US20060162822A1 - Capacitor-grade lead wires with increased tensile strength and hardness - Google Patents

Capacitor-grade lead wires with increased tensile strength and hardness Download PDF

Info

Publication number
US20060162822A1
US20060162822A1 US11/388,107 US38810706A US2006162822A1 US 20060162822 A1 US20060162822 A1 US 20060162822A1 US 38810706 A US38810706 A US 38810706A US 2006162822 A1 US2006162822 A1 US 2006162822A1
Authority
US
United States
Prior art keywords
niobium
wire
capacitor
powder
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US11/388,107
Inventor
Richard Malen
Prabhat Kumar
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from PCT/US2003/001822 external-priority patent/WO2004003949A1/en
Application filed by Individual filed Critical Individual
Priority to US11/388,107 priority Critical patent/US20060162822A1/en
Publication of US20060162822A1 publication Critical patent/US20060162822A1/en
Assigned to DRESDNER BANK AG, NIEDERLASSUNG LUXEMBOURG, AS SECURITY AGENT reassignment DRESDNER BANK AG, NIEDERLASSUNG LUXEMBOURG, AS SECURITY AGENT INTELLECTUAL PROPERTY RIGHTS SECURITY AGREEMENT (SENIOR) Assignors: H.C. STARCK INC.
Assigned to DRESDNER BANK AG, NIEDERLASSUNG LUXEMBOURG, AS SECURITY AGENT reassignment DRESDNER BANK AG, NIEDERLASSUNG LUXEMBOURG, AS SECURITY AGENT INTELLECTUAL PROPERTY RIGHTS SECURITY AGREEMENT (SECOND LIEN) Assignors: H.C. STARCK INC.
Assigned to DRESDNER BANK AG, NIEDERLASSUNG LUXEMBOURG, AS SECURITY AGENT reassignment DRESDNER BANK AG, NIEDERLASSUNG LUXEMBOURG, AS SECURITY AGENT INTELLECTUAL PROPERTY RIGHTS SECURITY AGREEMENT (MEZZANINE) Assignors: H.C. STARCK INC.
Assigned to GLAS TRUST CORPORATION LIMITED, AS SECURITY AGENT FOR THE BENEFIT OF THE SECOND LIEN SECURED PARTIES reassignment GLAS TRUST CORPORATION LIMITED, AS SECURITY AGENT FOR THE BENEFIT OF THE SECOND LIEN SECURED PARTIES SECURITY INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: H.C. STARCK INC.
Assigned to GLAS TRUST CORPORATION LIMITED, AS SECURITY AGENT FOR THE BENEFIT OF THE SENIOR SECURED PARTIES reassignment GLAS TRUST CORPORATION LIMITED, AS SECURITY AGENT FOR THE BENEFIT OF THE SENIOR SECURED PARTIES SECURITY INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: H.C. STARCK INC.
Assigned to H.C. STARCK INC. reassignment H.C. STARCK INC. RELEASE BY SECURED PARTY (SEE DOCUMENT FOR DETAILS). Assignors: GLAS TRUST CORPORATION LIMITED
Assigned to H.C. STARCK INC. reassignment H.C. STARCK INC. RELEASE BY SECURED PARTY (SEE DOCUMENT FOR DETAILS). Assignors: GLAS TRUST CORPORATION LIMITED
Assigned to H.C. STARCK INC. reassignment H.C. STARCK INC. RELEASE BY SECURED PARTY (SEE DOCUMENT FOR DETAILS). Assignors: GLAS TRUST CORPORATION LIMITED
Assigned to H.C. STARCK INC. reassignment H.C. STARCK INC. RELEASE BY SECURED PARTY (SEE DOCUMENT FOR DETAILS). Assignors: GLAS TRUST CORPORATION LIMITED
Assigned to H.C. STARCK INC. reassignment H.C. STARCK INC. RELEASE BY SECURED PARTY (SEE DOCUMENT FOR DETAILS). Assignors: GLAS TRUST CORPORATION LIMITED
Abandoned legal-status Critical Current

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C27/00Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/02Alloys based on vanadium, niobium, or tantalum
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/02Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/004Details
    • H01G9/008Terminals
    • H01G9/012Terminals specially adapted for solid capacitors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/004Details
    • H01G9/04Electrodes or formation of dielectric layers thereon
    • H01G9/048Electrodes or formation of dielectric layers thereon characterised by their structure
    • H01G9/052Sintered electrodes
    • H01G9/0525Powder therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/004Details
    • H01G9/04Electrodes or formation of dielectric layers thereon
    • H01G9/048Electrodes or formation of dielectric layers thereon characterised by their structure
    • H01G9/052Sintered electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/15Solid electrolytic capacitors

Definitions

  • the invention relates generally to capacitor lead wires, more particularly to niobium lead wires usable with anode compacts of tantalum or niobium.
  • the invention includes niobium powder metallurgy derived lead wires of niobium doped with silicon, preferably having improved strength and hardness without significant detriment to electrical leakage rating of the wire.
  • Niobium and niobium alloy lead wires with melt source derivation have been used as capacitor lead wires.
  • Pure niobium wires of melt process origin have low electrical leakage at sintering temperatures of 1150° C. and above.
  • the wires are limited in tensile strength and hardness, which make them difficult to work with; this results in low production through put when bonding the wires to the capacitor anode compacts and/or in the course of sintering the compact or prolysis of solid electrolyte with the lead wire attached.
  • Niobium alloys, such as niobium-zirconium have better tensile strength then pure niobium wires of melt process origin and acceptable electrical leakage above 1150° C. However above 1050° C. zirconium diffuses off the wire and contaminates the anode, making it unacceptable as a capacitor lead wire.
  • the invention relates to a process for making a capacitor grade silicone-doped niobium lead-wire comprising (a) forming a low oxygen niobium powder by hydriding a niobium ingot or a niobium bar and grinding or milling the ingot or the bar, and thereby making a powder having a Fisher Average Particle Diameter particle size range of less than about 150 microns, (b) dehyriding the powder, and optionally deoxidizing the powder, forming a low oxygen niobium powder, (c) blending the low oxygen niobium powder with a silicon additive powder and compacting the powder by cold isostatic pressing to a bar; (d) thermomechanically processing the bar into a rod, and (e) subjecting the rod to a combination of rolling and cold drawning steps, and forming the silicon doped wire.
  • the invention also relates to a method made from such a process.
  • the present invention includes a niobium wire made from powder metallurgy (P/M), containing a silicon additive of less than about 600 ppm.
  • P/M powder metallurgy
  • the amount of silicon ranges from about 150 to about 600 ppm.
  • the amount of silicon ranges from about 150 to 300 ppm.
  • the invention imparts a controlled, higher mechanical tensile strength in the niobium wire at finish diameter that exceeds capacitor-grade wire formed from niobium and niobium-zirconium alloys derived directly from ingot metallurgy (I/M).
  • I/M ingot metallurgy
  • the P/M source niobium has oxygen content below 400 ppm, even when silicon is added in an oxide form.
  • the P/M derived niobium, and niobium-silicon wires also have increased hardness that exceeds hardness of capacitor-grade wire of I/M niobium and niobium-zirconium wires and electrical leakage within current specifications at sinter temperatures of about 1150° C. and above, or about 1250 and above.
  • the P/M source material if sintered at well below about 1150° C. or 1250° C. and above, and/or attached to anode compacts sintered below about 1150° C. or below 1250° C. would have higher leakage. But at about 1150° C. or 1250° C. and above, the differences become minimal.
  • FIG. 1 is a chart of the ultimate tensile strength as a function of wire diameter of select niobium and niobium alloy wire of the present invention derived from powder metallurgy compared to niobium and niobium alloy wire derived from ingot metallurgy;
  • FIG. 2 is a chart of electrical DC leakage as a function of sintering temperature of select niobium and niobium alloy wire of the present invention derived from powder metallurgy compared to niobium and niobium alloy wire derived from ingot metallurgy;
  • FIG. 3A-3F are side and front views of examples of capacitor lead wires bonded to anode compacts.
  • FIG. 4 is a chart of electrical DC leakage as a function of sintering temperature of select niobium and niobium alloy wire of the present invention derived from powder metallurgy compared to niobium and niobium alloy wire derived from ingot metallurgy.
  • Niobium powders are formed by hydriding an ingot or bar of niobium and grinding or otherwise milling the ingot or bar to create a powder at a size range of less than 150 microns FAPD (Fisher Average Particle Diameter), dehyriding and deoxidating.
  • FAPD Fisher Average Particle Diameter
  • the hydride-grind process as disclosed in U.S. Pat. No. 3,295,951 of Fincham et al and the deoxidation (with a combined dehydriding deoxidation) is described in U.S. Pat. No. 6,261,337 of Kumar, incorporated herein by reference in their entirety, both said patents are of common assignment with this application and Mr.
  • the niobium powder preferably is attained with an oxygen level below 400 ppm, preferably below 200 ppm.
  • a silicon additive powder is blended with the low oxygen niobium powder, compacted by cold isostatic pressing (at up to 60 KSI) to a preform billet for extrusion or sinter bar preferably yeilding a bar approximately 1.3 inches diameter.
  • the bar is thermomechanically processed to a rod.
  • the rod is then rolled (or swaged) and cold drawn, typically with a schedule of reductions and intermediate anneals as follows:
  • the rod can be rolled (or swaged) and cold drawn, typically with a schedule of reductions and intermediate anneals as follows:
  • the diameter of the wire made in accordance to the invention can range from about 0.005 inches to about 0.1 inches.
  • the wire of the present invention can contain other additional ingredients such as other metals or ingredients typically added to niobium metal, such as tantalum, zirconium, titanium, or mixtures thereof. The types and amounts of these additional ingredients can be the same as those used with conventional niobium and would be known to those skilled in the art. TABLE 1 below lists the chemistry of the specimens used in certain Experiments 1-5 of silicon doped niobium wire of powder metallurgy origin as reduced to 0.5 inch diameter and 0.103 inch diameter.
  • the niobium-silicon wire had a much higher tensile strength and hardness than the niobium-zirconium wire at about 0.050 inches diameter and below.
  • FIGS. 3A-3F Side and front views of examples of niobium-silicon capacitor lead wires of the present invention bonded to anode compacts are illustrated in FIGS. 3A-3F .
  • FIGS. 3A and 3B illustrate a niobium-silicon capacitor lead wire 10 butt welded to an anode compact 12 .
  • FIGS. 3C and 3D illustrate a niobium-silicon capacitor lead wire 10 imbedded for a length 14 within compact 12 .
  • FIGS. 3E and 3F illustrated yet another attachment technique of welding the lead wire 10 to the top 16 of the compact 12 .
  • the lead wire 10 of any of FIGS. 3A-3F and/or the compact 12 of any such figures can be circular or flat (ribbon form) or other shapes.

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Powder Metallurgy (AREA)

Abstract

A capacitor-grade wire made from powder metallurgy containing at least niobium and silicon, wherein the niobium is the highest weight percent metal present in the niobium wire. The wire having a controlled tensile strength at finish diameter exceeds the strength of capacitor-grade wire formed by ingot metallurgy. Also, the powder metallurgy wire hardness exceeds capacitor-grade wire formed from ingot metallurgy with electrical leakage meeting the specifications normally applied to capacitor grade tantalum, niobium or niobium-zirconium lead wire at sinter temperatures of about 1150° C. and above.

Description

    BACKGROUND OF THE INVENTION
  • The invention relates generally to capacitor lead wires, more particularly to niobium lead wires usable with anode compacts of tantalum or niobium. The invention includes niobium powder metallurgy derived lead wires of niobium doped with silicon, preferably having improved strength and hardness without significant detriment to electrical leakage rating of the wire.
  • Niobium and niobium alloy lead wires with melt source derivation have been used as capacitor lead wires. Pure niobium wires of melt process origin have low electrical leakage at sintering temperatures of 1150° C. and above. However the wires are limited in tensile strength and hardness, which make them difficult to work with; this results in low production through put when bonding the wires to the capacitor anode compacts and/or in the course of sintering the compact or prolysis of solid electrolyte with the lead wire attached. Niobium alloys, such as niobium-zirconium have better tensile strength then pure niobium wires of melt process origin and acceptable electrical leakage above 1150° C. However above 1050° C. zirconium diffuses off the wire and contaminates the anode, making it unacceptable as a capacitor lead wire.
  • It is an object of the present invention to improve chemical, mechanical, metallurgical, and functional consistency of capacitor grade lead wires.
  • It is a further object of the present invention to reduce sintering and bonding problems.
  • It is yet a further object of the present invention to improve niobium wire to overcome the above-described disadvantages without significantly impacting the electrical properties of the wire and wire-anode assembly.
  • SUMMARY OF THE INVENTION
  • The invention relates to a process for making a capacitor grade silicone-doped niobium lead-wire comprising (a) forming a low oxygen niobium powder by hydriding a niobium ingot or a niobium bar and grinding or milling the ingot or the bar, and thereby making a powder having a Fisher Average Particle Diameter particle size range of less than about 150 microns, (b) dehyriding the powder, and optionally deoxidizing the powder, forming a low oxygen niobium powder, (c) blending the low oxygen niobium powder with a silicon additive powder and compacting the powder by cold isostatic pressing to a bar; (d) thermomechanically processing the bar into a rod, and (e) subjecting the rod to a combination of rolling and cold drawning steps, and forming the silicon doped wire. The invention also relates to a method made from such a process.
  • The present invention includes a niobium wire made from powder metallurgy (P/M), containing a silicon additive of less than about 600 ppm. Generally, the amount of silicon ranges from about 150 to about 600 ppm. Preferably, the amount of silicon ranges from about 150 to 300 ppm. The invention imparts a controlled, higher mechanical tensile strength in the niobium wire at finish diameter that exceeds capacitor-grade wire formed from niobium and niobium-zirconium alloys derived directly from ingot metallurgy (I/M). Preferably too the P/M source niobium has oxygen content below 400 ppm, even when silicon is added in an oxide form. The P/M derived niobium, and niobium-silicon wires also have increased hardness that exceeds hardness of capacitor-grade wire of I/M niobium and niobium-zirconium wires and electrical leakage within current specifications at sinter temperatures of about 1150° C. and above, or about 1250 and above. The P/M source material if sintered at well below about 1150° C. or 1250° C. and above, and/or attached to anode compacts sintered below about 1150° C. or below 1250° C. would have higher leakage. But at about 1150° C. or 1250° C. and above, the differences become minimal.
  • It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are intended to provide further explanation of the present invention as described.
  • BRIEF DESCRIPTION OF THE DRAWINGS
  • FIG. 1 is a chart of the ultimate tensile strength as a function of wire diameter of select niobium and niobium alloy wire of the present invention derived from powder metallurgy compared to niobium and niobium alloy wire derived from ingot metallurgy;
  • FIG. 2 is a chart of electrical DC leakage as a function of sintering temperature of select niobium and niobium alloy wire of the present invention derived from powder metallurgy compared to niobium and niobium alloy wire derived from ingot metallurgy;
  • FIG. 3A-3F are side and front views of examples of capacitor lead wires bonded to anode compacts; and
  • FIG. 4 is a chart of electrical DC leakage as a function of sintering temperature of select niobium and niobium alloy wire of the present invention derived from powder metallurgy compared to niobium and niobium alloy wire derived from ingot metallurgy.
  • DETAILED DESCRIPTION OF THE INVENTION
  • One of the preferred embodiments of the invention is a lead wire of silicone-doped niobium made as follows. Niobium powders are formed by hydriding an ingot or bar of niobium and grinding or otherwise milling the ingot or bar to create a powder at a size range of less than 150 microns FAPD (Fisher Average Particle Diameter), dehyriding and deoxidating. The hydride-grind process as disclosed in U.S. Pat. No. 3,295,951 of Fincham et al and the deoxidation (with a combined dehydriding deoxidation) is described in U.S. Pat. No. 6,261,337 of Kumar, incorporated herein by reference in their entirety, both said patents are of common assignment with this application and Mr. Kumar as a joint inventor of the present invention. The niobium powder preferably is attained with an oxygen level below 400 ppm, preferably below 200 ppm. A silicon additive powder is blended with the low oxygen niobium powder, compacted by cold isostatic pressing (at up to 60 KSI) to a preform billet for extrusion or sinter bar preferably yeilding a bar approximately 1.3 inches diameter. The bar is thermomechanically processed to a rod. The rod is then rolled (or swaged) and cold drawn, typically with a schedule of reductions and intermediate anneals as follows:
  • Annealed at 2500° F. for 1.5 hours;
  • Rolled to 0.440 inches diameter;
  • Annealed at 2500° F. for 1.5 hours;
  • Reduced to 0.103 inches diameter;
  • Drawn to 0.0346 inches diameter wire;
  • Drawn to a finish diameter.
  • Stated in general terms, the rod can be rolled (or swaged) and cold drawn, typically with a schedule of reductions and intermediate anneals as follows:
  • Annealed at a temperature ranging from about 2100° F. to about 2700° F. for a time ranging from about 0.5 hours to about 2.0 hours;
  • Rolled from a diameter ranging from about 1 inch to about 0.25 inches diameter;
  • Annealed at a temperature ranging from about 2100 to about 2700° F. for a time ranging from about 0.5 hours to about 2.0 hours;
  • Reduced from about 1 inch to about to 0.075 inches diameter;
  • Drawn to a finish diameter.
  • The diameter of the wire made in accordance to the invention can range from about 0.005 inches to about 0.1 inches. The wire of the present invention can contain other additional ingredients such as other metals or ingredients typically added to niobium metal, such as tantalum, zirconium, titanium, or mixtures thereof. The types and amounts of these additional ingredients can be the same as those used with conventional niobium and would be known to those skilled in the art. TABLE 1 below lists the chemistry of the specimens used in certain Experiments 1-5 of silicon doped niobium wire of powder metallurgy origin as reduced to 0.5 inch diameter and 0.103 inch diameter.
    TABLE 1
    PPM C O N Mg Al Si Ti Cr Fe Ni Cu Zr Mo Ta W
    Experiment #
    1 ½″ 88 646 47 114 20 25 20 108 655 157 10 10 20 1388 200
    Experiment #2 ½″ 90 301 42 106 20 158 20 99 574 133 16 10 20 8374 200
    Experiment #3 ½″ 54 322 60 120 0.5 13 6.1 45 225 44 4 5 1 3000 5
    Experiment #4 ½″ 142 358 60 120 1.1 161 5.3 50 255 53 3.5 5 1 10000 7.1
    Experiment #5 ½″ 58 329 72 95 2.7 306 5.5 45 230 53 7 5 1 20000 7.5
    Experiment #1 .103″ 63 173 31 110 2 23 2 140 500 130 4 5 11 1000 55
    Experiment #2 .103″ 71 180 28 105 3 163 2 150 675 150 6.4 5 11 10000 85
    Experiment #3 .103″ 57 262 49 85 5.2 12 7.5 65 100 55 1.9 5 1 5000 6.8
    Experiment #4 .103″ 79 291 52 100 4.1 162 6.1 63 130 65 2.2 5 1 10000 5.7
    Experiment #5 .103″ 61 282 59 80 2.8 294 4.9 63 70 55 1.9 5 1 10000 6.5
  • Wires were prepared from the silicon master blends presented in Experiments 1-5 of TABLE 1, and sample were taken at various size milestones and tested for tensile strength and hardness (Rockwell hardness B scale, HRB). I/M derived niobium-zirconium wires (prior art) were also tested similarly.
    TABLE 2
    Prior
    Art Nb PM Nb PM Nb PM Nb PM Nb PM
    NbZr Exp. # 1 Exp. #2 Exp. #3 Exp. #4 Exp. #5
    Ingot (25 ppm) (150 ppm) (10 ppm) (150 ppm) (300 ppm)
    Size Hardness Tensil Hardness Tensil Hardness Tensil Hardness Tensil Hardness Tensil Hardness Tensil
    In HRB KSI HRB KSI HRB KSI HRB KSI HRB KSI HRB KSI
    0.6 83.7 73 74.3 75.7 76.5 80.2
    0.42 82.4 74.9 73.2 36.7 39.7 43.1
    0.266 89.8 74.4 71 74.3 76.9 79.1
    0.166 89.1 74.5 76.6 79.9 81 81.1
    0.107 87.7 72 81 82 82.5 84.7
    0.103 79.2 85.6 86.1 84.4 86.4 87.5
    0.0933 68.5 41 80.8 53 76.9 55.6
    0.0845 72.3 47 78.7 57.1 79.5 58.32
    0.0765 71.6 47.2 81.4 59.72 82.7 62.5
    0.0693 72.7 52.8 83.4 62.12 82.4 64.86
    0.0627 75.4 55 82.4 68.3 83.7 69.9
    0.0568 75.4 55.9 85 72.53 84.3 75.1
    0.0514 76.9 62.5 83.7 75.6 85.4 77.7 89 119.88 91.5 122.28 98 125.94
    0.0465 77.2 64.4 84 76.1 86.3 78.7 87 124.65 90.5 130.17 96.8 132.48
    0.0422 78.3 66.7 85.4 81.28 84.7 82.7 92.5 126.05 91.7 133.49 97.4 132.83
    0.0382 79 65.5 86.5 83.5 85.8 84.2 88.3 131.23 93.2 138.43 97.6 137.2
    0.0344 85 70.31 88.5 89 85.6 87.7 90 130.57 92.5 143.76 97.5 139.88
    0.02878 83.7 71.22 86.5 93.8 87.1 94.6 93 133.74 94.2 142.57 99.6 141.34
    0.02634 84.7 72.21 88.5 95.2 88.5 96.3 96.7 150.2 99.7 154.8 99.7 174.64
    0.02431 85 72.93 89 101 89.5 99.7 96.4 168.63 98 180.61 98.1 182.2
    0.0223 87.3 74.63 89 99.3 89.9 103.3 99.3 178.14 99.4 180.66 100.3 182.4
    0.02062 87.6 75.88 90.5 103.4 91.4 106.8 98.8 188.97 100.2 206.86 99.7 192.47
    0.01995 87.8 83.56 90.7 112.32 90.7 114.98 99.7 164.45 100.2 172.85 102 158.6
    0.0173 85 82.30 90.1 116.8 90.5 117.66 100.5 168.54 101.5 179.12 101.6 166.84
    0.01537 86.8 73.36 91 119.56 91.2 121 99.7 172.73 103.6 182.28 102.2 172.94
    0.01334 87.8 73.36 90.6 126.95 91 128.43 100 176.76 104.6 187.1 102.2 179.5
  • As can be seen from the results in TABLE 2 and FIG. 1, the niobium-silicon wire had a much higher tensile strength and hardness than the niobium-zirconium wire at about 0.050 inches diameter and below.
  • Also, electrical leakage tests (40 volts at 90%) were conducted for wire (wire-anode assemblies in capacitor test conditions) or anodes with select silicon master blends (Experiments #1 and #2) and presented in FIG. 2. The tests were conducted for anode assemblies with lead wires made at various sintering temperatures. As can be seen from the results in TABLE 3 below and FIG. 2, the niobium-silicon wire is acceptable for use at sintering temperatures of 1250° C. and above, but not lower, complying with the current tantalum capacitor grade wire specification leakage of 0.6 μA/in2 at 1250° C.
    TABLE 3
    (@1250° C.)
    Leakage
    μA/in2
    niobium ingot 0.1
    niobium-zirconium 0.25
    Experiment #1 0.35
    Experiment #2 0.6
    Specification 0.6
  • Side and front views of examples of niobium-silicon capacitor lead wires of the present invention bonded to anode compacts are illustrated in FIGS. 3A-3F. FIGS. 3A and 3B illustrate a niobium-silicon capacitor lead wire 10 butt welded to an anode compact 12. FIGS. 3C and 3D illustrate a niobium-silicon capacitor lead wire 10 imbedded for a length 14 within compact 12. FIGS. 3E and 3F illustrated yet another attachment technique of welding the lead wire 10 to the top 16 of the compact 12. The lead wire 10 of any of FIGS. 3A-3F and/or the compact 12 of any such figures can be circular or flat (ribbon form) or other shapes.
  • Also, electrical leakage tests (40 volts at 90%) were conducted for wire (wire-anode assemblies in capacitor test conditions) or anodes with select silicon master blends ( Experiments # 3, 4 and 5) and presented in FIG. 4. The tests were conducted for anode assemblies with lead wires made at various sintering temperatures. As can be seen from the results in TABLE 4 below and FIG. 4, the niobium-silicon wire is acceptable for use at sintering temperatures of 1150° C. and above, but not lower, complying with the current tantalum capacitor grade wire specification leakage of 0.6 μA/in2 at 1150° C.
    TABLE 4
    (@1150° C.)
    Leakage
    μA/in2
    niobium ingot 0.1
    niobium-zirconium 0.25
    Experiment #3 0.09
    Experiment #4 0.118
    Experiment #5 0.103
    Specification 0.6
  • Artifacts of electrolyte impregnation and pyrolysis cathode attachment and packaging all well known to those skilled in the art are omitted from the figures for convenience of illustration
  • Other embodiments of the present invention will be apparent to those skilled in the art from consideration of the specification and practice of the invention disclosed herein. It is intended that the specification and examples be considered as exemplary only.

Claims (9)

1-9. (canceled)
10. A capacitor grade wire prepared by a process comprising:
(a) forming a low oxygen niobium powder by hydriding a niobium ingot or a niobium bar and grinding or milling the ingot or the bar, and thereby making a powder having a Fisher Average Particle Diameter particle size range of less than about 150 microns;
(b) (i) the niobium powder, and
(ii) deoxidating the dehydrided niobium powder,
thereby forming a low oxygen niobium powder;
(c) blending the low oxygen niobium powder with a silicon additive powder, and compacting the powder blend of low oxygen niobium poser and silicon additive powder by cold isotactic pressing to form a bar;
(d) thermomechanically processing the bar into a rod; and
(e) subjecting the rod to the following sequential steps,
(i) annealing at a temperature of about 2500° F. for 1.5 hours,
(ii) rolling to a diameter of about 0.440 inches,
(iii) annealing at a temperature of about 2500° F. for 1.5 hours,
(iv) reducing to a diameter of about 0.1 inches, and
(v) drawing to a wire having a diameter of at least about 0.005 inches,
thereby forming said capacitor grade wire,
wherein said capacitor grade wire has a tensile strength exceeding the tensile strength of capacitor-grade niobium wire and niobium-zirconium alloys derived directly from ingot metallurgy.
11. The capacitor grade wire of claim 10, wherein the silicon is added in an amount that is less than about 600 ppm.
12. The capacitor grade wire of claim 10, wherein the silicon is added in an amount ranging from about 150 to about 300 ppm.
13-15. (canceled)
16. The capacitor grade wire of claim 10, wherein the wire further comprises a metal component selected from the group consisting of tantalum, zirconium, titanium, and combinations thereof.
17. The capacitor grade wire of claim 10, wherein the niobium powder has an oxygen level that is below about 400 ppm.
18. (canceled)
19. The capacitor grade wire of claim 10 wherein the niobium powder has an oxygen level of less than 200 ppm.
US11/388,107 2003-01-21 2006-03-23 Capacitor-grade lead wires with increased tensile strength and hardness Abandoned US20060162822A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US11/388,107 US20060162822A1 (en) 2003-01-21 2006-03-23 Capacitor-grade lead wires with increased tensile strength and hardness

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
PCT/US2003/001822 WO2004003949A1 (en) 2002-01-24 2003-01-21 Capacitor-grade lead wires with increased tensile strength and hardness
US10/498,174 US7056470B2 (en) 2002-01-24 2003-01-21 Capacitor-grade lead wires with increased tensile strength and hardness
WOPCT/US03/01822 2003-01-21
US11/388,107 US20060162822A1 (en) 2003-01-21 2006-03-23 Capacitor-grade lead wires with increased tensile strength and hardness

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US10/498,174 Division US7056470B2 (en) 2002-01-24 2003-01-21 Capacitor-grade lead wires with increased tensile strength and hardness

Publications (1)

Publication Number Publication Date
US20060162822A1 true US20060162822A1 (en) 2006-07-27

Family

ID=36695449

Family Applications (1)

Application Number Title Priority Date Filing Date
US11/388,107 Abandoned US20060162822A1 (en) 2003-01-21 2006-03-23 Capacitor-grade lead wires with increased tensile strength and hardness

Country Status (1)

Country Link
US (1) US20060162822A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100211147A1 (en) * 2009-02-19 2010-08-19 W. C. Heraeus Gmbh Electrically conducting materials, leads, and cables for stimulation electrodes
US20190287730A1 (en) * 2018-03-15 2019-09-19 Kemet Electronics Corporation Method to Reduce Anode Lead Wire Embrittlement in Capacitors

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3295951A (en) * 1965-02-02 1967-01-03 Nat Res Corp Production of metals
US4235629A (en) * 1977-10-17 1980-11-25 Fansteel Inc. Method for producing an embrittlement-resistant tantalum wire
US6261337B1 (en) * 1999-08-19 2001-07-17 Prabhat Kumar Low oxygen refractory metal powder for powder metallurgy
US6269536B1 (en) * 1996-03-28 2001-08-07 H.C. Starck, Inc. Production of low oxygen metal wire
US6402066B1 (en) * 1999-03-19 2002-06-11 Cabot Corporation Method of making niobium and other metal powders

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3295951A (en) * 1965-02-02 1967-01-03 Nat Res Corp Production of metals
US4235629A (en) * 1977-10-17 1980-11-25 Fansteel Inc. Method for producing an embrittlement-resistant tantalum wire
US6269536B1 (en) * 1996-03-28 2001-08-07 H.C. Starck, Inc. Production of low oxygen metal wire
US6402066B1 (en) * 1999-03-19 2002-06-11 Cabot Corporation Method of making niobium and other metal powders
US6261337B1 (en) * 1999-08-19 2001-07-17 Prabhat Kumar Low oxygen refractory metal powder for powder metallurgy

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100211147A1 (en) * 2009-02-19 2010-08-19 W. C. Heraeus Gmbh Electrically conducting materials, leads, and cables for stimulation electrodes
DE102009009557A1 (en) * 2009-02-19 2010-09-02 W.C. Heraeus Gmbh Electrically conductive materials, leads and cables for stimulation electrodes
US20190287730A1 (en) * 2018-03-15 2019-09-19 Kemet Electronics Corporation Method to Reduce Anode Lead Wire Embrittlement in Capacitors

Similar Documents

Publication Publication Date Title
US10563291B2 (en) Method of forming a sintered nickel-titanium-rare earth (Ni—Ti—Re) alloy
US4999336A (en) Dispersion strengthened metal composites
EP2804711B1 (en) Mixture of powders for preparing a sintered nickel-titanium-rare earth metal (ni-ti-re) alloy
US7056470B2 (en) Capacitor-grade lead wires with increased tensile strength and hardness
EP0144959A2 (en) Powdered metal composite
US7704448B2 (en) High temperature-resistant niobium wire
US20140334964A1 (en) Alpha + beta or beta titanium alloy and method for producing same
JP2005520055A5 (en)
US20060162822A1 (en) Capacitor-grade lead wires with increased tensile strength and hardness
US2883284A (en) Molybdenum base alloys
US20050118052A1 (en) Stabilized grain size refractory metal powder metallurgy mill products
JP2631318B2 (en) Sintered Ti alloy
US5940675A (en) T222 production by powder metallurgy

Legal Events

Date Code Title Description
AS Assignment

Owner name: DRESDNER BANK AG, NIEDERLASSUNG LUXEMBOURG, AS SEC

Free format text: INTELLECTUAL PROPERTY RIGHTS SECURITY AGREEMENT (SENIOR);ASSIGNOR:H.C. STARCK INC.;REEL/FRAME:020036/0759

Effective date: 20071026

Owner name: DRESDNER BANK AG, NIEDERLASSUNG LUXEMBOURG, AS SEC

Free format text: INTELLECTUAL PROPERTY RIGHTS SECURITY AGREEMENT (SECOND LIEN);ASSIGNOR:H.C. STARCK INC.;REEL/FRAME:020036/0851

Effective date: 20071026

Owner name: DRESDNER BANK AG, NIEDERLASSUNG LUXEMBOURG, AS SEC

Free format text: INTELLECTUAL PROPERTY RIGHTS SECURITY AGREEMENT (MEZZANINE);ASSIGNOR:H.C. STARCK INC.;REEL/FRAME:020036/0864

Effective date: 20071026

STCB Information on status: application discontinuation

Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION

AS Assignment

Owner name: GLAS TRUST CORPORATION LIMITED, AS SECURITY AGENT

Free format text: SECURITY INTEREST;ASSIGNOR:H.C. STARCK INC.;REEL/FRAME:038701/0333

Effective date: 20160523

Owner name: GLAS TRUST CORPORATION LIMITED, AS SECURITY AGENT

Free format text: SECURITY INTEREST;ASSIGNOR:H.C. STARCK INC.;REEL/FRAME:038701/0219

Effective date: 20160523

AS Assignment

Owner name: H.C. STARCK INC., GERMANY

Free format text: RELEASE BY SECURED PARTY;ASSIGNOR:GLAS TRUST CORPORATION LIMITED;REEL/FRAME:057993/0198

Effective date: 20211101

Owner name: H.C. STARCK INC., GERMANY

Free format text: RELEASE BY SECURED PARTY;ASSIGNOR:GLAS TRUST CORPORATION LIMITED;REEL/FRAME:057993/0188

Effective date: 20211101

Owner name: H.C. STARCK INC., GERMANY

Free format text: RELEASE BY SECURED PARTY;ASSIGNOR:GLAS TRUST CORPORATION LIMITED;REEL/FRAME:057993/0178

Effective date: 20211101

Owner name: H.C. STARCK INC., GERMANY

Free format text: RELEASE BY SECURED PARTY;ASSIGNOR:GLAS TRUST CORPORATION LIMITED;REEL/FRAME:057993/0103

Effective date: 20211101

Owner name: H.C. STARCK INC., GERMANY

Free format text: RELEASE BY SECURED PARTY;ASSIGNOR:GLAS TRUST CORPORATION LIMITED;REEL/FRAME:057993/0069

Effective date: 20211101