TWM656470U - Photocatalyst treatment system for degradation of harmful gases - Google Patents
Photocatalyst treatment system for degradation of harmful gases Download PDFInfo
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- TWM656470U TWM656470U TW112211674U TW112211674U TWM656470U TW M656470 U TWM656470 U TW M656470U TW 112211674 U TW112211674 U TW 112211674U TW 112211674 U TW112211674 U TW 112211674U TW M656470 U TWM656470 U TW M656470U
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- 239000007789 gas Substances 0.000 title claims abstract description 69
- 239000011941 photocatalyst Substances 0.000 title claims abstract description 25
- 230000015556 catabolic process Effects 0.000 title 1
- 238000006731 degradation reaction Methods 0.000 title 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 67
- 230000001699 photocatalysis Effects 0.000 claims abstract description 45
- 238000005406 washing Methods 0.000 claims abstract description 30
- 239000007788 liquid Substances 0.000 claims abstract description 24
- 239000003595 mist Substances 0.000 claims abstract description 16
- 239000000126 substance Substances 0.000 claims abstract description 15
- 239000003054 catalyst Substances 0.000 claims description 31
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 11
- 230000000593 degrading effect Effects 0.000 claims description 8
- 239000011521 glass Substances 0.000 claims description 8
- 239000002245 particle Substances 0.000 claims description 8
- 230000000694 effects Effects 0.000 claims description 6
- 239000004408 titanium dioxide Substances 0.000 claims description 6
- 239000003344 environmental pollutant Substances 0.000 abstract description 14
- 231100000719 pollutant Toxicity 0.000 abstract description 14
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 24
- 229910021529 ammonia Inorganic materials 0.000 description 12
- 238000009264 composting Methods 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
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- 238000012986 modification Methods 0.000 description 2
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- 150000001412 amines Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000036461 convulsion Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
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- 208000007475 hemolytic anemia Diseases 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
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Abstract
本創作之光觸媒處理系統至少包含:基座、水洗模組以及第一、第二光催化模組,基座具有中空狀之通道,二側分別為氣體入口及氣體出口,水洗模組係設置於該通道內靠近該氣體入口處,提供水霧或水對氣體進行沖洗,將氣體中的有害物質溶解於液體成為待處理液體,第一光催化模組係設置於該通道內且接續於該水洗模組之後,接收經過該水洗模組沖洗後的氣體,而第二光催化模組係設置於該通道內且配置於該水洗模組下方,則用以接收待處理液體,透過光催化模組以光觸媒光源對氣體及液體中的污染物質進行降解,最後將淨化氣體以及液體排出,達到將含污染物的有害氣體處理形成潔淨空氣之目的。The photocatalyst treatment system of this invention at least includes: a base, a water washing module, and a first and a second photocatalytic module. The base has a hollow channel, and the two sides are respectively a gas inlet and a gas outlet. The water washing module is arranged in the channel near the gas inlet to provide water mist or water to flush the gas, dissolving the harmful substances in the gas into a liquid to be treated. The first photocatalytic module is arranged in the channel. And following the water washing module, the first photocatalytic module receives the gas after being flushed by the water washing module, and the second photocatalytic module is arranged in the channel and configured below the water washing module, and is used to receive the liquid to be treated. The pollutants in the gas and liquid are degraded by the photocatalyst light source through the photocatalytic module, and finally the purified gas and liquid are discharged, so as to achieve the purpose of treating harmful gases containing pollutants to form clean air.
Description
本創作係有關一種處理系統,特別是有關於一種可降解有害氣體例如氨氣之光觸媒處理系統。 This invention relates to a treatment system, in particular to a photocatalytic treatment system that can degrade harmful gases such as ammonia.
按,台灣地區近年來由於畜殖相關產業發達,每年產生之各種有機廢棄物數量極為龐大,特別在一些農業大縣,主管機關正對於堆肥場或畜殖場所衍生之惡臭尋找有效之解決方案。這些眾多之禽畜廢棄物、農產廢棄物、林業及水產廢棄物,每年合計產生達2,000噸,若未能適當快速處理,將成為嚴重污染源,對環境與生態造成極大負面影響。 According to the report, due to the development of livestock-related industries in Taiwan in recent years, the amount of various organic wastes generated each year is extremely large. Especially in some large agricultural counties, the competent authorities are looking for effective solutions for the odors derived from composting sites or livestock farms. These numerous livestock wastes, agricultural wastes, forestry and aquatic wastes, a total of 2,000 tons are generated each year. If they are not properly and quickly handled, they will become a serious source of pollution and have a great negative impact on the environment and ecology.
過去因環境污染因素,導致堆肥場停工與畜殖場遷廠之例子比比皆是。通常在堆肥場之堆肥過程中,有機負荷過高與氧氣不足時,將會產生惡臭的吲哚(Indole)、糞臭素(Skatol)、硫化氫(Hydrogen sulfide)、氨氣(Ammonia)、揮發性胺類(Amines)及硫醇類(Mercaptans)等氣體,其中以「氨氣」為堆肥場逸散惡臭之主要來源,經過實際調查堆肥場在「高度發酵」時,其中氨氣之尖峰濃度竟高達1,200ppm,平均達800ppm,如此高之濃度已屬於「毒性」污染物,因此不容忽視。另外,於家禽生產過程中,氨氣(NH3)的產出是最 令人擔憂的、會污染環境的問題。當鳥類攝入蛋白質時,它們會產生尿酸(uric acid),最終在適合的條件下轉化為氨氣。另外,高濃度氨氣除會由高度發酵之堆肥製程產生以及家禽生產過程中產生外,此高濃度污染物之逸散亦被發現於魚畜殘渣煉製業、飼料業及食品加工廠排氣。 In the past, there were many examples of composting sites being shut down and livestock farms being relocated due to environmental pollution. Usually, during the composting process in a composting site, when the organic load is too high and the oxygen is insufficient, foul-smelling gases such as indole, skatol, hydrogen sulfide, ammonia, volatile amines, and mercaptans will be produced. Among them, ammonia is the main source of foul odors emitted from composting sites. After actual investigation, when composting sites are "highly fermented", the peak concentration of ammonia is as high as 1,200ppm and the average is 800ppm. Such a high concentration is already a "toxic" pollutant and should not be ignored. In addition, the production of ammonia (NH 3 ) is the most worrying problem in the poultry production process. When birds ingest protein, they produce uric acid, which is eventually converted into ammonia under the right conditions. In addition to high concentrations of ammonia produced by highly fermented composting processes and poultry production processes, high concentrations of this pollutant have also been found in the exhaust of fish and livestock residue processing, feed industry and food processing plants.
再者,醫學界亦證實,長時間暴露高濃度(>500ppm)氨氣下可能造成致命的傷害,嚴重的肺水腫,抽搐、呼吸麻痺,嚴重的溶血性貧血、昏迷,甚而快速致死;若未妥善處理不但極易造成環境污染,也會直接或間接地影響工作人員或鄰近居民的生活品質和身體健康。所以如何降解高濃度的氨氣等有害氣體,為目前業界亟欲解決之問題。 Furthermore, the medical community has also confirmed that long-term exposure to high concentrations of ammonia (>500ppm) may cause fatal injuries, severe pulmonary edema, convulsions, respiratory paralysis, severe hemolytic anemia, coma, and even rapid death; if not properly handled, it will not only easily cause environmental pollution, but will also directly or indirectly affect the quality of life and health of workers or nearby residents. Therefore, how to degrade high concentrations of ammonia and other harmful gases is a problem that the industry is currently eager to solve.
有鑑於此,本創作提供一種處理系統,特別是有關於一種可降解有害氣體例如高濃度氨氣之光觸媒處理系統,為其主要目的者。 In view of this, this invention provides a treatment system, especially a photocatalytic treatment system that can degrade harmful gases such as high-concentration ammonia, as its main purpose.
本創作之光觸媒處理系統,至少包含:基座,其內部具有中空狀之通道,並於基座的通道二側分別設有供外部氣體進入之氣體入口、供處理後氣體輸出之氣體出口;水洗模組,係設置於該通道內靠近該氣體入口處,該水洗模組提供水霧或水對氣體進行沖洗,將氣體中的有害物質溶解於液體成為待處理液體;第一光催化模組,係設置於該通道內且接續於該水洗模組之後,接收經過該水洗模組沖洗後的氣體,該第一光催化模組係具有將氣體中有害物質進行裂解之第一光觸媒光源;以及第二光催化模組,係設置於該通道內且配 置於該水洗模組下方,該第二光催化模組係具有接收待處理液體之槽體、第二光觸媒光源以及震動源,該震動源係與該槽體連接用以對該槽體產生震動作用,而該第二光觸媒光源可對該槽體內待處理液體中有害物質進行裂解。 The photocatalyst treatment system of this invention at least comprises: a base having a hollow channel inside, and a gas inlet for external gas to enter and a gas outlet for treated gas to be output on both sides of the channel of the base; a water washing module is arranged in the channel near the gas inlet, and the water washing module provides water mist or water to wash the gas, dissolving harmful substances in the gas into liquid to be treated liquid; a first photocatalytic module is arranged in the channel and follows the water washing module to receive the gas after the water washing module is washed. The gas washed by the water washing module, the first photocatalytic module has a first photocatalyst light source for cracking harmful substances in the gas; and the second photocatalytic module is arranged in the channel and disposed below the water washing module. The second photocatalytic module has a tank body for receiving the liquid to be treated, a second photocatalyst light source and a vibration source. The vibration source is connected to the tank body to generate a vibration effect on the tank body, and the second photocatalyst light source can crack harmful substances in the liquid to be treated in the tank body.
依據上述技術特徵,所述水洗模組具有分別與一供水管相連接之複數水霧噴頭。 According to the above technical features, the water washing module has a plurality of water mist nozzles respectively connected to a water supply pipe.
依據上述技術特徵,所述水洗模組具有分別與該供水管相連接之複數水簾,而該水簾係設置於水霧噴頭之後。 According to the above technical features, the water washing module has a plurality of water curtains respectively connected to the water supply pipe, and the water curtains are arranged behind the water mist nozzle.
依據上述技術特徵,所述第一光催化模組具有第一觸媒單元及第一光源單元,該第一觸媒單元具有一底板以及豎立於該底板且間隔排列的複數片體,該複數片體之表面設置有觸媒物質,該第一光源單元係配置於該複數片體一側,可供產生光源並朝該複數片體照射,以產生該第一光觸媒光源。 According to the above technical features, the first photocatalytic module has a first catalyst unit and a first light source unit. The first catalyst unit has a bottom plate and a plurality of sheets vertically disposed on the bottom plate and arranged at intervals. The surfaces of the plurality of sheets are provided with a catalyst material. The first light source unit is disposed on one side of the plurality of sheets and can generate a light source and irradiate the plurality of sheets to generate the first photocatalyst light source.
依據上述技術特徵,所述第二光催化模組具有第二觸媒單元及第二光源單元,該第二觸媒單元具有複數玻璃顆粒以及包覆於玻璃顆粒表面之觸媒物質,該第二光源單元係配置於該槽體一側,可供產生光源並朝該第二觸媒單元照射,以產生該第二光觸媒光源。 According to the above technical features, the second photocatalytic module has a second catalyst unit and a second light source unit. The second catalyst unit has a plurality of glass particles and a catalyst material coated on the surface of the glass particles. The second light source unit is arranged on one side of the tank body, and can be used to generate a light source and irradiate the second catalyst unit to generate the second photocatalyst light source.
依據上述技術特徵,所述觸媒物質為二氧化鈦,而該第一、第二光源單元係能產生紫外線光。 According to the above technical features, the catalyst material is titanium dioxide, and the first and second light source units are capable of generating ultraviolet light.
依據上述技術特徵,所述震動源係為超音波震動單元。 According to the above technical features, the vibration source is an ultrasonic vibration unit.
1:光觸媒處理系統 1: Photocatalytic media processing system
10:基座 10: Base
11:通道 11: Channel
12:氣體入口 12: Gas inlet
13:氣體出口 13: Gas outlet
20:水洗模組 20: Water washing module
21:供水管 21: Water supply pipe
22:水霧噴頭 22: Water mist spray head
23:水簾 23: Water curtain
30:第一光催化模組 30: First photocatalytic module
31:第一光源單元 31: First light source unit
32:底板 32: Bottom plate
33:片體 33: Film body
40:第二光催化模組 40: Second photocatalytic module
41:槽體 41: Tank
42:震動源 42: Source of vibration
43:第二觸媒單元 43: Second catalyst unit
431:玻璃顆粒 431: Glass particles
432:觸媒物質 432: Catalyst
44:第二光源單元 44: Second light source unit
45:輸出管 45: Output pipe
50:待處理液體 50: Liquid to be processed
第1圖所示為本創作中光觸媒處理系統之結構示意圖。 Figure 1 shows the schematic diagram of the structure of the photocatalytic processing system in this work.
第2圖所示為本創作中第二觸媒單元之結構示意圖。 Figure 2 shows the schematic diagram of the structure of the second catalyst unit in this creation.
為利 貴審查員瞭解本創作之技術特徵、內容與優點及其所能達成之功效,茲將本創作配合附圖,並以實施例之表達形式詳細說明如下,而其中所使用之圖式,其主旨僅為示意及輔助說明書之用,未必為本創作實施後之真實比例與精準配置,故不應就所附之圖式的比例與配置關係解讀、侷限本創作於實際實施上的權利範圍,合先敘明。 In order to help the reviewer understand the technical features, content and advantages of this creation and the effects it can achieve, this creation is accompanied by attached diagrams and described in detail in the form of an embodiment. The diagrams used are only for illustration and auxiliary instructions, and may not be the actual proportions and precise configurations of this creation after implementation. Therefore, the proportions and configurations of the attached diagrams should not be interpreted to limit the scope of rights of this creation in actual implementation. This should be stated in advance.
請參閱第1圖所示為本創作中光觸媒處理系統之結構示意圖,本創作之光觸媒處理系統1至少包含:基座10、水洗模組20以及第一、第二光催化模組30、40。
Please refer to Figure 1, which is a schematic diagram of the structure of the photocatalyst treatment system in this invention. The
該基座10部具有中空狀之通道11,並於基座的通道11二側分別設有供外部氣體進入之氣體入口12、供處理後氣體輸出之氣體出口13,可貫通至外部。
The
該水洗模組20係設置於該通道11內靠近該氣體入口12處,該水洗模組20提供水霧或水等液體對氣體進行沖洗,將氣體中的汙染有害物質溶解於液體成為待處理液體50。如圖所示之實施例中,該水洗模組20具有分別與一供水管21相連接之複數水霧噴頭22,分別向基座10的通道11內噴灑水霧,對氣體之污染物質噴灑水霧,利用水霧撞擊污染物質後,即可抓取並溶解氣體中的污染物質,藉由水洗將氣體中相對濕度飽和且經凝核處理之污染物質利用撞擊、抓取予以洗去,做為氣體中污染物質的第一道去除行程;而水霧噴頭22之後亦可進一步設有與該供水管21相連接之複數水簾23,讓帶有污染物質的氣體通過
該水簾23,以洗去污染物質,將氣體中的污染有害物質溶解於液體成為待處理液體50。
The
該第一光催化模組30係設置於該通道11內且接續於該水洗模組20之後,接收經過該水洗模組20沖洗後的氣體,該第一光催化模組30係具有將氣體中有害物質進行裂解之第一光觸媒光源;如圖所示之實施例中,該第一光催化模組30具有第一觸媒單元及第一光源單元31,該第一觸媒單元具有一底板32以及豎立於該底板32且間隔排列的複數片體33,該複數片體33之表面設置有觸媒物質,其可以是二氧化鈦,但不以此為限;該第一光源單元31係配置於該複數片體33一側,可供產生光源並朝該複數片體33照射,該第一光源單元31以能產生紫外線為佳,其具體為一LED燈,但不以此為限;利用複數片體33上的觸媒物質(例如為二氧化鈦)經由第一光源單元之照射,產生光觸媒作用進而產生第一光觸媒光源,能還原分解空氣中的細菌、甲醛、苯類、氨等,搶走這些有機物的電子,使這些有機物失去鍵結能力降解成對人體無害的小分子,以獲致淨化殺菌功效,最後再由氣體出口13將該些處理後氣體輸出。
The first
該第二光催化模組40係設置於該通道11內且配置於該水洗模組20下方,該第二光催化模組40係具有接收待處理液體50之槽體41、第二光觸媒光源以及震動源42,該槽體41位於該水霧噴頭22以及該水簾23下方用以承接待處理液體50,該震動源42係與該槽體41連接用以對該槽體41產生震動作用,該震動源42可以是超音波震動單元,但不以此為限;而該第二光觸媒光源可對該槽體41內待處理液體50中有害物質進行裂解,通過震動源42對該槽體41產生震動作用,從而使第二光觸媒光源多次發生多角度反射,從而極大提高光的使用率,同時讓光觸媒反應無死角受光,進而提高光觸媒的反應效率;如圖所示之
實施例中,該第二光催化模組40進一步具有第二觸媒單元43及第二光源單元44,請同時參閱第2圖所示,該第二觸媒單元43具有複數玻璃顆粒431以及包覆於玻璃顆粒431表面之觸媒物質432,其可以是二氧化鈦,但不以此為限,該第二光源單元44係配置於該槽體41一側,可供產生光源並朝該第二觸媒單元43照射,該第二光源單元44以能產生紫外線為佳,其具體為一LED燈,但不以此為限;利用玻璃顆粒431上的觸媒物質432(例如為二氧化鈦)經由第二光源單元之照射,產生光觸媒作用進而產生第二光觸媒光源,能還原分解空氣中的細菌、甲醛、苯類、氨等,搶走這些有機物的電子,使這些有機物失去鍵結能力降解成對人體無害的小分子,以獲致淨化殺菌功效,最後可由一輸出管45將該些處理後液體輸出。
The second
上述各構件於實際組構時,係於基座10的通道11內由氣體入口12往另側氣體出口13處,依序組裝光觸媒處理系統1之水洗模組20以及第一、第二光催化模組30、40,藉以將氣體入口12處引進的外部氣體,透過光觸媒處理系統1進行滅菌、除臭、濾除污染物質等處理作業後,分別產生無害的氣體及液體,其中氣體由另側氣體出口13處向外排出,液體則由輸出管45向外排出,而利本創作之光觸媒處理系統1,並可達到淨化空氣、降低空氣污染現象之目的。
When the above components are actually assembled, the
綜上所述,本創作提供一較佳可行用以降解有害氣體之光觸媒處理系統,爰依法提呈新型專利之申請;本創作之技術內容及技術特點已揭示如上,然而熟悉本項技術之人士仍可能基於本創作之揭示而作各種不背離本案創作精神之替換及修飾。因此,本創作之保護範圍應不限於實施例所揭示者,而 應包括各種不背離本創作之替換及修飾,並為以下之申請專利範圍所涵蓋。 In summary, this invention provides a better and feasible photocatalytic treatment system for degrading harmful gases, and therefore a new patent application is submitted in accordance with the law; the technical content and technical features of this invention have been disclosed as above, but people familiar with this technology may still make various substitutions and modifications based on the disclosure of this invention without departing from the spirit of this invention. Therefore, the protection scope of this invention should not be limited to those disclosed in the embodiments, but should include various substitutions and modifications that do not depart from this invention and are covered by the following patent application scope.
1:光觸媒處理系統 1: Photocatalytic media processing system
10:基座 10: Base
11:通道 11: Channel
12:氣體入口 12: Gas inlet
13:氣體出口 13: Gas outlet
20:水洗模組 20: Water washing module
21:供水管 21: Water supply pipe
22:水霧噴頭 22: Water mist spray head
23:水簾 23: Water curtain
30:第一光催化模組 30: First photocatalytic module
31:第一光源單元 31: First light source unit
32:底板 32: Bottom plate
33:片體 33: Film body
40:第二光催化模組 40: Second photocatalytic module
41:槽體 41: Tank
42:震動源 42: Source of vibration
43:第二觸媒單元 43: Second catalyst unit
44:第二光源單元 44: Second light source unit
45:輸出管 45: Output pipe
50:待處理液體 50: Liquid to be processed
Claims (7)
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