US20020094669A1 - Semiconductor device having reduced contact resistance and leakage and method of construction - Google Patents
Semiconductor device having reduced contact resistance and leakage and method of construction Download PDFInfo
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- US20020094669A1 US20020094669A1 US09/742,034 US74203400A US2002094669A1 US 20020094669 A1 US20020094669 A1 US 20020094669A1 US 74203400 A US74203400 A US 74203400A US 2002094669 A1 US2002094669 A1 US 2002094669A1
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- 238000000034 method Methods 0.000 title claims abstract description 46
- 239000004065 semiconductor Substances 0.000 title claims abstract description 37
- 238000010276 construction Methods 0.000 title description 4
- 229910052751 metal Inorganic materials 0.000 claims abstract description 102
- 239000002184 metal Substances 0.000 claims abstract description 102
- 229910021332 silicide Inorganic materials 0.000 claims abstract description 91
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical group [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims abstract description 85
- 239000000758 substrate Substances 0.000 claims abstract description 39
- 238000000151 deposition Methods 0.000 claims abstract description 30
- 239000012212 insulator Substances 0.000 claims abstract description 12
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 30
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 28
- 229910017052 cobalt Inorganic materials 0.000 claims description 24
- 239000010941 cobalt Substances 0.000 claims description 24
- 229910052759 nickel Inorganic materials 0.000 claims description 13
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 12
- 229910052735 hafnium Inorganic materials 0.000 claims description 11
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 9
- 238000000137 annealing Methods 0.000 claims description 8
- 229910052726 zirconium Inorganic materials 0.000 claims description 7
- 230000005669 field effect Effects 0.000 claims 6
- 239000004020 conductor Substances 0.000 abstract description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 32
- 229910052710 silicon Inorganic materials 0.000 description 27
- 239000010703 silicon Substances 0.000 description 27
- 230000015572 biosynthetic process Effects 0.000 description 20
- 230000008569 process Effects 0.000 description 16
- 239000000463 material Substances 0.000 description 11
- -1 silicide compound Chemical class 0.000 description 10
- 230000008901 benefit Effects 0.000 description 9
- 238000012421 spiking Methods 0.000 description 8
- 238000009792 diffusion process Methods 0.000 description 7
- 150000002500 ions Chemical class 0.000 description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 6
- 239000010936 titanium Substances 0.000 description 6
- 229910052719 titanium Inorganic materials 0.000 description 6
- 150000002739 metals Chemical class 0.000 description 5
- 125000006850 spacer group Chemical group 0.000 description 5
- 229910021341 titanium silicide Inorganic materials 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 230000005476 size effect Effects 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 3
- 238000002513 implantation Methods 0.000 description 3
- 229910021334 nickel silicide Inorganic materials 0.000 description 3
- RUFLMLWJRZAWLJ-UHFFFAOYSA-N nickel silicide Chemical compound [Ni]=[Si]=[Ni] RUFLMLWJRZAWLJ-UHFFFAOYSA-N 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- 229920005591 polysilicon Polymers 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 230000001627 detrimental effect Effects 0.000 description 2
- 229910000449 hafnium oxide Inorganic materials 0.000 description 2
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- TWRSDLOICOIGRH-UHFFFAOYSA-N [Si].[Si].[Hf] Chemical compound [Si].[Si].[Hf] TWRSDLOICOIGRH-UHFFFAOYSA-N 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000005389 semiconductor device fabrication Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/665—Unipolar field-effect transistors with an insulated gate, i.e. MISFET using self aligned silicidation, i.e. salicide
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/28008—Making conductor-insulator-semiconductor electrodes
- H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
- H01L21/28026—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor
- H01L21/28035—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor the final conductor layer next to the insulator being silicon, e.g. polysilicon, with or without impurities
- H01L21/28044—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor the final conductor layer next to the insulator being silicon, e.g. polysilicon, with or without impurities the conductor comprising at least another non-silicon conductive layer
- H01L21/28052—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor the final conductor layer next to the insulator being silicon, e.g. polysilicon, with or without impurities the conductor comprising at least another non-silicon conductive layer the conductor comprising a silicide layer formed by the silicidation reaction of silicon with a metal layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
- H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
- H01L21/28512—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table
- H01L21/28518—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table the conductive layers comprising silicides
Definitions
- a salicide process is a self-aligned silicidation process.
- a metal such as titanium
- a metal contact is placed into contact with silicon and heated. Heating of the titanium and silicon causes the silicon and titanium to combine to form a silicide compound.
- Silicidation is conventionally used to provide a conductive contact between silicon in a semiconductor device and a metal contact, which may be connected to a conductive lead. The resulting silicon-silicide-metal combination provides less contact resistance than provided with a direct metal-to-silicon contact. Large contact resistance is generally detrimental to the performance of a semiconductor device.
- a silicidation process is self-aligned, or a salicide process, when masking is not required to deposit the metal used to form the silicide compound.
- a problem with the use of titanium in a silicide compound is that titanium silicide suffers from size effects. As the volume of a titanium silicide region in a semiconductor device decreases, its contact resistance increases. Thus, as semiconductor devices shrink, particularly the length of a gate in a semiconductor device, the use of titanium silicide may become unacceptable due to resulting high contact resistances. Because of the susceptibility to size effects of titanium silicide, cobalt and nickel are sometimes used as alternatives. In contrast to titanium silicide, cobalt silicide and nickel silicide do not suffer size effects and have a relatively constant resistance for varying volumes of the resulting silicide compound.
- cobalt or nickel in a silicidation process offers benefits over the use of titanium, their use is not without disadvantages.
- the use of cobalt or nickel can result in current leakage into the silicon substrate. Such current leakage can be detrimental.
- the present invention recognizes that current leakage arising from the use of cobalt or nickel in a silicidation process may be attributed to spiking of either cobalt or nickel into the silicon substrate.
- the present invention also recognizes that such spiking may be attributed to a rough interface between the cobalt silicide or the nickel silicide and the silicon substrate in a silicide process.
- the present invention additionally recognizes that the higher than expected contact resistances resulting from the use of either cobalt or nickel in the silicide process may be attributed to native oxide residing on the surface of the formed silicide. Such native oxide results in degradation of the contact formed in the silicide process. Such degradation results in higher than expected contact resistance.
- a method for constructing a semiconductor device includes separating a semiconductor gate body from the outer surface of the substrate by a gate insulator layer, forming a conductive drain region in the outer surface of the substrate and spaced apart from the gate conductor body, and forming a conductive source region in the outer surface of the substrate and spaced apart from the gate conductor body opposite the conductive drain region to define a channel region in the substrate disposed inwardly from the gate body and the gate insulator layer.
- the method also includes depositing a metal buffer layer over the conductive source region and conductive drain region, depositing a metal layer over the metal buffer layer, and reacting the metal layer and metal buffer layer with the conductive source region and conductive drain region to form respective first and second silicide regions.
- a semiconductor device includes a semiconductor gate body separated from the outer surface of the substrate by a gate insulator layer, a conductive drain region formed in the outer surface of the substrate and spaced apart from the gate conductor body, and a conductive source region formed in the outer surface of the substrate and spaced apart from the gate conductor body opposite the conductive drain region to define a channel region in the substrate disposed inwardly from the gate body and the gate insulator layer.
- the semiconductor device also includes a first silicide region overlying the conductive drain region, a second silicide region overlying the conductive source region.
- the first and second silicide regions comprise a silicide selected from the group consisting of CoZr y Si x , CoHf y Si x , NiZr y Si x , and NiHf y Si x , where “y” is less than one.
- one embodiment of the invention provides a method for constructing a semiconductor device that results in a device having reduced contact resistance and low leakage but that incorporates advantages associated with the use of cobalt or nickel to form silicide regions overlying portions of the semiconductor device.
- Such advantages include a relatively constant contact resistance for varying gate lengths, which is particularly important as device sizes shrink.
- FIG. 1 a through if are simplified cross-sectional views of a semiconductor structure in various states of fabrication according to one embodiment of the invention
- FIGS. 2 a through 2 d are simplified cross-sectional views of portions of FIGS. 1 a through 1 f , illustrating formation of a silicide region according to the teachings of the invention.
- FIG. 2 e is a simplified cross-sectional view of a portion of a semiconductor device showing formation of a silicide region according to conventional techniques.
- FIGS. 1 a through 2 e of the drawings like numerals being used for like and corresponding parts of the various drawings.
- FIG. 1 a illustrates a semiconductor device 10 during an initial state of construction after formation of a source region 14 and a drain region 16 in a substrate 12 and after formation of a gate body 18 overlying an oxide layer 20 . Also illustrated in FIG. 1 a are thick field oxide regions 22 utilized to isolate the resulting transistor from adjacent semiconductor devices. Source region 14 , drain region 16 , gate body 18 , oxide layer 20 , and field oxide regions 22 may be formed according to conventional techniques.
- substrate 12 is a P-type silicon substrate; however, substrate 12 could be an N-type substrate.
- Thick field oxide regions 22 are formed by local oxidation of silicon using a process such as that shown in Havemann, et al. U.S. Pat. No. 4,541,167, issued Sep. 17, 1985 and assigned to the assignee of this application.
- Substrate 12 is then subjected to a thermal oxidation in a steam environment for approximately 7 minutes at a temperature of approximately 850° C. to form oxide layer 20 as shown in FIG. 1 a .
- Oxide layer 20 may be grown to a thickness of approximately 3 to 10 nanometers, however, other thicknesses for oxide layer 20 may be used.
- a polysilicon layer is then deposited, patterned and etched using conventional photolithographic techniques to form polysilicon gate body 18 .
- An example thickness of polysilicon gate body is approximately 400 nanometers.
- Appropriate ions 19 are then implanted, self-aligned to form source region 14 and drain region 16 .
- appropriate ions include phosphorous ions and arsenic ions.
- An example implantation includes implantation of arsenic ions at a density of approximately
- a channel region is defined within substrate 12 between source region 14 and drain region 16 .
- source region 12 drain region 14 , gate body 18 , oxide layer 20 , and field oxide regions 22 have been provided, other methods and techniques may be utilized without departing from the scope of the present invention.
- FIG. 1 b illustrates semiconductor device 10 after formation of a gate oxide layer 24 and sidewall spacers 26 25 and 28 .
- Gate oxide layer 24 is formed by patterning and etching oxide layer 20 using conventional photolithographic techniques.
- Sidewall spacers 26 and 28 provide separation between a silicide that will be formed over source and drain regions 14 , 16 and gate body 18 , which is conductive.
- Sidewall spacers 26 and 28 may be formed, for example, by depositing a conformal layer of TEOS oxide over semiconductor device 10 and anisotropically etching the TEOS oxide layer, leaving sidewall spacers 26 and 28 .
- Sidewall spacers 26 and 28 may alternatively be formed prior to implantation of ions 19 to form source region 14 and drain region 16 .
- FIG. 1 c illustrates the deposition of a thin buffer layer 30 of metal.
- Thin buffer layer 30 will act as a buffer layer between silicon in source region 12 , drain region 14 , and gate body 18 and a metal layer during formation of silicide regions in semiconductor device 10 .
- zirconium and hafnium are both particularly suitable metals for thin buffer layer 30 ; however, other suitable metals may be used without departing from the teachings of the present invention.
- Thin buffer layer 30 is deposited outwardly from semiconductor device 10 to a thickness of approximately 1 to 5 nanometers. Thin buffer layer 30 resists spiking during the formation of a silicide and also contributes to low contact resistance between a resulting silicide and a metal contact.
- thin buffer layer 30 should be sufficiently thin to prevent the formation of a second silicide layer in addition to a silicide layer formed primarily from a metal layer 32 .
- Metal layer 32 is illustrated disposed outwardly over thin buffer layer 30 .
- Metal layer 32 is provided for reaction with silicon in source region 14 , drain region 16 , and gate body 18 to produce silicide regions for establishing an electrical connection with metal contacts.
- silicide regions provide lower contact resistance between a metal contact and the silicon in source region 14 , drain region 16 , or gate body 18 than would occur with a direct contact between a metal contact and the silicon in source region 14 , drain region 16 , or gate body 18 .
- Metal layer 32 may be formed from any suitable metal that is a different metal from that used for thin buffer layer 30 ; however, cobalt and nickel are both particularly advantageous metals for use in metal layer 32 .
- Metal layer 32 is deposited to a thickness in the range of 5 nanometers to 40 nanometers; however, other thicknesses for layer 32 may be used without departing from the scope of the present invention.
- FIG. 1 d illustrates semiconductor device 10 after reaction of metal layer 32 with thin buffer layer 30 and the silicon in source region 14 , drain region 16 , and gate body 18 . Due to the reaction of these materials, a silicide region 34 is formed overlying source region 14 , and a silicide region 36 is formed overlying drain region 16 . In addition, a silicide region 38 is formed overlying gate body 18 . Silicide regions 34 , 36 , and 38 are formed by heating of semiconductor device 10 such that the metal in metal layer 32 may react with the silicon in source region 14 , drain region 16 , and gate body 18 , as well as the metal in thin buffer layer 30 to form a silicide.
- such an anneal occurs at a temperature in the range of 450° C. to 850° C. for a time period of 10 seconds to 100 seconds.
- a second anneal could be performed with similar temperature and time conditions to cause further reaction of the materials.
- a silicide compound is formed within silicide regions 34 , 36 , and 38 incorporating each metal.
- thin buffer layer 30 being thinner than metal layer 32 , the metal in metal layer 32 will form a majority silicide within silicide regions 34 , 36 , and 38 and the metal within thin buffer layer 30 will form a minority silicide within silicide regions 34 , 36 , and 38 .
- An example of the resulting compound in silicide regions 34 , 36 , and 38 formed according to the teachings of the present invention is CoZr y Si x , where “x” represents the ratio of silicon atoms to cobalt atoms and “y” is less than one and represents the ratio of zirconium atoms to cobalt atoms.
- compounds comprising silicide regions 34 , 36 , and 38 include CoHf y si x , NiZr y Si x , and NiHf y Si x , where “x” represents the ratio of silicon atoms to either cobalt or nickel atoms and “y” is less than one and represents the ratio of either the number of hafnium atoms or zirconium atoms to the number of cobalt or nickel atoms.
- FIG. 1 e illustrates semiconductor device 10 after additional processing steps associated with removing thin buffer layer 30 and metal layer 32 .
- the unreacted metals in metal layer 32 and thin buffer layer 30 may be selectively removed through the use of an etchant that does not attack the silicide in silicide regions 34 , 36 , and 38 , silicon substrate 12 , or field oxide regions 22 .
- An example of such an etchant is a mixture of H 2 O 2 and H 2 SO 4 .
- FIG. 1 f illustrates semiconductor device 10 after formation of metal contacts 62 and 64 .
- a dielectric layer 60 is deposited. Contact holes are then opened to expose portions of silicide regions 34 and 36 overlying source region 14 and drain region 16 , respectively.
- An example method for exposing portions of silicide regions 34 and 36 is photolithographic masking and etching. After exposing portions of silicide regions 34 and 36 , metal is deposited into the contact holes to form metal contacts 62 and 64 . Metal contacts 62 and 64 therefore provide a conductive path to source region 14 and drain region 16 . A metal contact may also be formed for connection to silicide region 38 .
- zirconium or hafnium are good oxide reduction materials.
- zirconium oxide has a. heat of formation of approximately ⁇ 360 kJ/mole and hafnium oxide has a heat of formation of approximately ⁇ 380 kJ/mole.
- silicon dioxide has a heat of formation of approximately ⁇ 300 kJ/mole. Because zirconium and hafnium are good oxide reduction materials, native oxide formed on the surface of the resulting silicide in silicide regions 34 , 36 , and 38 is reduced. Reduction of native oxide on the surface silicide regions 34 , 36 , and 38 eliminates the problem of higher than expected contact resistance due to native oxide formation.
- the use of thin buffer layer 30 provides a smooth interface of the resulting silicide with the underlying silicon, such as the silicon in drain region 14 , source region 16 , and gate region 18 . Because these interfaces are smooth, the likelihood of spiking is reduced, and therefore current leakage is reduced. Providing of a smooth interface of silicide regions 34 , 36 , and 38 with the underlying silicon is described in greater detail in conjunction with FIGS. 2 a though 2 e.
- FIG. 2 a illustrates an enlarged view of gate body 18 , which is formed from silicon.
- thin buffer layer 30 Overlying gate body 18 is thin buffer layer 30 .
- thin buffer layer 30 is assumed to comprise hafnium in FIGS. 2 a through 2 d .
- metal layer 32 Overlying thin buffer layer 30 is metal layer 32 .
- metal layer 32 is assumed to comprise cobalt in FIGS. 2 a through 2 d .
- Silicon in gate body 18 reacts with cobalt in metal layer 32 and hafnium in thin buffer layer 30 to produce silicide region 38 .
- Thin layer 30 of hafnium provides beneficial properties for the resulting silicide region 38 , as described below. The below description is also applicable to formation of silicide regions 34 and 36 overlying source region 14 and drain region 16 .
- FIG. 2 b illustrates the diffusion of silicon atoms, represented by arrows 40 , into metal layer 32 and the diffusion of the cobalt atoms, represented by arrows 42 , into gate body 18 .
- a silicidation process forms a rough silicide layer such as silicide layer 152 illustrated in FIG. 2 e .
- thin layer 30 provides a diffusion buffer between the silicon in gate body 18 and the cobalt in metal layer 32 to prevent the formation of a rough silicide layer. The prevention of such a rough silicide layer resists spiking, which could otherwise result in current leakage.
- Silicon atoms 40 diffuse toward metal layer 32 and cobalt atoms 42 diffuse toward gate body 18 in response to an annealing step.
- An example anneal is a rapid thermal anneal having a temperature range of 450° C. to 850° C. and a duration of 10 seconds to 100 seconds.
- thin buffer layer 30 transforms into an amorphous layer 44 of, in this example, hafnium, cobalt, and silicon.
- FIG. 2 c illustrates the formation of a smooth silicide layer 46 of cobalt silicide during the above-described annealing step.
- a polycrystalline material such as the silicon in gate body 18
- diffusion through a polycrystalline material tends to form a rough interface, such as interface 154 illustrated in FIG. 2 e .
- an amorphous material has no grain boundary, therefore the rate of diffusion within an amorphous material, such as layer 44 , is more uniform.
- forming amorphous layer 44 before the formation of layers 46 and 52 which have a polycrystalline structure makes a resulting interface 54 smooth.
- FIG. 2 d provides an interface 54 between gate body 18 and silicide layer 52 that is smooth enough to eliminate leakage due to spiking of silicide into gate body 18 . Therefore, the use of thin buffer layer 30 in combination with metal layer 32 results in a structure that does not suffer leakage problems due to a rough interface between the silicide and the silicon. Such rough interfaces are conventionally found in silicide processes utilizing cobalt or nickel.
- FIG. 2 e depicts a rough interface 154 that may be formed in a silicide process not incorporating a thin buffer layer, such as thin buffer layer 30 .
- a rough silicide layer 152 is disposed between a metal layer 132 and a gate body, such as gate body 18 .
- Rough interface 154 is formed between gate body 18 and silicide layer 152 , which could lead to spiking and leakage. Such spiking is avoided in the above-described process incorporating the teachings of the present invention.
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Abstract
A method of forming a semiconductor device includes separating a semiconductor gate body from the outer surface of the substrate by a gate insulator layer, forming a conductive drain region in the outer surface of the substrate and spaced apart from the gate conductor body, and forming a conductive source region in the outer surface of the substrate and spaced apart from the gate conductor body opposite the conductive drain region to define a channel region in the substrate disposed inwardly from the gate body and the gate insulator layer. The method also includes depositing a metal buffer layer over the conductive source region and conductive drain region, depositing a metal layer over the metal buffer layer, and reacting the metal layer and metal buffer layer with the conductive source region and conductive drain region to form respective first and second silicide regions.
Description
- Semiconductor device fabrication often utilizes a salicide process. A salicide process is a self-aligned silicidation process. In a silicidation process, a metal, such as titanium, is placed into contact with silicon and heated. Heating of the titanium and silicon causes the silicon and titanium to combine to form a silicide compound. Silicidation is conventionally used to provide a conductive contact between silicon in a semiconductor device and a metal contact, which may be connected to a conductive lead. The resulting silicon-silicide-metal combination provides less contact resistance than provided with a direct metal-to-silicon contact. Large contact resistance is generally detrimental to the performance of a semiconductor device. A silicidation process is self-aligned, or a salicide process, when masking is not required to deposit the metal used to form the silicide compound.
- A problem with the use of titanium in a silicide compound is that titanium silicide suffers from size effects. As the volume of a titanium silicide region in a semiconductor device decreases, its contact resistance increases. Thus, as semiconductor devices shrink, particularly the length of a gate in a semiconductor device, the use of titanium silicide may become unacceptable due to resulting high contact resistances. Because of the susceptibility to size effects of titanium silicide, cobalt and nickel are sometimes used as alternatives. In contrast to titanium silicide, cobalt silicide and nickel silicide do not suffer size effects and have a relatively constant resistance for varying volumes of the resulting silicide compound.
- Although the use of cobalt or nickel in a silicidation process offers benefits over the use of titanium, their use is not without disadvantages. For example, the use of cobalt or nickel can result in current leakage into the silicon substrate. Such current leakage can be detrimental. In addition, the use of cobalt or nickel, although providing relatively constant contact: resistance for varying volumes of silicide, has resulted in greater than expected contact resistances.
- Accordingly, a need has arisen for a semiconductor device having reduced contact resistance and low leakage and method of construction for such a device. The present invention recognizes that current leakage arising from the use of cobalt or nickel in a silicidation process may be attributed to spiking of either cobalt or nickel into the silicon substrate. The present invention also recognizes that such spiking may be attributed to a rough interface between the cobalt silicide or the nickel silicide and the silicon substrate in a silicide process. The present invention additionally recognizes that the higher than expected contact resistances resulting from the use of either cobalt or nickel in the silicide process may be attributed to native oxide residing on the surface of the formed silicide. Such native oxide results in degradation of the contact formed in the silicide process. Such degradation results in higher than expected contact resistance.
- The present invention provides a semiconductor device and method of construction that addresses shortcomings of prior devices and methods. According to one aspect of the invention, a method for constructing a semiconductor device includes separating a semiconductor gate body from the outer surface of the substrate by a gate insulator layer, forming a conductive drain region in the outer surface of the substrate and spaced apart from the gate conductor body, and forming a conductive source region in the outer surface of the substrate and spaced apart from the gate conductor body opposite the conductive drain region to define a channel region in the substrate disposed inwardly from the gate body and the gate insulator layer. The method also includes depositing a metal buffer layer over the conductive source region and conductive drain region, depositing a metal layer over the metal buffer layer, and reacting the metal layer and metal buffer layer with the conductive source region and conductive drain region to form respective first and second silicide regions.
- According to another aspect of the invention, a semiconductor device includes a semiconductor gate body separated from the outer surface of the substrate by a gate insulator layer, a conductive drain region formed in the outer surface of the substrate and spaced apart from the gate conductor body, and a conductive source region formed in the outer surface of the substrate and spaced apart from the gate conductor body opposite the conductive drain region to define a channel region in the substrate disposed inwardly from the gate body and the gate insulator layer. The semiconductor device also includes a first silicide region overlying the conductive drain region, a second silicide region overlying the conductive source region. The first and second silicide regions comprise a silicide selected from the group consisting of CoZrySix, CoHfySix, NiZrySix, and NiHfySix, where “y” is less than one.
- The invention provides several technical advantages. For example, one embodiment of the invention provides a method for constructing a semiconductor device that results in a device having reduced contact resistance and low leakage but that incorporates advantages associated with the use of cobalt or nickel to form silicide regions overlying portions of the semiconductor device. Such advantages include a relatively constant contact resistance for varying gate lengths, which is particularly important as device sizes shrink.
- Other technical advantages will be readily apparent to one skilled in the art from the following figures, descriptions, and claims.
- For a more complete understanding of the present invention and the advantages thereof, reference is now made to the following descriptions taken in connection with the accompanying drawings in which:
- FIG. 1a through if are simplified cross-sectional views of a semiconductor structure in various states of fabrication according to one embodiment of the invention;
- FIGS. 2a through 2 d are simplified cross-sectional views of portions of FIGS. 1a through 1 f, illustrating formation of a silicide region according to the teachings of the invention; and
- FIG. 2e is a simplified cross-sectional view of a portion of a semiconductor device showing formation of a silicide region according to conventional techniques.
- Embodiments of the present invention and its advantages are best understood by referring to FIGS. 1a through 2 e of the drawings, like numerals being used for like and corresponding parts of the various drawings.
- FIG. 1a illustrates a
semiconductor device 10 during an initial state of construction after formation of asource region 14 and adrain region 16 in asubstrate 12 and after formation of agate body 18 overlying anoxide layer 20. Also illustrated in FIG. 1a are thickfield oxide regions 22 utilized to isolate the resulting transistor from adjacent semiconductor devices.Source region 14,drain region 16,gate body 18,oxide layer 20, andfield oxide regions 22 may be formed according to conventional techniques. - One example of a conventional technique for forming the
semiconductor device 10 illustrated in FIG. 1a is described below. In this example,substrate 12 is a P-type silicon substrate; however,substrate 12 could be an N-type substrate. Thickfield oxide regions 22 are formed by local oxidation of silicon using a process such as that shown in Havemann, et al. U.S. Pat. No. 4,541,167, issued Sep. 17, 1985 and assigned to the assignee of this application.Substrate 12 is then subjected to a thermal oxidation in a steam environment for approximately 7 minutes at a temperature of approximately 850° C. to formoxide layer 20 as shown in FIG. 1a.Oxide layer 20 may be grown to a thickness of approximately 3 to 10 nanometers, however, other thicknesses foroxide layer 20 may be used. A polysilicon layer is then deposited, patterned and etched using conventional photolithographic techniques to formpolysilicon gate body 18. An example thickness of polysilicon gate body is approximately 400 nanometers.Appropriate ions 19 are then implanted, self-aligned to formsource region 14 anddrain region 16. For a P-type substrate, appropriate ions include phosphorous ions and arsenic ions. An example implantation includes implantation of arsenic ions at a density of approximately -
- A channel region is defined within
substrate 12 betweensource region 14 and drainregion 16. Although particular details of one example of the formation ofsource region 12,drain region 14,gate body 18,oxide layer 20, andfield oxide regions 22 have been provided, other methods and techniques may be utilized without departing from the scope of the present invention. - FIG. 1b illustrates
semiconductor device 10 after formation of agate oxide layer 24 andsidewall spacers 26 25 and 28.Gate oxide layer 24 is formed by patterning andetching oxide layer 20 using conventional photolithographic techniques.Sidewall spacers regions gate body 18, which is conductive.Sidewall spacers semiconductor device 10 and anisotropically etching the TEOS oxide layer, leavingsidewall spacers Sidewall spacers ions 19 to formsource region 14 and drainregion 16. - FIG. 1c illustrates the deposition of a
thin buffer layer 30 of metal.Thin buffer layer 30 will act as a buffer layer between silicon insource region 12,drain region 14, andgate body 18 and a metal layer during formation of silicide regions insemiconductor device 10. As described in greater detail below, zirconium and hafnium are both particularly suitable metals forthin buffer layer 30; however, other suitable metals may be used without departing from the teachings of the present invention.Thin buffer layer 30 is deposited outwardly fromsemiconductor device 10 to a thickness of approximately 1 to 5 nanometers.Thin buffer layer 30 resists spiking during the formation of a silicide and also contributes to low contact resistance between a resulting silicide and a metal contact. Although particular thicknesses forthin buffer layer 30 have been described, other thicknesses forthin buffer layer 30 may be utilized. However,thin buffer layer 30 should be sufficiently thin to prevent the formation of a second silicide layer in addition to a silicide layer formed primarily from ametal layer 32. -
Metal layer 32 is illustrated disposed outwardly overthin buffer layer 30.Metal layer 32 is provided for reaction with silicon insource region 14,drain region 16, andgate body 18 to produce silicide regions for establishing an electrical connection with metal contacts. Such silicide regions provide lower contact resistance between a metal contact and the silicon insource region 14,drain region 16, orgate body 18 than would occur with a direct contact between a metal contact and the silicon insource region 14,drain region 16, orgate body 18.Metal layer 32 may be formed from any suitable metal that is a different metal from that used forthin buffer layer 30; however, cobalt and nickel are both particularly advantageous metals for use inmetal layer 32. Both cobalt silicide and nickel silicide do not suffer size effects traditionally associated with the use of titanium to form a silicide compound. Therefore, the use of such materials allows for reduced contact resistances, which are particularly important as the size of semiconductor devices decrease.Metal layer 32 is deposited to a thickness in the range of 5 nanometers to 40 nanometers; however, other thicknesses forlayer 32 may be used without departing from the scope of the present invention. - FIG. 1d illustrates
semiconductor device 10 after reaction ofmetal layer 32 withthin buffer layer 30 and the silicon insource region 14,drain region 16, andgate body 18. Due to the reaction of these materials, asilicide region 34 is formedoverlying source region 14, and asilicide region 36 is formedoverlying drain region 16. In addition, asilicide region 38 is formedoverlying gate body 18.Silicide regions semiconductor device 10 such that the metal inmetal layer 32 may react with the silicon insource region 14,drain region 16, andgate body 18, as well as the metal inthin buffer layer 30 to form a silicide. According to one embodiment, such an anneal occurs at a temperature in the range of 450° C. to 850° C. for a time period of 10 seconds to 100 seconds. In addition to this anneal, a second anneal could be performed with similar temperature and time conditions to cause further reaction of the materials. - Because different metals are used within
metal layer 32 andthin buffer layer 30, a silicide compound is formed withinsilicide regions thin buffer layer 30 being thinner thanmetal layer 32, the metal inmetal layer 32 will form a majority silicide withinsilicide regions thin buffer layer 30 will form a minority silicide withinsilicide regions silicide regions silicide regions - FIG. 1e illustrates
semiconductor device 10 after additional processing steps associated with removingthin buffer layer 30 andmetal layer 32. After formation ofsilicide regions metal layer 32 andthin buffer layer 30 may be selectively removed through the use of an etchant that does not attack the silicide insilicide regions silicon substrate 12, orfield oxide regions 22. An example of such an etchant is a mixture of H2O2 and H2SO4. - FIG. 1f illustrates
semiconductor device 10 after formation ofmetal contacts metal layer 32 andthin buffer layer 30, adielectric layer 60 is deposited. Contact holes are then opened to expose portions ofsilicide regions overlying source region 14 and drainregion 16, respectively. An example method for exposing portions ofsilicide regions silicide regions metal contacts Metal contacts region 14 and drainregion 16. A metal contact may also be formed for connection to silicideregion 38. - The use of a
thin buffer layer 30 provides several benefits. First, if zirconium or hafnium is used, because zirconium oxide and hafnium oxide both have high heats of formation, zirconium and hafnium are good oxide reduction materials. For example, zirconium oxide has a. heat of formation of approximately −360 kJ/mole and hafnium oxide has a heat of formation of approximately −380 kJ/mole. By comparison, silicon dioxide has a heat of formation of approximately −300 kJ/mole. Because zirconium and hafnium are good oxide reduction materials, native oxide formed on the surface of the resulting silicide insilicide regions surface silicide regions - Furthermore, as described in greater detail in conjunction with FIGS. 2a through 2 d, the use of
thin buffer layer 30 provides a smooth interface of the resulting silicide with the underlying silicon, such as the silicon indrain region 14,source region 16, andgate region 18. Because these interfaces are smooth, the likelihood of spiking is reduced, and therefore current leakage is reduced. Providing of a smooth interface ofsilicide regions - FIG. 2a illustrates an enlarged view of
gate body 18, which is formed from silicon.Overlying gate body 18 isthin buffer layer 30. For simplicity of description,thin buffer layer 30 is assumed to comprise hafnium in FIGS. 2a through 2 d. Overlyingthin buffer layer 30 ismetal layer 32. Also for simplicity of description,metal layer 32 is assumed to comprise cobalt in FIGS. 2a through 2 d. Silicon ingate body 18 reacts with cobalt inmetal layer 32 and hafnium inthin buffer layer 30 to producesilicide region 38.Thin layer 30 of hafnium provides beneficial properties for the resultingsilicide region 38, as described below. The below description is also applicable to formation ofsilicide regions overlying source region 14 and drainregion 16. - FIG. 2b, illustrates the diffusion of silicon atoms, represented by
arrows 40, intometal layer 32 and the diffusion of the cobalt atoms, represented byarrows 42, intogate body 18. Conventionally, a silicidation process forms a rough silicide layer such assilicide layer 152 illustrated in FIG. 2e. However,thin layer 30 provides a diffusion buffer between the silicon ingate body 18 and the cobalt inmetal layer 32 to prevent the formation of a rough silicide layer. The prevention of such a rough silicide layer resists spiking, which could otherwise result in current leakage. -
Silicon atoms 40 diffuse towardmetal layer 32 andcobalt atoms 42 diffuse towardgate body 18 in response to an annealing step. An example anneal is a rapid thermal anneal having a temperature range of 450° C. to 850° C. and a duration of 10 seconds to 100 seconds. Assilicon atoms 40 andcobalt atoms 42 begin to diffuse,thin buffer layer 30 transforms into anamorphous layer 44 of, in this example, hafnium, cobalt, and silicon. - FIG. 2c illustrates the formation of a
smooth silicide layer 46 of cobalt silicide during the above-described annealing step. Because the rate of diffusion along a grain boundary within a polycrystalline material, such as the silicon ingate body 18 is different than diffusion within a single grain of material within a polycrystalline material, diffusion through a polycrystalline material tends to form a rough interface, such asinterface 154 illustrated in FIG. 2e. In contrast, an amorphous material has no grain boundary, therefore the rate of diffusion within an amorphous material, such aslayer 44, is more uniform. Thus, formingamorphous layer 44 before the formation oflayers interface 54 smooth. As annealing continues,additional silicon atoms 40 andcobalt atoms 42 diffuse intoamorphous layer 44 to form a silicide. As annealing continues, hafnium silicide becomes a minority silicide and cobalt silicide becomes a majority silicide within a uniform and smoothpolycrystalline silicide layer 52 formed between thesilicon gate body 18 andmetal layer 32. The resulting structure is illustrated in FIG. 2d. - The resulting structure in FIG. 2d provides an
interface 54 betweengate body 18 andsilicide layer 52 that is smooth enough to eliminate leakage due to spiking of silicide intogate body 18. Therefore, the use ofthin buffer layer 30 in combination withmetal layer 32 results in a structure that does not suffer leakage problems due to a rough interface between the silicide and the silicon. Such rough interfaces are conventionally found in silicide processes utilizing cobalt or nickel. - FIG. 2e depicts a
rough interface 154 that may be formed in a silicide process not incorporating a thin buffer layer, such asthin buffer layer 30. As illustrated, arough silicide layer 152 is disposed between ametal layer 132 and a gate body, such asgate body 18.Rough interface 154 is formed betweengate body 18 andsilicide layer 152, which could lead to spiking and leakage. Such spiking is avoided in the above-described process incorporating the teachings of the present invention. - Although the present invention and its advantages have been described in detail, it should be understood that various changes, substitutions, and alterations can be made therein without departing from the spirit and scope of the present invention as defined by the appended claims.
Claims (20)
1. A method of forming a semiconductor device in the surface of a substrate, the method comprising the steps of:
separating a semiconductor gate body from the outer surface of the substrate by a gate insulator layer;
forming a conductive drain region in the outer surface of the substrate and spaced apart from the gate body;
forming a conductive source region in the outer surface of the substrate and spaced apart from the gate body opposite the conductive drain region to define a channel region in the substrate disposed inwardly from the gate body and the gate insulator layer;
depositing a metal buffer layer over the conductive source region and conductive drain region;
depositing a metal layer over the metal buffer layer; and
reacting the metal layer and metal buffer layer with the conductive source region and conductive drain region to form respective first and second silicide regions.
2. The method of claim 2 , wherein the step of depositing a metal layer over the metal buffer layer comprises depositing a metal layer comprising a metal selected from the group consisting of cobalt and nickel.
3. The method of claim 1 , wherein the step of depositing a metal buffer layer comprises depositing a metal buffer layer comprising a metal selected from the group consisting of zirconium and hafnium.
4. The method of claim 3 , wherein the step of reacting the metal layer and metal buffer layer with the conductive source region and conductive drain region comprises annealing the metal layer, metal buffer layer, conductive source region, and conductive drain region.
5. The method of claim 4 , wherein the step of annealing comprises annealing at a temperature in the range of 450 degrees Centigrade to 850 degrees Centigrade for a time period in the range of 10 seconds to 100 seconds.
6. The method of claim 3 , wherein the step of depositing a metal buffer layer further comprises depositing a metal buffer layer consisting essentially of zirconium.
7. The method of claim 3 , wherein the step of depositing a metal buffer layer further comprises depositing a metal buffer layer consisting essentially of hafnium.
8. The method of claim 1 , wherein the step of depositing a metal buffer layer further comprises depositing a metal buffer layer having a thickness in the range of 1 to 5 nanometers.
9. The method of claim 3 , wherein the step of depositing a metal buffer layer further comprises depositing a metal buffer layer having a thickness in the range of 1 to 5 nanometers.
10. The method of claim 1 , wherein the step of depositing a metal buffer layer over the conductive source region and conductive drain region further comprises depositing the metal buffer layer over the gate body and further comprising reacting the metal layer and metal buffer layer with the gate body.
11. The method of claim 3 , wherein the step of depositing a metal layer over the metal buffer layer comprises depositing a metal layer consisting essentially of cobalt.
12. The method of claim 3 , wherein the step of depositing a metal layer over the metal buffer layer comprises depositing a metal layer consisting essentially of nickel.
13. The method of claim 9 , wherein the step of depositing a metal layer further comprises depositing a metal layer having a thickness in the range of 5 to 40 nanometers.
14. A method of forming a semiconductor device in the surface of a substrate, the method comprising the steps of:
separating a semiconductor gate body from the outer surface of the substrate by a gate insulator layer;
forming a conductive drain region in the outer surface of the substrate and spaced apart from the gate body;
forming a conductive source region in the outer surface of the substrate and spaced apart from the gate body opposite the conductive drain region to define a channel region in the substrate disposed inwardly from the gate body and the gate insulator layer;
depositing a buffer layer overlying the conductive source region, conductive drain region, and gate body, the buffer layer consisting essentially of a metal selected from the group consisting of hafnium and zirconium, the buffer layer having a thickness in the range of 1 to 5 nanometers;
depositing a metal layer overlying the buffer layer, the metal layer consisting essentially of a metal selected from the group consisting of cobalt and nickel, the metal layer having of a thickness in the range of 5 to 40nanometers; and
annealing the metal layer, buffer layer, conductive source region, conductive drain region, and gate body to form respective first, second, and third silicide regions, the first, second a third silicide regions each comprising a silicide selected from the group consisting of CoZrySix, CoHfySix, NiZrySix, and NiHfySix, where “y” is less than one.
15. A field effect transistor formed in a surface of a semiconductor substrate, comprising:
a semiconductor gate body separated from the outer surface of the substrate by a gate insulator layer;
a conductive drain region formed in the outer surface of the substrate and spaced apart from the gate body;
a conductive source region formed in the outer surface of the substrate and spaced apart from the gate body opposite the conductive drain region to define a channel region in the substrate disposed inwardly from the gate body and the gate insulator layer;
a first silicide region overlying the conductive drain region;
a second silicide region overlying the conductive source region; and
wherein each of the first and second silicide regions comprises a silicide selected from the group consisting of CoZrySix, CoHfySix, NiZrySix, and NiHfySix, where “y” is less than one.
16. The field effect transistor of claim 15 , and further comprising a third silicide region overlying the gate body, the third silicide region comprising a silicide selected from the group consisting of CoZrySix, CoHfySix, NiZrySix, and NiHfySix, where “y” is less than one.
17. The field effect transistor of claim 15 wherein the first silicide region consists essentially of CoZrySix, where “y” is less than one.
18. The field effect transistor of claim 15 wherein the first silicide region consists essentially of oHfySix, where “y” is less than one.
19. The field effect transistor of claim 15 wherein the first silicide region consists essentially of NiZrysix, where “y” is less than one.
20. The field effect transistor of claim 15 wherein the first silicide region consists essentially of NiHfysix, where “y” is less than one.
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US09/742,034 US20020094669A1 (en) | 1997-12-12 | 2000-12-20 | Semiconductor device having reduced contact resistance and leakage and method of construction |
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US09/207,088 US6214710B1 (en) | 1997-12-12 | 1998-12-07 | Method for a semiconductor device having reduced contact resistance and leakage |
US09/742,034 US20020094669A1 (en) | 1997-12-12 | 2000-12-20 | Semiconductor device having reduced contact resistance and leakage and method of construction |
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US20100210098A1 (en) * | 2009-02-17 | 2010-08-19 | International Business Machines Corporation | Self-aligned contact |
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US6121663A (en) * | 1997-05-22 | 2000-09-19 | Advanced Micro Devices, Inc. | Local interconnects for improved alignment tolerance and size reduction |
US6724051B1 (en) * | 2000-10-05 | 2004-04-20 | Advanced Micro Devices, Inc. | Nickel silicide process using non-reactive spacer |
US6468900B1 (en) * | 2000-12-06 | 2002-10-22 | Advanced Micro Devices, Inc. | Dual layer nickel deposition using a cobalt barrier to reduce surface roughness at silicide/junction interface |
KR100431294B1 (en) * | 2001-10-06 | 2004-05-12 | 주식회사 하이닉스반도체 | method for fabricating semiconductor device |
US8975672B2 (en) | 2011-11-09 | 2015-03-10 | United Microelectronics Corp. | Metal oxide semiconductor transistor and manufacturing method thereof |
CN103117296B (en) * | 2011-11-17 | 2017-10-27 | 联华电子股份有限公司 | The formed method of metal oxide semiconductor transistor |
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US5047367A (en) | 1990-06-08 | 1991-09-10 | Intel Corporation | Process for formation of a self aligned titanium nitride/cobalt silicide bilayer |
JP2586345B2 (en) | 1994-10-14 | 1997-02-26 | 日本電気株式会社 | Semiconductor device comprising cobalt silicide film and method of manufacturing the device |
US6046113A (en) * | 1996-10-31 | 2000-04-04 | Texas Instruments Incorporated | Combined dry and wet etch for improved silicide formation |
US6037254A (en) * | 1996-10-31 | 2000-03-14 | Texas Instruments Incorporated | Method of making a surface protective layer for improved silicide formation |
US5888888A (en) * | 1997-01-29 | 1999-03-30 | Ultratech Stepper, Inc. | Method for forming a silicide region on a silicon body |
US6114733A (en) * | 1997-10-24 | 2000-09-05 | Texas Instruments Incorporated | Surface protective layer for improved silicide formation |
US6020239A (en) * | 1998-01-28 | 2000-02-01 | International Business Machines Corporation | Pillar transistor incorporating a body contact |
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1998
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US20100210098A1 (en) * | 2009-02-17 | 2010-08-19 | International Business Machines Corporation | Self-aligned contact |
US7888252B2 (en) * | 2009-02-17 | 2011-02-15 | International Business Machines Corporation | Self-aligned contact |
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