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Application filed by Петр Георгиевич ДульневfiledCriticalПетр Георгиевич Дульнев
Priority to UAA200611972ApriorityCriticalpatent/UA86803C2/en
Publication of UA86803C2publicationCriticalpatent/UA86803C2/en
A process for processing of etch solutions comprises the use of sulphuric acid in the presence of manganese dioxide with the regeneration of hydrogen chloride and obtaining of chlorine gas, ferrous (II) and manganese (II) sulphates, and the mixture of ferrous (II) and manganese (II) sulphates is used as a fertilizer or as a raw material for ferroalloy industry.
UAA200611972A2006-11-142006-11-14Process for processing of etch solutions
UA86803C2
(en)
Absorbent solution based on n,n,n',n'-tetramethylhexane-1,6-diamine and an amine having primary or secondary amine functions, and process for removing acid compounds from a gaseous effluent