US20020030905A1 - Micromachined apparatus for improved reflection of light - Google Patents
Micromachined apparatus for improved reflection of light Download PDFInfo
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- US20020030905A1 US20020030905A1 US09/948,843 US94884301A US2002030905A1 US 20020030905 A1 US20020030905 A1 US 20020030905A1 US 94884301 A US94884301 A US 94884301A US 2002030905 A1 US2002030905 A1 US 2002030905A1
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- 239000000758 substrate Substances 0.000 claims description 10
- 230000004888 barrier function Effects 0.000 claims description 4
- 238000004804 winding Methods 0.000 claims 2
- 239000013307 optical fiber Substances 0.000 description 12
- 230000003287 optical effect Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 230000003760 hair shine Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000008021 deposition Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S359/00—Optical: systems and elements
- Y10S359/904—Micromirror
Definitions
- the invention relates to a micromachined apparatus for reflecting light.
- Optical fibers are commonly used in networks such as the Internet. Optical fibers are often bundled together in an array, each carrying different signals of light. In certain instances the signals of light carried by the different optical fibers have to be switched into a different arrangement.
- the optical fibers are provided as input fibers into an optical switch and further optical fibers are provided as output fibers from the optical switch.
- a micromachined apparatus for reflecting light from the input optical fibers is located in a path of light being emitted from the input optical fibers.
- the micromachined apparatus for reflecting light usually has an array of mirrors which are arranged in a manner similar to the input optical fibers. Each mirror reflects light from a respective input optical fiber to the output optical fibers. Each mirror can be pivoted so that the light reflected therefrom is directed to a selected one of the output optical fibers.
- Losses in quality and intensity of the light used in such a switch may occur. Losses may be due to the mirrors being located too far apart or due to clipping of edges of bundles of light when the mirrors are located at an angle to the bundles of light. Locating the mirrors too close to one another may, however, require forces that are too high for purposes of pivoting the mirrors against torsion spring forces which tend to restore the mirrors.
- a micromachined apparatus for reflecting light comprising a support structure and a plurality of mirrors. Each mirror is pivotally secured to the support structure. A first to a third adjacent ones of the mirrors are located at corners of a first triangle. Each corner of the triangle is less than 90°.
- FIG. 1 is a plan view of a micromachined apparatus for reflecting light according to an embodiment of the invention
- FIG. 2 is a cross-sectional side view on 2 - 2 in FIG. 1;
- FIG. 3 is a cross-sectional side view on 3 - 3 in FIG. 1.
- a micromachined apparatus for reflecting light is described that is designed to reduce losses in quality or intensity of light.
- “Micromachined” refers to structures fabricated by selective etching or deposition. As described in more detail below mirrors are used having lengths that are longer than their widths to reduce dipping of light when a mirror is located at an angle with respect to light falling thereon. Relatively long mirror torsion components are used to reduce forces required to pivot the mirrors. Regardless of the dimensions of the mirrors and the use of long torsion components, the mirrors are still located relatively dose to one another.
- the relatively dose positioning of the mirrors is due to a combined use of notches formed in support frames to which the torsion components are secured, oval shapes of the mirrors which take up less space than rectangular shapes, matching oval openings in the support frames, and the arrangement of the support frames in a non-rectangular array wherein tips of the support frames are located between one another.
- FIG. 1 to FIG. 3 of the accompanying drawings illustrate a micromachined apparatus 10 for reflecting light according to an embodiment of the invention.
- the apparatus 10 includes a substrate 12 , a support structure 14 , a plurality of support frames 16 , and a plurality of mirrors 18 and may be manufactured utilizing photographic techniques, ion etching techniques or any other technique as will be evident to a person skilled in the art.
- the support structure 14 is formed on the substrate 12 so as to be secured to the substrate 12 .
- the support structure 14 is in the form of a honeycomb defining generally hexagonal openings.
- the substrate is fabricated from silicon
- the support structure 14 is formed by a reactive ion etching of silicon
- the mirrors 18 are formed by etching silicon.
- Each frame 16 is formed to define an oval opening 20 .
- Deep notches 22 A and 22 B are formed in a surface of the oval opening 20 .
- the notches 22 A and 22 B are formed at 0° and 180° about the oval opening 20 , respectively.
- Notches 24 A and 24 B are also formed in an outer surface of the frame 16 .
- the notches 24 A and 24 B are located at 90° and 270° on the outer surface of the support frame 16 .
- the oval shape 20 has a length L1 and a width W1.
- the length L1 extends between the notches 22 A and 22 B and the width W1 between the notches 24 A and 24 B.
- the length L1 is typically about 320 micron and the width W1 is about 270 micron.
- the oval shape 20 thus has a long axis between the notches 22 A and 22 B.
- the frame 16 Because of the oval shape 20 and its orientation, and to allow for the notches 22 A and 22 B to be formed, the frame 16 has a length L2 and a width W2wherein the length L2 is much larger that the width W2.
- the frame 16 thus takes up more space along its length L2 than along its width W2.
- the length L2 is typically about 520 micron and the width W2 about 340 micron.
- Each frame 16 is located within a respective opening in the support structure 14 and is secured to the support structure 14 with two frame torsion components 26 .
- Each frame torsion component 26 has a first end 28 and a second, opposing end 30 .
- the first end 28 is non-rotationally secured to the support structure 14 .
- the frame torsion component 26 extends from the first end 28 into a respective one of the notches 24 A or 24 B, and the second end 30 is non-rotationally secured to the frame 16 .
- the frame 16 is thereby suspended above the substrate 12 by the frame torsion components 26 .
- the frame 16 has a minimum spacing S as measured from directly next to the notch 24 A to the support structure 14 .
- the frame torsion component 26 has a torsion length from the end 26 to the end 30 which is more than the minimum spacing S.
- the frame 16 can be pivoted about an axis through the frame torsion components 26 .
- the entire length of each frame torsion component 26 i.e. from its end 28 to its end 30 , winds up, or twists against a torsion spring force thereof, thus tending to return the frame 16 to its original position.
- each spring torsion component 26 has a torsion length that is relatively long, in particular longer than the minimum spacing S.
- a torsion spring constant of each spring portion component can be increased with a corresponding decrease in torsion required to pivot the frame 16 by a predetermined degree.
- the relatively long torsion length is allowed for due to the extra space provided by the notch 24 A or 24 B.
- Another thinner frame having less material may also provide a similar amount of space but may include too little material for purposes of strength.
- the notches 24 A or 24 B thus provide additional space while maintaining strength in the frame 16 .
- the frames 16 are located in a nonrectangular array.
- the frames 16 A, 16 B, and 16 C pivot about a common frame axis 30 and the frames 16 D, 16 E, and 16 F pivot about a common frame axis 32 which is parallel to and spaced from the frame axis 30 .
- a line can be constructed from a center point of an oval opening 20 of one frame (e.g. 16 A) to an oval opening 20 of an adjacent frame (e.g. 16 D). By constructing such lines between adjacent oval openings 20 , it can be seen that center points of the oval openings 20 are located at corners of contiguous triangles.
- oval openings 20 of the frames 16 A, 16 B, and 16 D are located respectively at comers 40 , 42 , and 44 of one triangle.
- Each comer, 40 , 42 , and 44 is less than 90°.
- the comers 40 and 42 are equal to one another.
- Each oval opening 20 has a center line 46 extending along its length L1.
- the center line 46 of the oval opening 16 D is spaced and parallel to the center line 46 of the oval opening 20 of the frame 16 A.
- the center line 46 of the oval opening 20 of the frame 16 B is spaced and parallel to the center line 46 A of the oval opening 20 of the frame 16 D, and so on.
- the center points of the oval openings of the frames 16 A, 16 B, and 16 D can be located closer to one another. This can be accomplished even though each frame 16 has a relatively long length L2. The frames 16 are then located over a smaller area than would for example be possible in a rectangular array.
- Each mirror 18 has an approximate oval shape with a length L3 and a width W3.
- the length L3 is typically about 300 micron and the width W3 about 250 micron.
- Each mirror 18 is located within a respective oval opening 20 with its length L3 along the length L1 of the oval opening 20 and its width W3 along the width W1 of the oval opening 20 .
- Each mirror 18 is secured to a respective frame 16 with two mirror torsion components 54 .
- Each mirror torsion component 54 has first and second opposed ends 56 and 58 respectively. The first end 56 is non-rotationally secured to the mirror 18 .
- the mirror torsion component 54 extends from the first end 56 into a respective one of the notches 22 A or 22 B.
- the second end 58 of the mirror torsion component 54 is non-rotationally secured to the frame 16 within the notch 22 A or 22 B.
- the mirror 18 is thereby suspended within the oval opening 20 of the frame 16 .
- a center point of the mirror 18 coincides with a center point of the oval opening 20 .
- the mirror can pivot relative to the frame 16 about the center line 46 , whereupon each mirror torsion component 54 winds up, or twists against a torsion spring force thereof.
- the length of each mirror torsion component 54 allows it to have a higher torsion spring constant with a corresponding smaller force being applied to rotate the mirror 18 by a certain degree.
- Electrostatic terminals 64 are formed on the substrate 12 .
- the electrostatic terminals 64 are used to pivot the frame 16 or the mirror 18 by electrostatic attraction.
- the support structure 14 also serves as an electrostatic barrier between electrostatic terminals and adjacent mirrors 18 .
- the apparatus 10 may be used in an optical switch wherein a respective circular bundle of light shines from a respective optical fiber onto a respective one of the mirrors 18 .
- the light may shine in a direction 66 which is at an angle 68 of, for example, 45° with respect to a plane in which the substrate 12 extends.
- a usable portion of the bundle of light falls between the width W3 of the mirror 18 .
- the bundle of light is usually circular in cross section so that it typically has a usable length which equals its usable width.
- each mirror 18 Because of its length L3 of the mirror 18 , the entire usable length of the bundle of light falls on the mirror 18 .
- the oval shape of the mirror 18 thereby allows for the entire usable width and length of the bundle of light to be reflected therefrom, even though the light shines in the direction 66 and even when the frame 16 is pivoted as shown in FIG. 2 so that the mirror 18 is pivoted with respect to the frame 16 .
- the oval shape of each mirror 18 also makes more efficient use of space than for example a rectangular mirror, thereby allowing for the mirrors 18 and frames 16 to be located over a smaller area.
- Mirrors 18 are thus used which have lengths L3 which are longer than their widths W3.
- relatively long mirror torsion components 54 and frame torsion components 56 are used. Regardless of the dimensions of the mirrors 18 and the torsion components 54 and 26 , the mirrors 18 are still located relatively dose to one another.
- the relatively close positioning of the mirrors 18 is due to a combined use of a honeycomb support structure 14 which also serves as an electrostatic barrier, the notches 22 A, 22 B, 24 A, 24 B, the oval shapes of the mirrors 18 together with closely matching shapes of the oval openings 20 , and the arrangement of the frames 16 in a non-rectangular array wherein a tip 50 can be located between the tips 52 and 54 .
- a smaller array results in a smaller optical switch and a reducing in path length that light has to travel before reaching and after being reflected by a mirror.
- a reducing in path length of the light reduces losses in quality and intensity of light.
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Micromachines (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
Abstract
Description
- The invention relates to a micromachined apparatus for reflecting light.
- Optical fibers are commonly used in networks such as the Internet. Optical fibers are often bundled together in an array, each carrying different signals of light. In certain instances the signals of light carried by the different optical fibers have to be switched into a different arrangement. The optical fibers are provided as input fibers into an optical switch and further optical fibers are provided as output fibers from the optical switch. A micromachined apparatus for reflecting light from the input optical fibers is located in a path of light being emitted from the input optical fibers. The micromachined apparatus for reflecting light usually has an array of mirrors which are arranged in a manner similar to the input optical fibers. Each mirror reflects light from a respective input optical fiber to the output optical fibers. Each mirror can be pivoted so that the light reflected therefrom is directed to a selected one of the output optical fibers.
- Losses in quality and intensity of the light used in such a switch may occur. Losses may be due to the mirrors being located too far apart or due to clipping of edges of bundles of light when the mirrors are located at an angle to the bundles of light. Locating the mirrors too close to one another may, however, require forces that are too high for purposes of pivoting the mirrors against torsion spring forces which tend to restore the mirrors.
- A micromachined apparatus for reflecting light is provided comprising a support structure and a plurality of mirrors. Each mirror is pivotally secured to the support structure. A first to a third adjacent ones of the mirrors are located at corners of a first triangle. Each corner of the triangle is less than 90°.
- Other features and advantages of the present invention will be apparent from the accompanying drawings and from the detailed description that follows below.
- The present invention is illustrated by way of example and not limitation in the figures of the accompanying drawings, in which like references indicate similar elements and in which:
- FIG. 1 is a plan view of a micromachined apparatus for reflecting light according to an embodiment of the invention;
- FIG. 2 is a cross-sectional side view on2-2 in FIG. 1; and
- FIG. 3 is a cross-sectional side view on3-3 in FIG. 1.
- A micromachined apparatus for reflecting light is described that is designed to reduce losses in quality or intensity of light. “Micromachined” refers to structures fabricated by selective etching or deposition. As described in more detail below mirrors are used having lengths that are longer than their widths to reduce dipping of light when a mirror is located at an angle with respect to light falling thereon. Relatively long mirror torsion components are used to reduce forces required to pivot the mirrors. Regardless of the dimensions of the mirrors and the use of long torsion components, the mirrors are still located relatively dose to one another. The relatively dose positioning of the mirrors is due to a combined use of notches formed in support frames to which the torsion components are secured, oval shapes of the mirrors which take up less space than rectangular shapes, matching oval openings in the support frames, and the arrangement of the support frames in a non-rectangular array wherein tips of the support frames are located between one another.
- FIG. 1 to FIG. 3 of the accompanying drawings illustrate a micromachined apparatus10 for reflecting light according to an embodiment of the invention. The apparatus 10 includes a
substrate 12, asupport structure 14, a plurality ofsupport frames 16, and a plurality ofmirrors 18 and may be manufactured utilizing photographic techniques, ion etching techniques or any other technique as will be evident to a person skilled in the art. - The
support structure 14 is formed on thesubstrate 12 so as to be secured to thesubstrate 12. Thesupport structure 14 is in the form of a honeycomb defining generally hexagonal openings. In one implementation, the substrate is fabricated from silicon, thesupport structure 14 is formed by a reactive ion etching of silicon, and themirrors 18 are formed by etching silicon. - Each
frame 16 is formed to define anoval opening 20.Deep notches 22A and 22B are formed in a surface of theoval opening 20. Thenotches 22A and 22B are formed at 0° and 180° about theoval opening 20, respectively.Notches 24A and 24B are also formed in an outer surface of theframe 16. Thenotches 24A and 24B are located at 90° and 270° on the outer surface of thesupport frame 16. - The
oval shape 20 has a length L1 and a width W1. The length L1 extends between thenotches 22A and 22B and the width W1 between thenotches 24A and 24B. The length L1 is typically about 320 micron and the width W1 is about 270 micron. Theoval shape 20 thus has a long axis between thenotches 22A and 22B. Because of theoval shape 20 and its orientation, and to allow for thenotches 22A and 22B to be formed, theframe 16 has a length L2 and a width W2wherein the length L2 is much larger that the width W2. Theframe 16 thus takes up more space along its length L2 than along its width W2. The length L2 is typically about 520 micron and the width W2 about 340 micron. - Each
frame 16 is located within a respective opening in thesupport structure 14 and is secured to thesupport structure 14 with twoframe torsion components 26. Eachframe torsion component 26 has afirst end 28 and a second, opposingend 30. Thefirst end 28 is non-rotationally secured to thesupport structure 14. Theframe torsion component 26 extends from thefirst end 28 into a respective one of thenotches 24A or 24B, and thesecond end 30 is non-rotationally secured to theframe 16. Theframe 16 is thereby suspended above thesubstrate 12 by theframe torsion components 26. Theframe 16 has a minimum spacing S as measured from directly next to thenotch 24A to thesupport structure 14. Theframe torsion component 26 has a torsion length from theend 26 to theend 30 which is more than the minimum spacing S. - The
frame 16 can be pivoted about an axis through theframe torsion components 26. The entire length of eachframe torsion component 26, i.e. from itsend 28 to itsend 30, winds up, or twists against a torsion spring force thereof, thus tending to return theframe 16 to its original position. It can thus be seen that, although the minimum spacing S can be kept relatively small, eachspring torsion component 26 has a torsion length that is relatively long, in particular longer than the minimum spacing S. By keeping the torsion length relatively long, a torsion spring constant of each spring portion component can be increased with a corresponding decrease in torsion required to pivot theframe 16 by a predetermined degree. The relatively long torsion length is allowed for due to the extra space provided by thenotch 24A or 24B. Another thinner frame having less material may also provide a similar amount of space but may include too little material for purposes of strength. Thenotches 24A or 24B thus provide additional space while maintaining strength in theframe 16. - The
frames 16 are located in a nonrectangular array. Theframes 16A, 16B, and 16C pivot about acommon frame axis 30 and theframes common frame axis 32 which is parallel to and spaced from theframe axis 30. A line can be constructed from a center point of anoval opening 20 of one frame (e.g. 16A) to anoval opening 20 of an adjacent frame (e.g. 16D). By constructing such lines between adjacentoval openings 20, it can be seen that center points of theoval openings 20 are located at corners of contiguous triangles. For example, theoval openings 20 of theframes 16A, 16B, and 16D are located respectively atcomers comers frames 16, a zigzag pattern is created following center points of oval openings of theframes - Each
oval opening 20 has acenter line 46 extending along its length L1. Thecenter line 46 of the oval opening 16D is spaced and parallel to thecenter line 46 of theoval opening 20 of theframe 16A. Similarly, thecenter line 46 of theoval opening 20 of the frame 16B is spaced and parallel to the center line 46A of theoval opening 20 of the frame 16D, and so on. By so locating theframes 16, atip 50 of the frame 16D near the notch 22B thereof can be located betweentips 52 and 54 of theframes 16A and 16B, respectively. - By locating the
tip 50 between thetips 52 and 54, the center points of the oval openings of theframes 16A, 16B, and 16D can be located closer to one another. This can be accomplished even though eachframe 16 has a relatively long length L2. Theframes 16 are then located over a smaller area than would for example be possible in a rectangular array. - Each
mirror 18 has an approximate oval shape with a length L3 and a width W3. The length L3 is typically about 300 micron and the width W3 about 250 micron. Eachmirror 18 is located within a respectiveoval opening 20 with its length L3 along the length L1 of theoval opening 20 and its width W3 along the width W1 of theoval opening 20. Eachmirror 18 is secured to arespective frame 16 with twomirror torsion components 54. Eachmirror torsion component 54 has first and second opposed ends 56 and 58 respectively. Thefirst end 56 is non-rotationally secured to themirror 18. Themirror torsion component 54 extends from thefirst end 56 into a respective one of thenotches 22A or 22B. Thesecond end 58 of themirror torsion component 54 is non-rotationally secured to theframe 16 within thenotch 22A or 22B. Themirror 18 is thereby suspended within theoval opening 20 of theframe 16. A center point of themirror 18 coincides with a center point of theoval opening 20. There is a minimum spacing M as measured from a surface of themirror 18 to a surface of theoval opening 20 directly next to thenotch 22A. Although the minimum spacing M is relatively small, themirror torsion component 54 is relatively long due to the depth of thenotch 22A while still maintaining strength of theframe 16. - The mirror can pivot relative to the
frame 16 about thecenter line 46, whereupon eachmirror torsion component 54 winds up, or twists against a torsion spring force thereof. The entire length of the mirror torsion component from thefirst end 56 to thesecond end 58 winds up, or twists. The length of eachmirror torsion component 54 allows it to have a higher torsion spring constant with a corresponding smaller force being applied to rotate themirror 18 by a certain degree. -
Electrostatic terminals 64 are formed on thesubstrate 12. Theelectrostatic terminals 64 are used to pivot theframe 16 or themirror 18 by electrostatic attraction. Thesupport structure 14 also serves as an electrostatic barrier between electrostatic terminals andadjacent mirrors 18. The apparatus 10 may be used in an optical switch wherein a respective circular bundle of light shines from a respective optical fiber onto a respective one of themirrors 18. The light may shine in adirection 66 which is at anangle 68 of, for example, 45° with respect to a plane in which thesubstrate 12 extends. A usable portion of the bundle of light falls between the width W3 of themirror 18. The bundle of light is usually circular in cross section so that it typically has a usable length which equals its usable width. Because of its length L3 of themirror 18, the entire usable length of the bundle of light falls on themirror 18. The oval shape of themirror 18 thereby allows for the entire usable width and length of the bundle of light to be reflected therefrom, even though the light shines in thedirection 66 and even when theframe 16 is pivoted as shown in FIG. 2 so that themirror 18 is pivoted with respect to theframe 16. It should be noted that the oval shape of eachmirror 18 also makes more efficient use of space than for example a rectangular mirror, thereby allowing for themirrors 18 and frames 16 to be located over a smaller area. - Mirrors18 are thus used which have lengths L3 which are longer than their widths W3. In addition, relatively long
mirror torsion components 54 andframe torsion components 56 are used. Regardless of the dimensions of themirrors 18 and thetorsion components mirrors 18 are still located relatively dose to one another. The relatively close positioning of themirrors 18 is due to a combined use of ahoneycomb support structure 14 which also serves as an electrostatic barrier, thenotches mirrors 18 together with closely matching shapes of theoval openings 20, and the arrangement of theframes 16 in a non-rectangular array wherein atip 50 can be located between thetips 52 and 54. By locating the mirrors closer to one another a smaller array is formed. A smaller array results in a smaller optical switch and a reducing in path length that light has to travel before reaching and after being reflected by a mirror. A reducing in path length of the light reduces losses in quality and intensity of light. - In the foregoing specification, the invention has been described with reference to specific exemplary embodiments thereof. It will, however, be evident that various modifications and changes may be made thereto without departing from the broader spirit and scope of the invention as set forth in the appended claims. The specification and drawings are, accordingly, to be regarded in an illustrative rather that a restrictive sense.
Claims (21)
Priority Applications (1)
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US09/948,843 US20020030905A1 (en) | 2000-05-18 | 2001-09-06 | Micromachined apparatus for improved reflection of light |
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US09/574,660 US6585383B2 (en) | 2000-05-18 | 2000-05-18 | Micromachined apparatus for improved reflection of light |
US09/948,843 US20020030905A1 (en) | 2000-05-18 | 2001-09-06 | Micromachined apparatus for improved reflection of light |
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US09/574,660 Division US6585383B2 (en) | 2000-05-18 | 2000-05-18 | Micromachined apparatus for improved reflection of light |
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US20020030905A1 true US20020030905A1 (en) | 2002-03-14 |
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US09/917,420 Expired - Lifetime US6612706B2 (en) | 2000-05-18 | 2001-07-27 | Micromachined apparatus for improved reflection of light |
US09/948,843 Abandoned US20020030905A1 (en) | 2000-05-18 | 2001-09-06 | Micromachined apparatus for improved reflection of light |
US09/948,801 Expired - Lifetime US6578974B2 (en) | 2000-05-18 | 2001-09-07 | Micromachined apparatus for improved reflection of light |
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US7209274B2 (en) * | 2001-06-02 | 2007-04-24 | Capella Photonics, Inc. | High fill-factor bulk silicon mirrors |
US6695457B2 (en) * | 2001-06-02 | 2004-02-24 | Capella Photonics, Inc. | Bulk silicon mirrors with hinges underneath |
US6882766B1 (en) | 2001-06-06 | 2005-04-19 | Calient Networks, Inc. | Optical switch fabric with redundancy |
JP3722021B2 (en) * | 2001-07-18 | 2005-11-30 | 株式会社デンソー | Light switch |
US7379668B2 (en) * | 2002-04-02 | 2008-05-27 | Calient Networks, Inc. | Optical amplification in photonic switched crossconnect systems |
US6870659B2 (en) * | 2002-10-11 | 2005-03-22 | Exajoule, Llc | Micromirror systems with side-supported mirrors and concealed flexure members |
US7193767B1 (en) * | 2004-03-03 | 2007-03-20 | Jonathan Peeri | Method for enhancing visibility |
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-
2000
- 2000-05-18 US US09/574,660 patent/US6585383B2/en not_active Expired - Lifetime
-
2001
- 2001-04-30 WO PCT/US2001/013964 patent/WO2001088595A2/en active Application Filing
- 2001-07-27 US US09/917,420 patent/US6612706B2/en not_active Expired - Lifetime
- 2001-09-06 US US09/948,843 patent/US20020030905A1/en not_active Abandoned
- 2001-09-07 US US09/948,801 patent/US6578974B2/en not_active Expired - Lifetime
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US20020044365A1 (en) | 2002-04-18 |
US6578974B2 (en) | 2003-06-17 |
US20010055166A1 (en) | 2001-12-27 |
US6612706B2 (en) | 2003-09-02 |
US20020018311A1 (en) | 2002-02-14 |
US6585383B2 (en) | 2003-07-01 |
WO2001088595A3 (en) | 2003-01-30 |
WO2001088595A2 (en) | 2001-11-22 |
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