US20040100340A1 - Hybrid n+ and p+ gate-doped voltage variable capacitors to improve linear tuning range in voltage controlled oscillators - Google Patents

Hybrid n+ and p+ gate-doped voltage variable capacitors to improve linear tuning range in voltage controlled oscillators Download PDF

Info

Publication number
US20040100340A1
US20040100340A1 US10/301,943 US30194302A US2004100340A1 US 20040100340 A1 US20040100340 A1 US 20040100340A1 US 30194302 A US30194302 A US 30194302A US 2004100340 A1 US2004100340 A1 US 2004100340A1
Authority
US
United States
Prior art keywords
hybrid
voltage variable
voltage
variable capacitor
gate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
US10/301,943
Other versions
US6737929B1 (en
Inventor
Yan Cui
Jyoti Mondal
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shenzhen Xinguodu Tech Co Ltd
NXP BV
NXP USA Inc
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to US10/301,943 priority Critical patent/US6737929B1/en
Assigned to MOTOROLA, INC. reassignment MOTOROLA, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: CUI, YAN, MONDAL, JYOTI
Assigned to FREESCALE SEMICONDUCTOR, INC. reassignment FREESCALE SEMICONDUCTOR, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: MOTOROLA, INC
Application granted granted Critical
Publication of US6737929B1 publication Critical patent/US6737929B1/en
Publication of US20040100340A1 publication Critical patent/US20040100340A1/en
Assigned to CITIBANK, N.A. AS COLLATERAL AGENT reassignment CITIBANK, N.A. AS COLLATERAL AGENT SECURITY AGREEMENT Assignors: FREESCALE ACQUISITION CORPORATION, FREESCALE ACQUISITION HOLDINGS CORP., FREESCALE HOLDINGS (BERMUDA) III, LTD., FREESCALE SEMICONDUCTOR, INC.
Assigned to CITIBANK, N.A., AS COLLATERAL AGENT reassignment CITIBANK, N.A., AS COLLATERAL AGENT SECURITY AGREEMENT Assignors: FREESCALE SEMICONDUCTOR, INC.
Assigned to CITIBANK, N.A., AS NOTES COLLATERAL AGENT reassignment CITIBANK, N.A., AS NOTES COLLATERAL AGENT SECURITY AGREEMENT Assignors: FREESCALE SEMICONDUCTOR, INC.
Assigned to CITIBANK, N.A., AS NOTES COLLATERAL AGENT reassignment CITIBANK, N.A., AS NOTES COLLATERAL AGENT SECURITY AGREEMENT Assignors: FREESCALE SEMICONDUCTOR, INC.
Assigned to FREESCALE SEMICONDUCTOR, INC. reassignment FREESCALE SEMICONDUCTOR, INC. PATENT RELEASE Assignors: CITIBANK, N.A., AS COLLATERAL AGENT
Assigned to FREESCALE SEMICONDUCTOR, INC. reassignment FREESCALE SEMICONDUCTOR, INC. PATENT RELEASE Assignors: CITIBANK, N.A., AS COLLATERAL AGENT
Assigned to FREESCALE SEMICONDUCTOR, INC. reassignment FREESCALE SEMICONDUCTOR, INC. PATENT RELEASE Assignors: CITIBANK, N.A., AS COLLATERAL AGENT
Assigned to MORGAN STANLEY SENIOR FUNDING, INC. reassignment MORGAN STANLEY SENIOR FUNDING, INC. ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Assignors: CITIBANK, N.A.
Assigned to MORGAN STANLEY SENIOR FUNDING, INC. reassignment MORGAN STANLEY SENIOR FUNDING, INC. ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Assignors: CITIBANK, N.A.
Assigned to MORGAN STANLEY SENIOR FUNDING, INC. reassignment MORGAN STANLEY SENIOR FUNDING, INC. SUPPLEMENT TO THE SECURITY AGREEMENT Assignors: FREESCALE SEMICONDUCTOR, INC.
Assigned to NXP, B.V., F/K/A FREESCALE SEMICONDUCTOR, INC. reassignment NXP, B.V., F/K/A FREESCALE SEMICONDUCTOR, INC. RELEASE BY SECURED PARTY (SEE DOCUMENT FOR DETAILS). Assignors: MORGAN STANLEY SENIOR FUNDING, INC.
Assigned to NXP B.V. reassignment NXP B.V. RELEASE BY SECURED PARTY (SEE DOCUMENT FOR DETAILS). Assignors: MORGAN STANLEY SENIOR FUNDING, INC.
Assigned to NXP USA, INC. reassignment NXP USA, INC. CHANGE OF NAME (SEE DOCUMENT FOR DETAILS). Assignors: FREESCALE SEMICONDUCTOR INC.
Assigned to NXP USA, INC. reassignment NXP USA, INC. CORRECTIVE ASSIGNMENT TO CORRECT THE NATURE OF CONVEYANCE LISTED CHANGE OF NAME SHOULD BE MERGER AND CHANGE PREVIOUSLY RECORDED AT REEL: 040652 FRAME: 0180. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER AND CHANGE OF NAME. Assignors: FREESCALE SEMICONDUCTOR INC.
Assigned to MORGAN STANLEY SENIOR FUNDING, INC. reassignment MORGAN STANLEY SENIOR FUNDING, INC. CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE PATENTS 8108266 AND 8062324 AND REPLACE THEM WITH 6108266 AND 8060324 PREVIOUSLY RECORDED ON REEL 037518 FRAME 0292. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Assignors: CITIBANK, N.A.
Assigned to SHENZHEN XINGUODU TECHNOLOGY CO., LTD. reassignment SHENZHEN XINGUODU TECHNOLOGY CO., LTD. CORRECTIVE ASSIGNMENT TO CORRECT THE TO CORRECT THE APPLICATION NO. FROM 13,883,290 TO 13,833,290 PREVIOUSLY RECORDED ON REEL 041703 FRAME 0536. ASSIGNOR(S) HEREBY CONFIRMS THE THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS.. Assignors: MORGAN STANLEY SENIOR FUNDING, INC.
Assigned to NXP B.V. reassignment NXP B.V. RELEASE BY SECURED PARTY (SEE DOCUMENT FOR DETAILS). Assignors: MORGAN STANLEY SENIOR FUNDING, INC.
Assigned to MORGAN STANLEY SENIOR FUNDING, INC. reassignment MORGAN STANLEY SENIOR FUNDING, INC. CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 037486 FRAME 0517. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Assignors: CITIBANK, N.A.
Assigned to NXP B.V. reassignment NXP B.V. CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040928 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Assignors: MORGAN STANLEY SENIOR FUNDING, INC.
Assigned to NXP, B.V. F/K/A FREESCALE SEMICONDUCTOR, INC. reassignment NXP, B.V. F/K/A FREESCALE SEMICONDUCTOR, INC. CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040925 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Assignors: MORGAN STANLEY SENIOR FUNDING, INC.
Adjusted expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/92Capacitors with potential-jump barrier or surface barrier
    • H01L29/94Metal-insulator-semiconductors, e.g. MOS
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
    • H01L27/08Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/0805Capacitors only
    • H01L27/0808Varactor diodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
    • H01L27/08Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/0805Capacitors only
    • H01L27/0811MIS diodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/92Capacitors with potential-jump barrier or surface barrier
    • H01L29/93Variable capacitance diodes, e.g. varactors
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03BGENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING, BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN A NON-SWITCHING MANNER; GENERATION OF NOISE BY SUCH CIRCUITS
    • H03B5/00Generation of oscillations using amplifier with regenerative feedback from output to input
    • H03B5/08Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance
    • H03B5/12Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device
    • H03B5/1206Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device using multiple transistors for amplification
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03BGENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING, BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN A NON-SWITCHING MANNER; GENERATION OF NOISE BY SUCH CIRCUITS
    • H03B5/00Generation of oscillations using amplifier with regenerative feedback from output to input
    • H03B5/08Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance
    • H03B5/12Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device
    • H03B5/1237Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device comprising means for varying the frequency of the generator
    • H03B5/124Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device comprising means for varying the frequency of the generator the means comprising a voltage dependent capacitance
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03BGENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING, BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN A NON-SWITCHING MANNER; GENERATION OF NOISE BY SUCH CIRCUITS
    • H03B5/00Generation of oscillations using amplifier with regenerative feedback from output to input
    • H03B5/08Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance
    • H03B5/12Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device
    • H03B5/1237Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device comprising means for varying the frequency of the generator
    • H03B5/1293Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device comprising means for varying the frequency of the generator having means for achieving a desired tuning characteristic, e.g. linearising the frequency characteristic across the tuning voltage range

Definitions

  • the invention relates generally to the field of voltage variable capacitors. More particularly, the invention relates to a hybrid voltage variable capacitor.
  • a voltage-controlled oscillator is a circuit that generates an oscillating signal at a frequency proportional to an externally applied control voltage.
  • VCO voltage-controlled oscillator
  • MOS capacitors also known in the art as voltage variable capacitors (VVCs) have been used in tank circuits of VCOs because of their high quality and good capacitance variation versus tuning voltage characteristics.
  • Capacitance variation range is an important consideration in VCO circuit design. Typically, the capacitance variation range of a MOS capacitor starts from a flat-band voltage to a threshold voltage, which may be less than 0.7 volts. Beyond this range, the MOS capacitor tuning (or control) voltage does not cause frequency change in the VCO. A narrow capacitance variation range results in a narrow VCO frequency range.
  • An unsatisfactory approach to increasing the frequency range of a VCO includes utilizing band switching circuits. Adding and deleting capacitance or inductance for each desired band of operation can cause a shift in the oscillation frequency of the VCO. Problems with this technology include the need for more logic control circuits, increased design complexity, and signal degradation.
  • a method for operating a wide band voltage controlled oscillator comprises using a control voltage to tune the capacitance of at least one hybrid n+ and p+ gate-doped voltage variable capacitor of the wide band voltage controlled oscillator.
  • a hybrid voltage variable capacitor includes a substrate, a well adjacent to the substrate, a first and second set of contact elements adjacent to the well, a first channel layer adjacent to the well and bound by the first set of contact elements, a first insulating layer adjacent to the first channel layer, a first electrode adjacent to the first insulating layer, a second channel layer adjacent to the well and bound by the second set of contact elements, a second insulating layer adjacent to the second channel layer, and a second electrode adjacent to the second insulating layer; a capacitance of said hybrid voltage variable capacitor varying as a function of a voltage applied to said first and second set of contact elements.
  • FIG. 1 is a cross-section of a hybrid n+ and p+ gate-doped voltage variable capacitor, representing an embodiment of the invention.
  • FIG. 2 is a combination circuit and block diagram of a simulated hybrid voltage variable capacitor in a capacitance measuring circuit, illustrating an aspect of the invention.
  • FIG. 3 is a graph of a capacitance as function of a control voltage for the circuit of FIG. 2, illustrating an aspect of the invention.
  • FIG. 4 is a block diagram of a wide band voltage controlled oscillator with a hybrid voltage variable capacitance circuit, representing an embodiment of the invention.
  • FIG. 5 is a circuit diagram of a wide band voltage controlled oscillator with a simulated hybrid voltage variable capacitor circuit, representing an embodiment of the invention.
  • FIG. 6 is a graph of a voltage controlled oscillator frequency versus control voltage for the circuit of FIG. 5, illustrating an aspect of the invention.
  • VVC voltage variable capacitor
  • the VVC 100 includes an n+ gate-doped VVC 120 and a p+ gate-doped VVC 130 in a parallel construction.
  • a p-substrate 101 is adjacent to an n-well 102 .
  • the n-well 102 includes two pairs of n+ contact elements 103 , 104 and 113 , 114 , each contact area being coupled to a control (or tuning) voltage 105 .
  • the first pair of n+ contact elements 103 , 104 bounds an accumulated n-type channel 106 .
  • a first insulating layer 107 is adjacent to the n-type channel 106 .
  • the first insulating layer 107 is also adjacent to an n+ layer (n+ electrode) 108 , defining the n+ gate-doped VVC 120 .
  • the second pair of n+ contact elements 113 , 114 bounds another accumulated n-type channel 109 .
  • a second insulating layer 110 is adjacent to the n-type channel 109 .
  • the second insulating layer 110 is also adjacent to a p+ layer (p+ electrode) 111 , defining the p+ gate-doped VVC 130 .
  • the n+ layer 108 and p+ layer 111 may be coupled to a voltage supply 112 .
  • the first and second insulating layers 107 , 110 are silicon dioxide layers (SiO 2 ).
  • a MOS capacitor is a serial combination of an oxide capacitance (oxidation layer) and a channel capacitance below the oxidation layer and on the semiconductor bulk side.
  • the n-well is fabricated on a p-substrate and the n-well is the semiconductor bulk of the MOS capacitor.
  • the oxide capacitance is a fixed value, but the channel capacitance varies with different bias voltage between the gate and the bulk, and the MOS capacitor may be used as a voltage variable capacitor.
  • the capacitance versus bias voltage (C-V curve) shifts according to different work function differences between the gate and the semiconductor bulk.
  • the p+ gate-doped capacitor 130 has a shifted C-V curve from that of the n+ gate-doped capacitor 120 .
  • the hybrid voltage variable capacitor 100 may be utilized in several applications.
  • the invention includes a voltage controlled oscillator with the hybrid voltage variable capacitor 100 in a tank circuit.
  • the hybrid VVC 100 has a larger capacitance variation and linear tuning range compared to standard single n+ or p+ voltage variable capacitors.
  • the invention includes a wide band VCO including the hybrid VVC 100 and operable for use in multi-band applications. In a VCO design, the hybrid VVC 100 can improve the quality of a tank circuit and of the guard band while increasing production yield and simplifying circuit layout.
  • FIG. 2 a combination circuit and block diagram of a simulated hybrid voltage variable capacitor 200 A in capacitance measuring circuit 200 is depicted according to one aspect of the invention.
  • the circuit 200 can be used to determine the capacitance of the simulated hybrid VVC 200 A (including an n+ gate-doped VVC 120 A and a p+ gate-doped VVC 130 A coupled in parallel) as a function of the tuning voltage 105 .
  • a voltage supply 112 is coupled to an inductor 203 and to a reference (ground) 208 .
  • the inductor 203 may be a large inductor (L ⁇ 1H) to serve as an AC block.
  • the tuning voltage 105 is coupled to the simulated hybrid VVC 200 A via a filter comprising a resistor 204 and a fixed value capacitor 205 .
  • a network analyzer 207 is coupled to the simulated hybrid VVC 200 A via another fixed value capacitor 206 .
  • the circuit 200 is a standard capacitance measuring circuit and its operation is well-known to one of ordinary skill in the art.
  • the network analyzer 207 may serve as a port termination, injecting a signal, measuring a reflection, and calculating a scattering parameter as function of the tuning voltage 105 .
  • this procedure can yield a curve representing the capacitance of the simulated hybrid VVC 200 A as function of the tuning voltage 105 .
  • a graph 300 of a capacitance as function of a control voltage for the circuit 200 of FIG. 2 is depicted illustrating an aspect of the invention.
  • the vertical axis is a capacitance in picoFarads and the horizontal axis is the tuning voltage 105 in volts.
  • the tuning voltage 112 was varied from 0 to 5 volts.
  • a first curve 301 shows the simulated hybrid VVC 200 A capacitance as function of the control voltage 105 according to the present invention.
  • a second curve 302 shows the capacitance of a single p+ gate-doped capacitor replacing the simulated hybrid VVC 200 A in circuit 200 as a function of the tuning voltage 105 .
  • a third curve 303 shows the capacitance of a single n+ gate-doped capacitor replacing the simulated hybrid VVC 200 A in circuit 200 as a function of the tuning voltage 105 .
  • Curves 301 , 302 and 303 show that a hybrid n+ and p+ gate-doped VVC has a much larger capacitance variance range than single n+ gate-doped or p+ gate-doped VCCs. More specifically, the hybrid VVC 200 A can provide a capacitance variation at least 3.1 times larger than a standard n+ gate-doped VVC and at least 1.8 larger than a standard p+ gate-doped VVC. Further, the hybrid VVC 200 A can provide a substantially larger VCO tuning range than standard n+ gate-doped or p+ gate-doped VVCs.
  • FIG. 4 a block diagram of a wide band voltage controlled oscillator 400 with hybrid voltage variable capacitance circuits 100 A, 100 B is depicted representing an exemplary embodiment of the invention.
  • a tuning voltage 105 is coupled to the pair of hybrid VVC circuits 100 A, 100 B and to tank circuits 402 A, 402 B via a fixed value capacitor 401 .
  • a voltage supply 112 is coupled to a node between the tank circuits 402 A, 402 B.
  • the tank circuits 402 A, 402 B are coupled to an amplifier circuit 403 .
  • the amplifier circuit 403 is coupled to a bias (or enable) circuit 404 .
  • the tank circuits 402 A, 402 B oscillate with the amplifier circuit 403 .
  • the hybrid VVC circuits 100 A, 100 B may be seen as part of the tank circuits 402 A, 402 B.
  • the tuning voltage 105 may change the capacitance of the hybrid VVCs 100 A, 100 B causing the output frequency of the VCO 400 to vary.
  • the bias circuit 404 may enable or disable operation of the VCO 400 . This type of circuit finds several applications in telecommunications, and is useful for tracking and matching signal frequencies as they shift due to thermal variations, power supply fluctuations, and other sources of frequency shifts.
  • FIG. 5 a circuit diagram of a wide band voltage controlled oscillator 500 with hybrid voltage variable capacitor circuits 200 B, 200 C is depicted according to one aspect of the invention.
  • the tuning voltage 105 is coupled to the pair of simulated hybrid VVC circuits 200 B, 200 C and to a tank circuit 402 C.
  • the hybrid VVC circuit 200 B includes a first n+ gate-doped capacitor 120 B in parallel with a first p+ gate-doped capacitor 130 B.
  • the hybrid VVC circuit 200 C includes a second n+ gate-doped capacitor 120 C in parallel with a second p+ gate-doped capacitor 130 C.
  • the voltage supply 112 is coupled to a node between a pair of inductors 503 , 504 in the tank circuit 402 C.
  • the tank circuit 402 C further includes second, third, and fourth fixed valued capacitors 501 , 502 , 401 and it is coupled to the amplifier circuit 403 .
  • the amplifier circuit 403 is coupled to the bias (or enable) circuit 404 .
  • the tuning voltage 105 may change the capacitance of the hybrid VVC circuits 200 B, 200 C, thereby determining the output frequency of the VCO 500 .
  • the output of the VCO 500 may be differentially probed at outputs 505 , 506 .
  • the pair of simulated hybrid VVC circuits 200 B, 200 C may be seen as an integral tuning branch of the tank circuit 402 C.
  • a graph 600 of a simulated voltage controlled oscillator frequency versus tuning voltage for the circuit 500 of FIG. 5 is depicted illustrating one aspect of the invention.
  • the vertical axis is the output frequency of the VCO 500 in GHz.
  • the horizontal axis is the tuning voltage 105 in volts and as detailed in FIG. 5.
  • the frequency span of the hybrid VCO 500 according to the present invention was seen to be 857 MHz.
  • the frequency span of the hybrid VCO 500 may cover the quad-band GSM VCO and may provide a 200 MHz guard band on both high and low sides.
  • the frequency span of the VCO 500 with p+ gate-doped VVCs replacing the hybrid VVCs 200 B, 200 C was seen to be 698 MHz.
  • the frequency span of the VCO 500 with n+ gate-doped VVCs replacing the hybrid VVCs 200 B, 200 C was seen to be 389 MHz.
  • the invention includes a hybrid structure comprising two parallel VVCs of different n+ and/or p+ dopant density in the gates for further expansion of its tuning range.
  • the invention includes a structure of several hybrid VVCs in a parallel construction.
  • the particular manufacturing process used for the hybrid n+ and p+ gate-doped voltage variable capacitor of the present invention is within the skill level of one of ordinary skill in the art and is not essential as long as it provides the described functionality. Normally those who make or use the invention may select the manufacturing process based upon tooling and energy requirements, the expected application requirements of the final product, and the demands of the overall manufacturing process, as known in the art.
  • a or an as used herein, are defined as one or more than one unless the specification explicitly states otherwise.
  • the term plurality, as used herein, is defined as two or more than two.
  • the term another, as used herein, is defined as at least a second or more.
  • the terms including and/or having, as used herein, are defined as comprising (i.e., open language).
  • the term coupled, as used herein, is defined as connected, although not necessarily directly, and not necessarily mechanically.

Abstract

A method for operating a wide band voltage controlled oscillator comprises using a control voltage to tune the capacitance of at least one hybrid n+ and p+ gate-doped voltage variable capacitor of the wide band voltage controlled oscillator. A hybrid voltage variable capacitor includes a substrate, a well adjacent to the substrate, a first and second set of contact elements adjacent to the well, a first channel layer adjacent to the well and bound by the first set of contact elements, a first insulating layer adjacent to the first channel layer, a first electrode adjacent to the first insulating layer, a second channel layer adjacent to the well and bound by the second set of contact elements, a second insulating layer adjacent to the second channel layer, and a second electrode adjacent to the second insulating layer.

Description

    BACKGROUND OF THE INVENTION
  • 1. Field of the Invention [0001]
  • The invention relates generally to the field of voltage variable capacitors. More particularly, the invention relates to a hybrid voltage variable capacitor. [0002]
  • 2. Discussion of the Related Art [0003]
  • A voltage-controlled oscillator (VCO) is a circuit that generates an oscillating signal at a frequency proportional to an externally applied control voltage. These types of circuits find several applications in telecommunications and are useful for tracking and matching signal frequencies as they shift due to thermal variations, power supply fluctuations, and other sources of frequency shifts. [0004]
  • Metal-oxide semiconductor (MOS) capacitors, also known in the art as voltage variable capacitors (VVCs), have been used in tank circuits of VCOs because of their high quality and good capacitance variation versus tuning voltage characteristics. [0005]
  • Capacitance variation range is an important consideration in VCO circuit design. Typically, the capacitance variation range of a MOS capacitor starts from a flat-band voltage to a threshold voltage, which may be less than 0.7 volts. Beyond this range, the MOS capacitor tuning (or control) voltage does not cause frequency change in the VCO. A narrow capacitance variation range results in a narrow VCO frequency range. [0006]
  • An unsatisfactory approach to increasing the frequency range of a VCO includes utilizing band switching circuits. Adding and deleting capacitance or inductance for each desired band of operation can cause a shift in the oscillation frequency of the VCO. Problems with this technology include the need for more logic control circuits, increased design complexity, and signal degradation. [0007]
  • Thus, there is need for a single wide band VCO with linear tuning range that does not require extra logic control circuits and/or increased design complexity. [0008]
  • SUMMARY OF THE INVENTION
  • There is a need for the following embodiments. Of course, the invention is not limited to these embodiments. [0009]
  • According to an aspect of the invention, a method for operating a wide band voltage controlled oscillator comprises using a control voltage to tune the capacitance of at least one hybrid n+ and p+ gate-doped voltage variable capacitor of the wide band voltage controlled oscillator. [0010]
  • According to another aspect of the invention, a hybrid voltage variable capacitor includes a substrate, a well adjacent to the substrate, a first and second set of contact elements adjacent to the well, a first channel layer adjacent to the well and bound by the first set of contact elements, a first insulating layer adjacent to the first channel layer, a first electrode adjacent to the first insulating layer, a second channel layer adjacent to the well and bound by the second set of contact elements, a second insulating layer adjacent to the second channel layer, and a second electrode adjacent to the second insulating layer; a capacitance of said hybrid voltage variable capacitor varying as a function of a voltage applied to said first and second set of contact elements. [0011]
  • These, and other, embodiments of the invention will be better appreciated and understood when considered in conjunction with the following description and the accompanying drawings. It should be understood, however, that the following description, while indicating various embodiments of the invention and numerous specific details thereof, is given by way of illustration and not of limitation. Many substitutions, modifications, additions and/or rearrangements may be made within the scope of the invention without departing from the spirit thereof, and the invention includes all such substitutions, modifications, additions and/or rearrangements.[0012]
  • BRIEF DESCRIPTION OF THE DRAWINGS
  • The drawings accompanying and forming part of this specification are included to depict certain aspects of the invention. A clearer conception of the invention, and of the components and operation of systems provided with the invention, will become more readily apparent by referring to the exemplary, and therefore nonlimiting, embodiments illustrated in the drawings, wherein like reference numerals (if they occur in more than one view) designate the same or similar elements. The invention may be better understood by reference to one or more of these drawings in combination with the description presented herein. It should be noted that the features illustrated in the drawings are not necessarily drawn to scale. [0013]
  • FIG. 1 is a cross-section of a hybrid n+ and p+ gate-doped voltage variable capacitor, representing an embodiment of the invention. [0014]
  • FIG. 2 is a combination circuit and block diagram of a simulated hybrid voltage variable capacitor in a capacitance measuring circuit, illustrating an aspect of the invention. [0015]
  • FIG. 3 is a graph of a capacitance as function of a control voltage for the circuit of FIG. 2, illustrating an aspect of the invention. [0016]
  • FIG. 4 is a block diagram of a wide band voltage controlled oscillator with a hybrid voltage variable capacitance circuit, representing an embodiment of the invention. [0017]
  • FIG. 5 is a circuit diagram of a wide band voltage controlled oscillator with a simulated hybrid voltage variable capacitor circuit, representing an embodiment of the invention. [0018]
  • FIG. 6 is a graph of a voltage controlled oscillator frequency versus control voltage for the circuit of FIG. 5, illustrating an aspect of the invention.[0019]
  • DETAILED DESCRIPTION
  • The invention and the various features and advantageous details thereof are explained more fully with reference to the nonlimiting embodiments that are illustrated in the accompanying drawings and detailed in the following description. Descriptions of well known starting materials, processing techniques, components and equipment are omitted so as not to unnecessarily obscure the invention in detail. It should be understood, however, that the detailed description and the specific examples, while indicating specific embodiments of the invention, are given by way of illustration only and not by way of limitation. Various substitutions, modifications, additions and/or rearrangements within the spirit and/or scope of the underlying inventive concept will become apparent to one of ordinary skill in the art from this disclosure. [0020]
  • Referring to FIG. 1, a cross-section of a hybrid n+ and p+ gate-doped voltage variable capacitor (VVC) [0021] 100 is depicted according to an exemplary embodiment of the invention. The VVC 100 includes an n+ gate-doped VVC 120 and a p+ gate-doped VVC 130 in a parallel construction. A p-substrate 101 is adjacent to an n-well 102. The n-well 102 includes two pairs of n+ contact elements 103, 104 and 113, 114, each contact area being coupled to a control (or tuning) voltage 105. The first pair of n+ contact elements 103, 104 bounds an accumulated n-type channel 106. A first insulating layer 107 is adjacent to the n-type channel 106. The first insulating layer 107 is also adjacent to an n+ layer (n+ electrode) 108, defining the n+ gate-doped VVC 120. The second pair of n+ contact elements 113, 114 bounds another accumulated n-type channel 109. A second insulating layer 110 is adjacent to the n-type channel 109. The second insulating layer 110 is also adjacent to a p+ layer (p+ electrode) 111, defining the p+ gate-doped VVC 130. The n+ layer 108 and p+ layer 111 may be coupled to a voltage supply 112. In one embodiment, the first and second insulating layers 107, 110 are silicon dioxide layers (SiO2).
  • A MOS capacitor is a serial combination of an oxide capacitance (oxidation layer) and a channel capacitance below the oxidation layer and on the semiconductor bulk side. In an n-well process, the n-well is fabricated on a p-substrate and the n-well is the semiconductor bulk of the MOS capacitor. The oxide capacitance is a fixed value, but the channel capacitance varies with different bias voltage between the gate and the bulk, and the MOS capacitor may be used as a voltage variable capacitor. The capacitance versus bias voltage (C-V curve) shifts according to different work function differences between the gate and the semiconductor bulk. Referring to the hybrid n+ and p+ gate-doped voltage variable capacitor (VVC) [0022] 100, since the p+ doped gate 111 and the n+ doped gate 108 have a work function difference approximately equal to the semiconductor band gap, the p+ gate-doped capacitor 130 has a shifted C-V curve from that of the n+ gate-doped capacitor 120.
  • Still referring to FIG. 1, the hybrid [0023] voltage variable capacitor 100 may be utilized in several applications. In one exemplary embodiment, the invention includes a voltage controlled oscillator with the hybrid voltage variable capacitor 100 in a tank circuit. The hybrid VVC 100 has a larger capacitance variation and linear tuning range compared to standard single n+ or p+ voltage variable capacitors. In another exemplary embodiment, the invention includes a wide band VCO including the hybrid VVC 100 and operable for use in multi-band applications. In a VCO design, the hybrid VVC 100 can improve the quality of a tank circuit and of the guard band while increasing production yield and simplifying circuit layout.
  • Referring to FIG. 2, a combination circuit and block diagram of a simulated hybrid [0024] voltage variable capacitor 200A in capacitance measuring circuit 200 is depicted according to one aspect of the invention. The circuit 200 can be used to determine the capacitance of the simulated hybrid VVC 200A (including an n+ gate-doped VVC 120A and a p+ gate-doped VVC 130A coupled in parallel) as a function of the tuning voltage 105. A voltage supply 112 is coupled to an inductor 203 and to a reference (ground) 208. The inductor 203 may be a large inductor (L˜1H) to serve as an AC block. The tuning voltage 105 is coupled to the simulated hybrid VVC 200A via a filter comprising a resistor 204 and a fixed value capacitor 205. A network analyzer 207 is coupled to the simulated hybrid VVC 200A via another fixed value capacitor 206. The circuit 200 is a standard capacitance measuring circuit and its operation is well-known to one of ordinary skill in the art.
  • Still referring to FIG. 2, the [0025] network analyzer 207 may serve as a port termination, injecting a signal, measuring a reflection, and calculating a scattering parameter as function of the tuning voltage 105. By utilizing a relationship between the scattering parameter and capacitance, this procedure can yield a curve representing the capacitance of the simulated hybrid VVC 200A as function of the tuning voltage 105.
  • Referring to FIG. 3, a [0026] graph 300 of a capacitance as function of a control voltage for the circuit 200 of FIG. 2 is depicted illustrating an aspect of the invention. The vertical axis is a capacitance in picoFarads and the horizontal axis is the tuning voltage 105 in volts. With the frequency of the network analyzer 207 set at 3.7 GHz, the tuning voltage 112 was varied from 0 to 5 volts. A first curve 301 shows the simulated hybrid VVC 200A capacitance as function of the control voltage 105 according to the present invention. A second curve 302 shows the capacitance of a single p+ gate-doped capacitor replacing the simulated hybrid VVC 200A in circuit 200 as a function of the tuning voltage 105. Similarly, a third curve 303 shows the capacitance of a single n+ gate-doped capacitor replacing the simulated hybrid VVC 200A in circuit 200 as a function of the tuning voltage 105.
  • Still referring to FIG. 3, component values remained unchanged in all three simulations. [0027] Curves 301, 302 and 303 show that a hybrid n+ and p+ gate-doped VVC has a much larger capacitance variance range than single n+ gate-doped or p+ gate-doped VCCs. More specifically, the hybrid VVC 200A can provide a capacitance variation at least 3.1 times larger than a standard n+ gate-doped VVC and at least 1.8 larger than a standard p+ gate-doped VVC. Further, the hybrid VVC 200A can provide a substantially larger VCO tuning range than standard n+ gate-doped or p+ gate-doped VVCs.
  • Referring to FIG. 4, a block diagram of a wide band voltage controlled [0028] oscillator 400 with hybrid voltage variable capacitance circuits 100A, 100B is depicted representing an exemplary embodiment of the invention. A tuning voltage 105 is coupled to the pair of hybrid VVC circuits 100A, 100B and to tank circuits 402A, 402B via a fixed value capacitor 401. A voltage supply 112 is coupled to a node between the tank circuits 402A, 402B. The tank circuits 402A, 402B are coupled to an amplifier circuit 403. The amplifier circuit 403 is coupled to a bias (or enable) circuit 404.
  • When in operation, the [0029] tank circuits 402A, 402B oscillate with the amplifier circuit 403. As one of ordinary skill in the art will recognize in light of this disclosure, the hybrid VVC circuits 100A, 100B may be seen as part of the tank circuits 402A, 402B. The tuning voltage 105 may change the capacitance of the hybrid VVCs 100A, 100B causing the output frequency of the VCO 400 to vary. The bias circuit 404 may enable or disable operation of the VCO 400. This type of circuit finds several applications in telecommunications, and is useful for tracking and matching signal frequencies as they shift due to thermal variations, power supply fluctuations, and other sources of frequency shifts.
  • Referring to FIG. 5, a circuit diagram of a wide band voltage controlled [0030] oscillator 500 with hybrid voltage variable capacitor circuits 200B, 200C is depicted according to one aspect of the invention. The tuning voltage 105 is coupled to the pair of simulated hybrid VVC circuits 200B, 200C and to a tank circuit 402C. The hybrid VVC circuit 200B includes a first n+ gate-doped capacitor 120B in parallel with a first p+ gate-doped capacitor 130B. The hybrid VVC circuit 200C includes a second n+ gate-doped capacitor 120C in parallel with a second p+ gate-doped capacitor 130C. The voltage supply 112 is coupled to a node between a pair of inductors 503, 504 in the tank circuit 402C. The tank circuit 402C further includes second, third, and fourth fixed valued capacitors 501, 502, 401 and it is coupled to the amplifier circuit 403. The amplifier circuit 403 is coupled to the bias (or enable) circuit 404.
  • When in operation, the [0031] tuning voltage 105 may change the capacitance of the hybrid VVC circuits 200B, 200C, thereby determining the output frequency of the VCO 500. The output of the VCO 500 may be differentially probed at outputs 505, 506. In practice, the pair of simulated hybrid VVC circuits 200B, 200C may be seen as an integral tuning branch of the tank circuit 402C.
  • Referring to FIG. 6, a [0032] graph 600 of a simulated voltage controlled oscillator frequency versus tuning voltage for the circuit 500 of FIG. 5 is depicted illustrating one aspect of the invention. The vertical axis is the output frequency of the VCO 500 in GHz. The horizontal axis is the tuning voltage 105 in volts and as detailed in FIG. 5. In one simulation 603, the frequency span of the hybrid VCO 500 according to the present invention was seen to be 857 MHz. The frequency span of the hybrid VCO 500 may cover the quad-band GSM VCO and may provide a 200 MHz guard band on both high and low sides. In another simulation 601, the frequency span of the VCO 500 with p+ gate-doped VVCs replacing the hybrid VVCs 200B, 200C was seen to be 698 MHz. In another simulation 602, the frequency span of the VCO 500 with n+ gate-doped VVCs replacing the hybrid VVCs 200B, 200C was seen to be 389 MHz.
  • In one embodiment, the invention includes a hybrid structure comprising two parallel VVCs of different n+ and/or p+ dopant density in the gates for further expansion of its tuning range. In another embodiment, the invention includes a structure of several hybrid VVCs in a parallel construction. [0033]
  • The particular manufacturing process used for the hybrid n+ and p+ gate-doped voltage variable capacitor of the present invention is within the skill level of one of ordinary skill in the art and is not essential as long as it provides the described functionality. Normally those who make or use the invention may select the manufacturing process based upon tooling and energy requirements, the expected application requirements of the final product, and the demands of the overall manufacturing process, as known in the art. [0034]
  • The terms a or an, as used herein, are defined as one or more than one unless the specification explicitly states otherwise. The term plurality, as used herein, is defined as two or more than two. The term another, as used herein, is defined as at least a second or more. The terms including and/or having, as used herein, are defined as comprising (i.e., open language). The term coupled, as used herein, is defined as connected, although not necessarily directly, and not necessarily mechanically. [0035]
  • The appended claims are not to be interpreted as including means-plus-function limitations, unless such a limitation is explicitly recited in a given claim using the phrase(s) “means for” and/or “step for.” Subgeneric embodiments of the invention are delineated by the appended independent claims and their equivalents. Specific embodiments of the invention are differentiated by the appended dependent claims and their equivalents. [0036]

Claims (18)

What is claimed is:
1. A method for operating a wide band voltage controlled oscillator, comprising using a control voltage to tune the capacitance of at least one hybrid n+ and p+ gate-doped voltage variable capacitor of the wide band voltage controlled oscillator.
2. The method of claim 1, further comprising using a supply voltage to bias the hybrid n+ and p+ gate-doped voltage variable capacitor.
3. The method of claim 1, the hybrid n+ and p+ gate-doped voltage variable capacitor comprising a hybrid metal-oxide semiconductor structure comprising n+ and p+ gate-doped voltage variable capacitors in a parallel construction.
4. A hybrid voltage variable capacitor, comprising:
a substrate;
a well adjacent to the substrate;
a first and second set of contact elements adjacent to the well;
a first channel layer adjacent to the well and bound by the first set of contact elements;
a first insulating layer adjacent to the first channel layer;
a first electrode adjacent to the first insulating layer;
a second channel layer adjacent to the well and bound by the second set of contact elements;
a second insulating layer adjacent to the second channel layer; and
a second electrode adjacent to the second insulating layer;
a capacitance of said hybrid voltage variable capacitor varying as a function of a voltage applied to said first and second set of contact elements.
5. The hybrid voltage variable capacitor of claim 4, the substrate comprising a p-type substrate.
6. The hybrid voltage variable capacitor of claim 4, the well comprising an n-type well.
7. The hybrid voltage variable capacitor of claim 4, the first and second set of contact elements comprising n+ contact elements.
8. The hybrid voltage variable capacitor of claim 4, the first electrode comprising an n+ electrode.
9. The hybrid voltage variable capacitor of claim 4, the second electrode comprising a p+ electrode.
10. The hybrid voltage variable capacitor of claim 4, the first and second insulating layers comprising a silicon dioxide layer.
11. The hybrid voltage variable capacitor of claim 4, the first and second contact elements being operable to connect to a tuning voltage.
12. The hybrid voltage variable capacitor of claim 4, the first and second electrodes being operable to connect to a supply voltage.
13. A hybrid voltage variable capacitance structure, comprising at least two parallel n+ and p+ hybrid voltage variable capacitors in a parallel configuration, each hybrid capacitor including:
a substrate;
a well adjacent to the substrate;
a first and second set of contact elements adjacent to the well;
a first channel layer adjacent to the well and bound by the first set of contact elements;
a first insulating layer adjacent to the first channel layer;
a first electrode adjacent to the first insulating layer;
a second channel layer adjacent to the well and bound by the second set of contact elements;
a second insulating layer adjacent to the second channel layer; and
a second electrode adjacent to the second insulating layer;
a capacitance of said hybrid voltage variable capacitance structure varying as a function of a voltage applied to said first and second set of contact elements.
14. The hybrid voltage variable capacitance structure of claim 13, the gates of the parallel n+ and p+ hybrid voltage variable capacitors having different n+ dopant densities.
15. The hybrid voltage variable capacitance structure of claim 13, the gates of the parallel n+ and p+ hybrid voltage variable capacitors having different p+ dopant densities.
16. A wide band voltage controlled oscillator, comprising:
at least one hybrid n+ and p+ gate-doped voltage variable capacitor;
at least one tank circuit coupled to the hybrid n+ and p+ gate-doped voltage variable capacitor;
an amplifier circuit coupled to the tank circuit; and
a bias circuit coupled to the amplifier circuit.
17. The wide band voltage controlled oscillator of claim 16, the hybrid n+ and p+ gate-doped voltage variable capacitor receiving a control voltage for tuning the capacitance of the hybrid n+ and p+ gate-doped voltage variable capacitor.
18. The wide band voltage controlled oscillator of claim 16, the hybrid n+ and p+ gate-doped voltage variable capacitor receiving a supply voltage for biasing the hybrid n+ and p+ gate-doped voltage variable capacitor.
US10/301,943 2002-11-22 2002-11-22 Hybrid n+ and p+ gate-doped voltage variable capacitors to improve linear tuning range in voltage controlled oscillators Expired - Lifetime US6737929B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US10/301,943 US6737929B1 (en) 2002-11-22 2002-11-22 Hybrid n+ and p+ gate-doped voltage variable capacitors to improve linear tuning range in voltage controlled oscillators

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/301,943 US6737929B1 (en) 2002-11-22 2002-11-22 Hybrid n+ and p+ gate-doped voltage variable capacitors to improve linear tuning range in voltage controlled oscillators

Publications (2)

Publication Number Publication Date
US6737929B1 US6737929B1 (en) 2004-05-18
US20040100340A1 true US20040100340A1 (en) 2004-05-27

Family

ID=32298009

Family Applications (1)

Application Number Title Priority Date Filing Date
US10/301,943 Expired - Lifetime US6737929B1 (en) 2002-11-22 2002-11-22 Hybrid n+ and p+ gate-doped voltage variable capacitors to improve linear tuning range in voltage controlled oscillators

Country Status (1)

Country Link
US (1) US6737929B1 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050127411A1 (en) * 2003-03-03 2005-06-16 Fujitsu Limited Mos type variable capacitance device
US20080048236A1 (en) * 2006-07-21 2008-02-28 Integrant Technologies Inc. Parallel varactor capacitor
US20110044415A1 (en) * 2009-08-19 2011-02-24 Ikanos Communications, Inc. Adaptive integrated hybrid with complex adaptation for digital subscriber line systems

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0214206D0 (en) * 2002-06-19 2002-07-31 Filtronic Compound Semiconduct A micro-electromechanical variable capacitor
JP2004214408A (en) * 2002-12-27 2004-07-29 Nec Electronics Corp Voltage controlled variable capacitor element
JP2006237463A (en) * 2005-02-28 2006-09-07 Matsushita Electric Ind Co Ltd Mos variable capacitor, and voltage-control oscillator using same
JP2007081626A (en) * 2005-09-13 2007-03-29 Sony Corp Solid-state image pickup element and adjustment method thereof
US7821097B2 (en) * 2006-06-05 2010-10-26 International Business Machines Corporation Lateral passive device having dual annular electrodes
KR102117351B1 (en) * 2013-12-02 2020-06-01 에스케이하이닉스 주식회사 Semiconductor device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6351020B1 (en) * 1999-11-12 2002-02-26 Motorola, Inc. Linear capacitor structure in a CMOS process
US6608747B1 (en) * 2002-09-26 2003-08-19 Oki Electric Industry Co., Ltd. Variable-capacitance device and voltage-controlled oscillator

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6351020B1 (en) * 1999-11-12 2002-02-26 Motorola, Inc. Linear capacitor structure in a CMOS process
US6608747B1 (en) * 2002-09-26 2003-08-19 Oki Electric Industry Co., Ltd. Variable-capacitance device and voltage-controlled oscillator

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050127411A1 (en) * 2003-03-03 2005-06-16 Fujitsu Limited Mos type variable capacitance device
US7622760B2 (en) * 2003-03-03 2009-11-24 Fujitsu Microelectronics Limited MOS type variable capacitance device
US20080048236A1 (en) * 2006-07-21 2008-02-28 Integrant Technologies Inc. Parallel varactor capacitor
US7781821B2 (en) * 2006-07-21 2010-08-24 Integrant Technologies Inc. Parallel varactor capacitor with varying capacitance
US20110044415A1 (en) * 2009-08-19 2011-02-24 Ikanos Communications, Inc. Adaptive integrated hybrid with complex adaptation for digital subscriber line systems
US8619969B2 (en) * 2009-08-19 2013-12-31 Ikanos Communications, Inc. Adaptive integrated hybrid with complex adaptation for digital subscriber line systems

Also Published As

Publication number Publication date
US6737929B1 (en) 2004-05-18

Similar Documents

Publication Publication Date Title
JP4666564B2 (en) Tunable voltage controlled oscillator
Svelto et al. A 1.3 GHz low-phase noise fully tunable CMOS LC VCO
US9800204B2 (en) Integrated circuit capacitor including dual gate silicon-on-insulator transistor
US8665030B2 (en) Voltage-controlled oscillator
US20090184739A1 (en) Dual-injection locked frequency dividing circuit
US7218182B2 (en) Voltage controlled oscillator
US7268634B2 (en) Dual-mode voltage controlled oscillator using integrated variable inductors
US7369008B2 (en) MOS varactor and voltage-controlled oscillator using the same
US8098109B2 (en) Differential varactor circuit for a voltage controlled oscillator
US20050206465A1 (en) Voltage control oscillator
US6737929B1 (en) Hybrid n+ and p+ gate-doped voltage variable capacitors to improve linear tuning range in voltage controlled oscillators
Tohidian et al. Dual-core high-swing class-C oscillator with ultra-low phase noise
KR19990030147A (en) Wide Frequency Range and Low Noise Voltage Controlled Oscillators for Integrated Circuit Manufacturing
US20090072919A1 (en) Voltage-controlled oscillator with wide oscillation frequency range and linear characteristics
US7098751B1 (en) Tunable capacitance circuit for voltage control oscillator
Meng et al. A novel variable inductor-based differential Colpitts VCO design with 17% frequency tuning range for 30 and 60 GHz applications
US8115281B2 (en) Differential varactor
US20040012450A1 (en) Broadband voltage controlled oscillator supporting improved phase noise
JP4511223B2 (en) Voltage controlled oscillator integrated circuit
US7642871B2 (en) Surface acoustic wave oscillator and method of varying frequency thereof
JP2000252480A (en) Mos capacitor and semiconductor integrated circuit device
KR100572128B1 (en) A voltage controlled oscillator using LC resonator
Mostafa et al. A fully integrated sub-1 V 4 GHz CMOS VCO, and a 10.5 GHz oscillator
Maheshwari et al. Design & optimization of switched capacitor array based differential CMOS LC VCO for wide band application
Saad et al. An L, S and S2 bands, compliant LC-based DCO for amateur Nano-satellite applications

Legal Events

Date Code Title Description
AS Assignment

Owner name: MOTOROLA, INC., ILLINOIS

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:CUI, YAN;MONDAL, JYOTI;REEL/FRAME:013515/0312

Effective date: 20021122

STCF Information on status: patent grant

Free format text: PATENTED CASE

AS Assignment

Owner name: FREESCALE SEMICONDUCTOR, INC., TEXAS

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:MOTOROLA, INC;REEL/FRAME:015360/0718

Effective date: 20040404

Owner name: FREESCALE SEMICONDUCTOR, INC.,TEXAS

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:MOTOROLA, INC;REEL/FRAME:015360/0718

Effective date: 20040404

AS Assignment

Owner name: CITIBANK, N.A. AS COLLATERAL AGENT, NEW YORK

Free format text: SECURITY AGREEMENT;ASSIGNORS:FREESCALE SEMICONDUCTOR, INC.;FREESCALE ACQUISITION CORPORATION;FREESCALE ACQUISITION HOLDINGS CORP.;AND OTHERS;REEL/FRAME:018855/0129

Effective date: 20061201

Owner name: CITIBANK, N.A. AS COLLATERAL AGENT,NEW YORK

Free format text: SECURITY AGREEMENT;ASSIGNORS:FREESCALE SEMICONDUCTOR, INC.;FREESCALE ACQUISITION CORPORATION;FREESCALE ACQUISITION HOLDINGS CORP.;AND OTHERS;REEL/FRAME:018855/0129

Effective date: 20061201

FPAY Fee payment

Year of fee payment: 4

FEPP Fee payment procedure

Free format text: PAYOR NUMBER ASSIGNED (ORIGINAL EVENT CODE: ASPN); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY

FEPP Fee payment procedure

Free format text: PAYOR NUMBER ASSIGNED (ORIGINAL EVENT CODE: ASPN); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY

Free format text: PAYER NUMBER DE-ASSIGNED (ORIGINAL EVENT CODE: RMPN); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY

AS Assignment

Owner name: CITIBANK, N.A., AS COLLATERAL AGENT,NEW YORK

Free format text: SECURITY AGREEMENT;ASSIGNOR:FREESCALE SEMICONDUCTOR, INC.;REEL/FRAME:024397/0001

Effective date: 20100413

Owner name: CITIBANK, N.A., AS COLLATERAL AGENT, NEW YORK

Free format text: SECURITY AGREEMENT;ASSIGNOR:FREESCALE SEMICONDUCTOR, INC.;REEL/FRAME:024397/0001

Effective date: 20100413

FPAY Fee payment

Year of fee payment: 8

AS Assignment

Owner name: CITIBANK, N.A., AS NOTES COLLATERAL AGENT, NEW YOR

Free format text: SECURITY AGREEMENT;ASSIGNOR:FREESCALE SEMICONDUCTOR, INC.;REEL/FRAME:030633/0424

Effective date: 20130521

AS Assignment

Owner name: CITIBANK, N.A., AS NOTES COLLATERAL AGENT, NEW YOR

Free format text: SECURITY AGREEMENT;ASSIGNOR:FREESCALE SEMICONDUCTOR, INC.;REEL/FRAME:031591/0266

Effective date: 20131101

FPAY Fee payment

Year of fee payment: 12

AS Assignment

Owner name: FREESCALE SEMICONDUCTOR, INC., TEXAS

Free format text: PATENT RELEASE;ASSIGNOR:CITIBANK, N.A., AS COLLATERAL AGENT;REEL/FRAME:037356/0143

Effective date: 20151207

Owner name: FREESCALE SEMICONDUCTOR, INC., TEXAS

Free format text: PATENT RELEASE;ASSIGNOR:CITIBANK, N.A., AS COLLATERAL AGENT;REEL/FRAME:037356/0553

Effective date: 20151207

Owner name: FREESCALE SEMICONDUCTOR, INC., TEXAS

Free format text: PATENT RELEASE;ASSIGNOR:CITIBANK, N.A., AS COLLATERAL AGENT;REEL/FRAME:037354/0225

Effective date: 20151207

AS Assignment

Owner name: MORGAN STANLEY SENIOR FUNDING, INC., MARYLAND

Free format text: ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS;ASSIGNOR:CITIBANK, N.A.;REEL/FRAME:037486/0517

Effective date: 20151207

AS Assignment

Owner name: MORGAN STANLEY SENIOR FUNDING, INC., MARYLAND

Free format text: ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS;ASSIGNOR:CITIBANK, N.A.;REEL/FRAME:037518/0292

Effective date: 20151207

AS Assignment

Owner name: MORGAN STANLEY SENIOR FUNDING, INC., MARYLAND

Free format text: SUPPLEMENT TO THE SECURITY AGREEMENT;ASSIGNOR:FREESCALE SEMICONDUCTOR, INC.;REEL/FRAME:039138/0001

Effective date: 20160525

AS Assignment

Owner name: NXP, B.V., F/K/A FREESCALE SEMICONDUCTOR, INC., NETHERLANDS

Free format text: RELEASE BY SECURED PARTY;ASSIGNOR:MORGAN STANLEY SENIOR FUNDING, INC.;REEL/FRAME:040925/0001

Effective date: 20160912

Owner name: NXP, B.V., F/K/A FREESCALE SEMICONDUCTOR, INC., NE

Free format text: RELEASE BY SECURED PARTY;ASSIGNOR:MORGAN STANLEY SENIOR FUNDING, INC.;REEL/FRAME:040925/0001

Effective date: 20160912

AS Assignment

Owner name: NXP B.V., NETHERLANDS

Free format text: RELEASE BY SECURED PARTY;ASSIGNOR:MORGAN STANLEY SENIOR FUNDING, INC.;REEL/FRAME:040928/0001

Effective date: 20160622

AS Assignment

Owner name: NXP USA, INC., TEXAS

Free format text: CHANGE OF NAME;ASSIGNOR:FREESCALE SEMICONDUCTOR INC.;REEL/FRAME:040652/0180

Effective date: 20161107

AS Assignment

Owner name: NXP USA, INC., TEXAS

Free format text: CORRECTIVE ASSIGNMENT TO CORRECT THE NATURE OF CONVEYANCE LISTED CHANGE OF NAME SHOULD BE MERGER AND CHANGE PREVIOUSLY RECORDED AT REEL: 040652 FRAME: 0180. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER AND CHANGE OF NAME;ASSIGNOR:FREESCALE SEMICONDUCTOR INC.;REEL/FRAME:041354/0148

Effective date: 20161107

AS Assignment

Owner name: MORGAN STANLEY SENIOR FUNDING, INC., MARYLAND

Free format text: CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE PATENTS 8108266 AND 8062324 AND REPLACE THEM WITH 6108266 AND 8060324 PREVIOUSLY RECORDED ON REEL 037518 FRAME 0292. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS;ASSIGNOR:CITIBANK, N.A.;REEL/FRAME:041703/0536

Effective date: 20151207

AS Assignment

Owner name: SHENZHEN XINGUODU TECHNOLOGY CO., LTD., CHINA

Free format text: CORRECTIVE ASSIGNMENT TO CORRECT THE TO CORRECT THE APPLICATION NO. FROM 13,883,290 TO 13,833,290 PREVIOUSLY RECORDED ON REEL 041703 FRAME 0536. ASSIGNOR(S) HEREBY CONFIRMS THE THE ASSIGNMENT AND ASSUMPTION OF SECURITYINTEREST IN PATENTS.;ASSIGNOR:MORGAN STANLEY SENIOR FUNDING, INC.;REEL/FRAME:048734/0001

Effective date: 20190217

AS Assignment

Owner name: NXP B.V., NETHERLANDS

Free format text: RELEASE BY SECURED PARTY;ASSIGNOR:MORGAN STANLEY SENIOR FUNDING, INC.;REEL/FRAME:050744/0097

Effective date: 20190903

AS Assignment

Owner name: MORGAN STANLEY SENIOR FUNDING, INC., MARYLAND

Free format text: CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 037486 FRAME 0517. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITYINTEREST IN PATENTS;ASSIGNOR:CITIBANK, N.A.;REEL/FRAME:053547/0421

Effective date: 20151207

AS Assignment

Owner name: NXP B.V., NETHERLANDS

Free format text: CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVEAPPLICATION 11759915 AND REPLACE IT WITH APPLICATION11759935 PREVIOUSLY RECORDED ON REEL 040928 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITYINTEREST;ASSIGNOR:MORGAN STANLEY SENIOR FUNDING, INC.;REEL/FRAME:052915/0001

Effective date: 20160622

AS Assignment

Owner name: NXP, B.V. F/K/A FREESCALE SEMICONDUCTOR, INC., NETHERLANDS

Free format text: CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVEAPPLICATION 11759915 AND REPLACE IT WITH APPLICATION11759935 PREVIOUSLY RECORDED ON REEL 040925 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITYINTEREST;ASSIGNOR:MORGAN STANLEY SENIOR FUNDING, INC.;REEL/FRAME:052917/0001

Effective date: 20160912