US20010027017A1 - Minimizing metal corrosion during post metal solvent clean - Google Patents
Minimizing metal corrosion during post metal solvent clean Download PDFInfo
- Publication number
- US20010027017A1 US20010027017A1 US09/877,661 US87766101A US2001027017A1 US 20010027017 A1 US20010027017 A1 US 20010027017A1 US 87766101 A US87766101 A US 87766101A US 2001027017 A1 US2001027017 A1 US 2001027017A1
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- United States
- Prior art keywords
- solvent
- temperature
- spraying
- semiconductor wafer
- processing chamber
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- Abandoned
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- 239000002904 solvent Substances 0.000 title claims description 73
- 229910052751 metal Inorganic materials 0.000 title abstract description 11
- 239000002184 metal Substances 0.000 title abstract description 11
- 230000007797 corrosion Effects 0.000 title abstract description 7
- 238000005260 corrosion Methods 0.000 title abstract description 7
- 239000004065 semiconductor Substances 0.000 claims abstract description 43
- 238000000034 method Methods 0.000 claims abstract description 32
- AVFZOVWCLRSYKC-UHFFFAOYSA-N 1-methylpyrrolidine Chemical compound CN1CCCC1 AVFZOVWCLRSYKC-UHFFFAOYSA-N 0.000 claims abstract description 24
- AHVYPIQETPWLSZ-UHFFFAOYSA-N N-methyl-pyrrolidine Natural products CN1CC=CC1 AHVYPIQETPWLSZ-UHFFFAOYSA-N 0.000 claims abstract description 24
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 22
- 238000004140 cleaning Methods 0.000 claims abstract description 17
- 238000005507 spraying Methods 0.000 claims description 20
- 239000007921 spray Substances 0.000 claims description 19
- 229920000642 polymer Polymers 0.000 claims description 8
- 238000005530 etching Methods 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 12
- 235000012431 wafers Nutrition 0.000 abstract 6
- 239000003870 refractory metal Substances 0.000 description 15
- 239000010936 titanium Substances 0.000 description 6
- 229910000838 Al alloy Inorganic materials 0.000 description 5
- 239000012530 fluid Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
- H01L21/02068—Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers
- H01L21/02071—Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers the processing being a delineation, e.g. RIE, of conductive layers
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
- C11D7/5004—Organic solvents
- C11D7/5013—Organic solvents containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
Definitions
- the present invention relates the cleaning of etched residue from semiconductor devices. More particularly, the invention relates to the wet cleaning of etched residue from semiconductor devices.
- photoresist is applied to a surface to create an etch barrier. Parts not covered by the photoresist are etched away. The photoresist is then stripped away. Remaining photoresist and the etching residue is then cleaned, often through a wet cleaning process. If the solvent used in the wet cleaning process is too aggressive, the solvent may attack or corrode metal layers of the semiconductor devices. If the solvent used in the wet cleaning process is not aggressive enough, it may provide a slow throughput or insufficient residue removal. As device size decreases, solvent attack or corrosion of metal layers and residue are more likely to damage a semiconductor device.
- the foregoing object is accomplished providing a solvent spray at an elevated temperature, then providing a spray of the same solvent at a lower temperature close to room temperature, and then providing a water rinse.
- FIG. 1 is a schematic view of a wafer cleaning rinse system that is used in the practice of the invention.
- FIG. 2 is a cross-sectional view of an unfinished semiconductor device prior to being etched.
- FIG. 3 is a cross-sectional view of the unfinished semiconductor device, shown in FIG. 2, after etching.
- FIG. 4 is a cross-sectional view of the unfinished semiconductor device, shown in FIG. 3, after plasma stripping and solvent stripping and prior to the inventive process.
- FIG. 5 is a cross-sectional view of the unfinished semiconductor device, shown in FIG. 4, after undergoing the inventive process.
- FIG. 6 is a cross-sectional view of the of the unfinished semiconductor device, shown in FIG. 5, after an intermetallic dielectric layer has been deposited over the stacks.
- FIG. 1 is a schematic view of a wafer cleaning system 10 .
- the wafer cleaning system 10 comprises a processing chamber 12 , a first tank 14 in fluid connection with the processing chamber 12 through a first valve 16 , a second tank 18 in fluid connection with the processing chamber 12 through a second valve 20 , and a third tank 22 in fluid connection with the processing chamber 12 through a third valve 24 .
- a first temperature control 15 is connected to the first tank 14 .
- a second temperature control 19 is connected to the second tank 18 .
- a third temperature control 23 is connected to the third tank 22 .
- the processing chamber 12 comprises at least one spray nozzle 26 and a centrifuge carriage 28 .
- FIG. 2 is a cross-sectional view of an unfinished semiconductor device 110 on a semiconductor wafer 30 , which has an upper surface 112 .
- An oxide layer 113 is deposited on the upper surface 112 .
- a first refractory metal layer 115 is deposited on the oxide layer 113 .
- the first refractory metal layer 115 is made of a refractory metal chosen from the group consisting of titanium Ti, titanium nitride TiN, titanium/titanium nitride Ti/TiN.
- An aluminum alloy layer 116 is deposited on the first refractory metal layer 115 .
- a second refractory metal layer 118 is deposited on the aluminum alloy layer 116 .
- the second refractory metal layer is made of a refractory metal chosen from the group consisting of Ti, TiN, Ti/TiN.
- a photoresist mask 120 is placed on the second refractory metal layer 118 .
- the semiconductor device 110 then is subjected to a plasma etching to provide a metal etch.
- a power source creates a radio frequency field, which is used to energize etchant gases to a plasma state.
- the etchant gases attack the metal layer etching away the parts of the first refractory metal layer 115 , aluminum alloy layer 116 , second refractory metal layer 118 , and the oxide layer 112 that are not covered by the photoresist mask 120 .
- FIG. 3 is a cross sectional view of the part of the unfinished semiconductor device 110 after it has gone through the metal etch.
- Two stacks 122 are formed with each stack comprising an oxide layer 113 , a first refractory metal layer 115 , an aluminum alloy layer 116 , and a second refractory metal layer 118 , capped by the photoresist mask 120 .
- the etchant gasses deposit some of the photoresist onto the side walls of the stacks 122 , creating sidewall polymer residue 124 .
- the semiconductor device 110 is then subjected to a plasma strip and then a solvent strip which strips away the sidewall polymer residue 124 and the photoresist mask 120 , but leaves a polymer residue 126 as schematically illustrated in FIG. 4.
- the wafer 30 is then mounted in the centrifuge carriage 28 , as shown in FIG. 1.
- the centrifuge carriage 28 rotates the wafer 30 in the direction indicated by arrow A.
- the first temperature control 15 heats a solvent in the first tank 14 to a temperature of between 50° C. and 100° C.
- the solvent is a N-methylpyrrolidine (NMP) based solvent heated to a temperature of between 65° C. and 85° C.
- the first valve 16 is opened and allows the NMP solvent from the first tank to go to the spray nozzle 26 , which sprays the NMP solvent into the processing chamber 12 and onto the rotating wafer 30 . After a period of time, the first valve 16 is closed, which discontinues the spraying of the NMP solvent from the first tank 14 into the processing chamber 12 .
- NMP N-methylpyrrolidine
- the second temperature control 19 maintains the solvent in the second tank 18 at a temperature of between 20° C. and 40° C.
- the solvent in the second tank 18 is the same chemical as the solvent in the first tank 14 , which in the preferred embodiment the solvent is a N-methylpyrrolidine (NMP) based solvent, but is maintained at a different temperature, which in the preferred embodiment is between 25° C. and 30° C.
- the second valve 20 is opened and allows the NMP solvent from the second tank 18 to go to the spray nozzle 26 , which sprays the NMP solvent into the processing chamber 12 and onto the rotating wafer 30 . After a period of time, the second valve 20 is closed, which discontinues the spraying of the NMP solvent from the second tank 18 into the processing chamber 12 .
- the second temperature control 19 may not need to heat the solvent in the second tank 18 . Therefore, the invention may be practiced without the second temperature control 19 . It is also possible that the second temperature control 19 may need to cool the solvent in the second tank 18 to keep the solvent at room temperature.
- the third temperature control 23 maintains water, which is contained in the third tank 22 , at a temperature of between 20° C. and 40° C.
- the water is preferably kept at room temperature.
- the third valve 24 is opened and allows the water from the third tank 22 to go to the spray nozzle 26 , which sprays the water into the processing chamber 12 and onto the rotating wafer 30 .
- the third valve 20 is closed, which discontinues the spraying of the water from the third tank 22 into the processing chamber 12 . Since the water is preferably at room temperature, the third temperature control 23 may not need to heat the water in the third tank 22 . Therefore, the invention may be practiced without the third temperature control 23 . It is also possible that the third temperature control 23 may need to cool the water in the third tank 22 to keep the water at room temperature.
- the centrifuge carriage 28 stops rotating the wafer 30 .
- the wafer 30 is removed from the centrifuge carriage 28 .
- more than one wafer 30 is held in the centrifuge carriage 28 at a time.
- FIG. 5 is a cross sectional-view of the part of the unfinished semiconductor device 110 after it has been removed from the centrifuge carriage 28 .
- the polymer residue 126 has been stripped from the stacks 122 .
- the inventive method is aggressive enough to provide a fast throughput, but reduces solvent attack and corrosion of the first refractory metal layer 115 , an aluminum alloy layer 116 , and a second refractory metal layer 118 .
- FIG. 6 is a cross-sectional view of the part of the unfinished semiconductor device 110 after an intermetallic dielectric layer 130 has been deposited over the stacks 122 . Vias 132 have been etched in the intermetallic dielectric layer 130 to the stacks 122 , using a photoresist process. After the photoresist has been stripped, a polymer residue 134 remains.
- the wafer 30 is placed into the centrifuge carriage 28 as shown in FIG. 1, and the clean process described above is repeated. Namely, the centrifuge carriage 28 rotates the wafer 30 in the direction indicated by arrow A.
- the first temperature control 15 heats a solvent in the first tank 14 to a temperature of between 50° C. and 100° C.
- the solvent is a N-methylpyrrolidine (NMP) based solvent heated to a temperature of between 65° C. and 85° C.
- NMP N-methylpyrrolidine
- the first valve 16 is opened and allows the NMP solvent from the first tank to go to the spray nozzle 26 , which sprays the NMP solvent into the processing chamber 12 and onto the rotating wafer 30 . After a period of time, the first valve 16 is closed, which discontinues the spraying of the NMP solvent from the first tank 14 into the processing chamber 12 .
- NMP N-methylpyrrolidine
- the second temperature control 19 maintains the solvent in the second tank 18 at a temperature of between 20° C. and 40° C.
- the solvent in the second tank 18 is the same chemical as the solvent in the first tank 14 , which in the preferred embodiment the solvent is a N-methylpyrrolidine (NMP) based solvent, but is maintained at a different temperature, which in the preferred embodiment is between 25° C. and 30° C.
- the second valve 20 is opened and allows the NMP solvent from the second tank 18 to go to the spray nozzle 26 , which sprays the NMP solvent into the processing chamber 12 and onto the rotating wafer 30 . After a period of time, the second valve 20 is closed, which discontinues the spraying of the NMP solvent from the second tank 18 into the processing chamber 12 . Since room temperature is within the temperature range of the solvent in the second tank 18 , the second temperature control 19 may not need to heat the solvent in the second tank 18 .
- the third temperature control 23 maintains water which is contained in the third tank 22 at a temperature of between 20° C. and 40° C.
- the water is preferably kept at room temperature.
- the third valve 24 is opened and allows the water from the third tank 22 to go to the spray nozzle 26 , which sprays the water into the processing chamber 12 and onto the rotating wafer 30 .
- the third valve 20 is closed, which discontinues the spraying of the water from the third tank 22 into the processing chamber 12 . Since the water is preferably at room temperature, the third temperature control 23 may not need to heat the water in the third tank 22 .
- the centrifuge carriage 28 stops rotating the wafer 30 .
- the wafer 30 is removed from the centrifuge carriage 28 .
- more than one wafer 30 is held in the centrifuge carriage 28 at a time.
- the cleaning system 10 removes the polymer residue 134 from the vias 132 .
- the inventive method is aggressive enough to provide a fast throughput, but reduces solvent attack and corrosion of the second refractory metal layer 118 , which is exposed to the solvent through the vias 132 . Therefore the inventive polymer residue cleaning process may be used to protect metal layers in both the production of stacks and in the creation of vias.
- the unfinished semiconductor device undergoes further processes known in the prior art to complete the semiconductor device.
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Abstract
The inventive method provides a wet cleaning of semiconductor devices on semiconductor wafers after photoresist is stripped. Semiconductor wafers are placed into a centrifuge carriage of a processing chamber. The centrifuge carriage rotates the semiconductor wafers. N-methylpyrrolidine heated to a temperature between 65° C. and 85° C. is sprayed onto the semiconductor wafers. Next N-methylpyrrolidine at room temperature is sprayed onto the semiconductor wafers. Finally, water at room temperature is sprayed onto the semiconductor wafers. The inventive method provides high throughput cleaning without undue corrosion or damage to metal layers.
Description
- The present invention relates the cleaning of etched residue from semiconductor devices. More particularly, the invention relates to the wet cleaning of etched residue from semiconductor devices.
- In the manufacture of semiconductor devices, photoresist is applied to a surface to create an etch barrier. Parts not covered by the photoresist are etched away. The photoresist is then stripped away. Remaining photoresist and the etching residue is then cleaned, often through a wet cleaning process. If the solvent used in the wet cleaning process is too aggressive, the solvent may attack or corrode metal layers of the semiconductor devices. If the solvent used in the wet cleaning process is not aggressive enough, it may provide a slow throughput or insufficient residue removal. As device size decreases, solvent attack or corrosion of metal layers and residue are more likely to damage a semiconductor device.
- It would be advantageous to provide a wet cleaning processes that reduces solvent attack and corrosion of metal layers, which does not reduce residue removal and device throughput.
- It is an object of the invention to provide a wet cleaning process that reduces solvent attack and corrosion of metal layers, without reducing residue removal and device throughput.
- Accordingly, the foregoing object is accomplished providing a solvent spray at an elevated temperature, then providing a spray of the same solvent at a lower temperature close to room temperature, and then providing a water rinse.
- Other features of the present invention are disclosed or apparent in the section entitled: “DETAILED DESCRIPTION OF THE INVENTION.”
- For a fuller understanding of the present invention, reference is made to the accompanying drawings wherein:
- FIG. 1 is a schematic view of a wafer cleaning rinse system that is used in the practice of the invention.
- FIG. 2 is a cross-sectional view of an unfinished semiconductor device prior to being etched.
- FIG. 3 is a cross-sectional view of the unfinished semiconductor device, shown in FIG. 2, after etching.
- FIG. 4 is a cross-sectional view of the unfinished semiconductor device, shown in FIG. 3, after plasma stripping and solvent stripping and prior to the inventive process.
- FIG. 5 is a cross-sectional view of the unfinished semiconductor device, shown in FIG. 4, after undergoing the inventive process.
- FIG. 6 is a cross-sectional view of the of the unfinished semiconductor device, shown in FIG. 5, after an intermetallic dielectric layer has been deposited over the stacks.
- Reference numbers refer to the same or equivalent parts of the present invention throughout the several figures of the drawing.
- FIG. 1 is a schematic view of a
wafer cleaning system 10. Thewafer cleaning system 10 comprises aprocessing chamber 12, afirst tank 14 in fluid connection with theprocessing chamber 12 through afirst valve 16, asecond tank 18 in fluid connection with theprocessing chamber 12 through asecond valve 20, and athird tank 22 in fluid connection with theprocessing chamber 12 through athird valve 24. Afirst temperature control 15 is connected to thefirst tank 14. Asecond temperature control 19 is connected to thesecond tank 18. Athird temperature control 23 is connected to thethird tank 22. Theprocessing chamber 12 comprises at least onespray nozzle 26 and acentrifuge carriage 28. - In operation, prior to the inventive cleaning step, a wafer undergoes several steps to build semiconductor devices. FIG. 2 is a cross-sectional view of an
unfinished semiconductor device 110 on asemiconductor wafer 30, which has anupper surface 112. Anoxide layer 113 is deposited on theupper surface 112. A firstrefractory metal layer 115 is deposited on theoxide layer 113. In this example, the firstrefractory metal layer 115 is made of a refractory metal chosen from the group consisting of titanium Ti, titanium nitride TiN, titanium/titanium nitride Ti/TiN. Analuminum alloy layer 116 is deposited on the firstrefractory metal layer 115. A secondrefractory metal layer 118 is deposited on thealuminum alloy layer 116. In this example, the second refractory metal layer is made of a refractory metal chosen from the group consisting of Ti, TiN, Ti/TiN. Aphotoresist mask 120 is placed on the secondrefractory metal layer 118. - The
semiconductor device 110 then is subjected to a plasma etching to provide a metal etch. In plasma etching a power source creates a radio frequency field, which is used to energize etchant gases to a plasma state. The etchant gases attack the metal layer etching away the parts of the firstrefractory metal layer 115,aluminum alloy layer 116, secondrefractory metal layer 118, and theoxide layer 112 that are not covered by thephotoresist mask 120. - FIG. 3 is a cross sectional view of the part of the
unfinished semiconductor device 110 after it has gone through the metal etch. Twostacks 122 are formed with each stack comprising anoxide layer 113, a firstrefractory metal layer 115, analuminum alloy layer 116, and a secondrefractory metal layer 118, capped by thephotoresist mask 120. The etchant gasses deposit some of the photoresist onto the side walls of thestacks 122, creatingsidewall polymer residue 124. - The
semiconductor device 110 is then subjected to a plasma strip and then a solvent strip which strips away thesidewall polymer residue 124 and thephotoresist mask 120, but leaves apolymer residue 126 as schematically illustrated in FIG. 4. - The
wafer 30 is then mounted in thecentrifuge carriage 28, as shown in FIG. 1. Thecentrifuge carriage 28 rotates thewafer 30 in the direction indicated by arrow A. Thefirst temperature control 15 heats a solvent in thefirst tank 14 to a temperature of between 50° C. and 100° C. In the preferred embodiment, the solvent is a N-methylpyrrolidine (NMP) based solvent heated to a temperature of between 65° C. and 85° C. Thefirst valve 16 is opened and allows the NMP solvent from the first tank to go to thespray nozzle 26, which sprays the NMP solvent into theprocessing chamber 12 and onto the rotatingwafer 30. After a period of time, thefirst valve 16 is closed, which discontinues the spraying of the NMP solvent from thefirst tank 14 into theprocessing chamber 12. - The
second temperature control 19 maintains the solvent in thesecond tank 18 at a temperature of between 20° C. and 40° C. The solvent in thesecond tank 18 is the same chemical as the solvent in thefirst tank 14, which in the preferred embodiment the solvent is a N-methylpyrrolidine (NMP) based solvent, but is maintained at a different temperature, which in the preferred embodiment is between 25° C. and 30° C. Thesecond valve 20 is opened and allows the NMP solvent from thesecond tank 18 to go to thespray nozzle 26, which sprays the NMP solvent into theprocessing chamber 12 and onto the rotatingwafer 30. After a period of time, thesecond valve 20 is closed, which discontinues the spraying of the NMP solvent from thesecond tank 18 into theprocessing chamber 12. Since room temperature is within the temperature range of the solvent in thesecond tank 18, thesecond temperature control 19 may not need to heat the solvent in thesecond tank 18. Therefore, the invention may be practiced without thesecond temperature control 19. It is also possible that thesecond temperature control 19 may need to cool the solvent in thesecond tank 18 to keep the solvent at room temperature. - The
third temperature control 23 maintains water, which is contained in thethird tank 22, at a temperature of between 20° C. and 40° C. The water is preferably kept at room temperature. Thethird valve 24 is opened and allows the water from thethird tank 22 to go to thespray nozzle 26, which sprays the water into theprocessing chamber 12 and onto the rotatingwafer 30. After a period of time, thethird valve 20 is closed, which discontinues the spraying of the water from thethird tank 22 into theprocessing chamber 12. Since the water is preferably at room temperature, thethird temperature control 23 may not need to heat the water in thethird tank 22. Therefore, the invention may be practiced without thethird temperature control 23. It is also possible that thethird temperature control 23 may need to cool the water in thethird tank 22 to keep the water at room temperature. - The
centrifuge carriage 28 stops rotating thewafer 30. Thewafer 30 is removed from thecentrifuge carriage 28. In the preferred embodiment, more than onewafer 30 is held in thecentrifuge carriage 28 at a time. - FIG. 5 is a cross sectional-view of the part of the
unfinished semiconductor device 110 after it has been removed from thecentrifuge carriage 28. Thepolymer residue 126 has been stripped from thestacks 122. The inventive method is aggressive enough to provide a fast throughput, but reduces solvent attack and corrosion of the firstrefractory metal layer 115, analuminum alloy layer 116, and a secondrefractory metal layer 118. - FIG. 6 is a cross-sectional view of the part of the
unfinished semiconductor device 110 after anintermetallic dielectric layer 130 has been deposited over thestacks 122.Vias 132 have been etched in theintermetallic dielectric layer 130 to thestacks 122, using a photoresist process. After the photoresist has been stripped, apolymer residue 134 remains. Thewafer 30 is placed into thecentrifuge carriage 28 as shown in FIG. 1, and the clean process described above is repeated. Namely, thecentrifuge carriage 28 rotates thewafer 30 in the direction indicated by arrow A. Thefirst temperature control 15 heats a solvent in thefirst tank 14 to a temperature of between 50° C. and 100° C. In the preferred embodiment the solvent is a N-methylpyrrolidine (NMP) based solvent heated to a temperature of between 65° C. and 85° C. Thefirst valve 16 is opened and allows the NMP solvent from the first tank to go to thespray nozzle 26, which sprays the NMP solvent into theprocessing chamber 12 and onto the rotatingwafer 30. After a period of time, thefirst valve 16 is closed, which discontinues the spraying of the NMP solvent from thefirst tank 14 into theprocessing chamber 12. - The
second temperature control 19 maintains the solvent in thesecond tank 18 at a temperature of between 20° C. and 40° C. The solvent in thesecond tank 18 is the same chemical as the solvent in thefirst tank 14, which in the preferred embodiment the solvent is a N-methylpyrrolidine (NMP) based solvent, but is maintained at a different temperature, which in the preferred embodiment is between 25° C. and 30° C. Thesecond valve 20 is opened and allows the NMP solvent from thesecond tank 18 to go to thespray nozzle 26, which sprays the NMP solvent into theprocessing chamber 12 and onto the rotatingwafer 30. After a period of time, thesecond valve 20 is closed, which discontinues the spraying of the NMP solvent from thesecond tank 18 into theprocessing chamber 12. Since room temperature is within the temperature range of the solvent in thesecond tank 18, thesecond temperature control 19 may not need to heat the solvent in thesecond tank 18. - The
third temperature control 23 maintains water which is contained in thethird tank 22 at a temperature of between 20° C. and 40° C. The water is preferably kept at room temperature. Thethird valve 24 is opened and allows the water from thethird tank 22 to go to thespray nozzle 26, which sprays the water into theprocessing chamber 12 and onto the rotatingwafer 30. After a period of time, thethird valve 20 is closed, which discontinues the spraying of the water from thethird tank 22 into theprocessing chamber 12. Since the water is preferably at room temperature, thethird temperature control 23 may not need to heat the water in thethird tank 22. - The
centrifuge carriage 28 stops rotating thewafer 30. Thewafer 30 is removed from thecentrifuge carriage 28. In the preferred embodiment, more than onewafer 30 is held in thecentrifuge carriage 28 at a time. - The
cleaning system 10 removes thepolymer residue 134 from thevias 132. The inventive method is aggressive enough to provide a fast throughput, but reduces solvent attack and corrosion of the secondrefractory metal layer 118, which is exposed to the solvent through thevias 132. Therefore the inventive polymer residue cleaning process may be used to protect metal layers in both the production of stacks and in the creation of vias. - The unfinished semiconductor device undergoes further processes known in the prior art to complete the semiconductor device.
- Information as herein shown and described in detail is fully capable of attaining the above-described object of the invention, it is understood that it is the presently preferred embodiment of the present invention and is thus representative of the subject matter which is broadly contemplated by the present invention, that the scope of the present invention fully encompasses other embodiments which may become obvious to those skilled in the art, and that the scope of the present invention is accordingly to be limited by nothing other than the appended claims, in which reference to an element in the singular is not intended to mean “one and only one” unless explicitly so stated, but rather “one or more”. All structural and functional equivalents to the elements of the above-described preferred embodiment that are known or later come to be known to those of ordinary skill in the art are expressly incorporated herein by reference and are intended to be encompassed by the present claims. Moreover, it is not necessary for a device or method to address each and every problem sought to be solved by the present invention, for it to be encompassed by the present claims. Furthermore, no element, component, or method step in the present disclosure is intended to be dedicated to the public regardless of whether the element, component, or method step is explicitly recited in the claims. No claim element herein is to be construed under the provisions of 35 U.S.C. 112, sixth paragraph, unless the element is expressly recited using the phrase “means for”.
Claims (15)
1. A method of cleaning a semiconductor wafer, comprising the steps of:
placing the semiconductor wafer into a processing chamber;
spraying a first solvent, maintained at a temperature between 50° C. and 100° C., on to the semiconductor wafer;
discontinuing the spraying of the first solvent on to the semiconductor wafer;
spraying a second solvent, at a temperature between 20° C. and 40° C., on to the semiconductor wafer; and
discontinuing the spraying of the second solvent on to the semiconductor wafer.
2. The method, as recited in , further comprising the step of:
claim 1
spraying water, at a temperature between 20° C. and 40° C., on to the semiconductor wafer, wherein the step of spraying water is after the discontinuing of the spraying of the second solvent on the semiconductor wafer.
3. The method, as recited in , wherein the first solvent and the second solvent are made of the same chemicals.
claim 2
4. The method, as recited in , further comprising the step of centrifuging the wafer during the steps of spraying the first solvent, spraying the second solvent, and spraying the water.
claim 3
5. The method, as recited in , wherein in the step of spraying the first solvent, the first solvent is at a temperature between 65° C. and 85° C.
claim 4
6. The method, as recited in , wherein in the step of spraying the second solvent, the second solvent is at a temperature between 25° C. and 30° C.
claim 5
7. The method, as recited in , wherein the first solvent and the second solvent are N-methylpyrrolidine.
claim 6
8. The method, as recited in , further comprising the steps of:
claim 7
applying a layer on the semiconductor wafer, prior to placing the semiconductor wafer into the processing chamber;
placing a resist mask on the layer, prior to placing the semiconductor wafer into the processing chamber;
etching the layer, prior to placing the semiconductor wafer into the processing chamber; and
stripping the resist mask, prior to placing the semiconductor wafer into the processing chamber.
9. The method, as recited in , wherein part of the layer is metallic.
claim 8
10. The method, as recited in , further comprising the step of stripping a sidewall polymer residue, prior to placing the semiconductor wafer into the processing chamber.
claim 8
11. The method, as recited in , wherein the first solvent and the second solvent are made of the same chemicals.
claim 1
12. The method, as recited in , wherein in the step of spraying the first solvent, the first solvent is at a temperature between 65° C. and 85° C.
claim 11
13. The method, as recited in , wherein in the step of spraying the second solvent, the second solvent is at a temperature between 25° C. and 30° C.
claim 12
14. The method, as recited in , wherein the first solvent and the second solvent are N-methylpyrrolidine.
claim 13
15. An apparatus for cleaning a semiconductor wafer, comprising:
a processing chamber;
a wafer centrifuge mounted in the processing chamber, with a means for retaining a semiconductor wafer;
a spray nozzle mounted within the processing chamber;
means for providing a first solvent, at a temperature between 50° C. and 100° C., to the spray nozzle;
means for providing a second solvent, at a temperature between 20° C. and 40° C., to the spray nozzle; and
means for providing water, at a temperature between 20° C. and 40° C., to the spray nozzle.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/877,661 US20010027017A1 (en) | 1999-06-15 | 2001-06-08 | Minimizing metal corrosion during post metal solvent clean |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/334,120 US6274504B2 (en) | 1999-06-15 | 1999-06-15 | Minimizing metal corrosion during post metal solvent clean |
US09/877,661 US20010027017A1 (en) | 1999-06-15 | 2001-06-08 | Minimizing metal corrosion during post metal solvent clean |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US09/334,120 Division US6274504B2 (en) | 1999-06-15 | 1999-06-15 | Minimizing metal corrosion during post metal solvent clean |
Publications (1)
Publication Number | Publication Date |
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US20010027017A1 true US20010027017A1 (en) | 2001-10-04 |
Family
ID=23305675
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US09/334,120 Expired - Lifetime US6274504B2 (en) | 1999-06-15 | 1999-06-15 | Minimizing metal corrosion during post metal solvent clean |
US09/877,661 Abandoned US20010027017A1 (en) | 1999-06-15 | 2001-06-08 | Minimizing metal corrosion during post metal solvent clean |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US09/334,120 Expired - Lifetime US6274504B2 (en) | 1999-06-15 | 1999-06-15 | Minimizing metal corrosion during post metal solvent clean |
Country Status (1)
Country | Link |
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US (2) | US6274504B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105551942A (en) * | 2016-01-14 | 2016-05-04 | 成都海威华芯科技有限公司 | Method for cleaning etched deep hole of semiconductor wafer |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3382138B2 (en) * | 1997-08-21 | 2003-03-04 | 富士通株式会社 | Chemical liquid supply device and chemical liquid supply method |
US7276454B2 (en) * | 2002-11-02 | 2007-10-02 | Taiwan Semiconductor Manufacturing Co., Ltd. | Application of impressed-current cathodic protection to prevent metal corrosion and oxidation |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4119550A (en) * | 1975-03-21 | 1978-10-10 | The Lubrizol Corporation | Sulfurized compositions |
US4261791A (en) * | 1979-09-25 | 1981-04-14 | Rca Corporation | Two step method of cleaning silicon wafers |
US5419779A (en) | 1993-12-02 | 1995-05-30 | Ashland Inc. | Stripping with aqueous composition containing hydroxylamine and an alkanolamine |
US5863348A (en) * | 1993-12-22 | 1999-01-26 | International Business Machines Corporation | Programmable method for cleaning semiconductor elements |
JP3236220B2 (en) * | 1995-11-13 | 2001-12-10 | 東京応化工業株式会社 | Stripper composition for resist |
JP3755776B2 (en) * | 1996-07-11 | 2006-03-15 | 東京応化工業株式会社 | Rinsing composition for lithography and substrate processing method using the same |
US6033993A (en) * | 1997-09-23 | 2000-03-07 | Olin Microelectronic Chemicals, Inc. | Process for removing residues from a semiconductor substrate |
-
1999
- 1999-06-15 US US09/334,120 patent/US6274504B2/en not_active Expired - Lifetime
-
2001
- 2001-06-08 US US09/877,661 patent/US20010027017A1/en not_active Abandoned
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105551942A (en) * | 2016-01-14 | 2016-05-04 | 成都海威华芯科技有限公司 | Method for cleaning etched deep hole of semiconductor wafer |
Also Published As
Publication number | Publication date |
---|---|
US6274504B2 (en) | 2001-08-14 |
US20010001736A1 (en) | 2001-05-24 |
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Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |