US20070293968A1 - Automatic methods and systems for manufacturing recipe feedback control - Google Patents
Automatic methods and systems for manufacturing recipe feedback control Download PDFInfo
- Publication number
- US20070293968A1 US20070293968A1 US11/423,984 US42398406A US2007293968A1 US 20070293968 A1 US20070293968 A1 US 20070293968A1 US 42398406 A US42398406 A US 42398406A US 2007293968 A1 US2007293968 A1 US 2007293968A1
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- manufacturing
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- feedback control
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Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 120
- 238000000034 method Methods 0.000 title claims abstract description 18
- 235000012431 wafers Nutrition 0.000 claims abstract description 31
- 238000012545 processing Methods 0.000 claims abstract description 8
- 238000012986 modification Methods 0.000 claims description 8
- 230000004048 modification Effects 0.000 claims description 8
- 238000005137 deposition process Methods 0.000 claims description 6
- 238000010586 diagram Methods 0.000 description 8
- 238000005259 measurement Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
- G05B19/41875—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by quality surveillance of production
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/32—Operator till task planning
- G05B2219/32096—Batch, recipe configuration for flexible batch control
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/32—Operator till task planning
- G05B2219/32137—Configure, connect, combine different program modules
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/45—Nc applications
- G05B2219/45031—Manufacturing semiconductor wafers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
Definitions
- the present invention relates to wafer manufacturing methods, and in particular to computer-implemented automatic methods and systems for manufacturing recipes feedback control.
- FIG. 2 is a diagram illustrating conventional relationships among manufacturing recipes.
- Manufacturing Recipe-A 200 is a process related to a multi-layered operation, comprising manufacturing Recipe-B 202 and Recipe-C 204 , thus the relationship is a one-to-multiple type.
- Manufacturing Recipe-B 202 , Recipe-C 204 , and Recipe-D 206 form manufacturing Recipe-E 208 , thus the relationship is a multiple-to-one type.
- manufacturing Recipe-C 204 and Recipe-D 206 form manufacturing Recipe-F 210 . Therefore, manufacturing Recipe-E 208 is a common recipe for manufacturing Recipe-B 202 , Recipe-C 204 , and Recipe-D 206 and manufacturing Recipe-F 210 is a common recipe for manufacturing Recipe-C 204 and Recipe-D 206 .
- manufacturing Recipe-G 212 does not actually exist, but may be formed by manipulations of other recipes.
- manufacturing Recipe-G 212 is a resulting recipe 214 of Recipe-A 200 less the process of Recipe-C 204 .
- manufacturing Recipe-G 212 is a virtual recipe.
- An embodiment of the invention provides automatic methods for manufacturing recipe feedback control. Relationships between manufacturing recipes are determined. The manufacturing recipes are used in wafer manufacture. After processing, the wafers are transferred to metrology tools and measured thereby to acquire feedback information for the manufacturing recipes. The manufacturing recipes are automatically modified according to the feedback information and the determined relationships.
- FIG. 1 is a diagram of a conventional method of manufacturing recipe feedback control.
- FIG. 2 is a diagram illustrating conventional relationships among manufacturing recipes.
- FIG. 3 is a flowchart of an exemplary embodiment of a computer-implemented method for automated manufacturing recipe feedback control.
- FIG. 5 is a diagram of an exemplary implementation of a system for automated manufacturing recipe feedback control.
- FIG. 3 is a flowchart of an exemplary embodiment of a computer-implemented method for automated manufacturing recipe feedback control. Relationships among manufacturing recipes are first determined (step S 300 ). Relationships may be a one-to-one, one-to-multiple, or multiple-to-one type corresponding correlations. Relationship determination can also identify common and virtual manufacturing recipes.
- the manufacturing recipes are then applied to manufacture wafers (step S 302 ), which may comprise a film deposition process.
- the wafers are measured by metrology tools after being manufactured (step S 304 ).
- the metrology tools measure film thickness to verify the manufacturing results.
- Feedback information for the manufacturing recipes is then acquired from the metrology tools (step S 306 ).
- the manufacturing recipes are modified automatically according to the feedback information of the verification results and the determined relationships (step S 308 ). Thereafter, wafers can be processed according to the modified manufacturing recipes.
- the relationships and recipes, original or modified, can be stored in a MES database.
- FIG. 4 is a diagram of an exemplary embodiment of a system for automated manufacturing recipe feedback control, comprising a determination module 40 , metrology tools 42 , an acquisition module 44 , and a modification module 46 .
- the determination module 40 determines relationships between manufacturing recipes.
- the manufacturing recipes are provided to process wafers, such as in a film deposition process.
- Metrology tools 42 measure the wafers after processing with the manufacturing recipes. If the manufacturing is a film deposition process, the measurement can be film thickness.
- the acquisition module 44 coupled to the metrology tools, acquires feedback information of the manufacturing results of the manufacturing recipes from the metrology tools.
- the modification module 46 automatically modifies the manufacturing recipes according to the feedback information and the relationship.
- relationships include one-to-one, one-to-multiple, or multiple-to-one types. Relationship determination also identifies common and virtual manufacturing recipes.
- FIG. 5 is a diagram of an exemplary implementation of a system for automated manufacturing recipe feedback control.
- Manufacturing recipes 500 are stored in a MES database 50 connected to a manufacturing tool 502 .
- the manufacturing tool 502 verifies the wafer lot and selects a corresponding manufacturing recipe from the MES database 50 .
- the wafer lot is then processed according to the selected manufacturing recipe in the manufacturing tool 502 .
- the wafer lot is transferred to a metrology tool 504 for result measurement, such as film deposition thickness.
- Feedback information 506 is acquired.
- the manufacturing recipes 500 are then modified automatically based on the feedback information 506 .
- manufacturing recipe modification is automatically executed after wafer manufacturing and measurement as shown in FIG. 5 by applying the inventive methods, thereby decreasing errors and conserving resources.
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- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Quality & Reliability (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- General Factory Administration (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
- The present invention relates to wafer manufacturing methods, and in particular to computer-implemented automatic methods and systems for manufacturing recipes feedback control.
- In integrated circuit (IC) related manufacturing foundries, such as semiconductor product foundries, manufacturing recipes are applied to manufacturing tools for IC product manufacture.
FIG. 1 is a diagram of a conventional method of manufacturing recipe feedback control.Manufacturing recipes 100 are generally stored in a manufacturing execution system (MES) database connected to manufacturing tools. When a wafer or wafer lot arrives at amanufacturing tool 102, themanufacturing tool 102 verifies the wafer or wafer lot. A proper or prearranged manufacturing recipe is selected from the MES database. The arriving wafer or wafer lot is then processed by themanufacturing tool 102 according to the manufacturing recipe. After manufacturing, the wafer or wafer lot is transferred to ametrology tool 104 to measure manufacturing result, such as a film deposition thickness, and to acquire feedback information. Themanufacturing recipes 100 are then modified manually byoperators 106 based on the feedback information. - Such manual modification of manufacturing recipes is time-consuming and error-prone. Additionally, relationships among manufacturing recipes are complex, including one-to-one, one-to-multiple, and multiple-to-one correlation types.
FIG. 2 is a diagram illustrating conventional relationships among manufacturing recipes. Manufacturing Recipe-A 200 is a process related to a multi-layered operation, comprising manufacturing Recipe-B 202 and Recipe-C 204, thus the relationship is a one-to-multiple type. Manufacturing Recipe-B 202, Recipe-C 204, and Recipe-D 206 form manufacturing Recipe-E 208, thus the relationship is a multiple-to-one type. Similarly, manufacturing Recipe-C 204 and Recipe-D 206 form manufacturing Recipe-F 210. Therefore, manufacturing Recipe-E 208 is a common recipe for manufacturing Recipe-B 202, Recipe-C 204, and Recipe-D 206 and manufacturing Recipe-F 210 is a common recipe for manufacturing Recipe-C 204 and Recipe-D 206. - Here, manufacturing Recipe-G 212 does not actually exist, but may be formed by manipulations of other recipes. For example, manufacturing Recipe-
G 212 is a resultingrecipe 214 of Recipe-A 200 less the process of Recipe-C 204. Thus, manufacturing Recipe-G 212 is a virtual recipe. - Manual modification of common or virtual recipes is difficult. For example, if manufacturing Recipe-
B 202 has been changed, manufacturing Recipe-E 208 must be changed accordingly. For virtual manufacturing recipes, manufacturing Recipe-G 212 cannot be recognized by operators but need to be modified for manufacturing. As relationships among recipes become more complicated, modification becomes increasingly difficult. Thus, automatic methods and systems for manufacturing recipe feedback control are desirable. - An embodiment of the invention provides automatic methods for manufacturing recipe feedback control. Relationships between manufacturing recipes are determined. The manufacturing recipes are used in wafer manufacture. After processing, the wafers are transferred to metrology tools and measured thereby to acquire feedback information for the manufacturing recipes. The manufacturing recipes are automatically modified according to the feedback information and the determined relationships.
- The present invention can be more fully understood by reading the subsequent detailed description and examples with references made to the accompanying drawings, wherein:
-
FIG. 1 is a diagram of a conventional method of manufacturing recipe feedback control. -
FIG. 2 is a diagram illustrating conventional relationships among manufacturing recipes. -
FIG. 3 is a flowchart of an exemplary embodiment of a computer-implemented method for automated manufacturing recipe feedback control. -
FIG. 4 is a diagram of an exemplary embodiment of a system for automated manufacturing recipe feedback control. -
FIG. 5 is a diagram of an exemplary implementation of a system for automated manufacturing recipe feedback control. -
FIG. 3 is a flowchart of an exemplary embodiment of a computer-implemented method for automated manufacturing recipe feedback control. Relationships among manufacturing recipes are first determined (step S300). Relationships may be a one-to-one, one-to-multiple, or multiple-to-one type corresponding correlations. Relationship determination can also identify common and virtual manufacturing recipes. - The manufacturing recipes are then applied to manufacture wafers (step S302), which may comprise a film deposition process. The wafers are measured by metrology tools after being manufactured (step S304). Here, with the wafer manufacturing a film deposition process, the metrology tools measure film thickness to verify the manufacturing results. Feedback information for the manufacturing recipes is then acquired from the metrology tools (step S306). The manufacturing recipes are modified automatically according to the feedback information of the verification results and the determined relationships (step S308). Thereafter, wafers can be processed according to the modified manufacturing recipes. The relationships and recipes, original or modified, can be stored in a MES database.
-
FIG. 4 is a diagram of an exemplary embodiment of a system for automated manufacturing recipe feedback control, comprising adetermination module 40,metrology tools 42, anacquisition module 44, and amodification module 46. - The
determination module 40 determines relationships between manufacturing recipes. The manufacturing recipes are provided to process wafers, such as in a film deposition process.Metrology tools 42 measure the wafers after processing with the manufacturing recipes. If the manufacturing is a film deposition process, the measurement can be film thickness. - The
acquisition module 44, coupled to the metrology tools, acquires feedback information of the manufacturing results of the manufacturing recipes from the metrology tools. Themodification module 46 automatically modifies the manufacturing recipes according to the feedback information and the relationship. - Here, again, relationships include one-to-one, one-to-multiple, or multiple-to-one types. Relationship determination also identifies common and virtual manufacturing recipes.
-
FIG. 5 is a diagram of an exemplary implementation of a system for automated manufacturing recipe feedback control.Manufacturing recipes 500 are stored in a MESdatabase 50 connected to amanufacturing tool 502. When a wafer lot arrives at themanufacturing tool 502, themanufacturing tool 502 verifies the wafer lot and selects a corresponding manufacturing recipe from the MESdatabase 50. The wafer lot is then processed according to the selected manufacturing recipe in themanufacturing tool 502. After manufacture, the wafer lot is transferred to ametrology tool 504 for result measurement, such as film deposition thickness.Feedback information 506 is acquired. The manufacturingrecipes 500 are then modified automatically based on thefeedback information 506. - Comparing
FIG. 1 withFIG. 5 , manufacturing recipe modification is automatically executed after wafer manufacturing and measurement as shown inFIG. 5 by applying the inventive methods, thereby decreasing errors and conserving resources. - While the invention has been described by way of example and in terms of preferred embodiment, it is to be understood that the invention is not limited thereto. Those skilled in this technology can still make various alterations and modifications without departing from the scope and spirit of this invention. Therefore, the scope of the present invention shall be defined and protected by the following claims and their equivalents.
Claims (14)
Priority Applications (2)
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US11/423,984 US7313450B1 (en) | 2006-06-14 | 2006-06-14 | Automatic methods and systems for manufacturing recipe feedback control |
CNB200710005299XA CN100498603C (en) | 2006-06-14 | 2007-02-14 | Computer-implemented automated method and automated system for feedback control of manufacturing processes |
Applications Claiming Priority (1)
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US11/423,984 US7313450B1 (en) | 2006-06-14 | 2006-06-14 | Automatic methods and systems for manufacturing recipe feedback control |
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US20070293968A1 true US20070293968A1 (en) | 2007-12-20 |
US7313450B1 US7313450B1 (en) | 2007-12-25 |
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US11/423,984 Expired - Fee Related US7313450B1 (en) | 2006-06-14 | 2006-06-14 | Automatic methods and systems for manufacturing recipe feedback control |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100211202A1 (en) * | 2009-02-13 | 2010-08-19 | Hermes Microvision, Inc. | Method and machine for examining wafers |
US20120314054A1 (en) * | 2009-02-13 | 2012-12-13 | Hermes Microvision, Inc. | Method and machine for examining wafers |
US20230221702A1 (en) * | 2022-01-13 | 2023-07-13 | Changxin Memory Technologies, Inc. | Process recipe, method and system for generating same, and semiconductor manufacturing method |
US20230359168A1 (en) * | 2022-05-03 | 2023-11-09 | Nanya Technology Corporation | Method for controlling deposition tool |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101751025B (en) * | 2008-12-12 | 2012-06-06 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Silicon slice optimal scheduling method and device |
CN101824647B (en) * | 2009-03-04 | 2012-07-25 | 和舰科技(苏州)有限公司 | Automatic process control method of PECVD film deposition |
US10783290B2 (en) | 2017-09-28 | 2020-09-22 | Taiwan Semiconductor Manufacturing Company, Ltd. | IC manufacturing recipe similarity evaluation methods and systems |
US11685998B2 (en) | 2018-06-21 | 2023-06-27 | Asm Ip Holding B.V. | Substrate processing apparatus, storage medium and substrate processing method |
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US20060265098A1 (en) * | 2005-05-18 | 2006-11-23 | Infineon Technologies Richmond, Lp | System and method for real time prediction and/or inheritance of process controller settings in a semiconductor manufacturing facility |
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Publication number | Priority date | Publication date | Assignee | Title |
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US5495417A (en) * | 1990-08-14 | 1996-02-27 | Kabushiki Kaisha Toshiba | System for automatically producing different semiconductor products in different quantities through a plurality of processes along a production line |
US6197604B1 (en) * | 1998-10-01 | 2001-03-06 | Advanced Micro Devices, Inc. | Method for providing cooperative run-to-run control for multi-product and multi-process semiconductor fabrication |
US20020095278A1 (en) * | 2000-12-06 | 2002-07-18 | Riley Terrence J. | Method for adjusting rapid thermal processing (RTP) recipe setpoints based on wafer electrical test (WET) parameters |
US6789067B1 (en) * | 2000-12-19 | 2004-09-07 | Gateway, Inc. | Multiple recipe merge with feedback |
US20030229410A1 (en) * | 2002-06-07 | 2003-12-11 | Smith Taber H. | Integrated circuit metrology |
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Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
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US20100211202A1 (en) * | 2009-02-13 | 2010-08-19 | Hermes Microvision, Inc. | Method and machine for examining wafers |
US20120314054A1 (en) * | 2009-02-13 | 2012-12-13 | Hermes Microvision, Inc. | Method and machine for examining wafers |
US9768082B2 (en) * | 2009-02-13 | 2017-09-19 | Hermes Microvision Inc. | Method and machine for examining wafers |
US10840156B2 (en) | 2009-02-13 | 2020-11-17 | Asml Netherlands B.V. | Method and machine for examining wafers |
US12394674B2 (en) | 2009-02-13 | 2025-08-19 | Asml Netherlands B.V. | Method and machine for examining wafers |
US20230221702A1 (en) * | 2022-01-13 | 2023-07-13 | Changxin Memory Technologies, Inc. | Process recipe, method and system for generating same, and semiconductor manufacturing method |
US12276965B2 (en) * | 2022-01-13 | 2025-04-15 | Changxin Memory Technologies, Inc. | Process recipe, method and system for generating same, and semiconductor manufacturing method |
US20230359168A1 (en) * | 2022-05-03 | 2023-11-09 | Nanya Technology Corporation | Method for controlling deposition tool |
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Also Published As
Publication number | Publication date |
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US7313450B1 (en) | 2007-12-25 |
CN101089758A (en) | 2007-12-19 |
CN100498603C (en) | 2009-06-10 |
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