TWM668299U - Ring Catalyst Unit - Google Patents

Ring Catalyst Unit Download PDF

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TWM668299U
TWM668299U TW114200540U TW114200540U TWM668299U TW M668299 U TWM668299 U TW M668299U TW 114200540 U TW114200540 U TW 114200540U TW 114200540 U TW114200540 U TW 114200540U TW M668299 U TWM668299 U TW M668299U
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area
plate
annular
wave
region
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TW114200540U
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賀鴻昌
韓佩樺
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信通交通器材股份有限公司
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Publication of TWM668299U publication Critical patent/TWM668299U/en

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Abstract

一種環形觸媒單體包含第一金屬環形本體、第二金屬環形本體以及位於第一金屬環形本體以及第二金屬環形本體之間的環形蜂巢狀結構。環形蜂巢狀結構包括波浪板以及平板相互疊置捲繞並容置於該第一金屬環形本體內。平板具有第一區域,波浪板具有波浪斷面並具有第二區域以及連接第二區域的連續區域。波浪斷面包含多個波峰及多個波谷。波浪板具有重疊於第二區域及連續區域二者中至少一者之至少一部分的焊料區域。位於焊料區域之該些波峰與該些波谷之外側具有焊料。平板的一端及波浪板的一端連接於第二金屬環形本體的外表面。An annular catalyst unit includes a first metal annular body, a second metal annular body, and an annular honeycomb structure located between the first metal annular body and the second metal annular body. The annular honeycomb structure includes a wave plate and a flat plate that are stacked and wound on each other and accommodated in the first metal annular body. The flat plate has a first area, the wave plate has a wave cross section and has a second area and a continuous area connected to the second area. The wave cross section includes a plurality of wave crests and a plurality of wave troughs. The wave plate has a solder area that overlaps at least a portion of at least one of the second area and the continuous area. The outer sides of the wave crests and the wave troughs located in the solder area have solder. One end of the flat plate and one end of the wave plate are connected to the outer surface of the second metal annular body.

Description

環形觸媒單體Ring Catalyst Unit

本揭露係關於一種環形觸媒單體,特別是一種適於裝設於氫燃料電池的環形觸媒單體。The present disclosure relates to an annular catalyst monomer, and in particular to an annular catalyst monomer suitable for being installed in a hydrogen fuel cell.

氫燃料電池運作過程中會產生廢氣。因此,氫燃料電池中設置具備淨化廢氣功能的觸媒轉化器。觸媒轉化器是將觸媒披覆在呈現環形蜂巢單體上,環形蜂巢單體包含金屬內環、金屬外環以及固定於金屬內環與金屬外環之間的蜂窩狀結構。其中蜂窩狀結構是由平板與波形板疊合捲繞後所形成,並且蜂窩狀結構是透過焊接方式固定於金屬內環與金屬外環之間。另外,蜂窩狀結構的表面係披覆有觸媒材料。因此,當廢氣通過環形蜂巢單體時,觸媒可將有害廢氣轉化為無害的氣體,從而減輕氫燃料電池運作中所排放的氣體對外界的污染。Hydrogen fuel cells generate exhaust gas during operation. Therefore, a catalyst converter with the function of purifying exhaust gas is installed in hydrogen fuel cells. The catalyst converter is a ring-shaped honeycomb monomer coated with a catalyst. The ring-shaped honeycomb monomer includes a metal inner ring, a metal outer ring, and a honeycomb structure fixed between the metal inner ring and the metal outer ring. The honeycomb structure is formed by stacking and winding a flat plate and a corrugated plate, and the honeycomb structure is fixed between the metal inner ring and the metal outer ring by welding. In addition, the surface of the honeycomb structure is coated with a catalyst material. Therefore, when the exhaust gas passes through the annular honeycomb monomer, the catalyst can convert the harmful exhaust gas into harmless gas, thereby reducing the pollution of the gas emitted during the operation of the hydrogen fuel cell to the outside world.

然而,由於環形蜂巢單體中的氣體通道係呈現直線狀,使得廢氣停留於環形蜂巢單體的時間過短,從而導致環形蜂巢單體的轉化效率不足。However, since the gas channel in the annular honeycomb monomer is in a straight line shape, the time that the exhaust gas stays in the annular honeycomb monomer is too short, resulting in insufficient conversion efficiency of the annular honeycomb monomer.

有鑑於上述問題,本揭露提供一種環形觸媒單體。In view of the above problems, the present disclosure provides a ring-shaped catalyst monomer.

依據一些實施例,環形觸媒單體包含第一金屬環形本體、第二金屬環形本體以及環形蜂巢狀結構。第二金屬環形本體位於第一金屬環形本體內,且第二金屬環形本體的直徑小於第一金屬環形本體的直徑。環形蜂巢狀結構位於第一金屬環形本體以及第二金屬環形本體之間。環形蜂巢狀結構包括波浪板以及平板,波浪板與平板相互疊置捲繞而成並容置於該第一金屬環形本體內。平板具有第一區域,波浪板具有波浪斷面並具有第二區域以及連續區域。第二區域連接連續區域。波浪斷面包含多個波峰及多個波谷。波浪板具有焊料區域,且焊料區域重疊於第二區域及連續區域二者中至少一者之至少一部分。位於焊料區域之該些波峰與該些波谷之外側具有焊料,焊料區域與波浪板之面積比為20%至67%。平板的一端及波浪板的一端連接於第二金屬環形本體的外表面。According to some embodiments, the annular catalyst unit includes a first metal annular body, a second metal annular body, and an annular honeycomb structure. The second metal annular body is located in the first metal annular body, and the diameter of the second metal annular body is smaller than the diameter of the first metal annular body. The annular honeycomb structure is located between the first metal annular body and the second metal annular body. The annular honeycomb structure includes a corrugated plate and a flat plate, which are stacked and wound with each other and accommodated in the first metal annular body. The flat plate has a first area, the corrugated plate has a corrugated cross section and has a second area and a continuous area. The second area is connected to the continuous area. The corrugated cross section includes multiple crests and multiple troughs. The wave plate has a solder area, and the solder area overlaps at least a portion of at least one of the second area and the continuous area. The outer sides of the wave crests and the wave troughs in the solder area have solder, and the area ratio of the solder area to the wave plate is 20% to 67%. One end of the flat plate and one end of the wave plate are connected to the outer surface of the second metal ring body.

依據一些實施例,重疊部分位於第二區域,而焊料區域與波浪板之面積比為40%至67%。According to some embodiments, the overlapping portion is located in the second region, and the area ratio of the solder region to the wave plate is 40% to 67%.

依據一些實施例,重疊部分位於連續區域,而焊料區域與波浪板之面積比為20%至33%。According to some embodiments, the overlapping portion is located in the continuous region, and the area ratio of the solder region to the wave plate is 20% to 33%.

依據一些實施例,重疊部分位於第二區域及連續區域,而焊料區域與波浪板之面積比為21%至40%。According to some embodiments, the overlapping portion is located in the second region and the continuous region, and the area ratio of the solder region to the wave plate is 21% to 40%.

在一些實施例中,波浪板一體連接於平板;但在另一些實施例中,波浪板與平板為不同板體。In some embodiments, the corrugated plate is integrally connected to the flat plate; but in other embodiments, the corrugated plate and the flat plate are different plates.

綜上所述,根據一或多個實施例,環形觸媒單體的焊料區域與波浪板具有適當的面積比,讓波浪板與平板所捲繞成的環形蜂巢狀結構可以穩固地固定於第一金屬環形本體與第二金屬環形本體之間,從而使得環形蜂巢狀結構具有良好的機械強度。另外,根據一或多個實施例,環形蜂巢狀結構的平板及波浪板具有適當的開孔率,可使廢氣停留於環形觸媒單體中的時間較長,從而增加擾流效果,讓環形觸媒單體具有較佳的轉換效率。並且,由於前述環形蜂巢狀結構的平板及波浪板的開孔設計,也使得氫燃料電池運作中的廢氣處理過程有較佳的熱均勻性。In summary, according to one or more embodiments, the solder area of the annular catalyst unit and the corrugated plate have an appropriate area ratio, so that the annular honeycomb structure formed by the corrugated plate and the flat plate can be stably fixed between the first metal annular body and the second metal annular body, so that the annular honeycomb structure has good mechanical strength. In addition, according to one or more embodiments, the flat plate and the corrugated plate of the annular honeycomb structure have an appropriate opening rate, so that the exhaust gas can stay in the annular catalyst unit for a longer time, thereby increasing the turbulence effect and allowing the annular catalyst unit to have a better conversion efficiency. Furthermore, due to the opening design of the flat plate and the corrugated plate of the aforementioned annular honeycomb structure, the exhaust gas treatment process during the operation of the hydrogen fuel cell also has better thermal uniformity.

請參閱圖1及圖2。圖1係繪示依據一些實施例之環形觸媒單體100的立體示意圖。圖2係繪示依據一些實施例之環形觸媒單體100的分解示意圖。如圖1及圖2所示,一種環形觸媒單體100適於被設置在氫燃料電池系統中。環形觸媒單體100上可以披覆觸媒(通常含有鈀(Pd)、鉑(Pt)與釕(Ru)等貴金屬)。因此,當廢氣通過環形觸媒單體100時,觸媒材料中的鈀、鉑以及釕可將有害廢氣中所含的一氧化碳及碳氫化合物分別氧化為二氧化碳及水。藉此,該觸媒可將通過環形觸媒單體100的有害廢氣轉換為無害的氣體,減輕燃料電池運作過程中對外界空氣造成的汙染。Please refer to Figures 1 and 2. Figure 1 is a three-dimensional schematic diagram of an annular catalyst monomer 100 according to some embodiments. Figure 2 is an exploded schematic diagram of an annular catalyst monomer 100 according to some embodiments. As shown in Figures 1 and 2, an annular catalyst monomer 100 is suitable for being arranged in a hydrogen fuel cell system. The annular catalyst monomer 100 can be coated with a catalyst (usually containing precious metals such as palladium (Pd), platinum (Pt) and ruthenium (Ru)). Therefore, when the exhaust gas passes through the annular catalyst monomer 100, the palladium, platinum and ruthenium in the catalyst material can oxidize the carbon monoxide and hydrocarbons contained in the harmful exhaust gas into carbon dioxide and water respectively. Thereby, the catalyst can convert harmful exhaust gas passing through the annular catalyst unit 100 into harmless gas, thereby reducing the pollution to the outside air caused by the operation of the fuel cell.

請繼續參閱圖1、圖2以及圖3A至圖3C。圖3A係繪示依據一些實施例之環形觸媒單體100的平板20與波浪板30的立體示意圖。圖3B繪示依據一些實施例之環形觸媒單體100的平板20與波浪板30相互疊置前的側視示意圖。圖3C繪示依據一些實施例之環形觸媒單體100的平板20與波浪板30相互疊置後的側視示意圖。如圖1、圖2以及圖3A至圖3C所示,環形觸媒單體100包含第一金屬環形本體12、第二金屬環形本體14以及環形蜂巢狀結構H。如圖1所示,第二金屬環形本體14位於第一金屬環形本體12內,且第二金屬環形本體14的直徑小於第一金屬環形本體12的直徑。環形蜂巢狀結構H位於第一金屬環形本體12以及第二金屬環形本體14之間,並且環形蜂巢狀結構H由平板20與波浪板30相互疊置(如圖3B及圖3C所示)、捲繞而成並容置於該第一金屬環形本體12內。平板20的一端及波浪板30的一端連接於第二金屬環形本體14的外表面14a(容後敘明)。Please continue to refer to Figures 1, 2, and 3A to 3C. Figure 3A is a three-dimensional schematic diagram of the flat plate 20 and the wave plate 30 of the annular catalyst unit 100 according to some embodiments. Figure 3B is a side view schematic diagram of the flat plate 20 and the wave plate 30 of the annular catalyst unit 100 before being stacked on each other according to some embodiments. Figure 3C is a side view schematic diagram of the flat plate 20 and the wave plate 30 of the annular catalyst unit 100 after being stacked on each other according to some embodiments. As shown in Figures 1, 2, and 3A to 3C, the annular catalyst unit 100 includes a first metal annular body 12, a second metal annular body 14, and an annular honeycomb structure H. As shown in FIG. 1 , the second metal annular body 14 is located in the first metal annular body 12, and the diameter of the second metal annular body 14 is smaller than the diameter of the first metal annular body 12. The annular honeycomb structure H is located between the first metal annular body 12 and the second metal annular body 14, and the annular honeycomb structure H is formed by overlapping and winding a flat plate 20 and a corrugated plate 30 (as shown in FIG. 3B and FIG. 3C ) and is accommodated in the first metal annular body 12. One end of the flat plate 20 and one end of the corrugated plate 30 are connected to the outer surface 14a of the second metal annular body 14 (described later).

在一些實施例中,第一金屬環形本體12、第二金屬環形本體14、平板20以及波浪板30的材料為不鏽鋼板,但並不以此為限制。在一些實施例中,可將金屬板透過機械捲成筒狀後,將兩端予以焊接而形成第一金屬環形本體12;同樣地,第二金屬環形本體14也可以相同方式製作。In some embodiments, the first metal ring body 12, the second metal ring body 14, the flat plate 20 and the corrugated plate 30 are made of stainless steel plates, but the present invention is not limited thereto. In some embodiments, the metal plate can be rolled into a cylinder by a machine, and then the two ends are welded to form the first metal ring body 12; similarly, the second metal ring body 14 can also be made in the same way.

環形觸媒單體100的長度與直徑、波浪板30及平板20的長度與厚度可視需求而設計,例如視氫燃料電池系統的尺寸而設計。在一些實施例中,環形觸媒單體100的長度可約為30 mm至120 mm,環形觸媒單體100的直徑(即第一金屬環形本體12的直徑)可約為150 mm至350 mm,第二金屬環形本體14的直徑可約為100 mm至250 mm。在一些實施例中,波浪板30及平板20的厚度可約為0.02 mm至0.2 mm。在一些實施例中,波浪板30的長度可約為5790 mm至68350 mm,而平板20的長度可約為5950 mm至69130 mm。在一些實施例中,環形觸媒單體100的長度與直徑分別約為40 mm與150 mm、波浪板30的長度約為640 mm、平板20的長度約為660 mm。在一些實施例中,環形觸媒單體100的長度與直徑分別約為80 mm與350 mm。波浪板30的長度約為5840 mm、平板20的長度約為5920 mm。The length and diameter of the annular catalyst unit 100, the length and thickness of the corrugated plate 30 and the flat plate 20 can be designed according to the requirements, for example, according to the size of the hydrogen fuel cell system. In some embodiments, the length of the annular catalyst unit 100 can be about 30 mm to 120 mm, the diameter of the annular catalyst unit 100 (i.e., the diameter of the first metal annular body 12) can be about 150 mm to 350 mm, and the diameter of the second metal annular body 14 can be about 100 mm to 250 mm. In some embodiments, the thickness of the corrugated plate 30 and the flat plate 20 can be about 0.02 mm to 0.2 mm. In some embodiments, the length of the wave plate 30 may be approximately 5790 mm to 68350 mm, and the length of the flat plate 20 may be approximately 5950 mm to 69130 mm. In some embodiments, the length and diameter of the annular catalyst unit 100 are approximately 40 mm and 150 mm, respectively, the length of the wave plate 30 is approximately 640 mm, and the length of the flat plate 20 is approximately 660 mm. In some embodiments, the length and diameter of the annular catalyst unit 100 are approximately 80 mm and 350 mm, respectively. The length of the wave plate 30 is approximately 5840 mm, and the length of the flat plate 20 is approximately 5920 mm.

在一些實施例中,平板20具有第一區域21(以虛線框列),而第一區域21具有多個第一孔洞21a,各第一孔洞21a的孔徑(直徑)大小 (Φ)為介於0.8 mm至5 mm之間。該些第一孔洞21a的孔徑可以相同或不同,且相鄰的第一孔洞21a間的孔距可以相同或不同。波浪板30包含第二區域31(以虛線框列)及連續區域32,而第二區域31連接連續區域32。第二區域31具有多個第二孔洞31a,各第二孔洞31a的孔徑大小為介於0.8 mm至5 mm之間。該些第二孔洞31a的孔徑可以相同或不同,且相鄰的第二孔洞31a間的孔距可以相同或不同。In some embodiments, the plate 20 has a first region 21 (in a dotted frame), and the first region 21 has a plurality of first holes 21a, and the aperture (diameter) size (Φ) of each first hole 21a is between 0.8 mm and 5 mm. The apertures of the first holes 21a can be the same or different, and the hole spacing between adjacent first holes 21a can be the same or different. The wave plate 30 includes a second region 31 (in a dotted frame) and a continuous region 32, and the second region 31 is connected to the continuous region 32. The second region 31 has a plurality of second holes 31a, and the aperture size of each second hole 31a is between 0.8 mm and 5 mm. The apertures of the second holes 31a can be the same or different, and the hole spacing between adjacent second holes 31a can be the same or different.

請再次參閱圖3A,波浪板30的第二區域31具有第二孔洞31a,而連續區域32則是指波浪板30上沒有形成第二孔洞31a的部分。在一些實施例中,波浪板30由第二區域31及連續區域32所組成。第二區域31是指第二孔洞31a所在位置的區域,該第二區域31的邊界可以是切齊第二區域31中最外側的第二孔洞31a外緣。連續區域32是在波浪板30上第二區域31以外的區域。對應的,平板20是由第一區域21及連續區域22所組成,第一區域21是指第一孔洞21a所在位置的區域,該第一區域21的邊界可以是切齊第一區域21中最外側的第一孔洞21a外緣。連續區域22是在平板20上第一區域21以外的區域。在一些實施例中,平板20的第一區域21及連續區域22與波浪板30的第二區域31與連續區域32可相互對應,而具有相同的配置。為方便說明,以下僅以波浪板30為例,說明其第二區域31與連續區域32的不同配置情況。Please refer to FIG. 3A again. The second area 31 of the wave plate 30 has a second hole 31a, and the continuous area 32 refers to the portion of the wave plate 30 where the second hole 31a is not formed. In some embodiments, the wave plate 30 is composed of the second area 31 and the continuous area 32. The second area 31 refers to the area where the second hole 31a is located, and the boundary of the second area 31 may be aligned with the outer edge of the outermost second hole 31a in the second area 31. The continuous area 32 is the area outside the second area 31 on the wave plate 30. Correspondingly, the flat plate 20 is composed of the first area 21 and the continuous area 22. The first area 21 refers to the area where the first hole 21a is located, and the boundary of the first area 21 may be aligned with the outer edge of the outermost first hole 21a in the first area 21. The continuous area 22 is an area outside the first area 21 on the flat plate 20. In some embodiments, the first area 21 and the continuous area 22 of the flat plate 20 and the second area 31 and the continuous area 32 of the wave plate 30 may correspond to each other and have the same configuration. For the convenience of explanation, the following only takes the wave plate 30 as an example to explain the different configurations of its second area 31 and the continuous area 32.

請參閱圖4。圖4繪示依據一些實施例之環形觸媒單體100的尚未彎成波浪狀的波浪板30的第二區域31及連續區域32的示意圖。為方便以圖式表示,圖4係以尚未彎成波浪狀的波浪板30說明其第二區域31與連續區域32之配置關係。如圖4所示,在本實施例中,第二區域31係概呈矩形,而連續區域32則呈現口字型。需要說明的是,上述第二區域31的形狀僅為例示,本創作並不以此為限。Please refer to FIG. 4. FIG. 4 is a schematic diagram of the second area 31 and the continuous area 32 of the wave plate 30 that has not yet been bent into a wave shape of the annular catalyst unit 100 according to some embodiments. For the convenience of diagrammatic representation, FIG. 4 uses the wave plate 30 that has not yet been bent into a wave shape to illustrate the configuration relationship between the second area 31 and the continuous area 32. As shown in FIG. 4, in this embodiment, the second area 31 is roughly rectangular, and the continuous area 32 is in the shape of a square. It should be noted that the shape of the second area 31 is only an example, and the present invention is not limited thereto.

請參閱圖5A及圖5B。圖5A繪示依據一些實施例之環形觸媒單體100的平板20的第一區域21的示意圖(一)。圖5B繪示依據一些實施例之環形觸媒單體100的平板20的第一區域21的示意圖(二)。如圖5A所示,在一些實施例中,第一孔洞21a可以於第一區域21交錯排列(例如第一行的第一孔洞21a與第二行的第一孔洞21a沿著平板20的長軸方向D1不相互對齊),但並不以此為限。如圖5B所示,在另一些實施例中,第一孔洞21a也可以於第一區域21相互對齊排列(例如第一行的第一孔洞21a與第二行的第一孔洞21a沿著平板20的長軸方向D1相互對齊)。請參閱圖5C及圖5D。圖5C繪示依據一些實施例之環形觸媒單體100的尚未彎成波浪狀的波浪板30的第二區域31的示意圖(一)。圖5D繪示依據一些實施例之環形觸媒單體100的尚未彎成波浪狀的波浪板30的第二區域31的示意圖(二)。為方便以圖式表示,圖5C及圖5D係以尚未彎成波浪狀的波浪板30說明其第二孔洞31a的配置關係。如圖5C所示,類似地,在一些實施例中,第二孔洞31a可以於第二區域31交錯排列(例如第一行的第二孔洞31a與第二行的第二孔洞31a沿著波浪板30的長軸方向D1不相互對齊),但並不以此為限。如圖5D所示,在另一些實施例中,第二孔洞31a也可以於第二區域31相互對齊排列(例如第一行的第二孔洞31a與第二行的第二孔洞31a沿著波浪板30的長軸方向D1相互對齊)。Please refer to FIG. 5A and FIG. 5B. FIG. 5A is a schematic diagram (I) of the first region 21 of the flat plate 20 of the annular catalyst unit 100 according to some embodiments. FIG. 5B is a schematic diagram (II) of the first region 21 of the flat plate 20 of the annular catalyst unit 100 according to some embodiments. As shown in FIG. 5A, in some embodiments, the first holes 21a may be arranged in a staggered manner in the first region 21 (for example, the first holes 21a in the first row and the first holes 21a in the second row are not aligned with each other along the long axis direction D1 of the flat plate 20), but the present invention is not limited thereto. As shown in FIG. 5B, in other embodiments, the first holes 21a may also be arranged in alignment with each other in the first region 21 (for example, the first holes 21a in the first row and the first holes 21a in the second row are aligned with each other along the long axis direction D1 of the flat plate 20). Please refer to FIG. 5C and FIG. 5D. FIG. 5C is a schematic diagram (I) of the second region 31 of the wave plate 30 of the annular catalyst unit 100 that has not yet been bent into a wave shape according to some embodiments. FIG. 5D is a schematic diagram (II) of the second region 31 of the wave plate 30 of the annular catalyst unit 100 that has not yet been bent into a wave shape according to some embodiments. For the convenience of diagrammatic representation, FIG. 5C and FIG. 5D illustrate the configuration relationship of the second holes 31a of the wave plate 30 that has not yet been bent into a wave shape. As shown in FIG. 5C, similarly, in some embodiments, the second holes 31a can be arranged in a staggered manner in the second region 31 (for example, the second holes 31a of the first row and the second holes 31a of the second row are not aligned with each other along the long axis direction D1 of the wave plate 30), but it is not limited thereto. As shown in FIG. 5D , in some other embodiments, the second holes 31 a may also be arranged in alignment with each other in the second region 31 (eg, the second holes 31 a in the first row and the second holes 31 a in the second row are aligned with each other along the long axis direction D1 of the corrugated plate 30 ).

前述第一孔洞21a與第二孔洞31a是圓孔,但並不以此為限;在一些實施例中,孔洞的形狀也可以是其他幾何圖形,第一孔洞21a與第二孔洞31a之形狀亦可相異。The first hole 21a and the second hole 31a are circular holes, but the present invention is not limited thereto. In some embodiments, the shape of the hole can also be other geometric shapes, and the shapes of the first hole 21a and the second hole 31a can also be different.

第一孔洞21a與第二孔洞31a的總面積相對於平板20及波浪板30的總面積的比例(以下稱為開孔率)為介於約30~60%之間。在一實施例中,前述開孔率約為45%。The ratio of the total area of the first holes 21a and the second holes 31a to the total area of the flat plate 20 and the corrugated plate 30 (hereinafter referred to as the opening ratio) is between about 30% and 60%. In one embodiment, the opening ratio is about 45%.

請參閱圖6A至圖6C。圖6A係繪示依據一些實施例之環形觸媒單體100的尚未彎成波浪狀的波浪板30的第二區域31、連續區域32及焊料區域33的示意圖(一)。圖6B係繪示依據一些實施例之環形觸媒單體100的尚未彎成波浪狀的波浪板30的第二區域31、連續區域32及焊料區域33的示意圖(二)。圖6C係繪示依據一些實施例之環形觸媒單體100的尚未彎成波浪狀的波浪板30的第二區域31、連續區域32及焊料區域33的示意圖(三)。為方便以圖式表示,圖6A至圖6C係以尚未彎成波浪狀的波浪板30說明其第二區域31、連續區域32及焊料區域33的配置關係。如圖6A至圖6C所示,在一些實施例中,波浪板30具有焊料區域33(以點鏈線方式表現)。而焊料區域33重疊於第二區域31及連續區域32二者中至少一者之至少一部分。換句話說,在一些實施例中,焊料區域33重疊於第二區域31的至少一部分(如圖6A所示)、或者重疊於連續區域32的至少一部分(如圖6B所示)又或者重疊於第二區域31的至少一部分及連續區域32的至少一部分(如圖6C所示)。Please refer to Figures 6A to 6C. Figure 6A is a schematic diagram (I) showing the second region 31, the continuous region 32, and the solder region 33 of the wave plate 30 of the annular catalyst unit 100 that has not yet been bent into a wave shape. Figure 6B is a schematic diagram (II) showing the second region 31, the continuous region 32, and the solder region 33 of the wave plate 30 of the annular catalyst unit 100 that has not yet been bent into a wave shape. Figure 6C is a schematic diagram (III) showing the second region 31, the continuous region 32, and the solder region 33 of the wave plate 30 of the annular catalyst unit 100 that has not yet been bent into a wave shape. For the convenience of diagrammatic representation, FIG. 6A to FIG. 6C illustrate the configuration relationship between the second region 31, the continuous region 32, and the solder region 33 of the wave plate 30 that has not yet been bent into a wave shape. As shown in FIG. 6A to FIG. 6C, in some embodiments, the wave plate 30 has a solder region 33 (represented by dot-chain lines). The solder region 33 overlaps at least a portion of at least one of the second region 31 and the continuous region 32. In other words, in some embodiments, the solder region 33 overlaps at least a portion of the second region 31 (as shown in FIG. 6A), or overlaps at least a portion of the continuous region 32 (as shown in FIG. 6B), or overlaps at least a portion of the second region 31 and at least a portion of the continuous region 32 (as shown in FIG. 6C).

並請一併參閱圖7。圖7係繪示依據一些實施例之環形觸媒單體100的環形蜂巢狀結構H的局部剖面示意圖。為方便說明,圖7僅繪示出環形蜂巢狀結構H中的一層波浪板30與二層平板20的剖面情況。如圖7所示,在一些實施例中,沿環形蜂巢狀結構H的剖面觀之,波浪板30具有波浪斷面,波浪斷面包含多個波峰30a及多個波谷30b,並且波峰30a與波谷30b係沿著波浪板30的長軸方向D1(即沿著環形蜂巢狀結構H的圓周方向)交錯排列。位於焊料區域33之該些波峰30a與該些波谷30b之外側具有焊料T。如圖7所示,在本實施例中,外側是指波浪板30的波峰30a/波谷30b接近相鄰的平板20的部分。此外,在一些實施例中,焊料區域33與波浪板30之面積比為約20%至約67%。Please also refer to FIG. 7. FIG. 7 is a partial cross-sectional schematic diagram of the annular honeycomb structure H of the annular catalyst unit 100 according to some embodiments. For the convenience of explanation, FIG. 7 only shows the cross-sectional conditions of the first layer of wave plate 30 and the second layer of flat plate 20 in the annular honeycomb structure H. As shown in FIG. 7, in some embodiments, when viewed along the cross-section of the annular honeycomb structure H, the wave plate 30 has a wave cross-section, and the wave cross-section includes a plurality of wave crests 30a and a plurality of wave troughs 30b, and the wave crests 30a and the wave troughs 30b are arranged alternately along the long axis direction D1 of the wave plate 30 (i.e., along the circumferential direction of the annular honeycomb structure H). The solder T is disposed outside the wave crests 30a and the wave valleys 30b of the solder region 33. As shown in FIG7 , in the present embodiment, the outside refers to the portion of the wave crests 30a/wave valleys 30b of the wave plate 30 close to the adjacent flat plate 20. In addition, in some embodiments, the area ratio of the solder region 33 to the wave plate 30 is about 20% to about 67%.

請再次參閱圖6A,在本實施例中,焊料區域33重疊於第二區域31的至少一部分。換句話說,在本實施例中,焊料區域33全部都在第二區域31上,也就是於製程中焊料T會被塗在第二區域31上,使得焊料T位於第二區域31的第二孔洞31a之間的實體部分(當焊料T的黏滯性較低時,焊料T亦可能位於第二孔洞31a的孔壁)。另外,在本實施例中,焊料區域33與波浪板30之面積比為約40%至約67%。Please refer to FIG. 6A again. In this embodiment, the solder area 33 overlaps at least a portion of the second area 31. In other words, in this embodiment, the solder area 33 is all on the second area 31, that is, the solder T will be applied to the second area 31 during the manufacturing process, so that the solder T is located in the solid part between the second holes 31a of the second area 31 (when the viscosity of the solder T is low, the solder T may also be located on the hole wall of the second hole 31a). In addition, in this embodiment, the area ratio of the solder area 33 to the wave plate 30 is about 40% to about 67%.

請再次參閱圖6B,在本實施例中,焊料區域33重疊於連續區域32的至少一部分。換句話說,焊料區域33全部都在連續區域32上,也就是於製程中焊料T會被塗在連續區域32上。在本實施例中,焊料區域33與波浪板30之面積比為約20%至約33%。Please refer to FIG. 6B again. In this embodiment, the solder region 33 overlaps at least a portion of the continuous region 32. In other words, the solder region 33 is entirely on the continuous region 32, that is, the solder T will be applied on the continuous region 32 during the manufacturing process. In this embodiment, the area ratio of the solder region 33 to the wave plate 30 is about 20% to about 33%.

請再次參閱圖6C,在本實施例中,焊料區域33重疊於第二區域31的至少一部分及連續區域32的至少一部分。換句話說,在本實施例中,焊料區域33部分位於連續區域32上而部分位於第二區域31上,也就是於製程中焊料T會被塗在連續區域32以及第二區域31上。另外,在本實施例中,焊料區域33與波浪板30之面積比為約21%至約40%。Please refer to FIG. 6C again. In this embodiment, the solder region 33 overlaps at least a portion of the second region 31 and at least a portion of the continuous region 32. In other words, in this embodiment, the solder region 33 is partially located on the continuous region 32 and partially located on the second region 31, that is, during the manufacturing process, the solder T will be applied on the continuous region 32 and the second region 31. In addition, in this embodiment, the area ratio of the solder region 33 to the wave plate 30 is about 21% to about 40%.

另外,需要說明的是,圖5C的第二區域31(以框線表示)也可以是單純的矩形,圖式僅為單純說明那一區是第二區域31,但至於第二區域31是否是多邊形或矩形,並不重要,只要開孔率符合前述數值範圍即可。類似地,圖5A中的第一區域21(以框線表示)也可以是單純的矩形,圖式僅為單純說明那一區是第一區域21,但至於第一區域21是否是多邊形或矩形,並不重要,只要開孔率符合前述數值範圍即可。In addition, it should be noted that the second area 31 (indicated by a frame line) in FIG. 5C may also be a simple rectangle, and the diagram is only used to simply illustrate which area is the second area 31. However, it is not important whether the second area 31 is a polygon or a rectangle, as long as the opening rate meets the aforementioned numerical range. Similarly, the first area 21 (indicated by a frame line) in FIG. 5A may also be a simple rectangle, and the diagram is only used to simply illustrate which area is the first area 21. However, it is not important whether the first area 21 is a polygon or a rectangle, as long as the opening rate meets the aforementioned numerical range.

請參閱圖8A及圖8B並再次參閱圖3A至圖3C。圖8A繪示依據一些實施例之環形觸媒單體100的平板20與波浪板30的製造方法示意圖(一)。圖8B繪示依據一些實施例之環形觸媒單體100的平板20與波浪板30的製造方法示意圖(二)。以下搭配圖式簡單說明依據一或多個實施例的環形觸媒單體100的平板20及波浪板30的製作過程。首先,在平面式的連續板件90(如圖8A所示)上透過沖壓機器(例如打孔機)加工出孔洞91(如圖8B所示)。接著,將具有孔洞91的連續板件90的一部分(即對應波浪板30)透過波板成型機加工出波浪斷面結構而形成波浪板30,具有孔洞91的連續板件90的其餘部分則未被加工為波浪斷面,即為平板20(如圖3A及圖3B所示)。接著,依據前述實施例說明,於波浪板30的焊料區域33塗布焊料T。在一實施例中,焊料區域33的正反兩面均塗布焊料T。之後,再將平板20及波浪板30以中心線C為折線相互疊置(如圖3B及圖3C所示)。Please refer to Figures 8A and 8B and refer to Figures 3A to 3C again. Figure 8A shows a schematic diagram of a manufacturing method of a flat plate 20 and a corrugated plate 30 of an annular catalyst unit 100 according to some embodiments (I). Figure 8B shows a schematic diagram of a manufacturing method of a flat plate 20 and a corrugated plate 30 of an annular catalyst unit 100 according to some embodiments (II). The following diagrams briefly illustrate the manufacturing process of the flat plate 20 and the corrugated plate 30 of the annular catalyst unit 100 according to one or more embodiments. First, a hole 91 (as shown in Figure 8B) is processed on a planar continuous plate 90 (as shown in Figure 8A) by a punching machine (such as a punching machine). Next, a portion of the continuous plate 90 with the hole 91 (i.e., corresponding to the wave plate 30) is processed into a wave cross-section structure by a wave plate forming machine to form the wave plate 30, and the remaining portion of the continuous plate 90 with the hole 91 is not processed into a wave cross-section, that is, a flat plate 20 (as shown in FIG. 3A and FIG. 3B). Next, according to the above-mentioned embodiment, solder T is applied to the solder area 33 of the wave plate 30. In one embodiment, solder T is applied to both the front and back sides of the solder area 33. Afterwards, the flat plate 20 and the wave plate 30 are overlapped with each other with the center line C as the fold line (as shown in FIG. 3B and FIG. 3C).

接著,請參閱圖9A,圖9A繪示依據一些實施例之環形觸媒單體100的製造方法示意圖(一)。如圖9A所示,在一些實施例中,波浪板30一體連接於平板20(換句話說,在一些實施例中,波浪板30與平板20為同一板體),使得平板20的一端及波浪板30的一端一體連接(在此,為便於說明,圖中未繪示平板20上以及波浪板30上的孔洞),平板20及波浪板30的連接處再透過焊料T焊接於第二金屬環形本體14的外表面14a上,但並不以此為限制;舉例來說,在一些實施例中,平板20及波浪板30的連接處也可以透過點焊方式焊接於第二金屬環形本體14的外表面14a上。之後,利用捲繞機器將平板20、波浪板30沿著第二金屬環形本體14的外表面14a捲繞,從而形成環形蜂巢狀結構H於第二金屬環形本體14的外表面14a,爾後再將環形蜂巢狀結構H以及第二金屬環形本體14一同容置於該第一金屬環形本體12內成為半成品。最後,將半成品放置於真空爐中加熱,以使焊料T熔化而讓環形蜂巢狀結構H能夠穩定固定於第一金屬環形本體12以及第二金屬環形本體14之間。而在其他實施例中,請參閱圖9B,圖9B繪示依據一些實施例之環形觸媒單體100的製造方法示意圖(二)。如圖9B所示,在另一些實施例中,波浪板30與平板20為不同板體。具體來說,是先於連續板件90上加工出孔洞91後,再將具有孔洞91的連續板件90裁切,並將裁切的二板件分別製作成平板20與帶有一小段平面板體結構的波浪板30。之後,將前述平板20與波浪板30疊置(如圖9B所示)並利用捲繞機器將平板20、波浪板30沿著第二金屬環形本體14的外表面14a捲繞,從而形成環形蜂巢狀結構H於第二金屬環形本體14的外表面14a,爾後再將環形蜂巢狀結構H以及第二金屬環形本體14一同容置於該第一金屬環形本體12內。另外,在一些實施例中,第一金屬環形本體12與環形蜂巢狀結構H之間可以不包含焊料T;換句話說,在一些實施例中,第一金屬環形本體12與環形蜂巢狀結構H之間未相對固定。Next, please refer to FIG. 9A, which shows a schematic diagram (I) of a manufacturing method of the annular catalyst unit 100 according to some embodiments. As shown in FIG. 9A, in some embodiments, the wave plate 30 is integrally connected to the flat plate 20 (in other words, in some embodiments, the wave plate 30 and the flat plate 20 are the same plate body), so that one end of the flat plate 20 and one end of the wave plate 30 are integrally connected (here, for the convenience of explanation, the holes on the flat plate 20 and the wave plate 30 are not shown in the figure), and the connection between the flat plate 20 and the wave plate 30 is then welded to the outer surface 14a of the second metal annular body 14 through solder T, but this is not limited to this; for example, in some embodiments, the connection between the flat plate 20 and the wave plate 30 can also be welded to the outer surface 14a of the second metal annular body 14 through spot welding. Afterwards, the flat plate 20 and the corrugated plate 30 are wound along the outer surface 14a of the second metal annular body 14 by a winding machine, thereby forming an annular honeycomb structure H on the outer surface 14a of the second metal annular body 14, and then the annular honeycomb structure H and the second metal annular body 14 are placed together in the first metal annular body 12 to form a semi-finished product. Finally, the semi-finished product is placed in a vacuum furnace for heating to melt the solder T so that the annular honeycomb structure H can be stably fixed between the first metal annular body 12 and the second metal annular body 14. In other embodiments, please refer to FIG. 9B, which shows a schematic diagram (II) of a manufacturing method of the annular catalyst unit 100 according to some embodiments. As shown in FIG. 9B, in other embodiments, the corrugated plate 30 and the flat plate 20 are different plates. Specifically, after the hole 91 is processed on the continuous plate 90, the continuous plate 90 with the hole 91 is cut, and the cut two plates are respectively made into the flat plate 20 and the corrugated plate 30 with a small section of the flat plate structure. Afterwards, the flat plate 20 and the corrugated plate 30 are stacked (as shown in FIG. 9B ) and a winding machine is used to wind the flat plate 20 and the corrugated plate 30 along the outer surface 14a of the second metal annular body 14, thereby forming an annular honeycomb structure H on the outer surface 14a of the second metal annular body 14, and then the annular honeycomb structure H and the second metal annular body 14 are placed together in the first metal annular body 12. In addition, in some embodiments, the first metal annular body 12 and the annular honeycomb structure H may not include solder T; in other words, in some embodiments, the first metal annular body 12 and the annular honeycomb structure H are not relatively fixed.

在一些實施例中,平板20的第一區域21的第一孔洞21a與波浪板30的第二區域31的第二孔洞31a的孔徑大小可以不相同。舉例來說,可以是第一孔洞21a較大而第二孔洞31a較小的情況,如此,對於焊料區域33重疊於第二區域31的實施例而言,由於第二孔洞31a較小,所以焊料T較有可能被提供到第二區域31的第二孔洞31a之間的實體部分,從而提升波浪板30與平板20之間的接著強度。In some embodiments, the apertures of the first hole 21a in the first region 21 of the flat plate 20 and the second hole 31a in the second region 31 of the corrugated plate 30 may be different. For example, the first hole 21a may be larger and the second hole 31a may be smaller. Thus, for the embodiment where the solder region 33 overlaps the second region 31, since the second hole 31a is smaller, the solder T is more likely to be provided to the solid portion between the second holes 31a in the second region 31, thereby improving the bonding strength between the corrugated plate 30 and the flat plate 20.

另外,在一些實施例中,在製程中除了依據前述方式於焊料區域33設置焊料T以外,還可以在波浪板30遠離平板20的一端再額外設置焊料T,從而進一步增強環形蜂巢狀結構H外圍部分的結構強度。In addition, in some embodiments, in addition to setting the solder T in the solder area 33 according to the aforementioned method during the manufacturing process, additional solder T may be set at one end of the corrugated plate 30 away from the flat plate 20, thereby further enhancing the structural strength of the outer portion of the annular honeycomb structure H.

在一些實施例中,平板20與波浪板30相互疊置捲繞而使得環形蜂巢狀結構H包含12圈至36圈的平板20以及12圈至36圈的波浪板30。In some embodiments, the flat plate 20 and the corrugated plate 30 are overlapped and wound together so that the annular honeycomb structure H includes 12 to 36 turns of the flat plate 20 and 12 to 36 turns of the corrugated plate 30 .

藉此,根據一或多個實施例,環形觸媒單體100的焊料區域33與波浪板30具有適當的面積比,讓波浪板30與平板20所捲繞成的環形蜂巢狀結構H可以穩固地焊接於第一金屬環形本體12以及第二金屬環形本體14之間,從而使得環形觸媒單體100具有良好的機械強度。另外,根據一或多個實施例,環形觸媒單體100的環形蜂巢狀結構H中的平板20及波浪板30具有適當的開孔率,可使廢氣停留於環形觸媒單體100中的時間較長,從而增加擾流效果,讓環形觸媒單體100具有較佳的轉換效率。並且,由於前述環形蜂巢狀結構H的平板20及波浪板30的開孔設計,也使得觸媒轉化器整體有較佳的熱均勻性。Thus, according to one or more embodiments, the solder area 33 of the annular catalyst unit 100 and the corrugated plate 30 have an appropriate area ratio, so that the annular honeycomb structure H formed by the corrugated plate 30 and the flat plate 20 can be stably welded between the first metal annular body 12 and the second metal annular body 14, so that the annular catalyst unit 100 has good mechanical strength. In addition, according to one or more embodiments, the flat plate 20 and the corrugated plate 30 in the annular honeycomb structure H of the annular catalyst unit 100 have an appropriate opening rate, which can make the exhaust gas stay in the annular catalyst unit 100 for a longer time, thereby increasing the turbulence effect, so that the annular catalyst unit 100 has a better conversion efficiency. In addition, due to the opening design of the flat plate 20 and the corrugated plate 30 of the annular honeycomb structure H, the catalyst converter as a whole also has better thermal uniformity.

100:環形觸媒單體 12:第一金屬環形本體 14:第二金屬環形本體 14a:外表面 20:平板 21:第一區域 21a:第一孔洞 22:連續區域 30:波浪板 30a:波峰 30b:波谷 31:第二區域 31a:第二孔洞 32:連續區域 33:焊料區域 90:連續板件 91:孔洞 C:中心線 D1:長軸方向 H:環形蜂巢狀結構 T:焊料 100: annular catalyst unit 12: first metal annular body 14: second metal annular body 14a: outer surface 20: flat plate 21: first region 21a: first hole 22: continuous region 30: wave plate 30a: wave crest 30b: wave trough 31: second region 31a: second hole 32: continuous region 33: solder region 90: continuous plate 91: hole C: center line D1: long axis direction H: annular honeycomb structure T: solder

圖1繪示依據一些實施例之環形觸媒單體的立體示意圖。 圖2繪示依據一些實施例之環形觸媒單體的分解示意圖。 圖3A繪示依據一些實施例之環形觸媒單體的平板與波浪板的立體示意圖。 圖3B繪示依據一些實施例之環形觸媒單體的平板與波浪板相互疊置前的側視示意圖。 圖3C繪示依據一些實施例之環形觸媒單體的平板與波浪板相互疊置後的側視示意圖。 圖4繪示依據一些實施例之環形觸媒單體的尚未彎成波浪狀的波浪板的第二區域及連續區的示意圖。 圖5A繪示依據一些實施例之環形觸媒單體的平板的第一區域的示意圖(一)。 圖5B繪示依據一些實施例之環形觸媒單體的平板的第一區域的示意圖(二)。 圖5C繪示依據一些實施例之環形觸媒單體的尚未彎成波浪狀的波浪板的第二區域的示意圖(一)。 圖5D繪示依據一些實施例之環形觸媒單體的尚未彎成波浪狀的波浪板的第二區域的示意圖(二)。 圖6A繪示依據一些實施例之環形觸媒單體的尚未彎成波浪狀的波浪板的第二區域、連續區域及焊料區域的示意圖(一)。 圖6B繪示依據一些實施例之環形觸媒單體的尚未彎成波浪狀的波浪板的第二區域、連續區域及焊料區域的示意圖(二)。 圖6C繪示依據一些實施例之環形觸媒單體的尚未彎成波浪狀的波浪板的第二區域、連續區域及焊料區域的示意圖(三)。 圖7繪示依據一些實施例之環形觸媒單體的環形蜂巢狀結構的局部剖面示意圖。 圖8A繪示依據一些實施例之環形觸媒單體的平板與波浪板的製造方法示意圖(一)。 圖8B繪示依據一些實施例之環形觸媒單體的平板與波浪板的製造方法示意圖(二)。 圖9A繪示依據一些實施例之環形觸媒單體的製造方法示意圖(一)。 圖9B繪示依據一些實施例之環形觸媒單體的製造方法示意圖(二)。 FIG. 1 is a three-dimensional schematic diagram of an annular catalyst unit according to some embodiments. FIG. 2 is a decomposed schematic diagram of an annular catalyst unit according to some embodiments. FIG. 3A is a three-dimensional schematic diagram of a flat plate and a wave plate of an annular catalyst unit according to some embodiments. FIG. 3B is a side view schematic diagram of an annular catalyst unit before the flat plate and the wave plate are stacked on each other according to some embodiments. FIG. 3C is a side view schematic diagram of an annular catalyst unit after the flat plate and the wave plate are stacked on each other according to some embodiments. FIG. 4 is a schematic diagram of a second region and a continuous region of a wave plate that has not yet been bent into a wave shape of an annular catalyst unit according to some embodiments. FIG. 5A is a schematic diagram of a first region of a flat plate of an annular catalyst unit according to some embodiments (I). FIG. 5B is a schematic diagram of a first region of a flat plate of an annular catalyst unit according to some embodiments (II). FIG. 5C is a schematic diagram of a second region of a wave plate of an annular catalyst unit that has not yet been bent into a wave shape according to some embodiments (I). FIG. 5D is a schematic diagram of a second region of a wave plate of an annular catalyst unit that has not yet been bent into a wave shape according to some embodiments (II). FIG. 6A is a schematic diagram of a second region, a continuous region, and a solder region of a wave plate of an annular catalyst unit that has not yet been bent into a wave shape according to some embodiments (I). FIG. 6B is a schematic diagram of the second region, the continuous region and the solder region of the wavy plate that has not been bent into a wavy shape according to some embodiments of the annular catalyst unit (II). FIG. 6C is a schematic diagram of the second region, the continuous region and the solder region of the wavy plate that has not been bent into a wavy shape according to some embodiments of the annular catalyst unit (III). FIG. 7 is a schematic diagram of a partial cross-section of the annular honeycomb structure of the annular catalyst unit according to some embodiments. FIG. 8A is a schematic diagram of a manufacturing method of a flat plate and a wavy plate of an annular catalyst unit (I). FIG. 8B is a schematic diagram of a manufacturing method of a flat plate and a wavy plate of an annular catalyst unit (II). FIG. 9A is a schematic diagram showing a method for manufacturing an annular catalyst unit according to some embodiments (I). FIG. 9B is a schematic diagram showing a method for manufacturing an annular catalyst unit according to some embodiments (II).

100:環形觸媒單體 100: Annular catalyst unit

12:第一金屬環形本體 12: First metal ring body

14:第二金屬環形本體 14: Second metal ring body

H:環形蜂巢狀結構 H: Ring honeycomb structure

Claims (4)

一種環形觸媒單體,包括: 一第一金屬環形本體; 一第二金屬環形本體,位於該第一金屬環形本體內,其中該第二金屬環形本體的直徑小於該第一金屬環形本體的直徑; 一環形蜂巢狀結構,位於該第一金屬環形本體以及該第二金屬環形本體之間,其中該環形蜂巢狀結構包括一平板以及一波浪板,該平板與該波浪板相互疊置捲繞並容置於該第一金屬環形本體內; 該平板具有一第一區域,該第一區域具有多個第一孔洞,各該第一孔洞的孔徑大小為介於0.8 mm至5 mm之間;以及 該波浪板具有一波浪斷面並包含一第二區域及一連續區域,該第二區域連接該連續區域,該波浪斷面包含多個波峰及多個波谷; 其中,該平板的一端及該波浪板的一端連接於該第二金屬環形本體的一外表面; 其中,該第二區域具有多個第二孔洞,各該第二孔洞的孔徑大小為介於0.8 mm至5 mm之間,該些第一孔洞以及該些第二孔洞的總面積相對於該平板以及該波浪板的總面積的比例為介於35%至45%之間; 其中,該波浪板具有一焊料區域,該焊料區域重疊於該第二區域及該連續區域二者中至少一者之至少一部分,位於該焊料區域之該些波峰與該些波谷之外側具有一焊料,該焊料區域與該波浪板之一面積比為20%至67%。 A ring-shaped catalyst monomer, comprising: a first metal ring-shaped body; a second metal ring-shaped body, located in the first metal ring-shaped body, wherein the diameter of the second metal ring-shaped body is smaller than the diameter of the first metal ring-shaped body; an annular honeycomb structure, located between the first metal ring-shaped body and the second metal ring-shaped body, wherein the annular honeycomb structure comprises a flat plate and a corrugated plate, the flat plate and the corrugated plate are overlapped and wound with each other and accommodated in the first metal ring-shaped body; the flat plate has a first area, the first area has a plurality of first holes, and the diameter of each first hole is between 0.8 mm and 5 mm; and The corrugated plate has a corrugated cross section and includes a second region and a continuous region, the second region is connected to the continuous region, and the corrugated cross section includes a plurality of crests and a plurality of troughs; wherein one end of the flat plate and one end of the corrugated plate are connected to an outer surface of the second metal annular body; wherein the second region has a plurality of second holes, the aperture size of each of the second holes is between 0.8 mm and 5 mm, and the total area of the first holes and the second holes is between 35% and 45% relative to the total area of the flat plate and the corrugated plate; The wave plate has a solder area, which overlaps at least a portion of at least one of the second area and the continuous area, and there is solder outside the wave crests and the wave troughs of the solder area. The area ratio of the solder area to the wave plate is 20% to 67%. 如請求項1所述的環形觸媒單體,其中,該重疊部分位於該第二區域,該焊料區域與該波浪板之該面積比為40%至67%。An annular catalyst unit as described in claim 1, wherein the overlapping portion is located in the second area, and the area ratio of the solder area to the corrugated plate is 40% to 67%. 如請求項1所述的環形觸媒單體,其中,該重疊部分位於該連續區域,該焊料區域與該波浪板之該面積比為20%至33%。An annular catalyst unit as described in claim 1, wherein the overlapping portion is located in the continuous area, and the area ratio of the solder area to the corrugated plate is 20% to 33%. 如請求項1所述的環形觸媒單體,其中,該重疊部分位於該第二區域及該連續區域,該焊料區域與該波浪板之該面積比為21%至40%。The annular catalyst unit as described in claim 1, wherein the overlapping portion is located in the second area and the continuous area, and the area ratio of the solder area to the corrugated plate is 21% to 40%.
TW114200540U 2025-01-14 2025-01-14 Ring Catalyst Unit TWM668299U (en)

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