US20040235260A1 - Stack-type capacitor, semiconductor memory device having the same, and methods of manufacturing the capacitor and the semiconductor memory device - Google Patents
Stack-type capacitor, semiconductor memory device having the same, and methods of manufacturing the capacitor and the semiconductor memory device Download PDFInfo
- Publication number
- US20040235260A1 US20040235260A1 US10/830,120 US83012004A US2004235260A1 US 20040235260 A1 US20040235260 A1 US 20040235260A1 US 83012004 A US83012004 A US 83012004A US 2004235260 A1 US2004235260 A1 US 2004235260A1
- Authority
- US
- United States
- Prior art keywords
- layer
- metal layer
- ruthenium
- lower electrode
- capacitor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/60—Electrodes
- H01L28/65—Electrodes comprising a noble metal or a noble metal oxide, e.g. platinum (Pt), ruthenium (Ru), ruthenium dioxide (RuO2), iridium (Ir), iridium dioxide (IrO2)
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/60—Electrodes
- H01L28/75—Electrodes comprising two or more layers, e.g. comprising a barrier layer and a metal layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/60—Electrodes
- H01L28/82—Electrodes with an enlarged surface, e.g. formed by texturisation
- H01L28/90—Electrodes with an enlarged surface, e.g. formed by texturisation having vertical extensions
- H01L28/91—Electrodes with an enlarged surface, e.g. formed by texturisation having vertical extensions made by depositing layers, e.g. by depositing alternating conductive and insulating layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/01—Manufacture or treatment
- H10B12/02—Manufacture or treatment for one transistor one-capacitor [1T-1C] memory cells
- H10B12/03—Making the capacitor or connections thereto
- H10B12/033—Making the capacitor or connections thereto the capacitor extending over the transistor
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Semiconductor Memories (AREA)
Abstract
A stack-type capacitor includes a lower electrode, a dielectric layer formed on the lower electrode, and an upper electrode formed on the dielectric layer, wherein the lower electrode includes a first metal layer having a cylindrical shape and a second metal layer filled in the first metal layer. In the capacitor, an amount of oxygen included in the lower electrode is decreased to suppress oxidation of a TiN layer. Thus, a stable stack-type capacitor may be formed, which increases greatly the performance of highly integrated DRAMs.
Description
- 1. Field of the Invention
- The present invention relates to a stack-type capacitor in which a lower electrode is formed of two different metal layers, a semiconductor memory device including the stack-type capacitor, and methods of manufacturing the capacitor and the semiconductor memory device.
- 2. Description of the Related Art
- As the area occupied by a memory cell is scaled down, cell capacitance decreases. A decrease in the cell capacitance is typically a serious obstacle in increasing the integration density of dynamic random access memory (DRAM) devices. In a memory device, a decrease in the cell capacitance not only lowers the ability to read a memory cell and increases a soft error rate, but also hinders the operation of a device at a low voltage. Therefore, a method for increasing cell capacitance is needed for the manufacture of a highly integrated semiconductor memory device.
- In order to increase a cell capacitance, cylindrical electrodes are used to increase the area of electrodes.
- FIG. 1 illustrates a schematic cross-sectional view of a conventional cylindrical capacitor.
- Referring to FIG. 1, an interlayer dielectric (ILD)11 and an
etch stop layer 12 are deposited on asubstrate 20, and are patterned to form acontact hole 11 a. Thecontact hole 11 a is filled with aconductive plug 13. A lower electrode 14 is formed in a cylindrical shape over theconductive plug 13. Adielectric layer 15 and anupper electrode 16 are sequentially deposited on the lower electrode 14. - The electrodes of the cylindrical capacitor have increased areas, and the cylindrical capacitor has an improved capacitance. The prior art includes a method of manufacturing a cylindrical capacitor in which a hemispherical grain (HSG) is grown on an exposed portion of a cylindrical structure to increase the areas of electrodes.
- However, in a highly integrated memory device using this conventional cylindrical capacitor, the inside of a hollow cylindrical structure is so narrow that inner walls may contact each other. To solve this problem, a filled cylindrical stack-type capacitor (hereinafter, referred to as a “stack-type capacitor”) occupying a narrow area is required. Since the sectional area of the stack-type capacitor is smaller than that of a cylindrical capacitor, the integration density of a memory device may be improved.
- FIG. 2 illustrates a cross-sectional view of a DRAM cell including a stack-type capacitor having a ruthenium (Ru) electrode.
- Referring to FIG. 2, the DRAM cell includes a stack-
type capacitor 40 and aswitching transistor 30. Thetransistor 30 includes an n+-type source region 21 and an n+-type drain region 22, which are formed to be spaced apart from each other in a surface of asubstrate 20 formed of p-type silicon. Agate insulating layer 31 and agate electrode 32 are formed on thesubstrate 20 between thesource region 21 and thedrain region 22. - The stack-
type capacitor 40 is formed on thetransistor 30 via an interlayer dielectric (ILD) 33. To form the stack-type capacitor 40, alower electrode 41, adielectric layer 43, and anupper electrode 44 are sequentially stacked on theILD 33. Thelower electrode 41 and theupper electrode 44 are formed of ruthenium, and adielectric material 42, such as Ta2O5, is filled in thelower electrode 41. Thesource region 21 of thetransistor 30 is electrically connected to thelower electrode 41 of thecapacitor 40 by acontact hole 33 a formed in theILD 33. Thecontact hole 33 a is filled with aconductive plug 34 formed of polysilicon or tungsten. Also, a conductive barrier layer, e.g., aTiN layer 35, is formed between theconductive plug 34 and thelower electrode 41. Theconductive barrier layer 35 is a diffusion barrier layer that prevents mutual diffusion or chemical reactions between theconductive plug 34 and thelower electrode 41. Although it is possible to use a TaN layer or a WN layer, theTiN layer 35 is generally used. TheTiN layer 35 isolates thelower electrode 41 from theconductive plug 34, thereby preventing diffusion from theconductive plug 34 into thelower electrode 41 and exposure of theconductive plug 34 to oxygen during deposition.Reference numeral 45 denotes an etch stop layer to be described later. - This stack-type capacitor of FIG. 2, which takes up a smaller area than the conventional cylindrical capacitor of FIG. 1, is more appropriate for a highly integrated memory device.
- FIGS. 3A through 3E illustrate cross-sectional views for showing a method of manufacturing a semiconductor memory device including the stack-type capacitor of FIG. 2.
- A
transistor 30 is formed on asemiconductor substrate 20 by a known semiconductor manufacturing method. Next, a first ILD 33 is formed on thesemiconductor substrate 20. The first ILD 33 is selectively etched to form acontact hole 33 a, which exposes asource region 21 of thetransistor 30. Thecontact hole 33 a is filled with aconductive plug 34 to connect theconductive plug 34 with thesource region 21, as shown in FIG. 3A. - Thereafter, an
insulating layer 36 is formed on the first ILD 33 to cover theconductive plug 34. Theinsulating layer 36 is selectively etched to expose theconductive plug 34. ATiN layer 35 is deposited by chemical vapor deposition (CVD) on theinsulating layer 36 and then planarized by chemical mechanical polishing (CMP) until theinsulating layer 36 and theTiN layer 35 are exposed, as shown in FIG. 3B. - Thereafter, a SiN
etch stop layer 45 and a SiO2 second ILD 46 are sequentially stacked on theinsulating layer 36 and theTiN layer 35 and then etched by a dry etch process until a portion of theTiN layer 35 is exposed, thereby forming avia hole 46 a. An electrode of the capacitor will be formed in thevia hole 46 a and on the portion of theTiN layer 35 exposed by thevia hole 46 a. Next, aconductive layer 41, e.g., a Ru layer, is formed by CVD to cover the entire surface of theTiN layer 35 exposed by thevia hole 46 a, and a Ta2O5 layer 42 is formed thereon (refer to FIG. 3C). - Next, the resultant structure is planarized by CMP until the
second ILD 46 is exposed, and thesecond ILD 46 is etched by a Hf wet etch process to form a stack-type lower electrode 41 (refer to FIG. 3D). - Next, a
dielectric layer 43 and a Ruupper electrode 44 are sequentially formed on thelower electrode 41, and eventually a stack-type capacitor 40 is completed (refer to FIG. 3E). - However, in this method, when the
lower electrode 41 is formed by depositing a Ru layer using CVD, since oxygen is used for a reaction gas, theTiN layer 35 connected to thelower electrode 41 is oxidized and thus volumetrically expands. The volumetric expansion of theTiN layer 35 causes a vacancy between theTiN layer 35 and the Rulower electrode 41, as shown in the photograph of FIG. 4. Thus, the stack-type capacitor including the Ru lower electrode does not resist and collapses. As shown in FIG. 5, a photograph taken of a storage node shows that a capacitor leans toward and contacts the next capacitor. This degrades electrical properties of the capacitor, thus increasing leakage current. - In an effort to solve these and other problems, the present invention provides a stack-type capacitor including a lower electrode that is formed of two different metals and has improved physical properties and a semiconductor memory device having the same.
- The present invention also provides methods of manufacturing the stack-type capacitor and the semiconductor memory device including the capacitor.
- Accordingly, it is a feature of a first embodiment of the present invention to provide a stack-type capacitor including a lower electrode, a dielectric layer formed on the lower electrode, and an upper electrode formed on the dielectric layer, wherein the lower electrode includes a first metal layer having a cylindrical shape and a second metal layer filled in the first metal layer.
- The first metal layer may be a ruthenium (Ru) layer and the second metal layer may be a nitride and aluminum layer. The nitride and aluminum layer may be a titanium aluminum nitride (TiAlN) layer or a tantalum aluminum nitride layer.
- The upper electrode may be a ruthenium (Ru) layer.
- It is another feature of an embodiment of the present invention to provide a semiconductor memory device including a stack-type capacitor, the device including a transistor and a capacitor, wherein the capacitor includes a lower electrode, a dielectric layer formed on the lower electrode, and an upper electrode formed on the dielectric layer, wherein the lower electrode includes a first metal layer having a cylindrical shape and a second metal layer filled in the first metal layer.
- The transistor may be electrically connected to the capacitor by a conductive plug, and a diffusion barrier layer, i.e., a TiN layer, may be formed between the lower electrode and the conductive plug.
- It is a third feature of an embodiment of the present invention to provide a method of manufacturing a stack-type capacitor, the method including (a) sequentially stacking an etch stop layer and an ILD on a substrate and forming a via hole by patterning the ILD and the etch stop layer, (b) sequentially forming a first metal layer and a second metal layer on the via hole and the ILD, (c) exposing the ILD, (d) forming a lower electrode formed of the first metal layer and the second metal layer by removing the ILD, and (e) sequentially depositing a dielectric layer and an upper electrode on the lower electrode, wherein the first metal layer is formed by atomic layer deposition.
- The first metal layer may be formed of ruthenium and the second metal layer may be formed of titanium aluminum nitride or tantalum aluminum nitride. The upper electrode may be formed of ruthenium.
- Step (b) may include absorbing a Ru precursor to a resultant structure of step (a), purging any remaining Ru precursor, decomposing the Ru precursor by absorbing an oxygen gas to the absorbed Ru precursor layer to form a ruthenium oxide layer, purging any remaining oxygen gas, and reducing the ruthenium oxide layer by supplying a hydrogen gas thereto.
- Before absorbing the Ru precursor, the method may further comprise absorbing iodine (I), which is a halogen-series material, to the resultant structure of step (a).
- It is a third feature of an embodiment of the present invention to provide a method of manufacturing a semiconductor memory device including a stack-type capacitor, the method including (a) forming a transistor on a substrate, (b) forming a first ILD on the substrate, (c) forming a contact hole in the first ILD to expose a predetermined region of the transistor, (d) forming a conductive plug in the contact hole, (e) forming an insulating layer on the first ILD, patterning the insulating layer until the conductive plug is exposed, and forming a diffusion barrier layer on the exposed portion, (f) sequentially stacking an etch stop layer and a second ILD on the first ILD and patterning the second ILD and the etch stop layer to expose the diffusion barrier layer (g) sequentially forming a first metal layer and a second metal layer on a resultant structure of step (f), (h) exposing the second ILD, (i) forming a lower electrode formed of the first metal layer and the second metal layer by removing the second ILD, and (j) sequentially depositing a dielectric layer and an upper electrode on the lower electrode, wherein the first metal layer is formed by atomic layer deposition.
- The above and other features and advantages of the present invention will become more apparent to those of ordinary skill in the art by describing in detail preferred embodiments thereof with reference to the attached drawings in which:
- FIG. 1 illustrates a schematic cross-sectional view of a conventional cylindrical capacitor;
- FIG. 2 illustrates a cross-sectional view of a DRAM cell including a stack-type capacitor having Ru electrodes;
- FIGS. 3A through 3E illustrate cross-sectional views for showing a method of manufacturing a semiconductor memory device including the stack-type capacitor as shown in FIG. 2;
- FIG. 4 is a microscopic photograph of a lower electrode including an oxidized TiN layer;
- FIG. 5 is a microscopic photograph of a storage node in which a capacitor leans toward and contacts the next capacitor;
- FIG. 6 illustrates a cross-sectional view of a DRAM cell including a stack-type capacitor according to an embodiment of the present invention;
- FIG. 7 illustrates a graph showing activity of TiN in an oxidized atmosphere depending on whether or not Al is added to TiN; and
- FIGS. 8A through 8F illustrate cross-sectional views for showing a method of manufacturing a semiconductor memory device including the stack-type capacitor as shown in FIG. 6.
- Korean Patent Application No. 2003-32255, filed on May 21, 2003, and entitled: “Stack-Type Capacitor, Semiconductor Memory Device Having The Same, And Methods Of Manufacturing The Capacitor And The Semiconductor Memory Device,” is incorporated by reference herein in its entirety.
- The present invention will now be described more fully hereinafter with reference to the accompanying drawings, in which preferred embodiments of the invention are shown. The invention may, however, be embodied in different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. In the drawings, the thickness of layers and regions are exaggerated for clarity. It will also be understood that when a layer is referred to as being “on” another layer or substrate, it can be directly on the other layer or substrate, or intervening layers may also be present. Further, it will be understood that when a layer is referred to as being “under” another layer, it can be directly under, and one or more intervening layers may also be present. In addition, it will also be understood that when a layer is referred to as being “between” two layers, it can be the only layer between the two layers, or one or more intervening layers may also be present. Like numbers refer to like elements throughout.
- FIG. 6 illustrates a cross-sectional view of a DRAM cell including a stack-type capacitor according to an embodiment of the present invention.
- Referring to FIG. 6A, the memory device includes a stack-
type capacitor 140 and a switchingtransistor 130. Thetransistor 130 includes an n+-type source region 121 and an n+-type drain region 122, which are formed to be spaced apart from each other on asubstrate 120 formed of p-type silicon. Agate insulating layer 131 and agate electrode 132 as a word line are formed on thesubstrate 120 between thesource region 121 and thedrain region 122. - A stack-
type capacitor 140 is formed on thetransistor 130 via a first interlayer dielectric (ILD) 133. In order to form the stack-type capacitor 140, alower electrode 141, adielectric layer 143, and anupper electrode 144 are sequentially stacked on thefirst ILD 133. Thelower electrode 141 includes acylindrical Ru layer 141 a and a TiAlN layer (or a TaAlN layer) 141 b filled in theRu layer 141 a. Theupper electrode 144 is formed of Ru. Thesource region 121 of thetransistor 130 is electrically connected to thelower electrode 141 of thecapacitor 140 by acontact hole 133 a formed in thefirst ILD 133. Thecontact hole 133 a is filled with aconductive plug 134 formed of polysilicon or tungsten. Also, a conductive barrier layer, e.g., aTiN layer 135, which is a diffusion barrier layer preventing mutual diffusion or chemical reactions between different materials, is formed between theconductive plug 134 and thelower electrode 141. Although it is possible to use a TaN layer or a WN layer, theTiN layer 135 is generally used. TheTiN layer 135 isolates thelower electrode 141 from theconductive plug 134, thereby preventing diffusion from theconductive plug 134 into thelower electrode 141 and exposure of theconductive plug 134 to oxygen during deposition.Reference numeral 145 denotes an etch stop layer. - In the present invention, the
lower electrode 141 is formed of TiAlN to solve structural instability of a capacitor due to oxidation ofTiN 135. That is, as shown in FIG. 7, TiAlN shows a larger activity than TiN in an oxidized atmosphere. Since Al is oxidized earlier than TiN, a partial pressure of oxygen is lowered by the addition of the Al, and oxidation of the TiN is delayed. That is, Al leads a reduced amount of oxygen to react on TiN, thus suppressing oxidation of TiN. - Also, Ru for the
lower electrode 141 is deposited by atomic layer deposition (ALD). The ALD process is a thin-film deposition technique using chemical absorption and desorption of a monatomic layer. In the ALD process, reactants are individually separated and supplied to a chamber in a pulsed mode such that the reactants are deposited on the surface of a substrate by chemical absorption and desorption due to a saturated surface reaction. Meanwhile, a halogen-series material, such as iodine (I), is firstly absorbed on a substrate, where a Ru layer is to be deposited, and then a Ru precursor is absorbed such that the iodine induces decomposition of the Ru precursor. Next, an oxygen gas is absorbed on the Ru precursor layer. Thus, a ligand of the Ru precursor reacts on oxygen and decomposes. The decomposed Ru is oxidized to generate ruthenium oxide. Next, hydrogen is absorbed on the resultant structure and reduces the ruthenium oxide, thereby removing oxygen included in Ru. As a result, oxidation between TiN and Ru, which is used for thelower electrode 141, may be suppressed. - FIGS. 8A through 8F illustrate cross-sectional views for showing a method of manufacturing a semiconductor memory device including the stack-type capacitor as shown in FIG. 6.
- A
transistor 130 is formed on asemiconductor substrate 120 by a known semiconductor manufacturing method. Next, afirst ILD 133 is formed on thesemiconductor substrate 120. Thefirst ILD 133 is selectively etched to form acontact hole 133 a, thereby exposing asource region 121 of thetransistor 130. Then, thecontact hole 133 a is filled with aconductive plug 134 to connect theconductive plug 134 with thesource region 121 as shown in FIG. 8A. - Thereafter, an insulating
layer 136 is formed on thefirst ILD 133 to cover theconductive plug 134. The insulatinglayer 136 is selectively etched until theconductive plug 134 is exposed. Next, aTiN layer 135 is deposited by CVD on the insulatinglayer 136 and planarized by CMP until the insulatinglayer 136 is exposed, thereby forming theTiN layer 135 as illustrated in FIG. 8B. - Thereafter, a SiN
etch stop layer 145 and a SiO2second ILD 146 are sequentially stacked on the insulatinglayer 136 and theTiN layer 135. The SiNetch stop layer 145 and SiO2second ILD 146 are etched using a dry etch process until theTiN layer 135 is exposed, thereby forming a viahole 146 a as shown in FIG. 8C. The viahole 146 a exposes a region where a capacitor electrode will be formed. - A process of forming a
Ru layer 141 a for alower electrode 141 on the viahole 146 a using ALD will now be described. First, a halogen-series material, e.g., iodine, is absorbed on the insulatinglayer 146 and in the viahole 146 a. The halogen-series material reacts on a Ru precursor, which will be used in a subsequent ALD process, and induces decomposition of the Ru precursor. The Ru precursor is absorbed on the entire surface of the insulatinglayer 146 where the iodine is absorbed, to cover the entire exposed surface of theTiN layer 135. Here, the iodine absorbed on the insulatinglayer 146 reacts on the Ru precursor and decomposes Ru from a ligand. Then, any remaining Ru precursor is purged. Next, an oxygen gas is absorbed on the Ru precursor layer. The oxygen gas reacts on the ligand of the Ru precursor and decomposes the Ru precursor, and the decomposed Ru reacts on oxygen, thus generating ruthenium oxide. Then, the oxygen gas is purged. Thereafter, a hydrogen gas is absorbed such that a reaction between oxygen and hydrogen occurs, thus generating water vapor. As a result, the amount of oxygen included in the ruthenium oxide is significantly decreased. By repeating the foregoing steps, theRu layer 141 a having a predetermined thickness is deposited on the viahole 146 a and thesecond ILD 146. - Thereafter, a TiAlN layer (or a TaAlN layer)141 b is deposited by CVD or ALD on the
Ru layer 141 a as shown in FIG. 8D. - Next, the
Ru layer 141 a and theTiAlN layer 141 b are planarized by CMP until the insulatinglayer 146 is exposed. Thesecond ILD 146 is etched using a Hf wet etch process, thereby forming a stack-typelower electrode 141 as shown in FIG. 8E. - Next, a
dielectric layer 143 and a Ruupper electrode layer 144 are sequentially formed on thelower electrode 141 and eventually a stack-type capacitor 140 is completed as shown in FIG. 8F. Thedielectric layer 143 is formed of HfO2, Ta, TiO2, or BST. - As explained thus far, in the present invention, an amount of oxygen in a lower electrode is decreased, thereby suppressing oxidation of a TiN layer. Thus, a stable stack-type capacitor may be formed, which greatly increases the performance of highly integrated DRAMs.
- Preferred embodiments of the present invention have been disclosed herein and, although specific terms are employed, they are used and are to be interpreted in a generic and descriptive sense only and not for purpose of limitation. Accordingly, it will be understood by those of ordinary skill in the art that various changes in form and details may be made without departing from the spirit and scope of the present invention as set forth in the following claims.
Claims (24)
1. A stack-type capacitor comprising:
a lower electrode;
a dielectric layer formed on the lower electrode; and
an upper electrode formed on the dielectric layer,
wherein the lower electrode includes:
a first metal layer having a cylindrical shape; and
a second metal layer filled in the first metal layer.
2. The capacitor as claimed in claim 1 , wherein the first metal layer is a ruthenium layer and the second metal layer is a nitride and aluminum layer.
3. The capacitor as claimed in claim 2 , wherein the nitride and aluminum layer is a titanium aluminum nitride layer or a tantalum aluminum nitride layer.
4. The capacitor as claimed in claim 2 , wherein the upper electrode is a ruthenium layer.
5. A semiconductor memory device including a stack-type capacitor, the device comprising a transistor and a capacitor,
wherein the capacitor includes:
a lower electrode;
a dielectric layer formed on the lower electrode; and
an upper electrode formed on the dielectric layer,
wherein the lower electrode includes:
a first metal layer having a cylindrical shape; and
a second metal layer filled in the first metal layer.
6. The device as claimed in claim 5 , wherein the transistor is electrically connected to the capacitor by a conductive plug.
7. The device as claimed in claim 6 , wherein a diffusion barrier layer is formed between the lower electrode and the conductive plug.
8. The device as claimed in claim 7 , wherein the diffusion barrier layer is a titanium nitride layer.
9. The device as claimed in claim 5 , wherein the first metal layer is a ruthenium layer, and the second metal layer is a nitride and aluminum layer.
10. The device as claimed in claim 9 , wherein the nitride and aluminum layer is a titanium aluminum nitride layer or a tantalum aluminum nitride layer.
11. The device as claimed in claim 9 , wherein the upper electrode is a ruthenium layer.
12. A method of manufacturing a stack-type capacitor, the method comprising:
(a) sequentially stacking an etch stop layer and an interlayer dielectric on a substrate and forming a via hole by patterning the interlayer dielectric and the etch stop layer;
(b) sequentially forming a first metal layer and a second metal layer in the via hole and on the interlayer dielectric;
(c) exposing the interlayer dielectric;
(d) forming a lower electrode formed of the first metal layer and the second metal layer by removing the interlayer dielectric; and
(e) sequentially depositing a dielectric layer and an upper electrode on the lower electrode,
wherein the first metal layer is formed by atomic layer deposition.
13. The method as claimed in claim 12 , wherein the first metal layer is formed of ruthenium and the second metal layer is formed of titanium aluminum nitride or tantalum aluminum nitride.
14. The method as claimed in claim 13 , wherein the upper electrode is formed of ruthenium.
15. The method as claimed in claim 12 , wherein (b) includes:
absorbing a ruthenium precursor to a resultant structure of (a);
purging any remaining ruthenium precursor;
decomposing the ruthenium precursor by absorbing an oxygen gas to the absorbed ruthenium precursor layer, to thereby form a ruthenium oxide layer;
purging any remaining oxygen gas; and
reducing the ruthenium oxide layer by supplying a hydrogen gas thereto.
16. The method as claimed in claim 15 , further comprising absorbing a halogen-series material to the resultant structure of (a) before absorbing the ruthenium precursor.
17. The method as claimed in claim 16 , wherein the halogen-series material is iodine.
18. A method of manufacturing a semiconductor memory device including a stack-type capacitor, the method comprising:
(a) forming a transistor on a substrate;
(b) forming a first interlayer dielectric on the substrate;
(c) forming a contact hole in the first interlayer dielectric to expose a predetermined region of the transistor;
(d) forming a conductive plug in the contact hole;
(e) forming an insulating layer on the first interlayer dielectric, patterning the insulating layer until the conductive plug is exposed, and forming a diffusion barrier layer on the exposed portion;
(f) sequentially stacking an etch stop layer and a second interlayer dielectric on the first interlayer dielectric and patterning the second interlayer dielectric and the etch stop layer to expose the diffusion barrier layer;
(g) sequentially forming a first metal layer and a second metal layer on a resultant structure of (f);
(h) exposing the second interlayer dielectric;
(i) forming a lower electrode formed of the first metal layer and the second metal layer by removing the second interlayer dielectric; and
(j) sequentially depositing a dielectric layer and an upper electrode on the lower electrode,
wherein the first metal layer is formed by atomic layer deposition.
19. The method as claimed in claim 18 , wherein the first metal layer is formed of ruthenium and the second metal layer is formed of titanium aluminum nitride.
20. The method as claimed in claim 19 , wherein the upper electrode is formed of ruthenium.
21. The method as claimed in claim 18 , wherein the diffusion barrier layer is formed of titanium nitride.
22. The method as claimed in claim 21 , wherein (g) includes:
absorbing a ruthenium precursor on a resultant structure of (f);
purging any remaining ruthenium precursor;
decomposing the ruthenium precursor by absorbing an oxygen gas to the absorbed ruthenium precursor layer, to form a ruthenium oxide layer;
purging any remaining oxygen gas; and
reducing the ruthenium oxide layer by supplying a hydrogen gas thereto.
23. The method as claimed in claim 22 , further comprising absorbing a halogen-series material to the resultant structure of (f) before absorbing the ruthenium precursor.
24. The method as claimed in claim 23 , wherein the halogen-series material is iodine.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/289,966 US7875525B2 (en) | 2003-05-21 | 2008-11-07 | Method of manufacturing stack-type capacitor and semiconductor memory device having the stack-type capacitor |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020030032255A KR100988082B1 (en) | 2003-05-21 | 2003-05-21 | Stack type capacitor, memory device having the same and manufacturing method thereof |
KR2003-32255 | 2003-05-21 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/289,966 Division US7875525B2 (en) | 2003-05-21 | 2008-11-07 | Method of manufacturing stack-type capacitor and semiconductor memory device having the stack-type capacitor |
Publications (1)
Publication Number | Publication Date |
---|---|
US20040235260A1 true US20040235260A1 (en) | 2004-11-25 |
Family
ID=33448192
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/830,120 Abandoned US20040235260A1 (en) | 2003-05-21 | 2004-04-23 | Stack-type capacitor, semiconductor memory device having the same, and methods of manufacturing the capacitor and the semiconductor memory device |
US12/289,966 Active 2025-02-05 US7875525B2 (en) | 2003-05-21 | 2008-11-07 | Method of manufacturing stack-type capacitor and semiconductor memory device having the stack-type capacitor |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/289,966 Active 2025-02-05 US7875525B2 (en) | 2003-05-21 | 2008-11-07 | Method of manufacturing stack-type capacitor and semiconductor memory device having the stack-type capacitor |
Country Status (4)
Country | Link |
---|---|
US (2) | US20040235260A1 (en) |
JP (1) | JP2004349707A (en) |
KR (1) | KR100988082B1 (en) |
CN (1) | CN1574365A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006076987A1 (en) * | 2004-12-18 | 2006-07-27 | Aixtron Ag | Method for the self-limited deposition of one or more monolayers and corresponding suitable starting material |
US20070275484A1 (en) * | 2006-05-24 | 2007-11-29 | Seiko Epson Corporation | Ferroelectric memory and method for manufacturing the same |
US20080087930A1 (en) * | 2006-10-11 | 2008-04-17 | Jong-Cheol Lee | Capicitor Using Binary Metal Electrode, Semiconductor Device Having The Capacitor And Method of Fabricating The Same |
US20080157278A1 (en) * | 2006-12-27 | 2008-07-03 | Hynix Semiconductor Inc. | Semiconductor device and method for fabricating the same |
US20080303074A1 (en) * | 2007-03-06 | 2008-12-11 | Seiko Epson Corporation | Semiconductor device and its manufacturing method |
US20090155486A1 (en) * | 2007-12-18 | 2009-06-18 | Micron Technology, Inc. | Methods of making crystalline tantalum pentoxide |
US20090294907A1 (en) * | 2008-06-02 | 2009-12-03 | Stefan Tegen | Semiconductor component with mim capacitor |
US8581352B2 (en) | 2006-08-25 | 2013-11-12 | Micron Technology, Inc. | Electronic devices including barium strontium titanium oxide films |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009253208A (en) * | 2008-04-10 | 2009-10-29 | Elpida Memory Inc | Semiconductor memory device and method of manufacturing the same |
US8354703B2 (en) | 2010-07-15 | 2013-01-15 | International Business Machines Corporation | Semiconductor capacitor |
US8969169B1 (en) | 2013-09-20 | 2015-03-03 | Intermolecular, Inc. | DRAM MIM capacitor using non-noble electrodes |
US10790188B2 (en) * | 2017-10-14 | 2020-09-29 | Applied Materials, Inc. | Seamless ruthenium gap fill |
Citations (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5918118A (en) * | 1997-01-22 | 1999-06-29 | Samsung Electronics Co., Ltd. | Dual deposition methods for forming contact metallizations, capacitors, and memory devices |
US5998824A (en) * | 1995-09-25 | 1999-12-07 | Lg Semicon Co., Ltd. | Capacitor structure having a lower electrode with a rough surface, a plurality of metal layers and a nitridation treated film |
US6180447B1 (en) * | 1997-02-27 | 2001-01-30 | Samsung Electronics Co., Ltd. | Methods for fabricating integrated circuit capacitors including barrier layers having grain boundary filling material |
US20010054730A1 (en) * | 2000-06-07 | 2001-12-27 | Samsung Electronics Co., Ltd. | Metal-insulator-metal capacitor and manufacturing method thereof |
US20020000598A1 (en) * | 1999-12-08 | 2002-01-03 | Sang-Bom Kang | Semiconductor devices having metal layers as barrier layers on upper or lower electrodes of capacitors |
US20020072191A1 (en) * | 2000-11-24 | 2002-06-13 | Nec Corporation | Manufacturing method of semiconductor device |
US6472269B2 (en) * | 1999-10-29 | 2002-10-29 | Samsung Electronics Co., Ltd. | Method for forming capacitor |
US6521494B2 (en) * | 2000-01-26 | 2003-02-18 | Hitachi, Ltd. | Method of manufacturing semiconductor devices utilizing underlayer-dependency of deposition of capacitor electrode film, and semiconductor device |
US20030057445A1 (en) * | 2001-09-12 | 2003-03-27 | Soon-Yong Kweon | Semiconductor device and method for fabricating the same |
US6720604B1 (en) * | 1999-01-13 | 2004-04-13 | Agere Systems Inc. | Capacitor for an integrated circuit |
US20040087085A1 (en) * | 2002-11-04 | 2004-05-06 | Kwang-Hee Lee | Methods for manufacturing semiconductor memory devices |
US6750092B2 (en) * | 1999-12-23 | 2004-06-15 | Samsung Electronics Co., Ltd. | Methods of forming ruthenium film by changing process conditions during chemical vapor deposition and ruthenium films formed thereby |
US6815221B2 (en) * | 2001-09-17 | 2004-11-09 | Samsung Electronics Co., Ltd. | Method for manufacturing capacitor of semiconductor memory device controlling thermal budget |
US20040232463A1 (en) * | 2003-05-23 | 2004-11-25 | Suk-Jin Chung | Capacitors including a cavity containing a buried layer and methods of manufacturing the same |
US20060040444A1 (en) * | 2004-08-20 | 2006-02-23 | Samsung Electronics Co., Ltd. | Method for fabricating a three-dimensional capacitor |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1282911B1 (en) * | 2000-05-15 | 2018-09-05 | Asm International N.V. | Process for producing integrated circuits |
KR20020058573A (en) * | 2000-12-30 | 2002-07-12 | 박종섭 | Semiconductor device and method for fabricating the same |
KR20030055395A (en) * | 2001-12-26 | 2003-07-04 | 주식회사 하이닉스반도체 | A method for forming a capacitor of a semiconductor device |
-
2003
- 2003-05-21 KR KR1020030032255A patent/KR100988082B1/en not_active IP Right Cessation
-
2004
- 2004-04-12 CN CNA2004100343563A patent/CN1574365A/en active Pending
- 2004-04-23 US US10/830,120 patent/US20040235260A1/en not_active Abandoned
- 2004-05-21 JP JP2004151531A patent/JP2004349707A/en not_active Withdrawn
-
2008
- 2008-11-07 US US12/289,966 patent/US7875525B2/en active Active
Patent Citations (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5998824A (en) * | 1995-09-25 | 1999-12-07 | Lg Semicon Co., Ltd. | Capacitor structure having a lower electrode with a rough surface, a plurality of metal layers and a nitridation treated film |
US5918118A (en) * | 1997-01-22 | 1999-06-29 | Samsung Electronics Co., Ltd. | Dual deposition methods for forming contact metallizations, capacitors, and memory devices |
US6180447B1 (en) * | 1997-02-27 | 2001-01-30 | Samsung Electronics Co., Ltd. | Methods for fabricating integrated circuit capacitors including barrier layers having grain boundary filling material |
US6720604B1 (en) * | 1999-01-13 | 2004-04-13 | Agere Systems Inc. | Capacitor for an integrated circuit |
US6472269B2 (en) * | 1999-10-29 | 2002-10-29 | Samsung Electronics Co., Ltd. | Method for forming capacitor |
US20020000598A1 (en) * | 1999-12-08 | 2002-01-03 | Sang-Bom Kang | Semiconductor devices having metal layers as barrier layers on upper or lower electrodes of capacitors |
US6750092B2 (en) * | 1999-12-23 | 2004-06-15 | Samsung Electronics Co., Ltd. | Methods of forming ruthenium film by changing process conditions during chemical vapor deposition and ruthenium films formed thereby |
US6521494B2 (en) * | 2000-01-26 | 2003-02-18 | Hitachi, Ltd. | Method of manufacturing semiconductor devices utilizing underlayer-dependency of deposition of capacitor electrode film, and semiconductor device |
US20010054730A1 (en) * | 2000-06-07 | 2001-12-27 | Samsung Electronics Co., Ltd. | Metal-insulator-metal capacitor and manufacturing method thereof |
US20020072191A1 (en) * | 2000-11-24 | 2002-06-13 | Nec Corporation | Manufacturing method of semiconductor device |
US20030057445A1 (en) * | 2001-09-12 | 2003-03-27 | Soon-Yong Kweon | Semiconductor device and method for fabricating the same |
US6815221B2 (en) * | 2001-09-17 | 2004-11-09 | Samsung Electronics Co., Ltd. | Method for manufacturing capacitor of semiconductor memory device controlling thermal budget |
US20040087085A1 (en) * | 2002-11-04 | 2004-05-06 | Kwang-Hee Lee | Methods for manufacturing semiconductor memory devices |
US20040232463A1 (en) * | 2003-05-23 | 2004-11-25 | Suk-Jin Chung | Capacitors including a cavity containing a buried layer and methods of manufacturing the same |
US20060040444A1 (en) * | 2004-08-20 | 2006-02-23 | Samsung Electronics Co., Ltd. | Method for fabricating a three-dimensional capacitor |
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006076987A1 (en) * | 2004-12-18 | 2006-07-27 | Aixtron Ag | Method for the self-limited deposition of one or more monolayers and corresponding suitable starting material |
US20070009659A1 (en) * | 2004-12-18 | 2007-01-11 | Peter Baumann | Process for the self-limiting deposition of one or more monolayers |
US20070275484A1 (en) * | 2006-05-24 | 2007-11-29 | Seiko Epson Corporation | Ferroelectric memory and method for manufacturing the same |
US9202686B2 (en) | 2006-08-25 | 2015-12-01 | Micron Technology, Inc. | Electronic devices including barium strontium titanium oxide films |
US8581352B2 (en) | 2006-08-25 | 2013-11-12 | Micron Technology, Inc. | Electronic devices including barium strontium titanium oxide films |
US20080087930A1 (en) * | 2006-10-11 | 2008-04-17 | Jong-Cheol Lee | Capicitor Using Binary Metal Electrode, Semiconductor Device Having The Capacitor And Method of Fabricating The Same |
US8298909B2 (en) * | 2006-12-27 | 2012-10-30 | Hynix Semiconductor Inc. | Semiconductor device and method for fabricating the same |
US20080157278A1 (en) * | 2006-12-27 | 2008-07-03 | Hynix Semiconductor Inc. | Semiconductor device and method for fabricating the same |
US7989862B2 (en) * | 2007-03-06 | 2011-08-02 | Seiko Epson Corporation | Semiconductor device and its manufacturing method |
US20080303074A1 (en) * | 2007-03-06 | 2008-12-11 | Seiko Epson Corporation | Semiconductor device and its manufacturing method |
US8012532B2 (en) * | 2007-12-18 | 2011-09-06 | Micron Technology, Inc. | Methods of making crystalline tantalum pentoxide |
US8282988B2 (en) | 2007-12-18 | 2012-10-09 | Micron Technology, Inc | Methods of making crystalline tantalum pentoxide |
US20090155486A1 (en) * | 2007-12-18 | 2009-06-18 | Micron Technology, Inc. | Methods of making crystalline tantalum pentoxide |
US8673390B2 (en) | 2007-12-18 | 2014-03-18 | Micron Technology, Inc. | Methods of making crystalline tantalum pentoxide |
US20090294907A1 (en) * | 2008-06-02 | 2009-12-03 | Stefan Tegen | Semiconductor component with mim capacitor |
US7659602B2 (en) | 2008-06-02 | 2010-02-09 | Qimonda Ag | Semiconductor component with MIM capacitor |
Also Published As
Publication number | Publication date |
---|---|
KR100988082B1 (en) | 2010-10-18 |
JP2004349707A (en) | 2004-12-09 |
KR20040100054A (en) | 2004-12-02 |
US20090075450A1 (en) | 2009-03-19 |
US7875525B2 (en) | 2011-01-25 |
CN1574365A (en) | 2005-02-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7875525B2 (en) | Method of manufacturing stack-type capacitor and semiconductor memory device having the stack-type capacitor | |
US9214467B2 (en) | Method for fabricating capacitor | |
US6846711B2 (en) | Method of making a metal oxide capacitor, including a barrier film | |
US7524724B2 (en) | Method of forming titanium nitride layer and method of fabricating capacitor using the same | |
US6630387B2 (en) | Method for forming capacitor of semiconductor memory device using electroplating method | |
US8017491B2 (en) | Method for fabricating capacitor | |
US20060183301A1 (en) | Method for forming thin film | |
US20040152255A1 (en) | Capacitor with electrodes made of ruthenium and method for patterning layers made of ruthenium or ruthenium(IV) oxide | |
JP2001160617A (en) | Method of manufacturing capacitor of semiconductor memory device by using electroplating method | |
US20060244033A1 (en) | Capacitor, semiconductor device having the same, and method of manufacturing the semiconductor device | |
JP2008166563A (en) | Semiconductor device and method for manufacturing semiconductor device | |
US7514315B2 (en) | Methods of forming capacitor structures having aluminum oxide diffusion barriers | |
US6218258B1 (en) | Method for fabricating semiconductor device including capacitor with improved bottom electrode | |
US7923343B2 (en) | Capacitor of semiconductor device and method for forming the same | |
US7456455B2 (en) | Semiconductor memory device and method for fabricating the same | |
US20040166627A1 (en) | Methods for forming a capacitor on an integrated circuit device at reduced temperatures | |
US20060141702A1 (en) | Method for depositing titanium oxide layer and method for fabricating capacitor by using the same | |
JP2014017461A (en) | Semiconductor device manufacturing method | |
US7608517B2 (en) | Method for forming capacitor of semiconductor device | |
US11804518B2 (en) | Semiconductor device and method of manufacturing the same | |
KR20060038615A (en) | Capacitor and method for fabricating the same | |
JP2000022107A (en) | Semiconductor device and its manufacture | |
JP2004071759A (en) | Semiconductor device and its manufacturing method |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: SAMSUNG ELECTRONICS CO., LTD., KOREA, REPUBLIC OF Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:LEE, JUNG-HYUN;BAIK, HION-SUCK;KIM, SOON-HO;AND OTHERS;REEL/FRAME:015260/0064 Effective date: 20040414 |
|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |