US1705954A - Electrolytic disposition of chromium - Google Patents

Electrolytic disposition of chromium Download PDF

Info

Publication number
US1705954A
US1705954A US159507A US15950727A US1705954A US 1705954 A US1705954 A US 1705954A US 159507 A US159507 A US 159507A US 15950727 A US15950727 A US 15950727A US 1705954 A US1705954 A US 1705954A
Authority
US
United States
Prior art keywords
chromium
solution
electrolytic
disposition
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US159507A
Inventor
Auerbach Rudolf
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHROMEPLATE Inc
Original Assignee
CHROMEPLATE Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHROMEPLATE Inc filed Critical CHROMEPLATE Inc
Priority to US159507A priority Critical patent/US1705954A/en
Application granted granted Critical
Publication of US1705954A publication Critical patent/US1705954A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/04Electroplating: Baths therefor from solutions of chromium

Definitions

  • My invention refers to the electrolytic depstances the composition of the solution will osition of metallic chromium, and its partic- Vary from time to time in such manner as to ular object is to provide means whereby such require constant watching and correcting. deposition can be carried through under I have now found that colloidal silicic acid 5 more favorable conditions and in a less exand colloidal silicates are particularly useful pensive manner than was hitherto possible. and eifective in the direction aforementioned.
  • chromium will be the denser and the more 10 homogeneous the lower the density of current employed in producing same. If the cur- 5 grams of soluble water glass (N a Si,O,) rent density is too high, exceeding 5 amperes of 28 B. are dissolved in 500 ccms. water, per square decimetre, the electrolytic deposit and tothis solution is added under constant of chromium will be porous and brittle, so stirringa solution of 10- grams chromic acid 65 Example 1. 60
  • the method of electrolytically depositmg metallic chromium which consists in adding metallic chromium, which consists in adding about a 1% solution of soluble Waterv ing soluble Water glass (Na si O in about glass (Na Si O to about a 2% solution of a 1% solution to a dilute solution ofa chroohromic acid, mixing the resultant solution mium salt to which has been added an acid 5 With further quantities of a, chromic acid and and electrolyzing the solution.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)

Description

Patented Mar. 19, 1929. 4
UNITED STATES PATENT OFF-ICE.
RUDOLF AUERBACH, OF PROBSTDEUBEN, NEAR LEIPZIG, GERMANY, ASSIGNOR 'I'O GEROMEPLA'IE, INC., OF UNION CITY, NEW JERSEY, A CORPORATION OF NEW JERSEY.
-ELECTROLYTIC DISPOSITION OF CHROMIU'M.
No Drawing. 7 Application filed January 6, 1927. Serial No. 159,507.
My invention refers to the electrolytic depstances the composition of the solution will osition of metallic chromium, and its partic- Vary from time to time in such manner as to ular object is to provide means whereby such require constant watching and correcting. deposition can be carried through under I have now found that colloidal silicic acid 5 more favorable conditions and in a less exand colloidal silicates are particularly useful pensive manner than was hitherto possible. and eifective in the direction aforementioned.
As is well known to those skilled in the In carrying outmy invention I may, for art, an electrolytically produced deposit of instance, proceed as follows:
chromium will be the denser and the more 10 homogeneous the lower the density of current employed in producing same. If the cur- 5 grams of soluble water glass (N a Si,O,) rent density is too high, exceeding 5 amperes of 28 B. are dissolved in 500 ccms. water, per square decimetre, the electrolytic deposit and tothis solution is added under constant of chromium will be porous and brittle, so stirringa solution of 10- grams chromic acid 65 Example 1. 60
p as to readily splinter oil the base material. in 500 ccms. water. Only after the two solu- Furthermore with such high current .densitions have been mixed in the manner aforeties the separation of the metal willnot occur said, the electrolytic solution is completed by in perfect purity, oxygen compounds being slowly adding further quantities of chromic deposited in the pores which impair the qualacid or chromates and the like. a 70 ities of the deposit. Em Z 2 On the other hand the yield of chromium amp 6 per ampere hour is dependent from the cur- To a solution of 5 grams of soluble Water rent density, this yield increasing as the denglass (N a Si,O,) in 500 ccms. water are sity of current increases. In order, therefore, added under stirring 500 ccms. of a dilute soto obtain as strong a deposit as possible in the lution of a chromium salt, to which has been least possible time, the largest possible denadded sulphuric acid or some other suitable sity of current is preferable. acid. In this manner is obtained a colloidal, have now ascertained that if a. solvatized highly viscous mixture of chromium silicate colloid is added to the solution of chromic acidand silicic acid. 'Also in this case I prefer 30 or cromates employed in the I electrolytic dissolving the rest of the chromium salts process, a homogeneous deposition of chro: only after the colloidal mixture has been finmium will occur over a far wider range of ished. I current densities. In other words, chromium -If strong mineral acids have been used in will be de osited from the solution on the one the production of the silicates, it is preferhand with so low densities of current, that able to subject the solutions to dialysis beunder ordinary conditions no separation of fore preparing themready for use, in order metal would occur. 'On the other hand the to free them from the dispersed particles range within which dense and firmly adherwhich might cause trouble during the electroing deposits are obtained extends up to high lytic process. 0 40 current densities (beyond 15 amperes per I wish it to be understood that I do not desquare decimetre), so that the high yield obsire to be limited to the exact substances and tainable under these conditions,' which operations above described for obvious modiamounts substantially to 30 per cent, can be ficat-ions will occur to a person skilled in the utilized in a commercial manner. art. In view, however, of the fact that most of I claim:
the chromium solutions nowadays in use con- 1. The method of electrolytically dep0sittain either chromic acid or chromates, it is ing metallic chromium, which consists in addimpossible to employ organic colloids. For ing to a solution containing chromic acid, solwhile such colloids will at first act in the manuble freshly made silicic acid and electrolvz- 100 0 .ner above described, nevertheless in conseing the solution. quence of the oxidation of the organic sub- 2. The method of electrolytically depositmg metallic chromium, which consists in adding metallic chromium, which consists in adding about a 1% solution of soluble Waterv ing soluble Water glass (Na si O in about glass (Na Si O to about a 2% solution of a 1% solution to a dilute solution ofa chroohromic acid, mixing the resultant solution mium salt to which has been added an acid 5 With further quantities of a, chromic acid and and electrolyzing the solution.
electrolyzing the solution. In testimony whereof I affix my signature.
3. The method of electrolytically deposit- RUDOLF AUERBACH.
US159507A 1927-01-06 1927-01-06 Electrolytic disposition of chromium Expired - Lifetime US1705954A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US159507A US1705954A (en) 1927-01-06 1927-01-06 Electrolytic disposition of chromium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US159507A US1705954A (en) 1927-01-06 1927-01-06 Electrolytic disposition of chromium

Publications (1)

Publication Number Publication Date
US1705954A true US1705954A (en) 1929-03-19

Family

ID=22572841

Family Applications (1)

Application Number Title Priority Date Filing Date
US159507A Expired - Lifetime US1705954A (en) 1927-01-06 1927-01-06 Electrolytic disposition of chromium

Country Status (1)

Country Link
US (1) US1705954A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2992171A (en) * 1957-06-27 1961-07-11 Gen Dev Corp Method and composition for chromium plating

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2992171A (en) * 1957-06-27 1961-07-11 Gen Dev Corp Method and composition for chromium plating

Similar Documents

Publication Publication Date Title
USRE31508E (en) Electrodeposition of chromium
US3201223A (en) Method of preparation of silver powder having a protective gum coating
CN101988210A (en) Ionic liquid indium chloride/n-butyl pyridine chloride system electroplating solution
US1980381A (en) Method of making ductile electrolytic iron from sulphide ores
US1705954A (en) Electrolytic disposition of chromium
US1849293A (en) Process of electrodepositing indium
US3346468A (en) Tin electrodeposition process
US3462373A (en) Alkaline tin oxide sols and process for their preparation
US2577365A (en) Rhodium plating
US2841541A (en) Chemical composition for chromium plating
US4118293A (en) Process for producing tin (II) sulfate
EP0194432B1 (en) Bath for the galvanic deposition of gold-tin alloy coatings
US2598777A (en) Recovering gallium from metallic aluminum
US3589987A (en) Method for the electrolytic preparation of tungsten carbide
US2866740A (en) Electrodeposition of rhodium
US2514941A (en) Process for increasing the corrosion-resistance of metals
TWI576470B (en) Electroplating additive
US1584959A (en) Electrodeposited metal
US1608706A (en) Electrodeposition of metals
US1300420A (en) Process of conducting electrolysis.
US1564413A (en) Process of electroplating metallic cadmium and electrolytic bath therefor
US2612469A (en) Rapid fine-grained copper electrodeposition
DE582528C (en) Process for the electrolytic production of thin, molybdenum, tungsten, vanadium, beryllium, bismuth and tantalum-containing coatings on base metals
DE1922421B2 (en) GLAVANIC BATHROOM FOR DEPOSITING CRACK-FREE AND THICK RHODIUM LAYERS
US1372047A (en) Process of cleaning converter-slag