US20060216902A1 - Rugged metal electrodes for metal-insulator-metal capacitors - Google Patents
Rugged metal electrodes for metal-insulator-metal capacitors Download PDFInfo
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- US20060216902A1 US20060216902A1 US11/432,867 US43286706A US2006216902A1 US 20060216902 A1 US20060216902 A1 US 20060216902A1 US 43286706 A US43286706 A US 43286706A US 2006216902 A1 US2006216902 A1 US 2006216902A1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/60—Electrodes
- H01L28/82—Electrodes with an enlarged surface, e.g. formed by texturisation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/60—Electrodes
- H01L28/82—Electrodes with an enlarged surface, e.g. formed by texturisation
- H01L28/84—Electrodes with an enlarged surface, e.g. formed by texturisation being a rough surface, e.g. using hemispherical grains
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/01—Manufacture or treatment
- H10B12/02—Manufacture or treatment for one transistor one-capacitor [1T-1C] memory cells
- H10B12/03—Making the capacitor or connections thereto
- H10B12/033—Making the capacitor or connections thereto the capacitor extending over the transistor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76886—Modifying permanently or temporarily the pattern or the conductivity of conductive members, e.g. formation of alloys, reduction of contact resistances
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/55—Capacitors with a dielectric comprising a perovskite structure material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/60—Electrodes
- H01L28/82—Electrodes with an enlarged surface, e.g. formed by texturisation
- H01L28/90—Electrodes with an enlarged surface, e.g. formed by texturisation having vertical extensions
- H01L28/91—Electrodes with an enlarged surface, e.g. formed by texturisation having vertical extensions made by depositing layers, e.g. by depositing alternating conductive and insulating layers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
- H10B12/31—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells having a storage electrode stacked over the transistor
- H10B12/318—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells having a storage electrode stacked over the transistor the storage electrode having multiple segments
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/933—Germanium or silicon or Ge-Si on III-V
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/964—Roughened surface
Definitions
- the invention relates generally to thin film integrated circuit design and fabrication.
- the invention pertains to electrode design and materials used in stacked cell capacitor Dynamic Random Access Memories (DRAM).
- DRAM Dynamic Random Access Memories
- a dynamic random access memory (DRAM) cell typically comprises a charge storage capacitor (or cell capacitor) coupled to an access device such as a Metal-Oxide-Semiconductor Field Effect Transistor (MOSFET).
- MOSFET functions to apply or remove charge on the capacitor, thus affecting a logical state defined by the stored charge.
- the conditions of DRAM operation such as operating voltage, leakage rate and refresh rate, will in general mandate that a certain minimum charge be stored by the capacitor.
- the packing density of storage cells must increase, yet each will maintain required capacitance levels. This is a crucial demand of DRAM fabrication technologies if future generations of expanded memory array devices are to be successfully manufactured. Nevertheless, in the trend to higher memory capacity, the packing density of cell capacitors has increased at the expense of available cell area. For example, the area allowed for a single cell in a 64-Mbit DRAM is only about 1.4 ⁇ m 2 . In such limited areas, it is difficult to provide sufficient capacitance using conventional stacked capacitor structures. Yet, design and operational parameters determine the minimum charge required for reliable operation of the memory cell despite decreasing cell area. Several techniques have been developed to increase the total charge capacity of the cell capacitor without significantly affecting the cell area.
- a method of forming a textured metal structure comprises first forming a predetermined textured silicon structure having the desired form, and then replacing silicon atoms in the textured structure with metal atoms.
- a method of forming a predetermined textured structure preferably comprises depositing an amorphous or polycrystalline silicon structure by chemical vapor deposition, and then exposing the structure to a controlled annealing process to form a silicon surface having a textured surface morphology.
- the metal substitution process preferably comprises exposing the textured structure to a refractory metal-halide complex, and most preferably to WF 6 .
- a process for fabricating a metal-insulator-metal capacitor on a semiconductor wafer comprises first forming a silicon electrode structure on the semiconductor wafer, texturizing the silicon electrode structure, and then replacing the silicon in the silicon electrode structure with a metal, thereby forming a textured metal electrode.
- the process further comprises depositing a dielectric layer having a high dielectric constant over the textured metal electrode followed by a metal layer deposited over the dielectric layer.
- Replacing the silicon in the silicon electrode structure preferably comprises exposing the silicon electrode structure to a refractory metal-halide complex, such as WF 6 .
- the dielectric layer preferably comprises a material selected from the group consisting of Ta 2 O 5 , BaTiO 3 , SrTiO 3 , Ba x Sr 1-x ,TiO 3 , and PbZr x Ti 1-x O 3 , and the metal layer preferably comprises titanium.
- a DRAM capacitor comprises a metal electrode having a textured surface morphology overlayed by a dielectric material having a high dielectric constant and covered by a metal layer.
- the metal electrode of the DRAM capacitor is preferably comprised of a refractory metal, such as tungsten.
- the dielectric material of the DRAM capacitor is preferably comprised of a material selected from the group consisting of Ta 2 O 5 , BaTiO 3 , SrTiO 3 , Ba x Sr 1-x TiO 3 , and PbZr x Ti 1-x O 3 .
- the top electrode layer of the DRAM capacitor preferably comprises a refractory metal, such as titanium.
- FIG. 1 is a schematic section of an exemplary DRAM structure having textured electrodes.
- FIG. 2 is a schematic section of the DRAM structure shown in FIG. 1 illustrating a completed oxide “mold.”
- FIG. 3 is a schematic section of a preferred DRAM electrode after a metal substitution process.
- FIG. 4 is a schematic section of a preferred DRAM electrode after oxide removal.
- FIG. 5 is a schematic section of a preferred DRAM electrode with a deposited dielectric layer.
- FIG. 6 is a schematic section of a completed DRAM structure in accordance with the present invention.
- FIG. 7 is a schematic section of an alternative embodiment of a completed DRAM structure in accordance with the present invention.
- complex metal structures having enhanced surface area advantageous for DRAM storage capacitors are fabricated by first forming rugged or texturized polysilicon (“poly”) electrodes and subsequently subjecting the poly structures to a metal-substitution process.
- the rugged metal electrodes are advantageous for high-density DRAM storage applications because they exhibit a substantially higher conductivity than conventional doped poly electrodes and they are compatible with high- ⁇ dielectric materials such as Ta 2 O 5 , BST, PZT and others.
- the preferred embodiment of the present invention is directed to a novel DRAM storage cell having a rugged metal electrode.
- the inventive aspects are herein disclosed in connection with a preferred process for fabricating rugged metal electrodes in accordance with the aforementioned principles, beginning with the formation of the cell capacitor itself.
- a conventional front-end DRAM cell formation comprises a semiconductor substrate 12 processed to a point where capacitor fabrication begins.
- the DRAM cell may have field oxide regions 16 , active regions 14 , word lines 18 , bit lines 20 , capacitor plugs 22 , and planarizing layer 23 .
- the capacitor structures of the present invention begins with the formation of polysilicon electrodes 24 having a textured or rugged surface region 26 .
- the textured surface 26 increases the electrode surface area without increasing the lateral dimensions of the electrode 24 .
- the silicon electrodes 24 may be formed by depositing a layer of polysilicon or a-Si over the poly plugs 22 and adjacent oxide spacers 28 by well-known chemical vapor deposition processes. A subsequent planarizing process such as a chemical-mechanical polish or anisotropic etch may remove the topmost portion of the layer, yielding the isolated electrode structures 24 .
- the rugged surface 26 may be fabricated by a seeding and anneal process which produces a rough surface morphology comprising relatively large polycrystalline silicon grains of about 50-200 nm.
- a seeding process may for example comprise dispersing a material such as polysilicon or silicon dioxide over the surface which produces nucleation sites on the surface of the silicon electrodes 24 .
- a controlled anneal process then induces accumulation of silicon at the nucleation sites, thereby forming a rough surface morphology having enhanced surface area.
- HSG Hemispherically Grained Silicon
- a next step in accordance with the present embodiment comprises depositing a silicon dioxide (“oxide”) layer over the entire structure and planarizing to produce the filled oxide regions 30 .
- the oxide layer 28 and filled oxide regions 30 thus form a boundary or “mold” between which the metal substitution process shall proceed.
- the next step in the present embodiment is to convert the silicon electrode structure 24 with ruggedized surface 26 to a metal electrode by the general process: a M x R y +b Si ⁇ ax M+ b SiR ay/b
- M x R y is a refractory metal-halide complex such as WF 6
- a, b are appropriate numerical constants.
- refractory metal complexes may be used for the substitution, such as complexes of tungsten, molybdenum, and titanium.
- the silicon comprising the electrode structures 10 may be converted to tungsten (W) by the process: 2WF 6 +3Si ⁇ 2W+3SiF 4 yielding electrodes 32 having rugged surfaces 26 comprised of substantially tungsten metal, as shown in FIG. 3 .
- the process may be carried out in situ by exposing the wafer to the volatile W complex.
- the time required for a substitution will in general depend upon other parameters such as the wafer temperature, W-complex partial pressure and volume of material to be substituted.
- the metal substitution may require 10 or several tens of minutes.
- the process may be accelerated by a chemical-oxide pretreatment, for example comprising exposing the silicon electrode structures 10 to a mixture of ammonia (NH 3 ) and hydrogen peroxide (H 2 O 2 ) prior to the metal substitution process.
- the chemical oxide is shown to assist in the substitution process.
- the metal substitution results in a conversion of the electrode structures 10 into structures comprising substantially of the substituted metal.
- the structures 10 are comprised of substantially W.
- the oxide regions 28 and 30 are removed by wet etching to expose the metal electrode structures to further processing.
- dielectric layer 34 is then deposited conformally over the metal electrode structures 10 as shown in FIG. 5 .
- Preferred dielectric layers comprise materials having high dielectric constant ⁇ , such as Ta 2 O 5 , BaTiO 3 , SrTiO 3 , Ba x Sr 1-x TiO 3 or PbZr x Ti 1-x O 3 . Such materials may be deposited by chemical vapor deposition processes, as is well-known in the art.
- the capacitor structure is completed by deposition of a reference electrode layer 36 , preferably also by a CVD process.
- the reference electrode 36 should minimally comprise a material having high conductivity, and which is also chemically compatible with the dielectric layer 34 .
- CVD titanium or TiN may for example serve as reference electrodes as they are compatible with titanate-based dielectrics.
- alternative embodiments of the complex, rugged metal electrodes may comprise textured surfaces 26 extending over the outer portions of the metal electrodes 38 , thereby providing even greater capacitance.
- the principle of forming rugged metal electrodes may be extended to a variety of capacitor arrangements where good conductivity and high capacitance are requisite in small geometries.
Abstract
Thin film metal-insulator-metal capacitors having enhanced surface area are formed by a substituting metal for silicon in a preformed electrode geometry. The resulting metal structures are advantageous for high-density DRAM applications since they have good conductivity, enhanced surface area and are compatible with capacitor dielectric materials having high dielectric constant.
Description
- This application is a divisional of U.S. application Ser. No. 09/770,540, filed Jan. 26, 2001, which is a continuation of U.S. application Ser. No. 09/161,156, filed Sep. 25, 1998, now issued as U.S. Pat. No. 6,197,634, which is a divisional of U.S. application Ser. No. 08/943,222, filed Oct. 6, 1997, now issued as U.S. Pat. No. 6,015,986, which is a file wrapper continuation of application Ser. No. 08/576,952, filed Dec. 22, 1995, now abandoned.
- The invention relates generally to thin film integrated circuit design and fabrication. In particular, the invention pertains to electrode design and materials used in stacked cell capacitor Dynamic Random Access Memories (DRAM).
- A dynamic random access memory (DRAM) cell typically comprises a charge storage capacitor (or cell capacitor) coupled to an access device such as a Metal-Oxide-Semiconductor Field Effect Transistor (MOSFET). The MOSFET functions to apply or remove charge on the capacitor, thus affecting a logical state defined by the stored charge. The amount of charge stored on the capacitor is determined by the capacitance, C=εA/d, where ε is the dielectric constant of the capacitor dielectric, A is the electrode (or storage node) area and d is the interelectrode spacing. The conditions of DRAM operation such as operating voltage, leakage rate and refresh rate, will in general mandate that a certain minimum charge be stored by the capacitor.
- In the continuing trend to higher memory capacity, the packing density of storage cells must increase, yet each will maintain required capacitance levels. This is a crucial demand of DRAM fabrication technologies if future generations of expanded memory array devices are to be successfully manufactured. Nevertheless, in the trend to higher memory capacity, the packing density of cell capacitors has increased at the expense of available cell area. For example, the area allowed for a single cell in a 64-Mbit DRAM is only about 1.4 μm2. In such limited areas, it is difficult to provide sufficient capacitance using conventional stacked capacitor structures. Yet, design and operational parameters determine the minimum charge required for reliable operation of the memory cell despite decreasing cell area. Several techniques have been developed to increase the total charge capacity of the cell capacitor without significantly affecting the cell area. These include new structures utilizing trench and stacked capacitors, electrodes having textured surface morphology and new capacitor dielectric materials having higher dielectric constants. Recently, for example, a great deal of attention has been given to the development of thin film dielectric materials that possess a dielectric constant significantly greater (>10×) the conventional dielectrics used today, such as silicon oxides or nitrides. Particular attention has been paid to Barium Strontium Titanate (BST), Barium Titanate (BT), Lead Zirconate Titanate (PZT), Tantalum Pentoxide (Ta2O5) and other high dielectric constant materials as a cell dielectric material of choice for DRAMs. These materials, in particular BST, have a high dielectric constant (>300) and low leakage currents which makes them very attractive for high density memory devices. Due to their reactivity and complex processing, these dielectric materials are generally not compatible with the usual polysilicon electrodes. Thus, much effort has been directed to developing suitable metal electrodes for use with such dielectric materials.
- As DRAM density has increased (1 MEG and beyond), thin film capacitors, such as stacked capacitors (STC), trenched capacitors, or combinations thereof, have evolved in attempts to meet minimum space requirements. Many of these designs have become elaborate and difficult to fabricate consistently as well as efficiently. Furthermore, the recent generations of DRAMs (4 MEG, 16 MEG for example) have pushed conventional thin film capacitor technology to the limit of processing capability. In giga-scale STC DRAMs the electrode conductivity plays an important role in device size and performance; thus, two kinds of capacitors have been considered, the three-dimensional metal electrode such as the FIN or CROWN, or the simple metal electrode with higher-permitivity dielectric films. For example, a recent article by T. Kaga et al. (“0.29 μm2 MIM-CROWN Cell and Process Technologies for 1-Gigabit DRAMs,” T. Kaga et al., IEDM '94, pp. 927-929.) discloses a substituted tungsten process for forming three-dimensional metal electrodes from polysilicon “molds.” The article, herein incorporated by reference, discloses a method advantageous for creating metal structures, such as capacitor electrodes; nevertheless the simple structures created thus far are not sufficient to meet the demands of giga-scale DRAM arrays.
- It is an object of the present invention to provide a metal structure having a textured surface morphology. It is another object of the present invention to provide processes by which textured metal structures are fabricated, such processes being compatible with silicon integration technology. It is furthermore an object of the present invention to provide a metal-insulator-metal DRAM capacitor having textured electrodes advantageous for gigabit-scale memory arrays.
- In accordance with one aspect of the present invention a method of forming a textured metal structure comprises first forming a predetermined textured silicon structure having the desired form, and then replacing silicon atoms in the textured structure with metal atoms. A method of forming a predetermined textured structure preferably comprises depositing an amorphous or polycrystalline silicon structure by chemical vapor deposition, and then exposing the structure to a controlled annealing process to form a silicon surface having a textured surface morphology. The metal substitution process preferably comprises exposing the textured structure to a refractory metal-halide complex, and most preferably to WF6.
- In accordance with another aspect of the present invention, a process for fabricating a metal-insulator-metal capacitor on a semiconductor wafer comprises first forming a silicon electrode structure on the semiconductor wafer, texturizing the silicon electrode structure, and then replacing the silicon in the silicon electrode structure with a metal, thereby forming a textured metal electrode. The process further comprises depositing a dielectric layer having a high dielectric constant over the textured metal electrode followed by a metal layer deposited over the dielectric layer. Replacing the silicon in the silicon electrode structure preferably comprises exposing the silicon electrode structure to a refractory metal-halide complex, such as WF6. The dielectric layer preferably comprises a material selected from the group consisting of Ta2O5, BaTiO3, SrTiO3, BaxSr1-x,TiO3, and PbZrxTi1-xO3, and the metal layer preferably comprises titanium.
- In accordance with yet another aspect of the present invention a DRAM capacitor comprises a metal electrode having a textured surface morphology overlayed by a dielectric material having a high dielectric constant and covered by a metal layer. The metal electrode of the DRAM capacitor is preferably comprised of a refractory metal, such as tungsten. The dielectric material of the DRAM capacitor is preferably comprised of a material selected from the group consisting of Ta2O5, BaTiO3, SrTiO3, BaxSr1-xTiO3, and PbZrxTi1-xO3. Furthermore, the top electrode layer of the DRAM capacitor preferably comprises a refractory metal, such as titanium.
- These and other objects and attributes of the present invention will become more fully apparent with the following detailed description and accompanying figures.
-
FIG. 1 is a schematic section of an exemplary DRAM structure having textured electrodes. -
FIG. 2 is a schematic section of the DRAM structure shown inFIG. 1 illustrating a completed oxide “mold.” -
FIG. 3 is a schematic section of a preferred DRAM electrode after a metal substitution process. -
FIG. 4 is a schematic section of a preferred DRAM electrode after oxide removal. -
FIG. 5 is a schematic section of a preferred DRAM electrode with a deposited dielectric layer. -
FIG. 6 is a schematic section of a completed DRAM structure in accordance with the present invention. -
FIG. 7 is a schematic section of an alternative embodiment of a completed DRAM structure in accordance with the present invention. - In accordance with the principles of the present invention, complex metal structures having enhanced surface area advantageous for DRAM storage capacitors are fabricated by first forming rugged or texturized polysilicon (“poly”) electrodes and subsequently subjecting the poly structures to a metal-substitution process. The rugged metal electrodes are advantageous for high-density DRAM storage applications because they exhibit a substantially higher conductivity than conventional doped poly electrodes and they are compatible with high-ε dielectric materials such as Ta2O5, BST, PZT and others. The preferred embodiment of the present invention is directed to a novel DRAM storage cell having a rugged metal electrode. The inventive aspects are herein disclosed in connection with a preferred process for fabricating rugged metal electrodes in accordance with the aforementioned principles, beginning with the formation of the cell capacitor itself.
- Referring to
FIG. 1 , a conventional front-end DRAM cell formation comprises asemiconductor substrate 12 processed to a point where capacitor fabrication begins. At this stage in the fabrication process, the DRAM cell may havefield oxide regions 16,active regions 14, word lines 18,bit lines 20, capacitor plugs 22, andplanarizing layer 23. The capacitor structures of the present invention begins with the formation ofpolysilicon electrodes 24 having a textured orrugged surface region 26. Thetextured surface 26 increases the electrode surface area without increasing the lateral dimensions of theelectrode 24. - Polysilicon or amorphous silicon (a-Si) are preferred materials from which to fabricate the
electrode structure 24 andrugged surface 26. The subsequent metal substitution reaction (to be described) is shown to be effective in faithfully replicating the silicon structure by the substituted metal. Moreover, such reactions are compatable with other silicon fabrication processes and thus are capable of producing complex structures with high dimensional tolerances in a cost-effective manner. For example, thesilicon electrodes 24 may be formed by depositing a layer of polysilicon or a-Si over the poly plugs 22 andadjacent oxide spacers 28 by well-known chemical vapor deposition processes. A subsequent planarizing process such as a chemical-mechanical polish or anisotropic etch may remove the topmost portion of the layer, yielding theisolated electrode structures 24. Therugged surface 26 may be fabricated by a seeding and anneal process which produces a rough surface morphology comprising relatively large polycrystalline silicon grains of about 50-200 nm. Such processes for example are disclosed in U.S. Pat. No. 5,102,832 by M. E. Tuttle, herein incorporated by reference. A seeding process may for example comprise dispersing a material such as polysilicon or silicon dioxide over the surface which produces nucleation sites on the surface of thesilicon electrodes 24. A controlled anneal process then induces accumulation of silicon at the nucleation sites, thereby forming a rough surface morphology having enhanced surface area. The resulting surface morphology, often appearing bulbous, is usually comprised of relatively large polycrystallites, referred to as Hemispherically Grained Silicon (HSG). An exemplary method for forming HSG on complex stacked capacitor structures is disclosed in U.S. Pat. No. 5,340,765 by C. H. Dennison et al., also herein incorporated by reference. It will be appreciated that the processes heretofore disclosed are sufficient to produce a startingelectrode structure 24 having arugged surface 26 in accordance with the present invention. However, the processes themselves are disclosed by way of example, and it will also be appreciated that other processes may be utilized to achieve a similar result. - Beginning with the complex electrode structure shown in
FIG. 1 , and referring now toFIG. 2 , a next step in accordance with the present embodiment comprises depositing a silicon dioxide (“oxide”) layer over the entire structure and planarizing to produce the filledoxide regions 30. Theoxide layer 28 and filledoxide regions 30 thus form a boundary or “mold” between which the metal substitution process shall proceed. - The next step in the present embodiment is to convert the
silicon electrode structure 24 withruggedized surface 26 to a metal electrode by the general process:
aMxRy +bSi→axM+bSiRay/b - where MxRy is a refractory metal-halide complex such as WF6, and a, b are appropriate numerical constants. It is anticipated that a variety of refractory metal complexes may be used for the substitution, such as complexes of tungsten, molybdenum, and titanium. For example, the silicon comprising the
electrode structures 10, may be converted to tungsten (W) by the process:
2WF6+3Si→2W+3SiF4
yieldingelectrodes 32 havingrugged surfaces 26 comprised of substantially tungsten metal, as shown inFIG. 3 . The process may be carried out in situ by exposing the wafer to the volatile W complex. The time required for a substitution will in general depend upon other parameters such as the wafer temperature, W-complex partial pressure and volume of material to be substituted. For the general size of structures considered here, the metal substitution may require 10 or several tens of minutes. The process may be accelerated by a chemical-oxide pretreatment, for example comprising exposing thesilicon electrode structures 10 to a mixture of ammonia (NH3) and hydrogen peroxide (H2O2) prior to the metal substitution process. The chemical oxide is shown to assist in the substitution process. In general, as shown inFIG. 3 , the metal substitution results in a conversion of theelectrode structures 10 into structures comprising substantially of the substituted metal. In the present embodiment, thestructures 10 are comprised of substantially W. As shown inFIG. 4 , theoxide regions - An
appropriate dielectric layer 34 is then deposited conformally over themetal electrode structures 10 as shown inFIG. 5 . Preferred dielectric layers comprise materials having high dielectric constant ε, such as Ta2O5, BaTiO3, SrTiO3, BaxSr1-xTiO3 or PbZrxTi1-xO3. Such materials may be deposited by chemical vapor deposition processes, as is well-known in the art. The capacitor structure is completed by deposition of areference electrode layer 36, preferably also by a CVD process. Thereference electrode 36 should minimally comprise a material having high conductivity, and which is also chemically compatible with thedielectric layer 34. CVD titanium or TiN may for example serve as reference electrodes as they are compatible with titanate-based dielectrics. - As shown in
FIG. 7 , alternative embodiments of the complex, rugged metal electrodes may comprisetextured surfaces 26 extending over the outer portions of themetal electrodes 38, thereby providing even greater capacitance. Clearly the principle of forming rugged metal electrodes may be extended to a variety of capacitor arrangements where good conductivity and high capacitance are requisite in small geometries. - Although described above with reference to the preferred embodiments, modifications within the scope of the invention may be apparent to those skilled in the art, all such modifications are intended to be within the scope of the appended claims.
Claims (14)
1. A method of forming a rugged metal structure comprising:
forming a rugged structure comprised of substantially silicon atoms; and
replacing silicon atoms in the rugged structure with metal atoms.
2. The method of claim 1 , wherein forming the rugged structure comprised of substantially silicon atoms comprises:
depositing an amorphous or polycrystalline silicon structure by chemical vapor deposition; and
annealing the silicon structure to form a silicon surface having a rugged surface morphology.
3. The method of claim 2 , wherein replacing silicon atoms with metal atoms comprises exposing the rugged structure comprised of substantially silicon atoms to a refractory metal-halide complex.
4. The method of claim 3 , wherein the refractory metal-halide complex comprises WF6.
5. The method of claim 4 , further comprising chemically oxidizing the rugged structure prior to exposing the rugged structure to the refractory metal-halide complex.
6. The method of claim 1 , wherein forming the rugged structure comprised of substantially silicon atoms comprises forming hemispherical grained silicon.
7. The method of claim 1 , wherein replacing silicon atoms comprises exposing the rugged structure comprised of substantially silicon atoms to a volatile metal complex.
8. A method of forming an integrated circuit capacitor on a substrate, the method comprising:
forming a rugged silicon electrode structure on the substrate;
forming a metal electrode having a rugged surface on the substrate after forming the rugged silicon electrode by replacing silicon in the rugged silicon electrode structure with metal;
covering said rugged surface with a dielectric; and
covering said dielectric with a second electrode.
9. The method of claim 8 , wherein forming the metal electrode comprises providing a hemispherical grain silicon morphology.
10. The method of claim 8 , wherein forming the rugged silicon electrode structure comprises forming a hemispherically grained silicon structure.
11. The method of claim 10 , wherein forming the hemispherically grained silicon structure comprises seeding and annealing.
12. The method of claim 8 , wherein replacing silicon comprises exposing the rugged silicon electrode structure to a volatile metal complex.
13. The method of claim 12 , wherein the volatile metal complex comprises a metal-halide complex.
14. The method of claim 13 , wherein the metal-halide complex comprises WF6.
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Application Number | Priority Date | Filing Date | Title |
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US11/432,867 US20060216902A1 (en) | 1995-12-22 | 2006-05-12 | Rugged metal electrodes for metal-insulator-metal capacitors |
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Application Number | Priority Date | Filing Date | Title |
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US57695295A | 1995-12-22 | 1995-12-22 | |
US08/943,222 US6015986A (en) | 1995-12-22 | 1997-10-06 | Rugged metal electrodes for metal-insulator-metal capacitors |
US09/161,156 US6197634B1 (en) | 1995-12-22 | 1998-09-25 | Rugged metal electrodes for metal-insulator-metal capacitors |
US09/770,540 US7105405B2 (en) | 1995-12-22 | 2001-01-26 | Rugged metal electrodes for metal-insulator-metal capacitors |
US11/432,867 US20060216902A1 (en) | 1995-12-22 | 2006-05-12 | Rugged metal electrodes for metal-insulator-metal capacitors |
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US09/770,540 Division US7105405B2 (en) | 1995-12-22 | 2001-01-26 | Rugged metal electrodes for metal-insulator-metal capacitors |
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US08/943,222 Expired - Lifetime US6015986A (en) | 1995-12-22 | 1997-10-06 | Rugged metal electrodes for metal-insulator-metal capacitors |
US09/161,156 Expired - Lifetime US6197634B1 (en) | 1995-12-22 | 1998-09-25 | Rugged metal electrodes for metal-insulator-metal capacitors |
US09/770,540 Expired - Fee Related US7105405B2 (en) | 1995-12-22 | 2001-01-26 | Rugged metal electrodes for metal-insulator-metal capacitors |
US11/432,867 Abandoned US20060216902A1 (en) | 1995-12-22 | 2006-05-12 | Rugged metal electrodes for metal-insulator-metal capacitors |
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US08/943,222 Expired - Lifetime US6015986A (en) | 1995-12-22 | 1997-10-06 | Rugged metal electrodes for metal-insulator-metal capacitors |
US09/161,156 Expired - Lifetime US6197634B1 (en) | 1995-12-22 | 1998-09-25 | Rugged metal electrodes for metal-insulator-metal capacitors |
US09/770,540 Expired - Fee Related US7105405B2 (en) | 1995-12-22 | 2001-01-26 | Rugged metal electrodes for metal-insulator-metal capacitors |
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Also Published As
Publication number | Publication date |
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US7105405B2 (en) | 2006-09-12 |
US20010012224A1 (en) | 2001-08-09 |
US6197634B1 (en) | 2001-03-06 |
US6015986A (en) | 2000-01-18 |
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