Massachusetts Institute Of Technology | Nanowire synthesis |
US9244015B2 (en) | 2010-04-20 | 2016-01-26 | Hewlett-Packard Development Company, L.P. | Self-arranging, luminescence-enhancement device for surface-enhanced luminescence |
US8431817B2 (en) * | 2010-06-08 | 2013-04-30 | Sundiode Inc. | Multi-junction solar cell having sidewall bi-layer electrical interconnect |
US8659037B2 (en) | 2010-06-08 | 2014-02-25 | Sundiode Inc. | Nanostructure optoelectronic device with independently controllable junctions |
US8476637B2 (en) | 2010-06-08 | 2013-07-02 | Sundiode Inc. | Nanostructure optoelectronic device having sidewall electrical contact |
WO2012015443A1 (en) | 2010-07-30 | 2012-02-02 | Hewlett-Packard Development Company, L.P. | Optical fiber surface enhanced raman spectroscopy (sers) probe |
WO2012054027A1 (en) | 2010-10-20 | 2012-04-26 | Hewlett-Packard Development Company, L.P. | Chemical-analysis device integrated with metallic-nanofinger device for chemical sensing |
WO2012054024A1 (en) | 2010-10-20 | 2012-04-26 | Hewlett-Packard Development Company, L.P. | Metallic-nanofinger device for chemical sensing |
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US8520202B2 (en) | 2011-09-15 | 2013-08-27 | Hewlett-Packard Development Company, L.P. | Asymmetrical-nanofinger device for surface-enhanced luminescense |
US9453793B2 (en) | 2012-04-20 | 2016-09-27 | Hewlett-Packard Development Company, L.P. | Integrated sensors |
EP2839295B1 (en) | 2012-04-20 | 2017-04-19 | Hewlett-Packard Development Company, L.P. | Integrated sensors |
CN106449133B (en) * | 2016-10-08 | 2020-03-31 | 全普半导体科技(深圳)有限公司 | Single-layer graphene film-based composite structure, preparation method and semiconductor device |
US20210214215A1 (en) * | 2018-08-29 | 2021-07-15 | Thales Solutions Asia Pte Ltd | Nanostructure transfer method |
CN112201722B (en) * | 2019-07-08 | 2022-01-28 | 中国科学院苏州纳米技术与纳米仿生研究所 | Multi-band detection structure and manufacturing method thereof |
Citations (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6248674B1 (en) * | 2000-02-02 | 2001-06-19 | Hewlett-Packard Company | Method of aligning nanowires |
US6359288B1 (en) * | 1997-04-24 | 2002-03-19 | Massachusetts Institute Of Technology | Nanowire arrays |
US20030189202A1 (en) * | 2002-04-05 | 2003-10-09 | Jun Li | Nanowire devices and methods of fabrication |
US6656573B2 (en) * | 2001-06-26 | 2003-12-02 | Hewlett-Packard Development Company, L.P. | Method to grow self-assembled epitaxial nanowires |
US20040005723A1 (en) * | 2002-04-02 | 2004-01-08 | Nanosys, Inc. | Methods of making, positioning and orienting nanostructures, nanostructure arrays and nanostructure devices |
US6699779B2 (en) * | 2002-03-22 | 2004-03-02 | Hewlett-Packard Development Company, L.P. | Method for making nanoscale wires and gaps for switches and transistors |
US20040082178A1 (en) * | 2002-10-28 | 2004-04-29 | Kamins Theodore I. | Method of forming catalyst nanoparticles for nanowire growth and other applications |
US20040144970A1 (en) * | 2002-10-07 | 2004-07-29 | Dunwei Wang | Nanowires |
US6808605B2 (en) * | 2001-10-15 | 2004-10-26 | Korea Institute Of Science And Technology | Fabrication method of metallic nanowires |
US6831017B1 (en) * | 2002-04-05 | 2004-12-14 | Integrated Nanosystems, Inc. | Catalyst patterning for nanowire devices |
US6841013B2 (en) * | 2002-10-11 | 2005-01-11 | General Motors Corporation | Metallic nanowire and method of making the same |
US6843902B1 (en) * | 2001-07-20 | 2005-01-18 | The Regents Of The University Of California | Methods for fabricating metal nanowires |
US20050011431A1 (en) * | 2003-04-04 | 2005-01-20 | Btg International Limited | Precisely positioned nanowhiskers and nanowhisker arrays and method for preparing them |
US20050029678A1 (en) * | 2003-07-08 | 2005-02-10 | University Of Texas System, Board Of Regents | Growth of single crystal nanowires |
US20050133476A1 (en) * | 2003-12-17 | 2005-06-23 | Islam M. S. | Methods of bridging lateral nanowires and device using same |
US7018549B2 (en) * | 2003-12-29 | 2006-03-28 | Intel Corporation | Method of fabricating multiple nanowires of uniform length from a single catalytic nanoparticle |
US20060175601A1 (en) * | 2000-08-22 | 2006-08-10 | President And Fellows Of Harvard College | Nanoscale wires and related devices |
-
2005
- 2005-12-09 US US11/297,900 patent/US7402531B1/en not_active Expired - Fee Related
Patent Citations (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6359288B1 (en) * | 1997-04-24 | 2002-03-19 | Massachusetts Institute Of Technology | Nanowire arrays |
US6248674B1 (en) * | 2000-02-02 | 2001-06-19 | Hewlett-Packard Company | Method of aligning nanowires |
US20060175601A1 (en) * | 2000-08-22 | 2006-08-10 | President And Fellows Of Harvard College | Nanoscale wires and related devices |
US6656573B2 (en) * | 2001-06-26 | 2003-12-02 | Hewlett-Packard Development Company, L.P. | Method to grow self-assembled epitaxial nanowires |
US6843902B1 (en) * | 2001-07-20 | 2005-01-18 | The Regents Of The University Of California | Methods for fabricating metal nanowires |
US6808605B2 (en) * | 2001-10-15 | 2004-10-26 | Korea Institute Of Science And Technology | Fabrication method of metallic nanowires |
US6699779B2 (en) * | 2002-03-22 | 2004-03-02 | Hewlett-Packard Development Company, L.P. | Method for making nanoscale wires and gaps for switches and transistors |
US20040005723A1 (en) * | 2002-04-02 | 2004-01-08 | Nanosys, Inc. | Methods of making, positioning and orienting nanostructures, nanostructure arrays and nanostructure devices |
US6831017B1 (en) * | 2002-04-05 | 2004-12-14 | Integrated Nanosystems, Inc. | Catalyst patterning for nanowire devices |
US20030189202A1 (en) * | 2002-04-05 | 2003-10-09 | Jun Li | Nanowire devices and methods of fabrication |
US20040144970A1 (en) * | 2002-10-07 | 2004-07-29 | Dunwei Wang | Nanowires |
US6841013B2 (en) * | 2002-10-11 | 2005-01-11 | General Motors Corporation | Metallic nanowire and method of making the same |
US20040082178A1 (en) * | 2002-10-28 | 2004-04-29 | Kamins Theodore I. | Method of forming catalyst nanoparticles for nanowire growth and other applications |
US20050011431A1 (en) * | 2003-04-04 | 2005-01-20 | Btg International Limited | Precisely positioned nanowhiskers and nanowhisker arrays and method for preparing them |
US20050029678A1 (en) * | 2003-07-08 | 2005-02-10 | University Of Texas System, Board Of Regents | Growth of single crystal nanowires |
US20050133476A1 (en) * | 2003-12-17 | 2005-06-23 | Islam M. S. | Methods of bridging lateral nanowires and device using same |
US7018549B2 (en) * | 2003-12-29 | 2006-03-28 | Intel Corporation | Method of fabricating multiple nanowires of uniform length from a single catalytic nanoparticle |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100056851A1 (en) * | 2008-09-02 | 2010-03-04 | Georgia Tech Research Corporation | Piezoelectric Nanowire Vibration Sensors |
US8758217B2 (en) * | 2008-09-02 | 2014-06-24 | Georgia Tech Research Corporation | Piezoelectric nanowire vibration sensors |
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